Nothing Special   »   [go: up one dir, main page]

CN103034056A - 着色感光性树脂组合物 - Google Patents

着色感光性树脂组合物 Download PDF

Info

Publication number
CN103034056A
CN103034056A CN201210391755XA CN201210391755A CN103034056A CN 103034056 A CN103034056 A CN 103034056A CN 201210391755X A CN201210391755X A CN 201210391755XA CN 201210391755 A CN201210391755 A CN 201210391755A CN 103034056 A CN103034056 A CN 103034056A
Authority
CN
China
Prior art keywords
methyl
resin
structural unit
acid
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201210391755XA
Other languages
English (en)
Chinese (zh)
Inventor
城内公之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of CN103034056A publication Critical patent/CN103034056A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
CN201210391755XA 2011-10-07 2012-09-29 着色感光性树脂组合物 Pending CN103034056A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011222669 2011-10-07
JP2011-222669 2011-10-07

Publications (1)

Publication Number Publication Date
CN103034056A true CN103034056A (zh) 2013-04-10

Family

ID=48021071

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210391755XA Pending CN103034056A (zh) 2011-10-07 2012-09-29 着色感光性树脂组合物

Country Status (4)

Country Link
JP (1) JP6091831B2 (ja)
KR (1) KR101974965B1 (ja)
CN (1) CN103034056A (ja)
TW (1) TWI610134B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104698748A (zh) * 2013-12-03 2015-06-10 Jsr株式会社 着色组合物、着色固化膜和显示元件
CN105974739A (zh) * 2015-03-12 2016-09-28 东友精细化工有限公司 着色感光树脂组合物、滤色器和液晶显示装置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101391224B1 (ko) * 2013-05-28 2014-05-02 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서
KR102012523B1 (ko) * 2013-07-25 2019-08-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치
KR101987107B1 (ko) * 2014-03-31 2019-06-10 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이로부터 제조되는 컬러 필터
WO2017150615A1 (ja) * 2016-03-02 2017-09-08 株式会社ダイセル 硬化性組成物
JP6432710B2 (ja) * 2016-05-12 2018-12-05 京セラドキュメントソリューションズ株式会社 静電潜像現像用トナー

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030224291A1 (en) * 2002-05-02 2003-12-04 Jun Hatakeyama Resist composition and patterning process
CN101349867A (zh) * 2007-07-16 2009-01-21 韩国电气研究院 有机-无机复合感光树脂组合物及使用其硬化体的液晶显示元件
CN101445578A (zh) * 2007-11-29 2009-06-03 住友化学株式会社 热固化性树脂组合物
US20100081089A1 (en) * 2007-04-11 2010-04-01 Kim Han-Soo Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
CN101910945A (zh) * 2007-12-27 2010-12-08 住友化学株式会社 感光性树脂组合物
CN102023480A (zh) * 2009-09-18 2011-04-20 Jsr株式会社 放射线敏感性树脂组合物、作为显示元件用保护膜、绝缘膜或分隔物的固化物及其形成方法
CN102193315A (zh) * 2010-03-15 2011-09-21 住友化学株式会社 着色感光性树脂组合物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11323260A (ja) * 1998-03-11 1999-11-26 Hitachi Chem Co Ltd 着色性樹脂組成物、着色性感光性樹脂組成物、着色画像形成用感光液、感光性エレメント、着色画像の製造法、カラーフィルタ用基板の製造法及びカラーフィルタの製造法
TW201111447A (en) * 2009-07-14 2011-04-01 Sumitomo Chemical Co Production method of pigment dispersion solution
JP5549439B2 (ja) * 2009-09-18 2014-07-16 Ｊｓｒ株式会社 表示素子用の保護膜、絶縁膜又はスペーサーとしての硬化物形成用の感放射線性樹脂組成物、硬化物及びその形成方法
TW201113303A (en) * 2009-10-07 2011-04-16 Sumitomo Chemical Co Colored photosensitive resin compositions
JP2011170011A (ja) * 2010-02-17 2011-09-01 Toppan Printing Co Ltd 液晶表示装置用カラーフィルタの製造方法
JP5510152B2 (ja) * 2010-03-15 2014-06-04 住友化学株式会社 着色感光性樹脂組成物

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030224291A1 (en) * 2002-05-02 2003-12-04 Jun Hatakeyama Resist composition and patterning process
US20100081089A1 (en) * 2007-04-11 2010-04-01 Kim Han-Soo Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
CN101349867A (zh) * 2007-07-16 2009-01-21 韩国电气研究院 有机-无机复合感光树脂组合物及使用其硬化体的液晶显示元件
CN101445578A (zh) * 2007-11-29 2009-06-03 住友化学株式会社 热固化性树脂组合物
CN101910945A (zh) * 2007-12-27 2010-12-08 住友化学株式会社 感光性树脂组合物
CN102023480A (zh) * 2009-09-18 2011-04-20 Jsr株式会社 放射线敏感性树脂组合物、作为显示元件用保护膜、绝缘膜或分隔物的固化物及其形成方法
CN102193315A (zh) * 2010-03-15 2011-09-21 住友化学株式会社 着色感光性树脂组合物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104698748A (zh) * 2013-12-03 2015-06-10 Jsr株式会社 着色组合物、着色固化膜和显示元件
CN104698748B (zh) * 2013-12-03 2019-10-29 Jsr株式会社 着色组合物、着色固化膜和显示元件
CN105974739A (zh) * 2015-03-12 2016-09-28 东友精细化工有限公司 着色感光树脂组合物、滤色器和液晶显示装置
CN105974739B (zh) * 2015-03-12 2020-10-02 东友精细化工有限公司 着色感光树脂组合物、滤色器和液晶显示装置

Also Published As

Publication number Publication date
TWI610134B (zh) 2018-01-01
TW201321893A (zh) 2013-06-01
JP6091831B2 (ja) 2017-03-08
KR20130038172A (ko) 2013-04-17
KR101974965B1 (ko) 2019-05-03
JP2013092759A (ja) 2013-05-16

Similar Documents

Publication Publication Date Title
CN102799067B (zh) 着色固化性树脂组合物
KR102282903B1 (ko) 착색 조성물
CN102053496B (zh) 着色感光性树脂组合物
CN104350422B (zh) 着色感光性树脂组合物
CN103105733B (zh) 着色感光性树脂组合物
CN104678706A (zh) 着色固化性树脂组合物
TW201335704A (zh) 著色硬化性樹脂組成物
CN102636956A (zh) 着色感光性树脂组合物
CN102736416A (zh) 着色感光性树脂组合物
CN102902160A (zh) 着色固化性树脂组合物
CN103034056A (zh) 着色感光性树脂组合物
CN102629076A (zh) 着色感光性树脂组合物
CN103105735A (zh) 着色固化性树脂组合物
CN104865796A (zh) 着色固化性树脂组合物
CN102681346B (zh) 着色感光性树脂组合物
CN103048882A (zh) 着色固化性树脂组合物
CN104672198A (zh) 化合物及着色固化性树脂组合物
CN102645844A (zh) 着色固化性树脂组合物
TW201435489A (zh) 感光性樹脂組成物
CN107522685A (zh) 化合物、着色固化性树脂组合物、滤色器和显示装置
CN103365088A (zh) 着色固化性树脂组合物
CN102681347A (zh) 着色感光性树脂组合物
CN103309155A (zh) 着色固化性树脂组合物
TWI604271B (zh) 著色硬化性樹脂組成物
CN103488050A (zh) 着色感光性树脂组合物

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: TONGWOO FINE CHEMICALS CO., LTD.

Effective date: 20150316

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20150316

Address after: Japan Tokyo central Sichuan two chome 27 No. 1

Applicant after: Sumitomo Chemical Co., Ltd.

Applicant after: Tongwoo Fine Chemicals Co., Ltd.

Address before: Japan's Tokyo new central Sichuan two chome 27 No. 1

Applicant before: Sumitomo Chemical Co., Ltd.

RJ01 Rejection of invention patent application after publication

Application publication date: 20130410

RJ01 Rejection of invention patent application after publication