CN101330032A - Plasma processing apparatus and transition chamber thereof - Google Patents
Plasma processing apparatus and transition chamber thereof Download PDFInfo
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- CN101330032A CN101330032A CNA2008101170095A CN200810117009A CN101330032A CN 101330032 A CN101330032 A CN 101330032A CN A2008101170095 A CNA2008101170095 A CN A2008101170095A CN 200810117009 A CN200810117009 A CN 200810117009A CN 101330032 A CN101330032 A CN 101330032A
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Abstract
The invention discloses a transitional chamber of plasma processing equipment, wherein, a carrier plate jacking gear which can reciprocate in a vertical direction is provided; after a substrate carrier plate enters into the transitional chamber, the carrier plate jacking gear can separate the substrate carrier plate from a carrier plate conveying device. The invention also provides plasma processing equipment which comprises the transitional chamber. The invention improves an operation mode that a substrate carrier plate can be loaded or unloaded for one time into the operation mode that two or more substrate carrier plates can be loaded or unloaded for one time, thus significantly improving the efficiency of loading or unloading and further improving the production capacity of the plasma processing equipment. On the other hand, owing that the conveyance of one substrate carrier plate to every reaction chamber can be carried out, every substrate carrier plate can complete a whole technical process simultaneously during the same technical period, thus guaranteeing higher processing quality of the substrate.
Description
Technical field
The present invention relates to microelectronics technology, particularly relate to a kind of transition chamber thereof that is used between processing chamber and atmospheric environment, transmitting substrate carrier plate.The invention still further relates to a kind of apparatus for processing plasma that comprises above-mentioned transition chamber thereof.
Background technology
Apparatus for processing plasma has been widely used in microelectronics technology.
Please refer to Fig. 1, Fig. 1 is a kind of structural representation of apparatus for processing plasma.
Apparatus for processing plasma 1 has adjacent successively loading chamber 11, preheating chamber 12, reaction chamber 13 and unloading chamber 14, and substrate carrier plate 16 passes through above-mentioned each chamber successively under the drive of support plate conveyer (for example transfer roller group of being made up of some transfer rollers 15).Certainly, apparatus for processing plasma 1 also can have other specific constructive form.
Above-mentioned loading chamber 11 and unloading chamber 14 are used for transmitting substrate carrier plate 16 between vacuum environment and atmospheric environment, are transition chamber thereof.
Please refer to Fig. 2, Fig. 2 is the structural representation of another kind of apparatus for processing plasma.
Another kind of apparatus for processing plasma 2 has adjacent successively loading chamber 21, preheating chamber 22, first reaction chamber 231, second reaction chamber 232 and unloading chamber 24; Substrate carrier plate 26 passes through above-mentioned each chamber successively under the drive of a series of transfer rollers 25.The mode of substrate carrier plate 26 loading and unloading is identical with above-mentioned apparatus for processing plasma 1, promptly still shifts between atmospheric environment and vacuum environment by transition chamber thereof (load chamber 21 and unload chamber 24).
Can be every half process cycle substrate carrier plate 26 of in loading chamber 21, packing into.When the substrate in the substrate carrier plate 26 27 in first reaction chamber 231, finish predetermined technical process 1/2nd after, be sent to second reaction chamber 232 to finish 1/2nd technical process in addition; Simultaneously, send into next piece substrate carrier plate 26 in first reaction chamber 231 and finish first 1/2nd technical processs, so circulation.Certainly, three even more reaction chamber can also be set, this moment, operation principle was similar.Plasma processing 2 can be processed the substrate 27 in two even the polylith substrate carrier plate 26 in a process cycle, and its production capacity will be improved.
But the further raising of above-mentioned apparatus for processing plasma 2 production capacities is subjected to the restriction of support plate efficiency of loading.As previously mentioned, the loading and unloading of substrate carrier plate 26 by transition chamber thereof operate between atmospheric environment and the vacuum environment and shift; Because relate to sealing, sequence of operations such as vacuumize, above-mentioned loading and uninstall process are comparatively time-consuming.And apparatus for processing plasma 2 promptly needs to carry out a loading operation and a unloading operation in half process cycle even shorter time, so above-mentioned comparatively time-consuming loading operation and unloading operation cause the significantly restriction of overall operation speed generation of article on plasma body treatment facility 2 to be difficult in time finish and repeatedly load and unloading operation in a process cycle; Therefore, the production capacity of apparatus for processing plasma 2 is still undesirable.
Therefore, how effectively improving the loading, unloading efficient of transition chamber thereof and then the production capacity of raising apparatus for processing plasma, is the skill problem that those skilled in the art need solve at present.
Summary of the invention
The purpose of this invention is to provide a kind of transition chamber thereof, have higher loading and unloading efficient, and then can effectively improve the production capacity of its applied apparatus for processing plasma.Another object of the present invention provides a kind of gas ions treatment facility that comprises above-mentioned transition chamber thereof.
For solving the problems of the technologies described above, the invention provides a kind of transition chamber thereof, be arranged between the processing chamber and atmospheric environment of apparatus for processing plasma, substrate carrier plate arrogant compression ring border or processing chamber under the drive of support plate conveyer enter this transition chamber thereof; The support plate lowering or hoisting gear is set in the described transition chamber thereof, and this support plate lowering or hoisting gear can the in the vertical direction reciprocating motion; After substrate carrier plate entered described transition chamber thereof, described support plate lowering or hoisting gear made it break away from described support plate conveyer.
Further, described support plate lowering or hoisting gear comprises: connect crossbeam, flatly be arranged in the described transition chamber thereof substantially, and cardinal principle is perpendicular to the direction of transfer of substrate carrier plate; The height of described connection cross bar changes under the effect of driver part; Left branching rod and right pole, cardinal principle are provided with and are fixedly connected on respectively the both ends of described connection crossbeam vertically; Described left branching rod and right pole are positioned at the left and right sides of described support plate conveyer, both spacings greater than substrate carrier plate perpendicular to the width on its direction of transfer; An a left side sheet and a right sheet are horizontally disposed with substantially and are connected with right strut fixation with described left branching rod respectively; The height that sheet and right sheet are propped up in a described left side is identical substantially, bearing of trend is relative, and the spacing of both ends less than substrate carrier plate perpendicular to the width on its direction of transfer.
Further, the both ends of described connection crossbeam are fixedly connected left connecting rod and right connecting rod respectively, and both extend generally along the direction of transfer of substrate carrier plate; Described left branching rod is fixedly connected on the left part of described connection crossbeam by this left side connecting rod, and described right pole is fixedly connected on the right part of described connection crossbeam by this right side connecting rod.
Further, fixedly connected at least two left branching rods of described left connecting rod, fixedly connected at least two the right poles of described right connecting rod.
Further, described support plate conveyer is the transfer roller group, and described left branching rod and right pole are arranged in the gap of each transfer roller.
Further, described left branching rod is connected with a two-layer at least described left side and props up sheet, and described right pole is connected with the described right side of the identical number of plies and props up sheet; Be positioned at that to prop up the height of sheet and right sheet with the left side of one deck identical substantially.
Further, the described left side number of plies of propping up sheet or right sheet is lacked one than the number of reaction chamber in the described apparatus for processing plasma.
Further, described driver part drives described connection crossbeam by the connection column that vertically passes described transition chamber thereof top or bottom substantially; Be provided with dynamic sealing device between the roof of described connection column and described transition chamber thereof or the diapire.
Further, described dynamic sealing device is specially bellows.
The present invention also provides a kind of apparatus for processing plasma, comprises the loading chamber that is used to admit substrate carrier plate, the unloading chamber that is used for outwards transmitting substrate carrier plate, and the reaction chamber between described loading chamber and described unloading chamber; Described loading chamber and described unloading chamber are above-mentioned each described transition chamber thereof.
Technical scheme provided by the present invention has changed that single loads or the number of unloading substrate support plate, and the mode of operation of single being loaded or unloads a substrate carrier plate is improved to the mode of operation that single loaded or unloaded two or polylith substrate carrier plate.Specifically, being provided with in the transition chamber thereof provided by the present invention can the reciprocating support plate lowering or hoisting gear of in the vertical direction, and after substrate carrier plate entered described transition chamber thereof, described support plate lowering or hoisting gear can make it break away from described support plate conveyer; After described substrate carrier plate breaks away from described support plate conveyer, can continue to send at least one substrate carrier plate in described transition chamber thereof by described support plate conveyer, can hold at least two piece substrate carrier plates in the described transition chamber thereof this moment.Like this, at least two substrate carrier plates can be loaded or unload to single operation, thereby significantly promoted the efficient of loading or unloading, and then effectively improved the production capacity of apparatus for processing plasma.
Description of drawings
Fig. 1 is a kind of structural representation of apparatus for processing plasma;
Fig. 2 is the structural representation of another kind of apparatus for processing plasma;
Fig. 3 is the working method schematic diagram of apparatus for processing plasma provided by the present invention;
Fig. 4 looks schematic diagram for the master of a kind of embodiment of transition chamber thereof provided by the present invention;
Fig. 5 is the schematic top plan view of transition chamber thereof shown in Figure 4;
Fig. 6 is the schematic side view of transition chamber thereof shown in Figure 4;
Fig. 7 is that the axle of a kind of embodiment of support plate lowering or hoisting gear provided by the present invention is surveyed schematic diagram;
Fig. 8 is the schematic top plan view that the support plate lowering or hoisting gear is provided shown in Figure 7;
Fig. 9 provides the master of support plate lowering or hoisting gear to look schematic diagram for shown in Figure 4;
Figure 10 is the front elevational schematic of transition chamber thereof shown in Figure 4 under in running order;
Figure 11 is the schematic side view of transition chamber thereof shown in Figure 4 under in running order;
Figure 12 is that the axle of the another kind of embodiment of support plate lowering or hoisting gear provided by the present invention is surveyed schematic diagram.
Embodiment
Core of the present invention provides a kind of transition chamber thereof, has higher loading and unloading efficient, and then can effectively improve the production capacity of its applied apparatus for processing plasma.Another core of the present invention provides a kind of gas ions treatment facility that comprises above-mentioned transition chamber thereof.
In order to make those skilled in the art person understand the present invention program better, the present invention is described in further detail below in conjunction with the drawings and specific embodiments.
Please refer to Fig. 3, Fig. 3 is the working method schematic diagram of apparatus for processing plasma provided by the present invention.
In a kind of embodiment, apparatus for processing plasma 3 provided by the present invention comprises adjacent successively loading chamber 31, preheating chamber 32, first reaction chamber 331, second reaction chamber 332 and unloading chamber 34; Substrate carrier plate 38 passes through above-mentioned each chamber successively under the drive of support plate conveyer, pending substrate 37 is set on the substrate carrier plate 38.The transfer roller group that described support plate conveyer specifically can be made up of a series of transfer roller 35.
Transition chamber thereof generally includes and loads chamber 31 and unloading chamber 34, and both structures are identical substantially; Therefore, this paper is that example describes transition chamber thereof provided by the present invention to load chamber 31 only.
The basic design of technical scheme provided by the present invention is that being provided with can be generally along vertical direction rising and the support plate lowering or hoisting gear 4 (hereinafter having a detailed description) that descends in loading chamber 31; Like this, shown in Fig. 3 hollow core arrow, after first substrate carrier plate 38 enters loading chamber 31, can it vertically be gone up picking-up, so that can in loading chamber 31, send into second even more substrate carrier plate 38 by support plate lowering or hoisting gear 4.Therefore, the efficiency of loading of substrate carrier plate 38 will be significantly improved, thereby effectively improve the production capacity of plasma processing 3.
Please refer to Fig. 4 to Fig. 6, Fig. 4 looks schematic diagram for the master of a kind of embodiment of transition chamber thereof provided by the present invention; Fig. 5 is the schematic top plan view of transition chamber thereof shown in Figure 4; Fig. 6 is the schematic side view of transition chamber thereof shown in Figure 4.
In a kind of embodiment, loading chamber 31 provided by the present invention is cuboid substantially, wherein is provided with the transfer roller group as the support plate conveyer; Described transfer roller group is made up of some transfer rollers 35, and transfer roller 35 can be to traverse the whole roller that loads chamber 31, also can be two short rollers shown in this embodiment.Substrate carrier plate 38 can be sent into or sent loading chamber 31 by the rotation of transfer roller 35.The length and width that loads chamber 31 cross sections obviously is slightly larger than the length and width (with reference to Figure 10, Figure 11) of substrate carrier plate 38 respectively, and the height that loads chamber 31 can suitably strengthen, thereby provides the stroke space for support plate lowering or hoisting gear 4.
Please contrast Fig. 7 to Fig. 9, Fig. 7 is that the axle of a kind of embodiment of support plate lowering or hoisting gear provided by the present invention is surveyed schematic diagram; Fig. 8 is the schematic top plan view that the support plate lowering or hoisting gear is provided shown in Figure 7; Fig. 9 provides the master of support plate lowering or hoisting gear to look schematic diagram for shown in Figure 4.
Support plate lowering or hoisting gear 4 is located at and is loaded in the chamber 31.In a kind of embodiment, support plate lowering or hoisting gear 4 provided by the present invention comprises connection crossbeam 41, connect crossbeam 41 and be horizontally disposed with substantially, and its bearing of trend cardinal principle is perpendicular to the direction of transfer (also promptly connecting crossbeam 41 parallels with transfer roller 35 substantially) of substrate carrier plate 38.
Connect cross bar 41 and be connected with driver part, it highly can change under the effect of above-mentioned driver part; Above-mentioned driver part specifically can be cylinder, motor or other common power-equipments.Can will connect cross bar 41 by the mode of various routines is connected with above-mentioned driver part, such as, can be provided with in the bottom that connects crossbeam 41 and connect column 45, connect column 45 and pass the diapire that loads chamber 31 substantially vertically, be connected with the driver part that is positioned at loading chamber 31 outsides thereby will be positioned at the connection crossbeam 41 that loads chamber 31 inside.
In order to keep sealing, be provided with dynamic sealing device 46 between connection column 45 and loading chamber 31 diapires, air infiltrates from both gaps when moving with respect to loading chamber 31 diapires to avoid connecting column 45.Dynamic sealing device 46 specifically can be a bellows.
It is pointed out that connecting column 45 in theory can also be arranged on the top that connects crossbeam 41, thereby make it pass the roof that loads chamber 31 substantially vertically, at this moment, described driver part is arranged at the top of loading chamber 31.
Please refer to Figure 10, Figure 11, Figure 10 is the front elevational schematic of transition chamber thereof shown in Figure 4 under in running order; Figure 11 is the schematic side view of transition chamber thereof shown in Figure 4 under in running order.
The both ends that connect crossbeam 41 are provided with left branching rod 421 and right pole 422 respectively.Left branching rod 421 and right pole 422 vertically is provided with substantially, and both lay respectively at the left and right sides of described support plate conveyer, and both spacings should be slightly larger than substrate carrier plate 38 perpendicular to the width on the direction of transfer; Enter under the drive of substrate transfer device when loading chamber 31, substrate carrier plate 38 is just between left branching rod 421 and right pole 422.
When being positioned at initial position, the end face of a left side sheet 431 and a right sheet 432 is a little less than the support plate supporting surface of support plate conveyer.After substrate carrier plate 38 enters loading chamber 31, described driver part drives connection column 45 and moves straight up, connect the motion straight up thereupon of crossbeam 41, left branching rod 421 and right pole 422, therefore a left side sheet 431 and a right sheet 432 can hold in the palm from described substrate transfer device vertically with entering the substrate carrier plate 38 that loads chamber 31.So just can send into another substrate carrier plate 38 by described substrate transfer device in loading chamber 31 once more, therefore, above-mentioned two substrate carrier plates 38 will be distributed in vertically and load in the chamber 31.Like this, single operation can be loaded at least two substrate carrier plates 38 in loading chamber 31, thereby has significantly promoted efficiency of loading, and then has effectively improved the production capacity of apparatus for processing plasma 3.
In order to guarantee that substrate carrier plate 38 is held up reliably, can at least two left branching rods 421 be set in the left part that connects crossbeam 41, and at least two right poles 422 be set in the right part that connects crossbeam 41.Like this, the number that a sheet 431 and a right sheet 432 are propped up in an above-mentioned left side significantly increases, and therefore can more reliably substrate carrier plate 38 be held up.
For the ease of a plurality of left branching rods 421 and right pole 422 being set, the both ends fixedly connected left connecting rod 441 of difference and the right connecting rod 442 of crossbeam 41 can connected at connection crossbeam 41 both ends.Left side connecting rod 441 and right connecting rod 442 be level substantially, and can cardinal principle extend upward the sender of substrate carrier plate; Can be on left connecting rod 441 fixedly connected a plurality of left branching rods 421, and can be on right connecting rod 442 fixedly connected a plurality of right poles 422, so left branching rod 421 and right pole 422 can be provided with comparatively easily.
As previously mentioned, described support plate conveyer specifically can be the transfer roller group that comprises a plurality of transfer rollers 35.At this moment, each left branching rod 421 and right pole 422 can be arranged in the gap of each transfer roller 35, and needn't strictly be positioned at the left and right sides of described transfer roller group, thereby have saved the space of loading chamber.
Refer again to Figure 12, Figure 12 is that the axle of the another kind of embodiment of support plate lowering or hoisting gear provided by the present invention is surveyed schematic diagram.
In another kind of embodiment, support plate lowering or hoisting gear 4 provided by the present invention can hold up two layers of substrate support plate 38 at least on described support plate conveyer.
Specifically, in this embodiment, arbitrary left branching rod 421 includes a two-layer at least left side and props up sheet 431, and arbitrary right pole 422 includes the right side with identical number of plies and props up sheet 432, and is positioned at that to prop up the height of sheet 431 and right sheet 432 with the left side of one deck identical substantially.
Propping up sheet 431 and a right sheet 432 with a left side, all to have two-layer situation be example, and the height that is positioned at each left side sheet 431 on upper strata and a right sheet 432 is identical substantially, and also cardinal principle is identical to be positioned at each left side sheet 431 of lower floor and the right height that props up sheet 432; Therefore, after a left side that is positioned at the upper strata is propped up sheet 431 and a right sheet 432 and will at first be entered the substrate carrier plate 38 that loads chamber 31 and hold up, can in loading chamber 31, send into second substrate carrier plate 38, then can prop up sheet 431 and above-mentioned second substrate carrier plate 38 be held up, thereby can in loading chamber 31, send into the 3rd substrate carrier plate 38 with a right sheet 432 by a left side that is positioned at lower floor.Like this, the efficiency of loading of substrate carrier plate 38 is higher.
Along with the increase of the sheet 431 and right sheet 432 number of plies is propped up on a left side, the single loading operation the number of the substrate carrier plate 38 that can load will further increase, the efficiency of loading of substrate carrier plate 38 also will further improve.
Can determine a left side sheet 431 and right sheet 432 number of plies according to the number of reaction chamber in the apparatus for processing plasma 3; A left side sheet 431 and right sheet 432 number of plies can be lacked one than the number of above-mentioned reaction chamber.Like this, can in each reaction chamber, send into a substrate carrier plate just after loading finishes.
More than describe the structure of loading chamber 31 in detail, because the basic structure of unloading chamber 34 is identical substantially with loading chamber 31, so this paper repeats no more.Transition chamber thereof provided by the present invention can be used as above-mentioned loading chamber 31 and unloading chamber 34.
The overall structure of plasma processing 3 provided by the present invention comprises adjacent successively loading chamber 31, preheating chamber 32, first reaction chamber 331, second reaction chamber 332 and unloading chamber 34 as shown in Figure 3; Described loading chamber 31 and unloading chamber 34 are transition chamber thereof provided by the present invention.Other structures of plasma processing 3 can be with reference to prior art, and this paper no longer launches explanation.
More than apparatus for processing plasma provided by the present invention and transition chamber thereof thereof are described in detail.Used specific case herein principle of the present invention and execution mode are set forth, the explanation of above embodiment just is used for helping to understand method of the present invention and core concept thereof.Should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention, can also carry out some improvement and modification to the present invention, these improvement and modification also fall in the protection range of claim of the present invention.
Claims (10)
1, a kind of transition chamber thereof is arranged between the processing chamber and atmospheric environment of apparatus for processing plasma, and substrate carrier plate arrogant compression ring border or processing chamber under the drive of support plate conveyer enter this transition chamber thereof; It is characterized in that, the support plate lowering or hoisting gear is set in the described transition chamber thereof, this support plate lowering or hoisting gear can the in the vertical direction reciprocating motion; After substrate carrier plate entered described transition chamber thereof, described support plate lowering or hoisting gear can make it break away from described support plate conveyer.
2, transition chamber thereof as claimed in claim 1 is characterized in that, described support plate lowering or hoisting gear comprises:
Connect crossbeam, flatly be arranged in the described transition chamber thereof substantially, and cardinal principle is perpendicular to the direction of transfer of substrate carrier plate; The height of described connection cross bar changes under the effect of driver part;
Left branching rod and right pole, cardinal principle are provided with and are fixedly connected on respectively the both ends of described connection crossbeam vertically; Described left branching rod and right pole are positioned at the left and right sides of described support plate conveyer, both spacings greater than substrate carrier plate perpendicular to the width on its direction of transfer;
An a left side sheet and a right sheet are horizontally disposed with substantially and are connected with right strut fixation with described left branching rod respectively; The height that sheet and right sheet are propped up in a described left side is identical substantially, bearing of trend is relative, and the spacing of both ends less than substrate carrier plate perpendicular to the width on its direction of transfer.
3, transition chamber thereof as claimed in claim 2 is characterized in that, the both ends of described connection crossbeam are fixedly connected left connecting rod and right connecting rod respectively, and both extend generally along the direction of transfer of substrate carrier plate; Described left branching rod is fixedly connected on the left part of described connection crossbeam by this left side connecting rod, and described right pole is fixedly connected on the right part of described connection crossbeam by this right side connecting rod.
4, transition chamber thereof as claimed in claim 3 is characterized in that, fixedly connected at least two left branching rods of described left connecting rod, fixedly connected at least two the right poles of described right connecting rod.
5, transition chamber thereof as claimed in claim 3 is characterized in that, described support plate conveyer is the transfer roller group, and described left branching rod and right pole are arranged in the gap of each transfer roller.
6, transition chamber thereof as claimed in claim 4 is characterized in that, described left branching rod is connected with a two-layer at least described left side and props up sheet, and described right pole is connected with the described right side of the identical number of plies and props up sheet; Be positioned at that to prop up the height of sheet and right sheet with the left side of one deck identical substantially.
7, transition chamber thereof as claimed in claim 6 is characterized in that, the number of plies that a sheet or a right sheet are propped up in a described left side is lacked one than the number of reaction chamber in the described apparatus for processing plasma.
8, transition chamber thereof as claimed in claim 2 is characterized in that, described driver part drives described connection crossbeam by the connection column that vertically passes described transition chamber thereof top or bottom substantially; Be provided with dynamic sealing device between the roof of described connection column and described transition chamber thereof or the diapire.
9, transition chamber thereof as claimed in claim 8 is characterized in that, described dynamic sealing device is specially bellows.
10, a kind of apparatus for processing plasma comprises the loading chamber that is used to admit substrate carrier plate, the unloading chamber that is used for outwards transmitting substrate carrier plate, and the reaction chamber between described loading chamber and described unloading chamber; It is characterized in that described loading chamber and described unloading chamber are as each described transition chamber thereof of claim 1 to 9.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101170095A CN101330032B (en) | 2008-07-22 | 2008-07-22 | Plasma processing apparatus and transition chamber thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2008101170095A CN101330032B (en) | 2008-07-22 | 2008-07-22 | Plasma processing apparatus and transition chamber thereof |
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| CN101330032A true CN101330032A (en) | 2008-12-24 |
| CN101330032B CN101330032B (en) | 2012-01-11 |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101893879A (en) * | 2010-06-01 | 2010-11-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Method and system for carrier plate transmission control of plasma chemical vapor deposition equipment |
| CN102719807A (en) * | 2011-03-30 | 2012-10-10 | 北京北方微电子基地设备工艺研究中心有限责任公司 | An electrostatic-adsorbing support plate, an apparatus and a technology for producing film |
| CN101928930B (en) * | 2009-06-18 | 2012-10-10 | 鸿富锦精密工业（深圳）有限公司 | Vacuum coating machine |
| CN103569629A (en) * | 2012-07-26 | 2014-02-12 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Magazine replacing device, insert machine and semiconductor device |
| CN106356317A (en) * | 2015-07-15 | 2017-01-25 | 英属开曼群岛商精曜有限公司 | Picking and placing cavity |
| CN108063107A (en) * | 2018-01-19 | 2018-05-22 | 常州比太黑硅科技有限公司 | A kind of high yield energy chain type transmission vacuum etching and filming equipment |
| CN109478527A (en) * | 2016-07-22 | 2019-03-15 | 东京毅力科创株式会社 | Substrate processing equipment |
| CN110158058A (en) * | 2018-02-16 | 2019-08-23 | 等离子体成膜有限公司 | Plasma processing apparatus |
| CN111477582A (en) * | 2020-05-28 | 2020-07-31 | 深圳市捷佳伟创新能源装备股份有限公司 | Silicon wafer process cavity, silicon wafer processing equipment and silicon wafer processing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101928930B (en) * | 2009-06-18 | 2012-10-10 | 鸿富锦精密工业（深圳）有限公司 | Vacuum coating machine |
| CN101893879B (en) * | 2010-06-01 | 2012-08-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Method and system for carrier plate transmission control of plasma chemical vapor deposition equipment |
| CN101893879A (en) * | 2010-06-01 | 2010-11-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Method and system for carrier plate transmission control of plasma chemical vapor deposition equipment |
| CN102719807B (en) * | 2011-03-30 | 2014-08-27 | 北京北方微电子基地设备工艺研究中心有限责任公司 | An electrostatic-adsorbing support plate, an apparatus and a technology for producing film |
| CN102719807A (en) * | 2011-03-30 | 2012-10-10 | 北京北方微电子基地设备工艺研究中心有限责任公司 | An electrostatic-adsorbing support plate, an apparatus and a technology for producing film |
| CN103569629B (en) * | 2012-07-26 | 2015-12-16 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Magazine is changing device, plug-in sheet machine and semiconductor equipment more |
| CN103569629A (en) * | 2012-07-26 | 2014-02-12 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Magazine replacing device, insert machine and semiconductor device |
| CN106356317A (en) * | 2015-07-15 | 2017-01-25 | 英属开曼群岛商精曜有限公司 | Picking and placing cavity |
| CN109478527A (en) * | 2016-07-22 | 2019-03-15 | 东京毅力科创株式会社 | Substrate processing equipment |
| CN109478527B (en) * | 2016-07-22 | 2023-03-28 | 东京毅力科创株式会社 | Substrate processing apparatus |
| CN108063107A (en) * | 2018-01-19 | 2018-05-22 | 常州比太黑硅科技有限公司 | A kind of high yield energy chain type transmission vacuum etching and filming equipment |
| CN110158058A (en) * | 2018-02-16 | 2019-08-23 | 等离子体成膜有限公司 | Plasma processing apparatus |
| CN111477582A (en) * | 2020-05-28 | 2020-07-31 | 深圳市捷佳伟创新能源装备股份有限公司 | Silicon wafer process cavity, silicon wafer processing equipment and silicon wafer processing method |
| CN112626485A (en) * | 2020-12-31 | 2021-04-09 | 广东谛思纳为新材料科技有限公司 | PVD (physical vapor deposition) continuous coating equipment and coating method |
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| CN101330032B (en) | 2012-01-11 |
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Address after: No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone, 100176 Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100016 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |