CN101183220A - 药液供给装置 - Google Patents
药液供给装置 Download PDFInfo
- Publication number
- CN101183220A CN101183220A CNA2007101541404A CN200710154140A CN101183220A CN 101183220 A CN101183220 A CN 101183220A CN A2007101541404 A CNA2007101541404 A CN A2007101541404A CN 200710154140 A CN200710154140 A CN 200710154140A CN 101183220 A CN101183220 A CN 101183220A
- Authority
- CN
- China
- Prior art keywords
- soup
- storage tank
- nozzle
- chemical storage
- medical liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1026—Valves
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Devices For Dispensing Beverages (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2006-0114060 | 2006-11-17 | ||
KR1020060114060A KR100820362B1 (ko) | 2006-11-17 | 2006-11-17 | 약액 공급장치 |
KR1020060114060 | 2006-11-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101183220A true CN101183220A (zh) | 2008-05-21 |
CN101183220B CN101183220B (zh) | 2011-01-26 |
Family
ID=39448538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101541404A Active CN101183220B (zh) | 2006-11-17 | 2007-09-19 | 药液供给装置 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100820362B1 (zh) |
CN (1) | CN101183220B (zh) |
TW (1) | TWI367398B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112839442A (zh) * | 2019-11-25 | 2021-05-25 | 黄信航 | 水平式湿制程设备的药液供给系统 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101092067B1 (ko) * | 2009-12-04 | 2011-12-12 | 주식회사 디엠에스 | 인라인 방식의 태양전지 제조용 씨비디(cbd) 장치 |
KR20130066810A (ko) * | 2011-12-13 | 2013-06-21 | 엘지디스플레이 주식회사 | 약액 공급장치 |
CN109252935B (zh) * | 2018-11-23 | 2023-11-07 | 佛山职业技术学院 | 一种汽车排气管防进水装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050049907A (ko) * | 2003-11-24 | 2005-05-27 | 세메스 주식회사 | 평판표시소자 제조를 위한 기판 상에 포토레지스트를도포하는 방법 |
JP4490797B2 (ja) * | 2004-01-23 | 2010-06-30 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4554303B2 (ja) | 2004-09-03 | 2010-09-29 | 東京エレクトロン株式会社 | 塗布装置及び塗布方法 |
KR20060075548A (ko) * | 2004-12-28 | 2006-07-04 | 동부일렉트로닉스 주식회사 | 반도체 장치 제조용 현상 장치의 현상액 노즐 레벨 제어시스템 |
-
2006
- 2006-11-17 KR KR1020060114060A patent/KR100820362B1/ko active IP Right Grant
-
2007
- 2007-09-19 CN CN2007101541404A patent/CN101183220B/zh active Active
- 2007-09-19 TW TW096134845A patent/TWI367398B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112839442A (zh) * | 2019-11-25 | 2021-05-25 | 黄信航 | 水平式湿制程设备的药液供给系统 |
Also Published As
Publication number | Publication date |
---|---|
CN101183220B (zh) | 2011-01-26 |
TW200823602A (en) | 2008-06-01 |
KR100820362B1 (ko) | 2008-04-08 |
TWI367398B (en) | 2012-07-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEI SHIGUANG MECHANICAL AND ELECTRONIC Effective date: 20140303 |
|
TR01 | Transfer of patent right |
Effective date of registration: 20140303 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
|
TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. Patentee after: DMS Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: DMS Co.,Ltd. Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. |
|
CP03 | Change of name, title or address |