CN109536916A - A kind of vacuum atmosphere quenching CVD system and its working method that can be freely lifted - Google Patents
A kind of vacuum atmosphere quenching CVD system and its working method that can be freely lifted Download PDFInfo
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- CN109536916A CN109536916A CN201811611380.7A CN201811611380A CN109536916A CN 109536916 A CN109536916 A CN 109536916A CN 201811611380 A CN201811611380 A CN 201811611380A CN 109536916 A CN109536916 A CN 109536916A
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- quenching
- air inlet
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/34—Methods of heating
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/62—Quenching devices
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
- C21D1/773—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/0062—Heat-treating apparatus with a cooling or quenching zone
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The present invention discloses a kind of vacuum atmosphere quenching CVD system and its working method that can be freely lifted, the system includes installation shell, lifting regulating mechanism, heating mechanism, quenching deposit mechanism, heating mechanism, quenching deposit mechanism are set at the inner wall of installation shell, and lifting regulating mechanism includes lifting saddle, lifting regulator, self-raising platform, elevating lever；Heating mechanism includes heater, convection preventing plug, quartz chamber body；Quenching deposit mechanism includes air inlet cavity, air intake valve, air inlet, and the top of air inlet cavity is tightly connected by flange and heater.Device can be moved to the growth that another temperature region realizes different films in the case where not destroying cavity environment by the system, and quenching unit and the preparation of CVD composite membrane are effectively combined together.The system structure is simple, easy to operate, and CVD film growth can be realized the case where not needing cooling phase transformation, improve device quality while reducing the process time.
Description
Technical field
The present invention relates to metal composite nano material installation fields, and in particular to the vacuum atmosphere that one kind can be freely lifted
Quench CVD system and its working method.
Background technique
Report at this stage about metal composite nano material preparation process is less, however as nano material technology high speed
Development, metal nanometer composite material are more and more widely used due to the good characteristic property having.Current preparation
Technique is all that metal material has been handled in metal glowing furnace, takes out after cooling, places into CVD equipment and inside and outside prolong and nanometer material
Expect compound.
Wherein, CVD refers to high temperature vapor deposition, the gaseous reactant or liquid reactants for containing composition film element
Other gases needed for steam and reaction introduce reaction chamber, and the process of chemical reaction generation film occurs in substrate surface.It is handling
In the process, the metal material metallographic for quenching completion first is fixed, and not can guarantee surface clean level after taking out, and is deposited after adhering to again
The problems such as inter-molecular binding force is weak, the coefficient of expansion, determining can fall off or separate after being used for multiple times, and surface is not clean and produces
Raw impurity, influences quality of materials, so that the metallic composite of high quality can not be prepared.
Summary of the invention
In order to overcome above-mentioned technical problem, the purpose of the present invention is to provide the vacuum atmospheres that one kind can be freely lifted
CVD system and its working method are quenched, the system structure is simple, easy to operate, and effective solution metal is the same as position composite membrane system
The problem of standby process；CVD film growth can be realized in the system the case where not needing cooling phase transformation, when reducing technique
Between while improve device quality, device can be moved to another temperature region in the case where not destroying cavity environment
The growth for realizing different films is effectively combined together quenching unit and the preparation of CVD composite membrane.
The purpose of the present invention can be achieved through the following technical solutions:
The present invention provides the vacuum atmospheres that one kind can be freely lifted to quench CVD system, including installation shell, rising-falling tone
Mechanism, heating mechanism, quenching deposit mechanism are saved, heating mechanism, quenching deposit mechanism are set at the inner wall of installation shell, the liter
Dropping regulating mechanism includes lifting saddle, lifting regulator, self-raising platform, elevating lever, and self-raising platform in a rectangular parallelepiped shape, is gone up and down
Adjuster and elevating lever are coaxially disposed, and one end of elevating lever is fixedly connected with lifting saddle, and the other end is fixed with self-raising platform
Connection；
The heating mechanism includes heater, convection preventing plug, quartz chamber body, and heater has a cylindrical hollow cavity,
The top of quartz chamber body and heater cylindrical hollow cavity is tightly connected, and convection preventing plug is set in cylindrical hollow cavity and it is pushed up
Portion and the bottom of quartz chamber body connect；
Quenching deposit mechanism includes air inlet cavity, air intake valve, air inlet, the top of air inlet cavity by flange with
Heater is tightly connected, and air intake valve and air inlet are respectively arranged on the outer wall of air inlet cavity and connect with the intracorporal cavity of inlet chamber
It is logical；
The installation shell includes a housing main body being vertically arranged and a support base, and the inner wall of housing main body, which is equipped with, to be risen
Sliding rail drops, and the wall portion of self-raising platform width direction side is slidably connected with lifting sliding rail, and support base is set to shell master
The bottom of the bottom of body, support base is equipped with support leg；The side wall of the housing main body is equipped with master controller and Gas controller.
As a further solution of the present invention, the top of the quartz chamber body is equipped with exhaust outlet.
As a further solution of the present invention, the bottom of the air inlet cavity is coaxially arranged with sealing flange.
As a further solution of the present invention, the air inlet cavity is externally connected to pressure sensor.
The present invention also provides the working methods for the vacuum atmosphere quenching CVD system that one kind can be freely lifted, including with
Lower step:
1) first samples devices 1Cr to be processed17Ni2Stainless steel is put into the upper surface of lifting saddle, and then starting is automatic
Samples devices are risen to air inlet cavity position, are then vacuumized by exhaust outlet by lifting platform, and main controller controls heater adds
Heat arrives 950-1050 DEG C, realizes quenching technical；
2) when reaching quenching technical effect, air intake valve is passed through SiH4、H2、N2Three kinds of gas sources, gas source after cracking by sinking
Product is in sample surface, and since metal material is in high-end trim, inter-molecular binding force is strong；
3) if desired another redeposited film, closing air intake valve cut off SiH4Sample is risen to heater by gas source
In cavity, air inlet is opened, another gas source CH is passed through4Cracking is deposited on sample, realizes a variety of composite membranes.
Beneficial effects of the present invention:
1, vacuum atmosphere of the invention quenches CVD system, and structure is simple, easy to operate, and effective solution metal is multiple with position
Close film preparation；CVD film growth is realized in the case where not needing cooling phase transformation, improves device matter while reducing the process time
Device, the life that another temperature region realizes different films can be moved in the case where not destroying cavity environment by amount
It is long, quenching unit and the preparation of CVD composite membrane are effectively combined together.
2, in lifting regulating mechanism, by self-raising platform sliding up and down on lifting sliding rail, cooperate lifting regulator
Moving up and down for elevating lever is driven, the lifting of lifting saddle can be freely adjusted, so that being placed on the sample device on lifting saddle
Part can be realized in oscilaltion in the cavity of air inlet cavity and heater and realize difference in heater body different heating region
Film laminated.
3, it quenches in deposition mechanism, the top of air inlet cavity and heater are tightly connected, and bottom is coaxially arranged with Sealing Method
Orchid has ensured the leakproofness during metal material heating quenching, Film laminated, while the pressure of pressure sensor being cooperated to supervise
Survey and the exhaust of exhaust outlet, the different gas sources that air intake valve is passed through from air inlet have ensured quenching, have heated in recombination process
Safety.
Detailed description of the invention
The present invention will be further described below with reference to the drawings.
Fig. 1 is the left view for the vacuum atmosphere quenching CVD system that the present invention can be freely lifted, and wherein dotted line indicates lifting
The motion profile of saddle and elevating lever.
Fig. 2 is the front view for the vacuum atmosphere quenching CVD system that the present invention can be freely lifted.
In figure: 1, air intake valve；2, pressure sensor；3, exhaust outlet；4, quartz chamber body；5, convection preventing plug；6, heater；
7, air inlet；8, sealing flange；9, saddle is gone up and down；10, lifting regulator；11, self-raising platform；12, master controller；13, gas
Body master controller；14, shell is installed；141, housing main body；142, support base；15, support leg；16, elevating lever；17, it goes up and down
Sliding rail；18, air inlet cavity.
Specific embodiment
Below in conjunction with the embodiment of the present invention, technical scheme in the embodiment of the invention is clearly and completely described,
Obviously, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based in the present invention
Embodiment, all other embodiment obtained by those of ordinary skill in the art without making creative efforts, all
Belong to the scope of protection of the invention.
Refering to fig. 1 shown in -2, a kind of vacuum atmosphere quenching CVD system that can be freely lifted, packet are present embodiments provided
Installation shell 14, lifting regulating mechanism, heating mechanism, quenching deposit mechanism are included, heating mechanism, quenching deposit mechanism are set to installation
At the inner wall of shell 14, installation shell 14 includes a housing main body 141 being vertically arranged and a support base 142, support base
142 are set to the bottom of housing main body 141, and the bottom of support base 142 is equipped with support leg 15, and the side wall of housing main body 141 is equipped with
The inner wall of master controller 12 and Gas controller 13, housing main body 141 is equipped with lifting sliding rail 17.Wherein, master controller 12 uses
The embedded integrated touch screen of model TPC7062TX, Gas controller 13 use the integrated quality of model GMF-3Z
Flowmeter.
Lifting regulating mechanism includes lifting saddle 9, lifting regulator 10, self-raising platform 11, elevating lever 16, automatic lifting
In a rectangular parallelepiped shape, wall portion and the lifting sliding rail 17 of width direction side are slidably connected platform 11, lifting regulator 10 and elevating lever
One end of 16 coaxial arrangements, elevating lever 16 is fixedly connected with lifting saddle 9, and the other end is fixedly connected with self-raising platform 11.It is logical
The sliding up and down on lifting sliding rail 17 of self-raising platform 11 is crossed, is moved down on the cooperation drive elevating lever 16 of lifting regulator 10
It is dynamic, it can freely adjust the lifting of lifting saddle 9.
Heating mechanism includes heater 6, convection preventing plug 5, quartz chamber body 4, and heater 6 has a cylindrical hollow cavity,
The top of quartz chamber body 4 and 6 cylindrical hollow cavity of heater is tightly connected, convection preventing plug 5 be set in cylindrical hollow cavity and
Its top is connect with the bottom of quartz chamber body 4, and the top of the quartz chamber body 4 is equipped with exhaust outlet 3.Wherein, the inside of heater 6
Burner hearth is from top to bottom equipped with lattice gear, and the burner hearth of heater is divided into different temperature regions.
Quenching deposit mechanism includes air inlet cavity 18, air intake valve 1, air inlet 7, and the top of air inlet cavity 18 passes through flange
It is tightly connected with heater 6, the bottom of air inlet cavity 18 is coaxially arranged with sealing flange 8, and air intake valve 1 and air inlet 7 are distinguished
Set on air inlet cavity 18 outer wall and be connected to the cavity in air inlet cavity 18.Go up and down saddle 9 can air inlet cavity 18 and plus
Oscilaltion in the cavity of hot device 6, air inlet cavity 18 are externally connected to pressure sensor 2.
The working method that the vacuum atmosphere quenches CVD system is as follows:
1) first samples devices 1Cr to be processed17Ni2Stainless steel is put into the upper surface of lifting saddle 9, and then starting is automatic
Samples devices are risen to 18 position of air inlet cavity by lifting platform 11, are then vacuumized by exhaust outlet 3, and master controller 12 controls
Heater 6 is heated to 950-1050 DEG C, realizes quenching technical；
2) when reaching quenching technical effect, air intake valve 1 is passed through SiH4、H2、N2Three kinds of gas sources, after gas source is by cracking
It is deposited on sample surface, since metal material is in high-end trim, inter-molecular binding force is strong；
3) if desired another redeposited film, closing air intake valve 1 cut off SiH4Sample is risen to heating by gas source
In 6 cavity of device, air inlet 7 is opened, another gas source CH is passed through4Cracking is deposited on sample, realizes a variety of composite membranes.
System control is simple, and easy to operate, effective solution metal reduces the same of process time with the compound film preparation in position
When improve device quality, by quenching unit and CVD composite membrane preparation be effectively combined together.
In the description of this specification, the description of reference term " one embodiment ", " example ", " specific example " etc. means
Particular features, structures, materials, or characteristics described in conjunction with this embodiment or example are contained at least one implementation of the invention
In example or example.In the present specification, schematic expression of the above terms may not refer to the same embodiment or example.
Moreover, particular features, structures, materials, or characteristics described can be in any one or more of the embodiments or examples to close
Suitable mode combines.
Above content is only citing made for the present invention and explanation, affiliated those skilled in the art are to being retouched
The specific embodiment stated does various modifications or additions or is substituted in a similar manner, and without departing from invention or surpasses
More range defined in the claims, is within the scope of protection of the invention.
Claims (5)
1. the vacuum atmosphere that one kind can be freely lifted quenches CVD system, including installs shell (14), lifting regulating mechanism, adds
Heat engine structure, quenching deposit mechanism, heating mechanism, quenching deposit mechanism are set at the inner wall of installation shell (14), which is characterized in that
The lifting regulating mechanism includes lifting saddle (9), lifting regulator (10), self-raising platform (11), elevating lever (16), automatically
In a rectangular parallelepiped shape, lifting regulator (10) and elevating lever (16) are coaxially disposed lifting platform (11), one end of elevating lever (16) and liter
Drop saddle (9) is fixedly connected, and the other end is fixedly connected with self-raising platform (11)；
The heating mechanism includes heater (6), convection preventing plug (5), quartz chamber body (4), and heater (6) has in a cylinder
The top of cavity body, quartz chamber body (4) and heater (6) cylindrical hollow cavity is tightly connected, and convection preventing plug (5) is set to cylinder
In hollow cavity and its top is connect with the bottom of quartz chamber body (4)；
Quenching deposit mechanism includes air inlet cavity (18), air intake valve (1), air inlet (7), the top of air inlet cavity (18)
It is tightly connected by flange and heater (6), air intake valve (1) is respectively arranged on the outer wall of air inlet cavity (18) with air inlet (7)
And it is connected to the cavity in air inlet cavity (18)；
Installation shell (14) includes a housing main body (141) being vertically arranged and a support base (142), housing main body
(141) inner wall is equipped with lifting sliding rail (17), the wall portion and lifting sliding rail of self-raising platform (11) the width direction side
(17) it is slidably connected, support base (142) is set to the bottom of housing main body (141), and the bottom of support base (142) is equipped with support
Foot (15)；The side wall of the housing main body (141) is equipped with master controller (12) and Gas controller (13).
2. the vacuum atmosphere quenching CVD system according to claim 1 that can be freely lifted, which is characterized in that the institute
The top for stating quartz chamber body (4) is equipped with exhaust outlet (3).
3. it is according to claim 1 can be freely lifted vacuum atmosphere quenching CVD system, which is characterized in that it is described into
The bottom of air cavity (18) is coaxially arranged with sealing flange (8).
4. it is according to claim 1 can be freely lifted vacuum atmosphere quenching CVD system, which is characterized in that it is described into
Air cavity (18) is externally connected to pressure sensor (2).
5. the working method for the vacuum atmosphere quenching CVD system that one kind can be freely lifted, which is characterized in that including following step
It is rapid:
1) first samples devices 1Cr to be processed17Ni2Stainless steel is put into the upper surface of lifting saddle (9), and then starting is automatic rises
It drops platform (11), samples devices is risen into air inlet cavity (18) position, then vacuumized by exhaust outlet (3), master controller
(12) control heater (6) is heated to 950-1050 DEG C, realizes quenching technical；
2) when reaching quenching technical effect, air intake valve (1) is passed through SiH4、H2、N2Three kinds of gas sources, gas source after cracking by sinking
Product is in sample surface；
3) if desired SiH is cut off in another redeposited film, closing air intake valve (1)4Sample is risen to heater by gas source
(6) it in cavity, opens air inlet (7), is passed through another gas source CH4Cracking is deposited on sample, realizes a variety of composite membranes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811611380.7A CN109536916A (en) | 2018-12-27 | 2018-12-27 | A kind of vacuum atmosphere quenching CVD system and its working method that can be freely lifted |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811611380.7A CN109536916A (en) | 2018-12-27 | 2018-12-27 | A kind of vacuum atmosphere quenching CVD system and its working method that can be freely lifted |
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| Publication Number | Publication Date |
|---|---|
| CN109536916A true CN109536916A (en) | 2019-03-29 |
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| CN201811611380.7A Pending CN109536916A (en) | 2018-12-27 | 2018-12-27 | A kind of vacuum atmosphere quenching CVD system and its working method that can be freely lifted |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1865497A (en) * | 2006-06-10 | 2006-11-22 | 中国科学技术大学 | Method for continuous chemical vapor deposition and device thereof |
| CN201212049Y (en) * | 2008-01-31 | 2009-03-25 | 秦文隆 | Automatic heating quenching vacuum atmosphere oven |
| CN102121098A (en) * | 2010-01-08 | 2011-07-13 | 复旦大学 | Reaction chamber with external heating mode for metal organic chemical vapor deposition system |
| WO2012035900A1 (en) * | 2010-09-14 | 2012-03-22 | 日本パーカライジング株式会社 | Iron steel member having nitrogen compound layer, and process for production thereof |
| CN108166064A (en) * | 2018-01-04 | 2018-06-15 | 福建农林大学 | A kind of element ambient anneal stove |
-
2018
- 2018-12-27 CN CN201811611380.7A patent/CN109536916A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1865497A (en) * | 2006-06-10 | 2006-11-22 | 中国科学技术大学 | Method for continuous chemical vapor deposition and device thereof |
| CN201212049Y (en) * | 2008-01-31 | 2009-03-25 | 秦文隆 | Automatic heating quenching vacuum atmosphere oven |
| CN102121098A (en) * | 2010-01-08 | 2011-07-13 | 复旦大学 | Reaction chamber with external heating mode for metal organic chemical vapor deposition system |
| WO2012035900A1 (en) * | 2010-09-14 | 2012-03-22 | 日本パーカライジング株式会社 | Iron steel member having nitrogen compound layer, and process for production thereof |
| CN108166064A (en) * | 2018-01-04 | 2018-06-15 | 福建农林大学 | A kind of element ambient anneal stove |
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Effective date of registration: 20230116 Address after: 230000 China (Anhui) Pilot Free Trade Zone, Hefei, Anhui Province D7-308, Phase I, Innovation Industrial Park Road, No. 800, Wangjiang West Road, High-tech Zone, Hefei Applicant after: ANHUI BEQ EQUIPMENT TECHNOLOGY CO.,LTD. Address before: 238000 northwest corner of the intersection of Heping Avenue and Xiuhu Road, Chaohu Economic Development Zone, Hefei City, Anhui Province Applicant before: HEFEI BAISI NEW MATERIALS RESEARCH INSTITUTE Co.,Ltd. |