CN107219730B - Mask plate loading system and exposure machine - Google Patents
Mask plate loading system and exposure machine Download PDFInfo
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- CN107219730B CN107219730B CN201710637931.6A CN201710637931A CN107219730B CN 107219730 B CN107219730 B CN 107219730B CN 201710637931 A CN201710637931 A CN 201710637931A CN 107219730 B CN107219730 B CN 107219730B
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- mask plate
- supporting table
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- loading unit
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- 238000005286 illumination Methods 0.000 claims abstract description 11
- 238000001179 sorption measurement Methods 0.000 claims description 35
- 239000000758 substrate Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The embodiment of the invention provides a mask plate loading system and an exposure machine, relates to the technical field of display devices, and aims to reduce the time for replacing a mask plate and improve the efficiency for replacing the mask plate. The mask loading system includes: the device comprises a working area and at least one standby area, wherein the working area is provided with a first supporting platform, and the standby area is provided with a second supporting platform; the first supporting table and the second supporting table are used for placing a mask plate; the conveying unit is used for driving the first supporting table and the second supporting table to move simultaneously so that the first supporting table moves out of the working area and the second supporting table moves into the working area; and a first loading unit is arranged above the working area and used for loading the mask plate of the working area to an illumination area of the exposure machine. The mask plate loading device is used for loading the mask plate.
Description
Technical Field
The invention relates to the technical field of display devices, in particular to a mask plate loading system and an exposure machine.
Background
A Mask (Mask), also called a photomask or reticle, is an indispensable component in the photolithography process. In the production process of a thin film transistor-liquid crystal display (TFT-LCD), exposure equipment needs to carry a mask plate, and regularly shields light to retain the photoresist in an effective exposure area, so that a specific pattern is formed on the surface of a glass substrate. In the prior art, different products generally need different masks, so the masks need to be replaced when different products are produced, and when the masks are replaced, the masks which are used up in a working area are firstly moved out of the working area by a mechanical arm, then the masks to be replaced in a mask stacking chamber are moved into the working area, and the process needs a long time, so that the efficiency of replacing the masks is poor.
Disclosure of Invention
The embodiment of the invention provides a mask plate loading system and an exposure machine, which can reduce the time for replacing a mask plate and improve the efficiency for replacing the mask plate.
In order to achieve the above purpose, the embodiment of the invention adopts the following technical scheme:
in one aspect, an embodiment of the present invention provides a mask loading system, including: the device comprises a working area and at least one standby area, wherein the working area is provided with a first supporting platform, and the standby area is provided with a second supporting platform; the first supporting table and the second supporting table are used for placing a mask plate;
the conveying unit is used for driving the first supporting table and the second supporting table to move simultaneously so that the first supporting table moves out of the working area and the second supporting table moves into the working area;
and a first loading unit is arranged above the working area and used for loading the mask plate of the working area to an illumination area of the exposure machine.
Optionally, the transfer unit comprises a first guide rail and a first drive;
the first supporting table and the second supporting table are both arranged on the first guide rail and are in sliding connection with the first guide rail;
the first driving member can drive the first supporting table and the second supporting table to simultaneously move along the first guide rail.
Optionally, a connection unit is arranged between the first supporting table and the second supporting table, and the connection unit is used for connecting the first supporting table and the second supporting table, so that a preset distance is kept between the first supporting table and the second supporting table.
Optionally, the connecting unit comprises an elastic part and a limiting cylinder; two ends of the elastic piece are respectively connected to two opposite side walls of the first supporting table and the second supporting table; one end of the limiting cylinder is connected with one of the two side walls, and the other end of the limiting cylinder is abutted against the other side wall of the two side walls.
Optionally, the first supporting platform and the second supporting platform are all provided with four positioning supporting platforms, four positioning supporting platforms are respectively distributed at four corners of the first supporting platform or the second supporting platform, and four positioning supporting platforms can support the mask plate, so that the pattern surface of the mask plate is suspended and can block the mask plate, and the mask plate is opposite to the first supporting platform or the second supporting platform.
Optionally, the first loading unit includes a first grabbing module, a first pre-aligning module and a first adsorption module;
the first grabbing module is used for grabbing the mask plate from the first supporting table and moving the mask plate to the lower surface of the first adsorption module;
the first pre-alignment module is used for adjusting the mask plate grabbed by the first grabbing unit to a first preset position;
the first adsorption module is used for adsorbing the mask plate at the first preset position on the lower surface of the mask plate.
Optionally, a second loading unit is disposed above the standby area, and the second loading unit includes a second grabbing module, a second pre-alignment module, and a second adsorption module;
the second grabbing module is used for grabbing the mask plate from the second supporting table and moving the mask plate to the lower surface of the second adsorption module;
the second pre-alignment module is used for adjusting the mask plate grabbed by the second grabbing unit to a second preset position;
the second adsorption module is used for adsorbing the mask plate at the second preset position on the lower surface of the second adsorption module.
Optionally, the first adsorption module and the second adsorption module are communicated through a vacuum gas pipeline.
Optionally, the device further comprises a second guide rail and a second driving element;
the side wall of the first loading unit and the side wall of the second loading unit are both connected to the second guide rail in a sliding manner;
the second driving piece drives the first loading unit and the second loading unit to simultaneously move along the second guide rail, so that the mask plate loaded on the second loading unit moves to the illumination area of the exposure machine.
On the other hand, an exposure machine provided by the embodiment of the invention comprises any one of the mask plate loading systems.
The mask plate loading system and the exposure machine provided by the embodiment of the invention comprise: the device comprises a working area and at least one standby area, wherein the working area is provided with a first supporting platform, and the standby area is provided with a second supporting platform; the first supporting table and the second supporting table are used for placing a mask plate; the conveying unit is used for driving the first supporting table and the second supporting table to move simultaneously so that the first supporting table moves out of the working area and the second supporting table moves into the working area; and a first loading unit is arranged above the working area and used for loading the mask plate of the working area to an illumination area of the exposure machine. Compared with the prior art, the mask plate loading system provided by the embodiment of the invention has the advantages that the spare area is arranged around the working area, the mask plate to be replaced is placed on the second supporting table of the spare area, and the used mask plate on the first supporting table of the working area and the mask plate to be replaced on the second supporting table of the spare area are simultaneously moved by the conveying unit, so that the action of moving the used mask plate out of the working area and the action of moving the mask plate to be replaced into the working area are simultaneously carried out, the time for replacing the mask plate is shortened, and the efficiency for replacing the mask plate is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a mask plate loading system according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a working area and a spare area according to an embodiment of the present invention;
fig. 3 is a top view of a mask loading system according to an embodiment of the present invention;
fig. 4 is a front view of a mask loading system according to an embodiment of the present invention;
FIG. 5 is an enlarged view of area A of FIG. 4;
FIG. 6 is a schematic structural diagram of a first supporting platform according to an embodiment of the present invention;
FIG. 7 is a top view of a first support platform according to an embodiment of the present invention;
fig. 8 is a schematic structural diagram of a first loading unit and a second loading unit according to an embodiment of the present invention;
fig. 9 is a structural plan view of a first loading unit and a second loading unit provided in an embodiment of the present invention;
FIG. 10 is a left side view of a first loading unit configuration provided by an embodiment of the present invention;
fig. 11 is a left side view of a mask loading system structure according to an embodiment of the present invention;
FIG. 12 is a schematic view of an exposure machine according to the prior art;
fig. 13 is a schematic structural diagram of an exposure machine according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
An embodiment of the present invention provides a mask plate loading system, as shown in fig. 1 to 11, including: the device comprises a working area 11 and at least one standby area 12, wherein the working area 11 is provided with a first supporting platform 13, and the standby area 12 is provided with a second supporting platform 14; the first supporting platform 13 and the second supporting platform 14 are used for placing a mask plate 15; the device further comprises a conveying unit, wherein the conveying unit is used for driving the first supporting table 13 and the second supporting table 14 to move simultaneously, so that the first supporting table 13 moves out of the working area 11, and the second supporting table 14 moves into the working area 11; a first loading unit 16 is disposed above the working area 11, and the first loading unit 16 is used for loading the mask plate 15 of the working area 11 to the light irradiation area of the exposure machine.
The embodiment of the present invention does not limit the specific number of the spare areas 12, and in practical applications, one or two spare areas 12 are generally disposed around the working area 11, as shown in fig. 1 and fig. 2.
The first support table 13 and the second support table 14 may or may not be connected, and this is not limited in the embodiment of the present invention. Preferably, the first support table 13 and the second support table 14 are connected, so that the transfer unit only needs to drive one of the first support table 13 or the second support table 14 to move, and the other one moves under the drive, thereby facilitating the driving connection of the transfer unit.
Referring to fig. 1, a second support table 14 in the spare area 12 is used for placing a mask 15 to be replaced, where the mask 15 to be replaced may be the same mask as the mask 15 on the first support table 13 in the working area 11, so that when a problem or a fault occurs in the mask 15 in the working area 11, one same mask 15 can be quickly replaced, and a long-time downtime of the equipment due to the fault of the mask 15 is prevented; or, the mask plate 15 to be replaced may also be a mask plate different from the mask plate 15 on the first support table 13 in the working area 11, that is, the mask plate 15 to be replaced is a mask plate to be switched for performing a mask work next, which also shortens the time for switching the mask plate 15, which is not limited in the embodiment of the present invention.
Therefore, compared with the prior art, the mask plate loading system provided by the embodiment of the invention has the advantages that the spare area is arranged around the working area, the mask plate to be replaced is placed on the second supporting table of the spare area, the used mask plate on the first supporting table of the working area and the mask plate to be replaced on the second supporting table of the spare area are simultaneously moved by the conveying unit, so that the action of moving the used mask plate out of the working area and the action of moving the mask plate to be replaced into the working area are simultaneously carried out, the time for replacing the mask plate is shortened, and the efficiency for replacing the mask plate is improved.
Further, referring to fig. 1, 3 and 4, the transfer unit includes a first guide rail 17 and a first driving member; the first support table 13 and the second support table 14 are both arranged on the first guide rail 17 and are connected with the first guide rail 17 in a sliding manner; the first drive member may drive the first support table 13 and the second support table 14 to move simultaneously along the first guide rail 17.
In the embodiment of the present invention, the structural shapes of the first support table 13 and the second support table 14 are not limited. Illustratively, as shown in fig. 1, 6 and 7, the first support table 13 and the second support table 14 are two strip-shaped support structures, respectively, which are slidably connected to two rails of the first rail 17, respectively.
In practical applications, the first driving member may be a linear motor.
Further, as shown in fig. 4 and 5, a connection unit for connecting the first support table 13 and the second support table 14 is provided between the first support table 13 and the second support table 14, so that a predetermined distance is maintained between the first support table 13 and the second support table 14. The preset interval is a preset interval, and a person skilled in the art can set the preset interval according to actual conditions, which is not limited in the embodiment of the present invention.
The connection unit may adopt a rigid connection structure such as a connection rod, or may adopt a flexible connection structure such as a spring and a limit cylinder, which is not limited in the embodiment of the present invention. Preferably, the connection unit adopts a flexible connection structure such as a spring, a limiting cylinder and the like, and as shown in fig. 4 and 5, the connection unit comprises an elastic member 18 and a limiting cylinder; two ends of the elastic element 18 are respectively connected to two opposite side walls of the first supporting platform 13 and the second supporting platform 14; one end of the limiting cylinder is connected with one of the two side walls, and the other end of the limiting cylinder is abutted against the other side wall of the two side walls. This ensures that the position of the second support table 14 is not affected when the position of the first support table 13 is fine-tuned. Wherein the resilient member 18 is typically a spring.
Optionally, the four corners of the first supporting table 13 and the second supporting table 14 are provided with light sensor, and the light sensor is used for detecting whether the four corners of the first supporting table 13 and the second supporting table 14 are provided with mask plates 15 or not. When the mask 15 is placed on the first supporting table 13 or the second supporting table 14, one or more of the light sensors on the corresponding supporting tables detect that the mask 15 is not placed on the first supporting table 13 or the second supporting table 14, which means that the mask 15 is placed at an improper position, and may be deflected, and the placement position of the mask 15 needs to be readjusted until all the four light sensors detect that the mask 15 is placed on the corresponding supporting table.
It should be noted that, the distance between the parallel guide rails on both sides of the first guide rail 17 needs to be the same as the width of the mask plate 15, and in practical application, a laser sensor may be additionally installed to measure the distance between the parallel guide rails on both sides of the first guide rail 17, so as to ensure smooth transmission of the mask plate 15.
Further, referring to fig. 6 and 7, the first support table 13 and the second support table 14 each include four positioning pallets 19, the four positioning pallets 19 are respectively distributed at four corners of the first support table 13 or the second support table 14, and the four positioning pallets 19 can support the mask plate 15, so that the pattern surface of the mask plate 15 is suspended, and the mask plate 15 can be prevented from moving relative to the first support table 13 or the second support table 14. Referring to fig. 6, the four positioning pallets 19 are double-layer pallets, and the positioning pallets 19 and the mask plate 15 have the same cutting angle, so that the mask plate 15 can be effectively prevented from being displaced due to vibration.
Optionally, the first loading unit 16 comprises a first gripping module, a first pre-alignment module and a first adsorption module; the first grabbing module is used for grabbing a mask plate 15 from a first supporting table 13 and moving the mask plate to the lower surface of the first adsorption module; the first pre-alignment module is used for adjusting the mask plate 15 grabbed by the first grabbing unit to a first preset position; the first adsorption module is used for adsorbing the mask plate 15 at the first preset position on the lower surface of the mask plate. Wherein the first preset position is generally a position aligned with an illumination area of the exposure machine.
In practical application, the specific loading process of the mask 15 is as follows: firstly, a mask plate 15 on a first supporting table 13 of a working area 11 is grabbed and moved to the lower surface of a first adsorption module by using a loading clamp of the first grabbing module, then whether the position of the mask plate 15 is at a first preset position is detected by using a detection lens in the first pre-alignment module, and if not, the position of the mask plate 15 is adjusted by using a reference cylinder 20 and a push rod (pusher)21 in the first pre-alignment module; the first adsorption module is of an adsorption frame structure, the lower surface of the first adsorption module is provided with a plurality of vacuum adsorption holes 22, after the position of the mask plate 15 is adjusted, the mask plate 15 is adsorbed on the lower surface of the adsorption frame through the vacuum adsorption holes 22, and therefore the loading process of the mask plate 15 is completed. During exposure, light can penetrate through the hollow part of the adsorption frame and irradiate on the mask plate 15 and the glass substrate positioned below the mask plate 15, and the mask plate 15 can shield part of the light so as to form a specific pattern on the glass substrate.
It should be noted that the specific structure of each module in the first loading unit 16 is the prior art, and therefore, will not be described in detail herein.
Further, a second loading unit 23 is disposed above the spare area 12, and the second loading unit 23 includes a second grabbing module, a second pre-aligning module and a second adsorption module; the second grabbing module is used for grabbing a mask plate 15 from a second support table 14 and moving the mask plate to the lower surface of the second adsorption module; the second pre-alignment module is used for adjusting the mask plate 15 grabbed by the second grabbing unit to a second preset position; the second adsorption module is used for adsorbing the mask plate 15 at the second preset position on the lower surface of the second preset position. The structures and functions of the modules in the second loading unit 23 are similar to those of the modules in the first loading unit 16, and are all the prior art, so that the detailed description thereof is omitted here.
Referring to fig. 8 and 9, the second loading unit 23 is a backup structure of the first loading unit 16, and can quickly replace the first loading unit 16 when the first loading unit 16 fails, so as to prevent the exposure apparatus from being down for a long time.
In practical applications, the first adsorption module and the second adsorption module can be communicated through the vacuum gas pipeline 24, and a vacuum system can be used for providing vacuum air flow for the two adsorption modules, so that the structures of the first loading unit 16 and the second loading unit 23 are simplified, and the cost is saved.
Further, the mask plate loading system further comprises a second guide rail 25 and a second driving member; the side wall of the first loading unit 16 and the side wall of the second loading unit 23 are both connected on the second guide rail 25 in a sliding manner; the second driving member drives the first loading unit 16 and the second loading unit 23 to simultaneously move along the second guide rail 25, so that the mask plate 15 loaded on the second loading unit 23 moves to the illumination area of the exposure machine. Wherein the second drive member is generally a linear motor. By arranging the second guide rail 25 and the second driving member, when the first loading unit 16 fails, the second driving member is used for driving the first loading unit 16 to move out of the illumination area of the exposure machine, and simultaneously driving the second loading unit 23 to move into the illumination area of the exposure machine, so that the replacement of the loading unit is completed, and the exposure equipment is prevented from being down for a long time.
In practical applications, the first loading unit 16 and the second loading unit 23 can be connected by a spring, and a spacing cylinder can be arranged between the first loading unit 16 and the second loading unit 23 to maintain the spacing, and the flexible connection relationship can ensure that the position of the first loading unit 16 is finely adjusted without affecting the position of the second loading unit 23.
The mask plate loading system provided by the embodiment of the invention comprises: the device comprises a working area and at least one standby area, wherein the working area is provided with a first supporting platform, and the standby area is provided with a second supporting platform; the first supporting table and the second supporting table are used for placing a mask plate; the conveying unit is used for driving the first supporting table and the second supporting table to move simultaneously so that the first supporting table moves out of the working area and the second supporting table moves into the working area; and a first loading unit is arranged above the working area and used for loading the mask plate of the working area to an illumination area of the exposure machine. Compared with the prior art, the mask plate loading system provided by the embodiment of the invention has the advantages that the spare area is arranged around the working area, the mask plate to be replaced is placed on the second supporting table of the spare area, and the used mask plate on the first supporting table of the working area and the mask plate to be replaced on the second supporting table of the spare area are simultaneously moved by the conveying unit, so that the action of moving the used mask plate out of the working area and the action of moving the mask plate to be replaced into the working area are simultaneously carried out, the time for replacing the mask plate is shortened, and the efficiency for replacing the mask plate is improved.
Another embodiment of the present invention provides an exposure machine, as shown in fig. 13, including any one of the mask loading systems described above.
FIG. 12 is a top view of a structure of a prior art exposure machine, and FIG. 13 is a top view of a structure of an exposure machine according to an embodiment of the present invention. Referring to fig. 12 and 13, the exposure apparatus mainly includes a Main stage (Main-stage)26, a left stage (L-stage)27, a right stage (R-stage)28, a Glass-substrate moving machine (Glass-robot)29, a Mask-plate moving machine (Mask-robot)30, a Mask-plate stacking chamber (Mask Stocker)31, and a Lamp chamber (Lamp House) 32. The glass substrate moving machine 29 is configured to move the glass substrate 33 onto the main stage 26, the left stage 27, or the right stage 28, and the mask plate moving machine 30 is configured to move the mask plate 15 in the mask plate stacking chamber 31 to the working area 11 or the standby area 12 above the main stage 26, the left stage 27, or the right stage 28. As can be seen from comparison between fig. 1 and fig. 2, the embodiment of the present invention changes the positions of the mask plate stacking chamber 31 and the lamp chamber 32 originally located on the left and right sides of the mask plate moving machine 30, and frees up the space on the left and right sides of the mask plate moving machine 30, so that the mask plate moving machine 30 has a wider moving space, and the mask plate moving machine 30 can move the mask plate 15 in the mask plate stacking chamber 31 to the spare area 12 located above the left platform 27 and/or the right platform 28.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and all the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (7)
1. A mask loading system, comprising: the device comprises a working area and at least one standby area, wherein the working area is provided with a first supporting platform, and the standby area is provided with a second supporting platform; the first supporting table and the second supporting table are used for placing a mask plate;
the conveying unit is used for driving the first supporting table and the second supporting table to move simultaneously so that the first supporting table moves out of the working area and the second supporting table moves into the working area;
a first loading unit is arranged above the working area and used for loading the mask plate of the working area to an illumination area of an exposure machine;
the conveying unit comprises a first guide rail and a first driving piece;
the first supporting table and the second supporting table are both arranged on the first guide rail and are in sliding connection with the first guide rail;
the first driving piece can drive the first supporting table and the second supporting table to simultaneously move along the first guide rail;
a connecting unit is arranged between the first supporting table and the second supporting table and is used for connecting the first supporting table and the second supporting table, so that a preset distance is kept between the first supporting table and the second supporting table;
the connecting unit comprises an elastic piece and a limiting cylinder; two ends of the elastic piece are respectively connected to two opposite side walls of the first supporting table and the second supporting table; one end of the limiting cylinder is connected with one of the two side walls, and the other end of the limiting cylinder is abutted against the other side wall of the two side walls.
2. The system according to claim 1, wherein the first support table and the second support table each comprise four positioning pallets, the four positioning pallets are respectively distributed at four corners of the first support table or the second support table, and the four positioning pallets can support the mask plate, so that the pattern surface of the mask plate is suspended and the mask plate can be prevented from moving relative to the first support table or the second support table.
3. The system of claim 1, wherein the first loading unit comprises a first grasping module, a first pre-alignment module, and a first adsorption module;
the first grabbing module is used for grabbing the mask plate from the first supporting table and moving the mask plate to the lower surface of the first adsorption module;
the first pre-alignment module is used for adjusting the mask plate grabbed by the first grabbing module to a first preset position;
the first adsorption module is used for adsorbing the mask plate at the first preset position on the lower surface of the mask plate.
4. The system of claim 3, wherein a second loading unit is disposed above the spare area, the second loading unit including a second grasping module, a second pre-alignment module, and a second adsorption module;
the second grabbing module is used for grabbing the mask plate from the second supporting table and moving the mask plate to the lower surface of the second adsorption module;
the second pre-alignment module is used for adjusting the mask plate grabbed by the second grabbing module to a second preset position;
the second adsorption module is used for adsorbing the mask plate at the second preset position on the lower surface of the second adsorption module.
5. The system of claim 4, wherein the first adsorption module and the second adsorption module are in communication via a vacuum gas line.
6. The system of claim 4, further comprising a second guide track and a second drive;
the side wall of the first loading unit and the side wall of the second loading unit are both connected to the second guide rail in a sliding manner;
the second driving piece drives the first loading unit and the second loading unit to simultaneously move along the second guide rail, so that the mask plate loaded on the second loading unit moves to the illumination area of the exposure machine.
7. An exposure machine, characterized by comprising the mask loading system according to any one of claims 1 to 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710637931.6A CN107219730B (en) | 2017-07-28 | 2017-07-28 | Mask plate loading system and exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710637931.6A CN107219730B (en) | 2017-07-28 | 2017-07-28 | Mask plate loading system and exposure machine |
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| Publication Number | Publication Date |
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| CN107219730A CN107219730A (en) | 2017-09-29 |
| CN107219730B true CN107219730B (en) | 2020-04-14 |
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| CN201710637931.6A Expired - Fee Related CN107219730B (en) | 2017-07-28 | 2017-07-28 | Mask plate loading system and exposure machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115477138A (en) * | 2022-09-16 | 2022-12-16 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Mask transfer device and mask transfer system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0945651A (en) * | 1995-07-26 | 1997-02-14 | Toshiba Corp | Cleaner of resist and developing device |
| US6723168B2 (en) * | 2001-06-20 | 2004-04-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Spin-coater with self-cleaning cup and method of using |
| DE60335595D1 (en) * | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Immersion lithographic apparatus and method of making a device |
| EP1498778A1 (en) * | 2003-06-27 | 2005-01-19 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN201917775U (en) * | 2010-12-28 | 2011-08-03 | 北京京东方光电科技有限公司 | Exposure device |
| CN105093836B (en) * | 2014-05-06 | 2017-08-29 | 上海微电子装备（集团）股份有限公司 | EUV lithography device and its exposure method |
| CN106044229A (en) * | 2016-07-22 | 2016-10-26 | 京东方科技集团股份有限公司 | Mask plate haulage equipment and exposure unit system |
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