CN106170584A - For processing the equipment of flexible base board and cleaning its method processing chamber - Google Patents
For processing the equipment of flexible base board and cleaning its method processing chamber Download PDFInfo
- Publication number
- CN106170584A CN106170584A CN201480077770.4A CN201480077770A CN106170584A CN 106170584 A CN106170584 A CN 106170584A CN 201480077770 A CN201480077770 A CN 201480077770A CN 106170584 A CN106170584 A CN 106170584A
- Authority
- CN
- China
- Prior art keywords
- curtain
- painting drum
- equipment
- flexible base
- sedimentary origin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
Abstract
According to the disclosure, it is provided that a kind of equipment for processing flexible base board.This equipment includes processing chamber, painting drum (110), one or more sedimentary origin and shutter device (200), described painting drum is in processing chamber and is configured to support flexible base board, one or more sedimentary origin are arranged in the processing chamber, and described shutter device is arranged in processing chamber and is configured between painting drum and one or more sedimentary origin mobile curtain (300).
Description
Technical field
Embodiment of the disclosure and relate to a kind of film processing device, particularly to a kind of in order to process setting of flexible base board
Standby, and relate more particularly to Reel-to-reel type (Roll-to-Roll, R2R) system.Embodiment of the disclosure particularly to right to volume
The chamber that processes of rolling chemical gaseous phase deposition (CVD) system carries out the Apparatus and method for of plasma clean.
Background technology
The process of flexible base board (such as, plastic foil or paper tinsel) has in encapsulation industry, semiconductor industry and other industries
High demand.Process can include utilizing material requested (such as, metal, quasiconductor and dielectric substance) to be coated with flexible base board
Cloth, etching and perform on substrate other process steps so that required application.Perform the system of this task substantially
Including painting drum (coating drum) (such as, cylindrical roller), it is coupled to processing system with for transmitting substrate, in institute
State and on painting drum, process at least some of of substrate.Therefore Reel-to-reel type coating system can provide high yield system.
Generally, coating process (such as, chemical vaporization technique or thermal evaporation process) can be used to by thin material layer depositions in
On flexible base board.But, Reel-to-reel type depositing system has also gone through strong need in display industry and photovoltaic (PV) industry
Ask growth.For example, contact panel element, flexible display and flexible PV modules cause depositing in Reel-to-reel type coating machine
The increase in demand of the layer (especially in the case of low manufacturing cost) being suitable for.But, if this device is generally of dried layer, it leads to
Often manufacture with CVD technique, the most still pecvd process.
The depositing device with such as CVD, PECVD and/or PVD source may be at the shielding part of sedimentary origin and/or periphery
Deposition is produced on part.In order to avoid cross-contamination effect and guarantee long-term technology stability, it is necessary to perform equipment cleaning procedure
So as follow-up use.Generally, for this purpose, manual unlocking cleaning treatment chamber.But, this is time-consuming, and can
Machine stopping time can be caused to increase, making it difficult to chamber vent before identical under conditions of follow-up or replace
Process on flexible base board.
Therefore, there is a need in the art for a kind of for processing flexible base board (such as OLED structure, semiconductor structure and other are existing
The increasingly complex device in generation) high-efficiency appliance to guarantee that substrate output maximizes, and downtime minimizes.
Summary of the invention
In view of above-mentioned, it is provided that a kind of equipment for processing flexible base board and clean its method processing chamber.The present invention
Further aspect, advantage and feature become apparent from dependent claims, description and appended accompanying drawing.
On the one hand, it is provided that a kind of equipment for processing flexible base board.Equipment include process chamber, painting drum, one
Individual or more sedimentary origin and a shutter device, described painting drum in the processing chamber and is configured to support flexible base
Plate, one or more sedimentary origin are arranged in the processing chamber, and described shutter device is arranged in processing chamber and joins
It is set between painting drum and one or more sedimentary origin mobile curtain.
On the other hand, it is provided that the curtain of a kind of equipment for processing flexible base board.Curtain includes one or more
Multiple otch, these otch are corresponding to the position of one or more sedimentary origin of equipment.
At other aspects another, it is provided that a kind of for cleaning flexible base in the case of not destroying the vacuum processed in chamber
The method processing chamber of plate processing equipment.Equipment include shutter device, described shutter device be arranged on process chamber in and
It is configured between painting drum and one or more sedimentary origin mobile curtain.The method includes by shutter device in coating
Curtain is guided between cylinder and one or more sedimentary origin；Start the first suction in the processing chamber and purify technique；Carry
Supply cleaning or etching gas to processing chamber；Plasma clean processes chamber；And start the second suction in the processing chamber
With purification technique.
In another aspect, it is provided that a kind of equipment for processing flexible base board.Equipment includes processing chamber, coating rolling
Cylinder, one or more sedimentary origin and shutter device, described painting drum is in processing chamber and is configured to support flexibility
Substrate, one or more sedimentary origin are arranged in the processing chamber, and described shutter device is arranged in process chamber.Shutter
Device includes that at least one arm, at least one arm described have Part I and Part II, and wherein Part I provides this arm
Rotary shaft, and wherein curtain is connectable to Part II.Shutter device is configured through arm being rotated in around rotary shaft
Mobile curtain between painting drum and one or more sedimentary origin.
Embodiment is also directed to the equipment for carrying out disclosed method, and includes for performing the side disclosed in each
The part of appliance of method step.These method steps can pass through nextport hardware component NextPort, by the computer of suitable software programming, both
Any combination or perform in any other manner.Furthermore, it is also directed to the said equipment operation according to inventive embodiment used
Method.The method includes the method step of each function for carrying out equipment.
Accompanying drawing explanation
Therefore, in order to the mode of the features described above of the present invention is understood in detail, can be obtained briefly above by reference example
The present invention's of general introduction is the brightest.Appended accompanying drawing is related to embodiments of the invention and is described as follows:
Figure 1A illustrates the part processing chamber of the equipment for processing flexible base board according to embodiment described herein
Schematic diagram.
Figure 1B illustrates showing of the Reel-to-reel type depositing device for deposition or coated thin film according to embodiment described herein
It is intended to.
Fig. 2 illustrates the side elevational cross-section of the painting drum of the equipment for processing flexible base board according to embodiment described herein
Figure.
Fig. 3 illustrates the schematic diagram of the shutter device of the equipment for processing flexible base board shown in Fig. 2.
Fig. 4 illustrates the equipment for processing flexible base board and is in the detail perspective view of shutter device of diverse location.
Fig. 5 illustrates the forward sight section of the painting drum of the equipment for processing flexible base board according to embodiment described herein
Figure.
Fig. 6 illustrates the plane graph of the section of the equipment for processing flexible base board according to embodiment described herein.
Fig. 7 illustrates the side-looking of the process part of another equipment for processing flexible base board according to embodiment described herein
Profile.
Fig. 8 illustrates the equipment of the Fig. 7 according to embodiment described herein and the front view of the curtain with otch.
Fig. 9 illustrates the side-looking of the process part of the another equipment for processing flexible base board according to embodiment described herein
Profile.
Figure 10 illustrates the method processing chamber for cleaning flexible base board processing equipment according to embodiment described herein
Flow chart.
Detailed description of the invention
With detailed reference to various embodiments of the present invention, the one or more examples in embodiment are shown in the drawings.
In the following description to accompanying drawing, identical reference number censures identical parts.Generally, only with respect to separate embodiment
Difference illustrates.Each example provides as explanation of the invention, and is not construed as limitation of the present invention.Enter
One step, a part the feature described or describe as an embodiment is usable in other embodiments or implements with other
Example is used in combination, to produce another embodiment.This description is intended to include such amendment and modification.
It is to be noted here that flexible base board or web (web) used in embodiment described herein can generally characterize
It is flexible for it.Term " web (web) " synonymously can make with term " band (strip) " or term " flexible base board "
With.For example, the web described in embodiment hereof can be paper tinsel or other flexible base boards.
Term used herein " curtain (shielding foil) " is intended to mean that generally by being different from flexible base board
The paper tinsel made by material of material.Such as, this paper tinsel can be made up of metal alloy (such as, such as rustless steel).According to herein
Embodiment, curtain can such as have the thickness of 10 microns to 300 microns, the thickness of particularly 50 microns to 125 microns.With
The meaning of language " curtain " can be equal to term and " sacrifice paper tinsel (sacrificial foil) ".
Embodiment as herein described relates generally to a kind of equipment for processing flexible base board, and for not destroying
The method processing chamber of flexible base board processing equipment is cleaned in the case of processing the vacuum in chamber.Equipment includes processing chamber
Interior shutter device (shutter device).Shutter device is configured between painting drum and one or more sedimentary origin
Mobile curtain.Specifically, curtain can cover the region below sedimentary origin, and can carry out plasma clean and not affect
Flexible base board and/or painting drum.
In presently disclosed embodiment, it is not necessary to destroy vacuum before washing, owing to shutter device can clean
During technique, even when processing cavity seal or emptying, mobile curtain is to protect painting drum.Further, the present embodiment
(such as, NF3 is clear to allow to perform cleaning in the case of not removing flexible base board (such as, from plasma clean region)
Wash technique).Chamber is purified and suction is not necessarily required to remove flexible base board.The length of flexible base board (such as, web paper tinsel)
Degree can be up to hundreds of meters.Even if some technique have to be carried out between them (being such as processed at whole zig
Before), it is also possible that in the case of not removing flexible base board.Embodiment described herein especially can be at web
Coating machine uses.
According to embodiment as herein described, for processing the part processing chamber of the equipment 100 of flexible base board (especially
It is for by thin film deposition part on flexible substrates) it is exemplarily illustrated in figure ia.
Equipment 100 includes processing chamber, painting drum 110, one or more sedimentary origin and shutter device 200, institute
Stating painting drum 110 in the processing chamber and to be configured to support flexible base board 300, one or more sedimentary origin are arranged in
Process in chamber, in described shutter device 200 is arranged on process chamber and be configured to painting drum 110 and one or more
Mobile curtain 300 between sedimentary origin.Generally, one or more sedimentary origin be provided in painting drum 110 and one or
A gap is there is between more sedimentary origins.Gap can have the width of about 0.5 to 50 millimeter.In some embodiments, soon
Door gear 200 can be configured to mobile curtain 300 in the gap between painting drum 110 and one or more sedimentary origin.
Generally, equipment 100 farther includes web and guides system, and described web guides system to include several roller, such as deflection roll, guiding
Roller, expansion roller (spreader rollers), and for unwinding and recoil the roller of web.
According to some embodiments can being combined with other embodiments as herein described, shutter device 200 can include at least one
Individual Part I and at least one Part II.Part I can provide the rotary shaft of shutter device 200.Curtain 300 can connect
It is connected to Part II, such as, is connected to second by least one in clamping, clamping, gluing, magnetic force, welding and welding
Point.Curtain 300 is alternatively referred to as " shutter (jalousie) ".Shutter device 200 alternatively referred to as " louver shutter
(jalousie shutter)”。
By rotating around rotary shaft, the curtain 300 being attached to Part II can painting drum 110 and one or more
Move between multiple sedimentary origins.When curtain 300 covers the region below sedimentary origin, plasma clean can be carried out.Shielding
Paper tinsel 300 can move via automatic priming, such as when initial wash program starts.
According to some embodiments can being combined with other embodiments as herein described, shutter device 200 may be provided at coating
The lower section (below painting drum 110) of cylinder 110.Curtain 300 can below painting drum 110 in an upward direction
Mobile, to be positioned between painting drum 110 and one or more sedimentary origin.By making shutter device 200 be positioned at painting
Below cloth cylinder 110, the quantity of the part of appliance can minimize the part of appliance above painting drum 110, especially moving.Enter
One step, the granule discharged from shutter device 200 and/or curtain 300 falls to the bottom of e.g. processing chamber, without
Arrive or cross crystallizing field.In consideration of it, can prevent depositing operation from being polluted by impurity, and particularly prevent coating by impurity
Pollution.In other words, granule risk is minimized.Curtain has repellence, so that curtain is repeatable to cleaning material
Use, i.e. after each cleaning and be not required to replace curtain.
As shown in Figure 1A, in some embodiments, painting drum 110 can by shielding construction Vacuum flange 112 institute around.
Vacuum flange 112 can have the lid of the processing chamber attached with it.This lid can include multiple opening to take handling implement.
According to some embodiments can being combined with other embodiments as herein described, equipment can include at least one interval dress
Put 115, such as, be arranged on the side of painting drum 110.In certain embodiments, equipment 100 can be in each side of painting drum 110
Including an escapement 115.Escapement 115 can be circular, or can be a circular part, wherein escapement
The diameter of 115 is big than the diameter of painting drum 110.Escapement 115 can be configured to support curtain 300, particularly when
Curtain 300 is supported during mobile curtain 300 between painting drum 110 and one or more sedimentary origin 120.Escapement
115 can provide a gap between painting drum 110 or the flexible base board being disposed thereon and curtain 300.Therefore, when being coated with
Between cloth cylinder 110 and one or more sedimentary origin 120 during mobile curtain 300, owing to curtain 300 is not in contact with coating
Cylinder 110 or flexible base board, can minimize the damage risk of painting drum 110 or flexible base board.
In some other embodiments, equipment may not include at least one escapement 115, and when at painting drum
Between 110 and one or more sedimentary origin 120 during mobile curtain 300, curtain 300 may contact or touch coating rolling
Cylinder 110 or the flexible base board being disposed thereon.In the case, the painting drum 110 of curtain 300 and carrying flexible base board with
Identical speed moves.In other words, the curtain 300 relative motion relative to painting drum 110 can be substantially absent from.
Figure 1B illustrate according to embodiment described herein for deposition or the Reel-to-reel type depositing device 1000 of coated thin film
Schematic diagram.According to embodiment as herein described, equipment 1000 can include shutter device.Equipment 1000 can include at least three chamber
Room part 1020A, 1020B and 1020C.Multiple sedimentary origins 6300 as handling implement can be provided at chamber portion 1020C
And etching station 4300.For cleaning as described herein, handling implement (the most multiple sedimentary origins 6300 and etching station
4300) can be used as etch tool so that cleaning treatment chamber.Flexible base board 1060 is arranged on the first roller 7640 and (such as has winding
Axle) on.Unwind from roller 7640 as indicated by the flexible base board 1060 substrate moving direction as shown in arrow 1080.Partition wall
7010 are provided for separating chamber portion 1020A and 1020B.Partition wall 7010 can have gap lock 1400 further for making
Substrate 1060 passes through.Vacuum flange 1120 is arranged between chamber portion 1020B and 1020C, and above-mentioned with reference to as described in Figure 1A,
Vacuum flange 1120 can be provided with multiple opening to take handling implement.
Substrate 1060 is moved through deposition region, and deposition region is arranged at painting drum 1100 and corresponding to multiple heavy
Long-pending position, source 6300.During operation, painting drum 1100 rotates around an axle, so that substrate 1060 is along the side of arrow 1080
To movement.According to typical embodiment, substrate is guided to painting drum from roller 7640 via one, two or more roller
1100 and guide to the second roller 7640 ' (such as having wireline reel) from painting drum 1100, after substrate is processed, substrate winds
On wireline reel.
In some embodiments, the first chamber portion 1020A is separated into inset (interleaf) chamber portion unit
1020A1 and substrate chamber unit 1020A2.Therefore, it is possible to provide inset roller 7660/7660 ' and inset roller 1050 are as setting
The modular component of standby 1000.Equipment 1000 can farther include preheating unit 1940, to heat flexible base board.Further,
Can additionally or alternatively provide preconditioning plasma source 1920 (such as RF plasma source), to enter chamber portion
Cement Composite Treated by Plasma substrate is used before 1020C.
According to the still further embodiments can being combined with other embodiments as herein described, it is possible to optionally provide use
With assessment processing substrate result optical measurement unit 4940 and/or in order to the electric charge on insert mounting adapter board one or more from
Sonization unit 4920.
Fig. 2 illustrates the side-looking of the painting drum 110 of the equipment for processing flexible base board according to embodiment described herein
Profile.Fig. 3 illustrates the schematic diagram of the shutter device 200 of the equipment of Fig. 2.
According to some embodiments can being combined with other embodiments as herein described, shutter device 200 can include at least one
Individual arm 210, at least one arm 210 described has at least one Part I 211 and at least one Part II 212.First
Divide 211 rotary shafts that arm 210 can be provided.Equipment can have a Part I 211, is arranged on the side of painting drum 110；Or
Can have two Part I 211, each Part I is arranged on every side of painting drum 110.Curtain 300 can connect
To Part II 212, such as, it is connected to second by least one in clamping, clamping, gluing, magnetic force, welding and welding
Divide 212.
By making arm 210 rotate around by rotary shaft defined in Part I 211, it is attached to the screen of Part II 212
Cover paper tinsel 300 to move between painting drum 110 and sedimentary origin 120, and coating rolling can be arranged in mentioned above especially
Move in gap between cylinder 110 and sedimentary origin 120.When etching program is initial, arm 210 can be around the rotation of painting drum 110
Rotating shaft 111 is moved, and transmits attached curtain 300 around painting drum 110.In some embodiments, curtain 300 can
Contact painting drum 110 or the flexible base board being arranged on.When curtain 300 covers the region below sedimentary origin 120, can
Carry out plasma clean.
According to some embodiments can being combined with other embodiments as herein described, the rotary shaft of arm 210 is substantially parallel
Rotary shaft 111 in painting drum 110.Specifically, the rotary shaft of arm 210 may correspond to the rotary shaft of painting drum 110
111.In some embodiments, Part I 211 may be attached to the rotary shaft 111 of painting drum 110, in order to can be around described
Rotary shaft 111 rotates.In some embodiments, it is possible to provide bearing (such as sleeve bearing or roller bearing) is so that arm 210 can
Rotate.For example, arm 210 (especially Part I 211) can attach via bearing (such as sleeve bearing or roller bearing)
Rotary shaft 111 to painting drum 110.
In some embodiments, Part I 211 may be substantially perpendicular to rotary shaft 111 and extends, especially can be from coating
The rotary shaft 111 of cylinder 110 at least extends to the circumferential surface of painting drum 110.The length of Part I can at least equal to or
Diameter more than painting drum 110.
According to some embodiments can being combined with other embodiments as herein described, Part II 212 can be substantially parallel
Rotary shaft 111 in painting drum 110 extends, and especially can extend along at least some of circumferential surface of painting drum 110.?
In some embodiments, Part II 312 can extend substantially along the whole length of the circumferential surface of painting drum 110.?
In some embodiments, Part II 212 can extend from Part I 211.
According to some embodiments can being combined with other embodiments as herein described, Part I 211 can be along first party
To extension, Part II 212 can extend along second direction, and described second direction may be substantially perpendicular to described first direction.
In some embodiments, first direction may be substantially perpendicular to the rotary shaft 111 of painting drum 110, and/or second direction can
It is arranged essentially parallel to the rotary shaft 111 of painting drum 110.
Although shielding instrument is moved with during cleaning process in the direction being the most likely perpendicular to flexible base board transmission
Covering and protect painting drum, in this case, the curvature of painting drum and the curvature of curtain are the most uneven
OK.Curtain must bend on its width.But, when it is rolled to roller (such as roller receptor 220), it will be
Limpen on its length direction.Therefore, rigid material (curtain being such as made of metal) may damage.
With reference to Fig. 3, it is shown that have the shutter device 200 of arm 210, arm 210 has two Part I 211 and one second
Part 212, Part II 212 connects two Part I 211.Part I 211 may be provided at the opposite side of painting drum 110
On.In other words, a Part I 211 may be provided on every side of painting drum 110.
Part I 211 can include hole or centre bore 213, is configured to provide for the connection with axis or axle, such as with painting
The rotary shaft 111 of cloth cylinder 110 connects.Be associated with centre bore 213 can be bearing (not illustrating), such as sleeve bearing or
Roller bearing, so that Part I 211 is rotatable.As example, bearing may be provided in hole 213, or is provided around hole
213。
According to some embodiments can being combined with other embodiments as herein described, shutter device 200 can include driver,
It is configured between painting drum 110 and one or more sedimentary origin 120 mobile curtain 300.In some embodiments,
Driver can be configured to make arm 210 rotate around the rotary shaft provided by Part I 211.According to some embodiments, driver
Motor, such as electric notor and/or air motor can be included.
In some embodiments, driver can be connected to Part I 211 via gear assembly.This gear assembly can wrap
Include the first gear 214 being arranged on Part I 211.As example, the first gear 214 may be configured as at least partly surrounding by
Rotary shaft defined in Part I 211, particularly centre bore 213.Gear assembly may also comprise the second gear 215, the second tooth
Wheel 215 is directly or indirectly attached to drive mechanism, such as motor (such as electric notor and/or air motor).
According to some embodiments can being combined with other embodiments as herein described, shutter device 200 can include one or
More roller receptors 220, are configured to winding and/or unwinding curtain 300.One or more roller receptor 220 configures
For receiving curtain 300, and it is particularly used for receiving or holding that there is the roller that curtain 300 is wound on.Therefore, necessary
Time, it is readily replaceable the roller with curtain 300.In certain embodiments, the first end of curtain 300 is connectable to roller
Receptor.As example, the first end of curtain 300 is connectable to roller receptor 220, and the second end of curtain 300
It is connectable to the Part II 212 of arm 210.
According to some embodiments can being combined with other embodiments as herein described, one or more roller receptor 220
May be provided in process chamber.And curtain 300 can (the most complete) be arranged in process chamber, and is not arranged in processing chamber
Outdoor.In consideration of it, be not required to guide curtain to processing in chamber from outside (such as through vacuum lock).So help
In cleaning treatment chamber in the case of not destroying the vacuum processed in chamber.
But, in other embodiments, at least one roller receptor may be provided at the outside processing chamber.In this feelings
Under condition, curtain 300 can such as pass through air lock (air-lock) from outside supply to processing in chamber.In this configuration,
The first end of curtain 300 is still connectable to roller receptor 220, and the second end of curtain 300 is connectable to shutter dress
Put, particularly the Part II 212 of arm 210.
In some embodiments, at least one in one or more roller receptor 220 may be provided at painting drum
The lower section of 110.By one or more roller receptor 220 being positioned at the lower section of painting drum 110, from one or more
The granule that roller receptor 220 and/or curtain 300 discharge falls to such as process the bottom of chamber, without arriving or horizontal
More crystallizing field.In consideration of it, can prevent depositing operation from being polluted by impurity, and particularly prevent coating from being polluted by impurity.
According to some embodiments can being combined with other embodiments as herein described, roller receptor 220 can include acceptance division
Divide 222, be configured to receive curtain 300 or there is the roller of curtain 300, be particularly configured to reception and there is curtain
300 rollers being wound on.
In typical embodiment, roller receptor 220 can have at least one attachment 221.Attachment 221 can configure
One-tenth provides roller receptor 222 or the roller with curtain 300 and the rotary type processed between chamber to be connected.Roller receptor 222 is outstanding
It can be installed in process chamber via at least one attachment 221.As example, attachment 221 can include or be connectable to
Bearing (such as sleeve bearing and/or roller bearing), to provide rotary type to connect.In certain embodiments, attachment 221 can be joined
It is set at least make receiving portion 222 rotatable around rotary shaft.The rotary shaft of receiving portion 222 can be arranged essentially parallel to coating rolling
The rotary shaft of cylinder.In typical embodiment, receiving portion 222 can have two attachment 221, receiving portion 222 every
An attachment 221 is had on side.
In other embodiments, roller receptor can include several attachment, and may not include roller receptor.Roller receptor can
(being such as not connected with) attachment including at least two independence.Roller receptor especially can include two attachment.Attachment can
It is configured to be connectable to that there is the roller that curtain 300 is wound on, is particularly configured to be connectable to that there is curtain 300 and winds
The side of roller thereon.Attachment can be configured to have offer rotary type company between the roller of curtain 300 and process chamber
Connect.To this end, attachment can include or be connectable to bearing (such as sleeve bearing and/or roller bearing).
In some embodiments, curtain 300 is arranged on roller receptor 220, and the first end of curtain 300 connects
Part II 212 to arm 210.When arm 210 rotates around rotary shaft 111, curtain 300 unwind from roller receptor 220 or
Launch, and move between painting drum 110 and one or more sedimentary origin 120, particularly painting drum 110 and one
Or move in the gap between more sedimentary origin 120.Explain with further reference to Fig. 4.
Fig. 4 illustrates the detailed of the shutter device processing partly and being in diverse location of the equipment for processing flexible base board
Thin perspective view.
Such as during depositing operation, the arm 210 of shutter device 200 can be in primary importance 240.In primary importance 240
In, curtain 300 is not located between painting drum 110 and sedimentary origin 120.As example, in primary importance 240, screen
Cover paper tinsel 300 and can be at winding or roll-up state.For curtain 300 mobile between painting drum 110 and sedimentary origin 120, arm
210 can move or rotate (arrow 260 indication) to the second position 250 from primary importance 240.Specifically, transfer arm is passed through
210, curtain 300 unwinds from roller receptor 220, launch or unties.
In some embodiments, roller receptor 220 can include retraction mechanism, such as based on spring retraction mechanism, its
There is provided the power contrary with the movement of curtain 300 and/or arm 210, particularly with curtain 300 and/or arm 210 from primary importance
240 move to the contrary power of the second position 250.Therefore, curtain 300 is by tension force, so that curtain 300 especially can be such as
Will not be wrinkling and/or between painting drum and sedimentary origin, guide shielding in the case of being wound between painting drum and sedimentary origin
Paper tinsel 300.
When arm 210 is back to primary importance 240 from the second position 250, such as after being complete cleaning, screen
Cover paper tinsel 300 to rewind or rewind on roller receptor 220.In some embodiments, roller receptor 220 can include
Retraction mechanism mentioned above, thus being shielded from paper tinsel 300 can be rolled-up, is especially in the state tightened so that not having gauffer
And/or spooling occurs.
According to some embodiments can being combined with other embodiments as herein described, roller receptor 220 may not include withdrawal
Mechanism, but driver, such as motor can be included, in order on roller receptor, rewind curtain 300.
According to some embodiments can being combined with other embodiments as herein described, arm 210 can be configured to rotate the most at least
90 °, particularly 130 °, 140 °, 143 °, 150 ° or 180 °.In other words, the angle between primary importance 240 and the second position 250
Degree or the anglec of rotation can be about at least 90 °, and specifically for 130 °, 140 °, 143 °, 150 ° or 180 °.
In view of above-mentioned, curtain 300 can cover the region below sedimentary origin 120, and can not affect flexible base board and/or
Plasma clean is carried out in the case of painting drum 110.In consideration of it, due to shutter device 200 can during cleaning, very
To when processing cavity seal or emptying, mobile curtain 300 is to protect painting drum 110, so being not required to before cleaning
Destroy vacuum.Further, the present embodiment allows to perform cleaning (such as NF3 cleaning) and do not remove flexible base board (example
As from plasma clean region).Chamber need not be purified and ventilate to remove flexible base board.
Fig. 5 illustrates for processing flexible base board and having another axonometric chart of process part of equipment of shutter device.
The shutter device of Fig. 5 can be configured to the above-mentioned shutter device 200 described with reference to Fig. 3.In Fig. 5, it is provided that two first
Part 211, every side of painting drum 110 has a Part I 211.Roller receptor 220 may be provided at painting drum 110
Lower section.As example, the first end of curtain 300 is connectable to roller receptor 220, and the second end of curtain 300
It is connectable to the Part II 212 of arm 210.
In certain embodiments, the rotary shaft of painting drum 110 can be or correspond to be provided by Part I 211
The rotary shaft of arm 210.Specifically, its rotary shaft 111 or axle are configurable to hold painting drum 110 with arm 210 (specifically
The Part I 211 of arm 210) both.
Fig. 6 illustrates the plane graph of the process part of the equipment for processing flexible base board according to embodiment described herein.
According to some embodiments can being combined with other embodiments as herein described, the first end of curtain 300 can connect
It is connected to roller receptor, is particularly connected to receiving portion 222, and the second end of curtain 300 is connectable to second of arm
Divide 212.In some embodiments, for guide or make one or more guide reel that curtain be partial to or be partial to roller 223,
Between 224 positions that may be provided at roller receptor and Part II 212.Roller 223,224 can be configured to the circle at painting drum 110
The angle of definition is provided between tangent line and the surface of curtain 300 of perimeter surface.
Flexible base board 400 may be provided on painting drum 110.Shutter device can be configured at sedimentary origin 120 and flexible base
Mobile curtain 300 between plate 400, and can be particularly configured in the gap between sedimentary origin 120 and flexible base board 400 move
Curtain 300.Thus, it is not necessary to removed from process chamber before starting cleaning (such as, plasma cleaning process)
Flexible base board 400, because flexible base board 400 is protected from the impact of washed material (such as NF3 and SF6).
Fig. 7 illustrates the process part of another equipment 500 for processing flexible base board according to embodiment described herein
Side cutaway view.Fig. 8 illustrates the equipment 500 of the Fig. 7 according to embodiment described herein and has the curtain 300 of otch 301
Front view.
According to some embodiments can being combined with other embodiments as herein described, equipment 500 can include two or more
Individual roller receptor 510,520, configuration is in order to wind and/or to unwind curtain 300.In some embodiments, equipment 500 can wrap
Include the first roller receptor 510 and the second roller receptor 520.As example, the first end of curtain 300 is connectable to the first roller
Receptor 510, and/or the second end of curtain 300 is connectable to the second roller receptor 520.Roller receptor 510 and 520 can
It is configured to any one in above-mentioned roller receptor 220.
In some embodiments, the first roller receptor 510 is arranged on the lower section of painting drum 110, the second roller receptor
520 tops being arranged on painting drum 110.In other words, the first roller receptor 510 and the second roller receptor 520 are arranged on painting
On the substantially opposite side of cloth cylinder 110.
In certain embodiments, the first roller receptor 510 and/or the second roller receptor 520 can include retraction mechanism, such as
Retraction mechanism based on spring, it provides and trends towards winding or roll the power of curtain 300.Therefore, curtain 300 by tension force,
So that especially can not wrinkling between painting drum and sedimentary origin at curtain 300 or be wound around in the case of painting drum with
Curtain 300 is guided between sedimentary origin.
According to some embodiments can being combined with other embodiments as herein described, curtain 300 includes one or more
Individual otch 301.In some embodiments, this one or more otch corresponds respectively to one or more sedimentary origin 120
Position.
In some embodiments, shutter device is configured at least mobile curtain between primary importance and the second position
300.As example, in primary importance, one or more otch can be arranged relative to painting drum 110 so that they are right
Should be in the position of one or more sedimentary origin 120.Owing to sedimentary origin 120 arranges curtain the most betwixt in the face of flexible base board
300, the depositing operation for processing flexible base board can be performed.In the second position, curtain 300 may be provided at sedimentary origin 120
And to provide shielding between painting drum 110.Specifically, curtain 300 can cover the region below sedimentary origin 120, and
And plasma clean can be carried out in the case of not affecting flexible base board and/or painting drum 110.More particularly, shielding
Paper tinsel 300 can cover the region of all handling implements (such as sedimentary origin 120) lower section.
In consideration of it, need not destroy before washing vacuum, because shutter device can be during cleaning, even work as place
Curtain 300 is moved to protect painting drum 110 when reason cavity seal or emptying.Further, the present embodiment allows to perform cleaning
Technique (such as, NF3 cleaning) and do not remove flexible base board (such as from plasma clean region).In order to remove flexible base
Plate and to purify chamber and ventilate be unnecessary.
According to some embodiments can being combined with other embodiments as herein described, curtain 300 is by metal alloy (especially
It is rustless steel) constituted.This allows curtain 300 that the cleaning material (such as NF3 and SF6) used in cleaning is had opposing
Property.
Shutter device can be configured at least mobile curtain 300 between primary importance and the second position.According to can with this
Some embodiments that other embodiments described in literary composition combine, shutter device 200 can include driver, be configured in primary importance
And mobile curtain 300 between the second position.In some embodiments, driver can be configured to drive and/or rotate the
One roller receptor 510 and/or the second roller receptor 520.According to some embodiments, driver can include motor, such as electric notor
And/or air motor.
As example, driver can be configured to rotate the first roller receptor 510, and the first roller receptor 510 may be provided at
The lower section of painting drum 110.Second roller receptor 520 can include retraction mechanism, such as based on spring retraction mechanism, and it provides
Trend towards winding or roll the power of curtain 300.Therefore, even if when the first roller receptor 510 rotates by driver, shielding
Paper tinsel 300 is also by tension force, so that especially can or situation about being wound around not wrinkling between painting drum and sedimentary origin at curtain 300
Under between painting drum and sedimentary origin guide curtain 300.
In another example, driver can be configured to rotate the second roller receptor 520, and the second roller receptor 520 can set
Put above painting drum 110.First roller receptor 510 can include retraction mechanism, such as based on spring retraction mechanism, its
There is provided and trend towards winding or roll the power of curtain 300.Therefore, even if when the second roller receptor 520 rotates by driver,
Curtain 300 is also by tension force, so that especially can be not wrinkling between painting drum and sedimentary origin 210 at curtain 300 or twine
Between painting drum and sedimentary origin 210, curtain 300 is guided in the case of around.
According to some embodiments can being combined with other embodiments as herein described, shutter device can include line or belt so that
Curtain 300 moves between the first location and the second location.This line or belt can have the first end, the second end and mid portion.
First end may be provided at the first roller receptor 510 or near the first roller receptor 510, and the second end may be provided at the second roller and receives
At device 520 or near the second roller receptor 520.The mid portion of line or belt is connectable to curtain 300, so that curtain 300
Move between the first location and the second location.Therefore, curtain 300 can be moved by the movement of line or belt.Term shields
" mid portion " of paper tinsel 300 can refer to any part of the curtain 300 between first end and the second end.
Shutter device can include driver, and driver is configured to wind line or belt and/or unwinding line or belt, so that curtain
300 move between the first location and the second location.Specifically, the first end or second end of line or belt is connectable to drive
Device, and the other end is connectable to retraction mechanism.Or, the first end is connectable to the first driver, and the second end is connectable to second
Driver.In all of situation, curtain 300 can be by winding and/or unwinding line or belt at primary importance and second
Move between putting.In some embodiments, line or belt is made by steel (particularly rustless steel).
In some embodiments, escapement 115 can include otch or chamfering on its circumferential surface, to receive and to draw
Wire.The degree of depth of otch or chamfering can correspond essentially to the diameter of line, to guarantee the mid portion of line with curtain 300 even
Connect.
Fig. 9 illustrates the process part of the another equipment 600 for processing flexible base board according to embodiment described herein
Side cutaway view.
Equipment 600 includes processing chamber, painting drum 110, one or more sedimentary origin 120 and shutter device, institute
Stating painting drum 110 in the processing chamber and to be configured to support flexible base board, one or more sedimentary origin 120 are arranged in
Processing in chamber, described shutter device is arranged in processing chamber and is configured to sink with one or more at painting drum 110
Mobile curtain 300 between long-pending source 120.
In some embodiments, painting drum 110 can by shielding construction institute around, with protection setting processing in chamber
At least some element, the most such as make painting drum 110, chiller and electronic installation to deposition material dirt
Dye or the driver of coating.
According to some embodiments can being combined with other embodiments as herein described, shutter device can include that at least one draws
Guide rail 620 and at least one support 621, at least one support 621 described is configured to may move along guide rail 620.Support 621
It is connectable to curtain 300, so that curtain 300 moves between painting drum 110 and one or more sedimentary origin 120,
Particularly make the curtain 300 gap between painting drum 110 and one or more sedimentary origin 120 is moved.This is at least
One guide rail 620 and at least one support 621 can be provided only on the side of painting drum 110.Equally, at least one guides
Rail 620 and at least one support 621 may be provided on every side of painting drum 110.As example, guide rail 620 can be installed
On escapement 115, as shown in Figure 9.Shutter device can configure as described above with reference to Figure 1.
In some embodiments, shutter device can include one or more roller receptor 610, is configured to winding
And/or unwinding curtain 300.One or more roller receptor 610 is configurable to receive curtain 300, particularly has
The roller that curtain 300 is wound thereon.Therefore, if desired, it is readily replaceable there is the roller of curtain 300.Implement at some
In example, the first end of curtain 300 is connectable to roller receptor 610.As example, the first end of curtain 300 can connect
It is connected to roller receptor 610, and the second end of curtain 300 is connectable to support 621.
According to some embodiments can being combined with other embodiments as herein described, one or more roller receptor 610
May be provided in process chamber.And curtain 300 can (the most complete) be arranged in process chamber, and is not arranged in processing chamber
Outdoor.Need not guide curtain to processing in chamber from outside (such as passing through vacuum lock).So contribute to not breaking
Cleaning treatment chamber in the case of vacuum in harm reason chamber.
But, in other embodiments, at least one roller receptor 610 may be provided at the outside processing chamber.At this
In the case of Zhong, curtain 300 can such as be supplied to processing in chamber from outside by air lock.In this configuration, curtain
The first end of 300 is still connectable to roller receptor 610, and the second end of curtain 300 is connectable to shutter device, especially
It it is support 621.
In some embodiments, one or more roller receptor 610 may be provided at the lower section of painting drum 110.Logical
Cross the lower section that one or more roller receptor 610 is positioned at painting drum 110, from one or more roller receptor 610
And/or the granule that discharges of curtain 300 falls to such as process the bottom of chamber, without arriving or crossing crystallizing field.Mirror
In this, can prevent depositing operation from being polluted by impurity, and particularly prevent coating from being polluted by impurity.
It is arbitrary that one or more roller receptor 610 can be configured in the roller receptor 220 described in above-mentioned Fig. 1 to Fig. 8
Person.
In some other embodiments, equipment 600 can include the first roller receptor and the second roller receptor.As showing
Example, the first end of curtain 300 is connectable to the first roller receptor, and/or the second end of curtain 300 is connectable to
Two roller receptors.First roller receptor and the second roller receptor can be configured to any one in above-mentioned roller receptor 220.Curtain
The mid portion of 300 is connectable to support 621.Therefore, curtain 300 can be moved by the movement of support 621, particularly by
Support moves along the movement of guide rail 620." mid portion " of term curtain 300 can represent first end and the second end
Any part of the curtain 300 between portion.
In some embodiments, the first roller receptor is arranged on the lower section of painting drum 110, and the second roller receptor is arranged
Above painting drum 110.In other words, the first roller receptor and the second roller receptor are arranged on the base of painting drum 110
In basis relative to side on.
In certain embodiments, the first roller receptor and/or the second roller receptor can include retraction mechanism, such as based on bullet
The retraction mechanism of spring, it provides and trends towards winding or roll the power of curtain 300.Therefore, curtain 300 by tension force so that
Especially can not wrinkling between painting drum and sedimentary origin 210 at curtain 300 or in the case of being wound around at painting drum with heavy
Curtain 300 is guided between long-pending source.
According to some embodiments can being combined with other embodiments as herein described, curtain 300 includes one or more
Individual otch 301.In some embodiments, one or more otch corresponds respectively to one or more sedimentary origin 120
Position.
In some embodiments, the support 621 of shutter device is configured to make curtain 300 at least primary importance and the
Move between two positions.As example, in primary importance, one or more otch can be arranged relative to painting drum 110,
Them are made to correspond to the position of one or more sedimentary origin 120.Due to sedimentary origin 120 in the face of flexible base board and the most betwixt
Curtain 300 is set, the depositing operation for processing flexible base board can be performed.In the second position, curtain 300 may be provided at
Between sedimentary origin 120 and painting drum, in order to shielding is provided.Specifically, curtain 300 can cover the district below sedimentary origin
Territory, can carry out plasma clean in the case of not affecting flexible base board and/or painting drum.More particularly, curtain
300 regions that can cover all handling implements (such as sedimentary origin 120) lower section.
In consideration of it, need not destroy before cleaning vacuum because the support of shutter device 621 can during cleaning,
Even move curtain to protect painting drum 110 when processing cavity seal or suction.Further, the present embodiment allows to perform clearly
Wash technique (such as NF3 cleaning) and do not remove flexible base board (such as from plasma clean region).In order to remove flexibility
Substrate and to purify chamber and ventilate be unnecessary.
Figure 10 illustrates the method processing chamber for cleaning flexible base board processing equipment according to embodiment described herein
Flow chart.
Generally, embodiment as herein described relates to the flexible base board equipment being as above illustratively described, and for clear
Wash the apparatus and method processing chamber of the most such equipment.For example, Figure 10 illustrates for not destroying process chamber
The side processing chamber of flexible base board processing equipment is cleaned in the case of vacuum in room and/or in the case of not removing substrate
Method 700.The method include guiding be arranged on process chamber in and curtain (frame between painting drum and at least one sedimentary origin
701)；Start the first suction in the processing chamber and purify technique (frame 702)；There is provided cleaning or etching gas to processing chamber
(frame 703)；Plasma clean processes chamber (frame 704)；And start the second suction in the processing chamber and purify technique (frame
705)。
Therefore, these steps (especially with regard to suction and purifying step) order can be arbitrary, as long as wait from
During daughter is cleaned, curtain is set between painting drum and at least one sedimentary origin.
According to embodiment described herein, the above-mentioned method processing chamber for cleaning flexible base board processing equipment can include
The many additional steps started according to demand and/or technique.
The frame 701 guiding the curtain in being arranged on process chamber and between painting drum and at least one sedimentary origin can profit
With above-mentioned referring to figs. 1 to any shutter device described by Fig. 8.
The first suction and/or purification process 702 can be started, remove from process chamber with the place's process gases that will leave over.Greatly
On body, first start pump, discharge from processing chamber with process gases (the most highly reactive place's process gases) at inciting somebody to action.Afterwards, can will appoint
The purification gas (such as argon and nitrogen) of meaning is introduced to process in chamber, to contribute to purifying technique.Purifying gas can be then
It is drawn out of process chamber.Pump is generally processing the chamber interior generation moderate vacuum to height.For example, chamber interior is processed
Vacuum can be from 50 × 10-1Millibar (mbar) is to 10-7Any value in millibar scope, particularly from 10-2Millibar is to 10-6In the least
Any value of bar scope, such as 10-3Millibar.According to some embodiments, some process residue (such as gas or solid material)
May need to remove in cleaning step reach, to avoid undesired chemical reaction.This generally uses suction and purifies technique.According to
Some embodiments can being combined with other embodiments as herein described, this as described in suction and purify technique can include several
Circulation, at least two of such as following steps or at least 3 circulations: be pumped to 10-2About Hao Ba or following and with up to 10 millis
Bar purifies to the noble gas (such as argon or nitrogen) of the pressure of about 20 millibars.But, for some embodiments, only
Suction or only purification may just be enough to prepare processing equipment to clean.
Generally, suction and/or sustainable 5 minutes to 30 minutes interior random times of purification process 702, such as, such as 20
Minute.Additionally, this process can include several continuous suction and decontamination cycle, such as three circulations, each circulation is each continues 5 points
Clock.According to the embodiments herein, testing agency (such as with the form of sensor) can detect whether to need continuous suction and/or
Decontamination cycle is to remove place's process gases from processing chamber.This testing agency can automatically begin to purify and/or cleaning.
Generally, after potentially including the coating process of highly exothermic reaction, it may be desirable to cooling flexible base board processing equipment
Painting drum.Such as, can be in the first suction and/or purify after technique and/or the first suction and/or during purifying technique
Optional step cools down painting drum.
According to embodiment described herein, can start plasma clean (such as plasma etching) process frame 703, it can
By impurity and pollutant, the surface in processing chamber removes.Generally, plasma cleaning process in the first suction and/or purifies
Start after process.Plasma clean can be started, so that being introduced to by applying RF high frequency (2MHz to 2.45GHz) voltage
Process the such as fluorinated gas in chamber partly and/or ionizing fully.In embodiment described herein, process chamber and exist
Keep under low pressure during plasma cleaning process.For example, process chamber and maintain 10-1Millibar is to 10-4In Hao Ba
Under any pressure, such as 10-2Under the pressure of millibar.
Generally, the pollutant in order to control such as to process in chamber remove speed, RF high frequency (2MHz to 2.45GHz) energy
Intensity can be adjustable.Generally, can apply enough RF high frequency (2MHz to 2.45GHz) energy with produce high from
Daughter density, thus can ensure that high pollutant remove speed.Additionally, high plasma density can avoid the lower floor of pollutant
Three-dimensional cross-links, thus produces new construction that is stable but that do not remove.In the embodiments described herein, sensing can be used
Device and controller, to monitor and to adjust plasma density.
According to embodiment described herein, during plasma cleaning process, painting drum can be generally the most motionless
's.Curtain substantially covers painting drum, thus protects the surface the most washed plasma impact of painting drum.With can be with
Clean plasma reaction and the flexible base board that is thus damaged is contrary, according to the curtain of embodiment described herein relative to clearly
It can be inert for washing plasma, and can reuse in other cleaning processes.Which reduce the material (substrate) of waste
Amount, and can been considerably reduce CoO.Further, the risk of wounded substrate being reduced or avoided, wounded substrate can make cylinder pass through
The damaged portion of substrate is exposed to cleaning plasma.
According to embodiment described herein, plasma cleaning process can be according to the degree polluted and process on the persistent period
The size of chamber and change.For example, sustainable 2 minutes to 25 minutes of plasma cleaning process, the most persistently 5 minutes
To 20 minutes, such as 15 minutes.According to some embodiments can being combined with other embodiments as herein described, cleaning time
Between can be about 10% to 15% time of depositing operation.In the embodiments herein, plasma cleaning process also can wrap
Include a series of plasma clean circulation, described a series of plasma clean circulate in insert one or more suction and/
Or decontamination cycle is to remove purge gas from process chamber.In order to clear, these suctions and/or clean cycle will be claimed below
It is the second suction and/or purification process.
In the embodiments described herein, testing agency can detect pollutant and the most still residue in process chamber, and can
Start another suction and/or purification process, and/or start further plasma cleaning process, be followed by another suction
And/or purification process.Testing agency can start the most such cleaning process, until all of pollutant, cleans and/or processes
Gas removes from process chamber the most.
According to embodiment as herein described, clean to acceptable or predetermined level processing chamber, and the second suction
And/or after purification process frame 704 completes, the process to flexible base board can be proceeded by.
Embodiment as herein described relates generally to a kind of equipment for processing flexible base board, and a kind of for not
Destruction cleans the method processing chamber of flexible base board processing equipment in the case of processing the vacuum in chamber.This equipment includes place
Shutter device in reason chamber.Shutter device is configured between painting drum and one or more sedimentary origin mobile shielding
Paper tinsel, curtain may also be arranged in process chamber.Specifically, curtain can cover the region below sedimentary origin, and can be not
Plasma clean is carried out in the case of affecting flexible base board and/or painting drum.More particularly, curtain 300 can cover
The region of all handling implements (such as sedimentary origin 120) lower section.
In consideration of it, need not destroy before washing vacuum, because shutter device is arranged in process chamber, and can be clearly
Curtain is moved to protect painting drum during washing technique, even when processing cavity seal or emptying.Further, the present embodiment
Allow to perform cleaning (such as NF3 cleaning) and do not remove flexible base board (such as from plasma clean region).For
It is unnecessary for removing flexible base board and purifying chamber and ventilate.The length of flexible base board (such as web paper tinsel) is permissible
Up to hundreds of meters.Even if some technique have to be cleaned betwixt, such as before processing zig entirety, it is possible to not
Carry out in the case of removing flexible base board.Embodiment described herein can especially be coated with for web before being etched technique
Machine.
Although foregoing teachings is for embodiments of the invention, but can design the present invention other and further embodiment and
Without departing substantially from the elemental range of the present invention, and the scope of the present invention is determined by appended claims.
Claims (15)
1. for processing an equipment for flexible base board, including:
Process chamber；
Painting drum, described painting drum is in described process chamber and is configured to support described flexible base board；
One or more sedimentary origin, one or more sedimentary origin are arranged in described process chamber；And
Shutter device, described shutter device is arranged in described process chamber and is configured at described painting drum and described
Mobile curtain between individual or more sedimentary origin.
2. equipment as claimed in claim 1, farther includes one or more roller receptor, be configured to winding and/or
Unwinding described curtain, one or more roller receptor the most wherein said is arranged on the lower section of described painting drum.
3. equipment as claimed in claim 2, one or more roller receptor wherein said is arranged in described process chamber.
4. equipment as claimed in claim 2 or claim 3, wherein said roller receptor includes
First roller receptor, is configured to curtain described in winding and backing off, and the first end of the most wherein said curtain can
It is connected to described first roller receptor；And
Second roller receptor, is configured to curtain described in winding and backing off, and the second end of the most wherein said curtain can
It is connected to described second roller receptor.
5. equipment as claimed in claim 4, wherein said first roller receptor is arranged on the lower section of described painting drum, and/
Or described second roller receptor is arranged on the top of described painting drum.
6. the equipment as described in one in claim 1 to 5, wherein said shutter device includes at least one arm, described extremely
A few arm has Part I and Part II, and wherein said Part I provides the rotary shaft of described arm, and wherein said
Curtain is connectable to described Part II.
7. equipment as claimed in claim 6, the described rotary shaft of wherein said arm is arranged essentially parallel to described painting drum
Rotary shaft, the rotary shaft of the most wherein said arm is corresponding to the rotary shaft of described painting drum.
Equipment the most as claimed in claims 6 or 7, wherein said Part I is substantially perpendicular to the described of described painting drum
Rotary shaft extends, and the most described Part I at least extends to described painting from the described rotary shaft of described painting drum
The circumferential surface of cloth cylinder, and/or the parallel described rotary shaft extension with described painting drum of wherein said Part II, specifically
For along at least some of extension of circumferential surface of described painting drum.
9. the equipment as described in claim 4 or 5, wherein said shutter device farther includes line or belt, and described line or belt has
There are the first end and the second end, wherein said first end to be arranged at described first roller receptor, and described second end is arranged on institute
State at the second roller receptor, and the mid portion of wherein said line or belt is connectable to described curtain, with in described coating rolling
Mobile curtain between cylinder and one or more sedimentary origin.
10. the equipment as described in claim 4 or 5, wherein said shutter device farther includes guide rail and support, described
Frame is configured to may move along described guide rail, and wherein said support is connectable to described curtain with at described painting drum
And mobile curtain between one or more sedimentary origin.
The equipment as described in one in 11. such as claim 1 to 10, wherein said shutter device farther includes driver, institute
State driver and be configured between described painting drum and one or more sedimentary origin mobile described curtain, specifically come
Say that wherein said driver is motor.
12. 1 kinds of curtains used in the equipment as described in one in claim 1 to 11, wherein said curtain bag
Including one or more otch, one or more otch the most wherein said corresponds respectively to one or more
The position of sedimentary origin.
13. curtains as claimed in claim 12, wherein said curtain is made up of metal alloy, particularly rustless steel.
14. 1 kinds for cleaning the described process of flexible base board processing equipment in the case of not destroying the vacuum processed in chamber
The method of chamber, described equipment includes that shutter device, described shutter device are arranged in described process chamber and are configured to be coated with
Mobile curtain between cloth cylinder and one or more sedimentary origin, described method includes:
By described shutter device, between described painting drum and one or more sedimentary origin, guide described shielding
Paper tinsel；
In described process chamber, start the first suction and purify technique；
There is provided and clean or etching gas extremely described process chamber；
Chamber is processed described in plasma clean；And
In described process chamber, start the second suction and purify technique.
15. methods as claimed in claim 14, wherein between described painting drum and one or more sedimentary origin
The step guiding described curtain includes:
At described painting drum or the described flexible base board that is placed on described painting drum and one or more sedimentary origin
Between arrange gap in guiding described curtain, particularly do not contacting described painting drum or be placed on described painting drum
Described flexible base board in the case of.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2014/056826 WO2015149869A1 (en) | 2014-04-04 | 2014-04-04 | Apparatus for processing a flexible substrate and method for cleaning a processing chamber thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106170584A true CN106170584A (en) | 2016-11-30 |
| CN106170584B CN106170584B (en) | 2019-08-02 |
Family
ID=50478379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480077770.4A Expired - Fee Related CN106170584B (en) | 2014-04-04 | 2014-04-04 | For handling the equipment of flexible base board and cleaning the method for its processing chamber housing |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6356824B2 (en) |
| KR (1) | KR101969533B1 (en) |
| CN (1) | CN106170584B (en) |
| TW (1) | TWI636154B (en) |
| WO (1) | WO2015149869A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109415804A (en) * | 2017-06-14 | 2019-03-01 | 应用材料公司 | Depositing device for coating flexible substrate |
| CN113544306A (en) * | 2019-03-05 | 2021-10-22 | 施福克私人有限公司 | Improved vapor deposition system, method and humidity control device |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102430579B1 (en) * | 2015-12-30 | 2022-08-08 | 엘지디스플레이 주식회사 | Deposition apparatus of roll-to-roll type |
| WO2018149510A1 (en) * | 2017-02-20 | 2018-08-23 | Applied Materials, Inc. | Deposition apparatus for coating a flexible substrate and method of coating a flexible substrate |
| JP2019534938A (en) * | 2017-09-26 | 2019-12-05 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Material deposition apparatus, vacuum deposition system, and method for performing vacuum deposition |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5215589A (en) * | 1992-03-10 | 1993-06-01 | Leybold Aktiengesellschaft | High-vacuum coating apparatus |
| CN2682087Y (en) * | 2004-02-17 | 2005-03-02 | 杨金波 | Roll-down type double cathode plane magnetron sputtering metallic film resistant film plating device |
| CN101601121A (en) * | 2006-12-01 | 2009-12-09 | 应用材料股份有限公司 | Electroplate the method and apparatus of rolling flexible solar cell substrates |
| US20110065282A1 (en) * | 2009-09-11 | 2011-03-17 | General Electric Company | Apparatus and methods to form a patterned coating on an oled substrate |
| CN102844838A (en) * | 2010-01-15 | 2012-12-26 | 索罗能源公司 | Roll-to-roll evaporation system and method to manufacture group ibiiiavia photovoltaics |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000239849A (en) * | 1999-02-25 | 2000-09-05 | Hitachi Maxell Ltd | Continuous plasma cvd method and cvd device |
| JP4817313B2 (en) * | 2006-09-01 | 2011-11-16 | 株式会社アルバック | Winding type plasma CVD equipment |
| US8900471B2 (en) * | 2009-02-27 | 2014-12-02 | Applied Materials, Inc. | In situ plasma clean for removal of residue from pedestal surface without breaking vacuum |
| WO2012146310A1 (en) * | 2011-04-29 | 2012-11-01 | Applied Materials, Inc. | Devices and methods for passivating a flexible substrate in a coating process |
| DE102012209051A1 (en) * | 2012-05-30 | 2013-12-05 | Roth & Rau Ag | Receiving a coating material in vacuum coating plants by a cover on a side of a planar substrate, comprises moving the cover such that it permanently receives a part of the coating material non-absorbed by the substrate |
-
2014
- 2014-04-04 JP JP2016559548A patent/JP6356824B2/en not_active Expired - Fee Related
- 2014-04-04 KR KR1020167031017A patent/KR101969533B1/en active IP Right Grant
- 2014-04-04 WO PCT/EP2014/056826 patent/WO2015149869A1/en active Application Filing
- 2014-04-04 CN CN201480077770.4A patent/CN106170584B/en not_active Expired - Fee Related
-
2015
- 2015-04-01 TW TW104110587A patent/TWI636154B/en not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5215589A (en) * | 1992-03-10 | 1993-06-01 | Leybold Aktiengesellschaft | High-vacuum coating apparatus |
| CN2682087Y (en) * | 2004-02-17 | 2005-03-02 | 杨金波 | Roll-down type double cathode plane magnetron sputtering metallic film resistant film plating device |
| CN101601121A (en) * | 2006-12-01 | 2009-12-09 | 应用材料股份有限公司 | Electroplate the method and apparatus of rolling flexible solar cell substrates |
| US20110065282A1 (en) * | 2009-09-11 | 2011-03-17 | General Electric Company | Apparatus and methods to form a patterned coating on an oled substrate |
| CN102844838A (en) * | 2010-01-15 | 2012-12-26 | 索罗能源公司 | Roll-to-roll evaporation system and method to manufacture group ibiiiavia photovoltaics |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109415804A (en) * | 2017-06-14 | 2019-03-01 | 应用材料公司 | Depositing device for coating flexible substrate |
| CN113544306A (en) * | 2019-03-05 | 2021-10-22 | 施福克私人有限公司 | Improved vapor deposition system, method and humidity control device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101969533B1 (en) | 2019-04-16 |
| CN106170584B (en) | 2019-08-02 |
| JP2017509798A (en) | 2017-04-06 |
| KR20160141840A (en) | 2016-12-09 |
| TWI636154B (en) | 2018-09-21 |
| JP6356824B2 (en) | 2018-07-11 |
| WO2015149869A1 (en) | 2015-10-08 |
| TW201606122A (en) | 2016-02-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106170584A (en) | For processing the equipment of flexible base board and cleaning its method processing chamber | |
| JP6360882B2 (en) | Deposition platform for flexible substrates and method of operation thereof | |
| CN104968830B (en) | Sedimentary origin with adjustable electrode | |
| JP6546930B2 (en) | Apparatus and method for thin film processing applications | |
| JP7117332B2 (en) | Deposition apparatus for coating flexible substrates and method of coating flexible substrates | |
| CN104968831B (en) | The gas separation carried out by adjustable separation wall | |
| CN108603291A (en) | Vacuum flush system and its method | |
| TWI583815B (en) | Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device and method for operating same | |
| EP2827359B1 (en) | Cleaning method for thin-film processing applications and apparatus for use therein | |
| CN104968833B (en) | Public deposition platform, treating stations and its operating method | |
| CN108425098A (en) | System and method for handling substrate | |
| JP5144393B2 (en) | Plasma CVD film forming method and plasma CVD apparatus | |
| TW201737318A (en) | Apparatus for processing a thin film on a substrate, and method for providing a gas tight process separating wall | |
| KR20130023646A (en) | Roll to roll apparaturs for manufacturing thin film | |
| KR20150073295A (en) | Roll to roll dry system for removing outgassing of flexible film | |
| JPH0641753A (en) | Plasma cvd device | |
| KR20150056117A (en) | Vertical sputter equipment | |
| EP2916350A1 (en) | Interleaf structure for a processing apparatus and processing apparatus with interleaf structure | |
| KR20160134267A (en) | Deposition System | |
| JP6209039B2 (en) | Thin film forming equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190802 Termination date: 20210404 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |