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CN105629680A - UV-LED mixed wavelength light source system for exposure machine - Google Patents

UV-LED mixed wavelength light source system for exposure machine Download PDF

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Publication number
CN105629680A
CN105629680A CN201610194248.5A CN201610194248A CN105629680A CN 105629680 A CN105629680 A CN 105629680A CN 201610194248 A CN201610194248 A CN 201610194248A CN 105629680 A CN105629680 A CN 105629680A
Authority
CN
China
Prior art keywords
led
exposure machine
source system
water inlet
inlet pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610194248.5A
Other languages
Chinese (zh)
Inventor
张文明
汤正光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Zunchen Electronics Co Ltd
Original Assignee
Kunshan Zunchen Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunshan Zunchen Electronics Co Ltd filed Critical Kunshan Zunchen Electronics Co Ltd
Priority to CN201610194248.5A priority Critical patent/CN105629680A/en
Publication of CN105629680A publication Critical patent/CN105629680A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2041Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)

Abstract

The invention discloses a UV-LED mixed wavelength light source system for an exposure machine. The UV-LED mixed wavelength light source system comprises a glass tube, a UV-LED lamp panel, a rotary mechanism, a conductive mechanism, a cooling mechanism and two mounting support seats, wherein the cooling mechanism and the rotary mechanism are connected with each other via gear transmission; the mounting support seats are arranged on two sides of the cooling mechanism respectively; the cooling mechanism is rotationally positioned in the mounting support seats; the UV-LED lamp panel is fixed on the cooling mechanism; the glass tube is fixedly connected onto the cooling mechanism via two glass tube fixing sleeves; the glass tubes cover the UV-LED lamp panel; the conductive mechanism is fixedly mounted on the cooling mechanism, in the mounting support seats, and electrically connected with the LED lamp panel. The UV-LED mixed wavelength light source system has the advantages that the product quality of the exposure machine can be improved; the production cost is reduced; the electrical consumption of the exposure machine can be reduced; the UV-LED mixed wavelength light source system can directly replace a metal halogen exposure lamp tube while modification of a mechanism on the exposure machine is not needed.

Description

For the UV-LED mixed wavelengths light-source system of exposure machine
Technical field
The present invention relates to the light source field of exposure machine, specifically, it relates to a kind of UV-LED mixed wavelengths light-source system for exposure machine.
Background technology
The currently used exposure light source overwhelming majority of general exposure machine is all also at use metal halogen exposure lamp pipe, but the fluorescent tube of this type has following shortcoming: 1 acceptable life is only 800-1000 hour, must often change fluorescent tube, and optical attenuation rate reaches more than 30%, seriously have impact on the production efficiency of exposure machine and the quality of production. 2. current consumption is big, difficult point lamp, efficiency are low, heat height. 3. arrive required ultraviolet work energy intensity slowly (more than 15 minutes) and must be always bright after starting, not only cause unnecessary power loss also to shorten the working life of metal halogen exposure lamp pipe.
Then having following advantage relative to UV-LED light source: the life-span of 1.UV-LED lamp can reach 20000-30000 hour, optical attenuation degree only has within 3%. The mode of operation of 2.UV-LED be can the only instant igniting when needs ultraviolet, decrease the time changing fluorescent tube. 3. low power consumption, equal illumination current consumption only needs the 20% of metal halogen exposure lamp pipe.
If so the metal halogen exposure lamp pipe light source that can be used by exposure machine as early as possible all changes UV-LED light source into, get final product obvious improving product quality and efficiency, and greatly reduce productive expense.
Summary of the invention
It is an object of the invention to overcome the above problem of prior art existence, it is provided that a kind of UV-LED mixed wavelengths light-source system for exposure machine, it is possible to promote quality product and the efficiency of exposure machine, reduce productive expense, reduce the current consumption of exposure machine.
For realizing above-mentioned technical purpose, reaching above-mentioned technique effect, the present invention is achieved through the following technical solutions:
A kind of UV-LED mixed wavelengths light-source system for exposure machine, it is characterized in that: comprise Glass tubing, UV-LED lamp plate, rotating mechanism, conductive mechanism, cooling body, seat is supported with installation, described cooling body is connected by geartransmission with described rotating mechanism, described install that to support seat be two and lays respectively at the both sides of described cooling body, described cooling body rotational positioning supports in seat in described installation, described UV-LED lamp plate is fixed on described cooling body, described Glass tubing is fixedly connected on described cooling body by two Glass tubing permanent sleeves, described Glass tubing cover establishes residence to state UV-LED lamp plate, described conductive mechanism is fixedly mounted on described cooling body, described conductive mechanism is arranged in described installation and supports seat, described conductive mechanism and described UV-LED lamp plate are electrically connected.
As a further improvement on the present invention, described cooling body comprises cooling spindle tube, water inlet pipe and rising pipe, described water inlet pipe is fixedly connected on the two ends of described cooling spindle tube and is connected with described cooling spindle tube with rising pipe, also comprising into water joint and water out adapter, described water inlet joint and described water out adapter are fixedly connected on the end of described water inlet pipe and rising pipe respectively.
As a further improvement on the present invention, described two Glass tubing permanent sleeves respectively permanent sleeve be located at the joining place of described cooling spindle tube and described water inlet pipe and rising pipe, the two ends of described Glass tubing are fixedly connected on described two Glass tubing permanent sleeves respectively.
As a further improvement on the present invention, described rotating mechanism comprises electronic motor, retaining plate, the first spot contact bearing and first and second gear, described electronic motor is fixed on described retaining plate, described first gear permanent sleeve is located in the rotating shaft of described electronic motor, described 2nd gear permanent sleeve is located on described water inlet pipe, first and second gear described engages each other, through hole has been offered in the centre of described retaining plate, described first spot contact bearing is fixed in described through hole, and the head rotation of described water inlet pipe is located in described first spot contact bearing.
As a further improvement on the present invention, described UV-LED lamp plate comprises some circuit cards and some UV-LED chipsets, the described even interval of UV-LED chipset is fixed on described circuit card, described circuit card is rectangle, described circuit card mutually flexibly connect and set collar around on the surface of described cooling spindle tube.
As a further improvement on the present invention, described conductive mechanism comprises two conduction rings, leads permanent sleeve respectively and is located on described water inlet pipe and rising pipe for described two, described conduction ring and the electric connection of described UV-LED lamp plate.
As a further improvement on the present invention, described installation in support seat is provided with for the pilot hole that described conduction ring is placed, described installation supports in seat and is fixed with the 2nd rolling bearing, described 2nd rolling bearing is positioned at the side of described conduction ring away from described Glass tubing permanent sleeve, described water inlet pipe and rising pipe rotate respectively and are located in described 2nd rolling bearing, and described water inlet pipe and rising pipe pass all described installation and support seat.
As a further improvement on the present invention, described cooling spindle tube is hexagonal tube, and described water inlet pipe and rising pipe are circular pipe, and described cooling main shaft and described water inlet pipe and rising pipe are one-body molded.
As a further improvement on the present invention, described UV-LED chipset comprise five kinds of wavelength regions, be respectively: 365-370nm, 380-390nm, 390-410nm, 420-430nm, 430-450nm.
The invention has the beneficial effects as follows: the UV-LED mixed wavelengths light-source system for exposure machine that the present invention proposes promotes the quality product of exposure machine, reduce the productive expense of exposure machine simultaneously, the current consumption of exposure machine can be reduced, directly can expose fluorescent tube and must not revise the mechanism on exposure machine by substituted metal halogen.
Above-mentioned explanation is only the general introduction of technical solution of the present invention, in order to better understand the technique means of the present invention, and can be implemented according to the content of specification sheets, below with the better embodiment of the present invention and coordinate accompanying drawing to be described in detail as follows. The specific embodiment of the present invention is provided in detail by following examples and accompanying drawing thereof.
Accompanying drawing explanation
Accompanying drawing described herein is used to provide a further understanding of the present invention, forms the part of the application, and the schematic description and description of the present invention, for explaining the present invention, does not form inappropriate limitation of the present invention. In the accompanying drawings:
Fig. 1 is this structural representation for the UV-LED mixed wavelengths light-source system of exposure machine;
Fig. 2 is the explosive view of the present invention for the UV-LED mixed wavelengths light-source system of exposure machine;
Fig. 3 is the group vertical figure of the present invention for the UV-LED mixed wavelengths light-source system of exposure machine;
Fig. 4 is the structural representation of UV-LED lamp plate of the present invention;
Fig. 5 connection diagram that to be the present invention work for the UV-LED mixed wavelengths light-source system of exposure machine;
Fig. 6 is the schematic diagram that existing metal halogen exposure lamp pipe is arranged in lamp box;
Fig. 7 is the schematic diagram that UV-LED fluorescent tube of the present invention is arranged in lamp box.
Embodiment
Below with reference to the accompanying drawings and in conjunction with the embodiments, the present invention is described in detail.
Embodiment: a kind of UV-LED mixed wavelengths light-source system for exposure machine, comprise Glass tubing 1, UV-LED lamp plate 2, rotating mechanism 3, conductive mechanism 4, cooling body 5, seat 6 is supported with installation, described cooling body is connected by geartransmission with described rotating mechanism, described install that to support seat be two and lays respectively at the both sides of described cooling body, described cooling body rotational positioning supports in seat in described installation, described UV-LED lamp plate is fixed on described cooling body, described Glass tubing is fixedly connected on described cooling body by two Glass tubing permanent sleeves 7, described Glass tubing cover establishes residence to state UV-LED lamp plate, described conductive mechanism is fixedly mounted on described cooling body, described conductive mechanism is arranged in described installation and supports seat, described conductive mechanism and described UV-LED lamp plate are electrically connected.
Described cooling body comprises cooling spindle tube 51, water inlet pipe 52 and rising pipe 53, described water inlet pipe is fixedly connected on the two ends of described cooling spindle tube and is connected with described cooling spindle tube with rising pipe, also comprising into water joint 9 and water out adapter 10, described water inlet joint and described water out adapter are fixedly connected on the end of described water inlet pipe and rising pipe respectively.
Described two Glass tubing permanent sleeves respectively permanent sleeve be located at the joining place of described cooling spindle tube and described water inlet pipe and rising pipe, the two ends of described Glass tubing are fixedly connected on described two Glass tubing permanent sleeves respectively.
Described rotating mechanism comprises electronic motor 31, retaining plate 32, first spot contact bearing 33 and first and second gear 34,35, described electronic motor is fixed on described retaining plate, described first gear permanent sleeve is located in the rotating shaft of described electronic motor, described 2nd gear permanent sleeve is located on described water inlet pipe, first and second gear described engages each other, through hole has been offered in the centre of described retaining plate, described first spot contact bearing is fixed in described through hole, and the head rotation of described water inlet pipe is located in described first spot contact bearing.
Described UV-LED lamp plate comprises some circuit cards 21 and some UV-LED chipsets 22, the described even interval of UV-LED chipset is fixed on described circuit card, described circuit card is rectangle, described circuit card mutually flexibly connect and set collar around on the surface of described cooling spindle tube.
Described conductive mechanism comprises two conduction rings 41, leads permanent sleeve respectively and is located on described water inlet pipe and rising pipe for described two, described conduction ring and the electric connection of described UV-LED lamp plate.
Described installation in support seat is provided with for the pilot hole 61 that described conduction ring is placed, described installation supports in seat and is fixed with the 2nd rolling bearing 8, described 2nd rolling bearing is positioned at the side of described conduction ring away from described Glass tubing permanent sleeve, described water inlet pipe and rising pipe rotate respectively and are located in described 2nd rolling bearing, and described water inlet pipe and rising pipe pass all described installation and support seat.
Described cooling spindle tube is hexagonal tube, and described water inlet pipe and rising pipe are circular pipe, and described cooling main shaft and described water inlet pipe and rising pipe are one-body molded. Certainly cooling spindle tube can also be other polygonal tube.
Described UV-LED chipset comprise five kinds of wavelength regions, be respectively: 365-370nm, 380-390nm, 390-410nm, 420-430nm, 430-450nm. And the chip of different wavelength range can be increased and decreased according to the needs of product, such as: UV-LED chipset also can only comprise 365-370nm, 380-390nm, 390-410nm tri-kinds of wavelength regions.
This for the principle of work of the UV-LED mixed wavelengths light-source system of exposure machine is: the water-in and water-out interface on cooling body is connected to cold water equipment, makes the cooling fluid in cooling spindle tube keep circulating and remain under set temperature;
The 2nd gear combination on the first gear comprised by rotating mechanism, the first rolling bearing and electronic motor is got up, and UV-LED lamp plate can be driven to rotate when electronic motor starting, can be mixed uniformly by the UV-LED light of five kinds of different wavelength range;
The cooling spindle tube that UV-LED lamp plate is installed on cooling body is on the surface, when cooling logical full cooling fluid in spindle tube, owing to UV-LED lamp back is fitted on cooling spindle tube table body completely, can rapidly the heat on UV-LED lamp plate lamp plate be taken away when making UV-LED lamp startup lamp bright;
The ring that conducts electricity two is connected to the positive and negative electrode contact of UV-LED lamp plate and LED power supply respectively, makes when UV-LED lamp plate rotates, and electric current, by the connection by two conduction rings, makes the state that UV-LED can keep lamp bright;
Glass tubing is installed, UV-LED lamp plate can be protected;
Whole system, by comprising PLC and the circuit control unit of related electric control part, controls unlatching and the closedown of UV-LED lamp.
The operating method of this UV-LED mixed wavelengths light-source system being used for exposure machine comprises following step:
One. cooling body connects cold water equipment;
Two. UV-LED lamp plate is connected UV-LED power supply unit;
Three. UV-LED lamp plate is connected PLC circuit control unit;
Four. start cold water equipment and make cooling body keep cooling fluid to be in recurrent state;
Five. start UV-LED power supply unit and UV-LED lamp plate is lighted;
Six. start electronic motor and UV-LED lamp plate is rotated;
Seven. unlatching and the closedown of UV-LED lamp plate can be controlled through the I/O signal of PLC;
The UV-LED light of the different wavelength range that eight .UV-LED lamp plates send, assembles, via rotation and lamp box reflector plate, the illumination promoting light, and Homogeneous phase mixing exposes to exposure region together.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations. Within the spirit and principles in the present invention all, any amendment of doing, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.

Claims (9)

1. the UV-LED mixed wavelengths light-source system for exposure machine, it is characterized in that: comprise Glass tubing, UV-LED lamp plate, rotating mechanism, conductive mechanism, cooling body, seat is supported with installation, described cooling body is connected by geartransmission with described rotating mechanism, described install that to support seat be two and lays respectively at the both sides of described cooling body, described cooling body rotational positioning supports in seat in described installation, described UV-LED lamp plate is fixed on described cooling body, described Glass tubing is fixedly connected on described cooling body by two Glass tubing permanent sleeves, described Glass tubing cover establishes residence to state UV-LED lamp plate, described conductive mechanism is fixedly mounted on described cooling body, described conductive mechanism is arranged in described installation and supports seat, described conductive mechanism and described UV-LED lamp plate are electrically connected.
2. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 1, it is characterized in that: described cooling body comprises cooling spindle tube, water inlet pipe and rising pipe, described water inlet pipe is fixedly connected on the two ends of described cooling spindle tube and is connected with described cooling spindle tube with rising pipe, also comprising into water joint and water out adapter, described water inlet joint and described water out adapter are fixedly connected on the end of described water inlet pipe and rising pipe respectively.
3. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 2, it is characterized in that: described two Glass tubing permanent sleeves respectively permanent sleeve be located at the joining place of described cooling spindle tube and described water inlet pipe and rising pipe, the two ends of described Glass tubing are fixedly connected on described two Glass tubing permanent sleeves respectively.
4. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 3, it is characterized in that: described rotating mechanism comprises electronic motor, retaining plate, first spot contact bearing and first, two gears, described electronic motor is fixed on described retaining plate, described first gear permanent sleeve is located in the rotating shaft of described electronic motor, described 2nd gear permanent sleeve is located on described water inlet pipe, described first, two gears engage each other, through hole has been offered in the centre of described retaining plate, described first spot contact bearing is fixed in described through hole, the head rotation of described water inlet pipe is located in described first spot contact bearing.
5. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 4, it is characterized in that: described UV-LED lamp plate comprises some circuit cards and some UV-LED chipsets, the described even interval of UV-LED chipset is fixed on described circuit card, described circuit card is rectangle, described circuit card mutually flexibly connect and set collar around on the surface of described cooling spindle tube.
6. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 5, it is characterized in that: described conductive mechanism comprises two conduction rings, leading permanent sleeve respectively and be located on described water inlet pipe and rising pipe for described two, described conduction ring and described UV-LED lamp plate are electrically connected.
7. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 6, it is characterized in that: described installation in support seat is provided with for the pilot hole that described conduction ring is placed, described installation supports in seat and is fixed with the 2nd rolling bearing, described 2nd rolling bearing is positioned at the side of described conduction ring away from described Glass tubing permanent sleeve, described water inlet pipe and rising pipe rotate respectively and are located in described 2nd rolling bearing, and described water inlet pipe and rising pipe pass all described installation and support seat.
8. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 7, it is characterized in that: described cooling spindle tube is hexagonal tube, described water inlet pipe and rising pipe are circular pipe, and described cooling main shaft and described water inlet pipe and rising pipe are one-body molded.
9. the UV-LED mixed wavelengths light-source system for exposure machine according to claim 8, it is characterized in that: described UV-LED chipset comprise five kinds of wavelength regions, be respectively: 365-370nm, 380-390nm, 390-410nm, 420-430nm, 430-450nm.
CN201610194248.5A 2016-03-30 2016-03-30 UV-LED mixed wavelength light source system for exposure machine Pending CN105629680A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610194248.5A CN105629680A (en) 2016-03-30 2016-03-30 UV-LED mixed wavelength light source system for exposure machine

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Application Number Priority Date Filing Date Title
CN201610194248.5A CN105629680A (en) 2016-03-30 2016-03-30 UV-LED mixed wavelength light source system for exposure machine

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CN105629680A true CN105629680A (en) 2016-06-01

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106054538A (en) * 2016-06-13 2016-10-26 马颖鏖 Optical light mixing illumination system of ultraviolet exposure machine
CN107091419A (en) * 2017-04-28 2017-08-25 中蕊(武汉)光电科技有限公司 Ultraviolet LED light source, ultraviolet catalytic oil saving structure and ultraviolet catalytic fuel saving method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201066678Y (en) * 2007-07-23 2008-05-28 钟德铧 Automatically overturning half-enclosed long residual brightness tube lamp
CN102425764A (en) * 2011-09-28 2012-04-25 长春德信光电技术有限公司 Automatic optical axis adjusting device of laser illuminator
CN103592821A (en) * 2013-10-16 2014-02-19 浙江欧视达科技有限公司 Novel LED (light-emitting diode) light source system for ultraviolet exposure machine
CN104964180A (en) * 2015-06-15 2015-10-07 徐虹 Omnidirectional photocatalyst super-power LED lamp
CN205485279U (en) * 2016-03-30 2016-08-17 昆山尊宸电子有限公司 A mixed wavelength light source system of UV -LED for exposure machine

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201066678Y (en) * 2007-07-23 2008-05-28 钟德铧 Automatically overturning half-enclosed long residual brightness tube lamp
CN102425764A (en) * 2011-09-28 2012-04-25 长春德信光电技术有限公司 Automatic optical axis adjusting device of laser illuminator
CN103592821A (en) * 2013-10-16 2014-02-19 浙江欧视达科技有限公司 Novel LED (light-emitting diode) light source system for ultraviolet exposure machine
CN104964180A (en) * 2015-06-15 2015-10-07 徐虹 Omnidirectional photocatalyst super-power LED lamp
CN205485279U (en) * 2016-03-30 2016-08-17 昆山尊宸电子有限公司 A mixed wavelength light source system of UV -LED for exposure machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106054538A (en) * 2016-06-13 2016-10-26 马颖鏖 Optical light mixing illumination system of ultraviolet exposure machine
CN107091419A (en) * 2017-04-28 2017-08-25 中蕊(武汉)光电科技有限公司 Ultraviolet LED light source, ultraviolet catalytic oil saving structure and ultraviolet catalytic fuel saving method

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