CN105457843A - Photoresist coating device and phtoresist coating method - Google Patents
Photoresist coating device and phtoresist coating method Download PDFInfo
- Publication number
- CN105457843A CN105457843A CN201610033569.7A CN201610033569A CN105457843A CN 105457843 A CN105457843 A CN 105457843A CN 201610033569 A CN201610033569 A CN 201610033569A CN 105457843 A CN105457843 A CN 105457843A
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- Prior art keywords
- substrate
- glue
- light blockage
- telling
- head body
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The invention provides a photoresist coating device and a photoresist coating method. The photoresist coating method is performed by adopting a vertical whole-face adhesive spitting mode, an adhesive is sprayed on the surface of a substrate through needlelike adhesive spitting nozzles which are densely distributed on a coating spray head, the photoresist adhesive can be naturally flattened on the surface of the substrate to form a film under the action of gravity and surface tension, the film is vertically pulled to grow by continuously supplementing the adhesive, the adhesive spitting nozzles are controlled to stop spraying the adhesive when the thickness of the film formed on the surface of the substrate reaches a preset range, and then the vertical whole-face adhesive spitting action is completed. Compared with an existing photoresist coating method adopting a horizontal coating mode, the photoresist coating method has the advantages that on the condition that the adhesive spitting uniformity and the film thickness stability are guaranteed, the coating time is greatly shortened, and therefore the productivity is improved.
Description
Technical field
The present invention relates to the manufacture field of display floater, particularly relate to a kind of light blockage coating device and light blockage coating method.
Background technology
Thin-film transistor LCD device (ThinFilmTransistorLiquidCrystalDisplay, TFT-LCD) has that fuselage is thin, power saving, the many merits such as radiationless, be widely used.Liquid crystal indicator major part on existing market is backlight liquid crystal indicator, and it comprises display panels and backlight module (backlightmodule).Usual display panels is by color film (CF, ColorFilter) substrate, tft array substrate, be sandwiched in liquid crystal (LC, LiquidCrystal) between color membrane substrates and tft array substrate and sealing frame glue (Sealant) composition; Its moulding process generally comprises: leading portion array (Array) processing procedure becomes box (Cell) processing procedure (tft array substrate and CF baseplate-laminating) and back segment module group assembling (Module) processing procedure (drive IC and printed circuit board (PCB) pressing) with CF processing procedure (film, gold-tinted, etching and stripping), stage casing; Wherein, leading portion Array processing procedure mainly forms TFT substrate, so that control the motion of liquid crystal molecule; Leading portion CF processing procedure mainly forms CF substrate; Stage casing Cell processing procedure mainly adds liquid crystal between TFT substrate and CF substrate; The integration of back segment module group assembling processing procedure mainly drive IC pressing and printed circuit board (PCB), and then drive liquid crystal molecule to rotate, display image.
CF substrate is the main devices that LCD is used for realizing colored display, and its basic comprising generally includes: glass substrate, black matrix" (BlackMatrix, BM), colored color blocking layer etc.The light that backlight sends incides CF substrate through the modulation of liquid crystal molecule, the filter action of the red color resistance of color blocking layer, green color blocking and the blue color blocking of being enameled by CF substrate, show red respectively, green, blue three kinds of light, the light of the color blocking difference TEM investigation color bands of different colours, thus realize the colour display of display.In the middle of CF processing procedure, comprise the processing procedures such as light blockage coating, exposure, development, wherein, light blockage coating is an of paramount importance link beyond doubt, and the uniformity of light blockage coating and the thickness of photoresistance have very important impact for display effect.
Traditional light blockage coating mode is: as shown in Figure 1, first coating shower nozzle 500 is carried out contraposition with the substrate 100 be placed on plummer 200, and coating shower nozzle 500 is provided with the gap nozzle 510 corresponding with the width of substrate 100; Then, as shown in Figure 2, the gap nozzle 510 controlled on described coating shower nozzle 500 tells glue, forms the photoresistance bundle (beam) 110 ' across substrate 100 on the substrate 100; Afterwards, as shown in Figure 3, by the mode of horizontally tracting, coating shower nozzle 500 is moved horizontally side on the substrate 100, form the photoresistance layer of whole on substrate 100 surface, obtain photoresist layer 110; Although this light blockage coating mode has superiority in film thickness uniformity, the production time (Tacttime) of entirety is but increase gradually along with the size increase of glass substrate, and the lifting therefore for production capacity does not help.
Therefore, be necessary to provide a kind of light blockage coating device and light blockage coating method, to solve the problem.
Summary of the invention
The object of the present invention is to provide a kind of light blockage coating device, what the bottom surface of head body was provided with several needle-likes of closely array arrangement tells glue nozzle, vertical whole face can be carried out to substrate and tell glue, ensure to tell glue uniformity and film thickness stability, reduce the production time of light blockage coating processing procedure.
The present invention also aims to provide a kind of light blockage coating method, the mode adopting vertical whole face to tell glue is carried out, and ensures to tell glue uniformity and film thickness stability, reduces the production time of light blockage coating processing procedure.
For achieving the above object, the invention provides a kind of light blockage coating device, for being coated with photoresistance rete on substrate, comprising coating shower nozzle; What described coating shower nozzle comprised head body and the several needle-likes of array arrangement on described head body bottom surface tells glue nozzle;
Described head body is for holding photoresistance glue, during use, several glue nozzle of telling carries out telling glue from the substrate of vertical direction upward horizon placement simultaneously, under gravity and surface tension effects, photoresistance glue natural levelling and form film on a surface of a substrate, constantly tells glue by telling glue nozzle and the thickness of film is increased.
Described light blockage coating device also comprises the thickness detector be located on described head body bottom surface, for measuring film forming thickness on the substrate.
Described thickness detector is laser sensor.
Described light blockage coating device also comprises controlling organization, measurement Real-time Feedback is given described controlling organization by described thickness detector, when the thickness of the film formed on the surface of the substrate reaches preset range, described controlling organization controls described several glue nozzle of telling to be stopped telling glue.
The present invention also provides a kind of light blockage coating method, comprises the steps:
Step 1, provide light blockage coating device and substrate to be coated, described substrate is positioned on plummer, and light blockage coating device and described substrate are carried out contraposition;
Described light blockage coating device comprises coating shower nozzle; What described coating shower nozzle comprised head body and the several needle-likes of array arrangement on described head body bottom surface tells glue nozzle; Accommodate photoresistance glue in described head body, after contraposition, described several tell glue nozzle corresponding be positioned at directly over described substrate;
Distance between adjustment head body and described substrate;
Step 2, several glue nozzle of telling carry out telling glue from the substrate of vertical direction upward horizon placement simultaneously, under gravity and surface tension effects, photoresistance glue natural levelling and form film on a surface of a substrate, constantly tells glue by telling glue nozzle and the thickness of film is increased;
Step 3, when the thickness of the film formed on the surface of the substrate reaches preset range, control several glue nozzle of telling and stop telling glue, obtain the photoresist layer on substrate surface, head body is moved up with away from described substrate, thus complete light blockage coating.
Described substrate is glass substrate, the color membrane substrates of substrate for the formation of display panels of what described step 3 obtained have photoresist layer.
Described light blockage coating shower nozzle also comprises the thickness detector be located on described head body bottom surface, for measuring film forming thickness on the substrate.
Described thickness detector is laser sensor.
Described light blockage coating device also comprises controlling organization, measurement Real-time Feedback is given described controlling organization by described thickness detector, when the thickness of the film formed on the surface of the substrate reaches preset range, in described step 3, described controlling organization controls described several glue nozzle of telling to be stopped telling glue.
The movement of described head body is controlled, to control the distance between described head body and described substrate by described controlling organization.
Beneficial effect of the present invention: a kind of light blockage coating device provided by the invention, coating shower nozzle comprise head body and closely the several needle-likes of array arrangement on described head body bottom surface tell glue nozzle; During use, several glue nozzle of telling carries out telling glue from the substrate of vertical direction upward horizon placement simultaneously, thus vertically whole gluing is carried out to substrate, when ensureing to tell glue uniformity and film thickness stability, the production time of light blockage coating processing procedure greatly can be reduced; A kind of light blockage coating method provided by the invention, adopt vertical whole face to tell glue mode to carry out, on substrate surface, glue is told by the glue nozzle of telling of the densely arranged needle-like that coating shower nozzle is arranged, now, under gravity and surface tension effects, photoresistance glue can form film at substrate surface nature levelling, the vertical distraction film growth by continuous benefit glue subsequently, when the thickness of the film formed on the surface of the substrate reaches preset range, control several glue nozzle of telling to stop telling glue, complete vertical whole face and tell glue action; This light blockage coating method, compared to the light blockage coating method of existing horizontal coating method, when ensureing to tell glue uniformity and film thickness stability, greatly reducing coating duration, thus improve production capacity.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, by the specific embodiment of the present invention describe in detail, will make technical scheme of the present invention and other beneficial effects apparent.
In accompanying drawing,
Fig. 1-3 is the schematic diagram of existing light blockage coating method;
Fig. 4 is the perspective view of the coating shower nozzle of light blockage coating device of the present invention;
Fig. 5 is the schematic flow sheet of light blockage coating method of the present invention;
Fig. 6 is the schematic diagram of the step 2 of light blockage coating method of the present invention;
Fig. 7 is the schematic diagram of the step 3 of light blockage coating method of the present invention.
Detailed description of the invention
For further setting forth the technological means and effect thereof that the present invention takes, be described in detail below in conjunction with the preferred embodiments of the present invention and accompanying drawing thereof.
Refer to Fig. 4, a kind of light blockage coating device of the present invention, for being coated with photoresistance rete on the substrate 10, comprises coating shower nozzle; Described coating shower nozzle comprise head body 50 and closely the several needle-likes of array arrangement on described head body 50 bottom surface tell glue nozzle 51;
Described head body 50 is for holding photoresistance glue, during use, several glue nozzle 51 of telling carries out telling glue from the substrate 10 of vertical direction upward horizon placement simultaneously, under gravity and surface tension effects, photoresistance glue natural levelling and form film on the surface of the substrate 10, constantly tells glue by telling glue nozzle 51 and the thickness of film is increased.
Concrete, described light blockage coating device also comprises the thickness detector 52 be located on described head body 50 bottom surface, for measuring film forming thickness on described substrate 10.
Concrete, described thickness detector 52 is laser sensor.
Concrete, described light blockage coating device also comprises controlling organization, measurement Real-time Feedback is given described controlling organization by described thickness detector 52, and when the thickness of the film formed on the surface of the substrate 10 reaches preset range, described controlling organization controls described several glue nozzle 51 of telling to be stopped telling glue.
Refer to Fig. 5, the present invention also provides a kind of light blockage coating method, comprises the steps:
Step 1, provide light blockage coating device and substrate 10 to be coated, described substrate 10 is positioned on plummer 20, and light blockage coating device and described substrate 10 are carried out contraposition;
Described light blockage coating device comprises coating shower nozzle; Described coating shower nozzle comprise head body 50 and closely the several needle-likes of array arrangement on described head body 50 bottom surface tell glue nozzle 51; Accommodate photoresistance glue in described head body 50, after contraposition, described several tell glue nozzle 51 correspondence be positioned at directly over described substrate 10;
Distance between adjustment head body 50 and described substrate 10;
Concrete, described light blockage coating shower nozzle also comprises the thickness detector 52 be located on described head body 50 bottom surface, for measuring film forming thickness on described substrate 10.
Concrete, described thickness detector 52 is laser sensor.
Concrete, described light blockage coating device also comprises controlling organization; In this step 1, by the distance between controlling organization adjustment head body 50 and described substrate 10.
Step 2, as shown in Figure 6, several glue nozzle 51 of telling carries out telling glue from the substrate 10 of vertical direction upward horizon placement simultaneously, under gravity and surface tension effects, photoresistance glue natural levelling and form film on the surface of the substrate 10, constantly tells glue by telling glue nozzle 51 and the thickness of film is increased;
Concrete, in this step 2, measurement Real-time Feedback is given described controlling organization by described thickness detector 52, when the thickness of the film formed on the surface of the substrate 10 does not reach preset range, described controlling organization controls described several glue nozzle 51 of telling and keeps and tell glue and the thickness of film is increased;
Step 3, as shown in Figure 7, when the thickness of the film formed on the surface of the substrate 10 reaches preset range, control several glue nozzle 51 of telling and stop telling glue, obtain the photoresist layer 11 on substrate 10 surface, head body 11 is moved up with away from described substrate 10, thus complete light blockage coating;
Concrete, in described step 3, described controlling organization is according to the measurement of described thickness detector 52, and when judging that the thickness of the film formed on the surface of the substrate 10 reaches preset range, described controlling organization controls described several glue nozzle 51 of telling to be stopped telling glue.
Concrete, described substrate 10 is glass substrate, the color membrane substrates of substrate 10 for the formation of display panels of what described step 3 obtained have photoresist layer 11.
Concrete, controlled the movement of described head body 50 by described controlling organization, to control the distance between described head body 50 and described substrate 10.
In sum, a kind of light blockage coating device provided by the invention, comprises coating shower nozzle, described coating shower nozzle comprise head body and closely the several needle-likes of array arrangement on described head body bottom surface tell glue nozzle; During use, several glue nozzle of telling carries out telling glue from the substrate of vertical direction upward horizon placement simultaneously, thus vertically whole gluing is carried out to substrate, when ensureing to tell glue uniformity and film thickness stability, the production time of light blockage coating processing procedure greatly can be reduced; A kind of light blockage coating method provided by the invention, adopt vertical whole face to tell glue mode to carry out, on substrate surface, glue is told by the glue nozzle of telling of the densely arranged needle-like that coating shower nozzle is arranged, now, under gravity and surface tension effects, photoresistance glue can form film at substrate surface nature levelling, the vertical distraction film growth by continuous benefit glue subsequently, when the thickness of the film formed on the surface of the substrate reaches preset range, control several glue nozzle of telling to stop telling glue, complete vertical whole face and tell glue action; This light blockage coating method, compared to existing horizontal coating process, when ensureing to tell glue uniformity and film thickness stability, greatly reducing coating duration, thus improve production capacity.
The above; for the person of ordinary skill of the art; can make other various corresponding change and distortion according to technical scheme of the present invention and technical conceive, and all these change and be out of shape the protection domain that all should belong to the accompanying claim of the present invention.
Claims (10)
1. a light blockage coating device, for being above coated with photoresistance rete at substrate (10), comprise coating shower nozzle, it is characterized in that, what described coating shower nozzle comprised head body (50) and the several needle-likes of array arrangement on described head body (50) bottom surface tells glue nozzle (51);
Described head body (50) is for holding photoresistance glue, during use, several glue nozzle (51) of telling carries out telling glue from the substrate (10) of vertical direction upward horizon placement simultaneously, under gravity and surface tension effects, photoresistance glue nature levelling and form film on the surface of substrate (10), constantly tells glue by telling glue nozzle (51) and the thickness of film is increased.
2. light blockage coating device as claimed in claim 1, it is characterized in that, described light blockage coating device also comprises the thickness detector (52) be located on described head body (50) bottom surface, for measuring at the upper film forming thickness of described substrate (10).
3. light blockage coating device as claimed in claim 2, it is characterized in that, described thickness detector (52) is laser sensor.
4. light blockage coating device as claimed in claim 2, it is characterized in that, described light blockage coating device also comprises controlling organization, measurement Real-time Feedback is given described controlling organization by described thickness detector (52), when the thickness of the film formed on the surface at substrate (10) reaches preset range, described controlling organization controls described several glue nozzle (51) of telling to be stopped telling glue.
5. a light blockage coating method, is characterized in that, comprises the steps:
Step 1, provide light blockage coating device and substrate to be coated (10), described substrate (10) is positioned on plummer (20), and light blockage coating device and described substrate (10) are carried out contraposition;
Described light blockage coating device comprises coating shower nozzle; What described coating shower nozzle comprised head body (50) and the several needle-likes of array arrangement on described head body (50) bottom surface tells glue nozzle (51); Described head body accommodates photoresistance glue in (50), after contraposition, described several tell glue nozzle (51) corresponding be positioned at directly over described substrate (10);
Distance between adjustment head body (50) and described substrate (10);
Step 2, several glue nozzle (51) of telling carry out telling glue from the substrate (10) of vertical direction upward horizon placement simultaneously, under gravity and surface tension effects, photoresistance glue nature levelling and form film on the surface of substrate (10), constantly tells glue by telling glue nozzle (51) and the thickness of film is increased;
Step 3, when the thickness of the film formed on the surface at substrate (10) reaches preset range, control several glue nozzle (51) of telling to stop telling glue, obtain the photoresist layer (11) on substrate (10) surface, head body (11) is moved up with away from described substrate (10), thus complete light blockage coating.
6. light blockage coating method as stated in claim 5, it is characterized in that, described substrate (10) is glass substrate, the color membrane substrates of substrate (10) for the formation of display panels of what described step 3 obtained have photoresist layer (11).
7. light blockage coating method as stated in claim 5, it is characterized in that, described light blockage coating shower nozzle also comprises the thickness detector (52) be located on described head body (50) bottom surface, for measuring at the upper film forming thickness of described substrate (10).
8. the light blockage coating method as shown in claim 7, is characterized in that, described thickness detector (52) is laser sensor.
9. the light blockage coating method as shown in claim 7, it is characterized in that, described light blockage coating device also comprises controlling organization, measurement Real-time Feedback is given described controlling organization by described thickness detector (52), when the thickness of the film formed on the surface at substrate (10) reaches preset range, in described step 3, described controlling organization controls described several glue nozzle (51) of telling to be stopped telling glue.
10. the light blockage coating method as shown in claim 9, it is characterized in that, the movement of described head body (50) is controlled, to control the distance between described head body (50) and described substrate (10) by described controlling organization.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610033569.7A CN105457843A (en) | 2016-01-18 | 2016-01-18 | Photoresist coating device and phtoresist coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610033569.7A CN105457843A (en) | 2016-01-18 | 2016-01-18 | Photoresist coating device and phtoresist coating method |
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| CN105457843A true CN105457843A (en) | 2016-04-06 |
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| CN201610033569.7A Pending CN105457843A (en) | 2016-01-18 | 2016-01-18 | Photoresist coating device and phtoresist coating method |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106200271A (en) * | 2016-08-31 | 2016-12-07 | 武汉华星光电技术有限公司 | Coating machine |
| CN106292185A (en) * | 2016-08-29 | 2017-01-04 | 深圳市华星光电技术有限公司 | Coating machine and light blockage coating method |
| CN107398397A (en) * | 2017-08-24 | 2017-11-28 | 武汉华星光电技术有限公司 | The apparatus for coating and coating method of photoresist |
| WO2018119870A1 (en) * | 2016-12-29 | 2018-07-05 | 深圳市柔宇科技有限公司 | Photoresist coating process and loading device |
| CN110126261A (en) * | 2019-06-11 | 2019-08-16 | 深圳市深科达智能装备股份有限公司 | Display or touch module 3D printing glue-line method |
| CN111036467A (en) * | 2018-10-15 | 2020-04-21 | 许铭案 | Three-in-one spraying machine |
| CN112180679A (en) * | 2019-07-03 | 2021-01-05 | 深圳碳森科技有限公司 | Method for preparing patterned polymer |
| CN113380614A (en) * | 2021-06-10 | 2021-09-10 | 广州安晟半导体技术有限公司 | Wafer thinning method |
| CN113893994A (en) * | 2021-11-06 | 2022-01-07 | 深圳市运达诚科技有限公司 | Liquid crystal display color film substrate processing device and technology |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106292185A (en) * | 2016-08-29 | 2017-01-04 | 深圳市华星光电技术有限公司 | Coating machine and light blockage coating method |
| CN106200271A (en) * | 2016-08-31 | 2016-12-07 | 武汉华星光电技术有限公司 | Coating machine |
| WO2018119870A1 (en) * | 2016-12-29 | 2018-07-05 | 深圳市柔宇科技有限公司 | Photoresist coating process and loading device |
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| CN111036467A (en) * | 2018-10-15 | 2020-04-21 | 许铭案 | Three-in-one spraying machine |
| CN110126261A (en) * | 2019-06-11 | 2019-08-16 | 深圳市深科达智能装备股份有限公司 | Display or touch module 3D printing glue-line method |
| CN110126261B (en) * | 2019-06-11 | 2021-04-13 | 深圳市深科达智能装备股份有限公司 | Method for 3D printing of adhesive layer by display or touch module |
| CN112180679A (en) * | 2019-07-03 | 2021-01-05 | 深圳碳森科技有限公司 | Method for preparing patterned polymer |
| CN113380614A (en) * | 2021-06-10 | 2021-09-10 | 广州安晟半导体技术有限公司 | Wafer thinning method |
| CN113893994A (en) * | 2021-11-06 | 2022-01-07 | 深圳市运达诚科技有限公司 | Liquid crystal display color film substrate processing device and technology |
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Application publication date: 20160406 |
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