Nothing Special   »   [go: up one dir, main page]

CN104532495B - Improved and non-sparse embroidery product without light reflection and method - Google Patents

Improved and non-sparse embroidery product without light reflection and method Download PDF

Info

Publication number
CN104532495B
CN104532495B CN201510016992.1A CN201510016992A CN104532495B CN 104532495 B CN104532495 B CN 104532495B CN 201510016992 A CN201510016992 A CN 201510016992A CN 104532495 B CN104532495 B CN 104532495B
Authority
CN
China
Prior art keywords
embroidery
light
exempt
skill
stitch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201510016992.1A
Other languages
Chinese (zh)
Other versions
CN104532495A (en
Inventor
顾金珍
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201510016992.1A priority Critical patent/CN104532495B/en
Publication of CN104532495A publication Critical patent/CN104532495A/en
Application granted granted Critical
Publication of CN104532495B publication Critical patent/CN104532495B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • DTEXTILES; PAPER
    • D05SEWING; EMBROIDERING; TUFTING
    • D05CEMBROIDERING; TUFTING
    • D05C17/00Embroidered or tufted products; Base fabrics specially adapted for embroidered work; Inserts for producing surface irregularities in embroidered products

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Automatic Embroidering For Embroidered Or Tufted Products (AREA)
  • Sewing Machines And Sewing (AREA)

Abstract

Provided is an improved and non-sparse embroidery product without light reflection and a method. The method comprises the following steps: (1) choosing appropriate base fabric used for the embroidery, the base fabric can be plain white cloth or ink ejecting cloth or preliminary embroidered cloth by a machine; (2) carrying out the non-sparse and primary embroidery without the light reflection; (3) carrying out the refining embroidery without the light reflection. The purpose is to solve the technical problems, caused by carrying embroidery on the fabric through the direct stitch without the light reflection, of sparse embroidery product, thin embroidery product, non-abundant color and poor layering and third dimension during the embroidery without the light reflection.

Description

It is after a kind of improvement, not bottom drain exempt from light embroidery product and method
Technical field
The present invention relates to embroidery product and embroidering method, more particularly to personal portrait are embroidered, it is a kind of after improvement, not bottom drain Exempt from light embroidering method and product, it is a kind of beneficial to the performance three-dimensional degree of embroidery pattern, the embroidery of reflectance to exempt from light embroidering method Method, easily shows the three-dimensional degree at character facial or each position of limbs using the skill of handling needles.
Background technology
Embroidery, embroidery is the most ancient traditional technology of China, and the anglicanum of China has had more than 2000 years history.Soviet Union Embroider, occupy critical role in China's embroidery history, Chinese " the four famous embroideries " are collectively referred to as with Guangdong embroidery, Hunan embroidery, Sichuan embroidery.Traditional Suzhou embroidery Embroidery stitching method can substantially be summarized as nine big class:Plain embroidery, bar sewing, point embroidery, volume embroidery, net embroidery, yarn embroidery, random stitch embroidery, variant are embroidered, above-mentioned Include the various skill of handling needles per apoplexy due to endogenous wind again, nine classes amount to 48 kinds of skill of handling needles.Conventional plain embroidery, bar sewing, compile embroider, net is embroidered, yarn is embroidered, disorderly The skill of handling needles of needlework these species be all with the stitch of longer line strip by it is parallel, the aligned transfer such as connect, intersect.And put and embroider class The skill of handling needles is that raised point-like stitch is formed in the way of knotting, and such skill of handling needles is only used for the local of picture as relief point Sew, for example pistil.It is the special embroidery in conventional embroidery changing and coming by means of other instruments, material and process that variant is embroidered Method, for example contaminates and embroiders.Application No. 201110114003.4, it is entitled " a kind of to exempt from the light T-shaped skill of handling needles and thorn for what is embroidered The patent of invention that authorizes of embroidery method " is my earlier application, overcome personal portrait embroidery in, particularly personage's face and The reflective problem of limbs.In prior art, also disclose many other graphic elements exempts from the light skill of handling needles, such as Application No. " 201210128432.1 ", the patent of invention of entitled " a kind of rice for embroidery is like the shape skill of handling needles and embroidering method ".It is existing The light embroidering method of exempting from having is that employing is exempted from the light skill of handling needles and embroidered directly in white embroidered cloth, colored embroidered cloth, ink-jet embroidered cloth, Successively embroidered in embroidered cloth front from bottom to top, and per layer all adopts and exempts from the light skill of handling needles and embroidered.And due to exempting from the figure of the light skill of handling needles Unit, such as T-shaped, 7 shapes, rice shape are present between its stitch than larger gap, even if being layering, on final image still Can have into a fixed gap, cause to exempt from light needlework and there is leakiness bottom, needlework is more thin, and color not enough enrich, level Sense and the not strong technical problem of third dimension.
The content of the invention
The present invention provide it is after a kind of improvement, not bottom drain exempt from light embroidering method, its purpose is to solution and exempt from light embroidery, Directly embroidered using exempting from the light skill of handling needles in embroidered cloth, the needlework leakiness bottom caused, more thin, color are not enough enriched, layer Secondary sense and the not strong technical problem of third dimension.
In Suzhou embroidery field, in prior art, done related improvement, is substantially the weight for Suzhou embroidery method and product Quantum jump and innovation, can change the overall technology level in embroidery field.To reach above-mentioned purpose, after a modification of the present invention , not bottom drain exempt from light embroidering method, realize technical scheme according to following steps:It is after a kind of improvement, not bottom drain exempt from polished bard Embroidery method, embroiders especially for personal portrait, realizes according to following steps:(1), from the suitable base fabric for being used for embroidery, base fabric Can be calico, ink-jet cloth, preliminary machine it is embroidered after cloth;Taut cloth is sewed up with base fabric two respectively, Ran Houjun It is even to be laid in inner lane hoop, outer ring spring is overlapped with inner lane, makes taut cloth footpath latitude all smooth;Manuscript paper will be hooked and be covered in embroidery original text On, tick bright and dark light line or block;The pattern profile duplication hooked on original text is being embroidered on the ground, original text fine rule nail will hooked and embroidered the anti-of ground Face, staple line are followed closely in pattern;(2), the light bottoming of exempting from of bottom drain is not embroidered:Plain, straight line pin, oblique pin, muscle are selected on base fabric One or more skill of handling needles in pin, random pin in this several traditional embroidery stitching method, carries out exempting from light beating to targeted graphical to be embroidered Bottom is embroidered, above-mentioned to exempt from light bottoming and embroider not adopting and exempt from the light skill of handling needles, it is to avoid to exempt from the big problem in the universal stitch gap of light skill of handling needles unit;Adopt Target stitching graphic is substantially shaped with the light bottoming embroidery of exempting from of not bottom drain, make stitching graphic that there is certain thickness, color, level And third dimension, exempt from light bottoming embroidery can carry out monolayer embroidery, also can multiple-level stack embroidery form;(3), exempt from light refinement embroidery: Exempt from light bottoming embroidery complete on the basis of, using exempt from the light skill of handling needles targeted graphical of preliminarily forming is further exempted from light refinement thorn Embroider, exempt from light refinement embroidery and be made up of multiple similar figure skill of handling needles units, and take successively embroidery, the embroidery side of multiple-level stack Method;Exempt from the skill of handling needles that the light skill of handling needles is the reflective problem that can change needlework, be made up of multiple similar light figure skill of handling needles units of exempting from.
Relevant content in above-mentioned technical proposal is explained as follows:
1. it is so-called embroidery be embroider line to be punctured in embroidered cloth with certain floral designs and color with pin, with embroider mark constituted it is various The general name of pattern.In embroidery field, the skill of handling needles refers to the tissue shape of stitch lines in the method for handling the needle in embroidery, and embroidery Formula, each skill of handling needles have the expression effect of certain organization rule and uniqueness.
2., in such scheme, exempt from the skill of handling needles that the light skill of handling needles is the reflective problem that can change needlework, exempted from by multiple similar Light figure skill of handling needles unit (e.g., exempt from light skill of handling needles unit, 7 shapes and exempt from that light skill of handling needles unit, L-shaped exempt from light skill of handling needles unit, " " " exempts from the light skill of handling needles by T-shaped Unit, " " " is exempted from light skill of handling needles unit, other analogous shapes and exempts from light skill of handling needles unit) constitute.Exempt from the light skill of handling needles and change embroidery to exist Reflection angle under light, solves embroidery under different light angles, flickering, the big problem of chromatic aberration. So that the needlework for exempting from the light skill of handling needles is adopted when multi-angle is viewed and admired, will not produce the deviation of color and the deviation of shape.The T of multiple repetitions Shape exempts from the needlework of light skill of handling needles unit composition makes needlework be presented more regular, more neat technique effect, and 7 shape skill of handling needles units, L Hand-manipulating of needle method unit, " " " skill of handling needles unit, " " " skill of handling needles unit or other analogous shape units are all to be extended to develop by T-shaped skill of handling needles unit , but the rule degree of needlework, regularity exempt from light skill of handling needles unit not as T-shaped.The T-shaped skill of handling needles not only arbitrarily but also had certain rule, disorderly In in order, stitch intersects few, feels very fine and smooth, and colored sense, stereovision are adapted to the details of performance character facial.
3. it is in such scheme, non-to exempt from the skill of handling needles that the light skill of handling needles is the reflective problem that change needlework.
4. using during the embroidered works of embroidering method of the present invention with line color can monolayer, also can multilamellar be overlapped, and have very much rule Rule it is layering, chromatography, appears line color with being superimposed for line by line layer by layer, makes beneath line color natural with colo(u)r streak above Combine together, make embroidery rich color, with stronger representability.
5. such scheme is applied to hand embroidering, is also applied for machine embroidery.
As above-mentioned technical proposal is used, the present invention has following advantages and effect compared with prior art:
It is of the prior art to exempt from light embroidering method, although to be able to retain the distinctive linear light characteristic of embroidery, and solve embroidery The reflective phenomenon of product, but due to exempting from the graphic element of the light skill of handling needles, such as T-shaped, 7 shapes, rice shape are present between its stitch than between larger Gap, even if being layering, still can have into a fixed gap on final image, cause to exempt from light needlework and have leakiness bottom, embroidery Product are more thin, the technical problem that color not enough enriches, stereovision and third dimension be not strong.On this basis, one kind of the invention It is after improvement, not bottom drain exempt from light embroidery product and embroidering method overcomes above-mentioned technical problem, be a kind of new technical scheme.
Description of the drawings
During accompanying drawing 1 is prior art, directly in white embroidered cloth, adopt and exempt from the embroidery schematic diagram embroidered by the light skill of handling needles; Accompanying drawing 2 is the embroidery figure after the bottoming embroidery for exempting from light embroidery of the not bottom drain of the present invention;
The embroidery figure exempted from light refinement embroidery after of the accompanying drawing 3 for the present invention.
In figure:1- exempts from light bottoming embroidery layer, and 2- exempts from light refinement embroidery layer
Specific embodiment
Below in conjunction with the accompanying drawings and embodiment the invention will be further described:
Embodiment 1:It is after a kind of improvement, not bottom drain exempt from light embroidery product.
As shown in figure 3, after a kind of improvement, not bottom drain exempt from light embroidery product, the embroidery product has exempting from for not bottom drain Light bottoming embroidery layer 1 refines embroidery layer 2 with light is exempted from;Exempt from light bottoming embroidery layer 1 by plain, straight line pin, oblique pin, muscle pin, random pin In one or more skill of handling needles embroidery in this several traditional embroidery stitching method form, rather than exempt from the embroidery of the light skill of handling needles and form, it is to avoid exempt from The big problem in the universal stitch gap of light skill of handling needles unit;Above-mentioned light bottoming embroidery layer of exempting from makes target stitching graphic substantially shape, and makes Stitching graphic has certain thickness, color, level and third dimension, exempts from light bottoming embroidery layer 1 and embroiders for multiple-level stack;Exempt from light refinement Embroidery layer 2 is made up of multiple similar T-shaped skill of handling needles units, and above-mentioned light refinement embroidery layer of exempting from takes successively embroidery, multiple-level stack Embroidering method.
Exempt from light bottoming embroidery layer 1 in the present embodiment and exempt from the form of light refinement embroidery layer 2 added using three stackings, but Be readily obtained under present invention enlightenment using two superimposed, four stackings plus, five stackings plus, the even more technical scheme of multiple-layer stacked.
Embodiment 2:It is after a kind of improvement, not bottom drain exempt from light embroidering method
The embroidering method of the present embodiment personal portrait is:
It is after a kind of improvement, not bottom drain exempt from light embroidering method, it is characterized in that realizing according to following steps:
(1), from the suitable base fabric for being used for embroidery, base fabric can be calico, ink-jet cloth, preliminary machine it is embroidered after Cloth;Taut cloth is sewed up with base fabric two respectively, it is then evenly laid out in inner lane hoop, by outer ring spring and inner lane weight Close, make taut cloth footpath latitude all smooth;Manuscript paper will be hooked to be covered on embroidery original text, bright and dark light line or block is ticked;The pattern hooked on original text Profile duplication is being embroidered on the ground, will be hooked original text fine rule and is followed closely in the reverse side for embroidering ground, and staple line is followed closely in pattern;
(2), the light bottoming of exempting from of bottom drain is not embroidered:On the base fabric from plain, straight line pin, oblique pin, muscle pin, random pin this One or more skill of handling needles in several traditional embroidery stitching methods, carries out exempting from light bottoming embroidery to targeted graphical to be embroidered, above-mentioned Exempt from light bottoming and embroider not adopting and exempt from the light skill of handling needles, it is to avoid exempt from the big problem in the universal stitch gap of light skill of handling needles unit;Using not bottom drain Exempting from light bottoming embroidery makes target stitching graphic substantially shape, and makes stitching graphic have certain thickness, color, level and third dimension, Exempting from light bottoming embroidery can carry out monolayer embroidery, also can multiple-level stack successively embroider and form;
(3), exempt from light refinement embroidery:Exempting from the basis of light bottoming embroidery completes, using exempting from the light skill of handling needles to preliminarily forming Targeted graphical is further exempted from light refinement embroidery, is exempted from light refinement embroidery and is made up of multiple similar figure skill of handling needles units, and adopts Take successively embroidery, the embroidering method of multiple-level stack.
From figure 3, it can be seen that the present invention solves and exempts from light needlework and have that leakiness bottom, needlework be more thin, color Not enough the not strong technical problem of abundant, stereovision and third dimension, makes Suzhou embroidery embroider in personal portrait and broken through and created in skill and technique Newly.
Embroidering method of the present invention is applied to hand embroidering, is also applied for machine embroidery.Machine embroidery is easier to make base fabric Into infringement, the problems such as cause bottom drain.Above-described embodiment technology design only to illustrate the invention and feature, its object is to allow ripe The personage for knowing technique will appreciate that present disclosure and implements according to this, can not limit the protection model of the present invention with this Enclose.All equivalence changes made according to spirit of the invention or modification, should all be included within the scope of the present invention.

Claims (8)

1. after a kind of improvement, it is not show-through exempt from light embroidering method, embroider for personal portrait, it is characterised in that according to following step It is rapid to realize:
(1), preparatory process
From the suitable base fabric for being used for embroidery, base fabric is calico, have painting cloth, air brushing cloth or preliminary machine embroidered after cloth Material;
In above-mentioned preparatory process, after suitably the base fabric of embroidery is used for, by base fabric and a kind of taut cloth two taut beneficial to volume Head is sewed up, and then, rolls taut cloth, equably roll from both sides, plug taut intervention, then drawn with line on both sides on taut axle Tight bed material, makes bed material longitude and latitude smooth wrinkle resistant, the line drawing original text for having ticked contour line and light and shade block face is lain in below bed material, Retouched on bed material again with light color;
(2), the not bottoming embroidery for exempting from light embroidery of bottom drain:
One kind or many in this several traditional embroidery stitching method in plain, straight line pin, oblique pin, muscle pin, random pin is selected on base fabric The skill of handling needles is planted, the bottoming embroidery for exempting from light embroidery of not bottom drain is carried out to targeted graphical to be embroidered, is produced not in bottoming embroidery The light sensation of needs, bottoming embroidery is not adopted exempts from the light skill of handling needles, it is to avoid the stitch gap for exempting from light skill of handling needles unit generally existing is big Problem;The light bottoming embroidery of exempting from of above-mentioned not bottom drain makes target stitching graphic substantially shape, and has certain thickness, color, level And third dimension, also allow bed material color all capped;Above-mentioned not bottom drain exempt from light bottoming embroidery can carry out monolayer embroidery, can also adopt Formed with multilamellar embroidery stacking;
(3), exempt from light refinement embroidery:
Above-mentioned not bottom drain exempt from light bottoming embroidery after the completion of, traveling one is entered to the targeted graphical of preliminarily forming using exempting from the light skill of handling needles Step exempts from light refinement embroidery, exempts from light refinement embroidery and is made up of multiple similar figure skill of handling needles units, and takes successively embroidery, multilamellar heap Folded embroidering method;Exempt from the skill of handling needles that the light skill of handling needles is the reflective problem that can change needlework, similar exempt from light figure pin by multiple Method unit is constituted.
2. after a kind of improvement according to claim 1, not show-through exempt from light embroidering method, it is characterised in that:It is above-mentioned to exempt from In light refinement stitching step, on the basis of the bottoming embroidery for exempting from light embroidery of not bottom drain is completed, existed using embroidering pin and embroider line Embroidered cloth front is successively embroidered at least three layers and the embroidery mark that is layering from bottom to top, wherein, per layer to embroider mark long by one group of stitch The roughly the same T-shaped stitch unit of degree is adjacently positioned to be formed in embroidered cloth front, with any one T-shaped stitch list in embroidering mark at per layer Centered on unit, around close to T-shaped stitch unit be in tilted layout with respect to the T-shaped stitch unit at center on embroidery face, from bottom to top Each layer is embroidered the stitch lengths of T-shaped stitch unit in mark and is gradually successively decreased, and the T-shaped stitch unit is embroidered using the light T-shaped skill of handling needles is exempted from, should The skill of handling needles is made up of the first stitch and the second stitch, wherein, the first stitch and the second stitch are in the " T " shape arrangement in embroidered cloth front, " T " The first stitch in shape with respect to the second stitch angle angle in 60 °~90 ° scopes, the first stitch lengths and the second stitch lengths Ratio 1:0.7 to 1:1.3 scope.
3. after a kind of improvement according to claim 2, not show-through exempt from light embroidering method, it is characterised in that:It is described from The stitch lengths that lower and upper each layer embroiders T-shaped stitch unit in mark are gradually decremented to uniformly successively decrease.
4. after a kind of improvement according to claim 3, not show-through exempt from light embroidering method, it is characterised in that:The superiors The stitch lengths of T-shaped stitch unit in mark are embroidered in 1~8 millimeter of scope.
5. after a kind of improvement according to claim 4, not show-through exempt from light embroidering method, it is characterised in that:It is described from Lower and upper each layer is embroidered in mark, and the T-shaped stitch unit on upper strata is filled in the gap formed between each T-shaped stitch unit of lower floor.
6. after a kind of improvement according to claim 5, not show-through exempt from light embroidering method, it is characterised in that:It is described from Lower and upper each layer is embroidered in mark, the thickness gradually transition from coarse to fine of embroider line.
7. after a kind of improvement according to claim 1 and 2, not show-through exempt from light embroidering method, it is characterised in that:It is above-mentioned It is that 7 shapes are exempted from light skill of handling needles unit, L-shaped and exempt from light skill of handling needles unit, " " " shape exempts from light skill of handling needles unit, " " " shape to exempt from light skill of handling needles unit to exempt from the light skill of handling needles In one kind.
8. after a kind of improvement, not bottom drain exempt from light embroidery product, it is characterised in that:The embroidery product is exempted from not bottom drain The bottoming embroidery layer of light embroidery refines embroidery layer with light is exempted from;Not bottom drain exempt from light embroidery bottoming embroidery layer by plain, straight line pin, Tiltedly one or more skill of handling needles embroidery in pin, muscle pin, random pin in this several traditional embroidery stitching method is formed, rather than exempts from light skill of handling needles thorn Embroidery is formed, it is to avoid exempt from the big problem in the universal stitch gap of light skill of handling needles unit;The bottoming thorn for exempting from light embroidery of above-mentioned not bottom drain Embroidering layer makes target stitching graphic substantially shape, and makes stitching graphic have certain thickness, color, level and third dimension, exempts from light bottoming Embroidery layer can be embroidered for monolayer, alternatively multiple-level stack embroidery;Exempt from light refinement embroidery layer by multiple similar figure skill of handling needles units Constitute, above-mentioned light refinement embroidery layer of exempting from takes successively embroidery, the embroidering method of multiple-level stack.
CN201510016992.1A 2015-01-14 2015-01-14 Improved and non-sparse embroidery product without light reflection and method Expired - Fee Related CN104532495B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510016992.1A CN104532495B (en) 2015-01-14 2015-01-14 Improved and non-sparse embroidery product without light reflection and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510016992.1A CN104532495B (en) 2015-01-14 2015-01-14 Improved and non-sparse embroidery product without light reflection and method

Publications (2)

Publication Number Publication Date
CN104532495A CN104532495A (en) 2015-04-22
CN104532495B true CN104532495B (en) 2017-04-26

Family

ID=52848106

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510016992.1A Expired - Fee Related CN104532495B (en) 2015-01-14 2015-01-14 Improved and non-sparse embroidery product without light reflection and method

Country Status (1)

Country Link
CN (1) CN104532495B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104727040A (en) * 2015-04-08 2015-06-24 内江市市中区汉安夏布绣专业合作社 Method for preparing grass cloth embroidery
CN105040299B (en) * 2015-06-08 2017-05-10 浙江工贸职业技术学院 Three-dimensional ou embroidery processing technology
CN105401357A (en) * 2015-10-21 2016-03-16 马继芳 Novel improved embroidering stitch and embroidering method thereof
CN105544113A (en) * 2016-02-19 2016-05-04 太仓市鑫泰针织有限公司 Crewel embroidery method
CN105603650A (en) * 2016-03-15 2016-05-25 太仓市鑫泰针织有限公司 Light-free Z-shaped stitch for embroidery and embroidery method
CN106498639A (en) * 2016-08-31 2017-03-15 纪慧娟 A kind of pure hand embroidering method
CN112411045A (en) * 2020-10-28 2021-02-26 江苏堂皇集团有限公司 Crease-resistant embroidery process for cloth
CN115029873B (en) * 2022-06-28 2024-01-09 苏州市高新区诺艺琴韵文化产业有限公司 Rice grain needle embroidery process

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02229259A (en) * 1989-02-27 1990-09-12 Namiko Nohara Embroidered product and production thereof
CN100513668C (en) * 2004-10-20 2009-07-15 顾玉纯 Opus anglicanum for ink painting
CN101016680A (en) * 2007-01-16 2007-08-15 杨小婷 Method of embroidering Youzhen embroidery
CN102182023B (en) * 2011-05-04 2012-12-26 顾金珍 Light-free T-shaped stitch for embroidery and embroidering method
CN103866508A (en) * 2014-03-31 2014-06-18 湖南工艺美术职业学院 Embroidery method for representing face of figure
CN103866507A (en) * 2014-03-31 2014-06-18 湖南工艺美术职业学院 Embroidery method for representing surface texture of object
CN104063562B (en) * 2014-07-14 2017-03-22 南京大学 Method used for generating bottom embroidery draft of disordered needlework and based on color clustering

Also Published As

Publication number Publication date
CN104532495A (en) 2015-04-22

Similar Documents

Publication Publication Date Title
CN104532495B (en) Improved and non-sparse embroidery product without light reflection and method
CN101824714B (en) Dispensing stitching method and embroidery method for embroidery
CN102619039B (en) *-shaped knitting method and embroidery method for embroidery
CN105040299B (en) Three-dimensional ou embroidery processing technology
CN100516340C (en) Improvement of cross embroidering method
CN106988044A (en) One kind embroidery dyeing and printing process
CN106167963A (en) Random stitch embroidery method
CN103243501A (en) Yunyi stitching method for embroidery and embroidering method
CN106521838A (en) Computerized embroidery plate-making method
CN107059277A (en) A kind of skill of handling needles of H types embroidery and preparation method thereof
CN107044015A (en) A kind of processing technology of Wenzhou embroidery
CN103419544B (en) The production method of natural silk glue back of the body artistic tapestry
CN108085842B (en) Single-width positioning silk pattern fabric and production method thereof
RU2469136C1 (en) Method of satin embroidery on article
CN106498639A (en) A kind of pure hand embroidering method
CN106948106A (en) A kind of Gu for being used to embroider is like shape skill of handling needles and preparation method thereof
CN103866508A (en) Embroidery method for representing face of figure
CN111020908B (en) Suspension 3D acupuncture method
CN209353074U (en) A kind of undercurrent embroidery embroidered with imitative sea anemone
CN102720015A (en) Chinese painting freehand brushwork embroidery stitch
CN115897090B (en) 45-Degree row embroidery technique
US2157573A (en) Means for combining smocking and needlework design
CN105956279A (en) Pattern design system for Wangjiang cross stitch
CN109440323A (en) A kind of undercurrent embroidery and its embroidering method embroidered with imitative sea anemone
CN105177884A (en) Oil painting disordered needlework embroidery process

Legal Events

Date Code Title Description
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170426

Termination date: 20190114