BE723556A - - Google Patents
Info
- Publication number
- BE723556A BE723556A BE723556DA BE723556A BE 723556 A BE723556 A BE 723556A BE 723556D A BE723556D A BE 723556DA BE 723556 A BE723556 A BE 723556A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68463667A | 1967-11-21 | 1967-11-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE723556A true BE723556A (en) | 1969-04-16 |
Family
ID=24748898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE723556D BE723556A (en) | 1967-11-21 | 1968-11-07 |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS4934681B1 (en) |
BE (1) | BE723556A (en) |
BR (1) | BR6804157D0 (en) |
CH (1) | CH494415A (en) |
DE (1) | DE1807644A1 (en) |
FR (1) | FR1592375A (en) |
GB (1) | GB1251345A (en) |
SU (1) | SU379110A3 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51483B2 (en) * | 1972-08-18 | 1976-01-08 | ||
GB1482921A (en) | 1973-07-31 | 1977-08-17 | Glaxo Lab Ltd | Polymers |
US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
JP2623309B2 (en) * | 1988-02-22 | 1997-06-25 | ユーシービー ソシエテ アノニム | How to get a resist pattern |
JP2944296B2 (en) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | Manufacturing method of photosensitive lithographic printing plate |
JP3290316B2 (en) | 1994-11-18 | 2002-06-10 | 富士写真フイルム株式会社 | Photosensitive lithographic printing plate |
JP3506295B2 (en) | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | Positive photosensitive lithographic printing plate |
US6511790B2 (en) | 2000-08-25 | 2003-01-28 | Fuji Photo Film Co., Ltd. | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
US6841330B2 (en) | 2000-11-30 | 2005-01-11 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
US20040067435A1 (en) | 2002-09-17 | 2004-04-08 | Fuji Photo Film Co., Ltd. | Image forming material |
JP4404734B2 (en) | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | Planographic printing plate precursor |
JP4474296B2 (en) | 2005-02-09 | 2010-06-02 | 富士フイルム株式会社 | Planographic printing plate precursor |
JP4404792B2 (en) | 2005-03-22 | 2010-01-27 | 富士フイルム株式会社 | Planographic printing plate precursor |
JP2009085984A (en) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | Planographic printing plate precursor |
JP2009083106A (en) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | Lithographic printing plate surface protective agent and plate making method for lithographic printing plate |
JP4890403B2 (en) | 2007-09-27 | 2012-03-07 | 富士フイルム株式会社 | Planographic printing plate precursor |
JP4994175B2 (en) | 2007-09-28 | 2012-08-08 | 富士フイルム株式会社 | Planographic printing plate precursor and method for producing copolymer used therefor |
JP4790682B2 (en) | 2007-09-28 | 2011-10-12 | 富士フイルム株式会社 | Planographic printing plate precursor |
WO2009063824A1 (en) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | Method of drying coating film and process for producing lithographic printing plate precursor |
JP2009236355A (en) | 2008-03-26 | 2009-10-15 | Fujifilm Corp | Drying method and device |
JP5164640B2 (en) | 2008-04-02 | 2013-03-21 | 富士フイルム株式会社 | Planographic printing plate precursor |
JP5183380B2 (en) | 2008-09-09 | 2013-04-17 | 富士フイルム株式会社 | Photosensitive lithographic printing plate precursor for infrared laser |
JP2010237435A (en) | 2009-03-31 | 2010-10-21 | Fujifilm Corp | Lithographic printing plate precursor |
EP2481603A4 (en) | 2009-09-24 | 2015-11-18 | Fujifilm Corp | Lithographic printing original plate |
JP5490168B2 (en) | 2012-03-23 | 2014-05-14 | 富士フイルム株式会社 | Planographic printing plate precursor and lithographic printing plate preparation method |
JP5512730B2 (en) | 2012-03-30 | 2014-06-04 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
-
1968
- 1968-11-07 BE BE723556D patent/BE723556A/xx unknown
- 1968-11-07 DE DE19681807644 patent/DE1807644A1/en not_active Withdrawn
- 1968-11-20 SU SU1284438A patent/SU379110A3/ru active
- 1968-11-20 BR BR20415768A patent/BR6804157D0/en unknown
- 1968-11-20 FR FR1592375D patent/FR1592375A/fr not_active Expired
- 1968-11-21 JP JP43084909A patent/JPS4934681B1/ja active Pending
- 1968-11-21 GB GB1251345D patent/GB1251345A/en not_active Expired
- 1968-11-21 CH CH1736868A patent/CH494415A/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
Also Published As
Publication number | Publication date |
---|---|
SU379110A3 (en) | 1973-04-18 |
GB1251345A (en) | 1971-10-27 |
DE1807644A1 (en) | 1969-08-28 |
JPS4934681B1 (en) | 1974-09-17 |
FR1592375A (en) | 1970-05-11 |
BR6804157D0 (en) | 1973-01-11 |
CH494415A (en) | 1970-07-31 |