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NL7904770A - Werkwijzen voor het bereiden en toepassen van gesub- stitueerde alkylarylsulfoxyden en fenylarylsulfoxyden, alsmede nieuwe arylsulfoxyden. - Google Patents

Werkwijzen voor het bereiden en toepassen van gesub- stitueerde alkylarylsulfoxyden en fenylarylsulfoxyden, alsmede nieuwe arylsulfoxyden.

Info

Publication number
NL7904770A
NL7904770A NL7904770A NL7904770A NL7904770A NL 7904770 A NL7904770 A NL 7904770A NL 7904770 A NL7904770 A NL 7904770A NL 7904770 A NL7904770 A NL 7904770A NL 7904770 A NL7904770 A NL 7904770A
Authority
NL
Netherlands
Prior art keywords
sulfoxide
substituated
phenylaryl
preparation
methods
Prior art date
Application number
NL7904770A
Other languages
English (en)
Original Assignee
Sandoz Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH687678A external-priority patent/CH635352A5/de
Priority claimed from CH1069278A external-priority patent/CH643538A5/de
Application filed by Sandoz Ag filed Critical Sandoz Ag
Publication of NL7904770A publication Critical patent/NL7904770A/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
    • C07D333/62—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/40—Radicals substituted by oxygen atoms
    • C07D307/46—Doubly bound oxygen atoms, or two oxygen atoms singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/78—Ring systems having three or more relevant rings
    • C07D311/80—Dibenzopyrans; Hydrogenated dibenzopyrans
    • C07D311/82—Xanthenes
    • C07D311/84—Xanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D311/86—Oxygen atoms, e.g. xanthones
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41—Compounds containing sulfur bound to oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL7904770A 1978-06-23 1979-06-19 Werkwijzen voor het bereiden en toepassen van gesub- stitueerde alkylarylsulfoxyden en fenylarylsulfoxyden, alsmede nieuwe arylsulfoxyden. NL7904770A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH687678A CH635352A5 (en) 1978-06-23 1978-06-23 Use of substituted alkyl phenyl sulphoxides and/or substituted phenyl phenyl sulphoxides as photoinitiators
CH1069278A CH643538A5 (en) 1978-10-16 1978-10-16 Sulphoxides

Publications (1)

Publication Number Publication Date
NL7904770A true NL7904770A (nl) 1979-12-28

Family

ID=25700316

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7904770A NL7904770A (nl) 1978-06-23 1979-06-19 Werkwijzen voor het bereiden en toepassen van gesub- stitueerde alkylarylsulfoxyden en fenylarylsulfoxyden, alsmede nieuwe arylsulfoxyden.

Country Status (7)

Country Link
US (1) US4324628A (nl)
DE (1) DE2923602A1 (nl)
ES (1) ES481839A1 (nl)
FR (1) FR2429201A1 (nl)
GB (1) GB2025991B (nl)
IT (1) IT1117247B (nl)
NL (1) NL7904770A (nl)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA839398B (en) * 1982-12-27 1985-08-28 Lilly Co Eli Substituted imidazopyrimidines-pyrazines,and-triazines
US4537889A (en) * 1982-12-27 1985-08-27 Eli Lilly And Company Inotropic agents
US4636502A (en) * 1982-12-27 1987-01-13 Eli Lilly And Company Methods of producing a positive inotropic effect or vasodilation by administration of 2-phenyl imidazo pyrimidines and pyrazines
IT1208494B (it) * 1985-01-28 1989-07-10 Lamberti Flli Spa Polimerizzazione. derivati solforati di chetoni aromatico-alifatici e alifatici come fotoiniziatori di
IT1187703B (it) * 1985-07-23 1987-12-23 Lamberti Fratelli Spa Benzofenoni sostituiti e loro miscele liquide,atti all'impiego come iniziatori di fotopolimerizzazione
AU625123B2 (en) * 1989-04-24 1992-07-02 Otsuka Pharmaceutical Factory, Inc. 3-halogeno-2,3-diphenylacrylaldehyde derivative, method of production thereof and curing agent for hyperlipidemia
GB9620202D0 (en) * 1996-09-27 1996-11-13 Rhone Poulenc Agriculture New herbicides
JP2002534488A (ja) 1999-01-12 2002-10-15 クラリアント・インターナシヨナル・リミテツド ベンゾフェノンおよび光重合開始剤としてのその使用
JP5717959B2 (ja) 2009-11-17 2015-05-13 株式会社Adeka 芳香族スルホニウム塩化合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2769777A (en) * 1954-01-04 1956-11-06 Monsanto Chemicals Initiation of photopolymerization
AU451354B2 (en) * 1971-01-06 1974-08-08 Inmont Corp. "actinic radiation curing compositions and method of coating and printing using same"
US3949084A (en) * 1972-03-03 1976-04-06 Syntex (U.S.A.) Inc. Novel substituted xanthone carboxylic acid compounds
CH570965A5 (nl) * 1972-07-14 1975-12-31 Sandoz Ag
US3903322A (en) * 1974-03-07 1975-09-02 Continental Can Co Photopolymerizable ethylenically unsaturated compounds photoinitiated with benzoyl derivatives of diphenyl sulfide and an organic amine compound
CH594705A5 (nl) 1974-09-19 1978-01-31 Sandoz Ag
US4165267A (en) * 1974-09-19 1979-08-21 Sandoz Ltd. Photo-polymerizable systems containing 2-haloacetophenone derivatives as photosensitizing agents
DE2602419A1 (de) * 1976-01-23 1977-07-28 Basf Ag Photopolymerisierbare masse
US4111692A (en) * 1976-06-04 1978-09-05 Toyo Boseki Kabushiki Kaisha Electrostatic printing plate
JPS6032175B2 (ja) * 1977-05-18 1985-07-26 バスフ アクチェン ゲゼルシャフト 版木及びレリ−フ版木を製造するために改良された光重合可能な物質
US4186108A (en) * 1978-02-08 1980-01-29 Minnesota Mining And Manufacturing Company Liquid compositions containing triarylsulfonium complex salts and oxyethylene material
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts

Also Published As

Publication number Publication date
IT7949459A0 (it) 1979-06-19
GB2025991A (en) 1980-01-30
FR2429201B1 (nl) 1984-05-11
US4324628A (en) 1982-04-13
ES481839A1 (es) 1980-07-01
IT1117247B (it) 1986-02-17
DE2923602A1 (de) 1980-01-10
GB2025991B (en) 1982-11-10
FR2429201A1 (fr) 1980-01-18

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Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BV The patent application has lapsed