Sedky, 2007 - Google Patents
SiGe: An attractive material for post-CMOS processing of MEMSSedky, 2007
View PDF- Document ID
- 2618431579694811197
- Author
- Sedky S
- Publication year
- Publication venue
- Microelectronic engineering
External Links
Snippet
This work gives an overview of the different developments for silicon germanium (Si1− xGex) from a MEMS post-processing perspective. First, the maximum processing temperature that does not introduce any damage or degradation into the standard characteristics of the …
- 229910000577 Silicon-germanium 0 title abstract description 22
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICRO-STRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICRO-STRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing micro-systems
- B81C1/00222—Integrating an electronic processing unit with a micromechanical structure
- B81C1/00246—Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate
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