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Huff, 2022 - Google Patents

Residual stresses in deposited thin-film material layers for micro-and nano-systems manufacturing

Huff, 2022

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Document ID
17476599624019076935
Author
Huff M
Publication year
Publication venue
Micromachines

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This review paper covers a topic of significant importance in micro-and nano-systems development and manufacturing, specifically the residual stresses in deposited thin-film material layers and methods to control or mitigate their impact on device behavior. A …
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