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Robust field-aligned global parametrization

Published: 27 July 2014 Publication History

Abstract

We present a robust method for computing locally bijective global parametrizations aligned with a given cross-field. The singularities of the parametrization in general agree with singularities of the field, except in a small number of cases when several additional cones need to be added in a controlled way. Parametric lines can be constrained to follow an arbitrary set of feature lines on the surface. Our method is based on constructing an initial quad patch partition using robust cross-field integral line tracing. This process is followed by an algorithm modifying the quad layout structure to ensure that consistent parametric lengths can be assigned to the edges. For most meshes, the layout modification algorithm does not add new singularities; a small number of singularities may be added to resolve an explicitly described set of layouts. We demonstrate that our algorithm succeeds on a test data set of over a hundred meshes.

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Published In

cover image ACM Transactions on Graphics
ACM Transactions on Graphics  Volume 33, Issue 4
July 2014
1366 pages
ISSN:0730-0301
EISSN:1557-7368
DOI:10.1145/2601097
Issue’s Table of Contents
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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Publication History

Published: 27 July 2014
Published in TOG Volume 33, Issue 4

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Author Tags

  1. geometric modeling
  2. parametrization

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