DEVELOPMENT OF ZINC OXIDE FILM THROUGH PULSED LASER (Autosaved) (Autosaved) (Autosaved)
DEVELOPMENT OF ZINC OXIDE FILM THROUGH PULSED LASER (Autosaved) (Autosaved) (Autosaved)
DEVELOPMENT OF ZINC OXIDE FILM THROUGH PULSED LASER (Autosaved) (Autosaved) (Autosaved)
Submitted to : Submitted by :
Dr. I. A. Palani Karmishtha Shaktawat
Department of Mechanical B.Tech (Mechatronics)
Engineering 2018BTMT005
INTRODUCTION
Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique
where a high-power pulsed laser beam is focused inside a vacuum chamber to
strike a target of the material that is to be deposited. This material is vaporized
from the target (in a plasma plume) which deposits it as a thin film on a
substrate (such as a silicon wafer facing the target). This process can occur
in ultra high vacuum or in the presence of a background gas, such as oxygen
which is commonly used when depositing oxides to fully oxygenate the
deposited films.
WORKING PRINCIPLE
Pulse Laser Techniques (PLD) uses high power laser pulses to melt, evaporate and ionize material from the
surface of a target.
In principle PLD is an extremely simple technique, which uses pulses of laser energy to remove
material from the surface of a target, as shown below in the diagram.
The vaporized material, containing neutrals, ions, electrons etc., is known as a laser-produced plasma
plume and expands rapidly away from the target surface Film growth occurs on a substrate upon which
some of the plume material recondenses.
LITERATURE SURVEY
15