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WO2022024438A1 - Resonator, and resonating device - Google Patents

Resonator, and resonating device Download PDF

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Publication number
WO2022024438A1
WO2022024438A1 PCT/JP2021/009077 JP2021009077W WO2022024438A1 WO 2022024438 A1 WO2022024438 A1 WO 2022024438A1 JP 2021009077 W JP2021009077 W JP 2021009077W WO 2022024438 A1 WO2022024438 A1 WO 2022024438A1
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WO
WIPO (PCT)
Prior art keywords
vibrating arm
vibrating
arm
offset structure
resonator
Prior art date
Application number
PCT/JP2021/009077
Other languages
French (fr)
Japanese (ja)
Inventor
宏 中谷
Original Assignee
株式会社村田製作所
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Filing date
Publication date
Application filed by 株式会社村田製作所 filed Critical 株式会社村田製作所
Priority to JP2022540004A priority Critical patent/JP7449496B2/en
Publication of WO2022024438A1 publication Critical patent/WO2022024438A1/en

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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive

Definitions

  • the present invention relates to a resonator and a resonator.
  • Resonators such as piezoelectric vibrators are used as devices for realizing the timekeeping function in electronic devices. With the miniaturization of electronic devices, miniaturization of resonators is also required, and resonators manufactured using MEMS (Micro Electro Mechanical Systems) technology (hereinafter, also referred to as "MEMS oscillators”) are attracting attention. ing.
  • MEMS Micro Electro Mechanical Systems
  • the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm due to the bending vibration of the vibrating arm may not be sufficiently offset.
  • vibration leakage from the holding portion may affect the vibration characteristics of the vibrating portion.
  • the present invention has been made in view of such circumstances, and is a resonator capable of stabilizing the vibration characteristics of the vibrating portion by canceling the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm. And to provide a resonator.
  • the resonator includes a vibrating portion, a holding portion provided at least a part around the vibrating portion, a holding arm provided between the vibrating portion and the holding portion, and a holding arm.
  • the vibrating portion has a fixed end and an open end, and has a first vibrating arm that bends out-of-plane, and a fixed end and an open end, and bends out-of-plane in a phase different from that of the first vibrating arm.
  • the holding arm includes a second vibrating arm, a front end to which the first vibrating arm and the second vibrating arm are connected in parallel, and a base having a rear end facing the front end, and the holding arm has one end.
  • the first vibrating arm is connected to the base portion and the other end is connected to the holding portion, and the first vibrating arm is a first central axis in the lateral direction of the first vibrating arm at a boundary portion between the first vibrating arm and the base portion.
  • the second vibrating arm has a first offset structure for offsetting the position of the center of gravity of the first vibrating arm inside the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm.
  • the position of the center of gravity of the second vibrating arm is offset to the inside of the vibrating portion in the parallel direction from the second central axis in the lateral direction of the second vibrating arm at the boundary portion between the second vibrating arm and the base portion. It has a two-offset structure.
  • the vibration characteristics of the vibrating portion can be stabilized by canceling the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm.
  • FIG. 1 is a perspective view schematically showing the appearance of the resonance device 1 according to the embodiment of the present invention.
  • FIG. 2 is an exploded perspective view schematically showing the structure of the resonance device 1 according to the embodiment of the present invention.
  • the resonator 1 includes a resonator 10 and an upper lid 30 and a lower lid 20 provided so as to face each other with the resonator 10 interposed therebetween. That is, the resonator 1 is configured by stacking the lower lid 20, the resonator 10, and the upper lid 30 in this order.
  • the resonator 10 is joined to the lower lid 20 and the upper lid 30, whereby the resonator 10 is sealed and the vibration space of the resonator 10 is formed.
  • the resonator 10, the lower lid 20, and the upper lid 30 are each formed by using a Si substrate.
  • the Si substrates of the resonator 10, the lower lid 20, and the upper lid 30 are joined to each other.
  • the resonator 10 and the lower lid 20 may be formed by using an SOI substrate.
  • the resonator 10 is a MEMS resonator manufactured by using MEMS technology.
  • the resonator 10 will be described as an example of being formed by using a silicon substrate.
  • each configuration of the resonance device 1 will be described in detail.
  • the upper lid 30 extends in a flat plate shape along the XY plane, and for example, a flat rectangular parallelepiped concave portion 31 is formed on the back surface thereof.
  • the recess 31 is surrounded by the side wall 33 and forms a part of the vibration space, which is the space where the resonator 10 vibrates.
  • the lower lid 20 has a rectangular plate-shaped bottom plate 22 provided along the XY plane and a side wall 23 extending from the peripheral edge of the bottom plate 22 in the Z-axis direction (that is, the stacking direction of the lower lid 20 and the resonator 10).
  • the lower lid 20 is provided with a recess 21 formed by the surface of the bottom plate 22 and the inner surface of the side wall 23 on the surface facing the resonator 10.
  • the recess 21 forms a part of the vibration space of the resonator 10.
  • the vibration space is airtightly sealed by the upper lid 30 and the lower lid 20 described above, and a vacuum state is maintained.
  • the vibration space may be filled with a gas such as an inert gas.
  • FIG. 3 is a plan view schematically showing the structure of the resonator 10 according to the present embodiment. Each configuration of the resonator 10 according to the present embodiment will be described with reference to FIG.
  • the resonator 10 includes a vibrating portion 120, a holding portion 140, and a holding arm 110.
  • the vibrating unit 120 has a rectangular contour extending along the XY plane in the Cartesian coordinate system of FIG.
  • the vibrating portion 120 is provided inside the holding portion 140, and a space is formed between the vibrating portion 120 and the holding portion 140 at a predetermined interval.
  • the vibrating unit 120 is a tuning fork type oscillator and has a base 130 and two vibrating arms 135A and 135B (collectively referred to as “vibrating arm 135”).
  • each vibrating arm 135 and the base 130 are integrally formed.
  • the base 130 has long sides 131a and 131b in the X-axis direction and short sides 131c and 131d in the Y-axis direction in a plan view.
  • the long side 131a is one side of the front end surface 131A (hereinafter, also referred to as “front end 131A”) of the base 130
  • the long side 131b is the rear end surface 131B (hereinafter, “rear end 131B”) of the base 130. Also called.) It is one side of.
  • the front end 131A and the rear end 131B are provided so as to face each other.
  • the front end 131A of the base 130 is connected to the vibrating arm 135 described later
  • the rear end 131B of the base 130 is connected to the holding arm 110 described later.
  • the vibrating arm 135 extends in the Y-axis direction and has the same size.
  • Each of the vibrating arms 135 is provided between the base 130 and the holding portion 140 in parallel in the Y-axis direction, one end is connected to the front end 131A of the base 130 to be a fixed end, and the other end is an open end. It has become.
  • the vibrating arms 135 are provided in parallel at predetermined intervals in the X-axis direction, respectively. That is, the X-axis direction corresponds to the parallel direction in which the two vibrating arms 135A and 135B are parallel to each other.
  • the vibrating arm 135 has, for example, a width of about 50 ⁇ m in the X-axis direction and a length of about 465 ⁇ m in the Y-axis direction.
  • the open end of the vibrating arm 135 has a weight portion. Unlike the example shown in FIG. 3, the weight portion may be wider in the X-axis direction than, for example, other portions of the vibrating arm 135. Alternatively, the weight portion may have the same width in the X-axis direction as the other portion of the vibrating arm 135. Such weight portions having the same width can be formed, for example, by laminating metal layers. Since the open end of the vibrating arm 135 has a weight portion, the weight per unit length of the vibrating arm 135 is heavier on the open end side than on the fixed end side. Therefore, the amplitude of the vertical vibration of the vibrating arm 135 can be increased.
  • a protective film 235 is formed on the surface of the vibrating portion 120 (the surface facing the upper lid 30) so as to cover the entire surface thereof. Further, frequency adjusting films 236A and 236B (hereinafter, the frequency adjusting films 236A and 236B are collectively referred to as "frequency adjusting film 236") are provided on a part of the surface of the protective film 235 in the vibrating arms 135A and 135B, respectively. It is formed.
  • the resonance frequency of the vibrating unit 120 can be adjusted by the protective film 235 and the frequency adjusting film 236.
  • the protective film 235 does not necessarily cover the entire surface of the vibrating portion 120, damage to the underlying electrode film (for example, the metal layer E2 in FIG. 4) and the piezoelectric film (for example, the piezoelectric thin film F3 in FIG. 4) in frequency adjustment is caused. It is desirable that the entire surface of the vibrating portion 120 is protected.
  • the frequency adjusting film 236 is formed on the protective film 235 so that the surface of the vibrating portion 120 is exposed at least in at least a part of the region where the displacement due to vibration is relatively larger than the other regions. Specifically, the frequency adjusting film 236 is formed on the tip of the vibrating arm 135, that is, the weight portion. On the other hand, the surface of the protective film 235 is exposed in other regions of the vibrating arm 135. In this embodiment, the frequency adjusting film 236 is formed up to the tip of the vibrating arm 135, and the protective film 235 is not exposed at all at the tip, but the frequency adjusting film 236 is provided so that a part of the protective film 235 is exposed. A configuration that is not formed at the tip of the vibrating arm 135 is also possible.
  • the holding portion 140 is formed in a rectangular frame shape along the XY plane.
  • the holding portion 140 is provided so as to surround the outside of the vibrating portion 120 along the XY plane in a plan view.
  • the holding portion 140 may be provided at least in a part around the vibrating portion 120, and is not limited to the frame shape.
  • the holding portion 140 may be provided around the vibrating portion 120 so as to hold the vibrating portion 120 and to be joined to the upper lid 30 and the lower lid 20.
  • the holding portion 140 is composed of prismatic frame bodies 140a to 140d integrally formed.
  • the frame body 140a is provided so as to face the open end of the vibrating arm 135 and to be provided in the longitudinal direction parallel to the X axis.
  • the frame body 140b is provided so as to face the rear end 131B of the base 130 and the longitudinal direction is parallel to the X axis.
  • the frame body 140c is provided so as to face the side end (short side 131c) of the base 130 and the vibrating arm 135A, and the longitudinal direction is parallel to the Y axis.
  • One end of the frame body 140c is connected to the frame body 140a, and the other end of the frame body 140c is connected to the frame body 140b.
  • the frame body 140d is provided so as to face the side end (short side 131d) of the base 130 and the vibrating arm 135B, and the longitudinal direction is parallel to the Y axis.
  • One end of the frame body 140d is connected to the frame body 140a, and the other end of the frame body 140d is connected to the frame body 140b.
  • the holding arm 110 is provided inside the holding portion 140, and connects the rear end 131B of the base 130 and the frame body 140b. One end of the holding arm 110 is connected to the rear end 131B of the base 130, and the other end of the holding arm 110 is connected to the frame body 140b.
  • the holding arm 110 is provided so that the longitudinal direction is parallel to the Y axis.
  • FIG. 4 is a schematic view schematically showing the AA'cross section of FIG. 3 and the electrical connection mode of the resonator 10.
  • the holding portion 140, the base 130, the vibrating arm 135, and the holding arm 110 are integrally formed by the same process.
  • the metal layer E1 is laminated on the Si (silicon) substrate F2.
  • a piezoelectric thin film F3 is laminated on the metal layer E1 so as to cover the metal layer E1, and a metal layer E2 is laminated on the surface of the piezoelectric thin film F3.
  • a protective film 235 is laminated on the metal layer E2 so as to cover the metal layer E2.
  • a frequency adjusting film 236 is further laminated on the protective film 235.
  • the metal layers E1 and E2 are formed by using, for example, Mo (molybdenum), aluminum (Al), or the like having a thickness of about 0.1 to 0.2 ⁇ m.
  • the metal layers E1 and E2 are formed into a desired shape by etching or the like.
  • the metal layer E1 functions as a lower electrode, for example, on the vibrating portion 120. Further, the metal layer E1 functions as wiring for connecting the lower electrode to the AC power supply provided outside the resonator 10 on the holding arm 110 and the holding portion 140.
  • the metal layer E2 functions as an upper electrode on the vibrating portion 120. Further, the metal layer E2 functions as wiring for connecting the upper electrode to the circuit provided outside the resonator 10 on the holding arm 110 and the holding portion 140.
  • the piezoelectric thin film F3 is a piezoelectric thin film that converts an applied voltage into vibration, and can contain, for example, a nitride or oxide such as AlN (aluminum nitride) as a main component.
  • the piezoelectric thin film F3 can be formed of ScAlN (scandium nitride aluminum). ScAlN is obtained by substituting a part of aluminum in aluminum nitride with scandium.
  • the piezoelectric thin film F3 expands and contracts in the in-plane direction of the XY plane, that is, in the Y-axis direction, according to the electric field applied to the piezoelectric thin film F3 by the metal layers E1 and E2. Due to the expansion and contraction of the piezoelectric thin film F3, the vibrating arm 135 displaces its open end toward the inner surfaces of the lower lid 20 and the upper lid 30 and vibrates in an out-of-plane bending vibration mode.
  • the protective film 235 is a layer of an insulator, and is formed of a material whose mass reduction rate by etching is slower than that of the frequency adjusting film 236.
  • the protective film 235 is formed of a nitride film such as AlN or SiN or an oxide film such as Ta2O5 (tantalum pentoxide) or SiO2.
  • the mass reduction rate is expressed by the product of the etching rate (thickness removed per unit time) and the density.
  • the frequency adjustment film 236 is a layer of a conductor, and is formed of a material whose mass reduction rate by etching is faster than that of the protective film 235.
  • the frequency adjusting film 236 is formed of, for example, a metal such as molybdenum (Mo), tungsten (W), gold (Au), platinum (Pt), nickel (Ni), aluminum (Al), and titanium (Ti).
  • the phase of the electric field applied to the vibrating arm 135A and the phase of the electric field applied to the vibrating arm 135B are set to be opposite to each other.
  • the vibrating arm 135A and the vibrating arm 135B are displaced in opposite directions. For example, when the vibrating arm 135A displaces the open end toward the inner surface of the upper lid 30, the vibrating arm 135B displaces the open end toward the inner surface of the lower lid 20.
  • the vibrating arm 135A and the vibrating arm 135B shown in FIG. 4 vibrate in the up-down direction around the central axis r1 extending in parallel with the Y axis. do.
  • twisting moments in opposite directions are generated about the central axis r1 and bending vibration is generated in the vibrating portion 120.
  • the strain is concentrated in the region near the central axis r1 in the base 130.
  • FIG. 5 is a diagram for explaining the operation of the vibrating portion 120 during bending vibration.
  • the first rotational moment Arm is a rotational moment around the central axis parallel to the Y axis.
  • the second rotational moment Bend is a rotational moment around the central axis parallel to the X axis passing through the connection portion between the vibrating arm 135 and the base 130.
  • the third rotational moment All is a rotational moment around the central axis parallel to the Y axis that passes through the central position of the base 130 in the X-axis direction.
  • FIG. 6 is a diagram showing an example of the resonator 10 according to the embodiment.
  • the first vibrating arm 135A is a vibrating portion 120 of the first vibrating arm 135A and the second vibrating arm 135B in the parallel direction with respect to the first central axis S1 extending in the longitudinal direction of the first vibrating arm 135A. It has a first offset structure that offsets the center of gravity position G1 of the first vibrating arm 135A inside.
  • the second vibrating arm 135B has a second vibration inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the second central axis S2 extending in the longitudinal direction of the second vibrating arm 135B.
  • the first central axis S1 is the central axis in the lateral direction of the first vibrating arm 135A at the boundary portion between the first vibrating arm 135A and the base 130.
  • the first central axis S1 is a straight line parallel to the Y axis passing through the center position of the first vibrating arm 135A on the straight line AA'parallel to the X axis passing through the boundary portion between the first vibrating arm 135A and the base 130.
  • the second central axis S2 is the central axis in the lateral direction of the second vibrating arm 135B at the boundary portion between the second vibrating arm 135B and the base 130.
  • the second central axis S2 is a straight line parallel to the Y axis passing through the center position of the second vibrating arm 135B on the straight line AA'parallel to the X axis passing through the boundary portion between the second vibrating arm 135B and the base 130. be.
  • the first offset structure is provided at the tip of the first vibrating arm 135A
  • the second offset structure is provided at the tip of the second vibrating arm 135B.
  • the tip of the first vibrating arm 135A is, for example, a portion on the tip side of the center position in the longitudinal direction of the first vibrating arm 135A
  • the tip of the second vibrating arm 135B is, for example, the second vibrating arm 135B. It is the part on the tip side of the center position in the longitudinal direction.
  • the first offset structure is inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the first central axis S1 in the upper surface of the first vibrating arm 135A.
  • a weight portion 136A provided in.
  • the weight portion 136A may be provided on the lower surface of the first vibrating arm 135A.
  • the second offset structure is a weight provided inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B from the second central axis S2 on the upper surface of the second vibrating arm 135B.
  • the weight portion 136B may be provided on the lower surface of the second vibrating arm 135B.
  • the weight portion 136A has a rectangular plate shape elongated in the longitudinal direction of the first vibrating arm 135A, and the center position of the weight portion 136A in the X-axis direction is X than the center position of the first vibrating arm 135A in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction.
  • the weight portion 136A may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the first vibrating arm 135A.
  • the weight portion 136A has a rectangular plate shape elongated in the longitudinal direction of the first vibrating arm 135A, and the center position of the weight portion 136A in the X-axis direction is X than the center position of the first vibrating arm 135A in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction.
  • the weight portion 136A may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the first vibrating arm 135A.
  • the weight portion 136B has a rectangular plate shape elongated in the longitudinal direction of the second vibrating arm 135B, and the center position of the weight portion 136B in the X-axis direction is X than the center position of the second vibrating arm 135B in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction.
  • the weight portion 136B may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the second vibrating arm 135B.
  • the weight portion 136B has a rectangular plate shape elongated in the longitudinal direction of the second vibrating arm 135B, and the center position of the weight portion 136B in the X-axis direction is X than the center position of the second vibrating arm 135B in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction.
  • the weight portion 136B may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the second vibrating arm 135B.
  • FIG. 7 is a diagram for explaining the function of the resonator 10 of the comparative example.
  • the position of the center of gravity of the first vibrating arm 135A coincides with the first central axis S1
  • the position of the center of gravity of the second vibrating arm 135B coincides with the second central axis S2.
  • FIG. 7 visually shows the result of predicting the magnitude of the distortion generated at each location of the resonator 10 at the time of bending vibration of the resonator 10 in the comparative example using a simulation model.
  • the first rotational moment Arm in the same direction acts on each of the tip portion of the first vibrating arm 135A and the tip portion of the second vibrating arm 135B.
  • the base end portion of the first vibrating arm 135A and the base end portion of the second vibrating arm 135B are likely to be distorted. If these distortions are transmitted from each of the first vibrating arm 135A and the second vibrating arm 135B to the base 130, vibration leakage may occur from the base 130 to the outside, which may affect the vibration characteristics of the vibrating portion 120. rice field.
  • FIG. 8 is a diagram for explaining the function of the resonator 10 according to the present embodiment.
  • FIG. 8 shows the position of the center of gravity of the first vibrating arm 135A and the position of the center of gravity of the first vibrating arm 135A by bending the tip of the first vibrating arm 135A and the tip of the second vibrating arm 135B inward for convenience of explanation and understanding of the specification.
  • the case where the position of the center of gravity of the second vibrating arm 135B is offset will be described as an example.
  • the first rotational moment Arm in the opposite direction acts on each of the tip of the first vibrating arm 135A and the tip of the second vibrating arm 135B. do.
  • distortion occurs in the base end of the first vibrating arm 135A and the base end of the second vibrating arm 135B, and these distortions are transmitted from each of the first vibrating arm 135A and the second vibrating arm 135B to the base 130. Even if transmitted, these distortions are offset. As a result, vibration leakage from the base 130 to the outside is unlikely to occur, and the vibration characteristics of the vibration unit 120 are stabilized.
  • the resonator 10 is provided between the vibrating portion 120, the holding portion 140 provided at least a part around the vibrating portion 120, and the vibrating portion 120 and the holding portion 140, and one end thereof is a base portion.
  • a holding arm 110 connected to 130 and the other end connected to a holding portion 140 is provided, and the vibrating portion 120 has a fixed end and an open end, and is fixed to a first vibrating arm 135A that bends out of the plane.
  • the second vibrating arm 135B which has an end and an open end and bends out of the plane in a phase different from that of the first vibrating arm 135A, the front end connected to the first vibrating arm 135A and the second vibrating arm 135B, and the front end thereof.
  • the first vibrating arm 135A includes a base 130 having opposite rear ends, and the first vibrating arm 135A is larger than the first central axis S1 in the lateral direction of the first vibrating arm 135A at the boundary portion between the first vibrating arm 135A and the base 130.
  • the second vibrating arm 135B has a first offset structure for offsetting the center of gravity position G1 of the first vibrating arm 135A inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • FIG. 9 is a diagram showing a modified example of the configuration of the resonator according to the embodiment.
  • the first offset structure includes a convex portion 137A provided on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • the second offset structure includes a convex portion 137B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • FIG. 10 is a diagram showing a modified example of the configuration of the resonator according to the embodiment.
  • the first offset structure is located outside the vibrating portion 120 of the upper surface or the lower surface of the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the first central axis S1. Includes the formed hole 138A.
  • the vibrating portion 120 instead of the hole 138A, of the upper surface or the lower surface of the first vibrating arm 135A, the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B from the first central axis S1. It may include a groove formed on the outside.
  • the second offset structure is a hole formed in the upper surface or the lower surface of the second vibrating arm 135B on the outer side of the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the second central axis S2. 138B is included. In the second offset structure, instead of the hole 138B, of the upper surface or the lower surface of the second vibrating arm 135B, the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B from the first central axis S1. It may include a groove formed on the outside.
  • FIG. 11 is a diagram showing a modified example of the configuration of the resonator according to the embodiment.
  • the first offset structure is the first vibrating arm 135A opposite to the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • the second offset structure is provided on the side surface of the second vibrating arm 135B opposite to the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • FIG. 12 is a diagram showing a modified example of the configuration of the resonator according to the embodiment.
  • the first offset structure is the first convex portion 141A provided on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • the first convex is provided on the side surface of the first vibrating arm 135A opposite to the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • the second offset structure includes a first convex portion 141B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B, and the first vibration. It is provided on the side surface of the second vibrating arm 135B opposite to the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the arm 135A and the second vibrating arm 135B, and is more than the first convex portion 141B. It includes a second convex portion 142B having a small protrusion amount from the side surface of the second vibrating arm 135B.
  • FIG. 13 is a diagram showing a modified example of the configuration of the resonator according to the embodiment.
  • the first offset structure is on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B in the longitudinal direction of the first vibrating arm 135A. It includes a plurality of convex portions 143A provided at intervals.
  • the second offset structure includes a protrusion 143B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
  • the convex portion 143B is provided at a position intermediate between the plurality of convex portions 143A in the longitudinal direction of the second vibrating arm 135B.
  • the first offset structure and the second offset structure are asymmetrical to each other, but the first vibrating arm 135A and the second vibrating arm 135B have a common natural frequency.
  • FIG. 14 is a diagram showing a modified example of the configuration of the resonator according to the embodiment.
  • the first offset structure is on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B in the longitudinal direction of the first vibrating arm 135A. It includes a plurality of convex portions 144A provided at intervals and a concave portion 145A provided at an intermediate position between the plurality of convex portions 144A in the same direction.
  • the second offset structure has a convex portion 144B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. It includes a plurality of recesses 145B provided on both sides of the 144B. The tip of each of the plurality of protrusions 144A is arranged inside the plurality of recesses 145B. The tip of the convex portion 144B is arranged inside the concave portion 145A.
  • the first offset structure and the second offset structure are asymmetrical to each other, but the first vibrating arm 135A and the second vibrating arm 135B have a common natural frequency.
  • FIG. 15 is a diagram showing a modified example of the configuration of the resonator according to the embodiment.
  • the first central axis S1 extending in the longitudinal direction of the first vibrating arm 135A and the second central axis S2 extending in the longitudinal direction of the second vibrating arm 135B are the first vibrating arm 135A and the second vibration, respectively.
  • the arm 135B is inclined and extends inward of the vibrating portion 120 in the parallel direction.
  • the first central axis S1 passes through the center position of the first vibrating arm 135A on the straight line AA'parallel to the X axis passing through the boundary portion between the first vibrating arm 135A and the base 130.
  • the second central axis S2 is the longitudinal length of the second vibrating arm 135B passing through the center position of the second vibrating arm 135B on the straight line AA'parallel to the X axis passing through the boundary portion between the second vibrating arm 135B and the base 130. It is a straight line parallel to the direction.
  • the vibrating portion is provided with a vibrating portion, a holding portion provided at least a part around the vibrating portion, and a holding arm provided between the vibrating portion and the holding portion.
  • a vibrating portion has a first vibrating arm that has a fixed end and an open end and bends out of the plane, and a second vibrating arm that has a fixed end and an open end and bends out of the plane in a phase different from that of the first vibrating arm.
  • the holding arm includes a front end connected to a first vibrating arm and a second vibrating arm, and a base having a rear end facing the front end, the holding arm having one end connected to the base and the other end connected to the holding portion.
  • the first vibrating arm is inside the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm from the first central axis in the lateral direction of the first vibrating arm at the boundary portion between the first vibrating arm and the base. It has a first offset structure that offsets the position of the center of gravity of the first vibrating arm, and the second vibrating arm is more than the second central axis in the lateral direction of the second vibrating arm at the boundary between the second vibrating arm and the base.
  • a resonator having a second offset structure for offsetting the position of the center of gravity of the second vibrating arm inside the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm.
  • the first offset structure is provided at the tip of the first vibrating arm, and the second offset structure is provided at the tip of the second vibrating arm.
  • the first offset structure is a weight portion provided inside the vibrating portion of the upper surface or the lower surface of the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the first central axis.
  • the second offset structure includes a weight portion provided inside the vibrating portion of the upper surface or the lower surface of the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the second central axis.
  • the first offset structure includes a convex portion provided on the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm
  • the second offset structure is , Includes a convex portion provided on the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm.
  • the first offset structure is a hole or a hole formed on the outer surface of the upper surface or the lower surface of the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the first central axis.
  • the second offset structure includes a groove, or a hole or a hole formed on the outer surface of the upper surface or the lower surface of the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the second central axis. Including grooves.
  • the first offset structure is provided on the side surface of the first vibrating arm opposite to the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm.
  • the second offset structure is provided on the side surface of the second vibrating arm opposite to the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm. Includes recessed recesses.
  • the first offset structure has a first convex portion provided on the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the first vibrating arm and the first vibrating arm, and the first vibrating arm. And from the side surface of the first vibrating arm rather than the first convex portion provided on the side surface of the first vibrating arm opposite to the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the second vibrating arm.
  • the second offset structure is provided on the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm, including the second convex portion having a small protrusion amount.
  • the first convex portion is provided on the side surface of the second vibrating arm opposite to the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the first vibrating arm. It includes a second convex portion having a smaller protrusion amount from the side surface of the second vibrating arm.
  • the first vibrating arm and the second vibrating arm have a common natural frequency
  • the first offset structure and the second offset structure are asymmetrical with each other.
  • the vibrating portion is provided with a vibrating portion, a holding portion provided at least a part around the vibrating portion, and a holding arm provided between the vibrating portion and the holding portion.
  • a vibrating portion has a first vibrating arm that has a fixed end and an open end and bends out of the plane, and a second vibrating arm that has a fixed end and an open end and bends out of the plane in a phase different from that of the first vibrating arm.
  • the holding arm includes a front end connected to a first vibrating arm and a second vibrating arm, and a base having a rear end facing the front end, the holding arm having one end connected to the base and the other end connected to the holding portion.
  • Each of the central axes is inclined and extends inward of the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm.
  • the vibrating portion has a piezoelectric film and an upper electrode and a lower electrode provided so as to face each other with the piezoelectric film interposed therebetween.
  • the vibration characteristics of the vibrating portion can be stabilized by canceling the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm.
  • the resonator is a MEMS having a piezoelectric film and an upper electrode and a lower electrode provided so as to face each other across the piezoelectric film has been described as an example, but the resonator is described. Not limited to this, it may have other materials (for example, crystal material, etc.) and structures.

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Abstract

This resonator is provided with a vibrating portion, a holding portion provided in at least a portion of the perimeter of the vibrating portion, and a holding arm provided between the vibrating portion and the holding portion, wherein: the vibrating portion includes a first vibrating arm which has a fixed end and an open end, and which bends out of plane, and a second vibrating arm which has a fixed end and an open, and which bends out of a plane with a phase different from the first vibrating arm, and a base portion to which the first vibrating arm and the second vibrating arm are connected in parallel; the holding arm has one end connected to the base portion and the other end connected to the holding portion; the first vibrating arm has a first offset structure in which the position of the center of gravity of the first vibrating arm is offset toward the inside of the vibrating portion, in the parallel direction of the first vibrating arm and the second vibrating arm, from a first central axis, in the lateral direction of the first vibrating arm, of the boundary between the first vibrating arm and the base portion; and the second vibrating arm has a second offset structure in which the position of the center of gravity of the second vibrating arm is offset toward the inside of the vibrating portion, in the parallel direction of the first vibrating arm and the second vibrating arm, from a second central axis, in the lateral direction of the second vibrating arm, of the boundary between the second vibrating arm and the base portion.

Description

共振子及び共振装置Resonator and resonator
 本発明は、共振子及び共振装置に関する。 The present invention relates to a resonator and a resonator.
 電子機器において計時機能を実現するためのデバイスとして、圧電振動子等の共振子が用いられている。電子機器の小型化に伴い、共振子も小型化が要求されており、MEMS(Micro Electro Mechanical Systems)技術を用いて製造される共振子(以下、「MEMS振動子」ともいう。)が注目されている。 Resonators such as piezoelectric vibrators are used as devices for realizing the timekeeping function in electronic devices. With the miniaturization of electronic devices, miniaturization of resonators is also required, and resonators manufactured using MEMS (Micro Electro Mechanical Systems) technology (hereinafter, also referred to as "MEMS oscillators") are attracting attention. ing.
 例えば、特許文献1には、内側に位置している2本の振動腕と、外側に位置している2本の振動腕を逆相に屈曲振動させることで、振動腕の屈曲振動に伴う振動腕の長手方向に延びる中心軸周りの振動腕の回転モーメントを相殺する共振子が記載されている。 For example, in Patent Document 1, two vibrating arms located inside and two vibrating arms located outside are flexed and vibrated in opposite phases to vibrate due to the flexion vibration of the vibrating arm. A resonator that cancels the rotational moment of the vibrating arm around the central axis extending in the longitudinal direction of the arm is described.
特許第6525292号公報Japanese Patent No. 6525292
 しかしながら、従来の技術においては、振動腕の屈曲振動に伴う振動腕の長手方向に延びる中心軸周りの回転モーメントを十分に相殺できないことがある。この場合、保持部からの振動漏れが生じることで、振動部の振動特性に影響を及ぼす虞があった。 However, in the conventional technique, the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm due to the bending vibration of the vibrating arm may not be sufficiently offset. In this case, vibration leakage from the holding portion may affect the vibration characteristics of the vibrating portion.
 本発明は、このような事情に鑑みてなされたものであり、振動腕の長手方向に延びる中心軸周りの回転モーメントを相殺することで、振動部の振動特性を安定化させることができる共振子及び共振装置を提供することを目的とする。 The present invention has been made in view of such circumstances, and is a resonator capable of stabilizing the vibration characteristics of the vibrating portion by canceling the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm. And to provide a resonator.
 本発明の一側面に係る共振子は、振動部と、前記振動部の周囲の少なくとも一部に設けられた保持部と、前記振動部と前記保持部との間に設けられた保持腕と、を備え、前記振動部は、固定端と開放端とを有し、面外屈曲する第1振動腕と、固定端と開放端とを有し、前記第1振動腕と異なる位相で面外屈曲する第2振動腕と、前記第1振動腕及び前記第2振動腕が並列して接続される前端、及び当該前端に対向する後端を有する基部と、を含み、前記保持腕は、一端が前記基部に接続され、他端が前記保持部に接続され、前記第1振動腕は、前記第1振動腕と前記基部との境界部分における前記第1振動腕の短手方向の第1中心軸よりも前記第1振動腕及び前記第2振動腕の並列方向における前記振動部の内側に前記第1振動腕の重心位置をオフセットさせる第1オフセット構造を有し、前記第2振動腕は、前記第2振動腕と前記基部との境界部分における前記第2振動腕の短手方向の第2中心軸よりも前記並列方向における前記振動部の内側に前記第2振動腕の重心位置をオフセットさせる第2オフセット構造を有する。 The resonator according to one aspect of the present invention includes a vibrating portion, a holding portion provided at least a part around the vibrating portion, a holding arm provided between the vibrating portion and the holding portion, and a holding arm. The vibrating portion has a fixed end and an open end, and has a first vibrating arm that bends out-of-plane, and a fixed end and an open end, and bends out-of-plane in a phase different from that of the first vibrating arm. The holding arm includes a second vibrating arm, a front end to which the first vibrating arm and the second vibrating arm are connected in parallel, and a base having a rear end facing the front end, and the holding arm has one end. The first vibrating arm is connected to the base portion and the other end is connected to the holding portion, and the first vibrating arm is a first central axis in the lateral direction of the first vibrating arm at a boundary portion between the first vibrating arm and the base portion. The second vibrating arm has a first offset structure for offsetting the position of the center of gravity of the first vibrating arm inside the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm. The position of the center of gravity of the second vibrating arm is offset to the inside of the vibrating portion in the parallel direction from the second central axis in the lateral direction of the second vibrating arm at the boundary portion between the second vibrating arm and the base portion. It has a two-offset structure.
 本発明によれば、振動腕の長手方向に延びる中心軸周りの回転モーメントを相殺することで、振動部の振動特性を安定化させることができる。 According to the present invention, the vibration characteristics of the vibrating portion can be stabilized by canceling the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm.
一実施形態に係る共振装置の外観を概略的に示す斜視図である。It is a perspective view schematically showing the appearance of the resonance apparatus which concerns on one Embodiment. 一実施形態に係る共振装置の構造を概略的に示す分解斜視図である。It is an exploded perspective view which shows schematic structure of the resonance apparatus which concerns on one Embodiment. 上側基板を取り外した一実施形態に係る共振子の平面図である。It is a top view of the resonator which concerns on one Embodiment which removed the upper substrate. 図1のAA'線に沿った断面図である。It is sectional drawing along the AA'line of FIG. 振動部の屈曲振動時の動作を説明するための図である。It is a figure for demonstrating the operation at the time of bending vibration of a vibrating part. 一実施形態に係る共振子の構成の一例を示す図である。It is a figure which shows an example of the structure of the resonator which concerns on one Embodiment. 比較例の共振子の機能を説明するための図である。It is a figure for demonstrating the function of the resonator of the comparative example. 一実施形態に係る共振子の機能を説明するための図である。It is a figure for demonstrating the function of the resonator which concerns on one Embodiment. 一実施形態に係る共振子の構成の変形例を示す図である。It is a figure which shows the modification of the structure of the resonator which concerns on one Embodiment. 一実施形態に係る共振子の構成の変形例を示す図である。It is a figure which shows the modification of the structure of the resonator which concerns on one Embodiment. 一実施形態に係る共振子の構成の変形例を示す図である。It is a figure which shows the modification of the structure of the resonator which concerns on one Embodiment. 一実施形態に係る共振子の構成の変形例を示す図である。It is a figure which shows the modification of the structure of the resonator which concerns on one Embodiment. 一実施形態に係る共振子の構成の変形例を示す図である。It is a figure which shows the modification of the structure of the resonator which concerns on one Embodiment. 一実施形態に係る共振子の構成の変形例を示す図である。It is a figure which shows the modification of the structure of the resonator which concerns on one Embodiment. 一実施形態に係る共振子の構成の変形例を示す図である。It is a figure which shows the modification of the structure of the resonator which concerns on one Embodiment.
 以下、添付の図面を参照して本発明の一実施形態について説明する。図1は、本発明の一実施形態に係る共振装置1の外観を概略的に示す斜視図である。また、図2は、本発明の一実施形態に係る共振装置1の構造を概略的に示す分解斜視図である。 Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a perspective view schematically showing the appearance of the resonance device 1 according to the embodiment of the present invention. Further, FIG. 2 is an exploded perspective view schematically showing the structure of the resonance device 1 according to the embodiment of the present invention.
 この共振装置1は、共振子10と、共振子10を挟んで互いに対向するように設けられた上蓋30及び下蓋20と、を備えている。すなわち、共振装置1は、下蓋20と、共振子10と、上蓋30とがこの順で積層されて構成されている。 The resonator 1 includes a resonator 10 and an upper lid 30 and a lower lid 20 provided so as to face each other with the resonator 10 interposed therebetween. That is, the resonator 1 is configured by stacking the lower lid 20, the resonator 10, and the upper lid 30 in this order.
 また、共振子10と下蓋20及び上蓋30とが接合され、これにより、共振子10が封止され、共振子10の振動空間が形成される。共振子10、下蓋20及び上蓋30は、それぞれSi基板を用いて形成されている。そして、共振子10、下蓋20及び上蓋30は、Si基板同士が互いに接合される。共振子10及び下蓋20は、SOI基板を用いて形成されてもよい。 Further, the resonator 10 is joined to the lower lid 20 and the upper lid 30, whereby the resonator 10 is sealed and the vibration space of the resonator 10 is formed. The resonator 10, the lower lid 20, and the upper lid 30 are each formed by using a Si substrate. The Si substrates of the resonator 10, the lower lid 20, and the upper lid 30 are joined to each other. The resonator 10 and the lower lid 20 may be formed by using an SOI substrate.
 共振子10は、MEMS技術を用いて製造されるMEMS共振子である。なお、本実施形態においては、共振子10はシリコン基板を用いて形成されるものを例として説明する。以下、共振装置1の各構成について詳細に説明する。 The resonator 10 is a MEMS resonator manufactured by using MEMS technology. In this embodiment, the resonator 10 will be described as an example of being formed by using a silicon substrate. Hereinafter, each configuration of the resonance device 1 will be described in detail.
(1.上蓋30)
 上蓋30はXY平面に沿って平板状に広がっており、その裏面に例えば平たい直方体形状の凹部31が形成されている。凹部31は、側壁33に囲まれており、共振子10が振動する空間である振動空間の一部を形成する。
(1. Top lid 30)
The upper lid 30 extends in a flat plate shape along the XY plane, and for example, a flat rectangular parallelepiped concave portion 31 is formed on the back surface thereof. The recess 31 is surrounded by the side wall 33 and forms a part of the vibration space, which is the space where the resonator 10 vibrates.
(2.下蓋20)
 下蓋20は、XY平面に沿って設けられる矩形板状の底板22と、底板22の周縁部からZ軸方向(すなわち、下蓋20と共振子10との積層方向)に延びる側壁23とを有する。下蓋20には、共振子10と対向する面において、底板22の表面と側壁23の内面とによって形成される凹部21が設けられる。凹部21は、共振子10の振動空間の一部を形成する。上述した上蓋30と下蓋20とによって、この振動空間は気密に封止され、真空状態が維持される。この振動空間には、例えば不活性ガス等の気体が充填されてもよい。
(2. Lower lid 20)
The lower lid 20 has a rectangular plate-shaped bottom plate 22 provided along the XY plane and a side wall 23 extending from the peripheral edge of the bottom plate 22 in the Z-axis direction (that is, the stacking direction of the lower lid 20 and the resonator 10). Have. The lower lid 20 is provided with a recess 21 formed by the surface of the bottom plate 22 and the inner surface of the side wall 23 on the surface facing the resonator 10. The recess 21 forms a part of the vibration space of the resonator 10. The vibration space is airtightly sealed by the upper lid 30 and the lower lid 20 described above, and a vacuum state is maintained. The vibration space may be filled with a gas such as an inert gas.
(3.共振子10)
 図3は、本実施形態に係る共振子10の構造を概略的に示す平面図である。図3を用いて本実施形態に係る共振子10の各構成について説明する。共振子10は、振動部120と、保持部140と、保持腕110とを備えている。
(3. Resonator 10)
FIG. 3 is a plan view schematically showing the structure of the resonator 10 according to the present embodiment. Each configuration of the resonator 10 according to the present embodiment will be described with reference to FIG. The resonator 10 includes a vibrating portion 120, a holding portion 140, and a holding arm 110.
 (a)振動部120
 振動部120は、図3の直交座標系におけるXY平面に沿って広がる矩形の輪郭を有している。振動部120は、保持部140の内側に設けられており、振動部120と保持部140との間には、所定の間隔で空間が形成されている。図3の例では、振動部120は、音叉型振動子であり、基部130と2本の振動腕135A、135B(まとめて「振動腕135」とも呼ぶ。)と、を有している。本実施形態において、各振動腕135と、基部130とは、一体に形成されている。
(A) Vibration unit 120
The vibrating unit 120 has a rectangular contour extending along the XY plane in the Cartesian coordinate system of FIG. The vibrating portion 120 is provided inside the holding portion 140, and a space is formed between the vibrating portion 120 and the holding portion 140 at a predetermined interval. In the example of FIG. 3, the vibrating unit 120 is a tuning fork type oscillator and has a base 130 and two vibrating arms 135A and 135B (collectively referred to as “vibrating arm 135”). In the present embodiment, each vibrating arm 135 and the base 130 are integrally formed.
 基部130は、平面視において、X軸方向に長辺131a、131b、Y軸方向に短辺131c、131dを有している。長辺131aは、基部130の前端の面131A(以下、「前端131A」とも呼ぶ。)の一つの辺であり、長辺131bは基部130の後端の面131B(以下、「後端131B」とも呼ぶ。)の一つの辺である。基部130において、前端131Aと後端131Bとは、互いに対向するように設けられている。基部130の前端131Aは、後述する振動腕135に接続され、基部130の後端131Bは、後述する保持腕110に接続されている。 The base 130 has long sides 131a and 131b in the X-axis direction and short sides 131c and 131d in the Y-axis direction in a plan view. The long side 131a is one side of the front end surface 131A (hereinafter, also referred to as “front end 131A”) of the base 130, and the long side 131b is the rear end surface 131B (hereinafter, “rear end 131B”) of the base 130. Also called.) It is one side of. In the base 130, the front end 131A and the rear end 131B are provided so as to face each other. The front end 131A of the base 130 is connected to the vibrating arm 135 described later, and the rear end 131B of the base 130 is connected to the holding arm 110 described later.
 振動腕135は、Y軸方向に延び、それぞれ同一のサイズを有している。振動腕135は、それぞれが基部130と保持部140との間にY軸方向に平行に設けられ、一端は、基部130の前端131Aと接続されて固定端となっており、他端は開放端となっている。また、振動腕135は、それぞれ、X軸方向に所定の間隔で、並列して設けられている。すなわち、X軸方向は、2本の振動腕135A,135Bが並列する並列方向に相当する。なお、振動腕135は、例えばX軸方向の幅が50μm程度、Y軸方向の長さが465μm程度である。 The vibrating arm 135 extends in the Y-axis direction and has the same size. Each of the vibrating arms 135 is provided between the base 130 and the holding portion 140 in parallel in the Y-axis direction, one end is connected to the front end 131A of the base 130 to be a fixed end, and the other end is an open end. It has become. Further, the vibrating arms 135 are provided in parallel at predetermined intervals in the X-axis direction, respectively. That is, the X-axis direction corresponds to the parallel direction in which the two vibrating arms 135A and 135B are parallel to each other. The vibrating arm 135 has, for example, a width of about 50 μm in the X-axis direction and a length of about 465 μm in the Y-axis direction.
 振動腕135の開放端は、錘部を有している。図3に示す例とは異なり、錘部は、例えば、振動腕135の他の部位よりもX軸方向の幅が広くてもよい。あるいは、錘部は、振動腕135の他の部位とX軸方向の幅が同一であってもよい。このような幅が同一の錘部は、例えば、金属層を積層させることによって形成することができる。振動腕135の開放端が錘部を有することで、振動腕135は、単位長さ当たりの重さが、固定端側よりも開放端側の方が重くなっている。従って、振動腕135における上下方向の振動の振幅を大きくすることができる。 The open end of the vibrating arm 135 has a weight portion. Unlike the example shown in FIG. 3, the weight portion may be wider in the X-axis direction than, for example, other portions of the vibrating arm 135. Alternatively, the weight portion may have the same width in the X-axis direction as the other portion of the vibrating arm 135. Such weight portions having the same width can be formed, for example, by laminating metal layers. Since the open end of the vibrating arm 135 has a weight portion, the weight per unit length of the vibrating arm 135 is heavier on the open end side than on the fixed end side. Therefore, the amplitude of the vertical vibration of the vibrating arm 135 can be increased.
 振動部120の表面(上蓋30に対向する面)には、その全面を覆うように保護膜235が形成されている。さらに、振動腕135A、135Bにおける保護膜235の表面の一部には、それぞれ、周波数調整膜236A、236B(以下、周波数調整膜236A、236Bをまとめて「周波数調整膜236」とも呼ぶ。)が形成されている。保護膜235及び周波数調整膜236によって、振動部120の共振周波数を調整することができる。尚、必ずしも保護膜235は振動部120の全面を覆う必要はないが、周波数調整における下地の電極膜(例えば図4の金属層E2)及び圧電膜(例えば図4の圧電薄膜F3)へのダメージを保護する上で、振動部120の全面の方が望ましい。 A protective film 235 is formed on the surface of the vibrating portion 120 (the surface facing the upper lid 30) so as to cover the entire surface thereof. Further, frequency adjusting films 236A and 236B (hereinafter, the frequency adjusting films 236A and 236B are collectively referred to as "frequency adjusting film 236") are provided on a part of the surface of the protective film 235 in the vibrating arms 135A and 135B, respectively. It is formed. The resonance frequency of the vibrating unit 120 can be adjusted by the protective film 235 and the frequency adjusting film 236. Although the protective film 235 does not necessarily cover the entire surface of the vibrating portion 120, damage to the underlying electrode film (for example, the metal layer E2 in FIG. 4) and the piezoelectric film (for example, the piezoelectric thin film F3 in FIG. 4) in frequency adjustment is caused. It is desirable that the entire surface of the vibrating portion 120 is protected.
 周波数調整膜236は、振動部120における、他の領域よりも振動による変位の比較的大きい領域の少なくとも一部において、その表面が露出するように、保護膜235上に形成されている。具体的には、周波数調整膜236は、振動腕135の先端、即ち錘部に形成される。他方、保護膜235は、振動腕135におけるその他の領域において、その表面が露出している。この実施例では、振動腕135の先端まで周波数調整膜236が形成され、先端部では保護膜235は全く露出していないが、保護膜235の一部が露出する様に、周波数調整膜236を振動腕135の先端部には形成されない構成も可能である。 The frequency adjusting film 236 is formed on the protective film 235 so that the surface of the vibrating portion 120 is exposed at least in at least a part of the region where the displacement due to vibration is relatively larger than the other regions. Specifically, the frequency adjusting film 236 is formed on the tip of the vibrating arm 135, that is, the weight portion. On the other hand, the surface of the protective film 235 is exposed in other regions of the vibrating arm 135. In this embodiment, the frequency adjusting film 236 is formed up to the tip of the vibrating arm 135, and the protective film 235 is not exposed at all at the tip, but the frequency adjusting film 236 is provided so that a part of the protective film 235 is exposed. A configuration that is not formed at the tip of the vibrating arm 135 is also possible.
 (b)保持部140
 保持部140は、XY平面に沿って矩形の枠状に形成される。保持部140は、平面視において、XY平面に沿って振動部120の外側を囲むように設けられる。なお、保持部140は、振動部120の周囲の少なくとも一部に設けられていればよく、枠状の形状に限定されない。例えば、保持部140は、振動部120を保持し、また、上蓋30及び下蓋20と接合できる程度に、振動部120の周囲に設けられていればよい。
(B) Holding unit 140
The holding portion 140 is formed in a rectangular frame shape along the XY plane. The holding portion 140 is provided so as to surround the outside of the vibrating portion 120 along the XY plane in a plan view. The holding portion 140 may be provided at least in a part around the vibrating portion 120, and is not limited to the frame shape. For example, the holding portion 140 may be provided around the vibrating portion 120 so as to hold the vibrating portion 120 and to be joined to the upper lid 30 and the lower lid 20.
 本実施形態においては、保持部140は一体形成される角柱形状の枠体140a~140dからなる。枠体140aは、図3に示すように、振動腕135の開放端に対向して、長手方向がX軸に平行に設けられる。枠体140bは、基部130の後端131Bに対向して、長手方向がX軸に平行に設けられる。枠体140cは、基部130の側端(短辺131c)及び振動腕135Aに対向して、長手方向がY軸に平行に設けられる。枠体140cの一端は枠体140aに接続され、枠体140cの他端は枠体140bに接続される。枠体140dは、基部130の側端(短辺131d)及び振動腕135Bに対向して、長手方向がY軸に平行に設けられる。枠体140dの一端は枠体140aに接続され、枠体140dの他端は枠体140bに接続される。 In the present embodiment, the holding portion 140 is composed of prismatic frame bodies 140a to 140d integrally formed. As shown in FIG. 3, the frame body 140a is provided so as to face the open end of the vibrating arm 135 and to be provided in the longitudinal direction parallel to the X axis. The frame body 140b is provided so as to face the rear end 131B of the base 130 and the longitudinal direction is parallel to the X axis. The frame body 140c is provided so as to face the side end (short side 131c) of the base 130 and the vibrating arm 135A, and the longitudinal direction is parallel to the Y axis. One end of the frame body 140c is connected to the frame body 140a, and the other end of the frame body 140c is connected to the frame body 140b. The frame body 140d is provided so as to face the side end (short side 131d) of the base 130 and the vibrating arm 135B, and the longitudinal direction is parallel to the Y axis. One end of the frame body 140d is connected to the frame body 140a, and the other end of the frame body 140d is connected to the frame body 140b.
 (c)保持腕110
 保持腕110は、保持部140の内側に設けられ、基部130の後端131Bと枠体140bとを接続する。保持腕110の一端は、基部130の後端131Bに接続され、保持腕110の他端は、枠体140bに接続されている。保持腕110は、長手方向がY軸に平行に設けられる。
(C) Holding arm 110
The holding arm 110 is provided inside the holding portion 140, and connects the rear end 131B of the base 130 and the frame body 140b. One end of the holding arm 110 is connected to the rear end 131B of the base 130, and the other end of the holding arm 110 is connected to the frame body 140b. The holding arm 110 is provided so that the longitudinal direction is parallel to the Y axis.
(4.積層構造)
 図4を用いて共振子10の積層構造について説明する。図4は、図3のAA'断面、及び共振子10の電気的な接続態様を模式的に示す概略図である。
(4. Laminated structure)
The laminated structure of the resonator 10 will be described with reference to FIG. FIG. 4 is a schematic view schematically showing the AA'cross section of FIG. 3 and the electrical connection mode of the resonator 10.
 共振子10では、保持部140、基部130、振動腕135、保持腕110は、同一プロセスで一体的に形成される。共振子10では、まず、Si(シリコン)基板F2の上に、金属層E1が積層されている。そして、金属層E1の上には、金属層E1を覆うように、圧電薄膜F3が積層されており、さらに、圧電薄膜F3の表面には、金属層E2が積層されている。金属層E2の上には、金属層E2を覆うように、保護膜235が積層されている。振動部120上においては、さらに、保護膜235上に、周波数調整膜236が積層されている。 In the resonator 10, the holding portion 140, the base 130, the vibrating arm 135, and the holding arm 110 are integrally formed by the same process. In the resonator 10, first, the metal layer E1 is laminated on the Si (silicon) substrate F2. A piezoelectric thin film F3 is laminated on the metal layer E1 so as to cover the metal layer E1, and a metal layer E2 is laminated on the surface of the piezoelectric thin film F3. A protective film 235 is laminated on the metal layer E2 so as to cover the metal layer E2. On the vibrating portion 120, a frequency adjusting film 236 is further laminated on the protective film 235.
 金属層E1、E2は、例えば厚さ0.1~0.2μm程度のMo(モリブデン)やアルミニウム(Al)等を用いて形成される。金属層E1、E2は、エッチング等により、所望の形状に形成される。金属層E1は、例えば振動部120上においては、下部電極として機能する。また、金属層E1は、保持腕110や保持部140上においては、共振子10の外部に設けられた交流電源に下部電極を接続する配線として機能する。 The metal layers E1 and E2 are formed by using, for example, Mo (molybdenum), aluminum (Al), or the like having a thickness of about 0.1 to 0.2 μm. The metal layers E1 and E2 are formed into a desired shape by etching or the like. The metal layer E1 functions as a lower electrode, for example, on the vibrating portion 120. Further, the metal layer E1 functions as wiring for connecting the lower electrode to the AC power supply provided outside the resonator 10 on the holding arm 110 and the holding portion 140.
 金属層E2は、振動部120上においては、上部電極として機能する。また、金属層E2は、保持腕110や保持部140上においては、共振子10の外部に設けられた回路に上部電極を接続する配線として機能する。 The metal layer E2 functions as an upper electrode on the vibrating portion 120. Further, the metal layer E2 functions as wiring for connecting the upper electrode to the circuit provided outside the resonator 10 on the holding arm 110 and the holding portion 140.
 圧電薄膜F3は、印加された電圧を振動に変換する圧電体の薄膜であり、例えば、AlN(窒化アルミニウム)等の窒化物や酸化物を主成分とすることができる。具体的には、圧電薄膜F3は、ScAlN(窒化スカンジウムアルミニウム)により形成することができる。ScAlNは、窒化アルミニウムにおけるアルミニウムの一部をスカンジウムに置換したものである。 The piezoelectric thin film F3 is a piezoelectric thin film that converts an applied voltage into vibration, and can contain, for example, a nitride or oxide such as AlN (aluminum nitride) as a main component. Specifically, the piezoelectric thin film F3 can be formed of ScAlN (scandium nitride aluminum). ScAlN is obtained by substituting a part of aluminum in aluminum nitride with scandium.
 圧電薄膜F3は、金属層E1、E2によって圧電薄膜F3に印加される電界に応じて、XY平面の面内方向すなわちY軸方向に伸縮する。この圧電薄膜F3の伸縮によって、振動腕135は、下蓋20及び上蓋30の内面に向かってその開放端を変位させ、面外の屈曲振動モードで振動する。 The piezoelectric thin film F3 expands and contracts in the in-plane direction of the XY plane, that is, in the Y-axis direction, according to the electric field applied to the piezoelectric thin film F3 by the metal layers E1 and E2. Due to the expansion and contraction of the piezoelectric thin film F3, the vibrating arm 135 displaces its open end toward the inner surfaces of the lower lid 20 and the upper lid 30 and vibrates in an out-of-plane bending vibration mode.
 保護膜235は、絶縁体の層であり、エッチングによる質量低減の速度が周波数調整膜236より遅い材料により形成される。例えば、保護膜235は、AlNやSiN等の窒化膜やTa2O5(5酸化タンタル)やSiO2等の酸化膜により形成される。なお、質量低減速度は、エッチング速度(単位時間あたりに除去される厚み)と密度との積により表される。 The protective film 235 is a layer of an insulator, and is formed of a material whose mass reduction rate by etching is slower than that of the frequency adjusting film 236. For example, the protective film 235 is formed of a nitride film such as AlN or SiN or an oxide film such as Ta2O5 (tantalum pentoxide) or SiO2. The mass reduction rate is expressed by the product of the etching rate (thickness removed per unit time) and the density.
 周波数調整膜236は、導電体の層であり、エッチングによる質量低減の速度が保護膜235より速い材料により形成される。周波数調整膜236は、例えば、モリブデン(Mo)やタングステン(W)や金(Au)、白金(Pt)、ニッケル(Ni)、アルミニウム(Al)、チタン(Ti)等の金属により形成される。 The frequency adjustment film 236 is a layer of a conductor, and is formed of a material whose mass reduction rate by etching is faster than that of the protective film 235. The frequency adjusting film 236 is formed of, for example, a metal such as molybdenum (Mo), tungsten (W), gold (Au), platinum (Pt), nickel (Ni), aluminum (Al), and titanium (Ti).
(5.共振子の動作)
 図4を参照して共振子10の動作について説明する。本実施形態では、振動腕135Aに印加される電界の位相と、振動腕135Bに印加される電界の位相とが互いに逆位相になるように設定される。これにより、振動腕135Aと振動腕135Bとが互いに逆方向に変位する。例えば、振動腕135Aが上蓋30の内面に向かって開放端を変位すると、振動腕135Bは下蓋20の内面に向かって開放端を変位する。
(5. Operation of resonator)
The operation of the resonator 10 will be described with reference to FIG. In the present embodiment, the phase of the electric field applied to the vibrating arm 135A and the phase of the electric field applied to the vibrating arm 135B are set to be opposite to each other. As a result, the vibrating arm 135A and the vibrating arm 135B are displaced in opposite directions. For example, when the vibrating arm 135A displaces the open end toward the inner surface of the upper lid 30, the vibrating arm 135B displaces the open end toward the inner surface of the lower lid 20.
 これによって、本実施形態に係る共振子10では、逆位相の振動時、すなわち、図4に示す振動腕135Aと振動腕135BとがY軸に平行に延びる中心軸r1回りに上下逆方向に振動する。これによって、中心軸r1を中心として互いに逆方向の捩れモーメントが生じ、振動部120で屈曲振動が発生する。このとき、基部130における中心軸r1の近傍の領域には歪みが集中することになる。 As a result, in the resonator 10 according to the present embodiment, when vibrating in opposite phase, that is, the vibrating arm 135A and the vibrating arm 135B shown in FIG. 4 vibrate in the up-down direction around the central axis r1 extending in parallel with the Y axis. do. As a result, twisting moments in opposite directions are generated about the central axis r1 and bending vibration is generated in the vibrating portion 120. At this time, the strain is concentrated in the region near the central axis r1 in the base 130.
 図5は、振動部120の屈曲振動時の動作を説明するための図である。同図に示すように、振動部120の屈曲振動時には、第1回転モーメントArm、第2回転モーメントBend、及び、第3回転モーメントAllが発生する。第1回転モーメントArmは、Y軸に平行な中心軸周りの回転モーメントである。第2回転モーメントBendは、振動腕135と基部130との接続部を通るX軸に平行な中心軸周りの回転モーメントである。第3回転モーメントAllは、X軸方向における基部130の中心位置を通るY軸に平行な中心軸周りの回転モーメントである。 FIG. 5 is a diagram for explaining the operation of the vibrating portion 120 during bending vibration. As shown in the figure, during the bending vibration of the vibrating portion 120, the first rotation moment Arm, the second rotation moment Bend, and the third rotation moment All are generated. The first rotational moment Arm is a rotational moment around the central axis parallel to the Y axis. The second rotational moment Bend is a rotational moment around the central axis parallel to the X axis passing through the connection portion between the vibrating arm 135 and the base 130. The third rotational moment All is a rotational moment around the central axis parallel to the Y axis that passes through the central position of the base 130 in the X-axis direction.
 図6は、一実施形態に係る共振子10の一例を示す図である。同図に示すように、第1振動腕135Aは、第1振動腕135Aの長手方向に延びる第1中心軸S1よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の内側に第1振動腕135Aの重心位置G1をオフセットさせる第1オフセット構造を有する。また、第2振動腕135Bは、第2振動腕135Bの長手方向に延びる第2中心軸S2よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の内側に第2振動腕135Bの重心位置G2をオフセットさせる第2オフセット構造を有する。第1中心軸S1は、第1振動腕135Aと基部130との境界部分における第1振動腕135Aの短手方向の中心軸である。第1中心軸S1は、第1振動腕135Aと基部130との境界部分を通るX軸に平行な直線AA´上での第1振動腕135Aの中心位置を通る、Y軸に平行な直線である。第2中心軸S2は、第2振動腕135Bと基部130との境界部分における第2振動腕135Bの短手方向の中心軸である。第2中心軸S2は、第2振動腕135Bと基部130との境界部分を通るX軸に平行な直線AA´上での第2振動腕135Bの中心位置を通る、Y軸に平行な直線である。 FIG. 6 is a diagram showing an example of the resonator 10 according to the embodiment. As shown in the figure, the first vibrating arm 135A is a vibrating portion 120 of the first vibrating arm 135A and the second vibrating arm 135B in the parallel direction with respect to the first central axis S1 extending in the longitudinal direction of the first vibrating arm 135A. It has a first offset structure that offsets the center of gravity position G1 of the first vibrating arm 135A inside. Further, the second vibrating arm 135B has a second vibration inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the second central axis S2 extending in the longitudinal direction of the second vibrating arm 135B. It has a second offset structure that offsets the center of gravity position G2 of the arm 135B. The first central axis S1 is the central axis in the lateral direction of the first vibrating arm 135A at the boundary portion between the first vibrating arm 135A and the base 130. The first central axis S1 is a straight line parallel to the Y axis passing through the center position of the first vibrating arm 135A on the straight line AA'parallel to the X axis passing through the boundary portion between the first vibrating arm 135A and the base 130. be. The second central axis S2 is the central axis in the lateral direction of the second vibrating arm 135B at the boundary portion between the second vibrating arm 135B and the base 130. The second central axis S2 is a straight line parallel to the Y axis passing through the center position of the second vibrating arm 135B on the straight line AA'parallel to the X axis passing through the boundary portion between the second vibrating arm 135B and the base 130. be.
 図示の例では、第1オフセット構造は、第1振動腕135Aの先端部に設けられ、第2オフセット構造は、第2振動腕135Bの先端部に設けられる。第1振動腕135Aの先端部は、例えば、第1振動腕135Aにおける長手方向の中心位置よりも先端側の部分であり、第2振動腕135Bの先端部は、例えば、第2振動腕135Bにおける長手方向の中心位置よりも先端側の部分である。また、図示の例では、第1オフセット構造は、第1振動腕135Aの上面のうち、第1中心軸S1よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の内側に設けられた錘部136Aを含む。錘部136Aは、第1振動腕135Aの下面に設けられてもよい。また、第2オフセット構造は、第2振動腕135Bの上面のうち、第2中心軸S2よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の内側に設けられた錘部136Bを含む。錘部136Bは、第2振動腕135Bの下面に設けられてもよい。 In the illustrated example, the first offset structure is provided at the tip of the first vibrating arm 135A, and the second offset structure is provided at the tip of the second vibrating arm 135B. The tip of the first vibrating arm 135A is, for example, a portion on the tip side of the center position in the longitudinal direction of the first vibrating arm 135A, and the tip of the second vibrating arm 135B is, for example, the second vibrating arm 135B. It is the part on the tip side of the center position in the longitudinal direction. Further, in the illustrated example, the first offset structure is inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the first central axis S1 in the upper surface of the first vibrating arm 135A. Includes a weight portion 136A provided in. The weight portion 136A may be provided on the lower surface of the first vibrating arm 135A. Further, the second offset structure is a weight provided inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B from the second central axis S2 on the upper surface of the second vibrating arm 135B. Includes part 136B. The weight portion 136B may be provided on the lower surface of the second vibrating arm 135B.
 錘部136Aは、第1振動腕135Aの長手方向に細長く延びる矩形板状をなしており、錘部136AにおけるX軸方向の中心位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置している。図示の例では、錘部136AにおけるX軸方向の左端となる位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置しているものの、錘部136AにおけるX軸方向の中心位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置していれば、錘部136AにおけるX軸方向の左端となる位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の外側に位置してもよい。錘部136Aは、第1振動腕135Aの長手方向に細長く延びる矩形板状をなしており、錘部136AにおけるX軸方向の中心位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置している。図示の例では、錘部136AにおけるX軸方向の左端となる位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置しているものの、錘部136AにおけるX軸方向の中心位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置していれば、錘部136AにおけるX軸方向の左端となる位置が第1振動腕135AにおけるX軸方向の中心位置よりもX軸方向における振動部120の外側に位置してもよい。 The weight portion 136A has a rectangular plate shape elongated in the longitudinal direction of the first vibrating arm 135A, and the center position of the weight portion 136A in the X-axis direction is X than the center position of the first vibrating arm 135A in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction. In the illustrated example, although the position at the left end in the X-axis direction of the weight portion 136A is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the first vibrating arm 135A, the weight portion If the center position in the X-axis direction of the 136A is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the first vibrating arm 135A, it is the left end in the X-axis direction of the weight portion 136A. The position may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the first vibrating arm 135A. The weight portion 136A has a rectangular plate shape elongated in the longitudinal direction of the first vibrating arm 135A, and the center position of the weight portion 136A in the X-axis direction is X than the center position of the first vibrating arm 135A in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction. In the illustrated example, although the position at the left end in the X-axis direction of the weight portion 136A is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the first vibrating arm 135A, the weight portion If the center position in the X-axis direction of the 136A is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the first vibrating arm 135A, it is the left end in the X-axis direction of the weight portion 136A. The position may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the first vibrating arm 135A.
 錘部136Bは、第2振動腕135Bの長手方向に細長く延びる矩形板状をなしており、錘部136BにおけるX軸方向の中心位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置している。図示の例では、錘部136BにおけるX軸方向の左端となる位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置しているものの、錘部136BにおけるX軸方向の中心位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置していれば、錘部136BにおけるX軸方向の左端となる位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の外側に位置してもよい。錘部136Bは、第2振動腕135Bの長手方向に細長く延びる矩形板状をなしており、錘部136BにおけるX軸方向の中心位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置している。図示の例では、錘部136BにおけるX軸方向の左端となる位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置しているものの、錘部136BにおけるX軸方向の中心位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の内側に位置していれば、錘部136BにおけるX軸方向の左端となる位置が第2振動腕135BにおけるX軸方向の中心位置よりもX軸方向における振動部120の外側に位置してもよい。 The weight portion 136B has a rectangular plate shape elongated in the longitudinal direction of the second vibrating arm 135B, and the center position of the weight portion 136B in the X-axis direction is X than the center position of the second vibrating arm 135B in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction. In the illustrated example, although the position at the left end in the X-axis direction of the weight portion 136B is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the second vibrating arm 135B, the weight portion If the center position in the X-axis direction of the 136B is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the second vibrating arm 135B, it is the left end in the X-axis direction of the weight portion 136B. The position may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the second vibrating arm 135B. The weight portion 136B has a rectangular plate shape elongated in the longitudinal direction of the second vibrating arm 135B, and the center position of the weight portion 136B in the X-axis direction is X than the center position of the second vibrating arm 135B in the X-axis direction. It is located inside the vibrating portion 120 in the axial direction. In the illustrated example, although the position at the left end in the X-axis direction of the weight portion 136B is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the second vibrating arm 135B, the weight portion If the center position in the X-axis direction of the 136B is located inside the vibrating portion 120 in the X-axis direction from the center position in the X-axis direction of the second vibrating arm 135B, it is the left end in the X-axis direction of the weight portion 136B. The position may be located outside the vibrating portion 120 in the X-axis direction with respect to the center position in the X-axis direction of the second vibrating arm 135B.
(6.共振子の機能)
 次に、本実施形態に係る共振子10の機能について説明する。図7は、比較例の共振子10の機能を説明するための図である。比較例の共振子10は、第1振動腕135Aの重心位置が第1中心軸S1と一致し、第2振動腕135Bの重心位置が第2中心軸S2と一致している。図7は、比較例の共振子10の屈曲振動時に、共振子10の箇所ごとに発生する歪みの大きさを、シミュレーションモデルを用いて予測した結果を視覚的に示している。同図に示すように、比較例の共振子10の屈曲振動時には、第1振動腕135Aの先端部及び第2振動腕135Bの先端部のそれぞれに同一方向の第1回転モーメントArmが作用する。その結果、第1振動腕135Aの基端部、及び、第2振動腕135Bの基端部に歪みが生じやすい。そして、これらの歪みが第1振動腕135A及び第2振動腕135Bのそれぞれから基部130に伝わると、基部130から外部に振動漏れが発生し、振動部120の振動特性に影響を及ぼす虞があった。
(6. Function of resonator)
Next, the function of the resonator 10 according to the present embodiment will be described. FIG. 7 is a diagram for explaining the function of the resonator 10 of the comparative example. In the resonator 10 of the comparative example, the position of the center of gravity of the first vibrating arm 135A coincides with the first central axis S1, and the position of the center of gravity of the second vibrating arm 135B coincides with the second central axis S2. FIG. 7 visually shows the result of predicting the magnitude of the distortion generated at each location of the resonator 10 at the time of bending vibration of the resonator 10 in the comparative example using a simulation model. As shown in the figure, at the time of bending vibration of the resonator 10 of the comparative example, the first rotational moment Arm in the same direction acts on each of the tip portion of the first vibrating arm 135A and the tip portion of the second vibrating arm 135B. As a result, the base end portion of the first vibrating arm 135A and the base end portion of the second vibrating arm 135B are likely to be distorted. If these distortions are transmitted from each of the first vibrating arm 135A and the second vibrating arm 135B to the base 130, vibration leakage may occur from the base 130 to the outside, which may affect the vibration characteristics of the vibrating portion 120. rice field.
 図8は、本実施形態に係る共振子10の機能を説明するための図である。図8は、明細書の説明理解の便宜上、第1振動腕135Aの先端部、及び、第2振動腕135Bの先端部が内向きに屈曲することで、第1振動腕135Aの重心位置、及び、第2振動腕135Bの重心位置がオフセットした場合を例に挙げて説明する。同図に示すように、本実施形態に係る共振子10の屈曲振動時には、第1振動腕135Aの先端部及び第2振動腕135Bの先端部のそれぞれに逆方向の第1回転モーメントArmが作用する。その結果、第1振動腕135Aの基端部、及び、第2振動腕135Bの基端部に歪みが生じ、これらの歪みが第1振動腕135A及び第2振動腕135Bのそれぞれから基部130に伝わったとしても、これらの歪みが相殺される。その結果、基部130から外部に振動漏れが発生しにくく、振動部120の振動特性が安定化される。 FIG. 8 is a diagram for explaining the function of the resonator 10 according to the present embodiment. FIG. 8 shows the position of the center of gravity of the first vibrating arm 135A and the position of the center of gravity of the first vibrating arm 135A by bending the tip of the first vibrating arm 135A and the tip of the second vibrating arm 135B inward for convenience of explanation and understanding of the specification. , The case where the position of the center of gravity of the second vibrating arm 135B is offset will be described as an example. As shown in the figure, at the time of bending vibration of the resonator 10 according to the present embodiment, the first rotational moment Arm in the opposite direction acts on each of the tip of the first vibrating arm 135A and the tip of the second vibrating arm 135B. do. As a result, distortion occurs in the base end of the first vibrating arm 135A and the base end of the second vibrating arm 135B, and these distortions are transmitted from each of the first vibrating arm 135A and the second vibrating arm 135B to the base 130. Even if transmitted, these distortions are offset. As a result, vibration leakage from the base 130 to the outside is unlikely to occur, and the vibration characteristics of the vibration unit 120 are stabilized.
 本実施形態に係る共振子10は、振動部120と、振動部120の周囲の少なくとも一部に設けられた保持部140と、振動部120と保持部140との間に設けられ、一端が基部130に接続され、他端が保持部140に接続される保持腕110と、を備え、振動部120は、固定端と開放端とを有し、面外屈曲する第1振動腕135Aと、固定端と開放端とを有し、第1振動腕135Aと異なる位相で面外屈曲する第2振動腕135Bと、第1振動腕135A及び第2振動腕135Bに接続される前端、及び当該前端に対向する後端を有する基部130と、を含み、第1振動腕135Aは、第1振動腕135Aと基部130との境界部分における第1振動腕135Aの短手方向の第1中心軸S1よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の内側に第1振動腕135Aの重心位置G1をオフセットさせる第1オフセット構造を有し、第2振動腕135Bは、第2振動腕135Bと基部130との境界部分における第2振動腕135Bの短手方向の第2中心軸S2よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の内側に第2振動腕135Bの重心位置G2をオフセットさせる第2オフセット構造を有する。そのため、共振子10の屈曲振動時に、第1振動腕135A及び第2振動腕135Bのそれぞれから基部130に伝わる歪みが相殺される。これにより、基部130から外部に振動漏れが発生しにくく、振動部120の振動特性を安定化できる。 The resonator 10 according to the present embodiment is provided between the vibrating portion 120, the holding portion 140 provided at least a part around the vibrating portion 120, and the vibrating portion 120 and the holding portion 140, and one end thereof is a base portion. A holding arm 110 connected to 130 and the other end connected to a holding portion 140 is provided, and the vibrating portion 120 has a fixed end and an open end, and is fixed to a first vibrating arm 135A that bends out of the plane. The second vibrating arm 135B, which has an end and an open end and bends out of the plane in a phase different from that of the first vibrating arm 135A, the front end connected to the first vibrating arm 135A and the second vibrating arm 135B, and the front end thereof. The first vibrating arm 135A includes a base 130 having opposite rear ends, and the first vibrating arm 135A is larger than the first central axis S1 in the lateral direction of the first vibrating arm 135A at the boundary portion between the first vibrating arm 135A and the base 130. The second vibrating arm 135B has a first offset structure for offsetting the center of gravity position G1 of the first vibrating arm 135A inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. Inside the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B than the second central axis S2 in the lateral direction of the second vibrating arm 135B at the boundary portion between the vibrating arm 135B and the base 130. 2 It has a second offset structure that offsets the center of gravity position G2 of the vibrating arm 135B. Therefore, when the resonator 10 bends and vibrates, the distortion transmitted from each of the first vibrating arm 135A and the second vibrating arm 135B to the base 130 is canceled out. As a result, vibration leakage from the base 130 to the outside is unlikely to occur, and the vibration characteristics of the vibration unit 120 can be stabilized.
 図9は、一実施形態に係る共振子の構成の変形例を示す図である。具体的には、第1オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第2振動腕135Bに対向する第1振動腕135Aの側面に設けられた凸部137Aを含む。第2オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第1振動腕135Aに対向する第2振動腕135Bの側面に設けられた凸部137Bを含む。 FIG. 9 is a diagram showing a modified example of the configuration of the resonator according to the embodiment. Specifically, the first offset structure includes a convex portion 137A provided on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. .. The second offset structure includes a convex portion 137B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B.
 図10は、一実施形態に係る共振子の構成の変形例を示す図である。この例では、第1オフセット構造は、第1振動腕135Aの上面または下面のうち、第1中心軸S1よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の外側に形成された孔138Aを含む。第1オフセット構造は、孔138Aに代えて、第1振動腕135Aの上面または下面のうち、第1中心軸S1よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の外側に形成された溝を含んでもよい。第2オフセット構造は、第2振動腕135Bの上面または下面のうち、第2中心軸S2よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の外側に形成された孔138Bを含む。第2オフセット構造は、孔138Bに代えて、第2振動腕135Bの上面または下面のうち、第1中心軸S1よりも第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の外側に形成された溝を含んでもよい。 FIG. 10 is a diagram showing a modified example of the configuration of the resonator according to the embodiment. In this example, the first offset structure is located outside the vibrating portion 120 of the upper surface or the lower surface of the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the first central axis S1. Includes the formed hole 138A. In the first offset structure, instead of the hole 138A, of the upper surface or the lower surface of the first vibrating arm 135A, the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B from the first central axis S1. It may include a groove formed on the outside. The second offset structure is a hole formed in the upper surface or the lower surface of the second vibrating arm 135B on the outer side of the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B with respect to the second central axis S2. 138B is included. In the second offset structure, instead of the hole 138B, of the upper surface or the lower surface of the second vibrating arm 135B, the vibrating portion 120 in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B from the first central axis S1. It may include a groove formed on the outside.
 図11は、一実施形態に係る共振子の構成の変形例を示す図である。この例では、第1オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第2振動腕135Bに対向する第1振動腕135Aの側面とは反対側の第1振動腕135Aの側面に設けられた凹部139Aを含む。第2オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第1振動腕135Aに対向する第2振動腕135Bの側面とは反対側の第2振動腕135Bの側面に設けられた凹部139Bを含む。 FIG. 11 is a diagram showing a modified example of the configuration of the resonator according to the embodiment. In this example, the first offset structure is the first vibrating arm 135A opposite to the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. Includes a recess 139A provided on the side surface of the. The second offset structure is provided on the side surface of the second vibrating arm 135B opposite to the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. Includes the recessed 139B.
 図12は、一実施形態に係る共振子の構成の変形例を示す図である。この例では、第1オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第2振動腕135Bに対向する第1振動腕135Aの側面に設けられた第1凸部141Aと、第1振動腕135A及び第2振動腕135Bの並列方向において第2振動腕135Bに対向する第1振動腕135Aの側面とは反対側の第1振動腕135Aの側面に設けられて第1凸部141Aよりも第1振動腕135Aの側面からの突出量が小さい第2凸部142Aとを含む。第2オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第1振動腕135Aに対向する第2振動腕135Bの側面に設けられた第1凸部141Bと、第1振動腕135A及び第2振動腕135Bの並列方向において第1振動腕135Aに対向する第2振動腕135Bの側面とは反対側の第2振動腕135Bの側面に設けられて第1凸部141Bよりも第2振動腕135Bの側面からの突出量が小さい第2凸部142Bとを含む。 FIG. 12 is a diagram showing a modified example of the configuration of the resonator according to the embodiment. In this example, the first offset structure is the first convex portion 141A provided on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. , The first convex is provided on the side surface of the first vibrating arm 135A opposite to the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. It includes a second convex portion 142A having a smaller protrusion amount from the side surface of the first vibrating arm 135A than the portion 141A. The second offset structure includes a first convex portion 141B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B, and the first vibration. It is provided on the side surface of the second vibrating arm 135B opposite to the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the arm 135A and the second vibrating arm 135B, and is more than the first convex portion 141B. It includes a second convex portion 142B having a small protrusion amount from the side surface of the second vibrating arm 135B.
 図13は、一実施形態に係る共振子の構成の変形例を示す図である。この例では、第1オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第2振動腕135Bに対向する第1振動腕135Aの側面に第1振動腕135Aの長手方向に間隔を隔てて設けられた複数の凸部143Aを含む。第2オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第1振動腕135Aに対向する第2振動腕135Bの側面に設けられた凸部143Bを含む。凸部143Bは、第2振動腕135Bの長手方向において複数の凸部143Aの中間となる位置に設けられる。この例では、第1オフセット構造及び第2オフセット構造は、互いに非対称構造であるものの、第1振動腕135A及び第2振動腕135Bは、固有振動数が共通している。 FIG. 13 is a diagram showing a modified example of the configuration of the resonator according to the embodiment. In this example, the first offset structure is on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B in the longitudinal direction of the first vibrating arm 135A. It includes a plurality of convex portions 143A provided at intervals. The second offset structure includes a protrusion 143B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. The convex portion 143B is provided at a position intermediate between the plurality of convex portions 143A in the longitudinal direction of the second vibrating arm 135B. In this example, the first offset structure and the second offset structure are asymmetrical to each other, but the first vibrating arm 135A and the second vibrating arm 135B have a common natural frequency.
 図14は、一実施形態に係る共振子の構成の変形例を示す図である。この例では、第1オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第2振動腕135Bに対向する第1振動腕135Aの側面に第1振動腕135Aの長手方向に間隔を隔てて設けられた複数の凸部144Aと、同方向において複数の凸部144Aの中間位置に設けられた凹部145Aとを含む。第2オフセット構造は、第1振動腕135A及び第2振動腕135Bの並列方向において第1振動腕135Aに対向する第2振動腕135Bの側面に設けられた凸部144Bと、同方向において凸部144Bの両側に設けられた複数の凹部145Bとを含む。複数の凸部144Aの各々の先端は、複数の凹部145Bの内側に配置されている。凸部144Bの先端は、凹部145Aの内側に配置されている。この例では、第1オフセット構造及び第2オフセット構造は、互いに非対称構造であるものの、第1振動腕135A及び第2振動腕135Bは、固有振動数が共通している。 FIG. 14 is a diagram showing a modified example of the configuration of the resonator according to the embodiment. In this example, the first offset structure is on the side surface of the first vibrating arm 135A facing the second vibrating arm 135B in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B in the longitudinal direction of the first vibrating arm 135A. It includes a plurality of convex portions 144A provided at intervals and a concave portion 145A provided at an intermediate position between the plurality of convex portions 144A in the same direction. The second offset structure has a convex portion 144B provided on the side surface of the second vibrating arm 135B facing the first vibrating arm 135A in the parallel direction of the first vibrating arm 135A and the second vibrating arm 135B. It includes a plurality of recesses 145B provided on both sides of the 144B. The tip of each of the plurality of protrusions 144A is arranged inside the plurality of recesses 145B. The tip of the convex portion 144B is arranged inside the concave portion 145A. In this example, the first offset structure and the second offset structure are asymmetrical to each other, but the first vibrating arm 135A and the second vibrating arm 135B have a common natural frequency.
 図15は、一実施形態に係る共振子の構成の変形例を示す図である。この例では、第1振動腕135Aの長手方向に延びる第1中心軸S1、及び、第2振動腕135Bの長手方向に延びる第2中心軸S2の各々は、第1振動腕135A及び第2振動腕135Bの並列方向における振動部120の内側に傾斜して延びる。この場合、第1中心軸S1は、第1振動腕135Aと基部130との境界部分を通るX軸に平行な直線AA´上での第1振動腕135Aの中心位置を通る、第1振動腕135Aの長手方向に平行な直線である。第2中心軸S2は、第2振動腕135Bと基部130との境界部分を通るX軸に平行な直線AA´上での第2振動腕135Bの中心位置を通る、第2振動腕135Bの長手方向に平行な直線である。 FIG. 15 is a diagram showing a modified example of the configuration of the resonator according to the embodiment. In this example, the first central axis S1 extending in the longitudinal direction of the first vibrating arm 135A and the second central axis S2 extending in the longitudinal direction of the second vibrating arm 135B are the first vibrating arm 135A and the second vibration, respectively. The arm 135B is inclined and extends inward of the vibrating portion 120 in the parallel direction. In this case, the first central axis S1 passes through the center position of the first vibrating arm 135A on the straight line AA'parallel to the X axis passing through the boundary portion between the first vibrating arm 135A and the base 130. It is a straight line parallel to the longitudinal direction of 135A. The second central axis S2 is the longitudinal length of the second vibrating arm 135B passing through the center position of the second vibrating arm 135B on the straight line AA'parallel to the X axis passing through the boundary portion between the second vibrating arm 135B and the base 130. It is a straight line parallel to the direction.
 以下に、本発明の実施形態の一部又は全部を付記し、その効果について説明する。なお、本発明は以下の付記に限定されるものではない。 Hereinafter, a part or all of the embodiments of the present invention will be described and their effects will be described. The present invention is not limited to the following appendices.
 本発明の一態様によれば、振動部と、振動部の周囲の少なくとも一部に設けられた保持部と、振動部と保持部との間に設けられた保持腕と、を備え、振動部は、固定端と開放端とを有し、面外屈曲する第1振動腕と、固定端と開放端とを有し、第1振動腕と異なる位相で面外屈曲する第2振動腕と、第1振動腕及び第2振動腕に接続される前端、及び前端に対向する後端を有する基部と、を含み、保持腕は、一端が基部に接続され、他端が保持部に接続され、第1振動腕は、第1振動腕と基部との境界部分における第1振動腕の短手方向の第1中心軸よりも第1振動腕及び第2振動腕の並列方向における振動部の内側に第1振動腕の重心位置をオフセットさせる第1オフセット構造を有し、第2振動腕は、第2振動腕と基部との境界部分における第2振動腕の短手方向の第2中心軸よりも第1振動腕及び第2振動腕の並列方向における振動部の内側に第2振動腕の重心位置をオフセットさせる第2オフセット構造を有する、共振子が提供される。 According to one aspect of the present invention, the vibrating portion is provided with a vibrating portion, a holding portion provided at least a part around the vibrating portion, and a holding arm provided between the vibrating portion and the holding portion. Has a first vibrating arm that has a fixed end and an open end and bends out of the plane, and a second vibrating arm that has a fixed end and an open end and bends out of the plane in a phase different from that of the first vibrating arm. The holding arm includes a front end connected to a first vibrating arm and a second vibrating arm, and a base having a rear end facing the front end, the holding arm having one end connected to the base and the other end connected to the holding portion. The first vibrating arm is inside the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm from the first central axis in the lateral direction of the first vibrating arm at the boundary portion between the first vibrating arm and the base. It has a first offset structure that offsets the position of the center of gravity of the first vibrating arm, and the second vibrating arm is more than the second central axis in the lateral direction of the second vibrating arm at the boundary between the second vibrating arm and the base. Provided is a resonator having a second offset structure for offsetting the position of the center of gravity of the second vibrating arm inside the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm.
 一態様として、第1オフセット構造は、第1振動腕の先端部に設けられ、第2オフセット構造は、第2振動腕の先端部に設けられる。 As one aspect, the first offset structure is provided at the tip of the first vibrating arm, and the second offset structure is provided at the tip of the second vibrating arm.
 一態様として、第1オフセット構造は、第1振動腕の上面または下面のうち、第1中心軸よりも第1振動腕及び第2振動腕の並列方向における振動部の内側に設けられた錘部を含み、第2オフセット構造は、第2振動腕の上面または下面のうち、第2中心軸よりも第1振動腕及び第2振動腕の並列方向における振動部の内側に設けられた錘部を含む。 As one aspect, the first offset structure is a weight portion provided inside the vibrating portion of the upper surface or the lower surface of the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the first central axis. The second offset structure includes a weight portion provided inside the vibrating portion of the upper surface or the lower surface of the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the second central axis. include.
 一態様として、第1オフセット構造は、第1振動腕及び第2振動腕の並列方向において第2振動腕に対向する第1振動腕の側面に設けられた凸部を含み、第2オフセット構造は、第1振動腕及び第2振動腕の並列方向において第1振動腕に対向する第2振動腕の側面に設けられた凸部を含む。 As one embodiment, the first offset structure includes a convex portion provided on the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm, and the second offset structure is , Includes a convex portion provided on the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm.
 一態様として、第1オフセット構造は、第1振動腕の上面または下面のうち、第1中心軸よりも第1振動腕及び第2振動腕の並列方向において振動部の外側に形成された孔又は溝を含み、第2オフセット構造は、第2振動腕の上面または下面のうち、第2中心軸よりも第1振動腕及び第2振動腕の並列方向において振動部の外側に形成された孔又は溝を含む。 As one aspect, the first offset structure is a hole or a hole formed on the outer surface of the upper surface or the lower surface of the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the first central axis. The second offset structure includes a groove, or a hole or a hole formed on the outer surface of the upper surface or the lower surface of the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the second central axis. Including grooves.
 一態様として、第1オフセット構造は、第1振動腕及び第2振動腕の並列方向において第2振動腕に対向する第1振動腕の側面とは反対側の第1振動腕の側面に設けられた凹部を含み、第2オフセット構造は、第1振動腕及び第2振動腕の並列方向において第1振動腕に対向する第2振動腕の側面とは反対側の第2振動腕の側面に設けられた凹部を含む。 As one aspect, the first offset structure is provided on the side surface of the first vibrating arm opposite to the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm. The second offset structure is provided on the side surface of the second vibrating arm opposite to the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm. Includes recessed recesses.
 一態様として、第1オフセット構造は、第1振動腕及び第2振動腕の並列方向において第2振動腕に対向する第1振動腕の側面に設けられた第1凸部と、第1振動腕及び第2振動腕の並列方向において第2振動腕に対向する第1振動腕の側面とは反対側の第1振動腕の側面に設けられて第1凸部よりも第1振動腕の側面からの突出量が小さい第2凸部とを含み、第2オフセット構造は、第1振動腕及び第2振動腕の並列方向において第1振動腕に対向する第2振動腕の側面に設けられた第1凸部と、第1振動腕及び第2振動腕の並列方向において第1振動腕に対向する第2振動腕の側面とは反対側の第2振動腕の側面に設けられて第1凸部よりも第2振動腕の側面からの突出量が小さい第2凸部とを含む。 As one aspect, the first offset structure has a first convex portion provided on the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the first vibrating arm and the first vibrating arm, and the first vibrating arm. And from the side surface of the first vibrating arm rather than the first convex portion provided on the side surface of the first vibrating arm opposite to the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction of the second vibrating arm. The second offset structure is provided on the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the second vibrating arm, including the second convex portion having a small protrusion amount. The first convex portion is provided on the side surface of the second vibrating arm opposite to the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction of the first vibrating arm and the first vibrating arm. It includes a second convex portion having a smaller protrusion amount from the side surface of the second vibrating arm.
 一態様として、第1振動腕及び第2振動腕は、固有振動数が共通し、第1オフセット構造及び第2オフセット構造は、互いに非対称構造である。 As one aspect, the first vibrating arm and the second vibrating arm have a common natural frequency, and the first offset structure and the second offset structure are asymmetrical with each other.
 本発明の一態様によれば、振動部と、振動部の周囲の少なくとも一部に設けられた保持部と、振動部と保持部との間に設けられた保持腕と、を備え、振動部は、固定端と開放端とを有し、面外屈曲する第1振動腕と、固定端と開放端とを有し、第1振動腕と異なる位相で面外屈曲する第2振動腕と、第1振動腕及び第2振動腕に接続される前端、及び前端に対向する後端を有する基部と、を含み、前記保持腕は、一端が基部に接続され、他端が保持部に接続され、第1振動腕と基部との境界部分における第1振動腕の短手方向の第1中心軸、及び、第2振動腕と基部との境界部分における第2振動腕の短手方向の第2中心軸の各々は、第1振動腕及び第2振動腕の並列方向における振動部の内側に傾斜して延びる。 According to one aspect of the present invention, the vibrating portion is provided with a vibrating portion, a holding portion provided at least a part around the vibrating portion, and a holding arm provided between the vibrating portion and the holding portion. Has a first vibrating arm that has a fixed end and an open end and bends out of the plane, and a second vibrating arm that has a fixed end and an open end and bends out of the plane in a phase different from that of the first vibrating arm. The holding arm includes a front end connected to a first vibrating arm and a second vibrating arm, and a base having a rear end facing the front end, the holding arm having one end connected to the base and the other end connected to the holding portion. , The first central axis in the lateral direction of the first vibrating arm at the boundary between the first vibrating arm and the base, and the second in the lateral direction of the second vibrating arm at the interface between the second vibrating arm and the base. Each of the central axes is inclined and extends inward of the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm.
 一態様として、振動部は、圧電膜と、圧電膜を挟んで互いに対向して設けられた上部電極および下部電極とを有する。 As one aspect, the vibrating portion has a piezoelectric film and an upper electrode and a lower electrode provided so as to face each other with the piezoelectric film interposed therebetween.
 以上説明したように、本発明の一態様によれば、振動腕の長手方向に延びる中心軸周りの回転モーメントを相殺することで、振動部の振動特性を安定化させることができる。 As described above, according to one aspect of the present invention, the vibration characteristics of the vibrating portion can be stabilized by canceling the rotational moment around the central axis extending in the longitudinal direction of the vibrating arm.
 ・上記実施形態では、共振子が、圧電膜と、圧電膜を挟んで互いに対向して設けられた上部電極および下部電極とを有するMEMSである場合を例に挙げて説明したが、共振子はこれに限らず、他の材料(例えば、水晶材料等)や構造を有していてもよい。 -In the above embodiment, the case where the resonator is a MEMS having a piezoelectric film and an upper electrode and a lower electrode provided so as to face each other across the piezoelectric film has been described as an example, but the resonator is described. Not limited to this, it may have other materials (for example, crystal material, etc.) and structures.
 なお、以上説明した実施形態は、本発明の理解を容易にするためのものであり、本発明を限定して解釈するためのものではない。本発明は、その趣旨を逸脱することなく、変更/改良され得るとともに、本発明にはその等価物も含まれる。即ち、各実施形態に当業者が適宜設計変更を加えたものも、本発明の特徴を備えている限り、本発明の範囲に包含される。例えば、各実施形態が備える各要素及びその配置、材料、条件、形状、サイズなどは、例示したものに限定されるわけではなく適宜変更することができる。また、各実施形態が備える各要素は、技術的に可能な限りにおいて組み合わせることができ、これらを組み合わせたものも本発明の特徴を含む限り本発明の範囲に包含される。 It should be noted that the embodiments described above are for facilitating the understanding of the present invention, and are not for limiting the interpretation of the present invention. The present invention can be modified / improved without departing from the spirit thereof, and the present invention also includes an equivalent thereof. That is, those skilled in the art with appropriate design changes to each embodiment are also included in the scope of the present invention as long as they have the features of the present invention. For example, each element included in each embodiment and its arrangement, material, condition, shape, size, and the like are not limited to those exemplified, and can be appropriately changed. Further, the elements included in each embodiment can be combined as much as technically possible, and the combination thereof is also included in the scope of the present invention as long as the features of the present invention are included.
 1            共振装置
 10           共振子
 20           下蓋
 30           上蓋
 110          保持腕
 120          振動部
 130          基部
 135          振動腕
 135A         第1振動腕
 135B         第2振動腕
 136A、136B    錘部
 137A、137B    凸部
 138A、138B    孔
 139A、139B    凹部
 140          保持部
 140a~d       枠体
 141A、141B    第1凸部
 142A、142B    第2凸部
 143A、143B    凸部
 144A、144B    凸部
 145A、145B    凹部
 235          保護膜
 236          周波数調整膜
 
1 Resonator 10 Resonator 20 Lower lid 30 Upper lid 110 Holding arm 120 Vibrating part 130 Base 135 Vibrating arm 135A 1st vibrating arm 135B 2nd vibrating arm 136A, 136B Weight part 137A, 137B Convex part 138A, 138B Hole 139A, 139B Concave 140 Holding part 140a- d Frame body 141A, 141B First convex part 142A, 142B Second convex part 143A, 143B Convex part 144A, 144B Convex part 145A, 145B Concave part 235 Protective film 236 Frequency adjustment film

Claims (11)

  1.  振動部と、
     前記振動部の周囲の少なくとも一部に設けられた保持部と、
     前記振動部と前記保持部との間に設けられた保持腕と、
     を備え、
     前記振動部は、
     固定端と開放端とを有し、面外屈曲する第1振動腕と、
     固定端と開放端とを有し、前記第1振動腕と異なる位相で面外屈曲する第2振動腕と、
     前記第1振動腕及び前記第2振動腕が並列して接続される前端、及び当該前端に対向する後端を有する基部と、
     を含み、
     前記保持腕は、一端が前記基部に接続され、他端が前記保持部に接続され、
     前記第1振動腕は、前記第1振動腕と前記基部との境界における前記第1振動腕の短手方向の第1中心軸よりも前記第1振動腕及び前記第2振動腕の並列方向における前記振動部の内側に前記第1振動腕の重心位置をオフセットさせる第1オフセット構造を有し、
     前記第2振動腕は、前記第2振動腕と前記基部との境界における前記第2振動腕の短手方向の第2中心軸よりも前記並列方向における前記振動部の内側に前記第2振動腕の重心位置をオフセットさせる第2オフセット構造を有する、
    共振子。
    The vibrating part and
    A holding portion provided at least a part around the vibrating portion and a holding portion.
    A holding arm provided between the vibrating portion and the holding portion,
    Equipped with
    The vibrating part is
    A first vibrating arm that has a fixed end and an open end and bends out of the plane,
    A second vibrating arm that has a fixed end and an open end and bends out of the plane in a phase different from that of the first vibrating arm.
    A front end to which the first vibrating arm and the second vibrating arm are connected in parallel, and a base having a rear end facing the front end,
    Including
    One end of the holding arm is connected to the base and the other end is connected to the holding portion.
    The first vibrating arm is in the parallel direction of the first vibrating arm and the second vibrating arm with respect to the first central axis in the lateral direction of the first vibrating arm at the boundary between the first vibrating arm and the base. It has a first offset structure that offsets the position of the center of gravity of the first vibrating arm inside the vibrating portion.
    The second vibrating arm is located inside the vibrating portion in the parallel direction from the second central axis in the lateral direction of the second vibrating arm at the boundary between the second vibrating arm and the base portion. Has a second offset structure that offsets the position of the center of gravity of
    Resonator.
  2.  前記第1オフセット構造は、前記第1振動腕の先端部に設けられ、
     前記第2オフセット構造は、前記第2振動腕の先端部に設けられる、
    請求項1に記載の共振子。
    The first offset structure is provided at the tip of the first vibrating arm.
    The second offset structure is provided at the tip of the second vibrating arm.
    The resonator according to claim 1.
  3.  前記第1オフセット構造は、前記第1振動腕の上面または下面のうち、前記第1中心軸よりも前記並列方向における前記振動部の内側に設けられた錘部を含み、
     前記第2オフセット構造は、前記第2振動腕の上面または下面のうち、前記第2中心軸よりも前記並列方向における前記振動部の内側に設けられた錘部を含む、
    請求項1または2に記載の共振子。
    The first offset structure includes a weight portion of the upper surface or the lower surface of the first vibrating arm provided inside the vibrating portion in the parallel direction from the first central axis.
    The second offset structure includes a weight portion of the upper surface or the lower surface of the second vibrating arm provided inside the vibrating portion in the parallel direction from the second central axis.
    The resonator according to claim 1 or 2.
  4.  前記第1オフセット構造は、前記並列方向において前記第2振動腕に対向する前記第1振動腕の側面に設けられた凸部を含み、
     前記第2オフセット構造は、前記並列方向において前記第1振動腕に対向する前記第2振動腕の側面に設けられた凸部を含む、
    請求項1または2に記載の共振子。
    The first offset structure includes a protrusion provided on the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction.
    The second offset structure includes a protrusion provided on the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction.
    The resonator according to claim 1 or 2.
  5.  前記第1オフセット構造は、前記第1振動腕の上面または下面のうち、前記第1中心軸よりも前記並列方向において前記振動部の外側に形成された孔又は溝を含み、
     前記第2オフセット構造は、前記第2振動腕の上面または下面のうち、前記第2中心軸よりも前記並列方向において前記振動部の外側に形成された孔又は溝を含む、
    請求項1または2に記載の共振子。
    The first offset structure includes a hole or groove formed on the outer surface of the vibrating portion in the parallel direction from the first central axis on the upper surface or the lower surface of the first vibrating arm.
    The second offset structure includes a hole or groove formed on the outer surface of the vibrating portion in the parallel direction from the second central axis on the upper surface or the lower surface of the second vibrating arm.
    The resonator according to claim 1 or 2.
  6.  前記第1オフセット構造は、前記並列方向において前記第2振動腕に対向する前記第1振動腕の側面とは反対側の前記第1振動腕の側面に設けられた凹部を含み、
     前記第2オフセット構造は、前記並列方向において前記第1振動腕に対向する前記第2振動腕の側面とは反対側の前記第2振動腕の側面に設けられた凹部を含む、
    請求項1または2に記載の共振子。
    The first offset structure includes a recess provided on the side surface of the first vibrating arm opposite to the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction.
    The second offset structure includes a recess provided on the side surface of the second vibrating arm opposite to the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction.
    The resonator according to claim 1 or 2.
  7.  前記第1オフセット構造は、前記並列方向において前記第2振動腕に対向する前記第1振動腕の側面に設けられた第1凸部と、前記並列方向において前記第2振動腕に対向する前記第1振動腕の側面とは反対側の前記第1振動腕の側面に設けられて当該第1凸部よりも前記第1振動腕の側面からの突出量が小さい第2凸部とを含み、
     前記第2オフセット構造は、前記並列方向において前記第1振動腕に対向する前記第2振動腕の側面に設けられた第1凸部と、前記並列方向において前記第1振動腕に対向する前記第2振動腕の側面とは反対側の前記第2振動腕の側面に設けられて当該第1凸部よりも前記第2振動腕の側面からの突出量が小さい第2凸部とを含む、
    請求項1または2に記載の共振子。
    The first offset structure includes a first convex portion provided on the side surface of the first vibrating arm facing the second vibrating arm in the parallel direction, and the first convex portion facing the second vibrating arm in the parallel direction. 1 Includes a second convex portion provided on the side surface of the first vibrating arm opposite to the side surface of the vibrating arm and having a smaller protrusion amount from the side surface of the first vibrating arm than the first convex portion.
    The second offset structure includes a first convex portion provided on the side surface of the second vibrating arm facing the first vibrating arm in the parallel direction, and the first convex portion facing the first vibrating arm in the parallel direction. 2. Includes a second convex portion provided on the side surface of the second vibrating arm opposite to the side surface of the vibrating arm and having a smaller protrusion amount from the side surface of the second vibrating arm than the first convex portion.
    The resonator according to claim 1 or 2.
  8.  前記第1振動腕及び前記第2振動腕は、固有振動数が共通し、
     前記第1オフセット構造及び前記第2オフセット構造は、互いに非対称構造である、
    請求項1から7のいずれか一項に記載の共振子。
    The first vibrating arm and the second vibrating arm have a common natural frequency.
    The first offset structure and the second offset structure are asymmetrical with each other.
    The resonator according to any one of claims 1 to 7.
  9.  振動部と、
     前記振動部の周囲の少なくとも一部に設けられた保持部と、
     前記振動部と前記保持部との間に設けられた保持腕と、
     を備え、
     前記振動部は、
     固定端と開放端とを有し、面外屈曲する第1振動腕と、
     固定端と開放端とを有し、前記第1振動腕と異なる位相で面外屈曲する第2振動腕と、
     前記第1振動腕及び前記第2振動腕が並列して接続される前端、及び当該前端に対向する後端を有する基部と、
     を含み、
     前記保持腕は、一端が前記基部に接続され、他端が前記保持部に接続され、
     前記第1振動腕と前記基部との境界部分における前記第1振動腕の短手方向の第1中心軸、及び、前記第2振動腕と前記基部との境界部分における前記第2振動腕の短手方向の第2中心軸の各々は、前記第1振動腕及び前記第2振動腕の並列方向における前記振動部の内側に傾斜して延びる、
    共振子。
    The vibrating part and
    A holding portion provided at least a part around the vibrating portion and a holding portion.
    A holding arm provided between the vibrating portion and the holding portion,
    Equipped with
    The vibrating part is
    A first vibrating arm that has a fixed end and an open end and bends out of the plane,
    A second vibrating arm that has a fixed end and an open end and bends out of the plane in a phase different from that of the first vibrating arm.
    A front end to which the first vibrating arm and the second vibrating arm are connected in parallel, and a base having a rear end facing the front end,
    Including
    One end of the holding arm is connected to the base and the other end is connected to the holding portion.
    The first central axis in the lateral direction of the first vibrating arm at the boundary portion between the first vibrating arm and the base portion, and the short length of the second vibrating arm at the boundary portion between the second vibrating arm and the base portion. Each of the second central axes in the hand direction is inclined and extends inward of the vibrating portion in the parallel direction of the first vibrating arm and the second vibrating arm.
    Resonator.
  10.  前記振動部は、
     圧電膜と、
     前記圧電膜を挟んで互いに対向して設けられた上部電極および下部電極と
     を有する、
    請求項1から9のいずれか一項に記載の共振子。
    The vibrating part is
    Piezoelectric membrane and
    It has an upper electrode and a lower electrode provided so as to face each other with the piezoelectric film interposed therebetween.
    The resonator according to any one of claims 1 to 9.
  11.  請求項1から10のいずれか一項に記載の共振子と、
     前記共振子を間に挟んで互いに対向して設けられた上蓋および下蓋と、
     を備える、
    共振装置。
     
     
    The resonator according to any one of claims 1 to 10 and
    The upper lid and the lower lid provided so as to face each other with the resonator in between,
    To prepare
    Resonator.

PCT/JP2021/009077 2020-07-29 2021-03-08 Resonator, and resonating device WO2022024438A1 (en)

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JP2001066141A (en) * 1999-08-27 2001-03-16 Yoshiaki Kato Vibrator for gyro sensor
JP2012060264A (en) * 2010-09-06 2012-03-22 Seiko Epson Corp Vibration piece, vibrator, vibration device and electronic apparatus
JP2014135654A (en) * 2013-01-10 2014-07-24 Sii Crystal Technology Inc Piezoelectric vibration piece, piezoelectric vibrator, oscillator, electronic apparatus, and atomic clock
WO2016175218A1 (en) * 2015-04-28 2016-11-03 株式会社村田製作所 Resonator and resonance device
WO2017047207A1 (en) * 2015-09-18 2017-03-23 株式会社村田製作所 Resonator and resonance device
WO2017110126A1 (en) * 2015-12-21 2017-06-29 株式会社村田製作所 Resonator and resonance device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001066141A (en) * 1999-08-27 2001-03-16 Yoshiaki Kato Vibrator for gyro sensor
JP2012060264A (en) * 2010-09-06 2012-03-22 Seiko Epson Corp Vibration piece, vibrator, vibration device and electronic apparatus
JP2014135654A (en) * 2013-01-10 2014-07-24 Sii Crystal Technology Inc Piezoelectric vibration piece, piezoelectric vibrator, oscillator, electronic apparatus, and atomic clock
WO2016175218A1 (en) * 2015-04-28 2016-11-03 株式会社村田製作所 Resonator and resonance device
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