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WO2022016775A1 - 活塞制作方法及活塞 - Google Patents

活塞制作方法及活塞 Download PDF

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Publication number
WO2022016775A1
WO2022016775A1 PCT/CN2020/134197 CN2020134197W WO2022016775A1 WO 2022016775 A1 WO2022016775 A1 WO 2022016775A1 CN 2020134197 W CN2020134197 W CN 2020134197W WO 2022016775 A1 WO2022016775 A1 WO 2022016775A1
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WO
WIPO (PCT)
Prior art keywords
piston
metal layer
piston base
zirconium
target
Prior art date
Application number
PCT/CN2020/134197
Other languages
English (en)
French (fr)
Inventor
马飞
韩金峰
齐少豹
郭灵燕
Original Assignee
潍柴动力股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 潍柴动力股份有限公司 filed Critical 潍柴动力股份有限公司
Priority to EP20946075.7A priority Critical patent/EP4186993A4/en
Priority to CA3186559A priority patent/CA3186559A1/en
Publication of WO2022016775A1 publication Critical patent/WO2022016775A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/026—Anodisation with spark discharge
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
    • F02F—CYLINDERS, PISTONS OR CASINGS, FOR COMBUSTION ENGINES; ARRANGEMENTS OF SEALINGS IN COMBUSTION ENGINES
    • F02F3/00—Pistons 
    • F02F3/10—Pistons  having surface coverings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
    • F02F—CYLINDERS, PISTONS OR CASINGS, FOR COMBUSTION ENGINES; ARRANGEMENTS OF SEALINGS IN COMBUSTION ENGINES
    • F02F3/00—Pistons 
    • F02F3/10—Pistons  having surface coverings
    • F02F3/12—Pistons  having surface coverings on piston heads

Definitions

  • the present application relates to the technical field of machining, for example, to a method for manufacturing a piston and a piston.
  • the first is to coat the top of the steel piston with thermal barrier ceramic layers such as yttrium-stabilized zirconia YSZ, magnesium oxide partially stabilized zirconia Mg-PSZ, etc.
  • the main material of the ceramic layer is zirconia, using zirconia with low thermal conductivity.
  • the second is to prepare a steel piston with a metal-ceramic composite coating.
  • a dense metal layer such as aluminum, magnesium and titanium is prepared on the top surface of the steel piston by the arc spraying technology, and then the steel piston covered with the metal layer is applied. Secondary machining, and finally the electrochemical method of hard anodizing is used to prepare the ceramic thermal barrier coating.
  • the arc spraying technology has the following disadvantages: (1) The porosity of the metal layer prepared by arc spraying is relatively large, and it is distributed in the entire metal layer, which will cause the metal layer to be unable to be closely combined with the steel piston substrate, and coating may occur.
  • the thermal shock performance of the coating will decrease; (2) high temperature will be generated on the surface of the steel piston during arc spraying, which may lead to a decrease in the high temperature strength of the steel piston substrate.
  • the metal-ceramic composite coating is prepared on the surface of the steel piston, the coating does not have excellent low thermal conductivity and low heat capacity.
  • the present application provides a method for manufacturing a piston and a piston, which have low heat capacity and low thermal conductivity, and reduce the heat absorption and heat transfer capabilities of the top of the piston, thereby helping to improve the thermal efficiency of the engine.
  • An embodiment provides a method for manufacturing a piston, comprising:
  • the top surface of the piston base is coated with a magnetron spray to form a metal layer; wherein, the metal layer is a composite metal layer of aluminum oxide and zirconium oxide;
  • electrochemical reaction is performed on the metal layer to form a ceramic layer; wherein, the ceramic layer has a hole-like structure.
  • the embodiment of the present application also provides a piston, which is manufactured by the above-mentioned piston manufacturing method, and the piston includes:
  • a metal layer disposed on the top surface of the piston base
  • the ceramic layer is arranged on the top surface of the metal layer.
  • FIG. 1 is a schematic structural diagram of a piston provided by the present application.
  • connection should be understood in a broad sense, for example, it may be a fixed connection, a detachable connection, or an integrated ; It can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between the two elements.
  • connection may be a fixed connection, a detachable connection, or an integrated ; It can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between the two elements.
  • a first feature "on” or “under” a second feature may include direct contact between the first and second features, or may include the first and second features Not directly but through additional features between them.
  • the first feature being “above”, “over” and “above” the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is level higher than the second feature.
  • the first feature is “below”, “below” and “below” the second feature includes the first feature being directly below and diagonally below the second feature, or simply means that the first feature has a lower level than the second feature.
  • this embodiment provides a piston.
  • the piston includes a piston base body 1 , a metal layer 2 and a ceramic layer 3 .
  • the piston base body 1 is made of steel.
  • a metal layer 2 is arranged thereon, and a ceramic layer 3 is arranged on the top surface of the metal layer 2 .
  • a metal layer 2 and a ceramic layer 3 are arranged on the top surface of the piston base 1, so as to add a composite thermal barrier ceramic coating with low heat capacity and low thermal conductivity on the top of the piston base 1, thereby reducing the pressure of the piston.
  • the heat absorption and heat transfer capability of the top of the base body 1 helps to improve the thermal efficiency of the engine.
  • a ceramic layer 3 is arranged on the top surface of the metal layer 2, and a plurality of holes are arranged in the ceramic layer 3. The holes in the ceramic layer 3 can realize heat absorption and release, thereby realizing heat insulation.
  • a dense transition layer 4 will be formed between the dense metal layer 2 and the ceramic layer 3 .
  • This embodiment also provides a method for manufacturing a piston, which is used to manufacture the above-mentioned piston.
  • the method for manufacturing a piston includes: using a magnetron spray method to coat the top surface of the piston base 1 to form a metal layer 2, and the metal layer 2 is aluminum oxide.
  • the material of the thermal barrier ceramic layer 3 coated on the top of the piston is zirconia, and the heat capacity of zirconia is relatively large.
  • the manufacturing method of the piston provided in this embodiment is to coat the top surface of the piston base 1 to form the metal layer 2 and the metal layer. 2 is a composite metal layer 2 of aluminum oxide and zirconia. Compared with the related technologies that all use zirconia, the composite metal layer 2 of aluminum oxide and zirconia adds aluminum oxide on the basis of zirconia, which effectively reduces the metal layer 2.
  • the heat capacity is high, avoiding the situation that a large amount of heat is stored in insulation and causing the temperature of the combustion chamber to rise, which is conducive to the full combustion of the fuel.
  • the ceramic layer 3 has a hole-like structure, so that the ceramic layer 3 has a loose structure, which has the characteristics of low heat capacity and reduces the heat capacity of the piston base 1 .
  • the top of the metal layer 2 is electrochemically treated to form a ceramic layer 3 with holes.
  • the ceramic layer 3 is a microscopic hole coating. The air thermal conductivity in the microscopic hole coating is extremely small, and the thermal conductivity of air is poor, which can hinder high temperature The heat transfer of the fuel gas to the piston base body 1 effectively reduces the thermal conductivity of the piston base body 1 .
  • the composite thermal barrier coating of the metal layer 2 and the ceramic layer 3 is prepared on the top of the piston base 1 by using the magnetron spraying method and the micro-arc oxidation method, which can reduce the heat absorption capacity of the piston base 1, thereby reducing the heat transfer through the piston base 1.
  • the heat conduction of the cylinder liner improves the thermal efficiency of the engine.
  • the piston base 1 is pretreated to make the top surface of the piston base 1 flat and smooth, so as to increase the adhesion of the coating.
  • the pretreatment includes the following steps: grinding the top surface of the piston base 1 with sandpaper to polish to a mirror surface; placing the piston base 1 in an ultrasonic cleaning machine, and ultrasonically cleaning the piston base 1 with a cleaning agent; using deionization
  • the piston base 1 is ultrasonically cleaned with water, and after cleaning, the piston base 1 is blown dry with hot air.
  • the cleaning agent is acetone or a metal cleaning agent solution, and the piston base 1 is ultrasonically cleaned for about 30min, after cleaning, ultrasonically clean with deionized water for about 10min, and dry with hot air.
  • the top surface of the piston base 1 is coated by a magnetron spray method.
  • the magnetron spraying method is a technique of bombarding the target surface with energetic particles in a vacuum, so that the bombarded particles are deposited on the substrate. And its atomic deposition characteristics make the metal layer 2 more dense.
  • the magnetron spray method includes the following steps: filling an inert gas in a vacuum chamber, and setting an aluminum target and a zirconium target in the vacuum chamber respectively; using a clamping assembly to clamp the piston base 1 and control the top surface of the piston base 1 away from the aluminum
  • the target and the zirconium target are set, and the incident ions generated by the glow discharge reaction of the low-pressure inert gas are used to bombard the surface of the aluminum target and the surface of the zirconium target; the clamping assembly is used to clamp the piston base 1 and control the top surface of the piston base 1 to face the aluminum target.
  • the zirconium target are arranged so that the aluminum atoms and zirconium atoms generated by the sputtering of the aluminum target and the zirconium target are sputtered and deposited on the top surface of the piston base 1 to form the metal layer 2 of the thin film structure.
  • the clamping assembly includes a clamp and a rotating shaft that can rotate relative to the vacuum chamber, clamps the pretreated piston base 1 on the clamp, and assembles the piston base 1 and the clamp on the rotating shaft as a whole, and then the piston base 1
  • the top surface of the device faces away from the aluminum target and the zirconium target, and the aluminum target and the zirconium target are distributed up and down and set at a preset angle.
  • the mechanical pump uses the mechanical pump to extract the air in the vacuum chamber. After the mechanical pump extracts the air pressure to the preset limit, turn on the molecular pump. On this basis, the molecular pump continues to extract air, so that the air pressure of the vacuum chamber before the inert gas is introduced is less than or equal to 5 ⁇ 10 -4 Pa, the vacuum chamber provides a vacuum environment for the magnetron spray, and an inert gas is introduced into the vacuum chamber, and the inert gas can be selected as argon.
  • the air pressure of the vacuum chamber after the inert gas is introduced is 0.1Pa-0.9Pa.
  • the air pressure of the vacuum chamber after the inert gas is introduced is 0.5Pa.
  • the aluminum target and zirconium target made of coating material are used as the cathode, and the piston base 1 is used as the anode.
  • the current of the aluminum target and the zirconium target was increased to 4A, and a glow discharge was generated under the action of a radio frequency voltage, and the incident ions generated by the glow discharge were argon ions.
  • Argon ions bombard the surface of the aluminum target and the surface of the zirconium target for about 20 minutes for surface cleaning of the aluminum target and the zirconium target.
  • the sputtered aluminum and zirconium atoms are sputtered after exchanging kinetic energy, so that the sputtered aluminum and zirconium atoms have high energy, which is beneficial to improve the diffusion ability of aluminum and zirconium atoms during deposition and improve the compactness of the deposition structure. , so that the produced metal layer 2 film has strong adhesion to the piston base 1 .
  • the magnetron spraying method for coating has high coating quality, the metal layer 2 and the piston base 1 can be closely combined to avoid the metal layer 2 falling off, and the thermal shock performance is good.
  • magnetron sputtering can precisely control the thickness and uniformity of the metal layer 2, so that the metal layer 2 can be directly subjected to the micro-arc oxidation treatment after magnetron sputtering, without the need for secondary processing of the metal layer 2, saving production process, reducing production costs.
  • a proper amount of zirconia is uniformly doped into the ceramic layer 3 .
  • the traditional method of adding zirconia to the ceramic coating is to add potassium fluorozirconate to the electrolyte during micro-arc oxidation. After the potassium fluorozirconate is dissolved at high temperature, the increase in its concentration will significantly increase the conductivity of the electrolyte The rate of spark ablation in the reaction process is serious, so that the added content of zirconium element in the ceramic layer 3 prepared by this method is extremely limited. At the same time, when using electrolyte to add zirconium element, the zirconium element cannot be uniformly distributed in the coating.
  • the metal layer 2 forms a ceramic layer 3 with zirconia in the electrochemical reaction, which solves the problem caused by the spraying method.
  • the prepared metal layer 2 is a composite metal layer 2 of aluminum oxide and zirconium oxide.
  • the zirconium element in the composite metal layer 2 is evenly distributed on the top surface of the piston base 1. After micro-arc oxidation The zirconia formed after the treatment will be uniformly distributed in the entire ceramic layer 3, avoiding the problem that the zirconium element cannot be uniformly distributed when the electrolyte is added.
  • controlling the content ratio of aluminum element and zirconium element is achieved by adjusting the sputtering angles of the aluminum target and the zirconium target respectively and controlling the simultaneous sputtering of the aluminum target and the zirconium target.
  • Magnetron sputtering can use aluminum target and zirconium target to sputter at the same time, and adjust the sputtering angle to precisely control the composition and content of the metal layer 2, and the adjustability is stronger, so as to realize the control of the content of zirconia in the ceramic layer 3.
  • the method of prefabricating the composite metal layer 2 by magnetron sputtering is used to add a trace amount of zirconium element to the ceramic layer 3, which increases the content of zirconium element in the ceramic layer 3, and solves the problem that the distribution of the added element in the ceramic layer 3 is not good when adding the electrolyte solution.
  • the uniform phenomenon makes the overall properties of the ceramic layer 3 more stable.
  • the micro-arc oxidation method includes the following steps: using a clamp assembly to clamp the piston base body 1; electrically connecting the positive electrode of the pulse power source to the piston base body 1, the negative electrode of the pulse power source is electrically connected to the clamp assembly, and placing the piston base body 1 on top.
  • the metal layer 2 on the upper surface is placed in the electrolyte, and the metal layer 2 reacts with the electrolyte and micro-arc discharges on the surface of the metal layer 2 to form the ceramic layer 3 on the surface of the metal layer 2 .
  • the piston base 1 is taken out, and the piston base 1 is assembled on a special clamp assembly, then the piston base 1 is connected to the positive electrode of the pulse power supply, and the clamp assembly is connected to the negative electrode of the power supply.
  • the electrolyte is a silicate electrolyte
  • the concentration of the electrolyte is 10g/L-30g/L
  • the temperature of the electrolyte is less than or equal to 35°C
  • the current density of the pulse power supply is 0.2A/dm 2 -0.4A/dm 2
  • the pulse The frequency of the power supply is 50Hz-500Hz
  • the duty cycle of the forward current is 40%-50%
  • the positive and negative current ratio of the pulse power supply is 0.7-1.3.
  • 40L of silicate electrolyte solution is configured and placed in the reaction circulation tank, and the concentration of sodium silicate is 15g/L, including complexing agent, stabilizer and the like.
  • the water-cooled circulation device to ensure that the temperature of the electrolyte is less than or equal to 35°C during the micro-arc oxidation process, and set the electric parameters of the micro-arc oxidation, for example: the current density of the pulse power supply is 0.3A/dm 2 , and the positive and negative current ratio of the pulse power supply is 1.2 , the frequency of the pulse power supply is 400Hz, the positive duty cycle is 40%, and the negative duty cycle is 40%.
  • a voltage is applied to the piston base 1 through a pulse power supply, so that the metal layer 2 on the surface of the piston base 1 interacts with the electrolyte solution, and a micro-arc discharge is formed on the surface of the metal layer 2.
  • the surface of the metal layer 2 The ceramic layer 3 is formed to achieve the purpose of surface strengthening.
  • the molten ceramic phase erupts from the inside of the metal layer 2, and cools rapidly after contacting the electrolyte. At this time, the discharge channel and the rapidly solidified structure will cause the existence of holes.
  • the micro-arc oxidation method is adopted to obtain the ceramic layer 3 which not only maintains excellent resistance to alternating heat and cold, but also has low heat capacity, so that the porosity of the ceramic layer 3 is 15%-25%.
  • the thermophysical properties of the ceramic layer 3 can be adjusted according to requirements by changing the electrical parameters and electrolyte parameters within a predetermined range.
  • the thermal conductivity of the coating was tested with a laser thermal conductivity meter, and the volumetric heat capacity of the coating was tested with a Differential Scanning Calorimeter (DSC).
  • DSC Differential Scanning Calorimeter
  • the ceramic coating prepared by this process also has a volumetric heat capacity lower than 1000kJ/(m 3 ⁇ K), and the top heat capacity of the piston base 1 prepared under the above parameters is 911KJ/ (m 3 ⁇ K), so that the temperature of the combustion chamber will not be too high, and the sufficient number of oxygen atoms in the combustion process is ensured, and the combustion efficiency is improved.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Ceramic Engineering (AREA)
  • Coating By Spraying Or Casting (AREA)
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Abstract

一种活塞制作方法及活塞。该活塞制作方法包括：采用磁控喷射方式，在活塞基体(1)的顶面镀膜，以形成金属层(2)；其中，金属层(2)为氧化铝和氧化锆的复合金属层(2)；采用微弧氧化方式，在金属层(2)上进行电化学反应，以形成陶瓷层(3)；其中，陶瓷层(3)为孔洞状结构。

Description

活塞制作方法及活塞
本申请要求申请日为2020年7月23日、申请号为202010717286.0的中国专利申请的优先权，该申请的全部内容通过引用结合在本申请中。
技术领域
本申请涉及机加工技术领域，例如涉及一种活塞制作方法及活塞。
背景技术
现有活塞的生产制造具有以下两种方式：
第一种，在钢活塞顶部涂覆钇稳定二氧化锆YSZ、氧化镁部分稳定氧化锆Mg-PSZ等热障陶瓷层，该陶瓷层的主体材料为氧化锆，利用氧化锆热导率低的特点来降低热量传递与损失。由于氧化锆密度大，热容较大，通常为2000kJ/(m 3·K)以上，会导致氧化锆涂层在隔热时存储大量的热，从而使燃烧室温度升高，使进入燃烧室的氧原子数量降低，不利于燃料的充分燃烧。
第二种，制备具有金属-陶瓷复合涂层的钢活塞，首先通过电弧喷涂技术在钢活塞顶面制备一层致密的铝、镁及钛等金属层，然后对覆盖有金属层的钢活塞进行二次机械加工，最后使用硬质阳极氧化的电化学方法制备陶瓷隔热涂层。但电弧喷涂技术存在以下缺点：(1)电弧喷涂制备的金属层中孔洞率较大，且分布于整个金属层内，这将会导致金属层无法与钢活塞基体紧密结合，可能会发生涂层脱落等问题，同时还会导致涂层的热震性能下降；(2)电弧喷涂时会在钢活塞表面产生高温，可能会导致钢活塞基体的高温强度下降。另外，虽然在钢活塞表面制备了金属-陶瓷复合涂层，但该涂层不具备优良的低热导性与低热容性。
发明内容
本申请提供了一种活塞制作方法及活塞，具有低热容、低热导率，降低了活塞顶部的吸热与传热能力，从而有助于提高发动机热效率。
一实施例提供一种活塞制作方法，包括：
采用磁控喷射方式，在活塞基体的顶面镀膜，以形成金属层；其中，所述金属层为氧化铝和氧化锆的复合金属层；
采用微弧氧化方式，在所述金属层上进行电化学反应，以形成陶瓷层；其中，所述陶瓷层为孔洞状结构。
本申请实施例还提供了一种活塞，采用上述的活塞制作方法制作而成，所述活塞包括：
活塞基体；
金属层，设置于所述活塞基体的顶面上；
陶瓷层，设置于所述金属层的顶面上。
附图说明
图1是本申请提供的活塞的结构示意图。
图中：
1、活塞基体；2、金属层；3、陶瓷层；4、过渡层。
具体实施方式
在本申请的描述中，除非另有明确的规定和限定，术语“相连”、“连接”、“固定”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请中的具体含义。
在本申请中，除非另有明确的规定和限定，第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触，也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且，第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方，或仅仅表示第一特征水平高度小于第二特征。
现有活塞作为燃烧室的组成部分，在燃油燃烧时活塞顶部会吸收大量的热，这些热量需要通过活塞传递给气缸套，然后通过发动机的冷却介质将这些热量带走，从而使活塞冷却，这些散失的热量将会降低发动机的热效率。为了解决这个问题，如图1所示，本实施例提供了一种活塞，活塞包括活塞基体1、 金属层2及陶瓷层3，活塞基体1为钢材制作而成，在活塞基体1的顶面上设置有金属层2，在金属层2的顶面设置有陶瓷层3。
本实施例提供的活塞，通过在活塞基体1的顶面上设置金属层2和陶瓷层3，以在活塞基体1的顶部增加具有低热容、低热导率复合热障陶瓷涂层，降低活塞基体1顶部的吸热与传热能力，从而有助于提升发动机热效率。在金属层2的顶面设置有陶瓷层3，在陶瓷层3内设置有多个孔洞，陶瓷层3中的孔洞可以实现热量的吸收与释放，从而实现隔热。
在金属层2的基础上形成陶瓷层3的过程中，在致密的金属层2和陶瓷层3之间会形成一个致密的过渡层4。
本实施例还提供了一种活塞制作方法，用于制造上述活塞，该活塞制作方法包括：采用磁控喷射方式，在活塞基体1的顶面镀膜，形成金属层2，金属层2为氧化铝和氧化锆的复合金属层2；采用微弧氧化方式，在金属层2上进行电化学反应，形成陶瓷层3，陶瓷层3为孔洞状结构。
相关技术活塞顶部涂覆的热障陶瓷层3材料为氧化锆，氧化锆的热容比较大，本实施例提供的活塞制作方法，在活塞基体1的顶面镀膜，形成金属层2，金属层2为氧化铝和氧化锆的复合金属层2，与相关技术全部采用氧化锆相比，氧化铝和氧化锆的复合金属层2在氧化锆的基础上增加了氧化铝，有效地降低金属层2的热容，避免隔热存储大量的热导致燃烧室温度升高的情况，利于燃料的充分燃烧。同时，在金属层2上进行电化学反应，形成陶瓷层3，陶瓷层3为孔洞状结构，使得陶瓷层3为疏松结构，其具有低热容的特性，降低了活塞基体1的热容。另外，采用电化学对金属层2顶部进行处理，形成具有孔洞的陶瓷层3，陶瓷层3为微观孔洞涂层，微观孔洞涂层中的空气导热系数极小，空气的导热性差，可阻碍高温燃气向活塞基体1的热量传递，有效地降低活塞基体1的热导率。
采用磁控喷射方式和微弧氧化方式，在活塞基体1的顶部制备了金属层2和陶瓷层3的复合热障涂层，可以降低活塞基体1的吸热能力，从而减少通过活塞基体1向气缸套的热量传导，提升发动机热效率。
为了保证金属层2的镀膜效果，在进行磁控喷射之前，对活塞基体1进行前处理，以使活塞基体1的顶面平整光滑，以增加镀膜的附着力。
示例性地，前处理包括以下步骤：用砂纸打磨活塞基体1的顶面，以抛光至镜面；将活塞基体1放置于超声清洗机中，利用清洗剂对活塞基体1进行超 声清洗；利用去离子水对活塞基体1进行超声清洗且清洗后用热空气将活塞基体1吹干。
可选地，利用不同细度型号的砂纸依次打磨活塞基体1的顶面，在将活塞基体1放置于超声清洗机之后，清洗剂为丙酮或金属清洗剂溶液，对活塞基体1进行超声清洗大约30min，在清洗结束之后，使用去离子水超声清洗大约10min，用热空气吹干。
为了解决金属层2在镀层过程中产生的高温对活塞基体1和金属层2致密度的不利影响，采用磁控喷射方式在活塞基体1的顶面进行镀膜。磁控喷射方式为在真空中利用荷能粒子轰击靶表面，使被轰击出的粒子沉积在基片上的技术，采用磁控喷射的方法温度低，不会对活塞基体1的高温强度产生影响，而且其原子沉积的特性使得金属层2致密性更高。
可选地，磁控喷射方式包括以下步骤：在真空室内填充惰性气体，并在真空室内分别设置铝靶和锆靶；利用夹持组件夹紧活塞基体1并控制活塞基体1的顶面背离铝靶和锆靶设置，利用低压惰性气体的辉光放电反应产生入射离子轰击铝靶的表面和锆靶的表面；利用夹持组件夹紧活塞基体1并控制活塞基体1的顶面正对铝靶和锆靶设置，以使铝靶和锆靶溅射产生的铝原子和锆原子溅出并沉积至活塞基体1的顶面上，以形成薄膜结构的金属层2。
其中，夹持组件包括夹具和能够相对于真空室转动的转动轴，将经过预处理的活塞基体1夹持到夹具上，并将活塞基体1和夹具整体装配至转动轴上，然后活塞基体1的顶面背对铝靶和锆靶，铝靶和锆靶上下分布并呈预设角度设置。
利用机械泵抽取真空室内的空气，在机械泵抽取气压至预设的限值之后，开启分子泵，分子泵在此基础上继续抽取空气，使真空室在通入惰性气体之前的气压小于或等于5×10 -4Pa，真空室为磁控喷射提供真空环境，并向真空室内通入惰性气体，惰性气体可选为氩气。真空室在通入惰性气体之后的气压为0.1Pa-0.9Pa。可选地，真空室在通入惰性气体之后的气压为0.5Pa。
由镀膜材料制成的铝靶和锆靶作为阴极，由活塞基体1作为阳极。将铝靶和锆靶电流升高至4A，在射频电压作用下产生辉光放电，辉光放电产生的入射离子为氩离子。氩离子轰击铝靶的表面和锆靶的表面大约20min，用于铝靶和锆靶的表面清洗。在清洗完成后，设置活塞基体1偏压为80V，控制转动轴将活塞基体1的顶面正对铝靶和锆靶，开始溅射镀膜，直到金属厚度达到 100μm。
被溅射铝原子和锆原子是通过交换动能后飞溅出来的，使得溅射出来的铝原子和锆原子能量高，有利于提高沉积时铝原子和锆原子的扩散能力，提高沉积组织的致密程度，使制出的金属层2薄膜与活塞基体1具有强的附着力。与相关技术采用电弧喷涂的方式相比，采用磁控喷射方式进行镀膜的方式镀膜质量高，金属层2和活塞基体1能够紧密结合，避免金属层2脱落的情况，热震性能好。另外，磁控溅射可以精准控制金属层2的厚度和均匀性，使得在磁控溅射后金属层2可以直接进行微弧氧化处理，不需要对金属层2进行二次加工，节省了生产工序，降低了生产成本。
为使活塞基体1顶部涂层具有低热导率的特性，可选地，在陶瓷层3中均匀的掺杂适量氧化锆。在陶瓷涂层中添加氧化锆的传统方法是在微弧氧化时在电解液中添加氟锆酸钾来实现，氟锆酸钾在高温下溶解后，其浓度上升会显著增大电解液的电导率，导致反应过程的火花烧蚀现象严重，使得采用该方法制备的陶瓷层3中锆元素添加含量极其有限。同时，使用电解液添加锆元素时，会导致锆元素无法在涂层内均匀分布。
为了解决上述问题，在进行磁控溅射时，通过控制铝元素和锆元素的含量比，使金属层2在进行电化学反应中形成具有氧化锆的陶瓷层3，在解决了喷涂方法导致的涂层致密度较低问题的同时，也解决了微弧氧化后陶瓷层3中氧化锆添加量较小的问题。另外，经磁控溅射后，完成制备的金属层2为氧化铝和氧化锆的复合金属层2，该复合金属层2中锆元素均匀分布在活塞基体1的顶面上，经过微弧氧化处理后形成的氧化锆会均匀分布在整个陶瓷层3中，避免了电解液添加时锆元素无法均匀分布的问题。
可选地，对于控制铝元素和锆元素的含量比，通过分别调整铝靶和锆靶的溅射角度并控制铝靶和锆靶同时溅射而实现。磁控溅射可以通过铝靶和锆靶同时溅射，并调整溅射角度来精准控制金属层2的成分和含量，可调整性更强，从而实现对陶瓷层3中氧化锆含量的控制。采用磁控溅射预制复合金属层2的方式，以向陶瓷层3中添加微量锆元素，提高了陶瓷层3中锆元素的含量，解决通过电解液添加时添加元素在陶瓷层3中分布不均匀的现象，使陶瓷层3的整体性质更加稳定。
示例性地，采用微弧氧化方式包括以下步骤：利用夹具组件夹持活塞基体1；将脉冲电源的正极电连接于活塞基体1，脉冲电源的负极电连接于夹具组 件，并将活塞基体1顶面上的金属层2放置于电解液内，使金属层2与电解液反应并在金属层2表面微弧放电，以在金属层2的表面形成陶瓷层3。
可选地，在金属层2制备完成之后，取出活塞基体1，并将活塞基体1装配于特制的夹具组件上，然后将活塞基体1与脉冲电源正极连接，夹具组件与电源负极连接。
电解液为硅酸盐电解液，电解液的浓度为10g/L-30g/L，电解液温度小于或等于35℃，脉冲电源的电流密度为0.2A/dm 2-0.4A/dm 2，脉冲电源的频率为50Hz-500Hz、正向电流占空比为40％-50％、脉冲电源的正负电流比为0.7-1.3。可选地，配置40L硅酸盐电解液放置于反应循环槽中，硅酸钠浓度为15g/L，其中包括络合剂、稳定剂等。启动水冷循环装置保证微弧氧化过程中电解液温度小于或等于35℃，并设置微弧氧化电参数，例如：脉冲电源的电流密度为0.3A/dm 2，脉冲电源的正负电流比为1.2，脉冲电源的频率为400Hz，正占空比为40％,负占空比为40％等。
在电参数设置完成后，启动脉冲电源进行微弧氧化处理90min。在微弧氧化处理结束后，关闭脉冲电源，待活塞基体1冷却后关闭水冷循环装置，从夹具组件中取出活塞基体1，使用热空气对活塞基体1进行干燥处理。
通过脉冲电源在活塞基体1上施加电压，使活塞基体1表面的金属层2与电解质溶液相互作用，在金属层2表面形成微弧放电，在高温、电场等因素的作用下，金属层2表面形成陶瓷层3，达到表面强化的目的。通过弧光放电，熔融的陶瓷相从金属层2内部喷发而出，在接触到电解液后迅速冷却，此时放电通道和极速凝固组织都会造成孔洞的存在。
采用微弧氧化方式，以获得既保持优良的抗冷热交变能力，又具备低热容性质的陶瓷层3，使得陶瓷层3的孔隙率为15％-25％。其中陶瓷层3的热物理性能可以按照需求，通过在既定范围内改变电参数和电解液参数进行工艺调整。
在涂层制备结束后，使用激光导热仪测试涂层热导率，使用差示扫描量热仪(Differential Scanning Calorimeter，DSC)测试涂层的体积热容。在钢活塞顶部增加该涂层后，在以上参数下制备的活塞基体1顶部的热导率低于0.5W/(m·K)，热导率为0.42W/(m·K)，而传统的氧化锆陶瓷热障涂层的热导率约为2.0W/(m·K)，因此该活塞顶部的涂层可以有效减少热量损失，提高柴油机能量利用率。在提供更好的隔热效果的同时，该工艺制备的陶瓷涂层还具备低 于1000kJ/(m 3·K)的体积热容，在以上参数下制备的活塞基体1顶部热容为911KJ/(m 3·K)，从而不会使燃烧室产生温度过高现象，保证燃烧过程中有充足的氧原子数量，提高了燃烧效率。
于本文的描述中，需要理解的是，术语“上”、“下”、“右”、等方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述和简化操作，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”，仅仅用于在描述上加以区分，并没有特殊的含义。
在本说明书的描述中，参考术语“一实施例”、“示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不一定指的是相同的实施例或示例。

Claims (10)

  1. 一种活塞制作方法，包括：
    采用磁控喷射方式，在活塞基体(1)的顶面镀膜，以形成金属层(2)；其中，所述金属层(2)为氧化铝和氧化锆的复合金属层(2)；
    采用微弧氧化方式，在所述金属层(2)上进行电化学反应，以形成陶瓷层(3)；其中，所述陶瓷层(3)为孔洞状结构。
  2. 根据权利要求1所述的活塞制作方法，其中，所述磁控喷射方式包括：
    在真空室内填充惰性气体，并在所述真空室内分别设置铝靶和锆靶；
    利用夹持组件夹紧所述活塞基体(1)并控制所述活塞基体(1)的顶面背离所述铝靶和所述锆靶设置，并利用所述惰性气体的辉光放电反应产生入射离子轰击所述铝靶的表面和所述锆靶的表面；
    利用夹持组件夹紧所述活塞基体(1)并控制所述活塞基体(1)的顶面正对所述铝靶和所述锆靶设置，以使所述铝靶和所述锆靶溅射产生的铝原子和锆原子溅出并沉积至所述活塞基体(1)的顶面上，以形成薄膜结构的所述金属层(2)。
  3. 根据权利要求2所述的活塞制作方法，其中，通过控制铝元素和锆元素的含量比，使所述金属层(2)在进行电化学反应中形成具有氧化锆的所述陶瓷层(3)。
  4. 根据权利要求3所述的活塞制作方法，其中，所述控制铝元素和锆元素的含量比是通过分别调整所述铝靶和所述锆靶的溅射角度并控制所述铝靶和所述锆靶同时溅射而实现。
  5. 根据权利要求2所述的活塞制作方法，其中，所述真空室在通入所述惰性气体之前的气压小于或等于5×10 -4Pa，所述真空室在通入所述惰性气体之后的气压为0.1Pa-0.9Pa。
  6. 根据权利要求1所述的活塞制作方法，其中，所述微弧氧化方式包括：
    利用夹具组件夹持所述活塞基体(1)；
    将脉冲电源的正极电连接于所述活塞基体(1)，将所述脉冲电源的负极电连接于所述夹具组件，并将所述活塞基体(1)顶面上的所述金属层(2)放置于电解液内，使所述金属层(2)与电解液反应并在所述金属层(2)的表面微弧放电，以在所述金属层(2)的表面形成所述陶瓷层(3)。
  7. 根据权利要求6所述的活塞制作方法，其中，所述电解液为硅酸盐电解液，所述电解液的浓度为10g/L-30g/L，所述电解液的温度小于或等于35℃，所 述脉冲电源的电流密度为0.2A/dm 2-0.4A/dm 2，所述脉冲电源的频率为50Hz-500Hz，所述脉冲电源的正向电流占空比为40％-50％，所述脉冲电源的正负电流比为0.7-1.3。
  8. 根据权利要求1所述的活塞制作方法，其中，在进行所述磁控喷射之前，还包括对所述活塞基体(1)进行前处理。
  9. 根据权利要求8所述的活塞制作方法，其中，所述前处理包括：
    用砂纸打磨所述活塞基体(1)的顶面，以抛光至镜面；
    将所述活塞基体(1)放置于超声清洗机中，利用清洗剂对所述活塞基体(1)进行超声清洗；
    利用去离子水对所述活塞基体(1)进行超声清洗且清洗后用热空气将所述活塞基体(1)吹干。
  10. 一种活塞，采用如权利要求1-9任一项所述的活塞制作方法制作而成，所述活塞包括：
    活塞基体(1)；
    金属层(2)，设置于所述活塞基体(1)的顶面上；
    陶瓷层(3)，设置于所述金属层(2)的顶面上。
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