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WO2021182232A1 - Photosensitive resin composition, cured product, color filter, display device member and display device - Google Patents

Photosensitive resin composition, cured product, color filter, display device member and display device Download PDF

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Publication number
WO2021182232A1
WO2021182232A1 PCT/JP2021/008168 JP2021008168W WO2021182232A1 WO 2021182232 A1 WO2021182232 A1 WO 2021182232A1 JP 2021008168 W JP2021008168 W JP 2021008168W WO 2021182232 A1 WO2021182232 A1 WO 2021182232A1
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WO
WIPO (PCT)
Prior art keywords
group
photosensitive resin
resin composition
weight
copolymer
Prior art date
Application number
PCT/JP2021/008168
Other languages
French (fr)
Japanese (ja)
Inventor
中川 泰伸
Original Assignee
株式会社ダイセル
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2020039964A external-priority patent/JP7483416B2/en
Priority claimed from JP2020039965A external-priority patent/JP7483417B2/en
Application filed by 株式会社ダイセル filed Critical 株式会社ダイセル
Priority to CN202180013052.0A priority Critical patent/CN115380248A/en
Priority to KR1020227033937A priority patent/KR20220152541A/en
Publication of WO2021182232A1 publication Critical patent/WO2021182232A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/08Styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04Acids; Metal salts or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04Acids; Metal salts or ammonium salts thereof
    • C08F220/06Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/02Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a single or double bond to nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Definitions

  • the present disclosure relates to a photosensitive resin composition, a cured product, a color filter, a display device member, and a display device.
  • the present application claims the priority of Japanese Patent Application No. 2020-039964 and Japanese Patent Application No. 2020-039965 filed in Japan on March 9, 2020, the contents of which are incorporated herein by reference.
  • the photosensitive resin composition used in producing an insulating film As the photosensitive resin composition used in producing an insulating film, a color filter, a color filter protective film, and a microlens, a resin composition containing an alkali-soluble resin, a photopolymerizable compound, and a photopolymerization initiator, and further. Resin compositions containing colorants (pigments and dyes) are known.
  • Patent Documents 1 and 4 disclose copolymers containing methacrylic acid and glycidyl methacrylate as constituent monomers as the alkali-soluble resin.
  • Patent Documents 2 and 5 disclose copolymers containing methacrylic acid and 3,4-epoxytricyclo [5.2.1.0 2,6 ] decyl acrylate as constituent monomers as the alkali-soluble resin.
  • Patent Document 3 discloses a copolymer containing methacrylic acid and benzyl methacrylate as constituent monomers as the alkali-soluble resin.
  • the photosensitive resin compositions disclosed in Patent Documents 1 and 4 have a drawback of low stability such as thickening with time. In addition, the solvent resistance of the cured product was not sufficient. Although the photosensitive resin compositions disclosed in Patent Documents 2 and 5 are excellent in storage stability, they have poor reactivity with carboxylic acids and require a curing temperature of 230 ° C. or higher. The photosensitive resin composition disclosed in Patent Document 3 has a drawback that the solvent resistance of the cured product is low.
  • an object of the present invention is to provide a photosensitive resin composition having excellent storage stability, excellent curing reactivity, and excellent solvent resistance of the cured product.
  • Another object of the present invention is to provide a cured product of a photosensitive resin composition having the above characteristics, a color filter which is the cured product, and a display device member or display device provided with the color filter. To provide.
  • the present inventor has made a photosensitive resin composition using a copolymer containing a specific structural unit as an alkali-soluble resin and having an exothermic peak top temperature of 180 to 220 ° C. According to the report, it was found that the product has excellent storage stability, cures even at a relatively low temperature, and has excellent solvent resistance of the cured product.
  • the invention according to the present disclosure has been completed based on these findings.
  • the present disclosure includes an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
  • the alkali-soluble resin contains a structural unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof, and the following formula (1).
  • R 1 and R 2 are the same or different, respectively, and represent a hydrogen atom or an alkyl group having 1 to 7 carbon atoms.
  • X is a divalent hydrocarbon group which may contain a single bond or a hetero atom.
  • Y represents a methylene group or an ethylene group which may have an alkyl group having 1 to 3 carbon atoms as a substituent, an oxygen atom, or a sulfur atom which may be bonded to an oxygen atom.
  • N is 0.
  • It is a copolymer containing the structural unit (B) derived from the compound represented by, and the exothermic peak top temperature that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter is 180.
  • a photosensitive resin composition which is a copolymer at ⁇ 220 ° C.
  • the copolymer may further contain a structural unit (C) derived from at least one compound selected from the group consisting of the following (c1) to (c4).
  • R 11 represents a hydrogen atom or an alkyl group having 1 to 7 carbon atoms.
  • R 12 represents a hydrocarbon group which may contain a hetero atom.
  • Z represents a hetero atom.
  • the ratio of the structural unit (A) to all the structural units of the copolymer is 2 to 60% by weight, the ratio of the structural unit (B) is 40 to 98% by weight, and the ratio of the structural unit (C) is 0 to 0 to. It may be 85% by weight.
  • the photosensitive resin composition of the present disclosure may further contain a coloring material.
  • the coloring material may be a pigment and / or a dye.
  • the present disclosure also provides a cured product of the photosensitive resin composition described above.
  • the present disclosure also provides a color filter which is a cured product of the above-mentioned photosensitive resin composition.
  • the present disclosure further provides a display device member or display device including the above-mentioned color filter.
  • a photosensitive resin composition having excellent storage stability, excellent curing reactivity, and excellent solvent resistance of the cured product. Further, a cured product of a photosensitive resin composition having the above characteristics, a color filter which is the cured product, and a display device member or display device provided with the color filter are provided.
  • the photosensitive resin composition according to the present disclosure is mainly used as a forming material for an insulating film, a color filter protective film, a microlens, a coloring pattern, etc., and a transparent film, and is an alkali-soluble resin and a photopolymerizable compound. , Photopolymerization initiator, and solvent. Further, the photosensitive resin composition according to the present disclosure may be a photosensitive resin composition further containing a coloring material.
  • the alkali-soluble resin includes a structural unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof and a structural unit (B) derived from a compound represented by the formula (1).
  • a copolymer having an exothermic peak top temperature of 180 to 220 ° C. that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter is used.
  • the copolymer may further contain a structural unit (C) derived from at least one compound selected from the group consisting of (c1) to (c4).
  • the structural unit (D) described later may be included as a structural unit other than the structural units (A) to (C).
  • the structural unit (A) can be introduced into the copolymer by subjecting an unsaturated carboxylic acid or an acid anhydride thereof (a) to the copolymer.
  • the unsaturated carboxylic acid or its acid anhydride (a) is not particularly limited, but for example, ⁇ , ⁇ -unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid and crotonic acid; itaconic acid, maleic acid, fumaric acid and the like.
  • acrylic acid and methacrylic acid are particularly preferable from the viewpoint of copolymerizability and developability.
  • the unsaturated carboxylic acid or its acid anhydride (a) can be used alone or in combination of two or more.
  • the ratio (content) of the constituent unit (A) to all the constituent units of the copolymer is not particularly limited, but is preferably 2 to 60% by weight, more preferably 3 to 40% by weight, still more preferably 5 to 5 to 60% by weight, for example. 20% by weight.
  • the ratio of the structural unit (A) is within the above range, the cured product tends to be excellent in solvent resistance and developability.
  • the ratio of the constituent unit to the copolymer is based on the weight of the compound (monomer) used for the copolymerization.
  • the ratio of the constituent unit (A) to the copolymer is the ratio of the amount of the unsaturated carboxylic acid or the acid anhydride (a) used to the total amount (100% by weight) of the compounds used for the copolymerization. means.
  • the structural unit (B) can be introduced into the copolymer by subjecting the compound represented by the following formula (1) to the copolymer.
  • R 1 and R 2 represent hydrogen atoms or alkyl groups having 1 to 7 carbon atoms, which are the same or different from each other.
  • X represents a divalent hydrocarbon group that may contain a single bond or a heteroatom.
  • Y represents a methylene group or an ethylene group which may have an alkyl group having 1 to 3 carbon atoms as a substituent, an oxygen atom, or a sulfur atom which may be bonded to the oxygen atom.
  • n represents an integer from 0 to 7.
  • Examples of the alkyl group having 1 to 7 carbon atoms in R 1 and R 2 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, an s-butyl group, a pentyl group, a hexyl group, and a heptyl group. And so on.
  • n R 2s may be the same or different.
  • R 1 and R 2 are preferably a hydrogen atom, a methyl group, or an ethyl group from the viewpoint of copolymerizability and reactivity.
  • heteroatom In a divalent hydrocarbon group which may contain a heteroatom of X, the heteroatom may be bonded to the terminal of the hydrocarbon group or may be interposed between carbon atoms constituting the hydrocarbon group. .. Heteroatoms are not particularly limited, and examples thereof include nitrogen atoms, oxygen atoms, and sulfur atoms.
  • an alkylene group such as a methylene group, an ethylene group, a propylene group and a trimethylene group (preferably an alkylene group having 1 to 12 carbon atoms is preferable and the carbon number is 1).
  • An alkylene group of to 6 is more preferable, and an alkylene group having 1 to 3 carbon atoms is particularly preferable);
  • a thioalkylene group such as a thiomethylene group, a thioethylene group, or a thiopropylene group (a thioalkylene group having 1 to 12 carbon atoms is preferable, and carbon is preferable.
  • a thioalkylene group having a number of 1 to 6 is more preferable); an aminoalkylene group such as an aminomethylene group, an aminoethylene group and an aminopropylene group (preferably an aminoalkylene group having 1 to 12 carbon atoms and an aminoalkylene group having 1 to 6 carbon atoms). Groups are more preferred) and the like. Among these, from the viewpoint of storage stability, an alkylene group having 1 to 3 carbon atoms is preferable, and a methylene group is more preferable.
  • the methylene group or ethylene group which may have an alkyl group having 1 to 3 carbon atoms as the substituent of Y is not particularly limited, but a methylene group or an ethylene group is preferable, and a methylene group is more preferable.
  • Examples of the sulfur atom that may be bonded to the oxygen atom of Y include a sulfur atom and a sulfonyl group.
  • Examples of the compound represented by the formula (1) include a compound represented by the following formula (1a).
  • R 1 , R 2 , X, Y, and n in the formula (1a) are the same as those described in the formula (1).
  • the ratio (content) of the constituent unit (B) to all the constituent units of the copolymer is not particularly limited, but is preferably 40 to 98% by weight, more preferably 60 to 95% by weight, still more preferably 75. ⁇ 90% by weight.
  • the ratio of the structural unit (B) is within the above range, the cured product tends to be excellent in solvent resistance and developability.
  • the structural unit (C) is styrene (c1) which may be substituted with an alkyl group, N-substituted maleimide (c2), an N-vinyl compound (c3), and an unsaturated carboxylic acid represented by the above formula (2). It is a structural unit derived from at least one compound selected from the group consisting of an acid derivative (c4).
  • the structural unit (C) has a function of imparting hardness to a cured product (cured film), a function of facilitating a copolymerization reaction, a function of increasing solubility in a solvent, a function of enhancing adhesion to a substrate, and the like. ..
  • the structural unit (C) can be introduced into the copolymer by subjecting at least one compound selected from the group consisting of the above (c1) to (c4) to the copolymer.
  • the alkyl group in styrene (c1) which may be substituted with an alkyl group is not particularly limited, but for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a hexyl group and the like.
  • Alkyl groups having 1 to 7 carbon atoms can be mentioned. Among these, an alkyl group having 1 to 4 carbon atoms such as a methyl group or an ethyl group is preferable, and a methyl group is more preferable.
  • the alkyl group may be bonded to either a vinyl group of styrene or a benzene ring.
  • styrene (c1) which may be substituted with an alkyl group
  • styrene (c1) which may be substituted with an alkyl group
  • Styrene (c1) which may be substituted with an alkyl group, can be used alone or in combination of two or more.
  • N-substituted maleimide (c2) examples include a compound represented by the following formula (3).
  • R 21 represents an organic group.
  • Examples of the organic group include a hydrocarbon group and a heterocyclic group.
  • Examples of the hydrocarbon group include an alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group and a hexyl group (for example, a C 1-6 alkyl group); a cyclopentyl group, a cyclohexyl group and a cyclooctyl group.
  • Examples thereof include a cycloalkyl group such as an adamantyl group and a norbornyl group; an aryl group such as a phenyl group; an aralkyl group such as a benzyl group; and a group in which two or more of these are bonded.
  • Examples of the heterocyclic group include a 5- to 10-membered heterocycloalkyl group and a heteroaryl group containing at least one heteroatom selected from the group consisting of a nitrogen atom, an oxygen atom, and a sulfur atom. ..
  • the N-substituted maleimide (c2) is not particularly limited, and is, for example, N-alkylmaleimide such as N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide; N-cyclopentylmaleimide, N-cyclohexylmaleimide, N-cyclo. Examples thereof include N-cycloalkylmaleimide such as octylmaleimide, N-adamantylmaleimide and N-norbornylmaleimide; N-arylmaleimide such as N-phenylmaleimide; and N-aralkylmaleimide such as N-benzylmaleimide.
  • the N-substituted maleimide (c2) can be used alone or in combination of two or more.
  • the N-vinyl compound (c3) is not particularly limited, but for example, N-vinylformamide, N-vinylacetamide, N-vinylisopropylamide, N-vinyl-N-methylacetamide, N-vinylpyrrolidone, N-vinylcarbazole. , N-vinylpiperidone, N-vinylcaprolactam and the like.
  • the N-vinyl compound (c3) can be used alone or in combination of two or more.
  • the unsaturated carboxylic acid derivative (c4) can be represented by the following formula (2).
  • R 11 represents a hydrogen atom or an alkyl group having 1 to 7 carbon atoms.
  • R 12 represents a hydrocarbon group that may contain a heteroatom.
  • Z represents a heteroatom.
  • Examples of the alkyl group having 1 to 7 carbon atoms in R 11 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a hexyl group and the like.
  • R 11 a hydrogen atom or a methyl group is particularly preferable.
  • Examples of the hydrocarbon group which may contain a hetero atom in R 12 include an alkyl group, a heteroalkyl group, an alkenyl group, a cycloalkyl group, a heterocycloalkyl group, an aryl group, and a group in which two or more of these are linked. Can be mentioned.
  • Examples of the hetero atom include a nitrogen atom, an oxygen atom, and a sulfur atom.
  • alkyl group examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, an s-butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, an isodecyl group, a lauryl group and a stearyl group.
  • alkyl groups having 1 to 23 carbon atoms such as groups.
  • heteroalkyl group for example,-(R 13- O) m-R 14 groups (in the formula, R 13 represents an alkylene group having 1 to 12 carbon atoms.
  • R 14 is a hydrogen atom or 1 to 12 carbon atoms.
  • M indicates an integer of 1 or more
  • -R 15- NR 16 R 17 groups in the formula, R 15 indicates an alkylene group having 1 to 12 carbon atoms.
  • R 16 and R 17 are. , The same or different, respectively, indicating a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • alkenyl group examples include alkenyl groups having 2 to 23 carbon atoms such as an allyl group, a 3-butenyl group, and a 5-hexenyl group.
  • cycloalkyl group examples include cycloalkyl groups having 3 to 12 carbon atoms such as a cyclopentyl group, a cyclohexyl group, a cyclooctyl group, an adamantyl group, and a norbornyl group.
  • heterocycloalkyl group examples include groups containing a cyclic ether structure such as an oxetane ring, an oxoran ring, an oxane ring, and an oxepane ring (for example, a cyclic ether-containing group having a 3-membered ring or more).
  • aryl group examples include an aryl group having 6 to 12 carbon atoms such as a phenyl group and a naphthyl group.
  • the unsaturated carboxylic acid derivative (c4) represented by the formula (2) is not particularly limited, and is, for example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, and butyl.
  • (Meta) acrylate having an alkyl group such as (meth) acrylate, isodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate; N, N-dimethylaminoethyl (meth) acrylate, N, N-diethylamino (Meta) acrylate having an alkylamino group such as ethyl (meth) acrylate, N, N-diisopropylaminoethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy Hydroxyl-containing (meth) acrylates such as butyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, ethoxydiethylene glycol (meth) acrylate, isooctyl
  • (Meta) acrylate having a heteroalkyl group such as polyalkylene glycol (meth) acrylate such as (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxypolyethylene glycol (meth) acrylate; alkenyl such as allyl (meth) acrylate having a group (meth) acrylate; cyclohexyl (meth) acrylate, 1-adamantyl (meth) acrylate, isobornyl (meth) acrylate, tricyclo [5,2,1,0 2,6] decan-8-ol (meth) acrylate (Meta) acrylate having a monocyclic or polycyclic cycloalkyl group such as; glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 2-ethylglycidyl (meth) acrylate, 2-glycidyloxyethyl (meth)
  • (Meta) acrylate having a heterocycloalkyl group such as (meth) acrylate (for example, a cyclic ether-containing group having three or more membered rings); (meth) having an aryl group such as phenyl (meth) acrylate and benzyl (meth) acrylate.
  • Aacrylate 3- (meth) acryloxypropylmethyldimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropylmethyldiethoxysilane, 3- (meth) acryloxipropyltriethoxysilane , 8- (Meta) Acryloxyoctyl Dimethoxysilane and other alkoxysilyl group-containing (meth) acrylates.
  • the unsaturated carboxylic acid derivative (c4) represented by the formula (2) can be used alone or in combination of two or more.
  • the ratio (content) of the constituent unit (C) to all the constituent units of the copolymer is not particularly limited, but is preferably 0 to 85% by weight, more preferably 1 to 60% by weight, still more preferably 2. ⁇ 40% by weight.
  • the ratio of the structural unit (C) is within the above range, the solvent resistance of the cured product tends to be excellent.
  • the copolymer in the present disclosure may contain a structural unit (D) other than the structural units (A) to (C).
  • Examples of the structural unit (D) include a structural unit derived from (meth) acrylamide and (meth) acrylonitrile.
  • the total amount of the constituent unit (A) and the constituent unit (B) is the total amount. It is preferably 90% by weight or more, more preferably 95% by weight or more, still more preferably 99% by weight or more, and may be substantially 100% by weight with respect to the constituent unit.
  • the copolymer in the present disclosure contains a structural unit (A), a structural unit (B), and a structural unit (C)
  • the total amount of the structural units (A) to (C) is relative to all the structural units. It is preferably 90% by weight or more, more preferably 95% by weight or more, still more preferably 99% by weight or more, and may be substantially 100% by weight.
  • the weight average molecular weight (Mw) of the copolymer is not particularly limited, but is preferably 1000 to 10000, more preferably 3000 to 300,000, and further preferably 5000 to 100,000.
  • the molecular weight distribution of the copolymer (ratio of weight average molecular weight to number average molecular weight: Mw / Mn) is not particularly limited, but is preferably 5.0 or less, more preferably 1.0 to 4.5, for example. , More preferably 1.0 to 4.0.
  • the weight average molecular weight (Mw) and the number average molecular weight (Mn) can be measured by, for example, using polystyrene as a standard substance by GPC, but were measured by the method used in the examples. It is preferable that it is one.
  • the polymer in the present disclosure has a heat generation peak top temperature of 180 to 220 ° C. that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter.
  • the exothermic peak top temperature is preferably measured by, for example, the method used in the examples described later.
  • the copolymer in the present disclosure functions as a binder resin for the photosensitive resin composition according to the present disclosure.
  • the copolymer in the present disclosure includes an unsaturated carboxylic acid or an anhydride thereof (a), and a compound (b) having a polycyclic aliphatic group having an epoxy group on the ring and a group having an unsaturated bond. If necessary, it can be produced by subjecting at least one compound selected from the group consisting of (c1) to (c4) to the copolymer and the compound corresponding to the structural unit (D). ..
  • compounds that can be introduced into a copolymer such as unsaturated carboxylic acid or its anhydride (a) may be collectively referred to as "monomer".
  • the copolymer may be subjected to copolymerization in the presence of a polymerization initiator.
  • a polymerization initiator a conventional or known radical polymerization initiator can be used, and for example, 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvaleronitrile), 2 , 2'-azobis (4-methoxy-2,4-dimethylvaleronitrile), dimethyl-2,2'-azobis (2-methylpropionate), diethyl-2,2'-azobis (2-methylpropio) Nate), azo compounds such as dibutyl-2,2'-azobis (2-methylpropionate), benzoyl peroxide, lauroyl peroxide, t-butyl peroxypivalate, 1,1-bis (t-butyl peroxy) cyclohexane and the like.
  • a peroxide is used as a radical polymerization initiator
  • a reducing agent may be combined to form a redox-type initiator.
  • azo compounds are preferable, and 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvaleronitrile), and dimethyl-2,2'-azobis (2-methylpropionate) are preferable. ) Is more preferable.
  • the amount of the polymerization initiator used can be appropriately selected as long as it does not impair smooth copolymerization, and is not particularly limited. For example, 1 to 20 parts by weight is preferable with respect to the total amount of the monomers (100 parts by weight). It is preferably 3 to 15 parts by weight.
  • the copolymerization can be carried out by a conventional method used for producing an acrylic polymer or a styrene polymer, such as solution polymerization, bulk polymerization, suspension polymerization, bulk-suspension polymerization, and emulsion polymerization.
  • the monomer and the polymerization initiator may be collectively supplied to the reaction system, or a part or all of them may be added dropwise to the reaction system.
  • a method of dropping a solution of a polymerization initiator dissolved in a polymerization solvent into a mixture of a monomer or a monomer kept at a constant temperature and a polymerization solvent to carry out the polymerization or a method of preliminarily starting a monomer and polymerization.
  • a method (drop polymerization method) or the like in which a solution obtained by dissolving an agent in a polymerization solvent is dropped into a polymerization solvent maintained at a constant temperature and polymerized can be adopted.
  • the copolymer in the present disclosure is preferably copolymerized in a polymerization solvent.
  • the polymerization solvent can be appropriately selected depending on the monomer composition and the like, and for example, ether (diethyl ether; ethylene glycol mono or dialkyl ether, diethylene glycol mono or dialkyl ether, propylene glycol mono or dialkyl ether, propylene glycol mono or diaryl ether, diaryl ether, di.
  • Glycol acetates or glycol ether acetates, etc. ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, 3,5,5-trimethyl-2-cyclohexe N-1-one, etc.), Amid (N, N-dimethylacetamide, N, N-dimethylformamide, etc.), Sulfoxide (dimethylsulfoxide, etc.), Alcohol (methanol, ethanol, propanol, C 5-6 cycloalkanediol, C 5-6 cycloalkanedimethanol, etc.), hydrocarbons (aromatic hydrocarbons such as benzene, toluene, xylene, aliphatic hydrocarbons such as hexane, alicyclic hydrocarbons such as cyclohexane, etc.), mixed solvents, etc. Can be mentioned.
  • the polymerization temperature can be appropriately selected depending on the type and composition of the monomer and is not particularly limited, but is preferably 30 to 150 ° C., for example.
  • the reaction solution containing the copolymer obtained by the above method can be purified by subjecting it to precipitation or reprecipitation, if necessary.
  • the solvent used for precipitation or reprecipitation may be either an organic solvent or water, or a mixed solvent thereof.
  • the organic solvent include hydrocarbons (aliphatic hydrocarbons such as pentane, hexane, heptane, and octane; alicyclic hydrocarbons such as cyclohexane and methylcyclohexane; aromatic hydrocarbons such as benzene, toluene, and xylene) and halogenation.
  • Hydrocarbons halogenated aliphatic hydrocarbons such as methylene chloride, chloroform and carbon tetrachloride; halogenated aromatic hydrocarbons such as chlorobenzene and dichlorobenzene), nitro compounds (nitromethane, nitroethane, etc.), nitriles (acetriform, benzonitrile, etc.) Etc.), ether (chain ether such as diethyl ether, diisopropyl ether, dimethoxyethane; cyclic ether such as tetrahydrofuran, dioxane), ketone (acetone, methyl ethyl ketone, diisobutyl ketone, etc.), ester (ethyl acetate, butyl acetate, etc.), carbonate Examples thereof include (dimethyl carbonate, diethyl carbonate, ethylene carbonate, propylene carbonate, etc.), alcohols (methanol, ethanol, propanol, iso
  • the coloring material may be any as long as it has coloring properties, and the color and material can be appropriately selected according to the use of the color filter and the like. Specifically, any of pigments, dyes and natural dyes can be used as the coloring material, but since high color purity, brightness, contrast and the like are required for color filter applications, pigments and / or dyes Is preferable.
  • the pigment may be either an organic pigment or an inorganic pigment, and examples of the organic pigment include compounds classified as pigments in the Color Index (CI; The Society of Dyers and Colorists). .. Specifically, those having the following color index (CI) names can be mentioned.
  • CI Color Index
  • Pigment Yellow 117 C.I. I. Pigment Yellow 125, C.I. I. Pigment Yellow 137, C.I. I. Pigment Yellow 138, C.I. I. Pigment Yellow 139, C.I. I. Pigment Yellow 147, C.I. I. Pigment Yellow 148, C.I. I. Pigment Yellow 150, C.I. I. Pigment Yellow 153, C.I. I. Pigment Yellow 154, C.I. I. Pigment Yellow 155, C.I. I. Pigment Yellow 166, C.I. I. Pigment Yellow 168, C.I. I. Pigment Yellow 180, C.I. I. Pigment Yellow 194, C.I. I. Pigment Yellow 211, C.I. I. Pigment Yellow 214 and other yellow pigments.
  • Pigment Orange 64 C.I. I. Pigment Orange 65, C.I. I. Pigment Orange 68, C.I. I. Pigment Orange 70, C.I. I. Pigment Orange 71, C.I. I. Pigment Orange 72, C.I. I. Pigment Orange 73, C.I. I. An orange pigment such as Pigment Orange 74.
  • Pigment Red 216 C.I. I. Pigment Red 220, C.I. I. Pigment Red 221 and C.I. I. Pigment Red 224, C.I. I. Pigment Red 242, C.I. I. Pigment Red 243, C.I. I. Pigment Red 254, C.I. I. Pigment Red 255, C.I. I. Pigment Red 262, C.I. I. Pigment Red 264, C.I. I. Pigment Red 265, C.I. I. Red pigments such as Pigment Red 272.
  • examples of the inorganic pigment include titanium oxide, barium sulfate, calcium carbonate, zinc flower, lead sulfate, yellow lead, zinc yellow, red iron oxide (III), cadmium red, ultramarine blue, dark blue, and chromium oxide.
  • examples thereof include green, cobalt green, amber, titanium black, synthetic iron black, and carbon black.
  • the pigment can also be purified and used by a recrystallization method, a reprecipitation method, a solvent cleaning method, a sublimation method, a vacuum heating method, or a combination thereof. Further, the pigment may be used by modifying the surface of the particles with a resin.
  • the dye can be appropriately selected from various oil-soluble dyes, direct dyes, acid dyes, metal complex dyes and the like, and for example, the following color index (CI) names are given. You can list what has been done.
  • CI color index
  • the coloring material can be used alone or in combination of two or more.
  • the content of the coloring material with respect to the solid content of the photosensitive resin composition is not particularly limited, but is preferably 3 to 50% by weight, more preferably 5 to 30% by weight, for example.
  • the "solid content” is, for example, a component other than the above-mentioned solvent.
  • a pigment when used as a coloring material in the present disclosure, it can be used together with a pigment dispersant and a pigment dispersion aid, if desired.
  • the pigment dispersant include cationic, anionic, nonionic, and amphoteric dispersants (surfactants); polymer dispersants such as acrylic copolymers, polyesters, polyurethanes, polyethyleneimine, and polyallylamines. Can be mentioned.
  • pigment dispersants can be used.
  • an acrylic copolymer Disperbyk-2000, Disperbyk-2001, BYK-LPN6919, BYK-LPN21116 (all manufactured by Big Chemie (BYK)), as polyester.
  • Ajisper PB821, Ajisper PB822, Ajisper PB880 (manufactured by Ajinomoto Fine-Techno Co., Ltd.), as polyurethane, Disperbyk-161, Disperbyk-162, Disperbyk-165, Disperbyk-167, Disperbyk-170, Disperbyk-170, Disperbyk-170 ), Solsperse 76500 (manufactured by Lubrizol Co., Ltd.), and as polyethyleneimine, Solsperse 24000 (manufactured by Lubrizol Co., Ltd.) and the like can be mentioned.
  • pigment dispersants can be used alone or in combination of two or more.
  • the content of the pigment dispersant is usually 100 parts by weight or less, preferably 1 to 70 parts by weight, more preferably 10 to 70 parts by weight, still more preferably 30 to 60 parts by weight, based on 100 parts by weight of the pigment. ..
  • the content of the pigment dispersant is in the above range, a pigment dispersion liquid in a uniformly dispersed state tends to be obtained, which is preferable.
  • pigment dispersion aid examples include pigment derivatives, and specific examples thereof include sulfonic acid derivatives of copper phthalocyanine, diketopyrrolopyrrole, and quinophthalone.
  • the content of the pigment dispersion aid can be appropriately determined within a range that does not impair the object of the invention according to the present disclosure.
  • the photopolymerizable compound is not particularly limited, and examples thereof include a polyfunctional vinyl compound, a polyfunctional thiol compound, and a polyfunctional epoxy compound.
  • the polyfunctional vinyl compound is not particularly limited as long as it is a compound having two or more vinyl groups, but for example, a di (meth) acrylate of an alkylene glycol such as ethylene glycol or propylene glycol; a polyalkylene such as polyethylene glycol or polypropylene glycol.
  • Poly (meth) acrylates of trihydric or higher polyhydric alcohols such as triol, trimethylol alkane, tetramethylol alkane, pentaerythritol, dipentaerythritol; poly (meth) of polyalkylene glycol adducts of trihydric or higher polyhydric alcohols.
  • Acrylate Poly (meth) acrylate of cyclic polyols such as 1,4-cyclohexanediol and 1,4-benzenediol; polyester (meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, silicone resin (meth) Examples thereof include oligo (meth) acrylates such as acrylates.
  • polyfunctional (meth) acrylates having two or more (meth) acryloyl groups are preferable.
  • the polyfunctional vinyl compound can be used alone or in combination of two or more.
  • the polyfunctional thiol compound is not particularly limited as long as it is a compound having two or more thiol groups, and for example, hexanedithiol, decandithiol, 1,4-butanediol bisthiopropionate, and 1,4-butanediol bis.
  • the polyfunctional epoxy compound is not particularly limited as long as it is a compound having two or more epoxy groups, and for example, a glycidyl ether type epoxy compound [polyhydroxy compounds (bisphenols, polyhydric phenols, alicyclic polyhydric alcohols) , Aliper polyhydric alcohols, etc.) and glycidyl ethers produced by the reaction with epichlorohydrin (for example, (poly) C 2-4 alkylene glycols such as ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, etc.
  • a glycidyl ether type epoxy compound [polyhydroxy compounds (bisphenols, polyhydric phenols, alicyclic polyhydric alcohols) , Aliper polyhydric alcohols, etc.) and glycidyl ethers produced by the reaction with epichlorohydrin (for example, (poly) C 2-4 alkylene glycols such as
  • Diglycidyl ether Diglycidyl ether; Diglycidyl ether of polyvalent phenols such as resorcin and hydroquinone; Diglycidyl ether of alicyclic polyvalent alcohols such as cyclohexanediol, cyclohexanedimethanol, hydrogenated bisphenols; bisphenols (4,4') -Bis (hydroxyphenyl) alkanes such as dihydroxybiphenyl and bisphenol A) or diglycidyl ether of C 2-3 alkylene oxide adduct thereof), novolac type epoxy resin (phenol novolac type or cresol novolac type epoxy resin, etc.) Etc.], glycidyl ester type epoxy compound, alicyclic epoxy compound (or cyclic aliphatic epoxy resin), heterocyclic epoxy resin (triglycidyl isocyanurate (TGIC), hydrantin type epoxy resin, etc.), glycidylamine type epoxy compound [ Reaction products of amine
  • Tetraglycidyl xylylene diamine TGMXA, etc.
  • TGMXA Tetraglycidyl xylylene diamine
  • N-glycidyl alicyclic amine tetraglycidyl bisaminocyclohexane, etc.
  • the polyfunctional epoxy compound can be used alone or in combination of two or more.
  • the photopolymerizable compound can be used alone or in combination of two or more.
  • the content of the photopolymerizable compound is usually 10 to 300 parts by weight, preferably 30 to 200 parts by weight, and more preferably 40 to 150 parts by weight with respect to 100 parts by weight of the alkali-soluble resin.
  • the content of the photopolymerizable compound is usually 10 to 1000 parts by weight, preferably 50 to 600 parts by weight, based on 100 parts by weight of the coloring material. It is preferably 100 to 500 parts by weight.
  • the content of the photopolymerizable compound is in the above range, curing sufficiently occurs and good adhesion can be obtained.
  • the photopolymerization initiator is not particularly limited, and examples thereof include a photoradical polymerization initiator and a photocationic polymerization initiator.
  • the photoradical polymerization initiator is a compound that generates radicals by irradiation with light to initiate a curing reaction (radical polymerization) of the photopolymerizable compound contained in the photosensitive resin composition.
  • the photoradical polymerization initiator can be used alone or in combination of two or more.
  • photoradical polymerization initiator examples include thioxanthone compounds, acetophenone compounds, biimidazole compounds, triazine compounds, oxime compounds, onium salt compounds, benzoin compounds, benzophenone compounds, ⁇ -diketone compounds, and the like.
  • examples thereof include polynuclear quinone compounds, diazo compounds, imide sulfonate compounds, anthracene compounds and the like.
  • thioxanthone-based compound examples include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, and 2,4-diisopropyl.
  • examples thereof include thioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone and the like.
  • acetophenone-based compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylketal, and 2-hydroxy-1- [4- (2-hydroxyethoxy) phenyl.
  • biimidazole compound examples include 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole and 2,2'-bis (2,3-dichlorophenyl)-.
  • triazine-based compound examples include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6- (4).
  • -Methoxynaphthyl) -1,3,5-triazine 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine
  • 2, 4-bis (trichloromethyl) -6- [2- (fran-2-yl) ethenyl] -1,3,5-triazine 2,4-bis (trichloromethyl) -6- [2- (4-dieth
  • Examples of the oxime compound include O-ethoxycarbonyl- ⁇ -oxyimino-1-phenylpropan-1-one.
  • benzoin-based compound examples include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.
  • benzophenone compound examples include benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfate, 3,3', 4,4 ⁇ -tetra (tert-). Butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone and the like.
  • anthracene-based compound examples include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl-9,10-diethoxyanthracene. ..
  • the photocationic polymerization initiator is a compound that generates an acid by irradiation with light to initiate a curing reaction (cationic polymerization) of the photopolymerizable compound contained in the photosensitive resin composition, and is a cation portion that absorbs light. It consists of an anion part that is a source of acid.
  • the photocationic polymerization initiator can be used alone or in combination of two or more.
  • photocationic polymerization initiator examples include diazonium salt compounds, iodonium salt compounds, sulfonium salt compounds, phosphonium salt compounds, selenium salt compounds, oxonium salt compounds, ammonium salt compounds, bromine salt compounds and the like. Can be mentioned.
  • Examples of the anion portion of the photocationic polymerization initiator include [(Y) s B (Phf) 4-s ] - (in the formula, Y represents a phenyl group or a biphenylyl group. Phf has at least one hydrogen atom.
  • perfluoroalkyl group perfluoroalkoxy group, and .s illustrating a phenyl group substituted with at least one selected from halogen atom is an integer of 0 ⁇ 3), BF 4 - , [(Rf) k PF 6-k] - (Rf: alkyl group in which at least 80% are substituted with fluorine atoms of the hydrogen atom, k: 0 ⁇ 5 an integer), AsF 6 -, SbF 6 - and the like, etc. -, SbF 5 OH can.
  • photocationic polymerization initiator examples include (4-hydroxyphenyl) methylbenzyl sulfonium tetrakis (pentafluorophenyl) borate, 4- (4-biphenylylthio) phenyl-4-biphenylylphenyl sulfonium tetrakis (pentafluorophenyl).
  • photocationic polymerization initiator examples include trade names “Cyracure UVI-6970”, “Cyracure UVI-6974”, “Cyracure UVI-6990”, “Cyracure UVI-950” (manufactured by Union Carbide, USA), and "Irrage250".
  • the content of the photopolymerization initiator (the total amount when two or more kinds are contained) is, for example, 0.1 to 100 with respect to 100 parts by weight of the photopolymerizable compound (total amount) contained in the photosensitive resin composition. It is by weight, preferably 0.5 to 50 parts by weight, more preferably 3 to 20 parts by weight.
  • the content of the photopolymerization initiator is less than the above range, the curability tends to decrease.
  • the content of the photopolymerization initiator exceeds the above range, the cured product tends to be easily colored.
  • solvent examples include ether (diethyl ether; ethylene glycol mono or dialkyl ether, diethylene glycol mono or dialkyl ether, propylene glycol mono or dialkyl ether, propylene glycol mono or diaryl ether, dipropylene glycol mono or dialkyl ether, tripropylene glycol mono.
  • glycol ethers such as dialkyl ether, 1,3-propanediol mono or dialkyl ether, 1,3-butanediol mono or dialkyl ether, 1,4-butanediol mono or dialkyl ether, glycerin mono, di or trialkyl ether.
  • chain ethers Such as chain ethers; cyclic ethers such as tetrahydrofuran and dioxane), esters (methyl acetate, ethyl acetate, butyl acetate, isoamyl acetate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, C 5- Carous acid esters such as 6 cycloalkanediol mono or diacetate, C 5-6 cycloalkane dimethanol mono or diacetate; ethylene glycol monoalkyl ether acetate, ethylene glycol mono or diacetate, diethylene glycol monoalkyl ether acetate, diethylene glycol mono Or diacetate, propylene glycol monoalkyl ether acetate, propylene glycol mono or diacetate, dipropylene glycol monoalkyl ether acetate, dipropylene glycol mono or diacetate, 1,3-propanediol mono
  • the photosensitive resin composition according to the present disclosure includes, for example, resins such as novolak resin, phenol resin, imide resin, and carboxy group-containing resin, curing agents, curing accelerators, and additives (fillers, erasing agents).
  • resins such as novolak resin, phenol resin, imide resin, and carboxy group-containing resin
  • curing agents curing accelerators
  • additives fillers, erasing agents.
  • the concentration of the alkali-soluble resin in the photosensitive resin composition according to the present disclosure is not particularly limited, but is, for example, 2 to 60% by weight, preferably 5 to 30% by weight.
  • Examples of the method for preparing the photosensitive resin composition of the present disclosure include a method of dissolving an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and if necessary, other additives in a solvent.
  • the photosensitive resin composition of the present disclosure contains a coloring material
  • a coloring material for example, a pigment dispersant is coexisted in a solvent as necessary, and the coloring material such as a pigment is dispersed to color the color.
  • a material dispersion is prepared, and separately, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and if necessary, other additives are dissolved in a solvent, which is mixed with the above-mentioned color material dispersion, and if necessary. Further, a method of adding a solvent and the like can be mentioned.
  • the photosensitive resin composition of the present disclosure is usually sealed in a container and used for distribution and storage.
  • the photosensitive resin composition of the present disclosure is excellent in storage stability during distribution and storage.
  • a cured product having excellent various physical properties By curing the photosensitive resin composition of the present disclosure, a cured product having excellent various physical properties can be obtained.
  • the photosensitive resin composition is applied to various substrates or substrates by a conventional coating means such as a spin coater, a dip coater, a roller coater, and a slit coater to form a coating film, and then the coating film is applied.
  • a cured product can be obtained by curing. Curing is performed, for example, by subjecting the photosensitive resin composition to light irradiation and / or heat treatment.
  • the light irradiation for example, a mercury lamp, a xenon lamp, a carbon arc lamp, a metal halide lamp, sunlight, an electron beam source, a laser light source, an LED light source, or the like is used, and the integrated irradiation amount is, for example, 500 to 5000 mJ / cm 2. It is preferable to irradiate in the range that becomes.
  • the heat treatment is preferably performed at a temperature of, for example, 60 to 300 ° C. (preferably 100 to 250 ° C.) for, for example, 1 to 120 minutes (preferably 1 to 60 minutes).
  • the base material or substrate examples include silicon wafers, metals, plastics, glass, and ceramics.
  • the thickness of the coating film after curing is, for example, preferably 0.05 to 20 ⁇ m, more preferably 0.1 to 10 ⁇ m.
  • the cured product (coating film after curing) of the present disclosure has excellent solvent resistance and high insulating properties, a protective film (color filter protective film, etc.), an insulating film, a material for forming a microlens, etc. It is useful as.
  • the color filter according to the present disclosure is a cured product of the photosensitive resin composition of the present disclosure.
  • the color filter according to the present disclosure may include a coloring pattern formed from the photosensitive resin composition.
  • the color filter can be manufactured, for example, through a step of forming a coloring pattern on a substrate using the photosensitive resin composition and a step of post-baking the coloring pattern.
  • the photosensitive resin composition of the present disclosure is applied to a substrate or another resin layer by a conventional coating means such as a spin coater.
  • a conventional coating means such as a spin coater.
  • examples thereof include a method of coating on a surface, removing volatile components such as a solvent to form a colored layer, and exposing the colored layer through a photomask to develop the colored layer.
  • the substrate examples include a glass substrate, a silicone substrate, a polycarbonate substrate, a polyester substrate, an aromatic polyamide substrate, a polyamide-imide substrate, a polyimide substrate, an Al substrate, a GaAs substrate, and the like having a flat surface.
  • These substrates may be subjected to pretreatment such as chemical treatment with a chemical such as a silane coupling agent, plasma treatment, ion plating treatment, sputtering treatment, gas phase reaction treatment, vacuum deposition treatment and the like.
  • the thickness of the colored layer after drying is, for example, 0.6 to 8 ⁇ m, preferably 1 to 5 ⁇ m.
  • Examples of the light source of radiation used for exposure include lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, and low-pressure mercury lamps, argon ion lasers, and YAG lasers.
  • lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, and low-pressure mercury lamps, argon ion lasers, and YAG lasers.
  • Examples thereof include a laser light source such as an XeCl excimer laser and a nitrogen laser.
  • the wavelength of radiation is preferably in the range of 190-450 nm.
  • the exposure amount of radiation is generally preferably 10 to 10,000 J / m 2.
  • alkaline developer used for development examples include sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo- [5.4.0] -7-undecene, and 1 , 5-Diazabicyclo- [4.3.0] -5-Nonene and other aqueous solutions are preferable.
  • Post-baking conditions are usually about 10 to 60 minutes at 120 to 280 ° C.
  • the film thickness of the pixels formed in this way is usually 0.5 to 5 ⁇ m, preferably 1 to 3 ⁇ m.
  • the photosensitive resin composition of the present disclosure it is possible to obtain a coloring pattern having excellent curing reactivity and sufficient solvent resistance.
  • the display device member or display device of the present disclosure includes the above-mentioned color filter.
  • Examples of the display device member include a color liquid crystal display element.
  • a color liquid crystal display device can be mentioned.
  • the structure of the color liquid crystal display element or the color liquid crystal display is not particularly limited, and an appropriate structure can be adopted.
  • the weight average molecular weight (in terms of polystyrene) and the degree of dispersion (weight average molecular weight Mw / number average molecular weight Mn) of the copolymer were measured under the following conditions.
  • Degasser DGU-20A3 (Shimadzu Corporation)
  • the exothermic peak top temperature was measured by the following method. That is, 5 g of the copolymer-containing solution obtained in Production Examples 1 to 8 was added dropwise to 50 g of heptane with stirring. The resulting precipitate was filtered off and dried under reduced pressure to give a copolymer as a white powder. Using about 10 mg of the white powder as a sample and using a differential scanning calorimeter (DSC1 manufactured by METTLER TOLEDO), the temperature is raised from 40 ° C to 300 ° C at a rate of 5 ° C / min under a nitrogen gas atmosphere to generate heat. The peak top temperature was measured.
  • DSC1 differential scanning calorimeter
  • Table 1 shows the copolymer composition, the weight average molecular weight of the copolymer, the degree of dispersion, and the exothermic peak top temperature in Production Examples 1 to 8.
  • Example 1-1 The copolymer obtained in Production Example 1 as an alkali-soluble resin was 8.09 g as a copolymer-containing solution, 2.25 g as a photopolymerizable compound, and 0.20 g as a photopolymerization initiator. , MMPGAC (6.83 g) as a polymer was weighed into a container and stirred for 30 minutes to prepare a photosensitive resin composition 1-1.
  • Example 1-2 The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 2 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-2 was carried out. Was prepared.
  • Example 1-3 The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 3 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-3 was performed. Was prepared.
  • Example 1-4 The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 4 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-4 was prepared.
  • Example 1-5 The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 5 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-5 was carried out. Was prepared.
  • Example 1-1 The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 6 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-6 was carried out. Was prepared.
  • Example 1-2 The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 7 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-7 was carried out. Was prepared.
  • Example 1-3 The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 8 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-8 was carried out. Was prepared.
  • Table 2 shows the compositions of the photosensitive resin compositions of the above Examples and Comparative Examples.
  • Example 2-1 C.I. I. 7.7 g of Pigment Red 254, 3.1 g of DISPERBYK-2000 as a dispersant, and 36.0 g of MMPGAC as a solvent were weighed into a container, and 45 g of zirconia beads having a diameter of 1.0 mm were added and covered. This was shaken with a paint shaker for 3 hours, and after 3 hours, the pigment dispersion and the zirconia beads were separated, 45 g of 0.5 mm zirconia beads were added, and the mixture was shaken with a paint shaker for another 3 hours.
  • the pigment dispersion liquid and the zirconia beads were separated, 45 g of 0.3 mm zirconia beads were added, and the mixture was further shaken with a paint shaker for 3 hours, and then the zirconia beads were separated to obtain a pigment dispersion liquid.
  • a photosensitive resin composition 2-1 was prepared by weighing 0.20 g of 1-hydroxycyclohexylphenyl ketone as a polymerization initiator and 15.2 g of MMPGAC as a solvent in a container and stirring for 30 minutes.
  • Example 2-2 The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 2 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -2 was prepared.
  • Example 2-3 The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 3 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -3 was prepared.
  • Example 2-4 The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 4 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -4 was prepared.
  • Example 2-5 The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 5 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -5 was prepared.
  • Example 2-1 The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 6 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -6 was prepared.
  • Example 2-2 The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 7 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -7 was prepared.
  • Example 2-3 The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 8 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -8 was prepared.
  • Table 4 shows the compositions of the photosensitive resin compositions of the above Examples and Comparative Examples.
  • Solvent resistance test-2 In the preparation of the test piece, the solvent resistance test of the cured product was carried out in the same manner as in the solvent resistance test-1 except that the curing temperature was set to 230 ° C.
  • the photosensitive resin compositions of Examples 1-1 to 1-5 were difficult to thicken even at 40 ° C. and had good storage stability. Further, even when the curing temperature was 200 ° C., good solvent resistance was exhibited as in the case of 230 ° C. On the other hand, it was found that the photosensitive resin compositions of Comparative Examples 1-1 to 1-2 had poor storage stability as can be understood from the fact that they gel at 40 ° C. Further, although the photosensitive resin composition of Comparative Example 3 has good storage stability by using the monomer B2 (EDCPA), it does not sufficiently cure when the curing temperature is lowered from 230 ° C. to 200 ° C., so that it is resistant to curing. It was found that the solvent property was reduced.
  • EDCPA monomer B2
  • Solvent resistance test-4 In the preparation of the test piece, the solvent resistance test of the cured product was carried out in the same manner as in the solvent resistance test-3 except that the curing temperature was set to 230 ° C.
  • the photosensitive resin compositions of Examples 2-1 to 2-5 were difficult to thicken even at 40 ° C. and had good storage stability. Further, even when the curing temperature was 200 ° C., good solvent resistance was exhibited as in the case of 230 ° C. On the other hand, it was found that the photosensitive resin compositions of Comparative Examples 2-1 to 2-2 had poor storage stability as can be understood from the fact that they thickened at 40 ° C. Further, although the photosensitive resin composition of Comparative Example 2-3 has good storage stability by using the monomer B2 (EDCPA), it is not sufficiently cured when the curing temperature is lowered from 230 ° C. to 200 ° C. , It was found that the solvent resistance was lowered.
  • EDCPA monomer B2
  • Monomer B1 3-oxatricyclo [3.2.1.0 2,4 ] octane-6-ylmethylmethacrylate (see Reference Example 1)
  • GMA Glycidyl methacrylate (manufactured by NOF CORPORATION)
  • Cyclomer M100 3,4-epoxycyclohexylmethylmethacrylate (manufactured by Daicel Corporation)
  • Monomer B2 3,4-epoxytricyclo [5.2.1.0 2,6 ] decane-9-ylacrylate and 3,4-epoxytricyclo [5.2.1.0 2,6 ] decane- Mixture of 8-yl acrylate (trade name "E-DCPA", manufactured by Daicel Corporation) ST: Styrene (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.)
  • MMA Methyl methacrylate (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) CHMI:
  • I. Pigment Red 254 (manufactured by Tokyo Chemical Industry Co., Ltd.)
  • DISPERBYK-2000 Amine value 4 mgKOH / g, non-volatile content 40% (manufactured by Big Chemie Japan)
  • DHPA Dipentaerythritol hexaacrylate (trade name "KAYARAD DPHA”; manufactured by Nippon Kayaku Co., Ltd.) 1-Hydroxycyclohexylphenyl ketone (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.)
  • the alkali-soluble resin has a structural unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof, and the above formula (1) (in the formula, R 1 and R 2 have the same or different hydrogen atoms or carbon, respectively. It represents an alkyl group of numbers 1 to 7.
  • X represents a divalent hydrocarbon group which may contain a single bond or a hetero atom.
  • Y has an alkyl group having 1 to 3 carbon atoms as a substituent.
  • N represents an integer of 0 to 7).
  • a photosensitive resin which is a copolymer containing and has a peak top temperature of 180 to 220 ° C. that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter.
  • the compound represented by the formula (1) is the same as that described in the formula (1a) (in the formula, R 1 , R 2 , X, Y, and n).
  • the photosensitive resin composition according to [1] which is a compound represented by (.).
  • the ratio of the structural unit (C) to all the structural units of the copolymer is 0 to 85% by weight, 1 to 60% by weight, and 2 to 40% by weight, [3], [5], and [6].
  • the photosensitive resin composition according to any one of. [8] The ratio of the structural unit (A) to all the structural units of the copolymer is 2 to 60% by weight, the content of the structural unit (B) is 40 to 98% by weight, and the content of the structural unit (C) is 0 to 0 to.
  • the total amount of the structural unit (A) and the structural unit (B) is the total structural unit. On the other hand, it is 90% by weight or more, 95% by weight or more, 99% by weight or more, or substantially 100% by weight, and the copolymer is a constituent unit (A), a constituent unit (B), and a constituent unit (C).
  • the total amount of the structural units (A) to (C) is 90% by weight or more, 95% by weight or more, 99% by weight or more, or 100% by weight with respect to all the structural units, [1] to [ 8]
  • the photosensitive resin composition according to any one of.
  • the molecular weight distribution of the copolymer (ratio of weight average molecular weight to number average molecular weight: Mw / Mn) is 5.0 or less, 1.0 to 4.5, or 1.0 to 4.0. 1]
  • Photosensitive resin composition Described in any one of [1] to [11], wherein the exothermic peak top temperature that appears when the polymer is heated at a rate of 5 ° C./min using a differential scanning calorimeter is 180 to 220 ° C.
  • Photosensitive resin composition [13] The photosensitive resin composition according to any one of [1] to [12], further comprising a coloring material.
  • the photosensitive resin composition according to [13] or [14], wherein the content of the coloring material with respect to the solid content of the photosensitive resin composition is 3 to 50% by weight and 5 to 30% by weight.
  • Resin composition [17]
  • the content of the photopolymerizable compound is 10 to 300 parts by weight, 30 to 200 parts by weight, or 40 to 150 parts by weight with respect to 100 parts by weight of the alkali-soluble resin, and the photosensitive resin composition contains a coloring material.
  • the content of the photopolymerizable compound is 10 to 1000 parts by weight, 50 to 600 parts by weight, or 100 to 500 parts by weight with respect to 100 parts by weight of the coloring material.
  • the photosensitive resin composition according to any one. [18] A cured product of the photosensitive resin composition according to any one of [1] to [17]. [19] A color filter which is a cured product of the photosensitive resin composition according to any one of [1] to [17]. [20] A display device member or display device including the color filter according to [19].
  • a photosensitive resin composition having excellent storage stability, excellent curing reactivity, and excellent solvent resistance of the cured product. Further, a cured product of a photosensitive resin composition having the above characteristics, a color filter which is the cured product, and a display device member or display device provided with the color filter are provided.

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Abstract

Provided is a photosensitive resin composition which exhibits excellent storage stability and curing reaction properties and which gives a cured product having excellent solvent resistance. This photosensitive resin composition contains an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent. The alkali-soluble resin is a copolymer that contains a constituent unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof and a constituent unit (B) derived from a compound represented by formula (1) (in the formula, R1 and R2 each denote a hydrogen atom or an alkyl group having 1-7 carbon atoms. X denotes a single bond, a divalent hydrocarbon group, or the like. Y denotes a methylene group or ethylene group that may have an alkyl group having 1-3 carbon atoms as a substituent group, or the like. n is an integer from 0 to 7). The copolymer has an exothermic peak top temperature of 180-220°C, which appears when the temperature is increased at a rate of 5°C/minute using a differential scanning calorimeter.

Description

感光性樹脂組成物、硬化物、カラーフィルタ、表示装置用部材、及び表示装置Photosensitive resin composition, cured product, color filter, display device member, and display device
 本開示は、感光性樹脂組成物、硬化物、カラーフィルタ、表示装置用部材、及び表示装置に関する。本願は、2020年3月9日に日本に出願した特願2020-039964号及び特願2020-039965号の優先権を主張し、その内容をここに援用する。 The present disclosure relates to a photosensitive resin composition, a cured product, a color filter, a display device member, and a display device. The present application claims the priority of Japanese Patent Application No. 2020-039964 and Japanese Patent Application No. 2020-039965 filed in Japan on March 9, 2020, the contents of which are incorporated herein by reference.
 絶縁膜、カラーフィルタ、カラーフィルタ保護膜、マイクロレンズを製造する際に用いられる感光性樹脂組成物として、アルカリ可溶性樹脂、光重合性化合物、及び光重合開始剤を含有する樹脂組成物や、さらに着色剤(顔料や染料)を含む樹脂組成物が知られている。 As the photosensitive resin composition used in producing an insulating film, a color filter, a color filter protective film, and a microlens, a resin composition containing an alkali-soluble resin, a photopolymerizable compound, and a photopolymerization initiator, and further. Resin compositions containing colorants (pigments and dyes) are known.
 特許文献1及び4には、前記アルカリ可溶性樹脂として、メタクリル酸とグリシジルメタクリレートを構成モノマーとして含む共重合体が開示されている。特許文献2及び5には、前記アルカリ可溶性樹脂として、メタクリル酸と3,4-エポキシトリシクロ[5.2.1.02,6]デシルアクリレートを構成モノマーとして含む共重合体が開示されている。特許文献3には、前記アルカリ可溶性樹脂として、メタクリル酸とベンジルメタクリレートを構成モノマーとして含む共重合体が開示されている。 Patent Documents 1 and 4 disclose copolymers containing methacrylic acid and glycidyl methacrylate as constituent monomers as the alkali-soluble resin. Patent Documents 2 and 5 disclose copolymers containing methacrylic acid and 3,4-epoxytricyclo [5.2.1.0 2,6 ] decyl acrylate as constituent monomers as the alkali-soluble resin. There is. Patent Document 3 discloses a copolymer containing methacrylic acid and benzyl methacrylate as constituent monomers as the alkali-soluble resin.
特開平11-133600号公報Japanese Unexamined Patent Publication No. 11-133600 特開2006-171160号公報Japanese Unexamined Patent Publication No. 2006-171160 特開平9-134004号公報Japanese Unexamined Patent Publication No. 9-134004 特開2011-237728号公報Japanese Unexamined Patent Publication No. 2011-237728 特開2007-333847号公報Japanese Unexamined Patent Publication No. 2007-333847
 しかしながら、特許文献1及び4に開示される感光性樹脂組成物は、経時で増粘するなど安定性が低いという欠点を有する。また、硬化物の耐溶剤性も十分でなかった。特許文献2及び5に開示される感光性樹脂組成物は、保存安定性には優れるものの、カルボン酸との反応性が悪く、230℃以上の硬化温度が必要であった。特許文献3に開示される感光性樹脂組成物は、硬化物の耐溶剤性が低いという欠点を有する。 However, the photosensitive resin compositions disclosed in Patent Documents 1 and 4 have a drawback of low stability such as thickening with time. In addition, the solvent resistance of the cured product was not sufficient. Although the photosensitive resin compositions disclosed in Patent Documents 2 and 5 are excellent in storage stability, they have poor reactivity with carboxylic acids and require a curing temperature of 230 ° C. or higher. The photosensitive resin composition disclosed in Patent Document 3 has a drawback that the solvent resistance of the cured product is low.
 したがって、本開示に係る発明の目的は、保存安定性に優れると共に、硬化反応性に優れ、しかも硬化物の耐溶剤性に優れる感光性樹脂組成物を提供することにある。
 また、本開示に係る発明の他の目的は、上記の特性を有する感光性樹脂組成物の硬化物、該硬化物であるカラーフィルタ、及び該カラーフィルタを備えた表示装置用部材又は表示装置を提供することにある。
Therefore, an object of the present invention is to provide a photosensitive resin composition having excellent storage stability, excellent curing reactivity, and excellent solvent resistance of the cured product.
Another object of the present invention is to provide a cured product of a photosensitive resin composition having the above characteristics, a color filter which is the cured product, and a display device member or display device provided with the color filter. To provide.
 本発明者は、上記目的を達成するため鋭意検討した結果、アルカリ可溶性樹脂として、特定の構成単位を含み、発熱ピークトップ温度が180~220℃である共重合体を用いた感光性樹脂組成物によれば、保存安定性に優れ、比較的低い温度でも硬化し、且つ硬化物の耐溶剤性に優れることを見出した。本開示に係る発明はこれらの知見に基づき完成させたものである。 As a result of diligent studies to achieve the above object, the present inventor has made a photosensitive resin composition using a copolymer containing a specific structural unit as an alkali-soluble resin and having an exothermic peak top temperature of 180 to 220 ° C. According to the report, it was found that the product has excellent storage stability, cures even at a relatively low temperature, and has excellent solvent resistance of the cured product. The invention according to the present disclosure has been completed based on these findings.
 すなわち、本開示は、アルカリ可溶性樹脂と、光重合性化合物、光重合開始剤、及び溶剤を含み、
 該アルカリ可溶性樹脂が、不飽和カルボン酸又はその無水物に由来する構成単位(A)と、下記式(1)
Figure JPOXMLDOC01-appb-C000003
(式中、R1及びR2は、それぞれ同一又は異なって、水素原子又は炭素数1~7のアルキル基を示す。Xは単結合又はヘテロ原子を含んでいてもよい2価の炭化水素基を示す。Yは置換基として炭素数1~3のアルキル基を有していてもよいメチレン基若しくはエチレン基、酸素原子、又は酸素原子と結合していてもよい硫黄原子を示す。nは0~7の整数を示す。)
で表される化合物に由来する構成単位(B)とを含む共重合体であって、示差走査熱量計を用いて、5℃/分の速度で昇温した際に現れる発熱ピークトップ温度が180~220℃である共重合体である感光性樹脂組成物を提供する。
That is, the present disclosure includes an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
The alkali-soluble resin contains a structural unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof, and the following formula (1).
Figure JPOXMLDOC01-appb-C000003
(In the formula, R 1 and R 2 are the same or different, respectively, and represent a hydrogen atom or an alkyl group having 1 to 7 carbon atoms. X is a divalent hydrocarbon group which may contain a single bond or a hetero atom. Y represents a methylene group or an ethylene group which may have an alkyl group having 1 to 3 carbon atoms as a substituent, an oxygen atom, or a sulfur atom which may be bonded to an oxygen atom. N is 0. Indicates an integer of ~ 7.)
It is a copolymer containing the structural unit (B) derived from the compound represented by, and the exothermic peak top temperature that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter is 180. Provided is a photosensitive resin composition which is a copolymer at ~ 220 ° C.
 前記共重合体は、さらに、下記(c1)~(c4)からなる群より選択された少なくとも1つの化合物に由来する構成単位(C)を含んでいてもよい。
(c1)アルキル基で置換されていてもよいスチレン
(c2)N-置換マレイミド
(c3)N-ビニル化合物
(c4)下記式(2)
Figure JPOXMLDOC01-appb-C000004
(式中、R11は水素原子又は炭素数1~7のアルキル基を示す。R12はヘテロ原子を含んでいてもよい炭化水素基を示す。Zはヘテロ原子を示す。)
で表される不飽和カルボン酸誘導体
The copolymer may further contain a structural unit (C) derived from at least one compound selected from the group consisting of the following (c1) to (c4).
(C1) Styrene (c2) N-substituted maleimide (c3) N-vinyl compound (c4) which may be substituted with an alkyl group The following formula (2)
Figure JPOXMLDOC01-appb-C000004
(In the formula, R 11 represents a hydrogen atom or an alkyl group having 1 to 7 carbon atoms. R 12 represents a hydrocarbon group which may contain a hetero atom. Z represents a hetero atom.)
Unsaturated carboxylic acid derivative represented by
 前記共重合体の全構成単位に対する前記構成単位(A)の割合が2~60重量%、前記構成単位(B)の割合が40~98重量%、前記構成単位(C)の割合が0~85重量%であってもよい。
The ratio of the structural unit (A) to all the structural units of the copolymer is 2 to 60% by weight, the ratio of the structural unit (B) is 40 to 98% by weight, and the ratio of the structural unit (C) is 0 to 0 to. It may be 85% by weight.
 本開示の感光性樹脂組成物は、さらに、色材を含んでいてもよい。 The photosensitive resin composition of the present disclosure may further contain a coloring material.
 前記色材は、顔料及び/又は染料であってもよい。 The coloring material may be a pigment and / or a dye.
 本開示は、また、前記の感光性樹脂組成物の硬化物を提供する。 The present disclosure also provides a cured product of the photosensitive resin composition described above.
 本開示は、また、前記の感光性樹脂組成物の硬化物であるカラーフィルタを提供する。 The present disclosure also provides a color filter which is a cured product of the above-mentioned photosensitive resin composition.
 本開示は、さらに、前記のカラーフィルタを備える表示装置用部材又は表示装置を提供する。 The present disclosure further provides a display device member or display device including the above-mentioned color filter.
 本開示に係る発明によれば、保存安定性に優れると共に、硬化反応性に優れ、しかも硬化物の耐溶剤性に優れる感光性樹脂組成物が提供される。また、上記の特性を有する感光性樹脂組成物の硬化物、該硬化物であるカラーフィルタ、及び該カラーフィルタを備えた表示装置用部材又は表示装置が提供される。 According to the invention according to the present disclosure, there is provided a photosensitive resin composition having excellent storage stability, excellent curing reactivity, and excellent solvent resistance of the cured product. Further, a cured product of a photosensitive resin composition having the above characteristics, a color filter which is the cured product, and a display device member or display device provided with the color filter are provided.
 本開示に係る感光性樹脂組成物は、主に絶縁膜、カラーフィルタ保護膜、マイクロレンズ、着色パターン等の形成材料、透明膜として使用されるものであり、アルカリ可溶性樹脂と、光重合性化合物、光重合開始剤、及び溶剤を含んでいる。また、本開示に係る感光性樹脂組成物は、さらに色材を含む感光性樹脂組成物であってもよい。 The photosensitive resin composition according to the present disclosure is mainly used as a forming material for an insulating film, a color filter protective film, a microlens, a coloring pattern, etc., and a transparent film, and is an alkali-soluble resin and a photopolymerizable compound. , Photopolymerization initiator, and solvent. Further, the photosensitive resin composition according to the present disclosure may be a photosensitive resin composition further containing a coloring material.
<アルカリ可溶性樹脂>
 本開示においては、アルカリ可溶性樹脂として、不飽和カルボン酸又はその無水物に由来する構成単位(A)と、前記式(1)で表される化合物に由来する構成単位(B)とを含む共重合体であって、示差走査熱量計を用いて、5℃/分の速度で昇温した際に現れる発熱ピークトップ温度が180~220℃である共重合体を用いる。前記共重合体は、さらに、前記(c1)~(c4)からなる群より選択された少なくとも1つの化合物に由来する構成単位(C)を含んでいてもよい。また、さらに構成単位(A)~(C)以外の構成単位として後述の構成単位(D)を含んでいてもよい。
<Alkali-soluble resin>
In the present disclosure, the alkali-soluble resin includes a structural unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof and a structural unit (B) derived from a compound represented by the formula (1). A copolymer having an exothermic peak top temperature of 180 to 220 ° C. that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter is used. The copolymer may further contain a structural unit (C) derived from at least one compound selected from the group consisting of (c1) to (c4). Further, the structural unit (D) described later may be included as a structural unit other than the structural units (A) to (C).
[構成単位(A)]
 構成単位(A)は不飽和カルボン酸又はその酸無水物(a)を共重合に付すことにより共重合体に導入することができる。
[Structural unit (A)]
The structural unit (A) can be introduced into the copolymer by subjecting an unsaturated carboxylic acid or an acid anhydride thereof (a) to the copolymer.
 不飽和カルボン酸又はその酸無水物(a)としては特に限定されないが、例えば、アクリル酸、メタクリル酸、クロトン酸等のα,β-不飽和モノカルボン酸;イタコン酸、マレイン酸、フマル酸等のα,β-不飽和ジカルボン酸;無水メタクリル酸等のα,β-不飽和モノカルボン酸の無水物;無水マレイン酸、無水イタコン酸等のα,β-不飽和ジカルボン酸の無水物が挙げられる。これらの中でも、共重合性や現像性の観点からはアクリル酸、メタクリル酸が特に好ましい。不飽和カルボン酸又はその酸無水物(a)は、単独で又は2以上を組み合わせて使用できる。 The unsaturated carboxylic acid or its acid anhydride (a) is not particularly limited, but for example, α, β-unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid and crotonic acid; itaconic acid, maleic acid, fumaric acid and the like. Α, β-unsaturated dicarboxylic acid; α, β-unsaturated monocarboxylic acid anhydride such as methacrylic acid anhydride; α, β-unsaturated dicarboxylic acid anhydride such as maleic anhydride and itaconic anhydride. Be done. Among these, acrylic acid and methacrylic acid are particularly preferable from the viewpoint of copolymerizability and developability. The unsaturated carboxylic acid or its acid anhydride (a) can be used alone or in combination of two or more.
 構成単位(A)の前記共重合体の全構成単位に対する割合(含有量)は特に限定されないが、例えば、2~60重量%が好ましく、より好ましくは3~40重量%、さらに好ましくは5~20重量%である。構成単位(A)の割合が上記範囲内であることにより、硬化物の耐溶剤性や現像性に優れる傾向がある。なお、本開示において、構成単位の共重合体に占める割合とは、共重合に使用する化合物(単量体)の重量を基準とするものである。例えば、構成単位(A)の共重合体に占める割合とは、共重合に使用する化合物の総量(100重量%)に対する、不飽和カルボン酸又はその酸無水物(a)の使用量の割合を意味する。 The ratio (content) of the constituent unit (A) to all the constituent units of the copolymer is not particularly limited, but is preferably 2 to 60% by weight, more preferably 3 to 40% by weight, still more preferably 5 to 5 to 60% by weight, for example. 20% by weight. When the ratio of the structural unit (A) is within the above range, the cured product tends to be excellent in solvent resistance and developability. In the present disclosure, the ratio of the constituent unit to the copolymer is based on the weight of the compound (monomer) used for the copolymerization. For example, the ratio of the constituent unit (A) to the copolymer is the ratio of the amount of the unsaturated carboxylic acid or the acid anhydride (a) used to the total amount (100% by weight) of the compounds used for the copolymerization. means.
[構成単位(B)]
 構成単位(B)は、下記式(1)で表される化合物を共重合に付すことにより共重合体に導入することができる。
Figure JPOXMLDOC01-appb-C000005
[Structural unit (B)]
The structural unit (B) can be introduced into the copolymer by subjecting the compound represented by the following formula (1) to the copolymer.
Figure JPOXMLDOC01-appb-C000005
 式(1)中、R1及びR2は、それぞれ同一又は異なって、水素原子又は炭素数1~7のアルキル基を示す。Xは単結合又はヘテロ原子を含んでいてもよい2価の炭化水素基を示す。Yは置換基として炭素数1~3のアルキル基を有していてもよいメチレン基若しくはエチレン基、酸素原子、又は酸素原子と結合していてもよい硫黄原子を示す。nは0~7の整数を示す。 In formula (1), R 1 and R 2 represent hydrogen atoms or alkyl groups having 1 to 7 carbon atoms, which are the same or different from each other. X represents a divalent hydrocarbon group that may contain a single bond or a heteroatom. Y represents a methylene group or an ethylene group which may have an alkyl group having 1 to 3 carbon atoms as a substituent, an oxygen atom, or a sulfur atom which may be bonded to the oxygen atom. n represents an integer from 0 to 7.
 R1及びR2における炭素数1~7のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s-ブチル基、ペンチル基、ヘキシル基、ヘプチル基等が挙げられる。nが2以上の場合、n個のR2は同一であっても異なっていてもよい。R1及びR2は、共重合性や反応性の観点からは水素原子、メチル基、又はエチル基が好ましい。 Examples of the alkyl group having 1 to 7 carbon atoms in R 1 and R 2 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, an s-butyl group, a pentyl group, a hexyl group, and a heptyl group. And so on. When n is 2 or more, n R 2s may be the same or different. R 1 and R 2 are preferably a hydrogen atom, a methyl group, or an ethyl group from the viewpoint of copolymerizability and reactivity.
 Xのヘテロ原子を含んでいてもよい2価の炭化水素基において、ヘテロ原子は炭化水素基の末端に結合していてもよく、炭化水素基を構成する炭素原子間に介在していてもよい。ヘテロ原子は特に限定されないが、例えば、窒素原子、酸素原子、硫黄原子が挙げられる。 In a divalent hydrocarbon group which may contain a heteroatom of X, the heteroatom may be bonded to the terminal of the hydrocarbon group or may be interposed between carbon atoms constituting the hydrocarbon group. .. Heteroatoms are not particularly limited, and examples thereof include nitrogen atoms, oxygen atoms, and sulfur atoms.
 前記ヘテロ原子を含んでいてもよい2価の炭化水素基としては、例えば、メチレン基、エチレン基、プロピレン基、トリメチレン基等のアルキレン基(炭素数1~12のアルキレン基が好ましく、炭素数1~6のアルキレン基がより好ましく、炭素数1~3のアルキレン基が特に好ましい);チオメチレン基、チオエチレン基、チオプロピレン基等のチオアルキレン基(炭素数1~12のチオアルキレン基が好ましく、炭素数1~6のチオアルキレン基がより好ましい);アミノメチレン基、アミノエチレン基、アミノプロピレン基等のアミノアルキレン基(炭素数1~12のアミノアルキレン基が好ましく、炭素数1~6のアミノアルキレン基がより好ましい)等が挙げられる。この中でも、保存安定性の観点からは、炭素数1~3のアルキレン基が好ましく、メチレン基がより好ましい。 As the divalent hydrocarbon group which may contain the hetero atom, for example, an alkylene group such as a methylene group, an ethylene group, a propylene group and a trimethylene group (preferably an alkylene group having 1 to 12 carbon atoms is preferable and the carbon number is 1). An alkylene group of to 6 is more preferable, and an alkylene group having 1 to 3 carbon atoms is particularly preferable); a thioalkylene group such as a thiomethylene group, a thioethylene group, or a thiopropylene group (a thioalkylene group having 1 to 12 carbon atoms is preferable, and carbon is preferable. A thioalkylene group having a number of 1 to 6 is more preferable); an aminoalkylene group such as an aminomethylene group, an aminoethylene group and an aminopropylene group (preferably an aminoalkylene group having 1 to 12 carbon atoms and an aminoalkylene group having 1 to 6 carbon atoms). Groups are more preferred) and the like. Among these, from the viewpoint of storage stability, an alkylene group having 1 to 3 carbon atoms is preferable, and a methylene group is more preferable.
 Yの置換基として炭素数1~3のアルキル基を有していてもよいメチレン基若しくはエチレン基としては特に限定されないが、メチレン基又はエチレン基が好ましく、メチレン基がより好ましい。 The methylene group or ethylene group which may have an alkyl group having 1 to 3 carbon atoms as the substituent of Y is not particularly limited, but a methylene group or an ethylene group is preferable, and a methylene group is more preferable.
 Yの酸素原子と結合していてもよい硫黄原子としては、例えば、硫黄原子、スルホニル基等が挙げられる。 Examples of the sulfur atom that may be bonded to the oxygen atom of Y include a sulfur atom and a sulfonyl group.
 前記式(1)で表される化合物としては、例えば、下記式(1a)で表される化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000006
Examples of the compound represented by the formula (1) include a compound represented by the following formula (1a).
Figure JPOXMLDOC01-appb-C000006
 式(1a)におけるR1、R2、X、Y、及びnは、式(1)にて説明したものと同様である。 R 1 , R 2 , X, Y, and n in the formula (1a) are the same as those described in the formula (1).
 式(1)で表される化合物の具体的な例としては、以下の化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000007
Specific examples of the compound represented by the formula (1) include the following compounds.
Figure JPOXMLDOC01-appb-C000007
 構成単位(B)の前記共重合体の全構成単位に対する割合(含有量)は特に限定されないが、40~98重量%であることが好ましく、より好ましくは60~95重量%、さらに好ましくは75~90重量%である。構成単位(B)の割合が上記範囲内であることにより、硬化物の耐溶剤性や現像性に優れる傾向がある。 The ratio (content) of the constituent unit (B) to all the constituent units of the copolymer is not particularly limited, but is preferably 40 to 98% by weight, more preferably 60 to 95% by weight, still more preferably 75. ~ 90% by weight. When the ratio of the structural unit (B) is within the above range, the cured product tends to be excellent in solvent resistance and developability.
[構成単位(C)]
 構成単位(C)は、アルキル基で置換されていてもよいスチレン(c1)、N-置換マレイミド(c2)、N-ビニル化合物(c3)、及び前記式(2)で表される不飽和カルボン酸誘導体(c4)からなる群より選択された少なくとも1つの化合物に由来する構成単位である。構成単位(C)は硬化物(硬化皮膜)に硬度を付与する機能や、共重合反応を円滑化する機能、溶媒への溶解性を高める機能、基材への密着性を高める機能などを有する。
[Structural unit (C)]
The structural unit (C) is styrene (c1) which may be substituted with an alkyl group, N-substituted maleimide (c2), an N-vinyl compound (c3), and an unsaturated carboxylic acid represented by the above formula (2). It is a structural unit derived from at least one compound selected from the group consisting of an acid derivative (c4). The structural unit (C) has a function of imparting hardness to a cured product (cured film), a function of facilitating a copolymerization reaction, a function of increasing solubility in a solvent, a function of enhancing adhesion to a substrate, and the like. ..
 構成単位(C)は、前記(c1)~(c4)からなる群より選択された少なくとも1つの化合物を共重合に付すことにより共重合体に導入することができる。 The structural unit (C) can be introduced into the copolymer by subjecting at least one compound selected from the group consisting of the above (c1) to (c4) to the copolymer.
(スチレン(c1))
 アルキル基で置換されていてもよいスチレン(c1)におけるアルキル基は特に限定されないが、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、t-ブチル基、ヘキシル基等の炭素数1~7のアルキル基が挙げられる。これらの中でも、メチル基又はエチル基等の炭素数1~4のアルキル基が好ましく、メチル基がより好ましい。前記アルキル基はスチレンのビニル基及びベンゼン環のいずれに結合していてもよい。
(Styrene (c1))
The alkyl group in styrene (c1) which may be substituted with an alkyl group is not particularly limited, but for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a hexyl group and the like. Alkyl groups having 1 to 7 carbon atoms can be mentioned. Among these, an alkyl group having 1 to 4 carbon atoms such as a methyl group or an ethyl group is preferable, and a methyl group is more preferable. The alkyl group may be bonded to either a vinyl group of styrene or a benzene ring.
 アルキル基で置換されていてもよいスチレン(c1)の代表的な例として、スチレン、α-メチルスチレン、ビニルトルエン(o-ビニルトルエン、m-ビニルトルエン、p-ビニルトルエン)等が挙げられる。アルキル基で置換されていてもよいスチレン(c1)は、単独で又は2種以上を組み合わせて使用できる。 Typical examples of styrene (c1) which may be substituted with an alkyl group include styrene, α-methylstyrene, vinyltoluene (o-vinyltoluene, m-vinyltoluene, p-vinyltoluene) and the like. Styrene (c1), which may be substituted with an alkyl group, can be used alone or in combination of two or more.
(N-置換マレイミド(c2))
 N-置換マレイミド(c2)としては、例えば、下記式(3)で表される化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000008
(N-substituted maleimide (c2))
Examples of the N-substituted maleimide (c2) include a compound represented by the following formula (3).
Figure JPOXMLDOC01-appb-C000008
 式(3)中、R21は有機基を示す。 In formula (3), R 21 represents an organic group.
 前記有機基としては、例えば、炭化水素基、複素環式基が挙げられる。炭化水素基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、ヘキシル基等のアルキル基(例えばC1-6アルキル基等);シクロペンチル基、シクロヘキシル基、シクロオクチル基、アダマンチル基、ノルボルニル基等のシクロアルキル基;フェニル基等のアリール基;ベンジル基等のアラルキル基;これらの2以上が結合した基等が挙げられる。複素環式基としては、例えば、窒素原子、酸素原子、及び硫黄原子からなる群より選択された少なくとも1種のヘテロ原子を含有する5~10員のヘテロシクロアルキル基及びヘテロアリール基が挙げられる。 Examples of the organic group include a hydrocarbon group and a heterocyclic group. Examples of the hydrocarbon group include an alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group and a hexyl group (for example, a C 1-6 alkyl group); a cyclopentyl group, a cyclohexyl group and a cyclooctyl group. Examples thereof include a cycloalkyl group such as an adamantyl group and a norbornyl group; an aryl group such as a phenyl group; an aralkyl group such as a benzyl group; and a group in which two or more of these are bonded. Examples of the heterocyclic group include a 5- to 10-membered heterocycloalkyl group and a heteroaryl group containing at least one heteroatom selected from the group consisting of a nitrogen atom, an oxygen atom, and a sulfur atom. ..
 N-置換マレイミド(c2)としては特に限定されないが、例えば、N-メチルマレイミド、N-エチルマレイミド、N-プロピルマレイミド等のN-アルキルマレイミド;N-シクロペンチルマレイミド、N-シクロヘキシルマレイミド、N-シクロオクチルマレイミド、N-アダマンチルマレイミド、N-ノルボルニルマレイミド等のN-シクロアルキルマレイミド;N-フェニルマレイミド等のN-アリールマレイミド;N-ベンジルマレイミド等のN-アラルキルマレイミド等が挙げられる。N-置換マレイミド(c2)は、単独で又は2種以上を組み合わせて使用できる。 The N-substituted maleimide (c2) is not particularly limited, and is, for example, N-alkylmaleimide such as N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide; N-cyclopentylmaleimide, N-cyclohexylmaleimide, N-cyclo. Examples thereof include N-cycloalkylmaleimide such as octylmaleimide, N-adamantylmaleimide and N-norbornylmaleimide; N-arylmaleimide such as N-phenylmaleimide; and N-aralkylmaleimide such as N-benzylmaleimide. The N-substituted maleimide (c2) can be used alone or in combination of two or more.
(N-ビニル化合物(c3))
 N-ビニル化合物(c3)としては特に限定されないが、例えば、N-ビニルホルムアミド、N-ビニルアセトアミド、N-ビニルイソプロピルアミド、N-ビニル-N-メチルアセトアミド、N-ビニルピロリドン、N-ビニルカルバゾール、N-ビニルピペリドン、N-ビニルカプロラクタム等が挙げられる。N-ビニル化合物(c3)は、単独で又は2種以上を組み合わせて使用できる。
(N-vinyl compound (c3))
The N-vinyl compound (c3) is not particularly limited, but for example, N-vinylformamide, N-vinylacetamide, N-vinylisopropylamide, N-vinyl-N-methylacetamide, N-vinylpyrrolidone, N-vinylcarbazole. , N-vinylpiperidone, N-vinylcaprolactam and the like. The N-vinyl compound (c3) can be used alone or in combination of two or more.
(不飽和カルボン酸誘導体(c4))
 不飽和カルボン酸誘導体(c4)は、下記式(2)で表すことができる。
Figure JPOXMLDOC01-appb-C000009
(Unsaturated carboxylic acid derivative (c4))
The unsaturated carboxylic acid derivative (c4) can be represented by the following formula (2).
Figure JPOXMLDOC01-appb-C000009
 式(2)中、R11は水素原子又は炭素数1~7のアルキル基を示す。R12はヘテロ原子を含んでいてもよい炭化水素基を示す。Zはヘテロ原子を示す。 In formula (2), R 11 represents a hydrogen atom or an alkyl group having 1 to 7 carbon atoms. R 12 represents a hydrocarbon group that may contain a heteroatom. Z represents a heteroatom.
 R11における炭素数1~7のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、t-ブチル基、ヘキシル基等が挙げられる。R11としては、水素原子又はメチル基が特に好ましい。 Examples of the alkyl group having 1 to 7 carbon atoms in R 11 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a hexyl group and the like. As R 11 , a hydrogen atom or a methyl group is particularly preferable.
 R12におけるヘテロ原子を含んでいてもよい炭化水素基としては、例えば、アルキル基、ヘテロアルキル基、アルケニル基、シクロアルキル基、ヘテロシクロアルキル基、アリール基、及びこれらの2以上が連結した基が挙げられる。前記ヘテロ原子としては、例えば、窒素原子、酸素原子、硫黄原子が挙げられる。 Examples of the hydrocarbon group which may contain a hetero atom in R 12 include an alkyl group, a heteroalkyl group, an alkenyl group, a cycloalkyl group, a heterocycloalkyl group, an aryl group, and a group in which two or more of these are linked. Can be mentioned. Examples of the hetero atom include a nitrogen atom, an oxygen atom, and a sulfur atom.
 前記アルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s-ブチル基、ヘキシル基、オクチル基、デシル基、ドデシル基、イソデシル基、ラウリル基、ステアリル基等の炭素数1~23のアルキル基が挙げられる。 Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, an s-butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, an isodecyl group, a lauryl group and a stearyl group. Examples thereof include alkyl groups having 1 to 23 carbon atoms such as groups.
 前記ヘテロアルキル基としては、例えば、-(R13-O)m-R14基(式中、R13は炭素数1~12のアルキレン基を示す。R14は水素原子又は炭素数1~12のアルキル基を示す。mは1以上の整数を示す。)、-R15-NR1617基(式中、R15は炭素数1~12のアルキレン基を示す。R16及びR17は、それぞれ同一又は異なって、水素原子又は炭素数1~4のアルキル基を示す。)が挙げられる。 As the heteroalkyl group, for example,-(R 13- O) m-R 14 groups (in the formula, R 13 represents an alkylene group having 1 to 12 carbon atoms. R 14 is a hydrogen atom or 1 to 12 carbon atoms. (M indicates an integer of 1 or more), -R 15- NR 16 R 17 groups (in the formula, R 15 indicates an alkylene group having 1 to 12 carbon atoms. R 16 and R 17 are. , The same or different, respectively, indicating a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.)
 前記アルケニル基としては、例えば、アリル基、3-ブテニル基、5-ヘキセニル基等の炭素数2~23のアルケニル基が挙げられる。 Examples of the alkenyl group include alkenyl groups having 2 to 23 carbon atoms such as an allyl group, a 3-butenyl group, and a 5-hexenyl group.
 前記シクロアルキル基としては、例えば、シクロペンチル基、シクロヘキシル基、シクロオクチル基、アダマンチル基、ノルボルニル基等の炭素数3~12のシクロアルキル基が挙げられる。 Examples of the cycloalkyl group include cycloalkyl groups having 3 to 12 carbon atoms such as a cyclopentyl group, a cyclohexyl group, a cyclooctyl group, an adamantyl group, and a norbornyl group.
 前記ヘテロシクロアルキル基としては、例えば、オキセタン環、オキソラン環、オキサン環、オキセパン環等の環状エーテル構造を含む基(例えば、3員環以上の環状エーテル含有基)等が挙げられる。 Examples of the heterocycloalkyl group include groups containing a cyclic ether structure such as an oxetane ring, an oxoran ring, an oxane ring, and an oxepane ring (for example, a cyclic ether-containing group having a 3-membered ring or more).
 前記アリール基としては、例えば、フェニル基、ナフチル基等の炭素数6~12のアリール基が挙げられる。 Examples of the aryl group include an aryl group having 6 to 12 carbon atoms such as a phenyl group and a naphthyl group.
 式(2)で表される不飽和カルボン酸誘導体(c4)としては特に限定されないが、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、ブチル(メタ)アクリレート、イソデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート等のアルキル基を有する(メタ)アクリレート;N,N-ジメチルアミノエチル(メタ)アクリレート、N,N-ジエチルアミノエチル(メタ)アクリレート、N,N-ジイソプロピルアミノエチル(メタ)アクリレート等のアルキルアミノ基を有する(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、2-ヒドロキシブチル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート等の水酸基含有(メタ)アクリレート、メトキシジエチレングリコール(メタ)アクリレート、エトキシジエチレングリコール(メタ)アクリレート、イソオクチルオキシジエチレングリコール(メタ)アクリレート、フェノキシトリエチレングリコール(メタ)アクリレート、メトキシトリエチレングリコール(メタ)アクリレート、メトキシポリエチレングリコール(メタ)アクリレート等のポリアルキレングリコール(メタ)アクリレート等のヘテロアルキル基を有する(メタ)アクリレート;アリル(メタ)アクリレート等のアルケニル基を有する(メタ)アクリレート;シクロヘキシル(メタ)アクリレート、1-アダマンチル(メタ)アクリレート、イソボロニル(メタ)アクリレート、トリシクロ[5,2,1,02,6]デカン-8-オール(メタ)アクリレート等の単環又は多環のシクロアルキル基を有する(メタ)アクリレート;グリシジル(メタ)アクリレート、2-メチルグリシジル(メタ)アクリレート、2-エチルグリシジル(メタ)アクリレート、2-グリシジルオキシエチル(メタ)アクリレート、3-グリシジルオキシプロピル(メタ)アクリレート、グリシジルオキシフェニル(メタ)アクリレート等のエポキシ基(オキシラニル基)を有する(メタ)アクリレート、オキセタニル(メタ)アクリレート、3-メチル-3-オキセタニル(メタ)アクリレート、3-エチル-3-オキセタニル(メタ)アクリレート、(3-メチル-3-オキセタニル)メチル(メタ)アクリレート、(3-エチル-3-オキセタニル)メチル(メタ)アクリレート、2-(3-メチル-3-オキセタニル)エチル(メタ)アクリレート、2-(3-エチル-3-オキセタニル)エチル(メタ)アクリレート、2-[(3-メチル-3-オキセタニル)メチルオキシ]エチル(メタ)アクリレート、2-[(3-エチル-3-オキセタニル)メチルオキシ]エチル(メタ)アクリレート、3-[(3-メチル-3-オキセタニル)メチルオキシ]プロピル(メタ)アクリレート、3-[(3-エチル-3-オキセタニル)メチルオキシ]プロピル(メタ)アクリレート等のオキセタニル基を有する(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート等のオキソラニル基を有する(メタ)アクリレート、3,4-エポキシシクロヘキシル(メタ)アクリレート、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート、2-(3,4-エポキシシクロヘキシル)エチル(メタ)アクリレート、2-(3,4-エポキシシクロヘキシルメチルオキシ)エチル(メタ)アクリレート、3-(3,4-エポキシシクロヘキシルメチルオキシ)プロピル(メタ)アクリレート等の脂環式エポキシ基を含む(メタ)アクリレート等のヘテロシクロアルキル基(例えば、3員環以上の環状エーテル含有基)を有する(メタ)アクリレート;フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート等のアリール基を有する(メタ)アクリレート;3-(メタ)アクリロキシプロピルメチルジメトキシシラン、3-(メタ)アクリロキシプロピルトリメトキシシラン、3-(メタ)アクリロキシプロピルメチルジエトキシシラン、3-(メタ)アクリロキシプロピルトリエトキシシラン、8-(メタ)アクリロキシオクチルトリメトキシシラン等のアルコキシシリル基含有(メタ)アクリレートが挙げられる。式(2)で表される不飽和カルボン酸誘導体(c4)は、単独で又は2種以上を組み合わせて使用できる。 The unsaturated carboxylic acid derivative (c4) represented by the formula (2) is not particularly limited, and is, for example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, and butyl. (Meta) acrylate having an alkyl group such as (meth) acrylate, isodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate; N, N-dimethylaminoethyl (meth) acrylate, N, N-diethylamino (Meta) acrylate having an alkylamino group such as ethyl (meth) acrylate, N, N-diisopropylaminoethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy Hydroxyl-containing (meth) acrylates such as butyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, ethoxydiethylene glycol (meth) acrylate, isooctyloxydiethylene glycol (meth) acrylate, phenoxytriethylene glycol. (Meta) acrylate having a heteroalkyl group such as polyalkylene glycol (meth) acrylate such as (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxypolyethylene glycol (meth) acrylate; alkenyl such as allyl (meth) acrylate having a group (meth) acrylate; cyclohexyl (meth) acrylate, 1-adamantyl (meth) acrylate, isobornyl (meth) acrylate, tricyclo [5,2,1,0 2,6] decan-8-ol (meth) acrylate (Meta) acrylate having a monocyclic or polycyclic cycloalkyl group such as; glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 2-ethylglycidyl (meth) acrylate, 2-glycidyloxyethyl (meth) (Meta) acrylate having an epoxy group (oxylanyl group) such as acrylate, 3-glycidyloxypropyl (meth) acrylate, glycidyloxyphenyl (meth) acrylate, oxetanyl (meth) acrylate, 3-methyl-3-oxetanyl (meth) Acrylate, 3-ethyl-3-oxetanyl (meth) acrylate, (3-methyl-3-oxetanyl) meth Lu (meth) acrylate, (3-ethyl-3-oxetanyl) methyl (meth) acrylate, 2- (3-methyl-3-oxetanyl) ethyl (meth) acrylate, 2- (3-ethyl-3-oxetanyl) ethyl (Meta) acrylate, 2-[(3-Methyl-3-oxetanyl) methyloxy] ethyl (meth) acrylate, 2-[(3-ethyl-3-oxetanyl) methyloxy] ethyl (meth) acrylate, 3-[ (3-Methyl-3-oxetanyl) methyloxy] propyl (meth) acrylate, 3-[(3-ethyl-3-oxetanyl) methyloxy] propyl (meth) acrylate and other (meth) acrylates having an oxetanyl group, tetrahydro (Meta) acrylate having an oxolanyl group such as furfuryl (meth) acrylate, 3,4-epoxycyclohexyl (meth) acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, 2- (3,4-epoxycyclohexyl) Contains alicyclic epoxy groups such as ethyl (meth) acrylate, 2- (3,4-epoxycyclohexylmethyloxy) ethyl (meth) acrylate, 3- (3,4-epoxycyclohexylmethyloxy) propyl (meth) acrylate. (Meta) acrylate having a heterocycloalkyl group such as (meth) acrylate (for example, a cyclic ether-containing group having three or more membered rings); (meth) having an aryl group such as phenyl (meth) acrylate and benzyl (meth) acrylate. Aacrylate; 3- (meth) acryloxypropylmethyldimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropylmethyldiethoxysilane, 3- (meth) acryloxipropyltriethoxysilane , 8- (Meta) Acryloxyoctyl Dimethoxysilane and other alkoxysilyl group-containing (meth) acrylates. The unsaturated carboxylic acid derivative (c4) represented by the formula (2) can be used alone or in combination of two or more.
 構成単位(C)の前記共重合体の全構成単位に対する割合(含有量)は特に限定されないが、0~85重量%であることが好ましく、より好ましくは1~60重量%、さらに好ましくは2~40重量%である。構成単位(C)の割合が上記範囲内であることにより、硬化物の耐溶剤性に優れる傾向がある。 The ratio (content) of the constituent unit (C) to all the constituent units of the copolymer is not particularly limited, but is preferably 0 to 85% by weight, more preferably 1 to 60% by weight, still more preferably 2. ~ 40% by weight. When the ratio of the structural unit (C) is within the above range, the solvent resistance of the cured product tends to be excellent.
[構成単位(D)]
 本開示における前記共重合体は、前記構成単位(A)~(C)以外の構成単位(D)を含んでいてもよい。構成単位(D)として、例えば、(メタ)アクリルアミド、(メタ)アクリルニトリルに由来する構成単位が挙げられる。
[Structural unit (D)]
The copolymer in the present disclosure may contain a structural unit (D) other than the structural units (A) to (C). Examples of the structural unit (D) include a structural unit derived from (meth) acrylamide and (meth) acrylonitrile.
 本開示における前記共重合体が構成単位(A)と構成単位(B)とを含み、構成単位(C)を含まない場合、構成単位(A)と構成単位(B)との総量は、全構成単位に対して90重量%以上であることが好ましく、より好ましくは95重量%以上、さらに好ましくは99重量%以上であり、実質的に100重量%であってもよい。また、本開示における前記共重合体が構成単位(A)と構成単位(B)と構成単位(C)とを含む場合、構成単位(A)~(C)の総量は、全構成単位に対して90重量%以上であることが好ましく、より好ましくは95重量%以上、さらに好ましくは99重量%以上であり、実質的に100重量%であってもよい。 When the copolymer in the present disclosure contains the constituent unit (A) and the constituent unit (B) and does not include the constituent unit (C), the total amount of the constituent unit (A) and the constituent unit (B) is the total amount. It is preferably 90% by weight or more, more preferably 95% by weight or more, still more preferably 99% by weight or more, and may be substantially 100% by weight with respect to the constituent unit. When the copolymer in the present disclosure contains a structural unit (A), a structural unit (B), and a structural unit (C), the total amount of the structural units (A) to (C) is relative to all the structural units. It is preferably 90% by weight or more, more preferably 95% by weight or more, still more preferably 99% by weight or more, and may be substantially 100% by weight.
 共重合体の重量平均分子量(Mw)は特に限定されないが、例えば、1000~1000000であることが好ましく、より好ましくは3000~300000、さらに好ましくは5000~100000である。共重合体の分子量分布(重量平均分子量と数平均分子量との比:Mw/Mn)は特に限定されないが、例えば、5.0以下であることが好ましく、より好ましくは1.0~4.5、さらに好ましくは1.0~4.0である。なお、本開示において、重量平均分子量(Mw)及び数平均分子量(Mn)は、例えば、GPCにより標準物質としてポリスチレンを用いて測定することができるが、実施例にて用いた方法により測定されたものであることが好ましい。 The weight average molecular weight (Mw) of the copolymer is not particularly limited, but is preferably 1000 to 10000, more preferably 3000 to 300,000, and further preferably 5000 to 100,000. The molecular weight distribution of the copolymer (ratio of weight average molecular weight to number average molecular weight: Mw / Mn) is not particularly limited, but is preferably 5.0 or less, more preferably 1.0 to 4.5, for example. , More preferably 1.0 to 4.0. In the present disclosure, the weight average molecular weight (Mw) and the number average molecular weight (Mn) can be measured by, for example, using polystyrene as a standard substance by GPC, but were measured by the method used in the examples. It is preferable that it is one.
 本開示における前記重合体は、示差走査熱量計を用いて、5℃/分の速度で昇温した際に現れる発熱ピークトップ温度が180~220℃である。なお、本開示において、発熱ピークトップ温度は、例えば、後述の実施例にて用いた方法により測定されたものであることが好ましい。 The polymer in the present disclosure has a heat generation peak top temperature of 180 to 220 ° C. that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter. In the present disclosure, the exothermic peak top temperature is preferably measured by, for example, the method used in the examples described later.
 本開示における前記共重合体は、本開示に係る感光性樹脂組成物のバインダー樹脂として機能する。 The copolymer in the present disclosure functions as a binder resin for the photosensitive resin composition according to the present disclosure.
<共重合体の製造方法>
 本開示における前記共重合体は、不飽和カルボン酸又はその無水物(a)と、環上にエポキシ基を有する多環式脂肪族基と不飽和結合を有する基とを有する化合物(b)と、必要に応じて、前記(c1)~(c4)からなる群より選択された少なくとも1つの化合物と、前記構成単位(D)に対応する化合物とを共重合に付すことにより製造することができる。以下、不飽和カルボン酸又はその無水物(a)等の共重合体に導入し得る化合物を「単量体」と総称することがある。
<Method for producing copolymer>
The copolymer in the present disclosure includes an unsaturated carboxylic acid or an anhydride thereof (a), and a compound (b) having a polycyclic aliphatic group having an epoxy group on the ring and a group having an unsaturated bond. If necessary, it can be produced by subjecting at least one compound selected from the group consisting of (c1) to (c4) to the copolymer and the compound corresponding to the structural unit (D). .. Hereinafter, compounds that can be introduced into a copolymer such as unsaturated carboxylic acid or its anhydride (a) may be collectively referred to as "monomer".
 本開示の共重合体の製造方法では、重合開始剤の存在下で共重合に付してもよい。前記重合開始剤としては、慣用乃至公知のラジカル重合開始剤が使用でき、例えば、2,2′-アゾビスイソブチロニトリル、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、2,2’-アゾビス(4-メトキシ-2,4-ジメチルバレロニトリル)、ジメチル-2,2’-アゾビス(2-メチルプロピオネート)、ジエチル-2,2’-アゾビス(2-メチルプロピオネート)、ジブチル-2,2’-アゾビス(2-メチルプロピオネート)等のアゾ化合物、ベンゾイルペルオキシド、ラウロイルペルオキシド、t-ブチルペルオキシピバレート、1,1-ビス(t-ブチルペルオキシ)シクロヘキサン等の有機過酸化物、過酸化水素等が挙げられる。過酸化物をラジカル重合開始剤として使用する場合、還元剤を組み合わせてレドックス型の開始剤としてもよい。この中でもアゾ化合物が好ましく、2,2’-アゾビスイソブチロニトリル、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、ジメチル-2,2’-アゾビス(2-メチルプロピオネート)がより好ましい。 In the method for producing a copolymer of the present disclosure, the copolymer may be subjected to copolymerization in the presence of a polymerization initiator. As the polymerization initiator, a conventional or known radical polymerization initiator can be used, and for example, 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvaleronitrile), 2 , 2'-azobis (4-methoxy-2,4-dimethylvaleronitrile), dimethyl-2,2'-azobis (2-methylpropionate), diethyl-2,2'-azobis (2-methylpropio) Nate), azo compounds such as dibutyl-2,2'-azobis (2-methylpropionate), benzoyl peroxide, lauroyl peroxide, t-butyl peroxypivalate, 1,1-bis (t-butyl peroxy) cyclohexane and the like. Organic peroxides, hydrogen peroxide and the like can be mentioned. When a peroxide is used as a radical polymerization initiator, a reducing agent may be combined to form a redox-type initiator. Of these, azo compounds are preferable, and 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvaleronitrile), and dimethyl-2,2'-azobis (2-methylpropionate) are preferable. ) Is more preferable.
 重合開始剤の使用量は、円滑な共重合を損なわない範囲で適宜選択でき、特に限定されないが、例えば、単量体の総量(100重量部)に対して1~20重量部が好ましく、より好ましくは3~15重量部である。 The amount of the polymerization initiator used can be appropriately selected as long as it does not impair smooth copolymerization, and is not particularly limited. For example, 1 to 20 parts by weight is preferable with respect to the total amount of the monomers (100 parts by weight). It is preferably 3 to 15 parts by weight.
 本開示において、共重合は、溶液重合、塊状重合、懸濁重合、塊状-懸濁重合、乳化重合等、アクリル系ポリマーやスチレン系ポリマーを製造する際に用いる慣用の方法により行うことができる。単量体、重合開始剤は、それぞれ、反応系に一括供給してもよく、その一部又は全部を反応系に滴下してもよい。例えば、一定温度に保持した単量体又は単量体と重合溶媒との混合液中に、重合開始剤を重合溶媒に溶解した溶液を滴下して重合する方法や、予め単量体、重合開始剤を重合溶媒に溶解させた溶液を、一定温度に保持した重合溶媒中に滴下して重合する方法(滴下重合法)等を採用できる。 In the present disclosure, the copolymerization can be carried out by a conventional method used for producing an acrylic polymer or a styrene polymer, such as solution polymerization, bulk polymerization, suspension polymerization, bulk-suspension polymerization, and emulsion polymerization. The monomer and the polymerization initiator may be collectively supplied to the reaction system, or a part or all of them may be added dropwise to the reaction system. For example, a method of dropping a solution of a polymerization initiator dissolved in a polymerization solvent into a mixture of a monomer or a monomer kept at a constant temperature and a polymerization solvent to carry out the polymerization, or a method of preliminarily starting a monomer and polymerization. A method (drop polymerization method) or the like in which a solution obtained by dissolving an agent in a polymerization solvent is dropped into a polymerization solvent maintained at a constant temperature and polymerized can be adopted.
 本開示における前記共重合体は、重合溶媒中で共重合されることが好ましい。重合溶媒は単量体組成等に応じて適宜選択でき、例えば、エーテル(ジエチルエーテル;エチレングリコールモノ又はジアルキルエーテル、ジエチレングリコールモノ又はジアルキルエーテル、プロピレングリコールモノ又はジアルキルエーテル、プロピレングリコールモノ又はジアリールエーテル、ジプロピレングリコールモノ又はジアルキルエーテル、トリプロピレングリコールモノ又はジアルキルエーテル、1,3-プロパンジオールモノ又はジアルキルエーテル、1,3-ブタンジオールモノ又はジアルキルエーテル、1,4-ブタンジオールモノ又はジアルキルエーテル、グリセリンモノ,ジ又はトリアルキルエーテル等のグリコールエーテル類等の鎖状エーテル;テトラヒドロフラン、ジオキサン等の環状エーテル等)、エステル(酢酸メチル、酢酸エチル、酢酸ブチル、酢酸イソアミル、乳酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、C5-6シクロアルカンジオールモノ又はジアセテート、C5-6シクロアルカンジメタノールモノ又はジアセテート等のカルボン酸エステル類;エチレングリコールモノアルキルエーテルアセテート、エチレングリコールモノ又はジアセテート、ジエチレングリコールモノアルキルエーテルアセテート、ジエチレングリコールモノ又はジアセテート、プロピレングリコールモノアルキルエーテルアセテート、プロピレングリコールモノ又はジアセテート、ジプロピレングリコールモノアルキルエーテルアセテート、ジプロピレングリコールモノ又はジアセテート、1,3-プロパンジオールモノアルキルエーテルアセテート、1,3-プロパンジオールモノ又はジアセテート、1,3-ブタンジオールモノアルキルエーテルアセテート、1,3-ブタンジオールモノ又はジアセテート、1,4-ブタンジオールモノアルキルエーテルアセテート、1,4-ブタンジオールモノ又はジアセテート、グリセリンモノ,ジ又はトリアセテート、グリセリンモノ又はジC1-4アルキルエーテルジ又はモノアセテート、トリプロピレングリコールモノアルキルエーテルアセテート、トリプロピレングリコールモノ又はジアセテート等のグリコールアセテート類又はグリコールエーテルアセテート類等)、ケトン(アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、3,5,5-トリメチル-2-シクロヘキセン-1-オン等)、アミド(N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド等)、スルホキシド(ジメチルスルホキシド等)、アルコール(メタノール、エタノール、プロパノール、C5-6シクロアルカンジオール、C5-6シクロアルカンジメタノール等)、炭化水素(ベンゼン、トルエン、キシレン等の芳香族炭化水素、ヘキサン等の脂肪族炭化水素、シクロヘキサン等の脂環式炭化水素等)、これらの混合溶媒等が挙げられる。 The copolymer in the present disclosure is preferably copolymerized in a polymerization solvent. The polymerization solvent can be appropriately selected depending on the monomer composition and the like, and for example, ether (diethyl ether; ethylene glycol mono or dialkyl ether, diethylene glycol mono or dialkyl ether, propylene glycol mono or dialkyl ether, propylene glycol mono or diaryl ether, diaryl ether, di. Propropylene glycol mono or dialkyl ether, tripropylene glycol mono or dialkyl ether, 1,3-propanediol mono or dialkyl ether, 1,3-butanediol mono or dialkyl ether, 1,4-butanediol mono or dialkyl ether, glycerin mono , Chain ethers such as glycol ethers such as di or trialkyl ethers; cyclic ethers such as tetrahydrofuran and dioxane), esters (methyl acetate, ethyl acetate, butyl acetate, isoamyl acetate, ethyl lactate, methyl 3-methoxypropionate, etc.) , Caroxyesters such as ethyl 3-ethoxypropionate, C 5-6 cycloalkanediol mono or diacetate, C 5-6 cycloalkanodimethanol mono or diacetate; ethylene glycol monoalkyl ether acetate, ethylene glycol mono or Diacetate, diethylene glycol monoalkyl ether acetate, diethylene glycol mono or diacetate, propylene glycol monoalkyl ether acetate, propylene glycol mono or diacetate, dipropylene glycol monoalkyl ether acetate, dipropylene glycol mono or diacetate, 1,3-propane Diol monoalkyl ether acetate, 1,3-propanediol mono or diacetate, 1,3-butanediol monoalkyl ether acetate, 1,3-butanediol mono or diacetate, 1,4-butanediol monoalkyl ether acetate, 1,4-Butanediol mono or diacetate, glycerin mono, di or triacetate, glycerin mono or di C 1-4 alkyl ether di or monoacetate, tripropylene glycol monoalkyl ether acetate, tripropylene glycol mono or diacetate, etc. Glycol acetates or glycol ether acetates, etc.), ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, 3,5,5-trimethyl-2-cyclohexe N-1-one, etc.), Amid (N, N-dimethylacetamide, N, N-dimethylformamide, etc.), Sulfoxide (dimethylsulfoxide, etc.), Alcohol (methanol, ethanol, propanol, C 5-6 cycloalkanediol, C 5-6 cycloalkanedimethanol, etc.), hydrocarbons (aromatic hydrocarbons such as benzene, toluene, xylene, aliphatic hydrocarbons such as hexane, alicyclic hydrocarbons such as cyclohexane, etc.), mixed solvents, etc. Can be mentioned.
 重合温度は単量体の種類や組成に応じて適宜選択でき、特に限定されないが、例えば、30~150℃であることが好ましい。 The polymerization temperature can be appropriately selected depending on the type and composition of the monomer and is not particularly limited, but is preferably 30 to 150 ° C., for example.
 上記方法により得られた共重合体を含む反応溶液は、必要に応じて、沈殿又は再沈殿を施すことにより精製することができる。沈殿又は再沈殿に用いる溶媒は有機溶媒及び水のいずれであってもよく、またその混合溶媒であってもよい。有機溶媒として、例えば、炭化水素(ペンタン、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素;シクロヘキサン、メチルシクロヘキサン等の脂環式炭化水素;ベンゼン、トルエン、キシレン等の芳香族炭化水素)、ハロゲン化炭化水素(塩化メチレン、クロロホルム、四塩化炭素等のハロゲン化脂肪族炭化水素;クロロベンゼン、ジクロロベンゼン等のハロゲン化芳香族炭化水素等)、ニトロ化合物(ニトロメタン、ニトロエタン等)、ニトリル(アセトニトリル、ベンゾニトリル等)、エーテル(ジエチルエーテル、ジイソプロピルエーテル、ジメトキシエタン等の鎖状エーテル;テトラヒドロフラン、ジオキサン等の環状エーテル)、ケトン(アセトン、メチルエチルケトン、ジイソブチルケトン等)、エステル(酢酸エチル、酢酸ブチル等)、カーボネート(ジメチルカーボネート、ジエチルカーボネート、エチレンカーボネート、プロピレンカーボネート等)、アルコール(メタノール、エタノール、プロパノール、イソプロピルアルコール、ブタノール等)、カルボン酸(酢酸等)、及びこれらの溶媒を含む混合溶媒等が挙げられる。 The reaction solution containing the copolymer obtained by the above method can be purified by subjecting it to precipitation or reprecipitation, if necessary. The solvent used for precipitation or reprecipitation may be either an organic solvent or water, or a mixed solvent thereof. Examples of the organic solvent include hydrocarbons (aliphatic hydrocarbons such as pentane, hexane, heptane, and octane; alicyclic hydrocarbons such as cyclohexane and methylcyclohexane; aromatic hydrocarbons such as benzene, toluene, and xylene) and halogenation. Hydrocarbons (halogenated aliphatic hydrocarbons such as methylene chloride, chloroform and carbon tetrachloride; halogenated aromatic hydrocarbons such as chlorobenzene and dichlorobenzene), nitro compounds (nitromethane, nitroethane, etc.), nitriles (acetriform, benzonitrile, etc.) Etc.), ether (chain ether such as diethyl ether, diisopropyl ether, dimethoxyethane; cyclic ether such as tetrahydrofuran, dioxane), ketone (acetone, methyl ethyl ketone, diisobutyl ketone, etc.), ester (ethyl acetate, butyl acetate, etc.), carbonate Examples thereof include (dimethyl carbonate, diethyl carbonate, ethylene carbonate, propylene carbonate, etc.), alcohols (methanol, ethanol, propanol, isopropyl alcohol, butanol, etc.), carboxylic acids (acetic acid, etc.), and mixed solvents containing these solvents.
<色材>
 本開示において、色材(着色剤)としては着色性を有するものであればよく、カラーフィルタ等の用途に応じて色彩や材質を適宜選択することができる。具体的には、色材として、顔料、染料及び天然色素の何れをも使用することができるが、カラーフィルタ用途には高い色純度、輝度、コントラスト等が求められることから、顔料及び/又は染料が 好ましい。
<Color material>
In the present disclosure, the coloring material (coloring agent) may be any as long as it has coloring properties, and the color and material can be appropriately selected according to the use of the color filter and the like. Specifically, any of pigments, dyes and natural dyes can be used as the coloring material, but since high color purity, brightness, contrast and the like are required for color filter applications, pigments and / or dyes Is preferable.
 上記顔料としては、有機顔料、無機顔料のいずれでもよく、有機顔料としては、例えば、カラーインデックス(C.I.;The Society of Dyers and Colourists 社発行)においてピグメントに分類されている化合物が挙げられる。具体的には、下記のようなカラーインデックス(C.I.)名が付されているものを挙げることができる。 The pigment may be either an organic pigment or an inorganic pigment, and examples of the organic pigment include compounds classified as pigments in the Color Index (CI; The Society of Dyers and Colorists). .. Specifically, those having the following color index (CI) names can be mentioned.
 C.I.ピグメントイエロー1、C.I.ピグメントイエロー3、C.I.ピグメントイエロー12、C.I.ピグメントイエロー13、C.I.ピグメントイエロー14、C.I.ピグメントイエロー16、C.I.ピグメントイエロー17、C.I.ピグメントイエロー20、 C.I.ピグメントイエロー24、C.I.ピグメントイエロー31、C.I.ピグメントイエロー55、C.I.ピグメントイエロー83、C.I.ピグメントイエロー86、C.I.ピグメントイエロー93、 C.I.ピグメントイエロー94、C.I.ピグメントイエロー109、C.I.ピグメントイエロー110、C.I.ピグメントイエロー117、C.I.ピグメントイエロー125、C.I.ピグメントイエロー137、C.I.ピグメントイエロー138、C.I.ピグメントイエロー139、C.I.ピグメントイエロー147、C.I.ピグメントイエロー148、C.I.ピグメントイエロ ー150、C.I.ピグメントイエロー153、C.I.ピグメントイエロー154、C .I.ピグメントイエロー155、C.I.ピグメントイエロー166、C.I.ピグメ ントイエロー168、C.I.ピグメントイエロー180、C.I.ピグメントイエロー194、C.I.ピグメントイエロー211、C.I.ピグメントイエロー214などの黄色顔料。 C. I. Pigment Yellow 1, C.I. I. Pigment Yellow 3, C.I. I. Pigment Yellow 12, C.I. I. Pigment Yellow 13, C.I. I. Pigment Yellow 14, C.I. I. Pigment Yellow 16, C.I. I. Pigment Yellow 17, C.I. I. Pigment Yellow 20, C.I. I. Pigment Yellow 24, C.I. I. Pigment Yellow 31, C.I. I. Pigment Yellow 55, C.I. I. Pigment Yellow 83, C.I. I. Pigment Yellow 86, C.I. I. Pigment Yellow 93, C.I. I. Pigment Yellow 94, C.I. I. Pigment Yellow 109, C.I. I. Pigment Yellow 110, C.I. I. Pigment Yellow 117, C.I. I. Pigment Yellow 125, C.I. I. Pigment Yellow 137, C.I. I. Pigment Yellow 138, C.I. I. Pigment Yellow 139, C.I. I. Pigment Yellow 147, C.I. I. Pigment Yellow 148, C.I. I. Pigment Yellow 150, C.I. I. Pigment Yellow 153, C.I. I. Pigment Yellow 154, C.I. I. Pigment Yellow 155, C.I. I. Pigment Yellow 166, C.I. I. Pigment Yellow 168, C.I. I. Pigment Yellow 180, C.I. I. Pigment Yellow 194, C.I. I. Pigment Yellow 211, C.I. I. Pigment Yellow 214 and other yellow pigments.
 C.I.ピグメントオレンジ5、C.I.ピグメントオレンジ13、C.I.ピグメント オレンジ14、C.I.ピグメントオレンジ24、C.I.ピグメントオレンジ31、C.I.ピグメントオレンジ34、C.I.ピグメントオレンジ36、C.I.ピグメントオレンジ38、C.I.ピグメント オレンジ40、C.I.ピグメント オレンジ42、C.I.ピグメントオレンジ43、C.I.ピグメントオレンジ46、C .I.ピグメントオレンジ49、C .I.ピグメントオレンジ51、C .I.ピグメントオレンジ55、C .I.ピグメントオレンジ59、C.I.ピグメントオレンジ61、C.I.ピグメントオレンジ64、C.I.ピグメントオレンジ65、C.I.ピグメントオレンジ68、C.I.ピグメントオレンジ70、C .I.ピグメントオレンジ71、C.I.ピグメントオレンジ72、C.I.ピグメント オレンジ73、C.I.ピグメントオレンジ74などのオレンジ色の顔料。 C. I. Pigment Orange 5, C.I. I. Pigment Orange 13, C.I. I. Pigment Orange 14, C.I. I. Pigment Orange 24, C.I. I. Pigment Orange 31, C.I. I. Pigment Orange 34, C.I. I. Pigment Orange 36, C.I. I. Pigment Orange 38, C.I. I. Pigment Orange 40, C.I. I. Pigment Orange 42, C.I. I. Pigment Orange 43, C.I. I. Pigment Orange 46, C.I. I. Pigment Orange 49, C.I. I. Pigment Orange 51, C.I. I. Pigment Orange 55, C.I. I. Pigment Orange 59, C.I. I. Pigment Orange 61, C.I. I. Pigment Orange 64, C.I. I. Pigment Orange 65, C.I. I. Pigment Orange 68, C.I. I. Pigment Orange 70, C.I. I. Pigment Orange 71, C.I. I. Pigment Orange 72, C.I. I. Pigment Orange 73, C.I. I. An orange pigment such as Pigment Orange 74.
 C.I.ピグメントレッド1、C.I.ピグメントレッド2、C.I.ピグメントレッド5、C.I.ピグメントレッド9、C.I.ピグメントレッド17、C.I.ピグメントレッド31、C.I.ピグメントレッド32、C.I.ピグメントレッド41、C.I.ピグメントレッド97、C.I.ピグメントレッド105、C.I.ピグメントレッド122、C.I.ピグメントレッド123、C.I.ピグメントレッド144、C.I.ピグメントレッド149、C.I.ピグメントレッド166、C.I.ピグメントレッド168、C.I.ピグメントレッド170、C.I.ピグメントレッド171、C.I.ピグメントレッド175、C.I.ピグメントレッド176、C.I.ピグメントレッド177、C.I.ピグメントレッド178、C.I.ピグメントレッド179、C.I.ピグメントレッド180、C.I.ピグメントレッド185、C.I.ピグメントレッド187、C.I.ピグメントレッド192、C.I.ピグメントレッド202、C.I.ピグメントレッド206、C.I.ピグメントレッド207、C.I.ピグメントレッド209、C.I.ピグメントレッド214、C.I.ピグメントレッド215、C.I.ピグメントレッド216、C.I.ピグメントレッド220、C.I.ピグメントレッド221、C.I.ピグメントレッド224、C.I.ピグメントレッド242、C.I.ピグメントレッド243、C.I.ピグメントレッド254、C.I.ピグメントレッド255、C.I.ピグメントレッド262、C.I.ピグメントレッド264、C.I.ピグメントレッド265、C.I.ピグメントレッド272などの赤色顔料。 C. I. Pigment Red 1, C.I. I. Pigment Red 2, C.I. I. Pigment Red 5, C.I. I. Pigment Red 9, C.I. I. Pigment Red 17, C.I. I. Pigment Red 31, C.I. I. Pigment Red 32, C.I. I. Pigment Red 41, C.I. I. Pigment Red 97, C.I. I. Pigment Red 105, C.I. I. Pigment Red 122, C.I. I. Pigment Red 123, C.I. I. Pigment Red 144, C.I. I. Pigment Red 149, C.I. I. Pigment Red 166, C.I. I. Pigment Red 168, C.I. I. Pigment Red 170, C.I. I. Pigment Red 171 and C.I. I. Pigment Red 175, C.I. I. Pigment Red 176, C.I. I. Pigment Red 177, C.I. I. Pigment Red 178, C.I. I. Pigment Red 179, C.I. I. Pigment Red 180, C.I. I. Pigment Red 185, C.I. I. Pigment Red 187, C.I. I. Pigment Red 192, C.I. I. Pigment Red 202, C.I. I. Pigment Red 206, C.I. I. Pigment Red 207, C.I. I. Pigment Red 209, C.I. I. Pigment Red 214, C.I. I. Pigment Red 215, C.I. I. Pigment Red 216, C.I. I. Pigment Red 220, C.I. I. Pigment Red 221 and C.I. I. Pigment Red 224, C.I. I. Pigment Red 242, C.I. I. Pigment Red 243, C.I. I. Pigment Red 254, C.I. I. Pigment Red 255, C.I. I. Pigment Red 262, C.I. I. Pigment Red 264, C.I. I. Pigment Red 265, C.I. I. Red pigments such as Pigment Red 272.
 C.I.ピグメントバイオレット1、C.I.ピグメントバイオレット19、C.I.ピ グメントバイオレット23、C.I.ピグメントバイオレット29、C.I.ピグメント バイオレット32、C.I.ピグメントバイオレット36、C.I.ピグメントバイオレ ット38などのバイオレット色顔料。 C. I. Pigment Violet 1, C.I. I. Pigment Violet 19, C.I. I. Pigment Violet 23, C.I. I. Pigment Violet 29, C.I. I. Pigment Violet 32, C.I. I. Pigment Violet 36, C.I. I. Violet color pigments such as Pigment Violet 38.
 C.I.ピグメントブルー15、C.I.ピグメントブルー15:3、C.I.ピグメン トブルー15:4、C.I.ピグメントブルー15:6、C.I.ピグメントブルー60 、C.I.ピグメントブルー80などの青色顔料。 C. I. Pigment Blue 15, C.I. I. Pigment Blue 15: 3, C.I. I. Pigment Blue 15: 4, C.I. I. Pigment Blue 15: 6, C.I. I. Pigment Blue 60, C.I. I. Blue pigments such as Pigment Blue 80.
 C.I.ピグメントグリーン7、C.I.ピグメントグリーン36、C.I.ピグメント グリーン58などの緑色顔料。 C. I. Pigment Green 7, C.I. I. Pigment Green 36, C.I. I. Pigment Green 58 and other green pigments.
 C.I.ピグメントブラウン23、C.I.ピグメントブラウン25などのブラウン色顔料。 C. I. Pigment Brown 23, C.I. I. A brown pigment such as Pigment Brown 25.
 C.I.ピグメントブラック1、C.I.ピグメントブラック7などの黒色顔料。 C. I. Pigment Black 1, C.I. I. Black pigments such as Pigment Black 7.
 また、上記無機顔料としては、例えば、酸化チタン、硫酸バリウム、炭酸カルシウム、亜鉛華、硫酸鉛、黄色鉛、亜鉛黄、べんがら(赤色酸化鉄(III))、カドミウム赤、群青、紺青、酸化クロム緑、コバルト緑、アンバー、チタンブラック、合成鉄黒、カーボンブラック等を挙げることができる。 Examples of the inorganic pigment include titanium oxide, barium sulfate, calcium carbonate, zinc flower, lead sulfate, yellow lead, zinc yellow, red iron oxide (III), cadmium red, ultramarine blue, dark blue, and chromium oxide. Examples thereof include green, cobalt green, amber, titanium black, synthetic iron black, and carbon black.
 本開示においては、顔料を、再結晶法、再沈殿法、溶剤洗浄法、昇華法、真空加熱法又はこれらの組み合わせにより精製して使用することもできる。また、顔料は、その粒子表面を樹脂で改質して使用してもよい。 In the present disclosure, the pigment can also be purified and used by a recrystallization method, a reprecipitation method, a solvent cleaning method, a sublimation method, a vacuum heating method, or a combination thereof. Further, the pigment may be used by modifying the surface of the particles with a resin.
 また、上記染料としては、各種の油溶性染料、直接染料、酸性染料、金属錯体染料等の中から適宜選択することができ、例えば、下記のようなカラーインデックス(C.I.)名が付されているものを挙げることができる。 Further, the dye can be appropriately selected from various oil-soluble dyes, direct dyes, acid dyes, metal complex dyes and the like, and for example, the following color index (CI) names are given. You can list what has been done.
 C.I.ソルベントイエロー4、C.I.ソルベントイエロー14、C.I.ソルベント イエロー15、C.I.ソルベントイエロー24、C.I.ソルベントイエロー82、C.I.ソルベントイエロー88、C.I.ソルベントイエロー94、C.I.ソルベント イエロー98、C.I.ソルベントイエロー162、C.I.ソルベントイエロー179、C.I.アシッドイエロー17、C.I.アシッドイエロー29、C.I.アシッドイエロー40、C.I.アシッドイエロー76などの黄色染料。 C. I. Solvent Yellow 4, C.I. I. Solvent Yellow 14, C.I. I. Solvent Yellow 15, C.I. I. Solvent Yellow 24, C.I. I. Solvent Yellow 82, C.I. I. Solvent Yellow 88, C.I. I. Solvent Yellow 94, C.I. I. Solvent Yellow 98, C.I. I. Solvent Yellow 162, C.I. I. Solvent Yellow 179, C.I. I. Acid Yellow 17, C.I. I. Acid Yellow 29, C.I. I. Acid Yellow 40, C.I. I. Yellow dyes such as Acid Yellow 76.
 C.I.ソルベントオレンジ2、C.I.ソルベントオレンジ7、C.I.ソルベントオ レンジ11、C.I.ソルベントオレンジ15、C.I.ソルベントオレンジ26、C.I.ソルベントオレンジ56、C.I.アシッドオレンジ51、C.I.アシッドオレンジ63などのオレンジ色染料。 C. I. Solvent Orange 2, C.I. I. Solvent Orange 7, C.I. I. Solvent Orange 11, C.I. I. Solvent Orange 15, C.I. I. Solvent Orange 26, C.I. I. Solvent Orange 56, C.I. I. Acid Orange 51, C.I. I. An orange dye such as Acid Orange 63.
 C.I.ソルベントレッド45、C.I.ソルベントレッド49、C.I.アシッドレッド91、C.I.アシッドレッド92、C.I.アシッドレッド97、C.I.アシッドレッド114、C.I.アシッドレッド138、C.I.アシッドレッド151などの赤色染料。 C. I. Solvent Red 45, C.I. I. Solvent Red 49, C.I. I. Acid Red 91, C.I. I. Acid Red 92, C.I. I. Acid Red 97, C.I. I. Acid Red 114, C.I. I. Acid Red 138, C.I. I. Red dyes such as Acid Red 151.
 C.I.ソルベントブルー35、C.I.ソルベントブルー37、C.I.ソルベントブ ルー59、C.I.ソルベントブルー67、C.I.アシッドブルー80、C.I.アシッドブルー83、C.I.アシッドブルー9 0などの青色染料。 C. I. Solvent Blue 35, C.I. I. Solvent Blue 37, C.I. I. Solvent Blue 59, C.I. I. Solvent Blue 67, C.I. I. Acid Blue 80, C.I. I. Acid Blue 83, C.I. I. Blue dyes such as Acid Blue 90.
 C.I.アシッドグリーン9、C.I.アシッドグリーン16、C.I.アシッドグリー ン25、C.I.アシッドグリーン27などの緑色染料。 C. I. Acid Green 9, C.I. I. Acid Green 16, C.I. I. Acid Green 25, C.I. I. Green dyes such as Acid Green 27.
 本開示において色材は、単独で又は2種以上を混合して使用することができる。 In the present disclosure, the coloring material can be used alone or in combination of two or more.
 感光性樹脂組成物の固形分に対する色材の含有量は、特に限定されないが、例えば3~50重量%が好ましく、より好ましくは5~30重量%である。ここで「固形分」とは、例えば上述の溶媒以外の成分である。 The content of the coloring material with respect to the solid content of the photosensitive resin composition is not particularly limited, but is preferably 3 to 50% by weight, more preferably 5 to 30% by weight, for example. Here, the "solid content" is, for example, a component other than the above-mentioned solvent.
 本開示において色材として顔料を使用する場合、所望により、顔料分散剤、顔料分散助剤と共に使用することができる。上記顔料分散剤としては、例えば、カチオン系、アニオン系、ノニオン系、両性などの分散剤(界面活性剤);アクリル系共重合体、ポリエステル、ポリウレタン、ポリエチレンイミン、ポリアリルアミンなどのポリマー分散剤を挙げることができる。 When a pigment is used as a coloring material in the present disclosure, it can be used together with a pigment dispersant and a pigment dispersion aid, if desired. Examples of the pigment dispersant include cationic, anionic, nonionic, and amphoteric dispersants (surfactants); polymer dispersants such as acrylic copolymers, polyesters, polyurethanes, polyethyleneimine, and polyallylamines. Can be mentioned.
 上記顔料分散剤は、市販のものを使用でき、例えば、アクリル系共重合体として、Disperbyk-2000、Disperbyk-2001、BYK-LPN6919、BYK-LPN21116(以上、ビックケミー(BYK)社製)、ポリエステルとして、アジスパーPB821、アジスパーPB822、アジスパーPB880(味の素ファインテクノ株式会社製)、ポリウレタンとして、Disperbyk-161、Disperbyk-162、Disperbyk-165、Disperbyk-167、Disperbyk-170、Disperbyk-182(以上、ビックケミー(BYK)社製)、ソルスパース76500(ルーブリゾール(株)社製)、ポリエチレンイミンとして、ソルスパース24000(ルーブリゾール(株)社製)等を挙げることができる。 Commercially available pigment dispersants can be used. For example, as an acrylic copolymer, Disperbyk-2000, Disperbyk-2001, BYK-LPN6919, BYK-LPN21116 (all manufactured by Big Chemie (BYK)), as polyester. , Ajisper PB821, Ajisper PB822, Ajisper PB880 (manufactured by Ajinomoto Fine-Techno Co., Ltd.), as polyurethane, Disperbyk-161, Disperbyk-162, Disperbyk-165, Disperbyk-167, Disperbyk-170, Disperbyk-170, Disperbyk-170 ), Solsperse 76500 (manufactured by Lubrizol Co., Ltd.), and as polyethyleneimine, Solsperse 24000 (manufactured by Lubrizol Co., Ltd.) and the like can be mentioned.
 これらの顔料分散剤は、単独で又は2種以上を混合して使用することができる。顔料分散剤の含有量は、顔料100重量部に対して、通常、100重量部以下、好ましくは1~70重量部、より好ましくは10~70重量部、さらに好ましくは30~60重量部である。顔料分散剤の含有量が上記の範囲にあると、均一な分散状態の顔料分散液が得られる傾向があるため好ましい。 These pigment dispersants can be used alone or in combination of two or more. The content of the pigment dispersant is usually 100 parts by weight or less, preferably 1 to 70 parts by weight, more preferably 10 to 70 parts by weight, still more preferably 30 to 60 parts by weight, based on 100 parts by weight of the pigment. .. When the content of the pigment dispersant is in the above range, a pigment dispersion liquid in a uniformly dispersed state tends to be obtained, which is preferable.
 上記顔料分散助剤としては、例えば、顔料誘導体を挙げることができ、具体的には、銅フタロシアニン、ジケトピロロピロール、キノフタロンのスルホン酸誘導体等を挙げることができる。顔料分散助剤の含有量は、本開示に係る発明の目的を阻害しない範囲内で適宜決定できる。 Examples of the pigment dispersion aid include pigment derivatives, and specific examples thereof include sulfonic acid derivatives of copper phthalocyanine, diketopyrrolopyrrole, and quinophthalone. The content of the pigment dispersion aid can be appropriately determined within a range that does not impair the object of the invention according to the present disclosure.
<光重合性化合物>
 本開示において、光重合性化合物としては、特に限定されないが、例えば、多官能ビニル化合物、多官能チオール化合物、多官能エポキシ化合物が挙げられる。
<Photopolymerizable compound>
In the present disclosure, the photopolymerizable compound is not particularly limited, and examples thereof include a polyfunctional vinyl compound, a polyfunctional thiol compound, and a polyfunctional epoxy compound.
 多官能ビニル化合物としては、ビニル基を2個以上有する化合物であれば特に限定されないが、例えば、エチレングリコール、プロピレングリコール等のアルキレングリコールのジ(メタ)アクリレート;ポリエチレングリコール、ポリプロピレングリコール等のポリアルキレングリコールのジ(メタ)アクリレート;両末端ヒドロキシポリブタジエン、両末端ヒドロキシポリイソプレン、両末端ヒドロキシポリカプリラクトン等の両末端ヒドロキシル化重合体のジ(メタ)アクリレート;グリセリン、1,2,4,-ブタントリオール、トリメチロールアルカン、テトラメチロールアルカン、ペンタエリスリトール、ジペンタエリスリトール等の3価以上の多価アルコールのポリ(メタ)アクリレート;3価以上の多価アルコールのポリアルキレングリコール付加物のポリ(メタ)アクリレート;1,4-シクロヘキサンジオール、1,4-ベンゼンジオール等の環式ポリオールのポリ(メタ)アクリレート;ポリエステル(メタ)アクリレート、エポキシ(メタ)アクリレート、ウレタン(メタ)アクリレート、シリコーン樹脂(メタ)アクリレート等のオリゴ(メタ)アクリレート等が挙げられる。これらの中でも、(メタ)アクリロイル基を2以上有する多官能(メタ)アクリレートが好ましい。多官能ビニル化合物は、単独で又は2種以上を組み合わせて使用できる。 The polyfunctional vinyl compound is not particularly limited as long as it is a compound having two or more vinyl groups, but for example, a di (meth) acrylate of an alkylene glycol such as ethylene glycol or propylene glycol; a polyalkylene such as polyethylene glycol or polypropylene glycol. Di (meth) acrylate of glycol; di (meth) acrylate of both-terminal hydroxylated polymers such as both-terminal hydroxypolybutadiene, both-terminal hydroxypolyisoprene, and both-terminal hydroxypolycaprilactone; glycerin, 1,2,4-butane. Poly (meth) acrylates of trihydric or higher polyhydric alcohols such as triol, trimethylol alkane, tetramethylol alkane, pentaerythritol, dipentaerythritol; poly (meth) of polyalkylene glycol adducts of trihydric or higher polyhydric alcohols. Acrylate: Poly (meth) acrylate of cyclic polyols such as 1,4-cyclohexanediol and 1,4-benzenediol; polyester (meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, silicone resin (meth) Examples thereof include oligo (meth) acrylates such as acrylates. Among these, polyfunctional (meth) acrylates having two or more (meth) acryloyl groups are preferable. The polyfunctional vinyl compound can be used alone or in combination of two or more.
 多官能チオール化合物としては、チオール基を2個以上有する化合物であれば特に限定されないが、例えば、ヘキサンジチオール、デカンジチオール、1,4-ブタンジオールビスチオプロピオネート、1,4-ブタンジオールビスチオグリコレート、エチレングリコールビスチオグリコレート、エチレングリコールビスチオプロピオネート、トリメチロールプロパントリスチオグリコレート、トリメチロールプロパントリスチオプロピオネート、トリメチロールプロパントリス(3-メルカプトブチレート)、ペンタエリスリトールテトラキスチオグリコレート、ペンタエリスリトールテトラキスチオプロピオネート、トリメルカプトプロピオン酸トリス(2-ヒドロキシエチル)イソシアヌレート、1,4-ジメチルメルカプトベンゼン、2、4、6-トリメルカプト-s-トリアジン、2-(N,N-ジブチルアミノ)-4,6-ジメルカプト-s-トリアジン、テトラエチレングリコールビス3-メルカプトプロピオネート、トリメチロールプロパントリス3-メルカプトプロピオネート、トリス(3-メルカプトプロピニルオキシエチル)イソシアヌレート、ペンタエリスリトールテトラキス3-メルカプトプロピオネート、ジペンタエリスリトールテトラキス3-メルカプトプロピオネート、1,4-ビス(3-メルカプトブチリルオキシ)ブタン、1,3,5-トリス(3-メルカブトブチルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン、ペンタエリスリトールテトラキス(3-メルカプトブチレート)等が挙げられる。多官能チオール化合物は、単独で又は2種以上を組み合わせて使用できる。 The polyfunctional thiol compound is not particularly limited as long as it is a compound having two or more thiol groups, and for example, hexanedithiol, decandithiol, 1,4-butanediol bisthiopropionate, and 1,4-butanediol bis. Thioglycolate, Ethylene Glycol Bisthioglycolate, Ethylene Glycol Bisthiopropionate, Trimethylol Propantris Thiolthioglycolate, Trimethylol Propantris Thiopropionate, Trimethylol Propantris (3-mercaptobutyrate), Pentaerythritol Tetrakissthioglycolate, pentaerythritol tetraxthiopropionate, tristrimercaptopropionate (2-hydroxyethyl) isocyanurate, 1,4-dimethylmercaptobenzene, 2,4,6-trimercapto-s-triazine, 2- (N, N-dibutylamino) -4,6-dimercapto-s-triazine, tetraethylene glycol bis3-mercaptopropionate, trimethylpropanthris 3-mercaptopropionate, tris (3-mercaptopropynyloxyethyl) Isocyanurate, pentaerythritol tetrakis 3-mercaptopropionate, dipentaerythritol tetrakis 3-mercaptopropionate, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mel) Kabutobutyloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, pentaerythritol tetrakis (3-mercaptobutylate) and the like can be mentioned. The polyfunctional thiol compound can be used alone or in combination of two or more.
 多官能エポキシ化合物としては、エポキシ基を2個以上有する化合物であれば特に限定されないが、例えば、グリシジルエーテル型エポキシ化合物[ポリヒドロキシ化合物(ビスフェノール類、多価フェノール類、脂環式多価アルコール類、脂肪族多価アルコール類等)とエピクロルヒドリンとの反応により生成するグリシジルエーテル類(例えば、エチレングリコールジグリシジルエーテル、ジエチレングリコールジグリシジルエーテル、ポリエチレングリコールジグリシジルエーテル等の(ポリ)C2-4アルキレングリコールジグリシジルエーテル;レゾルシン、ヒドロキノン等の多価フェノール類のジグリシジルエーテル;シクロヘキサンジオール、シクロヘキサンジメタノール、水添ビスフェノール類等の脂環式多価アルコール類のジグリシジルエーテル;ビスフェノール類(4,4’-ジヒドロキシビフェニル、ビスフェノールA等のビス(ヒドロキシフェニル)アルカン類等)又はそのC2-3アルキレンオキサイド付加体のジグリシジルエーテル等)、ノボラック型エポキシ樹脂(フェノールノボラック型又はクレゾールノボラック型エポキシ樹脂等)等]、グリシジルエステル型エポキシ化合物、脂環族エポキシ化合物(又は環状脂肪族エポキシ樹脂)、複素環式エポキシ樹脂(トリグリシジルイソシアヌレート(TGIC)、ヒダントイン型エポキシ樹脂等)、グリシジルアミン型エポキシ化合物[アミン類とエピクロルヒドリンとの反応生成物、例えば、N-グリシジル芳香族アミン{テトラグリシジルジアミノジフェニルメタン(TGDDM)、トリグリシジルアミノフェノール(TGPAP、TGMAP等)、ジグリシジルアニリン(DGA)、ジグリシジルトルイジン(DGT)、テトラグリシジルキシリレンジアミン(TGMXA等)等}、N-グリシジル脂環族アミン(テトラグリシジルビスアミノシクロヘキサン等)等]等が挙げられる。多官能エポキシ化合物は、単独で又は2種以上を組み合わせて使用できる。 The polyfunctional epoxy compound is not particularly limited as long as it is a compound having two or more epoxy groups, and for example, a glycidyl ether type epoxy compound [polyhydroxy compounds (bisphenols, polyhydric phenols, alicyclic polyhydric alcohols) , Aliper polyhydric alcohols, etc.) and glycidyl ethers produced by the reaction with epichlorohydrin (for example, (poly) C 2-4 alkylene glycols such as ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, etc. Diglycidyl ether; Diglycidyl ether of polyvalent phenols such as resorcin and hydroquinone; Diglycidyl ether of alicyclic polyvalent alcohols such as cyclohexanediol, cyclohexanedimethanol, hydrogenated bisphenols; bisphenols (4,4') -Bis (hydroxyphenyl) alkanes such as dihydroxybiphenyl and bisphenol A) or diglycidyl ether of C 2-3 alkylene oxide adduct thereof), novolac type epoxy resin (phenol novolac type or cresol novolac type epoxy resin, etc.) Etc.], glycidyl ester type epoxy compound, alicyclic epoxy compound (or cyclic aliphatic epoxy resin), heterocyclic epoxy resin (triglycidyl isocyanurate (TGIC), hydrantin type epoxy resin, etc.), glycidylamine type epoxy compound [ Reaction products of amines and epichlorohydrins, such as N-glycidyl aromatic amines {tetraglycidyl diaminodiphenylmethane (TGDDM), triglycidyl aminophenols (TGPAP, TGMAP, etc.), diglycidyl aniline (DGA), diglycidyl toluidine (DGT). ), Tetraglycidyl xylylene diamine (TGMXA, etc.), etc.}, N-glycidyl alicyclic amine (tetraglycidyl bisaminocyclohexane, etc.), etc.] and the like. The polyfunctional epoxy compound can be used alone or in combination of two or more.
 光重合性化合物は、単独で又は2種以上を混合して使用することができる。光重合性化合物の含有量は、前記アルカリ可溶性樹脂100重量部に対して、通常、10~300重量部、好ましくは30~200重量部、より好ましくは40~150重量部である。また、感光性樹脂組成物が色材を含む場合、光重合性化合物の含有量は、前記色材100重量部に対して、通常、10~1000重量部、好ましくは50~600重量部、より好ましくは100~500重量部である。光重合性化合物の含有量が上記の範囲であると、硬化が十分に起こり、良好な密着性が得られる。 The photopolymerizable compound can be used alone or in combination of two or more. The content of the photopolymerizable compound is usually 10 to 300 parts by weight, preferably 30 to 200 parts by weight, and more preferably 40 to 150 parts by weight with respect to 100 parts by weight of the alkali-soluble resin. When the photosensitive resin composition contains a coloring material, the content of the photopolymerizable compound is usually 10 to 1000 parts by weight, preferably 50 to 600 parts by weight, based on 100 parts by weight of the coloring material. It is preferably 100 to 500 parts by weight. When the content of the photopolymerizable compound is in the above range, curing sufficiently occurs and good adhesion can be obtained.
<光重合開始剤>
 本開示において、光重合開始剤としては、特に限定されないが、光ラジカル重合開始剤、光カチオン重合開始剤が挙げられる。
<Photopolymerization initiator>
In the present disclosure, the photopolymerization initiator is not particularly limited, and examples thereof include a photoradical polymerization initiator and a photocationic polymerization initiator.
 光ラジカル重合開始剤は、光の照射によってラジカルを発生して、感光性樹脂組成物に含まれる光重合性化合物の硬化反応(ラジカル重合)を開始させる化合物である。光ラジカル重合開始剤は、単独で又は2種以上を混合して使用することができる。 The photoradical polymerization initiator is a compound that generates radicals by irradiation with light to initiate a curing reaction (radical polymerization) of the photopolymerizable compound contained in the photosensitive resin composition. The photoradical polymerization initiator can be used alone or in combination of two or more.
 光ラジカル重合開始剤としては、例えば、チオキサントン系化合物、アセトフェノン系化合物、ビイミダゾール系化合物、トリアジン系化合物、オキシム系化合物、オニウム塩系化合物、ベンゾイン系化合物、ベンゾフェノン系化合物、α-ジケトン系化合物、多核キノン系化合物、ジアゾ系化合物、イミドスルホナート系化合物、アントラセン系化合物等を挙げることができる。 Examples of the photoradical polymerization initiator include thioxanthone compounds, acetophenone compounds, biimidazole compounds, triazine compounds, oxime compounds, onium salt compounds, benzoin compounds, benzophenone compounds, α-diketone compounds, and the like. Examples thereof include polynuclear quinone compounds, diazo compounds, imide sulfonate compounds, anthracene compounds and the like.
 前記チオキサントン系化合物としては、例えば、チオキサントン、2-クロロチオキサントン、2-メチルチオキサントン、2-イソプロピルチオキサントン、4-イソプロピルチオキサントン、2,4-ジメチルチオキサントン、2,4-ジエチルチオキサントン、2,4-ジイソプロピルチオキサントン、2,4-ジクロロチオキサントン、1-クロロ-4-プロポキシチオキサントンなどが挙げられる。  Examples of the thioxanthone-based compound include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, and 2,4-diisopropyl. Examples thereof include thioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone and the like.
 前記アセトフェノン系化合物としては、例えば、ジエトキシアセトフェノン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、ベンジルジメチルケタール、2-ヒドロキシ-1-〔4-(2-ヒドロキシエトキシ)フェニル〕-2-メチルプロパン-1-オン、1-ヒドロキシシクロヘキシルフェニルケトン、2-メチル-1-(4-メチルチオフェニル)-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)ブタン-1-オン、2-(2-メチルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(3-メチルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(4-メチルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-エチルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-プロピルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-ブチルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2,3-ジメチルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2、4-ジメチルベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-クロロベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-( 2-ブロモベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(3-クロロベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(4-クロロベンジル)-2-ジメチルアミノ-1-(4-モルホリ ノフェニル)-ブタノン、2-(3-ブロモベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(4-ブロモベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-メトキシベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(3-メトキシベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(4-メトキシベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-メチル-4-メトキシベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-メチル-4-ブロモベンジル)-2-ジメチルアミ ノ-1-(4-モルホリノフェニル)-ブタノン、2-(2-ブロモ-4-メトキシベンジル)-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン、2-ヒドロキシ-2-メチル-1-〔4-(1-メチルビニル)フェニル〕プロパン-1-オンのオリゴマーなどが挙げられる。 Examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylketal, and 2-hydroxy-1- [4- (2-hydroxyethoxy) phenyl. ] -2-Methylpropane-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1 -(4-Molholinophenyl) butane-1-one, 2- (2-methylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-methylbenzyl) -2-dimethyl Amino-1- (4-morpholinophenyl) -butanone, 2- (4-methylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-ethylbenzyl) -2-dimethyl Amino-1- (4-morpholinophenyl) -butanone, 2- (2-propylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-butylbenzyl) -2-dimethyl Amino-1- (4-morpholinophenyl) -butanone, 2- (2,3-dimethylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2,4-dimethylbenzyl) -2-Dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-chlorobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-bromobenzyl) -2-Dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-chlorobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-chlorobenzyl) -2-Dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-bromobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-bromobenzyl) -2-Dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-methoxybenzyl) -2-Dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl)- Butanone, 2- (2-methyl-4-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-methyl-4-bromobenzyl) -2-dimethylamino-1 -(4-Molholinophenyl) -butanone, 2- (2-bromo-4-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2-hydroxy-2-methyl-1-[ Examples thereof include 4- (1-methylvinyl) phenyl] propan-1-one oligomers.
 前記ビイミダゾール化合物としては、例えば、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール、2,2’-ビス(2,3-ジクロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(アルコキシフェニル)ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(ジアルコキシフェニル)ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(トリアルコキシフェニル)ビイミダゾール、4,4’5,5’-位のフェニル基がカルボアルコキシ基により置換されているイミダゾール化合物などが挙げられる。 Examples of the biimidazole compound include 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole and 2,2'-bis (2,3-dichlorophenyl)-. 4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2) -Chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (dialkoxyphenyl) Biimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (trialkoxyphenyl) biimidazole, phenyl group at 4,4'5,5'-position is carboalkoxy Examples include imidazole compounds substituted with groups.
 前記トリアジン系化合物としては、例えば、2,4-ビス(トリクロロメチル)-6-(4-メトキシフェニル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-(4-メトキシナフチル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-ピペロニル-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-(4-メトキシスチリル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(5-メチルフラン-2-イル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(フラン-2-イル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(4-ジエチルアミノ-2-メチルフェニル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(3,4-ジメトキシフェニル)エテニル〕-1,3,5-トリアジンなどが挙げられる。  Examples of the triazine-based compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6- (4). -Methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-) Methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2, 4-bis (trichloromethyl) -6- [2- (fran-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino) -2-Methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine And so on.
 前記オキシム化合物としては、O-エトキシカルボニル-α-オキシイミノ-1-フ ェニルプロパン-1-オンなどが挙げられる。 Examples of the oxime compound include O-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one.
 前記ベンゾイン系化合物としては、例えば、ベンゾイン、ベンゾインメチルエーテル 、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチル エーテルなどが挙げられる。 Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.
 前記ベンゾフェノン系化合物としては、例えば、ベンゾフェノン、o-ベンゾイル安 息香酸メチル、4-フェニルベンゾフェノン、4-ベンゾイル-4’-メチルジフェニル サルファイド、3,3’,4,4≡-テトラ(tert-ブチルパーオキシカルボニル) ベンゾフェノン、2,4,6-トリメチルベンゾフェノンなどが挙げられる。 Examples of the benzophenone compound include benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfate, 3,3', 4,4≡-tetra (tert-). Butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone and the like.
 前記アントラセン系化合物としては、例えば、9,10-ジメトキシアントラセン、 2-エチル-9,10-ジメトキシアントラセン、9,10-ジエトキシアントラセン、 2-エチル-9,10-ジエトキシアントラセンなどが挙げられる。 Examples of the anthracene-based compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl-9,10-diethoxyanthracene. ..
 前記光カチオン重合開始剤は、光の照射によって酸を発生して、感光性樹脂組成物に含まれる光重合性化合物の硬化反応(カチオン重合)を開始させる化合物であり、光を吸収するカチオン部と酸の発生源となるアニオン部からなる。光カチオン重合開始剤は、単独で又は2種以上を組み合わせて使用できる。 The photocationic polymerization initiator is a compound that generates an acid by irradiation with light to initiate a curing reaction (cationic polymerization) of the photopolymerizable compound contained in the photosensitive resin composition, and is a cation portion that absorbs light. It consists of an anion part that is a source of acid. The photocationic polymerization initiator can be used alone or in combination of two or more.
 光カチオン重合開始剤としては、例えば、ジアゾニウム塩系化合物、ヨードニウム塩系化合物、スルホニウム塩系化合物、ホスホニウム塩系化合物、セレニウム塩系化合物、オキソニウム塩系化合物、アンモニウム塩系化合物、臭素塩系化合物等を挙げることができる。 Examples of the photocationic polymerization initiator include diazonium salt compounds, iodonium salt compounds, sulfonium salt compounds, phosphonium salt compounds, selenium salt compounds, oxonium salt compounds, ammonium salt compounds, bromine salt compounds and the like. Can be mentioned.
 光カチオン重合開始剤のアニオン部としては、例えば、[(Y)sB(Phf)4-s-(式中、Yはフェニル基又はビフェニリル基を示す。Phfは水素原子の少なくとも1つが、パーフルオロアルキル基、パーフルオロアルコキシ基、及びハロゲン原子から選択される少なくとも1種で置換されたフェニル基を示す。sは0~3の整数である)、BF4 -、[(Rf)kPF6-k-(Rf:水素原子の80%以上がフッ素原子で置換されたアルキル基、k:0~5の整数)、AsF6 -、SbF6 -、SbF5OH-等を挙げることができる。 Examples of the anion portion of the photocationic polymerization initiator include [(Y) s B (Phf) 4-s ] - (in the formula, Y represents a phenyl group or a biphenylyl group. Phf has at least one hydrogen atom. perfluoroalkyl group, perfluoroalkoxy group, and .s illustrating a phenyl group substituted with at least one selected from halogen atom is an integer of 0 ~ 3), BF 4 - , [(Rf) k PF 6-k] - (Rf: alkyl group in which at least 80% are substituted with fluorine atoms of the hydrogen atom, k: 0 ~ 5 an integer), AsF 6 -, SbF 6 - and the like, etc. -, SbF 5 OH can.
 光カチオン重合開始剤としては、例えば、(4-ヒドロキシフェニル)メチルベンジルスルホニウム テトラキス(ペンタフルオロフェニル)ボレート、4-(4-ビフェニリルチオ)フェニル-4-ビフェニリルフェニルスルホニウム テトラキス(ペンタフルオロフェニル)ボレート、4-(フェニルチオ)フェニルジフェニルスルホニウム フェニルトリス(ペンタフルオロフェニル)ボレート、[4-(4-ビフェニリルチオ)フェニル]-4-ビフェニリルフェニルスルホニウム フェニルトリス(ペンタフルオロフェニル)ボレート、ジフェニル[4-(フェニルチオ)フェニル]スルホニウム トリス(ペンタフルオロエチル)トリフルオロホスフェート、ジフェニル[4-(フェニルチオ)フェニル]スルホニウム テトラキス(ペンタフルオロフェニル)ボレート、ジフェニル[4-(フェニルチオ)フェニル]スルホニウム ヘキサフルオロホスフェート、4-(4-ビフェニリルチオ)フェニル-4-ビフェニリルフェニルスルホニウム トリス(ペンタフルオロエチル)トリフルオロホスフェート、ビス[4-(ジフェニルスルホニオ)フェニル]スルフィド フェニルトリス(ペンタフルオロフェニル)ボレート、[4-(2-チオキサントニルチオ)フェニル]フェニル-2-チオキサントニルスルホニウム フェニルトリス(ペンタフルオロフェニル)ボレート、4-(フェニルチオ)フェニルジフェニルスルホニウム ヘキサフルオロアンチモネート等が挙げられる。 Examples of the photocationic polymerization initiator include (4-hydroxyphenyl) methylbenzyl sulfonium tetrakis (pentafluorophenyl) borate, 4- (4-biphenylylthio) phenyl-4-biphenylylphenyl sulfonium tetrakis (pentafluorophenyl). Borate, 4- (phenylthio) phenyldiphenylsulfonium phenyltris (pentafluorophenyl) borate, [4- (4-biphenylylthio) phenyl] -4-biphenylylphenylsulfonium phenyltris (pentafluorophenyl) borate, diphenyl [4 -(Phenylthio) phenyl] sulfonium tris (pentafluoroethyl) trifluorophosphate, diphenyl [4- (phenylthio) phenyl] sulfonium tetrakis (pentafluorophenyl) borate, diphenyl [4- (phenylthio) phenyl] sulfonium hexafluorophosphate, 4 -(4-Biphenylylthio) phenyl-4-biphenylylphenylsulfonium tris (pentafluoroethyl) trifluorophosphate, bis [4- (diphenylsulfonio) phenyl] sulfide phenyltris (pentafluorophenyl) borate, [4- (2-Thioxanthonylthio) phenyl] Phenyl-2-thioxanthonyl sulfonium phenyltris (pentafluorophenyl) borate, 4- (phenylthio) phenyldiphenylsulfonium hexafluoroantimonate and the like can be mentioned.
 光カチオン重合開始剤としては、商品名「サイラキュアUVI-6970」、「サイラキュアUVI-6974」、「サイラキュアUVI-6990」、「サイラキュアUVI-950」(以上、米国ユニオンカーバイド社製)、「Irgacure250」、「Irgacure261」、「Irgacure264」(以上、BASF社製)、「CG-24-61」(チバガイギー社製)、「オプトマーSP-150」、「オプトマーSP-151」、「オプトマーSP-170」、「オプトマーSP-171」(以上、(株)ADEKA製)、「DAICAT II」((株)ダイセル製)、「UVAC1590」、「UVAC1591」(以上、ダイセル・サイテック(株)製)、「CI-2064」、「CI-2639」、「CI-2624」、「CI-2481」、「CI-2734」、「CI-2855」、「CI-2823」、「CI-2758」、「CIT-1682」(以上、日本曹達(株)製)、「PI-2074」(ローディア社製、テトラキス(ペンタフルオロフェニル)ボレート トルイルクミルヨードニウム塩)、「FFC509」(3M社製)、「BBI-102」、「BBI-101」、「BBI-103」、「MPI-103」、「TPS-103」、「MDS-103」、「DTS-103」、「NAT-103」、「NDS-103」(以上、ミドリ化学(株)製)、「CD-1010」、「CD-1011」、「CD-1012」(以上、米国、Sartomer社製)、「CPI-100P」、「CPI-101A」(以上、サンアプロ(株)製)等の市販品を使用することができる。 Examples of the photocationic polymerization initiator include trade names "Cyracure UVI-6970", "Cyracure UVI-6974", "Cyracure UVI-6990", "Cyracure UVI-950" (manufactured by Union Carbide, USA), and "Irrage250". , "Irgacure 261", "Irgacure 264" (above, made by BASF), "CG-24-61" (made by Ciba Geigy), "Optomer SP-150", "Optomer SP-151", "Optomer SP-170", "Optomer SP-171" (above, manufactured by ADEKA Co., Ltd.), "DAICAT II" (manufactured by Daicel Co., Ltd.), "UVAC1590", "UVAC1591" (above, manufactured by Daicel Cytec Co., Ltd.), "CI-" 2064 "," CI-2739 "," CI-2624 "," CI-2481 "," CI-2734 "," CI-2855 "," CI-2823 "," CI-2758 "," CIT-1682 " (The above is manufactured by Nippon Sotatsu Co., Ltd.), "PI-2074" (manufactured by Rhodia, tetrakis (pentafluorophenyl) borate tolulucmiliodonium salt), "FFC509" (manufactured by 3M), "BBI-102", "BBI-101", "BBI-103", "MPI-103", "TPS-103", "MDS-103", "DTS-103", "NAT-103", "NDS-103" (above, Midori Chemical Co., Ltd.), "CD-1010", "CD-1011", "CD-1012" (above, manufactured by Sartomer, USA), "CPI-100P", "CPI-101A" (above, Sun Appro) Commercially available products such as (manufactured by Co., Ltd.) can be used.
 光重合開始剤の含有量(2種以上含有する場合はその総量)としては、感光性樹脂組成物に含まれる光重合性化合物(全量)100重量部に対して、例えば、0.1~100重量部、好ましくは0.5~50重量部、さらに好ましくは3~20重量部である。光重合開始剤の含有量が上記範囲を下回ると、硬化性が低下する傾向がある。一方、光重合開始剤の含有量が上記範囲を上回ると、硬化物が着色し易くなる傾向がある。 The content of the photopolymerization initiator (the total amount when two or more kinds are contained) is, for example, 0.1 to 100 with respect to 100 parts by weight of the photopolymerizable compound (total amount) contained in the photosensitive resin composition. It is by weight, preferably 0.5 to 50 parts by weight, more preferably 3 to 20 parts by weight. When the content of the photopolymerization initiator is less than the above range, the curability tends to decrease. On the other hand, when the content of the photopolymerization initiator exceeds the above range, the cured product tends to be easily colored.
<溶剤>
 溶剤としては、例えば、エーテル(ジエチルエーテル;エチレングリコールモノ又はジアルキルエーテル、ジエチレングリコールモノ又はジアルキルエーテル、プロピレングリコールモノ又はジアルキルエーテル、プロピレングリコールモノ又はジアリールエーテル、ジプロピレングリコールモノ又はジアルキルエーテル、トリプロピレングリコールモノ又はジアルキルエーテル、1,3-プロパンジオールモノ又はジアルキルエーテル、1,3-ブタンジオールモノ又はジアルキルエーテル、1,4-ブタンジオールモノ又はジアルキルエーテル、グリセリンモノ,ジ又はトリアルキルエーテル等のグリコールエーテル類等の鎖状エーテル;テトラヒドロフラン、ジオキサン等の環状エーテル等)、エステル(酢酸メチル、酢酸エチル、酢酸ブチル、酢酸イソアミル、乳酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、C5-6シクロアルカンジオールモノ又はジアセテート、C5-6シクロアルカンジメタノールモノ又はジアセテート等のカルボン酸エステル類;エチレングリコールモノアルキルエーテルアセテート、エチレングリコールモノ又はジアセテート、ジエチレングリコールモノアルキルエーテルアセテート、ジエチレングリコールモノ又はジアセテート、プロピレングリコールモノアルキルエーテルアセテート、プロピレングリコールモノ又はジアセテート、ジプロピレングリコールモノアルキルエーテルアセテート、ジプロピレングリコールモノ又はジアセテート、1,3-プロパンジオールモノアルキルエーテルアセテート、1,3-プロパンジオールモノ又はジアセテート、1,3-ブタンジオールモノアルキルエーテルアセテート、1,3-ブタンジオールモノ又はジアセテート、1,4-ブタンジオールモノアルキルエーテルアセテート、1,4-ブタンジオールモノ又はジアセテート、グリセリンモノ,ジ又はトリアセテート、グリセリンモノ又はジC1-4アルキルエーテルジ又はモノアセテート、トリプロピレングリコールモノアルキルエーテルアセテート、トリプロピレングリコールモノ又はジアセテート等のグリコールアセテート類又はグリコールエーテルアセテート類等)、ケトン(アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、3,5,5-トリメチル-2-シクロヘキセン-1-オン等)などが挙げられる。これらの溶剤は、単独で用いてもよく、2種以上を混合して用いてもよい。
<Solvent>
Examples of the solvent include ether (diethyl ether; ethylene glycol mono or dialkyl ether, diethylene glycol mono or dialkyl ether, propylene glycol mono or dialkyl ether, propylene glycol mono or diaryl ether, dipropylene glycol mono or dialkyl ether, tripropylene glycol mono. Or glycol ethers such as dialkyl ether, 1,3-propanediol mono or dialkyl ether, 1,3-butanediol mono or dialkyl ether, 1,4-butanediol mono or dialkyl ether, glycerin mono, di or trialkyl ether. Such as chain ethers; cyclic ethers such as tetrahydrofuran and dioxane), esters (methyl acetate, ethyl acetate, butyl acetate, isoamyl acetate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, C 5- Carous acid esters such as 6 cycloalkanediol mono or diacetate, C 5-6 cycloalkane dimethanol mono or diacetate; ethylene glycol monoalkyl ether acetate, ethylene glycol mono or diacetate, diethylene glycol monoalkyl ether acetate, diethylene glycol mono Or diacetate, propylene glycol monoalkyl ether acetate, propylene glycol mono or diacetate, dipropylene glycol monoalkyl ether acetate, dipropylene glycol mono or diacetate, 1,3-propanediol monoalkyl ether acetate, 1,3-propane Diol mono or diacetate, 1,3-butanediol monoalkyl ether acetate, 1,3-butanediol mono or diacetate, 1,4-butanediol monoalkyl ether acetate, 1,4-butanediol mono or diacetate, Glycerin mono, di or triacetate, glycerin mono or di C 1-4 alkyl ether di or monoacetate, tripropylene glycol monoalkyl ether acetate, glycol acetates such as tripropylene glycol mono or diacetate or glycol ether acetates, etc.), Examples thereof include ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, 3,5,5-trimethyl-2-cyclohexene-1-one, etc.). NS. These solvents may be used alone or in combination of two or more.
 本開示に係る感光性樹脂組成物は、上記成分以外にも、例えば、ノボラック樹脂、フェノール樹脂、イミド樹脂、カルボキシ基含有樹脂等の樹脂、硬化剤、硬化促進剤、添加剤(充填剤、消泡剤、難燃剤、酸化防止剤、紫外線吸収剤、着色剤、低応力化剤、可とう性付与剤、ワックス類、樹脂、架橋剤、ハロゲントラップ剤、レベリング剤、濡れ改良剤等)を含んでいてもよい。 In addition to the above components, the photosensitive resin composition according to the present disclosure includes, for example, resins such as novolak resin, phenol resin, imide resin, and carboxy group-containing resin, curing agents, curing accelerators, and additives (fillers, erasing agents). Contains foaming agents, flame retardants, antioxidants, UV absorbers, colorants, low stress agents, flexibility-imparting agents, waxes, resins, cross-linking agents, halogen trapping agents, leveling agents, wetting improvers, etc.) You may be.
 本開示に係る感光性樹脂組成物におけるアルカリ可溶性樹脂の濃度は、特に限定されないが、例えば、2~60重量%、好ましくは5~30重量%である。 The concentration of the alkali-soluble resin in the photosensitive resin composition according to the present disclosure is not particularly limited, but is, for example, 2 to 60% by weight, preferably 5 to 30% by weight.
 本開示の感光性樹脂組成物を調製する方法としては、例えば、溶剤に、アルカリ可溶性樹脂、光重合性化合物、光重合開始剤、及び必要によりその他の添加剤を溶解させる方法などが挙げられる。 Examples of the method for preparing the photosensitive resin composition of the present disclosure include a method of dissolving an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and if necessary, other additives in a solvent.
 本開示の感光性樹脂組成物が色材を含む場合、調製する方法としては、例えば、溶剤中において、必要に応じて顔料分散剤を併存させて、顔料などの色材を分散させて、色材分散液を調製し、別途、アルカリ可溶性樹脂、光重合性化合物、光重合開始剤、及び必要によりその他の添加剤を溶剤に溶解させ、これを前記の色材分散液と混合し、必要によりさらに溶剤を添加する方法などが挙げられる。 When the photosensitive resin composition of the present disclosure contains a coloring material, as a method for preparing the color material, for example, a pigment dispersant is coexisted in a solvent as necessary, and the coloring material such as a pigment is dispersed to color the color. A material dispersion is prepared, and separately, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and if necessary, other additives are dissolved in a solvent, which is mixed with the above-mentioned color material dispersion, and if necessary. Further, a method of adding a solvent and the like can be mentioned.
 本開示の感光性樹脂組成物は、通常、容器に封入して、流通、保管に供される。本開示の感光性樹脂組成物は、流通、保管に際し、保存安定性に優れる。 The photosensitive resin composition of the present disclosure is usually sealed in a container and used for distribution and storage. The photosensitive resin composition of the present disclosure is excellent in storage stability during distribution and storage.
<硬化物>
 本開示の感光性樹脂組成物を硬化させることにより諸物性に優れた硬化物が得られる。例えば、上記感光性樹脂組成物を、スピンコーター、ディップコーター、ローラコーター、スリットコーター等の慣用の塗布手段により、各種基材又は基板へ塗工して塗膜を形成した後、該塗膜を硬化させることにより硬化物を得ることができる。硬化は、例えば、感光性樹脂組成物に光照射及び/又は加熱処理を施すことにより行われる。
<Cured product>
By curing the photosensitive resin composition of the present disclosure, a cured product having excellent various physical properties can be obtained. For example, the photosensitive resin composition is applied to various substrates or substrates by a conventional coating means such as a spin coater, a dip coater, a roller coater, and a slit coater to form a coating film, and then the coating film is applied. A cured product can be obtained by curing. Curing is performed, for example, by subjecting the photosensitive resin composition to light irradiation and / or heat treatment.
 前記光照射は、例えば、水銀ランプ、キセノンランプ、カーボンアークランプ、メタルハライドランプ、太陽光、電子線源、レーザー光源、LED光源等を使用し、積算照射量が、例えば、500~5000mJ/cm2となる範囲で照射することが好ましい。 For the light irradiation, for example, a mercury lamp, a xenon lamp, a carbon arc lamp, a metal halide lamp, sunlight, an electron beam source, a laser light source, an LED light source, or the like is used, and the integrated irradiation amount is, for example, 500 to 5000 mJ / cm 2. It is preferable to irradiate in the range that becomes.
 前記加熱処理は、例えば60~300℃(好ましくは100~250℃)の温度で、例えば、1~120分間(好ましくは1~60分)加熱することが好ましい。 The heat treatment is preferably performed at a temperature of, for example, 60 to 300 ° C. (preferably 100 to 250 ° C.) for, for example, 1 to 120 minutes (preferably 1 to 60 minutes).
 基材又は基板としては、シリコンウエハー、金属、プラスチック、ガラス、セラミック等が挙げられる。硬化後の塗膜の厚みは、例えば、0.05~20μmが好ましく、より好ましくは0.1~10μmである。 Examples of the base material or substrate include silicon wafers, metals, plastics, glass, and ceramics. The thickness of the coating film after curing is, for example, preferably 0.05 to 20 μm, more preferably 0.1 to 10 μm.
 本開示の硬化物(硬化後の塗膜)は、耐溶剤性に優れ、高い絶縁性を有するものであるため、保護膜(カラーフィルタ保護膜等)や絶縁膜、或いはマイクロレンズの形成材料などとして有用である。 Since the cured product (coating film after curing) of the present disclosure has excellent solvent resistance and high insulating properties, a protective film (color filter protective film, etc.), an insulating film, a material for forming a microlens, etc. It is useful as.
<カラーフィルタ>
 本開示に係るカラーフィルタは、本開示の感光性樹脂組成物の硬化物である。本開示に係るカラーフィルタは、前記感光性樹脂組成物から形成された着色パターンを備えるものであってもよい。カラーフィルタは、例えば、基板上に前記感光性樹脂組成物を用いて着色パターンを形成する工程、及び前記着色パターンをポストベークする工程を経て製造することができる。
<Color filter>
The color filter according to the present disclosure is a cured product of the photosensitive resin composition of the present disclosure. The color filter according to the present disclosure may include a coloring pattern formed from the photosensitive resin composition. The color filter can be manufactured, for example, through a step of forming a coloring pattern on a substrate using the photosensitive resin composition and a step of post-baking the coloring pattern.
 本開示の感光性樹脂組成物を用いてカラーフィルタのパターンを形成する方法としては、例えば、本開示の感光性樹脂組成物を、スピンコーター等の慣用の塗布手段により、基板又は別の樹脂層の上に塗布し、溶剤など揮発成分を除去して着色層を形成し、フォトマスクを介して該着色層を露光して、現像する方法などが挙げられる。 As a method of forming a color filter pattern using the photosensitive resin composition of the present disclosure, for example, the photosensitive resin composition of the present disclosure is applied to a substrate or another resin layer by a conventional coating means such as a spin coater. Examples thereof include a method of coating on a surface, removing volatile components such as a solvent to form a colored layer, and exposing the colored layer through a photomask to develop the colored layer.
 基板としては、例えば、ガラス基板、シリコーン基板、ポリカーボネート基板、ポリエステル基板、芳香族ポリアミド基板、ポリアミドイミド基板、ポリイミド基板、Al基板、GaAs基板などの表面が平坦な基板などが挙げられる。これらの基板は、シランカップリング剤などの薬品による薬品処理、プラズマ処理、イオンプレーティング処理、スパッタリング処理、気相反応処理、真空蒸着処理などの前処理が施されていてもよい。 Examples of the substrate include a glass substrate, a silicone substrate, a polycarbonate substrate, a polyester substrate, an aromatic polyamide substrate, a polyamide-imide substrate, a polyimide substrate, an Al substrate, a GaAs substrate, and the like having a flat surface. These substrates may be subjected to pretreatment such as chemical treatment with a chemical such as a silane coupling agent, plasma treatment, ion plating treatment, sputtering treatment, gas phase reaction treatment, vacuum deposition treatment and the like.
 乾燥後の着色層の厚みは、例えば、0.6~8μm、好ましくは1~5μmである。 The thickness of the colored layer after drying is, for example, 0.6 to 8 μm, preferably 1 to 5 μm.
 露光の際に用いる放射線の光源としては 、例えば、キセノンランプ、ハロゲンランプ、タングステンランプ、高圧水銀灯、超高圧 水銀灯、メタルハライドランプ、中圧水銀灯、低圧水銀灯等のランプ光源やアルゴンイオンレーザー、YAGレーザー、XeClエキシマーレーザー、窒素レーザー等のレーザー光源等を挙げることができる。放射線の波長は、190~450nmの範囲にあるのが好ましい。放射線の露光量は、一般的には10~10,000J/m2が好ましい。 Examples of the light source of radiation used for exposure include lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, and low-pressure mercury lamps, argon ion lasers, and YAG lasers. Examples thereof include a laser light source such as an XeCl excimer laser and a nitrogen laser. The wavelength of radiation is preferably in the range of 190-450 nm. The exposure amount of radiation is generally preferably 10 to 10,000 J / m 2.
 現像に用いるアルカリ現像液としては、例えば、炭酸ナトリウム、水酸化ナトリウム、水酸化カリウム、テトラメチルアンモニウムハイドロオキサイド、コリン、1,8-ジアザ ビシクロ-[5.4.0]-7-ウンデセン、1,5-ジアザビシクロ-[4.3.0]-5-ノネン等の水溶液が好ましい。 Examples of the alkaline developer used for development include sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo- [5.4.0] -7-undecene, and 1 , 5-Diazabicyclo- [4.3.0] -5-Nonene and other aqueous solutions are preferable.
 ポストベークの条件は、通常120~280℃で10~60分程度である。このよう にして形成された画素の膜厚は、通常0.5~5μm、好ましくは1~3μmである。 Post-baking conditions are usually about 10 to 60 minutes at 120 to 280 ° C. The film thickness of the pixels formed in this way is usually 0.5 to 5 μm, preferably 1 to 3 μm.
 本開示の感光性樹脂組成物によれば、硬化反応性に優れるとともに、十分な耐溶剤性を有する着色パターンを得ることができる。 According to the photosensitive resin composition of the present disclosure, it is possible to obtain a coloring pattern having excellent curing reactivity and sufficient solvent resistance.
<表示装置用部材又は表示装置>
 本開示の表示装置用部材又は表示装置は、前記のカラーフィルタを備えている。前記表示装置用部材として、例えば、カラー液晶表示素子が挙げられる。また、前記表示装置としては、例えば、カラー液晶表示装置が挙げられる。カラー液晶表示素子やカラー液晶表示の構造としては、特に限定されず、適宜の構造をとることができる。 
<Display device member or display device>
The display device member or display device of the present disclosure includes the above-mentioned color filter. Examples of the display device member include a color liquid crystal display element. Further, as the display device, for example, a color liquid crystal display device can be mentioned. The structure of the color liquid crystal display element or the color liquid crystal display is not particularly limited, and an appropriate structure can be adopted.
 なお、本明細書に開示された各々の態様は、本明細書に開示された他のいかなる特徴とも組み合わせることができる。また、各実施形態における各構成及びそれらの組み合わせ等は、一例であって、本発明の主旨から逸脱しない範囲内で、適宜、構成の付加、省略、及びその他の変更が可能である。本開示は、実施形態によって限定されることはなく、クレームの範囲によってのみ限定される。 It should be noted that each aspect disclosed herein can be combined with any other feature disclosed herein. In addition, each configuration and a combination thereof in each embodiment are examples, and configurations can be added, omitted, and other changes as appropriate without departing from the gist of the present invention. The present disclosure is not limited by embodiments, but only by the scope of the claims.
 以下に、実施例に基づいて本開示をさらに具体的に説明する。 Hereinafter, the present disclosure will be described in more detail based on the examples.
 共重合体の重量平均分子量(ポリスチレン換算)及び分散度(重量平均分子量Mw/数平均分子量Mn)は、以下の条件で測定した。
 装置:検出器:RID-20A(島津製作所)
  ポンプ:LC-20AD(島津製作所)
  システムコントローラー:CBM-20Alite(島津製作所)
  デガッサー:DGU-20A3(島津製作所)
  オートインジェクター:SIL-20A HT(島津製作所)
 カラム:Shodex KF-806L(昭和電工)
 溶離液:THF(テトラヒドロフラン)0.8ml/min
 温度:オーブン:40℃、RI:40℃
 検出器:RI
The weight average molecular weight (in terms of polystyrene) and the degree of dispersion (weight average molecular weight Mw / number average molecular weight Mn) of the copolymer were measured under the following conditions.
Device: Detector: RID-20A (Shimadzu Corporation)
Pump: LC-20AD (Shimadzu Corporation)
System controller: CBM-20Alite (Shimadzu Corporation)
Degasser: DGU-20A3 (Shimadzu Corporation)
Auto injector: SIL-20A HT (Shimadzu Corporation)
Column: Shodex KF-806L (Showa Denko)
Eluent: THF (tetrahydrofuran) 0.8 ml / min
Temperature: Oven: 40 ° C, RI: 40 ° C
Detector: RI
 発熱ピークトップ温度は、以下の方法により測定した。すなわち、製造例1~8で得られた共重合体含有溶液5gを50gのヘプタン中に撹拌しながら滴下した。生じた沈殿物を濾別、減圧乾燥することにより共重合体を白色粉末として得た。前記の白色粉末の約10mgをサンプルとし、示差走査熱量計(メトラー・トレド社製、DSC1)を用い、窒素ガス雰囲気下、40℃から5℃/分の速度で300℃まで昇温し、発熱ピークトップ温度を測定した。 The exothermic peak top temperature was measured by the following method. That is, 5 g of the copolymer-containing solution obtained in Production Examples 1 to 8 was added dropwise to 50 g of heptane with stirring. The resulting precipitate was filtered off and dried under reduced pressure to give a copolymer as a white powder. Using about 10 mg of the white powder as a sample and using a differential scanning calorimeter (DSC1 manufactured by METTLER TOLEDO), the temperature is raised from 40 ° C to 300 ° C at a rate of 5 ° C / min under a nitrogen gas atmosphere to generate heat. The peak top temperature was measured.
[参考例1/モノマーB1の作成]
 33.7gの5-ノルボルネン-2-メタノール、41.3gのトリエチルアミン、及び6.5mgのメトキノンを57.2gのTHF(テトラヒドロフラン)に加えた混合溶液に対し、42.4gのメタクリル酸クロリドを、内温を20℃以下に維持しながら40分かけて滴下した後、20℃で4時間撹拌した。ガスクロマトグラフィーで原料である5-ノルボルネン-2-メタノールの消失を確認した後に、100gの酢酸エーテルと84.0gの水を加えた。分液後、94.8gの10%水酸化ナトリウム水溶液で洗浄し、68.0gの水で3回洗浄した。得られた有機相を40℃、15Torrの条件で濃縮することにより、48.3gの5-ノルボルネン-2-メチルアクリレート粗生成物を得た。前記粗生成物の純度は93%、収率は86%であった。
[Reference Example 1 / Preparation of Monomer B1]
42.4 g of chloride chloride in a mixed solution of 33.7 g of 5-norbornene-2-methanol, 41.3 g of triethylamine, and 6.5 mg of methquinone in 57.2 g of THF (tetrahydrofuran). After dropping over 40 minutes while maintaining the internal temperature at 20 ° C. or lower, the mixture was stirred at 20 ° C. for 4 hours. After confirming the disappearance of the raw material 5-norbornene-2-methanol by gas chromatography, 100 g of ether acetate and 84.0 g of water were added. After the liquid separation, the mixture was washed with 94.8 g of 10% aqueous sodium hydroxide solution and 68.0 g of water three times. The obtained organic phase was concentrated under the conditions of 40 ° C. and 15 Torr to obtain 48.3 g of a crude product of 5-norbornene-2-methylacrylate. The crude product had a purity of 93% and a yield of 86%.
 47.5gの前記5-ノルボルネン-2-メチルアクリレート粗生成物及び9.4mgのメトキノンを141gの酢酸エチルに加えた混合溶液に対して、72.3gのmCPBA(3-クロロ過安息香酸、30%含水)を、内温を20℃以下に維持しながら1時間かけて添加した後、20℃で3時間撹拌した。ガスクロマトグラフィーで原料の消失を確認した後に、278gの15%チオ硫酸ナトリウム水溶液と141gの酢酸エーテルを加えて15分撹拌した。分液後、217gの8%炭酸水素ナトリウム水溶液で洗浄し、141gの水で2回洗浄した。有機相を濃縮後、シリカゲルカラムクロマトグラフィーで精製することにより、29.4gの3-オキサトリシクロ[3.2.1.02,4]オクタンー6-イルメチルメタクリレート(以下、「モノマーB1」と称することがある)を得た。3-オキサトリシクロ[3.2.1.02,4]オクタンー6-イルメチルメタクリレートの純度は99%、収率は71%であった。 72.3 g of mCPBA (3-chloroperbenzoic acid, 30) to a mixed solution of 47.5 g of the 5-norbornene-2-methylacrylate crude product and 9.4 mg of methquinone added to 141 g of ethyl acetate. % Water content) was added over 1 hour while maintaining the internal temperature at 20 ° C. or lower, and then stirred at 20 ° C. for 3 hours. After confirming the disappearance of the raw materials by gas chromatography, 278 g of a 15% aqueous sodium thiosulfate solution and 141 g of ether acetate were added, and the mixture was stirred for 15 minutes. After the liquid separation, the mixture was washed with 217 g of an 8% aqueous sodium hydrogen carbonate solution and twice with 141 g of water. By concentrating the organic phase and purifying it by silica gel column chromatography, 29.4 g of 3-oxatricyclo [3.2.1.0 2,4 ] octane-6-ylmethylmethacrylate (hereinafter, "monomer B1"). (Sometimes referred to as) was obtained. The purity of 3-oxatricyclo [3.2.1.0 2,4 ] octane-6-ylmethylmethacrylate was 99%, and the yield was 71%.
[製造例1]
 還流冷却器、滴下ロート、及び撹拌機を備えた1Lのフラスコ内に窒素を適量流して窒素雰囲気とし、前記フラスコ内に150重量部のプロピレングリコールモノメチルエーテルアセテートを入れ、撹拌しながら80℃まで加熱した。その後、7重量部の2,2’-アゾビスイソブチロニトリル(AIBN)を、30重量部のプロピレングリコールモノメチルエーテルアセテートを用いて洗い流しながら加えた。次いで、該フラスコ内に、単量体としての11重量部のアクリル酸(AA)及び89重量部のモノマーB1と、20重量部のプロピレングリコールモノメチルエーテルアセテートとの混合溶液を、滴下ポンプを用いて約4時間かけて滴下した。単量体の滴下が終了した後、4時間、同温度に保持し、その後室温まで冷却して、固形分34.6重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは19,000、分散度は3.47であった。
[Manufacturing Example 1]
An appropriate amount of nitrogen was flowed into a 1 L flask equipped with a reflux condenser, a dropping funnel, and a stirrer to create a nitrogen atmosphere. 150 parts by weight of propylene glycol monomethyl ether acetate was placed in the flask and heated to 80 ° C. with stirring. bottom. Then, 7 parts by weight of 2,2'-azobisisobutyronitrile (AIBN) was added while rinsing with 30 parts by weight of propylene glycol monomethyl ether acetate. Then, in the flask, a mixed solution of 11 parts by weight of acrylic acid (AA) as a monomer, 89 parts by weight of the monomer B1 and 20 parts by weight of propylene glycol monomethyl ether acetate was put into the flask using a dropping pump. It was added dropwise over about 4 hours. After the dropping of the monomer was completed, the mixture was kept at the same temperature for 4 hours and then cooled to room temperature to obtain a copolymer-containing solution having a solid content of 34.6% by weight. The weight average molecular weight Mw of the produced copolymer was 19,000, and the dispersity was 3.47.
[製造例2]
 単量体として11重量部のアクリル酸(AA)、79重量部のモノマーB1、及び10重量部のスチレン(ST)を用いたこと以外は製造例1と同様の操作を行うことで、固形分33.8重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは17,000、分散度は3.33であった。
[Manufacturing Example 2]
By performing the same operation as in Production Example 1 except that 11 parts by weight of acrylic acid (AA), 79 parts by weight of monomer B1 and 10 parts by weight of styrene (ST) were used as the monomers, the solid content was obtained. A 33.8% by weight copolymer-containing solution was obtained. The weight average molecular weight Mw of the produced copolymer was 17,000, and the dispersity was 3.33.
[製造例3]
 単量体として11重量部のアクリル酸(AA)、79重量部のモノマーB1、及び10重量部のメタクリル酸メチル(MMA)を用いたこと以外は製造例1と同様の操作を行うことで、固形分34.2重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは18,500、分散度は3.41であった。
[Manufacturing Example 3]
By performing the same operation as in Production Example 1 except that 11 parts by weight of acrylic acid (AA), 79 parts by weight of monomer B1 and 10 parts by weight of methyl methacrylate (MMA) were used as the monomers. A copolymer-containing solution having a solid content of 34.2% by weight was obtained. The weight average molecular weight Mw of the produced copolymer was 18,500, and the dispersity was 3.41.
[製造例4]
 単量体として11重量部のアクリル酸(AA)、79重量部のモノマーB1、及び10重量部のシクロヘキシルマレイミド(CHMI)を用いたこと以外は製造例1と同様の操作を行うことで、固形分34.4重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは18,000、分散度は3.40であった。
[Manufacturing Example 4]
By performing the same operation as in Production Example 1 except that 11 parts by weight of acrylic acid (AA), 79 parts by weight of monomer B1 and 10 parts by weight of cyclohexylmaleimide (CHMI) were used as the monomers, solids were obtained. A copolymer-containing solution of 34.4% by weight was obtained. The weight average molecular weight Mw of the produced copolymer was 18,000, and the dispersity was 3.40.
[製造例5]
 単量体として11重量部のアクリル酸(AA)、79重量部のモノマーB1、及び10重量部のN-ビニルピロリドン(VP)を用いたこと以外は製造例1と同様の操作を行うことで、固形分34.4重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは17,500、分散度は3.38であった。
[Manufacturing Example 5]
By performing the same operation as in Production Example 1 except that 11 parts by weight of acrylic acid (AA), 79 parts by weight of monomer B1 and 10 parts by weight of N-vinylpyrrolidone (VP) were used as the monomers. , A copolymer-containing solution having a solid content of 34.4% by weight was obtained. The weight average molecular weight Mw of the produced copolymer was 17,500, and the dispersity was 3.38.
[製造例6]
 還流冷却器、滴下ロート及び撹拌機を備えた1Lのフラスコ内に窒素を適量流して窒素雰囲気とし、150重量部のプロピレングリコールモノメチルエーテルアセテートを入れ、撹拌しながら65℃まで加熱した。その後、14重量部の2,2’-アゾビス(2,4-ジメチルバレロニトリル)を30重量部のプロピレングリコールモノメチルエーテルアセテートで洗い流しながら加えた。次いで、該フラスコ内に、単量体として11重量部のアクリル酸(AA)、79重量部のグリシジルメタクリレート(GMA)、10重量部のメタクリル酸メチル(MMA)を20重量部のプロピレングリコールモノメチルエーテルアセテートに溶解した溶液を、滴下ポンプを用いて約4時間かけて滴下した。単量体の滴下が終了した後、約4時間同温度に保持し、その後室温まで冷却して、固形分33.8重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは16,000、分散度は3.32であった。
[Manufacturing Example 6]
An appropriate amount of nitrogen was flowed into a 1 L flask equipped with a reflux condenser, a dropping funnel and a stirrer to create a nitrogen atmosphere, 150 parts by weight of propylene glycol monomethyl ether acetate was added, and the mixture was heated to 65 ° C. with stirring. Then, 14 parts by weight of 2,2'-azobis (2,4-dimethylvaleronitrile) was added while rinsing with 30 parts by weight of propylene glycol monomethyl ether acetate. Next, in the flask, 11 parts by weight of acrylic acid (AA), 79 parts by weight of glycidyl methacrylate (GMA), and 10 parts by weight of methyl methacrylate (MMA) were added as monomers to 20 parts by weight of propylene glycol monomethyl ether. The solution dissolved in acetate was added dropwise over about 4 hours using a dropping pump. After the dropping of the monomer was completed, the mixture was kept at the same temperature for about 4 hours and then cooled to room temperature to obtain a copolymer-containing solution having a solid content of 33.8% by weight. The weight average molecular weight Mw of the produced copolymer was 16,000, and the dispersity was 3.32.
[製造例7]
 単量体として11重量部のアクリル酸(AA)、79重量部の3,4-エポキシシクロヘキシルメチルメタクリレート(サイクロマーM100)、10重量部のメタクリル酸メチル(MMA)を用いたこと以外は製造例6と同様の操作を行い、固形分33.4重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは16,000、分散度は3.30であった。
[Manufacturing Example 7]
Production Examples except that 11 parts by weight of acrylic acid (AA), 79 parts by weight of 3,4-epoxycyclohexylmethylmethacrylate (Cyclomer M100), and 10 parts by weight of methyl methacrylate (MMA) were used as the monomers. The same operation as in No. 6 was carried out to obtain a copolymer-containing solution having a solid content of 33.4% by weight. The weight average molecular weight Mw of the produced copolymer was 16,000, and the dispersity was 3.30.
[製造例8]
 単量体として11重量部のアクリル酸(AA)、89重量部の3,4-エポキシトリシクロ[5.2.1.02,6]デカン-9-イルアクリレートと3,4-エポキシトリシクロ[5.2.1.02,6]デカン-8-イルアクリレートの混合物(モノマーB2)を用いたこと以外は製造例1と同様の操作を行い、固形分34.1重量%の共重合体含有溶液を得た。生成した共重合体の重量平均分子量Mwは18,000、分散度は3.43であった。
[Manufacturing Example 8]
11 parts by weight acrylic acid (AA) as a monomer, 89 parts by weight 3,4-epoxytricyclo [5.2.1.0 2,6 ] decan-9-ylacrylate and 3,4-epoxytri The same operation as in Production Example 1 was carried out except that a mixture of cyclo [5.2.1.0 2,6 ] decan-8-ylacrylate (monomer B2) was used, and the solid content was 34.1% by weight. A polymer-containing solution was obtained. The weight average molecular weight Mw of the produced copolymer was 18,000, and the dispersity was 3.43.
 製造例1~8における共重合体組成、共重合体の重量平均分子量、分散度及び発熱ピークトップ温度を表1に示す。 Table 1 shows the copolymer composition, the weight average molecular weight of the copolymer, the degree of dispersion, and the exothermic peak top temperature in Production Examples 1 to 8.
[実施例1-1]
 アルカリ可溶性樹脂として上記製造例1で得られた共重合体を、共重合体含有溶液として8.09g、光重合性化合物としてDPHA2.25g、光重合開始剤として1-ヒドロキシシクロヘキシルフェニルケトン0.20g、溶剤としてMMPGAC6.83gをそれぞれ容器にはかり取り、30分間撹拌することで、感光性樹脂組成物1-1を調製した。
[Example 1-1]
The copolymer obtained in Production Example 1 as an alkali-soluble resin was 8.09 g as a copolymer-containing solution, 2.25 g as a photopolymerizable compound, and 0.20 g as a photopolymerization initiator. , MMPGAC (6.83 g) as a polymer was weighed into a container and stirred for 30 minutes to prepare a photosensitive resin composition 1-1.
[実施例1-2]
 アルカリ可溶性樹脂として上記製造例2で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は実施例1-1と同様の操作を行い、感光性樹脂組成物1-2を調製した。
[Example 1-2]
The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 2 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-2 was carried out. Was prepared.
[実施例1-3]
 アルカリ可溶性樹脂として上記製造例3で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は実施例1-1と同様の操作を行い、感光性樹脂組成物1-3を調製した。
[Example 1-3]
The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 3 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-3 was performed. Was prepared.
[実施例1-4]
 アルカリ可溶性樹脂として上記製造例4で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は実施例1-1と同様の操作を行い、感光性樹脂組成物1-4を調製した。
[Example 1-4]
The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 4 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-4 Was prepared.
[実施例1-5]
 アルカリ可溶性樹脂として上記製造例5で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は実施例1-1と同様の操作を行い、感光性樹脂組成物1-5を調製した。
[Example 1-5]
The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 5 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-5 was carried out. Was prepared.
[比較例1-1]
 アルカリ可溶性樹脂として上記製造例6で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は実施例1-1と同様の操作を行い、感光性樹脂組成物1-6を調製した。
[Comparative Example 1-1]
The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 6 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-6 was carried out. Was prepared.
[比較例1-2]
 アルカリ可溶性樹脂として上記製造例7で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は実施例1-1と同様の操作を行い、感光性樹脂組成物1-7を調製した。
[Comparative Example 1-2]
The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 7 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-7 was carried out. Was prepared.
[比較例1-3]
 アルカリ可溶性樹脂として上記製造例8で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は実施例1-1と同様の操作を行い、感光性樹脂組成物1-8を調製した。
[Comparative Example 1-3]
The same operation as in Example 1-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 8 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 1-8 was carried out. Was prepared.
 表2に、上記の実施例及び比較例の感光性樹脂組成物の組成を記す。 Table 2 shows the compositions of the photosensitive resin compositions of the above Examples and Comparative Examples.
[実施例2-1]
 色材として顔料のC.I.ピグメントレッド254を7.7g、分散剤としてDISPERBYK-2000を3.1g、溶剤としてMMPGACを36.0gそれぞれ容器にはかり取り、さらに径1.0mmのジルコニアビーズ45gを加え、フタをした。これをペイントシェーカーで3時間振とうし、3時間後、顔料分散液とジルコニアビーズを分別し、0.5mmのジルコニアビーズ45gを加え、ペイントシェーカーでさらに3時間振とうした。その後、顔料分散液とジルコニアビーズを分別し、0.3mmのジルコニアビーズ45gを加え、ペイントシェーカーでさらに3時間振とうした後、ジルコニアビーズを分別し顔料分散液を得た。
 得られた顔料分散液4.68gに対し、アルカリ可溶性樹脂として、上記製造例1で得られた共重合体を、共重合体含有溶液として8.09g、光重合性化合物としてDPHA2.25g、光重合開始剤として1-ヒドロキシシクロヘキシルフェニルケトン0.20g、溶剤としてMMPGAC15.2gをそれぞれ容器にはかり取り30分間撹拌することで、感光性樹脂組成物2-1を調製した。
[Example 2-1]
C.I. I. 7.7 g of Pigment Red 254, 3.1 g of DISPERBYK-2000 as a dispersant, and 36.0 g of MMPGAC as a solvent were weighed into a container, and 45 g of zirconia beads having a diameter of 1.0 mm were added and covered. This was shaken with a paint shaker for 3 hours, and after 3 hours, the pigment dispersion and the zirconia beads were separated, 45 g of 0.5 mm zirconia beads were added, and the mixture was shaken with a paint shaker for another 3 hours. Then, the pigment dispersion liquid and the zirconia beads were separated, 45 g of 0.3 mm zirconia beads were added, and the mixture was further shaken with a paint shaker for 3 hours, and then the zirconia beads were separated to obtain a pigment dispersion liquid.
With respect to 4.68 g of the obtained pigment dispersion, 8.09 g of the copolymer obtained in Production Example 1 as an alkali-soluble resin, 2.25 g of DPHA as a photopolymerizable compound, and light A photosensitive resin composition 2-1 was prepared by weighing 0.20 g of 1-hydroxycyclohexylphenyl ketone as a polymerization initiator and 15.2 g of MMPGAC as a solvent in a container and stirring for 30 minutes.
[実施例2-2]
 アルカリ可溶性樹脂として、上記製造例2で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は、実施例2-1と同様の操作を行い、感光性樹脂組成物2-2を調製した。
[Example 2-2]
The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 2 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -2 was prepared.
[実施例2-3]
 アルカリ可溶性樹脂として、上記製造例3で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は、実施例2-1と同様の操作を行い、感光性樹脂組成物2-3を調製した。
[Example 2-3]
The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 3 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -3 was prepared.
[実施例2-4]
 アルカリ可溶性樹脂として、上記製造例4で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は、実施例2-1と同様の操作を行い、感光性樹脂組成物2-4を調製した。
[Example 2-4]
The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 4 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -4 was prepared.
[実施例2-5]
 アルカリ可溶性樹脂として、上記製造例5で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は、実施例2-1と同様の操作を行い、感光性樹脂組成物2-5を調製した。
[Example 2-5]
The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 5 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -5 was prepared.
[比較例2-1]
 アルカリ可溶性樹脂として、上記製造例6で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は、実施例2-1と同様の操作を行い、感光性樹脂組成物2-6を調製した。
[Comparative Example 2-1]
The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 6 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -6 was prepared.
[比較例2-2]
 アルカリ可溶性樹脂として、上記製造例7で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は、実施例2-1と同様の操作を行い、感光性樹脂組成物2-7を調製した。
[Comparative Example 2-2]
The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 7 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -7 was prepared.
[比較例2-3]
 アルカリ可溶性樹脂として、上記製造例8で得られた共重合体を、共重合体含有溶液として8.09g用いた以外は、実施例2-1と同様の操作を行い、感光性樹脂組成物2-8を調製した。
[Comparative Example 2-3]
The same operation as in Example 2-1 was carried out except that 8.09 g of the copolymer obtained in Production Example 8 was used as the alkali-soluble resin as the copolymer-containing solution, and the photosensitive resin composition 2 was subjected to the same operation. -8 was prepared.
 表4に、上記の実施例及び比較例の感光性樹脂組成物の組成を記す。 Table 4 shows the compositions of the photosensitive resin compositions of the above Examples and Comparative Examples.
<評価試験>
 実施例1-1~1-5及び比較例1-1~1-3で得られた各感光性樹脂組成物を用いて以下の評価試験を行った。結果を表3に示す。
<Evaluation test>
The following evaluation tests were carried out using the photosensitive resin compositions obtained in Examples 1-1 to 1-5 and Comparative Examples 1-1 to 1-3. The results are shown in Table 3.
(1)保存安定性試験-1
 実施例1-1~1-5及び比較例1-1~1-3で得られた感光性樹脂組成物を40℃のオーブンで1週間保管した。重合直後の粘度と40℃で1週間保管後の粘度を測定した。粘度増加率を以下の計算式で算出した。なお、粘度(単位:mPa・s)は、粘度計(商品名「LVDV2T」、ブルックフィールド社製)を用いて、回転数60、温度:23℃の条件で測定した。
 P:重合直後の粘度、Q:40℃で1週間保管した後の粘度
 粘度増加率={(Q/P)×100}-100
(1) Storage stability test-1
The photosensitive resin compositions obtained in Examples 1-1 to 1-5 and Comparative Examples 1-1 to 1-3 were stored in an oven at 40 ° C. for 1 week. The viscosity immediately after polymerization and the viscosity after storage at 40 ° C. for 1 week were measured. The viscosity increase rate was calculated by the following formula. The viscosity (unit: mPa · s) was measured using a viscometer (trade name “LVDV2T”, manufactured by Brookfield) under the conditions of a rotation speed of 60 and a temperature of 23 ° C.
P: Viscosity immediately after polymerization, Q: Viscosity after storage at 40 ° C. for 1 week Viscosity increase rate = {(Q / P) x 100} -100
(2)耐溶剤性試験-1
 ガラス板に実施例1-1~1-5及び比較例1-1~1-3で得られた感光性樹脂組成物をスピンコーターで塗布した後、200℃で30分間加熱硬化させることで試験片を作製した。硬化後の塗膜の厚みは3μmであった。
(2) Solvent resistance test-1
The photosensitive resin compositions obtained in Examples 1-1 to 1-5 and Comparative Examples 1-1 to 1-3 are applied to a glass plate with a spin coater, and then heat-cured at 200 ° C. for 30 minutes for testing. Pieces were made. The thickness of the coating film after curing was 3 μm.
 試験片に対して、γ―ブチロラクトン(γ-BL)及びN―メチルピロリドン(NMP)をそれぞれ1滴ずつ滴下し、10分間放置した。その後水洗し、溶剤を滴下した箇所が全く変化していなかったら◎、僅かに溶剤の跡が残るが、拭き取れば消えるようであれば○、溶剤の跡が残り、拭き取っても消えないようであれば△、全面的に変色していたら×とした。 One drop each of γ-butyrolactone (γ-BL) and N-methylpyrrolidone (NMP) was added dropwise to the test piece, and the mixture was left for 10 minutes. After that, wash with water, and if the part where the solvent is dropped has not changed at all ◎, a slight trace of the solvent remains, but if it disappears if wiped off ○, if the trace of the solvent remains, it does not seem to disappear even if wiped off If it is △, if it is completely discolored, it is marked as ×.
(3)耐溶剤性試験-2
 試験片の調製において、硬化温度を230℃としたこと以外は耐溶剤性試験-1と同様にして、硬化物の耐溶剤性試験を行った。
(3) Solvent resistance test-2
In the preparation of the test piece, the solvent resistance test of the cured product was carried out in the same manner as in the solvent resistance test-1 except that the curing temperature was set to 230 ° C.
 実施例1-1~1-5の感光性樹脂組成物は、40℃でも増粘しにくく、保存安定性が良好であった。さらに、硬化温度が200℃でも、230℃の場合と同様に良好な耐溶剤性を示した。その一方で、比較例1-1~1-2の感光性樹脂組成物は、40℃でゲル化してしまうことからも理解できる様に保存安定性が悪いことが分かった。また、比較例3の感光性樹脂組成物は、モノマーB2(EDCPA)を用いることで、保存安定性は良好であるものの、硬化温度を230℃から200℃に下げると十分に硬化しないため、耐溶剤性が低下することが分かった。 The photosensitive resin compositions of Examples 1-1 to 1-5 were difficult to thicken even at 40 ° C. and had good storage stability. Further, even when the curing temperature was 200 ° C., good solvent resistance was exhibited as in the case of 230 ° C. On the other hand, it was found that the photosensitive resin compositions of Comparative Examples 1-1 to 1-2 had poor storage stability as can be understood from the fact that they gel at 40 ° C. Further, although the photosensitive resin composition of Comparative Example 3 has good storage stability by using the monomer B2 (EDCPA), it does not sufficiently cure when the curing temperature is lowered from 230 ° C. to 200 ° C., so that it is resistant to curing. It was found that the solvent property was reduced.
 次に、実施例2-1~2-5及び比較例2-1~2-3で得られた各感光性樹脂組成物を用いて以下の評価試験を行った。結果を表5に示す。 Next, the following evaluation tests were conducted using the photosensitive resin compositions obtained in Examples 2-1 to 2-5 and Comparative Examples 2-1 to 2-3. The results are shown in Table 5.
(1)保存安定性試験-2
 実施例2-1~2-5及び比較例2-1~2-3で得られた感光性樹脂組成物を40℃のオーブンで1週間保管した。重合直後の粘度と40℃で1週間保管後の粘度を測定した。粘度増加率を以下の計算式で算出した。なお、粘度(単位:mPa・s)は、粘度計(商品名「LVDV2T」、ブルックフィールド社製)を用いて、回転数60、温度:23℃の条件で測定した。
 P:重合直後の粘度、Q:40℃で1週間保管した後の粘度
 粘度増加率={(Q/P)×100}-100
(1) Storage stability test-2
The photosensitive resin compositions obtained in Examples 2-1 to 2-5 and Comparative Examples 2-1 to 2-3 were stored in an oven at 40 ° C. for 1 week. The viscosity immediately after polymerization and the viscosity after storage at 40 ° C. for 1 week were measured. The viscosity increase rate was calculated by the following formula. The viscosity (unit: mPa · s) was measured using a viscometer (trade name “LVDV2T”, manufactured by Brookfield) under the conditions of a rotation speed of 60 and a temperature of 23 ° C.
P: Viscosity immediately after polymerization, Q: Viscosity after storage at 40 ° C. for 1 week Viscosity increase rate = {(Q / P) x 100} -100
(2)耐溶剤性試験-3
 ガラス板に実施例2-1~2-5及び比較例2-1~2-3で得られた感光性樹脂組成物をスピンコーターで塗布した後、200℃で30分間加熱硬化させることで試験片を作製した。硬化後の塗膜の厚みは2μmであった。
(2) Solvent resistance test-3
The photosensitive resin compositions obtained in Examples 2-1 to 2-5 and Comparative Examples 2-1 to 2-3 are applied to a glass plate with a spin coater, and then heat-cured at 200 ° C. for 30 minutes for testing. Pieces were made. The thickness of the coating film after curing was 2 μm.
 試験片に対して、γ―ブチロラクトン(γ-BL)及びN―メチルピロリドン(NMP)をそれぞれ1滴ずつ滴下し、10分間放置した。その後水洗し、溶剤を滴下した箇所が全く変化していなかったら◎、僅かに溶剤の跡が残るが、拭き取れば消えるようであれば○、溶剤の跡が残り、拭き取っても消えないようであれば△、全面的に変色していたら×とした。 One drop each of γ-butyrolactone (γ-BL) and N-methylpyrrolidone (NMP) was added dropwise to the test piece, and the mixture was left for 10 minutes. After that, wash with water, and if the part where the solvent is dropped has not changed at all ◎, a slight trace of the solvent remains, but if it disappears if wiped off ○, if the trace of the solvent remains, it does not seem to disappear even if wiped off If it is △, if it is completely discolored, it is marked as ×.
(3)耐溶剤性試験-4
 試験片の調製において、硬化温度を230℃としたこと以外は耐溶剤性試験-3と同様にして、硬化物の耐溶剤性試験を行った。
(3) Solvent resistance test-4
In the preparation of the test piece, the solvent resistance test of the cured product was carried out in the same manner as in the solvent resistance test-3 except that the curing temperature was set to 230 ° C.
 実施例2-1~2-5の感光性樹脂組成物は、40℃でも増粘しにくく、保存安定性が良好であった。さらに、硬化温度が200℃でも、230℃の場合と同様に良好な耐溶剤性を示した。その一方で、比較例2-1~2-2の感光性樹脂組成物は、40℃で増粘してしまうことからも理解できる様に保存安定性が悪いことが分かった。また、比較例2-3の感光性樹脂組成物は、モノマーB2(EDCPA)を用いることで、保存安定性は良好であるものの、硬化温度を230℃から200℃に下げると十分に硬化しないため、耐溶剤性が低下することが分かった。 The photosensitive resin compositions of Examples 2-1 to 2-5 were difficult to thicken even at 40 ° C. and had good storage stability. Further, even when the curing temperature was 200 ° C., good solvent resistance was exhibited as in the case of 230 ° C. On the other hand, it was found that the photosensitive resin compositions of Comparative Examples 2-1 to 2-2 had poor storage stability as can be understood from the fact that they thickened at 40 ° C. Further, although the photosensitive resin composition of Comparative Example 2-3 has good storage stability by using the monomer B2 (EDCPA), it is not sufficiently cured when the curing temperature is lowered from 230 ° C. to 200 ° C. , It was found that the solvent resistance was lowered.
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000014
 以下に、製造例、実施例及び比較例で用いられた成分について説明する。
 モノマーB1:3-オキサトリシクロ[3.2.1.02,4]オクタンー6-イルメチルメタクリレート(参考例1を参照)
 GMA:グリシジルメタクリレート(日油(株)製)
 サイクロマーM100:3,4-エポキシシクロヘキシルメチルメタクリレート((株)ダイセル製)
 モノマーB2:3,4-エポキシトリシクロ[5.2.1.02,6]デカン-9-イルアクリレートと3,4-エポキシトリシクロ[5.2.1.02,6]デカン-8-イルアクリレートの混合物(商品名「E-DCPA」、(株)ダイセル製)
 ST:スチレン(富士フイルム和光純薬(株)製)
 MMA:メタクリル酸メチル(富士フイルム和光純薬(株)製)
 CHMI:シクロヘキシルマレイミド(日本触媒(株)製)
 VP:N-ビニルピロリドン(東京化成工業(株)製)
 MMPGAC:プロピレングリコールモノメチルエーテルアセテート((株)ダイセル製)
 PR 254:C.I.ピグメントレッド254(東京化成工業(株)製)
 DISPERBYK-2000:アミン価4mgKOH/g、不揮発分40%(ビックケミー・ジャパン製)
 DHPA:ジペンタエリスリトールヘキサアクリレート(商品名「KAYARAD DPHA」;日本化薬(株)製)
 1-ヒドロキシシクロヘキシルフェニルケトン(富士フイルム和光純薬(株)製)
The components used in Production Examples, Examples and Comparative Examples will be described below.
Monomer B1: 3-oxatricyclo [3.2.1.0 2,4 ] octane-6-ylmethylmethacrylate (see Reference Example 1)
GMA: Glycidyl methacrylate (manufactured by NOF CORPORATION)
Cyclomer M100: 3,4-epoxycyclohexylmethylmethacrylate (manufactured by Daicel Corporation)
Monomer B2: 3,4-epoxytricyclo [5.2.1.0 2,6 ] decane-9-ylacrylate and 3,4-epoxytricyclo [5.2.1.0 2,6 ] decane- Mixture of 8-yl acrylate (trade name "E-DCPA", manufactured by Daicel Corporation)
ST: Styrene (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.)
MMA: Methyl methacrylate (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.)
CHMI: Cyclohexylmaleimide (manufactured by Nippon Shokubai Co., Ltd.)
VP: N-vinylpyrrolidone (manufactured by Tokyo Chemical Industry Co., Ltd.)
MMPGAC: Propylene glycol monomethyl ether acetate (manufactured by Daicel Corporation)
PR 254: C.I. I. Pigment Red 254 (manufactured by Tokyo Chemical Industry Co., Ltd.)
DISPERBYK-2000: Amine value 4 mgKOH / g, non-volatile content 40% (manufactured by Big Chemie Japan)
DHPA: Dipentaerythritol hexaacrylate (trade name "KAYARAD DPHA"; manufactured by Nippon Kayaku Co., Ltd.)
1-Hydroxycyclohexylphenyl ketone (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.)
 以上のまとめとして、本発明の構成及びそのバリエーションを以下に付記する。
[1]
 アルカリ可溶性樹脂と、光重合性化合物、光重合開始剤、及び溶剤を含み、
 該アルカリ可溶性樹脂が、不飽和カルボン酸又はその無水物に由来する構成単位(A)と、前記式(1)(式中、R1及びR2は、それぞれ同一又は異なって、水素原子又は炭素数1~7のアルキル基を示す。Xは単結合又はヘテロ原子を含んでいてもよい2価の炭化水素基を示す。Yは置換基として炭素数1~3のアルキル基を有していてもよいメチレン基若しくはエチレン基、酸素原子、又は酸素原子と結合していてもよい硫黄原子を示す。nは0~7の整数を示す。)で表される化合物に由来する構成単位(B)とを含む共重合体であって、示差走査熱量計を用いて、5℃/分の速度で昇温した際に現れる発熱ピークトップ温度が180~220℃である共重合体である感光性樹脂組成物。
[2]
 前記式(1)で表される化合物が、前記式(1a)(式中、R1、R2、X、Y、及びnは、式(1)にて説明したものと同様のものを示す。)で表される化合物である、[1]に記載の感光性樹脂組成物。
[3]
 前記共重合体が、さらに、下記(c1)~(c4)からなる群より選択された少なくとも1つの化合物に由来する構成単位(C)を含む、[1]又は[2]に記載の感光性樹脂組成物。
(c1)アルキル基で置換されていてもよいスチレン
(c2)N-置換マレイミド
(c3)N-ビニル化合物
(c4)前記式(2)(式中、R11は水素原子又は炭素数1~7のアルキル基を示す。R12はヘテロ原子を含んでいてもよい炭化水素基を示す。Zはヘテロ原子を示す。)で表される不飽和カルボン酸誘導体
[4]
 前記共重合体が、さらに、構成単位(D)として、(メタ)アクリルアミド又は(メタ)アクリルニトリルに由来する構成単位を含む、[1]~[3]のいずれかに記載の感光性樹脂組成物。
[5]
 前記共重合体の全構成単位に対する構成単位(A)の割合が、2~60重量%、3~40重量%、又は5~20重量%である、[1]~[4]のいずれかに記載の感光性樹脂組成物。
[6]
 前記共重合体の全構成単位に対する構成単位(B)の割合が、40~98重量%、60~95重量%、又は75~90重量%である、[1]~[5]のいずれかに記載の感光性樹脂組成物。
[7]
 前記共重合体の全構成単位に対する構成単位(C)の割合が、0~85重量%、1~60重量%、2~40重量%である、[3]、[5]、及び[6]のいずれかに記載の感光性樹脂組成物。
[8]
 前記共重合体の全構成単位に対する構成単位(A)の割合が、2~60重量%、構成単位(B)の含有量が40~98重量%、構成単位(C)の含有量が0~85重量%である、[3]、[5]~[7]のいずれかに記載の感光性樹脂組成物。
[9]
 前記共重合体が構成単位(A)と構成単位(B)とを含み、構成単位(C)を含まない場合、構成単位(A)と構成単位(B)との総量は、全構成単位に対して90重量%以上、95重量%以上、99重量%以上、又は実質的に100重量%であり、前記共重合体が構成単位(A)と構成単位(B)と構成単位(C)とを含む場合、構成単位(A)~(C)の総量は、全構成単位に対して90重量%以上、95重量%以上、99重量%以上、又は100重量%である、[1]~[8]のいずれかに記載の感光性樹脂組成物。
[10]
 前記共重合体の重量平均分子量(Mw)が、1000~1000000、3000~300000、又は5000~100000である、[1]~[9]のいずれかに記載の感光性樹脂組成物。
[11]
 前記共重合体の分子量分布(重量平均分子量と数平均分子量との比:Mw/Mn)が、5.0以下、1.0~4.5、又は1.0~4.0である、[1]~[10]のいずれかに記載の感光性樹脂組成物。
[12]
 前記重合体の、示差走査熱量計を用いて5℃/分の速度で昇温した際に現れる発熱ピークトップ温度が、180~220℃である、[1]~[11]のいずれかに記載の感光性樹脂組成物。
[13]
 さらに、色材を含む、[1]~[12]のいずれかに記載の感光性樹脂組成物。
[14]
 前記色材は、顔料及び/又は染料である、[13]に記載の感光性樹脂組成物。
[15]
 感光性樹脂組成物の固形分に対する色材の含有量が、3~50重量%、5~30重量%である、[13]又は[14]に記載の感光性樹脂組成物。
[16]
 前記光重合性化合物が、多官能ビニル化合物、多官能チオール化合物、及び多官能エポキシ化合物からなる群より選択される少なくとも1つを含む、[1]~[15]のいずれかに記載の感光性樹脂組成物。
[17]
 光重合性化合物の含有量が、アルカリ可溶性樹脂100重量部に対して、10~300重量部、30~200重量部、又は40~150重量部であり、感光性樹脂組成物が色材を含む場合は、光重合性化合物の含有量が、色材100重量部に対して、10~1000重量部、50~600重量部、又は100~500重量部である、[1]~[16]のいずれかに記載の感光性樹脂組成物。
[18]
 [1]~[17]のいずれかに記載の感光性樹脂組成物の硬化物。
[19]
 [1]~[17]のいずれかに記載の感光性樹脂組成物の硬化物であるカラーフィルタ。
[20]
 [19]に記載のカラーフィルタを備える表示装置用部材又は表示装置。
As a summary of the above, the configuration of the present invention and variations thereof will be added below.
[1]
Contains an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
The alkali-soluble resin has a structural unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof, and the above formula (1) (in the formula, R 1 and R 2 have the same or different hydrogen atoms or carbon, respectively. It represents an alkyl group of numbers 1 to 7. X represents a divalent hydrocarbon group which may contain a single bond or a hetero atom. Y has an alkyl group having 1 to 3 carbon atoms as a substituent. A structural unit (B) derived from a compound represented by a compound represented by a methylene group or an ethylene group, an oxygen atom, or a sulfur atom which may be bonded to an oxygen atom. N represents an integer of 0 to 7). A photosensitive resin which is a copolymer containing and has a peak top temperature of 180 to 220 ° C. that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter. Composition.
[2]
The compound represented by the formula (1) is the same as that described in the formula (1a) (in the formula, R 1 , R 2 , X, Y, and n). The photosensitive resin composition according to [1], which is a compound represented by (.).
[3]
The photosensitive according to [1] or [2], wherein the copolymer further contains a structural unit (C) derived from at least one compound selected from the group consisting of the following (c1) to (c4). Resin composition.
(C1) A styrene (c2) N-substituted maleimide (c3) N-vinyl compound (c4) which may be substituted with an alkyl group. The above formula (2) (in the formula, R 11 is a hydrogen atom or 1 to 7 carbon atoms. R 12 represents a hydrocarbon group which may contain a hetero atom. Z represents a hetero atom), which is an unsaturated carboxylic acid derivative [4].
The photosensitive resin composition according to any one of [1] to [3], wherein the copolymer further contains a structural unit derived from (meth) acrylamide or (meth) acrylonitrile as the structural unit (D). thing.
[5]
Any of [1] to [4], wherein the ratio of the structural unit (A) to all the structural units of the copolymer is 2 to 60% by weight, 3 to 40% by weight, or 5 to 20% by weight. The photosensitive resin composition according to the above.
[6]
Any of [1] to [5], wherein the ratio of the structural unit (B) to all the structural units of the copolymer is 40 to 98% by weight, 60 to 95% by weight, or 75 to 90% by weight. The photosensitive resin composition according to the above.
[7]
The ratio of the structural unit (C) to all the structural units of the copolymer is 0 to 85% by weight, 1 to 60% by weight, and 2 to 40% by weight, [3], [5], and [6]. The photosensitive resin composition according to any one of.
[8]
The ratio of the structural unit (A) to all the structural units of the copolymer is 2 to 60% by weight, the content of the structural unit (B) is 40 to 98% by weight, and the content of the structural unit (C) is 0 to 0 to. The photosensitive resin composition according to any one of [3], [5] to [7], which is 85% by weight.
[9]
When the copolymer contains the structural unit (A) and the structural unit (B) and does not include the structural unit (C), the total amount of the structural unit (A) and the structural unit (B) is the total structural unit. On the other hand, it is 90% by weight or more, 95% by weight or more, 99% by weight or more, or substantially 100% by weight, and the copolymer is a constituent unit (A), a constituent unit (B), and a constituent unit (C). When the above is included, the total amount of the structural units (A) to (C) is 90% by weight or more, 95% by weight or more, 99% by weight or more, or 100% by weight with respect to all the structural units, [1] to [ 8] The photosensitive resin composition according to any one of.
[10]
The photosensitive resin composition according to any one of [1] to [9], wherein the weight average molecular weight (Mw) of the copolymer is 1000 to 1000000, 3000 to 300,000, or 5000 to 100,000.
[11]
The molecular weight distribution of the copolymer (ratio of weight average molecular weight to number average molecular weight: Mw / Mn) is 5.0 or less, 1.0 to 4.5, or 1.0 to 4.0. 1] The photosensitive resin composition according to any one of [10].
[12]
Described in any one of [1] to [11], wherein the exothermic peak top temperature that appears when the polymer is heated at a rate of 5 ° C./min using a differential scanning calorimeter is 180 to 220 ° C. Photosensitive resin composition.
[13]
The photosensitive resin composition according to any one of [1] to [12], further comprising a coloring material.
[14]
The photosensitive resin composition according to [13], wherein the coloring material is a pigment and / or a dye.
[15]
The photosensitive resin composition according to [13] or [14], wherein the content of the coloring material with respect to the solid content of the photosensitive resin composition is 3 to 50% by weight and 5 to 30% by weight.
[16]
The photosensitive compound according to any one of [1] to [15], wherein the photopolymerizable compound contains at least one selected from the group consisting of a polyfunctional vinyl compound, a polyfunctional thiol compound, and a polyfunctional epoxy compound. Resin composition.
[17]
The content of the photopolymerizable compound is 10 to 300 parts by weight, 30 to 200 parts by weight, or 40 to 150 parts by weight with respect to 100 parts by weight of the alkali-soluble resin, and the photosensitive resin composition contains a coloring material. In the case of [1] to [16], the content of the photopolymerizable compound is 10 to 1000 parts by weight, 50 to 600 parts by weight, or 100 to 500 parts by weight with respect to 100 parts by weight of the coloring material. The photosensitive resin composition according to any one.
[18]
A cured product of the photosensitive resin composition according to any one of [1] to [17].
[19]
A color filter which is a cured product of the photosensitive resin composition according to any one of [1] to [17].
[20]
A display device member or display device including the color filter according to [19].
 本開示に係る発明によれば、保存安定性に優れると共に、硬化反応性に優れ、しかも硬化物の耐溶剤性に優れる感光性樹脂組成物が提供される。また、上記の特性を有する感光性樹脂組成物の硬化物、該硬化物であるカラーフィルタ、及び該カラーフィルタを備えた表示装置用部材又は表示装置が提供される。 According to the invention according to the present disclosure, there is provided a photosensitive resin composition having excellent storage stability, excellent curing reactivity, and excellent solvent resistance of the cured product. Further, a cured product of a photosensitive resin composition having the above characteristics, a color filter which is the cured product, and a display device member or display device provided with the color filter are provided.

Claims (8)

  1.  アルカリ可溶性樹脂と、光重合性化合物、光重合開始剤、及び溶剤を含み、
     該アルカリ可溶性樹脂が、不飽和カルボン酸又はその無水物に由来する構成単位(A)と、下記式(1)
    Figure JPOXMLDOC01-appb-C000001
    (式中、R1及びR2は、それぞれ同一又は異なって、水素原子又は炭素数1~7のアルキル基を示す。Xは単結合又はヘテロ原子を含んでいてもよい2価の炭化水素基を示す。Yは置換基として炭素数1~3のアルキル基を有していてもよいメチレン基若しくはエチレン基、酸素原子、又は酸素原子と結合していてもよい硫黄原子を示す。nは0~7の整数を示す。)
    で表される化合物に由来する構成単位(B)とを含む共重合体であって、示差走査熱量計を用いて、5℃/分の速度で昇温した際に現れる発熱ピークトップ温度が180~220℃である共重合体である感光性樹脂組成物。
    Contains an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
    The alkali-soluble resin contains a structural unit (A) derived from an unsaturated carboxylic acid or an anhydride thereof, and the following formula (1).
    Figure JPOXMLDOC01-appb-C000001
    (In the formula, R 1 and R 2 are the same or different, respectively, and represent a hydrogen atom or an alkyl group having 1 to 7 carbon atoms. X is a divalent hydrocarbon group which may contain a single bond or a hetero atom. Y represents a methylene group or an ethylene group which may have an alkyl group having 1 to 3 carbon atoms as a substituent, an oxygen atom, or a sulfur atom which may be bonded to an oxygen atom. N is 0. Indicates an integer of ~ 7.)
    It is a copolymer containing the structural unit (B) derived from the compound represented by, and the exothermic peak top temperature that appears when the temperature is raised at a rate of 5 ° C./min using a differential scanning calorimeter is 180. A photosensitive resin composition that is a copolymer at ~ 220 ° C.
  2.  前記共重合体が、さらに、下記(c1)~(c4)からなる群より選択された少なくとも1つの化合物に由来する構成単位(C)を含む請求項1に記載の感光性樹脂組成物。
    (c1)アルキル基で置換されていてもよいスチレン
    (c2)N-置換マレイミド
    (c3)N-ビニル化合物
    (c4)下記式(2)
    Figure JPOXMLDOC01-appb-C000002
    (式中、R11は水素原子又は炭素数1~7のアルキル基を示す。R12はヘテロ原子を含んでいてもよい炭化水素基を示す。Zはヘテロ原子を示す。)
    で表される不飽和カルボン酸誘導体
    The photosensitive resin composition according to claim 1, wherein the copolymer further comprises a structural unit (C) derived from at least one compound selected from the group consisting of the following (c1) to (c4).
    (C1) Styrene (c2) N-substituted maleimide (c3) N-vinyl compound (c4) which may be substituted with an alkyl group The following formula (2)
    Figure JPOXMLDOC01-appb-C000002
    (In the formula, R 11 represents a hydrogen atom or an alkyl group having 1 to 7 carbon atoms. R 12 represents a hydrocarbon group which may contain a hetero atom. Z represents a hetero atom.)
    Unsaturated carboxylic acid derivative represented by
  3.  前記共重合体の全構成単位に対する前記構成単位(A)の割合が2~60重量%、前記構成単位(B)の割合が40~98重量%、前記構成単位(C)の割合が0~85重量%である請求項2に記載の感光性樹脂組成物。 The ratio of the structural unit (A) to all the structural units of the copolymer is 2 to 60% by weight, the ratio of the structural unit (B) is 40 to 98% by weight, and the ratio of the structural unit (C) is 0 to 0 to. The photosensitive resin composition according to claim 2, which is 85% by weight.
  4.  さらに、色材を含む、請求項1~3のいずれか1項に記載の感光性樹脂組成物。 The photosensitive resin composition according to any one of claims 1 to 3, further comprising a coloring material.
  5.  前記色材は、顔料及び/又は染料である請求項4に記載の感光性樹脂組成物。 The photosensitive resin composition according to claim 4, wherein the coloring material is a pigment and / or a dye.
  6.  請求項1~5のいずれか1項に記載の感光性樹脂組成物の硬化物。 A cured product of the photosensitive resin composition according to any one of claims 1 to 5.
  7.  請求項1~5のいずれか1項に記載の感光性樹脂組成物の硬化物であるカラーフィルタ。 A color filter which is a cured product of the photosensitive resin composition according to any one of claims 1 to 5.
  8.  請求項7記載のカラーフィルタを備える表示装置用部材又は表示装置。
     
    A display device member or display device including the color filter according to claim 7.
PCT/JP2021/008168 2020-03-09 2021-03-03 Photosensitive resin composition, cured product, color filter, display device member and display device WO2021182232A1 (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1115159A (en) * 1997-06-19 1999-01-22 Nec Corp Negative photoresist material and pattern forming method by using same
JP2006243726A (en) * 2005-03-03 2006-09-14 Dongjin Semichem Co Ltd Photosensitive resin composition
JP2011133610A (en) * 2009-12-24 2011-07-07 Seiko Epson Corp Color filter ink, color filter ink set, color filter, image display device, and electronic device
JP2014174428A (en) * 2013-03-12 2014-09-22 Shin Etsu Chem Co Ltd Silicon-containing underlay film material and pattern forming method
JP2017171748A (en) * 2016-03-22 2017-09-28 Jsr株式会社 Cured film, display element, material for forming cured film and method for forming cured film
JP2018090773A (en) * 2016-12-01 2018-06-14 Jsr株式会社 Curable resin composition for interlayer insulation film, interlayer insulation film, display element, and method for forming interlayer insulation film

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09134004A (en) 1995-11-07 1997-05-20 Sumitomo Chem Co Ltd Colored resist composition and its production
JPH11133600A (en) 1997-10-30 1999-05-21 Jsr Corp Radiation-sensitive resin composition for display panel spacer
JP4501665B2 (en) 2004-12-14 2010-07-14 住友化学株式会社 Photosensitive resin composition
JP4788485B2 (en) 2006-06-13 2011-10-05 住友化学株式会社 Colored photosensitive resin composition
JP5510050B2 (en) 2010-05-13 2014-06-04 Jsr株式会社 Coloring composition for color filter, color filter, color liquid crystal display element, and method for producing color filter

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1115159A (en) * 1997-06-19 1999-01-22 Nec Corp Negative photoresist material and pattern forming method by using same
JP2006243726A (en) * 2005-03-03 2006-09-14 Dongjin Semichem Co Ltd Photosensitive resin composition
JP2011133610A (en) * 2009-12-24 2011-07-07 Seiko Epson Corp Color filter ink, color filter ink set, color filter, image display device, and electronic device
JP2014174428A (en) * 2013-03-12 2014-09-22 Shin Etsu Chem Co Ltd Silicon-containing underlay film material and pattern forming method
JP2017171748A (en) * 2016-03-22 2017-09-28 Jsr株式会社 Cured film, display element, material for forming cured film and method for forming cured film
JP2018090773A (en) * 2016-12-01 2018-06-14 Jsr株式会社 Curable resin composition for interlayer insulation film, interlayer insulation film, display element, and method for forming interlayer insulation film

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