WO2015190281A1 - Brittle substrate cleavage method and brittle substrate cleavage device - Google Patents
Brittle substrate cleavage method and brittle substrate cleavage device Download PDFInfo
- Publication number
- WO2015190281A1 WO2015190281A1 PCT/JP2015/065073 JP2015065073W WO2015190281A1 WO 2015190281 A1 WO2015190281 A1 WO 2015190281A1 JP 2015065073 W JP2015065073 W JP 2015065073W WO 2015190281 A1 WO2015190281 A1 WO 2015190281A1
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- WIPO (PCT)
- Prior art keywords
- brittle material
- material substrate
- crack
- cleaving
- cutting line
- Prior art date
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/033—Apparatus for opening score lines in glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/08—Severing cooled glass by fusing, i.e. by melting through the glass
- C03B33/082—Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/10—Glass-cutting tools, e.g. scoring tools
- C03B33/102—Glass-cutting tools, e.g. scoring tools involving a focussed radiation beam, e.g. lasers
Definitions
- the present invention relates to a brittle material substrate cleaving method and a brittle material substrate cleaving apparatus.
- This application claims priority based on Japanese Patent Application No. 2014-120915 for which it applied to Japan on June 11, 2014, and uses the content here.
- a laser irradiation unit that irradiates the brittle material substrate with a laser beam and locally heats it, and jets a coolant onto the brittle material substrate heated by the laser beam.
- An apparatus including a coolant injection unit is proposed.
- such a cleaving apparatus only forms a scribe line along the planned cutting line on the brittle material substrate, and by performing a break process on the brittle material substrate along the scribe line as a post process, Finally, the brittle material substrate is fully cut.
- Patent Document 1 it is difficult to specifically configure the apparatus for applying the deformation stress, and the conditions for applying the deformation stress that can surely perform a full cut along the planned cutting line are determined. It can be difficult. Therefore, it is desired to provide a technique that has a relatively simple apparatus configuration and that can reliably perform a full cut on a brittle material substrate.
- the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a brittle material substrate cleaving method and a brittle material substrate cleaving apparatus that can reliably perform full cutting on a brittle material substrate by a relatively simple method. It is to provide.
- the present inventor for example, for an extremely thin brittle material substrate having a thickness of 300 ⁇ m or less, appropriately selects heating / cooling conditions, and moves the laser and cooling.
- the knowledge that a full cut could be performed to the middle of the planned cutting line by appropriately generating thermal stress due to the temperature distribution in the direction was obtained.
- a first aspect of the present invention is a method for cleaving a brittle material substrate along a planned cutting line, and the brittle material substrate on the planned cutting line of the brittle material substrate with respect to the laser beam irradiation source. Forming a crack at the leading end in the moving direction and a terminal crack at the trailing end in the moving direction, and moving the brittle material substrate with respect to the laser beam irradiation source.
- the brittle material substrate has a non-product quality area at the periphery, a product quality area inside the non-product quality area, In the step of forming the end crack, both the start crack and the end crack are formed in the non-product quality area.
- the brittle material substrate is subjected to heat treatment and thermal treatment so that the temperature gradient in the cutting line direction of the brittle material substrate is larger than the temperature gradient in the thickness direction of the brittle material substrate. Cooling process is performed.
- a fourth aspect of the present invention is a brittle material substrate cleaving apparatus for cleaving a brittle material substrate along a planned cutting line, on a processing table on which the brittle material substrate is arranged, on the planned cutting line of the brittle material substrate, At the front end in the moving direction when moving the brittle material substrate, at the start end crack forming portion for forming the start crack, and at the rear end in the moving direction when moving the brittle material substrate on the planned cutting line of the brittle material substrate A terminal crack forming part for forming a terminal crack, a laser irradiation part for irradiating a laser beam onto the brittle material substrate, a coolant injection part for injecting a coolant onto the brittle material substrate, and a laser irradiation part for the brittle material substrate And a moving means for moving in a preset direction with respect to the coolant injection unit.
- the moving means is configured to move the laser irradiation unit and the coolant injection unit with respect to the brittle material substrate. Is configured to move on the same movement path as the laser irradiation unit.
- a starting crack is formed as an initial crack at the tip in the moving direction when moving the brittle material substrate on the planned cutting line of the brittle material substrate, and the moving direction Since a terminal crack is formed as an initial crack at the rear end portion in FIG. 2, a full cut can be performed even at the cut terminal portion, particularly starting from the terminal crack. Therefore, a simple method of simply forming the end crack can eliminate the uncut portion at the cut end portion and perform a full cut on the entire cutting planned line.
- a terminal crack forming portion that forms a terminal crack as an initial crack at the rear end portion in the movement direction when the brittle material substrate is moved on the planned cutting line of the brittle material substrate. Therefore, a full cut can be performed even at the cut end portion, particularly starting from the end crack. Therefore, a simple method of simply providing the terminal crack forming part can eliminate the uncut residue at the cut terminal part and perform the full cut on the entire cutting planned line.
- FIG. 1 is a plan view showing a schematic configuration of an example of a transport apparatus provided with a brittle material substrate cleaving apparatus according to the present invention.
- reference numeral 1 is a transport apparatus
- 20 is a brittle material substrate cleaving apparatus (hereinafter referred to as “crushing apparatus”). (Referred to as a cleaving device).
- the transfer device 1 is a device that transfers a brittle material substrate W made of ultrathin glass having a thickness of 300 ⁇ m or less, for example.
- a brittle material substrate W made of ultrathin glass having a thickness of 300 ⁇ m or less, for example.
- a peripheral portion called an “ear” that is outside the product quality area, that is, a non-product quality area at both ends in the width direction of about 5 mm to 10 mm is directly held. It becomes an area to be.
- the transport device 1 does not directly hold the product quality area of the brittle material substrate W in this way, but directly holds and transports only both end portions that become non-product quality areas, and also uses the cleaving device 20 to carry the brittle material substrate W. Is a device that performs full cutting (cutting) into a desired dimension. That is, as shown in FIG. 1, the transport device 1 includes an unwinding roll 2 and a transport path 3 that transports the brittle material substrate W fed from the unwinding roll 2, and further includes a pair of fixed holding members 4, A pair of first movable holding members 5, a cleaving device 20, and a pair of second movable holding members 7 are provided.
- the unwinding roll 2 includes a roll shaft 2a around which the brittle material substrate W is wound, and a drive source 8 such as a motor that is connected to the roll shaft 2a and rotates the roll shaft 2a.
- the drive source 8 is provided with a control unit (not shown) that controls the rotation speed of the roll shaft 2 a, and the control unit intermittently unwinds the brittle material substrate W from the unwinding roll 2. It is formed as follows. As the brittle material substrate W, as described above, ultrathin glass having a thickness of 300 ⁇ m or less is used.
- a height adjusting roller 9 is disposed on the downstream side of the unwinding roll 2.
- the height adjusting roller 9 is a transport roller that transports the brittle material substrate W unwound from the unwinding roll 2.
- the upper end of the height adjusting roller 9 is disposed slightly higher than the upper surface of the transport path 3. With such a configuration, the height adjusting roller 9 transports the brittle material substrate W unwound from the unwinding roll 2 onto the upper surface (transport surface) of the transport path 3.
- the conveyance path 3 is arranged on the delivery side of the height adjusting roller 9.
- a plurality of long and thin plate-like conveyance units 10 are arranged in alignment along the conveyance direction of the brittle material substrate W.
- the transport unit 10 is preferably transported in a non-contact manner with respect to the product quality area so as not to directly hold the product quality area which is the central portion of the brittle material substrate W, levitation by blowing out air is preferable.
- the formula is adopted.
- a large number of air ejection holes are provided on the upper surface of the floating transport unit 10, and an air supply source is connected to the air ejection holes via a pipe so that a predetermined amount of air is discharged from the air ejection holes. Erupted.
- the air is thus ejected to form an air layer on the transport unit 10, and the brittle material substrate W floats above the upper surface of the transport unit 10 (transport path 3) by the air layer.
- the shape of the air ejection hole is not particularly limited, and may be a slit-like elongated hole in addition to a general circular hole.
- suction holes are formed in a processing region heated or cooled by a laser irradiation unit 23 or a coolant injection unit 24, which will be described later, and a region near the processing region, in addition to the air ejection holes. It may be formed.
- a vacuum pump (not shown) as a negative pressure source is connected to these suction holes via a pipe (not shown), and the brittle material substrate W is sucked by the vacuum pump to suck the brittle material substrate W. Pull on.
- the suction force by the suction hole is set to be weaker than the force of floating the brittle material substrate W by the air ejection hole.
- the air ejection from the air ejection holes and the suction by the suction holes are balanced, so that the brittle material substrate W is held at a predetermined interval between the upper surface of the transport path 3 and thus transported.
- the path 3 is held with high accuracy.
- the first clamp rail 11 and the second clamp rail 12 are arranged on both sides of the transport path 3 along the transport direction of the transport path 3.
- the fixed holding member 4 is provided on the upstream side (the unwinding roll 2 side) of the first clamp rail 11, and the first movable holding member 5 is provided on the downstream side of the fixed holding member 4.
- the fixed holding member 4 is attached to the first clamp rail 11 in a fixed state via an attachment member (not shown). That is, the fixed holding member 4 is fixed without moving along the length direction of the first clamp rail 11 (the transport direction of the transport path 3).
- the fixed holding member 4 is a general clamp having a lower plate and an upper plate, and the brittle material substrate W can be attached and detached by forming the lower plate and the upper plate so that they can be contacted and separated by an air cylinder. Hold on.
- substrate W is the front-end
- the first movable holding member 5 is also a general clamp having a lower plate and an upper plate, and the lower plate and the upper plate are formed so as to be able to contact and separate by the air cylinder in the same manner as the fixed holding member 4.
- the brittle material substrate W is detachably held. Note that, similarly to the fixed holding member 4, the first movable holding member 5 does not directly hold the product quality area of the brittle material substrate W, but directly holds both end portions that are non-product quality areas.
- the pair of first movable holding members 5 are both attached to the first clamp rail 11 so as to be reciprocally movable. That is, the pair of first movable holding members 5 can reciprocate along the length direction of the first clamp rail 11 (the conveyance direction of the conveyance path 3).
- the 1st clamp rail 11 is provided with the ball screw mechanism and the linear motor mechanism, for example, and the moving speed and the moving distance of the 1st movable holding member 5 are controlled with high precision by this.
- the second clamp rail 12 is provided with a pair of second movable holding members 7.
- the second movable holding member 7 is also a clamp configured similarly to the first movable holding member 5, and is movably attached to the second clamp rail 12. That is, the pair of second movable holding members 7 can reciprocate along the length direction of the second clamp rail 12 (the conveyance direction of the conveyance path 3). Note that the second movable holding member 7 does not directly hold the product quality area of the brittle material substrate W as in the case of the fixed holding member 4 and the first movable holding member 5, but only the end portions on both sides that become non-product quality areas. Hold directly.
- the second clamp rail 12 is also provided with a ball screw mechanism and a linear motor mechanism so that the moving speed and moving distance of the second movable holding member 7 can be made with high accuracy. It is controlled.
- the transport device 1 is provided with a holding frame 13 on the unwinding roll 2 side of the transport path 3, and a cleaving device 20 is movably provided on the holding frame 13.
- the cleaving apparatus 20 is an embodiment of the cleaving apparatus for a brittle material substrate according to the present invention, and includes main components on the lower surface of the movable plate 20a shown in FIG.
- the movable plate 20a is provided on the holding frame 13 so as to be movable, and can thereby be moved in a direction perpendicular to the transport direction of the transport path 3, that is, in the width direction of the brittle material substrate W.
- the cleaving apparatus 20 uses the conveyance path 3 as a processing table according to the present invention, that is, a processing table on which the brittle material substrate W is arranged, , A terminal crack forming unit 22, a laser irradiation unit 23, a coolant injection unit 24, and a moving mechanism 25 that moves the laser irradiation unit 23 and the coolant injection unit 24 relative to the brittle material substrate W on the transport path 3. Moving means).
- the moving mechanism 25 has a movable plate 20a, a pair of guide rails 13a of a holding frame 13 that holds the movable plate 20 movably, and a movable plate 20a for running on the pair of guide rails 13a.
- a drive source 20b such as a motor.
- a ball screw is used as the guide rail 13a.
- the movable plate 20a can move in the forward and reverse directions by rotating the guide rail 13a by the drive source 20b.
- the moving mechanism 25 is not limited to a mechanism using such a ball screw, and for example, a mechanism using a linear motor can also be adopted.
- the start-end crack forming portion 21 is disposed behind the moving direction of the movable plate 20a indicated by the arrow P in FIG. Therefore, the start-end crack forming portion 21 is disposed at the tip portion in the moving direction of the brittle material substrate W.
- the terminal crack formation part 22 is arrange
- the start-end crack forming portion 21 is a brittle material on the planned cutting line L of the brittle material substrate W as shown in FIG.
- a start-end crack 41 is formed as an initial crack at the tip in the moving direction when the substrate W is moved, in this embodiment, at the tip in the moving direction of the movable plate 20a indicated by the arrow P in FIG.
- the start-end crack forming unit 21 includes a diamond cutter 21a and a moving mechanism 21b including an air cylinder or the like that can be moved up and down and moved in the horizontal direction.
- the start-end crack forming unit 21 plans to cleave the brittle material substrate W stopped on the transport path 3 as shown in FIG. 3 when the diamond cutter 21a is moved in a predetermined path by the moving mechanism 21b.
- a start-end crack 41 is formed at the tip on the line L.
- the depth of the start end crack 41 is not particularly limited, and is about several ⁇ m to several tens of ⁇ m.
- the length of the start crack 41 is about 2 to 3 mm because the cut surface of the crack formed by the diamond cutter 21a is rougher than the cut surface based on laser light irradiation described later. It is as follows.
- such a starting crack 41 is formed to the inside of the virtual boundary line K between the product quality area and the non-product quality area of the brittle material substrate W indicated by a two-dot chain line in FIG. Instead, it is formed in a non-product quality area called “ear” that is outside the product quality area.
- the terminal crack forming portion 22 is a rear end portion in the moving direction when the brittle material substrate W is moved on the cutting line L of the brittle material substrate W as shown in FIG. 3, and in this embodiment, an arrow in FIG.
- a terminal crack 42 is formed as an initial crack at the rear end of the movable plate 20a in the moving direction indicated by P.
- the end crack forming part 22 also includes a diamond cutter 22a and a moving mechanism 22b made up of an air cylinder or the like that can move up and down and move in the horizontal direction.
- the terminal crack forming unit 22 causes the planned cutting line of the brittle material substrate W stopped on the transport path 3 as shown in FIG. 3 when the diamond cutter 22a moves in a predetermined path by the moving mechanism 22b.
- a terminal crack 42 is formed at the rear end on L.
- the depth of the end crack 42 is set to about several ⁇ m to several tens of ⁇ m, like the start end crack 41.
- the length of the end crack 42 is set to about 2 to 3 mm or less, similarly to the start end crack 41.
- the terminal crack 42 may be located slightly ahead of the rear end edge without being formed up to the rear end edge on the planned cutting line L of the brittle material substrate W as shown in FIG. .
- the end crack 42 is also formed in a non-product quality area in the same manner as the start end crack 41. Therefore, the end edge of the end crack 42 on the start end crack 41 side is the position of the virtual boundary line K, for example, a brittle material substrate. It is outside from the position of 5 mm from the side edge of W. If formed in this way, the relatively rough cut surface formed by the diamond cutter 22a is formed only in the non-product quality area without being formed in the product quality area. No loss of quality.
- a laser irradiation unit 23 (laser light irradiation source) is disposed on the lower surface of the movable plate 20a.
- the laser irradiation unit 23 is disposed so as to cross the brittle material substrate W on the transport path 3 in the width direction of the brittle material substrate W along with the movement of the movable plate 20a, and a laser oscillator (not shown).
- optical system equipment (not shown) for guiding the laser light C oscillated from the laser oscillator.
- the laser oscillator for example, a carbon dioxide laser oscillator having an output of 100 W to several hundred W is preferably used. However, laser oscillators with other output ranges or other oscillation mechanisms can be used.
- the optical system device includes a mirror, a lens, and the like, and guides and condenses the laser light C oscillated from the laser oscillator to a preset region (heating region).
- the laser irradiation unit 23 irradiates the brittle material substrate W held on the conveyance path 3 with laser light C on the planned cutting line L shown in FIG. Heat up.
- a space through which the laser beam C passes between the laser irradiation unit 23 and the brittle material substrate W as shown in FIG. 2 is set as a laser beam passage region 28, and the brittle material substrate W as shown in FIG. 3.
- the upper region irradiated with the laser beam C is defined as a heating region 29.
- the heating area 29 is set to a substantially rectangular area that is elongated along the planned cutting line L in the present embodiment. That is, in the laser irradiation unit 23, a laser oscillator and an optical system device are configured so as to form the elongated substantially rectangular heating area 29 in this way.
- a coolant injection unit 24 is disposed on the lower surface of the movable plate 20 a behind the laser irradiation unit 23 in the moving direction of the movable plate 20 a at a predetermined distance from the laser irradiation unit 23.
- the coolant injection unit 24 (coolant injection source) includes an injection nozzle 24a that is disposed vertically downward with respect to the transport path 3, a liquid feed pump 24b, and a tank 24c that stores the coolant. ing. Under such a configuration, the coolant injecting unit 24 injects the coolant R having fluidity from the injection nozzle 24 a toward the brittle material substrate W.
- a space through which the coolant R passes between the coolant injection unit 24 and the brittle material substrate W is set as a coolant passage region 30, and the coolant on the brittle material substrate W as shown in FIG. 3.
- a region where R is injected is referred to as a cooling region 31.
- the cooling area 31 is set to a small circular area formed on the planned cutting line L, and is formed and arranged at a predetermined distance behind the heating area 29 in the moving direction of the movable plate 20a.
- the coolant R sprayed from the spray nozzle 24a is formed by rapidly cooling the heating area 29 formed on the brittle material substrate W by the laser irradiation unit 23, and gas such as air is mixed into water.
- the transport device 1 having the cleaving device 20 having such a configuration In order to cleave while transporting the brittle material substrate W by the transport device 1 having the cleaving device 20 having such a configuration, first, the brittle material substrate W is sent out (unwinded) from the unwinding roll 2 shown in FIG. ), The front end of the brittle material substrate W is held by the first movable holding member 5. Then, when the first movable holding member 5 is moved and the brittle material substrate W is transported to a predetermined position, the movement of the first movable holding member 5 is stopped and the travel of the brittle material substrate W is stopped.
- the both ends of the brittle material substrate W on the side of the unwinding roll 2 are held by the fixed holding member 4.
- the distal end portion of the brittle material substrate W is also held by the second movable holding member 7. That is, the second movable holding member 7 holds the part ahead of the portion held by the first movable holding member 5.
- the movement direction (arrow P and A start-end crack 41 is formed at the tip in the opposite direction).
- the end crack 42 is formed at the rear end in the moving direction on the planned cutting line L of the brittle material substrate W by the end crack forming portion 22.
- the lower end of the laser beam passing region 28 is made to reach the tip of the laser beam.
- the heating area 29 is formed on the brittle material substrate W, and the front end portion of the brittle material substrate W is irradiated with the laser beam C and subjected to heat treatment.
- the leading end portion of the brittle material substrate W has not reached the coolant passage region 30, it has not been subjected to cooling processing, and therefore, initial processing in which only heat treatment is performed is performed.
- the movable plate 20a is further moved (advanced) by the moving mechanism 25 while the laser irradiation unit 23 and the coolant injection unit 24 are operated, and the leading end part where the start crack 41 is formed.
- the lower part of the laser beam passing area 30 is made to reach the lower part of the laser beam passing area 28 slightly behind the front end.
- the movable mechanism 20 is moved at a constant speed without stopping while moving from the initial machining to the medium-term machining.
- the heating area 29 heated by the irradiation of the laser beam C and the cooling area 31 cooled by the coolant R continuously move (change) on the brittle material substrate W at a constant speed. That is, the heating area 29 and the cooling area 31 move (change) continuously at a constant speed in the same direction as the movement direction of the movable plate 20a.
- the brittle material substrate W is an ultra-thin glass plate, by appropriately selecting the heating conditions of the laser irradiation unit 23 and the cooling conditions of the coolant injection unit 24, the brittle material substrate W is not a scribe line but a brittle line. A breaking line obtained by full-cutting the material substrate W can be formed.
- the movable plate 20a is further moved (advanced) by the moving mechanism 25 while the laser irradiation unit 23 and the coolant injection unit 24 are operated, and a terminal crack 42 is formed.
- the lower end of the laser beam passage region 28 and the lower portion of the coolant passage region 30 are sequentially reached and passed through the rear end portion of the brittle material substrate W.
- the movable plate 20a is moved at a constant speed by the moving mechanism 25 without stopping. Accordingly, the heating area 29 and the cooling area 31 continuously move at a constant speed on the brittle material substrate W.
- the heat treatment by the laser irradiation unit 23 and the cooling treatment by the coolant injection unit 24 are continuously performed along the planned cutting line L, whereby the brittle material substrate W is fully cut (cut) by the planned cutting line L. It can be performed.
- the mechanism by which a brittle material substrate such as a glass plate is cleaved by an initial crack is generally considered as follows.
- FIG. 4A and 4B are diagrams showing cross sections of the brittle material substrate W.
- the symbol t indicates the thickness of the brittle material substrate W
- the symbol A indicates the initial crack formed on the upper surface of the brittle material substrate W. Show.
- the initial crack A is irradiated with laser light and heated as shown in FIG. Is formed.
- the vicinity of the initial crack A of the brittle material substrate W is cooled by coolant injection, the vicinity of the initial crack A is cooled, and a cooling region 31 is formed in the surface layer portion of the brittle material substrate W as shown in FIG.
- the heating area 29 previously formed by heating expands in the thickness direction of the brittle material substrate W by heat conduction.
- the heating area 29 tends to extend due to thermal expansion. However, since the surroundings of the heating area 29 are hardly affected by heating, the thermal expansion in the heating area 29 is suppressed. As a result, a compressive stress is applied to the heating zone 29 as indicated by an arrow in FIG. 4B.
- the cooling zone 31 tends to shrink due to heat shrinkage, but the periphery of the cooling zone 31 is not greatly affected by the cooling, and thus acts to suppress the heat shrinkage in the cooling zone 31, and thereby, in FIG. As shown by the arrows in FIG.
- the tensile stress acts on the cooling region 31 of the surface layer portion of the brittle material substrate W
- the tensile stress acts on the initial crack A, so that the brittle material substrate W is cleaved starting from the initial crack A.
- the brittle material substrate W is cleaved as if an initial crack A grows, so that a marking line is made on the surface of the brittle material substrate W.
- 5A to 5C are perspective views showing the upper surface of the ultrathin brittle material substrate W.
- reference numeral 41 denotes a crack at the starting end formed on the upper surface of the brittle material substrate W
- reference symbol L denotes the brittle material.
- substrate W is shown.
- the brittle material substrate W is moved in the direction of the arrow Q (the direction opposite to the moving direction of the movable plate 20a in FIG. 2), and the start crack 41
- the ultrathin brittle material substrate W having a thickness of 300 ⁇ m or less conducts heat to the lower surface immediately after laser light irradiation.
- the temperature is almost uniform in the thickness direction of the brittle material substrate W, whereas the width of the temperature distribution is larger in the direction of the planned cutting line L of the brittle material substrate W than in the thickness direction of the brittle material substrate W.
- the brittle material substrate W has a gentle temperature gradient with a small change rate in the thickness direction
- the brittle material substrate W has a steep temperature gradient with a large change rate in the cutting line L direction (brittleness).
- the temperature gradient in the cutting line L direction of the brittle material substrate W is larger than the temperature gradient in the thickness direction of the material substrate W). For this reason, the growth of the start-end crack 41 is performed with the temperature distribution in the cutting line L direction being dominant over the temperature distribution in the thickness direction of the brittle material substrate W.
- the heating area 29 tends to expand due to thermal expansion, but the area around the heating area 29, particularly the area opposite to the direction of the arrow Q, is hardly affected by the heating. This acts to suppress expansion, and thereby compressive stress acts on the heating zone 29 as shown by the arrows in FIG. 5A.
- the cooling zone 31 tends to shrink due to heat shrinkage
- the periphery of the cooling zone 31 is not greatly affected by the cooling, and thus acts to suppress the heat shrinkage in the cooling zone 31, and thereby, in FIG. As shown by the arrows in FIG.
- the tensile stress acts on the starting crack 41, so that the brittle material substrate W is cleaved from the starting crack 41.
- the brittle material substrate W is moved in the direction of the arrow Q, and heating by laser light irradiation and cooling by coolant injection are continuously advanced along the planned cutting line L, the brittle material substrate W starting from the starting crack 41 is used.
- the cleaving proceeds along the planned breaking line L.
- the cooling zone 31 tends to shrink by heat as indicated by an arrow in FIG. 5B.
- the terminal crack 42 is formed in the terminal part of the brittle material substrate W.
- the tensile stress generated on the planned cutting line L acts on the terminal crack 42 shown in FIG. 5C, so that the brittle material substrate W is cleaved starting from the terminal crack 42.
- a terminal crack 42 is formed at the terminal part of the planned cutting line L.
- the cleaving of the brittle material substrate W starting from is progressed along the planned cutting line L, and is connected to the breaking line S starting from the previously formed start-end crack 41. Therefore, by forming the terminal crack 42 in this way, the cutting line S starting from the starting crack 41 on the planned cutting line L and the cutting of the brittle material substrate W starting from the terminal crack 42 are continuous.
- the brittle material substrate W is fully cut by one continuous breaking line.
- the movable plate 20a of the cleaving device 20 is moved in the direction opposite to the arrow P direction to return to the initial position. Then, the holding of the first movable holding member 5 with respect to the brittle material substrate W after cutting is released, the first movable holding member 5 is moved to the fixed holding member 4 side, and the subsequent brittleness that the fixed holding member 4 holds. The tip of the material substrate W is held.
- the brittle material substrate W after being cut is further moved (conveyed) on the conveyance path 3 by moving the second movable holding member 7 to the downstream side in the conveyance direction.
- the brittle material substrate W unwound from the unwinding roll 2 can be continuously fully cut by the cleaving device 20 to have a desired size.
- the terminal crack 42 is formed as an initial crack at the rear end portion in the moving direction when the brittle material substrate W is moved on the planned cutting line L of the brittle material substrate W. Since the terminal crack forming portion 22 is provided, a full cut can be performed even at the cut end portion of the brittle material substrate W, particularly starting from the terminal crack 42. Therefore, a simple method of simply including the terminal crack forming portion 22 eliminates the uncut portion at the cut terminal portion, and can surely perform a full cut over the entire cutting line L.
- both the start crack 41 and the end crack 42 were formed in the non-product quality area of the brittle material substrate W. Therefore, although the cut surfaces of the start end crack 41 and the end crack 42 are relatively rough, the start end crack 41 and the end crack 42 are not formed in the product quality area, so that the quality of the final product composed of the product quality area is impaired. Can be prevented.
- the start-end crack forming unit 21 and the end-end crack forming unit 22 are configured to be movable by the original moving mechanism 21b and the moving mechanism 22b, respectively.
- the diamond cutter 21a and the diamond cutter 22a are attached to the movable plate 20a, or attached to the laser irradiation unit 23, so that the moving plate 25a moves the moving plate 25a to move the starting end crack forming portion 21 (diamond cutter 21a) and the terminal crack forming portion. 22 (diamond cutter 22a) may be moved.
- the laser irradiation part 23 and the coolant injection part 24 were moved with respect to the brittle material board
- substrate W is divided
- the laser irradiation unit 23 and the coolant injection unit 24 may be fixedly arranged, and the brittle material substrate W may be moved with respect to the laser irradiation unit 23 and the coolant injection unit 24.
- the diamond cutter 21a and the diamond cutter 22a which are cutter wheels were used as the start end crack formation part 21 and the end crack formation part 22, this invention is not limited to this,
- the start end crack 41 and the end crack 42 may be formed by ablation processing using a short pulse laser. When such a short pulse laser is used, since the start end crack 41 and the end crack 42 can be formed in a non-contact manner, generation of micro cracks can be suppressed.
- the brittle material substrate cleaving apparatus and cleaving method of the present invention can perform a full cut even at the cut end portion, particularly starting from the end crack. Therefore, a simple method of simply forming the end crack can eliminate the uncut portion at the cut end portion and perform a full cut on the entire cutting planned line.
- Conveying device 3 Conveying path (processing stand) 20 Brittle material substrate cleaving device 20a Movable plate 21 Start-end crack forming section 22 End-end crack forming section 23 Laser irradiation section (laser beam irradiation source) 24 Coolant injection part (coolant injection source) 25 Moving mechanism (moving means) 29 Heating area 31 Cooling area 41 Start crack 42 End crack L Split line W Brittle material substrate
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Abstract
Description
本願は、2014年6月11日に日本国に出願された特願2014-120915号に基づき優先権を主張し、その内容をここに援用する。 The present invention relates to a brittle material substrate cleaving method and a brittle material substrate cleaving apparatus.
This application claims priority based on Japanese Patent Application No. 2014-120915 for which it applied to Japan on June 11, 2014, and uses the content here.
本発明の第3の態様は、第1の態様において、脆性材料基板の厚み方向の温度勾配より、脆性材料基板の割断予定線方向の温度勾配が大きくなるように、脆性材料基板に加熱処理及び冷却処理を行う。 According to a second aspect of the present invention, in the first aspect, the brittle material substrate has a non-product quality area at the periphery, a product quality area inside the non-product quality area, In the step of forming the end crack, both the start crack and the end crack are formed in the non-product quality area.
According to a third aspect of the present invention, in the first aspect, the brittle material substrate is subjected to heat treatment and thermal treatment so that the temperature gradient in the cutting line direction of the brittle material substrate is larger than the temperature gradient in the thickness direction of the brittle material substrate. Cooling process is performed.
本発明の脆性材料基板の割断装置によれば、脆性材料基板の割断予定線上の、脆性材料基板を移動させる際の移動方向における後端部に、初期亀裂として終端亀裂を形成する終端亀裂形成部を備えているので、特に終端亀裂を起点としてカット終端部でもフルカットを行うことができる。従って、単に終端亀裂形成部を備えるといった簡易な手法により、カット終端部での切れ残りを無くして割断予定線全域のフルカットを行うことができる。 According to the cleaving method of the brittle material substrate of the present invention, a starting crack is formed as an initial crack at the tip in the moving direction when moving the brittle material substrate on the planned cutting line of the brittle material substrate, and the moving direction Since a terminal crack is formed as an initial crack at the rear end portion in FIG. 2, a full cut can be performed even at the cut terminal portion, particularly starting from the terminal crack. Therefore, a simple method of simply forming the end crack can eliminate the uncut portion at the cut end portion and perform a full cut on the entire cutting planned line.
According to the cleaving apparatus for a brittle material substrate of the present invention, a terminal crack forming portion that forms a terminal crack as an initial crack at the rear end portion in the movement direction when the brittle material substrate is moved on the planned cutting line of the brittle material substrate. Therefore, a full cut can be performed even at the cut end portion, particularly starting from the end crack. Therefore, a simple method of simply providing the terminal crack forming part can eliminate the uncut residue at the cut terminal part and perform the full cut on the entire cutting planned line.
図1は本発明に係る脆性材料基板の割断装置を備えた搬送装置の一例の概略構成を示す平面図であり、図1中符号1は搬送装置、20は脆性材料基板の割断装置(以下、割断装置と記す)である。 Hereinafter, a brittle material substrate cleaving apparatus according to the present invention will be described in detail with reference to the drawings. In the following drawings, the scale of each member is appropriately changed to make each member a recognizable size.
FIG. 1 is a plan view showing a schematic configuration of an example of a transport apparatus provided with a brittle material substrate cleaving apparatus according to the present invention. In FIG. 1,
始端亀裂形成部21は、本実施形態ではダイヤモンドカッタ21aと、これを昇降可能、かつ水平方向に移動させるエアシリンダー等からなる移動機構21bと、を備えている。 The start-end
In this embodiment, the start-end
ここで、ガラス板等の脆性材料基板の、初期亀裂をきっかけにして割断されるメカニズムは、一般に、以下のように考えられる。 In this way, the heat treatment by the
Here, the mechanism by which a brittle material substrate such as a glass plate is cleaved by an initial crack is generally considered as follows.
このような脆性材料基板Wを割断するべく、図4Aに示すように初期亀裂Aにレーザ光を照射して加熱すると、初期亀裂A近傍が加熱され、脆性材料基板Wの表層部に加熱域29が形成される。続いて、冷却剤噴射によって脆性材料基板Wの初期亀裂A近傍を冷却すると、初期亀裂A近傍が冷却され、図4Bに示すように脆性材料基板Wの表層部に冷却域31が形成される。その際、先に加熱によって形成された加熱域29は、熱伝導によって脆性材料基板Wの厚み方向に拡がる。 4A and 4B are diagrams showing cross sections of the brittle material substrate W. In these drawings, the symbol t indicates the thickness of the brittle material substrate W, and the symbol A indicates the initial crack formed on the upper surface of the brittle material substrate W. Show.
In order to cleave such a brittle material substrate W, when the initial crack A is irradiated with laser light and heated as shown in FIG. Is formed. Subsequently, when the vicinity of the initial crack A of the brittle material substrate W is cooled by coolant injection, the vicinity of the initial crack A is cooled, and a
図5A~図5Cは極薄の脆性材料基板Wの上面を示す斜視図であり、これらの図においても符号41は脆性材料基板Wの上面に形成された始端亀裂を示し、符号Lは脆性材料基板Wの割断予定線を示している。 In particular, in the case of an extremely thin brittle material substrate W having a thickness of 300 μm or less, the mechanism by which a full cut (cleaving) is performed on the brittle material substrate W as an initial crack is considered as follows.
5A to 5C are perspective views showing the upper surface of the ultrathin brittle material substrate W. In these drawings,
以下、このような工程を繰り返すことにより、巻き出しロール2から巻き出された脆性材料基板Wを割断装置20によって連続的にフルカットし、所望の寸法にすることができる。 When the brittle material substrate W is cut in this way, the
Hereinafter, by repeating such steps, the brittle material substrate W unwound from the unwinding
例えば、上記実施形態では、始端亀裂形成部21、終端亀裂形成部22をそれぞれ独自の移動機構21b、移動機構22bによって移動可能に構成したが、始端亀裂形成部21、終端亀裂形成部22のそれぞれのダイヤモンドカッタ21a、ダイヤモンドカッタ22aを可動板20aに取り付け、あるいはレーザ照射部23に取り付けることにより、可動板20aを移動させる移動機構25によって始端亀裂形成部21(ダイヤモンドカッタ21a)、終端亀裂形成部22(ダイヤモンドカッタ22a)をそれぞれ移動させてもよい。 The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention.
For example, in the above-described embodiment, the start-end
3 搬送路(加工台)
20 脆性材料基板の割断装置
20a 可動板
21 始端亀裂形成部
22 終端亀裂形成部
23 レーザ照射部(レーザ光照射源)
24 冷却剤噴射部(冷却剤噴射源)
25 移動機構(移動手段)
29 加熱域
31 冷却域
41 始端亀裂
42 終端亀裂
L 割断予定線
W 脆性材料基板 1 Conveying
20 Brittle material
24 Coolant injection part (coolant injection source)
25 Moving mechanism (moving means)
29
Claims (5)
- 脆性材料基板を割断予定線に沿って割断する脆性材料基板の割断方法であって、
脆性材料基板の割断予定線上の、脆性材料基板をレーザ光照射源に対して移動させる際の移動方向における先端部に、始端亀裂を形成し、かつ、移動方向における後端部に、終端亀裂を形成する工程と、
前記脆性材料基板をレーザ光照射源に対して移動させつつ、レーザ光照射源から前記割断予定線上にレーザ光を照射して加熱処理を行う工程と、
レーザ光による脆性材料基板の加熱処理した部位に対して冷却剤噴射源から冷却剤を噴射し、冷却処理を行って前記割断予定線で前記脆性材料基板を割断する工程と、
を備える脆性材料基板の割断方法。 A method of cleaving a brittle material substrate that cleaves the brittle material substrate along a planned cleaving line,
A crack at the leading end in the moving direction when the brittle material substrate is moved relative to the laser beam irradiation source on the cutting line of the brittle material substrate is formed, and a terminal crack is formed at the trailing end in the moving direction. Forming, and
A step of performing a heat treatment by irradiating a laser beam from the laser light irradiation source onto the planned cutting line while moving the brittle material substrate with respect to the laser light irradiation source;
A step of injecting a coolant from a coolant injection source to a heat-treated portion of the brittle material substrate by laser light, performing a cooling treatment, and cleaving the brittle material substrate along the planned cutting line;
A method for cleaving a brittle material substrate. - 前記脆性材料基板が、周縁部に非製品品質エリアを有し、非製品品質エリアの内側に製品品質エリアを有しており、
前記始端亀裂及び前記終端亀裂を形成する工程では、これら始端亀裂及び終端亀裂を共に非製品品質エリアに形成する請求項1記載の脆性材料基板の割断方法。 The brittle material substrate has a non-product quality area at the periphery, and a product quality area inside the non-product quality area;
2. The method for cleaving a brittle material substrate according to claim 1, wherein in the step of forming the start end crack and the end crack, both the start end crack and the end crack are formed in a non-product quality area. - 前記脆性材料基板の厚み方向の温度勾配より、前記脆性材料基板の割断予定線方向の温度勾配が大きくなるように、前記脆性材料基板に前記加熱処理及び前記冷却処理を行う請求項1記載の脆性材料基板の割断方法。 2. The brittleness according to claim 1, wherein the heat treatment and the cooling treatment are performed on the brittle material substrate such that a temperature gradient in a cutting line direction of the brittle material substrate is larger than a temperature gradient in the thickness direction of the brittle material substrate. Material substrate cleaving method.
- 脆性材料基板を割断予定線に沿って割断する脆性材料基板の割断装置であって、
脆性材料基板を配置する加工台と、
前記脆性材料基板の割断予定線上の、脆性材料基板を移動させる際の移動方向における先端部に、始端亀裂を形成する始端亀裂形成部と、
前記脆性材料基板の割断予定線上の、脆性材料基板を移動させる際の移動方向における後端部に、終端亀裂を形成する終端亀裂形成部と、
前記脆性材料基板上にレーザ光を照射するレーザ照射部と、
前記脆性材料基板上に冷却剤を噴射する冷却剤噴射部と、
前記脆性材料基板を前記レーザ照射部及び前記冷却剤噴射部に対して予め設定された方向に移動させる移動手段と、
を備える脆性材料基板の割断装置。 A brittle material substrate cleaving apparatus for cleaving a brittle material substrate along a planned cutting line,
A processing table on which a brittle material substrate is placed;
A start-end crack forming part that forms a start-end crack at a tip end in a moving direction when the brittle material substrate is moved on the planned cutting line of the brittle material substrate,
A terminal crack forming portion that forms a terminal crack at a rear end portion in a moving direction when the brittle material substrate is moved on the planned cutting line of the brittle material substrate,
A laser irradiation unit for irradiating the brittle material substrate with laser light;
A coolant injection unit for injecting a coolant onto the brittle material substrate;
Moving means for moving the brittle material substrate in a preset direction with respect to the laser irradiation unit and the coolant injection unit;
A brittle material substrate cleaving apparatus comprising: - 前記移動手段は、前記脆性材料基板に対して前記レーザ照射部及び前記冷却剤噴射部を移動させるように構成され、
前記始端亀裂形成部及び前記終端亀裂形成部は、前記レーザ照射部と同じ移動路上を移動するように構成されている請求項4記載の脆性材料基板の割断装置。 The moving means is configured to move the laser irradiation unit and the coolant injection unit with respect to the brittle material substrate,
The brittle material substrate cleaving apparatus according to claim 4, wherein the start-end crack forming section and the end-end crack forming section are configured to move on the same moving path as the laser irradiation section.
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