WO2011047875A2 - Method for the light-induced, galvanic pulsed deposition for forming a seed layer for a metal contact of a solar cell and for the subsequent reinforcement of said seed layer or said metal contact and arrangement for carrying out the method - Google Patents
Method for the light-induced, galvanic pulsed deposition for forming a seed layer for a metal contact of a solar cell and for the subsequent reinforcement of said seed layer or said metal contact and arrangement for carrying out the method Download PDFInfo
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- WO2011047875A2 WO2011047875A2 PCT/EP2010/006468 EP2010006468W WO2011047875A2 WO 2011047875 A2 WO2011047875 A2 WO 2011047875A2 EP 2010006468 W EP2010006468 W EP 2010006468W WO 2011047875 A2 WO2011047875 A2 WO 2011047875A2
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- solar cell
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- light
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 97
- 239000002184 metal Substances 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims description 47
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- 230000008021 deposition Effects 0.000 title description 4
- 238000000151 deposition Methods 0.000 claims abstract description 6
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- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 claims description 19
- 230000036962 time dependent Effects 0.000 claims description 18
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 230000001360 synchronised effect Effects 0.000 claims description 8
- 238000002161 passivation Methods 0.000 claims description 7
- 230000000737 periodic effect Effects 0.000 claims description 7
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- 238000000137 annealing Methods 0.000 claims description 3
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 239000003792 electrolyte Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 7
- 238000009713 electroplating Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 230000002123 temporal effect Effects 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
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- 230000003014 reinforcing effect Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
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- 239000010409 thin film Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
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- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 101100390736 Danio rerio fign gene Proteins 0.000 description 1
- 101100390738 Mus musculus Fign gene Proteins 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 241000620457 Telestes souffia Species 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
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- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910001429 cobalt ion Inorganic materials 0.000 description 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/011—Electroplating using electromagnetic wave irradiation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/028—Electroplating of selected surface areas one side electroplating, e.g. substrate conveyed in a bath with inhibited background plating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
- C25D7/126—Semiconductors first coated with a seed layer or a conductive layer for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Definitions
- the present invention relates to a photoinduced galvanic pulse deposition method, with which a further metal contact can be formed for a solar cell having only a single metal contact.
- the metal contact to be formed is, in particular, the front-side contact of the solar cell (the existing individual contact is then the back contact or rear-side contact of the solar cell).
- the invention also relates to an arrangement corresponding to the method.
- CONFIRMATION COPY The efficiency of a solar cell depends inter alia on the amount of electrical contact resistance of the solar cell. This is the contact between the semiconductor material of the solar cell (usually: doped silicon) and a metal which is intended to dissipate the current generated in the cell, ie a contact between the front side contact of the solar cell and the semiconductor material thereof and between the rear contact of the solar cell and the semiconductor material thereof. A reduction of this contact resistance leads to an increase in the efficiency of the solar cell.
- the inventive method described below relates in particular to the contact formation on the n-side of any solar cell: In a standard p-type solar cell, this is the front side, ie the side facing the light. For this reason, the metal contacts to be formed on the front side must ensure a sufficiently high incidence of light into the solar cell, ie not overshadow the cell too much (as a rule, a plurality of individual metal contacts or metal contact sections are formed on the front side; However, in the following description of a front contact in the singular spoken: As a rule, this contact thus comprises a plurality of connected individual contacts or contact portions).
- a paste which holds Silberkoloiddispers ent ⁇ is printed by a microstructured mask on the solar cell.
- ⁇ th which are essential for the contact formation, which starts only at least 800 ° C.
- This Me ⁇ Thode has some drawbacks: Although the passivation must approximately layer not be opened and the adhesion to the silicon is better than the rei ⁇ nen silver due to the glass particles on the front of the solar cell, but which then formed contact is very inhomogeneous and overall has a relatively large contact resistance. Moreover, the method is only suitable if the emitter has sufficient surface area.
- the solar cell surface has phosphorus concentration, that is highly doped (up to about 10 20 atoms / cm 3 ). Although this simplifies the passivation of the surface, but leads to a - compared with a low-doped emitter - lower open circuit voltage. Furthermore, the aspect ratio, ie the height to width ratio of the metal fingers of the formed contact, is unfavorable. This means a relatively large shading of the solar cell surface, so a loss of efficiency.
- nickel is electroless, that is deposited with chemical reducing agents from an aqueous nickel-containing nickel solution on the semiconductor and then annealed.
- the disadvantage here is that this process is extremely difficult to control, so it can be poorly reproduced and usually leads to inhomogeneous layers.
- the passivation layer must first be opened microstructured.
- One of these methods describes the so-called light-induced electroplating, in which a solar cell having a front contact on the front side and a rear side contact is connected to an external voltage source by means of the rear side contact. Under illumination, the solar cell acts as a current or voltage source for the galvanic process, the front-side contact being the cathode (low potential) and the back-side contact the anode of the galvanic cell.
- the rear side contact is usually made of aluminum or an aluminum alloy (here too is spoken of a back contact in the singular, although it may also be several individual electrical contacts, which are angeord ⁇ net on the back), the anodic Process of this galvanic cell, the electrochemical ⁇ solution of aluminum, so the resolution of the back ⁇ side contact.
- auxiliary electrode which is also referred to below as an anode as an alternative: this a kon ⁇ stante potential difference is applied in such a way between the back of the solar cell or the back ⁇ side contact and of these consisting of the deposited Me ⁇ tall auxiliary electrode, that the back side opposite to the auxiliary electrode is negatively po ⁇ larized (ie the backside contact must be at a lower or more negative potential than the auxiliary electrode or the anode).
- the anodic dissolution of the auxiliary electrode (which is also referred to below as an anode as an alternative) takes place. is drawn) instead. Since the back contact of the solar cell is usually metallized over the entire surface, the connection of the back side contact with a voltage source is technically less demanding.
- the auxiliary electrode can thus be understood as a sacrificial anode.
- a potential difference arises between the light-facing side of the solar cell (front-side contact) and the auxiliary electrode, the magnitude of which is determined by the potential difference applied between the back and the auxiliary electrode on the one hand and between the back and the front the solar cell occurring potential difference on the other hand depends. The latter is determined by the incident on the solar cell light intensity.
- the already existing and by the light-induced electroplating reinforced metal contacts on solar cells have some shortcomings:
- the electrical ⁇ cal conductivity of these metal contacts is less than the specific conductivity of the corresponding metal
- the adhesion of the galvanically reinforced metal layer on the already existing metal layer is not optimal and the aspect ratio (ratio of height to width) of the metal contact is reduced by the galvanic process (however, the largest possible aspect ratio is desirable to keep the shading of the solar cell as low as possible).
- the object of the present invention is, starting from the prior art, the known light-induced galvanic amplification processes in which an existing metal contact of a solar cell by the light-induced electroplating reinforced or
- the object is therefore to achieve optimized electrical conductivity and optimized adhesion of a metal contact in a simple and reliable manner, to reduce internal stresses in the metal contact and to produce metal contact with an improved aspect ratio.
- the basic starting point of the present invention is to use the light-induced electrodeposition process not only to reinforce an already existing metal contact, but to apply to a solar cell, which has only one metal contact of its two applied metal contacts, in which therefore the second metal contact still completely is missing.
- Such le ⁇ diglich exactly one metal contact (typically: the rear-side contact) having solar cell can then at the opposite to the existing metal contact side (typically: the front or front side) to be open: That is, the passivation layer of the front side of the solar cell can, be ⁇ preferably microstructured, be open.
- the thus opened solar cell is then immersed in an electrolytic bath with an electrolyte containing those metal ions that lead to the the existing Me ⁇ talltitle opposite side for forming the second metal contact.
- the procedure is by the present invention, described in more detail below, light-induced galvanic deposition thus formed of the electrolyte contained in the requested metal ions ⁇ a seed layer for the second metal contact directly on the semiconductor material of the solar cell.
- This seed layer can then by the light-induced galvanic deposition decision procedure according to the present invention can also be further extended or thickened, so that the whole second metal contact can be made with the invention shown SEN method.
- the light-induced electroplating has hitherto been exclusively used to reinforce existing metal contacts (eg screen printing fingers or randomly generated seed layers), according to the present invention the contact formation with the light-induced electroplating already takes place.
- contact formation is understood to mean the formation of a seed layer of a metal immediately adjacent to and / or in conjunction with a semiconductor material of the solar cell. According to the invention, both the light incident on the (initially having only a single metal contact) solar cell and at the same time between the already existing metal contact (as a rule: rear contact) of the solar cell and the
- Auxiliary electrode potential (potential difference A URH) a predefined, time-varying characteristics.
- a time-dependent variation of the voltage-time characteristic (or the potential difference AURH) according to the invention and / or the time-dependent variation of the light irradiation time characteristic (or the light irradiation) can be a pulse-shaped variation.
- both the potential applied between the existing metal contact and the auxiliary electrode and the light irradiation have a pulse-shaped course (bigepulse method).
- both the potential difference AU RH and the incident light intensity over time are not constant ("constant” is understood here to mean that the corresponding magnitude value is constant over time except for the naturally unavoidable statistical fluctuations), but both the potential difference AU RH between already existing metal contact and the auxiliary electrode, as well as the light irradiation is varied in a time-dependent manner according to a predefined time characteristic.
- the voltage-time characteristic, with which the potential difference is varied over time can also be understood as the corresponding current-time characteristic.
- a corresponding variation of current density values over time can also be realized. In the following, simplified is always spoken of a voltage-time characteristic, although this may thus alternatively or cumulatively also be a variation of current density values.
- pulse sequences of the voltage-time characteristic on the one hand and the light irradiation time characteristic on the other hand are synchronized with each other: pulse sequences of the potential difference on the one hand and pulse sequences of the light irradiation on the other can be realized in the form of synchronized pulse sequences.
- a particularly advantageous contacting can be realized according to the invention.
- This potential difference AU RH must be ⁇ 0 in the time average, since otherwise the galvanic dissolution of the already existing metal contact (that is to say in particular of the rear-side contact) would take place and not the galvanic dissolution of the auxiliary electrode. However, this must apply only on a temporal average, so that quite short periods are also possible (see also the following exemplary embodiments) in which these Condition is not met.
- a synchronization of the voltage-time characteristic (hereinafter alternatively also referred to as the first characteristic) or a pulse sequence corresponding thereto and the light irradiation time characteristic (hereinafter also referred to as second characteristic) or a pulse sequence corresponding thereto is understood below as that both characteristics at least during a defined time interval (preferably: during their entire application) each have a periodic course (eg in the form of a pulse sequence), wherein the periodic course of the first characteristic and that of the second characteristic in the said time interval are matched.
- the period of one charac ⁇ teroxid can be an integer multiple of the period of the other characteristic.
- the frequency of one characteristic may be an integer multiple of the frequency of the other characteristic.
- both periods or frequencies are identical, but then the two characteristics are shifted from one another by a fixed, predefined time interval (for example, maxima of the first characteristic may be shifted by half a period with respect to maxima of the second characteristic) ,
- the invention is not limited to periodic pulse trains:
- a temporal Synchronisie ⁇ tion of the first characteristic and the second Cha ⁇ rakterizing also present when the two influencing large (ie, the potential difference AU RH on the one hand and the light irradiation or the incident radiation amount on the other hand) during both successive periods or time intervals always both have the same state (such a state, for example, a defined voltage or a defined amount of light irradiated or no applied voltage or no applied quantity of light).
- immediately consecutive time intervals or time segments each have one and the same time interval.
- a synchronous pulse sequence of the two characteristics is realized particularly advantageously at the same time that at the side of the solar cell opposite the metal electrode already present there is temporarily no voltage generated by external influences, ie neither by
- the following is understood to be a synchronous pulse sequence of the two characteristics: the pulse lengths of both the light pulses and the voltage pulses must be matched to one another such that periodically recurring phases of open cell potential occur at the front side of the solar cell.
- the open cell potential is the potential that adjusts itself to an electrode immersed in an electrolyte and over which no Electricity flows.
- the front of the solar cell (light-facing side) is not under open cell voltage as long as the solar cell is illuminated and as long as a voltage is applied to the backside of the auxiliary electrode. Only a non-illuminated solar cell with simultaneous galvanic separation of the back of the voltage source leads to the open cell potential at the
- Characterist ik periodically or in the form of pulse sequences can be varied over time.
- anodic pulses can be applied to the initial phase of a pulse routine, pulses of different sizes can also be superimposed, etc.
- An anodic pulse is the application of a potential to a workpiece, which results in an anodic reaction (oxidation) on the workpiece, ie in the present arrangement a positive (high) potential.
- a cathodic potential is that which results in a cathodic reaction (reduction) on the workpiece, in the present arrangement a negative (low) potential.
- pulse trains themselves d. H. Between individual pulse trains, each with a voltage-time characteristic varying in the form of individual pulses over time and / or light irradiation time characteristic, time intervals occur in which no time variation of the voltage-time characteristic and / or the light irradiation Time characteristic takes place.
- the generated potential difference can also be changed step by step.
- the shape of individual pulses can be nonlinear in this case, in addition to triangular or rectangular pulses can also sinusoidal pulses, exponentially shaped pulses and / or two, three or more degrees
- the second metal contact and the auxiliary electrode Extending between the side of the to be grown, the second metal contact and the auxiliary electrode a ⁇ alternate voltage runs of the applied potential difference between the first metal contact (usually: back contact) and the auxiliary electrode in the same direction, that is, a cathodic potential at the Back leads z. B. to a cathodic potential on the front.
- the potential difference ⁇ ⁇ a connected to a function generator between the first metal contact and the auxiliary electrode switched voltage source can be produced according to the invention:
- the function generator is then generated by the voltage source applied between the first metal contact and the auxiliary electrode potential difference AU RH varies with time.
- Voltage sources (which generate different voltages) are connected between the first metal contact and the auxiliary electrode. This is particularly advantageous in the course of inline processes in the production of solar cells.
- the light irradiation time characteristic of the light irradiated to the solar cell can be varied by connecting a light source irradiating the solar cell (especially the front side) to a frequency generator. With the latter, the voltage applied to the light source voltage can then be varied time-dependent, so that the light intensity emitted by the light source has a corresponding temporal variation.
- a generation of a seed layer is thus carried out with voltage and Lich-pulsed (ie bigepulster) light-induced electroplating:
- Lich-pulsed (ie bigepulster) light-induced electroplating For this purpose, the previously by any method
- Microstructured open Passivitations slaughter the front of only one metal contact on the back having solar cell in a suitable for the metal to be applied contact metal-containing electrolyte are immersed.
- These metal ions are preferably nickel ions, cobalt ions or tungsten ions.
- the inventive method results in a thin, homogeneous seed layer of, for example nickel, cobalt or tungsten, which can then be subsequently further strengthens ver ⁇ according to the invention on the basis of light induced plating.
- the method can be used independently of the emitter resistance, ie also for high-resistance emitters.
- the method can be carried out with all prior art electrolytes for the respective metal to be deposited of the second metal contact (the electrolytes listed above and below are thus to be understood as examples).
- the already existing individual metal contact of the solar cell is connected to the auxiliary electrode in such a way that a predefined potential difference, which can be varied over time or which changes over time, can be applied between the two.
- This potential difference advantageously consists of a periodic sequence of voltage pulses of different polarity, different amount and / or different duration and from voltage-free periods. This can be realized by the above-described function generator.
- the voltage pulses are selected such that the side of the solar cell carrying the already existing metal contact is at a lower potential for a longer duration than the auxiliary electrode.
- the front can be irradiated with a pulsed light source.
- a seed layer of the corresponding metal forms, wherein the duration of the treatment is preferably set so that the seed layer is between 50 nm and 500 nm thick.
- second characteristic the light irradiation time characteristic ik being time-dependent.
- current characteristic changes corresponding to the characteristics may also be generated.
- the first characteristic (or its time-dependent variation) is synchronized with the second characteristic (or its time-dependent variation).
- the two characteristics are designed so that during a plurality of spaced apart successive intervals defined intervals neither a potential difference AU RH between the first metal contact and the auxiliary electrode is applied, nor a light irradiation to the solar cell.
- the seed layer for the second metal contact thus produced is preferably used as the cathode in order to further grow the second metal contact based on the seed layer (by further maintaining a potential difference AU RH and a light irradiation).
- the present invention will be described by way of embodiments. Show:
- Figure 1 shows the basic arrangement which is used for ⁇ leadership of the method according to the invention
- FIG. 2 shows a first example of a temporal Va ⁇ riation the potential difference AU RH Zvi ⁇ rule a solar cell rear side and the auxiliary electrode and for a temporal variation of the light radiation on the front side of the solar cell;
- Figure 3 is a further corresponding example.
- Fig. 1 shows an arrangement according to the invention, which is designed for performing a light-induced electrodeposition process according to the invention.
- a container 1 In a container 1 is an electrolytic bath 6, in which an auxiliary electrode H (which serves as the anode of the electrodeposition) is arranged.
- auxiliary electrode H which serves as the anode of the electrodeposition
- the auxiliary electrode H is electrically connected to the back contact R via an insulated electrical lead 12 and an insulated electrical lead 11. Between the two lines 11 and 12, a voltage source 2 is connected, with which the applied between the auxiliary electrode H and the back contact R potential difference AU RH can be varied time-dependent.
- This time-dependent variation is accomplished by means of a function generator 3 (which is connected by means of the line 13 to the voltage source 2), the voltage generated by the voltage source 2 is varied time-dependent.
- a light source 4 is arranged, with which the side of the front side contact V of the solar cell S can be irradiated with electromagnetic radiation 5, which causes Stromer ⁇ generating in the solar cell.
- the voltage source 2 is controlled by the function generator 3 so as to realize the voltage-time characteristics shown in these figures.
- the voltage source ⁇ 2 can thus be controlled so that almost any Voltage sequences between the solar cell rear side R and the auxiliary electrode H can be generated.
- FIG. 2 shows a first example of a simultaneous formation of a voltage-time characteristic of the potential difference UU RH and a light-irradiation time characteristic of a quantity of light irradiated onto the front side of a solar cell.
- the solar cell which has only one rear-side contact, is immersed in an electrolyte 6 which has the following composition:
- Residual Ingredients Water
- the pH of the electrolyte solution which can be stirred moderately fast, is between 2 and 6, preferably between 3 and 4.
- the temperature of the electrolyte solution may be between room temperature (20 ° C) and 70 ° C, preferably between 40 ° C and 60 ° C.
- FIG. 2 a shows the potential pulse routine or the voltage-time characteristic for the potential difference AURH which is applied between the rear-side contact R of the solar cell S and the auxiliary electrode H.
- the potential pulse routine shown is also referred to as so-called "reverse pulse plating".
- an anodic pulse U 2 of the duration of the time interval [t 4 , t 5 ] with t 5 > t 4 is applied, that of a voltage-free time in the time interval [t 5 , t 7 ] with t 5 ⁇ t 7 followed.
- AU RH U oc ⁇ Ui ⁇ U 0 c ⁇ ü 2 .
- U 0 c is the open cell voltage: there is no potential difference between two electrodes from the outside
- Electrodes front and back set a potential according to the electrochemical conditions, i. the system tries to reach equilibrium. This leads to a restructuring of the electrolytic double layer, the phase boundary between the electrode and the electrolyte. It is this periodic restructuring of this bilayer that most beneficially affects the growth of metal contact on the solar cell.
- [ti, t 7 ] constitutes a period of a periodic voltage-time characteristic according to the invention.
- Time interval [t 0 , ti] the light intensity changes from I 0 to Ii with I 0 ⁇ Ii.
- the time interval [ti, t 7 ] is now subdivided into six sections of equal length, with the following for the time periods ti to t 7 defining these periods: ti ⁇ t 2 ⁇ t 3 ⁇ t 4 ⁇ t 5 ⁇ t 6 ⁇ t 7 .
- Figure 2b shows the time course of the potential that is established at the front or in the region of the seed layer of the solar cell ⁇ S (Potentialdiffe ⁇ rence between the front and auxiliary electrode).
- the above-described pulse sequence in the light intensity and at the same time in the potential difference AU RH ensures a change between phases of nucleation (during the time interval [ti, t 4 ] and the subsequent intervals of the pulse period corresponding to this interval) and phases in which a germination takes place ( during the time interval
- t 4 - ti can be between 10 "5 seconds and 1 second, preferably between 10 " 4 seconds and 0.1 seconds; t 5 - t 4 can be between 10 "6 seconds and 0.1 seconds, preferably between 10 ⁇ 5 seconds and 0.1 seconds, t 7 - t 5 can be between 0 seconds and 1 second, preferably between 10 ⁇ 2 seconds and 1 second.
- the cathodic voltage pulse Ui can be between -1.5 volts and -0.1 volts, preferably between -0.6 volts and -0.2 volts
- the anodic pulse U 2 can be between + 0.1 and + 5 volts, preferably between + 0.2 volts and + 1.5 volts.
- the light intensity Io can be between 0 W / m 2 and 100 W / m 2 , preferably between 0 W / m 2 and 1 W / m 2.
- Ii can be between 100 W / m 2 and 2000 W / m 2 , preferably between 100 W / m 2 and 1500 W / m 2.
- I 2 can be between 100 W / m 2 and 2000 W / m 2 , preferably between 200 W / m 2 and 1000 W / m 2 .
- the above-described pulse routine in light intensity and potential difference generates a homogeneous seed layer for the second metal contact of the solar cell, the thickness of which can be controlled by the number of repetitions.
- FIG. 3 shows an analogous example of a light and a potential difference sequence as in the case described in FIG. 2, so that only the differences will be described below.
- the voltage pulses which are applied between the solar cell rear side and the auxiliary electrode, and the light pulses are in this case specifically matched to the fact that the front side of the solar cell over sufficient periods or time intervals on open Cell potential (U 0 c in Figure 3b).
- the potential difference between the rear side and the auxiliary electrode is pulsed so that initially no potential difference is applied in the time interval [t 0 , ti].
- a cathodic voltage pulse Ui in the time interval [tx, t 2 ] followed by an anodic voltage pulse U 2 in the time interval [t 2 , t 3 ].
- the time interval [t 3 , t 4 ] again there is no potential difference ⁇ ⁇ .
- the time interval [ti, t 4 ] is then repeated periodically.
- the light pulses are selected such that during the time interval [t 0 , ti] the light intensity I 0 is irradiated, followed by the intensity Ii> I 0 in the time interval [ti, t 2 ]. In the time interval [t 2 , t 4 ] the intensity is again Io The light irradiation characteristic of the time interval [ti, t 4 ] is then repeated periodically.
- t 2 -ti can be between 10 "5 seconds and 1 second, preferably between 10 ⁇ 4 seconds and 0.1 seconds t 3 - t 2 can be between 10 " 6 seconds and 0.1 seconds, preferably between 10 "5 seconds and 0.1 seconds t 4 -t 3 can be between 10 -5 seconds and 1 second, preferably between 10 ⁇ 2 seconds and 1 second Ui can be between -1.5 volts and -0.1 volts, preferably between -0.6 volts and -0.2 volts U 2, between +0.1 volts and +5 volts may be, preferably, between +0.2 volts and +1.5 volts.
- I 0 can lie between 0 W / m 2 and 100 W / m 2, preferably between 0 W / m 2 and 1 W / m 2 .
- Ii can be between 100 W / m 2 and 200 W / m 2 , preferably between 500 W / m 2 and 1500 W / m 2 .
- the method according to the invention for producing the second metal contact can be supplemented as follows:
- the solar cell arrangement S (comprising the rear-side contact R, the semiconductor layer and the growing front-side contact or the seed layer) can be tempered. This means that the solar cell is exposed to higher temperatures, as a result of which improved contact bonding may occur.
- the tempering may be carried out before a galvanic reinforcement following the formation of the seed layer, but it may also be carried out after the galvanic reinforcement.
- Advantageous temperature ranges of tempering are 150 ° C. to 600 ° C., advantageous tempering times are 10 s to 20 min.
- annealing can also be dispensed with.
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Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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CN2010800588719A CN102686784A (en) | 2009-10-23 | 2010-10-22 | Method for the light-induced, galvanic pulsed deposition for forming a seed layer for a metal contact of a solar cell and for the subsequent reinforcement of said seed layer or said metal contact and arrangement for carrying out the method |
EP10776563A EP2491166A2 (en) | 2009-10-23 | 2010-10-22 | Method for the light-induced, galvanic pulsed deposition for forming a seed layer for a metal contact of a solar cell and for the subsequent reinforcement of said seed layer or said metal contact and arrangement for carrying out the method |
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DE102009051688.3 | 2009-10-23 | ||
DE102009051688A DE102009051688A1 (en) | 2009-10-23 | 2009-10-23 | Method for light-induced galvanic pulse deposition for forming a seed layer for metal contact of a solar cell and for subsequent reinforcement of this seed layer or metal contact and arrangement for carrying out the method |
Publications (3)
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WO2011047875A2 true WO2011047875A2 (en) | 2011-04-28 |
WO2011047875A8 WO2011047875A8 (en) | 2011-06-30 |
WO2011047875A3 WO2011047875A3 (en) | 2012-02-09 |
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PCT/EP2010/006468 WO2011047875A2 (en) | 2009-10-23 | 2010-10-22 | Method for the light-induced, galvanic pulsed deposition for forming a seed layer for a metal contact of a solar cell and for the subsequent reinforcement of said seed layer or said metal contact and arrangement for carrying out the method |
Country Status (5)
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EP (1) | EP2491166A2 (en) |
KR (1) | KR20120110101A (en) |
CN (1) | CN102686784A (en) |
DE (1) | DE102009051688A1 (en) |
WO (1) | WO2011047875A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011084843A1 (en) | 2011-10-20 | 2013-04-25 | Schott Solar Ag | Electroplating of galvanic emitter contact used for silicon-based wafer for solar cell involves using fluoride-containing nickel and/or cobalt electrolyte composition |
AU2010314804B2 (en) * | 2009-11-03 | 2016-12-01 | Newsouth Innovations Pty Limited | Photoplating of metal electrodes for solar cells |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101449942B1 (en) | 2012-01-17 | 2014-10-17 | 주식회사 호진플라텍 | Plating equipment for solar cell wafer using electroplating and light-induced plating jointly and method of the same |
DE102014210008A1 (en) * | 2014-05-26 | 2015-11-26 | Muhr Und Bender Kg | Method and plant for producing a hardened molded part |
CN106531817A (en) * | 2015-09-08 | 2017-03-22 | 英属开曼群岛商精曜有限公司 | Semiconductor element and manufacturing method thereof |
CN114744073A (en) * | 2022-01-26 | 2022-07-12 | 深圳黑晶光电科技有限公司 | Method for realizing metallization of solar cell and crystalline silicon solar cell |
Family Cites Families (8)
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US4251327A (en) * | 1980-01-14 | 1981-02-17 | Motorola, Inc. | Electroplating method |
US4608138A (en) * | 1984-02-16 | 1986-08-26 | Mitsubishi Denki Kabushiki Kaisha | Electrolytic method and apparatus |
CN100576578C (en) * | 2006-04-20 | 2009-12-30 | 无锡尚德太阳能电力有限公司 | The method and the electrochemical depositer thereof that prepare solar cel electrode |
US20080035489A1 (en) * | 2006-06-05 | 2008-02-14 | Rohm And Haas Electronic Materials Llc | Plating process |
CN100533785C (en) * | 2006-06-05 | 2009-08-26 | 罗门哈斯电子材料有限公司 | Plating method |
DE102007005161B4 (en) * | 2007-01-29 | 2009-04-09 | Nb Technologies Gmbh | Process for the metallization of substrates |
JP5216633B2 (en) * | 2008-03-19 | 2013-06-19 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Method for suppressing background plating |
DE102009029551B4 (en) * | 2009-09-17 | 2013-12-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for galvanic coating of substrates |
-
2009
- 2009-10-23 DE DE102009051688A patent/DE102009051688A1/en not_active Withdrawn
-
2010
- 2010-10-22 EP EP10776563A patent/EP2491166A2/en not_active Withdrawn
- 2010-10-22 CN CN2010800588719A patent/CN102686784A/en active Pending
- 2010-10-22 WO PCT/EP2010/006468 patent/WO2011047875A2/en active Application Filing
- 2010-10-22 KR KR1020127013037A patent/KR20120110101A/en not_active Application Discontinuation
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2010314804B2 (en) * | 2009-11-03 | 2016-12-01 | Newsouth Innovations Pty Limited | Photoplating of metal electrodes for solar cells |
DE102011084843A1 (en) | 2011-10-20 | 2013-04-25 | Schott Solar Ag | Electroplating of galvanic emitter contact used for silicon-based wafer for solar cell involves using fluoride-containing nickel and/or cobalt electrolyte composition |
Also Published As
Publication number | Publication date |
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DE102009051688A1 (en) | 2011-04-28 |
WO2011047875A8 (en) | 2011-06-30 |
CN102686784A (en) | 2012-09-19 |
WO2011047875A3 (en) | 2012-02-09 |
KR20120110101A (en) | 2012-10-09 |
EP2491166A2 (en) | 2012-08-29 |
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