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WO2009116552A1 - Outil revêtu de carbone amorphe - Google Patents

Outil revêtu de carbone amorphe Download PDF

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Publication number
WO2009116552A1
WO2009116552A1 PCT/JP2009/055228 JP2009055228W WO2009116552A1 WO 2009116552 A1 WO2009116552 A1 WO 2009116552A1 JP 2009055228 W JP2009055228 W JP 2009055228W WO 2009116552 A1 WO2009116552 A1 WO 2009116552A1
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WO
WIPO (PCT)
Prior art keywords
amorphous carbon
carbon film
layer portion
substrate
coated tool
Prior art date
Application number
PCT/JP2009/055228
Other languages
English (en)
Japanese (ja)
Inventor
護 木幡
Original Assignee
株式会社タンガロイ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社タンガロイ filed Critical 株式会社タンガロイ
Publication of WO2009116552A1 publication Critical patent/WO2009116552A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3492—Variation of parameters during sputtering
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
    • H05K3/0047—Drilling of holes

Definitions

  • the present invention relates to an amorphous carbon-coated tool in which an amorphous carbon film is coated on a base material.
  • amorphous carbon-coated tool As a conventional amorphous carbon-coated tool, there is an amorphous carbon-coated tool in which the amount of hydrogen in the amorphous carbon film is 5 atomic% or less (see, for example, Patent Document 1).
  • a DLC having a two-layer structure of a base layer that substantially does not contain hydrogen and a hydrogen-containing layer that is provided on the base layer and contains hydrogen within a range of 2 atomic% to 20 atomic% There is a DLC film-coated tool coated with a diamond-like carbon film (for example, see Patent Document 2).
  • these tools have a problem that the adhesion between the coating and the substrate is not sufficient.
  • an object of the present invention is to provide an amorphous carbon-coated tool that is excellent in adhesion between an amorphous carbon film and a base material and is excellent in wear resistance.
  • the present inventor has developed an amorphous carbon-coated tool.
  • an amorphous carbon film having a large amount of hydrogen is coated on the side in contact with the substrate, and an amorphous carbon film having a small amount of hydrogen is coated on the upper surface thereof.
  • the present invention was completed with the knowledge that an amorphous carbon-coated tool with excellent wear resistance and excellent adhesion between the amorphous carbon film and the substrate can be obtained. .
  • the amorphous carbon-coated tool of the present invention includes a base material and an amorphous carbon film, and the amorphous carbon film is composed of an inner layer portion on the side in contact with the base material and an outer layer portion on the surface side.
  • the amount of hydrogen contained in the inner layer portion of the crystalline carbon film is larger than the amount of hydrogen contained in the outer layer portion of the amorphous carbon film.
  • Examples of the base material for the amorphous carbon-coated tool of the present invention include high-speed steel, cemented carbide, ceramics, and ultra-high pressure sintered body. Among these, cemented carbide is more preferable because it is excellent in hardness and toughness.
  • the amorphous carbon film of the present invention includes what is called a hard carbon film, a diamond-like carbon film, a DLC film, an aC: H film, an i-carbon film, a ta-C film, and the like.
  • the amorphous carbon film of the present invention is composed of an inner layer portion in contact with the substrate and an outer layer portion on the surface side.
  • the amount of hydrogen contained in the inner layer portion of the amorphous carbon film is greater than the amount of hydrogen contained in the outer layer portion of the amorphous carbon film. This is because when the amount of hydrogen in the amorphous carbon film is low, the hardness of the amorphous carbon film is high, but the adhesion between the amorphous carbon film and the substrate is low. It is determined from the knowledge that, when the amount is high, the adhesion to the base material becomes high.
  • the concentration of hydrogen in the inner layer portion of the amorphous carbon film has a concentration gradient that gradually decreases from the side in contact with the base material toward the surface side, it is possible to prevent adhesion and decrease in coating hardness. More preferable.
  • the amount of hydrogen contained in the outer layer portion of the amorphous carbon film of the present invention is less than 0.5 atomic%, that is, an amount meaning that substantially no hydrogen is contained, and is contained in the inner layer portion of the amorphous carbon film. More preferably, the hydrogen content is 0.5-3 atomic%. This is because when the amount of hydrogen in the amorphous carbon film is less than 0.5 atomic%, the hardness of the amorphous carbon film is high, but the adhesion between the amorphous carbon film and the substrate is low, and the amorphous carbon film is amorphous.
  • the amount of hydrogen in the amorphous carbon film and its concentration gradient are measured using elastic recoil detection method (ERDA) using high-energy ions such as helium as incident particles, resonance nuclear reaction method (NRA: Nuclear Reaction Analysis), etc. It can be measured by doing.
  • the thickness of the inner layer portion in the amorphous carbon film of the present invention is preferably 1 to 10% of the entire thickness of the amorphous carbon film. If the thickness of the inner layer portion of the amorphous carbon film is less than 1% of the entire film thickness, the effect of increasing the wear resistance cannot be sufficiently obtained. The hardness of the entire film decreases. Therefore, the thickness of the outer layer portion of the amorphous carbon film is preferably 90 to 99% of the entire thickness of the amorphous carbon film.
  • the amorphous carbon film of the present invention preferably has a hardness by nanoindentation of 20 to 100 GPa, more preferably 30 to 80 GPa. This is because if the hardness is less than 20 GPa, the wear resistance decreases, and if it exceeds 100 GPa, the chipping resistance of the cutting edge decreases.
  • the elastic recovery rate of the amorphous carbon film of the present invention is easily plastically deformed when the elastic recovery rate is less than 70%, it preferably has an elastic recovery rate of 70 to 100%.
  • the amorphous carbon film of the present invention preferably has a film thickness of 0.06 to 5 ⁇ m. If the film thickness is less than 0.06 ⁇ m, the effect of covering the amorphous carbon film cannot be obtained. If the film thickness exceeds 5 ⁇ m, the compressive stress of the amorphous carbon film increases, and Adhesion decreases.
  • the compressive stress existing in the base material affects the chipping resistance and the adhesion between the amorphous carbon film and the base material. Regardless of the surface state of the substrate, the compressive stress present in the substrate is preferably 0.3 GPa or less. If the compressive stress of the substrate exceeds 0.3 GPa, chipping is likely to occur in the amorphous carbon film.
  • the compressive stress existing in the base material can be measured by the 2 ⁇ -sin 2 ⁇ method, and specifically, the compressive stress of the base material can be measured using the following formulas 2 and 3.
  • the compressive stress which exists in WC can be considered as the compressive stress which exists in a base material.
  • Stress ⁇ -E / (2 ⁇ (1 + ⁇ )) ⁇ cot ⁇ 0 ⁇ ⁇ / 180 ⁇ ⁇ (2 ⁇ ) / ⁇ (sin 2 ⁇ )
  • Stress ⁇ K ⁇ ⁇ (2 ⁇ ) / ⁇ (sin 2 ⁇ ) ⁇ : Angle between sample surface normal and lattice surface normal ⁇ : Stress (MPa) E: Young's modulus (MPa) ⁇ : Poisson's ratio ⁇ 0 : Standard Bragg angle (degrees) K: Constant determined by material properties and standard Bragg angle ⁇ 0
  • the amorphous carbon film of the present invention has a first peak in the range of wave numbers 1560 to 1600 cm ⁇ 1 and a wave number of 1100 to 1200 cm in a Raman spectrum by Raman spectroscopy using an argon gas laser having a wavelength of 514.5 nm. More preferably, it has a second peak in the range of -1 .
  • the Raman spectrum in the range of wave numbers 800 ⁇ 2000 cm -1 was measured, peaks hardly observed in the vicinity of a wave number of 1350 cm -1, if there is a first peak and second peak in the range of the wave number, amorphous It shows a tendency for the hardness of the carbon film to increase.
  • the amorphous carbon film of the present invention has high hardness comparable to diamond, and exhibits excellent wear resistance when used as a cutting tool. Since the amorphous carbon film of the present invention has a high sp 3 bond ratio, the room temperature hardness and the high temperature hardness are increased.
  • amorphous carbon-coated tool of the present invention include cutting tools such as drills, end mills, and throw-away tips, and dies.
  • the amorphous carbon film of the present invention can be obtained by physical vapor deposition using solid carbon as a starting material.
  • physical vapor deposition include arc ion plating, laser ablation, and sputtering.
  • the arc ion plating method in which the adhesion between the amorphous carbon film and the base material is high and the hardness of the obtained amorphous carbon film is high is more preferable.
  • Arc ion plating produces carbon ions with a higher ionization rate than other methods, resulting in a dense and hard film with a high sp 3 bond ratio similar to diamond, which greatly improves wear resistance. Can be improved.
  • microparticles In the arc ion plating method, protrusions called microparticles are easily generated on the surface of the amorphous carbon film. The microparticles cause a decrease in wear resistance and a rough surface of the amorphous carbon film, thereby deteriorating the surface quality of the work material.
  • a filtered arc ion plating method that reduces microparticles is more preferable.
  • Specific methods for producing the amorphous carbon film of the present invention include the following.
  • a tool-shaped substrate is placed in a film forming apparatus, and the surface of the substrate is cleaned with argon plasma.
  • a substrate bias voltage of ⁇ 30 to ⁇ 300 V direct current voltage or ⁇ 30 to ⁇ 500 V pulse voltage is applied to the substrate to apply one or two of C 2 H 2 and CH 4 to 5 to 20 cm 3 / Introducing into the furnace at a predetermined flow rate in the range of min, and evaporating and ionizing the graphite target by cathodic arc discharge with an arc discharge current of 80 A, the inner layer film of the amorphous carbon film is coated on the side in contact with the substrate. .
  • the amorphous carbon coating of the present invention A tool can be obtained.
  • the substrate temperature at the time of coating the amorphous carbon film is preferably 50 to 200 ° C., more preferably 50 to 150 ° C.
  • the substrate temperature exceeds 200 ° C. soft sp 2 -bonded graphite is likely to precipitate, and when it is less than 50 ° C., the adhesion between the substrate and the amorphous carbon film is lowered.
  • the amorphous carbon film is coated, carbon ions are irradiated on the surface of the base material, and the amorphous carbon film is formed, so that the base material temperature rises. In some cases, the substrate temperature may increase.
  • the amorphous carbon-coated tool of the present invention is excellent in the adhesion between the amorphous carbon film and the base material and in the wear resistance.
  • the amorphous carbon-coated tool of the present invention achieves high-efficiency machining and long tool life, and can improve the finish quality of the work material.
  • a drill made of cemented carbide for processing a printed circuit board having a drill diameter of 0.3 mm ⁇ length of 5.8 mm was prepared.
  • This substrate was placed in a furnace of an arc ion plating apparatus. While heating the substrate to 300 ° C. using a heater, the inside of the furnace was evacuated to a pressure of 1 ⁇ 10 ⁇ 4 Pa. After lowering the set temperature of the heater to 100 ° C. and lowering the substrate temperature to 150 ° C., argon gas is introduced and maintained in an argon atmosphere at a pressure of 2 ⁇ 10 ⁇ 1 Pa while the substrate is attached by a bias power source. The substrate surface was cleaned with argon plasma with a substrate bias voltage of ⁇ 400 V applied to the tool.
  • Table 1 mainly shows conditions relating to the arc ion plating apparatus
  • Table 2 shows pulse voltage conditions used for the bias voltage of the base materials of Inventions 5 to 8.
  • the DC voltage shown in Table 1 was used as the bias voltage of the substrate, and C 2 H 2 having a predetermined flow rate of 5 to 15 cm 3 / min was applied at the start of coating the inner layer portion of the amorphous carbon film.
  • Comparison product 1 is a cemented carbide drill without coating.
  • a cemented carbide drill base material is placed in a plasma CVD apparatus, and the anode voltage is 100 V, the reflector voltage is 50 V, and the filament current is 30 A.
  • the conditions shown in Table 3 are used on the surface of the base material. An amorphous carbon film was formed.
  • the outer layer portion contains a trace amount of hydrogen of less than 0.5 atomic%, which seems to be mixed from moisture remaining in the furnace. Therefore, it can be said that the outer layer portion of the amorphous carbon film does not substantially contain hydrogen.
  • the hardness and elastic recovery rate of the amorphous carbon film were measured at a load of 1 mN.
  • the compressive stress existing in the WC of the substrate was measured under the following stress measurement conditions.
  • Measuring device Micro-part stress measuring device manufactured by Rigaku Corporation
  • X-ray tube Cu target collimator: ⁇ 2mm
  • X-ray output 30 kV
  • 20 mA Standard black angle 2 ⁇ 0 117 degrees (WC (211) plane)
  • ⁇ 6-point measurement
  • Young's modulus E 700 GPa
  • Drilling test Drill diameter: ⁇ 0.3mm
  • Work material Printed circuit board FR-4 (4-layer board) ⁇ 2 sheets
  • the product of the present invention has superior welding resistance and wear resistance compared to the comparative product. Therefore, the drilling accuracy after drilling is very high, and the service life can be extended.
  • a throw-away tip for milling (K10 equivalent cemented carbide, model number AECW16T3PEFR) was prepared.
  • This substrate was placed in a furnace of an arc ion plating apparatus. While heating the substrate to 300 ° C. using a heater, the inside of the furnace was evacuated to a pressure of 1 ⁇ 10 ⁇ 4 Pa. After lowering the set temperature of the heater to 100 ° C. and lowering the substrate temperature to 150 ° C., argon gas is introduced and maintained in an argon atmosphere at a pressure of 2 ⁇ 10 ⁇ 1 Pa while the substrate is attached by a bias power source. The substrate surface was cleaned with argon plasma with a substrate bias voltage of ⁇ 400 V applied to the tool.
  • Table 8 mainly shows conditions relating to the arc ion plating apparatus
  • Table 9 shows pulse voltage conditions used for the bias voltage of the substrate.
  • the C 2 H 2 at a predetermined flow rate of 6 ⁇ 12cm 3 / min at the coating start of the inner layer portion of the amorphous carbon film is introduced into the furnace, with a flow rate time C 2 H 2
  • the inner layer portion was coated by adjusting the flow rate of C 2 H 2 to 0 cm 3 / min when the coating of the inner layer portion of the amorphous carbon film was completed.
  • the outer layer portion of the amorphous carbon film was coated without supplying C 2 H 2 into the furnace.
  • the inner layer portion was coated by supplying a constant flow rate of C 2 H 2 from the start of coating of the inner layer portion of the amorphous carbon film to the end of coating.
  • the outer layer portion of the amorphous carbon film was coated without supplying C 2 H 2 into the furnace.
  • Comparative product 4 is a cemented carbide throwaway tip that is not coated.
  • the base material was put in a furnace of a plasma CVD film forming apparatus, the flow rate of benzene C 6 H 6 was 10 cm 3 / min, the pressure was 4.3 ⁇ 10 ⁇ 1 Pa, the base material temperature was 200 ° C., An amorphous carbon film was formed on the surface of the substrate under the condition of a bias voltage of ⁇ 1500 V (DC voltage).
  • the elastic recoil detection method using high energy ions (helium ions) as incident particles was used to measure the depth of the amorphous carbon film.
  • the hydrogen concentration distribution was measured.
  • the maximum film thickness of the amorphous carbon film was measured using a scanning electron microscope from the cross-sectional observation of the amorphous carbon film. The results are shown in Table 10.
  • the outer layer portion contains a trace amount of hydrogen of less than 0.5 atomic%, which seems to be mixed from moisture remaining in the furnace.
  • a TriboIndentor manufactured by Hysitron the hardness and elastic recovery of the amorphous carbon film were measured under the same conditions as in Example 1.
  • the compressive stress existing in the WC of the substrate was measured under the same conditions as in Example 1.
  • the amorphous carbon-coated tool of the present invention is superior in adhesion between the coating film and the substrate and has excellent welding resistance and wear resistance as compared with the comparative product. Therefore, it is possible to extend the life. Therefore, the amorphous carbon-coated tool of the present invention is an invention with high industrial applicability.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)
  • Drilling Tools (AREA)

Abstract

L'invention porte sur un outil revêtu de carbone amorphe qui possède une excellente adhérence entre un film de carbone amorphe et un matériau de base, ainsi qu'une excellente résistance à l'abrasion. L'outil revêtu de carbone amorphe comporte un matériau de base et un film de carbone amorphe. Le film de carbone amorphe comporte une partie couche interne sur un côté en contact avec le matériau de base et une partie couche externe sur le côté de surface. La teneur en hydrogène contenue dans la partie couche interne dans le film de carbone amorphe est de 0,5 à 3 % atomique. La teneur en hydrogène contenue dans la partie couche externe dans le film de carbone amorphe est inférieure à 0,5 % atomique. La partie couche interne dans le film de carbone amorphe a un gradient de concentration tel que la teneur en hydrogène est progressivement réduite du côté en contact avec le matériau de base vers le côté de surface.
PCT/JP2009/055228 2008-03-18 2009-03-18 Outil revêtu de carbone amorphe WO2009116552A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008-068676 2008-03-18
JP2008068676A JP5176621B2 (ja) 2008-03-18 2008-03-18 非晶質炭素被覆工具

Publications (1)

Publication Number Publication Date
WO2009116552A1 true WO2009116552A1 (fr) 2009-09-24

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WO (1) WO2009116552A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011104687A (ja) * 2009-11-16 2011-06-02 Mitsubishi Materials Corp 耐剥離性と耐摩耗性にすぐれたダイヤモンド被覆工具
CN105420670A (zh) * 2014-09-12 2016-03-23 株式会社神户制钢所 硬质滑动部件的制造方法
US9546425B2 (en) 2010-01-19 2017-01-17 Kabushiki Kaisha Riken Member having hydrogen-containing, hard, amorphous carbon coating and its production method
CN106604796A (zh) * 2014-09-03 2017-04-26 三菱综合材料株式会社 表面包覆切削工具及其制造方法

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JP6039479B2 (ja) * 2013-03-25 2016-12-07 京セラ株式会社 表面被覆部材
KR101860292B1 (ko) 2013-03-29 2018-05-21 히타치 긴조쿠 가부시키가이샤 피복 공구 제조 방법
JP6200343B2 (ja) * 2014-02-10 2017-09-20 大同メタル工業株式会社 摺動部材
WO2016190443A1 (fr) * 2015-05-28 2016-12-01 京セラ株式会社 Outil de coupe
CN115038539A (zh) * 2020-04-24 2022-09-09 住友电工硬质合金株式会社 切削工具
EP4091745B1 (fr) * 2020-04-24 2024-07-10 Sumitomo Electric Hardmetal Corp. Outil de coupe
WO2021214984A1 (fr) * 2020-04-24 2021-10-28 住友電工ハードメタル株式会社 Outil de coupe

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JP2007126754A (ja) * 2006-12-21 2007-05-24 Nissin Electric Co Ltd 真空アーク蒸着装置

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JPH09314405A (ja) * 1996-05-31 1997-12-09 Kyocera Corp 被覆切削工具
JPH1082390A (ja) * 1996-07-18 1998-03-31 Sanyo Electric Co Ltd 摺動部材、圧縮機及び回転圧縮機
JP2003251503A (ja) * 2001-12-26 2003-09-09 Sumitomo Electric Ind Ltd 表面被覆切削工具
JP2005008851A (ja) * 2003-05-29 2005-01-13 Nissan Motor Co Ltd 硬質炭素薄膜付き機械加工工具用切削油及び硬質炭素薄膜付き機械加工工具
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011104687A (ja) * 2009-11-16 2011-06-02 Mitsubishi Materials Corp 耐剥離性と耐摩耗性にすぐれたダイヤモンド被覆工具
US9546425B2 (en) 2010-01-19 2017-01-17 Kabushiki Kaisha Riken Member having hydrogen-containing, hard, amorphous carbon coating and its production method
CN106604796A (zh) * 2014-09-03 2017-04-26 三菱综合材料株式会社 表面包覆切削工具及其制造方法
US10358712B2 (en) 2014-09-03 2019-07-23 Mitsubishi Materials Corporation Surface-coated cutting tool and method of manufacturing the same
CN105420670A (zh) * 2014-09-12 2016-03-23 株式会社神户制钢所 硬质滑动部件的制造方法

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