WO2009065545A1 - The use of a binary coating comprising first and second different metallic elements - Google Patents
The use of a binary coating comprising first and second different metallic elements Download PDFInfo
- Publication number
- WO2009065545A1 WO2009065545A1 PCT/EP2008/009719 EP2008009719W WO2009065545A1 WO 2009065545 A1 WO2009065545 A1 WO 2009065545A1 EP 2008009719 W EP2008009719 W EP 2008009719W WO 2009065545 A1 WO2009065545 A1 WO 2009065545A1
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- Prior art keywords
- layer
- accordance
- coating
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- graded
- Prior art date
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- 238000000576 coating method Methods 0.000 title claims abstract description 45
- 239000011248 coating agent Substances 0.000 title claims abstract description 38
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 12
- 238000005260 corrosion Methods 0.000 claims abstract description 20
- 230000007797 corrosion Effects 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 12
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 6
- 239000010959 steel Substances 0.000 claims abstract description 6
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 4
- 229910052742 iron Inorganic materials 0.000 claims abstract description 4
- 229910001369 Brass Inorganic materials 0.000 claims abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910000861 Mg alloy Inorganic materials 0.000 claims abstract description 3
- 229910000842 Zamak Inorganic materials 0.000 claims abstract description 3
- 239000004411 aluminium Substances 0.000 claims abstract description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000010951 brass Substances 0.000 claims abstract description 3
- 229910052802 copper Inorganic materials 0.000 claims abstract description 3
- 239000010949 copper Substances 0.000 claims abstract description 3
- 239000011777 magnesium Substances 0.000 claims abstract description 3
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 32
- 229910010169 TiCr Inorganic materials 0.000 claims description 20
- 238000005240 physical vapour deposition Methods 0.000 claims description 12
- 239000002585 base Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 8
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 238000005019 vapor deposition process Methods 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 238000000137 annealing Methods 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 238000001311 chemical methods and process Methods 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 238000007591 painting process Methods 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 238000005137 deposition process Methods 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 239000000446 fuel Substances 0.000 claims description 2
- 238000000869 ion-assisted deposition Methods 0.000 claims description 2
- 150000001247 metal acetylides Chemical class 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 239000011780 sodium chloride Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 238000005486 sulfidation Methods 0.000 claims description 2
- 238000007669 thermal treatment Methods 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 80
- 239000011651 chromium Substances 0.000 description 27
- 239000002184 metal Substances 0.000 description 6
- 239000000306 component Substances 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 235000011299 Brassica oleracea var botrytis Nutrition 0.000 description 1
- 240000003259 Brassica oleracea var. botrytis Species 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910003321 CoFe Inorganic materials 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 235000012041 food component Nutrition 0.000 description 1
- 239000005428 food component Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
- 235000013980 iron oxide Nutrition 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- 229910001068 laves phase Inorganic materials 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/028—Including graded layers in composition or in physical properties, e.g. density, porosity, grain size
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/36—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including layers graded in composition or physical properties
Definitions
- the present invention relates to use of a binary coating including a layer of at least first and second different metallic elements in the form of Ti and Cr.
- TiCr coatings are known per se. Thus DE 44 46 985 Al discloses the use of TiCr coating as a hard material layer on a steel substrate forming projections of a chuck for a dental cutting tool. It is not stated how the TiCr alloy is deposited.
- WO 03/049086 describes the use of a 30nm thick TiCr layer as a non-magnetic interlayer in a recording medium having a substrate, a soft magnetic interlayer, the TiCr non-magnetic interlayer and a hard magnetic recording layer.
- the purpose of the TiCr layer is to prevent magnetic interaction between the soft magnetic layer and the hard magnetic recording layer.
- the substrate can be a suitable glass, ceramic, glass-ceramic polymeric material or a composite or laminate of these materials.
- the soft magnetic layer can comprise a 50 to 400nm thick layer of Co, CoZr, CoZrCr, CoZrNb, CoFe, Fe, FeN, FeSiAl, FeSiAlN FeCoC etc.
- the hard magnetic layer is typically a IOnm to 25nm thick layer of a Co based alloy including one or more of the elements selected from the group consisting of Cr, Fe, Ta, Ni, Mo, Pt, V, Nb, Ge, B and Pd, iron oxides or a (CoX/ Pd or Pt) n multilayer structure where n is an integer from about 10 to 25 each of the alternating thin layers of Co-based magnetic alloy is about 0.2 to
- X is an element from the group consisting of Cr, Ta, B, Mo, Pt, W and Fe and each of the alternating Pd or Pt layers is about 0. lnm thick.
- a DLC layer diamond like carbon
- the object of the present invention is to propose a new use of such a binary coating.
- a binary coating including a layer of at least first and second metallic elements in the form of Ti and Cr as a top layer or an underlayer for corrosion protection on a metallic substrate consisting of any one of iron, steel, aluminium or an aluminium alloy, magnesium or a magnesium alloy or brass or copper or Zamak or any die-cast material.
- a TiCr underlayer when used with a preferred top layer system of a wear resistant material having a columnar structure can improve the mechanical properties since it breaks the columnar structure of the top layer system and gives a desirable smoother top surface (less cauliflower like) which in turn yields better wear resistance against mechanical wear, especially against abrasive wear. Furthermore it has been found that the TiCr binary coating, with or without a top layer or top layer system, has excellent properties as a corrosion protective layer. The reason seems to be that there are no voids where water or other liquids can leak through to initiate corrosion in the layer or layer system or corrosion of the substrate material.
- the coating used preferably comprises either a layer of TiCr with a sub- stantially constant composition or a graded TiCR layer, e.g. a base layer (adhesion layer) of Cr and a layer of graded composition consisting of Cr and Ti with the proportion of Ti in the layer increasing from the interface with the base layer to a proportion of Ti greater than that of Cr at the boundary of the graded layer remote from the base layer.
- a layer of TiCr with a sub- stantially constant composition or a graded TiCR layer e.g. a base layer (adhesion layer) of Cr and a layer of graded composition consisting of Cr and Ti with the proportion of Ti in the layer increasing from the interface with the base layer to a proportion of Ti greater than that of Cr at the boundary of the graded layer remote from the base layer.
- graded TiCr layer Although the use of a graded TiCr layer is possible it is by no means essential. A binary layer with between typically 45 and 70% Cr, especially between 52 and 62% Cr, has been found to be satisfactory, i.e. a layer having a homogenous composition of TiCr rather than a graded composi- tion.
- the boundary of the graded layer forms an interface to one or more further layers forming a top coating or top coating system respectively.
- the one or more further layers can for example com- prise at least one layer of one or more of the following materials: carbon, DLC, nitrides, carbonitrides and carbides of Zr, Ti, Cr, Al or mixtures thereof as well as any known decorative or colored coatings.
- the coating serves to protect the substrate from at least one of oxidation, sulfidation, acid corrosion and alkali corrosion, including saline corrosion.
- Ti can be used as the first metallic component and Cr as the second metallic component but rather the first metallic component can be selected from the group comprising Al, Ti, Cr, Si and W whereas the sec- ond component can be selected from the group comprising Cr, Ni; Mo, Nb and B. All the pairs of metallic binary coatings recited above are electrically conductive.
- the binary coating used for corrosion protection is present in at least one of amorphous, nanocrystalline or mixed nanocrystalline form. When used for corrosion protection it can have a thickness in the range from 50nm to lO ⁇ m.
- nanocrystalline signifies crystals which are randomly orientated and have a size under IOnm, preferably in the size range between 2nm and IOnm, especially between 3nm and IOnm.
- the thickness of the Cr base layer lies in the range from IOnm to 100 nm and the thickness of the graded layer lies in the range from 40nm to about lO ⁇ m.
- the binary coating of the invention is preferably deposited by a PVD process, for example a PVD process such as a magnetron sputtering process, a HIPIMS process, another ion assisted sputtering process and a plasma assisted vapor deposition process, such as a plasma assisted CVD process (PACVD) or by a combined PVD and PACVD process.
- a PVD process such as a magnetron sputtering process, a HIPIMS process, another ion assisted sputtering process and a plasma assisted vapor deposition process, such as a plasma assisted CVD process (PACVD) or by a combined PVD and PACVD process.
- a PVD process such as a magnetron sputtering process, a HIPIMS process, another ion assisted sputtering process and a plasma assisted vapor deposition process, such as a plasma assisted CVD process (PACVD) or by a combined PVD and PACVD process
- the deposition process for the top layer or some or all of the layers of a top layer system are selected from the group comprising PVD processes, CVD processes, plasma assisted PVD processes, plasma assisted CVD processes, electron beam vapor deposition processes, galvanic processes, powder coating processes, dying processes, chemical processes and painting processes.
- the use of the binary coating of the invention as an underlayer is not restricted to PVD or CVD processes where similar processes are used to deposit the top layer or top layer system but instead the underlayer can basically be used with all kinds of top layers or top layer systems.
- a metal substrate coated with the underlayer of the present invention can also be provided with a powder coating or plastic coating, e.g. as a decorative coating to color the sheet metal part.
- a powder coating or plastic coating e.g. as a decorative coating to color the sheet metal part.
- it can be dyed to color the part, for example to give it a particular sheen or can be painted using any of the known painting processes to provide a decorative finish.
- Chemical processes can also be used, for example etching processes in order to improve the bond of the top layer or to chemically modify the top surface of the binary layer to obtain a specific color or desired function.
- the coating and optionally any top layer or top layer system can also be subjected to a thermal treatment such as an annealing operation or to a chemical treatment such as an oxidation treatment.
- the invention can be used for corrosion protection of a material used in a corrosive industrial environment such as in a chemical reaction apparatus or in a galvanic apparatus or on an electrically conductive element in a battery or fuel cell. It can also be used in corrosive environments such as underwater, especially when exposed to salt water, or with food processing machinery for acidic or alkaline food components or environments.
- Fig. 1 a schematic cross-section through a substrate provided with a binary coating in accordance with the present teaching
- Fig. 2 a schematic cross-section similar to that of Fig. 1 but used as an underlayer provided with a top layer
- Fig. 3 a schematic cross-section similar to that of Fig. 1 but provided with a top layer system and
- Fig. 4 a metastable phase diagram for the equilibrium between the liquid, bcc and amorphous phase of a graded TiCr layer.
- a substrate 10 for example in the form of a sheet metal part of steel, which is coated on one surface with a binary coating 12 of TiCr in accordance with the present invention. It is possible to provide such coating on both sides of the sheet metal part and indeed on all sides of the sheet metal part if corrosion protection is re- quired on all sides. Moreover, the part need not be a sheet metal part but could be any metallic component which needs to be protected against corrosion.
- the binary coating 12 more specifically comprises a base layer 14 of chromium which is used to provide good adhesion between the layer 16 of TiCr forming the upper part of the layer 12 and the steel substrate.
- the proportion of Cr in the TiCr layer 16, which could be a graded TiCr layer but in this case is a homogenous TiCr layer is between 45 and 75% and preferably between 52 and 62%.
- Fig. 2 shows a diagram similar to Fig. 1 but in this case a further layer 18 of, in this example, TiN is applied on top of the corrosion protection layer 12 in order to give the article a gold- coloured appearance, TiN being frequently used for this purpose in addi- tion to providing a hard surface which improves the abrasion resistance of the article concerned.
- a thin layer of real gold (not shown) can be deposited on top of the layer 18.
- Such a gold-plated article can be beneficial because if the relatively soft real gold layer wears away locally, the colour-matched TiN layer beneath it disguises the fact that the gold top layer has partly worn away.
- Fig. 3 basically shows the same article as Fig. 2 provided with the binary coating 12 in accordance with the present invention, but in this case it has a top layer system 20, 22 provided for decorative purposes. More spe- cifically, the layer 20 could, for example, be a TiN layer and the layer 22 could be a gold layer.
- the substrate would be cleaned prior to depositing the Cr layer. This can take place by a usual etching process in a magnetron sputtering plant or, if the coating apparatus used is a so-called HIPIMS apparatus, then cleaning of the substrate can also be carried out in a HIPIMS cleaning mode which is again well known per se.
- the initial Cr base or adhesion layer 14 is crystalline, having a bcc A2 crystallographic structure.
- the initial Cr base or adhesion layer 14 When intro-ucked as an alloying element into a Ti alloy it acts as a ⁇ -stabilizer and this allows the metastable formation of the ⁇ -Ti bcc phase, which is retained at room temperature providing the Cr concentration is higher than 7.4 at%.
- a bcc A2 substitutional solid solution ( ⁇ -phase) a metastable B2 phase and a C 15 Laves phase within the compositional range.
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Abstract
This application describes and claims the use of a binary coating including a layer of at least first and second metallic elements in the form of Ti and Cr as a top layer or an underlayer for corrosion protection on a metallic substrate consisting of any one of iron, steel, aluminium or an aluminium alloy, magnesium or a magnesium alloy or brass or copper or Zamak or any die-cast material.
Description
The use of a binary coating comprising first and second different metallic elements
The present invention relates to use of a binary coating including a layer of at least first and second different metallic elements in the form of Ti and Cr.
TiCr coatings are known per se. Thus DE 44 46 985 Al discloses the use of TiCr coating as a hard material layer on a steel substrate forming projections of a chuck for a dental cutting tool. It is not stated how the TiCr alloy is deposited.
In addition the use of a TiCr coating on a sintered aluminium alloy (Al- 12%Si-2%Fe-l%Zr-0.5%Mg-3%AlN by weight), more specifically on inner diameter surfaces of an inner rotor of a gear rotor set mounted on an oval drive shaft is disclosed in EP-A-0907023. The method of applying the coating which is intended to avoid wear and damage occurring is not dis- closed.
Finally WO 03/049086 describes the use of a 30nm thick TiCr layer as a non-magnetic interlayer in a recording medium having a substrate, a soft magnetic interlayer, the TiCr non-magnetic interlayer and a hard magnetic recording layer. The purpose of the TiCr layer is to prevent magnetic interaction between the soft magnetic layer and the hard magnetic recording layer. The substrate can be a suitable glass, ceramic, glass-ceramic polymeric material or a composite or laminate of these materials. The soft magnetic layer can comprise a 50 to 400nm thick layer of Co, CoZr, CoZrCr, CoZrNb, CoFe, Fe, FeN, FeSiAl, FeSiAlN FeCoC etc. The hard
magnetic layer is typically a IOnm to 25nm thick layer of a Co based alloy including one or more of the elements selected from the group consisting of Cr, Fe, Ta, Ni, Mo, Pt, V, Nb, Ge, B and Pd, iron oxides or a (CoX/ Pd or Pt)n multilayer structure where n is an integer from about 10 to 25 each of the alternating thin layers of Co-based magnetic alloy is about 0.2 to
0.35nm thick, X is an element from the group consisting of Cr, Ta, B, Mo, Pt, W and Fe and each of the alternating Pd or Pt layers is about 0. lnm thick. A DLC layer (diamond like carbon) can also be provided as a protective overcoat layer, i.e. providing wear resistance.
The object of the present invention is to propose a new use of such a binary coating.
In accordance with the present invention there is provided a novel use of a binary coating including a layer of at least first and second metallic elements in the form of Ti and Cr as a top layer or an underlayer for corrosion protection on a metallic substrate consisting of any one of iron, steel, aluminium or an aluminium alloy, magnesium or a magnesium alloy or brass or copper or Zamak or any die-cast material.
It has surprisingly been found that a TiCr underlayer, when used with a preferred top layer system of a wear resistant material having a columnar structure can improve the mechanical properties since it breaks the columnar structure of the top layer system and gives a desirable smoother top surface (less cauliflower like) which in turn yields better wear resistance against mechanical wear, especially against abrasive wear. Furthermore it has been found that the TiCr binary coating, with or without a top layer or top layer system, has excellent properties as a corrosion protective layer. The reason seems to be that there are no voids where water
or other liquids can leak through to initiate corrosion in the layer or layer system or corrosion of the substrate material.
The coating used preferably comprises either a layer of TiCr with a sub- stantially constant composition or a graded TiCR layer, e.g. a base layer (adhesion layer) of Cr and a layer of graded composition consisting of Cr and Ti with the proportion of Ti in the layer increasing from the interface with the base layer to a proportion of Ti greater than that of Cr at the boundary of the graded layer remote from the base layer.
Although the use of a graded TiCr layer is possible it is by no means essential. A binary layer with between typically 45 and 70% Cr, especially between 52 and 62% Cr, has been found to be satisfactory, i.e. a layer having a homogenous composition of TiCr rather than a graded composi- tion.
When used as an underlayer the boundary of the graded layer forms an interface to one or more further layers forming a top coating or top coating system respectively. The one or more further layers can for example com- prise at least one layer of one or more of the following materials: carbon, DLC, nitrides, carbonitrides and carbides of Zr, Ti, Cr, Al or mixtures thereof as well as any known decorative or colored coatings.
The coating serves to protect the substrate from at least one of oxidation, sulfidation, acid corrosion and alkali corrosion, including saline corrosion.
Not only Ti can be used as the first metallic component and Cr as the second metallic component but rather the first metallic component can be selected from the group comprising Al, Ti, Cr, Si and W whereas the sec- ond component can be selected from the group comprising Cr, Ni; Mo, Nb
and B. All the pairs of metallic binary coatings recited above are electrically conductive.
The binary coating used for corrosion protection is present in at least one of amorphous, nanocrystalline or mixed nanocrystalline form. When used for corrosion protection it can have a thickness in the range from 50nm to lOμm. As used herein the term "nanocrystalline" signifies crystals which are randomly orientated and have a size under IOnm, preferably in the size range between 2nm and IOnm, especially between 3nm and IOnm.
More specifically, when used with a base layer of Cr the thickness of the Cr base layer lies in the range from IOnm to 100 nm and the thickness of the graded layer lies in the range from 40nm to about lOμm.
The binary coating of the invention is preferably deposited by a PVD process, for example a PVD process such as a magnetron sputtering process, a HIPIMS process, another ion assisted sputtering process and a plasma assisted vapor deposition process, such as a plasma assisted CVD process (PACVD) or by a combined PVD and PACVD process.
In addition the deposition process for the top layer or some or all of the layers of a top layer system are selected from the group comprising PVD processes, CVD processes, plasma assisted PVD processes, plasma assisted CVD processes, electron beam vapor deposition processes, galvanic processes, powder coating processes, dying processes, chemical processes and painting processes.
Thus the use of the binary coating of the invention as an underlayer is not restricted to PVD or CVD processes where similar processes are used to deposit the top layer or top layer system but instead the underlayer can
basically be used with all kinds of top layers or top layer systems. Thus a metal substrate coated with the underlayer of the present invention can also be provided with a powder coating or plastic coating, e.g. as a decorative coating to color the sheet metal part. Alternatively it can be dyed to color the part, for example to give it a particular sheen or can be painted using any of the known painting processes to provide a decorative finish. Chemical processes can also be used, for example etching processes in order to improve the bond of the top layer or to chemically modify the top surface of the binary layer to obtain a specific color or desired function.
The coating and optionally any top layer or top layer system can also be subjected to a thermal treatment such as an annealing operation or to a chemical treatment such as an oxidation treatment.
The invention can be used for corrosion protection of a material used in a corrosive industrial environment such as in a chemical reaction apparatus or in a galvanic apparatus or on an electrically conductive element in a battery or fuel cell. It can also be used in corrosive environments such as underwater, especially when exposed to salt water, or with food processing machinery for acidic or alkaline food components or environments.
The invention and a possible method of applying a binary coating in accordance with the invention will now be explained in further detail by way of example and with reference to specific embodiments as illustrated in the accompanying drawings in which are shown:
Fig. 1 a schematic cross-section through a substrate provided with a binary coating in accordance with the present teaching,
Fig. 2 a schematic cross-section similar to that of Fig. 1 but used as an underlayer provided with a top layer,
Fig. 3 a schematic cross-section similar to that of Fig. 1 but provided with a top layer system and
Fig. 4 a metastable phase diagram for the equilibrium between the liquid, bcc and amorphous phase of a graded TiCr layer.
Turning now to Fig. 1 there can be seen a substrate 10, for example in the form of a sheet metal part of steel, which is coated on one surface with a binary coating 12 of TiCr in accordance with the present invention. It is possible to provide such coating on both sides of the sheet metal part and indeed on all sides of the sheet metal part if corrosion protection is re- quired on all sides. Moreover, the part need not be a sheet metal part but could be any metallic component which needs to be protected against corrosion. In this example the binary coating 12 more specifically comprises a base layer 14 of chromium which is used to provide good adhesion between the layer 16 of TiCr forming the upper part of the layer 12 and the steel substrate. The proportion of Cr in the TiCr layer 16, which could be a graded TiCr layer but in this case is a homogenous TiCr layer is between 45 and 75% and preferably between 52 and 62%.
If it is a graded layer then the percentage of Cr preferably reduces from About 100% at the interface between layers 14 and 16 to about 52 to 62% at the free surface of the layer 16. Fig. 2 shows a diagram similar to Fig. 1 but in this case a further layer 18 of, in this example, TiN is applied on top of the corrosion protection layer 12 in order to give the article a gold- coloured appearance, TiN being frequently used for this purpose in addi- tion to providing a hard surface which improves the abrasion resistance of
the article concerned. If desired a thin layer of real gold (not shown) can be deposited on top of the layer 18. Such a gold-plated article can be beneficial because if the relatively soft real gold layer wears away locally, the colour-matched TiN layer beneath it disguises the fact that the gold top layer has partly worn away.
Fig. 3 basically shows the same article as Fig. 2 provided with the binary coating 12 in accordance with the present invention, but in this case it has a top layer system 20, 22 provided for decorative purposes. More spe- cifically, the layer 20 could, for example, be a TiN layer and the layer 22 could be a gold layer.
As is usual, when manufacturing the layer system 12 of Fig. 1 by a PVD process, the substrate would be cleaned prior to depositing the Cr layer. This can take place by a usual etching process in a magnetron sputtering plant or, if the coating apparatus used is a so-called HIPIMS apparatus, then cleaning of the substrate can also be carried out in a HIPIMS cleaning mode which is again well known per se.
Analysis of the deposited coatings 14 and 16 have shown the following when the coating 16 is realized as a coating of TiCr of graded composition:
It appears from HR-TEM analysis that the initial Cr base or adhesion layer 14 is crystalline, having a bcc A2 crystallographic structure. When intro- duced as an alloying element into a Ti alloy it acts as a β-stabilizer and this allows the metastable formation of the β-Ti bcc phase, which is retained at room temperature providing the Cr concentration is higher than 7.4 at%. In the compositional range of a Cr-Ti solid solution one expects a bcc A2 substitutional solid solution (β-phase), a metastable B2 phase and a C 15 Laves phase within the compositional range. Nevertheless, it has
been observed that Ti-Cr solid solutions can undergo inverse melting (solid state amorphization, SSA) after high temperature annealing of mechanically alloyed samples and sputtered films. For the Ti-Cr system used here it appears that the metastable phase diagram shown in Fig. 4 ap- plies. This indicates that, when varying the composition from a Cr-rich to a Ti-rich Ti-Cr solid solution, phase transitions are expected to occur as follows:
Cr-rich β— * amorphous + β → amorphous — * amorphous + β -→ Ti-rich β,
where the pure amorphous phase is expected at around 48 at.% Ti concentration. A progressive variation of the lattice constant seems to occur within the A2 crystal in areas which are progressively rich in Ti and finally the interlayer loses its crystallinity at a Ti concentration at around 60 at.%. It may be that these changes in composition are also in some way responsible for the dense Ti-Cr structure having no voids which ensures that, for example, water or other liquids and gases cannot readily reach the substrate and lead to corrosion there.
Claims
1. Use of a binary coating including a layer of at least first and second different metallic elements in the form of Ti and Cr as a top layer or an underlayer for corrosion protection on a metallic substrate consisting of any one of iron, steel, aluminium or an aluminium alloy, magnesium or a magnesium alloy or brass or copper or Zamak or any die-cast material.
2. Use in accordance with claim 1 wherein the coating comprises either a layer of TiCr with a substantially constant composition or a graded TiCR layer, e.g. a base layer (adhesion layer) of Cr and a layer of graded composition consisting of Cr and Ti with the proportion of Ti in the layer increasing from the interface with the base layer to a proportion of Ti greater than that of Cr at the boundary of the graded layer remote from the base layer.
3. Use in accordance with claim 2 wherein the proportion of Ti at the said boundary comprises essentially 90 to 100% excluding impurities.
4. Use in accordance with claim 2 or claim 3 wherein the boundary of the graded layer comprises a free surface of the coated substrate.
5. Use in accordance with claim 1 or claim 2 wherein the boundary of the graded layer forms an interface to one or more further layers forming a top coating or top coating system respectively.
6. Use in accordance with claim 5 wherein said one or more further layers comprises at least one layer of one or more of the following materials: carbon, DLC, nitrides, carbonitrides and carbides of Zr, Ti, Cr, Al or mixtures thereof as well as any known decorative or colored coatings.
7. Use in accordance with any one of the preceding claims wherein the binary coating serves to protect the substrate from at least one of oxidation, sulfidation, acid corrosion and alkali corrosion, including saline corrosion.
8. Use in accordance with any one of the preceding claims wherein the binary coating is present in at least one of amorphous, nanocrystal- line or mixed amorphous and nanocrystalline form.
9. Use in accordance with any one of the preceding claims wherein the binary coating has a thickness in the range from 50 nm to 10 μm.
10. Use in accordance with claim 2 wherein the thickness of the Cr base layer lies in the range from 10 nm to 100 nm and the thickness of the graded layer lies in the range from 40 nm to about 10 μm.
11. Use in accordance with any one of the preceding claims of a coating deposited by a PVD process, or by a plasma assisted CVD process (PACVD) or by a combined PVD and PACVD process.
12. Use in accordance with claim 11, wherein the PVD process is one of magnetron sputtering, a HIPIMS process, another ion assisted sputtering process and a plasma assisted vapor deposition process.
13. Use in accordance with claim 5, wherein the deposition process for the top layer or some or all of the layers of a top layer system are selected from the group comprising PVD processes, CVD processes, plasma assisted PVD processes, plasma assisted CVD processes, electron beam vapor deposition processes, galvanic processes, powder coating processes, dying processes, chemical processes and painting processes.
14. Use in accordance with any one of the preceding claims wherein the coating and optionally any top layer or top layer system has been subjected to a thermal treatment such as an annealing operation or to a chemical treatment such as an oxidation treatment.
15. Use in accordance with any one of the preceding claims for corro- sion protection of a material used in a corrosive industrial environment such as in a chemical reaction apparatus or in a galvanic apparatus or on an electrically conductive element in a battery or fuel cell.
16. Use substantially as herein described with reference to and as illustrated in the accompanying drawings.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0722642A GB2454743A (en) | 2007-11-19 | 2007-11-19 | TiCr binary coating |
| GB0722642.6 | 2007-11-19 |
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| Publication Number | Publication Date |
|---|---|
| WO2009065545A1 true WO2009065545A1 (en) | 2009-05-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2008/009719 WO2009065545A1 (en) | 2007-11-19 | 2008-11-17 | The use of a binary coating comprising first and second different metallic elements |
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| WO (1) | WO2009065545A1 (en) |
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| CN102560483A (en) * | 2010-12-30 | 2012-07-11 | 鸿富锦精密工业（深圳）有限公司 | Aluminium and aluminium alloy surface antiseptic treatment method and product prepared by same |
| CN105669254A (en) * | 2016-01-18 | 2016-06-15 | 太原理工大学 | Method for improving high temperature oxidization resistance performance of carbon/carbon composite material |
| US9511572B2 (en) | 2011-05-25 | 2016-12-06 | Southwest Research Institute | Nanocrystalline interlayer coating for increasing service life of thermal barrier coating on high temperature components |
| CN107812914A (en) * | 2017-11-18 | 2018-03-20 | 张晓娟 | A kind of processing method of magnesium alloy die casting mould |
| DE102020210209A1 (en) | 2020-08-12 | 2022-02-17 | Ekpo Fuel Cell Technologies Gmbh | Bipolar plate, fuel cell and method for manufacturing a bipolar plate |
| DE102022108476A1 (en) | 2022-04-07 | 2023-10-12 | Ekpo Fuel Cell Technologies Gmbh | Bipolar plate, fuel cell and method for producing a bipolar plate |
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| DE102011080898A1 (en) * | 2011-08-12 | 2013-02-14 | Robert Bosch Gmbh | Inlaid layer for metallic workpieces |
| EP2708305B1 (en) * | 2012-09-13 | 2018-05-30 | HDO -Druckguss- und Oberflächentechnik GmbH | Pressure cast component and method for its manufacture |
| CN107805811B (en) * | 2017-09-29 | 2019-05-10 | 河海大学 | A kind of powder cored filament material and its application of hydrogen sulfide corrosion resistant and abrasion aluminium-based amorphous alloy coating |
| CN109487213A (en) * | 2018-11-20 | 2019-03-19 | 山东科技大学 | A kind of anti-corrosion antifouling film and preparation method thereof based on stainless steel |
| CN111560589B (en) * | 2020-05-18 | 2021-03-05 | 中国科学院力学研究所 | HIPIMS preparation method of amorphous aluminum-manganese coating applied to neodymium-iron-boron |
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| JPS60138066A (en) * | 1983-12-26 | 1985-07-22 | Casio Comput Co Ltd | Surface treatment of external parts for timepiece |
| US6537638B2 (en) * | 2000-12-13 | 2003-03-25 | International Business Machines Corporation | Magnetic recording disk with perpendicular magnetic recording layer and multilayered underlayer structure |
| TWI240704B (en) * | 2003-12-26 | 2005-10-01 | Asia Optical Co Inc | Molding die for molding glass |
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| BERTRAM MALLIA, PETER DEARNLEY: "The Corrosion-Wear Response of Cr-Ti Coatings", WEAR, no. 263, 21 March 2007 (2007-03-21), uk, pages 679 - 690, XP002514806 * |
| CAI-E CUI, QIANG MIAO AND JUN-DE PAN: "Ti/Cr Multi-layer Coating on Magnesium Alloy AZ91 by Arc-added Glow Plasma Depositing Technique", SURFACE AND COATINGS TECHNOLOGY, no. 201, 1 September 2006 (2006-09-01), China, pages 5400 - 5403, XP002514805 * |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102560483A (en) * | 2010-12-30 | 2012-07-11 | 鸿富锦精密工业（深圳）有限公司 | Aluminium and aluminium alloy surface antiseptic treatment method and product prepared by same |
| US9511572B2 (en) | 2011-05-25 | 2016-12-06 | Southwest Research Institute | Nanocrystalline interlayer coating for increasing service life of thermal barrier coating on high temperature components |
| CN105669254A (en) * | 2016-01-18 | 2016-06-15 | 太原理工大学 | Method for improving high temperature oxidization resistance performance of carbon/carbon composite material |
| CN105669254B (en) * | 2016-01-18 | 2018-03-06 | 太原理工大学 | A kind of method for improving carbon/carbon composite pyro-oxidation resistance |
| CN107812914A (en) * | 2017-11-18 | 2018-03-20 | 张晓娟 | A kind of processing method of magnesium alloy die casting mould |
| DE102020210209A1 (en) | 2020-08-12 | 2022-02-17 | Ekpo Fuel Cell Technologies Gmbh | Bipolar plate, fuel cell and method for manufacturing a bipolar plate |
| WO2022033974A1 (en) | 2020-08-12 | 2022-02-17 | Ekpo Fuel Cell Technologies Gmbh | Flow field plate, fuel cell, and process for manufacturing a flow field plate |
| DE102022108476A1 (en) | 2022-04-07 | 2023-10-12 | Ekpo Fuel Cell Technologies Gmbh | Bipolar plate, fuel cell and method for producing a bipolar plate |
Also Published As
| Publication number | Publication date |
|---|---|
| GB0722642D0 (en) | 2007-12-27 |
| GB2454743A (en) | 2009-05-20 |
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