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WO2008090975A1 - 支持構造体及び露光装置 - Google Patents

支持構造体及び露光装置 Download PDF

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Publication number
WO2008090975A1
WO2008090975A1 PCT/JP2008/051070 JP2008051070W WO2008090975A1 WO 2008090975 A1 WO2008090975 A1 WO 2008090975A1 JP 2008051070 W JP2008051070 W JP 2008051070W WO 2008090975 A1 WO2008090975 A1 WO 2008090975A1
Authority
WO
WIPO (PCT)
Prior art keywords
support structure
exposure apparatus
vibration
resonation
damp
Prior art date
Application number
PCT/JP2008/051070
Other languages
English (en)
French (fr)
Inventor
Norihiko Fujimaki
Takahide Kamiyama
Hideaki Sakamoto
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2008555110A priority Critical patent/JPWO2008090975A1/ja
Publication of WO2008090975A1 publication Critical patent/WO2008090975A1/ja
Priority to US12/458,865 priority patent/US20100171022A1/en

Links

Classifications

    • G—PHYSICS
    • G10—MUSICAL INSTRUMENTS; ACOUSTICS
    • G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/172—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using resonance effects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Multimedia (AREA)
  • Acoustics & Sound (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　支持構造体（３０）は、支持対象物（１２，１４，１６，２０）を支持する。支持構造体（３０）は、外部から伝達される空気振動と共振して、上記空気振動を減衰させる共振装置（１）を備える。
PCT/JP2008/051070 2007-01-26 2008-01-25 支持構造体及び露光装置 WO2008090975A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008555110A JPWO2008090975A1 (ja) 2007-01-26 2008-01-25 支持構造体及び露光装置
US12/458,865 US20100171022A1 (en) 2007-01-26 2009-07-24 Support structure and exposure apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007016194 2007-01-26
JP2007-016194 2007-01-26

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/458,865 Continuation US20100171022A1 (en) 2007-01-26 2009-07-24 Support structure and exposure apparatus

Publications (1)

Publication Number Publication Date
WO2008090975A1 true WO2008090975A1 (ja) 2008-07-31

Family

ID=39644549

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051070 WO2008090975A1 (ja) 2007-01-26 2008-01-25 支持構造体及び露光装置

Country Status (4)

Country Link
US (1) US20100171022A1 (ja)
JP (1) JPWO2008090975A1 (ja)
TW (1) TW200846838A (ja)
WO (1) WO2008090975A1 (ja)

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US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2015108812A (ja) * 2013-10-23 2015-06-11 株式会社リコー 吸音器、および画像形成装置
US9097981B2 (en) 2007-10-12 2015-08-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
JP2017031767A (ja) * 2015-08-06 2017-02-09 理研軽金属工業株式会社 吸音構造材
JP2017520028A (ja) * 2014-06-05 2017-07-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置

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JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
US20120069317A1 (en) * 2010-09-20 2012-03-22 Jerry Peijster Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation
CN103797420A (zh) * 2011-09-12 2014-05-14 迈普尔平版印刷Ip有限公司 具有基底板的真空腔室
US9261852B2 (en) 2014-02-27 2016-02-16 Ricoh Company, Ltd. Acoustic device, and electronic device and image forming apparatus incorporating same
US9389574B2 (en) * 2014-02-27 2016-07-12 Ricoh Company, Limited Sound absorbing device, electronic device, and image forming apparatus
JP6361960B2 (ja) * 2014-05-26 2018-07-25 株式会社リコー 光走査装置及び画像形成装置
GB201415874D0 (en) * 2014-09-08 2014-10-22 Sonobex Ltd Acoustic Attenuator
US20180101099A1 (en) * 2015-04-17 2018-04-12 Asml Netherlands B.V. Lithographic Apparatus
NL2016500A (en) * 2015-05-06 2016-11-10 Asml Netherlands Bv Lithographic apparatus.
US9620102B1 (en) * 2016-05-02 2017-04-11 Hexcel Corporation Stepped acoustic structures with multiple degrees of freedom
US20180278786A1 (en) * 2017-03-23 2018-09-27 Kabushiki Kaisha Toshiba Case and apparatus for image formation
US11929053B2 (en) * 2019-09-11 2024-03-12 The Hong Kong University Of Science And Technology Broadband sound absorber based on inhomogeneous-distributed Helmholtz resonators with extended necks

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JPH05231458A (ja) * 1992-02-21 1993-09-07 Kurashiki Kako Co Ltd 除振装置
JP2001342693A (ja) * 2000-06-01 2001-12-14 Shimizu Corp 建物の外壁の構造
JP2002243211A (ja) * 2001-02-20 2002-08-28 Fujitsu General Ltd 空気調和機用圧縮機の吸音材
JP2003082839A (ja) * 2001-09-11 2003-03-19 Yamaha Corp 際根太構造体および床構造体
JP2005017635A (ja) * 2003-06-25 2005-01-20 Toyota Motor Corp 吸音構造体
JP2005280454A (ja) * 2004-03-29 2005-10-13 Sumitomo Rubber Ind Ltd タイヤとリムとの組立体およびこれに用いるサポートリング
JP2007016652A (ja) * 2005-07-06 2007-01-25 Tigers Polymer Corp 吸気装置

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DE69717975T2 (de) * 1996-12-24 2003-05-28 Asml Netherlands B.V., Veldhoven In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
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Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0231043A (ja) * 1988-07-16 1990-02-01 Tokkyo Kiki Kk 能動制御精密制振機構
JPH05231458A (ja) * 1992-02-21 1993-09-07 Kurashiki Kako Co Ltd 除振装置
JP2001342693A (ja) * 2000-06-01 2001-12-14 Shimizu Corp 建物の外壁の構造
JP2002243211A (ja) * 2001-02-20 2002-08-28 Fujitsu General Ltd 空気調和機用圧縮機の吸音材
JP2003082839A (ja) * 2001-09-11 2003-03-19 Yamaha Corp 際根太構造体および床構造体
JP2005017635A (ja) * 2003-06-25 2005-01-20 Toyota Motor Corp 吸音構造体
JP2005280454A (ja) * 2004-03-29 2005-10-13 Sumitomo Rubber Ind Ltd タイヤとリムとの組立体およびこれに用いるサポートリング
JP2007016652A (ja) * 2005-07-06 2007-01-25 Tigers Polymer Corp 吸気装置

Cited By (47)

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US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US9146474B2 (en) 2003-04-09 2015-09-29 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9164393B2 (en) 2003-04-09 2015-10-20 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9423697B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9244359B2 (en) 2003-10-28 2016-01-26 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
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US9140992B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9140990B2 (en) 2004-02-06 2015-09-22 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9423694B2 (en) 2004-02-06 2016-08-23 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429848B2 (en) 2004-02-06 2016-08-30 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
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US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9057963B2 (en) 2007-09-14 2015-06-16 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
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US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9097981B2 (en) 2007-10-12 2015-08-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8508717B2 (en) 2007-10-16 2013-08-13 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US9057877B2 (en) 2007-10-24 2015-06-16 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
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US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
JP2015108812A (ja) * 2013-10-23 2015-06-11 株式会社リコー 吸音器、および画像形成装置
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US10114299B2 (en) 2014-06-05 2018-10-30 Asml Netherlands B.V. Lithographic apparatus
JP2017031767A (ja) * 2015-08-06 2017-02-09 理研軽金属工業株式会社 吸音構造材

Also Published As

Publication number Publication date
JPWO2008090975A1 (ja) 2010-05-20
US20100171022A1 (en) 2010-07-08
TW200846838A (en) 2008-12-01

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