WO2008081555A1 - Manufacturing method for blaze type diffraction grating - Google Patents
Manufacturing method for blaze type diffraction grating Download PDFInfo
- Publication number
- WO2008081555A1 WO2008081555A1 PCT/JP2007/000001 JP2007000001W WO2008081555A1 WO 2008081555 A1 WO2008081555 A1 WO 2008081555A1 JP 2007000001 W JP2007000001 W JP 2007000001W WO 2008081555 A1 WO2008081555 A1 WO 2008081555A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- blaze
- ion beam
- backward
- resist pattern
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
A sinusoidal full or half resist pattern (3) is formed by a holographic exposure method in a photoresist layer (2) formed on a substrate (1) of glass or the like. After this, the substrate (1) is irradiated obliquely backward of the blaze direction with an ion beam by using an etching gas having a selection ratio (i.e., the etching rate of the substrate to the etching rate of the photoresist) less than 1. By executing the ion beam etching till the resist pattern (3) completely disappears, the sinusoidal grating grooves of the resist pattern (3) are transferred to the substrate thereby to form the pattern of a grating groove (4) having a saw-tooth section. A small blaze angle can be formed by lowering the etching rate of the substrate (1). In this case, too, by applying the ion beam obliquely not forward but backward of the blaze direction, the edge angle backward of the blaze angle across the blaze face can be reduced to enhance the diffraction efficiency.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/000001 WO2008081555A1 (en) | 2007-01-05 | 2007-01-05 | Manufacturing method for blaze type diffraction grating |
JP2008552012A JP4873015B2 (en) | 2007-01-05 | 2007-01-05 | Manufacturing method of blazed diffraction grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/000001 WO2008081555A1 (en) | 2007-01-05 | 2007-01-05 | Manufacturing method for blaze type diffraction grating |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008081555A1 true WO2008081555A1 (en) | 2008-07-10 |
Family
ID=39588245
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/000001 WO2008081555A1 (en) | 2007-01-05 | 2007-01-05 | Manufacturing method for blaze type diffraction grating |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4873015B2 (en) |
WO (1) | WO2008081555A1 (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013056627A1 (en) * | 2011-10-19 | 2013-04-25 | 苏州大学 | Method for manufacturing holographic bi-blazed grating |
WO2013056637A1 (en) * | 2011-10-19 | 2013-04-25 | 苏州大学 | Method for manufacturing holographic blazed grating |
WO2013183601A1 (en) | 2012-06-08 | 2013-12-12 | 株式会社日立ハイテクノロジーズ | Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same |
WO2014148118A1 (en) | 2013-03-19 | 2014-09-25 | 株式会社日立ハイテクノロジーズ | Curved diffraction grating, production method therefor, and optical device |
CN108957612A (en) * | 2018-07-26 | 2018-12-07 | 北极光电(深圳)有限公司 | A kind of film filter component and preparation method thereof |
US10302486B2 (en) | 2016-07-12 | 2019-05-28 | Oto Photonics Inc. | Spectrometer module and fabrication method thereof |
US10551531B2 (en) | 2011-12-30 | 2020-02-04 | Oto Photonics Inc. | Hybrid diffraction grating, mold insert and manufacturing methods thereof |
TWI719846B (en) * | 2018-05-30 | 2021-02-21 | 美商應用材料股份有限公司 | Controlling etch angles by substrate rotation in angled etch tools |
CN113023668A (en) * | 2021-03-10 | 2021-06-25 | 北京理工大学 | Method for manufacturing two-stage micro-nano structure array based on template |
JP2021532397A (en) * | 2018-07-13 | 2021-11-25 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Systems and methods for optimally forming a grid of diffractive optics |
CN114174872A (en) * | 2019-08-29 | 2022-03-11 | 株式会社日立高新技术 | Diffraction grating, method for manufacturing diffraction grating, and photomask |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113899533B (en) * | 2021-12-08 | 2022-04-01 | 杭州拓致光电科技有限公司 | Device and method for measuring performance of reflective volume grating |
CN114460676B (en) * | 2022-03-03 | 2024-01-09 | 福建睿创光电科技有限公司 | 1030nm sinusoidal medium grating and manufacturing method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05150110A (en) * | 1991-11-28 | 1993-06-18 | Shimadzu Corp | Production of diffraction grating of sic substrate |
JP2005157118A (en) * | 2003-11-27 | 2005-06-16 | Shimadzu Corp | Blazed holographic grating and manufacturing method therefor, and replica grating |
JP2006259325A (en) * | 2005-03-17 | 2006-09-28 | Shimadzu Corp | Method for manufacturing holographic grating |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3029524B2 (en) * | 1993-10-06 | 2000-04-04 | シャープ株式会社 | Manufacturing method of diffraction grating |
-
2007
- 2007-01-05 WO PCT/JP2007/000001 patent/WO2008081555A1/en active Application Filing
- 2007-01-05 JP JP2008552012A patent/JP4873015B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05150110A (en) * | 1991-11-28 | 1993-06-18 | Shimadzu Corp | Production of diffraction grating of sic substrate |
JP2005157118A (en) * | 2003-11-27 | 2005-06-16 | Shimadzu Corp | Blazed holographic grating and manufacturing method therefor, and replica grating |
JP2006259325A (en) * | 2005-03-17 | 2006-09-28 | Shimadzu Corp | Method for manufacturing holographic grating |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013056627A1 (en) * | 2011-10-19 | 2013-04-25 | 苏州大学 | Method for manufacturing holographic bi-blazed grating |
WO2013056637A1 (en) * | 2011-10-19 | 2013-04-25 | 苏州大学 | Method for manufacturing holographic blazed grating |
US9075194B2 (en) | 2011-10-19 | 2015-07-07 | Soochow University | Method for manufacturing holographic bi-blazed grating |
US9864113B2 (en) | 2011-10-19 | 2018-01-09 | Soochow University | Method for manufacturing holographic blazed grating |
US10551531B2 (en) | 2011-12-30 | 2020-02-04 | Oto Photonics Inc. | Hybrid diffraction grating, mold insert and manufacturing methods thereof |
WO2013183601A1 (en) | 2012-06-08 | 2013-12-12 | 株式会社日立ハイテクノロジーズ | Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same |
US9709714B2 (en) | 2012-06-08 | 2017-07-18 | Hitachi High-Technologies Corporation | Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same |
WO2014148118A1 (en) | 2013-03-19 | 2014-09-25 | 株式会社日立ハイテクノロジーズ | Curved diffraction grating, production method therefor, and optical device |
US9945993B2 (en) | 2013-03-19 | 2018-04-17 | Hitachi High-Technologies Corporation | Curved grating, method for manufacturing the same, and optical device |
US10302486B2 (en) | 2016-07-12 | 2019-05-28 | Oto Photonics Inc. | Spectrometer module and fabrication method thereof |
TWI719846B (en) * | 2018-05-30 | 2021-02-21 | 美商應用材料股份有限公司 | Controlling etch angles by substrate rotation in angled etch tools |
US11397289B2 (en) | 2018-05-30 | 2022-07-26 | Applied Materials, Inc. | Controlling etch angles by substrate rotation in angled etch tools |
JP2021532397A (en) * | 2018-07-13 | 2021-11-25 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Systems and methods for optimally forming a grid of diffractive optics |
CN108957612A (en) * | 2018-07-26 | 2018-12-07 | 北极光电(深圳)有限公司 | A kind of film filter component and preparation method thereof |
CN114174872A (en) * | 2019-08-29 | 2022-03-11 | 株式会社日立高新技术 | Diffraction grating, method for manufacturing diffraction grating, and photomask |
CN114174872B (en) * | 2019-08-29 | 2023-10-17 | 株式会社日立高新技术 | Diffraction grating, method for manufacturing diffraction grating, and photomask |
CN113023668A (en) * | 2021-03-10 | 2021-06-25 | 北京理工大学 | Method for manufacturing two-stage micro-nano structure array based on template |
Also Published As
Publication number | Publication date |
---|---|
JPWO2008081555A1 (en) | 2010-04-30 |
JP4873015B2 (en) | 2012-02-08 |
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