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WO2008081555A1 - Manufacturing method for blaze type diffraction grating - Google Patents

Manufacturing method for blaze type diffraction grating Download PDF

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Publication number
WO2008081555A1
WO2008081555A1 PCT/JP2007/000001 JP2007000001W WO2008081555A1 WO 2008081555 A1 WO2008081555 A1 WO 2008081555A1 JP 2007000001 W JP2007000001 W JP 2007000001W WO 2008081555 A1 WO2008081555 A1 WO 2008081555A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
blaze
ion beam
backward
resist pattern
Prior art date
Application number
PCT/JP2007/000001
Other languages
French (fr)
Japanese (ja)
Inventor
Tetsuya Nagano
Original Assignee
Shimadzu Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corporation filed Critical Shimadzu Corporation
Priority to JP2008552012A priority Critical patent/JP4873015B2/en
Priority to PCT/JP2007/000001 priority patent/WO2008081555A1/en
Publication of WO2008081555A1 publication Critical patent/WO2008081555A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

A sinusoidal full or half resist pattern (3) is formed by a holographic exposure method in a photoresist layer (2) formed on a substrate (1) of glass or the like. After this, the substrate (1) is irradiated obliquely backward of the blaze direction with an ion beam by using an etching gas having a selection ratio (i.e., the etching rate of the substrate to the etching rate of the photoresist) less than 1. By executing the ion beam etching till the resist pattern (3) completely disappears, the sinusoidal grating grooves of the resist pattern (3) are transferred to the substrate thereby to form the pattern of a grating groove (4) having a saw-tooth section. A small blaze angle can be formed by lowering the etching rate of the substrate (1). In this case, too, by applying the ion beam obliquely not forward but backward of the blaze direction, the edge angle backward of the blaze angle across the blaze face can be reduced to enhance the diffraction efficiency.
PCT/JP2007/000001 2007-01-05 2007-01-05 Manufacturing method for blaze type diffraction grating WO2008081555A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008552012A JP4873015B2 (en) 2007-01-05 2007-01-05 Manufacturing method of blazed diffraction grating
PCT/JP2007/000001 WO2008081555A1 (en) 2007-01-05 2007-01-05 Manufacturing method for blaze type diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/000001 WO2008081555A1 (en) 2007-01-05 2007-01-05 Manufacturing method for blaze type diffraction grating

Publications (1)

Publication Number Publication Date
WO2008081555A1 true WO2008081555A1 (en) 2008-07-10

Family

ID=39588245

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/000001 WO2008081555A1 (en) 2007-01-05 2007-01-05 Manufacturing method for blaze type diffraction grating

Country Status (2)

Country Link
JP (1) JP4873015B2 (en)
WO (1) WO2008081555A1 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013056627A1 (en) * 2011-10-19 2013-04-25 苏州大学 Method for manufacturing holographic bi-blazed grating
WO2013056637A1 (en) * 2011-10-19 2013-04-25 苏州大学 Method for manufacturing holographic blazed grating
WO2013183601A1 (en) 2012-06-08 2013-12-12 株式会社日立ハイテクノロジーズ Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same
WO2014148118A1 (en) 2013-03-19 2014-09-25 株式会社日立ハイテクノロジーズ Curved diffraction grating, production method therefor, and optical device
CN108957612A (en) * 2018-07-26 2018-12-07 北极光电(深圳)有限公司 A kind of film filter component and preparation method thereof
US10302486B2 (en) 2016-07-12 2019-05-28 Oto Photonics Inc. Spectrometer module and fabrication method thereof
US10551531B2 (en) 2011-12-30 2020-02-04 Oto Photonics Inc. Hybrid diffraction grating, mold insert and manufacturing methods thereof
TWI719846B (en) * 2018-05-30 2021-02-21 美商應用材料股份有限公司 Controlling etch angles by substrate rotation in angled etch tools
CN113023668A (en) * 2021-03-10 2021-06-25 北京理工大学 Method for manufacturing two-stage micro-nano structure array based on template
JP2021532397A (en) * 2018-07-13 2021-11-25 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド Systems and methods for optimally forming a grid of diffractive optics
CN114174872A (en) * 2019-08-29 2022-03-11 株式会社日立高新技术 Diffraction grating, method for manufacturing diffraction grating, and photomask

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113899533B (en) * 2021-12-08 2022-04-01 杭州拓致光电科技有限公司 Device and method for measuring performance of reflective volume grating
CN114460676B (en) * 2022-03-03 2024-01-09 福建睿创光电科技有限公司 1030nm sinusoidal medium grating and manufacturing method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05150110A (en) * 1991-11-28 1993-06-18 Shimadzu Corp Production of diffraction grating of sic substrate
JP2005157118A (en) * 2003-11-27 2005-06-16 Shimadzu Corp Blazed holographic grating and manufacturing method therefor, and replica grating
JP2006259325A (en) * 2005-03-17 2006-09-28 Shimadzu Corp Method for manufacturing holographic grating

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3029524B2 (en) * 1993-10-06 2000-04-04 シャープ株式会社 Manufacturing method of diffraction grating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05150110A (en) * 1991-11-28 1993-06-18 Shimadzu Corp Production of diffraction grating of sic substrate
JP2005157118A (en) * 2003-11-27 2005-06-16 Shimadzu Corp Blazed holographic grating and manufacturing method therefor, and replica grating
JP2006259325A (en) * 2005-03-17 2006-09-28 Shimadzu Corp Method for manufacturing holographic grating

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013056627A1 (en) * 2011-10-19 2013-04-25 苏州大学 Method for manufacturing holographic bi-blazed grating
WO2013056637A1 (en) * 2011-10-19 2013-04-25 苏州大学 Method for manufacturing holographic blazed grating
US9075194B2 (en) 2011-10-19 2015-07-07 Soochow University Method for manufacturing holographic bi-blazed grating
US9864113B2 (en) 2011-10-19 2018-01-09 Soochow University Method for manufacturing holographic blazed grating
US10551531B2 (en) 2011-12-30 2020-02-04 Oto Photonics Inc. Hybrid diffraction grating, mold insert and manufacturing methods thereof
WO2013183601A1 (en) 2012-06-08 2013-12-12 株式会社日立ハイテクノロジーズ Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same
US9709714B2 (en) 2012-06-08 2017-07-18 Hitachi High-Technologies Corporation Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same
WO2014148118A1 (en) 2013-03-19 2014-09-25 株式会社日立ハイテクノロジーズ Curved diffraction grating, production method therefor, and optical device
US9945993B2 (en) 2013-03-19 2018-04-17 Hitachi High-Technologies Corporation Curved grating, method for manufacturing the same, and optical device
US10302486B2 (en) 2016-07-12 2019-05-28 Oto Photonics Inc. Spectrometer module and fabrication method thereof
TWI719846B (en) * 2018-05-30 2021-02-21 美商應用材料股份有限公司 Controlling etch angles by substrate rotation in angled etch tools
US11397289B2 (en) 2018-05-30 2022-07-26 Applied Materials, Inc. Controlling etch angles by substrate rotation in angled etch tools
JP2021532397A (en) * 2018-07-13 2021-11-25 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド Systems and methods for optimally forming a grid of diffractive optics
CN108957612A (en) * 2018-07-26 2018-12-07 北极光电(深圳)有限公司 A kind of film filter component and preparation method thereof
CN114174872A (en) * 2019-08-29 2022-03-11 株式会社日立高新技术 Diffraction grating, method for manufacturing diffraction grating, and photomask
CN114174872B (en) * 2019-08-29 2023-10-17 株式会社日立高新技术 Diffraction grating, method for manufacturing diffraction grating, and photomask
CN113023668A (en) * 2021-03-10 2021-06-25 北京理工大学 Method for manufacturing two-stage micro-nano structure array based on template

Also Published As

Publication number Publication date
JP4873015B2 (en) 2012-02-08
JPWO2008081555A1 (en) 2010-04-30

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