WO2007066643A1 - Probe pin, probe card, and probe device - Google Patents
Probe pin, probe card, and probe device Download PDFInfo
- Publication number
- WO2007066643A1 WO2007066643A1 PCT/JP2006/324232 JP2006324232W WO2007066643A1 WO 2007066643 A1 WO2007066643 A1 WO 2007066643A1 JP 2006324232 W JP2006324232 W JP 2006324232W WO 2007066643 A1 WO2007066643 A1 WO 2007066643A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- probe pin
- probe
- electrode
- contact portion
- contact
- Prior art date
Links
- 239000000523 sample Substances 0.000 title claims abstract description 179
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000012360 testing method Methods 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 27
- 239000012768 molten material Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 22
- 238000000034 method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 238000007689 inspection Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R3/00—Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
Definitions
- the characteristic of the child circuit such as c s formed on the semiconductor device is pressed against the electronic circuit on the side of the device.
- the quality of the conventional type is that a metal such as tungsten is used to withstand many inspections ().
- the part of the electrode on the side of the side may be separated when attached to the electrode on the side of the side when the electrode is separated from the electrode on the side of the side. For this reason, it was feared that deposits would build up on the probe and electrical damage would occur between the probe and the electrode, after a large number of inspections. For this reason, it was necessary to replace the pile in a short period of time and remove the accumulated deposits with a la, resulting in a short life.
- the characteristics of the contact surface to be inspected are to be inspected, and the surface to be contacted with is made of a material whose strength is weaker than that of And A material with low strength is a material that breaks under certain stress.
- the surface of the bur is weaker than the surface of the covered garment, so that the bur of the bur will break when the glued bur is separated.
- deposits will not be deposited on the puck and the puck surface will always be exposed, so even if the puck is used many times, a constant contact with and can be maintained.
- it is possible to prolong the life of the fish, for example, by eliminating the need for the job of the fish.
- No. 009 surface may be made of a weak material, and the side part of the surface may be made of a material stronger than the above material. Even though.
- the 001p may be used for conducting electricity and electricity by using a tinging object.
- a device equipped with a probe for inspecting the characteristics of in contact with, which is weaker in strength than the contact with the device, and a device for contacting with the device. So that it can be dipped into the And a moving mechanism for moving the container, and characterized in that the top surface of the plug is made of a material whose strength is weaker than that of the above.
- the bur of the bur is separated. Therefore, deposits do not accumulate on the pock and the plow surface is exposed, so that even if the puck is used many times, a constant contact with and can be maintained. As a result, for example, the power supply of the king is no longer necessary and the life of the horse can be extended.
- the plug can be dipped in the container, the contacted part can be replenished and recovered. This can extend the life of the fish. Also, since the shape of the pump is stable, and are more stable.
- FIG. 6 (a) is a cross-section showing the state where the probe is in contact with the electrode. (b) is a cross-section showing the state where the probe is separated from the electrode. This is a cross-section of the 7 side coated with tin.
- the pu is equipped with a pod 2, a W as 3, and a moving mechanism 4 for moving the W.
- the pod 2 is provided with a contactor that supports a plurality of contacts with which W is in contact, and a pump 2 that sends and receives an electric signal to and from the contact through the body of the contactor dish.
- a contactor that supports a plurality of contacts with which W is in contact
- a pump 2 that sends and receives an electric signal to and from the contact through the body of the contactor dish.
- Punt 2 is formed, for example, and Punt 2 is
- the contactor is arranged so that it can be energized.
- the 002b is joined, for example, to the 2 formed on the body of the contactor dish.
- the loop is formed by a linear 3 as shown in 2 and a 3 protruding at a right angle to the 3 and has a shape.
- the back of the 3 is joined to the connection 2 and the contact 3 projects at the end of the 3. This 3 contacts P as a share of W.
- 002P is, for example, integrally molded, and is entirely made of P having W, which is weaker than P, for example, tin, for example, tin.
- the one whose tensile strength is smaller than O Pa than P is selected.
- a flexible wire is formed to connect 2 and electricity.
- the test 4 sends and receives signals for electrical characteristics, and 2 sets of tests to generate the targeting phenomenon.
- Test 4 Ting 4 is switched over to Ting 4 for impressing voltage on, continued via ching 42.
- the tenting phenomenon is the phenomenon in which the film on the surface of the electrode P is destroyed when the potential marked on the surface of the electrode P reaches ⁇ O c, and a current flows through the film.
- Taing 4 is a set of 2 touching Ps on W.
- the towing function is realized by the towing 4.
- the moving mechanism 4 includes, for example, a horizontal 5 that supports 3 from below, a moving unit 5 such as a unit that raises and lowers the horizontal 5, and a raising and lowering unit 5 in two horizontal directions. It is made up of a moving X stage 52. This makes it possible to move W set to 3 in three dimensions and to touch W on W's desired P.
- W is on top of 3.
- the moving mechanism 4 moves the W to the third dimension, and as shown in 5, each of the W's P has two pushes. Are contacted.
- the electrode Pp is extremely lowered.
- a voltage is applied between the two pts of P using Ting 4.
- a tinging phenomenon is generated, and the film on the surface of the electrode P is broken down (tinging).
- the electrical resistance between the P-electrode P and the P-electrode P becomes small, and the P-electrode P and the P-electrode P are electrically conducted.
- the switch 4 is switched to the test 4 by the switch 42. Then, using Test 4, an electric signal is sent from the electrode P to the electrode P, and the characteristics of the W W element are examined.
- Knob is separated from electrode P.
- the force of adhesion with the pre-electrode P is large. This is considered to be because a high current temporarily flows in a narrow area between the tip electrode P and the tip electrode P is welded.
- a tensile force acts on the probe electrode P. Since the electrode P is formed more frequently than the electrode P, if the electrode P is in contact with the electrode P as shown in 6 (a) and the electrode P is separated as shown in 6 (b), The part of the surface of the is separated and adheres to the electrode P.
- the container 62 having the container since the container 62 having the container is provided in the container, the container can be replenished with the container in the container 62. As a result, the shape of the pu is maintained, and the life of the pu can be further extended.
- the 003 62 is placed on the 6 so that it can keep the melt in the container 62.
- the body of the p is made of tin, but only the 3rd face of the p is made of tin, which is weaker than the electrode P, and the side of the 3rd face is formed.
- the part is made of a material stronger than the electrode P, for example,
- tungsten it may be made of tungsten or the like.
- a of the p is formed by Kakke (), and tin is coated on the b of the p.
- the tin of b is coated, for example, only to.
- the a of the body is made of a strong material, the degree of the body of the body is secured and the body is not deformed by, for example, touching P.
- only the surface of contact 3 is coated with tin, it is performed only on the surface of contact 3 that is missing at the time of separation, so that a large mass of tin does not adhere to the electrode P side.
- the contact a (3 contact 3) may be made of a strong material to the above degree, but only contact 3 It may be made of a strong material.
- tin is used as the material having a higher strength than the electrode P, but an alloy containing tin or another material such as solder may be used.
- the description is applied to the process used when the tinting process is performed, but it can also be applied to the process used when the tinting process is not performed. , P outside of W (ratney display), disk for otosk, etc.
- the P in this case is Aum.
- the horizontal axis indicates the number and the contact resistance. If the resistance is large, it will not be possible to use it, and it will be a life. As shown in Fig. 8, the (S)
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
[PROBLEMS] To increase the life of a probe pin. [MEANS FOR SOLVING THE PROBLEMS] The contact part of the probe pin is formed of a tin smaller in strength than the electrode of a wafer (W). Thus, since the probe pin is broken when it is separated from the electrode, a part of the electrode can be prevented from adhering to the probe pin. A container for reserving a molten tin is installed on a probe device. The container is three-dimensionally movable by a moving mechanism so that the probe pin can be immersed into the molten tin in the container. Consequently, it is possible to supply the tin onto the surface of the broken probe pin.
Description
明 細 書 Specification
プローブピン、プローブカード及びプローブ装置 Probe pins, probe cards and probe devices
技術分野 Technical field
[0001] 本発明は、被検査体に接触して被検査体の電気的特性を検査するためのプロ一 ブピンと、プローブカード及びプローブ装置に関する。 [0001] The present invention relates to a probe pin, a probe card, and a probe device for testing the electrical characteristics of a test object by contacting the test object.
背景技術 Background technology
[0002] 例えば半導体ウェハ上に形成された IC、 LSIなどの電子回路の電気的特性の検査 は、プローブ装置に設けられたプローブピンを、ウェハ側の電子回路の電極に押し付 けて接触させることにより行われて 、る。 [0002] For example, to inspect the electrical characteristics of electronic circuits such as ICs and LSIs formed on semiconductor wafers, probe pins provided on a probe device are pressed against and brought into contact with the electrodes of the electronic circuits on the wafer side. It is done by.
[0003] 上述のプローブピンは、電極表面の酸ィ匕膜を削る必要があるため、従来よりプロ一 ブピンの材質には、多数回の検査に耐えられるように、タングステンやニッケルなどの 強度の強 、金属が用いられて 、る(特許文献 1参照)。 [0003] Since the above-mentioned probe pin requires cutting off the oxide film on the electrode surface, the probe pin has traditionally been made of strong materials such as tungsten or nickel to withstand multiple inspections. A strong metal is used (see Patent Document 1).
特許文献 1 :特開 2005— 106497号公報 Patent document 1: Japanese Patent Application Publication No. 2005-106497
発明の開示 Disclosure of invention
発明が解決しょうとする課題 Problems that the invention seeks to solve
[0004] し力しながら、電気的特性の検査において、プローブピンの接触部がウェハ側の電 極から引き離される際に、ウェハ側の電極の一部が剥離して、プローブピンの接触部 に付着することがある。このため、多数回の検査を行うことにより、プローブピンの接触 部に付着物が堆積し、プローブピンと電極との間に電気的な接触不良が生じることが 懸念されていた。このため、プローブピンを短期間で交換し、堆積した付着物をブラ シで除去する必要があり、プローブピンの寿命が短くなつていた。 [0004] When the contact part of the probe pin is pulled away from the electrode on the wafer side while applying force, a part of the electrode on the wafer side is peeled off and the contact part of the probe pin is pulled away from the electrode on the wafer side. It may stick. For this reason, there was a concern that by performing multiple tests, deposits would accumulate on the contact portion of the probe pin, resulting in poor electrical contact between the probe pin and the electrode. For this reason, it was necessary to replace the probe pins in a short period of time and remove the deposits with a brush, which shortened the lifespan of the probe pins.
[0005] ところで、近年、プローブピンと電極との接触圧を低減するために、電極に接触した プローブピンに電圧を印加し、フリツティング現象を利用して、電極の表面の酸化膜 を絶縁破壊させ、プローブピンと電極との導通を図る技術が提案されている。この場 合、プローブピンと電極との間に、溶着による比較的強い接着力が発生することが確 認されており、プローブピンと電極が引き離れる際には、その時の引張応力により電 極の一部が破断し欠損して、プローブピンの接触部に付着しやすい。したがって、特
にフリツティング技術を用いた場合には、プローブピンに付着物が堆積し、プローブ ピンと電極との接触不良が生じやす!/、。 By the way, in recent years, in order to reduce the contact pressure between the probe pin and the electrode, a voltage is applied to the probe pin that is in contact with the electrode, and the oxide film on the surface of the electrode is dielectrically broken down using the fritting phenomenon. , techniques have been proposed for establishing electrical continuity between probe pins and electrodes. In this case, it has been confirmed that a relatively strong adhesive force is generated between the probe pin and the electrode due to welding, and when the probe pin and the electrode are separated, part of the electrode is damaged due to the tensile stress at that time. It is easy to break and become damaged, and to stick to the contact part of the probe pin. Therefore, When using the fritting technique, deposits tend to accumulate on the probe pin, resulting in poor contact between the probe pin and the electrode.
[0006] 本発明は、力かる点に鑑みてなされたものであり、プローブピンの接触部に、ウェハ などの被検査体側の接触部分の一部が剥離して付着するのを防止することをその目 的とする。 [0006] The present invention has been made in view of the above-mentioned problems, and is intended to prevent part of the contact portion of the object to be inspected, such as a wafer, from peeling off and adhering to the contact portion of the probe pin. That purpose.
課題を解決するための手段 Means to solve problems
[0007] 上記目的を達成するための本発明は、被検査体に接触して被検査体の電気的特 性を検査するためのプローブピンであって、被検査体と接触する接触部の少なくとも 表面が、被検査体側の接触部分よりも強度が弱 ヽ材質で形成されて ヽることを特徴 とする。なお、強度が弱い材質とは、小さな応力で破断する材質をいう。 [0007] To achieve the above object, the present invention provides a probe pin for testing the electrical characteristics of a test object by contacting the test object, the probe pin having at least one contact portion that comes into contact with the test object. The surface is characterized by being made of a material that is weaker than the contact part on the side of the object to be inspected. Note that a material with low strength refers to a material that breaks under small stress.
[0008] 本発明によれば、プローブピンの接触部の表面が被検査体側の接触部分よりも強 度が弱いので、接着したプローブピンと被検査体が離される際には、プローブピンの 接触部側が破断し剥離する。かかる場合、プローブピンに付着物が堆積することがな ぐまた常にプローブピンの新しい面が露出するので、プローブピンを多数回使用し ても、被検査体との安定的な接触を維持できる。この結果、例えばプローブピンのタリ 一-ング作業が不要になり、プローブピンの寿命を長くできる。 [0008] According to the present invention, since the surface of the contact portion of the probe pin is weaker than the contact portion on the side of the test object, when the bonded probe pin and the test object are separated, the contact portion of the probe pin The sides break and peel off. In this case, no deposits are deposited on the probe pin, and a new surface of the probe pin is always exposed, so that stable contact with the object to be inspected can be maintained even if the probe pin is used many times. As a result, for example, there is no need for probe pin tallying work, and the life of the probe pin can be extended.
[0009] 前記接触部の表面が、前記強度が弱い材質で形成され、前記接触部の表面の内 側部分は、前記被検査体側の接触部分よりも強度が強 ヽ材質で形成されて!、てもよ い。 [0009] The surface of the contact part is formed of the material with low strength, and the inner part of the surface of the contact part is made of a material with stronger strength than the contact part on the side of the object to be inspected! It's okay.
[0010] 前記接触部の前記強度の弱!、材質は、錫又は錫を含む合金であってもよ 、。 [0010] The material of the contact portion having low strength may be tin or an alloy containing tin.
[0011] 前記プローブピンは、フリツティング現象を利用して被検査体側の接触部分と電気 的に導通する際に用いられるものであってもよい。 [0011] The probe pin may be used to establish electrical continuity with a contact portion on the test object side by utilizing a fritting phenomenon.
[0012] 別の観点による本発明によれば、上述のプローブピンを備えたプローブカードが提 供される。 [0012] According to another aspect of the present invention, a probe card including the above-mentioned probe pins is provided.
[0013] 別の観点による本発明は、被検査体に接触して被検査体の電気的特性を検査す るためのプローブピンを備えたプローブ装置であって、プローブピンと接触する被検 查体側の接触部分よりも強度が弱!ヽ材料の溶融物を貯留する容器と、前記被検査 体と接触するプローブピンの接触部を前記容器内の溶融物に浸漬できるように、前
記容器を移動させる移動機構と、を有し、前記プローブピンの接触部の少なくとも表 面は、前記被検査体側の接触部分よりも強度が弱!ヽ材質で形成されて!ヽることを特 徴とする。 [0013] The present invention according to another aspect is a probe device equipped with a probe pin for testing the electrical characteristics of a test object by contacting the test object, the test object side being in contact with the probe pin. The strength is weaker than the contact part of the probe pin, which is in contact with the container that stores the molten material and the test object, so that it can be immersed in the melt in the container. a moving mechanism for moving the container, and at least the surface of the contact portion of the probe pin is formed of a material whose strength is weaker than that of the contact portion on the side of the object to be inspected. be a sign.
[0014] 本発明によれば、プローブピンの接触部の表面が被検査体側の接触部分よりも強 度が弱いので、接着したプローブピンと被検査体が離される際には、プローブピンの 接触部側が破断し剥離する。それ故、プローブピンに付着物が堆積することがなぐ またプローブピンの新しい面が露出するので、プローブピンを多数回使用しても、被 検査体との安定的な接触を維持できる。これによつて、例えばプローブピンのタリー ユング作業が不要になり、プローブピンの寿命を延ばすことができる。また、プローブ ピンの接触部を容器の溶融物に浸漬できるので、接触部の剥離した部分を補充し回 復することができる。これによつて、プローブピンの寿命をさらに延ばすことができる。 また、プローブピンの接触部の表面形状が安定するので、被検査体との接触がさら に安定する。 [0014] According to the present invention, since the surface of the contact portion of the probe pin is weaker than the contact portion on the side of the test object, when the bonded probe pin and the test object are separated, the contact portion of the probe pin The sides break and peel off. Therefore, no deposits are deposited on the probe pin, and since a new surface of the probe pin is exposed, stable contact with the object to be inspected can be maintained even if the probe pin is used many times. This eliminates the need for tallying the probe pin, for example, and extends the life of the probe pin. Furthermore, since the contact part of the probe pin can be immersed in the molten material in the container, the peeled off part of the contact part can be replenished and recovered. This allows the life of the probe pin to be further extended. Furthermore, since the surface shape of the contact portion of the probe pin is stabilized, the contact with the object to be inspected becomes even more stable.
[0015] 前記プローブ装置は、前記容器を加熱する加熱部材を有して!/ヽてもよ ヽ。 [0015] The probe device may include a heating member that heats the container.
[0016] 前記プローブ装置は、フリツティング現象を利用して被検査体とプローブピンを電気 的に導通させるフリツティング機能を有して 、てもよ 、。 [0016] The probe device may have a fritting function that utilizes a fritting phenomenon to electrically connect the test object and the probe pin.
発明の効果 Effect of the invention
[0017] 本発明によれば、プローブピンのクリーニングが不要になり、プローブピンの寿命を 長くできる。また、安定した低電気抵抗の接触点を形成できるため、電気的特性の検 查精度を安定させることができる。 [0017] According to the present invention, there is no need to clean the probe pin, and the life of the probe pin can be extended. In addition, since stable contact points with low electrical resistance can be formed, the accuracy of testing electrical characteristics can be stabilized.
図面の簡単な説明 Brief description of the drawing
[0018] [図 1]プローブ装置の構成の概略を示す側面図である。 [0018] FIG. 1 is a side view schematically showing the configuration of a probe device.
[図 2]プローブピンの取付け部の構成を示す縦断面の説明図である。 FIG. 2 is an explanatory diagram of a vertical cross section showing the configuration of a probe pin attachment part.
[図 3]プリント配線基板の回路の機能を示す説明図である。 FIG. 3 is an explanatory diagram showing the functions of the circuit of the printed wiring board.
[図 4]容器と熱板の縦断面の説明図である。 [Figure 4] An explanatory diagram of a vertical cross section of a container and a hot plate.
[図 5]2本のプローブピンが電極に接触した状態を示す説明図である。 FIG. 5 is an explanatory diagram showing a state in which two probe pins are in contact with an electrode.
[図 6] (a)は、プローブピンを電極に接触した状態を示す縦断面の説明図である。 (b) は、プローブピンを電極力 引き離した状態を示す縦断面の説明図である。
[図 7]表面に錫を被覆した接触部の縦断面の説明図である。 [FIG. 6] (a) is an explanatory diagram of a longitudinal section showing a state in which a probe pin is in contact with an electrode. (b) is an explanatory diagram of a longitudinal section showing a state in which the probe pin is separated by electrode force. FIG. 7 is an explanatory diagram of a vertical cross section of a contact portion whose surface is coated with tin.
[図 8]プローブピンの寿命を測る実験結果を示すグラフである。 [Figure 8] A graph showing the results of an experiment to measure the lifespan of probe pins.
符号の説明 Explanation of symbols
[0019] 1 プローブ装置 [0019] 1 Probe device
10 プローブピン 10 probe pin
31 接触部 31 Contact part
P 電極 P electrode
W ウェハ W wafer
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0020] 以下、本発明の好ましい実施の形態について説明する。図 1は、本実施の形態に 力かるプローブ装置 1の構成の概略を示す説明図である。 [0020] Preferred embodiments of the present invention will be described below. FIG. 1 is an explanatory diagram showing an outline of the configuration of a probe device 1 according to the present embodiment.
[0021] 例えばプローブ装置 1は、プローブカード 2と、被検査体としてのウェハ Wを載置す る載置台 3と、載置台 3を移動させる移動機構 4を備えている。 [0021] For example, the probe device 1 includes a probe card 2, a mounting table 3 on which a wafer W as an object to be inspected is placed, and a movement mechanism 4 that moves the mounting table 3.
[0022] プローブカード 2は、例えばウェハ Wの電極に接触する複数のプローブピン 10を下 面に支持したコンタクタ 11と、プローブピン 10に対しコンタクタ 11の本体を通じて電 気信号を授受するプリント配線基板 12を備えている。コンタクタ 11とプリント配線基板[0022] The probe card 2 includes, for example, a contactor 11 supporting a plurality of probe pins 10 on its lower surface that contact electrodes of a wafer W, and a printed wiring board that sends and receives electrical signals to and from the probe pins 10 through the body of the contactor 11. It has 12. Contactor 11 and printed wiring board
12は、例えば略円盤状に形成され、プリント配線基板 12は、コンタクタ 11の上面側 にコンタクタ 11と通電可能に配置されている。 12 is formed, for example, into a substantially disk shape, and the printed wiring board 12 is arranged on the upper surface side of the contactor 11 so as to be able to conduct electricity with the contactor 11.
[0023] プローブピン 10は、例えばコンタクタ 11の本体の下面に形成された接続端子 20に 接合されている。プローブピン 10は、例えば図 2に示すように直線状の梁部 30と、そ の梁部 30の先端部に直角方向に突出した接触部 31により構成され、略 L型形状を 有している。梁部 30の後端側が接続端子 20に接合され、接触部 31は、梁部 30の先 端において下側に突出している。この接触部 31は、ウェハ Wの接触部分としての電 極 Pに接触する。 [0023] The probe pin 10 is connected to a connection terminal 20 formed on the lower surface of the main body of the contactor 11, for example. For example, as shown in FIG. 2, the probe pin 10 is composed of a linear beam portion 30 and a contact portion 31 protruding perpendicularly to the tip of the beam portion 30, and has a substantially L-shape. . The rear end side of the beam portion 30 is joined to the connection terminal 20, and the contact portion 31 protrudes downward at the tip of the beam portion 30. This contact portion 31 contacts the electrode P serving as the contact portion of the wafer W.
[0024] プローブピン 10は、例えば一体成型され、全体がウェハ Wの電極 P、例えばアルミ -ゥムよりも強度が弱い導電性材料、例えば錫により形成されている。プローブピン 1 0の材質は、例えば電極 Pよりも引張強度が lOMPa以上小さいものが選択される。 [0024] The probe pin 10 is, for example, integrally molded, and the whole is made of a conductive material, such as tin, whose strength is weaker than that of the electrode P of the wafer W, such as aluminum. The material of the probe pin 10 is selected to have a tensile strength smaller than that of the electrode P by lOMPa or more, for example.
[0025] コンタクタ 11の本体の内部には、下面側の各プローブピン 10と上面側のプリント回
路基板 12とを電気的に接続する図示しない接続配線が形成されている。 [0025] Inside the main body of contactor 11, there are probe pins 10 on the bottom side and a printed circuit on the top side. Connection wiring (not shown) for electrically connecting to the circuit board 12 is formed.
[0026] 例えば図 3に示すようにプローブピン 10は、電気的特性の検査のための電気信号 を送受信するテスト回路 40と、フリツティング現象を起こすために 2本一糸且のプローブ ピン 10に電圧を印加するフリツティング回路 41に対して、テスト回路 40とフリツティン グ回路 41を切り替えるスイッチング回路 42を介して接続されている。ここで、フリツテ イング現象とは、電極 Pの表面に印加される電位傾度が 105〜: L06V/cm程度になる と、電極 Pの表面の酸化膜が絶縁破壊され、酸化膜を通じて電流が流れる現象をい う。フリツティング回路 41は、ウェハ Wの電極 Pに接触した 2本一組のプローブピン 10 間に、所定の電圧を印加し、 2本のプローブピン 10間の電位傾度を上げることによつ て、 2本のプローブピン 10と電極 Pとの 2箇所の接触部において同時に、電極 Pの表 面の酸ィ匕膜を絶縁破壊して、電極 Pとプローブピン 10とを電気的に導通することがで きる。なお、本実施の形態においては、フリツティング回路 41によってフリツティング機 能が実現されている。 [0026] For example, as shown in FIG. 3, the probe pin 10 is connected to a test circuit 40 that transmits and receives electrical signals for testing electrical characteristics, and a voltage is applied to the probe pin 10 of two single threads in order to cause a fritting phenomenon. The test circuit 40 is connected to the flitting circuit 41 that applies the voltage via a switching circuit 42 that switches between the test circuit 40 and the flitting circuit 41. Here, the fritting phenomenon means that when the potential gradient applied to the surface of electrode P reaches approximately 10 5 to L0 6 V/cm, the oxide film on the surface of electrode P undergoes dielectric breakdown and current flows through the oxide film. This refers to the phenomenon in which the flow of water occurs. The fritting circuit 41 applies a predetermined voltage between a pair of probe pins 10 that are in contact with the electrode P of the wafer W, and increases the potential gradient between the two probe pins 10. At the two contact points between the two probe pins 10 and the electrode P, the oxide film on the surface of the electrode P can be dielectrically broken down at the same time to establish electrical continuity between the electrode P and the probe pin 10. can. Note that in this embodiment, the flitting function is realized by the flitting circuit 41.
[0027] 移動機構 4は、図 1に示すように例えば載置台 3を下力 支持する水平支持台 50と 、水平支持台 50を昇降するシリンダなどの昇降駆動部 51と、昇降駆動部 51を水平 方向の X方向と Y方向の 2方向に移動させる X— Yステージ 52により構成されている 。これにより、載置台 3に載置されたウェハ Wを三次元移動させ、ウェハ Wの所望の電 極 Pにプローブピン 10を接触させることができる。 [0027] As shown in FIG. 1, the moving mechanism 4 includes, for example, a horizontal support base 50 that supports the mounting base 3 with downward force, an elevating drive unit 51 such as a cylinder that raises and lowers the horizontal support base 50, and an elevating drive unit 51. It consists of an X-Y stage 52 that moves in two horizontal directions: the X direction and the Y direction. Thereby, the wafer W placed on the mounting table 3 can be moved three-dimensionally, and the probe pins 10 can be brought into contact with desired electrodes P of the wafer W.
[0028] 例えば水平支持台 50上の載置台 3の隣には、給電による発熱するヒータ 60が内蔵 された加熱部材としての熱板 61が設けられている。この熱板 61上には、図 4に示す ようにプローブピン 10の構成材料である溶融錫 Aを貯留する容器 62が設けられて ヽ る。容器 62内の溶融錫 Aは、熱板 61の熱により溶融状態を維持できる。また、容器 6 2は、載置台 3と同じ水平支持台 50に載置されているため、移動機構 4により三次元 移動可能であり、プローブピン 10の接触部 31を容器 62内の溶融錫 Aに浸漬するこ とができる。これにより、プローブピン 10の接触部 31に錫を付着させることができる。 [0028] For example, next to the mounting table 3 on the horizontal support table 50, a hot plate 61 serving as a heating member is provided, which has a built-in heater 60 that generates heat by power supply. A container 62 for storing molten tin A, which is the constituent material of the probe pin 10, is provided on the hot plate 61, as shown in FIG. The molten tin A in the container 62 can be maintained in a molten state by the heat of the hot plate 61. In addition, since the container 62 is placed on the same horizontal support 50 as the mounting table 3, it can be moved three-dimensionally by the moving mechanism 4, and the contact portion 31 of the probe pin 10 is connected to the molten tin A in the container 62. Can be immersed in water. Thereby, tin can be attached to the contact portion 31 of the probe pin 10.
[0029] 次に、上述したプローブ装置 1の作用を、ウェハ Wの検査プロセスと共に説明する。 [0029]Next, the operation of the probe device 1 described above will be explained together with the wafer W inspection process.
先ず、ウェハ Wが載置台 3上に載置される。次に、移動機構 4により、ウェハ Wが三次 元移動され、図 5に示すようにウェハ Wの各電極 Pにそれぞれ 2本のプローブピン 10
が接触される。このとき、電極 Pとプローブピン 10は、極めて低い接触圧で接触される 。次に、フリツティング回路 41を用いて、各電極 Pの 2本のプローブピン 10間に電圧 が印加される。この電圧を徐々に上げて、プローブピン 10間の電位傾度を大きくする ことにより、フリツティング現象を生じさせ、電極 Pの表面の酸ィ匕膜を絶縁破壊する (フ リツティング処理)。こうして、プローブピン 10と電極 Pとの間の電気抵抗が小さくなり、 プローブピン 10と電極 Pとが電気的に導通される。 First, the wafer W is placed on the mounting table 3. Next, the moving mechanism 4 moves the wafer W three-dimensionally, and as shown in Figure 5, two probe pins 10 are attached to each electrode P of the wafer W. is contacted. At this time, the electrode P and the probe pin 10 are brought into contact with an extremely low contact pressure. Next, a voltage is applied between the two probe pins 10 of each electrode P using the fritting circuit 41. By gradually increasing this voltage and increasing the potential gradient between the probe pins 10, a fritting phenomenon is caused and the oxide film on the surface of the electrode P is dielectrically broken down (fritting process). In this way, the electrical resistance between the probe pin 10 and the electrode P is reduced, and the probe pin 10 and the electrode P are electrically connected.
[0030] 総ての電極 Pとプローブピン 10とが電気的に導通した後、スイッチング回路 42によ り、フリツティング回路 41からテスト回路 40に切り替えられる。続いて、テスト回路 40を 用いて、各プローブピン 10から電極 Pに電気信号が送られ、ウェハ Wの電子素子の 電気的特性が検査される。 [0030] After all electrodes P and probe pins 10 are electrically connected, the switching circuit 42 switches from the fritting circuit 41 to the test circuit 40. Next, using the test circuit 40, electrical signals are sent from each probe pin 10 to the electrode P, and the electrical characteristics of the electronic elements on the wafer W are tested.
[0031] 電気的特性の検査が終了すると、移動機構 4により、ウェハ Wが下降され、プロ一 ブピン 10が電極 P力も離される。上述したフリツティング処理を行っている場合、プロ ーブピン 10と電極 Pとの接着力が大きくなつている。これは、フリツティング処理時に プローブピン 10と電極 Pとの間の狭小な接触領域に一時的に高電流が流れ、プロ一 ブピン 10と電極 Pが溶着するためであると考えられる。そして、プローブピン 10が電 極 Pから引き離される際には、プローブピン 10と電極 Pに引張応力が作用する。プロ ーブピン 10の強度が電極 Pよりも弱く形成されているので、図 6 (a)に示すようにプロ ーブピン 10と電極 Pが接触した状態から、図 6 (b)に示すようにプローブピン 10と電 極 Pを引き離すと、プローブピン 10の接触部 31の表面の一部が破断し剥離し、電極 Pに付着する。 [0031] When the electrical characteristic test is completed, the moving mechanism 4 lowers the wafer W, and the probe pin 10 is released from the electrode P. When the above-mentioned fritting process is performed, the adhesive force between the probe pin 10 and the electrode P becomes large. This is considered to be because a high current temporarily flows through the narrow contact area between the probe pin 10 and the electrode P during the fritting process, and the probe pin 10 and the electrode P are welded together. Then, when the probe pin 10 is pulled away from the electrode P, tensile stress acts on the probe pin 10 and the electrode P. Since the strength of the probe pin 10 is weaker than that of the electrode P, the strength of the probe pin 10 is changed from the state where the probe pin 10 and the electrode P are in contact as shown in Fig. 6 (a) to the state shown in Fig. 6 (b). When the electrode P is pulled away from the probe pin 10, a part of the surface of the contact portion 31 of the probe pin 10 breaks off, peels off, and adheres to the electrode P.
[0032] その後、ウエノ、 Wは、プローブ装置 1から搬出される。そして、以上の検査プロセス が所定回数繰り返された後、必要に応じて、移動機構 4により、容器 62がプローブピ ン 10の下方まで水平移動され、その後上昇されて、図 4に示したようにプローブピン 10の接触部 31が容器 62内の溶融錫 Aに浸漬される。こうして、プローブピン 10の接 触部 31の欠損部分に錫が補充され、プローブピン 10の表面形状が回復される。 [0032] After that, Ueno and W are carried out from the probe device 1. After the above inspection process is repeated a predetermined number of times, the container 62 is moved horizontally to below the probe pin 10 by the moving mechanism 4 as required, and then raised to move the container 62 to the probe as shown in FIG. Contact portion 31 of pin 10 is immersed in molten tin A in container 62. In this way, the missing portion of the contact portion 31 of the probe pin 10 is replenished with tin, and the surface shape of the probe pin 10 is restored.
[0033] 以上の実施の形態によれば、プローブピン 10がウェハ Wの電極 Pよりも強度が弱い 錫で形成されているので、プローブピン 10と電極 Pとを引き離す際に、プローブピン 1 0側が破断し剥離する。これにより、プローブピン 10側に電極 Pの一部が付着して堆
積することがなぐプローブピン 10の新しい面が露出するので、プローブピン 10を多 数回使用してもプローブピン 10と電極 Pとの接触を維持できる。したがって、プローブ ピン 10の寿命を延ばすことができる。また、プローブピン 10に付着物が堆積しないの で、プローブピン 10の電極 Pに対する接触を安定させることができる。 [0033]According to the above embodiment, since the probe pin 10 is made of tin, which is weaker in strength than the electrode P of the wafer W, when the probe pin 10 and the electrode P are separated, the probe pin 10 The sides break and peel off. As a result, part of the electrode P adheres to the probe pin 10 side and accumulates. Since a new surface of the probe pin 10 that does not accumulate is exposed, contact between the probe pin 10 and the electrode P can be maintained even if the probe pin 10 is used many times. Therefore, the life of the probe pin 10 can be extended. Furthermore, since no deposits are deposited on the probe pin 10, the contact between the probe pin 10 and the electrode P can be stabilized.
[0034] 以上の実施の形態では、フリツティング現象を利用してプローブピン 10と電極 Pの 電気的な導通を図っているため、プローブピン 10と電極 Pとの間で溶着が起きている と考えられる。このため、引き離す際には、比較的大きな力が必要になる。したがって[0034] In the embodiments described above, since electrical continuity between the probe pin 10 and the electrode P is achieved by utilizing the fritting phenomenon, welding may occur between the probe pin 10 and the electrode P. Conceivable. Therefore, a relatively large force is required to pull them apart. therefore
、フリツティング処理に用いられるプローブピン 10を、電極 Pよりも強度の弱い材質で 形成し、プローブピン 10側の破断を促すことは、プローブピン 10に電極 Pの一部が 付着することを防止する上で非常に有効である。 , the probe pin 10 used in the fritting process is made of a material weaker than the electrode P, and promoting breakage on the probe pin 10 side prevents part of the electrode P from adhering to the probe pin 10. It is very effective in doing so.
[0035] 以上の実施の形態では、プローブ装置 1に、溶融錫 Aが貯留された容器 62を設け たので、プローブピン 10を容器 62内の溶融錫 Aに浸漬し、プローブピン 10の欠損部 分を補充することができる。これにより、プローブピン 10の形状が維持されるので、プ ローブピン 10の寿命をさらに延ばすことができる。 [0035] In the above embodiment, since the probe device 1 is provided with the container 62 in which molten tin A is stored, the probe pin 10 is immersed in the molten tin A in the container 62, and the defective portion of the probe pin 10 is You can replenish the amount. As a result, the shape of the probe pin 10 is maintained, so that the life of the probe pin 10 can be further extended.
[0036] 容器 62は、熱板 61上に載置されているので、容器 62内の溶融錫 Aを溶融状態に 維持することができる。 [0036] Since the container 62 is placed on the hot plate 61, the molten tin A in the container 62 can be maintained in a molten state.
[0037] 以上の実施の形態では、プローブピン 10の全体が錫によって形成されていたが、 プローブピン 10の接触部 31の表面のみ力 電極 Pより強度が弱い錫によって形成さ れ、その接触部 31の表面の内側部分は、電極 Pよりも強度の強い材質、例えば-ッ ケルゃタングステンなどにより形成されていてもよい。例えば、図 7に示すようにプロ ーブピン 10の本体 10aは、ニッケル(Ni)により形成され、プローブピン 10の接触部 3 1の表面 10bに、錫が被膜される。表面 10bの錫は、例えば 10一4〜 0. 01mm程度の 厚みに被覆される。この例によれば、プローブピン 10の本体 10aが強度の強い材質 により形成されているので、プローブピン 10全体の強度が確保され、例えば電極 Pと の接触により変形することがない。また、接触部 31の表面のみに錫が被覆されている ので、引き離し時の欠損が接触部 31の表面のみで行われるので、電極 P側にも大き な錫の塊が付着することがない。なお、プローブピン 10の本体 10a全体(梁部 30と接 触部 31)が上述の強度が強!、材質により形成されて 、てもよ 、し、接触部 31のみが
強度が強 、材質により形成されて 、てもよ 、。 [0037] In the embodiments described above, the entire probe pin 10 is made of tin, but only the surface of the contact portion 31 of the probe pin 10 is made of tin, which is weaker in strength than the electrode P; The inner surface of the electrode 31 may be made of a material stronger than the electrode P, such as tungsten or the like. For example, as shown in FIG. 7, the main body 10a of the probe pin 10 is made of nickel (Ni), and the surface 10b of the contact portion 31 of the probe pin 10 is coated with tin. The surface 10b is coated with tin to a thickness of, for example, about 10 mm to 0.01 mm. According to this example, since the main body 10a of the probe pin 10 is made of a strong material, the strength of the probe pin 10 as a whole is ensured, and it will not be deformed due to contact with the electrode P, for example. Furthermore, since only the surface of the contact portion 31 is coated with tin, the breakage during separation occurs only on the surface of the contact portion 31, so that no large chunks of tin will adhere to the electrode P side. Note that the entire body 10a of the probe pin 10 (beam portion 30 and contact portion 31) is made of the above-mentioned material with high strength, but only the contact portion 31 is It is made of strong and strong material.
[0038] 以上、添付図面を参照しながら本発明の好適な実施の形態について説明したが、 本発明はカゝかる例に限定されない。当業者であれば、特許請求の範囲に記載された 思想の範疇内において、各種の変更例または修正例に相到し得ることは明らかであ り、それらについても当然に本発明の技術的範囲に属するものと了解される。例えば 、以上の実施の形態では、電極 Pよりも強度の弱い材質として、錫を用いたが、錫を 含有する合金や、はんだなどの他の材料を用いてもよい。以上の実施の形態では、 フリツティング処理が行われる際に用いられるプローブピンに本発明を適用していた 力 本発明は、フリツティング処理が行われない検査に用いられるプローブピンにも 適用できる。本発明は、被検査体がウェハ W以外の FPD (フラットパネルディスプレイ )、フォトマスク用のマスクレチクルなどの他の基板である場合にも適用できる。 [0038] The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to these examples. It is clear that those skilled in the art can come up with various changes and modifications within the scope of the idea stated in the claims, and these naturally fall within the technical scope of the present invention. It is understood that it belongs to For example, in the above embodiment, tin is used as a material having a lower strength than the electrode P, but other materials such as an alloy containing tin or solder may also be used. In the embodiments described above, the present invention is applied to the probe pins used when the flitting process is performed. The present invention can also be applied when the object to be inspected is a substrate other than the wafer W, such as an FPD (flat panel display) or a mask reticle for a photomask.
実施例 Example
[0039] プローブピン 10の材質に電極 Pよりも強度が弱い錫を用いた場合と、プローブピン の材質にタングステンを用いた場合とのプローブピンの寿命についての実験を行つ た。なお、このときの電極 Pの材質は、アルミニウムである。図 8は、横軸が測定回数を 示し、縦軸が接触抵抗を示す。接触抵抗が大きいと、プローブピンが使用できなくな り、プローブピンの寿命になる。図 8に示すように、錫(Sn)を用いたプローブピン 10 は、測定回数 300回になっても、接触抵抗が 1 Ω程度に安定している。タングステン( W)を用いたプローブピンについては、測定回数 50回程度で、接触抵抗の値が大き くばらつく測定点が出現し、また接触抵抗の数値も大きい。この実験結果から、プロ ーブピン 10の材質を錫にすることにより、プローブピンの寿命が長くなることが確認で きる。また、プローブピンに錫を用いた方力 接触抵抗が低い値で安定しているので 、プローブピンと電極との接触が安定することも確認できる。 [0039] An experiment was conducted on the life of the probe pin when tin, which is weaker in strength than the electrode P, was used as the material of the probe pin 10, and when tungsten was used as the material of the probe pin. Note that the material of the electrode P at this time is aluminum. In Figure 8, the horizontal axis shows the number of measurements, and the vertical axis shows the contact resistance. If the contact resistance is large, the probe pin will become unusable and the life of the probe pin will be shortened. As shown in Figure 8, the contact resistance of the probe pin 10 made of tin (Sn) remains stable at around 1 Ω even after 300 measurements. For probe pins using tungsten (W), after about 50 measurements, there are measurement points where the contact resistance values vary widely, and the contact resistance values are also large. From this experimental result, it can be confirmed that by using tin as the material of the probe pin 10, the life of the probe pin becomes longer. Furthermore, since the contact resistance is stable at a low value when tin is used for the probe pin, it can be confirmed that the contact between the probe pin and the electrode is stable.
産業上の利用可能性 Industrial applicability
[0040] 本発明は、プローブピンの寿命を延ばす際に有用である。
[0040] The present invention is useful in extending the life of probe pins.
Claims
[1] 被検査体に接触して被検査体の電気的特性を検査するためのプローブピンであつ て、 [1] A probe pin for testing the electrical characteristics of a test object by contacting the test object,
被検査体と接触する接触部の少なくとも表面が、被検査体側の接触部分よりも強度 が弱 、材質で形成されて ヽる。 At least the surface of the contact portion that comes into contact with the object to be inspected is made of a material that is weaker in strength than the contact portion on the side of the object to be inspected.
[2] 請求項 1に記載のプローブピンにぉ 、て、 [2] The probe pin according to claim 1,
前記接触部の表面が、前記強度が弱い材質で形成され、前記接触部の表面の内 側部分は、前記被検査体側の接触部分よりも強度が強 ヽ材質で形成されて!ヽる。 The surface of the contact portion is formed of the material with low strength, and the inner portion of the surface of the contact portion is formed of a material with stronger strength than the contact portion on the side of the object to be inspected.
[3] 請求項 1に記載のプローブピンにぉ 、て、 [3] The probe pin according to claim 1,
前記接触部の前記強度の弱!、材質は、錫又は錫を含む合金である。 The material of the contact portion having low strength is tin or an alloy containing tin.
[4] 請求項 1に記載のプローブピンにぉ 、て、 [4] The probe pin according to claim 1,
フリツティング現象を利用して被検査体側の接触部分と電気的に導通する際に用 いられる。 It is used to create electrical continuity with the contact part on the test object side by utilizing the fritting phenomenon.
[5] 被検査体の電気的特性を検査するためプローブカードであって、 [5] A probe card for testing the electrical characteristics of a test object,
被検査体に接触して被検査体の電気的特性を検査するプローブピンを有し、 前記プローブピンは、被検査体と接触する接触部の少なくとも表面が、被検査体側 の接触部分よりも強度が弱 ヽ材質で形成されて ヽる。 The probe pin has a probe pin that tests the electrical characteristics of the test object by contacting the test object, and the probe pin has at least a surface of a contact portion that comes into contact with the test object with a stronger strength than a contact portion on the test object side. It is made of weak material.
[6] 被検査体に接触して被検査体の電気的特性を検査するためのプローブピンを備え たプローブ装置であって、 [6] A probe device equipped with a probe pin for testing the electrical characteristics of a test object by contacting the test object,
プローブピンと接触する被検査体側の接触部分よりも強度が弱い材料の溶融物を 貯留する容器と、 a container for storing a molten material having a lower strength than the contact part on the test object side that contacts the probe pin;
前記被検査体と接触するプローブピンの接触部を前記容器内の溶融物に浸漬で きるように、前記容器を移動させる移動機構と、を有し、 a moving mechanism for moving the container so that a contact portion of a probe pin that contacts the object to be inspected can be immersed in the molten material in the container;
前記プローブピンの接触部の少なくとも表面は、前記被検査体側の接触部分よりも 強度が弱!ヽ材質で形成されて!ヽる。 At least the surface of the contact portion of the probe pin is made of a material that is weaker in strength than the contact portion on the side of the object to be inspected.
[7] 請求項 6に記載のプローブ装置において、 [7] In the probe device according to claim 6,
前記容器を加熱する加熱部材を有する。 It has a heating member that heats the container.
[8] 請求項 6に記載のプローブ装置において、
フリツティング現象を利用して被検査体とプローブピンを電気的に導通させるフリツ ティング機能を有する。
[8] In the probe device according to claim 6, It has a fritting function that uses the fritting phenomenon to create electrical continuity between the test object and the probe pin.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005352566A JP5048942B2 (en) | 2005-12-06 | 2005-12-06 | Probe pin, probe card and probe device |
JP2005-352566 | 2005-12-06 |
Publications (1)
Publication Number | Publication Date |
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WO2007066643A1 true WO2007066643A1 (en) | 2007-06-14 |
Family
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Application Number | Title | Priority Date | Filing Date |
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PCT/JP2006/324232 WO2007066643A1 (en) | 2005-12-06 | 2006-12-05 | Probe pin, probe card, and probe device |
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JP (1) | JP5048942B2 (en) |
TW (1) | TW200736617A (en) |
WO (1) | WO2007066643A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2018162343A3 (en) * | 2017-03-07 | 2018-10-25 | Capres A/S | A probe for testing an electrical property of a test sample |
Families Citing this family (2)
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JP5691193B2 (en) * | 2010-02-26 | 2015-04-01 | 富士通セミコンダクター株式会社 | Contactor, semiconductor device testing apparatus, and semiconductor device manufacturing method |
CN108279368A (en) * | 2018-01-23 | 2018-07-13 | 德淮半导体有限公司 | Tester table and test method |
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JPH01291167A (en) * | 1988-05-18 | 1989-11-22 | Canon Inc | Probe card and measuring method for parts to be measured using the same card |
JP2000260516A (en) * | 1999-03-10 | 2000-09-22 | Canon Inc | Contact mechanism |
JP2002139542A (en) * | 2000-08-21 | 2002-05-17 | Tokyo Electron Ltd | Inspection method and inspection device |
JP2005069711A (en) * | 2003-08-27 | 2005-03-17 | Japan Electronic Materials Corp | Probe card and contact used for the same |
-
2005
- 2005-12-06 JP JP2005352566A patent/JP5048942B2/en not_active Expired - Fee Related
-
2006
- 2006-12-05 WO PCT/JP2006/324232 patent/WO2007066643A1/en active Application Filing
- 2006-12-06 TW TW095145415A patent/TW200736617A/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH01291167A (en) * | 1988-05-18 | 1989-11-22 | Canon Inc | Probe card and measuring method for parts to be measured using the same card |
JP2000260516A (en) * | 1999-03-10 | 2000-09-22 | Canon Inc | Contact mechanism |
JP2002139542A (en) * | 2000-08-21 | 2002-05-17 | Tokyo Electron Ltd | Inspection method and inspection device |
JP2005069711A (en) * | 2003-08-27 | 2005-03-17 | Japan Electronic Materials Corp | Probe card and contact used for the same |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018162343A3 (en) * | 2017-03-07 | 2018-10-25 | Capres A/S | A probe for testing an electrical property of a test sample |
US11215638B2 (en) | 2017-03-07 | 2022-01-04 | Capres A/S | Probe for testing an electrical property of a test sample |
Also Published As
Publication number | Publication date |
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TW200736617A (en) | 2007-10-01 |
TWI314213B (en) | 2009-09-01 |
JP5048942B2 (en) | 2012-10-17 |
JP2007155553A (en) | 2007-06-21 |
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