US3667661A - Apparatus for use in the manufacture of semi-conductor devices - Google Patents
Apparatus for use in the manufacture of semi-conductor devices Download PDFInfo
- Publication number
- US3667661A US3667661A US26734A US3667661DA US3667661A US 3667661 A US3667661 A US 3667661A US 26734 A US26734 A US 26734A US 3667661D A US3667661D A US 3667661DA US 3667661 A US3667661 A US 3667661A
- Authority
- US
- United States
- Prior art keywords
- slice
- diaphragms
- diaphragm
- semi
- scribed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0041—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing the workpiece being brought into contact with a suitably shaped rigid body which remains stationary during breaking
- B28D5/0047—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing the workpiece being brought into contact with a suitably shaped rigid body which remains stationary during breaking using fluid or gas pressure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
- Y10T225/12—With preliminary weakening
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/30—Breaking or tearing apparatus
- Y10T225/307—Combined with preliminary weakener or with nonbreaking cutter
- Y10T225/321—Preliminary weakener
- Y10T225/325—With means to apply moment of force to weakened work
Definitions
- the apparatus for cracking previously scribed semi-conductor slices includes a base 11 including a chamber 12 closed at one end by a rubber diaphragm 13.
- the apparatus further includes a movable platen 14 which is movable towards and away from the base 11, and which is provided, in its face presented to the diaphragm 13, with a recess 15.
- the recess 15 is closed by a second rubber diaphragm 16 which is movable with the movable platen 14.
- Means (not shown) is provided for pumping air into the chamber 11, and since the chamber 11 is closed by the diaphragm 13, then when the air pressure within the chamber 12 increases the diaphragm 13 will be distended towards the movable platen 14 and will assume a domed configuration.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Dicing (AREA)
Abstract
When a semi-conductor slice is subjected to a manufacturing process to convert it to a plurality of semi-conductor components, it is then necessary to separate the semi-conductor components. The invention provides apparatus for doing this in which a pair of resilient diaphragms are used to sandwich the wafer, the diaphragms then being distended to crack the slice along previously scribed lines.
Description
I United States Patent [151 3,667,66 1 Farmer June 6, 1972 [54] APPARATUS FOR USE IN THE I [56] References Cited MANUFACTURE OF SEIVH- UNITED STATES PATENTS CONDUCTOR DEVICES 3,507,426 4/1970 Bielen et al. ..225/96.5 X [72) Inventor: Francis Louis Farmer, 106 Holifast Rd, $182,873 5/1965 Kalvelage at X S tt c ldfi ld w i k hi England 3,493,155 2/1970 Litant et al ..225/96.5 X
[22] Filed: 1970 Primary Examiner-Frank T. Yost 21 1 Appl 2 734 Att0rneyH0lman, Glascock, Downing & Seebold 57 ABSTRACT [30] Foreign Application Priority Data When a semi-conductor slice is subjected to a manufacturing May 1969 Great Bmam "22l8O/69 process to convert it to a plurality of semi-conductor c0m ponents, it is then necessary to separate the semi-conductor [52] US. Cl ..225/2, 225/965 components The invention provides apparatus for doing this of w the wafer, the diaphragms then being distended to crack the slice along previously scribed lines.
5 Claims, 1 Drawing Figure PATENTEDJUH 61972 3.667, 661
g Al
INVENTOR f l i MA 7244 ,ggwima ATRQNEYS APPARATUS FOR USE IN THE MANUFACTURE OF SEMI-CONDUCTOR DEVICES This invention relates to apparatus for, and a method of cracking a semi-conductor slice, which has previously been scribed, to divide the slice into a plurality of semi-conductor components.
Apparatus according to the invention includes a first resilient diaphragm upon which, in use, a scribed semi-conductor slice is supported, a second resilient diaphragm engageable with the surface of the slice remote from said first diaphragm to maintain the slice in engagement with the first diaphragm and means for distending the diaphragms into a domed configuration so as to crack the slice along the scribed lines.
The invention further resides in a method of cracking a previously scribed semi-conductor slice including the steps of trapping the slice between a pair of resilient diaphragms and distending the diaphragms to a domed configuration to crack the slice along the scribed lines.
The accompanying drawing is a fragmentary diagrammatic sectional view of apparatus according to one example of the invention.
The apparatus for cracking previously scribed semi-conductor slices includes a base 11 including a chamber 12 closed at one end by a rubber diaphragm 13. The apparatus further includes a movable platen 14 which is movable towards and away from the base 11, and which is provided, in its face presented to the diaphragm 13, with a recess 15. The recess 15 is closed by a second rubber diaphragm 16 which is movable with the movable platen 14. Means (not shown) is provided for pumping air into the chamber 11, and since the chamber 11 is closed by the diaphragm 13, then when the air pressure within the chamber 12 increases the diaphragm 13 will be distended towards the movable platen 14 and will assume a domed configuration.
A slice 17 of silicon which has been treated to produce therein a P-N junction is scribed on its upper surface to divide the slice into a plurality of rectangular P-N wafers each of which will constitute a diode. In order to crack the slice 17 along the scribed lines to separate the P-N wafers from one another, the slice 17 is placed on the diaphragm 13 with its scribed surface uppermost. The movable platen 14 is then moved into engagement with the base 11 so that the diaphragm 16 traps the slice 17 in position on the diaphragm 13. Air is then admitted into the chamber 12 under pressure, thereby causing the diaphragm 13 to be distended towards the movable platen 14. Since the diaphragm 16 traps the slice 17 in facial contact with the diaphragm 13, then as the diaphragm 13 assumes its domed configuration, the slice l7 and the diaphragm 16 will also assume a domed configuration, and in so doing the slice 17 becomes cracked along the scribed lines. In order for a clean fracture to be produced along the scribed lines, it is desirable that the slice 17 is subject to tensile bending stresses only, and not to shear stresses. For this reason the diaphragm 13 is made thicker than the diaphragm 16 so that the neutral plane of the laminated unit constituted by the diaphragm 13, the slice 17 and the diaphragm 16, during distension thereof, occurs in the diaphragm 13.
If the diaphragm 13 were permitted to distend normally under the action of air pressure in the chamber 12, then the amount of movement of the slice 17 at its edges would be less than that at the center of the slice and unless the slice was of considerably smaller diameter than the diameter of the diaphragm 13 then the cracking of the slice at the periphery thereof might produce wafers with damaged edges. In order to ensure satisfactory cracking at the periphery of the slice 17, the base of the recess 15 in the movable platen is so shaped that its radius of curvature is greater towards the periphery of the recess than at the center of the recess. Thus, when the diaphragm 13 is distended, the periphery of the distended portion of the diaphragm 16 engages the base of the recess 15, so that the peripheral portion of the diaphragm l6 and therefore the slice 17 and the diaphragm l3, follow the shape of the peri heral ortion of the base of the recess 15.
en t e slice has been cracked, the pressure in the chamber 12 is reduced to atmospheric pressure so that the diaphragms l3, 16 return to their original positions. The movable platen 14 is then moved away from the base 11 to expose the cracked wafers which are removed from the diaphragm 13 in any convenient manner.
It will be appreciated that the apparatus and procedure described above can be used to crack any form of scribed semi-conductor slice. Moreover, the cracked wafers could be of shapes other than rectangular, for example triangular or rhombic. Furthermore, although compressed air is used to power the apparatus as described above, both other gases and liquids could be used.
Having thus described my invention what 1 claims as new and desire to secure by Letters Patent is:
1. Apparatus for cracking a previously scribed semi-conductor slice, including a first resilient diaphragm upon which, in use, a scribed semiconductor slice is supported, a second resilient diaphragm engageable with the surface of the slice remote from said first diaphragm to maintain the slice in engagement with the first diaphragm and means for distending the diaphragms into a domed configuration so as to crack the slice along the scribed lines, the relative thicknesses of the first and second diaphragms being such that the neutral plane of the laminated unit constituted by the first and second diaphragms and the semi-conductor slice occurs in one of the first and second diaphragms.
2. Apparatus as claimed in claim 1 including a body having therein a recess closed by the second diaphragm, the diaphragms being distended into said recess by application of a force to the first diaphragm.
3. Apparatus as claimed in claim 2 in which the recess is of generally domed configuration with its radius of curvature greater towards the periphery of the recess than at the center of the recess.
4. Apparatus as claimed in claim 1 in which the first diaphragm is thicker than the second diaphragm so that during cracking the neutral plane of the laminated unit constituted by the diaphragms and slice occurs in the first diaphragm.
5. A method of cracking a previously scribed semi-conductor slice including the steps of trapping the slice between a pair of resilient diaphragms and distending the diaphragms to a domed configuration to crack the slice along the scribed lines the relative thicknesses of the two diaphragms being such that the neutral plane of the laminated unit constituted by the two diaphragms and the slice occurs, during distention of the laminated units, in one of the diaphragms, and the scribed semi-conductor slice being positioned between the diaphragms in such a manner that its scribed surface is outermost during the distention of the diaphragms.
Claims (5)
1. Apparatus for cracking a previously scribed semi-conductor slice, including a first resilient diaphragm upon which, in use, a scribed semi-conductor slice is supported, a second resilient diaphragm engageable with the surface of the slice remote from said first diaphragm to maintain the slice in engagement with the first diaphragm and means for distending the diaphragms into a domed configuration so as to crack the slice along the scribed lines, the relative thicknesses of the first and second diaphragms being such that the neutral plane of the laminated unit constituted by the first and second diaphragms and the semiconductor slice occurs in one of the first and second diaphragms.
2. Apparatus as claimed in claim 1 including a body having therein a recess closed by the second diaphragm, the diaphragms being distended into said recess by application of a force to the first diaphragm.
3. Apparatus as claimed in claim 2 in which the recess is of generally domed configuration with its radius of curvature greater towards the periphery of the recess than at the center of the recess.
4. Apparatus as claimed in claim 1 in which the first diaphragm is thicker than the second diaphragm so that during cracking the neutral plane of the laminated unit constituted by the diaphragms and slice occurs in the first diaphragm.
5. A method of cracking a previously scribed semi-conductor slice including the steps of trapping the slice between a pair of resilient diaphragms and distending the diaphragms to a domed configuration to crack the slice along the scribed lines the relative thicknesses of the two diaphragms being such that the neutral plane of the laminated unit constituted by the two diaphragms and the slice occurs, during distention of the laminated units, in one of the diaphragms, and the scribed semi-conductor slice being positioned between the diaphragms in such a manner that its scribed surface is outermost during the distention of the diaphragms.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2218069 | 1969-05-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3667661A true US3667661A (en) | 1972-06-06 |
Family
ID=10175251
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US26734A Expired - Lifetime US3667661A (en) | 1969-05-01 | 1970-04-08 | Apparatus for use in the manufacture of semi-conductor devices |
Country Status (3)
Country | Link |
---|---|
US (1) | US3667661A (en) |
JP (1) | JPS4844051B1 (en) |
GB (1) | GB1297954A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0363548A1 (en) * | 1988-10-10 | 1990-04-18 | International Business Machines Corporation | Method of breaking a plate-like workpiece such as a semi-conductor wafer, and device for breaking said workpiece sandwiched between two foils |
US5759918A (en) * | 1995-05-18 | 1998-06-02 | Obsidian, Inc. | Method for chemical mechanical polishing |
EP0989593A2 (en) * | 1998-09-25 | 2000-03-29 | Canon Kabushiki Kaisha | Substrate separating apparatus and method, and substrate manufacturing method |
US20020174958A1 (en) * | 2001-05-25 | 2002-11-28 | Kazutaka Yanagita | Separating apparatus and processing method for plate memeber |
US6488565B1 (en) | 2000-08-29 | 2002-12-03 | Applied Materials, Inc. | Apparatus for chemical mechanical planarization having nested load cups |
US6527031B1 (en) | 1998-11-06 | 2003-03-04 | Canon Kabushiki Kaisha | Sample separating apparatus and method, and substrate manufacturing method |
US6629539B1 (en) | 1998-11-06 | 2003-10-07 | Canon Kabushiki Kaisha | Sample processing system |
US6672358B2 (en) | 1998-11-06 | 2004-01-06 | Canon Kabushiki Kaisha | Sample processing system |
US6833312B2 (en) | 2001-05-25 | 2004-12-21 | Canon Kabushiki Kaisha | Plate member separating apparatus and method |
US20060143908A1 (en) * | 2004-12-22 | 2006-07-06 | Pierre-Luc Duchesne | An automated dicing tool for semiconductor substrate materials |
US20180128278A1 (en) * | 2016-09-26 | 2018-05-10 | Fluid Handling Llc. | Multi-stage impeller produced via additive manufacturing |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3006314A1 (en) * | 1980-02-20 | 1981-09-03 | Robert Bosch Gmbh, 7000 Stuttgart | Splitting device for semiconductor substrate plates - used for hybrid circuit mfr. using suction field with edges along substrate dividing lines |
DE10007642C2 (en) * | 2000-02-19 | 2002-03-14 | Bosch Gmbh Robert | Process for separating substrates in utility format with predetermined breaking points |
DE10345964B4 (en) * | 2003-10-02 | 2016-02-11 | Hans-Joachim Weitzel Gmbh & Co. Kg | Granules, process for its preparation and use |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3182873A (en) * | 1961-09-11 | 1965-05-11 | Motorola Inc | Method for dicing semiconductor material |
US3493155A (en) * | 1969-05-05 | 1970-02-03 | Nasa | Apparatus and method for separating a semiconductor wafer |
US3507426A (en) * | 1968-02-23 | 1970-04-21 | Rca Corp | Method of dicing semiconductor wafers |
-
1969
- 1969-05-01 GB GB2218069A patent/GB1297954A/en not_active Expired
-
1970
- 1970-04-08 US US26734A patent/US3667661A/en not_active Expired - Lifetime
- 1970-05-01 JP JP3693170A patent/JPS4844051B1/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3182873A (en) * | 1961-09-11 | 1965-05-11 | Motorola Inc | Method for dicing semiconductor material |
US3507426A (en) * | 1968-02-23 | 1970-04-21 | Rca Corp | Method of dicing semiconductor wafers |
US3493155A (en) * | 1969-05-05 | 1970-02-03 | Nasa | Apparatus and method for separating a semiconductor wafer |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0363548A1 (en) * | 1988-10-10 | 1990-04-18 | International Business Machines Corporation | Method of breaking a plate-like workpiece such as a semi-conductor wafer, and device for breaking said workpiece sandwiched between two foils |
US4995539A (en) * | 1988-10-10 | 1991-02-26 | Heinz Richard | Method and apparatus for cleaving wafers |
US5759918A (en) * | 1995-05-18 | 1998-06-02 | Obsidian, Inc. | Method for chemical mechanical polishing |
US5851136A (en) * | 1995-05-18 | 1998-12-22 | Obsidian, Inc. | Apparatus for chemical mechanical polishing |
US5908530A (en) * | 1995-05-18 | 1999-06-01 | Obsidian, Inc. | Apparatus for chemical mechanical polishing |
US5938884A (en) * | 1995-05-18 | 1999-08-17 | Obsidian, Inc. | Apparatus for chemical mechanical polishing |
EP0989593A2 (en) * | 1998-09-25 | 2000-03-29 | Canon Kabushiki Kaisha | Substrate separating apparatus and method, and substrate manufacturing method |
EP0989593A3 (en) * | 1998-09-25 | 2002-01-02 | Canon Kabushiki Kaisha | Substrate separating apparatus and method, and substrate manufacturing method |
US6672358B2 (en) | 1998-11-06 | 2004-01-06 | Canon Kabushiki Kaisha | Sample processing system |
US20050045274A1 (en) * | 1998-11-06 | 2005-03-03 | Kazutaka Yanagita | Sample separating apparatus and method, and substrate manufacturing method |
US6527031B1 (en) | 1998-11-06 | 2003-03-04 | Canon Kabushiki Kaisha | Sample separating apparatus and method, and substrate manufacturing method |
US6629539B1 (en) | 1998-11-06 | 2003-10-07 | Canon Kabushiki Kaisha | Sample processing system |
US7579257B2 (en) | 1998-11-06 | 2009-08-25 | Canon Kabuhsiki Kaisha | Sample separating apparatus and method, and substrate manufacturing method |
US20040045679A1 (en) * | 1998-11-06 | 2004-03-11 | Canon Kabushiki Kaisha | Sample processing system |
US6971432B2 (en) | 1998-11-06 | 2005-12-06 | Canon Kabushiki Kaisha | Sample processing system |
US6488565B1 (en) | 2000-08-29 | 2002-12-03 | Applied Materials, Inc. | Apparatus for chemical mechanical planarization having nested load cups |
US6833312B2 (en) | 2001-05-25 | 2004-12-21 | Canon Kabushiki Kaisha | Plate member separating apparatus and method |
US6867110B2 (en) | 2001-05-25 | 2005-03-15 | Canon Kabushiki Kaisha | Separating apparatus and processing method for plate member |
US6946052B2 (en) | 2001-05-25 | 2005-09-20 | Canon Kabushiki Kaisha | Separating apparatus and processing method for plate member |
US20040221963A1 (en) * | 2001-05-25 | 2004-11-11 | Canon Kabushiki Kaisha | Separating apparatus and processing method for plate member |
US20020174958A1 (en) * | 2001-05-25 | 2002-11-28 | Kazutaka Yanagita | Separating apparatus and processing method for plate memeber |
US20060143908A1 (en) * | 2004-12-22 | 2006-07-06 | Pierre-Luc Duchesne | An automated dicing tool for semiconductor substrate materials |
US7559446B2 (en) * | 2004-12-22 | 2009-07-14 | International Business Machines Corporation | Automated dicing tool for semiconductor substrate materials |
US20180128278A1 (en) * | 2016-09-26 | 2018-05-10 | Fluid Handling Llc. | Multi-stage impeller produced via additive manufacturing |
Also Published As
Publication number | Publication date |
---|---|
GB1297954A (en) | 1972-11-29 |
JPS4844051B1 (en) | 1973-12-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3667661A (en) | Apparatus for use in the manufacture of semi-conductor devices | |
US3493155A (en) | Apparatus and method for separating a semiconductor wafer | |
US3152939A (en) | Process for preparing semiconductor members | |
US3562057A (en) | Method for separating substrates | |
US3054709A (en) | Production of wafers of semiconductor material | |
US3507426A (en) | Method of dicing semiconductor wafers | |
ES8707023A1 (en) | Method of manufacturing semiconductor devices comprising the mechanical connection of two bodies. | |
GB2093272A (en) | High temperature with standing layered silicon structures especially for pressure transducers | |
US3623219A (en) | Method for isolating semiconductor devices from a wafer of semiconducting material | |
KR920004514B1 (en) | Manufacturing apparatus of semiconductor elements | |
US3182873A (en) | Method for dicing semiconductor material | |
US3615047A (en) | Apparatus and method for separating scribed plates of brittle material | |
EP0094302A3 (en) | A method of removing impurities from semiconductor wafers | |
US3606035A (en) | Subdivided semiconductor wafer separator | |
US5043044A (en) | Monocrystalline silicon wafer | |
US3762973A (en) | Method of etch subdividing semiconductor wafers | |
JPS61121453A (en) | Braking and expanding process of fragile thin sheet | |
JPS5680174A (en) | Semiconductor pressure transducer | |
US3445302A (en) | Method for fabricating double-diffused semiconductive devices | |
JP2567395B2 (en) | Semiconductor device manufacturing equipment | |
GB1246022A (en) | Method of manufacturing semiconductor devices | |
US3686542A (en) | Semiconductor transducer device | |
JP2567396B2 (en) | Semiconductor device manufacturing equipment | |
US3478418A (en) | Fabrication of thin silicon device chips | |
JPS5619681A (en) | Manufacture of infrared-ray detecting element |