US20190326147A1 - Multi-cassette carrying case - Google Patents
Multi-cassette carrying case Download PDFInfo
- Publication number
- US20190326147A1 US20190326147A1 US16/432,568 US201916432568A US2019326147A1 US 20190326147 A1 US20190326147 A1 US 20190326147A1 US 201916432568 A US201916432568 A US 201916432568A US 2019326147 A1 US2019326147 A1 US 2019326147A1
- Authority
- US
- United States
- Prior art keywords
- substrate
- cassette
- chamber
- substrate cassette
- docking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67363—Closed carriers specially adapted for containing substrates other than wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67369—Closed carriers characterised by shock absorbing elements, e.g. retainers or cushions
Definitions
- Embodiments of the present disclosure generally relate to substrate processing equipment, and more specifically, methods and apparatus for handling a substrate.
- the substrate may be transferred to multiple chambers to perform various processes.
- the substrate is in a vacuum during processing and at atmospheric pressure during transfer. Oxidation forms on the substrates upon leaving the vacuum environment and returning to atmospheric pressure. As such, it is necessary for the substrate to undergo a degas and/or preclean procedure to remove any oxidation prior to any further processing, resulting in processing delays.
- a multi-cassette carrying case includes a body having an inner volume; a door coupled to the body to selectively seal off the inner volume; and a plurality of cassette holders disposed in the inner volume to hold one or more substrate cassettes.
- a multi-cassette carrying case includes a body having an inner volume; a door coupled to the body to selectively seal off the inner volume; a plurality of ledges disposed on opposite sides of the inner volume; and a plurality of snap locks disposed in a rear portion of the inner volume, wherein the plurality of ledges and the plurality of snap locks are configured to hold one or more substrate cassettes.
- a method of transferring substrates includes: placing a substrate in a substrate cassette, wherein an inner volume of the substrate cassette is sealed from an environment outside of the substrate cassette; and placing the substrate cassette in a multi-cassette carrying case.
- FIG. 1 depicts a schematic view of a processing system having a substrate transfer apparatus in accordance with some embodiments of the present disclosure.
- FIG. 2 depicts a cross-sectional view of a substrate transfer apparatus in accordance with some embodiments of the present disclosure.
- FIG. 3 depicts a side view of a substrate cassette in accordance with some embodiments of the present disclosure.
- FIG. 4 depicts a top view of a substrate cassette in accordance with some embodiments of the present disclosure.
- FIG. 5 depicts a cross-sectional close up view of a substrate cassette in accordance with some embodiments of the present disclosure.
- FIG. 6 depicts an isometric view of a multi-cassette carrying case in accordance with some embodiments of the present disclosure.
- FIG. 7 depicts a cross-section view of the multi-cassette carrying case of FIG. 6 .
- FIG. 8 depicts an isometric view of a cassette protector for use with the substrate cassette carrying apparatus of FIG. 6 in accordance with some embodiments of the present disclosure.
- FIG. 9 depicts a close-up view of the cassette protector of FIG. 8 .
- FIG. 10 is a flowchart illustrating a method of loading a substrate to be processed into a substrate cassette in accordance with some embodiments of the present disclosure.
- Embodiments of the present disclosure generally relate to methods and apparatus for transferring a substrate.
- Embodiments of the inventive apparatus may include a substrate transfer chamber that advantageously mounts directly to a load lock chamber of a substrate processing tool, thus minimizing any negative impact on the floor space occupied by the substrate processing tool and avoiding unnecessary and costly modification of existing processing systems.
- the inventive substrate cassette of the present disclosure advantageously allows for the transport of a substrate in a vacuum, thus avoiding any oxidation that may occur on the substrate when moving from a vacuum environment to atmosphere.
- FIG. 1 is a schematic top-view diagram of an exemplary multi-chamber processing system 100 that may be suitable for use with the present inventive apparatus disclosed herein.
- suitable multi-chamber processing systems that may be suitably modified in accordance with the teachings provided herein include the ENDURA®, CENTURA®, and PRODUCER® processing systems or other suitable processing systems commercially available from Applied Materials, Inc., located in Santa Clara, Calif. Other processing systems (including those from other manufacturers) may be adapted to benefit from the present disclosure.
- the multi-chamber processing system 100 may generally comprise a vacuum-tight processing platform 102 , a factory interface 104 , and a controller 140 .
- the processing platform 102 may include a plurality of process chambers 190 A-F and at least one load lock chamber 184 (two shown) that are coupled to a transfer chamber 188 .
- a substrate transfer robot 106 (described below with respect to FIGS. 2 and 3 ) is centrally disposed in the transfer chamber 188 to transfer substrates between the load lock chambers 184 and the process chambers 190 A-F.
- the process chambers 190 A-F may be configured to perform various functions including layer deposition including atomic layer deposition (ALD), chemical vapor deposition (CVD), physical vapor deposition (PVD), etch, pre-clean, de-gas, orientation and center-finding, annealing, and other substrate processes
- ALD atomic layer deposition
- CVD chemical vapor deposition
- PVD physical vapor deposition
- etch pre-clean, de-gas, orientation and center-finding, annealing, and other substrate processes
- Each of the process chambers 190 A-F may include a slit valve or other selectively sealable opening to selectively fluidly couple the respective inner volumes of the process chambers 190 A-F to the inner volume of the transfer chamber 188 .
- each load lock chamber 184 may include a port to selectively fluidly couple the respective inner volumes of the load lock chambers 184 to the inner volume of the transfer chamber 188 .
- the factory interface 104 is coupled to the transfer chamber 188 via the load lock chambers 184 .
- each of the load lock chambers 184 may include a first port 123 coupled to the factory interface 104 and a second port 125 coupled to the transfer chamber 188 .
- the load lock chambers 184 may be coupled to a pressure control system which pumps down and vents the load lock chambers 184 to facilitate passing the substrate between the vacuum environment of the transfer chamber 188 and the substantially ambient (e.g., atmospheric) environment of the factory interface 104 .
- the factory interface 104 comprises at least one docking station 183 and at least one factory interface robot 185 (one shown) to facilitate transfer of substrates from the factory interface 104 to the processing platform 102 for processing through the load lock chambers 184 .
- the docking station 183 is configured to accept one or more (four shown) front opening unified pods (FOUPs) 187 A-D.
- one or more metrology stations may be coupled to the factory interface 104 to facilitate measurement of the substrate from the FOUPs 187 A-D.
- the factory interface robot 185 disposed in the factory interface 104 is capable of linear and rotational movement (arrows 182 ) to shuttle cassettes of substrates between the load lock chambers 184 and the one or more FOUPs 187 A-D.
- the inventive substrate transfer chamber 200 is disposed on a load lock chamber 184 to facilitate transfer of a substrate to or from the processing platform 102 while keeping the substrate in a vacuum atmosphere at all times.
- the processing platform, and the substrate transfer chamber may be configured to process and handle substrates of varying sizes, including round wafers such as 150 mm, 200 mm, 300 mm, 450 mm, or the like.
- FIG. 2 depicts a substrate transfer chamber 200 in accordance with some embodiments of the present disclosure.
- the substrate transfer chamber 200 includes a body 202 that defines an interior volume 204 .
- a bottom portion of the body 202 includes an opening 206 that fluidly couples the interior volume 204 with the load lock chamber 184 .
- the body 202 further includes a door 208 to allow access to the interior volume 204 .
- the substrate transfer chamber 200 may include an adapter plate 209 having an opening 203 aligned with the opening 206 to couple the interior volume 204 with an inner volume 205 of the load lock chamber 184 .
- the adapter plate 209 will very in dimension and configuration depending upon the structure of the load lock chamber 184 of the specific processing system, which advantageously minimizes the cost of retrofitting the substrate transfer chamber 200 to existing processing systems.
- the adapter plate 209 may be coupled to the substrate transfer chamber 200 and the load lock chamber 184 using a plurality of fasteners such as, for example, screws (not shown).
- the adapter plate 209 includes seals 211 , 213 (e.g., gaskets, or o-rings) at the interface with the substrate transfer chamber 200 and at the interface with the load lock chamber 184 to ensure a proper seal and avoid any vacuum leaks.
- the door 208 also includes a seal 207 at the interface between the door and the body 202 . Because the substrate transfer chamber 200 is fluidly coupled to the load lock chamber 184 , a vacuum source 230 that evacuates the load lock chamber 184 also evacuates the substrate transfer chamber 200 .
- the substrate transfer chamber 200 further includes a cassette support 210 to support a substrate cassette 300 (described below with respect to FIGS. 3 and 4 ).
- the cassette support 210 includes a collar 212 having protrusions 215 that extend from opposite sides of the collar 212 to engage a corresponding mounting apparatus 324 on the substrate cassette 300 and support the substrate cassette 300 in the interior volume 204 .
- the cassette support 210 may include any type of device capable of holding onto the substrate cassette 300 .
- the cassette support 210 further includes a shaft 214 coupling the collar 212 to a first end of an arm 216 .
- a lift actuator 218 is coupled to a second end of the arm 216 to raise and lower the cassette support 210 in the direction indicated by arrow 217 .
- the cassette support 210 may include any type of actuator capable of raising and lowering the cassette support 210 .
- the lift actuator 218 may be a linear actuator.
- the cassette support 210 further includes a locking device 220 , which may be coupled to the cassette support 210 between the collar 212 and the shaft 214 .
- the locking device 220 includes a first piston actuator 221 and a second piston actuator 222 on one side of the collar 212 and a protruding element 219 (e.g., a hook) at an opposite side.
- the first and second piston actuators 221 , 222 are described below together with the locking plate 308 of the substrate cassette 300 .
- the substrate transfer chamber 200 may optionally include a seal plate 250 having a shape corresponding to the lower surface of the substrate transfer chamber 200 .
- the seal plate 250 may be placed on the lower surface of the chamber to block the opening 206 to allow the processing system 100 and the load lock chamber 184 to function normally without use of the substrate transfer chamber 200 .
- the seal plate 250 may be secured to the lower surface via any conventional means such as, for example, screws or the like.
- a seal may be disposed between the seal plate 250 and the lower surface of the substrate transfer chamber 200 to prevent any vacuum leaks during normal operation of the load lock chamber 184 .
- the load lock chamber 184 includes a first opening 232 , a second opening 234 , a pedestal 236 , and a lift hoop 238 .
- the first opening 232 facilitates interfacing with the docking station 183 to allow the factory interface robot 185 to insert or remove a substrate from the load lock chamber 184 .
- the second opening 234 facilitates interfacing with the processing platform 102 to allow the substrate transfer robot 106 to insert or remove a substrate from the load lock chamber 184 . As shown in FIG.
- the first and second openings 232 , 234 may be vertically offset so that the lift hoop is raised to receive/supply a substrate from/to the factory interface robot 185 and lowered to receive/supply a substrate from/to the substrate transfer robot 106 .
- a lift actuator 240 is coupled to the lift hoop 238 to raise or lower the lift hoop 238 as necessary.
- FIG. 3 depicts a side view a substrate cassette 300 in accordance with some embodiments of the present disclosure.
- FIG. 4 depicts a top view of the substrate cassette 300 attached to the cassette support 210 of the substrate transfer chamber 200 .
- the substrate cassette 300 includes an upper portion 302 and a lower portion 304 which, when coupled, define an interior volume 505 (shown in FIG. 5 ).
- the substrate cassette 300 also includes a locking mechanism 306 , which couples the upper portion 302 to the lower portion 304 , and a mounting apparatus 324 having prongs 325 and a latch 323 .
- the mounting apparatus 324 is shaped so that the protrusions 215 of the collar 212 are inserted into a space 327 between the prongs 325 , which rest on the protrusions 215 to support the substrate cassette 300 .
- the protrusions 215 move further into the space 327 and the latch 323 approaches the protruding element 219 .
- the substrate cassette 300 is pushed until the latch 323 latches onto the protruding element 219 , thus locking the substrate cassette 300 in place and allowing the substrate cassette 300 to hang on the cassette support 210 .
- the locking mechanism 306 may include a locking plate 308 disposed on the upper portion 302 and having a plurality of arms 310 extending from a center of the locking plate 308 .
- Two of the plurality of arms 310 include upwardly extending tabs 312 that are perpendicular to the locking plate 308 .
- a plurality of locking pins 313 extend through ends of the plurality of arms 310 and into a corresponding plurality of slots 314 formed in both the upper portion 302 and the lower portion 304 .
- Each of the plurality of locking pins 313 includes a reduced diameter midsection whose diameter is less than a width of each slot 314 to allow the locking pin 313 to slide along the slot 314 .
- each locking pin 313 has a diameter that is greater than a width of the slot to prevent the locking pin 313 from passing through the slot 314 .
- Each of the plurality of slots 314 includes an elongated portion 316 and a hole 318 at one end of the elongated portion 316 .
- a thickness of the elongated portion 316 is less than a diameter of the hole 318 .
- each locking pin 313 In a locked position (e.g., when the upper portion 302 and the lower portion 304 are coupled), each locking pin 313 extends through the elongated portion 316 . Because the ends of the locking pins 313 are too large to pass through the elongated portion 316 , the upper portion 302 and the lower portion 304 are sandwiched together between the enlarged ends. In an unlocked position, each locking pin 313 extends through the hole 318 . The ends of the locking pin 313 are sized to allow the locking pin 313 to pass through the holes 318 . When each locking pin 313 extends through the hole 318 , the upper and lower portions 302 , 304 can be separated.
- each of the plurality of arms 310 includes a protrusion 320 that extends beneath a corresponding tab 322 formed on the upper portion 302 . As shown in FIG. 4 , the protrusions 320 are substantially perpendicular to the arms 310 .
- the locking device 220 includes a first piston actuator 221 and a second piston actuator 222 perpendicular to the first piston actuator 221 .
- the first and second piston actuators 221 , 222 are each disposed adjacent to one of the upwardly extending tabs 312 to push the upwardly extending tabs 312 and move the locking mechanism 306 in a first direction and a second direction opposite the first direction (e.g., between the locked and unlocked positions).
- the first and second piston actuators 221 , 222 may be actuated using software.
- the upper portion 302 may include a load distribution plate 326 coupled to an upper surface of the upper portion 302 to evenly distribute a downwardly projecting force by the cassette support 210 pressing the upper portion 302 against the lower portion 304 for coupling.
- the load distribution plate 326 is coupled to the upper portion 302 via a plurality of fastening elements 330 (e.g., bolts, screws, or the like).
- the upper portion 302 may further include a plurality of locating pins 328 to interface with a corresponding plurality of holes in the lower portion 304 to correctly align the upper and lower portions 302 , 304 during coupling.
- FIG. 5 depicts a close up cross-sectional view of the substrate cassette 300 containing a substrate 502 .
- the substrate 502 rests on an inner surface 508 of the lower portion 304 .
- the inner surface may be shaped so that the number of contact points between the substrate 502 and the inner surface 508 is minimal to prevent any damage to a backside of the substrate 502 .
- the number of contact points may be limited to four contact points.
- the upper portion 302 may include an annular ring 510 proximate a periphery of the substrate 502 to limit or substantially eliminate any movement of the substrate 502 during transport.
- the upper and lower portions 302 , 304 may be formed of any material that will not damage the substrate 502 .
- the upper and lower portions 302 , 304 are formed of polyether ether ketone (PEEK).
- the lower portion 304 may include a seal 504 (e.g., gasket, o-ring, or the like) around a periphery of the lower portion at the interface between the lower portion 304 and the upper portion 302 .
- the seal 504 prevents any vacuum leaks when the substrate cassette 300 is removed from the vacuum environment inside of the substrate transfer chamber 200 .
- the seal 504 is formed of a material that is non-sticky, vacuum-compatible material to ensure that the separation of the upper and lower portions 302 , 304 does not damage the seal 504 .
- the lower portion 304 includes a recessed section 506 through which the substrate transfer robot 106 can extend to lift the substrate 502 after the upper portion 302 has been separated from the lower portion 304 .
- the substrate cassette 300 is inserted onto the collar 212 of the substrate transfer chamber 200 .
- the vacuum source 230 coupled to the load lock chamber 184 evacuates the interior volume 204 and the inner volume 205 .
- the lift actuator 218 then lowers the substrate cassette 300 onto one of the lift hoop 238 (if the lift hoop 238 is raised) or the pedestal 236 (if the lift hoop 238 is lowered). If the substrate cassette 300 is lowered onto the raised lift hoop 238 , the lift hoop 238 is lowered until the substrate cassette 300 rests on the pedestal 236 .
- the locking device 220 is subsequently activated to rotate the locking mechanism 306 towards the unlocked position.
- the lift actuator 218 lifts the upper portion 302 up, leaving the lower portion 304 resting on the pedestal 236 .
- a substrate 502 is either placed in or removed from the substrate cassette 300 .
- the lift actuator 218 lowers the upper portion 302 onto the lower portion 304 and forces the two portions together.
- the load distribution plate 326 ensures that this force is evenly distributed about the substrate cassette 300 .
- the locking device 220 then rotates the locking mechanism towards the locked position, thus locking the upper and lower portions 302 , 304 together. After the interior volume 204 and the inner volume 205 return to atmosphere, the lift actuator 218 lifts the substrate cassette 300 back up into the substrate transfer chamber 200 for removal.
- FIGS. 6 and 7 depict a multi-cassette carrying case 600 in accordance with some embodiments of the present disclosure.
- the carrying case 600 includes a body 602 that defines an inner volume 704 and has an opening 606 . At least one handle 614 may be disposed on an outer surface of the body 602 to enable carrying of the carrying case 600 .
- the carrying case 600 further includes a door 608 that is placed in the opening 606 to seal off the inner volume 704 . Although in FIG. 6 the door 608 is shown as fully detachable, the door 608 may alternatively be attached to a side of the body 602 via a hinge assembly.
- the door 608 includes locking mechanisms 610 that facilitate locking the door 608 in the opening 606 .
- the locking mechanisms 610 may include any locking mechanisms suitable to fix the door 608 shut.
- the carrying case 600 further includes a plurality of cassette holders to hold one or more substrate cassettes 300 .
- the cassette holders include a plurality of ledges 612 on opposite sides of the inner volume 704 to support one or more substrate cassettes 300 .
- the plurality of cassette holders may further include a plurality of snap locks 702 disposed at a rear portion of the inner volume 704 .
- the substrate cassette 300 is placed on a set of ledges 612 and pushed towards the corresponding snap lock 702 .
- the substrate cassette 300 contacts the snap lock 702 , the substrate cassette 300 is pushed further so that the snap lock 702 deforms outwardly and subsequently latches onto the substrate cassette 300 , thus locking the substrate cassette 300 in place.
- the carrying case 600 may include a vacuum port 616 and a vent port 618 to allow coupling of the carrying case to a vacuum source.
- the door 608 may include a seal around its periphery to prevent any vacuum leaks during transport.
- the carrying case 600 may also include a pressure monitoring device 620 to monitor and display a pressure of the inner volume 704 .
- the vacuum port 616 , vent port 618 , or another port may be coupled to a gas source, for example an inert gas source, to provide an inert gas to the interior of the carrying case.
- FIGS. 8 and 9 depict a cassette protector 800 in accordance with some embodiments of the disclosure.
- the cassette protector 800 may be used in combination with the multi-cassette carrying case 600 to provide added protection to the substrate cassette 300 .
- the cassette protector 800 includes a plate 802 having a plurality of arms 803 .
- Each of the plurality of arms 803 includes an upwardly projecting edge 805 .
- a plurality of bumpers 804 are respectively disposed on inner surfaces of the upwardly projecting edges 805 .
- the distance from a first bumper 804 to a second bumper 804 disposed across from the first bumper 804 is approximately equal to a diameter of the substrate cassette 300 .
- Each of the projecting edges 805 includes a latching apparatus 806 having a latch 808 and a latch handle 810 to secure the cassette protector to a substrate cassette.
- a plurality of latch plates 902 corresponding to the plurality of arms 803 are coupled to the upper portion 302 of the substrate cassette 300 via fixation elements 904 .
- the latch plate 902 includes a hook 906 which, when the substrate cassette 300 is placed in the cassette protector 800 , is disposed adjacent the latch 808 .
- the latch handle 810 is lifted, the latch 808 is placed on the hook 906 , and the latch handle 810 is pushed down again, thus coupling the cassette protector 800 to the substrate cassette 300 .
- FIG. 10 is a flowchart illustrating a method 1000 of loading a substrate 502 to be processed into a substrate cassette 300 in accordance with some embodiments of the present disclosure.
- a volume (interior volume 204 ) in which the substrate cassette 300 is disposed is evacuated.
- a locking mechanism 306 of the substrate cassette 300 is unlocked to uncouple an upper portion 302 from a lower portion 304 of the substrate cassette 300 .
- the upper portion 302 is separated from the lower portion 304 .
- the substrate 502 is placed on an inner surface 508 of the lower portion 304 .
- the upper portion 302 is forced against the lower portion 304 .
- the locking mechanism 306 is locked to couple the upper portion 302 to the lower portion 304 .
- the substrate may be disposed in the substrate cassette 300 in a vacuum environment while located outside of the vacuum processing tool.
- the controller 140 may be provided and coupled to various components of the multi-chamber processing system 100 to control the operation of the multi-chamber processing system 100 .
- the controller 140 includes a central processing unit (CPU) 142 , a memory 144 , and support circuits 146 .
- the controller 140 may control the multi-chamber processing system 100 directly, or via computers (or controllers) associated with particular process chamber and/or support system components.
- the controller 140 may be any form of general-purpose computer processor that can be used in an industrial setting for controlling various chambers and sub-processors.
- the memory, or computer readable medium, 144 of the controller 140 may be one or more of readily available memory such as random access memory (RAM), read only memory (ROM), floppy disk, hard disk, optical storage media (e.g., compact disc or digital video disc), flash drive, or any other form of digital storage, local or remote.
- the support circuits 146 are coupled to the CPU 142 for supporting the processor in a conventional manner. These circuits include cache, power supplies, clock circuits, input/output circuitry and subsystems, and the like.
- Inventive methods as described herein, such as the method 1000 may be stored in the memory 144 as software routine that may be executed or invoked to control the operation of the multi-chamber processing system 100 in the manner described herein.
- the software routine may also be stored and/or executed by a second CPU (not shown) that is remotely located from the hardware being controlled by the CPU 142 .
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
- This application is a Continuation of co-pending U.S. patent application Ser. No. 14/933,651, filed Nov. 5, 2015, which claims benefit of U.S. provisional patent application Ser. No. 62/078,401, filed Nov. 11, 2014. Each of the aforementioned related patent applications is herein incorporated by reference in its entirety.
- Embodiments of the present disclosure generally relate to substrate processing equipment, and more specifically, methods and apparatus for handling a substrate.
- During processing of a substrate, the substrate may be transferred to multiple chambers to perform various processes. The substrate is in a vacuum during processing and at atmospheric pressure during transfer. Oxidation forms on the substrates upon leaving the vacuum environment and returning to atmospheric pressure. As such, it is necessary for the substrate to undergo a degas and/or preclean procedure to remove any oxidation prior to any further processing, resulting in processing delays.
- Therefore, the inventors have provided improved methods and apparatus for substrate transfer.
- Embodiments of a multi-cassette carrying case are provided herein. In some embodiments, a multi-cassette carrying case includes a body having an inner volume; a door coupled to the body to selectively seal off the inner volume; and a plurality of cassette holders disposed in the inner volume to hold one or more substrate cassettes.
- In some embodiments, a multi-cassette carrying case includes a body having an inner volume; a door coupled to the body to selectively seal off the inner volume; a plurality of ledges disposed on opposite sides of the inner volume; and a plurality of snap locks disposed in a rear portion of the inner volume, wherein the plurality of ledges and the plurality of snap locks are configured to hold one or more substrate cassettes.
- In some embodiments, a method of transferring substrates includes: placing a substrate in a substrate cassette, wherein an inner volume of the substrate cassette is sealed from an environment outside of the substrate cassette; and placing the substrate cassette in a multi-cassette carrying case.
- Other and further embodiments of the present disclosure are described below.
- Embodiments of the present disclosure, briefly summarized above and discussed in greater detail below, can be understood by reference to the illustrative embodiments of the disclosure depicted in the appended drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments of this disclosure and are therefore not to be considered limiting of its scope, for the disclosure may admit to other equally effective embodiments.
-
FIG. 1 depicts a schematic view of a processing system having a substrate transfer apparatus in accordance with some embodiments of the present disclosure. -
FIG. 2 depicts a cross-sectional view of a substrate transfer apparatus in accordance with some embodiments of the present disclosure. -
FIG. 3 depicts a side view of a substrate cassette in accordance with some embodiments of the present disclosure. -
FIG. 4 depicts a top view of a substrate cassette in accordance with some embodiments of the present disclosure. -
FIG. 5 depicts a cross-sectional close up view of a substrate cassette in accordance with some embodiments of the present disclosure. -
FIG. 6 depicts an isometric view of a multi-cassette carrying case in accordance with some embodiments of the present disclosure. -
FIG. 7 depicts a cross-section view of the multi-cassette carrying case ofFIG. 6 . -
FIG. 8 depicts an isometric view of a cassette protector for use with the substrate cassette carrying apparatus ofFIG. 6 in accordance with some embodiments of the present disclosure. -
FIG. 9 depicts a close-up view of the cassette protector ofFIG. 8 . -
FIG. 10 is a flowchart illustrating a method of loading a substrate to be processed into a substrate cassette in accordance with some embodiments of the present disclosure. - To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. The figures are not drawn to scale and may be simplified for clarity. It is contemplated that elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation.
- Embodiments of the present disclosure generally relate to methods and apparatus for transferring a substrate. Embodiments of the inventive apparatus may include a substrate transfer chamber that advantageously mounts directly to a load lock chamber of a substrate processing tool, thus minimizing any negative impact on the floor space occupied by the substrate processing tool and avoiding unnecessary and costly modification of existing processing systems. The inventive substrate cassette of the present disclosure advantageously allows for the transport of a substrate in a vacuum, thus avoiding any oxidation that may occur on the substrate when moving from a vacuum environment to atmosphere.
-
FIG. 1 is a schematic top-view diagram of an exemplarymulti-chamber processing system 100 that may be suitable for use with the present inventive apparatus disclosed herein. Examples of suitable multi-chamber processing systems that may be suitably modified in accordance with the teachings provided herein include the ENDURA®, CENTURA®, and PRODUCER® processing systems or other suitable processing systems commercially available from Applied Materials, Inc., located in Santa Clara, Calif. Other processing systems (including those from other manufacturers) may be adapted to benefit from the present disclosure. - In some embodiments, the
multi-chamber processing system 100 may generally comprise a vacuum-tight processing platform 102, afactory interface 104, and acontroller 140. Theprocessing platform 102 may include a plurality ofprocess chambers 190A-F and at least one load lock chamber 184 (two shown) that are coupled to atransfer chamber 188. A substrate transfer robot 106 (described below with respect toFIGS. 2 and 3 ) is centrally disposed in thetransfer chamber 188 to transfer substrates between theload lock chambers 184 and theprocess chambers 190A-F. Theprocess chambers 190A-F may be configured to perform various functions including layer deposition including atomic layer deposition (ALD), chemical vapor deposition (CVD), physical vapor deposition (PVD), etch, pre-clean, de-gas, orientation and center-finding, annealing, and other substrate processes Each of theprocess chambers 190A-F may include a slit valve or other selectively sealable opening to selectively fluidly couple the respective inner volumes of theprocess chambers 190A-F to the inner volume of thetransfer chamber 188. Similarly, eachload lock chamber 184 may include a port to selectively fluidly couple the respective inner volumes of theload lock chambers 184 to the inner volume of thetransfer chamber 188. - The
factory interface 104 is coupled to thetransfer chamber 188 via theload lock chambers 184. In some embodiments, each of theload lock chambers 184 may include afirst port 123 coupled to thefactory interface 104 and asecond port 125 coupled to thetransfer chamber 188. Theload lock chambers 184 may be coupled to a pressure control system which pumps down and vents theload lock chambers 184 to facilitate passing the substrate between the vacuum environment of thetransfer chamber 188 and the substantially ambient (e.g., atmospheric) environment of thefactory interface 104. - In some embodiments, the
factory interface 104 comprises at least onedocking station 183 and at least one factory interface robot 185 (one shown) to facilitate transfer of substrates from thefactory interface 104 to theprocessing platform 102 for processing through theload lock chambers 184. Thedocking station 183 is configured to accept one or more (four shown) front opening unified pods (FOUPs) 187A-D. Optionally, one or more metrology stations (not shown) may be coupled to thefactory interface 104 to facilitate measurement of the substrate from theFOUPs 187A-D. Thefactory interface robot 185 disposed in thefactory interface 104 is capable of linear and rotational movement (arrows 182) to shuttle cassettes of substrates between theload lock chambers 184 and the one ormore FOUPs 187A-D. - In some embodiments, the inventive
substrate transfer chamber 200 is disposed on aload lock chamber 184 to facilitate transfer of a substrate to or from theprocessing platform 102 while keeping the substrate in a vacuum atmosphere at all times. The processing platform, and the substrate transfer chamber, may be configured to process and handle substrates of varying sizes, including round wafers such as 150 mm, 200 mm, 300 mm, 450 mm, or the like. -
FIG. 2 depicts asubstrate transfer chamber 200 in accordance with some embodiments of the present disclosure. Thesubstrate transfer chamber 200 includes abody 202 that defines aninterior volume 204. A bottom portion of thebody 202 includes an opening 206 that fluidly couples theinterior volume 204 with theload lock chamber 184. Thebody 202 further includes adoor 208 to allow access to theinterior volume 204. In order to facilitate coupling of thesubstrate transfer chamber 200 to theload lock chamber 184, thesubstrate transfer chamber 200 may include anadapter plate 209 having anopening 203 aligned with theopening 206 to couple theinterior volume 204 with aninner volume 205 of theload lock chamber 184. Theadapter plate 209 will very in dimension and configuration depending upon the structure of theload lock chamber 184 of the specific processing system, which advantageously minimizes the cost of retrofitting thesubstrate transfer chamber 200 to existing processing systems. Theadapter plate 209 may be coupled to thesubstrate transfer chamber 200 and theload lock chamber 184 using a plurality of fasteners such as, for example, screws (not shown). Theadapter plate 209 includesseals 211, 213 (e.g., gaskets, or o-rings) at the interface with thesubstrate transfer chamber 200 and at the interface with theload lock chamber 184 to ensure a proper seal and avoid any vacuum leaks. Similarly, thedoor 208 also includes aseal 207 at the interface between the door and thebody 202. Because thesubstrate transfer chamber 200 is fluidly coupled to theload lock chamber 184, avacuum source 230 that evacuates theload lock chamber 184 also evacuates thesubstrate transfer chamber 200. - The
substrate transfer chamber 200 further includes acassette support 210 to support a substrate cassette 300 (described below with respect toFIGS. 3 and 4 ). In some embodiments, thecassette support 210 includes acollar 212 havingprotrusions 215 that extend from opposite sides of thecollar 212 to engage a corresponding mountingapparatus 324 on thesubstrate cassette 300 and support thesubstrate cassette 300 in theinterior volume 204. However, thecassette support 210 may include any type of device capable of holding onto thesubstrate cassette 300. Thecassette support 210 further includes ashaft 214 coupling thecollar 212 to a first end of anarm 216. Alift actuator 218 is coupled to a second end of thearm 216 to raise and lower thecassette support 210 in the direction indicated byarrow 217. Thecassette support 210 may include any type of actuator capable of raising and lowering thecassette support 210. In some embodiments, for example, thelift actuator 218 may be a linear actuator. Thecassette support 210 further includes alocking device 220, which may be coupled to thecassette support 210 between thecollar 212 and theshaft 214. Thelocking device 220 includes afirst piston actuator 221 and asecond piston actuator 222 on one side of thecollar 212 and a protruding element 219 (e.g., a hook) at an opposite side. The first andsecond piston actuators plate 308 of thesubstrate cassette 300. - In some embodiments, the
substrate transfer chamber 200 may optionally include aseal plate 250 having a shape corresponding to the lower surface of thesubstrate transfer chamber 200. Theseal plate 250 may be placed on the lower surface of the chamber to block theopening 206 to allow theprocessing system 100 and theload lock chamber 184 to function normally without use of thesubstrate transfer chamber 200. Theseal plate 250 may be secured to the lower surface via any conventional means such as, for example, screws or the like. A seal may be disposed between theseal plate 250 and the lower surface of thesubstrate transfer chamber 200 to prevent any vacuum leaks during normal operation of theload lock chamber 184. - The
load lock chamber 184 includes afirst opening 232, asecond opening 234, apedestal 236, and alift hoop 238. Thefirst opening 232 facilitates interfacing with thedocking station 183 to allow thefactory interface robot 185 to insert or remove a substrate from theload lock chamber 184. Thesecond opening 234 facilitates interfacing with theprocessing platform 102 to allow thesubstrate transfer robot 106 to insert or remove a substrate from theload lock chamber 184. As shown inFIG. 2 , the first andsecond openings factory interface robot 185 and lowered to receive/supply a substrate from/to thesubstrate transfer robot 106. Alift actuator 240 is coupled to thelift hoop 238 to raise or lower thelift hoop 238 as necessary. -
FIG. 3 depicts a side view asubstrate cassette 300 in accordance with some embodiments of the present disclosure.FIG. 4 depicts a top view of thesubstrate cassette 300 attached to thecassette support 210 of thesubstrate transfer chamber 200. Thesubstrate cassette 300 includes anupper portion 302 and alower portion 304 which, when coupled, define an interior volume 505 (shown inFIG. 5 ). Thesubstrate cassette 300 also includes alocking mechanism 306, which couples theupper portion 302 to thelower portion 304, and a mountingapparatus 324 havingprongs 325 and alatch 323. The mountingapparatus 324 is shaped so that theprotrusions 215 of thecollar 212 are inserted into aspace 327 between theprongs 325, which rest on theprotrusions 215 to support thesubstrate cassette 300. As thesubstrate cassette 300 is moved further into theinterior volume 204, theprotrusions 215 move further into thespace 327 and thelatch 323 approaches the protrudingelement 219. Thesubstrate cassette 300 is pushed until thelatch 323 latches onto the protrudingelement 219, thus locking thesubstrate cassette 300 in place and allowing thesubstrate cassette 300 to hang on thecassette support 210. - The
locking mechanism 306 may include alocking plate 308 disposed on theupper portion 302 and having a plurality ofarms 310 extending from a center of thelocking plate 308. Two of the plurality ofarms 310 include upwardly extendingtabs 312 that are perpendicular to thelocking plate 308. A plurality of lockingpins 313 extend through ends of the plurality ofarms 310 and into a corresponding plurality ofslots 314 formed in both theupper portion 302 and thelower portion 304. Each of the plurality of lockingpins 313 includes a reduced diameter midsection whose diameter is less than a width of eachslot 314 to allow thelocking pin 313 to slide along theslot 314. Both ends of each lockingpin 313 have a diameter that is greater than a width of the slot to prevent thelocking pin 313 from passing through theslot 314. Each of the plurality ofslots 314 includes anelongated portion 316 and ahole 318 at one end of theelongated portion 316. A thickness of theelongated portion 316 is less than a diameter of thehole 318. - In a locked position (e.g., when the
upper portion 302 and thelower portion 304 are coupled), each lockingpin 313 extends through theelongated portion 316. Because the ends of the locking pins 313 are too large to pass through theelongated portion 316, theupper portion 302 and thelower portion 304 are sandwiched together between the enlarged ends. In an unlocked position, each lockingpin 313 extends through thehole 318. The ends of thelocking pin 313 are sized to allow thelocking pin 313 to pass through theholes 318. When each lockingpin 313 extends through thehole 318, the upper andlower portions plate 308 remains coupled to theupper portion 302, each of the plurality ofarms 310 includes aprotrusion 320 that extends beneath acorresponding tab 322 formed on theupper portion 302. As shown inFIG. 4 , theprotrusions 320 are substantially perpendicular to thearms 310. - Referring to
FIG. 4 , thelocking device 220 includes afirst piston actuator 221 and asecond piston actuator 222 perpendicular to thefirst piston actuator 221. The first andsecond piston actuators tabs 312 to push the upwardly extendingtabs 312 and move thelocking mechanism 306 in a first direction and a second direction opposite the first direction (e.g., between the locked and unlocked positions). In some embodiments, the first andsecond piston actuators - In some embodiments, the
upper portion 302 may include aload distribution plate 326 coupled to an upper surface of theupper portion 302 to evenly distribute a downwardly projecting force by thecassette support 210 pressing theupper portion 302 against thelower portion 304 for coupling. Theload distribution plate 326 is coupled to theupper portion 302 via a plurality of fastening elements 330 (e.g., bolts, screws, or the like). In some embodiments, theupper portion 302 may further include a plurality of locatingpins 328 to interface with a corresponding plurality of holes in thelower portion 304 to correctly align the upper andlower portions -
FIG. 5 depicts a close up cross-sectional view of thesubstrate cassette 300 containing asubstrate 502. Thesubstrate 502 rests on aninner surface 508 of thelower portion 304. In some embodiments, the inner surface may be shaped so that the number of contact points between thesubstrate 502 and theinner surface 508 is minimal to prevent any damage to a backside of thesubstrate 502. For example, the number of contact points may be limited to four contact points. In, some embodiments, theupper portion 302 may include anannular ring 510 proximate a periphery of thesubstrate 502 to limit or substantially eliminate any movement of thesubstrate 502 during transport. The upper andlower portions substrate 502. For example, in some embodiments the upper andlower portions lower portion 304 may include a seal 504 (e.g., gasket, o-ring, or the like) around a periphery of the lower portion at the interface between thelower portion 304 and theupper portion 302. Theseal 504 prevents any vacuum leaks when thesubstrate cassette 300 is removed from the vacuum environment inside of thesubstrate transfer chamber 200. Theseal 504 is formed of a material that is non-sticky, vacuum-compatible material to ensure that the separation of the upper andlower portions seal 504. - As shown in
FIG. 5 , thelower portion 304 includes a recessedsection 506 through which thesubstrate transfer robot 106 can extend to lift thesubstrate 502 after theupper portion 302 has been separated from thelower portion 304. - In operation, the
substrate cassette 300 is inserted onto thecollar 212 of thesubstrate transfer chamber 200. When thedoor 208 is closed, thevacuum source 230 coupled to theload lock chamber 184 evacuates theinterior volume 204 and theinner volume 205. Thelift actuator 218 then lowers thesubstrate cassette 300 onto one of the lift hoop 238 (if thelift hoop 238 is raised) or the pedestal 236 (if thelift hoop 238 is lowered). If thesubstrate cassette 300 is lowered onto the raisedlift hoop 238, thelift hoop 238 is lowered until thesubstrate cassette 300 rests on thepedestal 236. Thelocking device 220 is subsequently activated to rotate thelocking mechanism 306 towards the unlocked position. Next, thelift actuator 218 lifts theupper portion 302 up, leaving thelower portion 304 resting on thepedestal 236. Asubstrate 502 is either placed in or removed from thesubstrate cassette 300. Subsequently, thelift actuator 218 lowers theupper portion 302 onto thelower portion 304 and forces the two portions together. Theload distribution plate 326 ensures that this force is evenly distributed about thesubstrate cassette 300. Thelocking device 220 then rotates the locking mechanism towards the locked position, thus locking the upper andlower portions interior volume 204 and theinner volume 205 return to atmosphere, thelift actuator 218 lifts thesubstrate cassette 300 back up into thesubstrate transfer chamber 200 for removal. -
FIGS. 6 and 7 depict amulti-cassette carrying case 600 in accordance with some embodiments of the present disclosure. The carryingcase 600 includes abody 602 that defines aninner volume 704 and has anopening 606. At least onehandle 614 may be disposed on an outer surface of thebody 602 to enable carrying of the carryingcase 600. The carryingcase 600 further includes adoor 608 that is placed in theopening 606 to seal off theinner volume 704. Although inFIG. 6 thedoor 608 is shown as fully detachable, thedoor 608 may alternatively be attached to a side of thebody 602 via a hinge assembly. Thedoor 608 includes lockingmechanisms 610 that facilitate locking thedoor 608 in theopening 606. The lockingmechanisms 610 may include any locking mechanisms suitable to fix thedoor 608 shut. - The carrying
case 600 further includes a plurality of cassette holders to hold one ormore substrate cassettes 300. The cassette holders include a plurality ofledges 612 on opposite sides of theinner volume 704 to support one ormore substrate cassettes 300. To ensure that thesubstrate cassettes 300 do not move during transport, the plurality of cassette holders may further include a plurality ofsnap locks 702 disposed at a rear portion of theinner volume 704. To place asubstrate cassette 300 in the carryingcase 600, thesubstrate cassette 300 is placed on a set ofledges 612 and pushed towards the correspondingsnap lock 702. When thesubstrate cassette 300 contacts thesnap lock 702, thesubstrate cassette 300 is pushed further so that thesnap lock 702 deforms outwardly and subsequently latches onto thesubstrate cassette 300, thus locking thesubstrate cassette 300 in place. - In some embodiments, the carrying
case 600 may include avacuum port 616 and avent port 618 to allow coupling of the carrying case to a vacuum source. In embodiments in which theinner volume 704 of the carryingcase 600 is evacuated, thedoor 608 may include a seal around its periphery to prevent any vacuum leaks during transport. In some embodiments, the carryingcase 600 may also include a pressure monitoring device 620 to monitor and display a pressure of theinner volume 704. Alternatively or in combination, thevacuum port 616, ventport 618, or another port (not shown), may be coupled to a gas source, for example an inert gas source, to provide an inert gas to the interior of the carrying case. -
FIGS. 8 and 9 depict acassette protector 800 in accordance with some embodiments of the disclosure. In some embodiments, thecassette protector 800 may be used in combination with themulti-cassette carrying case 600 to provide added protection to thesubstrate cassette 300. Thecassette protector 800 includes aplate 802 having a plurality ofarms 803. Each of the plurality ofarms 803 includes an upwardly projectingedge 805. A plurality ofbumpers 804 are respectively disposed on inner surfaces of the upwardly projectingedges 805. The distance from afirst bumper 804 to asecond bumper 804 disposed across from thefirst bumper 804 is approximately equal to a diameter of thesubstrate cassette 300. Each of the projectingedges 805 includes alatching apparatus 806 having alatch 808 and alatch handle 810 to secure the cassette protector to a substrate cassette. - Referring to
FIG. 9 , a plurality oflatch plates 902 corresponding to the plurality ofarms 803 are coupled to theupper portion 302 of thesubstrate cassette 300 viafixation elements 904. Thelatch plate 902 includes ahook 906 which, when thesubstrate cassette 300 is placed in thecassette protector 800, is disposed adjacent thelatch 808. To engage thelatch 808, the latch handle 810 is lifted, thelatch 808 is placed on thehook 906, and the latch handle 810 is pushed down again, thus coupling thecassette protector 800 to thesubstrate cassette 300. -
FIG. 10 is a flowchart illustrating amethod 1000 of loading asubstrate 502 to be processed into asubstrate cassette 300 in accordance with some embodiments of the present disclosure. At 1005, a volume (interior volume 204) in which thesubstrate cassette 300 is disposed is evacuated. At 1010, alocking mechanism 306 of thesubstrate cassette 300 is unlocked to uncouple anupper portion 302 from alower portion 304 of thesubstrate cassette 300. At 1015, theupper portion 302 is separated from thelower portion 304. At 1020, thesubstrate 502 is placed on aninner surface 508 of thelower portion 304. At 1025, theupper portion 302 is forced against thelower portion 304. At 1030, thelocking mechanism 306 is locked to couple theupper portion 302 to thelower portion 304. Thus, the substrate may be disposed in thesubstrate cassette 300 in a vacuum environment while located outside of the vacuum processing tool. - Returning to
FIG. 1 , thecontroller 140 may be provided and coupled to various components of themulti-chamber processing system 100 to control the operation of themulti-chamber processing system 100. Thecontroller 140 includes a central processing unit (CPU) 142, amemory 144, and supportcircuits 146. Thecontroller 140 may control themulti-chamber processing system 100 directly, or via computers (or controllers) associated with particular process chamber and/or support system components. Thecontroller 140 may be any form of general-purpose computer processor that can be used in an industrial setting for controlling various chambers and sub-processors. The memory, or computer readable medium, 144 of thecontroller 140 may be one or more of readily available memory such as random access memory (RAM), read only memory (ROM), floppy disk, hard disk, optical storage media (e.g., compact disc or digital video disc), flash drive, or any other form of digital storage, local or remote. Thesupport circuits 146 are coupled to theCPU 142 for supporting the processor in a conventional manner. These circuits include cache, power supplies, clock circuits, input/output circuitry and subsystems, and the like. Inventive methods as described herein, such as themethod 1000, may be stored in thememory 144 as software routine that may be executed or invoked to control the operation of themulti-chamber processing system 100 in the manner described herein. The software routine may also be stored and/or executed by a second CPU (not shown) that is remotely located from the hardware being controlled by theCPU 142. - While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof.
Claims (18)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16/432,568 US20190326147A1 (en) | 2014-11-11 | 2019-06-05 | Multi-cassette carrying case |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462078401P | 2014-11-11 | 2014-11-11 | |
US14/933,651 US10566226B2 (en) | 2014-11-11 | 2015-11-05 | Multi-cassette carrying case |
US16/432,568 US20190326147A1 (en) | 2014-11-11 | 2019-06-05 | Multi-cassette carrying case |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/933,651 Continuation US10566226B2 (en) | 2014-11-11 | 2015-11-05 | Multi-cassette carrying case |
Publications (1)
Publication Number | Publication Date |
---|---|
US20190326147A1 true US20190326147A1 (en) | 2019-10-24 |
Family
ID=55912814
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/933,651 Expired - Fee Related US10566226B2 (en) | 2014-11-11 | 2015-11-05 | Multi-cassette carrying case |
US16/432,568 Abandoned US20190326147A1 (en) | 2014-11-11 | 2019-06-05 | Multi-cassette carrying case |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/933,651 Expired - Fee Related US10566226B2 (en) | 2014-11-11 | 2015-11-05 | Multi-cassette carrying case |
Country Status (3)
Country | Link |
---|---|
US (2) | US10566226B2 (en) |
TW (2) | TWI674227B (en) |
WO (1) | WO2016077270A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10347516B2 (en) * | 2014-11-11 | 2019-07-09 | Applied Materials, Inc. | Substrate transfer chamber |
US10153187B2 (en) * | 2014-11-11 | 2018-12-11 | Applied Materials, Inc. | Methods and apparatus for transferring a substrate |
TW201812893A (en) * | 2016-08-26 | 2018-04-01 | 美商應用材料股份有限公司 | Chemical mechanical polishing tool with robot access to cassettes |
US11948810B2 (en) | 2017-11-15 | 2024-04-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus for processing substrates or wafers |
US10504762B2 (en) * | 2018-02-06 | 2019-12-10 | Applied Materials, Inc. | Bridging front opening unified pod (FOUP) |
NL2022185B1 (en) * | 2018-12-12 | 2020-07-02 | Suss Microtec Lithography Gmbh | Substrate cassette |
US20230154766A1 (en) * | 2021-11-18 | 2023-05-18 | Applied Materials, Inc. | Pre-clean chamber assembly architecture for improved serviceability |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4500407A (en) * | 1983-07-19 | 1985-02-19 | Varian Associates, Inc. | Disk or wafer handling and coating system |
US20020061248A1 (en) * | 2000-07-07 | 2002-05-23 | Applied Materials, Inc. | High productivity semiconductor wafer processing system |
US20060156979A1 (en) * | 2004-11-22 | 2006-07-20 | Applied Materials, Inc. | Substrate processing apparatus using a batch processing chamber |
USRE39823E1 (en) * | 1990-08-29 | 2007-09-11 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
US8297319B2 (en) * | 2006-09-14 | 2012-10-30 | Brooks Automation, Inc. | Carrier gas system and coupling substrate carrier to a loadport |
US20130186803A1 (en) * | 2012-01-20 | 2013-07-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer transfer pod for reducing wafer particulate contamination |
US20140197068A1 (en) * | 2013-01-16 | 2014-07-17 | Samsung Electronics Co., Ltd. | Wafer holding apparatus |
US8796589B2 (en) * | 2001-07-15 | 2014-08-05 | Applied Materials, Inc. | Processing system with the dual end-effector handling |
US20160133490A1 (en) * | 2014-11-11 | 2016-05-12 | Applied Materials, Inc. | Methods and apparatus for transferring a substrate |
US20160133494A1 (en) * | 2014-11-11 | 2016-05-12 | Applied Materials, Inc. | Substrate transfer chamber |
US9564350B1 (en) * | 2015-09-18 | 2017-02-07 | Globalfoundries Inc. | Method and apparatus for storing and transporting semiconductor wafers in a vacuum pod |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3756383A (en) * | 1972-04-12 | 1973-09-04 | K Kryter | Storage case for magnetic tape cassettes, their boxes and the like |
US4150960A (en) * | 1976-08-23 | 1979-04-24 | Envirotech Corporation | Moveable top seal for an eliminator sheet core |
US4779730A (en) * | 1988-01-05 | 1988-10-25 | Hartsfield John W | Media box storage container |
US5042671A (en) * | 1989-09-20 | 1991-08-27 | International Business Machines Corporation | Versatile product carrier |
US5097946A (en) * | 1990-04-06 | 1992-03-24 | Emrich Richard A | Storage unit for compact discs and the like |
US5472086A (en) * | 1994-03-11 | 1995-12-05 | Holliday; James E. | Enclosed sealable purgible semiconductor wafer holder |
AU716538B2 (en) * | 1994-11-01 | 2000-02-24 | Boland, Helen Jane | Racks and carriers for CD-cases |
JP3796782B2 (en) | 1995-11-13 | 2006-07-12 | アシスト シンコー株式会社 | Mechanical interface device |
US5819927A (en) * | 1997-02-24 | 1998-10-13 | Yeh; Sheng-Fu | CD container storage device |
US6010008A (en) | 1997-07-11 | 2000-01-04 | Fluoroware, Inc. | Transport module |
US6020995A (en) * | 1998-05-15 | 2000-02-01 | Systec Inc. | Folding rack for microscope slides |
KR20000043451A (en) | 1998-12-29 | 2000-07-15 | 윤종용 | Chemical mechanical polishing apparatus with location alignment part |
JP2000289795A (en) * | 1999-04-06 | 2000-10-17 | Kakizaki Mamufacuturing Co Ltd | Container for housing and transporting thin plate |
WO2001001828A1 (en) | 1999-07-02 | 2001-01-11 | Spi/Semicon | Wafer container |
US6662950B1 (en) * | 1999-10-25 | 2003-12-16 | Brian R. Cleaver | Wafer shipping and storage container |
US6848579B2 (en) * | 1999-10-25 | 2005-02-01 | Brian Cleaver | Shock absorbing apparatus and method |
US7328727B2 (en) * | 2004-04-18 | 2008-02-12 | Entegris, Inc. | Substrate container with fluid-sealing flow passageway |
KR100568869B1 (en) | 2004-05-17 | 2006-04-10 | 삼성전자주식회사 | Cassette position adjusting device and method of semiconductor manufacturing equipment |
JP4667769B2 (en) * | 2004-06-11 | 2011-04-13 | 信越ポリマー株式会社 | Substrate storage container |
TWI475129B (en) | 2010-12-15 | 2015-03-01 | Ncd Co Ltd | Method and system for thin film deposition |
JP2014007344A (en) * | 2012-06-26 | 2014-01-16 | Disco Abrasive Syst Ltd | Housing cassette |
TWM485416U (en) * | 2014-04-21 | 2014-09-01 | K J Applied Materials Co Ltd | Light guiding plate structure |
-
2015
- 2015-11-05 US US14/933,651 patent/US10566226B2/en not_active Expired - Fee Related
- 2015-11-10 WO PCT/US2015/059828 patent/WO2016077270A1/en active Application Filing
- 2015-11-10 TW TW104137033A patent/TWI674227B/en not_active IP Right Cessation
- 2015-11-10 TW TW108124300A patent/TWI745713B/en not_active IP Right Cessation
-
2019
- 2019-06-05 US US16/432,568 patent/US20190326147A1/en not_active Abandoned
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4500407A (en) * | 1983-07-19 | 1985-02-19 | Varian Associates, Inc. | Disk or wafer handling and coating system |
USRE39823E1 (en) * | 1990-08-29 | 2007-09-11 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
US20020061248A1 (en) * | 2000-07-07 | 2002-05-23 | Applied Materials, Inc. | High productivity semiconductor wafer processing system |
US8796589B2 (en) * | 2001-07-15 | 2014-08-05 | Applied Materials, Inc. | Processing system with the dual end-effector handling |
US20060156979A1 (en) * | 2004-11-22 | 2006-07-20 | Applied Materials, Inc. | Substrate processing apparatus using a batch processing chamber |
US8297319B2 (en) * | 2006-09-14 | 2012-10-30 | Brooks Automation, Inc. | Carrier gas system and coupling substrate carrier to a loadport |
US20130186803A1 (en) * | 2012-01-20 | 2013-07-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer transfer pod for reducing wafer particulate contamination |
US20140197068A1 (en) * | 2013-01-16 | 2014-07-17 | Samsung Electronics Co., Ltd. | Wafer holding apparatus |
US20160133490A1 (en) * | 2014-11-11 | 2016-05-12 | Applied Materials, Inc. | Methods and apparatus for transferring a substrate |
US20160133494A1 (en) * | 2014-11-11 | 2016-05-12 | Applied Materials, Inc. | Substrate transfer chamber |
US9564350B1 (en) * | 2015-09-18 | 2017-02-07 | Globalfoundries Inc. | Method and apparatus for storing and transporting semiconductor wafers in a vacuum pod |
Also Published As
Publication number | Publication date |
---|---|
WO2016077270A1 (en) | 2016-05-19 |
TW202000548A (en) | 2020-01-01 |
TW201617276A (en) | 2016-05-16 |
US10566226B2 (en) | 2020-02-18 |
US20160133491A1 (en) | 2016-05-12 |
TWI674227B (en) | 2019-10-11 |
TWI745713B (en) | 2021-11-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11302549B2 (en) | Substrate vacuum transport and storage apparatus | |
US20190326147A1 (en) | Multi-cassette carrying case | |
KR102757160B1 (en) | Front opening ring pod | |
TWI757936B (en) | Apparatus, system, and method for processing substrates | |
US10553469B2 (en) | Sealed substrate carriers and systems and methods for transporting substrates | |
US9543180B2 (en) | Apparatus and method for transporting wafers between wafer carrier and process tool under vacuum | |
US11594439B2 (en) | Frame cassette for holding tape-frames | |
CN110383452B (en) | Load port operation in electronic device manufacturing apparatus, systems, and methods | |
US10153187B2 (en) | Methods and apparatus for transferring a substrate | |
US9779971B2 (en) | Methods and apparatus for rapidly cooling a substrate | |
US11923217B2 (en) | Processing system having a front opening unified pod (FOUP) load lock | |
US20210292104A1 (en) | Substrate processing system carrier | |
US20230415936A1 (en) | Load port and method for opening/closing storage container | |
US10586722B2 (en) | Vacuum substrate storage | |
TW201543599A (en) | Vertical heat treatment apparatus | |
US20240190026A1 (en) | Carrier with rotation prevention feature |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: APPLIED MATERIALS, INC., CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:NEMANI, SRINIVAS D.;YIEH, ELLIE Y.;RICE, MICHAEL;AND OTHERS;SIGNING DATES FROM 20151201 TO 20160225;REEL/FRAME:049447/0960 |
|
AS | Assignment |
Owner name: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD., Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:THIRUNAVUKARASU, SRISKANTHARAJAH;PEH, ENG SHENG;SUNDARRAJAN, ARVIND;REEL/FRAME:049642/0280 Effective date: 20151124 |
|
AS | Assignment |
Owner name: APPLIED MATERIALS, INC., CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.;REEL/FRAME:049676/0148 Effective date: 20160210 |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: FINAL REJECTION MAILED |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |