US20150004337A1 - Method for coating a substrate surface and coated product - Google Patents
Method for coating a substrate surface and coated product Download PDFInfo
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- US20150004337A1 US20150004337A1 US14/324,091 US201414324091A US2015004337A1 US 20150004337 A1 US20150004337 A1 US 20150004337A1 US 201414324091 A US201414324091 A US 201414324091A US 2015004337 A1 US2015004337 A1 US 2015004337A1
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- tungsten
- molybdenum
- titanium
- tantalum
- niobium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/02—Alloys based on vanadium, niobium, or tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/04—Alloys based on tungsten or molybdenum
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/137—Spraying in vacuum or in an inert atmosphere
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the present invention relates to a method of applying coatings which contain only small amounts of gaseous impurities, in particular oxygen.
- tungsten and copper impurities which originate from the electrodes used, are introduced into the coating, which is generally undesirable.
- impurities reduce the protective effect of the coating by the formation of so-called micro-galvanic cells.
- WO-A-03/106,051 discloses a method and an apparatus for low pressure cold spraying. In this process a coating of powder particles is sprayed in a gas substantially at ambient temperatures onto a workpiece. The process is conducted in a low ambient pressure environment which is less than atmospheric pressure to accelerate the sprayed powder particles. With this process a coating of a powder is formed on a workpiece.
- EP-A-1,382,720 discloses another method and apparatus for low pressure cold spraying.
- the target to be coated and the cold spray gun are located within a vacuum chamber at pressures below 80 kPa. With this process a workpiece is coated with a powder.
- An aspect of the present invention was to provide a novel process for coating substrates which is distinguished by the introduction of a small amount of energy, a low outlay in terms of apparatus and broad applicability for different carrier materials and coating materials, and wherein the metal to be applied is not melted on during processing.
- An additional aspect of the present invention was the provision of a novel process for preparing dense and corrosion resistant coatings, especially tantalum coatings, which possess low content of impurities, preferably low content of oxygen and nitrogen impurities, which coatings are highly qualified for use as corrosion protective layer, especially in equipment of chemical plants.
- the present invention provides a cold sprayed layer of tungsten, molybdenum, titanium, zirconium, or of mixtures of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of tungsten, molybdenum, titanium, zirconium with other metals, wherein the cold spayed layer has an oxygen content of below 1000 ppm.
- FIG. 1 shows an unetched cross-section of a tantalum coating, process gas helium
- FIG. 2 shows an unetched cross-section of a tantalum coating, process gas helium, overview picture with low magnification
- FIG. 3 shows a cross-section of a tantalum coating, etched with hydrofluoric acid, process gas helium, overview picture with low magnification
- FIG. 4 shows a cross-section of a tantalum coating, etched with hydrofluoric acid, process gas helium
- FIG. 5 shows an image section used for porosity determination, cross-section of a tantalum coating, process gas helium
- FIG. 6 shows a cross-section of a tantalum coating, etched with hydrofluoric acid, interface with the substrate, process gas helium;
- FIG. 7 shows an unetched cross-section of a tantalum coating, process gas nitrogen, overview picture with low magnification
- FIG. 8 shows an unetched cross-section of a tantalum coating, process gas nitrogen
- FIG. 9 shows an image section used for porosity determination, cross-section of a tantalum coating, process gas nitrogen.
- FIG. 10 shows an unetched cross-section of a tantalum coating, process gas nitrogen, high magnification.
- cold spray process or the kinetic spray process are particularly suitable for the method according to the invention; the cold spray process, which is described in EP-A-484533, is especially suitable, and this specification is incorporated herein by reference.
- a gas flow forms a gas-powder mixture with a powder of a material selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of at least two thereof or their alloys with one another or with other metals, the powder has a particle size of from 0.5 to 150 ⁇ m, wherein a supersonic speed is imparted to the gas flow and a jet of supersonic speed is formed, which ensures a speed of the powder in the gas-powder mixture of from 300 to 2000 m/s, preferably from 300 to 1200 m/s, and the jet is directed onto the surface of an object.
- the metal powder particles striking the surface of the object form a coating, the particles being deformed very considerably.
- the powder particles are advantageously present in the jet in an amount that ensures a flow rate density of the particles of from 0.01 to 200 g/s cm 2 , preferably 0.01 to 100 g/s cm 2 , very preferably 0.01 g/s cm 2 to 20 g/s cm 2 , or most preferred from 0.05 g/s cm 2 to 17 g/s cm 2 .
- an inert gas such as argon, neon, helium, nitrogen or mixtures of two or more thereof.
- air may also be used. If safety regulations are met also use of hydrogen or mixtures of hydrogen with other gases can be used.
- the spraying comprises the steps of:
- the spraying is performed with a cold spray gun and the target to be coated and the cold spray gun are located within a vacuum chamber at pressures below 80 kPa, preferably between 0.1 and 50 kPa, and most preferred between 2 and 10 kPa.
- the refractory metal has a purity of 99% or more, such as 99.5% or 99.7% or 99.9%.
- the refractory metal advantageously has a purity of at least 99.95%, based on metallic impurities, especially of at least 99.995% or of at least 99.999%, in particular of at least 99.9995%. If an alloy is used instead of a single refractory metal, then at least the refractory metal, but preferably the alloy as a whole, has that purity, so that a corresponding highly pure coating can be produced.
- the metal powder has an oxygen content of less than 1000 ppm oxygen, or less than 500, or less than 300, in particular an oxygen content of less than 100 ppm.
- Particularly suitable refractory metal powders have a purity of at least 99.7%, advantageously of at least 99.9%, in particular 99.95%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- Particularly suitable refractory metal powders have a purity of at least 99.95%, in particular of at least 99.995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- Particularly suitable refractory metal powders have a purity of at least 99.999%, in particular of at least 99.9995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- the total content of other non-metallic impurities should advantageously be less than 500 ppm, preferably less than 150 ppm.
- the oxygen content is advantageously 50 ppm or less, the nitrogen content is 25 ppm or less and the carbon content is 25 ppm or less.
- the content of metallic impurities is advantageously 500 ppm or less, preferably 100 ppm or less and most preferably 50 ppm or less, in particular 10 ppm or less.
- Suitable metal powders are, for example, many of the refractory metal powders which are also suitable for the production of capacitors.
- Such metal powders can be prepared by reduction of refractory metal compound with a reducing agent and preferably subsequent deoxidation.
- Tungsten oxide or molybdenum oxide for example, is reduced in a stream of hydrogen at elevated temperature.
- the preparation is described, for example, in Schubert, Lassner, “Tungsten”, Kluwer Academic/Plenum Publishers, New York, 1999 or Brauer, “Handbuch der Praparativen Anorganischen Chemie”, originally Enke Verlag Stuttgart, 1981, p 1530.
- the preparation is in most cases carried out by reducing alkali heptafluoro-tantalates and earth alkaline metal heptafluoro-tantalates or the oxides, such as, for example, sodium heptafluorotantalate, potassium heptafluorotantalate, sodium heptafluoroniobate or potassium heptafluoroniobate, with an alkali or alkaline earth metal.
- the reduction can be carried out in a salt melt with the addition of, for example, sodium, or in the gas phase, calcium or magnesium vapour advantageously being used.
- deoxidation is preferably carried out. This can be effected, for example, by mixing the refractory metal powder with Mg, Ca, Ba, La, Y or Ce and then heating, or by heating the refractory metal in the presence of a getter in an atmosphere that allows oxygen to pass from the metal powder to the getter.
- the refractory metal powder is in most cases then freed of the salts of the deoxidising agent using an acid and water, and is dried.
- the metallic impurities can be kept low.
- a further process for preparing pure powder having a low oxygen content consists in reducing a refractory metal hydride using an alkaline earth metal as reducing agent, as disclosed, for example, in WO 01/12364 and EP-A-1200218.
- the thickness of the coating is usually more than 0.01 mm.
- the thickness may be higher as well, for example from 3 to 50 mm, or from 5 to 45 mm, or from 8 to 40 mm, or from 10 to 30 mm or from 10 to 20 mm or 10 to 15 mm.
- the purities and oxygen contents of the resulting coatings should deviate not more than 50% and preferably not more than 20% from those of the powder.
- this can be achieved by coating the substrate surface under an inert gas.
- Argon is advantageously used as the inert gas because, owing to its higher density than air, it tends to cover the object to be coated and to remain present, in particular when the surface to be coated is located in a vessel which prevents the argon from escaping or flowing away and more argon is continuously added.
- the coatings applied according to the invention have a high purity and a low oxygen content.
- these coatings have an oxygen content of less than 1000 ppm oxygen, or less than 500, or less than 300, in particular an oxygen content of less than 100 ppm.
- the coatings usually exhibit compressive stress a.
- the compressive stress is about ⁇ 1000 MPa to 0 MPa, or from ⁇ 700 MPa to 0 MPa, or from ⁇ 500 MPa to 0 MPa, of from ⁇ 400 MPa to 0 MPa or from ⁇ 300 MPa to 0. More specifically, the compressive stress is from ⁇ 200 MPa to ⁇ 1000 MPa, or from ⁇ 300 MPa to ⁇ 700 MPa, or from ⁇ 300 MPa to ⁇ 500 MPa.
- a lower oxygen content of the powder employed will result in layers exhibiting lower compressive stress, e.g. a layer sprayed from powder having an oxygen content of 1400 ppm will usually result in a layer exhibiting compressive stress of about ⁇ 970 ⁇ 50 MPa MPa and a layer sprayed from powder having an oxygen content of 270 ppm will usually result in a layer exhibiting compressive stress of about ⁇ 460 MPa ⁇ 50 MPa, more preferably ⁇ 400 MPa ⁇ 50 MPa.
- layers produced by plasma spraying result in layers exhibiting no compressive stress at all, but tensile stress.
- these coatings have a purity of at least 99.7%, advantageously of at least 99.9%, in particular of at least 99.95%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- these coatings have a purity of at least 99.95%, in particular of at least 99.995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- these coatings have a purity of 99.999%, in particular of at least 99.9995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- the coatings according to the invention have a total content of other non-metallic impurities, such as carbon, nitrogen or hydrogen, which is advantageously below 500 ppm and most preferably below 150 ppm.
- the applied coating has a content of gaseous impurities which differs by not more than 50%, or not more than 20%, or not more than 10%, or not more than 5%, or not more than 1%, from the content of the starting powder with which this coating was produced.
- the term “differs” is to be understood as meaning in particular an increase; the resulting coatings should, therefore, advantageously have a content of gaseous impurities that is not more than 50% greater than the content of the starting powder.
- the applied coating preferably has an oxygen content which differs by not more than 5%, in particular not more than 1%, from the oxygen content of the starting powder.
- the coatings according to the invention preferably have a total content of other non-metallic impurities, such as carbon, nitrogen or hydrogen, which is advantageously less than 500 ppm and most preferably less than 150 ppm. With the process of this invention layers with higher impurity contents can also be produced.
- the oxygen content is advantageously 50 ppm or less, the nitrogen content is 25 ppm or less and the carbon content is 25 ppm or less.
- the content of metallic impurities is advantageously 50 ppm or less, in particular 10 ppm or less.
- the coatings additionally have a density of at least 97%, preferably greater than 98%, in particular greater than 99% or 99.5%.
- 97% density of a layer means that the layer has a density of 97% of the bulk material.
- the density of the coating is here a measure of the closed nature and porosity of the coating.
- a closed, substantially pore-free coating always has a density of more than 99.5%.
- the density can be determined either by image analysis of a cross-sectional image (ground section) of such a coating, or alternatively by helium pycnometry. The latter method is less preferred because, in the case of very dense coatings, pores present in coatings that are more remote from the surface are not detected and a lower porosity is accordingly measured than actually exists.
- the density can be determined by first determining the total area of the coating to be investigated in the image area of the microscope and relating this area to the areas of the pores. In this method, pores that are located far from the surface and close to the interface with the substrate are also detected.
- the coatings show high mechanical strength which is caused by their high density and by the high deformation of the particles.
- the strengths are at least 80 MPa more preferably at least 100 MPa, most preferably at least 140 MPa when nitrogen is used as the gas with which the metal powder forms a gas-powder mixture.
- the strength usually is at least 150 MPa, preferably at least 170 MPa, most preferably at least 200 MPa and very most preferred greater than 250 MPa.
- the coatings according to the invention show high densities and low porosities, the coatings have a morphology clearly showing it was created from discrete particles. Examples can be seen, for example, in FIGS. 1 to 7 .
- the coatings according to the invention can be distinguished over coatings obtained by other methods, like coatings obtained by galvanic processes.
- the characteristic appearance also allows distinguishing of coatings according to the invention from coatings obtained by plasma spraying.
- the articles to be coated with the process of this invention are not limited. Generally all articles which need a coating, preferably a corrosion protective coating, can be used. These articles may be made of metal and/or of ceramic material and/or of plastic material or may comprise components from these materials. Preferably surfaces of materials are coated which are subject to removal of material, for example by wear, corrosion, oxidation, etching, machining or other stress.
- Preferably surfaces of materials are coated with the process of this invention which are used in corroding surroundings, for example in chemical processes in medical devices or in implants.
- apparatus or components to be coated are components used in chemical plants or in laboratories or in medical devices or as implants, such as reaction and mixing vessels, stirrers, blind flanges, thermowells, birsting disks, birsting disk holders, heat exchangers (shell and tubes), pipings, valves, valve bodies and pump parts.
- articles are coated with the process of this invention which are no sputter targets or X-ray anodes.
- the coatings prepared with the process of this invention preferably are used in corrosion protection.
- the present invention therefore relates also to articles made of metal and/or of ceramic material and/or of plastic material containing at least one coatings composed of the refractory metals niobium, tantalum, tungsten, molybdenum, titanium zirconium or mixtures of two or more thereof or alloys of two or more thereof or alloys with other metals, which coatings have the above-mentioned properties.
- Such coatings are in particular coatings of tantalum or niobium.
- layers of tungsten, molybdenum, titanium zirconium or mixtures of two or more thereof or alloys of two or more thereof or alloys with other metals are applied by cold spraying to the surface of a substrate to be coated.
- said powders or powder mixtures preferably with tantalum and niobium powders, possessing a reduced oxygen content, for example an oxygen content below 1000 ppm, there can be produced cold sprayed layers with very high deposition rates of more than 90%.
- said cold sprayed layers the oxygen content of the metal is nearly unchanged compared to the oxygen content of the powders.
- These cold sprayed layers show considerably higher densities than layers produced by plasma spraying or by vacuum spraying. Furthermore, these cold sprayed layers can be produced without any or with small texture, depending on powder properties and coating parameters. These cold sprayed layers are also object of this invention.
- Suitable metal powders for use in the methods according to the invention are also metal powders that consist of alloys, pseudo alloys and powder mixtures of refractory metals with suitable non-refractory metals.
- alloys include especially alloys, pseudo alloys or powder mixtures of a refractory metal selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium or mixtures of two or more thereof, with a metal selected from the group cobalt, nickel, rhodium, palladium, platinum, copper, silver and gold.
- a refractory metal selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium or mixtures of two or more thereof, with a metal selected from the group cobalt, nickel, rhodium, palladium, platinum, copper, silver and gold.
- Alloy powders are in most cases obtainable by melting and mixing the alloying partners. According to the invention there may be used as alloy powders also so-called pre-alloyed powders. These are powders which are produced by mixing compounds such as, for example, salts, oxides and/or hydrides of the alloying partners and then reducing them, so that intimate mixtures of the metals in question are obtained. It is additionally possible according to the invention to use pseudo alloys. Pseudo alloys are understood as being materials which are obtained not by conventional melt metallurgy but, for example, by grinding, sintering or infiltration.
- tungsten/copper alloys or tungsten/copper mixtures, the properties of which are known and are listed here by way of example:
- molybdenum-silver alloys or molybdenium/silver mixtures which contain, for example, 10, 40 or 65 wt. % molybdenum.
- tungsten-silver alloys or tungsten/silver mixtures which contain, for example, 10, 40 or 65 wt. % tungsten.
- tungsten-rhenium alloys or mixtures or the metal powder is an alloy having the following composition: from 94 to 99 wt. %, preferably from 95 to 97 wt. %, molybdenum, from 1 to 6 wt. %, preferably from 2 to 4 wt. %, niobium, from 0.05 to 1 wt. %, preferably from 0.05 to 0.02 wt. %, zirconium.
- alloys like pure refractory metal powders having a purity of at least 99.95%, can be used in the recycling or production of sputter targets by means of cold gas spraying.
- Suitable materials for the methods according to the invention are listed in Tables 1 to 15. Individual materials are designated with the number of the table followed by the number of the combination of components and the amount of the non-refractory metal as in Table 1. For example, material 2.005 is a material described in Table 2, the precise composition being defined with the non-refractory metal and the amount thereof as listed in Table 1, position no. 5.
- Suitable niobium alloys are listed in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 1.001 Niobium Cobalt 2-5 1.002 Niobium Nickel 2-5 1.003 Niobium Rhodium 2-5 1.004 Niobium Palladium 2-5 1.005 Niobium Platinum 2-5 1.006 Niobium Copper 2-5 1.007 Niobium Silver 2-5 1.008 Niobium Gold 2-5 1.009 Niobium Cobalt 5-10 1.010 Niobium Nickel 5-10 1.011 Niobium Rhodium 5-10 1.012 Niobium Palladium 5-10 1.013 Niobium Platinum 5-10 1.014 Niobium Copper 5-10 1.015 Niobium Silver 5-10 1.016 Niobium Gold 5-10 1.017 Niobium Cobalt 10-15 1.018 Niobium Nickel 10-15 1.019 Niobium Rhodium 10-15 1.020 Niobium Palladium 10-15 1.021 Niobium Platinum 10-15 1.022 Niobium Copper 10-15 1.023 Niobium Silver 10-15 1.024 Niobium Gold
- Table 2 consists of 48 alloys, the refractory metal being tantalum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Table 3 consists of 48 alloys, the refractory metal being tungsten instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 3.001 Tungsten Cobalt 2-5 3.002 Tungsten Nickel 2-5 3.003 Tungsten Rhodium 2-5 3.004 Tungsten Palladium 2-5 3.005 Tungsten Platinum 2-5 3.006 Tungsten Copper 2-5 3.007 Tungsten Silver 2-5 3.008 Tungsten Gold 2-5 3.009 Tungsten Cobalt 5-10 3.010 Tungsten Nickel 5-10 3.011 Tungsten Rhodium 5-10 3.012 Tungsten Palladium 5-10 3.013 Tungsten Platinum 5-10 3.014 Tungsten Copper 5-10 3.015 Tungsten Silver 5-10 3.016 Tungsten Gold 5-10 3.017 Tungsten Cobalt 10-15 3.018 Tungsten Nickel 10-15 3.019 Tungsten Rhodium 10-15 3.020 Tungsten Palladium 10-15 3.021 Tungsten Platinum 10-15 3.022 Tungsten Copper 10-15 3.023 Tungsten Silver 10-15 3.024 Tungsten Gold
- Table 4 consists of 48 alloys, the refractory metal being molybdenum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 4.001 Molybdenum Cobalt 2-5 4.002 Molybdenum Nickel 2-5 4.003 Molybdenum Rhodium 2-5 4.004 Molybdenum Palladium 2-5 4.005 Molybdenum Platinum 2-5 4.006 Molybdenum Copper 2-5 4.007 Molybdenum Silver 2-5 4.008 Molybdenum Gold 2-5 4.009 Molybdenum Cobalt 5-10 4.010 Molybdenum Nickel 5-10 4.011 Molybdenum Rhodium 5-10 4.012 Molybdenum Palladium 5-10 4.013 Molybdenum Platinum 5-10 4.014 Molybdenum Copper 5-10 4.015 Molybdenum Silver 5-10 4.016 Molybdenum Gold 5-10 4.017 Molybdenum Cobalt 10-15 4.018 Molybdenum Nickel 10-15 4.019 Molybdenum Rhodium 10-15 4.020
- Table 5 consists of 48 alloys, the refractory metal being titanium instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 5.001 Titanium Cobalt 2-5 5.002 Titanium Nickel 2-5 5.003 Titanium Rhodium 2-5 5.004 Titanium Palladium 2-5 5.005 Titanium Platinum 2-5 5.006 Titanium Copper 2-5 5.007 Titanium Silver 2-5 5.008 Titanium Gold 2-5 5.009 Titanium Cobalt 5-10 5.010 Titanium Nickel 5-10 5.011 Titanium Rhodium 5-10 5.012 Titanium Palladium 5-10 5.013 Titanium Platinum 5-10 5.014 Titanium Copper 5-10 5.015 Titanium Silver 5-10 5.016 Titanium Gold 5-10 5.017 Titanium Cobalt 10-15 5.018 Titanium Nickel 10-15 5.019 Titanium Rhodium 10-15 5.020 Titanium Palladium 10-15 5.021 Titanium Platinum 10-15 5.022 Titanium Copper 10-15 5.023 Titanium Silver 10-15 5.024 Titanium Gold 10-15 5.025 Titanium Cobalt 15-20 5.026 Titanium Nickel 15-20 5.027 Titanium Rho
- Table 6 Table 6 consists of 48 pseudo alloys, the refractory metal being tantalum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Table 7 consists of 48 pseudo alloys, the refractory metal being tungsten instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 7.001 Tungsten Cobalt 2-5 7.002 Tungsten Nickel 2-5 7.003 Tungsten Rhodium 2-5 7.004 Tungsten Palladium 2-5 7.005 Tungsten Platinum 2-5 7.006 Tungsten Copper 2-5 7.007 Tungsten Silver 2-5 7.008 Tungsten Gold 2-5 7.009 Tungsten Cobalt 5-10 7.010 Tungsten Nickel 5-10 7.011 Tungsten Rhodium 5-10 7.012 Tungsten Palladium 5-10 7.013 Tungsten Platinum 5-10 7.014 Tungsten Copper 5-10 7.015 Tungsten Silver 5-10 7.016 Tungsten Gold 5-10 7.017 Tungsten Cobalt 10-15 7.018 Tungsten Nickel 10-15 7.019 Tungsten Rhodium 10-15 7.020 Tungsten Palladium 10-15 7.021 Tungsten Platinum 10-15 7.022 Tungsten Copper 10-15 7.023 Tungsten Silver 10-15 7.024 Tungsten Gold
- Table 8 consists of 48 pseudo alloys, the refractory metal being molybdenum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 8.001 Molybdenum Cobalt 2-5 8.002 Molybdenum Nickel 2-5 8.003 Molybdenum Rhodium 2-5 8.004 Molybdenum Palladium 2-5 8.005 Molybdenum Platinum 2-5 8.006 Molybdenum Copper 2-5 8.007 Molybdenum Silver 2-5 8.008 Molybdenum Gold 2-5 8.009 Molybdenum Cobalt 5-10 8.010 Molybdenum Nickel 5-10 8.011 Molybdenum Rhodium 5-10 8.012 Molybdenum Palladium 5-10 8.013 Molybdenum Platinum 5-10 8.014 Molybdenum Copper 5-10 8.015 Molybdenum Silver 5-10 8.016 Molybdenum Gold 5-10 8.017 Molybdenum Cobalt 10-15 8.018 Molybdenum Nickel 10-15 8.019 Molybdenum Rhodium 10-15 8.020
- Table 9 consists of 48 pseudo alloys, the refractory metal being titanium instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal 9.001 Titanium Cobalt 2-5 9.002 Titanium Nickel 2-5 9.003 Titanium Rhodium 2-5 9.004 Titanium Palladium 2-5 9.005 Titanium Platinum 2-5 9.006 Titanium Copper 2-5 9.007 Titanium Silver 2-5 9.008 Titanium Gold 2-5 9.009 Titanium Cobalt 5-10 9.010 Titanium Nickel 5-10 9.011 Titanium Rhodium 5-10 9.012 Titanium Palladium 5-10 9.013 Titanium Platinum 5-10 9.014 Titanium Copper 5-10 9.015 Titanium Silver 5-10 9.016 Titanium Gold 5-10 9.017 Titanium Cobalt 10-15 9.018 Titanium Nickel 10-15 9.019 Titanium Rhodium 10-15 9.020 Titanium Palladium 10-15 9.021 Titanium Platinum 10-15 9.022 Titanium Copper 10-15 9.023 Titanium Silver 10-15 9.024 Titanium Gold 10-15 9.025 Titanium Cobalt 15-20 9.026 Titanium Nickel 15-20 9.027 Titanium Rho
- Table 10 consists of 48 powder mixtures, the refractory metal being tantalum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 10.001 Tantalum Cobalt 2-5 10.002 Tantalum Nickel 2-5 10.003 Tantalum Rhodium 2-5 10.004 Tantalum Palladium 2-5 10.005 Tantalum Platinum 2-5 10.006 Tantalum Copper 2-5 10.007 Tantalum Silver 2-5 10.008 Tantalum Gold 2-5 10.009 Tantalum Cobalt 5-10 10.010 Tantalum Nickel 5-10 10.011 Tantalum Rhodium 5-10 10.012 Tantalum Palladium 5-10 10.013 Tantalum Platinum 5-10 10.014 Tantalum Copper 5-10 10.015 Tantalum Silver 5-10 10.016 Tantalum Gold 5-10 10.017 Tantalum Cobalt 10-15 10.018 Tantalum Nickel 10-15 10.019 Tantalum Rhodium 10-15 10.020 Tantalum Palladium 10-15 10.021 Tantalum Platinum 10-15 10.022 Tantalum Copper 10-15 10.023 Tantalum Silver 10-15 10.024 Tantalum Gold
- Table 11 consists of 48 powder mixtures, the refractory metal being tungsten instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Table 12 consists of 48 powder mixtures, the refractory metal being molybdenum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 12.001 Molybdenum Cobalt 2-5 12.002 Molybdenum Nickel 2-5 12.003 Molybdenum Rhodium 2-5 12.004 Molybdenum Palladium 2-5 12.005 Molybdenum Platinum 2-5 12.006 Molybdenum Copper 2-5 12.007 Molybdenum Silver 2-5 12.008 Molybdenum Gold 2-5 12.009 Molybdenum Cobalt 5-10 12.010 Molybdenum Nickel 5-10 12.011 Molybdenum Rhodium 5-10 12.012 Molybdenum Palladium 5-10 12.013 Molybdenum Platinum 5-10 12.014 Molybdenum Copper 5-10 12.015 Molybdenum Silver 5-10 12.016 Molybdenum Gold 5-10 12.017 Molybdenum Cobalt 10-15 12.018 Molybdenum Nickel 10-15 12.019 Molybdenum Rhodium 10-15 12.020
- Table 13 consists of 48 powder mixtures, the refractory metal being titanium instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal 13.001 Titanium Cobalt 2-5 13.002 Titanium Nickel 2-5 13.003 Titanium Rhodium 2-5 13.004 Titanium Palladium 2-5 13.005 Titanium Platinum 2-5 13.006 Titanium Copper 2-5 13.007 Titanium Silver 2-5 13.008 Titanium Gold 2-5 13.009 Titanium Cobalt 5-10 13.010 Titanium Nickel 5-10 13.011 Titanium Rhodium 5-10 13.012 Titanium Palladium 5-10 13.013 Titanium Platinum 5-10 13.014 Titanium Copper 5-10 13.015 Titanium Silver 5-10 13.016 Titanium Gold 5-10 13.017 Titanium Cobalt 10-15 13.018 Titanium Nickel 10-15 13.019 Titanium Rhodium 10-15 13.020 Titanium Palladium 10-15 13.021 Titanium Platinum 10-15 13.022 Titanium Copper 10-15 13.023 Titanium Silver 10-15 13.024 Titanium Gold 10-15 13.025 Titanium Cobalt 15-20 13.026 Titanium Nickel 15-20 13.027 Titanium Rho
- Table 14 consists of 48 pseudo alloys, the refractory metal being niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 14.001 Niobium Cobalt 2-5 14.002 Niobium Nickel 2-5 14.003 Niobium Rhodium 2-5 14.004 Niobium Palladium 2-5 14.005 Niobium Platinum 2-5 14.006 Niobium Copper 2-5 14.007 Niobium Silver 2-5 14.008 Niobium Gold 2-5 14.009 Niobium Cobalt 5-10 14.010 Niobium Nickel 5-10 14.011 Niobium Rhodium 5-10 14.012 Niobium Palladium 5-10 14.013 Niobium Platinum 5-10 14.014 Niobium Copper 5-10 14.015 Niobium Silver 5-10 14.016 Niobium Gold 5-10 14.017 Niobium Cobalt 10-15 14.018 Niobium Nickel 10-15 14.019 Niobium Rhodium 10-15 14.020 Niobium Palladium 10-15 14.021 Niobium Platinum 10-15 14.022 Niobium Copper 10-15 14.023 Niobium Silver 10-15 14.024 Niobium Gold
- Table 15 consists of 48 powder mixtures, the refractory metal being niobium and non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
- Non-refractory metal No. Refractory metal
- Non-refractory metal (wt. %) 15.001 Niobium Cobalt 2-5 15.002 Niobium Nickel 2-5 15.003 Niobium Rhodium 2-5 15.004 Niobium Palladium 2-5 15.005 Niobium Platinum 2-5 15.006 Niobium Copper 2-5 15.007 Niobium Silver 2-5 15.008 Niobium Gold 2-5 15.009 Niobium Cobalt 5-10 15.010 Niobium Nickel 5-10 15.011 Niobium Rhodium 5-10 15.012 Niobium Palladium 5-10 15.013 Niobium Platinum 5-10 15.014 Niobium Copper 5-10 15.015 Niobium Silver 5-10 15.016 Niobium Gold 5-10 15.017 Niobium Cobalt 10-15 15.018 Niobium Nickel 10-15 15.019 Niobium Rhodium 10-15 15.020 Niobium Palladium 10-15 15.021 Niobium Platinum 10-15 15.022 Niobium Copper 10-15 15.023 Niobium Silver 10-15 15.024 Niobium Gold
- metal powders which consist of alloys, pseudo alloys and powder mixtures of different refractory metals with one another.
- alloys of molybdenum and titanium in a ratio of 50:50 atomic percent or alloys of tungsten and titanium in an amount of about 90:10 wt. % are known and are suitable for use in the methods according to the invention. In principle, however, all alloys of the refractory metals with one another are suitable for use in the methods according to the invention.
- Tables 16 to 36 Binary alloys, pseudo alloys and powder mixtures of refractory metals that are suitable for the methods according to the invention are listed in Tables 16 to 36. Individual materials are designated with the number of the table followed by the number of the combination of components as in Table 16. For example, material 22.005 is a material described in Table 22, the precise composition being defined by the refractory metals, which are listed in Table 16, position no. 5, and the amount as listed in Table 22.
- Component 1 Component 2 16.001 Nb Ta 16.002 Nb W 16.003 Nb Mo 16.004 Nb Ti 16.005 Ta Nb 16.006 Ta W 16.007 Ta Mo 16.008 Ta Ti 16.009 W Ta 16.010 W Nb 16.011 W Mo 16.012 W Ti 16.013 Mo Ta 16.014 Mo Nb 16.015 Mo W 16.016 Mo Ti 16.017 Ti Ta 16.018 Ti Nb 16.019 Ti W 16.020 Ti Mo
- Table 17 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 2-5 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 18 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 5-10 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being listed in Table 16.
- Table 19 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 10-15 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 20 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 15-20 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 21 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 20-25 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 22 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 25-30 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 23 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 30-35 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 24 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 35-40 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 25 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 40-45 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 26 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 45-50 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 27 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 50-55 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 28 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 55-60 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 29 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 60-65 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 30 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 65-70 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 31 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 70-75 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 32 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 75-80 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 33 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 80-85 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 34 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 85-90 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 35 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 90-95 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- Table 36 Table 36 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 95-99 wt. %, component 2 being present in an amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16.
- a tantalum hydride powder was mixed with 0.3 wt. % magnesium and placed in a vacuum oven.
- the oven was evacuated and filled with argon.
- the pressure was 860 Torr, a stream of argon was maintained.
- the oven temperature was raised to 650° C. in steps of 50° C. and, after a constant temperature had been established, was maintained for four hours.
- the oven temperature was then raised to 1000° C. in steps of 50° C. and, after a constant temperature had been established, was maintained for six hours. At the end of this time, the oven was switched off and cooled to room temperature under argon. Magnesium and the resulting compounds were removed in the conventional manner by acid washing.
- the resulting tantalum powder had a particle size of ⁇ 100 mesh ( ⁇ 150 ⁇ m), an oxygen content of 77 ppm and a specific BET surface area of 255 cm 2 /g.
- the procedure was as for the preparation of the tantalum powder. A titanium powder having an oxygen content of 93 ppm was obtained.
- a mixture of tantalum hydride powder and titanium hydride powder in a molar ratio of 1:1 was prepared and was mixed with 0.3 wt. % magnesium; the procedure as in the preparation of the tantalum powder was then followed.
- a titanium/tantalum powder having an oxygen content of 89 ppm was obtained.
- Tantalum and niobium coatings were produced.
- the tantalum powder used was AMPERIT® 150.090 and the niobium powder used was AMPERIT® 160.090, both of which are commercially available materials from H.C. Starck GmbH in Goslar.
- the commercially available nozzle of the MOC 29 type from CGT GmbH in Ampfing was used.
- Substrates The substrates were placed in succession on the specimen holder and coated under the indicated test conditions.
- the substrate description is made up as follows:
- the number at the beginning indicates the number of identical substrates located next to one another.
- the following letter indicates whether a flat specimen (F) or a round specimen (R, tube) was used.
- the following letters indicate the material, Ta meaning tantalum, S meaning a structural steel, and V meaning a stainless steel (chromium-nickel steel).
- FIGS. 1 to 10 show light microscope pictures of cross-sections of the resulting tantalum coatings. No inclusions of copper or tungsten are detectable, as occurs with corresponding layers produced by vacuum plasma spraying. The porosity determination was carried out automatically by the image analysis program ImageAccess.
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Abstract
The present invention provides a cold sprayed layer of tungsten, molybdenum, titanium, zirconium, or of mixtures of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of tungsten, molybdenum, titanium, zirconium with other metals, wherein the cold spayed layer has an oxygen content of below 1,000 ppm.
Description
- This application is a divisional of U.S. application Ser. No. 11/913,579, filed on Sep. 18, 2009. U.S. application Ser. No. 11/913,579 is a U.S. National Phase application under 35 U.S.C. §371 of International Application No. PCT/EP2006/003967, filed on Apr. 28, 2006, which claims benefit to U.S. Provisional Application No. 60/678,057, filed on May 5, 2005. The International Application was published in English on Nov. 9, 2006 as WO 2006/117144 A1 under PCT Article 21(2).
- The present invention relates to a method of applying coatings which contain only small amounts of gaseous impurities, in particular oxygen.
- The application of refractory metal coatings to surfaces exhibits numerous problems.
- In conventional processes, the metal is completely or partially melted in most cases, as a result of which the metals readily oxidise or absorb other gaseous impurities. For this reason, conventional processes such as deposition-welding and plasma spraying must be carried out under a protecting gas or in vacuo.
- In such cases, the outlay in terms of apparatus is high, the size of the components is limited, and the content of gaseous impurities is still unsatisfactory.
- The pronounced introduction of heat transmitted into the object to be coated leads to a very high potential for distortion and means that these processes cannot be employed in the case of complex components, which often also contain constituents that melt at low temperatures. Complex components must therefore be taken apart before they are re-processed, with the result, in general, that re-processing is scarcely economical and only recycling of the material of the components (scrapping) is carried out.
- Moreover, in the case of vacuum plasma spraying, tungsten and copper impurities, which originate from the electrodes used, are introduced into the coating, which is generally undesirable. In the case of, for example, the use of tantalum or niobium coatings for corrosion protection, such impurities reduce the protective effect of the coating by the formation of so-called micro-galvanic cells.
- Moreover, such processes are processes of melt metallurgy, which always involve the inherent disadvantages thereof, such as, for example, unidirectional grain growth. This occurs in particular in laser processes, where a suitable powder is applied to the surface and melted by means of a laser beam. A further problem is the porosity, which can be observed in particular when a metal powder is first applied and is subsequently melted by means of a heat source. Attempts have been made in WO 02/064287 to solve these problems by merely melting on the powder particles by means of an energy beam, such as, for example, laser beams, and sintering them. However, the results are not always satisfactory and a high outlay in terms of apparatus is required, and the problems associated with the introduction of a reduced but nevertheless high amount of energy into a complex component remain.
- WO-A-03/106,051 discloses a method and an apparatus for low pressure cold spraying. In this process a coating of powder particles is sprayed in a gas substantially at ambient temperatures onto a workpiece. The process is conducted in a low ambient pressure environment which is less than atmospheric pressure to accelerate the sprayed powder particles. With this process a coating of a powder is formed on a workpiece.
- EP-A-1,382,720 discloses another method and apparatus for low pressure cold spraying. In this process the target to be coated and the cold spray gun are located within a vacuum chamber at pressures below 80 kPa. With this process a workpiece is coated with a powder.
- An aspect of the present invention was to provide a novel process for coating substrates which is distinguished by the introduction of a small amount of energy, a low outlay in terms of apparatus and broad applicability for different carrier materials and coating materials, and wherein the metal to be applied is not melted on during processing.
- An additional aspect of the present invention was the provision of a novel process for preparing dense and corrosion resistant coatings, especially tantalum coatings, which possess low content of impurities, preferably low content of oxygen and nitrogen impurities, which coatings are highly qualified for use as corrosion protective layer, especially in equipment of chemical plants.
- In an embodiment, the present invention provides a cold sprayed layer of tungsten, molybdenum, titanium, zirconium, or of mixtures of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of tungsten, molybdenum, titanium, zirconium with other metals, wherein the cold spayed layer has an oxygen content of below 1000 ppm.
- The present invention is described in greater detail below on the basis of embodiments and of the drawings in which:
-
FIG. 1 shows an unetched cross-section of a tantalum coating, process gas helium; -
FIG. 2 shows an unetched cross-section of a tantalum coating, process gas helium, overview picture with low magnification; -
FIG. 3 shows a cross-section of a tantalum coating, etched with hydrofluoric acid, process gas helium, overview picture with low magnification; -
FIG. 4 shows a cross-section of a tantalum coating, etched with hydrofluoric acid, process gas helium; -
FIG. 5 shows an image section used for porosity determination, cross-section of a tantalum coating, process gas helium; -
FIG. 6 shows a cross-section of a tantalum coating, etched with hydrofluoric acid, interface with the substrate, process gas helium; -
FIG. 7 shows an unetched cross-section of a tantalum coating, process gas nitrogen, overview picture with low magnification; -
FIG. 8 shows an unetched cross-section of a tantalum coating, process gas nitrogen; -
FIG. 9 shows an image section used for porosity determination, cross-section of a tantalum coating, process gas nitrogen; and -
FIG. 10 shows an unetched cross-section of a tantalum coating, process gas nitrogen, high magnification. - There are generally suitable for this purpose processes in which, in contrast to the conventional processes of thermal spraying (flame, plasma, high-velocity flame, arc, vacuum plasma, low-pressure plasma spraying) and of deposition-welding, there is no melting on of the coating material, caused by thermal energy produced in the coating apparatus. Contact with a flame or hot combustion gases is to be avoided, because these can cause oxidation of the powder particles and hence the oxygen content in the resulting coatings rises.
- These processes are known to the person skilled in the art as, for example, cold gas spraying, cold spray processes, cold gas dynamic spraying, kinetic spraying and are described, for example, in EP-A-484533. Also suitable according to the invention is the process described in patent DE-A-10253794.
- The so-called cold spray process or the kinetic spray process are particularly suitable for the method according to the invention; the cold spray process, which is described in EP-A-484533, is especially suitable, and this specification is incorporated herein by reference.
- Accordingly, there is advantageously employed a method for applying coatings to surfaces, wherein a gas flow forms a gas-powder mixture with a powder of a material selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of at least two thereof or their alloys with one another or with other metals, the powder has a particle size of from 0.5 to 150 μm, wherein a supersonic speed is imparted to the gas flow and a jet of supersonic speed is formed, which ensures a speed of the powder in the gas-powder mixture of from 300 to 2000 m/s, preferably from 300 to 1200 m/s, and the jet is directed onto the surface of an object.
- The metal powder particles striking the surface of the object form a coating, the particles being deformed very considerably.
- The powder particles are advantageously present in the jet in an amount that ensures a flow rate density of the particles of from 0.01 to 200 g/s cm2, preferably 0.01 to 100 g/s cm2, very preferably 0.01 g/s cm2 to 20 g/s cm2, or most preferred from 0.05 g/s cm2 to 17 g/s cm2.
- The flow rate density is calculated according to the formula F=m/(π/4*D2) where F=flow rate density, D=nozzle cross-section, m=powder feed rate. A powder feed rate of, for example, 70 g/min=1.1667 g/s is a typical example of a powder feed rate.
- At low D values of below 2 mm values of markedly greater than 20 g/s cm2 can be achieved. In this case F can easily assume values 50 g/s cm2 or even higher at higher powder delivery rates.
- As the gas with which the metal powder forms a gas-powder mixture there is generally used an inert gas such as argon, neon, helium, nitrogen or mixtures of two or more thereof. In particular cases, air may also be used. If safety regulations are met also use of hydrogen or mixtures of hydrogen with other gases can be used.
- In a preferred version of the process the spraying comprises the steps of:
-
- providing a spraying orifice adjacent a surface to be coated by spraying;
- providing to the spraying orifice a powder of a particulate material chosen from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of at least two thereof or alloys thereof with one another or other metals, the powder having a particle size of 0.5 to 150 μm, said powder being under pressure;
- providing an inert gas under pressure to the spraying orifice to establish a static pressure at the spraying orifice and providing a spray of said particulate material and gas onto the surface to be coated; and
- locating the spraying orifice in a region of low ambient pressure which is less than 1 atmosphere and which is substantially less than the static pressure at the spraying orifice to provide substantial acceleration of the spray of said particulate material and gas onto said surface to be coated.
- In another preferred version of the process the spraying is performed with a cold spray gun and the target to be coated and the cold spray gun are located within a vacuum chamber at pressures below 80 kPa, preferably between 0.1 and 50 kPa, and most preferred between 2 and 10 kPa. Further advantageous embodiments can be found in the claims.
- In general, the refractory metal has a purity of 99% or more, such as 99.5% or 99.7% or 99.9%.
- According to the invention, the refractory metal advantageously has a purity of at least 99.95%, based on metallic impurities, especially of at least 99.995% or of at least 99.999%, in particular of at least 99.9995%. If an alloy is used instead of a single refractory metal, then at least the refractory metal, but preferably the alloy as a whole, has that purity, so that a corresponding highly pure coating can be produced.
- In addition, the metal powder has an oxygen content of less than 1000 ppm oxygen, or less than 500, or less than 300, in particular an oxygen content of less than 100 ppm.
- Particularly suitable refractory metal powders have a purity of at least 99.7%, advantageously of at least 99.9%, in particular 99.95%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- Particularly suitable refractory metal powders have a purity of at least 99.95%, in particular of at least 99.995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm. Particularly suitable refractory metal powders have a purity of at least 99.999%, in particular of at least 99.9995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- In all the above-mentioned powders, the total content of other non-metallic impurities, such as carbon, nitrogen or hydrogen, should advantageously be less than 500 ppm, preferably less than 150 ppm.
- In particular, the oxygen content is advantageously 50 ppm or less, the nitrogen content is 25 ppm or less and the carbon content is 25 ppm or less.
- The content of metallic impurities is advantageously 500 ppm or less, preferably 100 ppm or less and most preferably 50 ppm or less, in particular 10 ppm or less.
- Suitable metal powders are, for example, many of the refractory metal powders which are also suitable for the production of capacitors.
- Such metal powders can be prepared by reduction of refractory metal compound with a reducing agent and preferably subsequent deoxidation. Tungsten oxide or molybdenum oxide, for example, is reduced in a stream of hydrogen at elevated temperature. The preparation is described, for example, in Schubert, Lassner, “Tungsten”, Kluwer Academic/Plenum Publishers, New York, 1999 or Brauer, “Handbuch der Praparativen Anorganischen Chemie”, Ferdinand Enke Verlag Stuttgart, 1981, p 1530.
- In the case of tantalum and niobium, the preparation is in most cases carried out by reducing alkali heptafluoro-tantalates and earth alkaline metal heptafluoro-tantalates or the oxides, such as, for example, sodium heptafluorotantalate, potassium heptafluorotantalate, sodium heptafluoroniobate or potassium heptafluoroniobate, with an alkali or alkaline earth metal. The reduction can be carried out in a salt melt with the addition of, for example, sodium, or in the gas phase, calcium or magnesium vapour advantageously being used. It is also possible to mix the refractory metal compound with the alkali or alkaline earth metal and heat the mixture. A hydrogen atmosphere may be advantageous. A large number of suitable processes is known to the person skilled in the art, as are process parameters from which suitable reaction conditions can be selected. Suitable processes are described, for example, in U.S. Pat. No. 4,483,819 and WO 98/37249.
- After the reduction, deoxidation is preferably carried out. This can be effected, for example, by mixing the refractory metal powder with Mg, Ca, Ba, La, Y or Ce and then heating, or by heating the refractory metal in the presence of a getter in an atmosphere that allows oxygen to pass from the metal powder to the getter. The refractory metal powder is in most cases then freed of the salts of the deoxidising agent using an acid and water, and is dried.
- It is advantageous if, when using metals to lower the oxygen content, the metallic impurities can be kept low.
- A further process for preparing pure powder having a low oxygen content consists in reducing a refractory metal hydride using an alkaline earth metal as reducing agent, as disclosed, for example, in WO 01/12364 and EP-A-1200218.
- The thickness of the coating is usually more than 0.01 mm. Preferred are layers with a thickness between 0.05 and 10 mm, more preferred between 0.05 and 5 mm, still more preferred between 0.05 and 1 mm, still more preferred between 0.05 and 0.5 mm. The thickness may be higher as well, for example from 3 to 50 mm, or from 5 to 45 mm, or from 8 to 40 mm, or from 10 to 30 mm or from 10 to 20 mm or 10 to 15 mm.
- The purities and oxygen contents of the resulting coatings should deviate not more than 50% and preferably not more than 20% from those of the powder.
- Advantageously, this can be achieved by coating the substrate surface under an inert gas. Argon is advantageously used as the inert gas because, owing to its higher density than air, it tends to cover the object to be coated and to remain present, in particular when the surface to be coated is located in a vessel which prevents the argon from escaping or flowing away and more argon is continuously added.
- The coatings applied according to the invention have a high purity and a low oxygen content. Advantageously, these coatings have an oxygen content of less than 1000 ppm oxygen, or less than 500, or less than 300, in particular an oxygen content of less than 100 ppm.
- The coatings usually exhibit compressive stress a. Usually, the compressive stress is about −1000 MPa to 0 MPa, or from −700 MPa to 0 MPa, or from −500 MPa to 0 MPa, of from −400 MPa to 0 MPa or from −300 MPa to 0. More specifically, the compressive stress is from −200 MPa to −1000 MPa, or from −300 MPa to −700 MPa, or from −300 MPa to −500 MPa.
- In general, a lower oxygen content of the powder employed will result in layers exhibiting lower compressive stress, e.g. a layer sprayed from powder having an oxygen content of 1400 ppm will usually result in a layer exhibiting compressive stress of about −970±50 MPa MPa and a layer sprayed from powder having an oxygen content of 270 ppm will usually result in a layer exhibiting compressive stress of about −460 MPa±50 MPa, more preferably −400 MPa±50 MPa.
- In contrast thereto, layers produced by plasma spraying result in layers exhibiting no compressive stress at all, but tensile stress.
- In particular, these coatings have a purity of at least 99.7%, advantageously of at least 99.9%, in particular of at least 99.95%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- In particular, these coatings have a purity of at least 99.95%, in particular of at least 99.995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- In particular, these coatings have a purity of 99.999%, in particular of at least 99.9995%, and a content of less than 1000 ppm oxygen, or less than 500 ppm oxygen, or less than 300 ppm oxygen, in particular an oxygen content of less than 100 ppm.
- The coatings according to the invention have a total content of other non-metallic impurities, such as carbon, nitrogen or hydrogen, which is advantageously below 500 ppm and most preferably below 150 ppm.
- The applied coating has a content of gaseous impurities which differs by not more than 50%, or not more than 20%, or not more than 10%, or not more than 5%, or not more than 1%, from the content of the starting powder with which this coating was produced. The term “differs” is to be understood as meaning in particular an increase; the resulting coatings should, therefore, advantageously have a content of gaseous impurities that is not more than 50% greater than the content of the starting powder.
- The applied coating preferably has an oxygen content which differs by not more than 5%, in particular not more than 1%, from the oxygen content of the starting powder.
- The coatings according to the invention preferably have a total content of other non-metallic impurities, such as carbon, nitrogen or hydrogen, which is advantageously less than 500 ppm and most preferably less than 150 ppm. With the process of this invention layers with higher impurity contents can also be produced.
- In particular, the oxygen content is advantageously 50 ppm or less, the nitrogen content is 25 ppm or less and the carbon content is 25 ppm or less.
- The content of metallic impurities is advantageously 50 ppm or less, in particular 10 ppm or less.
- In an advantageous embodiment, the coatings additionally have a density of at least 97%, preferably greater than 98%, in particular greater than 99% or 99.5%. 97% density of a layer means that the layer has a density of 97% of the bulk material. The density of the coating is here a measure of the closed nature and porosity of the coating. A closed, substantially pore-free coating always has a density of more than 99.5%. The density can be determined either by image analysis of a cross-sectional image (ground section) of such a coating, or alternatively by helium pycnometry. The latter method is less preferred because, in the case of very dense coatings, pores present in coatings that are more remote from the surface are not detected and a lower porosity is accordingly measured than actually exists. By means of image analysis, the density can be determined by first determining the total area of the coating to be investigated in the image area of the microscope and relating this area to the areas of the pores. In this method, pores that are located far from the surface and close to the interface with the substrate are also detected. A high density of at least 97%, preferably greater than 98%, in particular greater than 99% or 99.5%, is important in many coating processes.
- The coatings show high mechanical strength which is caused by their high density and by the high deformation of the particles. In the case of tantalum, therefore, the strengths are at least 80 MPa more preferably at least 100 MPa, most preferably at least 140 MPa when nitrogen is used as the gas with which the metal powder forms a gas-powder mixture. If helium is used, the strength usually is at least 150 MPa, preferably at least 170 MPa, most preferably at least 200 MPa and very most preferred greater than 250 MPa.
- Although the coatings according to the invention show high densities and low porosities, the coatings have a morphology clearly showing it was created from discrete particles. Examples can be seen, for example, in
FIGS. 1 to 7 . In this way the coatings according to the invention can be distinguished over coatings obtained by other methods, like coatings obtained by galvanic processes. The characteristic appearance also allows distinguishing of coatings according to the invention from coatings obtained by plasma spraying. - The articles to be coated with the process of this invention are not limited. Generally all articles which need a coating, preferably a corrosion protective coating, can be used. These articles may be made of metal and/or of ceramic material and/or of plastic material or may comprise components from these materials. Preferably surfaces of materials are coated which are subject to removal of material, for example by wear, corrosion, oxidation, etching, machining or other stress.
- Preferably surfaces of materials are coated with the process of this invention which are used in corroding surroundings, for example in chemical processes in medical devices or in implants. Examples of apparatus or components to be coated are components used in chemical plants or in laboratories or in medical devices or as implants, such as reaction and mixing vessels, stirrers, blind flanges, thermowells, birsting disks, birsting disk holders, heat exchangers (shell and tubes), pipings, valves, valve bodies and pump parts.
- Preferably articles are coated with the process of this invention which are no sputter targets or X-ray anodes.
- The coatings prepared with the process of this invention preferably are used in corrosion protection.
- The present invention therefore relates also to articles made of metal and/or of ceramic material and/or of plastic material containing at least one coatings composed of the refractory metals niobium, tantalum, tungsten, molybdenum, titanium zirconium or mixtures of two or more thereof or alloys of two or more thereof or alloys with other metals, which coatings have the above-mentioned properties.
- Such coatings are in particular coatings of tantalum or niobium.
- Preferably layers of tungsten, molybdenum, titanium zirconium or mixtures of two or more thereof or alloys of two or more thereof or alloys with other metals, very preferably layers of tantalum or niobium, are applied by cold spraying to the surface of a substrate to be coated. Surprisingly it has been found that with said powders or powder mixtures, preferably with tantalum and niobium powders, possessing a reduced oxygen content, for example an oxygen content below 1000 ppm, there can be produced cold sprayed layers with very high deposition rates of more than 90%. In said cold sprayed layers the oxygen content of the metal is nearly unchanged compared to the oxygen content of the powders. These cold sprayed layers show considerably higher densities than layers produced by plasma spraying or by vacuum spraying. Furthermore, these cold sprayed layers can be produced without any or with small texture, depending on powder properties and coating parameters. These cold sprayed layers are also object of this invention.
- Suitable metal powders for use in the methods according to the invention are also metal powders that consist of alloys, pseudo alloys and powder mixtures of refractory metals with suitable non-refractory metals.
- It is thereby possible to coat surfaces of substrates made of the same alloy or pseudo alloy.
- These include especially alloys, pseudo alloys or powder mixtures of a refractory metal selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium or mixtures of two or more thereof, with a metal selected from the group cobalt, nickel, rhodium, palladium, platinum, copper, silver and gold. Such powders belong to the prior art, are known in principle to the person skilled in the art and are described, for example, in EP-A-774315 and EP-A-1138420.
- They can be prepared by conventional processes; for example, powder mixtures are obtainable by homogenously mixing pre-prepared metal powders, it being possible for the mixing to be carried out on the one hand before use in the method according to the invention or alternatively during production of the gas-powder mixture. Alloy powders are in most cases obtainable by melting and mixing the alloying partners. According to the invention there may be used as alloy powders also so-called pre-alloyed powders. These are powders which are produced by mixing compounds such as, for example, salts, oxides and/or hydrides of the alloying partners and then reducing them, so that intimate mixtures of the metals in question are obtained. It is additionally possible according to the invention to use pseudo alloys. Pseudo alloys are understood as being materials which are obtained not by conventional melt metallurgy but, for example, by grinding, sintering or infiltration.
- Known materials are, for example, tungsten/copper alloys or tungsten/copper mixtures, the properties of which are known and are listed here by way of example:
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Thermal Electrical expansion Thermal Density HB conductivity coefficient conductivity Type (g/cm3) (MPa) (% IACS) (ppm/K) (W/m · K) WCu10 16.8-17.2 ≧2550 >27 6.5 170-180 WCu15 16.3 7.0 190-200 WCu20 15.2-15.6 ≧2160 >34 8.3 200-220 WCu25 14.5-15.0 ≧1940 >38 9.0 220-250 WCu30 13.8-14.4 ≧1720 >42 - Also known are molybdenum-copper alloys or molybdenium/copper mixtures in the same ratios as indicated above.
- Also known are molybdenum-silver alloys or molybdenium/silver mixtures which contain, for example, 10, 40 or 65 wt. % molybdenum.
- Also known are tungsten-silver alloys or tungsten/silver mixtures which contain, for example, 10, 40 or 65 wt. % tungsten.
- These can be used, for example, in heat pipes, cooling bodies or, in general, in temperature management systems.
- It is also possible to use tungsten-rhenium alloys or mixtures, or the metal powder is an alloy having the following composition: from 94 to 99 wt. %, preferably from 95 to 97 wt. %, molybdenum, from 1 to 6 wt. %, preferably from 2 to 4 wt. %, niobium, from 0.05 to 1 wt. %, preferably from 0.05 to 0.02 wt. %, zirconium.
- These alloys, like pure refractory metal powders having a purity of at least 99.95%, can be used in the recycling or production of sputter targets by means of cold gas spraying.
- Suitable materials for the methods according to the invention are listed in Tables 1 to 15. Individual materials are designated with the number of the table followed by the number of the combination of components and the amount of the non-refractory metal as in Table 1. For example, material 2.005 is a material described in Table 2, the precise composition being defined with the non-refractory metal and the amount thereof as listed in Table 1, position no. 5.
- Suitable niobium alloys are listed in Table 1.
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TABLE 1 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 1.001 Niobium Cobalt 2-5 1.002 Niobium Nickel 2-5 1.003 Niobium Rhodium 2-5 1.004 Niobium Palladium 2-5 1.005 Niobium Platinum 2-5 1.006 Niobium Copper 2-5 1.007 Niobium Silver 2-5 1.008 Niobium Gold 2-5 1.009 Niobium Cobalt 5-10 1.010 Niobium Nickel 5-10 1.011 Niobium Rhodium 5-10 1.012 Niobium Palladium 5-10 1.013 Niobium Platinum 5-10 1.014 Niobium Copper 5-10 1.015 Niobium Silver 5-10 1.016 Niobium Gold 5-10 1.017 Niobium Cobalt 10-15 1.018 Niobium Nickel 10-15 1.019 Niobium Rhodium 10-15 1.020 Niobium Palladium 10-15 1.021 Niobium Platinum 10-15 1.022 Niobium Copper 10-15 1.023 Niobium Silver 10-15 1.024 Niobium Gold 10-15 1.025 Niobium Cobalt 15-20 1.026 Niobium Nickel 15-20 1.027 Niobium Rhodium 15-20 1.028 Niobium Palladium 15-20 1.029 Niobium Platinum 15-20 1.030 Niobium Copper 15-20 1.031 Niobium Silver 15-20 1.032 Niobium Gold 15-20 1.033 Niobium Cobalt 20-25 1.034 Niobium Nickel 20-25 1.035 Niobium Rhodium 20-25 1.036 Niobium Palladium 20-25 1.037 Niobium Platinum 20-25 1.038 Niobium Copper 20-25 1.039 Niobium Silver 20-25 1.040 Niobium Gold 20-25 1.041 Niobium Cobalt 25-30 1.042 Niobium Nickel 25-30 1.043 Niobium Rhodium 25-30 1.044 Niobium Palladium 25-30 1.045 Niobium Platinum 25-30 1.046 Niobium Copper 25-30 1.047 Niobium Silver 25-30 1.048 Niobium Gold 25-30 - Table 2: Table 2 consists of 48 alloys, the refractory metal being tantalum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 2 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 2.001 Tantalum Cobalt 2-5 2.002 Tantalum Nickel 2-5 2.003 Tantalum Rhodium 2-5 2.004 Tantalum Palladium 2-5 2.005 Tantalum Platinum 2-5 2.006 Tantalum Copper 2-5 2.007 Tantalum Silver 2-5 2.008 Tantalum Gold 2-5 2.009 Tantalum Cobalt 5-10 2.010 Tantalum Nickel 5-10 2.011 Tantalum Rhodium 5-10 2.012 Tantalum Palladium 5-10 2.013 Tantalum Platinum 5-10 2.014 Tantalum Copper 5-10 2.015 Tantalum Silver 5-10 2.016 Tantalum Gold 5-10 2.017 Tantalum Cobalt 10-15 2.018 Tantalum Nickel 10-15 2.019 Tantalum Rhodium 10-15 2.020 Tantalum Palladium 10-15 2.021 Tantalum Platinum 10-15 2.022 Tantalum Copper 10-15 2.023 Tantalum Silver 10-15 2.024 Tantalum Gold 10-15 2.025 Tantalum Cobalt 15-20 2.026 Tantalum Nickel 15-20 2.027 Tantalum Rhodium 15-20 2.028 Tantalum Palladium 15-20 2.029 Tantalum Platinum 15-20 2.030 Tantalum Copper 15-20 2.031 Tantalum Silver 15-20 2.032 Tantalum Gold 15-20 2.033 Tantalum Cobalt 20-25 2.034 Tantalum Nickel 20-25 2.035 Tantalum Rhodium 20-25 2.036 Tantalum Palladium 20-25 2.037 Tantalum Platinum 20-25 2.038 Tantalum Copper 20-25 2.039 Tantalum Silver 20-25 2.040 Tantalum Gold 20-25 2.041 Tantalum Cobalt 25-30 2.042 Tantalum Nickel 25-30 2.043 Tantalum Rhodium 25-30 2.044 Tantalum Palladium 25-30 2.045 Tantalum Platinum 25-30 2.046 Tantalum Copper 25-30 2.047 Tantalum Silver 25-30 2.048 Tantalum Gold 25-30 - Table 3: Table 3 consists of 48 alloys, the refractory metal being tungsten instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 3 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 3.001 Tungsten Cobalt 2-5 3.002 Tungsten Nickel 2-5 3.003 Tungsten Rhodium 2-5 3.004 Tungsten Palladium 2-5 3.005 Tungsten Platinum 2-5 3.006 Tungsten Copper 2-5 3.007 Tungsten Silver 2-5 3.008 Tungsten Gold 2-5 3.009 Tungsten Cobalt 5-10 3.010 Tungsten Nickel 5-10 3.011 Tungsten Rhodium 5-10 3.012 Tungsten Palladium 5-10 3.013 Tungsten Platinum 5-10 3.014 Tungsten Copper 5-10 3.015 Tungsten Silver 5-10 3.016 Tungsten Gold 5-10 3.017 Tungsten Cobalt 10-15 3.018 Tungsten Nickel 10-15 3.019 Tungsten Rhodium 10-15 3.020 Tungsten Palladium 10-15 3.021 Tungsten Platinum 10-15 3.022 Tungsten Copper 10-15 3.023 Tungsten Silver 10-15 3.024 Tungsten Gold 10-15 3.025 Tungsten Cobalt 15-20 3.026 Tungsten Nickel 15-20 3.027 Tungsten Rhodium 15-20 3.028 Tungsten Palladium 15-20 3.029 Tungsten Platinum 15-20 3.030 Tungsten Copper 15-20 3.031 Tungsten Silver 15-20 3.032 Tungsten Gold 15-20 3.033 Tungsten Cobalt 20-25 3.034 Tungsten Nickel 20-25 3.035 Tungsten Rhodium 20-25 3.036 Tungsten Palladium 20-25 3.037 Tungsten Platinum 20-25 3.038 Tungsten Copper 20-25 3.039 Tungsten Silver 20-25 3.040 Tungsten Gold 20-25 3.041 Tungsten Cobalt 25-30 3.042 Tungsten Nickel 25-30 3.043 Tungsten Rhodium 25-30 3.044 Tungsten Palladium 25-30 3.045 Tungsten Platinum 25-30 3.046 Tungsten Copper 25-30 3.047 Tungsten Silver 25-30 3.048 Tungsten Gold 25-30 - Table 4: Table 4 consists of 48 alloys, the refractory metal being molybdenum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 4 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 4.001 Molybdenum Cobalt 2-5 4.002 Molybdenum Nickel 2-5 4.003 Molybdenum Rhodium 2-5 4.004 Molybdenum Palladium 2-5 4.005 Molybdenum Platinum 2-5 4.006 Molybdenum Copper 2-5 4.007 Molybdenum Silver 2-5 4.008 Molybdenum Gold 2-5 4.009 Molybdenum Cobalt 5-10 4.010 Molybdenum Nickel 5-10 4.011 Molybdenum Rhodium 5-10 4.012 Molybdenum Palladium 5-10 4.013 Molybdenum Platinum 5-10 4.014 Molybdenum Copper 5-10 4.015 Molybdenum Silver 5-10 4.016 Molybdenum Gold 5-10 4.017 Molybdenum Cobalt 10-15 4.018 Molybdenum Nickel 10-15 4.019 Molybdenum Rhodium 10-15 4.020 Molybdenum Palladium 10-15 4.021 Molybdenum Platinum 10-15 4.022 Molybdenum Copper 10-15 4.023 Molybdenum Silver 10-15 4.024 Molybdenum Gold 10-15 4.025 Molybdenum Cobalt 15-20 4.026 Molybdenum Nickel 15-20 4.027 Molybdenum Rhodium 15-20 4.028 Molybdenum Palladium 15-20 4.029 Molybdenum Platinum 15-20 4.030 Molybdenum Copper 15-20 4.031 Molybdenum Silver 15-20 4.032 Molybdenum Gold 15-20 4.033 Molybdenum Cobalt 20-25 4.034 Molybdenum Nickel 20-25 4.035 Molybdenum Rhodium 20-25 4.036 Molybdenum Palladium 20-25 4.037 Molybdenum Platinum 20-25 4.038 Molybdenum Copper 20-25 4.039 Molybdenum Silver 20-25 4.040 Molybdenum Gold 20-25 4.041 Molybdenum Cobalt 25-30 4.042 Molybdenum Nickel 25-30 4.043 Molybdenum Rhodium 25-30 4.044 Molybdenum Palladium 25-30 4.045 Molybdenum Platinum 25-30 4.046 Molybdenum Copper 25-30 4.047 Molybdenum Silver 25-30 4.048 Molybdenum Gold 25-30 - Table 5: Table 5 consists of 48 alloys, the refractory metal being titanium instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 5 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 5.001 Titanium Cobalt 2-5 5.002 Titanium Nickel 2-5 5.003 Titanium Rhodium 2-5 5.004 Titanium Palladium 2-5 5.005 Titanium Platinum 2-5 5.006 Titanium Copper 2-5 5.007 Titanium Silver 2-5 5.008 Titanium Gold 2-5 5.009 Titanium Cobalt 5-10 5.010 Titanium Nickel 5-10 5.011 Titanium Rhodium 5-10 5.012 Titanium Palladium 5-10 5.013 Titanium Platinum 5-10 5.014 Titanium Copper 5-10 5.015 Titanium Silver 5-10 5.016 Titanium Gold 5-10 5.017 Titanium Cobalt 10-15 5.018 Titanium Nickel 10-15 5.019 Titanium Rhodium 10-15 5.020 Titanium Palladium 10-15 5.021 Titanium Platinum 10-15 5.022 Titanium Copper 10-15 5.023 Titanium Silver 10-15 5.024 Titanium Gold 10-15 5.025 Titanium Cobalt 15-20 5.026 Titanium Nickel 15-20 5.027 Titanium Rhodium 15-20 5.028 Titanium Palladium 15-20 5.029 Titanium Platinum 15-20 5.030 Titanium Copper 15-20 5.031 Titanium Silver 15-20 5.032 Titanium Gold 15-20 5.033 Titanium Cobalt 20-25 5.034 Titanium Nickel 20-25 5.035 Titanium Rhodium 20-25 5.036 Titanium Palladium 20-25 5.037 Titanium Platinum 20-25 5.038 Titanium Copper 20-25 5.039 Titanium Silver 20-25 5.040 Titanium Gold 20-25 5.041 Titanium Cobalt 25-30 5.042 Titanium Nickel 25-30 5.043 Titanium Rhodium 25-30 5.044 Titanium Palladium 25-30 5.045 Titanium Platinum 25-30 5.046 Titanium Copper 25-30 5.047 Titanium Silver 25-30 5.048 Titanium Gold 25-30 - Table 6: Table 6 consists of 48 pseudo alloys, the refractory metal being tantalum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 6 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 6.001 Tantalum Cobalt 2-5 6.002 Tantalum Nickel 2-5 6.003 Tantalum Rhodium 2-5 6.004 Tantalum Palladium 2-5 6.005 Tantalum Platinum 2-5 6.006 Tantalum Copper 2-5 6.007 Tantalum Silver 2-5 6.008 Tantalum Gold 2-5 6.009 Tantalum Cobalt 5-10 6.010 Tantalum Nickel 5-10 6.011 Tantalum Rhodium 5-10 6.012 Tantalum Palladium 5-10 6.013 Tantalum Platinum 5-10 6.014 Tantalum Copper 5-10 6.015 Tantalum Silver 5-10 6.016 Tantalum Gold 5-10 6.017 Tantalum Cobalt 10-15 6.018 Tantalum Nickel 10-15 6.019 Tantalum Rhodium 10-15 6.020 Tantalum Palladium 10-15 6.021 Tantalum Platinum 10-15 6.022 Tantalum Copper 10-15 6.023 Tantalum Silver 10-15 6.024 Tantalum Gold 10-15 6.025 Tantalum Cobalt 15-20 6.026 Tantalum Nickel 15-20 6.027 Tantalum Rhodium 15-20 6.028 Tantalum Palladium 15-20 6.029 Tantalum Platinum 15-20 6.030 Tantalum Copper 15-20 6.031 Tantalum Silver 15-20 6.032 Tantalum Gold 15-20 6.033 Tantalum Cobalt 20-25 6.034 Tantalum Nickel 20-25 6.035 Tantalum Rhodium 20-25 6.036 Tantalum Palladium 20-25 6.037 Tantalum Platinum 20-25 6.038 Tantalum Copper 20-25 6.039 Tantalum Silver 20-25 6.040 Tantalum Gold 20-25 6.041 Tantalum Cobalt 25-30 6.042 Tantalum Nickel 25-30 6.043 Tantalum Rhodium 25-30 6.044 Tantalum Palladium 25-30 6.045 Tantalum Platinum 25-30 6.046 Tantalum Copper 25-30 6.047 Tantalum Silver 25-30 6.048 Tantalum Gold 25-30 - Table 7: Table 7 consists of 48 pseudo alloys, the refractory metal being tungsten instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 7 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 7.001 Tungsten Cobalt 2-5 7.002 Tungsten Nickel 2-5 7.003 Tungsten Rhodium 2-5 7.004 Tungsten Palladium 2-5 7.005 Tungsten Platinum 2-5 7.006 Tungsten Copper 2-5 7.007 Tungsten Silver 2-5 7.008 Tungsten Gold 2-5 7.009 Tungsten Cobalt 5-10 7.010 Tungsten Nickel 5-10 7.011 Tungsten Rhodium 5-10 7.012 Tungsten Palladium 5-10 7.013 Tungsten Platinum 5-10 7.014 Tungsten Copper 5-10 7.015 Tungsten Silver 5-10 7.016 Tungsten Gold 5-10 7.017 Tungsten Cobalt 10-15 7.018 Tungsten Nickel 10-15 7.019 Tungsten Rhodium 10-15 7.020 Tungsten Palladium 10-15 7.021 Tungsten Platinum 10-15 7.022 Tungsten Copper 10-15 7.023 Tungsten Silver 10-15 7.024 Tungsten Gold 10-15 7.025 Tungsten Cobalt 15-20 7.026 Tungsten Nickel 15-20 7.027 Tungsten Rhodium 15-20 7.028 Tungsten Palladium 15-20 7.029 Tungsten Platinum 15-20 7.030 Tungsten Copper 15-20 7.031 Tungsten Silver 15-20 7.032 Tungsten Gold 15-20 7.033 Tungsten Cobalt 20-25 7.034 Tungsten Nickel 20-25 7.035 Tungsten Rhodium 20-25 7.036 Tungsten Palladium 20-25 7.037 Tungsten Platinum 20-25 7.038 Tungsten Copper 20-25 7.039 Tungsten Silver 20-25 7.040 Tungsten Gold 20-25 7.041 Tungsten Cobalt 25-30 7.042 Tungsten Nickel 25-30 7.043 Tungsten Rhodium 25-30 7.044 Tungsten Palladium 25-30 7.045 Tungsten Platinum 25-30 7.046 Tungsten Copper 25-30 7.047 Tungsten Silver 25-30 7.048 Tungsten Gold 25-30 - Table 8: Table 8 consists of 48 pseudo alloys, the refractory metal being molybdenum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 8 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 8.001 Molybdenum Cobalt 2-5 8.002 Molybdenum Nickel 2-5 8.003 Molybdenum Rhodium 2-5 8.004 Molybdenum Palladium 2-5 8.005 Molybdenum Platinum 2-5 8.006 Molybdenum Copper 2-5 8.007 Molybdenum Silver 2-5 8.008 Molybdenum Gold 2-5 8.009 Molybdenum Cobalt 5-10 8.010 Molybdenum Nickel 5-10 8.011 Molybdenum Rhodium 5-10 8.012 Molybdenum Palladium 5-10 8.013 Molybdenum Platinum 5-10 8.014 Molybdenum Copper 5-10 8.015 Molybdenum Silver 5-10 8.016 Molybdenum Gold 5-10 8.017 Molybdenum Cobalt 10-15 8.018 Molybdenum Nickel 10-15 8.019 Molybdenum Rhodium 10-15 8.020 Molybdenum Palladium 10-15 8.021 Molybdenum Platinum 10-15 8.022 Molybdenum Copper 10-15 8.023 Molybdenum Silver 10-15 8.024 Molybdenum Gold 10-15 8.025 Molybdenum Cobalt 15-20 8.026 Molybdenum Nickel 15-20 8.027 Molybdenum Rhodium 15-20 8.028 Molybdenum Palladium 15-20 8.029 Molybdenum Platinum 15-20 8.030 Molybdenum Copper 15-20 8.031 Molybdenum Silver 15-20 8.032 Molybdenum Gold 15-20 8.033 Molybdenum Cobalt 20-25 8.034 Molybdenum Nickel 20-25 8.035 Molybdenum Rhodium 20-25 8.036 Molybdenum Palladium 20-25 8.037 Molybdenum Platinum 20-25 8.038 Molybdenum Copper 20-25 8.039 Molybdenum Silver 20-25 8.040 Molybdenum Gold 20-25 8.041 Molybdenum Cobalt 25-30 8.042 Molybdenum Nickel 25-30 8.043 Molybdenum Rhodium 25-30 8.044 Molybdenum Palladium 25-30 8.045 Molybdenum Platinum 25-30 8.046 Molybdenum Copper 25-30 8.047 Molybdenum Silver 25-30 8.048 Molybdenum Gold 25-30 - Table 9: Table 9 consists of 48 pseudo alloys, the refractory metal being titanium instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 9 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 9.001 Titanium Cobalt 2-5 9.002 Titanium Nickel 2-5 9.003 Titanium Rhodium 2-5 9.004 Titanium Palladium 2-5 9.005 Titanium Platinum 2-5 9.006 Titanium Copper 2-5 9.007 Titanium Silver 2-5 9.008 Titanium Gold 2-5 9.009 Titanium Cobalt 5-10 9.010 Titanium Nickel 5-10 9.011 Titanium Rhodium 5-10 9.012 Titanium Palladium 5-10 9.013 Titanium Platinum 5-10 9.014 Titanium Copper 5-10 9.015 Titanium Silver 5-10 9.016 Titanium Gold 5-10 9.017 Titanium Cobalt 10-15 9.018 Titanium Nickel 10-15 9.019 Titanium Rhodium 10-15 9.020 Titanium Palladium 10-15 9.021 Titanium Platinum 10-15 9.022 Titanium Copper 10-15 9.023 Titanium Silver 10-15 9.024 Titanium Gold 10-15 9.025 Titanium Cobalt 15-20 9.026 Titanium Nickel 15-20 9.027 Titanium Rhodium 15-20 9.028 Titanium Palladium 15-20 9.029 Titanium Platinum 15-20 9.030 Titanium Copper 15-20 9.031 Titanium Silver 15-20 9.032 Titanium Gold 15-20 9.033 Titanium Cobalt 20-25 9.034 Titanium Nickel 20-25 9.035 Titanium Rhodium 20-25 9.036 Titanium Palladium 20-25 9.037 Titanium Platinum 20-25 9.038 Titanium Copper 20-25 9.039 Titanium Silver 20-25 9.040 Titanium Gold 20-25 9.041 Titanium Cobalt 25-30 9.042 Titanium Nickel 25-30 9.043 Titanium Rhodium 25-30 9.044 Titanium Palladium 25-30 9.045 Titanium Platinum 25-30 9.046 Titanium Copper 25-30 9.047 Titanium Silver 25-30 9.048 Titanium Gold 25-30 - Table 10: Table 10 consists of 48 powder mixtures, the refractory metal being tantalum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 10 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 10.001 Tantalum Cobalt 2-5 10.002 Tantalum Nickel 2-5 10.003 Tantalum Rhodium 2-5 10.004 Tantalum Palladium 2-5 10.005 Tantalum Platinum 2-5 10.006 Tantalum Copper 2-5 10.007 Tantalum Silver 2-5 10.008 Tantalum Gold 2-5 10.009 Tantalum Cobalt 5-10 10.010 Tantalum Nickel 5-10 10.011 Tantalum Rhodium 5-10 10.012 Tantalum Palladium 5-10 10.013 Tantalum Platinum 5-10 10.014 Tantalum Copper 5-10 10.015 Tantalum Silver 5-10 10.016 Tantalum Gold 5-10 10.017 Tantalum Cobalt 10-15 10.018 Tantalum Nickel 10-15 10.019 Tantalum Rhodium 10-15 10.020 Tantalum Palladium 10-15 10.021 Tantalum Platinum 10-15 10.022 Tantalum Copper 10-15 10.023 Tantalum Silver 10-15 10.024 Tantalum Gold 10-15 10.025 Tantalum Cobalt 15-20 10.026 Tantalum Nickel 15-20 10.027 Tantalum Rhodium 15-20 10.028 Tantalum Palladium 15-20 10.029 Tantalum Platinum 15-20 10.030 Tantalum Copper 15-20 10.031 Tantalum Silver 15-20 10.032 Tantalum Gold 15-20 10.033 Tantalum Cobalt 20-25 10.034 Tantalum Nickel 20-25 10.035 Tantalum Rhodium 20-25 10.036 Tantalum Palladium 20-25 10.037 Tantalum Platinum 20-25 10.038 Tantalum Copper 20-25 10.039 Tantalum Silver 20-25 10.040 Tantalum Gold 20-25 10.041 Tantalum Cobalt 25-30 10.042 Tantalum Nickel 25-30 10.043 Tantalum Rhodium 25-30 10.044 Tantalum Palladium 25-30 10.045 Tantalum Platinum 25-30 10.046 Tantalum Copper 25-30 10.047 Tantalum Silver 25-30 10.048 Tantalum Gold 25-30 - Table 11: Table 11 consists of 48 powder mixtures, the refractory metal being tungsten instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 11 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 11.001 Tungsten Cobalt 2-5 11.002 Tungsten Nickel 2-5 11.003 Tungsten Rhodium 2-5 11.004 Tungsten Palladium 2-5 11.005 Tungsten Platinum 2-5 11.006 Tungsten Copper 2-5 11.007 Tungsten Silver 2-5 11.008 Tungsten Gold 2-5 11.009 Tungsten Cobalt 5-10 11.010 Tungsten Nickel 5-10 11.011 Tungsten Rhodium 5-10 11.012 Tungsten Palladium 5-10 11.013 Tungsten Platinum 5-10 11.014 Tungsten Copper 5-10 11.015 Tungsten Silver 5-10 11.016 Tungsten Gold 5-10 11.017 Tungsten Cobalt 10-15 11.018 Tungsten Nickel 10-15 11.019 Tungsten Rhodium 10-15 11.020 Tungsten Palladium 10-15 11.021 Tungsten Platinum 10-15 11.022 Tungsten Copper 10-15 11.023 Tungsten Silver 10-15 11.024 Tungsten Gold 10-15 11.025 Tungsten Cobalt 15-20 11.026 Tungsten Nickel 15-20 11.027 Tungsten Rhodium 15-20 11.028 Tungsten Palladium 15-20 11.029 Tungsten Platinum 15-20 11.030 Tungsten Copper 15-20 11.031 Tungsten Silver 15-20 11.032 Tungsten Gold 15-20 11.033 Tungsten Cobalt 20-25 11.034 Tungsten Nickel 20-25 11.035 Tungsten Rhodium 20-25 11.036 Tungsten Palladium 20-25 11.037 Tungsten Platinum 20-25 11.038 Tungsten Copper 20-25 11.039 Tungsten Silver 20-25 11.040 Tungsten Gold 20-25 11.041 Tungsten Cobalt 25-30 11.042 Tungsten Nickel 25-30 11.043 Tungsten Rhodium 25-30 11.044 Tungsten Palladium 25-30 11.045 Tungsten Platinum 25-30 11.046 Tungsten Copper 25-30 11.047 Tungsten Silver 25-30 11.048 Tungsten Gold 25-30 - Table 12: Table 12 consists of 48 powder mixtures, the refractory metal being molybdenum instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 12 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 12.001 Molybdenum Cobalt 2-5 12.002 Molybdenum Nickel 2-5 12.003 Molybdenum Rhodium 2-5 12.004 Molybdenum Palladium 2-5 12.005 Molybdenum Platinum 2-5 12.006 Molybdenum Copper 2-5 12.007 Molybdenum Silver 2-5 12.008 Molybdenum Gold 2-5 12.009 Molybdenum Cobalt 5-10 12.010 Molybdenum Nickel 5-10 12.011 Molybdenum Rhodium 5-10 12.012 Molybdenum Palladium 5-10 12.013 Molybdenum Platinum 5-10 12.014 Molybdenum Copper 5-10 12.015 Molybdenum Silver 5-10 12.016 Molybdenum Gold 5-10 12.017 Molybdenum Cobalt 10-15 12.018 Molybdenum Nickel 10-15 12.019 Molybdenum Rhodium 10-15 12.020 Molybdenum Palladium 10-15 12.021 Molybdenum Platinum 10-15 12.022 Molybdenum Copper 10-15 12.023 Molybdenum Silver 10-15 12.024 Molybdenum Gold 10-15 12.025 Molybdenum Cobalt 15-20 12.026 Molybdenum Nickel 15-20 12.027 Molybdenum Rhodium 15-20 12.028 Molybdenum Palladium 15-20 12.029 Molybdenum Platinum 15-20 12.030 Molybdenum Copper 15-20 12.031 Molybdenum Silver 15-20 12.032 Molybdenum Gold 15-20 12.033 Molybdenum Cobalt 20-25 12.034 Molybdenum Nickel 20-25 12.035 Molybdenum Rhodium 20-25 12.036 Molybdenum Palladium 20-25 12.037 Molybdenum Platinum 20-25 12.038 Molybdenum Copper 20-25 12.039 Molybdenum Silver 20-25 12.040 Molybdenum Gold 20-25 12.041 Molybdenum Cobalt 25-30 12.042 Molybdenum Nickel 25-30 12.043 Molybdenum Rhodium 25-30 12.044 Molybdenum Palladium 25-30 12.045 Molybdenum Platinum 25-30 12.046 Molybdenum Copper 25-30 12.047 Molybdenum Silver 25-30 12.048 Molybdenum Gold 25-30 - Table 13: Table 13 consists of 48 powder mixtures, the refractory metal being titanium instead of niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 13 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 13.001 Titanium Cobalt 2-5 13.002 Titanium Nickel 2-5 13.003 Titanium Rhodium 2-5 13.004 Titanium Palladium 2-5 13.005 Titanium Platinum 2-5 13.006 Titanium Copper 2-5 13.007 Titanium Silver 2-5 13.008 Titanium Gold 2-5 13.009 Titanium Cobalt 5-10 13.010 Titanium Nickel 5-10 13.011 Titanium Rhodium 5-10 13.012 Titanium Palladium 5-10 13.013 Titanium Platinum 5-10 13.014 Titanium Copper 5-10 13.015 Titanium Silver 5-10 13.016 Titanium Gold 5-10 13.017 Titanium Cobalt 10-15 13.018 Titanium Nickel 10-15 13.019 Titanium Rhodium 10-15 13.020 Titanium Palladium 10-15 13.021 Titanium Platinum 10-15 13.022 Titanium Copper 10-15 13.023 Titanium Silver 10-15 13.024 Titanium Gold 10-15 13.025 Titanium Cobalt 15-20 13.026 Titanium Nickel 15-20 13.027 Titanium Rhodium 15-20 13.028 Titanium Palladium 15-20 13.029 Titanium Platinum 15-20 13.030 Titanium Copper 15-20 13.031 Titanium Silver 15-20 13.032 Titanium Gold 15-20 13.033 Titanium Cobalt 20-25 13.034 Titanium Nickel 20-25 13.035 Titanium Rhodium 20-25 13.036 Titanium Palladium 20-25 13.037 Titanium Platinum 20-25 13.038 Titanium Copper 20-25 13.039 Titanium Silver 20-25 13.040 Titanium Gold 20-25 13.041 Titanium Cobalt 25-30 13.042 Titanium Nickel 25-30 13.043 Titanium Rhodium 25-30 13.044 Titanium Palladium 25-30 13.045 Titanium Platinum 25-30 13.046 Titanium Copper 25-30 13.047 Titanium Silver 25-30 13.048 Titanium Gold 25-30 - Table 14: Table 14 consists of 48 pseudo alloys, the refractory metal being niobium and the non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 14 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 14.001 Niobium Cobalt 2-5 14.002 Niobium Nickel 2-5 14.003 Niobium Rhodium 2-5 14.004 Niobium Palladium 2-5 14.005 Niobium Platinum 2-5 14.006 Niobium Copper 2-5 14.007 Niobium Silver 2-5 14.008 Niobium Gold 2-5 14.009 Niobium Cobalt 5-10 14.010 Niobium Nickel 5-10 14.011 Niobium Rhodium 5-10 14.012 Niobium Palladium 5-10 14.013 Niobium Platinum 5-10 14.014 Niobium Copper 5-10 14.015 Niobium Silver 5-10 14.016 Niobium Gold 5-10 14.017 Niobium Cobalt 10-15 14.018 Niobium Nickel 10-15 14.019 Niobium Rhodium 10-15 14.020 Niobium Palladium 10-15 14.021 Niobium Platinum 10-15 14.022 Niobium Copper 10-15 14.023 Niobium Silver 10-15 14.024 Niobium Gold 10-15 14.025 Niobium Cobalt 15-20 14.026 Niobium Nickel 15-20 14.027 Niobium Rhodium 15-20 14.028 Niobium Palladium 15-20 14.029 Niobium Platinum 15-20 14.030 Niobium Copper 15-20 14.031 Niobium Silver 15-20 14.032 Niobium Gold 15-20 14.033 Niobium Cobalt 20-25 14.034 Niobium Nickel 20-25 14.035 Niobium Rhodium 20-25 14.036 Niobium Palladium 20-25 14.037 Niobium Platinum 20-25 14.038 Niobium Copper 20-25 14.039 Niobium Silver 20-25 14.040 Niobium Gold 20-25 14.041 Niobium Cobalt 25-30 14.042 Niobium Nickel 25-30 14.043 Niobium Rhodium 25-30 14.044 Niobium Palladium 25-30 14.045 Niobium Platinum 25-30 14.046 Niobium Copper 25-30 14.047 Niobium Silver 25-30 14.048 Niobium Gold 25-30 - Table 15: Table 15 consists of 48 powder mixtures, the refractory metal being niobium and non-refractory metal and the amount thereof in wt. % being as indicated in Table 1.
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TABLE 15 Amount of non- refractory metal No. Refractory metal Non-refractory metal (wt. %) 15.001 Niobium Cobalt 2-5 15.002 Niobium Nickel 2-5 15.003 Niobium Rhodium 2-5 15.004 Niobium Palladium 2-5 15.005 Niobium Platinum 2-5 15.006 Niobium Copper 2-5 15.007 Niobium Silver 2-5 15.008 Niobium Gold 2-5 15.009 Niobium Cobalt 5-10 15.010 Niobium Nickel 5-10 15.011 Niobium Rhodium 5-10 15.012 Niobium Palladium 5-10 15.013 Niobium Platinum 5-10 15.014 Niobium Copper 5-10 15.015 Niobium Silver 5-10 15.016 Niobium Gold 5-10 15.017 Niobium Cobalt 10-15 15.018 Niobium Nickel 10-15 15.019 Niobium Rhodium 10-15 15.020 Niobium Palladium 10-15 15.021 Niobium Platinum 10-15 15.022 Niobium Copper 10-15 15.023 Niobium Silver 10-15 15.024 Niobium Gold 10-15 15.025 Niobium Cobalt 15-20 15.026 Niobium Nickel 15-20 15.027 Niobium Rhodium 15-20 15.028 Niobium Palladium 15-20 15.029 Niobium Platinum 15-20 15.030 Niobium Copper 15-20 15.031 Niobium Silver 15-20 15.032 Niobium Gold 15-20 15.033 Niobium Cobalt 20-25 15.034 Niobium Nickel 20-25 15.035 Niobium Rhodium 20-25 15.036 Niobium Palladium 20-25 15.037 Niobium Platinum 20-25 15.038 Niobium Copper 20-25 15.039 Niobium Silver 20-25 15.040 Niobium Gold 20-25 15.041 Niobium Cobalt 25-30 15.042 Niobium Nickel 25-30 15.043 Niobium Rhodium 25-30 15.044 Niobium Palladium 25-30 15.045 Niobium Platinum 25-30 15.046 Niobium Copper 25-30 15.047 Niobium Silver 25-30 15.048 Niobium Gold 25-30 - Also suitable for use in the methods according to the invention are metal powders which consist of alloys, pseudo alloys and powder mixtures of different refractory metals with one another.
- For example, alloys of molybdenum and titanium in a ratio of 50:50 atomic percent or alloys of tungsten and titanium in an amount of about 90:10 wt. % are known and are suitable for use in the methods according to the invention. In principle, however, all alloys of the refractory metals with one another are suitable for use in the methods according to the invention.
- Binary alloys, pseudo alloys and powder mixtures of refractory metals that are suitable for the methods according to the invention are listed in Tables 16 to 36. Individual materials are designated with the number of the table followed by the number of the combination of components as in Table 16. For example, material 22.005 is a material described in Table 22, the precise composition being defined by the refractory metals, which are listed in Table 16, position no. 5, and the amount as listed in Table 22.
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No. Component 1 Component 2 16.001 Nb Ta 16.002 Nb W 16.003 Nb Mo 16.004 Nb Ti 16.005 Ta Nb 16.006 Ta W 16.007 Ta Mo 16.008 Ta Ti 16.009 W Ta 16.010 W Nb 16.011 W Mo 16.012 W Ti 16.013 Mo Ta 16.014 Mo Nb 16.015 Mo W 16.016 Mo Ti 16.017 Ti Ta 16.018 Ti Nb 16.019 Ti W 16.020 Ti Mo - Table 17: Table 17 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 2-5 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 17 Amount of Amount of No. Component 1 component 1 Component 2 component 2 17.001 Nb 2-5 wt. % Ta ad 100 wt. % 17.002 Nb 2-5 wt. % W ad 100 wt. % 17.003 Nb 2-5 wt. % Mo ad 100 wt. % 17.004 Nb 2-5 wt. % Ti ad 100 wt. % 17.005 Ta 2-5 wt. % Nb ad 100 wt. % 17.006 Ta 2-5 wt. % W ad 100 wt. % 17.007 Ta 2-5 wt. % Mo ad 100 wt. % 17.008 Ta 2-5 wt. % Ti ad 100 wt. % 17.009 W 2-5 wt. % Ta ad 100 wt. % 17.010 W 2-5 wt. % Nb ad 100 wt. % 17.011 W 2-5 wt. % Mo ad 100 wt. % 17.012 W 2-5 wt. % Ti ad 100 wt. % 17.013 Mo 2-5 wt. % Ta ad 100 wt. % 17.014 Mo 2-5 wt. % Nb ad 100 wt. % 17.015 Mo 2-5 wt. % W ad 100 wt. % 17.016 Mo 2-5 wt. % Ti ad 100 wt. % 17.017 Ti 2-5 wt. % Ta ad 100 wt. % 17.018 Ti 2-5 wt. % Nb ad 100 wt. % 17.019 Ti 2-5 wt. % W ad 100 wt. % 17.020 Ti 2-5 wt. % Mo ad 100 wt. % - Table 18: Table 18 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 5-10 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being listed in Table 16. -
TABLE 18 Amount of Amount of No. Component 1 component 1 Component 2 component 2 18.001 Nb 5-10 wt. % Ta ad 100 wt. % 18.002 Nb 5-10 wt. % W ad 100 wt. % 18.003 Nb 5-10 wt. % Mo ad 100 wt. % 18.004 Nb 5-10 wt. % Ti ad 100 wt. % 18.005 Ta 5-10 wt. % Nb ad 100 wt. % 18.006 Ta 5-10 wt. % W ad 100 wt. % 18.007 Ta 5-10 wt. % Mo ad 100 wt. % 18.008 Ta 5-10 wt. % Ti ad 100 wt. % 18.009 W 5-10 wt. % Ta ad 100 wt. % 18.010 W 5-10 wt. % Nb ad 100 wt. % 18.011 W 5-10 wt. % Mo ad 100 wt. % 18.012 W 5-10 wt. % Ti ad 100 wt. % 18.013 Mo 5-10 wt. % Ta ad 100 wt. % 18.014 Mo 5-10 wt. % Nb ad 100 wt. % 18.015 Mo 5-10 wt. % W ad 100 wt. % 18.016 Mo 5-10 wt. % Ti ad 100 wt. % 18.017 Ti 5-10 wt. % Ta ad 100 wt. % 18.018 Ti 5-10 wt. % Nb ad 100 wt. % 18.019 Ti 5-10 wt. % W ad 100 wt. % 18.020 Ti 5-10 wt. % Mo ad 100 wt. % - Table 19: Table 19 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 10-15 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 19 Amount of Amount of No. Component 1 component 1 Component 2 component 2 19.001 Nb 10-15 wt. % Ta ad 100 wt. % 19.002 Nb 10-15 wt. % W ad 100 wt. % 19.003 Nb 10-15 wt. % Mo ad 100 wt. % 19.004 Nb 10-15 wt. % Ti ad 100 wt. % 19.005 Ta 10-15 wt. % Nb ad 100 wt. % 19.006 Ta 10-15 wt. % W ad 100 wt. % 19.007 Ta 10-15 wt. % Mo ad 100 wt. % 19.008 Ta 10-15 wt. % Ti ad 100 wt. % 19.009 W 10-15 wt. % Ta ad 100 wt. % 19.010 W 10-15 wt. % Nb ad 100 wt. % 19.011 W 10-15 wt. % Mo ad 100 wt. % 19.012 W 10-15 wt. % Ti ad 100 wt. % 19.013 Mo 10-15 wt. % Ta ad 100 wt. % 19.014 Mo 10-15 wt. % Nb ad 100 wt. % 19.015 Mo 10-15 wt. % W ad 100 wt. % 19.016 Mo 10-15 wt. % Ti ad 100 wt. % 19.017 Ti 10-15 wt. % Ta ad 100 wt. % 19.018 Ti 10-15 wt. % Nb ad 100 wt. % 19.019 Ti 10-15 wt. % W ad 100 wt. % 19.020 Ti 10-15 wt. % Mo ad 100 wt. % - Table 20: Table 20 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 15-20 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 20 Amount of Amount of No. Component 1 component 1 Component 2 component 2 20.001 Nb 15-20 wt. % Ta ad 100 wt. % 20.002 Nb 15-20 wt. % W ad 100 wt. % 20.003 Nb 15-20 wt. % Mo ad 100 wt. % 20.004 Nb 15-20 wt. % Ti ad 100 wt. % 20.005 Ta 15-20 wt. % Nb ad 100 wt. % 20.006 Ta 15-20 wt. % W ad 100 wt. % 20.007 Ta 15-20 wt. % Mo ad 100 wt. % 20.008 Ta 15-20 wt. % Ti ad 100 wt. % 20.009 W 15-20 wt. % Ta ad 100 wt. % 20.010 W 15-20 wt. % Nb ad 100 wt. % 20.011 W 15-20 wt. % Mo ad 100 wt. % 20.012 W 15-20 wt. % Ti ad 100 wt. % 20.013 Mo 15-20 wt. % Ta ad 100 wt. % 20.014 Mo 15-20 wt. % Nb ad 100 wt. % 20.015 Mo 15-20 wt. % W ad 100 wt. % 20.016 Mo 15-20 wt. % Ti ad 100 wt. % 20.017 Ti 15-20 wt. % Ta ad 100 wt. % 20.018 Ti 15-20 wt. % Nb ad 100 wt. % 20.019 Ti 15-20 wt. % W ad 100 wt. % 20.020 Ti 15-20 wt. % Mo ad 100 wt. % - Table 21: Table 21 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 20-25 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 21 Amount of Amount of No. Component 1 component 1 Component 2 component 2 21.001 Nb 20-25 wt. % Ta ad 100 wt. % 21.002 Nb 20-25 wt. % W ad 100 wt. % 21.003 Nb 20-25 wt. % Mo ad 100 wt. % 21.004 Nb 20-25 wt. % Ti ad 100 wt. % 21.005 Ta 20-25 wt. % Nb ad 100 wt. % 21.006 Ta 20-25 wt. % W ad 100 wt. % 21.007 Ta 20-25 wt. % Mo ad 100 wt. % 21.008 Ta 20-25 wt. % Ti ad 100 wt. % 21.009 W 20-25 wt. % Ta ad 100 wt. % 21.010 W 20-25 wt. % Nb ad 100 wt. % 21.011 W 20-25 wt. % Mo ad 100 wt. % 21.012 W 20-25 wt. % Ti ad 100 wt. % 21.013 Mo 20-25 wt. % Ta ad 100 wt. % 21.014 Mo 20-25 wt. % Nb ad 100 wt. % 21.015 Mo 20-25 wt. % W ad 100 wt. % 21.016 Mo 20-25 wt. % Ti ad 100 wt. % 21.017 Ti 20-25 wt. % Ta ad 100 wt. % 21.018 Ti 20-25 wt. % Nb ad 100 wt. % 21.019 Ti 20-25 wt. % W ad 100 wt. % 21.020 Ti 20-25 wt. % Mo ad 100 wt. % - Table 22: Table 22 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 25-30 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 22 Amount of Amount of No. Component 1 component 1 Component 2 component 2 22.001 Nb 25-30 wt. % Ta ad 100 wt. % 22.002 Nb 25-30 wt. % W ad 100 wt. % 22.003 Nb 25-30 wt. % Mo ad 100 wt. % 22.004 Nb 25-30 wt. % Ti ad 100 wt. % 22.005 Ta 25-30 wt. % Nb ad 100 wt. % 22.006 Ta 25-30 wt. % W ad 100 wt. % 22.007 Ta 25-30 wt. % Mo ad 100 wt. % 22.008 Ta 25-30 wt. % Ti ad 100 wt. % 22.009 W 25-30 wt. % Ta ad 100 wt. % 22.010 W 25-30 wt. % Nb ad 100 wt. % 22.011 W 25-30 wt. % Mo ad 100 wt. % 22.012 W 25-30 wt. % Ti ad 100 wt. % 22.013 Mo 25-30 wt. % Ta ad 100 wt. % 22.014 Mo 25-30 wt. % Nb ad 100 wt. % 22.015 Mo 25-30 wt. % W ad 100 wt. % 22.016 Mo 25-30 wt. % Ti ad 100 wt. % 22.017 Ti 25-30 wt. % Ta ad 100 wt. % 22.018 Ti 25-30 wt. % Nb ad 100 wt. % 22.019 Ti 25-30 wt. % W ad 100 wt. % 22.020 Ti 25-30 wt. % Mo ad 100 wt. % - Table 23: Table 23 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 30-35 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 23 Amount of Amount of No. Component 1 component 1 Component 2 component 2 23.001 Nb 30-35 wt. % Ta ad 100 wt. % 23.002 Nb 30-35 wt. % W ad 100 wt. % 23.003 Nb 30-35 wt. % Mo ad 100 wt. % 23.004 Nb 30-35 wt. % Ti ad 100 wt. % 23.005 Ta 30-35 wt. % Nb ad 100 wt. % 23.006 Ta 30-35 wt. % W ad 100 wt. % 23.007 Ta 30-35 wt. % Mo ad 100 wt. % 23.008 Ta 30-35 wt. % Ti ad 100 wt. % 23.009 W 30-35 wt. % Ta ad 100 wt. % 23.010 W 30-35 wt. % Nb ad 100 wt. % 23.011 W 30-35 wt. % Mo ad 100 wt. % 23.012 W 30-35 wt. % Ti ad 100 wt. % 23.013 Mo 30-35 wt. % Ta ad 100 wt. % 23.014 Mo 30-35 wt. % Nb ad 100 wt. % 23.015 Mo 30-35 wt. % W ad 100 wt. % 23.016 Mo 30-35 wt. % Ti ad 100 wt. % 23.017 Ti 30-35 wt. % Ta ad 100 wt. % 23.018 Ti 30-35 wt. % Nb ad 100 wt. % 23.019 Ti 30-35 wt. % W ad 100 wt. % 23.020 Ti 30-35 wt. % Mo ad 100 wt. % - Table 24: Table 24 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 35-40 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 24 Amount of Amount of No. Component 1 component 1 Component 2 component 2 24.001 Nb 35-40 wt. % Ta ad 100 wt. % 24.002 Nb 35-40 wt. % W ad 100 wt. % 24.003 Nb 35-40 wt. % Mo ad 100 wt. % 24.004 Nb 35-40 wt. % Ti ad 100 wt. % 24.005 Ta 35-40 wt. % Nb ad 100 wt. % 24.006 Ta 35-40 wt. % W ad 100 wt. % 24.007 Ta 35-40 wt. % Mo ad 100 wt. % 24.008 Ta 35-40 wt. % Ti ad 100 wt. % 24.009 W 35-40 wt. % Ta ad 100 wt. % 24.010 W 35-40 wt. % Nb ad 100 wt. % 24.011 W 35-40 wt. % Mo ad 100 wt. % 24.012 W 35-40 wt. % Ti ad 100 wt. % 24.013 Mo 35-40 wt. % Ta ad 100 wt. % 24.014 Mo 35-40 wt. % Nb ad 100 wt. % 24.015 Mo 35-40 wt. % W ad 100 wt. % 24.016 Mo 35-40 wt. % Ti ad 100 wt. % 24.017 Ti 35-40 wt. % Ta ad 100 wt. % 24.018 Ti 35-40 wt. % Nb ad 100 wt. % 24.019 Ti 35-40 wt. % W ad 100 wt. % 24.020 Ti 35-40 wt. % Mo ad 100 wt. % - Table 25: Table 25 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 40-45 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 25 Amount of Amount of No. Component 1 component 1 Component 2 component 2 25.001 Nb 40-45 wt. % Ta ad 100 wt. % 25.002 Nb 40-45 wt. % W ad 100 wt. % 25.003 Nb 40-45 wt. % Mo ad 100 wt. % 25.004 Nb 40-45 wt. % Ti ad 100 wt. % 25.005 Ta 40-45 wt. % Nb ad 100 wt. % 25.006 Ta 40-45 wt. % W ad 100 wt. % 25.007 Ta 40-45 wt. % Mo ad 100 wt. % 25.008 Ta 40-45 wt. % Ti ad 100 wt. % 25.009 W 40-45 wt. % Ta ad 100 wt. % 25.010 W 40-45 wt. % Nb ad 100 wt. % 25.011 W 40-45 wt. % Mo ad 100 wt. % 25.012 W 40-45 wt. % Ti ad 100 wt. % 25.013 Mo 40-45 wt. % Ta ad 100 wt. % 25.014 Mo 40-45 wt. % Nb ad 100 wt. % 25.015 Mo 40-45 wt. % W ad 100 wt. % 25.016 Mo 40-45 wt. % Ti ad 100 wt. % 25.017 Ti 40-45 wt. % Ta ad 100 wt. % 25.018 Ti 40-45 wt. % Nb ad 100 wt. % 25.019 Ti 40-45 wt. % W ad 100 wt. % 25.020 Ti 40-45 wt. % Mo ad 100 wt. % - Table 26: Table 26 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 45-50 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 26 Amount of Amount of No. Component 1 component 1 Component 2 component 2 26.001 Nb 45-50 wt. % Ta ad 100 wt. % 26.002 Nb 45-50 wt. % W ad 100 wt. % 26.003 Nb 45-50 wt. % Mo ad 100 wt. % 26.004 Nb 45-50 wt. % Ti ad 100 wt. % 26.005 Ta 45-50 wt. % Nb ad 100 wt. % 26.006 Ta 45-50 wt. % W ad 100 wt. % 26.007 Ta 45-50 wt. % Mo ad 100 wt. % 26.008 Ta 45-50 wt. % Ti ad 100 wt. % 26.009 W 45-50 wt. % Ta ad 100 wt. % 26.010 W 45-50 wt. % Nb ad 100 wt. % 26.011 W 45-50 wt. % Mo ad 100 wt. % 26.012 W 45-50 wt. % Ti ad 100 wt. % 26.013 Mo 45-50 wt. % Ta ad 100 wt. % 26.014 Mo 45-50 wt. % Nb ad 100 wt. % 26.015 Mo 45-50 wt. % W ad 100 wt. % 26.016 Mo 45-50 wt. % Ti ad 100 wt. % 26.017 Ti 45-50 wt. % Ta ad 100 wt. % 26.018 Ti 45-50 wt. % Nb ad 100 wt. % 26.019 Ti 45-50 wt. % W ad 100 wt. % 26.020 Ti 45-50 wt. % Mo ad 100 wt. % - Table 27: Table 27 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 50-55 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 27 Amount of Amount of No. Component 1 component 1 Component 2 component 2 27.001 Nb 50-55 wt. % Ta ad 100 wt. % 27.002 Nb 50-55 wt. % W ad 100 wt. % 27.003 Nb 50-55 wt. % Mo ad 100 wt. % 27.004 Nb 50-55 wt. % Ti ad 100 wt. % 27.005 Ta 50-55 wt. % Nb ad 100 wt. % 27.006 Ta 50-55 wt. % W ad 100 wt. % 27.007 Ta 50-55 wt. % Mo ad 100 wt. % 27.008 Ta 50-55 wt. % Ti ad 100 wt. % 27.009 W 50-55 wt. % Ta ad 100 wt. % 27.010 W 50-55 wt. % Nb ad 100 wt. % 27.011 W 50-55 wt. % Mo ad 100 wt. % 27.012 W 50-55 wt. % Ti ad 100 wt. % 27.013 Mo 50-55 wt. % Ta ad 100 wt. % 27.014 Mo 50-55 wt. % Nb ad 100 wt. % 27.015 Mo 50-55 wt. % W ad 100 wt. % 27.016 Mo 50-55 wt. % Ti ad 100 wt. % 27.017 Ti 50-55 wt. % Ta ad 100 wt. % 27.018 Ti 50-55 wt. % Nb ad 100 wt. % 27.019 Ti 50-55 wt. % W ad 100 wt. % 27.020 Ti 50-55 wt. % Mo ad 100 wt. % - Table 28: Table 28 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 55-60 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 28 Amount of Amount of No. Component 1 component 1 Component 2 component 2 28.001 Nb 55-60 wt. % Ta ad 100 wt. % 28.002 Nb 55-60 wt. % W ad 100 wt. % 28.003 Nb 55-60 wt. % Mo ad 100 wt. % 28.004 Nb 55-60 wt. % Ti ad 100 wt. % 28.005 Ta 55-60 wt. % Nb ad 100 wt. % 28.006 Ta 55-60 wt. % W ad 100 wt. % 28.007 Ta 55-60 wt. % Mo ad 100 wt. % 28.008 Ta 55-60 wt. % Ti ad 100 wt. % 28.009 W 55-60 wt. % Ta ad 100 wt. % 28.010 W 55-60 wt. % Nb ad 100 wt. % 28.011 W 55-60 wt. % Mo ad 100 wt. % 28.012 W 55-60 wt. % Ti ad 100 wt. % 28.013 Mo 55-60 wt. % Ta ad 100 wt. % 28.014 Mo 55-60 wt. % Nb ad 100 wt. % 28.015 Mo 55-60 wt. % W ad 100 wt. % 28.016 Mo 55-60 wt. % Ti ad 100 wt. % 28.017 Ti 55-60 wt. % Ta ad 100 wt. % 28.018 Ti 55-60 wt. % Nb ad 100 wt. % 28.019 Ti 55-60 wt. % W ad 100 wt. % 28.020 Ti 55-60 wt. % Mo ad 100 wt. % - Table 29: Table 29 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 60-65 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 29 Amount of Amount of No. Component 1 component 1 Component 2 component 2 29.001 Nb 60-65 wt. % Ta ad 100 wt. % 29.002 Nb 60-65 wt. % W ad 100 wt. % 29.003 Nb 60-65 wt. % Mo ad 100 wt. % 29.004 Nb 60-65 wt. % Ti ad 100 wt. % 29.005 Ta 60-65 wt. % Nb ad 100 wt. % 29.006 Ta 60-65 wt. % W ad 100 wt. % 29.007 Ta 60-65 wt. % Mo ad 100 wt. % 29.008 Ta 60-65 wt. % Ti ad 100 wt. % 29.009 W 60-65 wt. % Ta ad 100 wt. % 29.010 W 60-65 wt. % Nb ad 100 wt. % 29.011 W 60-65 wt. % Mo ad 100 wt. % 29.012 W 60-65 wt. % Ti ad 100 wt. % 29.013 Mo 60-65 wt. % Ta ad 100 wt. % 29.014 Mo 60-65 wt. % Nb ad 100 wt. % 29.015 Mo 60-65 wt. % W ad 100 wt. % 29.016 Mo 60-65 wt. % Ti ad 100 wt. % 29.017 Ti 60-65 wt. % Ta ad 100 wt. % 29.018 Ti 60-65 wt. % Nb ad 100 wt. % 29.019 Ti 60-65 wt. % W ad 100 wt. % 29.020 Ti 60-65 wt. % Mo ad 100 wt. % - Table 30: Table 30 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 65-70 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 30 Amount of Amount of No. Component 1 component 1 Component 2 component 2 30.001 Nb 65-70 wt. % Ta ad 100 wt. % 30.002 Nb 65-70 wt. % W ad 100 wt. % 30.003 Nb 65-70 wt. % Mo ad 100 wt. % 30.004 Nb 65-70 wt. % Ti ad 100 wt. % 30.005 Ta 65-70 wt. % Nb ad 100 wt. % 30.006 Ta 65-70 wt. % W ad 100 wt. % 30.007 Ta 65-70 wt. % Mo ad 100 wt. % 30.008 Ta 65-70 wt. % Ti ad 100 wt. % 30.009 W 65-70 wt. % Ta ad 100 wt. % 30.010 W 65-70 wt. % Nb ad 100 wt. % 30.011 W 65-70 wt. % Mo ad 100 wt. % 30.012 W 65-70 wt. % Ti ad 100 wt. % 30.013 Mo 65-70 wt. % Ta ad 100 wt. % 30.014 Mo 65-70 wt. % Nb ad 100 wt. % 30.015 Mo 65-70 wt. % W ad 100 wt. % 30.016 Mo 65-70 wt. % Ti ad 100 wt. % 30.017 Ti 65-70 wt. % Ta ad 100 wt. % 30.018 Ti 65-70 wt. % Nb ad 100 wt. % 30.019 Ti 65-70 wt. % W ad 100 wt. % 30.020 Ti 65-70 wt. % Mo ad 100 wt. % - Table 31: Table 31 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 70-75 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 31 Amount of Amount of No. Component 1 component 1 Component 2 component 2 31.001 Nb 70-75 wt. % Ta ad 100 wt. % 31.002 Nb 70-75 wt. % W ad 100 wt. % 31.003 Nb 70-75 wt. % Mo ad 100 wt. % 31.004 Nb 70-75 wt. % Ti ad 100 wt. % 31.005 Ta 70-75 wt. % Nb ad 100 wt. % 31.006 Ta 70-75 wt. % W ad 100 wt. % 31.007 Ta 70-75 wt. % Mo ad 100 wt. % 31.008 Ta 70-75 wt. % Ti ad 100 wt. % 31.009 W 70-75 wt. % Ta ad 100 wt. % 31.010 W 70-75 wt. % Nb ad 100 wt. % 31.011 W 70-75 wt. % Mo ad 100 wt. % 31.012 W 70-75 wt. % Ti ad 100 wt. % 31.013 Mo 70-75 wt. % Ta ad 100 wt. % 31.014 Mo 70-75 wt. % Nb ad 100 wt. % 31.015 Mo 70-75 wt. % W ad 100 wt. % 31.016 Mo 70-75 wt. % Ti ad 100 wt. % 31.017 Ti 70-75 wt. % Ta ad 100 wt. % 31.018 Ti 70-75 wt. % Nb ad 100 wt. % 31.019 Ti 70-75 wt. % W ad 100 wt. % 31.020 Ti 70-75 wt. % Mo ad 100 wt. % - Table 32: Table 32 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 75-80 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 32 Amount of Amount of No. Component 1 component 1 Component 2 component 2 32.001 Nb 75-80 wt. % Ta ad 100 wt. % 32.002 Nb 75-80 wt. % W ad 100 wt. % 32.003 Nb 75-80 wt. % Mo ad 100 wt. % 32.004 Nb 75-80 wt. % Ti ad 100 wt. % 32.005 Ta 75-80 wt. % Nb ad 100 wt. % 32.006 Ta 75-80 wt. % W ad 100 wt. % 32.007 Ta 75-80 wt. % Mo ad 100 wt. % 32.008 Ta 75-80 wt. % Ti ad 100 wt. % 32.009 W 75-80 wt. % Ta ad 100 wt. % 32.010 W 75-80 wt. % Nb ad 100 wt. % 32.011 W 75-80 wt. % Mo ad 100 wt. % 32.012 W 75-80 wt. % Ti ad 100 wt. % 32.013 Mo 75-80 wt. % Ta ad 100 wt. % 32.014 Mo 75-80 wt. % Nb ad 100 wt. % 32.015 Mo 75-80 wt. % W ad 100 wt. % 32.016 Mo 75-80 wt. % Ti ad 100 wt. % 32.017 Ti 75-80 wt. % Ta ad 100 wt. % 32.018 Ti 75-80 wt. % Nb ad 100 wt. % 32.019 Ti 75-80 wt. % W ad 100 wt. % 32.020 Ti 75-80 wt. % Mo ad 100 wt. % - Table 33: Table 33 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 80-85 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 33 Amount of Amount of No. Component 1 component 1 Component 2 component 2 33.001 Nb 80-85 wt. % Ta ad 100 wt. % 33.002 Nb 80-85 wt. % W ad 100 wt. % 33.003 Nb 80-85 wt. % Mo ad 100 wt. % 33.004 Nb 80-85 wt. % Ti ad 100 wt. % 33.005 Ta 80-85 wt. % Nb ad 100 wt. % 33.006 Ta 80-85 wt. % W ad 100 wt. % 33.007 Ta 80-85 wt. % Mo ad 100 wt. % 33.008 Ta 80-85 wt. % Ti ad 100 wt. % 33.009 W 80-85 wt. % Ta ad 100 wt. % 33.010 W 80-85 wt. % Nb ad 100 wt. % 33.011 W 80-85 wt. % Mo ad 100 wt. % 33.012 W 80-85 wt. % Ti ad 100 wt. % 33.013 Mo 80-85 wt. % Ta ad 100 wt. % 33.014 Mo 80-85 wt. % Nb ad 100 wt. % 33.015 Mo 80-85 wt. % W ad 100 wt. % 33.016 Mo 80-85 wt. % Ti ad 100 wt. % 33.017 Ti 80-85 wt. % Ta ad 100 wt. % 33.018 Ti 80-85 wt. % Nb ad 100 wt. % 33.019 Ti 80-85 wt. % W ad 100 wt. % 33.020 Ti 80-85 wt. % Mo ad 100 wt. % - Table 34: Table 34 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 85-90 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 34 Amount of Amount of No. Component 1 component 1 Component 2 component 2 34.001 Nb 85-90 wt. % Ta ad 100 wt. % 34.002 Nb 85-90 wt. % W ad 100 wt. % 34.003 Nb 85-90 wt. % Mo ad 100 wt. % 34.004 Nb 85-90 wt. % Ti ad 100 wt. % 34.005 Ta 85-90 wt. % Nb ad 100 wt. % 34.006 Ta 85-90 wt. % W ad 100 wt. % 34.007 Ta 85-90 wt. % Mo ad 100 wt. % 34.008 Ta 85-90 wt. % Ti ad 100 wt. % 34.009 W 85-90 wt. % Ta ad 100 wt. % 34.010 W 85-90 wt. % Nb ad 100 wt. % 34.011 W 85-90 wt. % Mo ad 100 wt. % 34.012 W 85-90 wt. % Ti ad 100 wt. % 34.013 Mo 85-90 wt. % Ta ad 100 wt. % 34.014 Mo 85-90 wt. % Nb ad 100 wt. % 34.015 Mo 85-90 wt. % W ad 100 wt. % 34.016 Mo 85-90 wt. % Ti ad 100 wt. % 34.017 Ti 85-90 wt. % Ta ad 100 wt. % 34.018 Ti 85-90 wt. % Nb ad 100 wt. % 34.019 Ti 85-90 wt. % W ad 100 wt. % 34.020 Ti 85-90 wt. % Mo ad 100 wt. % - Table 35: Table 35 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 90-95 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 35 Amount of Amount of No. Component 1 component 1 Component 2 component 2 35.001 Nb 90-95 wt. % Ta ad 100 wt. % 35.002 Nb 90-95 wt. % W ad 100 wt. % 35.003 Nb 90-95 wt. % Mo ad 100 wt. % 35.004 Nb 90-95 wt. % Ti ad 100 wt. % 35.005 Ta 90-95 wt. % Nb ad 100 wt. % 35.006 Ta 90-95 wt. % W ad 100 wt. % 35.007 Ta 90-95 wt. % Mo ad 100 wt. % 35.008 Ta 90-95 wt. % Ti ad 100 wt. % 35.009 W 90-95 wt. % Ta ad 100 wt. % 35.010 W 90-95 wt. % Nb ad 100 wt. % 35.011 W 90-95 wt. % Mo ad 100 wt. % 35.012 W 90-95 wt. % Ti ad 100 wt. % 35.013 Mo 90-95 wt. % Ta ad 100 wt. % 35.014 Mo 90-95 wt. % Nb ad 100 wt. % 35.015 Mo 90-95 wt. % W ad 100 wt. % 35.016 Mo 90-95 wt. % Ti ad 100 wt. % 35.017 Ti 90-95 wt. % Ta ad 100 wt. % 35.018 Ti 90-95 wt. % Nb ad 100 wt. % 35.019 Ti 90-95 wt. % W ad 100 wt. % 35.020 Ti 90-95 wt. % Mo ad 100 wt. % - Table 36: Table 36 consists of 20 alloys, pseudo alloys and powder mixtures according to Table 16, component 1 being present in an amount of 95-99 wt. %, component 2 being present in an
amount ad 100 wt. % and the individual partners in the mixture being as listed in Table 16. -
TABLE 36 Amount of Amount of No. Component 1 component 1 Component 2 component 2 36.001 Nb 95-99 wt. % Ta ad 100 wt. % 36.002 Nb 95-99 wt. % W ad 100 wt. % 36.003 Nb 95-99 wt. % Mo ad 100 wt. % 36.004 Nb 95-99 wt. % Ti ad 100 wt. % 36.005 Ta 95-99 wt. % Nb ad 100 wt. % 36.006 Ta 95-99 wt. % W ad 100 wt. % 36.007 Ta 95-99 wt. % Mo ad 100 wt. % 36.008 Ta 95-99 wt. % Ti ad 100 wt. % 36.009 W 95-99 wt. % Ta ad 100 wt. % 36.010 W 95-99 wt. % Nb ad 100 wt. % 36.011 W 95-99 wt. % Mo ad 100 wt. % 36.012 W 95-99 wt. % Ti ad 100 wt. % 36.013 Mo 95-99 wt. % Ta ad 100 wt. % 36.014 Mo 95-99 wt. % Nb ad 100 wt. % 36.015 Mo 95-99 wt. % W ad 100 wt. % 36.016 Mo 95-99 wt. % Ti ad 100 wt. % 36.017 Ti 95-99 wt. % Ta ad 100 wt. % 36.018 Ti 95-99 wt. % Nb ad 100 wt. % 36.019 Ti 95-99 wt. % W ad 100 wt. % 36.020 Ti 95-99 wt. % Mo ad 100 wt. % - A tantalum hydride powder was mixed with 0.3 wt. % magnesium and placed in a vacuum oven. The oven was evacuated and filled with argon. The pressure was 860 Torr, a stream of argon was maintained. The oven temperature was raised to 650° C. in steps of 50° C. and, after a constant temperature had been established, was maintained for four hours. The oven temperature was then raised to 1000° C. in steps of 50° C. and, after a constant temperature had been established, was maintained for six hours. At the end of this time, the oven was switched off and cooled to room temperature under argon. Magnesium and the resulting compounds were removed in the conventional manner by acid washing. The resulting tantalum powder had a particle size of −100 mesh (<150 μm), an oxygen content of 77 ppm and a specific BET surface area of 255 cm2/g.
- The procedure was as for the preparation of the tantalum powder. A titanium powder having an oxygen content of 93 ppm was obtained.
- A mixture of tantalum hydride powder and titanium hydride powder in a molar ratio of 1:1 was prepared and was mixed with 0.3 wt. % magnesium; the procedure as in the preparation of the tantalum powder was then followed. A titanium/tantalum powder having an oxygen content of 89 ppm was obtained.
- Production of Coatings
- Tantalum and niobium coatings were produced. The tantalum powder used was AMPERIT® 150.090 and the niobium powder used was AMPERIT® 160.090, both of which are commercially available materials from H.C. Starck GmbH in Goslar. The commercially available nozzle of the MOC 29 type from CGT GmbH in Ampfing was used.
-
Material Tantalum Tantalum Niobium Niobium Nozzle MOC 29 MOC 29 MOC 29 MOC 29 Determination of the feed rate at 0.52 Nm3/h: 3.0 rpm (g/30 s/g/min) 35.5/71.0 35.5/71.0 14.7/29.4 14.7/29.4 4.0 rpm (g/30 s/g/min) 19.8/39.6 19.8/39.6 Movement data: Spray speed/ 20/333 20/333 20/333 20/333 speed of the nozzle over the substrate (m/min) (mm/s) Line feed (mm) 1.5 1.5 1.5 1.5 Spraying interval (mm) 30 30 30 30 Process gas: Nitrogen Helium Nitrogen Helium Pressure (bar) 30 28 30 28 Flow (Nm3/h) 65 190/He 60 190/He Proportion of feed gas 8 181 8 181 (%) 3 (N2) 3 (N2) Powder feed Powder feed rate (g/min) 71 71 39.6 39.6 Number of passes 3 3 3 3 Substrates 1FTa 1FS 1FTa 1FV 2FS 2FV 2FS 2FV 1FV 1FS 2FS 1RV 1RS 1RV 1RV 1RS 1RV 1RS 1RS Sheet thickness before 2.86 2.92 2.91 2.84 (mm) Sheet thickness after 3.38 3.44 3.35 3.36 (mm) Coating thickness, 520.00 520.00 436.00 524.00 approx. (μm) *) Porosity/Density 0.9%/ 2.2%/ 99.1% 97.8% - Substrates: The substrates were placed in succession on the specimen holder and coated under the indicated test conditions. The substrate description is made up as follows:
- The number at the beginning indicates the number of identical substrates located next to one another. The following letter indicates whether a flat specimen (F) or a round specimen (R, tube) was used. The following letters indicate the material, Ta meaning tantalum, S meaning a structural steel, and V meaning a stainless steel (chromium-nickel steel).
- Very strong and dense coatings were obtained, which exhibit low porosity and excellent adhesion to the substrates in question. The flow rate densities were between 11 and 21 g/sec*cm2.
-
FIGS. 1 to 10 show light microscope pictures of cross-sections of the resulting tantalum coatings. No inclusions of copper or tungsten are detectable, as occurs with corresponding layers produced by vacuum plasma spraying. The porosity determination was carried out automatically by the image analysis program ImageAccess. - The present invention is not limited to embodiments described herein; reference should be had to the appended claims.
Claims (9)
1. A cold sprayed layer of tungsten, molybdenum, titanium, zirconium, or of mixtures of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of tungsten, molybdenum, titanium, zirconium with other metals, wherein the cold spayed layer has an oxygen content of below 1,000 ppm.
2. The cold sprayed layer as recited in claim 1 , wherein the cold sprayed layer has a density of at least 97% of a density of a bulk material.
3. The cold sprayed layer as recited in claim 1 , wherein the cold sprayed layer is made of tantalum or niobium.
4. The cold sprayed layer as recited in claim 1 , wherein the cold sprayed layer is obtained by a method comprising applying coatings to surfaces,
wherein a gas flow is sprayed at a supersonic speed onto a surface of an object, the gas flow comprising a mixture of a gas and a powder of a material selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium and zirconium, alloys of nobium, tantalum, tungsten, molybdenum, titanium and zirconium, mixtures of nobium, tantalum, tungsten, molybdenum, titanium and zirconium, and alloys of nobium, tantalum, tungsten, molybdenum, titanium and zirconium with other metals, and
wherein the powder has a particle size of from 0.5 to 150 μm and an oxygen content of less than 1,000 ppm.
5. A coated object comprising at least one cold sprayed layer as recited in claim 1 .
6. The coated object as recited in claim 5 , wherein the cold sprayed layer is obtained by a method comprising applying coatings to surfaces,
wherein a gas flow is sprayed at a supersonic speed onto a surface of an object, the gas flow comprising a mixture of a gas and a powder of a material selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium and zirconium, alloys of nobium, tantalum, tungsten, molybdenum, titanium and zirconium, mixtures of nobium, tantalum, tungsten, molybdenum, titanium and zirconium, and alloys of nobium, tantalum, tungsten, molybdenum, titanium and zirconium with other metals, and
wherein the powder has a particle size of from 0.5 to 150 μm and an oxygen content of less than 1,000 ppm.
7. The coated object as recited in claim 5 , wherein the coated object or a component of the coated object comprises at least one of a metal, a ceramic material, and a plastic material.
8. A process of using the coated object as recited in claim 5 as a component in at least one of a chemical plant, a laboratory, a medical device, and an implant, the process comprising:
providing the coated object; and
using the coated object as a component in at least one of a chemical plant, a laboratory, a medical device, and an implant.
9. The coated object as recited in claim 5 , wherein the coated object is a reaction vessel, a mixing vessel, a stirrer, a blind flange, a thermowell, a rupture disk, a rupture disk holder, a shell heat exchanger, a tube heat exchanger, a pipe, a valve, a valve body, or a part of a pump.
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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US10100388B2 (en) | 2011-12-30 | 2018-10-16 | Scoperta, Inc. | Coating compositions |
US10173290B2 (en) | 2014-06-09 | 2019-01-08 | Scoperta, Inc. | Crack resistant hardfacing alloys |
US10329647B2 (en) | 2014-12-16 | 2019-06-25 | Scoperta, Inc. | Tough and wear resistant ferrous alloys containing multiple hardphases |
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Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006117145A2 (en) * | 2005-05-05 | 2006-11-09 | H.C. Starck Gmbh | Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
PL201557B1 (en) * | 2006-03-21 | 2009-04-30 | Andrzej Buchholz | Method of elimination of fretting and tribocorrosion effects on the surface of machine parts directly co-working with one another |
US20080078268A1 (en) * | 2006-10-03 | 2008-04-03 | H.C. Starck Inc. | Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof |
PL2104753T3 (en) * | 2006-11-07 | 2014-12-31 | Starck H C Gmbh | Method for coating a substrate and coated product |
US20080145688A1 (en) * | 2006-12-13 | 2008-06-19 | H.C. Starck Inc. | Method of joining tantalum clade steel structures |
ATE503164T1 (en) * | 2007-01-17 | 2011-04-15 | Dow Corning | WEAR-RESISTANT MATERIALS USED BY DIRECT PROCESS |
US8197894B2 (en) | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
JP2008302311A (en) * | 2007-06-08 | 2008-12-18 | Ihi Corp | Cold spray process |
FR2918910B1 (en) * | 2007-07-16 | 2009-10-23 | Carbone Lorraine Equipements G | METHOD FOR MANUFACTURING A CHEMICAL ENGINEERING ELEMENT |
FR2920440B1 (en) * | 2007-08-31 | 2010-11-05 | Commissariat Energie Atomique | METHOD OF TREATING ANTI-CORROSION OF A PIECE BY DEPOSITION OF A ZIRCONIUM LAYER AND / OR ZIRCONIUM ALLOY |
WO2009046432A1 (en) * | 2007-10-05 | 2009-04-09 | Diamond Innovations, Inc. | Braze-metal coated articles and process for making same |
JP5321942B2 (en) * | 2008-02-29 | 2013-10-23 | 新東工業株式会社 | Method for manufacturing electronic circuit board and electronic circuit board |
JP5778373B2 (en) * | 2008-03-31 | 2015-09-16 | 富士通株式会社 | Deposition method |
US8246903B2 (en) | 2008-09-09 | 2012-08-21 | H.C. Starck Inc. | Dynamic dehydriding of refractory metal powders |
US8043655B2 (en) * | 2008-10-06 | 2011-10-25 | H.C. Starck, Inc. | Low-energy method of manufacturing bulk metallic structures with submicron grain sizes |
TWI478186B (en) * | 2009-08-11 | 2015-03-21 | Hermes Epitek Corp | Electrode structure adapted for high applied voltage and fabrication method thereof |
KR101233279B1 (en) * | 2010-08-06 | 2013-02-14 | 설영택 | Surface metal oxides for implants, implants or devices using the same and method for producing the implants or devices |
DE102011052121A1 (en) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Coating process using special powder coating materials and use of such coating materials |
US8703233B2 (en) | 2011-09-29 | 2014-04-22 | H.C. Starck Inc. | Methods of manufacturing large-area sputtering targets by cold spray |
US9335296B2 (en) | 2012-10-10 | 2016-05-10 | Westinghouse Electric Company Llc | Systems and methods for steam generator tube analysis for detection of tube degradation |
TWI572733B (en) | 2013-08-01 | 2017-03-01 | 史達克公司 | Partial spray refurbishment of sputtering targets |
RU2583222C1 (en) * | 2014-12-30 | 2016-05-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Кубанский государственный технологический университет" (ФГБОУ ВПО "КубГТУ") | Method of producing nano-structured coatings of titanium-nickel-zirconium with shape memory effect |
US9609874B1 (en) * | 2016-07-21 | 2017-04-04 | Kuwait Institute For Scientific Research | Metallic glassy alloy powders for antibacterial coating |
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JP2020536177A (en) * | 2017-09-28 | 2020-12-10 | マクステリアル インコーポレイテッド | Articles containing surface coatings and methods for producing them |
JP7116360B2 (en) * | 2018-07-20 | 2022-08-10 | 日産自動車株式会社 | sliding member |
US11935662B2 (en) | 2019-07-02 | 2024-03-19 | Westinghouse Electric Company Llc | Elongate SiC fuel elements |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6780458B2 (en) * | 2001-08-01 | 2004-08-24 | Siemens Westinghouse Power Corporation | Wear and erosion resistant alloys applied by cold spray technique |
Family Cites Families (168)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3436299A (en) | 1965-12-17 | 1969-04-01 | Celanese Corp | Polymer bonding |
US3990784A (en) | 1974-06-05 | 1976-11-09 | Optical Coating Laboratory, Inc. | Coated architectural glass system and method |
US4011981A (en) | 1975-03-27 | 1977-03-15 | Olin Corporation | Process for bonding titanium, tantalum, and alloys thereof |
US4073427A (en) | 1976-10-07 | 1978-02-14 | Fansteel Inc. | Lined equipment with triclad wall construction |
US4140172A (en) | 1976-12-23 | 1979-02-20 | Fansteel Inc. | Liners and tube supports for industrial and chemical process equipment |
JPS5467198A (en) * | 1977-11-07 | 1979-05-30 | Kawasaki Heavy Ind Ltd | Anti-corrosion material for high temperature weak oxidation atmosphere |
US4291104A (en) | 1978-04-17 | 1981-09-22 | Fansteel Inc. | Brazed corrosion resistant lined equipment |
US4202932A (en) | 1978-07-21 | 1980-05-13 | Xerox Corporation | Magnetic recording medium |
US4209375A (en) | 1979-08-02 | 1980-06-24 | The United States Of America As Represented By The United States Department Of Energy | Sputter target |
DE3130392C2 (en) | 1981-07-31 | 1985-10-17 | Hermann C. Starck Berlin, 1000 Berlin | Process for the production of pure agglomerated valve metal powder for electrolytic capacitors, their use and process for the production of sintered anodes |
US4510171A (en) | 1981-09-11 | 1985-04-09 | Monsanto Company | Clad metal joint closure |
US4459062A (en) | 1981-09-11 | 1984-07-10 | Monsanto Company | Clad metal joint closure |
CA1202599A (en) | 1982-06-10 | 1986-04-01 | Michael G. Down | Upgrading titanium, zirconium and hafnium powders by plasma processing |
DE3309891A1 (en) | 1983-03-18 | 1984-10-31 | Hermann C. Starck Berlin, 1000 Berlin | METHOD FOR PRODUCING VALVE METAL ANLANDS FOR ELECTROLYTE CAPACITORS |
US4508563A (en) | 1984-03-19 | 1985-04-02 | Sprague Electric Company | Reducing the oxygen content of tantalum |
US4818629A (en) | 1985-08-26 | 1989-04-04 | Fansteel Inc. | Joint construction for lined equipment |
KR960004799B1 (en) | 1986-12-22 | 1996-04-13 | 가와사끼 세이데쓰 가부시끼가이샤 | Method and apparatus for spray coating or refractory material to refractory construction |
US4722756A (en) | 1987-02-27 | 1988-02-02 | Cabot Corp | Method for deoxidizing tantalum material |
US4731111A (en) | 1987-03-16 | 1988-03-15 | Gte Products Corporation | Hydrometallurical process for producing finely divided spherical refractory metal based powders |
US4915745A (en) | 1988-09-22 | 1990-04-10 | Atlantic Richfield Company | Thin film solar cell and method of making |
ES2020131A6 (en) * | 1989-06-26 | 1991-07-16 | Cabot Corp | Powders and products of tantalum, niobium and their alloys |
US5242481A (en) * | 1989-06-26 | 1993-09-07 | Cabot Corporation | Method of making powders and products of tantalum and niobium |
US5147125A (en) | 1989-08-24 | 1992-09-15 | Viratec Thin Films, Inc. | Multilayer anti-reflection coating using zinc oxide to provide ultraviolet blocking |
US4964906A (en) | 1989-09-26 | 1990-10-23 | Fife James A | Method for controlling the oxygen content of tantalum material |
JP3031474B2 (en) * | 1989-12-26 | 2000-04-10 | 株式会社東芝 | Method for manufacturing high-purity tantalum material, tantalum target, thin film, and semiconductor device |
WO1991019016A1 (en) * | 1990-05-19 | 1991-12-12 | Institut Teoreticheskoi I Prikladnoi Mekhaniki Sibirskogo Otdelenia Akademii Nauk Sssr | Method and device for coating |
US5091244A (en) | 1990-08-10 | 1992-02-25 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
US5270858A (en) | 1990-10-11 | 1993-12-14 | Viratec Thin Films Inc | D.C. reactively sputtered antireflection coatings |
US5271965A (en) | 1991-01-16 | 1993-12-21 | Browning James A | Thermal spray method utilizing in-transit powder particle temperatures below their melting point |
US5612254A (en) | 1992-06-29 | 1997-03-18 | Intel Corporation | Methods of forming an interconnect on a semiconductor substrate |
US5693203A (en) | 1992-09-29 | 1997-12-02 | Japan Energy Corporation | Sputtering target assembly having solid-phase bonded interface |
US5305946A (en) | 1992-11-05 | 1994-04-26 | Nooter Corporation | Welding process for clad metals |
JP3197640B2 (en) | 1992-11-30 | 2001-08-13 | 朝日興業株式会社 | Bubble generator |
US5330798A (en) | 1992-12-09 | 1994-07-19 | Browning Thermal Systems, Inc. | Thermal spray method and apparatus for optimizing flame jet temperature |
US5679473A (en) | 1993-04-01 | 1997-10-21 | Asahi Komag Co., Ltd. | Magnetic recording medium and method for its production |
RU2038411C1 (en) * | 1993-11-17 | 1995-06-27 | Совместное предприятие "Петровский трейд хаус" | Method for application of coatings |
US6103392A (en) | 1994-12-22 | 2000-08-15 | Osram Sylvania Inc. | Tungsten-copper composite powder |
US5795626A (en) * | 1995-04-28 | 1998-08-18 | Innovative Technology Inc. | Coating or ablation applicator with a debris recovery attachment |
WO1997008359A1 (en) | 1995-08-23 | 1997-03-06 | Asahi Glass Company Ltd. | Target, process for production thereof, and method of forming highly refractive film |
DE19532244C2 (en) | 1995-09-01 | 1998-07-02 | Peak Werkstoff Gmbh | Process for the production of thin-walled tubes (I) |
US5993513A (en) | 1996-04-05 | 1999-11-30 | Cabot Corporation | Method for controlling the oxygen content in valve metal materials |
US5954856A (en) | 1996-04-25 | 1999-09-21 | Cabot Corporation | Method of making tantalum metal powder with controlled size distribution and products made therefrom |
US5859654A (en) | 1996-10-31 | 1999-01-12 | Hewlett-Packard Company | Print head for ink-jet printing a method for making print heads |
PT964937E (en) | 1997-02-19 | 2002-03-28 | Starck H C Gmbh | PROCESS FOR THEIR PREPARATION AS WELL AS SINTERIZED ANODOS OBTAINED FROM THAT PO |
US5972065A (en) | 1997-07-10 | 1999-10-26 | The Regents Of The University Of California | Purification of tantalum by plasma arc melting |
KR20010032498A (en) | 1997-11-26 | 2001-04-25 | 조셉 제이. 스위니 | Damage-free sculptured coating deposition |
US6911124B2 (en) | 1998-09-24 | 2005-06-28 | Applied Materials, Inc. | Method of depositing a TaN seed layer |
JP3052240B2 (en) * | 1998-02-27 | 2000-06-12 | 東京タングステン株式会社 | Rotating anode for X-ray tube and method for producing the same |
JPH11269639A (en) * | 1998-03-24 | 1999-10-05 | Sumitomo Metal Mining Co Ltd | Method for regenerating sputtering target |
US6171363B1 (en) | 1998-05-06 | 2001-01-09 | H. C. Starck, Inc. | Method for producing tantallum/niobium metal powders by the reduction of their oxides with gaseous magnesium |
US6189663B1 (en) | 1998-06-08 | 2001-02-20 | General Motors Corporation | Spray coatings for suspension damper rods |
DE19847012A1 (en) | 1998-10-13 | 2000-04-20 | Starck H C Gmbh Co Kg | Niobium powder and process for its manufacture |
FR2785897B1 (en) | 1998-11-16 | 2000-12-08 | Commissariat Energie Atomique | THIN FILM OF HAFNIUM OXIDE AND DEPOSITION METHOD |
US6328927B1 (en) | 1998-12-24 | 2001-12-11 | Praxair Technology, Inc. | Method of making high-density, high-purity tungsten sputter targets |
US6197082B1 (en) | 1999-02-17 | 2001-03-06 | H.C. Starck, Inc. | Refining of tantalum and tantalum scrap with carbon |
US6558447B1 (en) | 1999-05-05 | 2003-05-06 | H.C. Starck, Inc. | Metal powders produced by the reduction of the oxides with gaseous magnesium |
US6139913A (en) | 1999-06-29 | 2000-10-31 | National Center For Manufacturing Sciences | Kinetic spray coating method and apparatus |
JP2001020065A (en) | 1999-07-07 | 2001-01-23 | Hitachi Metals Ltd | Target for sputtering, its production and high melting point metal powder material |
US6521173B2 (en) | 1999-08-19 | 2003-02-18 | H.C. Starck, Inc. | Low oxygen refractory metal powder for powder metallurgy |
US6261337B1 (en) | 1999-08-19 | 2001-07-17 | Prabhat Kumar | Low oxygen refractory metal powder for powder metallurgy |
DE19942916A1 (en) | 1999-09-08 | 2001-03-15 | Linde Gas Ag | Manufacture of foamable metal bodies and metal foams |
US6245390B1 (en) | 1999-09-10 | 2001-06-12 | Viatcheslav Baranovski | High-velocity thermal spray apparatus and method of forming materials |
JP2001085378A (en) | 1999-09-13 | 2001-03-30 | Sony Corp | Semiconductor device and manufacturing method thereof |
US6258402B1 (en) | 1999-10-12 | 2001-07-10 | Nakhleh Hussary | Method for repairing spray-formed steel tooling |
JP2001131767A (en) * | 1999-11-09 | 2001-05-15 | Takuo Hashiguchi | Metal film forming method |
RU2166421C1 (en) | 1999-12-06 | 2001-05-10 | Государственный космический научно-производственный центр им. М.В. Хруничева | Method of machine parts reconditioning |
CN1214129C (en) | 1999-12-28 | 2005-08-10 | 东芝株式会社 | Parts for vacuum film-forming device and vacuum film-forming device using the same and board device thereof |
US6331233B1 (en) | 2000-02-02 | 2001-12-18 | Honeywell International Inc. | Tantalum sputtering target with fine grains and uniform texture and method of manufacture |
US7122069B2 (en) | 2000-03-29 | 2006-10-17 | Osram Sylvania Inc. | Mo-Cu composite powder |
US6502767B2 (en) | 2000-05-03 | 2003-01-07 | Asb Industries | Advanced cold spray system |
US20030023132A1 (en) | 2000-05-31 | 2003-01-30 | Melvin David B. | Cyclic device for restructuring heart chamber geometry |
JP2001347672A (en) | 2000-06-07 | 2001-12-18 | Fuji Photo Film Co Ltd | Ink jet recording head and its manufacturing method and ink jet printer |
US6464933B1 (en) | 2000-06-29 | 2002-10-15 | Ford Global Technologies, Inc. | Forming metal foam structures |
RU2181788C1 (en) * | 2000-08-08 | 2002-04-27 | Дикун Юрий Вениаминович | Method of producing composite materials and coats made from powders and device for realization of this method |
RU2183695C2 (en) * | 2000-08-25 | 2002-06-20 | Общество С Ограниченной Ответственностью Обнинский Центр Порошкового Напыления | Method of applying coatings |
WO2002027768A2 (en) | 2000-09-27 | 2002-04-04 | Nüp2 Incorporated | Fabrication of semiconductor devices |
US6498091B1 (en) | 2000-11-01 | 2002-12-24 | Applied Materials, Inc. | Method of using a barrier sputter reactor to remove an underlying barrier layer |
US6669782B1 (en) | 2000-11-15 | 2003-12-30 | Randhir P. S. Thakur | Method and apparatus to control the formation of layers useful in integrated circuits |
US6491208B2 (en) | 2000-12-05 | 2002-12-10 | Siemens Westinghouse Power Corporation | Cold spray repair process |
US6444259B1 (en) | 2001-01-30 | 2002-09-03 | Siemens Westinghouse Power Corporation | Thermal barrier coating applied with cold spray technique |
US7794554B2 (en) | 2001-02-14 | 2010-09-14 | H.C. Starck Inc. | Rejuvenation of refractory metal products |
RU2304633C2 (en) | 2001-02-14 | 2007-08-20 | Х.Ц ШТАРК, Инк | Method of renewal of the articles made out of the refractory metals |
PT1366203E (en) | 2001-02-20 | 2006-12-29 | Starck H C Inc | Refractory metal plates with uniform texture and methods of making the same |
US6679473B1 (en) * | 2001-03-20 | 2004-01-20 | Wcm Industries, Inc. | Push and turn hydrant for delivery of hot or cold water through a single discharge conduit |
US6915964B2 (en) | 2001-04-24 | 2005-07-12 | Innovative Technology, Inc. | System and process for solid-state deposition and consolidation of high velocity powder particles using thermal plastic deformation |
US6722584B2 (en) | 2001-05-02 | 2004-04-20 | Asb Industries, Inc. | Cold spray system nozzle |
DE10126100A1 (en) | 2001-05-29 | 2002-12-05 | Linde Ag | Production of a coating or a molded part comprises injecting powdered particles in a gas stream only in the divergent section of a Laval nozzle, and applying the particles at a specified speed |
US7201940B1 (en) | 2001-06-12 | 2007-04-10 | Advanced Cardiovascular Systems, Inc. | Method and apparatus for thermal spray processing of medical devices |
US7053294B2 (en) | 2001-07-13 | 2006-05-30 | Midwest Research Institute | Thin-film solar cell fabricated on a flexible metallic substrate |
WO2003025244A2 (en) | 2001-09-17 | 2003-03-27 | Heraeus, Inc. | Refurbishing spent sputtering targets |
US6770154B2 (en) | 2001-09-18 | 2004-08-03 | Praxair S.T. Technology, Inc. | Textured-grain-powder metallurgy tantalum sputter target |
US7081148B2 (en) | 2001-09-18 | 2006-07-25 | Praxair S.T. Technology, Inc. | Textured-grain-powder metallurgy tantalum sputter target |
US6861101B1 (en) | 2002-01-08 | 2005-03-01 | Flame Spray Industries, Inc. | Plasma spray method for applying a coating utilizing particle kinetics |
US6986471B1 (en) | 2002-01-08 | 2006-01-17 | Flame Spray Industries, Inc. | Rotary plasma spray method and apparatus for applying a coating utilizing particle kinetics |
EP1470265A2 (en) | 2002-01-24 | 2004-10-27 | H.C. Starck Inc. | Refractrory metal and alloy refining by laser forming and melting |
US6627814B1 (en) | 2002-03-22 | 2003-09-30 | David H. Stark | Hermetically sealed micro-device package with window |
BE1014736A5 (en) | 2002-03-29 | 2004-03-02 | Alloys For Technical Applic S | Manufacturing method and charging for target sputtering. |
US6896933B2 (en) | 2002-04-05 | 2005-05-24 | Delphi Technologies, Inc. | Method of maintaining a non-obstructed interior opening in kinetic spray nozzles |
US6623796B1 (en) | 2002-04-05 | 2003-09-23 | Delphi Technologies, Inc. | Method of producing a coating using a kinetic spray process with large particles and nozzles for the same |
JP3898082B2 (en) * | 2002-04-12 | 2007-03-28 | 株式会社東芝 | Method for producing composite metal and composite metal member |
US20030219542A1 (en) * | 2002-05-25 | 2003-11-27 | Ewasyshyn Frank J. | Method of forming dense coatings by powder spraying |
DE10224777A1 (en) | 2002-06-04 | 2003-12-18 | Linde Ag | High-velocity cold gas particle-spraying process for forming coating on workpiece, intercepts, purifies and collects carrier gas after use |
DE10224780A1 (en) | 2002-06-04 | 2003-12-18 | Linde Ag | High-velocity cold gas particle-spraying process for forming coating on workpiece, is carried out below atmospheric pressure |
US6759085B2 (en) | 2002-06-17 | 2004-07-06 | Sulzer Metco (Us) Inc. | Method and apparatus for low pressure cold spraying |
CA2433613A1 (en) | 2002-08-13 | 2004-02-13 | Russel J. Ruprecht, Jr. | Spray method for mcralx coating |
US7128988B2 (en) | 2002-08-29 | 2006-10-31 | Lambeth Systems | Magnetic material structures, devices and methods |
JP4883546B2 (en) | 2002-09-20 | 2012-02-22 | Jx日鉱日石金属株式会社 | Method for manufacturing tantalum sputtering target |
US6743468B2 (en) | 2002-09-23 | 2004-06-01 | Delphi Technologies, Inc. | Method of coating with combined kinetic spray and thermal spray |
US7108893B2 (en) | 2002-09-23 | 2006-09-19 | Delphi Technologies, Inc. | Spray system with combined kinetic spray and thermal spray ability |
MXPA05003286A (en) | 2002-09-25 | 2005-07-05 | Alcoa Inc | Coated vehicle wheel and method. |
US20040065546A1 (en) | 2002-10-04 | 2004-04-08 | Michaluk Christopher A. | Method to recover spent components of a sputter target |
CA2444917A1 (en) | 2002-10-18 | 2004-04-18 | United Technologies Corporation | Cold sprayed copper for rocket engine applications |
US6749002B2 (en) | 2002-10-21 | 2004-06-15 | Ford Motor Company | Method of spray joining articles |
DE10253794B4 (en) | 2002-11-19 | 2005-03-17 | Hühne, Erwin Dieter | Low temperature high speed flame spraying system |
TW571342B (en) | 2002-12-18 | 2004-01-11 | Au Optronics Corp | Method of forming a thin film transistor |
TWI341337B (en) | 2003-01-07 | 2011-05-01 | Cabot Corp | Powder metallurgy sputtering targets and methods of producing same |
US6872427B2 (en) | 2003-02-07 | 2005-03-29 | Delphi Technologies, Inc. | Method for producing electrical contacts using selective melting and a low pressure kinetic spray process |
DE10306347A1 (en) * | 2003-02-15 | 2004-08-26 | Hüttinger Elektronik GmbH & Co. KG | Controlling supply of power from AC supply to two consumers in plasma process, by adjusting supplied power if actual power deviates from set value |
ES2371070T3 (en) | 2003-02-24 | 2011-12-27 | Tekna Plasma Systems Inc. | PROCEDURE FOR MANUFACTURING A CATHODIC SPRAY WHITE. |
JP4163986B2 (en) * | 2003-04-09 | 2008-10-08 | 新日本製鐵株式会社 | Insoluble electrode and method for producing the same |
US7278353B2 (en) | 2003-05-27 | 2007-10-09 | Surface Treatment Technologies, Inc. | Reactive shaped charges and thermal spray methods of making same |
JP4008388B2 (en) | 2003-06-30 | 2007-11-14 | シャープ株式会社 | Film for semiconductor carrier, semiconductor device using the same, and liquid crystal module |
JP3890041B2 (en) * | 2003-07-09 | 2007-03-07 | 株式会社リケン | Piston ring and manufacturing method thereof |
US7170915B2 (en) | 2003-07-23 | 2007-01-30 | Intel Corporation | Anti-reflective (AR) coating for high index gain media |
US7208230B2 (en) | 2003-08-29 | 2007-04-24 | General Electric Company | Optical reflector for reducing radiation heat transfer to hot engine parts |
JP4310251B2 (en) * | 2003-09-02 | 2009-08-05 | 新日本製鐵株式会社 | Nozzle for cold spray and method for producing cold spray coating |
US7128948B2 (en) | 2003-10-20 | 2006-10-31 | The Boeing Company | Sprayed preforms for forming structural members |
US7335341B2 (en) | 2003-10-30 | 2008-02-26 | Delphi Technologies, Inc. | Method for securing ceramic structures and forming electrical connections on the same |
US20050147742A1 (en) | 2004-01-07 | 2005-07-07 | Tokyo Electron Limited | Processing chamber components, particularly chamber shields, and method of controlling temperature thereof |
US20070172378A1 (en) | 2004-01-30 | 2007-07-26 | Nippon Tungsten Co., Ltd. | Tungsten based sintered compact and method for production thereof |
US6905728B1 (en) | 2004-03-22 | 2005-06-14 | Honeywell International, Inc. | Cold gas-dynamic spray repair on gas turbine engine components |
US7244466B2 (en) | 2004-03-24 | 2007-07-17 | Delphi Technologies, Inc. | Kinetic spray nozzle design for small spot coatings and narrow width structures |
US20050220995A1 (en) | 2004-04-06 | 2005-10-06 | Yiping Hu | Cold gas-dynamic spraying of wear resistant alloys on turbine blades |
DE102004029354A1 (en) | 2004-05-04 | 2005-12-01 | Linde Ag | Method and apparatus for cold gas spraying |
US20060021870A1 (en) | 2004-07-27 | 2006-02-02 | Applied Materials, Inc. | Profile detection and refurbishment of deposition targets |
US20060045785A1 (en) | 2004-08-30 | 2006-03-02 | Yiping Hu | Method for repairing titanium alloy components |
US20060042728A1 (en) | 2004-08-31 | 2006-03-02 | Brad Lemon | Molybdenum sputtering targets |
EP1797212A4 (en) | 2004-09-16 | 2012-04-04 | Vladimir Belashchenko | Deposition system, method and materials for composite coatings |
CN101052746B (en) | 2004-09-25 | 2010-04-14 | Abb技术股份公司 | Corresponding shield parts for manufacturing fire-proof and anti-corrosion coating and for vacuum switch-box |
US20060090593A1 (en) | 2004-11-03 | 2006-05-04 | Junhai Liu | Cold spray formation of thin metal coatings |
US20060121187A1 (en) * | 2004-12-03 | 2006-06-08 | Haynes Jeffrey D | Vacuum cold spray process |
DE102004059716B3 (en) | 2004-12-08 | 2006-04-06 | Siemens Ag | Cold gas spraying method uses particles which are chemical components of high temperature superconductors and are sprayed on to substrate with crystal structure corresponding to that of superconductors |
US7479299B2 (en) | 2005-01-26 | 2009-01-20 | Honeywell International Inc. | Methods of forming high strength coatings |
US7399335B2 (en) | 2005-03-22 | 2008-07-15 | H.C. Starck Inc. | Method of preparing primary refractory metal |
DE102005018618A1 (en) | 2005-04-21 | 2006-10-26 | Rheinmetall Waffe Munition Gmbh | Gun barrel and method of coating the inner surface of the barrel |
WO2006117145A2 (en) | 2005-05-05 | 2006-11-09 | H.C. Starck Gmbh | Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
US20060251872A1 (en) | 2005-05-05 | 2006-11-09 | Wang Jenn Y | Conductive barrier layer, especially an alloy of ruthenium and tantalum and sputter deposition thereof |
US8480864B2 (en) | 2005-11-14 | 2013-07-09 | Joseph C. Farmer | Compositions of corrosion-resistant Fe-based amorphous metals suitable for producing thermal spray coatings |
US7618500B2 (en) | 2005-11-14 | 2009-11-17 | Lawrence Livermore National Security, Llc | Corrosion resistant amorphous metals and methods of forming corrosion resistant amorphous metals |
US20070116890A1 (en) | 2005-11-21 | 2007-05-24 | Honeywell International, Inc. | Method for coating turbine engine components with rhenium alloys using high velocity-low temperature spray process |
CA2560030C (en) | 2005-11-24 | 2013-11-12 | Sulzer Metco Ag | A thermal spraying material, a thermally sprayed coating, a thermal spraying method an also a thermally coated workpiece |
KR101380793B1 (en) | 2005-12-21 | 2014-04-04 | 슐저메트코(유에스)아이엔씨 | Hybrid plasma-cold spray method and apparatus |
EP1806429B1 (en) * | 2006-01-10 | 2008-07-09 | Siemens Aktiengesellschaft | Cold spray apparatus and method with modulated gasstream |
US7402277B2 (en) | 2006-02-07 | 2008-07-22 | Exxonmobil Research And Engineering Company | Method of forming metal foams by cold spray technique |
KR101377574B1 (en) | 2006-07-28 | 2014-03-26 | 삼성전자주식회사 | Security management method in a mobile communication system using proxy mobile internet protocol and system thereof |
US20080078268A1 (en) | 2006-10-03 | 2008-04-03 | H.C. Starck Inc. | Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof |
PL2104753T3 (en) | 2006-11-07 | 2014-12-31 | Starck H C Gmbh | Method for coating a substrate and coated product |
US20080145688A1 (en) | 2006-12-13 | 2008-06-19 | H.C. Starck Inc. | Method of joining tantalum clade steel structures |
US8784729B2 (en) | 2007-01-16 | 2014-07-22 | H.C. Starck Inc. | High density refractory metals and alloys sputtering targets |
US20110303535A1 (en) | 2007-05-04 | 2011-12-15 | Miller Steven A | Sputtering targets and methods of forming the same |
US8197894B2 (en) | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
US7914856B2 (en) | 2007-06-29 | 2011-03-29 | General Electric Company | Method of preparing wetting-resistant surfaces and articles incorporating the same |
DE102008024504A1 (en) | 2008-05-21 | 2009-11-26 | Linde Ag | Method and apparatus for cold gas spraying |
US8246903B2 (en) | 2008-09-09 | 2012-08-21 | H.C. Starck Inc. | Dynamic dehydriding of refractory metal powders |
US8043655B2 (en) | 2008-10-06 | 2011-10-25 | H.C. Starck, Inc. | Low-energy method of manufacturing bulk metallic structures with submicron grain sizes |
US8192799B2 (en) | 2008-12-03 | 2012-06-05 | Asb Industries, Inc. | Spray nozzle assembly for gas dynamic cold spray and method of coating a substrate with a high temperature coating |
US8268237B2 (en) | 2009-01-08 | 2012-09-18 | General Electric Company | Method of coating with cryo-milled nano-grained particles |
US8363787B2 (en) | 2009-03-25 | 2013-01-29 | General Electric Company | Interface for liquid metal bearing and method of making same |
-
2006
- 2006-04-28 RU RU2007144638/02A patent/RU2434073C9/en not_active IP Right Cessation
- 2006-04-28 BR BRPI0611539A patent/BRPI0611539B1/en not_active IP Right Cessation
- 2006-04-28 US US11/913,579 patent/US8802191B2/en active Active
- 2006-04-28 WO PCT/EP2006/003967 patent/WO2006117144A1/en active Application Filing
- 2006-04-28 EP EP06742726.0A patent/EP1880035B1/en active Active
- 2006-04-28 CA CA 2606478 patent/CA2606478C/en not_active Expired - Fee Related
- 2006-04-28 MX MX2007013600A patent/MX2007013600A/en active IP Right Grant
- 2006-04-28 AU AU2006243447A patent/AU2006243447B2/en not_active Ceased
- 2006-04-28 JP JP2008509342A patent/JP5065248B2/en not_active Expired - Fee Related
- 2006-05-04 TW TW95115826A patent/TWI392768B/en not_active IP Right Cessation
-
2007
- 2007-11-01 IL IL187110A patent/IL187110A/en not_active IP Right Cessation
- 2007-11-02 ZA ZA200709469A patent/ZA200709469B/en unknown
- 2007-11-20 KR KR1020077027013A patent/KR101342314B1/en active IP Right Grant
- 2007-11-27 NO NO20076124A patent/NO20076124L/en not_active Application Discontinuation
-
2014
- 2014-07-04 US US14/324,091 patent/US20150004337A1/en not_active Abandoned
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6780458B2 (en) * | 2001-08-01 | 2004-08-24 | Siemens Westinghouse Power Corporation | Wear and erosion resistant alloys applied by cold spray technique |
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US10100388B2 (en) | 2011-12-30 | 2018-10-16 | Scoperta, Inc. | Coating compositions |
US9802387B2 (en) | 2013-11-26 | 2017-10-31 | Scoperta, Inc. | Corrosion resistant hardfacing alloy |
US10173290B2 (en) | 2014-06-09 | 2019-01-08 | Scoperta, Inc. | Crack resistant hardfacing alloys |
US11130205B2 (en) | 2014-06-09 | 2021-09-28 | Oerlikon Metco (Us) Inc. | Crack resistant hardfacing alloys |
US11111912B2 (en) | 2014-06-09 | 2021-09-07 | Oerlikon Metco (Us) Inc. | Crack resistant hardfacing alloys |
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WO2024137730A1 (en) * | 2022-12-21 | 2024-06-27 | Westinghouse Electric Company Llc | Effective coating morphology to protect zr alloy cladding from oxidation and hydriding |
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BRPI0611539A2 (en) | 2010-09-21 |
TWI392768B (en) | 2013-04-11 |
IL187110A0 (en) | 2008-02-09 |
KR20080005562A (en) | 2008-01-14 |
EP1880035A1 (en) | 2008-01-23 |
TW200706696A (en) | 2007-02-16 |
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JP5065248B2 (en) | 2012-10-31 |
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AU2006243447A1 (en) | 2006-11-09 |
RU2007144638A (en) | 2009-06-10 |
CA2606478A1 (en) | 2006-11-09 |
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CA2606478C (en) | 2013-10-08 |
ZA200709469B (en) | 2009-06-24 |
US20100055487A1 (en) | 2010-03-04 |
IL187110A (en) | 2015-11-30 |
WO2006117144A1 (en) | 2006-11-09 |
RU2434073C9 (en) | 2012-12-27 |
JP2008540822A (en) | 2008-11-20 |
US8802191B2 (en) | 2014-08-12 |
NO20076124L (en) | 2008-01-31 |
AU2006243447B2 (en) | 2010-11-18 |
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