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US20100200424A1 - Plasma-electrolytic polishing of metals products - Google Patents

Plasma-electrolytic polishing of metals products Download PDF

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Publication number
US20100200424A1
US20100200424A1 US12/691,773 US69177310A US2010200424A1 US 20100200424 A1 US20100200424 A1 US 20100200424A1 US 69177310 A US69177310 A US 69177310A US 2010200424 A1 US2010200424 A1 US 2010200424A1
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US
United States
Prior art keywords
electrolyte
voltage
plasma
electrolytic polishing
products
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US12/691,773
Inventor
Alexander Mayorov
Anna Berkovich
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RUSSAMER LAB LLC
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Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Priority to US12/691,773 priority Critical patent/US20100200424A1/en
Publication of US20100200424A1 publication Critical patent/US20100200424A1/en
Assigned to RUSSAMER LAB, LLC reassignment RUSSAMER LAB, LLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BERKOVICH, ANNA, MAYOROV, ALEXANDER
Abandoned legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • C25F3/18Polishing of light metals
    • C25F3/20Polishing of light metals of aluminium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • C25F3/22Polishing of heavy metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • C25F3/22Polishing of heavy metals
    • C25F3/24Polishing of heavy metals of iron or steel
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • C25F3/22Polishing of heavy metals
    • C25F3/26Polishing of heavy metals of refractory metals

Definitions

  • Plasma-electrolytic polishing (PEP) of metal products was dicovered in 1986 [1]. The process is based on the smoothing of micro-roughness surfaces in a passage of current through ionized layer separating the electrolyte from the surface of the metal, with the application between a sufficiently high voltage (from 90 to 290 v). The voltage applied to the piece (+) and electronic conductor (cathode) immersed in the electrolyte ( ⁇ ). Steam layer is formed as a result of overheating electrolyte in contact with the surface of the product, above the point of boiling, Joule heat and abundant gas (the cathode), caused by the electrolysis of water.
  • PEP Plasma-electrolytic polishing
  • EPA has a significant advantage over the conventional process electrolytic polishing (EP), is the ability to use as the electrolyte harmless to human health, cheap and environmentally friendly solutions of low-concentration salts.
  • EP electrolytic polishing
  • polishing rate is proportional to the current density , as well as removal of metal in the PEP, as well as in PE is proportional to current density.
  • Time tp inversely proportional to the speed of removing the metal and is directly proportional to voltage:
  • Total Energy E is equal to multiplication of Ws by timing tp and is proportional to voltage U:
  • Stainless steel type 400 and 300 may be polished in the electrolyte consisting of 70% solution of phosphoric acid in water 75 C temperature, voltage 48 V, current density 2-3 A/cm2. Polishing time 15-45 sec.
  • Copper can be polished in a solution: 57% sodium phosphate (NaH2PO4)+9% H3PO4 (phosphoric acid) at a temperature of 70 C, with a voltage of 35 V, current density 8-9 A/cm2. Time polishing 2-10 sec.
  • Products made of titanium alloy Ti, 6% Al, 4% V can be polished in the electrolyte consisting of 50% phosphoric acid, 10% Sodium perchlorate, 1% of hydrofluoric acid HF in the 75 C temperature, current density 1.5-2 A/cm2. Time 30-60 sec.
  • Products made of aluminum alloy Al, 4% Cu, 0.9% Mn can be polished in a solution containing 50% polypropylene-glycol, 39% water, 10% Sulfuric acid, 2.5% Ammonium Fluoride, at 80 C temperature, voltage 80 V, current density 1.2-1.5 A/cm2. Polishing time 30-60 seconds.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

Plasma-electrolytic polishing (PEP) of titanium alloy and other metals where plasma effect takes place when voltage does not exceed 80V DC.

Description

  • Plasma-electrolytic polishing (PEP) of metal products was dicovered in 1986 [1]. The process is based on the smoothing of micro-roughness surfaces in a passage of current through ionized layer separating the electrolyte from the surface of the metal, with the application between a sufficiently high voltage (from 90 to 290 v). The voltage applied to the piece (+) and electronic conductor (cathode) immersed in the electrolyte (−). Steam layer is formed as a result of overheating electrolyte in contact with the surface of the product, above the point of boiling, Joule heat and abundant gas (the cathode), caused by the electrolysis of water. At the auxiliary electrode (cathode), which has a surface much more than surface processed products, ionized layer of steam is not occurs and the surface of the cathode in contact with the electrolyte. On boundary of the cathode to the electrolyte flow electrochemical reactions generally—the restoration of water to hydrogen gas:

  • 2H2O+2e-=H2+2OH—
  • Later it was suggested to use more high voltage (200-400 V) for the sustainable maintenance of steam layer and its ionization [2]. EPA has a significant advantage over the conventional process electrolytic polishing (EP), is the ability to use as the electrolyte harmless to human health, cheap and environmentally friendly solutions of low-concentration salts. The disadvantages of EPA are:
  • a) high energy, ten times more than energy PE; b) the high cost of equipment. The high cost of equipment due to high power PEP power supply and the need to ensure reliable electrical safety at high DC voltages.
  • Studies of the EPA showed that in order to maintain stable Ionized steam layer (plasma) is needed some thermal power per unit area of treated surface WS.
  • This power can be roughly estimated by the formula:

  • W s =i*U  (1)
  • where i—current density on the treated surface, U—voltage between the product and the cathode. Formula (1) is approximate because the majority (80-90%) of voltage is lost by passing electrical current through the steam layer. The value of Ws depends on the composition of the material products of the electrolyte temperature and other factors, but remained within the 100-300 Wt/cm2. With increasing current density-voltage, under with the formula (1), decreases:

  • i=W s/U  (2)
  • On the other hand, the polishing rate is proportional to the current density , as well as removal of metal in the PEP, as well as in PE is proportional to current density.
  • Time tp, inversely proportional to the speed of removing the metal and is directly proportional to voltage:

  • t p =k*(U/W s)  (3)
  • Total Energy E is equal to multiplication of Ws by timing tp and is proportional to voltage U:

  • E=t p *W s =kU  (4)
  • Thus, to reduce the energy consumption of the process, it is necessary to reduce the operating voltage. This current density will grow in accordance with the formula (3).
  • At the same time, reducing the voltage from hundreds of volts to values below 80V, sharply reduces the chance of injury of personnel of electric shocks and allows to simplify and reduce the price of equipment. Experience shows that the way to improve the PEP real, and the PEP at 80 and below can be practically implemented, which can be confirmed by a number of examples.
  • EXAMPLE NUMBER 1
  • Stainless steel type 400 and 300 may be polished in the electrolyte consisting of 70% solution of phosphoric acid in water 75 C temperature, voltage 48 V, current density 2-3 A/cm2. Polishing time 15-45 sec.
  • EXAMPLE NUMBER 2
  • Copper can be polished in a solution: 57% sodium phosphate (NaH2PO4)+9% H3PO4 (phosphoric acid) at a temperature of 70 C, with a voltage of 35 V, current density 8-9 A/cm2. Time polishing 2-10 sec.
  • EXAMPLE NUMBER 3
  • Products made of titanium alloy Ti, 6% Al, 4% V can be polished in the electrolyte consisting of 50% phosphoric acid, 10% Sodium perchlorate, 1% of hydrofluoric acid HF in the 75 C temperature, current density 1.5-2 A/cm2. Time 30-60 sec.
  • EXAMPLE NUMBER 4
  • Products made of aluminum alloy Al, 4% Cu, 0.9% Mn can be polished in a solution containing 50% polypropylene-glycol, 39% water, 10% Sulfuric acid, 2.5% Ammonium Fluoride, at 80 C temperature, voltage 80 V, current density 1.2-1.5 A/cm2. Polishing time 30-60 seconds.
  • LITERATURE.
    • 1. Patent of German Democratic Republic (DD) #238074 (A1), Class 25F3/16, published Aug. 6, 1986
    • 2. U.S. Pat. No. 5,028,304, Class B23H3/08, C25F3/16, C25F5/00, Published Feb. 7, 1991

Claims (3)

1. method of plasma electrolytic polishing surface metal products, including immersion in electrolyte, processed products and electro-conducting auxiliary electrode (cathode) and the application of permanent tension between manufacturing and product support electrode, only difference is that in order to reduce energy consumption and to avoid the risk of destruction of people with electric shocks, DC voltage does not exceed 80 V.
2. The method of claim 1, characterized that as the electrolyte use water or water-organic solutions inorganic acids and their salts.
3. The method of claim 1, characterized that the temperature of the electrolyte is in the interval from 20 to 100 C, mostly from 70 to 100 C.
US12/691,773 2009-02-09 2010-01-22 Plasma-electrolytic polishing of metals products Abandoned US20100200424A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/691,773 US20100200424A1 (en) 2009-02-09 2010-01-22 Plasma-electrolytic polishing of metals products

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15088109P 2009-02-09 2009-02-09
US12/691,773 US20100200424A1 (en) 2009-02-09 2010-01-22 Plasma-electrolytic polishing of metals products

Publications (1)

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2495966C1 (en) * 2012-07-03 2013-10-20 Общество с ограниченной ответственностью "Научно-производственное предприятие "Уралавиаспецтехнология" Method of grinding parts made from titanium alloys
WO2017060701A1 (en) 2015-10-06 2017-04-13 Wallwork Cambridge Limited Smoothing the surface finish of rough metal articles
CN108875155A (en) * 2018-05-29 2018-11-23 广东工业大学 A kind of ceramic polishing machine energy consumption optimization method based on improved adaptive GA-IAGA
CN110948292A (en) * 2019-12-13 2020-04-03 中山市奥博精密科技有限公司 Polishing process of golf club head
CN111975000A (en) * 2020-08-27 2020-11-24 西安理工大学 Technology for 3D printing of complex parts by anisotropic polishing metal powder bed
KR102244502B1 (en) * 2019-11-29 2021-04-27 한국생산기술연구원 Cathode apparatus and method for plasma electrolytic polishing of inner surface of pipe
CN113564683A (en) * 2021-09-02 2021-10-29 太原理工大学 Electrolyte plasma polishing method for titanium alloy femoral stem prosthesis
CN114473649A (en) * 2022-03-09 2022-05-13 江苏徐工工程机械研究院有限公司 Electrolyte plasma polishing assembly and electrolyte plasma polishing device
WO2022151738A1 (en) * 2021-01-13 2022-07-21 南京尚吉增材制造研究院有限公司 Micro-nano bubble enhanced plasma polishing method
US11982011B2 (en) 2018-05-22 2024-05-14 Cummins Inc. Plasma electrolytic polished diesel engine components

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2645611A (en) * 1948-09-20 1953-07-14 Shwayder Bros Inc Method of and bath for electrolytic polishing
US3970529A (en) * 1975-04-30 1976-07-20 Oxy Metal Industries Corporation Electropolishing aluminum and aluminum alloys
US6835300B2 (en) * 2002-09-13 2004-12-28 General Electric Company Electropolishing solution and methods for its use and recovery
RU2355829C2 (en) * 2007-04-25 2009-05-20 ООО "НПП Уралавиаспецтехнология" Method of electrolytic-plasma polishing of metals works

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2645611A (en) * 1948-09-20 1953-07-14 Shwayder Bros Inc Method of and bath for electrolytic polishing
US3970529A (en) * 1975-04-30 1976-07-20 Oxy Metal Industries Corporation Electropolishing aluminum and aluminum alloys
US6835300B2 (en) * 2002-09-13 2004-12-28 General Electric Company Electropolishing solution and methods for its use and recovery
RU2355829C2 (en) * 2007-04-25 2009-05-20 ООО "НПП Уралавиаспецтехнология" Method of electrolytic-plasma polishing of metals works

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2495966C1 (en) * 2012-07-03 2013-10-20 Общество с ограниченной ответственностью "Научно-производственное предприятие "Уралавиаспецтехнология" Method of grinding parts made from titanium alloys
WO2017060701A1 (en) 2015-10-06 2017-04-13 Wallwork Cambridge Limited Smoothing the surface finish of rough metal articles
US11982011B2 (en) 2018-05-22 2024-05-14 Cummins Inc. Plasma electrolytic polished diesel engine components
CN108875155A (en) * 2018-05-29 2018-11-23 广东工业大学 A kind of ceramic polishing machine energy consumption optimization method based on improved adaptive GA-IAGA
KR102244502B1 (en) * 2019-11-29 2021-04-27 한국생산기술연구원 Cathode apparatus and method for plasma electrolytic polishing of inner surface of pipe
CN110948292A (en) * 2019-12-13 2020-04-03 中山市奥博精密科技有限公司 Polishing process of golf club head
CN111975000A (en) * 2020-08-27 2020-11-24 西安理工大学 Technology for 3D printing of complex parts by anisotropic polishing metal powder bed
WO2022151738A1 (en) * 2021-01-13 2022-07-21 南京尚吉增材制造研究院有限公司 Micro-nano bubble enhanced plasma polishing method
CN113564683A (en) * 2021-09-02 2021-10-29 太原理工大学 Electrolyte plasma polishing method for titanium alloy femoral stem prosthesis
CN114473649A (en) * 2022-03-09 2022-05-13 江苏徐工工程机械研究院有限公司 Electrolyte plasma polishing assembly and electrolyte plasma polishing device

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Owner name: RUSSAMER LAB, LLC, PENNSYLVANIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BERKOVICH, ANNA;MAYOROV, ALEXANDER;REEL/FRAME:030111/0971

Effective date: 20130319

STCB Information on status: application discontinuation

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