US20090182088A9 - Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom - Google Patents
Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom Download PDFInfo
- Publication number
- US20090182088A9 US20090182088A9 US11/286,060 US28606005A US2009182088A9 US 20090182088 A9 US20090182088 A9 US 20090182088A9 US 28606005 A US28606005 A US 28606005A US 2009182088 A9 US2009182088 A9 US 2009182088A9
- Authority
- US
- United States
- Prior art keywords
- article
- insulating layer
- combination
- oxide
- nanosized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000009413 insulation Methods 0.000 title description 9
- 238000000576 coating method Methods 0.000 title description 4
- 239000002131 composite material Substances 0.000 title description 2
- 239000000945 filler Substances 0.000 claims abstract description 88
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 64
- 239000004634 thermosetting polymer Substances 0.000 claims abstract description 59
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 48
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 47
- 239000002105 nanoparticle Substances 0.000 claims abstract description 37
- 239000010432 diamond Substances 0.000 claims abstract description 33
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 37
- 239000002245 particle Substances 0.000 claims description 28
- -1 polyacrylics Polymers 0.000 claims description 27
- 229910052618 mica group Inorganic materials 0.000 claims description 22
- 239000010445 mica Substances 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 18
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 17
- 239000000835 fiber Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000012764 mineral filler Substances 0.000 claims description 12
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 11
- 239000000395 magnesium oxide Substances 0.000 claims description 10
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims description 9
- 230000015556 catabolic process Effects 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 239000011787 zinc oxide Substances 0.000 claims description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 7
- 150000001247 metal acetylides Chemical class 0.000 claims description 7
- 229920001296 polysiloxane Polymers 0.000 claims description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 7
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 7
- 229920002554 vinyl polymer Polymers 0.000 claims description 7
- 229910000859 α-Fe Inorganic materials 0.000 claims description 7
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 6
- 229910001589 annite Inorganic materials 0.000 claims description 6
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 6
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- 239000005995 Aluminium silicate Substances 0.000 claims description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 5
- 239000004593 Epoxy Substances 0.000 claims description 5
- 235000012211 aluminium silicate Nutrition 0.000 claims description 5
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 5
- 239000000292 calcium oxide Substances 0.000 claims description 5
- 239000000378 calcium silicate Substances 0.000 claims description 5
- 229910052918 calcium silicate Inorganic materials 0.000 claims description 5
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 claims description 5
- 238000004132 cross linking Methods 0.000 claims description 5
- YGANSGVIUGARFR-UHFFFAOYSA-N dipotassium dioxosilane oxo(oxoalumanyloxy)alumane oxygen(2-) Chemical compound [O--].[K+].[K+].O=[Si]=O.O=[Al]O[Al]=O YGANSGVIUGARFR-UHFFFAOYSA-N 0.000 claims description 5
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 5
- 229910052627 muscovite Inorganic materials 0.000 claims description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052628 phlogopite Inorganic materials 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 239000005751 Copper oxide Substances 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 4
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910000431 copper oxide Inorganic materials 0.000 claims description 4
- 125000000524 functional group Chemical group 0.000 claims description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 4
- 238000010422 painting Methods 0.000 claims description 4
- 229920002492 poly(sulfone) Polymers 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000000454 talc Substances 0.000 claims description 4
- 229910052623 talc Inorganic materials 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052902 vermiculite Inorganic materials 0.000 claims description 4
- 239000010455 vermiculite Substances 0.000 claims description 4
- 235000019354 vermiculite Nutrition 0.000 claims description 4
- 239000005046 Chlorosilane Substances 0.000 claims description 3
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 239000004115 Sodium Silicate Substances 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000010425 asbestos Substances 0.000 claims description 3
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 claims description 3
- 229910052626 biotite Inorganic materials 0.000 claims description 3
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 3
- 229910001596 celadonite Inorganic materials 0.000 claims description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 3
- 229910001604 clintonite Inorganic materials 0.000 claims description 3
- 238000003618 dip coating Methods 0.000 claims description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 3
- 229910052631 glauconite Inorganic materials 0.000 claims description 3
- 239000005337 ground glass Substances 0.000 claims description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052629 lepidolite Inorganic materials 0.000 claims description 3
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 claims description 3
- 239000001095 magnesium carbonate Substances 0.000 claims description 3
- 229910000021 magnesium carbonate Inorganic materials 0.000 claims description 3
- 229910001737 paragonite Inorganic materials 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920002530 polyetherether ketone Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 235000019422 polyvinyl alcohol Nutrition 0.000 claims description 3
- 229910052895 riebeckite Inorganic materials 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 150000004756 silanes Chemical class 0.000 claims description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 3
- 238000007592 spray painting technique Methods 0.000 claims description 3
- 238000009864 tensile test Methods 0.000 claims description 3
- 150000004684 trihydrates Chemical class 0.000 claims description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 239000010456 wollastonite Substances 0.000 claims description 3
- 229910052882 wollastonite Inorganic materials 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 239000004962 Polyamide-imide Substances 0.000 claims description 2
- 229920002732 Polyanhydride Polymers 0.000 claims description 2
- 239000004793 Polystyrene Substances 0.000 claims description 2
- 229920002396 Polyurea Polymers 0.000 claims description 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 150000007942 carboxylates Chemical class 0.000 claims description 2
- 229910001567 cementite Inorganic materials 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims description 2
- 125000005670 ethenylalkyl group Chemical group 0.000 claims description 2
- 125000001188 haloalkyl group Chemical group 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 150000004678 hydrides Chemical class 0.000 claims description 2
- 150000002825 nitriles Chemical class 0.000 claims description 2
- 229920001643 poly(ether ketone) Polymers 0.000 claims description 2
- 229920001652 poly(etherketoneketone) Polymers 0.000 claims description 2
- 229920002627 poly(phosphazenes) Polymers 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920002312 polyamide-imide Polymers 0.000 claims description 2
- 229920001230 polyarylate Polymers 0.000 claims description 2
- 229920002480 polybenzimidazole Polymers 0.000 claims description 2
- 229920002577 polybenzoxazole Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- 229920006393 polyether sulfone Polymers 0.000 claims description 2
- 229920001601 polyetherimide Polymers 0.000 claims description 2
- 229920006324 polyoxymethylene Polymers 0.000 claims description 2
- 235000013824 polyphenols Nutrition 0.000 claims description 2
- 229920001709 polysilazane Polymers 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- 229920001021 polysulfide Polymers 0.000 claims description 2
- 239000005077 polysulfide Substances 0.000 claims description 2
- 150000008117 polysulfides Polymers 0.000 claims description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 2
- 229920001290 polyvinyl ester Polymers 0.000 claims description 2
- 229920001289 polyvinyl ether Polymers 0.000 claims description 2
- 229920001291 polyvinyl halide Polymers 0.000 claims description 2
- 229920006215 polyvinyl ketone Polymers 0.000 claims description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 150000003568 thioethers Chemical class 0.000 claims description 2
- 125000003396 thiol group Chemical class [H]S* 0.000 claims description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 2
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 claims description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 2
- 229910052791 calcium Inorganic materials 0.000 claims 2
- 239000011575 calcium Substances 0.000 claims 2
- 239000010941 cobalt Substances 0.000 claims 2
- 229910017052 cobalt Inorganic materials 0.000 claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 229910052749 magnesium Inorganic materials 0.000 claims 2
- 239000011777 magnesium Substances 0.000 claims 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 2
- 229910052759 nickel Inorganic materials 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 description 12
- 239000012744 reinforcing agent Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 10
- 239000011152 fibreglass Substances 0.000 description 7
- 239000005350 fused silica glass Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 235000012245 magnesium oxide Nutrition 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 5
- 239000000806 elastomer Substances 0.000 description 5
- 239000012713 reactive precursor Substances 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 229920005573 silicon-containing polymer Polymers 0.000 description 5
- 238000004804 winding Methods 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 4
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 4
- 239000004927 clay Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000010008 shearing Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910000323 aluminium silicate Inorganic materials 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000002734 clay mineral Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 235000012222 talc Nutrition 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 0 [1*][Si]([2*])([6*])O[Si]([3*])([4*])O[5*] Chemical compound [1*][Si]([2*])([6*])O[Si]([3*])([4*])O[5*] 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- QXJJQWWVWRCVQT-UHFFFAOYSA-K calcium;sodium;phosphate Chemical compound [Na+].[Ca+2].[O-]P([O-])([O-])=O QXJJQWWVWRCVQT-UHFFFAOYSA-K 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920001195 polyisoprene Polymers 0.000 description 2
- 239000003586 protic polar solvent Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910021647 smectite Inorganic materials 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- HDYFAPRLDWYIBU-UHFFFAOYSA-N 1-silylprop-2-en-1-one Chemical class [SiH3]C(=O)C=C HDYFAPRLDWYIBU-UHFFFAOYSA-N 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 241000276489 Merlangius merlangus Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- HPTYUNKZVDYXLP-UHFFFAOYSA-N aluminum;trihydroxy(trihydroxysilyloxy)silane;hydrate Chemical compound O.[Al].[Al].O[Si](O)(O)O[Si](O)(O)O HPTYUNKZVDYXLP-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- ZOMBKNNSYQHRCA-UHFFFAOYSA-J calcium sulfate hemihydrate Chemical compound O.[Ca+2].[Ca+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZOMBKNNSYQHRCA-UHFFFAOYSA-J 0.000 description 1
- VNSBYDPZHCQWNB-UHFFFAOYSA-N calcium;aluminum;dioxido(oxo)silane;sodium;hydrate Chemical compound O.[Na].[Al].[Ca+2].[O-][Si]([O-])=O VNSBYDPZHCQWNB-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013005 condensation curing Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000010433 feldspar Substances 0.000 description 1
- 229910021526 gadolinium-doped ceria Inorganic materials 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 229910052621 halloysite Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000271 hectorite Inorganic materials 0.000 description 1
- KWLMIXQRALPRBC-UHFFFAOYSA-L hectorite Chemical compound [Li+].[OH-].[OH-].[Na+].[Mg+2].O1[Si]2([O-])O[Si]1([O-])O[Si]([O-])(O1)O[Si]1([O-])O2 KWLMIXQRALPRBC-UHFFFAOYSA-L 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 238000011415 microwave curing Methods 0.000 description 1
- 239000002557 mineral fiber Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 239000012802 nanoclay Substances 0.000 description 1
- 229910052664 nepheline Inorganic materials 0.000 description 1
- 239000010434 nepheline Substances 0.000 description 1
- AJCDFVKYMIUXCR-UHFFFAOYSA-N oxobarium;oxo(oxoferriooxy)iron Chemical compound [Ba]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O AJCDFVKYMIUXCR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000010451 perlite Substances 0.000 description 1
- 235000019362 perlite Nutrition 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006376 polybenzimidazole fiber Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 239000011044 quartzite Substances 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 239000010458 rotten stone Substances 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910000275 saponite Inorganic materials 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 239000010435 syenite Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
- H01L21/3121—Layers comprising organo-silicon compounds
- H01L21/3122—Layers comprising organo-silicon compounds layers comprising polysiloxane compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/002—Inhomogeneous material in general
- H01B3/006—Other inhomogeneous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
- H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/3146—Carbon layers, e.g. diamond-like layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
- B29C48/03—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
- B29C48/15—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor incorporating preformed parts or layers, e.g. extrusion moulding around inserts
- B29C48/154—Coating solid articles, i.e. non-hollow articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
- B29K2995/0003—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds having particular electrical or magnetic properties, e.g. piezoelectric
- B29K2995/0007—Insulating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/251—Mica
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/252—Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
- Y10T428/257—Iron oxide or aluminum oxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/259—Silicic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- This disclosure relates to composite coatings for groundwall insulation in electromagnetic devices such as motors, generators, and the like, methods of manufacture thereof, and articles derived therefrom.
- Groundwall insulation for electrical components that are utilized in electrical devices has generally been manufactured from multilayered materials. Multiple layers facilitate a higher resistance to corona discharge. It is also desirable for the insulating layer to have a high value of breakdown voltage so that it can withstand the high voltage environment of electrical devices such as motors and generators.
- the multiple layers are generally comprised of a fibrous backing manufactured from glass as well as additional layers manufactured from mica. The use of multiple layers is both time-consuming as well as expensive. In addition, the use of multiple layers generally results in a thicker layer of insulation and consequently larger parts.
- insulating layers that can be applied in a single step process and that can withstand higher voltages while have reduced thickness when compared with insulation that is made from multilayered materials.
- an article comprising an electrical component; and an electrically insulating layer disposed upon the electrical component, wherein the electrically insulating layer comprises a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers.
- thermosetting polymer comprises a thermosetting polymer and a nanosized filler
- the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers; and curing the thermosetting polymer.
- composition comprising a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers.
- a method comprising feeding a stator bar into a central bore of a die, wherein the central bore is of a configuration sufficient to allow relative movement of the die over the stator bar; extruding an insulating layer into the die so that it is deposited simultaneously onto each side of the stator bar; wherein the insulating layer comprises a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers; and traversing the die along an entire length of the stator bar.
- an insulating layer that may be used to protect and insulate electrical components of electrical devices such as motors, generators, and the like.
- a method for applying the insulating layer onto electrical components that may be utilized in electrical devices are electrical conduction windings, stator bars, or on the inside of a stator piece, or the like.
- the insulating layer generally comprises a thermosetting polymer and a nanosized filler.
- the nanosized fillers comprise a combination of metal oxides and diamonds.
- the nanosized fillers comprise diamonds.
- the nanosized fillers can also optionally include nanosized mineral fillers and/or nanoclays.
- the insulating layer is advantageous in that it can be applied to the electrical components in thicknesses of about 30 to about 300 micrometers, which is generally less than or equal to the thickness of other commercially available insulating layers.
- the insulating layer advantageously has a compressive strength and hardness effective to withstand a compressive force of about 250 to about 1000 mega-Pascals (MPa).
- MPa mega-Pascals
- Application of the insulating layer also provides an opportunity for excluding the tape wound, micaeous and polymeric groundwall insulation or slot liner material that is generally used in electrical devices.
- the insulating layer can be easily applied in a single step process such as dip coating, spray painting, extrusion, coextrusion, or the like. It also provides the potential for thinner insulation layers and provides a more robust insulation material because of its ability to withstand higher voltages. It also displays a significant corona resistance compared with other comparative insulating materials that do not contain nanosized fillers and improved thermal conductivity.
- the insulating layer comprises an elastomer having a modulus of elasticity of less than or equal to about 10 5 gigapascals (GPa) at room temperature.
- the elastomer generally comprises a thermosetting polysiloxane resin and a nanosized filler.
- the elastomeric insulating layer advantageously displays an elongation of greater than or equal to about 200% in a tensile test at room temperature while at the same time displaying no substantial creep when subjected to a compressive or tensile force at prevailing temperatures in an electrical generator.
- the thermosetting polymer generally comprises a polymer that may be a homopolymer, a copolymer such as a star block copolymer, a graft copolymer, an alternating block copolymer or a random copolymer, ionomer, dendrimer, or a combination comprising at least one of the foregoing polymers that may be covalently crosslinked.
- thermosetting polymers are polyurethanes, epoxies, phenolics, silicones, polyacrylics, polycarbonates polystyrenes, polyesters, polyamides, polyamideimides, polyarylates, polyarylsulfones, polyethersulfones, polyphenylene sulfides, polysulfones, polyimides, polyetherimides, polytetrafluoroethylenes, polyetherketones, polyether etherketones, polyether ketone ketones, polybenzoxazoles, polyoxadiazoles, polybenzothiazinophenothiazines, polybenzothiazoles, polypyrazinoquinoxalines, polypyromellitimides, polyquinoxalines, polybenzimidazoles, polyoxindoles, polyoxoisoindolines, polydioxoisoindolines, polytriazines, polypyridazines, polypiperazines, polypyr
- thermosetting polymers may also be utilized.
- An exemplary thermosetting polymer is a silicone polymer.
- the term polymer as used herein is used to mean either a small molecule (e.g., monomer, dimer, trimer, and the like), a homopolymer or a copolymer.
- thermosetting polymer can be an elastomer.
- thermosetting polymers are polybutadienes, polyisoprenes, polysiloxanes, polyurethanes, or the like, or a combination comprising at least one of the foregoing elastomers.
- An exemplary thermosetting polymer is a polysiloxane polymer (hereinafter silicone polymer).
- the silicone polymers that may be used in the preparation of the insulating layer generally has the formula (I) prior to reacting to form the thermoset wherein R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may be the same or different and wherein at least one of R 1 , R 2 , R 3 , R 4 , R 5 and R 6 is a reactive functionality prior to cross linking; m and n can be any integer including 0, with the exception that both m and n cannot be 0 at the same time.
- R 1 , R 2 , R 3 , R 4 , R 5 and R 6 it is generally desirable for two or preferably three of R 1 , R 2 , R 3 , R 4 , R 5 or R 6 to be chemically reactive. It is generally desirable for the sum of m and n to be about 1 to about 50,000.
- Suitable examples of groups that may be present as R 1 , R 2 , R 3 , R 4 , R 5 or R 6 in the equation (I) are alkyl, aryl, aralkyl, fluoroalkyl, vinylalkyl, aminoalkyl, vinyl, epoxy, hydride, silanol, amine, carbinol (hydroalkyl), methacrylate, acrylate, mercapto, haloalkyl, halogen, carboxylate, acetoxy, alkoxy, or the like.
- Exemplary reactive functional groups are vinyl or epoxy.
- Exemplary non-reactive functional groups are alkyl, fluoroalkyl or phenyl.
- An exemplary silicone polymer is a condensation cure silicone having methyl, phenyl and hydroxyl functional groups.
- One of the commercially available silicone polymer is MC 550 BKH® commercially available from General Electric Silicones in Waterford, N.Y.
- MC 550 BKH® contains 78 wt % of a reinforcing agent.
- the reinforcing agent is not nanosized and comprises fused silica and fiberglass in a weight ratio of 80:20. Nanosized fillers of interest are then added to this material.
- thermosetting polymer It is generally desirable for the thermosetting polymer to have a number average molecular weight of about 75 to about 500,000 grams/mole (g/mole) prior to reacting to form the thermosetting polymer. In one embodiment, it is generally desirable for the thermosetting polymer to have a number average molecular weight of about 150 to about 100,000 g/mole prior to reacting to form the thermosetting polymer. In another embodiment, it is generally desirable for the thermosetting polymer to have a number average molecular weight of about 300 to about 75,000 g/mole prior to reacting to form the thermosetting polymer.
- thermosetting polymer it is generally desirable for the thermosetting polymer to have a number average molecular weight of about 450 to about 50,000 g/mole prior to reacting to form the thermosetting polymer.
- An exemplary number average molecular weight of the thermosetting polymer is about 75 to about 5,000 g/mole prior to reacting to form the thermosetting polymer.
- thermosetting polymer it is generally desirable to use the thermosetting polymer in an amount of about 50 to 98 wt %, based on the total weight of the insulating layer. In one embodiment, it is desirable to use the thermosetting polymer in an amount of about 55 to about 90 wt %, based on the total weight of the insulating layer. In another embodiment, it is desirable to use the thermosetting polymer in an amount of about 60 to about 85 wt %, based on the total weight of the insulating layer. In yet another embodiment, it is desirable to use the thermosetting polymer in an amount of about 65 to about 80 wt %, based on the total weight of the insulating layer.
- the thermosetting polymer may optionally be mixed with reactive precursors such as silanes in order to increase the crosslink density.
- Suitable silanes are chlorosilanes, vinylsilanes, vinylalkoxysilanes, aklylacetoxysilanes, and the like.
- Suitable examples of chlorosilanes are methyltrichlorosilane and dimethyldichlorosilane. It is generally desirable for the dimethyldichlorosilane to have about 1 to about 35 mole percent of hydroxyl groups. In one embodiment, it is desirable for the dimethyldichlorosilane to have about 2 to about 15 mole percent of hydroxyl groups. In one embodiment, it is desirable for the dimethyldichlorosilane to have about 4 to about 8 mole percent of hydroxyl groups.
- the reactive precursor in an amount of about 0.1 to 50 wt %, based on the total weight of the thermosetting polymer. In one embodiment, it is desirable to use the reactive precursor in an amount of about 0.5 to about 40 wt %, based on the total weight of the thermosetting polymer. In another embodiment, it is desirable to use the reactive precursor in an amount of about 1 to about 30 wt %, based on the total weight of the thermosetting polymer. In yet another embodiment, it is desirable to use the reactive precursor in an amount of about 1.2 to about 25 wt %, based on the total weight of the thermosetting polymer.
- the insulating layer may optionally contain a reinforcing agent that is not nanosized.
- the reinforcing agent is a filler having particle dimensions of greater than or equal to about 500 nanometers (nm).
- Suitable reinforcing agents are silica powder, such as fused silica, crystalline silica, natural silica sand, and various silane-coated silicas; talc, including fibrous, modular, needle shaped, and lamellar talcs; glass spheres, both hollow and solid, and surface-treated glass spheres; kaolin, including hard, soft, and calcined kaolin; mica, including metallized mica and mica surface treated with aminosilanes, acryloylsilanes, hexamethylenedisilazane, or coatings having a chemical composition similar to the thermosetting polymer so as to impart good physicals to compounded blends; feldspar and nepheline syenite; silicate spheres;
- Exemplary reinforcing agents are fused silica and fiber glass. It is generally desirable for the weight ratio of fused silica to fiber glass to be about 1:5 to about 10:1. In one embodiment, the weight ratio of fused silica to fiber glass is about 1:3 to about 8:1. In another embodiment, the weight ratio of fused silica to fiber glass is about 1:1 to about 6:1. An exemplary weight ratio of fused silica to fiber glass is about 4:1.
- the reinforcing agent is used in amounts of about 20 to about 90 wt %, based on the total weight of the insulating layer. In one embodiment, it is desirable for the reinforcing agent to be used in amounts of about 30 to about 85 wt %, based on the total weight of the insulating layer. In another embodiment, it is desirable for the reinforcing agent to be used in amounts of about 50 to about 80 wt %, based on the total weight of the insulating layer. An exemplary amount of reinforcing agent is about 78 wt %, based on the total weight of the insulating layer.
- the insulating layer comprises nanosized fillers.
- the nanosized fillers are those having an average largest dimension of at least one characteristic length of the particle being less than or equal to about 200 nm.
- a characteristic length may be a diameter, edge of a face, length, or the like.
- the nanosized fillers may have shapes whose dimensionalities are defined by integers, e.g., the particles are either 1, 2 or 3-dimensional in shape. They may also have shapes whose dimensionalities are not defined by integers (e.g., they may exist in the form of fractals).
- the nanosized fillers may exist in the form of spheres, flakes, fibers, whiskers, or the like, or a combination comprising at least one of the foregoing forms.
- fillers may have cross-sectional geometries that may be circular, ellipsoidal, triangular, rectangular, polygonal, or a combination comprising at least one of the foregoing geometries.
- the fillers as commercially available, may exist in the form of aggregates or agglomerates prior to incorporation into the insulating layer or even after incorporation into the insulating layer.
- An aggregate comprises more than one filler particle in physical contact with one another, while an agglomerate comprises more than one aggregate in physical contact with one another.
- the nanosized fillers comprise diamond nanoparticles having an average particle size of less than or equal to about 200 nanometers. In another embodiment, the diamond nanoparticles have an average particle size of less than or equal to about 75 nanometers. In yet another embodiment, the diamond nanoparticles have an average particle size of less than or equal to about 50 nanometers. In yet another embodiment, the diamond nanoparticles have an average particle size of less than or equal to about 25 nanometers. Exemplary nanosized fillers are diamond nanoparticles having an average particle size of about 50 nanometers.
- the diamond nanoparticles can be added in an amount of about 1 to about 50 wt %, based upon the total weight of the insulating layer. In another embodiment, the diamond nanoparticles can be added in an amount of about 3 to about 40 wt %, based upon the total weight of the insulating layer. In yet another embodiment, the diamond nanoparticles can be added in an amount of about 5 to about 30 wt %, based upon the total weight of the insulating layer. An exemplary amount of diamond nanoparticles is about 15 wt %, based upon the total weight of the insulating layer.
- the nanosized fillers comprise either diamond nanoparticles or a combination of metal oxides nanoparticles (nanosized metal oxides) and diamond nanoparticles.
- the nanosized metal oxides can be in the form of ceramics (i.e., chemically or mechano-chemically synthesized metal oxide powder).
- Nanosized metal oxides that may be used in the insulating layer are metal oxides of alkali earth metals, alkaline earth metals, transition metals and other commercially used metals.
- metal oxides are calcium oxide, cerium oxide, magnesium oxide, titanium oxide, zinc oxide, silicon oxide, copper oxide, aluminum oxide (e.g., alumina and/or fumed alumina), silicon dioxide (e.g., silica and/or fumed silica), or the like, or a combination comprising at least one of the foregoing metal oxides.
- Nanosized metal carbides such as silicon carbide, titanium carbide, tungsten carbide, iron carbide, or the like, or a combination comprising at least one of the foregoing metal carbides may also be used in the insulating layer.
- Exemplary metal oxides are fumed alumina, alumina, fumed silica, silica and combinations comprising at least one of the foregoing metal oxides.
- the metal oxides and carbides are generally particles having surface areas in an amount of about 1 to about 1000 square meter/gram (m 2 /g). Within this range it is generally desirable for the metal oxides and carbides to have surface areas greater than or equal to about 5 m 2 /g, specifically greater than or equal to about 10 m 2 /g, and more specifically greater than or equal to about 15 m 2 /g. Also desirable within this range is a surface area less than or equal to about 950 m 2 /g, specifically less than or equal to about 900 m 2 /g, and more specifically less than or equal to about 875 m 2 /g.
- the nanosized metal oxide and carbide particles prefferably have bulk densities in an amount of about 0.2 to about 2.5 grams per cubic centimeter; true densities in an amount of about 3 to about 7 grams per cubic centimeter and an average pore diameter of about 10 to about 250 angstroms.
- nanosized metal oxides are NANOACTIVETM calcium oxide, NANOACTIVETM calcium oxide plus, NANOACTIVETM cerium oxide, NANOACTIVETM magnesium oxide, NANOACTIVETM magnesium oxide plus, NANOACTIVETM titanium oxide, NANOACTIVETM zinc oxide, NANOACTIVETM silicon oxide, NANOACTIVETM copper oxide, NANOACTIVETM aluminum oxide, NANOACTIVETM aluminum oxide plus, all commercially available from NanoScale Materials Incorporated.
- nanosized metal carbides are titanium carbonitride, silicon carbide, silicon carbide-silicon nitride, and tungsten carbide all commercially available from Pred Materials International Incorporated.
- An exemplary type of nanosized fillers are the ferritic nanosized particles represented by the formula (II): (MeO) x. (Fe 2 O 3 ) 100-x (II) where “MeO” is any divalent ferrite forming metal oxide or a combination comprising two or more divalent metal oxides, and “x” is less than 50 mole percent.
- Suitable examples of ferrite forming divalent metal oxides are iron oxide (FeO), manganese oxide (MnO), nickel oxide (NiO), copper oxide (CuO), zinc oxide (ZnO), cobalt oxide (CoO), magnesium oxide (MgO), calcium oxide (CaO), ceria (Ce 2 O 3 ), or the like.
- Single metal oxides, multi-metal oxides, doped oxides are also envisioned for use in the insulating layer.
- Suitable examples of commercially available ferrite forming metal oxides are zinc oxide having average largest dimensions of 30 nm and 80 nm. All of the foregoing commercially available ferrite forming metal oxides may be obtained from Advanced Powder Technology based in St. Welshpool in Australia.
- metal oxides examples include ceria having a particle size of less than or equal to about 20 mm; gadolinium doped ceria having particle sizes of less than or equal to about 20 nm; samarium doped ceria having particle sizes of less than or equal to about 20 nm; or the like, or a combination comprising at least one of the foregoing commercially available metal oxides. All of the foregoing commercially available ferrite forming metal oxides comprising ceria may be obtained from Microcoating Technologies based in Atlanta, Ga.
- Ni 0.5 Zn 0.5 Fe 2 O 4 manufactured and sold by NanoProducts, Inc.
- the crystallite size for the Ni 0.5 Zn 0.5 Fe 2 O 4 is 12 nm, specific surface area is 45 square meter/gram (m 2 /g) and the equivalent spherical diameter is 47 nm.
- ferritic nanosized fillers When ferritic nanosized fillers are used, they may be used in amounts of about 2 to about 15 wt %, based on the total weight of the insulating layer. In one embodiment, the ferritic nanosized fillers are used in amounts of about 3 to about 12 wt %, based on the total weight of the insulating layer. In another embodiment, the ferritic nanosized fillers are used in amounts of about 4 to about 12 wt %, based on the total weight of the insulating layer. In an exemplary embodiment, the ferritic nanosized fillers are used in amounts of about 5 wt %, based on the total weight of the insulating layer.
- nanosized fillers such as asbestos, ground glass, kaolin and other clay minerals, silica, calcium silicate, calcium carbonate (whiting), magnesium oxide, zinc oxide, aluminum silicate, calcium sulfate, magnesium carbonate, sodium silicate, barium carbonate, barium sulfate (barytes), mica, talc, alumina trihydrate, quartz, and wollastonite (calcium silicate).
- Mica is an exemplary nanosized mineral filler.
- mica examples include anandite, annite, biotite, bityte, boromuscovite, celadonite, chernikhite, clintonite, ephesite, ferri-annite, glauconite, hendricksite, kinoshitalite, lepidolite, masutomilite, muscovite, nanpingite, paragonite, phlogopite, polylithionite, schenwerkite, roscoelite, siderophillite, sodiumphlogopite, taeniolite, vermiculite, wonesite, and zinnwaldite.
- Exemplary forms of mica are phlogopite (KMg 3 AlSi 3 O 10 (OH) 2 ) or muscovite (K 2 Al 4 [Si 6 Al 2 O 20 ](OH,F) 4 ).
- the phlogopite or muscovite or both are subjected to a process in which they are heated to an elevated temperature of about 500 to about 850° C. This heat causes the mica crystals to partially dehydrate and release a portion of the water, which is bonded naturally in the crystal. When this occurs, the mica partially exfoliates, resulting in smaller particles. The mica is then ground to produce small nanosized filler particles.
- a suitable from of commercially available mica is mica dust from VonRoll Isola.
- Nanosized fillers such as nanoclays (nanosized clays) may also be used in the insulating layer.
- Nanoclays are generally plate-like materials, the clay mineral being generally selected from smectite, vermiculite and halloysite clays.
- the smectite clay in turn can be selected from montmorillonite, saponite, beidellite, nontrite, hectorite or the like, or a combination comprising at least one of the foregoing clays.
- An exemplary clay mineral is the montmorillonite clay, a multilayered alumino-silicate.
- the nanoclay platelets generally have a thickness of about 3 to about 3000 angstroms and a size in the planar direction ranging of about 0.01 to about 100 micrometers.
- the aspect ratio of the nanoclays is generally of the order of about 10 to about 10,000.
- the respective clay platelets are separated by a gallery, i.e., a space between parallel layers of clay platelets containing various ions holding the platelets together.
- One such material is CLOISITE®10A commercially available from Southern Clay Products, its platelets having a thickness of about 0.001 micrometers (10 angstroms) and a size in the planar direction of about 0.15 to about 0.20 micrometers.
- a combination of nanosized fillers, nanosized mineral fillers and/or nanoclays may be used in the insulating layer. When such a combination is used, it may be added to the insulating layer in an amount of about 1 to about 80 wt %, based on the total weight of the insulating layer. In one embodiment, the combination of nanosized fillers, nanosized mineral fillers and/or nanoclays may be used in an amount of about 2 to about 75 wt %, based on the total weight of the insulating layer. In another embodiment, the combination of nanosized fillers, nanosized mineral fillers and/or nanoclays may be used in an amount of about 3 to about 70 wt %, based on the total weight of the insulating layer.
- An exemplary insulating layer is one having metal oxide nanosized fillers in an amount of about 5 wt %, based upon the total weight of the insulating layer.
- Another exemplary insulating layer is one having mica dust in an amount of about 20 wt %, based upon the total weight of the insulating layer.
- nanosized fillers of a particular chemical composition may be desirable to add to the insulating layer along with micrometer sized fillers of the same chemical composition.
- the micrometer sized fillers have average largest dimensions of greater than or equal to about 500 nm.
- mica dust having nanosized particle of an average largest dimension of less than or equal to about 200 nm may be added to the insulating layer in conjunction with micrometer sized mica dust having an average particle sizes of about 50 micrometers.
- nanosized fillers are used in conjunction with micrometer sized fillers having the same chemical composition, it is generally desirable for the nanosized filler to constitute up to about 50 wt %, more specifically up to about 60 wt %, and even more specifically up to about 70 wt %, based on the total weight of combination of nanosized and micrometer sized fillers.
- the shape of the nanosized fillers may be for example, spherical, irregular, plate-like or whisker like.
- the nanosized fillers may generally have average largest dimensions of at least one characteristic length being less than or equal to about 200 nm. In one embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 150 nm. In another embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 100 nm. In yet another embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 75 nm. In yet another embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 50 nm.
- the nanosized fillers may generally have average largest dimensions of less than or equal to about 200 nm. In one embodiment, more than 90% of the nanosized fillers have average largest dimensions less than or equal to about 200 nm. In another embodiment, more than 95% of the nanosized fillers have average largest dimensions less than or equal to about 200 nm. In yet another embodiment, more than 99% of the nanosized fillers have average largest dimensions less than or equal to about 200 nm. Bimodal or higher particle size distributions may also be used.
- the nanosized fillers may be used in amounts of about 1 to about 80 wt %, based on the total weight of the insulating layer. In one embodiment, the nanosized fillers may be used in amounts of about 3 to about 75 wt %, based on the total weight of the insulating layer. In another embodiment, the nanosized filler particles may be used in amounts of about 5 to about 70 wt %, based on the total weight of the insulating layer. In yet another embodiment, the nanosized filler particles may be used in amounts of about 6 to about 60 wt %, based on the total weight of the insulating layer. In an exemplary embodiment, the nanosized filler particles may be used in an amount of about 20 wt % based on the total weight of the insulating layer.
- the nanosized fillers may be coated with a silane-coupling agent to facilitate bonding with the thermosetting polymer. It is generally desirable for the fillers utilized in the curable polymeric resin coating to be treated with a silane-coupling agent such as tetramethylchlorosilane, hexadimethylenedisilazane, gamma-aminopropoxysilane, or the like, or a combination comprising at least one of the foregoing silane coupling agents.
- the silane-coupling agents generally enhance compatibility of the nanosized filler with the thermosetting polymer and improve the mechanical properties of the insulating layer.
- Solvents may optionally be used in the insulating layer.
- the solvent may be used as a viscosity modifier, or to facilitate the dispersion and/or suspension of nanosized filler.
- Liquid aprotic polar solvents such as propylene carbonate, ethylene carbonate, butyrolactone, acetonitrile, benzonitrile, nitromethane, nitrobenzene, sulfolane, dimethylformamide, N-methylpyrrolidone, or the like, or a combination comprising at least one of the foregoing solvents are generally desirable.
- Polar protic solvents such as, but not limited to, water, methanol, acetonitrile, nitromethane, ethanol, propanol, isopropanol, butanol, or the like, or a combination comprising at least one of the foregoing polar protic solvents may be used.
- Other non-polar solvents such a benzene, toluene, methylene chloride, carbon tetrachloride, hexane, diethyl ether, tetrahydrofuran, or the like, or a combination comprising at least one of the foregoing solvents may also be used.
- Co-solvents comprising at least one aprotic polar solvent and at least one non-polar solvent may also be utilized.
- An exemplary solvent is xylene or N-methylpyrrolidone.
- a solvent it may be utilized in an amount of about 1 to about 50 wt %, of the total weight of the insulating layer. In one embodiment, if a solvent is used, it may be utilized in an amount of about 3 to about 30 wt %, of the total weight of the insulating layer. In yet another embodiment, if a solvent is used, it may be utilized in an amount of about 5 to about 20 wt %, of the total weight of the insulating layer. It is generally desirable to evaporate the solvent before, during and/or after the curing of the thermosetting polymer.
- the thermosetting polymer is blended with the nanosized filler under high levels of shear in order to facilitate mixing.
- the level of shear imparted to the mixture of the thermosetting polymer and the nanosized filler is effective to facilitate dispersion of the filler in the thermosetting polymer.
- the energy imparted during the shearing process is about 0.001 kilowatt-hour/kilogram (kWhr/kg) to about 10 kWhr/kg. In one embodiment, the energy imparted during the shearing process is about 0.01 to about 8 kWhr/kg. In another embodiment, the energy imparted during the shearing process is about 0.1 to about 6 kWhr/kg. In yet another embodiment, the energy imparted during the shearing process is about 0.5 to about 4 kWhr/kg.
- the shear may be imparted in a melt blending process or it may be imparted via other means such as the application of ultrasonic energy to the mixture.
- suitable examples of melt blending equipment are extruders such as single screw extruders, twin screw extruders, or the like; buss kneaders, roll mills, paint mills, helicones, Waring blenders, Henschel mixers, Banbury's, or the like, or a combination comprising at least one of the foregoing melt blenders.
- Ultrasonic blending may also be carried out to facilitate the suspension and/or dispersion of the nanosized filler in the thermosetting polymer. In order to facilitate the suspension of the nanosized filler, it is desirable that both aggregates and agglomerates are broken into smaller particles.
- the insulating layer is disposed upon electrical components such as electrical conduction windings or stator bars or on the inside of a stator piece, and subjected to curing.
- the electrical component comprises copper.
- An initiator and/or crosslinking catalyst may be added to the mixture of the thermosetting polymer and the nanosized filler prior to or during the disposition of the insulating layer upon the winding.
- the insulating layer may be applied to the winding via dip coating, spray painting, electrostatic painting, brush painting, spin coating, injection molding, coextrusion or the like, or a combination comprising at least one of the foregoing processes.
- the insulating layer may be disposed upon a electrical components such as electrical conduction windings or stator bars or on the inside of a stator piece in several steps.
- an insulating layer of a certain thickness may be disposed upon the electrical components in a first step, while a second insulating layer of another thickness is disposed upon the first layer in a second step.
- the first insulating layer may have a different composition from the second insulating layer.
- the insulating layers may then be subjected to a heat treatment or to electromagnetic radiation such as UV curing and/or microwave curing to facilitate a more effective crosslinking.
- an insulating layer comprising the thermosetting resin can be extruded onto a complex shape such as that of a stator bar.
- the insulating layer comprises a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers.
- the method comprises feeding the complex shape with a length and more than one side into a central bore of a die wherein the central bore is of a configuration sufficient to allow the die to be moved along the complex shape or for the complex shape to be moved along through the die.
- At least one thermosetting material comprising the aforementioned nanoparticles is extruded through the die so that the thermosetting material is deposited simultaneously onto each side of the complex shape.
- the die is traversed along the entire length of the complex shape.
- the entire length of the complex shape is permitted to travel through the die so that it is coated with the insulating layer.
- the apparatus comprises a die having a central bore, wherein the central bore is of a configuration sufficient to allow the die to be moved along a complex shape with a plurality of sides and a length, and through which the complex shape is fed.
- the apparatus also comprises a means of traversing the extrusion die along the length of the complex shape, and at least one extruder connected to the die by flexible coupling means.
- the thermosetting polymer in the insulating layer may be subjected to curing at a temperature of about 100° C. to about 250° C.
- the insulating layer may be cured at a temperature of about 120° C. to about 220° C.
- the insulating layer may be cured at a temperature of about 140° C. to about 200° C.
- the insulating layer may be cured at a temperature of about 180° C.
- an insulating layer having a thickness of about 25 to about 300 micrometers ( ⁇ m). In one embodiment, it is desirable for the insulating layer to have a thickness of about 30 to about 275 ⁇ m. In another embodiment, it is desirable for the insulating layer to have a thickness of about 40 to about 250 ⁇ m. In yet another embodiment, it is desirable for the insulating layer to have a thickness of about 50 to about 225 ⁇ m.
- the insulating layer is advantageous in that it has a breakdown voltage of greater than or equal to about 0.75 kilovolt (kV) at a thickness of about 25 to about 300 ⁇ m. In one embodiment, the breakdown voltage for the insulating layer is greater than or equal to about 2 kV. In yet another embodiment, the breakdown voltage for the insulating layer is greater than or equal to about 3 kV. In yet another embodiment, the breakdown voltage for the insulating layer is greater than or equal to about 4 kV.
- kV kilovolt
- the insulating layer has an electrical breakdown strength of greater than or equal to about 1 kilovolt and is corona resistant to an applied voltage of 5000 Volts at a frequency of 3 kilohertz for a time period of over 100 minutes. In another embodiment, the insulating layer has an electrical breakdown strength of greater than or equal to about 1 kilovolt and is corona resistant to an applied voltage of 5000 Volts at a frequency of 3 kilohertz for a time period of over 200 minutes.
- the insulating layer is advantageous in that it can be applied to the electrical components in thicknesses of about 30 to about 300 micrometers, which is generally less than or equal to other commercially available insulating layers.
- the insulating layer advantageously has a compressive strength and hardness effective to withstand a compressive force of about 250 to about 1000 mega-Pascals (MPa).
- MPa mega-Pascals
- Application of the insulating layer also provides an opportunity for excluding the tape wound micaeous combined with polymeric groundwall insulation or slot liner material that is generally used in electrical devices.
- the insulating layer can comprise a thermosetting polymer that displays elastomeric behavior at room temperature.
- the thermosetting polymer displays elastomeric behavior at room temperature is used in the insulation, it is desirable for the insulating layer to have an elastic modulus of less than or equal to about 10 5 GPa when measured in a tensile test at room temperature.
- the insulating layer has an elongation to break of greater than or equal to about 200%. In one embodiment, the insulating layer has an elongation to break of greater than or equal to about 300%. In another embodiment, the insulating layer has an elongation to break of greater than or equal to about 500%. In yet another embodiment, the insulating layer has an elongation to break of greater than or equal to about 700%.
- the insulating layer displays substantially no creep when subjected to tensile or compressive stresses at temperatures that are greater than or equal to about room temperature (23° C.) up to about 2000 hours.
- the insulating layer displays a creep of less than 10% of its original length when subjected to a tensile or compressive force of greater than or equal to about 100 kilograms/square centimeter for a time period of up to about 2000 hours at room temperature.
- the insulating layer displays a creep of less than 15% of its original length when subjected to a tensile or compressive force of greater than or equal to about 100 kilograms/square centimeter for a time period of up to about 2000 hours at room temperature.
- the insulating layer displays a creep of less than or equal to about 10% of its original length when subjected to a deforming force of 10 kilo-pounds per square inch (10 kpsi) (about 700 kilogram-force/square centimeter) for 1000 hours at 155° C. In yet another embodiment, the insulating layer displays a creep of less than or equal to about 6% when subjected to a deforming force of 10 kilo-pounds per square inch (10 kpsi) (about 700 kilogram-force/square centimeter) for 1000 hours at 155° C.
- the insulating layer displays a creep of less than or equal to about 3% when subjected to a deforming force of 10 kilo-pounds per square inch (10 kpsi) (about 700 kilogram-force/square centimeter) for 1000 hours at 155° C.
- the insulating layer comprising the elastomer displays substantially no creep when subjected to prevailing tensile or compressive stresses at prevailing temperatures in an electrical generator that has been operating for a period of over 24 hours. This ability of the insulating layer to avoid creep at elevated temperatures makes it useful on stator bars and other pieces of equipment used in electrical generators.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polymers & Plastics (AREA)
- Composite Materials (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Organic Insulating Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Insulation, Fastening Of Motor, Generator Windings (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Insulating Of Coils (AREA)
- Manufacture Of Motors, Generators (AREA)
Abstract
Description
- This disclosure relates to composite coatings for groundwall insulation in electromagnetic devices such as motors, generators, and the like, methods of manufacture thereof, and articles derived therefrom.
- Groundwall insulation for electrical components that are utilized in electrical devices has generally been manufactured from multilayered materials. Multiple layers facilitate a higher resistance to corona discharge. It is also desirable for the insulating layer to have a high value of breakdown voltage so that it can withstand the high voltage environment of electrical devices such as motors and generators. The multiple layers are generally comprised of a fibrous backing manufactured from glass as well as additional layers manufactured from mica. The use of multiple layers is both time-consuming as well as expensive. In addition, the use of multiple layers generally results in a thicker layer of insulation and consequently larger parts.
- It is therefore generally desirable to use insulating layers that can be applied in a single step process and that can withstand higher voltages while have reduced thickness when compared with insulation that is made from multilayered materials.
- Disclosed herein is an article comprising an electrical component; and an electrically insulating layer disposed upon the electrical component, wherein the electrically insulating layer comprises a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers.
- Disclosed herein too is a method of manufacturing an article comprising disposing an electrically insulating layer upon an electrical component, wherein the electrically insulating layer comprises a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers; and curing the thermosetting polymer.
- Disclosed herein too is a composition comprising a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers.
- Disclosed herein too is a method comprising feeding a stator bar into a central bore of a die, wherein the central bore is of a configuration sufficient to allow relative movement of the die over the stator bar; extruding an insulating layer into the die so that it is deposited simultaneously onto each side of the stator bar; wherein the insulating layer comprises a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises diamond nanoparticles, or a combination of metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers; and traversing the die along an entire length of the stator bar.
- It is to be noted that the terms “first,” “second,” and the like as used herein do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The terms “a” and “an” do not denote a limitation of quantity, but rather denote the presence of at least one of the referenced item. The modifier “about” used in connection with a quantity is inclusive of the stated value and has the meaning dictated by the context (e.g., includes the degree of error associated with measurement of the particular quantity). It is to be noted that all ranges disclosed within this specification are inclusive and are independently combinable.
- Disclosed herein is an insulating layer that may be used to protect and insulate electrical components of electrical devices such as motors, generators, and the like. Disclosed herein too, is a method for applying the insulating layer onto electrical components that may be utilized in electrical devices. Suitable examples of such electrical components are electrical conduction windings, stator bars, or on the inside of a stator piece, or the like. The insulating layer generally comprises a thermosetting polymer and a nanosized filler. In one embodiment, the nanosized fillers comprise a combination of metal oxides and diamonds. In another embodiment, the nanosized fillers comprise diamonds. The nanosized fillers can also optionally include nanosized mineral fillers and/or nanoclays.
- The insulating layer is advantageous in that it can be applied to the electrical components in thicknesses of about 30 to about 300 micrometers, which is generally less than or equal to the thickness of other commercially available insulating layers. The insulating layer advantageously has a compressive strength and hardness effective to withstand a compressive force of about 250 to about 1000 mega-Pascals (MPa). Application of the insulating layer also provides an opportunity for excluding the tape wound, micaeous and polymeric groundwall insulation or slot liner material that is generally used in electrical devices. The insulating layer can be easily applied in a single step process such as dip coating, spray painting, extrusion, coextrusion, or the like. It also provides the potential for thinner insulation layers and provides a more robust insulation material because of its ability to withstand higher voltages. It also displays a significant corona resistance compared with other comparative insulating materials that do not contain nanosized fillers and improved thermal conductivity.
- In one advantageous embodiment, the insulating layer comprises an elastomer having a modulus of elasticity of less than or equal to about 105 gigapascals (GPa) at room temperature. The elastomer generally comprises a thermosetting polysiloxane resin and a nanosized filler. The elastomeric insulating layer advantageously displays an elongation of greater than or equal to about 200% in a tensile test at room temperature while at the same time displaying no substantial creep when subjected to a compressive or tensile force at prevailing temperatures in an electrical generator.
- The thermosetting polymer generally comprises a polymer that may be a homopolymer, a copolymer such as a star block copolymer, a graft copolymer, an alternating block copolymer or a random copolymer, ionomer, dendrimer, or a combination comprising at least one of the foregoing polymers that may be covalently crosslinked. Suitable examples of thermosetting polymers are polyurethanes, epoxies, phenolics, silicones, polyacrylics, polycarbonates polystyrenes, polyesters, polyamides, polyamideimides, polyarylates, polyarylsulfones, polyethersulfones, polyphenylene sulfides, polysulfones, polyimides, polyetherimides, polytetrafluoroethylenes, polyetherketones, polyether etherketones, polyether ketone ketones, polybenzoxazoles, polyoxadiazoles, polybenzothiazinophenothiazines, polybenzothiazoles, polypyrazinoquinoxalines, polypyromellitimides, polyquinoxalines, polybenzimidazoles, polyoxindoles, polyoxoisoindolines, polydioxoisoindolines, polytriazines, polypyridazines, polypiperazines, polypyridines, polypiperidines, polytriazoles, polypyrazoles, polycarboranes, polyoxabicyclononanes, polydibenzofurans, polyphthalides, polyacetals, polyanhydrides, polyvinyl ethers, polyvinyl thioethers, polyvinyl alcohols, polyvinyl ketones, polyvinyl halides, polyvinyl nitriles, polyvinyl esters, polysulfonates, polysulfides, polythioesters, polysulfones, polysulfonamides, polyureas, polyphosphazenes, polysilazanes, polybutadienes, polyisoprenes, or the like, or a combination comprising at least one of the foregoing thermosetting polymers. Blends of thermosetting polymers may also be utilized. An exemplary thermosetting polymer is a silicone polymer. The term polymer as used herein is used to mean either a small molecule (e.g., monomer, dimer, trimer, and the like), a homopolymer or a copolymer.
- As noted above, the thermosetting polymer can be an elastomer. Examples of thermosetting polymers are polybutadienes, polyisoprenes, polysiloxanes, polyurethanes, or the like, or a combination comprising at least one of the foregoing elastomers. An exemplary thermosetting polymer is a polysiloxane polymer (hereinafter silicone polymer).
- The silicone polymers that may be used in the preparation of the insulating layer generally has the formula (I) prior to reacting to form the thermoset
wherein R1, R2, R3, R4, R5 and R6 may be the same or different and wherein at least one of R1, R2, R3, R4, R5 and R6 is a reactive functionality prior to cross linking; m and n can be any integer including 0, with the exception that both m and n cannot be 0 at the same time. In general, while it is preferred for at least one of R1, R2, R3, R4, R5 and R6 to be reactive, it is generally desirable for two or preferably three of R1, R2, R3, R4, R5 or R6 to be chemically reactive. It is generally desirable for the sum of m and n to be about 1 to about 50,000. Suitable examples of groups that may be present as R1, R2, R3, R4, R5 or R6 in the equation (I) are alkyl, aryl, aralkyl, fluoroalkyl, vinylalkyl, aminoalkyl, vinyl, epoxy, hydride, silanol, amine, carbinol (hydroalkyl), methacrylate, acrylate, mercapto, haloalkyl, halogen, carboxylate, acetoxy, alkoxy, or the like. Exemplary reactive functional groups are vinyl or epoxy. Exemplary non-reactive functional groups are alkyl, fluoroalkyl or phenyl. An exemplary silicone polymer is a condensation cure silicone having methyl, phenyl and hydroxyl functional groups. One of the commercially available silicone polymer is MC 550 BKH® commercially available from General Electric Silicones in Waterford, N.Y. MC 550 BKH® contains 78 wt % of a reinforcing agent. The reinforcing agent is not nanosized and comprises fused silica and fiberglass in a weight ratio of 80:20. Nanosized fillers of interest are then added to this material. - It is generally desirable for the thermosetting polymer to have a number average molecular weight of about 75 to about 500,000 grams/mole (g/mole) prior to reacting to form the thermosetting polymer. In one embodiment, it is generally desirable for the thermosetting polymer to have a number average molecular weight of about 150 to about 100,000 g/mole prior to reacting to form the thermosetting polymer. In another embodiment, it is generally desirable for the thermosetting polymer to have a number average molecular weight of about 300 to about 75,000 g/mole prior to reacting to form the thermosetting polymer. In yet another embodiment, it is generally desirable for the thermosetting polymer to have a number average molecular weight of about 450 to about 50,000 g/mole prior to reacting to form the thermosetting polymer. An exemplary number average molecular weight of the thermosetting polymer is about 75 to about 5,000 g/mole prior to reacting to form the thermosetting polymer.
- It is generally desirable to use the thermosetting polymer in an amount of about 50 to 98 wt %, based on the total weight of the insulating layer. In one embodiment, it is desirable to use the thermosetting polymer in an amount of about 55 to about 90 wt %, based on the total weight of the insulating layer. In another embodiment, it is desirable to use the thermosetting polymer in an amount of about 60 to about 85 wt %, based on the total weight of the insulating layer. In yet another embodiment, it is desirable to use the thermosetting polymer in an amount of about 65 to about 80 wt %, based on the total weight of the insulating layer.
- The thermosetting polymer may optionally be mixed with reactive precursors such as silanes in order to increase the crosslink density. Suitable silanes are chlorosilanes, vinylsilanes, vinylalkoxysilanes, aklylacetoxysilanes, and the like. Suitable examples of chlorosilanes are methyltrichlorosilane and dimethyldichlorosilane. It is generally desirable for the dimethyldichlorosilane to have about 1 to about 35 mole percent of hydroxyl groups. In one embodiment, it is desirable for the dimethyldichlorosilane to have about 2 to about 15 mole percent of hydroxyl groups. In one embodiment, it is desirable for the dimethyldichlorosilane to have about 4 to about 8 mole percent of hydroxyl groups.
- It is generally desirable to use the reactive precursor in an amount of about 0.1 to 50 wt %, based on the total weight of the thermosetting polymer. In one embodiment, it is desirable to use the reactive precursor in an amount of about 0.5 to about 40 wt %, based on the total weight of the thermosetting polymer. In another embodiment, it is desirable to use the reactive precursor in an amount of about 1 to about 30 wt %, based on the total weight of the thermosetting polymer. In yet another embodiment, it is desirable to use the reactive precursor in an amount of about 1.2 to about 25 wt %, based on the total weight of the thermosetting polymer.
- The insulating layer may optionally contain a reinforcing agent that is not nanosized. The reinforcing agent is a filler having particle dimensions of greater than or equal to about 500 nanometers (nm). Suitable reinforcing agents are silica powder, such as fused silica, crystalline silica, natural silica sand, and various silane-coated silicas; talc, including fibrous, modular, needle shaped, and lamellar talcs; glass spheres, both hollow and solid, and surface-treated glass spheres; kaolin, including hard, soft, and calcined kaolin; mica, including metallized mica and mica surface treated with aminosilanes, acryloylsilanes, hexamethylenedisilazane, or coatings having a chemical composition similar to the thermosetting polymer so as to impart good physicals to compounded blends; feldspar and nepheline syenite; silicate spheres; cenospheres; fillite; aluminosilicate (armospheres), including silanized and metallized aluminosilicate; quartz; quartzite; perlite; tripoli; diatomaceous earth; silicon carbide; molybdenum sulfide; zinc sulfide; aluminum silicate (mullite); synthetic calcium silicate; zirconium silicate; barium titanate; barium ferrite; barium sulfate and heavy spar; flaked fillers and reinforcements such as glass flakes, flaked silicon carbide, aluminum diboride; processed mineral fibers such as those derived from blends comprising at least one of aluminum silicates, aluminum oxides, magnesium oxides, and calcium sulfate hemihydrate; synthetic reinforcing fibers, including polyester fibers such as polyethylene terephthalate fibers, polyvinylalcohol fibers, aromatic polyamide fibers, polybenzimidazole fibers, polyimide fibers, polyphenylene sulfide fibers, polyether ether ketone fibers, boron fibers, ceramic fibers such as silicon carbide, fibers from mixed oxides of aluminum, boron and silicon; single crystal fibers or “whiskers” including silicon carbide fibers, alumina fibers, boron carbide fibers, glass fibers, including textile glass fibers such as E, A, C, ECR, R, S, D, and NE glasses, fiber glass and quartz; or the like, or a combination comprising at least one of the foregoing reinforcing agents.
- Exemplary reinforcing agents are fused silica and fiber glass. It is generally desirable for the weight ratio of fused silica to fiber glass to be about 1:5 to about 10:1. In one embodiment, the weight ratio of fused silica to fiber glass is about 1:3 to about 8:1. In another embodiment, the weight ratio of fused silica to fiber glass is about 1:1 to about 6:1. An exemplary weight ratio of fused silica to fiber glass is about 4:1.
- When present, the reinforcing agent is used in amounts of about 20 to about 90 wt %, based on the total weight of the insulating layer. In one embodiment, it is desirable for the reinforcing agent to be used in amounts of about 30 to about 85 wt %, based on the total weight of the insulating layer. In another embodiment, it is desirable for the reinforcing agent to be used in amounts of about 50 to about 80 wt %, based on the total weight of the insulating layer. An exemplary amount of reinforcing agent is about 78 wt %, based on the total weight of the insulating layer.
- As stated above, the insulating layer comprises nanosized fillers. The nanosized fillers are those having an average largest dimension of at least one characteristic length of the particle being less than or equal to about 200 nm. A characteristic length may be a diameter, edge of a face, length, or the like. The nanosized fillers may have shapes whose dimensionalities are defined by integers, e.g., the particles are either 1, 2 or 3-dimensional in shape. They may also have shapes whose dimensionalities are not defined by integers (e.g., they may exist in the form of fractals). The nanosized fillers may exist in the form of spheres, flakes, fibers, whiskers, or the like, or a combination comprising at least one of the foregoing forms. These fillers may have cross-sectional geometries that may be circular, ellipsoidal, triangular, rectangular, polygonal, or a combination comprising at least one of the foregoing geometries. The fillers, as commercially available, may exist in the form of aggregates or agglomerates prior to incorporation into the insulating layer or even after incorporation into the insulating layer. An aggregate comprises more than one filler particle in physical contact with one another, while an agglomerate comprises more than one aggregate in physical contact with one another.
- In one embodiment, the nanosized fillers comprise diamond nanoparticles having an average particle size of less than or equal to about 200 nanometers. In another embodiment, the diamond nanoparticles have an average particle size of less than or equal to about 75 nanometers. In yet another embodiment, the diamond nanoparticles have an average particle size of less than or equal to about 50 nanometers. In yet another embodiment, the diamond nanoparticles have an average particle size of less than or equal to about 25 nanometers. Exemplary nanosized fillers are diamond nanoparticles having an average particle size of about 50 nanometers.
- The diamond nanoparticles can be added in an amount of about 1 to about 50 wt %, based upon the total weight of the insulating layer. In another embodiment, the diamond nanoparticles can be added in an amount of about 3 to about 40 wt %, based upon the total weight of the insulating layer. In yet another embodiment, the diamond nanoparticles can be added in an amount of about 5 to about 30 wt %, based upon the total weight of the insulating layer. An exemplary amount of diamond nanoparticles is about 15 wt %, based upon the total weight of the insulating layer.
- As noted above, the nanosized fillers comprise either diamond nanoparticles or a combination of metal oxides nanoparticles (nanosized metal oxides) and diamond nanoparticles. In one embodiment, the nanosized metal oxides can be in the form of ceramics (i.e., chemically or mechano-chemically synthesized metal oxide powder). Nanosized metal oxides that may be used in the insulating layer are metal oxides of alkali earth metals, alkaline earth metals, transition metals and other commercially used metals. Suitable examples of metal oxides are calcium oxide, cerium oxide, magnesium oxide, titanium oxide, zinc oxide, silicon oxide, copper oxide, aluminum oxide (e.g., alumina and/or fumed alumina), silicon dioxide (e.g., silica and/or fumed silica), or the like, or a combination comprising at least one of the foregoing metal oxides. Nanosized metal carbides such as silicon carbide, titanium carbide, tungsten carbide, iron carbide, or the like, or a combination comprising at least one of the foregoing metal carbides may also be used in the insulating layer. Exemplary metal oxides are fumed alumina, alumina, fumed silica, silica and combinations comprising at least one of the foregoing metal oxides.
- The metal oxides and carbides are generally particles having surface areas in an amount of about 1 to about 1000 square meter/gram (m2/g). Within this range it is generally desirable for the metal oxides and carbides to have surface areas greater than or equal to about 5 m2/g, specifically greater than or equal to about 10 m2/g, and more specifically greater than or equal to about 15 m2/g. Also desirable within this range is a surface area less than or equal to about 950 m2/g, specifically less than or equal to about 900 m2/g, and more specifically less than or equal to about 875 m2/g.
- It is generally desirable for the nanosized metal oxide and carbide particles to have bulk densities in an amount of about 0.2 to about 2.5 grams per cubic centimeter; true densities in an amount of about 3 to about 7 grams per cubic centimeter and an average pore diameter of about 10 to about 250 angstroms.
- Commercially available examples of nanosized metal oxides are NANOACTIVE™ calcium oxide, NANOACTIVE™ calcium oxide plus, NANOACTIVE™ cerium oxide, NANOACTIVE™ magnesium oxide, NANOACTIVE™ magnesium oxide plus, NANOACTIVE™ titanium oxide, NANOACTIVE™ zinc oxide, NANOACTIVE™ silicon oxide, NANOACTIVE™ copper oxide, NANOACTIVE™ aluminum oxide, NANOACTIVE™ aluminum oxide plus, all commercially available from NanoScale Materials Incorporated. Commercially available examples of nanosized metal carbides are titanium carbonitride, silicon carbide, silicon carbide-silicon nitride, and tungsten carbide all commercially available from Pred Materials International Incorporated.
- An exemplary type of nanosized fillers are the ferritic nanosized particles represented by the formula (II):
(MeO)x.(Fe2O3)100-x (II)
where “MeO” is any divalent ferrite forming metal oxide or a combination comprising two or more divalent metal oxides, and “x” is less than 50 mole percent. Suitable examples of ferrite forming divalent metal oxides are iron oxide (FeO), manganese oxide (MnO), nickel oxide (NiO), copper oxide (CuO), zinc oxide (ZnO), cobalt oxide (CoO), magnesium oxide (MgO), calcium oxide (CaO), ceria (Ce2O3), or the like. Single metal oxides, multi-metal oxides, doped oxides are also envisioned for use in the insulating layer. - Suitable examples of commercially available ferrite forming metal oxides are zinc oxide having average largest dimensions of 30 nm and 80 nm. All of the foregoing commercially available ferrite forming metal oxides may be obtained from Advanced Powder Technology based in St. Welshpool in Australia.
- Other examples of commercially available metal oxides are ceria having a particle size of less than or equal to about 20 mm; gadolinium doped ceria having particle sizes of less than or equal to about 20 nm; samarium doped ceria having particle sizes of less than or equal to about 20 nm; or the like, or a combination comprising at least one of the foregoing commercially available metal oxides. All of the foregoing commercially available ferrite forming metal oxides comprising ceria may be obtained from Microcoating Technologies based in Atlanta, Ga.
- A suitable example of commercially available ferritic nanosized fillers is Ni0.5Zn0.5Fe2O4 manufactured and sold by NanoProducts, Inc. The crystallite size for the Ni0.5Zn0.5Fe2O4 is 12 nm, specific surface area is 45 square meter/gram (m2/g) and the equivalent spherical diameter is 47 nm.
- When ferritic nanosized fillers are used, they may be used in amounts of about 2 to about 15 wt %, based on the total weight of the insulating layer. In one embodiment, the ferritic nanosized fillers are used in amounts of about 3 to about 12 wt %, based on the total weight of the insulating layer. In another embodiment, the ferritic nanosized fillers are used in amounts of about 4 to about 12 wt %, based on the total weight of the insulating layer. In an exemplary embodiment, the ferritic nanosized fillers are used in amounts of about 5 wt %, based on the total weight of the insulating layer.
- Suitable examples of other nanosized fillers are nanosized mineral fillers such as asbestos, ground glass, kaolin and other clay minerals, silica, calcium silicate, calcium carbonate (whiting), magnesium oxide, zinc oxide, aluminum silicate, calcium sulfate, magnesium carbonate, sodium silicate, barium carbonate, barium sulfate (barytes), mica, talc, alumina trihydrate, quartz, and wollastonite (calcium silicate). Mica is an exemplary nanosized mineral filler.
- Examples of mica that may be used are anandite, annite, biotite, bityte, boromuscovite, celadonite, chernikhite, clintonite, ephesite, ferri-annite, glauconite, hendricksite, kinoshitalite, lepidolite, masutomilite, muscovite, nanpingite, paragonite, phlogopite, polylithionite, preiswerkite, roscoelite, siderophillite, sodiumphlogopite, taeniolite, vermiculite, wonesite, and zinnwaldite.
- Exemplary forms of mica are phlogopite (KMg3AlSi3O10(OH)2) or muscovite (K2Al4[Si6Al2O20](OH,F)4). The phlogopite or muscovite or both are subjected to a process in which they are heated to an elevated temperature of about 500 to about 850° C. This heat causes the mica crystals to partially dehydrate and release a portion of the water, which is bonded naturally in the crystal. When this occurs, the mica partially exfoliates, resulting in smaller particles. The mica is then ground to produce small nanosized filler particles. A suitable from of commercially available mica is mica dust from VonRoll Isola.
- Nanosized fillers such as nanoclays (nanosized clays) may also be used in the insulating layer. Nanoclays are generally plate-like materials, the clay mineral being generally selected from smectite, vermiculite and halloysite clays. The smectite clay in turn can be selected from montmorillonite, saponite, beidellite, nontrite, hectorite or the like, or a combination comprising at least one of the foregoing clays. An exemplary clay mineral is the montmorillonite clay, a multilayered alumino-silicate. The nanoclay platelets generally have a thickness of about 3 to about 3000 angstroms and a size in the planar direction ranging of about 0.01 to about 100 micrometers. The aspect ratio of the nanoclays is generally of the order of about 10 to about 10,000. The respective clay platelets are separated by a gallery, i.e., a space between parallel layers of clay platelets containing various ions holding the platelets together. One such material is CLOISITE®10A commercially available from Southern Clay Products, its platelets having a thickness of about 0.001 micrometers (10 angstroms) and a size in the planar direction of about 0.15 to about 0.20 micrometers.
- In one embodiment, a combination of nanosized fillers, nanosized mineral fillers and/or nanoclays may be used in the insulating layer. When such a combination is used, it may be added to the insulating layer in an amount of about 1 to about 80 wt %, based on the total weight of the insulating layer. In one embodiment, the combination of nanosized fillers, nanosized mineral fillers and/or nanoclays may be used in an amount of about 2 to about 75 wt %, based on the total weight of the insulating layer. In another embodiment, the combination of nanosized fillers, nanosized mineral fillers and/or nanoclays may be used in an amount of about 3 to about 70 wt %, based on the total weight of the insulating layer. An exemplary insulating layer is one having metal oxide nanosized fillers in an amount of about 5 wt %, based upon the total weight of the insulating layer. Another exemplary insulating layer is one having mica dust in an amount of about 20 wt %, based upon the total weight of the insulating layer.
- In one embodiment, it may be desirable to add nanosized fillers of a particular chemical composition to the insulating layer along with micrometer sized fillers of the same chemical composition. In general, the micrometer sized fillers have average largest dimensions of greater than or equal to about 500 nm. For example mica dust having nanosized particle of an average largest dimension of less than or equal to about 200 nm may be added to the insulating layer in conjunction with micrometer sized mica dust having an average particle sizes of about 50 micrometers.
- In general when nanosized fillers are used in conjunction with micrometer sized fillers having the same chemical composition, it is generally desirable for the nanosized filler to constitute up to about 50 wt %, more specifically up to about 60 wt %, and even more specifically up to about 70 wt %, based on the total weight of combination of nanosized and micrometer sized fillers.
- As stated above, there is no particular limitation to the shape of the nanosized fillers, which may be for example, spherical, irregular, plate-like or whisker like. The nanosized fillers may generally have average largest dimensions of at least one characteristic length being less than or equal to about 200 nm. In one embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 150 nm. In another embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 100 nm. In yet another embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 75 nm. In yet another embodiment, the nanosized fillers may have average largest dimensions of less than or equal to about 50 nm.
- As stated above, the nanosized fillers may generally have average largest dimensions of less than or equal to about 200 nm. In one embodiment, more than 90% of the nanosized fillers have average largest dimensions less than or equal to about 200 nm. In another embodiment, more than 95% of the nanosized fillers have average largest dimensions less than or equal to about 200 nm. In yet another embodiment, more than 99% of the nanosized fillers have average largest dimensions less than or equal to about 200 nm. Bimodal or higher particle size distributions may also be used.
- The nanosized fillers may be used in amounts of about 1 to about 80 wt %, based on the total weight of the insulating layer. In one embodiment, the nanosized fillers may be used in amounts of about 3 to about 75 wt %, based on the total weight of the insulating layer. In another embodiment, the nanosized filler particles may be used in amounts of about 5 to about 70 wt %, based on the total weight of the insulating layer. In yet another embodiment, the nanosized filler particles may be used in amounts of about 6 to about 60 wt %, based on the total weight of the insulating layer. In an exemplary embodiment, the nanosized filler particles may be used in an amount of about 20 wt % based on the total weight of the insulating layer.
- In one embodiment, the nanosized fillers may be coated with a silane-coupling agent to facilitate bonding with the thermosetting polymer. It is generally desirable for the fillers utilized in the curable polymeric resin coating to be treated with a silane-coupling agent such as tetramethylchlorosilane, hexadimethylenedisilazane, gamma-aminopropoxysilane, or the like, or a combination comprising at least one of the foregoing silane coupling agents. The silane-coupling agents generally enhance compatibility of the nanosized filler with the thermosetting polymer and improve the mechanical properties of the insulating layer.
- Solvents may optionally be used in the insulating layer. The solvent may be used as a viscosity modifier, or to facilitate the dispersion and/or suspension of nanosized filler. Liquid aprotic polar solvents such as propylene carbonate, ethylene carbonate, butyrolactone, acetonitrile, benzonitrile, nitromethane, nitrobenzene, sulfolane, dimethylformamide, N-methylpyrrolidone, or the like, or a combination comprising at least one of the foregoing solvents are generally desirable. Polar protic solvents such as, but not limited to, water, methanol, acetonitrile, nitromethane, ethanol, propanol, isopropanol, butanol, or the like, or a combination comprising at least one of the foregoing polar protic solvents may be used. Other non-polar solvents such a benzene, toluene, methylene chloride, carbon tetrachloride, hexane, diethyl ether, tetrahydrofuran, or the like, or a combination comprising at least one of the foregoing solvents may also be used. Co-solvents comprising at least one aprotic polar solvent and at least one non-polar solvent may also be utilized. An exemplary solvent is xylene or N-methylpyrrolidone.
- If a solvent is used, it may be utilized in an amount of about 1 to about 50 wt %, of the total weight of the insulating layer. In one embodiment, if a solvent is used, it may be utilized in an amount of about 3 to about 30 wt %, of the total weight of the insulating layer. In yet another embodiment, if a solvent is used, it may be utilized in an amount of about 5 to about 20 wt %, of the total weight of the insulating layer. It is generally desirable to evaporate the solvent before, during and/or after the curing of the thermosetting polymer.
- In one method of manufacturing the insulating layer, the thermosetting polymer is blended with the nanosized filler under high levels of shear in order to facilitate mixing. The level of shear imparted to the mixture of the thermosetting polymer and the nanosized filler is effective to facilitate dispersion of the filler in the thermosetting polymer. The energy imparted during the shearing process is about 0.001 kilowatt-hour/kilogram (kWhr/kg) to about 10 kWhr/kg. In one embodiment, the energy imparted during the shearing process is about 0.01 to about 8 kWhr/kg. In another embodiment, the energy imparted during the shearing process is about 0.1 to about 6 kWhr/kg. In yet another embodiment, the energy imparted during the shearing process is about 0.5 to about 4 kWhr/kg.
- The shear may be imparted in a melt blending process or it may be imparted via other means such as the application of ultrasonic energy to the mixture. Suitable examples of melt blending equipment are extruders such as single screw extruders, twin screw extruders, or the like; buss kneaders, roll mills, paint mills, helicones, Waring blenders, Henschel mixers, Banbury's, or the like, or a combination comprising at least one of the foregoing melt blenders. Ultrasonic blending may also be carried out to facilitate the suspension and/or dispersion of the nanosized filler in the thermosetting polymer. In order to facilitate the suspension of the nanosized filler, it is desirable that both aggregates and agglomerates are broken into smaller particles.
- As stated above, the insulating layer is disposed upon electrical components such as electrical conduction windings or stator bars or on the inside of a stator piece, and subjected to curing. In one embodiment, the electrical component comprises copper. An initiator and/or crosslinking catalyst may be added to the mixture of the thermosetting polymer and the nanosized filler prior to or during the disposition of the insulating layer upon the winding. The insulating layer may be applied to the winding via dip coating, spray painting, electrostatic painting, brush painting, spin coating, injection molding, coextrusion or the like, or a combination comprising at least one of the foregoing processes.
- In one embodiment, the insulating layer may be disposed upon a electrical components such as electrical conduction windings or stator bars or on the inside of a stator piece in several steps. For example, an insulating layer of a certain thickness may be disposed upon the electrical components in a first step, while a second insulating layer of another thickness is disposed upon the first layer in a second step. In one embodiment, the first insulating layer may have a different composition from the second insulating layer. The insulating layers may then be subjected to a heat treatment or to electromagnetic radiation such as UV curing and/or microwave curing to facilitate a more effective crosslinking.
- In one exemplary embodiment, an insulating layer comprising the thermosetting resin can be extruded onto a complex shape such as that of a stator bar. As noted above, the insulating layer comprises a thermosetting polymer and a nanosized filler; wherein the nanosized filler comprises metal oxide and diamond nanoparticles that have an average largest dimension of less than or equal to about 200 nanometers. The method comprises feeding the complex shape with a length and more than one side into a central bore of a die wherein the central bore is of a configuration sufficient to allow the die to be moved along the complex shape or for the complex shape to be moved along through the die. At least one thermosetting material comprising the aforementioned nanoparticles is extruded through the die so that the thermosetting material is deposited simultaneously onto each side of the complex shape. In one embodiment, the die is traversed along the entire length of the complex shape. In another embodiment, the entire length of the complex shape is permitted to travel through the die so that it is coated with the insulating layer.
- An exemplary apparatus for applying the insulating layer is described in U.S. Pat. No. 5,650,031 to Bolon et al., the entire contents of which is hereby incorporated by reference except in those cases where a term in the present application contradicts a term from the incorporated reference, in which event the term from the present application takes precedence over the conflicting term from the incorporated reference. The apparatus comprises a die having a central bore, wherein the central bore is of a configuration sufficient to allow the die to be moved along a complex shape with a plurality of sides and a length, and through which the complex shape is fed. The apparatus also comprises a means of traversing the extrusion die along the length of the complex shape, and at least one extruder connected to the die by flexible coupling means.
- In one embodiment, the thermosetting polymer in the insulating layer may be subjected to curing at a temperature of about 100° C. to about 250° C. In another embodiment, the insulating layer may be cured at a temperature of about 120° C. to about 220° C. In yet another embodiment, the insulating layer may be cured at a temperature of about 140° C. to about 200° C. In an exemplary embodiment, the insulating layer may be cured at a temperature of about 180° C.
- It is generally desirable to have an insulating layer having a thickness of about 25 to about 300 micrometers (μm). In one embodiment, it is desirable for the insulating layer to have a thickness of about 30 to about 275 μm. In another embodiment, it is desirable for the insulating layer to have a thickness of about 40 to about 250 μm. In yet another embodiment, it is desirable for the insulating layer to have a thickness of about 50 to about 225 μm.
- The insulating layer is advantageous in that it has a breakdown voltage of greater than or equal to about 0.75 kilovolt (kV) at a thickness of about 25 to about 300 μm. In one embodiment, the breakdown voltage for the insulating layer is greater than or equal to about 2 kV. In yet another embodiment, the breakdown voltage for the insulating layer is greater than or equal to about 3 kV. In yet another embodiment, the breakdown voltage for the insulating layer is greater than or equal to about 4 kV.
- In one embodiment, the insulating layer has an electrical breakdown strength of greater than or equal to about 1 kilovolt and is corona resistant to an applied voltage of 5000 Volts at a frequency of 3 kilohertz for a time period of over 100 minutes. In another embodiment, the insulating layer has an electrical breakdown strength of greater than or equal to about 1 kilovolt and is corona resistant to an applied voltage of 5000 Volts at a frequency of 3 kilohertz for a time period of over 200 minutes.
- The insulating layer is advantageous in that it can be applied to the electrical components in thicknesses of about 30 to about 300 micrometers, which is generally less than or equal to other commercially available insulating layers. The insulating layer advantageously has a compressive strength and hardness effective to withstand a compressive force of about 250 to about 1000 mega-Pascals (MPa). Application of the insulating layer also provides an opportunity for excluding the tape wound micaeous combined with polymeric groundwall insulation or slot liner material that is generally used in electrical devices.
- As noted above, in one advantageous embodiment, the insulating layer can comprise a thermosetting polymer that displays elastomeric behavior at room temperature. When the thermosetting polymer displays elastomeric behavior at room temperature is used in the insulation, it is desirable for the insulating layer to have an elastic modulus of less than or equal to about 105 GPa when measured in a tensile test at room temperature. The insulating layer has an elongation to break of greater than or equal to about 200%. In one embodiment, the insulating layer has an elongation to break of greater than or equal to about 300%. In another embodiment, the insulating layer has an elongation to break of greater than or equal to about 500%. In yet another embodiment, the insulating layer has an elongation to break of greater than or equal to about 700%.
- It is desirable for the insulating layer to display substantially no creep when subjected to tensile or compressive stresses at temperatures that are greater than or equal to about room temperature (23° C.) up to about 2000 hours. In one embodiment, the insulating layer displays a creep of less than 10% of its original length when subjected to a tensile or compressive force of greater than or equal to about 100 kilograms/square centimeter for a time period of up to about 2000 hours at room temperature. In another embodiment, the insulating layer displays a creep of less than 15% of its original length when subjected to a tensile or compressive force of greater than or equal to about 100 kilograms/square centimeter for a time period of up to about 2000 hours at room temperature.
- In another embodiment, the insulating layer displays a creep of less than or equal to about 10% of its original length when subjected to a deforming force of 10 kilo-pounds per square inch (10 kpsi) (about 700 kilogram-force/square centimeter) for 1000 hours at 155° C. In yet another embodiment, the insulating layer displays a creep of less than or equal to about 6% when subjected to a deforming force of 10 kilo-pounds per square inch (10 kpsi) (about 700 kilogram-force/square centimeter) for 1000 hours at 155° C. In yet another embodiment, the insulating layer displays a creep of less than or equal to about 3% when subjected to a deforming force of 10 kilo-pounds per square inch (10 kpsi) (about 700 kilogram-force/square centimeter) for 1000 hours at 155° C.
- The insulating layer comprising the elastomer displays substantially no creep when subjected to prevailing tensile or compressive stresses at prevailing temperatures in an electrical generator that has been operating for a period of over 24 hours. This ability of the insulating layer to avoid creep at elevated temperatures makes it useful on stator bars and other pieces of equipment used in electrical generators.
- While the invention has been described with reference to exemplary embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted for elements thereof without departing from the scope of the invention. In addition, many modifications may be made to adapt a particular situation or material to the teachings of the invention without departing from the essential scope thereof. Therefore, it is intended that the invention not be limited to the particular embodiment disclosed as the best mode contemplated for carrying out this invention, but that the invention will include all embodiments falling within the scope of the appended claims.
Claims (39)
(MeO)x.(Fe2O3)100-x (II)
(MeO)x.(Fe2O3)100-x (II)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/286,060 US7875347B2 (en) | 2003-12-29 | 2005-11-23 | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
EP20060124546 EP1790460A1 (en) | 2005-11-23 | 2006-11-22 | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
CNA200610172957XA CN1992100A (en) | 2005-11-23 | 2006-11-23 | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
JP2006317221A JP2007181814A (en) | 2005-11-23 | 2006-11-24 | Composite coating for groundwall insulation, method of manufacture thereof and article derived therefrom |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/747,725 US7803457B2 (en) | 2003-12-29 | 2003-12-29 | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
US11/286,060 US7875347B2 (en) | 2003-12-29 | 2005-11-23 | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/747,725 Continuation-In-Part US7803457B2 (en) | 2003-12-29 | 2003-12-29 | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
Publications (3)
Publication Number | Publication Date |
---|---|
US20070117911A1 US20070117911A1 (en) | 2007-05-24 |
US20090182088A9 true US20090182088A9 (en) | 2009-07-16 |
US7875347B2 US7875347B2 (en) | 2011-01-25 |
Family
ID=37758870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/286,060 Expired - Fee Related US7875347B2 (en) | 2003-12-29 | 2005-11-23 | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
Country Status (4)
Country | Link |
---|---|
US (1) | US7875347B2 (en) |
EP (1) | EP1790460A1 (en) |
JP (1) | JP2007181814A (en) |
CN (1) | CN1992100A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080312731A1 (en) * | 2004-01-22 | 2008-12-18 | Boston Scientific Scimed, Inc. | Medical devices |
US20090326114A1 (en) * | 2006-08-25 | 2009-12-31 | Sonja Grothe | Barium sulfate-containing composite |
US20110207863A1 (en) * | 2010-02-22 | 2011-08-25 | General Electric Company | Composite films comprising passivated nanoparticulated ceramic oxides |
WO2012148631A1 (en) * | 2011-04-29 | 2012-11-01 | Rensselaer Polytechnic Institute | Self-healing electrical insulation |
US9667112B2 (en) | 2014-08-28 | 2017-05-30 | General Electric Company | Rotor slot liners |
US10030143B2 (en) * | 2014-12-25 | 2018-07-24 | Shengyi Technology Co., Ltd. | Ceramized silicone resin composition and pre-preg and laminate that use the composition |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070185260A1 (en) * | 2006-02-03 | 2007-08-09 | Hsi-Liang Lin | Heat-resisting silicone materials containing inorganic ceramic hollow microspheres |
US20070258190A1 (en) * | 2006-05-05 | 2007-11-08 | Irwin Patricia C | High temperature capacitors and method of manufacturing the same |
DE102007029739A1 (en) * | 2007-06-27 | 2009-01-08 | Robert Bosch Gmbh | Stator with insulation for an electric motor and insulation for a stator and power tool |
US20090075046A1 (en) * | 2007-09-17 | 2009-03-19 | Dow Global Technologies, Inc. | Aqueous based coating with attractive barrier and optical characteristics |
US20090142585A1 (en) * | 2007-11-08 | 2009-06-04 | Toshikazu Kobayashi | Nanocomposite compositions of polyamides, sepiolite-type clays and copper species and articles thereof |
US7655868B2 (en) * | 2008-01-08 | 2010-02-02 | General Electric Company | Stator bar components with high thermal conductivity |
DE102008026887B4 (en) * | 2008-06-05 | 2012-02-23 | Tridelta Weichferrite Gmbh | Soft magnetic composite material |
EP2131373B1 (en) | 2008-06-05 | 2016-11-02 | TRIDELTA Weichferrite GmbH | Soft magnetic material and method for producing objects from this soft magnetic material |
KR101080725B1 (en) * | 2009-03-13 | 2011-11-07 | 현대자동차주식회사 | Ptfe coating agent, method of preparing and using the same |
KR101783487B1 (en) * | 2009-05-01 | 2017-10-23 | 나노시스, 인크. | Functionalized matrixes for dispersion of nanostructures |
CN101901882B (en) * | 2009-05-31 | 2012-12-12 | 比亚迪股份有限公司 | Metallic laminate plate, method for preparing same and battery using same |
CN101931060B (en) * | 2009-06-26 | 2012-12-12 | 比亚迪股份有限公司 | Metal laminate plate, preparation method thereof and battery using metal laminate plate |
US20110049684A1 (en) * | 2009-09-03 | 2011-03-03 | Kang Lee | Anticounterfeiting system and method for integrated circuits |
EP2348615A1 (en) * | 2010-01-22 | 2011-07-27 | Alstom Technology Ltd | Conductive bar for electric machines |
JP5697230B2 (en) * | 2010-03-31 | 2015-04-08 | リンテック株式会社 | Molded body, manufacturing method thereof, member for electronic device, and electronic device |
WO2011161100A1 (en) * | 2010-06-22 | 2011-12-29 | Abb Research Ltd | Electrical conductor with surrounding electrical insulation |
TWI523900B (en) | 2010-07-20 | 2016-03-01 | 首威索勒希斯股份有限公司 | Fluoroelastomer composition |
JP2012244861A (en) * | 2011-05-24 | 2012-12-10 | Mitsubishi Electric Corp | Insulation coil |
CN102320821A (en) * | 2011-06-22 | 2012-01-18 | 北京航空航天大学 | Fireproof high-temperature resistant ceramic precursor coating suitable for cable lead |
US8097996B1 (en) | 2011-06-24 | 2012-01-17 | Dantam K Rao | Thermally conductive ground wall insulation for a stator bar |
ES2660542T3 (en) * | 2011-11-16 | 2018-03-22 | Abb Research Ltd. | Electrical insulation system |
CN103945965B (en) * | 2011-11-29 | 2016-05-18 | 昭和电工株式会社 | The manufacture method of tungsten fine powder |
ES2558859T3 (en) * | 2011-12-15 | 2016-02-09 | Siemens Aktiengesellschaft | Procedure to manufacture a shield against the corona effect, shield system against the corona effect of rapid curing and electric machine |
EP2645540A1 (en) * | 2012-03-28 | 2013-10-02 | Siemens Aktiengesellschaft | Corona shielding material for an electric machine |
GB2509753A (en) * | 2013-01-14 | 2014-07-16 | Bae Systems Plc | Ferrite Fibre Composites |
US9928935B2 (en) | 2013-05-31 | 2018-03-27 | General Electric Company | Electrical insulation system |
CN103319928B (en) * | 2013-07-02 | 2015-09-09 | 中南钻石有限公司 | High-thermal conductivity nanometer diamond insulation varnish and preparation method thereof |
DE102014203744A1 (en) | 2014-02-28 | 2015-09-03 | Siemens Aktiengesellschaft | Conductive anti-corrosive paper, especially for external corona protection |
DE102014203740A1 (en) * | 2014-02-28 | 2015-09-03 | Siemens Aktiengesellschaft | Corona protection system, in particular external corona protection system for an electrical machine |
KR101512025B1 (en) * | 2014-10-02 | 2015-04-14 | 한국산업은행 | Bipolar Conventional Air Terminal coated Magnetic Materials |
CN104726016A (en) * | 2015-03-30 | 2015-06-24 | 佛山市新战略知识产权文化有限公司 | High-temperature-resistant insulating paint and preparation method thereof |
CN105368251B (en) * | 2015-11-17 | 2017-12-15 | 国家电网公司 | A kind of extra-high voltage coatings and preparation method thereof |
KR101766085B1 (en) | 2015-12-10 | 2017-08-08 | 현대자동차주식회사 | Coating method using ptfe coating solution and piston skirt coated ptfe coating solution |
EP3179482A1 (en) * | 2015-12-10 | 2017-06-14 | ABB Schweiz AG | Conductor arrangement with insulation for an electrical machine |
CN105754474A (en) * | 2016-03-28 | 2016-07-13 | 无锡锡能锅炉有限公司 | High-temperature-resistant coating material for biomass fuel boiler wall |
CN105778643A (en) * | 2016-03-30 | 2016-07-20 | 无锡锡能锅炉有限公司 | Biomass boiler pipeline wear-resistant coating material |
CN105733326A (en) * | 2016-04-28 | 2016-07-06 | 无锡锡能锅炉有限公司 | Flue anticorrosive paint for pulverized coal boiler |
JP6734124B2 (en) * | 2016-06-02 | 2020-08-05 | 株式会社ダイセル | Method for producing cured resin film and cured resin film |
JP6157761B1 (en) * | 2016-07-13 | 2017-07-05 | 三菱電機株式会社 | Thermosetting resin composition, stator coil using the same, and rotating electric machine |
CN106941105B (en) | 2017-05-17 | 2019-09-24 | 京东方科技集团股份有限公司 | A kind of display base plate, its production method and display device |
WO2018224163A1 (en) * | 2017-06-09 | 2018-12-13 | Abb Schweiz Ag | Electrical machine with a conductor arrangement and insulation therefore |
CN109837037B (en) * | 2017-11-28 | 2021-02-02 | 山东得普达电机股份有限公司 | Super-heat-conduction nano diamond insulating cement and application thereof |
JP2019176023A (en) * | 2018-03-28 | 2019-10-10 | 京セラ株式会社 | Semiconductor-sealing resin composition and semiconductor device |
EP3837758A4 (en) * | 2018-08-13 | 2022-05-18 | University of Connecticut | Nanostructured insulation for electric machines |
DE102019103285A1 (en) * | 2019-02-11 | 2020-08-13 | Dr. Ing. H.C. F. Porsche Aktiengesellschaft | Process and stator for optimized slot base insulation |
CN113710362B (en) * | 2019-03-27 | 2023-09-01 | 三菱化学株式会社 | Catalyst molded body and method for producing methacrolein and/or methacrylic acid |
JP2021188047A (en) * | 2020-05-27 | 2021-12-13 | 三菱ケミカル株式会社 | Film for motor, motor, and method for manufacturing film for motor |
JP7482763B2 (en) | 2020-11-30 | 2024-05-14 | 日本特殊陶業株式会社 | coil |
EP4372969A1 (en) * | 2021-07-15 | 2024-05-22 | Nissan Motor Co., Ltd. | Dynamo-electric machine and coil fixing method for dynamo-electric machine |
CN113714030B (en) * | 2021-11-03 | 2022-01-28 | 北京华辰康健科技发展有限公司 | Tweezers sheet insulating layer coating equipment and coating processing method thereof |
CN115785713A (en) * | 2022-12-09 | 2023-03-14 | 中创新航科技股份有限公司 | Insulating paint and battery comprising same |
CN115873489A (en) * | 2022-12-15 | 2023-03-31 | 江苏泰力松新材料有限公司 | Polyurethane composite muscovite/feldspar film applied to enameled flat copper wire and preparation method thereof |
Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5552222A (en) * | 1995-01-27 | 1996-09-03 | General Electric Company | Electrically conductive articles comprising insulation resistant to corona discharge-induced degradation |
US5650031A (en) * | 1995-09-25 | 1997-07-22 | General Electric Company | Extruding thermoplastic insulation on stator bars |
US6359232B1 (en) * | 1996-12-19 | 2002-03-19 | General Electric Company | Electrical insulating material and stator bar formed therewith |
US20030151030A1 (en) * | 2000-11-22 | 2003-08-14 | Gurin Michael H. | Enhanced conductivity nanocomposites and method of use thereof |
US6632109B2 (en) * | 2001-06-28 | 2003-10-14 | General Electric Company | Powder coated terminal stud assemblies and methods of fabricating |
US6703780B2 (en) * | 2001-01-16 | 2004-03-09 | General Electric Company | Organic electroluminescent device with a ceramic output coupler and method of making the same |
US20040084112A1 (en) * | 2002-11-05 | 2004-05-06 | General Electric Company | Insulating coating with ferromagnetic particles |
US6778053B1 (en) * | 2000-04-19 | 2004-08-17 | General Electric Company | Powder coated generator field coils and related method |
US6864306B2 (en) * | 2001-04-30 | 2005-03-08 | Georgia Tech Research Corporation | High dielectric polymer composites and methods of preparation thereof |
US20050142349A1 (en) * | 2003-12-29 | 2005-06-30 | Irwin Patricia C. | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
US20050208301A1 (en) * | 2002-07-04 | 2005-09-22 | Tetsushi Okamoto | Highly heat conductive insulating member, method of manufacturing the same and electromagnetic device |
US20050245644A1 (en) * | 2003-07-11 | 2005-11-03 | Siemens Westinghouse Power Corporation | High thermal conductivity materials with grafted surface functional groups |
US20050277349A1 (en) * | 2004-06-15 | 2005-12-15 | Siemens Westinghouse Power Corporation | High thermal conductivity materials incorporated into resins |
US7041148B2 (en) * | 2003-03-03 | 2006-05-09 | General Electric Company | Coated ferromagnetic particles and compositions containing the same |
US7224039B1 (en) * | 2003-09-09 | 2007-05-29 | International Technology Center | Polymer nanocomposite structures for integrated circuits |
US7268293B2 (en) * | 2004-06-15 | 2007-09-11 | Siemen Power Generation, Inc. | Surface coating of lapped insulation tape |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3465829B2 (en) * | 1994-05-26 | 2003-11-10 | 電気化学工業株式会社 | Insulating material composition and circuit board and module using the same |
US5997894A (en) | 1997-09-19 | 1999-12-07 | Burlington Bio-Medical & Scientific Corp. | Animal resistant coating composition and method of forming same |
WO2001089827A1 (en) | 2000-05-18 | 2001-11-29 | Georgia Tech Research Corporation | High dielectric constant nano-structure polymer-ceramic composite |
JP2002129028A (en) * | 2000-10-26 | 2002-05-09 | Ngk Insulators Ltd | Characteristic inclined material |
JP2002201447A (en) * | 2000-12-27 | 2002-07-19 | Toyo Chem Co Ltd | Adhesive sheet containing magnetic material and manufacturing method of adhesive sheet containing magnetic material |
JP3590776B2 (en) * | 2001-03-27 | 2004-11-17 | 独立行政法人 科学技術振興機構 | Circuit board and its manufacturing method |
JP2002356619A (en) | 2001-05-29 | 2002-12-13 | Nippon Paint Co Ltd | Dielectric thermosetting composite film and its manufacturing method |
JP4080799B2 (en) | 2002-06-28 | 2008-04-23 | 三井金属鉱業株式会社 | Method for forming polyimide film containing dielectric filler on metal material surface, method for producing copper clad laminate for forming capacitor layer for printed wiring board, and copper clad laminate obtained by the method |
JP2004343054A (en) | 2003-04-23 | 2004-12-02 | Tdk Corp | Electronic component and its manufacturing method |
DE112004001324B4 (en) * | 2003-07-17 | 2011-02-24 | Rorze Corp., Fukuyama | Low-dielectric-constant films and manufacturing processes for these films, and electronic components using these films |
KR20050019214A (en) | 2003-08-18 | 2005-03-03 | 한국과학기술원 | Polymer/ceramic composite paste for embedded capacitor and method for fabricating capacitor using the same |
JP2005151667A (en) * | 2003-11-13 | 2005-06-09 | Tamagawa Seiki Co Ltd | Motor stator structure |
JP5278943B2 (en) * | 2005-09-15 | 2013-09-04 | ニホンハンダ株式会社 | Thermosetting silicone rubber composition, electronic component and electronic device |
-
2005
- 2005-11-23 US US11/286,060 patent/US7875347B2/en not_active Expired - Fee Related
-
2006
- 2006-11-22 EP EP20060124546 patent/EP1790460A1/en not_active Withdrawn
- 2006-11-23 CN CNA200610172957XA patent/CN1992100A/en active Pending
- 2006-11-24 JP JP2006317221A patent/JP2007181814A/en not_active Ceased
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5552222A (en) * | 1995-01-27 | 1996-09-03 | General Electric Company | Electrically conductive articles comprising insulation resistant to corona discharge-induced degradation |
US5650031A (en) * | 1995-09-25 | 1997-07-22 | General Electric Company | Extruding thermoplastic insulation on stator bars |
US6359232B1 (en) * | 1996-12-19 | 2002-03-19 | General Electric Company | Electrical insulating material and stator bar formed therewith |
US6778053B1 (en) * | 2000-04-19 | 2004-08-17 | General Electric Company | Powder coated generator field coils and related method |
US20030151030A1 (en) * | 2000-11-22 | 2003-08-14 | Gurin Michael H. | Enhanced conductivity nanocomposites and method of use thereof |
US6703780B2 (en) * | 2001-01-16 | 2004-03-09 | General Electric Company | Organic electroluminescent device with a ceramic output coupler and method of making the same |
US6864306B2 (en) * | 2001-04-30 | 2005-03-08 | Georgia Tech Research Corporation | High dielectric polymer composites and methods of preparation thereof |
US6632109B2 (en) * | 2001-06-28 | 2003-10-14 | General Electric Company | Powder coated terminal stud assemblies and methods of fabricating |
US20050208301A1 (en) * | 2002-07-04 | 2005-09-22 | Tetsushi Okamoto | Highly heat conductive insulating member, method of manufacturing the same and electromagnetic device |
US20040084112A1 (en) * | 2002-11-05 | 2004-05-06 | General Electric Company | Insulating coating with ferromagnetic particles |
US7041148B2 (en) * | 2003-03-03 | 2006-05-09 | General Electric Company | Coated ferromagnetic particles and compositions containing the same |
US20050245644A1 (en) * | 2003-07-11 | 2005-11-03 | Siemens Westinghouse Power Corporation | High thermal conductivity materials with grafted surface functional groups |
US7224039B1 (en) * | 2003-09-09 | 2007-05-29 | International Technology Center | Polymer nanocomposite structures for integrated circuits |
US20050142349A1 (en) * | 2003-12-29 | 2005-06-30 | Irwin Patricia C. | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
US20050277349A1 (en) * | 2004-06-15 | 2005-12-15 | Siemens Westinghouse Power Corporation | High thermal conductivity materials incorporated into resins |
US7268293B2 (en) * | 2004-06-15 | 2007-09-11 | Siemen Power Generation, Inc. | Surface coating of lapped insulation tape |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080312731A1 (en) * | 2004-01-22 | 2008-12-18 | Boston Scientific Scimed, Inc. | Medical devices |
US8048143B2 (en) * | 2004-01-22 | 2011-11-01 | Boston Scientific Scimed, Inc. | Medical devices |
US20090326114A1 (en) * | 2006-08-25 | 2009-12-31 | Sonja Grothe | Barium sulfate-containing composite |
US20110207863A1 (en) * | 2010-02-22 | 2011-08-25 | General Electric Company | Composite films comprising passivated nanoparticulated ceramic oxides |
WO2012148631A1 (en) * | 2011-04-29 | 2012-11-01 | Rensselaer Polytechnic Institute | Self-healing electrical insulation |
US8796372B2 (en) | 2011-04-29 | 2014-08-05 | Rensselaer Polytechnic Institute | Self-healing electrical insulation |
US9667112B2 (en) | 2014-08-28 | 2017-05-30 | General Electric Company | Rotor slot liners |
US10030143B2 (en) * | 2014-12-25 | 2018-07-24 | Shengyi Technology Co., Ltd. | Ceramized silicone resin composition and pre-preg and laminate that use the composition |
Also Published As
Publication number | Publication date |
---|---|
US20070117911A1 (en) | 2007-05-24 |
US7875347B2 (en) | 2011-01-25 |
JP2007181814A (en) | 2007-07-19 |
CN1992100A (en) | 2007-07-04 |
EP1790460A1 (en) | 2007-05-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7875347B2 (en) | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom | |
US7803457B2 (en) | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom | |
US7579397B2 (en) | Nanostructured dielectric composite materials | |
EP1766636B1 (en) | High thermal conductivity materials aligned within resins | |
CN111886659B (en) | Melt-processible thermoplastic composite comprising multimodal dielectric filler | |
KR101313857B1 (en) | Structured resin systems with high thermal conductivity fillers | |
EP1656682B1 (en) | Nanocomposites with controlled electrical properties | |
KR101313137B1 (en) | High thermal conductivity materials incorporated into resins | |
US20100326699A1 (en) | Polymeric High Voltage Insulator with a Hard, Hydrophobic Surface | |
US20090092832A1 (en) | Glass fibres coated with size containing nanoparticles | |
KR101104390B1 (en) | Manufacturing method of organic inorganic nanohybrid/nanocomposite varnish materials and the coated electrical wire | |
KR20140099352A (en) | Insulating wire having partial discharge resistance and high partial discharge inception voltage | |
EP3217410B1 (en) | Corona-resistant flat wire | |
Shen et al. | Enhanced thermal conductivity of epoxy composites with core‐shell SiC@ SiO2 nanowires | |
Tanaka et al. | Partial discharge endurance of epoxy/SiC nanocomposite | |
WO2023136990A1 (en) | High performance polymer composition containing carbon nanostructures | |
WO2017098566A1 (en) | Electrical insulating material for high-voltage devices | |
Taherian | 5-Nanocomposites in Dielectrics» | |
Frechette et al. | The role of molecular dielectrics in shaping the interface of polymer nanodielectrics | |
Chen et al. | Enhanced thermal and mechanical properties of epoxy composites by spherical silica with different size | |
Balasubramanian et al. | Nanocomposites based on inorganic nanoparticles | |
KR102512116B1 (en) | Insulating filler and manufacturing method thereof, insulating material containing the insulating filler and manufacturing method thereof | |
Iwata et al. | Preparation of Polymer Nanocomposites: Key for Homogeneous Dispersion | |
CN118871522A (en) | High performance polymer composition containing carbon nanostructures | |
Wang | Polypropylene-based nanodielectrics for HVDC cables |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: GENERAL ELECTRIC COMPANY, NEW YORK Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:IRWIN, PATRICIA CHAPMAN;TAN, QI;YOUNSI, ABDELKRIM;AND OTHERS;REEL/FRAME:017282/0242 Effective date: 20051121 |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
CC | Certificate of correction | ||
FPAY | Fee payment |
Year of fee payment: 4 |
|
MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 8TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1552) Year of fee payment: 8 |
|
FEPP | Fee payment procedure |
Free format text: MAINTENANCE FEE REMINDER MAILED (ORIGINAL EVENT CODE: REM.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
LAPS | Lapse for failure to pay maintenance fees |
Free format text: PATENT EXPIRED FOR FAILURE TO PAY MAINTENANCE FEES (ORIGINAL EVENT CODE: EXP.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
|
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20230125 |