US20070023895A1 - Semiconductor device having capacitors for reducing power source noise - Google Patents
Semiconductor device having capacitors for reducing power source noise Download PDFInfo
- Publication number
- US20070023895A1 US20070023895A1 US11/501,849 US50184906A US2007023895A1 US 20070023895 A1 US20070023895 A1 US 20070023895A1 US 50184906 A US50184906 A US 50184906A US 2007023895 A1 US2007023895 A1 US 2007023895A1
- Authority
- US
- United States
- Prior art keywords
- chip
- semiconductor chip
- semiconductor device
- semiconductor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 264
- 239000003990 capacitor Substances 0.000 title claims abstract description 86
- 239000000758 substrate Substances 0.000 claims abstract description 131
- 239000002184 metal Substances 0.000 claims abstract description 34
- 229910000679 solder Inorganic materials 0.000 claims abstract description 10
- 238000012546 transfer Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 238000012360 testing method Methods 0.000 description 10
- 230000002411 adverse Effects 0.000 description 6
- 230000008901 benefit Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 230000036039 immunity Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
- H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/50—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/66—High-frequency adaptations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0655—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0657—Stacked arrangements of devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0237—Disposition of the redistribution layers
- H01L2224/02371—Disposition of the redistribution layers connecting the bonding area on a surface of the semiconductor or solid-state body with another surface of the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0237—Disposition of the redistribution layers
- H01L2224/02372—Disposition of the redistribution layers connecting to a via connection in the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05541—Structure
- H01L2224/05548—Bonding area integrally formed with a redistribution layer on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/0557—Disposition the external layer being disposed on a via connection of the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/1302—Disposition
- H01L2224/13024—Disposition the bump connector being disposed on a redistribution layer on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16135—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/16145—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73253—Bump and layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/0651—Wire or wire-like electrical connections from device to substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06513—Bump or bump-like direct electrical connections between devices, e.g. flip-chip connection, solder bumps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06517—Bump or bump-like direct electrical connections from device to substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06527—Special adaptation of electrical connections, e.g. rewiring, engineering changes, pressure contacts, layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06541—Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06551—Conductive connections on the side of the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/535—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01075—Rhenium [Re]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19102—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device
- H01L2924/19103—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device interposed between the semiconductor or solid-state device and the die mounting substrate, i.e. chip-on-passive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19102—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device
- H01L2924/19104—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device on the semiconductor or solid-state device, i.e. passive-on-chip
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/924—Active solid-state devices, e.g. transistors, solid-state diodes with passive device, e.g. capacitor, or battery, as integral part of housing or housing element, e.g. cap
Definitions
- the present invention relates to a semiconductor device and, more particularly, to a semiconductor device which handles signals at high speed, and to a semiconductor device which has capacitors for reducing power source noise.
- FIG. 22 is a perspective view for describing a typical structure of a conventional semiconductor device of the above type.
- FIG. 23 is a cross-sectional view for describing the semiconductor device shown in FIG. 22 .
- reference numeral 1 indicates a system substrate on which to mount components.
- Reference numeral 2 indicates a BGA (ball grid array) substrate mounted on the system substrate 1 .
- BGA ball grid array
- numerous solder balls 3 are interposed between the BGA substrate 2 and a principal plane of the system substrate 1 to keep the two substrates fixed and electrically connected.
- Reference numeral 4 indicates a semiconductor chip mounted on the BGA substrate 2 .
- bumps 5 are interposed between the semiconductor chip 4 and a principal plane of the BGA substrate 2 to have the chip and substrate fixed and electrically connected.
- Reference numeral 6 indicates chip capacitors mounted on the system substrate 1 and BGA substrate 2 .
- a large number of chip capacitors 6 are interposed connectively between power supply terminals (not shown) on a semiconductor device that handles signals at high speed; these chip capacitors 6 are provided to reduce power source noise and thereby to stabilize voltage levels of the power source and ground.
- one disadvantage of the conventional semiconductor device is that the chip capacitors 6 are located away from the semiconductor chip 4 . Therefore, as the speed of signals, which are handled by the semiconductor device, is higher, the inductance between the semiconductor chip 4 and the chip capacitors 6 becomes higher. The growing inductance progressively reduces the immunity of the chip to power source noise.
- Another disadvantage is that the flow of high-speed signals generates electromagnetic waves from the semiconductor chip 4 , its package, or its mounting substrate. When reaching nearby electronic equipment, the electromagnetic waves can induce electric currents therein by electromagnetic induction, triggering a malfunction at times.
- semiconductor chips are mounted on the system substrate basically in a two-dimensional manner.
- semiconductor chips as they are designed to become ever higher in performance, incorporate a growing number of I/O terminals which translate into an ever-greater external size.
- differences in thermal expansion coefficient between the semiconductor chip 4 and the system substrate 1 can result in a warped substrate or dislodged terminals.
- dislodged terminals means that the accuracy of location of terminals is changed for worse.
- the BGA type semiconductor device is at its limit of fabrication when coming to measure about 40 mm per side.
- large-sized devices carry numerous terminals, they may adopt a pin grid array structure.
- the pin grid array structure requires installing a socket between the semiconductor chip and the mounting substrate, which raises fabrication costs.
- Multi-chip modules have different external shapes and different numbers of terminals from one system to another. Such diversities make it difficult for the modules to share sockets and substrates between them. This is another factor pushing up the costs involved.
- Another problem with the BGA type is that the module or chip is not receptive to what is known as rework. That is, considerable difficulties are experienced when a semiconductor device or MCM is dismounted from the system substrate for repair or for replacement with a new one having higher performance and the repaired or a replacement device is again mounted onto the system substrate.
- the heat dissipating structure of the BGA type leaves much to be desired in terms of performance and production costs.
- the present invention has been conceived to solve the previously-mentioned problems and a general object of the present invention is to provide a novel and useful semiconductor device.
- a more specific object of the present invention is to reduce power source noise and radio frequency interference, and to implement with high-density, and to rework easily.
- the above object of the present invention is attained by a following semiconductor device.
- the semiconductor device comprises a BGA substrate; a semiconductor chip mounted on a principal plane of the BGA substrate, the semiconductor chip being electrically connected to the BGA substrate by metal wires; and chip capacitors mounted on the semiconductor chip to reduce power source noise.
- the semiconductor device comprises: a BGA substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to one principal plane of the BGA substrate; and a first chip capacitor attached to the active regions of the semiconductor chip or to the opposite side of the active regions, the chip capacitor serving to reduce power source noise.
- the worsening of electrical characteristics which may be brought about by the presence of metal wires, can be eliminated.
- the first chip capacitor is attached to the opposite side of the active regions, higher degrees of freedom in determining the size and mounting locations of chip capacitors can be attained.
- power source and ground characteristics can be improved efficiently at low cost.
- the semiconductor device comprises a semiconductor chip including bumps and active regions, the bumps serving as electrodes and being formed on one principal plane of the semiconductor chip, the active regions being formed on the opposite side as the bumps; wherein chip capacitors can be attached to the active regions of the semiconductor chip, and the chip capacitors are served to reduce power source noise.
- testing of chip capacitors can be performed easily. Further, a sure connection between the chip capacitors and the semiconductor chip can be attained. Furthermore, since testing can be carried out readily, it is also easy to rework any defective products (chip capacitors).
- FIG. 1 is a cross-sectional view for describing a typical structure of a semiconductor device according to a first embodiment of the present invention
- FIG. 2 is a cross-sectional view for describing a typical structure of a semiconductor device according to the second embodiment
- FIG. 3 is a cross-sectional view for describing a typical structure of a semiconductor device according to the third embodiment
- FIG. 4 is a cross-sectional view for describing a typical structure of the through-type via contacts in the third embodiment
- FIG. 5 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourth embodiment
- FIG. 6 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifth embodiment
- FIG. 7 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixth embodiment.
- FIG. 8 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventh embodiment.
- FIG. 9 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighth embodiment.
- FIG. 10 is a cross-sectional view for describing a typical structure of a semiconductor device according to the ninth embodiment.
- FIG. 11 is a cross-sectional view for describing a typical structure of a semiconductor device according to the tenth embodiment
- FIG. 12 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eleventh embodiment
- FIG. 13 is a cross-sectional view for describing a typical structure of a semiconductor device according to the twelfth embodiment
- FIG. 14 is a cross-sectional view for describing a typical structure of a semiconductor device according to the thirteenth embodiment
- FIG. 15 is a cross-sectional view for describing a modification of a semiconductor device according to the thirteenth embodiment
- FIG. 16 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourteenth embodiment
- FIG. 17 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifteenth embodiment.
- FIG. 18 is a plan view for describing a layout of mounting pads and rework mounting pads in the fifteenth embodiment
- FIG. 19 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixteenth embodiment.
- FIG. 20 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventeenth embodiment
- FIG. 21 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighteenth embodiment.
- FIG. 22 is a perspective view for describing a typical structure of a conventional semiconductor device of the above type.
- FIG. 23 is a cross-sectional view for describing the semiconductor device shown in FIG. 22 .
- FIG. 1 is a cross-sectional view for describing a typical structure of a semiconductor device according to a first embodiment of the present invention.
- reference numeral 2 indicates a BGA (ball grid array) substrate.
- the BGA substrate 2 is secured onto a mounting substrate (not shown), with numerous solder balls 3 interposed therebetween to ensure inter-substrate electrical connection in a well-known procedure.
- Reference numeral 4 indicates a semiconductor chip mounted on the BGA substrate 2 .
- Metal wires 7 provide electrical connection between the semiconductor chip 4 and the BGA substrate 2 .
- Reference numeral 6 indicates chip capacitors provided for the same technical reason as in conventionally devised comparable setups. What characterizes the first embodiment is that the chip capacitors 6 are mounted on the semiconductor chip 4 .
- Reference numeral 8 indicates a mold resin that covers the semiconductor chip 4 , metal wires 7 , and chip capacitors 6 .
- the semiconductor device has the chip capacitors 6 mounted on the semiconductor chip 4 to minimize inductance therebetween. This effectively reduces power source noise so as to let high-speed signals be handled more easily than before. Unlike conventional setups where chip capacitors 6 are positioned away from the semiconductor chip 4 , the number of chip capacitors 6 required is significantly reduced in the first embodiment.
- FIG. 2 is a cross-sectional view for describing a typical structure of a semiconductor device according to the second embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIG. 1 are designated by like reference numerals, and their descriptions are omitted where redundant.
- bumps 5 are used to connect the semiconductor chip 4 with the BGA substrate 2 .
- reference numeral 5 indicates bumps that secures the semiconductor chip 4 onto the BGA substrate 2 while providing electrical connection therebetween.
- the bumps 5 eliminate that potential problem.
- the semiconductor chip 4 furnished with the bumps 5 has active regions (not shown) formed on its lower surface as shown in FIG. 2 , the chip capacitors 6 are attached to the bottom of the semiconductor chip 4 as indicated.
- Reference numeral 9 indicates an under-fill resin.
- FIG. 3 is a cross-sectional view for describing a typical structure of a semiconductor device according to the third embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIG. 2 are designated by like reference numerals, and their descriptions are omitted where redundant.
- FIG. 3 What differentiates the third embodiment from the setup of FIG. 2 is that while chip capacitors 6 are attached to the back of the semiconductor chip 4 , a plurality of through-type via contacts 10 are used to ensure electrical connection between the chip capacitors 6 and active regions of the semiconductor chip 4 .
- reference numeral 6 indicates chip capacitors 6 .
- the chip capacitors 6 are mounted on the top, as shown in FIG. 3 , which in fact constitutes the back of the semiconductor chip 4 .
- Reference numeral 10 indicates through-type via contact that extend from the upper to the lower surface of the semiconductor chip 4 as shown in FIG. 3 .
- the through-type via contacts 10 ensure electrical connection between both ends of the chip capacitors 6 on the one hand and active regions (not shown) of the semiconductor chip 4 on the other hand.
- FIG. 4 is a cross-sectional view for describing a typical structure of the through-type via contacts in the third embodiment.
- reference numeral 4 indicates a semiconductor chip; 11 indicates active regions of the semiconductor chip 4 ; 10 indicates through-type via contacts that extend from the active regions 11 of the semiconductor chip 4 to its back; and 12 indicates on-chip metal wiring which, mounted on the active regions 11 , is connected to appropriate locations of the active regions 11 as well as to lower ends of the through-type via contacts 10 as seen in FIG. 4 .
- Reference numeral 13 indicates chip back pads which, mounted on the back of the semiconductor chip 4 , are connected to upper ends of the through-type via contacts 10 as shown in FIG. 4 and constitute electrodes connected to the chip capacitors 6 .
- Reference numerals 61 and 62 indicate terminal electrodes of the chip capacitors 6 . These electrodes 61 and 62 are attached to the back of the semiconductor chip 4 and are connected individually to the chip back pads 13 .
- the third embodiment constituted as described above, has the chip capacitors 6 mounted on the back of the semiconductor chip 4 and connected to its active regions 11 by means of the through-type via contacts 10 . Therefore, this structure permits higher degrees of freedom in determining the size and mounting locations of chip capacitors 6 , whereby power source and ground characteristics are improved efficiently at low cost.
- FIG. 5 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourth embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIGS. 1 and 2 are designated by like reference numerals, and their descriptions are omitted where redundant.
- the semiconductor chip 4 B of FIG. 1 is mounted on the semiconductor chip 4 A of FIG. 2 in a three-dimensional manner with respect to a BGA substrate 2 .
- reference numeral 4 A indicates a first semiconductor chip whose structure is shown in FIG. 2 ;
- 4 B indicates a second semiconductor chip whose structure is shown in FIG. 1 , the second semiconductor chip 4 B being mounted on the back of the first semiconductor chip 4 A;
- 7 indicates metal wires provided for electrical connection between the second semiconductor chip 4 B and the BGA substrate 2 ;
- 8 indicates a mold resin covering the first and second semiconductor chips 4 A and 4 B as a whole. Namely, the first and second semiconductor chips 4 A and 4 B, bumps 5 , the chip capacitors 6 and the metal wires 7 are covered by the mold resin 8 .
- the fourth embodiment constituted as described above, permits packaging of chips with higher density than before to make the system smaller in size.
- This feature adds advantageously to the improved power source and ground characteristics brought about by mounting the chip capacitors 6 onto the semiconductor chips 4 A and 4 B.
- FIG. 6 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifth embodiment.
- reference numeral 14 indicates a module substrate that carries, in two-dimensional fashion, a first semiconductor chip 4 A whose structure is shown in FIG. 2 and a second semiconductor chip 4 B whose structure is shown in FIG. 1 .
- the fifth embodiment constituted as described above, has multiple semiconductor chips 4 A and 4 B installed two-dimensionally to make up an appreciably thin-shaped system which, admittedly, is not quite susceptible to being reduced in size.
- One advantage of the present embodiment 5 is that as many semiconductor chips as needed are readily mounted on the module substrate 14 depending on the scale of the system of interest.
- chip capacitor 6 A shown in FIG. 6 may be attached to the module substrate 14 to stabilize the power source and ground characteristics of the system.
- the semiconductor device comprises: a module substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the module substrate; a second semiconductor chip mounted on the principal plane of the module substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the module substrate by means of metal wires; chip capacitors attached to s active regions of first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise.
- the module substrate may further carries chip capacitors for reducing power source noise.
- FIG. 7 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixth embodiment.
- the component parts having the same or
- solder balls 3 are mounted on the back of a module substrate 14 to constitute a BGA substrate 2 while the BGA substrate 2 carrying a first and a second semiconductor chip 4 A and 4 B is mounted on a system substrate 15 .
- reference numeral 2 indicates a BGA substrate formed by attaching solder balls 3 to the back of the module substrate 14 in FIG. 6 ;
- 15 indicates a system substrate on which the BGA substrate 2 is mounted; and
- 6 B indicates chip capacitors mounted on the system substrate 15 .
- the sixth embodiment constituted as described above, has a plurality of module substrates mounted in like manner each onto the system substrate 14 to easily make up a system of a still larger scale. Further, the chip capacitors 6 B mounted on the system substrate 15 stabilize the power source and ground characteristics of the system.
- the semiconductor device comprises: a system substrate; a ball grid array substrate called the BGA substrate mounted on a principal plane of the system substrate with solder balls interposed therebetween; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the BGA substrate; a second semiconductor chip mounted on the principal plane of the BGA substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the BGA substrate by means of metal wires; and chip capacitors attached to the active regions of the first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise.
- At least one of the system substrate and the BGA substrate carries chip capacitors for reducing power source noise.
- FIG. 8 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventh embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIG. 1 are designated by like reference numerals, and their descriptions are omitted where redundant.
- the semiconductor chip 4 is covered with a conductive radiator 16 while the BGA substrate 2 incorporates a shield plane 17 for shielding the semiconductor chip 4 in combination with the conductive radiator 16 .
- reference numeral 16 indicates a conductive radiator mounted on a BGA substrate 2 in such a manner that the conductive radiator 16 provides a covering over a semiconductor chip 4 enveloped in a mold resin 8 ; and numeral 17 indicates a shield plane which is incorporated in the BGA substrate 2 and which constitutes a shield of the semiconductor chip 4 in combination with the conductive radiator 16 .
- the conductive radiator 16 and shield plane 17 are both connected to ground potential.
- the seventh embodiment constituted as described above, reduces power source noise and ground noise while preventing radio frequency interference from inside the conductive radiator 16 and forestalling adverse effects of such interference from outside the conductive radiator 16 .
- heat transfer afforded by the conductive radiator 16 and shield plane 17 enhances the characteristics of heat radiation upward as well as downward.
- FIG. 9 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighth embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIG. 2 are designated by like reference numerals, and their descriptions are omitted where redundant.
- the semiconductor chip 4 is covered with a conductive radiator 16 while the BGA substrate 2 incorporates a shield plane 17 for shielding the semiconductor chip 4 in combination with the conductive radiator 16 .
- reference numeral 16 indicates a conductive radiator mounted on a BGA substrate 2 in such a manner that the conductive radiator 16 covers over the semiconductor chip 4 ; and numeral 17 indicates a shield plane which is incorporated in the BGA substrate 2 and which constitutes a shield of the semiconductor chip 4 in combination with the conductive radiator 16 .
- the conductive radiator 16 and shield plane 17 are both connected to ground potential.
- Reference numeral 18 indicates for a heat transfer member such as a heat sinking (radiating) resin installed interposingly between the semiconductor chip 4 and the conductive radiator 16 .
- the eighth embodiment constituted as described above, reduces power source noise and ground noise while preventing radio frequency interference from inside the conductive radiator 16 and forestalling adverse effects of such interference from outside the conductive radiator 16 .
- Heat transfer afforded by the conductive radiator 16 and shield plane 17 enhances the characteristics of heat radiation upward as well as downward.
- the heat transfer member 18 transfers heat of the semiconductor chip 4 efficiently to the conductive radiator 16 so that heat sinking performance is enhanced further.
- FIG. 10 is a cross-sectional view for describing a typical structure of a semiconductor device according to the ninth embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIG. 8 are designated by like reference numerals, and their descriptions are omitted where redundant.
- a radiating fin 19 is attached to the outside face of the conductive radiator 16 .
- reference numeral 19 indicates the radiating fin attached to the external surface of the conductive radiator 16 .
- FIG. 11 is a cross-sectional view for describing a typical structure of a semiconductor device according to the tenth embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIG. 6 are designated by like reference numerals, and their descriptions are omitted where redundant.
- a conductive radiator 16 covering a first and a second semiconductor chip 4 A and 4 B is mounted on a module substrate 14 , and the module substrate 14 is arranged to incorporate a shield plane 17 .
- the shield plane 17 constitutes a shield of the first and second semiconductor chips 4 A and 4 B.
- the conductive radiator 16 and shield plane 17 are connected to ground potential.
- Reference numeral 18 indicates a heat transfer member such as a heat sinking (radiating) resin installed interposingly between the first semiconductor chip 4 A and the conductive radiator 16 .
- the tenth embodiment constituted as described above, can reduce power source noise and ground noise while preventing radio frequency interference from inside the conductive radiator 16 and forestalling adverse effects of such interference from outside the conductive radiator 16 .
- Heat transfer afforded by the conductive radiator 16 and shield plane 17 enhances the characteristics of heat radiation upward as well as downward.
- the heat transfer member 18 transfers heat of the first semiconductor chip 4 A efficiently to the conductive radiator 16 so that heat sinking performance is enhanced further.
- the semiconductor device further comprises: a conductive radiator attached to the principal plane of the module substrate (or the BGA substrate), the conductive radiator covering the first and second semiconductor chips; and a shield plane incorporated in the module substrate, shield plane serving to provide a shield of the first and second semiconductor chips in combination with the conductive radiator; wherein the conductive radiator and the shield plane are connected to ground potential.
- the semiconductor device further comprises a heat transfer member interposed between the opposite side of the active regions of the first semiconductor chip and the conductive radiator.
- FIG. 12 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eleventh embodiment.
- FIG. 12 the component parts having the same or corresponding functions as their counterparts in FIG. 7 are designated by like reference numerals, and their descriptions are omitted where redundant.
- a conductive radiator 16 covering a first and a second semiconductor chip 4 A and 4 B is mounted on a BGA substrate 2 , and the BGA substrate 2 is arranged to incorporate a shield plane 17 A which, combined with the conductive radiator 16 , constitutes a shield of the first and second semiconductor chips 4 A and 4 B.
- a system substrate 15 is also arranged to incorporate a shield plane 17 B.
- the shield plane 17 B is similar to the shield plane 17 A.
- the shield planes 17 A and 17 B are connected to ground potential as well as the conductive radiator 16 .
- Reference numeral 18 indicates a heat transfer member such as a heat sinking (radiating) resin installed interposingly between the first semiconductor chip 4 A and the conductive radiator 16 .
- the eleventh embodiment constituted as described above, can reduce power source noise and ground noise while preventing radio frequency interference from inside the conductive radiator 16 and forestalling adverse effects of such interference from outside the conductive radiator 16 .
- Heat transfer afforded by the conductive radiator 16 and shield planes 17 A and 17 B enhances the characteristics of heat radiation upward as well as downward.
- the heat transfer member 18 transfers heat of the first semiconductor chip 4 A efficiently to the conductive radiator 16 so that heat sinking performance is enhanced further.
- FIG. 13 is a cross-sectional view for describing a typical structure of a semiconductor device according to the twelfth embodiment.
- reference numeral 4 indicates a semiconductor chip
- 5 indicates bumps
- 11 indicates active regions of the semiconductor chip 4 , and the active regions 11 are formed on the opposite side of the bump mounting surface across the semiconductor chip 4
- 10 indicates through-type via contacts extending from the active regions to the bump mounting surface in the semiconductor chip 4
- 12 indicates on-chip metal wiring which, mounted on the active regions 11 , is connected to appropriate locations of the active regions 11 as well as to upper ends of the through-type via contacts 10 as seen in FIG. 13 , the on-chip metal wiring 12 further constituting connecting electrodes of chip capacitors (not shown).
- Reference numeral 20 indicates chip back-mounted metal wiring which, mounted on the bump mounting surface, is connected to the bumps 5 as well as to lower ends of the through-type via contacts 10 as shown in FIG. 13 .
- the twelfth embodiment constituted as described above, has the active regions 11 of the semiconductor chip 4 facing upward when the semiconductor chip 4 is mounted on the BGA substrate or the like.
- This structure allows electrodes such as the on-chip metal wiring 12 to be used for test and chip capacitor connection purposes. Because testing is readily carried out, it is also easy to rework any defective products.
- FIG. 14 is a cross-sectional view for describing a typical structure of a semiconductor device according to the thirteenth embodiment.
- FIG. 15 is a cross-sectional view for describing a modification of a semiconductor device according to the thirteenth embodiment.
- reference numeral 2 indicates a BGA substrate furnished with solder balls 3 .
- the semiconductor device shown in FIG. 13 is mounted on a principal plane of the BGA substrate 2 .
- Reference numeral 8 indicates a mold resin 8 covering the semiconductor device and constituting a package.
- FIG. 14 the component parts having the same or corresponding functions as their counterparts in FIG. 13 are designated by like reference numerals, and their descriptions are omitted where redundant.
- the thirteenth embodiment constituted as described above, has no metal wires and is thus capable of handling signals at higher speed.
- the benefit of having the active regions 11 facing upward is the same as with the twelfth embodiment.
- chip capacitors 6 are connected to the on-chip metal wiring 12 on the active regions 11 as shown in FIG. 15 , it is possible to improve the power source and ground characteristics as described above in connection with other embodiments.
- FIG. 16 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourteenth embodiment.
- reference numeral 15 indicates a system substrate that is furnished with numerous mounting pads 21 .
- a sealing resin 22 a sealing resin 22 .
- Chip capacitors 6 B may be mounted on the system substrate 15 . Thus, it is possible to stabilize the power source and ground characteristics of the system constituted by the device.
- FIG. 17 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifteenth embodiment.
- FIG. 18 is a plan view for describing a layout of mounting pads and rework mounting pads in the fifteenth embodiment.
- FIG. 17 the component parts having the same or corresponding functions as their counterparts in FIG. 16 are designated by like reference numerals, and their descriptions are omitted where redundant.
- rework mounting pads 23 are provided on a principal plane of a system substrate 15 in contiguous to mounting pads 21 for easy rework.
- reference numeral 23 indicates rework mounting pads furnished on a principal plane of a system substrate 15 in a manner contiguous to the mounting pads 21 .
- the mounting pads 21 and the rework mounting pads 23 are furnished on the principal plane of the system substrate 15 .
- the fifteenth embodiment constituted as described above, offers the major advantage of making rework easy.
- FIG. 19 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixteenth embodiment.
- the sixteenth embodiment is constituted by having three semiconductor devices (whose structure is shown in FIG. 13 ) layered on a principal plane of a system substrate 15 .
- three semiconductor devices whose structure is shown in FIG. 13
- two semiconductor device shown in FIG. 13 are layered on the semiconductor device shown in FIG. 14 .
- the layered three semiconductor devices are sealed by a sealing resin 22 .
- Chip capacitors 6 B are attached to the system substrate 15 in the same manner as with other embodiments described so far.
- the sixteenth embodiment constituted as described above, permits three-dimensional mounting of semiconductor devices onto the system substrate 15 . Therefore, the system as a whole can be formed on a reduced scale.
- This structure also meets high-performance and high-speed signal processing requirements.
- FIG. 20 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventeenth embodiment.
- reference numeral 4 indicates a semiconductor chip; 11 indicates active regions of the semiconductor chip 4 , formed on its principal plane; 10 indicates through-type via contacts extending from the active regions 11 of the semiconductor device 4 to its back; and 12 indicates on-chip metal wiring which, mounted on the active regions 11 , is connected to appropriate locations of the active regions 11 as well as to left-hand ends of the through-type via contacts 10 as seen in FIG. 20 , the on-chip metal wiring 12 constituting connecting electrodes of chip capacitors (not shown).
- Reference numeral 24 indicates chip back-mounted metal wiring which is mounted on the back of the semiconductor chip 4 and connected to right-hand ends of the through-type via contacts 10 as shown in FIG.
- 25 indicates lateral via contacts that extend laterally from the semiconductor chip 4 to the through-type via contacts 10 for connection therewith; and 26 indicates lateral pads furnished laterally on the semiconductor chip 4 and connected to lower ends of the lateral via contacts 25 as seen in FIG. 20 .
- the seventeenth embodiment constituted as described above, allows the on-chip metal wiring 12 on the active regions 11 to be used as connecting electrodes of chip capacitors (not shown).
- the chip back-mounted metal wiring 24 at the back is used as testing electrodes, and the lateral pads 26 are utilized as mounting electrodes.
- the semiconductor device comprises a semiconductor chip which includes: through-type via contacts extending from one surface to another surface of the semiconductor chip; active regions on one surface thereof; on-chip metal wiring which, mounted on the one surface of the semiconductor chip, is connected to one-side ends of the through-type via contacts and constitutes connecting electrodes of chip capacitors; chip back-mounted metal wiring which, mounted on the another surface of the semiconductor chip, is connected to another-side ends of the through-type via contacts; lateral via contacts extending laterally from the semiconductor chip to the through-type via contacts for connection therewith; and lateral pads which are mounted laterally on the semiconductor chip and are connected to the lateral via contacts.
- FIG. 21 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighteenth embodiment.
- the component parts having the same or corresponding functions as their counterparts in FIG. 20 are designated by like reference numerals, and their descriptions are omitted where redundant.
- reference numeral 15 indicates a system substrate
- numeral 27 indicates a plurality of connectors mounted on the system substrate 15 .
- two semiconductor devices shown in FIG. 20 are connected by means of their lateral pads 26 .
- the eighteenth embodiment constituted as described above, allows the semiconductor devices shown in FIG. 20 to be mounted on the system substrate 15 in upright fashion. Therefore, this structure helps form the system of interest on a reduced scale and facilitates rework procedures.
- the semiconductor device further comprises the plurality of connectors formed on the principal plane of the system substrate, the connectors serving to accommodate the lateral pads of the semiconductor device.
- a semiconductor device comprising: a BGA substrate; a semiconductor chip mounted on a principal plane of the BGA substrate with metal wires interposed between the BGA substrate and the semiconductor chip to ensure electrical connection therebetween; and chip capacitors mounted on the semiconductor chip to reduce power source noise.
- This structure can minimize inductance between the chip capacitors and the semiconductor chip, thereby reducing power source noise effectively.
- a semiconductor device comprising: a BGA substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to one principal plane of the BGA substrate; and a first chip capacitor attached to the active regions of the semiconductor chip or to the opposite side of the active regions, the chip capacitor serving to reduce power source noise.
- This structure can minimize inductance between the first chip capacitor and the first semiconductor chip, thereby reducing power source noise effectively. With this structure, a small number of chip capacitors afford sufficient effects of power source noise reduction.
- the worsening of electrical characteristics, which may be brought about by the presence of metal wires, can be eliminated.
- the first chip capacitor is attached to the opposite side of the active regions, higher degrees of freedom in determining the size and mounting locations of chip capacitors can be attained.
- power source and ground characteristics can be improved efficiently at low cost.
- the semiconductor device further comprising: a second semiconductor chip mounted on the opposite side of the active regions of the first semiconductor chip, with metal wires interposed between the BGA substrate and the second semiconductor chip to ensure electrical connection therebetween; and a second chip capacitor attached to the second semiconductor chip as well as a first chip capacitor attached to the active region of the first semiconductor chip, the chip capacitor serving to reduce power source noise.
- the semiconductor device further comprising: a conductive radiator attached to the another principal plane of the BGA substrate, the conductive radiator covering the semiconductor chip; and a shield plane incorporated in the BGA substrate, the shield plane constituting a shield of the semiconductor chip in combination with the conductive radiator; wherein the conductive radiator and the shield plane are connected to ground potential.
- This preferred structure reduces power source noise and ground noise while preventing radio frequency interference from inside the conductive radiator and forestalling adverse effects of such interference from outside the conductive radiator.
- the semiconductor device further comprising: a conductive radiator attached to the another principal plane of the BGA substrate, the conductive radiator covering the semiconductor chip; and a shield plane incorporated in the BGA substrate, the shield plane constituting a shield of the semiconductor chip in combination with the conductive radiator; wherein the conductive radiator and the shield plane are connected to ground potential.
- a conductive radiator attached to the another principal plane of the BGA substrate, the conductive radiator covering the semiconductor chip; and a shield plane incorporated in the BGA substrate, the shield plane constituting a shield of the semiconductor chip in combination with the conductive radiator; wherein the conductive radiator and the shield plane are connected to ground potential.
- the semiconductor device further comprises radiating fins attached to an external surface of the conductive radiator. This preferred structure helps boost heat sinking performance of the conductive radiator.
- a semiconductor device comprising: a semiconductor chip including bumps and active regions, the bumps serving as electrodes and being formed on one principal plane of the semiconductor chip, the active region being formed on the opposite side as the bumps; wherein a chip capacitor can be attached to the active region of the semiconductor chip, the chip capacitor serving to reduce power source noise. Therefore, testing of chip capacitors can be performed easily. Further, a sure connection between the chip capacitors and the semiconductor chip can be attained. Further, since testing is readily carried out, it is also easy to rework any defective products.
- the semiconductor device further comprising: a system substrate; a plurality of mounting pads furnished on one principal plane of the system substrate to ensure electrical connection between the semiconductor chip and the system substrate; a chip capacitor mounted either on the principal plane of the system substrate or on a back, thereof, the chip capacitors serving to reduce power source noise; and a sealing resin member for sealing the semiconductor chip; wherein the bumps of the semiconductor chip are attached to the plurality of mounting pads to provide electrical connection between the bumps and the active regions.
- the semiconductor device further comprising: a plurality of rework mounting pads furnished on the principal plane of the system substrate in contiguous to the mounting pads. This preferred structure facilitates rework procedures.
- the semiconductor device further comprising: a plurality of layered semiconductor chips mounted on the semiconductor chip, each of the layered semiconductor chips including active regions on one surface thereof, bumps on another surface thereof, and a through-type via contact extending from the one surface to the another surface, the active region and the bumps being electrically connected through the through-type via contact.
- This structure permits three-dimensional mounting of semiconductor devices onto the system substrate so that the system as a whole may be built on a reduced scale.
- a semiconductor device comprising: a module substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the module substrate; a second semiconductor chip mounted on the principal plane of the module substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the module substrate by means of metal wires; and chip capacitors attached to the active regions of the first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise.
- This structure has multiple semiconductor chips installed two-dimensionally to make up an appreciably thin-shaped system which however is not quite susceptible to being reduced in size.
- the inventive structure allows as many semiconductor chips as needed to be readily mounted on the module substrate depending on the scale of the system of interest.
- a semiconductor device comprising: a system substrate; a BGA substrate mounted on a principal plane of the system substrate with solder balls interposed therebetween; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the BGA substrate; a second semiconductor chip mounted on the principal plane of the BGA substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the BGA substrate by means of metal wires; and chip capacitors attached to the active regions of the first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise.
- This structure allows the system of interest to be built with ease on a large scale.
- a semiconductor device comprising a semiconductor chip which includes: through-type via contacts extending from one surface to another surface of the semiconductor chip; on-chip metal wiring which, mounted on the one surface of the semiconductor chip, is connected to one-side ends of the through-type via contacts and constitutes connecting electrodes of chip capacitors; chip back-mounted metal wiring which, mounted on the other surface of the semiconductor chip, is connected to another-side ends of the through-type via contacts; lateral via contacts extending laterally from the semiconductor chip to the through-type via contacts for connection therewith; and lateral pads which are mounted laterally on the semiconductor chip and are connected to the lateral via contacts.
- This structure allows the on-chip metal wiring on the active regions to be used as connecting electrodes of the chip capacitors.
- the chip back-mounted metal wiring at the back is used as testing electrodes, and the lateral pads are utilized as mounting electrodes.
- the semiconductor may further comprise connectors on a principal plane of a system substrate, the connectors serving to accommodate the lateral pads of the semiconductor device.
- This preferred structure allows the semiconductor devices to be mounted on the substrate in upright fashion. This helps form the system of interest on a reduced scale and facilitates rework procedures.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Geometry (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
Abstract
A semiconductor device comprises a BGA substrate having one principal plane furnished with a large number of solder balls, the solder balls constituting a ball grid array; a semiconductor chip mounted on another principal plane of the BGA substrate, the semiconductor chip being electrically connected to the BGA substrate by metal wires; and chip capacitors mounted on the semiconductor chip to reduce power source noise.
Description
- This application is a continuation application of Ser. No. 11/064,822, filed Feb. 25, 2005, which is a divisional of Ser. No. 09/846,272, filed May 2, 2001, now U.S. Pat. No. 6,873,035, which claims priority of Japanese Patent application No. 2000-382592, filed Dec. 15, 2000, and the contents of which are herewith incorporated by reference.
- 1. Field of the Invention
- The present invention relates to a semiconductor device and, more particularly, to a semiconductor device which handles signals at high speed, and to a semiconductor device which has capacitors for reducing power source noise.
- 2. Description of the Background Art
-
FIG. 22 is a perspective view for describing a typical structure of a conventional semiconductor device of the above type.FIG. 23 is a cross-sectional view for describing the semiconductor device shown inFIG. 22 . In theseFIGS. 22 and 23 ,reference numeral 1 indicates a system substrate on which to mount components.Reference numeral 2 indicates a BGA (ball grid array) substrate mounted on thesystem substrate 1. As is well known,numerous solder balls 3 are interposed between theBGA substrate 2 and a principal plane of thesystem substrate 1 to keep the two substrates fixed and electrically connected.Reference numeral 4 indicates a semiconductor chip mounted on theBGA substrate 2. As shown inFIG. 23 , bumps 5 are interposed between thesemiconductor chip 4 and a principal plane of theBGA substrate 2 to have the chip and substrate fixed and electrically connected. -
Reference numeral 6 indicates chip capacitors mounted on thesystem substrate 1 andBGA substrate 2. A large number ofchip capacitors 6 are interposed connectively between power supply terminals (not shown) on a semiconductor device that handles signals at high speed; thesechip capacitors 6 are provided to reduce power source noise and thereby to stabilize voltage levels of the power source and ground. - Given the above constitution, one disadvantage of the conventional semiconductor device is that the
chip capacitors 6 are located away from thesemiconductor chip 4. Therefore, as the speed of signals, which are handled by the semiconductor device, is higher, the inductance between thesemiconductor chip 4 and thechip capacitors 6 becomes higher. The growing inductance progressively reduces the immunity of the chip to power source noise. - Another disadvantage is that the flow of high-speed signals generates electromagnetic waves from the
semiconductor chip 4, its package, or its mounting substrate. When reaching nearby electronic equipment, the electromagnetic waves can induce electric currents therein by electromagnetic induction, triggering a malfunction at times. - Further, semiconductor chips are mounted on the system substrate basically in a two-dimensional manner. This leads to another problem: semiconductor chips, as they are designed to become ever higher in performance, incorporate a growing number of I/O terminals which translate into an ever-greater external size. On that extended component scale, differences in thermal expansion coefficient between the
semiconductor chip 4 and thesystem substrate 1 can result in a warped substrate or dislodged terminals. Here, “dislodged terminals” means that the accuracy of location of terminals is changed for worse. - Therefore, above-mentioned flaws make it difficult to mount
semiconductor chips 4 precisely on thesystem substrate 1. The yield rate of thechip 4 thus tends to decline and the reliability of mounting worsens. - The BGA type semiconductor device is at its limit of fabrication when coming to measure about 40 mm per side. When large-sized devices carry numerous terminals, they may adopt a pin grid array structure. The pin grid array structure, however, requires installing a socket between the semiconductor chip and the mounting substrate, which raises fabrication costs.
- Multi-chip modules (MCM) have different external shapes and different numbers of terminals from one system to another. Such diversities make it difficult for the modules to share sockets and substrates between them. This is another factor pushing up the costs involved.
- Another problem with the BGA type is that the module or chip is not receptive to what is known as rework. That is, considerable difficulties are experienced when a semiconductor device or MCM is dismounted from the system substrate for repair or for replacement with a new one having higher performance and the repaired or a replacement device is again mounted onto the system substrate.
- Furthermore, the heat dissipating structure of the BGA type leaves much to be desired in terms of performance and production costs.
- The present invention has been conceived to solve the previously-mentioned problems and a general object of the present invention is to provide a novel and useful semiconductor device.
- A more specific object of the present invention is to reduce power source noise and radio frequency interference, and to implement with high-density, and to rework easily.
- The above object of the present invention is attained by a following semiconductor device.
- According to a first aspect of the present invention, the semiconductor device comprises a BGA substrate; a semiconductor chip mounted on a principal plane of the BGA substrate, the semiconductor chip being electrically connected to the BGA substrate by metal wires; and chip capacitors mounted on the semiconductor chip to reduce power source noise.
- Therefore, inductance between the chip capacitors and the semiconductor chip can be minimized, thereby reducing power source noise effectively. With this structure, a small number of chip capacitors afford sufficient effects of power source noise reduction.
- According to second aspect of the present invention, the semiconductor device comprises: a BGA substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to one principal plane of the BGA substrate; and a first chip capacitor attached to the active regions of the semiconductor chip or to the opposite side of the active regions, the chip capacitor serving to reduce power source noise.
- Therefore, inductance between the first chip capacitor and the first semiconductor chip can be minimized, thereby reducing power source noise effectively. With this structure, a small number of chip capacitors afford sufficient effects of power source noise reduction.
- Furthermore, in the case that the first chip capacitor is attached to the active regions, the worsening of electrical characteristics, which may be brought about by the presence of metal wires, can be eliminated. On the contrary, in the case that the first chip capacitor is attached to the opposite side of the active regions, higher degrees of freedom in determining the size and mounting locations of chip capacitors can be attained. Thus, power source and ground characteristics can be improved efficiently at low cost.
- According to third aspect of the present invention, the semiconductor device comprises a semiconductor chip including bumps and active regions, the bumps serving as electrodes and being formed on one principal plane of the semiconductor chip, the active regions being formed on the opposite side as the bumps; wherein chip capacitors can be attached to the active regions of the semiconductor chip, and the chip capacitors are served to reduce power source noise.
- Therefore, testing of chip capacitors can be performed easily. Further, a sure connection between the chip capacitors and the semiconductor chip can be attained. Furthermore, since testing can be carried out readily, it is also easy to rework any defective products (chip capacitors).
-
FIG. 1 is a cross-sectional view for describing a typical structure of a semiconductor device according to a first embodiment of the present invention; -
FIG. 2 is a cross-sectional view for describing a typical structure of a semiconductor device according to the second embodiment; -
FIG. 3 is a cross-sectional view for describing a typical structure of a semiconductor device according to the third embodiment; -
FIG. 4 is a cross-sectional view for describing a typical structure of the through-type via contacts in the third embodiment; -
FIG. 5 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourth embodiment; -
FIG. 6 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifth embodiment; -
FIG. 7 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixth embodiment; -
FIG. 8 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventh embodiment; -
FIG. 9 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighth embodiment; -
FIG. 10 is a cross-sectional view for describing a typical structure of a semiconductor device according to the ninth embodiment; -
FIG. 11 is a cross-sectional view for describing a typical structure of a semiconductor device according to the tenth embodiment; -
FIG. 12 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eleventh embodiment; -
FIG. 13 is a cross-sectional view for describing a typical structure of a semiconductor device according to the twelfth embodiment; -
FIG. 14 is a cross-sectional view for describing a typical structure of a semiconductor device according to the thirteenth embodiment; -
FIG. 15 is a cross-sectional view for describing a modification of a semiconductor device according to the thirteenth embodiment; -
FIG. 16 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourteenth embodiment; -
FIG. 17 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifteenth embodiment; -
FIG. 18 is a plan view for describing a layout of mounting pads and rework mounting pads in the fifteenth embodiment; -
FIG. 19 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixteenth embodiment; -
FIG. 20 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventeenth embodiment; -
FIG. 21 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighteenth embodiment; -
FIG. 22 is a perspective view for describing a typical structure of a conventional semiconductor device of the above type; and -
FIG. 23 is a cross-sectional view for describing the semiconductor device shown inFIG. 22 . - In the following, principles and embodiments of the present invention will be described with reference to the accompanying drawings. The members that are common to some of the drawings are given the same reference numerals and redundant descriptions therefore may be omitted.
- The first embodiment of the present invention will now be described with reference to
FIG. 1 . -
FIG. 1 is a cross-sectional view for describing a typical structure of a semiconductor device according to a first embodiment of the present invention. InFIG. 1 ,reference numeral 2 indicates a BGA (ball grid array) substrate. TheBGA substrate 2 is secured onto a mounting substrate (not shown), withnumerous solder balls 3 interposed therebetween to ensure inter-substrate electrical connection in a well-known procedure. -
Reference numeral 4 indicates a semiconductor chip mounted on theBGA substrate 2.Metal wires 7 provide electrical connection between thesemiconductor chip 4 and theBGA substrate 2.Reference numeral 6 indicates chip capacitors provided for the same technical reason as in conventionally devised comparable setups. What characterizes the first embodiment is that thechip capacitors 6 are mounted on thesemiconductor chip 4.Reference numeral 8 indicates a mold resin that covers thesemiconductor chip 4,metal wires 7, andchip capacitors 6. - As described above, the semiconductor device according to the first embodiment has the
chip capacitors 6 mounted on thesemiconductor chip 4 to minimize inductance therebetween. This effectively reduces power source noise so as to let high-speed signals be handled more easily than before. Unlike conventional setups wherechip capacitors 6 are positioned away from thesemiconductor chip 4, the number ofchip capacitors 6 required is significantly reduced in the first embodiment. - The second embodiment of the present invention will now be described with reference to
FIG. 2 . -
FIG. 2 is a cross-sectional view for describing a typical structure of a semiconductor device according to the second embodiment. InFIG. 2 , the component parts having the same or corresponding functions as their counterparts inFIG. 1 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the second embodiment different form the setup of
FIG. 1 is thatbumps 5 are used to connect thesemiconductor chip 4 with theBGA substrate 2. InFIG. 2 ,reference numeral 5 indicates bumps that secures thesemiconductor chip 4 onto theBGA substrate 2 while providing electrical connection therebetween. - Whereas the
metal wires 7 in the first embodiment ofFIG. 1 tend to constitute prolonged connections that may entail worsened electrical characteristics, thebumps 5 eliminate that potential problem. - Because the
semiconductor chip 4 furnished with thebumps 5 has active regions (not shown) formed on its lower surface as shown inFIG. 2 , thechip capacitors 6 are attached to the bottom of thesemiconductor chip 4 as indicated.Reference numeral 9 indicates an under-fill resin. - The third embodiment of the present invention will now be described with reference to
FIGS. 3 and 4 . -
FIG. 3 is a cross-sectional view for describing a typical structure of a semiconductor device according to the third embodiment. InFIG. 3 , the component parts having the same or corresponding functions as their counterparts inFIG. 2 are designated by like reference numerals, and their descriptions are omitted where redundant. - What differentiates the third embodiment from the setup of
FIG. 2 is that whilechip capacitors 6 are attached to the back of thesemiconductor chip 4, a plurality of through-type viacontacts 10 are used to ensure electrical connection between thechip capacitors 6 and active regions of thesemiconductor chip 4. InFIG. 3 ,reference numeral 6 indicateschip capacitors 6. Thechip capacitors 6 are mounted on the top, as shown inFIG. 3 , which in fact constitutes the back of thesemiconductor chip 4. -
Reference numeral 10 indicates through-type via contact that extend from the upper to the lower surface of thesemiconductor chip 4 as shown inFIG. 3 . The through-type viacontacts 10 ensure electrical connection between both ends of thechip capacitors 6 on the one hand and active regions (not shown) of thesemiconductor chip 4 on the other hand. -
FIG. 4 is a cross-sectional view for describing a typical structure of the through-type via contacts in the third embodiment. - In
FIG. 4 ,reference numeral 4 indicates a semiconductor chip; 11 indicates active regions of thesemiconductor chip 4; 10 indicates through-type via contacts that extend from theactive regions 11 of thesemiconductor chip 4 to its back; and 12 indicates on-chip metal wiring which, mounted on theactive regions 11, is connected to appropriate locations of theactive regions 11 as well as to lower ends of the through-type viacontacts 10 as seen in FIG. 4.Reference numeral 13 indicates chip back pads which, mounted on the back of thesemiconductor chip 4, are connected to upper ends of the through-type viacontacts 10 as shown inFIG. 4 and constitute electrodes connected to thechip capacitors 6.Reference numerals chip capacitors 6. Theseelectrodes semiconductor chip 4 and are connected individually to the chip backpads 13. - The third embodiment, constituted as described above, has the
chip capacitors 6 mounted on the back of thesemiconductor chip 4 and connected to itsactive regions 11 by means of the through-type viacontacts 10. Therefore, this structure permits higher degrees of freedom in determining the size and mounting locations ofchip capacitors 6, whereby power source and ground characteristics are improved efficiently at low cost. - The fourth embodiment of the present invention will now be described with reference to
FIG. 5 . -
FIG. 5 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourth embodiment. InFIG. 5 , the component parts having the same or corresponding functions as their counterparts inFIGS. 1 and 2 are designated by like reference numerals, and their descriptions are omitted where redundant. - What differentiates the fourth embodiment from the setups of
FIGS. 1 and 2 is that thesemiconductor chip 4B ofFIG. 1 is mounted on thesemiconductor chip 4A ofFIG. 2 in a three-dimensional manner with respect to aBGA substrate 2. - In
FIG. 5 ,reference numeral 4A indicates a first semiconductor chip whose structure is shown inFIG. 2 ; 4B indicates a second semiconductor chip whose structure is shown inFIG. 1 , thesecond semiconductor chip 4B being mounted on the back of thefirst semiconductor chip 4A; 7 indicates metal wires provided for electrical connection between thesecond semiconductor chip 4B and theBGA substrate 2; and 8 indicates a mold resin covering the first andsecond semiconductor chips second semiconductor chips chip capacitors 6 and themetal wires 7 are covered by themold resin 8. - The fourth embodiment, constituted as described above, permits packaging of chips with higher density than before to make the system smaller in size. This feature adds advantageously to the improved power source and ground characteristics brought about by mounting the
chip capacitors 6 onto thesemiconductor chips - Since the connective distances between
multiple semiconductor chips - The fifth embodiment of the present invention will now be described with reference to
FIG. 6 . -
FIG. 6 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifth embodiment. InFIG. 6 ,reference numeral 14 indicates a module substrate that carries, in two-dimensional fashion, afirst semiconductor chip 4A whose structure is shown inFIG. 2 and asecond semiconductor chip 4B whose structure is shown inFIG. 1 . - The fifth embodiment, constituted as described above, has
multiple semiconductor chips present embodiment 5 is that as many semiconductor chips as needed are readily mounted on themodule substrate 14 depending on the scale of the system of interest. Another advantage is thatchip capacitor 6A shown inFIG. 6 may be attached to themodule substrate 14 to stabilize the power source and ground characteristics of the system. - To summarize the above-described semiconductor device, the semiconductor device comprises: a module substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the module substrate; a second semiconductor chip mounted on the principal plane of the module substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the module substrate by means of metal wires; chip capacitors attached to s active regions of first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise.
- In the semiconductor device, the module substrate may further carries chip capacitors for reducing power source noise.
- The sixth embodiment of the present invention will now be described with reference to
FIG. 7 . -
FIG. 7 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixth embodiment. InFIG. 7 , the component parts having the same or - corresponding functions as their counterparts in
FIG. 6 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the sixth embodiment different from the setup of
FIG. 6 is thatsolder balls 3 are mounted on the back of amodule substrate 14 to constitute aBGA substrate 2 while theBGA substrate 2 carrying a first and asecond semiconductor chip system substrate 15. - In
FIG. 7 ,reference numeral 2 indicates a BGA substrate formed by attachingsolder balls 3 to the back of themodule substrate 14 inFIG. 6 ; 15 indicates a system substrate on which theBGA substrate 2 is mounted; and 6B indicates chip capacitors mounted on thesystem substrate 15. - The sixth embodiment, constituted as described above, has a plurality of module substrates mounted in like manner each onto the
system substrate 14 to easily make up a system of a still larger scale. Further, thechip capacitors 6B mounted on thesystem substrate 15 stabilize the power source and ground characteristics of the system. - To summarize the above-described semiconductor device, the semiconductor device comprises: a system substrate; a ball grid array substrate called the BGA substrate mounted on a principal plane of the system substrate with solder balls interposed therebetween; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the BGA substrate; a second semiconductor chip mounted on the principal plane of the BGA substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the BGA substrate by means of metal wires; and chip capacitors attached to the active regions of the first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise.
- In the semiconductor device, at least one of the system substrate and the BGA substrate carries chip capacitors for reducing power source noise.
- The seventh embodiment of the present invention will now be described with reference to
FIG. 8 . -
FIG. 8 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventh embodiment. InFIG. 8 , the component parts having the same or corresponding functions as their counterparts inFIG. 1 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the seventh embodiment different from the setup of
FIG. 1 is that thesemiconductor chip 4 is covered with aconductive radiator 16 while theBGA substrate 2 incorporates ashield plane 17 for shielding thesemiconductor chip 4 in combination with theconductive radiator 16. - In
FIG. 8 ,reference numeral 16 indicates a conductive radiator mounted on aBGA substrate 2 in such a manner that theconductive radiator 16 provides a covering over asemiconductor chip 4 enveloped in amold resin 8; and numeral 17 indicates a shield plane which is incorporated in theBGA substrate 2 and which constitutes a shield of thesemiconductor chip 4 in combination with theconductive radiator 16. Theconductive radiator 16 andshield plane 17 are both connected to ground potential. - The seventh embodiment, constituted as described above, reduces power source noise and ground noise while preventing radio frequency interference from inside the
conductive radiator 16 and forestalling adverse effects of such interference from outside theconductive radiator 16. - In addition, heat transfer afforded by the
conductive radiator 16 andshield plane 17 enhances the characteristics of heat radiation upward as well as downward. - The eighth embodiment of the present invention will now be described with reference to
FIG. 9 . -
FIG. 9 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighth embodiment. InFIG. 9 , the component parts having the same or corresponding functions as their counterparts inFIG. 2 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the eighth embodiment different from the setup of
FIG. 2 is that thesemiconductor chip 4 is covered with aconductive radiator 16 while theBGA substrate 2 incorporates ashield plane 17 for shielding thesemiconductor chip 4 in combination with theconductive radiator 16. - In
FIG. 9 ,reference numeral 16 indicates a conductive radiator mounted on aBGA substrate 2 in such a manner that theconductive radiator 16 covers over thesemiconductor chip 4; and numeral 17 indicates a shield plane which is incorporated in theBGA substrate 2 and which constitutes a shield of thesemiconductor chip 4 in combination with theconductive radiator 16. - The
conductive radiator 16 andshield plane 17 are both connected to ground potential.Reference numeral 18 indicates for a heat transfer member such as a heat sinking (radiating) resin installed interposingly between thesemiconductor chip 4 and theconductive radiator 16. - The eighth embodiment, constituted as described above, reduces power source noise and ground noise while preventing radio frequency interference from inside the
conductive radiator 16 and forestalling adverse effects of such interference from outside theconductive radiator 16. - Heat transfer afforded by the
conductive radiator 16 andshield plane 17 enhances the characteristics of heat radiation upward as well as downward. In addition, theheat transfer member 18 transfers heat of thesemiconductor chip 4 efficiently to theconductive radiator 16 so that heat sinking performance is enhanced further. - The ninth embodiment of the present invention will now be described with reference to
FIG. 10 . -
FIG. 10 is a cross-sectional view for describing a typical structure of a semiconductor device according to the ninth embodiment. InFIG. 10 , the component parts having the same or corresponding functions as their counterparts inFIG. 8 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the ninth embodiment different from the setup of
FIG. 8 is that a radiatingfin 19 is attached to the outside face of theconductive radiator 16. - In
FIG. 10 ,reference numeral 19 indicates the radiating fin attached to the external surface of theconductive radiator 16. - The above-described structure promotes the heat radiating effect of the
conductive radiator 16. Obviously, this type of radiatingfin 19 may also be applied to theconductive radiator 16 shown inFIG. 9 . - The tenth embodiment of the present invention will now be described with reference to
FIG. 11 . -
FIG. 11 is a cross-sectional view for describing a typical structure of a semiconductor device according to the tenth embodiment. InFIG. 11 , the component parts having the same or corresponding functions as their counterparts inFIG. 6 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the tenth embodiment different from the setup of
FIG. 6 is this: as with the embodiments inFIGS. 8 and 9 , aconductive radiator 16 covering a first and asecond semiconductor chip module substrate 14, and themodule substrate 14 is arranged to incorporate ashield plane 17. Combined with theconductive radiator 16, theshield plane 17 constitutes a shield of the first andsecond semiconductor chips conductive radiator 16 andshield plane 17 are connected to ground potential. -
Reference numeral 18 indicates a heat transfer member such as a heat sinking (radiating) resin installed interposingly between thefirst semiconductor chip 4A and theconductive radiator 16. - The tenth embodiment, constituted as described above, can reduce power source noise and ground noise while preventing radio frequency interference from inside the
conductive radiator 16 and forestalling adverse effects of such interference from outside theconductive radiator 16. - Heat transfer afforded by the
conductive radiator 16 andshield plane 17 enhances the characteristics of heat radiation upward as well as downward. In addition, theheat transfer member 18 transfers heat of thefirst semiconductor chip 4A efficiently to theconductive radiator 16 so that heat sinking performance is enhanced further. - To summarize the above-described semiconductor device, the semiconductor device according to the fifth embodiment, further comprises: a conductive radiator attached to the principal plane of the module substrate (or the BGA substrate), the conductive radiator covering the first and second semiconductor chips; and a shield plane incorporated in the module substrate, shield plane serving to provide a shield of the first and second semiconductor chips in combination with the conductive radiator; wherein the conductive radiator and the shield plane are connected to ground potential.
- The semiconductor device further comprises a heat transfer member interposed between the opposite side of the active regions of the first semiconductor chip and the conductive radiator.
- The eleventh embodiment of the present invention will now be described with reference to
FIG. 12 . -
FIG. 12 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eleventh embodiment. - In
FIG. 12 , the component parts having the same or corresponding functions as their counterparts inFIG. 7 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the eleventh embodiment different from the setup of
FIG. 7 is this: as with the embodiments inFIGS. 8 and 9 , aconductive radiator 16 covering a first and asecond semiconductor chip BGA substrate 2, and theBGA substrate 2 is arranged to incorporate ashield plane 17A which, combined with theconductive radiator 16, constitutes a shield of the first andsecond semiconductor chips system substrate 15 is also arranged to incorporate ashield plane 17B. Theshield plane 17B is similar to theshield plane 17A. The shield planes 17A and 17B are connected to ground potential as well as theconductive radiator 16. -
Reference numeral 18 indicates a heat transfer member such as a heat sinking (radiating) resin installed interposingly between thefirst semiconductor chip 4A and theconductive radiator 16. - The eleventh embodiment, constituted as described above, can reduce power source noise and ground noise while preventing radio frequency interference from inside the
conductive radiator 16 and forestalling adverse effects of such interference from outside theconductive radiator 16. - Heat transfer afforded by the
conductive radiator 16 andshield planes heat transfer member 18 transfers heat of thefirst semiconductor chip 4A efficiently to theconductive radiator 16 so that heat sinking performance is enhanced further. - The twelfth embodiment of the present invention will now be described with reference to
FIG. 13 . -
FIG. 13 is a cross-sectional view for describing a typical structure of a semiconductor device according to the twelfth embodiment. - In
FIG. 13 ,reference numeral 4 indicates a semiconductor chip; 5 indicates bumps; 11 indicates active regions of thesemiconductor chip 4, and theactive regions 11 are formed on the opposite side of the bump mounting surface across thesemiconductor chip 4; 10 indicates through-type via contacts extending from the active regions to the bump mounting surface in thesemiconductor chip 4; and 12 indicates on-chip metal wiring which, mounted on theactive regions 11, is connected to appropriate locations of theactive regions 11 as well as to upper ends of the through-type viacontacts 10 as seen inFIG. 13 , the on-chip metal wiring 12 further constituting connecting electrodes of chip capacitors (not shown). -
Reference numeral 20 indicates chip back-mounted metal wiring which, mounted on the bump mounting surface, is connected to thebumps 5 as well as to lower ends of the through-type viacontacts 10 as shown inFIG. 13 . - The twelfth embodiment, constituted as described above, has the
active regions 11 of thesemiconductor chip 4 facing upward when thesemiconductor chip 4 is mounted on the BGA substrate or the like. This structure allows electrodes such as the on-chip metal wiring 12 to be used for test and chip capacitor connection purposes. Because testing is readily carried out, it is also easy to rework any defective products. - The thirteenth embodiment of the present invention will now be described with reference to
FIGS. 14 and 15 . -
FIG. 14 is a cross-sectional view for describing a typical structure of a semiconductor device according to the thirteenth embodiment.FIG. 15 is a cross-sectional view for describing a modification of a semiconductor device according to the thirteenth embodiment. - In
FIGS. 14 and 15 ,reference numeral 2 indicates a BGA substrate furnished withsolder balls 3. The semiconductor device shown inFIG. 13 is mounted on a principal plane of theBGA substrate 2.Reference numeral 8 indicates amold resin 8 covering the semiconductor device and constituting a package. - In
FIG. 14 , the component parts having the same or corresponding functions as their counterparts inFIG. 13 are designated by like reference numerals, and their descriptions are omitted where redundant. - The thirteenth embodiment, constituted as described above, has no metal wires and is thus capable of handling signals at higher speed. The benefit of having the
active regions 11 facing upward is the same as with the twelfth embodiment. Further, ifchip capacitors 6 are connected to the on-chip metal wiring 12 on theactive regions 11 as shown inFIG. 15 , it is possible to improve the power source and ground characteristics as described above in connection with other embodiments. - The fourteenth embodiment of the present invention will now be described with reference to
FIG. 16 . -
FIG. 16 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fourteenth embodiment. - In
FIG. 16 ,reference numeral 15 indicates a system substrate that is furnished with numerous mountingpads 21. The semiconductor device, according to the present embodiment, which is sealed, with the semiconductor device ofFIG. 13 mounted on thepads 21, by a sealingresin 22. Thus, reliability of packaging can be enhanced. - Because the
active regions 11 face upward, it is easy to carry out testing and rework on the inventive semiconductor device.Chip capacitors 6B may be mounted on thesystem substrate 15. Thus, it is possible to stabilize the power source and ground characteristics of the system constituted by the device. - The fifteenth embodiment of the present invention will now be described with reference to
FIGS. 17 and 18 . -
FIG. 17 is a cross-sectional view for describing a typical structure of a semiconductor device according to the fifteenth embodiment.FIG. 18 is a plan view for describing a layout of mounting pads and rework mounting pads in the fifteenth embodiment. - In
FIG. 17 , the component parts having the same or corresponding functions as their counterparts inFIG. 16 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the fifteenth embodiment different from the setup of
FIG. 16 is thatrework mounting pads 23 are provided on a principal plane of asystem substrate 15 in contiguous to mountingpads 21 for easy rework. - In
FIG. 17 ,reference numeral 23 indicates rework mounting pads furnished on a principal plane of asystem substrate 15 in a manner contiguous to the mountingpads 21. Namely, as shown inFIG. 18 , the mountingpads 21 and therework mounting pads 23 are furnished on the principal plane of thesystem substrate 15. - The fifteenth embodiment, constituted as described above, offers the major advantage of making rework easy.
- The sixteenth embodiment of the present invention will now be described with reference to
FIG. 19 . -
FIG. 19 is a cross-sectional view for describing a typical structure of a semiconductor device according to the sixteenth embodiment. - The sixteenth embodiment is constituted by having three semiconductor devices (whose structure is shown in
FIG. 13 ) layered on a principal plane of asystem substrate 15. In other words, two semiconductor device shown inFIG. 13 are layered on the semiconductor device shown inFIG. 14 . The layered three semiconductor devices are sealed by a sealingresin 22.Chip capacitors 6B are attached to thesystem substrate 15 in the same manner as with other embodiments described so far. - The sixteenth embodiment, constituted as described above, permits three-dimensional mounting of semiconductor devices onto the
system substrate 15. Therefore, the system as a whole can be formed on a reduced scale. - This structure also meets high-performance and high-speed signal processing requirements.
- The seventeenth embodiment of the present invention will now be described with reference to
FIG. 20 . -
FIG. 20 is a cross-sectional view for describing a typical structure of a semiconductor device according to the seventeenth embodiment. - In
FIG. 20 ,reference numeral 4 indicates a semiconductor chip; 11 indicates active regions of thesemiconductor chip 4, formed on its principal plane; 10 indicates through-type via contacts extending from theactive regions 11 of thesemiconductor device 4 to its back; and 12 indicates on-chip metal wiring which, mounted on theactive regions 11, is connected to appropriate locations of theactive regions 11 as well as to left-hand ends of the through-type viacontacts 10 as seen inFIG. 20 , the on-chip metal wiring 12 constituting connecting electrodes of chip capacitors (not shown).Reference numeral 24 indicates chip back-mounted metal wiring which is mounted on the back of thesemiconductor chip 4 and connected to right-hand ends of the through-type viacontacts 10 as shown inFIG. 20 ; 25 indicates lateral via contacts that extend laterally from thesemiconductor chip 4 to the through-type viacontacts 10 for connection therewith; and 26 indicates lateral pads furnished laterally on thesemiconductor chip 4 and connected to lower ends of the lateral viacontacts 25 as seen inFIG. 20 . - The seventeenth embodiment, constituted as described above, allows the on-
chip metal wiring 12 on theactive regions 11 to be used as connecting electrodes of chip capacitors (not shown). The chip back-mountedmetal wiring 24 at the back is used as testing electrodes, and thelateral pads 26 are utilized as mounting electrodes. - To summarize the above-described semiconductor device, the semiconductor device comprises a semiconductor chip which includes: through-type via contacts extending from one surface to another surface of the semiconductor chip; active regions on one surface thereof; on-chip metal wiring which, mounted on the one surface of the semiconductor chip, is connected to one-side ends of the through-type via contacts and constitutes connecting electrodes of chip capacitors; chip back-mounted metal wiring which, mounted on the another surface of the semiconductor chip, is connected to another-side ends of the through-type via contacts; lateral via contacts extending laterally from the semiconductor chip to the through-type via contacts for connection therewith; and lateral pads which are mounted laterally on the semiconductor chip and are connected to the lateral via contacts.
- The eighteenth embodiment of the present invention will now be described with reference to
FIG. 21 . -
FIG. 21 is a cross-sectional view for describing a typical structure of a semiconductor device according to the eighteenth embodiment. InFIG. 21 , the component parts having the same or corresponding functions as their counterparts inFIG. 20 are designated by like reference numerals, and their descriptions are omitted where redundant. - What makes the eighteenth embodiment different from the setup of
FIG. 20 is that semiconductor devices with their structure shown inFIG. 20 are mounted on asystem substrate 15. - In
FIG. 21 ,reference numeral 15 indicates a system substrate, and numeral 27 indicates a plurality of connectors mounted on thesystem substrate 15. As shown inFIG. 21 , two semiconductor devices shown inFIG. 20 are connected by means of theirlateral pads 26. - The eighteenth embodiment, constituted as described above, allows the semiconductor devices shown in
FIG. 20 to be mounted on thesystem substrate 15 in upright fashion. Therefore, this structure helps form the system of interest on a reduced scale and facilitates rework procedures. - To summarize the above-described semiconductor device, the semiconductor device according to the eighteenth embodiment, further comprises the plurality of connectors formed on the principal plane of the system substrate, the connectors serving to accommodate the lateral pads of the semiconductor device.
- This invention, when practiced illustratively in the manner described above, provides the following major effects:
- According to first aspect of the invention, there is provided a semiconductor device comprising: a BGA substrate; a semiconductor chip mounted on a principal plane of the BGA substrate with metal wires interposed between the BGA substrate and the semiconductor chip to ensure electrical connection therebetween; and chip capacitors mounted on the semiconductor chip to reduce power source noise.
- This structure can minimize inductance between the chip capacitors and the semiconductor chip, thereby reducing power source noise effectively.
- With this structure, a small number of chip capacitors afford sufficient effects of power source noise reduction.
- According to second aspect of the invention, there is provided a semiconductor device comprising: a BGA substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to one principal plane of the BGA substrate; and a first chip capacitor attached to the active regions of the semiconductor chip or to the opposite side of the active regions, the chip capacitor serving to reduce power source noise.
- This structure can minimize inductance between the first chip capacitor and the first semiconductor chip, thereby reducing power source noise effectively. With this structure, a small number of chip capacitors afford sufficient effects of power source noise reduction.
- Further, in the case that the first chip capacitor is attached to the active regions, the worsening of electrical characteristics, which may be brought about by the presence of metal wires, can be eliminated. In the case that the first chip capacitor is attached to the opposite side of the active regions, higher degrees of freedom in determining the size and mounting locations of chip capacitors can be attained. Thus, power source and ground characteristics can be improved efficiently at low cost.
- In a preferred variation of the first aspect of the present invention, the semiconductor device further comprising: a second semiconductor chip mounted on the opposite side of the active regions of the first semiconductor chip, with metal wires interposed between the BGA substrate and the second semiconductor chip to ensure electrical connection therebetween; and a second chip capacitor attached to the second semiconductor chip as well as a first chip capacitor attached to the active region of the first semiconductor chip, the chip capacitor serving to reduce power source noise. This structure permits packaging of chips with higher density than before to make the system of interest smaller in size.
- In another preferred variation of the first aspect of the present invention, the semiconductor device further comprising: a conductive radiator attached to the another principal plane of the BGA substrate, the conductive radiator covering the semiconductor chip; and a shield plane incorporated in the BGA substrate, the shield plane constituting a shield of the semiconductor chip in combination with the conductive radiator; wherein the conductive radiator and the shield plane are connected to ground potential. This preferred structure reduces power source noise and ground noise while preventing radio frequency interference from inside the conductive radiator and forestalling adverse effects of such interference from outside the conductive radiator.
- In a preferred variation of the second aspect of the present invention, the semiconductor device further comprising: a conductive radiator attached to the another principal plane of the BGA substrate, the conductive radiator covering the semiconductor chip; and a shield plane incorporated in the BGA substrate, the shield plane constituting a shield of the semiconductor chip in combination with the conductive radiator; wherein the conductive radiator and the shield plane are connected to ground potential. This preferred structure reduces power source noise and ground noise while preventing radio frequency interference from inside the conductive radiator and forestalling adverse effects of such interference from outside the conductive radiator. In addition, the semiconductor device further comprises radiating fins attached to an external surface of the conductive radiator. This preferred structure helps boost heat sinking performance of the conductive radiator.
- According to third aspect of the present invention, there is provided a semiconductor device comprising: a semiconductor chip including bumps and active regions, the bumps serving as electrodes and being formed on one principal plane of the semiconductor chip, the active region being formed on the opposite side as the bumps; wherein a chip capacitor can be attached to the active region of the semiconductor chip, the chip capacitor serving to reduce power source noise. Therefore, testing of chip capacitors can be performed easily. Further, a sure connection between the chip capacitors and the semiconductor chip can be attained. Further, since testing is readily carried out, it is also easy to rework any defective products.
- In a preferred variation of the third aspect of the present invention, the semiconductor device further comprising: a system substrate; a plurality of mounting pads furnished on one principal plane of the system substrate to ensure electrical connection between the semiconductor chip and the system substrate; a chip capacitor mounted either on the principal plane of the system substrate or on a back, thereof, the chip capacitors serving to reduce power source noise; and a sealing resin member for sealing the semiconductor chip; wherein the bumps of the semiconductor chip are attached to the plurality of mounting pads to provide electrical connection between the bumps and the active regions. This structure makes it easy to carry out testing and rework of the chip capacitors. With the chip capacitors mounted on the system substrate, it is possible to stabilize the power source and ground characteristics of the system of interest constituted by the device.
- In another preferred variation of the third aspect of the present invention, the semiconductor device further comprising: a plurality of rework mounting pads furnished on the principal plane of the system substrate in contiguous to the mounting pads. This preferred structure facilitates rework procedures.
- In further preferred variation of the third aspect of the present invention, the semiconductor device further comprising: a plurality of layered semiconductor chips mounted on the semiconductor chip, each of the layered semiconductor chips including active regions on one surface thereof, bumps on another surface thereof, and a through-type via contact extending from the one surface to the another surface, the active region and the bumps being electrically connected through the through-type via contact. This structure permits three-dimensional mounting of semiconductor devices onto the system substrate so that the system as a whole may be built on a reduced scale.
- In a preferred variation of the present invention, a semiconductor device comprising: a module substrate; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the module substrate; a second semiconductor chip mounted on the principal plane of the module substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the module substrate by means of metal wires; and chip capacitors attached to the active regions of the first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise. This structure has multiple semiconductor chips installed two-dimensionally to make up an appreciably thin-shaped system which however is not quite susceptible to being reduced in size. The inventive structure allows as many semiconductor chips as needed to be readily mounted on the module substrate depending on the scale of the system of interest.
- In a preferred variation of the present invention, a semiconductor device comprising: a system substrate; a BGA substrate mounted on a principal plane of the system substrate with solder balls interposed therebetween; a first semiconductor chip including bumps and active regions formed on the same side as the bumps, the bumps serving as electrodes attached to a principal plane of the BGA substrate; a second semiconductor chip mounted on the principal plane of the BGA substrate away from the first semiconductor chip, the second semiconductor chip being electrically connected to the BGA substrate by means of metal wires; and chip capacitors attached to the active regions of the first semiconductor chip as well as to the second semiconductor chip, the chip capacitors serving to reduce power source noise. This structure allows the system of interest to be built with ease on a large scale.
- In a preferred variation of the present invention, a semiconductor device comprising a semiconductor chip which includes: through-type via contacts extending from one surface to another surface of the semiconductor chip; on-chip metal wiring which, mounted on the one surface of the semiconductor chip, is connected to one-side ends of the through-type via contacts and constitutes connecting electrodes of chip capacitors; chip back-mounted metal wiring which, mounted on the other surface of the semiconductor chip, is connected to another-side ends of the through-type via contacts; lateral via contacts extending laterally from the semiconductor chip to the through-type via contacts for connection therewith; and lateral pads which are mounted laterally on the semiconductor chip and are connected to the lateral via contacts. This structure allows the on-chip metal wiring on the active regions to be used as connecting electrodes of the chip capacitors. The chip back-mounted metal wiring at the back is used as testing electrodes, and the lateral pads are utilized as mounting electrodes.
- In a preferred variation of the present invention, the semiconductor may further comprise connectors on a principal plane of a system substrate, the connectors serving to accommodate the lateral pads of the semiconductor device. This preferred structure allows the semiconductor devices to be mounted on the substrate in upright fashion. This helps form the system of interest on a reduced scale and facilitates rework procedures.
- Further, the present invention is not limited to these embodiments, but variations and modifications may be made without departing from the scope of the present invention.
- The entire disclosure of Japanese Patent Application No. 2000-382592 filed on Dec. 15, 2000 containing specification, claims, drawings and summary are incorporated herein by reference in its entirety.
Claims (2)
1.-15. (canceled)
16. A semiconductor device comprising:
a substrate having one principal plane furnished with solder balls;
a semiconductor chip mounted on another principal plane of the substrate, the semiconductor chip being electrically connected to the substrate by metal wires;
chip capacitors mounted on the semiconductor chip; and
a shield plane connected to ground potential and incorporated in the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/501,849 US20070023895A1 (en) | 2000-12-15 | 2006-08-10 | Semiconductor device having capacitors for reducing power source noise |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000382592A JP4422323B2 (en) | 2000-12-15 | 2000-12-15 | Semiconductor device |
JP2000-382592 | 2000-12-15 | ||
US09/846,272 US6873035B2 (en) | 2000-12-15 | 2001-05-02 | Semiconductor device having capacitors for reducing power source noise |
US11/064,822 US7233065B2 (en) | 2000-12-15 | 2005-02-25 | Semiconductor device having capacitors for reducing power source noise |
US11/501,849 US20070023895A1 (en) | 2000-12-15 | 2006-08-10 | Semiconductor device having capacitors for reducing power source noise |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/064,822 Continuation US7233065B2 (en) | 2000-12-15 | 2005-02-25 | Semiconductor device having capacitors for reducing power source noise |
Publications (1)
Publication Number | Publication Date |
---|---|
US20070023895A1 true US20070023895A1 (en) | 2007-02-01 |
Family
ID=18850391
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/846,272 Expired - Lifetime US6873035B2 (en) | 2000-12-15 | 2001-05-02 | Semiconductor device having capacitors for reducing power source noise |
US11/064,822 Expired - Fee Related US7233065B2 (en) | 2000-12-15 | 2005-02-25 | Semiconductor device having capacitors for reducing power source noise |
US11/501,849 Abandoned US20070023895A1 (en) | 2000-12-15 | 2006-08-10 | Semiconductor device having capacitors for reducing power source noise |
US11/797,544 Expired - Fee Related US7319268B2 (en) | 2000-12-15 | 2007-05-04 | Semiconductor device having capacitors for reducing power source noise |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/846,272 Expired - Lifetime US6873035B2 (en) | 2000-12-15 | 2001-05-02 | Semiconductor device having capacitors for reducing power source noise |
US11/064,822 Expired - Fee Related US7233065B2 (en) | 2000-12-15 | 2005-02-25 | Semiconductor device having capacitors for reducing power source noise |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/797,544 Expired - Fee Related US7319268B2 (en) | 2000-12-15 | 2007-05-04 | Semiconductor device having capacitors for reducing power source noise |
Country Status (2)
Country | Link |
---|---|
US (4) | US6873035B2 (en) |
JP (1) | JP4422323B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060278983A1 (en) * | 2005-06-08 | 2006-12-14 | Seiko Epson Corporation | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US20070008705A1 (en) * | 2005-07-06 | 2007-01-11 | Seiko Epson Corporation | Electronic substrate, manufacturing method for electronic substrate, and electronic device |
US20090294959A1 (en) * | 2008-05-28 | 2009-12-03 | Siliconware Precision Industries Co., Ltd. | Semiconductor package device, semiconductor package structure, and fabrication methods thereof |
US20090302437A1 (en) * | 2008-06-10 | 2009-12-10 | Stats Chippac, Ltd. | Semiconductor Device and Method of Connecting a Shielding Layer to Ground Through Conductive Vias |
Families Citing this family (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6949822B2 (en) * | 2000-03-17 | 2005-09-27 | International Rectifier Corporation | Semiconductor multichip module package with improved thermal performance; reduced size and improved moisture resistance |
US20020127771A1 (en) * | 2001-03-12 | 2002-09-12 | Salman Akram | Multiple die package |
SG95637A1 (en) * | 2001-03-15 | 2003-04-23 | Micron Technology Inc | Semiconductor/printed circuit board assembly, and computer system |
US6441483B1 (en) * | 2001-03-30 | 2002-08-27 | Micron Technology, Inc. | Die stacking scheme |
US7215022B2 (en) * | 2001-06-21 | 2007-05-08 | Ati Technologies Inc. | Multi-die module |
US6700794B2 (en) * | 2001-07-26 | 2004-03-02 | Harris Corporation | Decoupling capacitor closely coupled with integrated circuit |
TW525291B (en) * | 2001-12-19 | 2003-03-21 | Silicon Integrated Sys Corp | Package with embedded capacitors in chip |
US7046522B2 (en) * | 2002-03-21 | 2006-05-16 | Raymond Jit-Hung Sung | Method for scalable architectures in stackable three-dimensional integrated circuits and electronics |
US7109574B2 (en) * | 2002-07-26 | 2006-09-19 | Stmicroelectronics, Inc. | Integrated circuit package with exposed die surfaces and auxiliary attachment |
KR100618812B1 (en) * | 2002-11-18 | 2006-09-05 | 삼성전자주식회사 | Multi chip package having increased reliability |
JP2004200041A (en) * | 2002-12-19 | 2004-07-15 | Tohoku Pioneer Corp | Organic el display device |
DE10300958A1 (en) * | 2003-01-13 | 2004-07-22 | Epcos Ag | Encapsulated module |
JP3819851B2 (en) * | 2003-01-29 | 2006-09-13 | 松下電器産業株式会社 | Semiconductor device and manufacturing method thereof |
WO2004070790A2 (en) * | 2003-02-03 | 2004-08-19 | United Test And Assembly Center Ltd. | Molded high density electronic packaging structure for high performance applications |
US20040245651A1 (en) * | 2003-06-09 | 2004-12-09 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method for fabricating the same |
TWI234209B (en) * | 2003-10-31 | 2005-06-11 | Advanced Semiconductor Eng | BGA semiconductor device with protection of component on ball-planting surface |
JP3763312B2 (en) * | 2004-04-08 | 2006-04-05 | ダイキン工業株式会社 | Semiconductor circuit board and semiconductor circuit |
US7217597B2 (en) | 2004-06-22 | 2007-05-15 | Micron Technology, Inc. | Die stacking scheme |
CN101057326A (en) * | 2004-11-17 | 2007-10-17 | 富士通株式会社 | Semiconductor device |
JP2006278906A (en) * | 2005-03-30 | 2006-10-12 | Oki Electric Ind Co Ltd | Semiconductor device and its manufacturing method |
JP2006310783A (en) * | 2005-03-30 | 2006-11-09 | Sanyo Electric Co Ltd | Circuit device |
ES2388290T3 (en) | 2005-06-13 | 2012-10-11 | Daikin Industries, Ltd. | Semiconductor circuit board and a semiconductor circuit |
JP4904768B2 (en) * | 2005-10-20 | 2012-03-28 | 日本電気株式会社 | Semiconductor package |
US7622325B2 (en) * | 2005-10-29 | 2009-11-24 | Stats Chippac Ltd. | Integrated circuit package system including high-density small footprint system-in-package |
US7323968B2 (en) * | 2005-12-09 | 2008-01-29 | Sony Corporation | Cross-phase adapter for powerline communications (PLC) network |
DE102006022748B4 (en) * | 2006-05-12 | 2019-01-17 | Infineon Technologies Ag | Semiconductor device with surface mount devices and method of making the same |
KR100691632B1 (en) * | 2006-05-16 | 2007-03-12 | 삼성전기주식회사 | Semiconductor chip, method of manufacturing the semiconductor chip and semiconductor chip package |
KR100818088B1 (en) * | 2006-06-29 | 2008-03-31 | 주식회사 하이닉스반도체 | Semiconductor package and method of fabricating the same |
US7656024B2 (en) * | 2006-06-30 | 2010-02-02 | Fairchild Semiconductor Corporation | Chip module for complete power train |
JP4969934B2 (en) * | 2006-07-19 | 2012-07-04 | 株式会社東芝 | Semiconductor device |
US7378733B1 (en) | 2006-08-29 | 2008-05-27 | Xilinx, Inc. | Composite flip-chip package with encased components and method of fabricating same |
US7622811B2 (en) * | 2006-09-14 | 2009-11-24 | Stats Chippac, Inc. | Semiconductor assembly with component attached on die back side |
CN101653056B (en) * | 2007-02-15 | 2011-08-31 | 日本电气株式会社 | Elecric device-installed apparatus and its noise reduction method |
JP4734282B2 (en) | 2007-04-23 | 2011-07-27 | 株式会社日立製作所 | Semiconductor chip and semiconductor device |
US20090057867A1 (en) * | 2007-08-30 | 2009-03-05 | Vincent Hool | Integrated Circuit Package with Passive Component |
US7679177B2 (en) * | 2007-09-21 | 2010-03-16 | Stats Chippac Ltd. | Integrated circuit packaging system with passive components |
US8350382B2 (en) * | 2007-09-21 | 2013-01-08 | Infineon Technologies Ag | Semiconductor device including electronic component coupled to a backside of a chip |
JP4811437B2 (en) * | 2008-08-11 | 2011-11-09 | 日本テキサス・インスツルメンツ株式会社 | Mounting electronic components on IC chips |
US8304854B2 (en) * | 2008-11-13 | 2012-11-06 | Samsung Electro-Mechanics Co., Ltd. | Semiconductor integrated circuit chip, multilayer chip capacitor and semiconductor integrated circuit chip package |
US20100123215A1 (en) * | 2008-11-20 | 2010-05-20 | Qualcomm Incorporated | Capacitor Die Design for Small Form Factors |
US7989942B2 (en) * | 2009-01-20 | 2011-08-02 | Altera Corporation | IC package with capacitors disposed on an interposal layer |
EP2483890A4 (en) | 2009-10-01 | 2013-04-03 | Rambus Inc | Methods and systems for reducing supply and termination noise |
FR2967814A1 (en) * | 2010-11-23 | 2012-05-25 | St Microelectronics Grenoble 2 | Semiconductor device, has electrical connection of intermediate elements provided between support plate and chip and connected to electrical interconnection unit of plate and rear electrical interconnection network of chip |
US8848390B2 (en) * | 2011-02-16 | 2014-09-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Capacitive proximity communication using tuned-inductor |
JP5516511B2 (en) * | 2011-06-09 | 2014-06-11 | セイコーエプソン株式会社 | Electronic components, circuit boards and electronic equipment |
JP5569473B2 (en) * | 2011-06-09 | 2014-08-13 | セイコーエプソン株式会社 | Electronic components, circuit boards and electronic equipment |
EP2741426B1 (en) | 2011-08-01 | 2017-12-20 | Murata Manufacturing Co., Ltd. | High-frequency module |
US9275976B2 (en) * | 2012-02-24 | 2016-03-01 | Broadcom Corporation | System-in-package with integrated socket |
JP6342994B2 (en) * | 2014-04-24 | 2018-06-13 | ルネサスエレクトロニクス株式会社 | Semiconductor device and manufacturing method thereof |
US9660017B2 (en) * | 2015-01-20 | 2017-05-23 | Mediatek Inc. | Microelectronic package with surface mounted passive element |
US10681326B2 (en) | 2016-05-19 | 2020-06-09 | AVAGO TECHNOLOGlES INTERNATIONAL SALES PTE. LIMITED | 360 degree video system with coordinate compression |
US10848668B2 (en) | 2016-05-19 | 2020-11-24 | Avago Technologies International Sales Pte. Limited | 360 degree video recording and playback with object tracking |
US11019257B2 (en) | 2016-05-19 | 2021-05-25 | Avago Technologies International Sales Pte. Limited | 360 degree video capture and playback |
US20180019194A1 (en) * | 2016-07-14 | 2018-01-18 | Semtech Corporation | Low Parasitic Surface Mount Circuit Over Wirebond IC |
US11404365B2 (en) * | 2019-05-07 | 2022-08-02 | International Business Machines Corporation | Direct attachment of capacitors to flip chip dies |
JP7377181B2 (en) * | 2020-09-11 | 2023-11-09 | 株式会社東芝 | semiconductor equipment |
US20230130354A1 (en) * | 2021-10-27 | 2023-04-27 | Advanced Micro Devices, Inc. | Three-dimensional semiconductor package having a stacked passive device |
Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5138436A (en) * | 1990-11-16 | 1992-08-11 | Ball Corporation | Interconnect package having means for waveguide transmission of rf signals |
US5786979A (en) * | 1995-12-18 | 1998-07-28 | Douglass; Barry G. | High density inter-chip connections by electromagnetic coupling |
US6150724A (en) * | 1998-03-02 | 2000-11-21 | Motorola, Inc. | Multi-chip semiconductor device and method for making the device by using multiple flip chip interfaces |
US6222276B1 (en) * | 1998-04-07 | 2001-04-24 | International Business Machines Corporation | Through-chip conductors for low inductance chip-to-chip integration and off-chip connections |
US6225699B1 (en) * | 1998-06-26 | 2001-05-01 | International Business Machines Corporation | Chip-on-chip interconnections of varied characteristics |
US6228682B1 (en) * | 1999-12-21 | 2001-05-08 | International Business Machines Corporation | Multi-cavity substrate structure for discrete devices |
US6274214B1 (en) * | 1998-01-22 | 2001-08-14 | International Business Machines Corporation | Microelectronic package module with temporary lid |
US6281042B1 (en) * | 1998-08-31 | 2001-08-28 | Micron Technology, Inc. | Structure and method for a high performance electronic packaging assembly |
US20010024360A1 (en) * | 2000-03-14 | 2001-09-27 | Fuji Xerox Co., Ltd. | Printed wiring board |
US6313998B1 (en) * | 1999-04-02 | 2001-11-06 | Legacy Electronics, Inc. | Circuit board assembly having a three dimensional array of integrated circuit packages |
US6369448B1 (en) * | 2000-01-21 | 2002-04-09 | Lsi Logic Corporation | Vertically integrated flip chip semiconductor package |
US6369444B1 (en) * | 1998-05-19 | 2002-04-09 | Agere Systems Guardian Corp. | Packaging silicon on silicon multichip modules |
US6400008B1 (en) * | 1996-02-16 | 2002-06-04 | Micron Technology, Inc. | Surface mount ic using silicon vias in an area array format or same size as die array |
US6413353B2 (en) * | 1997-08-22 | 2002-07-02 | International Business Machines Corporation | Method for direct attachment of a chip to a cooling member |
US6418029B1 (en) * | 2000-02-28 | 2002-07-09 | Mckee James S. | Interconnect system having vertically mounted passive components on an underside of a substrate |
US6611434B1 (en) * | 2000-10-30 | 2003-08-26 | Siliconware Precision Industries Co., Ltd. | Stacked multi-chip package structure with on-chip integration of passive component |
US20030205826A1 (en) * | 2000-05-19 | 2003-11-06 | Megic Corporation | Multiple chips bonded to packaging structure with low noise and multiple selectable functions |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1933731C3 (en) * | 1968-07-05 | 1982-03-25 | Honeywell Information Systems Italia S.p.A., Caluso, Torino | Method for producing a semiconductor integrated circuit |
JPS58218152A (en) | 1982-06-11 | 1983-12-19 | Fujitsu Ltd | Electronic parts |
JPH0237761A (en) * | 1988-07-27 | 1990-02-07 | Nec Corp | Hybrid integrated circuit device |
JP2942363B2 (en) * | 1991-01-14 | 1999-08-30 | 株式会社日立製作所 | Semiconductor integrated circuit device |
JPH0582714A (en) | 1991-09-19 | 1993-04-02 | Hitachi Commun Syst Inc | Bypass capacitor-built in ic |
JPH0637249A (en) | 1992-07-20 | 1994-02-10 | Fujitsu Ltd | Mounting structure for capacitor |
US5355016A (en) * | 1993-05-03 | 1994-10-11 | Motorola, Inc. | Shielded EPROM package |
JP2905736B2 (en) | 1995-12-18 | 1999-06-14 | 株式会社エイ・ティ・アール光電波通信研究所 | Semiconductor device |
JPH09321175A (en) * | 1996-05-30 | 1997-12-12 | Oki Electric Ind Co Ltd | Microwave circuit and chip |
JPH10125741A (en) * | 1996-10-16 | 1998-05-15 | Oki Electric Ind Co Ltd | Integrated circuit, manufacturing method thereof and method of evaluating integrated circuit |
JP4703061B2 (en) * | 2001-08-30 | 2011-06-15 | 富士通株式会社 | Thin film circuit board manufacturing method and via forming board forming method |
-
2000
- 2000-12-15 JP JP2000382592A patent/JP4422323B2/en not_active Expired - Fee Related
-
2001
- 2001-05-02 US US09/846,272 patent/US6873035B2/en not_active Expired - Lifetime
-
2005
- 2005-02-25 US US11/064,822 patent/US7233065B2/en not_active Expired - Fee Related
-
2006
- 2006-08-10 US US11/501,849 patent/US20070023895A1/en not_active Abandoned
-
2007
- 2007-05-04 US US11/797,544 patent/US7319268B2/en not_active Expired - Fee Related
Patent Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5138436A (en) * | 1990-11-16 | 1992-08-11 | Ball Corporation | Interconnect package having means for waveguide transmission of rf signals |
US5786979A (en) * | 1995-12-18 | 1998-07-28 | Douglass; Barry G. | High density inter-chip connections by electromagnetic coupling |
US6400008B1 (en) * | 1996-02-16 | 2002-06-04 | Micron Technology, Inc. | Surface mount ic using silicon vias in an area array format or same size as die array |
US6413353B2 (en) * | 1997-08-22 | 2002-07-02 | International Business Machines Corporation | Method for direct attachment of a chip to a cooling member |
US6274214B1 (en) * | 1998-01-22 | 2001-08-14 | International Business Machines Corporation | Microelectronic package module with temporary lid |
US6150724A (en) * | 1998-03-02 | 2000-11-21 | Motorola, Inc. | Multi-chip semiconductor device and method for making the device by using multiple flip chip interfaces |
US6222276B1 (en) * | 1998-04-07 | 2001-04-24 | International Business Machines Corporation | Through-chip conductors for low inductance chip-to-chip integration and off-chip connections |
US6369444B1 (en) * | 1998-05-19 | 2002-04-09 | Agere Systems Guardian Corp. | Packaging silicon on silicon multichip modules |
US6225699B1 (en) * | 1998-06-26 | 2001-05-01 | International Business Machines Corporation | Chip-on-chip interconnections of varied characteristics |
US6281042B1 (en) * | 1998-08-31 | 2001-08-28 | Micron Technology, Inc. | Structure and method for a high performance electronic packaging assembly |
US6313998B1 (en) * | 1999-04-02 | 2001-11-06 | Legacy Electronics, Inc. | Circuit board assembly having a three dimensional array of integrated circuit packages |
US6228682B1 (en) * | 1999-12-21 | 2001-05-08 | International Business Machines Corporation | Multi-cavity substrate structure for discrete devices |
US6369448B1 (en) * | 2000-01-21 | 2002-04-09 | Lsi Logic Corporation | Vertically integrated flip chip semiconductor package |
US6418029B1 (en) * | 2000-02-28 | 2002-07-09 | Mckee James S. | Interconnect system having vertically mounted passive components on an underside of a substrate |
US20010024360A1 (en) * | 2000-03-14 | 2001-09-27 | Fuji Xerox Co., Ltd. | Printed wiring board |
US20030205826A1 (en) * | 2000-05-19 | 2003-11-06 | Megic Corporation | Multiple chips bonded to packaging structure with low noise and multiple selectable functions |
US6611434B1 (en) * | 2000-10-30 | 2003-08-26 | Siliconware Precision Industries Co., Ltd. | Stacked multi-chip package structure with on-chip integration of passive component |
Cited By (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10312182B2 (en) | 2005-06-08 | 2019-06-04 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US10361144B2 (en) | 2005-06-08 | 2019-07-23 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US7495331B2 (en) | 2005-06-08 | 2009-02-24 | Seiko Epson Corporation | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US10727166B2 (en) | 2005-06-08 | 2020-07-28 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US8673767B2 (en) | 2005-06-08 | 2014-03-18 | Seiko Epson Corporation | Manufacturing method for semiconductor device |
US10424533B1 (en) | 2005-06-08 | 2019-09-24 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US11205608B2 (en) | 2005-06-08 | 2021-12-21 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US20060278983A1 (en) * | 2005-06-08 | 2006-12-14 | Seiko Epson Corporation | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US10636726B2 (en) | 2005-06-08 | 2020-04-28 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US20110062566A1 (en) * | 2005-06-08 | 2011-03-17 | Seiko Epson Corporation | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US8004077B2 (en) | 2005-06-08 | 2011-08-23 | Seiko Epson Corporation | Interconnection of land section to wiring layers at center of external connection terminals in semiconductor device and manufacturing thereof |
US8012864B2 (en) | 2005-06-08 | 2011-09-06 | Seiko Epson Corporation | Manufacturing method for interconnection having stress-absorbing layer between the semiconductor substrate and the external connection terminal |
US10283438B2 (en) | 2005-06-08 | 2019-05-07 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US8294260B2 (en) | 2005-06-08 | 2012-10-23 | Seiko Epson Corporation | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US10262923B2 (en) | 2005-06-08 | 2019-04-16 | Advanced Interconnect Systems Limited | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US8896104B2 (en) | 2005-06-08 | 2014-11-25 | Seiko Epson Corporation | Semiconductor device, manufacturing method for semiconductor device, electronic component, circuit substrate, and electronic apparatus |
US20100226109A1 (en) * | 2005-07-06 | 2010-09-09 | Seiko Epson Corporation | Electronic substrate, manufacturing method for electronic substrate, and electronic device |
US8416578B2 (en) | 2005-07-06 | 2013-04-09 | Seiko Epson Corporation | Manufacturing method for an electronic substrate |
US9087820B2 (en) | 2005-07-06 | 2015-07-21 | Seiko Epson Corporation | Electronic substrate |
US9496202B2 (en) | 2005-07-06 | 2016-11-15 | Seiko Epson Corporation | Electronic substrate |
US8284566B2 (en) | 2005-07-06 | 2012-10-09 | Seiko Epson Corporation | Electronic substrate |
US20100223784A1 (en) * | 2005-07-06 | 2010-09-09 | Seiko Epson Corporation | Electronic substrate, manufacturing method for electronic substrate, and electronic device |
US7746663B2 (en) | 2005-07-06 | 2010-06-29 | Seiko Epson Corporation | Electronic substrate and electronic device |
US20070008705A1 (en) * | 2005-07-06 | 2007-01-11 | Seiko Epson Corporation | Electronic substrate, manufacturing method for electronic substrate, and electronic device |
US8802507B2 (en) | 2008-05-28 | 2014-08-12 | Siliconware Precision Industries Co., Ltd. | Fabrication method of semiconductor package device, and fabrication method of semiconductor package structure |
US8304891B2 (en) * | 2008-05-28 | 2012-11-06 | Siliconware Precision Industries Co., Ltd. | Semiconductor package device, semiconductor package structure, and fabrication methods thereof |
US20090294959A1 (en) * | 2008-05-28 | 2009-12-03 | Siliconware Precision Industries Co., Ltd. | Semiconductor package device, semiconductor package structure, and fabrication methods thereof |
US7851893B2 (en) * | 2008-06-10 | 2010-12-14 | Stats Chippac, Ltd. | Semiconductor device and method of connecting a shielding layer to ground through conductive vias |
US20090302437A1 (en) * | 2008-06-10 | 2009-12-10 | Stats Chippac, Ltd. | Semiconductor Device and Method of Connecting a Shielding Layer to Ground Through Conductive Vias |
Also Published As
Publication number | Publication date |
---|---|
JP2002184933A (en) | 2002-06-28 |
US20070205505A1 (en) | 2007-09-06 |
US6873035B2 (en) | 2005-03-29 |
US20050151252A1 (en) | 2005-07-14 |
JP4422323B2 (en) | 2010-02-24 |
US20020074669A1 (en) | 2002-06-20 |
US7233065B2 (en) | 2007-06-19 |
US7319268B2 (en) | 2008-01-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7233065B2 (en) | Semiconductor device having capacitors for reducing power source noise | |
EP0638931B1 (en) | Multi-chip module | |
US5866943A (en) | System and method for forming a grid array device package employing electomagnetic shielding | |
US5990550A (en) | Integrated circuit device cooling structure | |
US7259448B2 (en) | Die-up ball grid array package with a heat spreader and method for making the same | |
EP1374305B1 (en) | Enhanced die-down ball grid array and method for making the same | |
US5646828A (en) | Thin packaging of multi-chip modules with enhanced thermal/power management | |
JP3239909B2 (en) | Stackable 3D multi-chip semiconductor device and its manufacturing method | |
TWI401778B (en) | Semiconductor chip package | |
US20040262038A1 (en) | Perimeter matrix ball grid array circuit package with a populated center | |
US6833993B2 (en) | Multichip package | |
US20060202335A1 (en) | Tape ball grid array package with electromagnetic interference protection and method for fabricating the package | |
US7868439B2 (en) | Chip package and substrate thereof | |
JP3148718B2 (en) | Thermally and electrically enhanced semiconductor package | |
US8546187B2 (en) | Electronic part and method of manufacturing the same | |
US6963129B1 (en) | Multi-chip package having a contiguous heat spreader assembly | |
US20030080418A1 (en) | Semiconductor device having power supply pads arranged between signal pads and substrate edge | |
KR19990028206U (en) | Stacked Semiconductor Packages | |
JPH0770671B2 (en) | Semiconductor chip carrier and semiconductor chip mounting method using the same | |
KR20000018896A (en) | Thermally and electrically improved pbga package | |
KR20000009752A (en) | Pin grid array package which a number of pin is increased |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |