TWM543457U - Multi-grain Pressing machine - Google Patents
Multi-grain Pressing machine Download PDFInfo
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- TWM543457U TWM543457U TW106201139U TW106201139U TWM543457U TW M543457 U TWM543457 U TW M543457U TW 106201139 U TW106201139 U TW 106201139U TW 106201139 U TW106201139 U TW 106201139U TW M543457 U TWM543457 U TW M543457U
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本創作為一種多晶粒壓合機的技術領域,尤其指一種在微米間距的條件下,一次進行吸取大量微型晶粒及進行加壓焊接作業的設計。The present invention is a technical field of a multi-grain press, in particular, a design in which a large number of micro-grains are sucked and subjected to a pressure welding operation under a micro-pitch condition.
LED元件為目前運用最為廣泛的發光元件,若將RGB三種不同波長的LED擺放在一起,透過光強度控制各LED發光強度,就能發出各種顏色的光。目前戶外或是室內大型LED看板,它就是以RGB三色組成一顆發光源(尺寸約2~4mm),複數發光源以間距(約5~15mm)的陣列方式分佈擺放,就可製作出大型遠距離觀看的銀幕。當單元面積內分佈數目愈多的發光源,解析度也愈高。LED components are currently the most widely used light-emitting components. If RGB three different wavelengths of LEDs are placed together, the intensity of each LED can be controlled by light intensity to emit light of various colors. At present, outdoor or indoor large LED kanban, it is composed of RGB three colors to form a light source (size about 2~4mm), and multiple light sources are distributed in an array of spacing (about 5~15mm), which can be produced. Large screen for long distance viewing. The more the number of light sources distributed in the cell area, the higher the resolution.
同理若將微尺寸(約0.01~0.1mm)的RGB 微型LED晶粒組裝在一起,形成約0.05~0.25mm的發光源,複數發光源以間距(約0.05~0.5mm)的陣列方式分佈擺放,就可形成高解析度的LED銀幕。例如50吋電視4k掃描線的解析度間距為1000mm/4000=0.25mm,因此間距0.1mm的解析度會比4k*2k電視解析度更高。可適用於製作穿戴裝置顯示器、VR顯示器…等各種特殊顯示器應用上。Similarly, if micro-sized (about 0.01~0.1mm) RGB micro LED dies are assembled together to form an illuminating source of about 0.05~0.25mm, the complex illuminating sources are distributed in an array of pitches (about 0.05~0.5mm). Put it on, you can form a high-resolution LED screen. For example, the resolution of the 50-inch TV 4k scan line is 1000mm/4000=0.25mm, so the resolution of the pitch of 0.1mm will be higher than that of the 4k*2k TV. It can be used in a variety of special display applications such as wearable device displays, VR displays, etc.
但是如何將0.01mm~0.1mm小尺寸的LED微型晶粒,以RGB三色擺放到銀幕基板上並將每顆LED微型晶粒的正負極焊接起來,是目前LED業界共用遭遇到的技術瓶頸。例如4K電視,一個50吋銀幕上面採用0.05mm尺寸的發光源,就需要超過上億顆RGB的LED微型晶粒,若採用一顆顆焊接的加工方式,效率差且沒有商業利益存在的。因此目前廠商皆不斷開發各式設備,以期該設備能一次進行100~10000顆微型晶粒的吸取及焊接作業。However, how to put a small size of 0.01mm~0.1mm LED micro-die on RGB three-color to the screen substrate and solder the positive and negative poles of each LED micro-die is a technical bottleneck encountered by the LED industry. . For example, 4K TV, a 50-inch screen with a 0.05mm-size illumination source, requires more than 100 million RGB LED micro-die. If one-piece welding is used, the efficiency is poor and there is no commercial advantage. Therefore, manufacturers are constantly developing various types of equipment, in the hope that the equipment can perform 100~10000 micro-die suction and welding operations at one time.
本創作之主要目的係提供一種多晶粒壓合機,主要是提供一種一次能吸取100~10000顆LED微型晶粒,並移載至具有正負極接線及線路的接收基板上,該接收基板可為顯示器基板或照明基板等,然後將微型晶粒準確地定位壓下並以高溫將晶粒焊接於接收基板上。The main purpose of this creation is to provide a multi-die press machine, which mainly provides a micro-die which can absorb 100-10000 LEDs at a time and is transferred to a receiving substrate having positive and negative wirings and lines, and the receiving substrate can be For the display substrate or the illumination substrate, etc., the micro-grains are then accurately positioned and pressed and the die is soldered to the receiving substrate at a high temperature.
為達上述之目的,本創作包括:基板、水平移動載台及龍門支架,該水平移動載台安裝於該基座上,能於水平方向精密移動,該水平移動載台上另安裝著能獨立旋轉的三個晶粒旋轉台及一基板旋轉台;該龍門支架樹立於該基座,且不干涉該水平移動載台的移動,該龍門支架安裝著一升降機構,該升降機構能控制一吸取頭的升降,該吸取頭由下而上至少包括一吸取單元及一旋轉單元;藉由該水平移動載台精準地在不同時間移動該晶粒旋轉台或該基板旋轉台於該吸取頭下方,由該升降機構適時控制該吸取頭下降,讓該吸取頭一次吸取該晶粒旋轉台上的複數顆微型晶粒,或是將該複數微型晶粒加壓安裝於該基板旋轉台上的接收基板。For the above purposes, the creation includes: a substrate, a horizontal moving stage and a gantry bracket, the horizontal moving stage is mounted on the base, and can be precisely moved in a horizontal direction, and the horizontal moving stage is additionally mounted separately a rotating three-grain rotating table and a substrate rotating table; the gantry bracket is erected on the base and does not interfere with the movement of the horizontal moving stage, the gantry bracket is mounted with a lifting mechanism, and the lifting mechanism can control a suction Lifting the head, the suction head includes at least one suction unit and a rotating unit from bottom to top; and the horizontal moving stage accurately moves the die rotating table or the substrate rotating table below the suction head at different times, The lifting mechanism timely controls the lowering of the suction head, so that the suction head absorbs the plurality of micro-grains on the crystal rotating table at a time, or presses the plurality of micro-grains on the receiving substrate of the substrate rotating table. .
由於本創作將微型晶粒以微米間距安裝於該接收基板上,為克服習用封裝設備排列元件的定位精度於10μm的限制,本創作水平位置的精度由該水平移動載台負責,目前該水平移動載台的精度可達奈米級,該升降機構僅負責該吸取頭的上升,因此即可滿足以微米間距將微型晶粒安裝於該接收基板的作業。Since the present invention mounts the microchips on the receiving substrate at a micron pitch, in order to overcome the limitation of the positioning accuracy of the conventional packaging device alignment components by 10 μm, the accuracy of the horizontal position of the creation is performed by the horizontal moving stage, and the horizontal movement is currently performed. The accuracy of the stage is up to the nanometer level, and the lifting mechanism is only responsible for the rise of the suction head, so that the operation of mounting the microchips on the receiving substrate at a micron pitch can be satisfied.
再者,本創作之吸取頭進一步包括由下而上依序結合的吸取單元、加熱單元、隔熱單元及旋轉單元,利用該吸取單元能一次吸取數目眾多的微型晶粒,而在另一個下降時機,該加熱單元則能適時加熱,進而使熱能經該吸取單元傳導至該微型晶粒處,以完成熔焊於接收基板的目的,為一種創新實用的特殊吸取頭設計。Furthermore, the suction head of the present invention further comprises a suction unit, a heating unit, a heat insulation unit and a rotation unit which are sequentially combined from bottom to top, by which the plurality of micro-grains can be sucked at one time and decreased in another. At the timing, the heating unit can be heated in time, so that thermal energy is conducted to the micro-die through the suction unit to complete the welding to the receiving substrate, and is an innovative and practical special suction head design.
以下配合圖式及元件符號對本創作之實施方式做更詳細的說明,俾使熟習該項技藝者在研讀本說明書後能據以實施。The implementation of the present invention will be described in more detail below with reference to the drawings and component symbols, so that those skilled in the art can implement the present specification after studying the present specification.
本創作實施例為描述多晶粒壓合機,在各種實施例中,是以簡單,示意的參考圖式進行描述,圖式中構件皆以簡單方塊呈現其所在位置及其空間型態,並未將各構件之詳細機構、機器及結構具體繪出,此類構件是運用目前實際機台即可具體實現之,但不因此限縮其範圍。本所所使用之術語「微型」晶粒,是根據本創作實施例之某些元件或結構之描述性大小,參考尺寸範圍於5μm至200μm。接收基板是用以供該微型晶粒採陣列方式排列安裝其上,該接收基板是指用於顯示器銀幕之基板。The present written embodiment describes a multi-die press machine, which in various embodiments is described in a simple, schematic reference pattern in which the components present their positions and their spatial patterns in a simple square, and The detailed mechanism, machine and structure of each component are not specifically drawn. Such components can be realized by using the actual machine, but they are not limited. As used herein, the term "micro" dies is a descriptive size of certain elements or structures according to the presently-created embodiments, with reference dimensions ranging from 5 μm to 200 μm. The receiving substrate is for mounting on the micro-array array, and the receiving substrate refers to a substrate for a display screen.
如圖1及圖2所示,分別為本創作側面結構示意圖以及基座俯視狀態的示意圖。本創作多晶粒壓合機,包括:基座1、水平移動載台2及龍門支架3。該水平移動載台2安裝於該基座1上,其上承載著能獨立旋轉的三個晶粒旋轉台21、22、22及一基板旋轉台24。該龍門支架3橫跨架設於基座1上方,安裝著一升降機構31,該升降機構31能控制一吸取頭4的升降。藉此利用該水平移動載台2精準地移動調整各旋轉台的位置,配合該吸取頭4適時升降,讓微型晶粒得依序被吸取上升、等待、下降、加壓加熱而焊接固定。由於本創作之架構能精準地控制各構件的位置,一次完成100~1000顆晶粒的焊接作業,在微米間距的條件下,滿足於該接收基板上完成千萬顆或億顆微型晶粒的焊接固定作業。As shown in FIG. 1 and FIG. 2 , the schematic diagram of the side structure of the creation and the schematic view of the base are shown. The multi-grain press machine of the present invention comprises: a base 1, a horizontal moving stage 2 and a gantry support 3. The horizontal moving stage 2 is mounted on the base 1 and carries three die rotating stages 21, 22, 22 and a substrate rotating table 24 which are independently rotatable. The gantry bracket 3 is mounted above the base 1 and is mounted with a lifting mechanism 31 capable of controlling the lifting and lowering of a suction head 4. Thereby, the horizontal moving stage 2 is accurately moved and adjusted to adjust the position of each of the rotating stages, and the picking head 4 is appropriately raised and lowered, so that the micro-grains are sequentially sucked up, waited, lowered, pressurized and heated to be welded and fixed. Since the architecture of the creation can accurately control the position of each component, the welding operation of 100 to 1000 crystal grains is completed at one time, and under the condition of micrometer pitch, it is satisfied that the micro-grain is completed on the receiving substrate. Welding fixed work.
接著就各構件的運作方式及結構作一說明:Then explain the operation mode and structure of each component:
該基座1為一花岡岩平台,確保機台精密不受微震影響。The pedestal 1 is a granite rock platform to ensure that the precision of the machine is not affected by microseisms.
該水平移動載台2安裝於該基座1上,能於水平(X-Y軸)方向作精準地移動。該水平移動載台2上另安裝著能獨立旋轉的三個晶粒旋轉台21、22、23及一基板旋轉台24。該晶粒旋轉台21、22、23能精準地控制其旋轉角度,分別用以承載著三個晶粒載盤(圖中並未畫出),三個晶粒載盤分別放置著紅光微型晶粒、綠光微型晶粒、以及藍光微型晶粒。本創作是利用該晶粒旋轉台21、22、23可精準旋轉的特性,進一步校正其所在方位。該基板旋轉台24亦能精準地控制其旋轉角度,用以承載該接收基板(圖中並未畫出),該接收基板是供放置不同顏色的微型晶粒。在本實施例中,移動載台、旋轉台的皆為高精密度機台,為業界常用機台,故不再詳加描述。另外該水平移動載台2另安裝著一第一對位鏡頭組25,該第一對位鏡頭組25是朝上方向置拍攝,用以拍攝該吸取頭4的影像,透過內部軟體的運作分析,進而驅動該吸取頭4旋轉,以校正其位置。The horizontal moving stage 2 is mounted on the base 1 so as to be accurately moved in the horizontal (X-Y axis) direction. The horizontal moving stage 2 is additionally provided with three crystal rotating stages 21, 22, 23 and a substrate rotating table 24 which are independently rotatable. The crystal rotating tables 21, 22, 23 can precisely control the rotation angle thereof, respectively for carrying three crystal carrier plates (not shown), and the three crystal carrier plates are respectively placed with red light micro Grain, green micro-grain, and blue micro-grain. The creation is to further correct the orientation of the grain rotating table 21, 22, 23 by means of precise rotation. The substrate rotating table 24 can also accurately control the rotation angle thereof for carrying the receiving substrate (not shown) for receiving micro-crystals of different colors. In this embodiment, the moving stage and the rotating table are all high-precision machines, which are commonly used in the industry, and therefore will not be described in detail. In addition, the horizontal moving stage 2 is further mounted with a first alignment lens group 25, and the first alignment lens group 25 is photographed upwards for capturing the image of the suction head 4, and analyzing the operation through the internal software. The suction head 4 is then driven to rotate to correct its position.
該龍門支架3為ㄇ字型,採橫跨架設於該基座1上方,且不干涉到該水平移動載台2的移動。該龍門支架3中央位置安裝著該升降機構31,該升降機構31用以能控制位於其底部之吸取頭4的升降。該吸取頭4具有兩種功能:一、為一次精準地吸取100~1000顆微型晶粒,二、再次下降過程中,得進行加壓、加熱焊接作業。另外該龍門支架3另安裝著一第二對位鏡頭組33,該第二對位鏡頭組33是朝下方拍攝,當該晶粒旋轉台21、22、23或該基板旋轉台24被該水平移動載台2移動至下方位置時,由該第二對位鏡頭組33拍攝其影像,透過內部軟體的運作及分析,進而驅動該晶粒旋轉台21、22、23或該基板旋轉台24旋轉,以校正其位置,接著進行原點對位並予以電腦紀錄原點位置。The gantry bracket 3 has a U-shaped shape and is mounted across the base 1 without interfering with the movement of the horizontal moving stage 2. The lifting mechanism 31 is mounted at a central position of the gantry bracket 3, and the lifting mechanism 31 is configured to control the lifting and lowering of the suction head 4 at the bottom thereof. The suction head 4 has two functions: one is to accurately suck 100 to 1000 micro-grains at a time, and the second, during the lowering process, the pressing and heating welding operations are performed. In addition, the gantry bracket 3 is further mounted with a second alignment lens group 33, and the second alignment lens group 33 is photographed downward, when the crystal rotary table 21, 22, 23 or the substrate rotary table 24 is horizontally When the moving stage 2 is moved to the lower position, the image is captured by the second alignment lens group 33, and the operation and analysis of the internal software is driven to drive the die rotating table 21, 22, 23 or the substrate rotating table 24 to rotate. To correct its position, then perform the origin alignment and record the origin of the computer.
如圖3所示,為本創作第一實施例之吸取頭的側面結構示意圖。該吸取頭4包括由上而下依序結合的一旋轉單元41、一隔熱單元42、一加熱單元43、以及一吸取單元44。該旋轉單元41為一高精密度的旋轉軸,進而控制該吸取單元44的方位。該隔熱單元42包括由上而下連的一冷卻盤421及一隔熱層422,該隔熱層422由熱傳導係數差的材料所構成,避免熱能向上傳遞。該冷卻盤421另外連接一冷卻管路(圖中未畫出),使該冷卻盤421具有降溫的效果,避免影響該旋轉單元41的運轉。該加熱單元43用以快速提升該吸取單元44的溫度,以利微型晶粒焊接作業的進行。該加熱單元43的加熱方式包括接觸式加熱及非接觸式加熱。接觸式加熱係於該加熱單元43內部填設一電熱裝置(圖中未畫出),內部其餘部份皆為傳熱性佳的金屬所構成,藉此快速升溫。而非接觸式加熱則進一步包括一雷射發射單元45(如圖4所示),該加熱單元43對應該雷射發射單元45位置處具有一盲孔431,該盲孔431的孔底是位於該加熱單元43的中心位置,透過該雷射發射單元45發射特定波長的光源於盲孔431內,使得該加熱單元43得快速升溫,此種方式的升溫效率較快。由於該吸取單元44與該加熱單元43是結合在一起,當該加熱單元43溫度快速升高時,該吸取單元4亦會同步升高。As shown in FIG. 3, it is a schematic side view of the suction head of the first embodiment of the present invention. The suction head 4 includes a rotating unit 41, a heat insulating unit 42, a heating unit 43, and a suction unit 44 which are sequentially combined from top to bottom. The rotating unit 41 is a high-precision rotating shaft, thereby controlling the orientation of the suction unit 44. The thermal insulation unit 42 includes a cooling plate 421 connected from top to bottom and a thermal insulation layer 422. The thermal insulation layer 422 is made of a material having a poor thermal conductivity to prevent heat from being transmitted upward. The cooling plate 421 is additionally connected to a cooling pipe (not shown), so that the cooling plate 421 has a cooling effect to avoid affecting the operation of the rotating unit 41. The heating unit 43 is used to quickly raise the temperature of the suction unit 44 to facilitate the micro-die welding operation. The heating mode of the heating unit 43 includes contact heating and non-contact heating. The contact heating system is provided with an electric heating device (not shown) inside the heating unit 43, and the rest of the interior is made of a metal having good heat transfer property, thereby rapidly heating up. The non-contact heating further includes a laser emitting unit 45 (shown in FIG. 4) having a blind hole 431 corresponding to the position of the laser emitting unit 45, the bottom of which is located at the bottom of the blind hole 431. The central position of the heating unit 43 transmits a light source of a specific wavelength to the blind hole 431 through the laser emitting unit 45, so that the heating unit 43 is rapidly heated, and the temperature rising efficiency in this manner is faster. Since the suction unit 44 and the heating unit 43 are combined, when the temperature of the heating unit 43 rises rapidly, the suction unit 4 also rises synchronously.
如圖3、4所示,該吸取單元44由下而上包括相連的一多孔吸盤441及一金屬壓頭442。如圖5、6所示,該多孔吸盤441內部具有複數個縱向氣道4411且底面具有複數個接觸墊4412,每個該緃向氣道4411出口處對應著一個接觸墊4412,該多孔吸盤441與該金屬壓頭442相接處,於該縱向氣道4411頂端具有許多橫向氣道4413,藉此連通各縱向氣道4411。該金屬壓頭442內部具有管路4421能連接於外部的抽真空裝置(圖中未畫出),該複數縱向氣道4411是與該管路4421相連接,藉此適時產生真空以吸取晶粒。該接觸墊4412可由純金所構成,間距尺寸是與微型晶粒相同。As shown in FIGS. 3 and 4, the suction unit 44 includes a porous suction cup 441 and a metal indenter 442 connected from bottom to top. As shown in FIGS. 5 and 6, the porous suction cup 441 has a plurality of longitudinal air passages 4411 therein and a plurality of contact pads 4412 on the bottom surface. Each of the outlets of the air passages 4411 corresponds to a contact pad 4412. The porous suction cup 441 and the bottom The metal indenter 442 meets with a plurality of transverse air passages 4413 at the top end of the longitudinal air passage 4411, thereby communicating the longitudinal air passages 4411. The inside of the metal indenter 442 has a vacuuming device (not shown) which can be connected to the outside of the pipe 4421. The plurality of longitudinal air passages 4411 are connected to the pipe 4421, thereby generating a vacuum in time to suck the crystal grains. The contact pad 4412 can be made of pure gold with the same pitch size as the micro die.
接著就本創作的運作方式作一簡單的描述:Then make a brief description of how this creation works:
本實施例是用以製成一LED的顯示器銀幕,是將微尺寸(約0.01~0.1mm)的R、G、B 微型LED晶粒組裝在一起,形成約0.05~0.25mm的發光源,複數發光源以間距(約0.05~0.5mm)的陣列方式分佈擺放,藉此形成高解析度的LED銀幕。This embodiment is a display screen for forming an LED, which is a micro-sized (about 0.01-0.1 mm) R, G, B micro LED die assembled to form a light source of about 0.05 to 0.25 mm. The light sources are distributed in an array of pitches (about 0.05 to 0.5 mm) to form a high-resolution LED screen.
承載著紅光微型晶粒、綠光微型晶粒、以及藍光微型晶粒的三個晶粒載盤分別放置於相對應之該晶粒旋轉台21、22、23上,欲安裝的接收基板則放置於該基板旋轉台24上。Three die carriers carrying red micro micro crystals, green micro micro crystals, and blue micro crystal grains are respectively placed on the corresponding crystal rotating stages 21, 22, and 23, and the receiving substrate to be mounted is It is placed on the substrate rotating table 24.
首先進行校正作業,該水平移動載台2分別依序移動該晶粒旋轉台21、22、23及該基板旋轉台24於該第二對位鏡頭組33正下方,確認所承載之晶粒載盤及接收基板的位置是否正確,如果不對,並啟動旋轉台旋轉一角度,以校正至正確方位。同理將該第一對位鏡頭組25由該水平移動載台2移動至該吸取頭4正下方,確認該吸取單元44之位置是否正確,如果不對則由該旋轉單元41旋轉一角度,校正至該吸取單元44於正確方位。上述各軸皆會進行原點對位並予以電腦紀錄原點位置。。First, the correcting operation is performed. The horizontal moving stage 2 sequentially moves the die rotating tables 21, 22, 23 and the substrate rotating table 24 directly below the second alignment lens group 33 to confirm the loaded die load. Whether the position of the disc and the receiving substrate is correct, if not, and start the rotating table to rotate an angle to correct to the correct orientation. Similarly, the first alignment lens group 25 is moved from the horizontal movement stage 2 directly below the suction head 4, and it is confirmed whether the position of the suction unit 44 is correct. If not, the rotation unit 41 is rotated by an angle to correct The suction unit 44 is in the correct orientation. Each of the above axes will perform the origin alignment and the computer will record the origin position. .
接著進行晶粒的移載作業:首先將承載紅光微型晶粒之該晶粒旋轉台21移動至該吸取單元4正下方,該升降機構31控制該吸取頭4下降,利用該吸取單元44一次吸取100~1000顆紅光微型晶粒,吸取後上升待機。Then, the die transfer operation is performed: firstly, the die rotating table 21 carrying the red light micro die is moved directly below the suction unit 4, and the lifting mechanism 31 controls the suction head 4 to descend, and the suction unit 44 is used once. Draw 100~1000 red micro-grains, and then rise to standby after sucking.
接著利用該水平移動載台2將該基板旋轉台24移動至該吸取頭4正下方。Then, the substrate rotating table 24 is moved to directly below the suction head 4 by the horizontal moving stage 2.
該升降機構31再次作動而使該吸取頭4下降,使該紅光微型晶粒得安裝於具有正負極接線及線路的該接收基板上,該接收基板於相對位置亦設有鍚膏或焊接劑等,之後該加熱單元43升溫,該吸取單元44同步升溫,使得該紅光晶粒熔焊到該接收基板上,之後解除該吸取單元44之真空吸力狀態後,該吸取頭4再度上升。The lifting mechanism 31 is again actuated to lower the suction head 4, so that the red micro-die can be mounted on the receiving substrate having positive and negative wirings and lines. The receiving substrate is also provided with a paste or solder at a relative position. Then, the heating unit 43 is heated up, and the suction unit 44 is simultaneously heated to fuse the red crystal grain onto the receiving substrate. After the vacuum suction state of the suction unit 44 is released, the suction head 4 is again raised.
同理,接著將承載綠光微型晶粒之該晶粒旋轉台22由該水平移動載台4移動至該吸取單元4正下方,依序吸取微型晶粒上升,等待後再下降熔焊接到該接收基板上,即完成綠光微型晶粒的焊接作業。同理該藍光微型晶粒亦以相同方式完成焊接作業。當然也可將所有特定顏色之微型晶粒焊接於該接收基板後,再進行其他顏色微型晶粒的焊接作業。藉由本創作能一次大量地進行微型晶粒的焊接,在多次作業後,即達到商業化將數目眾多的發光二極體加工形成於一顯示器銀幕,最終達到高解析度發光二極體螢幕的生產目的。Similarly, the crystal rotating table 22 carrying the green micro-grain is moved from the horizontal moving stage 4 to the bottom of the suction unit 4, sequentially sucking the micro-grain rises, waiting for the lower-fabrication welding to the On the receiving substrate, the welding operation of the green micro-die is completed. Similarly, the blue micro-die also performs the soldering operation in the same manner. Of course, it is also possible to solder all the micro-dies of a specific color to the receiving substrate, and then perform the welding operation of the other color micro-grains. With this creation, the micro-die welding can be performed in large quantities at a time, and after many operations, commercialization is performed to process a large number of light-emitting diodes on a display screen, and finally reach a high-resolution light-emitting diode screen. Production purpose.
如圖7所示,為本創作第三實施例之吸取頭的側面結構示意圖,在本實施中該吸取頭4包括由上而下依序結合的一旋轉單元41、一隔熱單元42、以及一吸取單元44,在本實施例中並無該加熱單元的結構,因此在本實施例中該吸取頭4主要負責將晶粒放置而安裝於接收基板後,後續再進行晶粒與接收基板加熱焊接固化作業,因此該隔熱單元42也可省略。As shown in FIG. 7 , a schematic view of the side structure of the suction head according to the third embodiment of the present invention. In the present embodiment, the suction head 4 includes a rotating unit 41 , an insulating unit 42 , which are sequentially combined from top to bottom, and A suction unit 44 does not have the structure of the heating unit in this embodiment. Therefore, in the embodiment, the suction head 4 is mainly responsible for placing the die and mounting it on the receiving substrate, and then performing heating on the die and the receiving substrate. The welding hardening operation is performed, so the heat insulating unit 42 can also be omitted.
以上所述者僅為用以解釋本創作之較佳實施例,並非企圖據以對本創作做任何形式上之限制,是以,凡有在相同之創作精神下所作有關本創作之任何修飾或變更,皆仍應包括在本創作意圖保護之範疇。The above description is only for the purpose of explaining the preferred embodiment of the present invention, and is not intended to impose any form of limitation on the creation, so that any modification or alteration of the creation made in the same creative spirit is provided. , should still be included in the scope of protection of this creative intent.
1‧‧‧基座
2‧‧‧水平移動載台
21、22、22‧‧‧晶粒旋轉台
24‧‧‧基板旋轉台
25‧‧‧第一對位鏡頭組
3‧‧‧龍門支架
31‧‧‧升降機構
33‧‧‧第二對位鏡頭組
4‧‧‧吸取頭
41‧‧‧旋轉單元
42‧‧‧隔熱單元
421‧‧‧冷卻盤
422‧‧‧隔熱層
43‧‧‧加熱單元
431‧‧‧盲孔
44‧‧‧吸取單元
441‧‧‧多孔吸盤
4411‧‧‧緃向氣道
4412‧‧‧接觸墊
4413‧‧‧橫向氣道
4412‧‧‧接觸墊
442‧‧‧金屬壓頭
45‧‧‧雷射發射單元1‧‧‧Base
2‧‧‧Horizontal mobile stage
21, 22, 22‧‧‧ die rotating table
24‧‧‧Substrate rotary table
25‧‧‧First alignment lens group
3‧‧‧ gantry bracket
31‧‧‧ Lifting mechanism
33‧‧‧Secondary lens group
4‧‧‧Sucking head
41‧‧‧Rotating unit
42‧‧‧Insulation unit
421‧‧‧Cooling plate
422‧‧‧Insulation
43‧‧‧heating unit
431‧‧‧Blind hole
44‧‧‧ suction unit
441‧‧‧ Porous suction cup
4411‧‧‧緃向气道
4412‧‧‧Contact pads
4413‧‧‧ transverse airway
4412‧‧‧Contact pads
442‧‧‧Metal indenter
45‧‧‧Laser launching unit
圖1為本創作之側面結構示意圖; 圖2為本創作之基座與水平移動載台之俯視結構示意圖,而龍門支架位置則以假想線表示; 圖3為本創作第一實施例之吸取頭的側面結構示意圖; 圖4為本創作第二實施例之吸取頭的側面結構示意圖; 圖5為本創作吸取單元之仰視圖; 圖6為本創作多孔吸盤之局部剖面示意圖; 圖7為本創作第三實施例之吸取頭的側面結構示意圖。1 is a schematic side view of the creation; FIG. 2 is a schematic plan view of the pedestal and the horizontal moving stage of the present invention, and the gantry bracket position is represented by an imaginary line; FIG. 3 is a suction head of the first embodiment of the present invention. 4 is a schematic side view of the suction head of the second embodiment of the present invention; FIG. 5 is a bottom view of the suction unit of the present invention; FIG. 6 is a partial cross-sectional view of the porous suction cup of the present invention; A schematic view of the side structure of the suction head of the third embodiment.
1‧‧‧基座 1‧‧‧Base
2‧‧‧水平移動載台 2‧‧‧Horizontal mobile stage
21、22、23‧‧‧晶粒旋轉台 21, 22, 23‧‧‧ grain rotating table
25‧‧‧第一對位鏡頭組 25‧‧‧First alignment lens group
3‧‧‧龍門支架 3‧‧‧ gantry bracket
31‧‧‧升降機構 31‧‧‧ Lifting mechanism
33‧‧‧第二對位鏡頭組 33‧‧‧Secondary lens group
4‧‧‧吸取頭 4‧‧‧Sucking head
Claims (10)
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112331760A (en) * | 2020-11-05 | 2021-02-05 | 中国科学院金属研究所 | Micro thermoelectric device and preparation method thereof |
CN113178408A (en) * | 2021-05-28 | 2021-07-27 | 重庆翰博显示科技研发中心有限公司 | Discharging, transferring and positioning device for miniature electronic assembly and working method of discharging, transferring and positioning device |
US11172600B2 (en) | 2017-09-29 | 2021-11-09 | Shinkawa Ltd. | Mounting device |
CN114551710A (en) * | 2020-11-26 | 2022-05-27 | 中国科学院金属研究所 | Device and method for integrating miniature thermoelectric transducer |
-
2017
- 2017-01-23 TW TW106201139U patent/TWM543457U/en not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11172600B2 (en) | 2017-09-29 | 2021-11-09 | Shinkawa Ltd. | Mounting device |
TWI746888B (en) * | 2017-09-29 | 2021-11-21 | 日商新川股份有限公司 | Package device |
CN112331760A (en) * | 2020-11-05 | 2021-02-05 | 中国科学院金属研究所 | Micro thermoelectric device and preparation method thereof |
CN114551710A (en) * | 2020-11-26 | 2022-05-27 | 中国科学院金属研究所 | Device and method for integrating miniature thermoelectric transducer |
CN113178408A (en) * | 2021-05-28 | 2021-07-27 | 重庆翰博显示科技研发中心有限公司 | Discharging, transferring and positioning device for miniature electronic assembly and working method of discharging, transferring and positioning device |
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