TWI849189B - processing method - Google Patents
processing method Download PDFInfo
- Publication number
- TWI849189B TWI849189B TW109125069A TW109125069A TWI849189B TW I849189 B TWI849189 B TW I849189B TW 109125069 A TW109125069 A TW 109125069A TW 109125069 A TW109125069 A TW 109125069A TW I849189 B TWI849189 B TW I849189B
- Authority
- TW
- Taiwan
- Prior art keywords
- cutting
- unit
- test piece
- cutting groove
- workpiece
- Prior art date
Links
- 238000003672 processing method Methods 0.000 title claims abstract description 41
- 238000005520 cutting process Methods 0.000 claims abstract description 187
- 230000002950 deficient Effects 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000003384 imaging method Methods 0.000 description 35
- 235000012431 wafers Nutrition 0.000 description 13
- 238000001514 detection method Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000032258 transport Effects 0.000 description 7
- 230000009471 action Effects 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 5
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 239000002390 adhesive tape Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000010924 continuous production Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 2
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 1
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0017—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
- B28D5/0029—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools rotating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10004—Still image; Photographic image
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30164—Workpiece; Machine component
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Theoretical Computer Science (AREA)
- Quality & Reliability (AREA)
- Dicing (AREA)
- Machine Tool Sensing Apparatuses (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
[課題] 提供可以更容易地判定切削刀之更換時序,抑制持續製造不良晶片之情形的加工方法。 [解決手段] 其係被加工物之加工方法,包含:切削步驟,其係以切削刀切削被加工物;切削溝形成步驟,其係以該切削刀將試驗片從一端切削至另一端而形成切削溝;攝像步驟,其係於實施該切削溝形成步驟之後,攝像該試驗片之該一端側或該另一端側之側面而形成包含該切削溝的攝像畫像;及判定步驟,其係根據從該攝像畫像檢測出的該切削溝之內面之傾斜而判定該切削刀是否需要更換。[Topic] To provide a processing method that can more easily determine the replacement timing of a cutting blade and suppress the situation of continuously manufacturing defective chips. [Solution] It is a processing method for a workpiece, comprising: a cutting step, which is to cut the workpiece with a cutting blade; a cutting groove forming step, which is to cut a test piece from one end to the other end with the cutting blade to form a cutting groove; a photographing step, which is to photograph the side surface of the one end side or the other end side of the test piece after implementing the cutting groove forming step to form a photographic image including the cutting groove; and a determination step, which is to determine whether the cutting blade needs to be replaced based on the inclination of the inner surface of the cutting groove detected from the photographic image.
Description
本發明係關於被加工物之加工方法。The present invention relates to a method for processing a workpiece.
作為半導體晶圓等之被加工物之切削的切削裝置,使用在切削中,實施切痕檢查,檢測在晶圓產生的碎屑之尺寸的切削裝置(例如,參照專利文獻1)。 [先前技術文獻] [專利文獻]A cutting device for cutting a workpiece such as a semiconductor wafer, which performs a cut inspection during cutting to detect the size of debris generated on the wafer (for example, refer to Patent Document 1). [Prior Art Document] [Patent Document]
[專利文獻1] 日本特開2001-129822號公報[Patent Document 1] Japanese Patent Application Publication No. 2001-129822
[發明所欲解決之課題][The problem that the invention wants to solve]
但是,當專利文獻1所示的切削裝置在切削中產生所謂的斜切時,被個片化的晶片之側面傾斜,當傾斜的角度超過規格值時,晶片成為不良,因此必須進行切削刀之更換。However, when the cutting device shown in
以往,斜切係作業者從切削加工結束的晶圓抽取晶片,使用顯微鏡測量晶片之尺寸,依此確認晶片之側面是否傾斜。而且,在晶片之側面傾斜之情況,更換切削刀。但是,藉由該方法時,有就算發生斜切之狀態下在短時間內也不會注意到而持續加工大量地製造出不良的晶片之虞。再者,也有抽取晶片測量其尺寸較費時的問題。In the past, the operator extracted the chip from the wafer after the cutting process and measured the size of the chip under a microscope to confirm whether the side of the chip was tilted. In addition, if the side of the chip was tilted, the cutting blade was replaced. However, with this method, there is a risk that even if the chip is tilted, it will not be noticed in a short time and the chip will continue to be processed, resulting in a large number of defective chips. In addition, it is time-consuming to extract the chip and measure its size.
依此,本發明之目的係提供可以更容易地判定切削刀之更換時序,抑制持續製造不良晶片之情形的加工方法。 [用以解決課題之手段]Accordingly, the purpose of the present invention is to provide a processing method that can more easily determine the replacement timing of the cutting blade and suppress the continuous production of defective chips. [Means for solving the problem]
當藉由本發明時則提供一種被加工物之加工方法,其具備:切削步驟,其係以切削刀切削被加工物;切削溝形成步驟,其係以該切削刀將試驗片從一端切削至另一端而形成切削溝;攝像步驟,其係於實施該切削溝形成步驟之後,攝像該試驗片之該一端側或該另一端側之側面而形成包含該切削溝的攝像畫像;及判定步驟,其係根據從該攝像畫像檢測出的該切削溝之側壁之傾斜而判定該切削刀是否需要更換。 [發明之效果]When the present invention is used, a processing method for a workpiece is provided, which comprises: a cutting step, which is to cut the workpiece with a cutting blade; a cutting groove forming step, which is to cut a test piece from one end to the other end with the cutting blade to form a cutting groove; a photographing step, which is to photograph the side surface of the one end side or the other end side of the test piece after the cutting groove forming step is implemented to form a photographic image including the cutting groove; and a determination step, which is to determine whether the cutting blade needs to be replaced based on the inclination of the side wall of the cutting groove detected from the photographic image. [Effect of the invention]
本發明發揮下述效果:可以更容易地判定切削刀之更換時序,抑制持續製造不良晶片之情形。The present invention has the following effects: it is easier to determine the replacement timing of the cutting blade, thereby preventing the continuous production of defective chips.
以下,針對本發明之實施型態,邊參照圖面邊予以詳細說明。並非藉由記載於以下之實施型態的內容限定本發明者。再者,以下所記載之構成要素包含所屬技術領域中具有通常知識者容易思及者及實質上相同者。而且,以下所記載之構成能夠適當組合。再者,在不脫離本發明之主旨的範圍下,可以進行構成之各種省略、置換或變更。The following is a detailed description of the embodiments of the present invention with reference to the drawings. The present invention is not limited by the contents of the embodiments described below. Furthermore, the constituent elements described below include those that are easily conceivable by a person with ordinary knowledge in the relevant technical field and those that are substantially the same. Moreover, the structures described below can be appropriately combined. Furthermore, various omissions, substitutions or changes of the structures can be made without departing from the scope of the subject matter of the present invention.
根據圖面說明與本發明之實施型態有關之加工方法。圖1為表示實施與實施型態有關之加工方法之加工裝置的構成例的斜視圖。圖2為圖1所示之加工裝置之載置台單元的斜視圖。圖3為表示被記憶於圖2所示之加工裝置之控制單元之正常畫像記憶部的正常畫像之一例的圖。圖4為表示與實施型態有關之加工方法之流程的流程圖。The processing method related to the embodiment of the present invention is described with reference to the drawings. FIG1 is a perspective view showing an example of the structure of a processing device for implementing the processing method related to the embodiment. FIG2 is a perspective view of the mounting table unit of the processing device shown in FIG1. FIG3 is a diagram showing an example of a normal image stored in the normal image storage unit of the control unit of the processing device shown in FIG2. FIG4 is a flow chart showing the process of the processing method related to the embodiment.
(加工裝置)
與實施型態有關之加工方法係圖1所示之加工裝置(切削裝置)1對被加工物200進行切削加工的方法。在實施型態中,被加工物200係將矽、藍寶石、鎵等當作基板204之圓板狀之半導體晶圓或光裝置晶圓等的晶圓。被加工物200係在藉由於基板204之表面201形成格子狀之複數分割預定線202而被區劃的區域上形成裝置203。(Processing device)
The processing method related to the embodiment is a method of cutting a
再者,本發明之被加工物200即使為中央部被薄化,在外周部形成厚壁部的所謂TAIKO(註冊商標)晶圓亦可,除了晶圓之外,即使為包含具有複數藉由樹脂被密封之裝置的矩形狀封裝基板、陶瓷基板、鐵氧體基板或鎳及鐵之至少一方的基板等亦可。在實施型態中,被加工物200係藉由直徑大於被加工物200之圓板狀的黏著膠帶210被黏貼於基板204之背面205,在黏著膠帶210之外周緣安裝環狀框211,被支持於環狀框211。
Furthermore, the
圖1所示之加工裝置1係以挾盤載置台10保持被加工物200,沿著分割預定線202以切削刀21進行切削加工(相當於加工)而分割成各個晶片205的切削裝置。另外,晶片203具有基板204之一部分和裝置203。加工裝置1如圖1所示般,具備:載置台單元2,其具備以保持面11吸引保持被加工物200的挾盤載置台10;切削單元20,其係以切削刀21切削挾盤載置台10保持的被加工物200;攝像單元30,其係攝像被保持於挾盤載置台10之被加工物200;及控制單元100,其係控制手段。
The
再者,加工裝置1係如圖1所示般,至少具備:X軸移動單元31,其係使包含挾盤載置台10之載置台單元2在與水平方向平行之X軸方向進行加工進給;Y軸移動單元32其係使切削單元20在與水平方向平行並且與X軸方向正交之Y軸方向進行分度進給;Z軸移動單元33,其係使切削單元20在平行於與X軸方向和Y軸方向之雙方正交之垂直方向的Z軸方向進行切入進給;及旋轉移動單元34,其係使挾盤載置台10繞與Z軸方向平行的軸心旋轉。加工裝置1係如圖1所示般,具備兩個切削單元20,即是2主軸的切割機,所謂的對向雙主軸式的切削裝置。
Furthermore, the
挾盤載置台10為圓盤形狀,保持被加工物200之保持面11係由多孔陶瓷等形成。再者,挾盤載置台10係被設置成藉由X軸移動單元31在切削單元20之下方的加工區域,和從切削單元20之下方間隔開而搬入搬出被加工物200的搬入搬出區域,於X軸方向移動自如,並且,被設置成藉由旋轉移動單元34繞與Z軸方向平行之軸心旋轉自如。挾盤載置台10係藉由保持面11與無圖示之真空吸引源連接,藉由真空吸引源被吸引,吸引、保持被載置於保持面11之被加工物200。在實施型態中,挾盤載置台10係經由黏著膠帶210吸引、保持被加工物200之背面205側。
The
另外,在實施型態中,挾盤載置台10被設置在藉由載置台單元2之X軸移動單元31在X軸方向移動的載置台蓋3,被支持成藉由旋轉移動單元34繞軸心旋轉自如,該旋轉移動單元34被設置成藉由X軸移動單元31在X軸方向移動自如。另外,載置台蓋3之上面沿著水平方向被形成平坦。
In addition, in the embodiment, the
切削單元20係拆裝自如地安裝切削刀21的切削手段,該切削刀21係切削被保持於挾盤載置台10之被加工物200。切削單元20分別對被保持於挾盤載置台10之被加工物200,被設置成藉由Y軸移動單元32在Y軸方向移動自如,並且被設置成藉由Z軸移動單元33在Z軸方向移動自如。
The
一方之切削單元20如圖1所示般,經由Y軸移動單元32及Z軸移動單元33等,被設置在從裝置本體4豎立設置的門型支持框5之一方的柱部。另一方之切削單元20如圖1所示般,經由Y軸移動單元32及Z軸移動單元33等,被設置在支持框5之另一方的柱部。另外,支持框5係藉由水平樑連結柱部之上端彼此。As shown in FIG1 , the
切削單元20係藉由Y軸移動單元32及Z軸移動單元33,能夠將切削刀21定位在挾盤載置台10之保持面11之任意位置。The
切削單元20具備被設置成藉由Y軸移動單元32及Z軸移動單元33在Y軸方向及Z軸方向移動自如的主軸殼體22,和被設置成在主軸殼體22內繞軸心旋轉自如的主軸23,和被安裝於主軸23的切削刀21。The
切削刀21係具有略環形狀的極薄的切削磨石。在實施型態中,切削刀21係所謂的輪轂刀,具備以導電性之金屬構成的圓環狀之圓形基台,和被配設在圓形基台之外周緣並且切削被加工物200的圓環狀之刀刃。切刀係由鑽石或CBN(Cubic Boron Nitride)等之磨粒,和金屬或樹脂等之接合材(結合材)構成,被形成特定厚度。主軸23係藉由無圖示之主軸馬達旋轉,在前端部安裝切削刀21。另外,切削單元20之主軸23及切削刀21之軸心被設定成與Y軸方向平行。The
攝像單元30係以與一方之切削單元20一體性移動之方式,被固定於一方之切削單元20。攝像單元30具備攝像被保持在挾盤載置台10之切削前的被加工物200之應分割的區域的攝像元件。攝像元件係例如CCD(Charge-Coupled Device)攝像元件或CMOS(Complementary MOS)攝像元件。攝像單元30係攝像被保持於挾盤載置台10之被加工物200,取得用以執行校準等的畫像,該校準係進行被加工物200和切削刀21之位置對準,將所取得的畫像輸出至控制單元100。The
X軸移動單元31係藉由使載置台單元2之挾盤載置台10在加工進給方向亦即X軸方向移動,使挾盤載置台10和切削單元20相對性地沿著X軸方向進行加工進給。Y軸移動單元32係藉由使切削單元20在分度進給方向亦即Y軸方向移動,使挾盤載置台10和切削單元20相對性地沿著Y軸方向進行分度進給。Z軸移動單元33係藉由使切削單元20在分度進給方向亦即Z軸方向移動,使挾盤載置台10和切削單元20相對性地沿著Z軸方向進行切入進給。The
X軸移動單元31、Y軸移動單元32及Z軸移動單元33具備被設置成繞軸心旋轉自如的眾所皆知的滾珠螺桿,在X軸方向、Y軸方向及Z軸方向移動自如地支持使滾珠螺桿繞軸心旋轉的眾所皆知的馬達及挾盤載置台10或切削單元20的眾所皆知的導軌。The
再者,加工裝置1具備用以檢測挾盤載置台10之X軸方向之位置的無圖示之X軸方向位置檢測單元,和用以檢測切削單元20之Y軸方向之位置的無圖示之Y軸方向位置檢測單元,和用以檢測出切削單元20之Z軸方向之位置的Z軸方向位置檢測單元。X軸方向位置檢測單元及Y軸方向位置檢測單元可以藉由與X軸方向或Y軸方向平行之線性標尺,和讀取頭構成。Z軸方向位置檢測單元係由馬達之脈衝檢測切削單元20之Z軸方向的位置。X軸方向位置檢測單元、Y軸方向位置檢測單元及Z軸方向位置檢測單元係對控制單元100輸出挾盤載置台10之X軸方向、切削單元20之Y軸方向或Z軸方向的位置。另外,在實施型態中,加工裝置1之各構成要素之X軸方向、Y軸方向及Z軸方向之位置,係由以事先設定的無圖示的基準位置作為基準的位置來決定。Furthermore, the
再者,加工裝置1具備載置收容切削前後之被加工物200的無圖示的卡匣,並且使卡匣在Z軸方向移動的卡匣升降器40,和洗淨切削後之被加工物200的洗淨單元50,和對卡匣進行被加工物200之取放,並且在卡匣、挾盤載置台10及洗淨單元50之間搬運被加工物200的無圖示之搬運單元。Furthermore, the
再者,加工裝置1具備試驗片用挾盤載置台60。試驗片用挾盤載置台60被設置在載置台單元2之載置台蓋3,如圖2所示般,藉由被形成矩形狀且上面61為平坦的金屬材構成。在實施型態中,試驗片用挾盤載置台60之長邊方向與Y軸方向平行。試驗片用挾盤載置台60在上面61載置圖2所示的試驗片70。試驗片70係由與被加工物200之基板204相同的材料構成,平面形狀被形成與上面61相同形狀的矩形平板狀。Furthermore, the
試驗片用挾盤載置台60係在上面61形成與無圖示的真空吸引源連接的吸引溝62。吸引溝62被形成從上面61凹陷。試驗片用挾盤載置台60係藉由真空吸引源被吸引,依此吸引保持被載置於上面61的試驗片70。在實施型態中,試驗片用挾盤載置台60係被支持成藉由被安裝於載置台蓋3的旋轉驅動機構63繞與Y軸方向平行的軸心旋轉自如。在實施型態中,旋轉驅動機構63係橫跨上面61面對於上方的圖2中以實線表示的位置,和上面61面對於搬入搬出區域的圖2中以虛線表示的位置,旋轉試驗片用挾盤載置台60。The test
控制單元100還分別控制加工裝置1之各構成要素,以使加工裝置1實施對被加工物200的加工動作。另外,控制單元100為電腦,該電腦具有CPU(central processing unit)般之微處理器之運算處理裝置,和具有ROM(read only memory)或RAM(random access memory)般之記憶體的記憶裝置,和輸入輸出介面裝置。控制單元100之運算處理裝置係依照被記憶於記憶裝置之電腦程式而實施運算處理,將用以控制加工裝置1之控制訊號,經由輸入輸出介面裝置而輸出至加工裝置1之各構成要素。The
控制單元100被連接於藉由顯示加工動作之狀態或畫像等之液晶顯示裝置等被構成的無圖示之顯示單元,和操作員登記加工內容資訊等之時所使用的輸入單元,和報知單元101。輸入單元係藉由被設置在顯示單元之觸控面板,和鍵盤等之外部輸入裝置之中的至少一個而構成。報知單元101係發出聲音、光之至少一方,而對操作員報知。The
再者,控制單元100如圖1所示般,具備正常畫像記憶部102和比較判定部103。正常畫像記憶部102係記憶圖3所示的正常畫像300,該正常畫像300係以攝像單元30從兩端71、72中之一端71側的側面711攝像正常的切削刀21將試驗片70從X軸方向之一端71橫跨至另一端72予以切削而形成在試驗片70的切削溝80所取得。正常畫像300係切削溝80之側壁亦即內面81與試驗片70之表面73正交。再者,正常畫像記憶部102記憶正常畫像300之切削溝80的從試驗片70之表面201到靠近底面的特定距離301。特定距離301係規定以切削刀21切削試驗片70之時,判定是否需要更換切削刀21之判定位置302的距離。正常畫像記憶部102之機構係藉由記憶裝置而被實現。Furthermore, the
比較判定部103係根據以切削刀21切削試驗片70而形成的切削溝80(以圖9等表示一例,以下以符號80-1表示),判定是否需要更換切削刀21。比較判定部103係根據攝像單元30從一端71側之側面711攝像以切削刀21切削試驗片70所形成的切削溝80-1而取得的攝像畫像400(在圖9表示一例)之切削溝80-1之內面81-1之傾斜,判定切削刀21是否需要更換。比較判定部103之機能係藉由運算處理裝置實行被記憶於記憶裝置之電腦程式而被實現。The comparison and
(加工方法)
與實施型態有關之加工方法係加工裝置1對被加工物200進行切削加工的加工動作。加工方法係操作員將加工內容資訊登記於控制單元100,將收容有複數切削加工前之被加工物200的卡匣設置在卡匣升降器40之上面,將試驗片70載置在試驗片用挾盤載置台60之朝上方的上面61,當從操作員受理加工動作之開始指示時,加工裝置1實施。當開始加工動作時,加工裝置1係在試驗片用挾盤載置台60之上面61吸引保持試驗片70。(Processing method)
The processing method related to the implementation form is a processing action of cutting the
加工方法係被加工物200之加工方法,如圖4所示般,具備切削步驟ST1,和切削溝形成步驟ST4,和攝像步驟ST5,和判定步驟ST6。The processing method is a processing method for the
(切削步驟)
圖5為示意性表示圖4所示之加工方法之切削步驟的剖面圖。切削步驟ST1係以切削刀21切削被加工物200的步驟。在切削步驟ST1中,加工裝置1係搬運單元將被加工物200從卡匣內搬運至搬入搬出區域之挾盤載置台10,經由黏著膠帶210將背面205側吸引保持在挾盤載置台10之保持面11。(Cutting step)
Figure 5 is a cross-sectional view schematically showing the cutting step of the processing method shown in Figure 4. The cutting step ST1 is a step of cutting the
在切削步驟ST1中,加工裝置1係X軸移動單元將挾盤載置台10朝向加工區域移動,攝像單元30攝像被加工物200,根據攝像單元30攝像而取得的畫像,執行校準。加工裝置1係如圖5所示般,一面沿著分割預定線202使被加工物200和切削單元20相對性移動,一面使切削刀21切入至各分割預定線202而將被加工物200分割成各個晶片206。加工裝置1係搬運單元將被分割成各個晶片206之被加工物200從挾盤載置台10搬運至洗淨單元50,洗淨單元50洗淨被加工物200。在切削步驟ST1中,加工裝置1係搬運單元在切削加工後將洗淨後之被加工物200從洗淨單元50搬運至卡匣,收容在卡匣內。In the cutting step ST1, the
加工裝置1之控制單元100判定是否結束加工動作(步驟ST2)。具體而言,加工裝置1之控制單元100係當卡匣內之所有被加工物200之切削加工完成時則判定為加工動作結束,當在卡匣內殘留未切削加工之被加工物200時則判定為繼續加工動作。The
加工裝置1之控制單元100係當判定為結束加工動作(步驟ST2:Yes)時,結束加工動作即是加工方法。加工裝置1之控制單元100係當判定為繼續加工動作(步驟ST2:No)時則判定是否為判定有是否需要更換切削刀21的時序(步驟ST3)。When the
判定是否需要更換切削刀21之時序係藉由切削的被加工物200、切削刀21之刀刃的材質等而決定。判定是否需要更換切削刀21之時序係例如每次切削一片被加工物200,或每次切削特定數被加工物200,作為加工內容資訊之一部分被記憶於控制單元100之記憶裝置。再者,在本發明中,判定是否需要更換切削刀21之時序,即使係每次切削特定數之分割預定線202亦可,即是即使在被保持於挾盤載置台10的被加工物200之切削加工中亦可。在此情況,判定是否需要更換切削刀21之時序即使係每次切削彼此平行之分割預定線202中之一方的分割預定線202全部亦可。The timing for determining whether the
加工裝置1之控制單元100係當判定為非判定是否需要更換切削刀21的時序(步驟ST3:No)時則返回至切削步驟ST1。加工裝置1之控制單元100係當判定為判定是否需要更換切削刀21的時序(步驟ST3:Yes)時則前進至切削溝形成步驟ST4。The
(切削溝形成步驟)
圖6為示意性表示圖4所示之加工方法之切削溝形成步驟的剖面圖。圖7為表示圖4所示之加工方法之切削溝形成步驟後之試驗片的俯視圖。切削溝形成步驟ST4係以切削刀21將試驗片70從X軸方向之一端71切削至另一端72而形成切削溝80-1的步驟。(Cutting groove forming step)
Figure 6 is a cross-sectional view schematically showing the cutting groove forming step of the processing method shown in Figure 4. Figure 7 is a top view of the test piece after the cutting groove forming step of the processing method shown in Figure 4. The cutting groove forming step ST4 is a step of cutting the
在實施型態中,在切削溝形成步驟ST4中,加工裝置1之控制單元100係以攝像單元30攝像被吸引保持在試驗片用挾盤載置台60之試驗片70,將試驗片70和切削刀21之刀刃予以位置對準。加工裝置1係如圖5所示般,一面沿著X軸方向使試驗片70和切削單元20相對性移動,一面如圖6所示般,將切削刀21從一端71橫跨至另一端72切入至試驗片70,在被加工物200形成圖7所示的切削溝80-1,前進至攝像步驟ST5。另外,在實施型態中,雖然從試驗片70之X軸方向之一端71橫跨至另一端72而形成切削溝80-1,但是即使在本發明中,不從一端71切至另一端72,而從一端71朝向另一端72側切削至途中,使切削刀21上升亦可。In the embodiment, in the cutting groove forming step ST4, the
(攝像步驟)
圖8為示意性表示圖4所示之加工方法之攝像步驟的剖面圖。圖9為表示以圖4所示之加工方法之攝像步驟所取得的攝像畫像之一例的圖。攝像步驟ST5係於實施切削溝形成步驟ST4之後,攝像試驗片70之一端71側或另一端72側之側面711、721而形成包含切削溝80-1的攝像畫像400的步驟。(Photographic step)
Figure 8 is a cross-sectional view schematically showing the photographic step of the processing method shown in Figure 4. Figure 9 is a diagram showing an example of a photographic image obtained by the photographic step of the processing method shown in Figure 4. The photographic step ST5 is a step of photographing the side surfaces 711, 721 of one
在實施型態中,在攝像步驟ST5中,加工裝置1係以旋轉驅動機構63使試驗片用挾盤載置台60繞軸心旋轉90度,使上面61與搬入搬出區域面對面。在實施型態中,在攝像步驟ST5中,加工裝置1係如圖8所示般,以攝像單元30攝像試驗片70之一端71側之側面711,取得在圖9所示的一例的攝像畫像400,而前進至判定步驟ST6。In the embodiment, in the imaging step ST5, the
(判定步驟)
圖10為表示圖4所示之加工方法之判定步驟之一例的圖。判定步驟ST6係根據從攝像畫像400檢測出的切削溝80-1之內面81-1之傾斜,判定是否需要更換切削刀21的步驟。(Judgment step)
Figure 10 is a diagram showing an example of the judgment step of the processing method shown in Figure 4. Judgment step ST6 is a step of judging whether the
在實施型態中,在判定步驟ST6中,將正常畫像300之切削溝80(在圖10中以虛線表示)重疊在攝像畫像400。另外,在實施型態中,將正常畫像300之切削溝80之上端重疊在攝像畫像400之切削溝80之上端。在實施型態中,在判定步驟ST6中,控制單元100係檢測判定位置302之攝像畫像400之切削溝80-1之內面81-1和正常畫像300之切削溝80之內面81的距離401,當判定為檢測出的距離401為事先設定的容許值以下時則判定不需要更換切削刀21(判定步驟ST6:No),返回至切削步驟ST1。如此一來,在實施型態中,在判定步驟ST6中,控制單元100係根據從攝像畫像400檢測出的切削溝80-1之內面81-1之傾斜,判定是否需要更換切削刀21。In the embodiment, in the determination step ST6, the cut groove 80 (indicated by a dotted line in FIG. 10 ) of the
在實施型態中,在判定步驟ST6中,控制單元100係當判定為檢測出的距離401超過事先設定的容許值時則判定為需要更換切削刀21(判定步驟ST6:Yes),使報知單元101動作而進行報知(步驟ST7),結束加工動作即是與實施型態有關的加工方法。另外,在本發明中,在判定步驟ST6中判定是否需要更換切削刀21之方法,不限定於記載於實施型態者,即使比較正常畫像300之切削溝80之輪廓和攝像畫像400之切削溝80之輪廓亦可,即使比較攝像畫像400之切削溝80-1之內面81-1和理想的切削溝80之內面之假想線亦可。In the embodiment, in the determination step ST6, when the
如上述說明般,與實施型態有關之加工方法及加工裝置1在試驗片70形成切削溝80-1,攝像試驗片70之側面711。根據攝像且形成的攝像畫像400檢測出的切削溝80-1之內面81-1之傾斜,判定是否需要更換切削刀21。其結果,加工方法及加工裝置1發揮下述效果:較以往可以更容易地判定切削刀21之更換時序,抑制持續製造不良晶片206之情形。As described above, the processing method and
[變形例] 根據圖面說明與本發明之實施型態之變形例有關之加工方法。圖11為示意性表示與實施型態之變形例有關之加工方法之攝像步驟的剖面圖。另外,圖11係對與實施型態相同部分賦予相同符號省略說明。[Variation] The processing method related to the variation of the embodiment of the present invention is described based on the drawings. FIG11 is a cross-sectional view schematically showing the imaging step of the processing method related to the variation of the embodiment. In addition, FIG11 gives the same symbols to the same parts as the embodiment and omits the description.
實施與實施型態之變形例有關之加工方法的加工裝置1具備與攝像單元30不同個體且用以取得攝像畫像400的第2攝像單元90,將第2攝像單元90配置在試驗片用挾盤載置台60之X軸方向之側方。在變形例中,加工裝置1係在攝像步驟ST5中,如圖11所示般,攝像被吸引保持於將上面61朝上方的試驗片用挾盤載置台60之試驗片70之另一端72側的側面721而取得攝像畫像400。The
另外,第2攝像單元90與攝像單元30相同具備攝像試驗片70之另一端72側面721的攝像元件。攝像元件係例如CCD(Charge-Coupled Device)攝像元件或CMOS (Complementary MOS)攝像元件。In addition, the
與變形例有關之加工方法及加工裝置1係在切削溝形成步驟ST4中在試驗片70形成切削溝80-1,在攝像步驟ST5中以第2攝像單元90攝像試驗片70之側面721。加工方法及加工裝置1係在判定步驟ST6中,與實施型態相同根據攝像且形成的攝像畫像400檢測出的切削溝80-1之內面81-1之傾斜,判定是否需要更換切削刀21。其結果,與變形例有關之加工方法及加工裝置1與實施型態相同發揮下述效果:較以往可以更容易地判定切削刀21之更換時序,抑制持續製造不良晶片206之情形。The processing method and
另外,本發明並不限定於上述實施型態。即是,可以在不脫離本發明之主旨的範圍下可以進行各種變形並予以實施。另外,在實施型態中,雖然停止切削加工,而實施攝像步驟ST5及判定步驟ST6,但是在本發明中,不限定於此,即使在切削加工中實施攝像步驟ST5及判定步驟ST6亦可。In addition, the present invention is not limited to the above-mentioned implementation. That is, various modifications can be made and implemented without departing from the scope of the present invention. In addition, in the implementation, although the cutting process is stopped and the imaging step ST5 and the determination step ST6 are implemented, the present invention is not limited to this, and the imaging step ST5 and the determination step ST6 can be implemented even during the cutting process.
再者,在本發明中,即使在切削裝置亦即加工裝置1具備一對切削單元20之情況,與各切削單元20對應設置一對具備旋轉驅動機構63之試驗片用挾盤載置台60亦可。在此情況,加工裝置1以夾著挾盤載置台10在各切削單元20側設置試驗片用挾盤載置台60為佳。Furthermore, in the present invention, even if the cutting device, i.e., the
21:切削刀
70:試驗片
71:一端
72:另一端
80,80-1:切削溝
81,81-1:內面(側壁)
400:攝像畫像
711,721:側面
200:被加工物
ST1:切削步驟
ST4:切削溝形成步驟
ST5:攝像步驟
ST6:判定步驟21: Cutting blade
70: Test piece
71: One end
72: The
[圖1]為表示實施與實施型態有關之加工方法之加工裝置之構成例的斜視圖。 [圖2]為圖1所示之晶圓之加工裝置之載置台單元的斜視圖。 [圖3]為表示被記憶於圖2所示之加工裝置之控制單元之正常畫像記憶部的正常畫像之一例的圖。 [圖4]為表示與實施型態有關之加工方法之流程的流程圖。 [圖5]為示意性表示圖4所示之加工方法之切削步驟的剖面圖。 [圖6]為示意性表示圖4所示之加工方法之切削溝形成步驟的剖面圖。 [圖7]為表示圖4所示之加工方法之切削溝形成步驟後之試驗片的俯視圖。 [圖8]為示意性表示圖4所示之加工方法之攝像步驟的剖面圖。 [圖9]為表示以圖4所示之加工方法之攝像步驟所取得的攝像畫像之一例的圖。 [圖10]為表示圖4所示之加工方法之判定步驟之一例的圖。 [圖11]為示意性表示與實施型態之變形例有關之加工方法之攝像步驟的剖面圖。[FIG. 1] is a perspective view showing a configuration example of a processing device for implementing a processing method related to an embodiment. [FIG. 2] is a perspective view of a stage unit of the wafer processing device shown in FIG. 1. [FIG. 3] is a view showing an example of a normal image stored in a normal image storage unit of a control unit of the processing device shown in FIG. 2. [FIG. 4] is a flow chart showing a flow of a processing method related to an embodiment. [FIG. 5] is a cross-sectional view schematically showing a cutting step of the processing method shown in FIG. 4. [FIG. 6] is a cross-sectional view schematically showing a cutting groove forming step of the processing method shown in FIG. 4. [FIG. 7] is a top view showing a test piece after the cutting groove forming step of the processing method shown in FIG. 4. [FIG. 8] is a cross-sectional view schematically showing an imaging step of the processing method shown in FIG. 4. [Fig. 9] is a diagram showing an example of a photographic image obtained by the photographic step of the processing method shown in Fig. 4. [Fig. 10] is a diagram showing an example of a determination step of the processing method shown in Fig. 4. [Fig. 11] is a cross-sectional view schematically showing the photographic step of the processing method related to a modified example of the implementation form.
Claims (1)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-138203 | 2019-07-26 | ||
JP2019138203A JP7362334B2 (en) | 2019-07-26 | 2019-07-26 | Processing method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202105488A TW202105488A (en) | 2021-02-01 |
TWI849189B true TWI849189B (en) | 2024-07-21 |
Family
ID=74099013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109125069A TWI849189B (en) | 2019-07-26 | 2020-07-24 | processing method |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP7362334B2 (en) |
KR (1) | KR20210012906A (en) |
CN (1) | CN112297258A (en) |
DE (1) | DE102020209369A1 (en) |
SG (1) | SG10202006734RA (en) |
TW (1) | TWI849189B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007296604A (en) * | 2006-04-28 | 2007-11-15 | Disco Abrasive Syst Ltd | Wafer cutting device |
US20190035689A1 (en) * | 2017-07-28 | 2019-01-31 | Disco Corporation | Wafer processing method |
TW201929082A (en) * | 2017-12-27 | 2019-07-16 | 日商迪思科股份有限公司 | Cutting apparatus capable of simply measuring an inclination or an irregularity of end surface being in contact with the mounting member bump of the cutting blade |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3646781B2 (en) | 1999-11-08 | 2005-05-11 | 株式会社東京精密 | Dicing method, kerf check method of dicing apparatus, and kerf check system |
JP3746422B2 (en) * | 2000-12-05 | 2006-02-15 | シャープ株式会社 | Dicing apparatus and dicing method |
JP2006108219A (en) * | 2004-10-01 | 2006-04-20 | Disco Abrasive Syst Ltd | Method of adjusting inclined angle of cutting blade of cutting device and method for cutting using the same |
JP4903445B2 (en) * | 2006-01-26 | 2012-03-28 | 株式会社ディスコ | How to check the cutting blade depth |
JP5495624B2 (en) * | 2008-06-23 | 2014-05-21 | キヤノン株式会社 | Dicing method, program of dicing method, and storage medium |
JP5384174B2 (en) * | 2009-04-06 | 2014-01-08 | 株式会社ディスコ | Cutting blade tip shape detection method |
JP5757831B2 (en) * | 2011-09-14 | 2015-08-05 | 株式会社ディスコ | Cutting blade tip shape detection method |
JP6537423B2 (en) * | 2015-09-29 | 2019-07-03 | 株式会社ディスコ | Refraction detection method of cutting blade |
JP7045167B2 (en) * | 2017-11-14 | 2022-03-31 | 株式会社ディスコ | Cutting equipment |
-
2019
- 2019-07-26 JP JP2019138203A patent/JP7362334B2/en active Active
-
2020
- 2020-07-01 KR KR1020200080786A patent/KR20210012906A/en unknown
- 2020-07-15 SG SG10202006734RA patent/SG10202006734RA/en unknown
- 2020-07-23 CN CN202010716022.3A patent/CN112297258A/en active Pending
- 2020-07-24 TW TW109125069A patent/TWI849189B/en active
- 2020-07-24 DE DE102020209369.5A patent/DE102020209369A1/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007296604A (en) * | 2006-04-28 | 2007-11-15 | Disco Abrasive Syst Ltd | Wafer cutting device |
US20190035689A1 (en) * | 2017-07-28 | 2019-01-31 | Disco Corporation | Wafer processing method |
TW201929082A (en) * | 2017-12-27 | 2019-07-16 | 日商迪思科股份有限公司 | Cutting apparatus capable of simply measuring an inclination or an irregularity of end surface being in contact with the mounting member bump of the cutting blade |
Also Published As
Publication number | Publication date |
---|---|
JP7362334B2 (en) | 2023-10-17 |
JP2021022657A (en) | 2021-02-18 |
KR20210012906A (en) | 2021-02-03 |
SG10202006734RA (en) | 2021-02-25 |
DE102020209369A1 (en) | 2021-01-28 |
CN112297258A (en) | 2021-02-02 |
TW202105488A (en) | 2021-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107086195A (en) | Device with transfer control based on captured images | |
JP6873712B2 (en) | Dressing board, cutting blade dressing method and cutting equipment | |
TW202030789A (en) | Chuck table and inspection device | |
JP2018078145A (en) | Cutting apparatus | |
CN110571147B (en) | Wafer processing method and grinding device | |
TWI849189B (en) | processing method | |
TW202009099A (en) | Cutting apparatus | |
TW202228203A (en) | Grinding apparatus | |
TW202109639A (en) | Cutting method and cutting device comprising an identification code reading step, a cutting blade mounting step, a cutting step, a width inspecting step, a comparing step, and a warning step | |
JP7539258B2 (en) | Method for processing workpiece | |
JP2021040097A (en) | Cutting method of workpiece | |
JP2025012314A (en) | Inspection wafer storage cassette and processing device | |
JP7271181B2 (en) | diagnostic method | |
JP2023018558A (en) | Cassette mounting stage and fixture for the cassette mounting stage | |
CN118571836A (en) | Processing method of workpiece | |
TW202128345A (en) | Processing method and processing apparatus | |
TW202138114A (en) | Cutting apparatus | |
TW202412155A (en) | Mounting method and cutting apparatus | |
JP2022083252A (en) | Processing device and processing method | |
TW202123372A (en) | Processing device capable of suppressing decrease of processing efficiency | |
JP2024175936A (en) | How to sharpen cutting blades | |
JP2022142633A (en) | Positioning mechanism and semiconductor processing equipment | |
TW202407780A (en) | Processing device | |
JP2020191426A (en) | Processing device | |
CN119098883A (en) | Semiconductor wafer processing system |