TWI680058B - Adsorption device and bonding system - Google Patents
Adsorption device and bonding system Download PDFInfo
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- TWI680058B TWI680058B TW107140674A TW107140674A TWI680058B TW I680058 B TWI680058 B TW I680058B TW 107140674 A TW107140674 A TW 107140674A TW 107140674 A TW107140674 A TW 107140674A TW I680058 B TWI680058 B TW I680058B
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
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- B—PERFORMING OPERATIONS; TRANSPORTING
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Abstract
本發明提供一種吸附裝置,包括:施力結構,用於提供壓力;以及吸附結構,連接於所述施力結構,其包括接觸層,所述接觸層包括基底及由所述基底之一表面凸伸出之複數間隔排列之彈性接觸部;其中,所述彈性接觸部用於配合所述施力結構所提供之壓力,吸附待貼合物件。本發明提供之吸附裝置,提高了對表面不平整之貼合物件之吸附效果,有利於解決習知技術中於待貼合物件表面不平整之情況下,吸附不良之問題。本發明還提供一種貼合系統。 The invention provides an adsorption device, comprising: a force applying structure for providing pressure; and an adsorption structure connected to the force applying structure, comprising a contact layer, the contact layer including a substrate and a surface protruding from one surface of the substrate The plurality of protruding elastic contact portions are arranged at intervals; wherein, the elastic contact portions are adapted to cooperate with the pressure provided by the force applying structure to adsorb the parts to be bonded. The adsorption device provided by the present invention improves the adsorption effect on the surface-attached pieces, which is helpful to solve the problem of poor adsorption in the conventional technology when the surface of the pieces to be laminated is uneven. The invention also provides a fitting system.
Description
本發明涉及一種吸附裝置及具有該吸附裝置之貼合系統。 The invention relates to an adsorption device and a bonding system having the same.
貼合系統一般包括用於固定待貼合物之吸附裝置。一般之吸附原理是利用真空吸附、靜電吸附或者凡德瓦爾力塗層以固定待貼合物。由於使用真空吸附時,會考慮到裝置可能存於之漏氣問題,因此,一般吸附裝置會使用剛性材料作為基材,常用之為金屬與陶瓷。若使用靜電吸附時,則吸附裝置需搭配繞線線圈進行吸附,基材亦多使用剛性材料。於利用凡德瓦爾力之情況下,則是將塗層塗於剛性介質表面,達到吸附效果。 The bonding system generally includes an adsorption device for fixing the compound to be bonded. The general adsorption principle is to use vacuum adsorption, electrostatic adsorption or Van der Waals coating to fix the compound to be bonded. Because the problem of air leakage that may exist in the device is taken into consideration when vacuum adsorption is used, generally, a rigid material is used as the substrate for the adsorption device, and metals and ceramics are commonly used. If electrostatic adsorption is used, the adsorption device needs to be equipped with a winding coil for adsorption, and rigid materials are often used for the substrate. In the case of using Van der Waals force, the coating is applied to the surface of a rigid medium to achieve an adsorption effect.
上述之貼合治具,於吸附裝置吸附待貼合物時,若待貼合物之表面為不平整材料時,比如表面有毛刺、針尖狀凸起等表面凸起,該等不平整之表面會成為受力點發生應力集中,導致貼合失敗。 In the above-mentioned bonding jig, when the surface to be bonded is an uneven material when the adsorption device adsorbs the material to be bonded, for example, the surface has burrs, needle-shaped protrusions and other surface protrusions, such uneven surfaces Stress concentration will occur at the point of stress, which will cause the bonding failure.
本發明一方面提供一種吸附裝置,包括:施力結構,用於提供壓力;以及吸附結構,連接於所述施力結構,其包括接觸層,所述接觸層包括基底及由所述基底之一表面凸伸出之複數間隔排列之彈性接觸部;其中,所述彈性接觸部用於配合所述施力結構所提供之壓力,吸附待貼合物件。 An aspect of the present invention provides an adsorption device, including: a force applying structure for providing pressure; and an adsorption structure connected to the force applying structure, comprising a contact layer, the contact layer including a substrate and one of the substrates A plurality of elastic contact portions arranged on the surface protruding in a plurality of intervals; wherein the elastic contact portions are used for cooperating with the pressure provided by the force-applying structure to adsorb the parts to be bonded.
本發明另一方面提供一種貼合系統,包括:上平臺,用於固定第一待貼合物件,所述上平臺包括如上述任意一項所述之吸附裝置;下平臺,用於固定第二待貼合物件;及 位移控制器,所述位移控制器與所述施力結構連接,用於帶動所述施力結構及所述吸附結構於三維方向產生位移。 Another aspect of the present invention provides a bonding system, comprising: an upper platform for fixing a first piece to be bonded, the upper platform including the adsorption device according to any one of the above; a lower platform for fixing a second Pieces to be laminated; and A displacement controller, which is connected to the force applying structure and is used to drive the force applying structure and the adsorption structure to generate displacement in a three-dimensional direction.
本發明提供之吸附裝置,緩衝層及所有彈性接觸部均採用高彈性之材料製成(例如PDMS)。當施力結構施加壓力時,緩衝層起到緩衝作用,對壓力進行均衡分配再施加至彈性接觸部,彈性接觸部受到壓力,可對待貼合物件進行緊貼,並且由於緩衝層及所有彈性接觸部均具有彈性其具備較好之彈性,可對待貼合物件之接觸面進行仿形,即使待貼合物件與彈性接觸部之接觸面不平整,對待貼合物件與彈性接觸部接觸之表面各處均可良好接觸,彈性接觸部再利用分子間之作用力,將待貼合物件吸附起來,從而提高對表面不平整之貼合物件之吸附效果。有利於解決習知技術中於待貼合物件表面不平整之情況下,吸附不良之問題。 The adsorption device, the buffer layer and all the elastic contact portions provided by the present invention are made of a highly elastic material (such as PDMS). When the force is applied by the force structure, the buffer layer acts as a buffer, and the pressure is evenly distributed and then applied to the elastic contact portion. The elastic contact portion is under pressure and can be closely adhered to the laminated component. All parts have elasticity, which has good elasticity, and can be profiled on the contact surface of the piece to be bonded, even if the contact surface of the piece to be bonded and the elastic contact portion is not flat, Good contact is possible everywhere, and the elastic contact portion reuses the intermolecular force to adsorb the parts to be bonded, thereby improving the adsorption effect on the parts with uneven surfaces. It is beneficial to solve the problem of poor adsorption in the conventional technology when the surface of the component to be laminated is uneven.
100‧‧‧吸附裝置 100‧‧‧ Adsorption device
110‧‧‧施力結構 110‧‧‧force structure
111‧‧‧施力單元 111‧‧‧force application unit
120‧‧‧吸附結構 120‧‧‧ Adsorption structure
121‧‧‧接觸層 121‧‧‧contact layer
1210‧‧‧基底 1210‧‧‧ substrate
1211‧‧‧彈性接觸部 1211‧‧‧Elastic contact
122‧‧‧緩衝層 122‧‧‧ buffer layer
1221‧‧‧第一端 1221‧‧‧ the first end
1222‧‧‧第二端 1222‧‧‧Second End
1223‧‧‧腔體 1223‧‧‧ Cavity
130‧‧‧連接板 130‧‧‧Connecting plate
200‧‧‧第一待貼合物件 200‧‧‧The first piece to be laminated
300‧‧‧第二待貼合物件 300‧‧‧ The second piece to be laminated
400‧‧‧貼合系統 400‧‧‧ Laminating System
410‧‧‧上平臺 410‧‧‧on the platform
411‧‧‧位移控制器 411‧‧‧Displacement controller
4111‧‧‧基板 4111‧‧‧ substrate
4112‧‧‧懸臂 4112‧‧‧ cantilever
420‧‧‧下平臺 420‧‧‧ under platform
圖1是本發明實施例提供之吸附裝置之結構示意圖。 FIG. 1 is a schematic structural diagram of an adsorption device provided by an embodiment of the present invention.
圖2是圖1中吸附結構之結構示意圖。 FIG. 2 is a schematic structural diagram of the adsorption structure in FIG. 1.
圖3是圖2所示之吸附結構與圖1中之連接板於一起之剖面結構示意圖。 3 is a schematic cross-sectional structure diagram of the adsorption structure shown in FIG. 2 and the connecting plate in FIG. 1.
圖4是本發明實施例提供之PDMS之楊氏模數與其厚度之間關係之示意圖。 FIG. 4 is a schematic diagram showing the relationship between the Young's modulus of the PDMS and its thickness according to an embodiment of the present invention.
圖5是本發明實施例提供之彈性接觸部之製作方法之流程示意圖。 FIG. 5 is a schematic flowchart of a method for manufacturing an elastic contact portion according to an embodiment of the present invention.
圖6A~6E為本實施例提供之吸附裝置之工作過程示意圖。 6A to 6E are schematic diagrams of the working process of the adsorption device provided in this embodiment.
圖7是本發明實施例提供之貼合系統之模塊示意圖。 FIG. 7 is a schematic block diagram of a bonding system according to an embodiment of the present invention.
圖8為圖7中位移控制器及吸附裝置之結構示意圖。 FIG. 8 is a schematic structural diagram of the displacement controller and the adsorption device in FIG. 7.
實施例一 Example one
圖1所示為一實施例提供之吸附裝置100之結構示意圖,吸附裝置100包括施力結構110及吸附結構120。施力結構110用於為吸附結構120於吸附待貼合物件時提供所需之壓力。施力結構110包括複數施力單元111,呈陣列式排列,每一個施力單元111均得獨立提供壓力。於一實施例中,施力單元111 得為氣壓柱或液壓柱。施力單元111工作時,得選擇開啟一個或者複數,為吸附結構120提供壓力。吸附結構120包括接觸層121及與接觸層121連接之緩衝層122,緩衝層122設置於施力結構110及接觸層121之間。 FIG. 1 is a schematic structural diagram of an adsorption device 100 according to an embodiment. The adsorption device 100 includes a force applying structure 110 and an adsorption structure 120. The force applying structure 110 is used to provide a required pressure for the adsorption structure 120 when adsorbing the component to be bonded. The force applying structure 110 includes a plurality of force applying units 111 arranged in an array, and each force applying unit 111 can independently provide pressure. In one embodiment, the force applying unit 111 May be a pneumatic or hydraulic column. When the force applying unit 111 is working, one or more of the force applying units 111 must be selected to provide pressure to the adsorption structure 120. The adsorption structure 120 includes a contact layer 121 and a buffer layer 122 connected to the contact layer 121. The buffer layer 122 is disposed between the force applying structure 110 and the contact layer 121.
如圖2所示,接觸層121包括基底1210及由基底1210之一表面凸伸出之複數間隔排列之彈性接觸部1211,於本實施例中,彈性接觸部1211為圓柱狀,於其他實施例中,彈性接觸部1211亦得為其他之形狀。於一實施例中,圓柱狀之彈性接觸部1211之直徑為30μm~100μm之間,直徑與高度之比介於1-4之間,且各個彈性接觸部1211之直徑相等,各個彈性接觸部1211之高度亦設置為相等,於上述尺寸下,彈性接觸部1211得利用分子間作用力與待貼合物件(圖未示)產生黏附力,以將其吸附。 As shown in FIG. 2, the contact layer 121 includes a substrate 1210 and a plurality of spaced-apart elastic contact portions 1211 protruding from one surface of the substrate 1210. In this embodiment, the elastic contact portion 1211 is cylindrical. In other embodiments, The elastic contact portion 1211 may have other shapes. In an embodiment, the diameter of the cylindrical elastic contact portion 1211 is between 30 μm and 100 μm, and the ratio of the diameter to the height is between 1-4. The diameter of each elastic contact portion 1211 is the same, and each of the elastic contact portions 1211 is the same. The heights are also set to be equal. Under the above dimensions, the elastic contact portion 1211 may use an intermolecular force to generate an adhesive force with a piece to be bonded (not shown) to adsorb it.
請一併參考圖2及圖3,緩衝層122包括靠近施力結構110之第一端1221、與第一端1221相對之第二端1222以及貫通第一端1221及第二端1222之複數腔體1223。接觸層121之基底1210連接於第二端1222並封閉複數腔體1223之開口,彈性接觸部1211則形成於基底1210遠離第二端1222之一面上。腔體1223用於對施力結構110提供壓力,並且均衡之施加壓力至彈性接觸部1211。 Please refer to FIG. 2 and FIG. 3 together. The buffer layer 122 includes a first end 1221 near the force applying structure 110, a second end 1222 opposite to the first end 1221, and a plurality of cavities penetrating the first end 1221 and the second end 1222.体 1223. The base 1210 of the contact layer 121 is connected to the second end 1222 and closes the opening of the plurality of cavities 1223. The elastic contact portion 1211 is formed on a surface of the base 1210 away from the second end 1222. The cavity 1223 is used to provide pressure to the force applying structure 110 and apply the pressure to the elastic contact portion 1211 in a balanced manner.
本實施例中,腔體1223為中空之正六棱柱型。於一實施例中,正六棱柱之邊長及高度設置為相等,例如邊長及高度均為500μm。 In this embodiment, the cavity 1223 is a hollow regular hexagonal prism. In an embodiment, the side length and height of the regular hexagonal prism are set to be equal, for example, the side length and height are both 500 μm.
緩衝層122藉由將腔體1223設置為複數,使得吸附裝置100於使用過程中,即使某一腔體1223發生破損,其他未破損之腔體1223亦得正常工作,不會導致緩衝層122整個損壞,提高了吸附裝置100之整體穩定性。 The buffer layer 122 has a plurality of cavities 1223, so that during the use of the adsorption device 100, even if one of the cavities 1223 is damaged, other unbroken cavities 1223 will work normally, which will not cause the entirety of the buffer layer 122. The damage improves the overall stability of the adsorption device 100.
吸附裝置100還可包括連接板130,其與緩衝層122之第一端1221連接並封閉腔體1223位於第一端1221之開口。緩衝層122藉由連接板130與施力結構110連接。 The adsorption device 100 may further include a connection plate 130 that is connected to the first end 1221 of the buffer layer 122 and closes the opening of the cavity 1223 at the first end 1221. The buffer layer 122 is connected to the force applying structure 110 through the connection plate 130.
參考圖1~圖3,每一個施力單元111可對應為一個或複數特定之腔體1223提供壓力。操作時,可選擇性之將所有施力單元111中之某一個或某幾個施力單元111開啟,其餘施力單元111關閉,以實現對緩衝層122之全部或部分腔體1223施加壓力。 Referring to FIG. 1 to FIG. 3, each of the force applying units 111 may correspondingly provide pressure to one or a plurality of specific cavities 1223. During operation, one or several of the force applying units 111 may be selectively turned on, and the remaining force applying units 111 may be turned off to apply pressure to all or part of the cavity 1223 of the buffer layer 122.
於一實施例中,當待貼合物件與吸附裝置100接觸之面積小於彈性接觸部1211所能吸附之面積時,只需於與待貼合物件接觸之彈性接觸部1211對應之腔體1223施加壓力,其餘之部分不需要施加壓力。 In an embodiment, when the area of the contact piece to be bonded with the adsorption device 100 is smaller than the area that can be adsorbed by the elastic contact portion 1211, it is only necessary to apply to the cavity 1223 corresponding to the elastic contact portion 1211 in contact with the piece to be bonded. Pressure, the rest need not apply pressure.
於一實施例中,待貼合物件與彈性接觸部1211之接觸面各處施加之壓力亦可能不同。例如於接觸面為不平整表面時,需要相對較大之壓力;於平整之表面時,則需要相對較小之壓力等。 In one embodiment, the pressure applied by the contact surfaces of the component to be laminated and the elastic contact portion 1211 may also be different. For example, when the contact surface is an uneven surface, a relatively large pressure is required; when the contact surface is a flat surface, a relatively small pressure is required.
於一實施例中,接觸層121及緩衝層122均為聚二甲基矽氧烷(polydimethylsiloxane,PDMS),該材料之彈性接觸部1211楊氏模數一般於1~10MPa之間,低於傳統橡膠,其模厚與楊氏模數之間之關係如圖4所示,圖4中橫坐標表示PDMS之厚度,而縱坐標則表示楊氏模數。當待貼合物件與彈性接觸部1211之接觸面不平整時,彈性接觸部1211因為楊氏模數一般於1~10MPa之間,低於傳統橡膠,因此相對具有較高之彈性,得對待貼合物件不平整接觸面之形狀進行仿形,藉由施力結構110提供之壓力,得與待貼合物件之接觸面良好地緊密接觸,彈性接觸部1211利用分子間之作用力,將待貼合物件吸附起來。 In an embodiment, the contact layer 121 and the buffer layer 122 are both polydimethylsiloxane (PDMS). The elastic contact portion 1211 of the material has a Young's modulus generally between 1 and 10 MPa, which is lower than that of the conventional method. The relationship between the modulus of rubber and the Young's modulus is shown in Fig. 4, where the abscissa represents the thickness of the PDMS, and the ordinate represents the Young's modulus. When the contact surface between the piece to be laminated and the elastic contact portion 1211 is uneven, the elastic contact portion 1211 has a relatively high elasticity because the Young's modulus is generally between 1 and 10 MPa, which is lower than that of traditional rubber. The shape of the uneven contact surface of the composite part is profiled, and the pressure provided by the force applying structure 110 can be in good close contact with the contact surface of the component to be bonded. The elastic contact portion 1211 uses the intermolecular force to The composite pieces are adsorbed.
本實施例中,連接板130亦為PDMS,厚度大於500μm,則施力結構110對緩衝層122施加壓力時,緩衝層122為彈性材料,會發生形變,則連接板130亦會產生形變。 In this embodiment, the connecting plate 130 is also PDMS, and the thickness is greater than 500 μm. When the force applying structure 110 applies pressure to the buffer layer 122, the buffer layer 122 is an elastic material, and the connecting plate 130 will also be deformed.
於一實施例中,接觸層121由軟成型(Soft-Molding)方式使用PDMS製備而成。參見圖5,由軟成型(Soft-Molding)方式製作接觸層121之流程則如下:步驟S1,將聚二甲基矽氧烷與樹脂以10:1之質量比混合,形成混合液;步驟S2,對混合液進行真空脫泡;步驟S3,將利於脫模之塗層均勻塗布於矽膠模具上並等待乾燥;步驟S4,將混合液塗於矽膠模具內;步驟S5,於70℃下加熱塗覆有混合液之矽膠模具1.5小時後退火,使矽膠模具內之混合液固化得到接觸層;步驟S6,使用脫模刀將矽膠模具與接觸層分開。 In one embodiment, the contact layer 121 is prepared by a soft-molding method using PDMS. Referring to FIG. 5, the process of making the contact layer 121 by the soft-molding method is as follows: Step S1, mixing polydimethylsiloxane and resin at a mass ratio of 10: 1 to form a mixed solution; Step S2 Vacuum defoaming the mixed solution; step S3, uniformly coat the mold-friendly coating on the silicone mold and wait for drying; step S4, apply the mixed liquid in the silicone mold; step S5, heat-coat at 70 ° C The silicone mold covered with the mixed solution is annealed for 1.5 hours, and then the mixed solution in the silicone mold is cured to obtain a contact layer. In step S6, the silicone mold is separated from the contact layer by using a mold release knife.
上述之矽膠模具之型腔具有與接觸層121相應之結構,上述形成之接觸層121包括基底1210及由基底1210之一表面凸伸出之複數間隔排列之彈性接觸部1211。於一實施例中,還可於步驟S6之前,塗覆防刮或防髒之塗層以提高接觸層121之製作質量。 The cavity of the above-mentioned silicon mold has a structure corresponding to the contact layer 121. The contact layer 121 formed above includes a base 1210 and a plurality of elastic contact portions 1211 arranged at intervals from a surface of the base 1210. In one embodiment, before step S6, a scratch-resistant or anti-dirty coating can be applied to improve the manufacturing quality of the contact layer 121.
緩衝層122之製作方式與接觸層121之製作方式相同,於一實施例中,緩衝層122之高度可設置為500μm。於分別形成緩衝層122及接觸層121之後將接觸層121與緩衝層122使用熱固化黏膠劑或紫外線固化黏膠劑進行貼合,並進行熱或紫外線處理。 The manufacturing method of the buffer layer 122 is the same as that of the contact layer 121. In one embodiment, the height of the buffer layer 122 can be set to 500 μm. After the buffer layer 122 and the contact layer 121 are respectively formed, the contact layer 121 and the buffer layer 122 are bonded using a heat-curable adhesive or an ultraviolet-curable adhesive, and subjected to heat or ultraviolet treatment.
本實施例中,基底1210及彈性接觸部1211一起製作成型,再將基底1210未形成彈性接觸部1211之一面與緩衝層122之第二端1222貼合,然後將連接板130與緩衝層122於空氣下貼合,使得緩衝層122形成氣密結構。 In this embodiment, the base 1210 and the elastic contact portion 1211 are formed together, and then one surface of the base 1210 on which the elastic contact portion 1211 is not formed is bonded to the second end 1222 of the buffer layer 122, and then the connecting plate 130 and the buffer layer 122 are bonded to Under air bonding, the buffer layer 122 forms an air-tight structure.
於一實施例中,連接板130與緩衝層122亦可一起製作成型,然後再將基底1210未形成彈性接觸部1211之一面與緩衝層122之第二端1222貼合。 In an embodiment, the connecting plate 130 and the buffer layer 122 can also be formed together, and then one surface of the base 1210 on which the elastic contact portion 1211 is not formed is bonded to the second end 1222 of the buffer layer 122.
於一實施例中,接觸層121、緩衝層122亦可藉由3D打印之方式分別成型再進行貼合。 In one embodiment, the contact layer 121 and the buffer layer 122 can also be separately molded and then bonded by 3D printing.
於一實施例中,基底1210及緩衝層122之第二端1222之間藉由黏膠貼合,連接板130及緩衝層122之第一端1221之間亦可藉由黏膠貼合,例如,黏膠可為PU或SU8膠。 In an embodiment, the substrate 1210 and the second end 1222 of the buffer layer 122 are bonded by adhesive, and the connection plate 130 and the first end 1221 of the buffer layer 122 may also be bonded by adhesive, for example, , Adhesive can be PU or SU8 glue.
本實施例中之吸附裝置100,緩衝層122及所有彈性接觸部1211均採用高彈性之材料製成(例如PDMS,楊氏模數一般於1~10MPa之間,低於傳統橡膠)。當施力結構110施加壓力時,緩衝層122起到緩衝作用,對壓力進行均衡分配再施加至彈性接觸部1211,彈性接觸部1211受到壓力,可對待貼合物件進行緊貼,並且由於緩衝層122及所有彈性接觸部1211均具有彈性其具備較好之彈性,可對待貼合物件之接觸面進行仿形,即使待貼合物件與彈性接觸部1211之接觸面不平整,對待貼合物件與彈性接觸部1211接觸之表面各處均可良好接觸,彈性接觸部1211再利用分子間之作用力,將待貼合物件吸附起來,從而提高對表面不平整之貼合物件之吸附效果。 In this embodiment, the adsorption device 100, the buffer layer 122, and all the elastic contact portions 1211 are made of a highly elastic material (for example, PDMS, the Young's modulus is generally between 1 and 10 MPa, which is lower than that of traditional rubber). When pressure is applied by the force applying structure 110, the buffer layer 122 plays a buffering role, distributes the pressure in a balanced manner, and then applies it to the elastic contact portion 1211. The elastic contact portion 1211 is under pressure and can be closely adhered to the laminated component. 122 and all the elastic contact portions 1211 have elasticity, which has good elasticity, and can be contoured to the contact surface of the laminated component. The surface contacted by the elastic contact portion 1211 can be in good contact everywhere, and the elastic contact portion 1211 reuses the intermolecular force to adsorb the components to be bonded, thereby improving the adsorption effect on the components with uneven surfaces.
如圖6A~6E所示,為吸附裝置100之工作過程之示意:如圖6A所示,吸附裝置100於馬達之驅動下位移至第一待貼合物件200所於之位置。 As shown in FIGS. 6A to 6E, it is a schematic diagram of the working process of the adsorption device 100. As shown in FIG. 6A, the adsorption device 100 is moved to the position where the first to-be-attached piece 200 is driven by the motor.
如圖6B所示,吸附裝置100與第一待貼合物件200接觸。 As shown in FIG. 6B, the adsorption device 100 is in contact with the first piece to be bonded 200.
如圖6C所示,貼合吸附裝置100吸附住第一待貼合物件200,於馬達之驅動下帶動第一待貼合物件200移動至第二待貼合物件300所於之位置。 As shown in FIG. 6C, the bonding and adsorption device 100 adsorbs the first to-be-bonded piece 200 and drives the first to-be-bonded piece 200 to the position where the second to-be-bonded piece 300 is driven by the motor.
如圖6D所示,吸附裝置100將第一待貼合物件200放置於第二待貼合物件300上,以使得第一待貼合物件200及第二待貼合物件300完成貼合。 As shown in FIG. 6D, the adsorption device 100 places the first to-be-attached piece 200 on the second to-be-attached piece 300, so that the first to-be-attached piece 200 and the second to-be-attached piece 300 are attached together.
如圖6E所示,第一待貼合物件200及第二待貼合物件300貼合完成,貼合吸附裝置100與第一待貼合物件200脫離。 As shown in FIG. 6E, the bonding of the first to-be-bonded piece 200 and the second to-be-bonded piece 300 is completed, and the bonding adsorption device 100 is detached from the first to-be-bonded piece 200.
請參見圖7,本實施例還提供一種貼合系統400,貼合系統400還包括上平臺410及下平臺420;其中,上平臺410包括上述之吸附裝置100,吸附裝置100用於固定(吸附)第一待貼合物件200,下平臺420則用於固定第二待貼合物件300。上平臺410還包括位移控制器411,用於帶動施力結構110、緩衝層122及複數彈性接觸部1211於三維方向位移。 Referring to FIG. 7, this embodiment also provides a bonding system 400. The bonding system 400 further includes an upper platform 410 and a lower platform 420. The upper platform 410 includes the adsorption device 100 described above, and the adsorption device 100 is used for fixing (adsorption). ) The first to-be-attached piece 200, and the lower platform 420 is used to fix the second to-be-attached piece 300. The upper platform 410 further includes a displacement controller 411 for driving the force applying structure 110, the buffer layer 122, and the plurality of elastic contact portions 1211 to be displaced in a three-dimensional direction.
請參見圖8,圖8為圖7中位移控制器411及吸附裝置100之結構圖,位移控制器411包括基板4111及懸臂4112,用於帶動施力結構110、緩衝層122及複數彈性接觸部1211於三維方向位移。其中,基板4111與施力結構110連接,懸臂4112則與基板4111連接。於一實施例中,位移控制器411藉由馬達進行驅動。貼合系統400藉由上平臺410及下平臺420即可將第一待貼合物件200及第二待貼合物件300進行貼合。本實施例提供之貼合系統400,得實現如上述之吸附裝置100之所有有益效果。 Please refer to FIG. 8. FIG. 8 is a structural diagram of the displacement controller 411 and the adsorption device 100 in FIG. 7. The displacement controller 411 includes a substrate 4111 and a cantilever 4112 for driving the force applying structure 110, the buffer layer 122 and a plurality of elastic contact portions. 1211 is displaced in three dimensions. The substrate 4111 is connected to the force applying structure 110, and the cantilever 4112 is connected to the substrate 4111. In one embodiment, the displacement controller 411 is driven by a motor. The bonding system 400 can bond the first to-be-bonded piece 200 and the second to-be-bonded piece 300 through the upper platform 410 and the lower platform 420. The bonding system 400 provided in this embodiment can achieve all the beneficial effects of the adsorption device 100 as described above.
本技術領域之普通技術人員應當認識到,以上之實施方式僅是用來說明本發明,而並非用作為對本發明之限定,只要於本發明之實質精神範圍之內,對以上實施例所作之適當改變及變化均落於本發明要求保護之範圍之內。 Those of ordinary skill in the art should recognize that the above embodiments are only used to illustrate the present invention, and are not intended to limit the present invention, as long as they are within the scope of the essential spirit of the present invention, the above embodiments are appropriately made. Changes and variations are all within the scope of the present invention.
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