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TWI641427B - Coating liquid coating device and coating method for curved substrate - Google Patents

Coating liquid coating device and coating method for curved substrate Download PDF

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Publication number
TWI641427B
TWI641427B TW105117413A TW105117413A TWI641427B TW I641427 B TWI641427 B TW I641427B TW 105117413 A TW105117413 A TW 105117413A TW 105117413 A TW105117413 A TW 105117413A TW I641427 B TWI641427 B TW I641427B
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Taiwan
Prior art keywords
coating
slit nozzle
coating liquid
slit
curved substrate
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TW105117413A
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Chinese (zh)
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TW201733686A (en
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岩成賢治
戶內八郎
神戶壽夫
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日商中外爐工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • B05C5/0258Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1007Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials

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  • Coating Apparatus (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

一種對曲面基材之塗布液之塗布裝置,其特徵在於包含:貯留槽,貯留塗布液;狹縫噴嘴,將塗布液塗布於曲面基材;供給部,將塗布液從貯留槽往狹縫噴嘴供給;控制部,控制塗布裝置;控制部以令往狹縫噴嘴之塗布液之供給壓力或供給量一定的方式而控制供給部,再者,以令狹縫噴嘴之移動速度是與從狹縫噴嘴之狹縫前端部至曲面基材之塗布面為止的距離成反比的方式而控制狹縫噴嘴。 A coating device for a coating liquid for a curved substrate, which comprises: a storage tank for storing the coating liquid; a slit nozzle for coating the coating liquid on the curved substrate; and a supplying part for coating the liquid from the storage tank to the slit nozzle. The control unit controls the coating device. The control unit controls the supply unit such that the supply pressure or supply amount of the coating liquid to the slit nozzle is constant. Furthermore, the movement speed of the slit nozzle is controlled from the slit. The slit nozzle is controlled so that the distance from the tip end portion of the nozzle to the coating surface of the curved substrate is inversely proportional.

Description

對曲面基材的塗布液塗布裝置及塗布方法 Coating liquid coating device and coating method for curved substrate 發明領域 Field of invention

本發明是涉及對曲面基材的塗布液塗布裝置及其塗布方法。 The invention relates to a coating liquid coating device and a coating method for a curved substrate.

發明背景 Background of the invention

近年來,在顯示面板之市場等,表面是凸狀曲面且背面是平面之片側凸玻璃之需求逐漸升高,該片側凸玻璃之製造是在凸狀曲面玻璃之背面(凹狀曲面)將接著劑平坦地塗布,而與平面玻璃貼合。 In recent years, in the market of display panels, the demand for sheet-side convex glass with a convex curved surface and a flat surface at the back has gradually increased. The manufacture of the sheet-side convex glass is continued on the back (concave curved surface) of the convex curved glass. The agent is applied evenly and bonded to a flat glass.

習知,要將如接著劑般之塗布液塗布在在平面玻璃的情況下,會使用如專利文獻1所示之平台塗布機(table coater)。另外,要將如接著劑般之塗布液塗布在凹狀曲面的情況下,有如專利文獻2所示之使用圓弧狀之噴嘴而塗布、或如專利文獻3所示之在凹狀曲面之最上位部分進行塗布且讓塗布液因為自身重量而在凹狀曲面上移動之方法。 Conventionally, when a coating liquid such as an adhesive is to be applied to flat glass, a table coater as shown in Patent Document 1 is used. In addition, when a coating liquid such as an adhesive is to be applied to a concave curved surface, there is a coating method using an arc-shaped nozzle as shown in Patent Document 2 or the most on the concave curved surface as shown in Patent Document 3. A method in which the upper part is coated and the coating liquid is moved on the concave curved surface due to its own weight.

先行技術文獻 Advance technical literature 專利文獻 Patent literature

[專利文獻1]日本特開2002-200450號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2002-200450

[專利文獻2]日本特開2004-167422號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2004-167422

[專利文獻3]日本特開2011-256060號公報 [Patent Document 3] Japanese Patent Application Laid-Open No. 2011-256060

發明概要 Summary of invention

然而,上述之方法皆難以在將塗布液塗布於凹狀曲面時以令所塗布之塗布液之上面成為平面的方式來塗布。 However, all of the methods described above are difficult to apply when the coating liquid is applied to the concave curved surface so that the upper surface of the applied coating liquid becomes flat.

於是,本發明之目的是提供當對曲面基材塗布塗布液時令所塗布之塗布液之上面成為平面的塗布液塗布裝置及塗布方法。 Then, an object of the present invention is to provide a coating liquid coating device and a coating method for making the upper surface of the coated coating liquid flat when the coating liquid is coated on a curved substrate.

本申請案之第1發明是對曲面基材之塗布液之塗布裝置,其特徵在於包含:貯留槽,貯留前述塗布液;狹縫噴嘴,將前述塗布液塗布於前述曲面基材;供給部,將前述塗布液從前述貯留槽往前述狹縫噴嘴供給;及控制部,控制前述塗布裝置;前述控制部控制前述供給部使其供給至前述狹縫噴嘴之前述塗布液之供給壓力一定,再者,以令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止的距離成反比的方式來控制前述狹縫噴嘴。 The first invention of the present application is a coating liquid coating device for a curved substrate, which includes a storage tank for storing the coating liquid, a slit nozzle for coating the coating liquid on the curved substrate, and a supply unit. Supplying the coating liquid from the storage tank to the slit nozzle; and a control unit that controls the coating device; the control unit controls the supply unit so that the supply pressure of the coating liquid that is supplied to the slit nozzle is constant, and The slit nozzle is controlled such that a moving speed of the slit nozzle is inversely proportional to a distance from a slit front end portion of the slit nozzle to a coating surface of the curved substrate.

根據前述構成,在令往狹縫噴嘴之塗布液之供給壓力一定之狀態下,以令狹縫噴嘴之移動速度是與從狹縫前端部至曲面基材為止之距離成反比的方式而控制狹縫噴嘴,藉此,能以令塗布液之上面成為平面的方式而對曲面基材塗布塗布液。 According to the foregoing configuration, in a state where the supply pressure of the coating liquid to the slit nozzle is constant, the slit nozzle is controlled so that the moving speed of the slit nozzle is inversely proportional to the distance from the slit tip to the curved substrate. By slitting the nozzle, the coating liquid can be applied to the curved substrate so that the upper surface of the coating liquid becomes flat.

本申請案之第2發明是對曲面基材之塗布液之塗布裝置,其特徵在於包含:貯留槽,貯留前述塗布液;狹縫噴嘴,將前述塗布液塗布於前述曲面基材;供給部,將前述塗布液從前述貯留槽往前述狹縫噴嘴供給;及控制部,控制前述塗布裝置;前述控制部控制前述供給部使其供給至前述狹縫噴嘴之前述塗布液之供給量一定,再者,以令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止的距離成反比的方式來控制前述狹縫噴嘴。 The second invention of the present application is a coating liquid coating device for a curved substrate, which includes a storage tank that stores the coating liquid, a slit nozzle that applies the coating liquid to the curved substrate, and a supply unit. Supplying the coating liquid from the storage tank to the slit nozzle; and a control unit that controls the coating device; the control unit controls the supply unit so that a supply amount of the coating liquid that is supplied to the slit nozzle is constant, and The slit nozzle is controlled such that a moving speed of the slit nozzle is inversely proportional to a distance from a slit front end portion of the slit nozzle to a coating surface of the curved substrate.

根據前述構成,在令往狹縫噴嘴之塗布液之供給量一定之狀態下,以令狹縫噴嘴之移動速度是與從狹縫前端部至曲面基材為止之距離成反比的方式而控制狹縫噴嘴,藉此,能以令塗布液之上面成為平面的方式而對曲面基材塗布塗布液。 According to the foregoing configuration, the slit is controlled so that the moving speed of the slit nozzle is inversely proportional to the distance from the tip of the slit to the curved substrate while the supply amount of the coating liquid to the slit nozzle is constant. By slitting the nozzle, the coating liquid can be applied to the curved substrate so that the upper surface of the coating liquid becomes flat.

前述第1發明及前述第2發明更宜具有如下之構成。 The first invention and the second invention preferably have the following configurations.

(1)前述曲面基材之塗布面具有凹狀曲面。 (1) The coating surface of the curved substrate has a concave curved surface.

根據前述構成(1),可將接著劑當作塗布液而塗布在凹狀曲面,藉此,以令接著劑之上面成為平面的方式而在凹狀曲面塗布接著劑。結果,凸狀曲面玻璃與平面玻璃之貼合變得容易,可容易地形成片側凸玻璃。 According to the said structure (1), an adhesive agent can be apply | coated to a concave curved surface as a coating liquid, and an adhesive agent can be apply | coated to a concave curved surface so that the upper surface of an adhesive agent may become flat. As a result, the bonding of the convex curved glass and the flat glass becomes easy, and the sheet-side convex glass can be easily formed.

本申請案之第3發明是對曲面基材之塗布液之塗布方法,其特徵在於:將供給至狹縫噴嘴之前述塗布液之供給壓力設為一定,該狹縫噴嘴係將前述塗布液塗布在前述曲面基材;令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止之距離成反比,來移動前述狹縫噴嘴。 The third invention of the present application is a method for applying a coating liquid to a curved substrate, characterized in that the supply pressure of the coating liquid to be supplied to a slit nozzle is constant, and the slit nozzle is to apply the coating liquid On the curved substrate, the moving speed of the slit nozzle is made inversely proportional to the distance from the front end of the slit of the slit nozzle to the coating surface of the curved substrate, to move the slit nozzle.

根據前述構成,在令往狹縫噴嘴之塗布液之供給壓力一定之狀態下,以與從狹縫前端部至曲面基材為止之距離成反比的方式而將狹縫噴嘴移動,藉此,能以令塗布液之上面成為平面的方式而對曲面基材塗布塗布液。 According to the aforementioned configuration, the slit nozzle can be moved in an inversely proportional manner to the distance from the front end of the slit to the curved substrate while the supply pressure of the coating liquid to the slit nozzle is constant. The coating liquid is applied to a curved substrate so that the upper surface of the coating liquid becomes flat.

本申請案之第4發明是對曲面基材之塗布液之塗布方法,其特徵在於:將供給至狹縫噴嘴之前述塗布液之供給量設為一定,該狹縫噴嘴係將前述塗布液塗布在前述曲面基材;令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止之距離成反比,來移動前述狹縫噴嘴。 The fourth invention of the present application is a method for applying a coating liquid to a curved substrate, characterized in that the supply amount of the coating liquid to be supplied to a slit nozzle is constant, and the slit nozzle is to apply the coating liquid On the curved substrate, the moving speed of the slit nozzle is made inversely proportional to the distance from the front end of the slit of the slit nozzle to the coating surface of the curved substrate, to move the slit nozzle.

根據前述構成,在令往狹縫噴嘴之塗布液之供 給量一定之狀態下,以與從狹縫前端部至曲面基材為止之距離成反比的方式而將狹縫噴嘴移動,藉此,能以令塗布液之上面成為平面的方式而對曲面基材塗布塗布液。 According to the foregoing configuration, the supply of the coating liquid to the slit nozzle is supplied. The slit nozzle is moved in a manner inversely proportional to the distance from the front end of the slit to the curved base material under a given amount of the feed, whereby the curved base can be applied to the curved surface so that the upper surface of the coating liquid becomes flat. Wood coating solution.

總而言之,根據本發明,可提供當對曲面基材塗布塗布液時令所塗布之塗布液之上面成為平面的塗布液塗布裝置及塗布方法。 In summary, according to the present invention, it is possible to provide a coating liquid coating apparatus and a coating method that make the upper surface of the coated coating liquid flat when the coating liquid is coated on a curved substrate.

1‧‧‧貯留槽 1‧‧‧ storage tank

2‧‧‧保持托盤 2‧‧‧ holding tray

3‧‧‧狹縫噴嘴 3‧‧‧Slot Nozzle

3a‧‧‧狹縫前端部 3a‧‧‧Slit front end

3b‧‧‧吐出口 3b‧‧‧Eject

4‧‧‧供給部 4‧‧‧ Supply Department

10‧‧‧塗布裝置 10‧‧‧ Coating device

11‧‧‧曲面基材 11‧‧‧ curved substrate

11a‧‧‧塗布面 11a‧‧‧ coated surface

12‧‧‧兩通閥 12‧‧‧ Two-way valve

20‧‧‧臺 20‧‧‧units

21‧‧‧夾持構件 21‧‧‧Clamping member

21a‧‧‧鉛直部分 21a‧‧‧Vertical section

21b‧‧‧水平部分 21b‧‧‧Horizontal Section

22‧‧‧夾持構件 22‧‧‧Clamping member

23‧‧‧支持構件 23‧‧‧ supporting components

23a‧‧‧支持部 23a‧‧‧Support Department

23b‧‧‧賦予勢能構件 23b‧‧‧ Empowerment

23c‧‧‧管狀構件 23c‧‧‧tubular member

24‧‧‧支持構件 24‧‧‧ supporting components

25‧‧‧夾持構件 25‧‧‧ clamping member

26‧‧‧夾持構件 26‧‧‧Clamping member

27‧‧‧支持構件 27‧‧‧ supporting components

28‧‧‧支持構件 28‧‧‧ supporting components

43‧‧‧馬達 43‧‧‧ Motor

44‧‧‧注射泵 44‧‧‧ Syringe Pump

45‧‧‧第1供給管路 45‧‧‧The first supply line

48‧‧‧三通閥 48‧‧‧Three-way valve

49‧‧‧第2供給管路 49‧‧‧ 2nd supply line

201‧‧‧滾珠螺桿 201‧‧‧ Ball Screw

202‧‧‧把手 202‧‧‧handle

203‧‧‧移動台 203‧‧‧mobile station

A‧‧‧長度 A‧‧‧ length

B‧‧‧長度 B‧‧‧ length

C‧‧‧長度 C‧‧‧ length

D‧‧‧從狹縫噴嘴之前端部至曲面基材之塗布面為止的距離 D‧‧‧The distance from the front end of the slit nozzle to the coating surface of the curved substrate

X‧‧‧方向 X‧‧‧ direction

Y‧‧‧方向 Y‧‧‧ direction

[圖1]與本發明之實施形態相關之塗布裝置的概略圖。 [Fig. 1] A schematic view of a coating apparatus according to an embodiment of the present invention.

[圖2]狹縫噴嘴部分之附近的概略立體圖。 [Fig. 2] A schematic perspective view of the vicinity of a slit nozzle portion.

[圖3]保持托盤的正面概略圖。 [Fig. 3] A schematic front view of a holding tray.

[圖4]顯示曲面基材上之狹縫噴嘴之位置與從狹縫前端部至塗布面為止之距離、狹縫噴嘴之移動速度、狹縫噴嘴之吐出量或吐出壓力之關係的圖表。 [Fig. 4] A graph showing the relationship between the position of the slit nozzle on the curved substrate and the distance from the front end of the slit to the coating surface, the moving speed of the slit nozzle, the discharge amount of the slit nozzle, or the discharge pressure.

[圖5]顯示與其他實施形態相關之對應圖4的圖表。 [Fig. 5] A diagram corresponding to Fig. 4 showing other embodiments.

[圖6]顯示與其他實施形態相關之對應圖4的圖表。 [Fig. 6] A diagram corresponding to Fig. 4 showing other embodiments.

用以實施發明之形態 Forms used to implement the invention

(整體構成) (Overall composition)

圖1是與本發明之實施形態相關之塗布裝置10的概略圖。如圖1所示,塗布裝置10具有貯留塗布液之貯留槽1、將塗布液塗布在保持托盤2上之曲面基材11之狹縫噴嘴3、將塗布液從貯留槽1往狹縫噴嘴3供給之供給部4、控制塗 布裝置10之控制部。狹縫噴嘴3是平台塗布機用之狹縫噴嘴,該平台塗布機是在噴嘴本身形成有用於吐出塗布液之預定寬度之狹縫、藉由令狹縫噴嘴3移動而將塗布液塗布在基材。 FIG. 1 is a schematic diagram of a coating apparatus 10 according to an embodiment of the present invention. As shown in FIG. 1, the coating apparatus 10 includes a storage tank 1 for storing a coating liquid 1, a slit nozzle 3 for coating the coating liquid on a curved substrate 11 on a holding tray 2, and a coating liquid from the storage tank 1 to the slit nozzle 3. Supply supply part 4, control coating Control unit of the cloth device 10. The slit nozzle 3 is a slit nozzle for a flatbed coating machine. The flatbed coating machine is formed with a slit of a predetermined width for discharging the coating liquid in the nozzle itself, and the coating liquid is coated on the substrate by moving the slit nozzle 3. material.

於貯留槽1有供給高壓空氣,藉由該高壓空氣之壓力而將塗布液從下方擠出去。附帶一提,亦可以不使用高壓空氣而是藉由重力來讓貯留槽1內之塗布液擠出去。 The storage tank 1 is supplied with high-pressure air, and the coating liquid is squeezed out from below by the pressure of the high-pressure air. Incidentally, instead of using high-pressure air, the coating liquid in the storage tank 1 may be squeezed out by gravity.

貯留槽1是透過兩通閥12而與供給部4連接。供給部4具有藉由馬達43來驅動之注射泵44、及三通閥48。貯留槽1是透過兩通閥12而與第1供給管路45連接,第1供給管路45是透過三通閥48而與注射泵44連接。注射泵44是透過三通閥48而與第2供給管路49連接。第2供給管路49是與狹縫噴嘴3連接。狹縫噴嘴3可相對於保持托盤2而移動於水平方向,藉由從狹縫噴嘴3塗布之塗布液,而在保持托盤2上之曲面基材11形成塗膜。附帶一提,控制部是藉由控制供給部4(具體而言,控制藉由馬達43來驅動之注射泵44之運作及三通閥48之運作),而控制從貯留槽1往狹縫噴嘴3之塗布液之供給壓力及/或供給量。 The storage tank 1 is connected to the supply unit 4 through a two-way valve 12. The supply unit 4 includes a syringe pump 44 driven by a motor 43 and a three-way valve 48. The storage tank 1 is connected to a first supply line 45 through a two-way valve 12, and the first supply line 45 is connected to a syringe pump 44 through a three-way valve 48. The syringe pump 44 is connected to the second supply line 49 through a three-way valve 48. The second supply line 49 is connected to the slit nozzle 3. The slit nozzle 3 can be moved in a horizontal direction relative to the holding tray 2, and a coating film is formed on the curved substrate 11 on the holding tray 2 by the coating liquid applied from the slit nozzle 3. Incidentally, the control unit controls the operation from the storage tank 1 to the slit nozzle by controlling the supply unit 4 (specifically, the operation of the injection pump 44 and the three-way valve 48 driven by the motor 43). Supply pressure and / or supply amount of the coating liquid of 3.

圖2是狹縫噴嘴3部分附近的概略立體圖。如圖2所示,在狹縫噴嘴3,身為塗布液之吐出口之狹縫是在狹縫噴嘴3之噴嘴移動方向(X方向)只形成預定寬,朝與X方向正交之狹縫方向Y延伸而形成。於是,可藉由令狹縫噴嘴3朝X方向移動,而在保持托盤2上之曲面基材11以預定寬來塗布塗布液。控制部可調整狹縫噴嘴3之X方向之移動 速度。具體而言,控制部以令狹縫噴嘴3之X方向之移動速度是與從狹縫噴嘴3之狹縫前端部3a至曲面基材11之塗布面11a為止的距離D成反比的方式而控制狹縫噴嘴3。 FIG. 2 is a schematic perspective view of the vicinity of the slit nozzle 3 portion. As shown in FIG. 2, in the slit nozzle 3, a slit serving as a discharge port of the coating liquid is a slit having a predetermined width in the nozzle moving direction (X direction) of the slit nozzle 3 and orthogonal to the X direction. The direction Y is extended. Then, the coating liquid can be applied to the curved base material 11 on the holding tray 2 by a predetermined width by moving the slit nozzle 3 in the X direction. The control unit can adjust the X-direction movement of the slit nozzle 3 speed. Specifically, the control unit controls the movement speed in the X direction of the slit nozzle 3 to be inversely proportional to the distance D from the slit front end portion 3 a of the slit nozzle 3 to the coating surface 11 a of the curved substrate 11. Slit nozzle 3.

關於曲面基材11,從Y方向看起來是以朝下方突出的方式彎曲而在上面之塗布面11a具有凹狀曲面,並且,凹狀曲面具有一定之曲率。而且,曲面基材11具有令凹狀曲面朝Y方向延伸之構成。 The curved base material 11 is curved from the Y direction so as to protrude downward, and the upper coating surface 11a has a concave curved surface, and the concave curved surface has a certain curvature. The curved base material 11 has a configuration in which a concave curved surface extends in the Y direction.

另外,於曲面基材11塗布之塗布液宜具有觸變性。觸變性是顯示出如凝膠般之塑性固體與如溶膠般之非牛頓液體的中間物質的性質,意指黏度會隨著時間經過而變化之性質。具體而言,若持續承受剪應力則黏度會逐漸降低而變成液狀,若靜止則黏度會逐漸上昇而最後變成固體狀。在本實施形態,塗布液是具有觸變性,藉此,塗布液在從狹縫噴嘴3吐出時是被賦予剪應力而液狀化,塗布在曲面基材11後是黏度逐漸上昇而最後變成固體狀。總而言之是平常高黏度但賦予壓力時黏度降低、流動性變佳之液體(較常見之例子是如油漆、番茄醬、美乃滋),適合用在如本發明般之有塗料從塗膜厚的地方往塗膜薄的地方流出之虞的情況,在賦予壓力而流動性佳地進行吐出之後,當附著於塗布面時黏度上昇而不易流出。 In addition, the coating liquid applied to the curved substrate 11 is preferably thixotropic. Thixotropy is a property that shows an intermediate between a plastic solid like a gel and a non-Newtonian liquid like a sol, meaning a property that viscosity changes over time. Specifically, if continuously subjected to shear stress, the viscosity will gradually decrease and become liquid, and if it is stationary, the viscosity will gradually increase and finally become solid. In this embodiment, the coating liquid is thixotropic, whereby the coating liquid is liquefied by being given a shearing stress when it is discharged from the slit nozzle 3, and the viscosity gradually increases after coating on the curved substrate 11 and finally becomes solid. shape. All in all, it is usually a liquid with a high viscosity but a reduced viscosity and better fluidity when pressure is applied (more common examples are paint, tomato sauce, mayonnaise), and it is suitable for use in coatings with thick coatings as in the present invention. In the case where the coating film is thin, it may flow out. After pressure is applied and the liquid is discharged with good fluidity, the viscosity increases when adhered to the coating surface, making it difficult to flow out.

(保持托盤) (Holding tray)

圖3是保持托盤2的正面概略圖。如圖2及圖3所示,對曲面基材11進行保持之保持托盤2是在狹縫噴嘴3之狹縫方向(Y方向)之一端部具有一對之夾持構件21、22及支持構 件23、24,前者是在狹縫噴嘴3之噴嘴移動方向(X方向)之曲面基材11之兩端部將曲面基材11夾於其間而保持,後者是在X方向上配置於一對之夾持構件21、22之間而從下方支持曲面基材11。並且,保持托盤2是在狹縫噴嘴3之狹縫方向(Y方向)之另一端部具有一對之夾持構件25、26及支持構件27、28,前者是在狹縫噴嘴3之噴嘴移動方向(X方向)之曲面基材11之兩端部將曲面基材11夾於其間而保持,後者是在X方向上配置於一對之夾持構件25、26之間而從下方支持曲面基材11。而且,夾持構件21與支持構件23、及、夾持構件25與支持構件27是在狹縫噴嘴3之狹縫方向(Y方向)之曲面基材11之兩端部設成一對,夾持構件22與支持構件24、及、夾持構件26與支持構件28是在狹縫噴嘴3之狹縫方向(Y方向)之曲面基材11之兩端部設成一對。 FIG. 3 is a schematic front view of the holding tray 2. As shown in FIGS. 2 and 3, the holding tray 2 that holds the curved substrate 11 has a pair of clamping members 21 and 22 and a supporting structure at one end of the slit nozzle 3 in the slit direction (Y direction). 23, 24, the former is to hold the curved substrate 11 between the two ends of the curved substrate 11 in the nozzle moving direction (X direction) of the slit nozzle 3, and the latter is arranged in a pair in the X direction The curved base material 11 is supported from below between the sandwiching members 21 and 22. The holding tray 2 has a pair of holding members 25 and 26 and supporting members 27 and 28 at the other end of the slit nozzle 3 in the slit direction (Y direction). The former is moved by the nozzle of the slit nozzle 3 Both sides of the curved base material 11 in the direction (X direction) sandwich and hold the curved base material 11 therebetween. The latter is arranged between a pair of holding members 25 and 26 in the X direction to support the curved base from below.材 11。 Material 11. The clamping member 21 and the supporting member 23 and the clamping member 25 and the supporting member 27 are provided as a pair at both ends of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3, The holding member 22 and the supporting member 24 and the holding member 26 and the supporting member 28 are provided as a pair at both ends of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3.

夾持構件21具有朝上下方向延伸之鉛直部分21a、從鉛直部分21a之上端部朝水平方向延伸之水平部分21b。在此,在圖3,鉛直部分21a之長度A、狹縫噴嘴3與鉛直部分21a之鉛直方向長度B、狹縫噴嘴3(初期位置)與鉛直部分21a之X方向長度C是一定。所以,當以夾持構件21夾持曲面基材11時,即便曲面基材11之厚度或曲率發生變化,長度A、長度B及長度C仍為一定,因此,即便曲面基材11之曲率改變,亦可令塗布裝置10之運作之初期條件一定。附帶一提,夾持構件21、22、25、26是以令水平部分之下端之高度(亦即鉛直部分之長度A)相同的方式形成,而將曲面基材11之兩端部以相同高度來夾持。 The holding member 21 includes a vertical portion 21a extending in the vertical direction, and a horizontal portion 21b extending from the upper end portion of the vertical portion 21a in the horizontal direction. Here, in FIG. 3, the length A of the vertical portion 21a, the length B of the slit nozzle 3 and the vertical portion 21a, and the length C of the slit nozzle 3 (initial position) and the X direction of the vertical portion 21a are constant. Therefore, when the curved substrate 11 is clamped by the clamping member 21, the length A, length B, and length C are constant even if the thickness or curvature of the curved substrate 11 is changed. Therefore, even if the curvature of the curved substrate 11 is changed It is also possible to make the initial conditions of the operation of the coating device 10 constant. Incidentally, the holding members 21, 22, 25, and 26 are formed in such a manner that the height of the lower end of the horizontal portion (that is, the length A of the vertical portion) is the same, and both ends of the curved base material 11 are at the same height To clamp.

為了配合噴嘴移動方向(X方向)之曲面基材11的長度來調整夾持構件21、22間之距離,夾持構件22可相對於夾持構件21而沿著X方向移動。具體而言,與夾持構件22卡合之滾珠螺桿201是從臺20之X方向端部朝X方向內側延伸而設,可藉由將滾珠螺桿201之前端部之把手202旋轉,而令與滾珠螺桿201卡合之夾持構件22在X方向移動。並且,由於夾持構件22及支持構件24是安裝在移動台203(其安裝在臺20之上部且可在X方向移動),故當藉由滾珠螺桿201而令夾持構件22在X方向移動時,移動台203亦會在X方向移動,再者,支持構件24亦會在X方向移動。結果,夾持構件22與支持構件24會一體地在X方向移動。 In order to adjust the distance between the holding members 21 and 22 in accordance with the length of the curved substrate 11 in the nozzle moving direction (X direction), the holding member 22 can move in the X direction relative to the holding member 21. Specifically, the ball screw 201 engaged with the clamping member 22 is provided to extend from the X-direction end portion of the table 20 to the X-direction inner side. The handle 202 at the front end portion of the ball screw 201 can be rotated to make the The clamping member 22 engaged with the ball screw 201 moves in the X direction. In addition, since the holding member 22 and the supporting member 24 are mounted on the moving table 203 (which is mounted on the upper portion of the table 20 and is movable in the X direction), the holding member 22 is moved in the X direction by the ball screw 201 At this time, the mobile station 203 will also move in the X direction, and furthermore, the support member 24 will also move in the X direction. As a result, the holding member 22 and the supporting member 24 move integrally in the X direction.

與夾持構件22同樣,為了配合噴嘴移動方向(X方向)之曲面基材11的長度來調整夾持構件25、26間之距離,夾持構件26可相對於夾持構件25而沿著X方向移動。而且,支持構件28是與夾持構件26一體地在X方向移動。 Similar to the holding member 22, in order to adjust the distance between the holding members 25 and 26 in accordance with the length of the curved substrate 11 in the nozzle moving direction (X direction), the holding member 26 may be along the X with respect to the holding member 25. Move in the direction. The support member 28 moves in the X direction integrally with the holding member 26.

支持構件23、24、27、28是具有同樣之構造。以下,以支持構件23來舉例說明。支持構件23是在上端部具有與曲面基材11接觸之支持部23a,支持部23a是藉由壓縮空氣、電磁力、或機械構造等而可在上下方向昇降。支持部23a之頂部具有球形狀,以樹脂而構成。再者,支持構件23具有在上下方向被賦予勢能之賦予勢能構件23b。賦予勢能構件23b舉例來說是彈簧,具有支持曲面基材11之情況下之緩衝機能。賦予勢能構件23b是收納在管狀構件23c,令支持部23a上下昇降。 The support members 23, 24, 27, and 28 have the same structure. Hereinafter, the supporting member 23 will be described as an example. The support member 23 has a support portion 23a in contact with the curved base material 11 at an upper end portion, and the support portion 23a can be raised and lowered by compressed air, electromagnetic force, mechanical structure, or the like. The top of the support portion 23a has a spherical shape and is made of resin. Furthermore, the support member 23 has a potential energy imparting member 23 b which is imparted with potential energy in the vertical direction. The potential energy imparting member 23b is, for example, a spring, and has a buffer function when the curved base material 11 is supported. The potential energy applying member 23b is housed in the tubular member 23c, and raises and lowers the support portion 23a.

塗布裝置10是如下般地運作。 The coating apparatus 10 operates as follows.

首先,於貯留槽1供給高壓空氣而加壓,令兩通閥12開放。然後,以三通閥48作為吸引側,令馬達43朝吸引側旋轉,則貯留槽1內之塗布液會通過第1供給管路45、透過三通閥48而填充於注射泵44。 First, high-pressure air is supplied to the storage tank 1 to pressurize it, and the two-way valve 12 is opened. Then, using the three-way valve 48 as the suction side and rotating the motor 43 toward the suction side, the coating liquid in the storage tank 1 passes through the first supply line 45 and passes through the three-way valve 48 to fill the syringe pump 44.

在往注射泵44之填充完成後,將三通閥48切換成吐出側。然後,令馬達43朝吐出側旋轉,則注射泵44內之塗布液會從三通閥48通過第2供給管路49而供給至狹縫噴嘴3。控制部是將馬達43控制成當將注射泵44內之塗布液供給至狹縫噴嘴3之際,塗布液之供給壓力或供給量一定。然後,塗布液會從狹縫噴嘴3之吐出口3b以供給壓力或供給量一定的方式而吐出至保持托盤2上之曲面基材11,成為塗膜。 After the filling to the syringe pump 44 is completed, the three-way valve 48 is switched to the discharge side. Then, when the motor 43 is rotated toward the discharge side, the coating liquid in the injection pump 44 is supplied from the three-way valve 48 through the second supply line 49 to the slit nozzle 3. The control unit controls the motor 43 so that when the coating liquid in the injection pump 44 is supplied to the slit nozzle 3, the supply pressure or supply amount of the coating liquid is constant. Then, the coating liquid is discharged from the discharge port 3b of the slit nozzle 3 to the curved base material 11 on the holding tray 2 with a constant supply pressure or supply amount, and becomes a coating film.

控制部將狹縫噴嘴3控制成當將塗布液從狹縫噴嘴3朝曲面基材11吐出之際,狹縫噴嘴3之移動速度(X方向)是與從狹縫噴嘴3之狹縫前端部3a至曲面基材11之塗布面為止的距離成反比。圖4是顯示曲面基材11上之狹縫噴嘴3之位置與從狹縫前端部3a至塗布面11a為止之距離、狹縫噴嘴3之移動速度、狹縫噴嘴3之吐出量或吐出壓力之關係的圖表。如圖4所示,關於從狹縫噴嘴3之狹縫前端部3a至曲面基材11之塗布面11a為止的距離D,在曲面基材11之X方向基端部是最短,隨著移向X方向中央部而變長,在X方向中央部變最長,隨著從X方向中央部移向X方向前端部而變短,在X方向前端部變最短。而且,關於從狹縫噴 嘴3之狹縫前端部3a至曲面基材11之塗布面為止的距離D,在X方向基端部與X方向前端部是相同。所以,狹縫噴嘴3之移動速度是在曲面基材11之X方向基端部最快,隨著移向X方向中央部而速度減少,在X方向中央部變最慢,隨著從X方向中央部移向X方向前端部而速度增加,在X方向前端部變最快。而且,關於狹縫噴嘴3之移動速度,在X方向基端部與X方向前端部是相同速度。附帶一提,塗布液之供給壓力或供給量是無關狹縫噴嘴3之位置而一定。 The control unit controls the slit nozzle 3 such that when the coating liquid is discharged from the slit nozzle 3 toward the curved substrate 11, the moving speed (X direction) of the slit nozzle 3 is the same as that of the slit tip 3 from the slit tip 3 The distance from 3a to the coated surface of the curved substrate 11 is inversely proportional. FIG. 4 shows the position of the slit nozzle 3 on the curved substrate 11 and the distance from the slit front end portion 3a to the coating surface 11a, the moving speed of the slit nozzle 3, and the ejection amount or ejection pressure of the slit nozzle 3. Relationship chart. As shown in FIG. 4, the distance D from the slit front end portion 3 a of the slit nozzle 3 to the coating surface 11 a of the curved base material 11 is the shortest in the X-direction base end portion of the curved base material 11 and moves toward The X-direction central portion becomes longer, becomes longer in the X-direction central portion, becomes shorter as it moves from the X-direction central portion to the X-direction distal portion, and becomes shorter in the X-direction distal portion. And, about spraying from the slit The distance D between the tip end portion 3a of the slit 3 of the nozzle 3 and the coating surface of the curved base material 11 is the same in the X-direction base end portion and the X-direction front end portion. Therefore, the moving speed of the slit nozzle 3 is the fastest at the base end portion of the curved surface 11 in the X direction, the speed decreases as it moves toward the center portion in the X direction, and the speed decreases at the center portion in the X direction. The central portion moves toward the front end portion in the X direction and the speed increases, and the front end portion in the X direction becomes the fastest. The moving speed of the slit nozzle 3 is the same at the base end portion in the X direction and the front end portion in the X direction. Incidentally, the supply pressure or supply amount of the coating liquid is constant regardless of the position of the slit nozzle 3.

根據前述構成之塗布裝置10,可發揮如下之效果。 According to the coating device 10 configured as described above, the following effects can be exhibited.

(1)在往狹縫噴嘴3之塗布液之供給壓力一定之狀態下,以令狹縫噴嘴3之移動速度是與從狹縫前端部3a至曲面基材11之塗布面11a為止的距離D成反比的方式而移動狹縫噴嘴3,藉此,能以令塗布液之上面成為平面的方式而對曲面基材11塗布塗布液。 (1) In a state where the supply pressure of the coating liquid to the slit nozzle 3 is constant, the moving speed of the slit nozzle 3 is set to a distance D from the slit tip 3a to the coating surface 11a of the curved substrate 11 By moving the slit nozzle 3 in an inverse manner, the coating liquid can be applied to the curved substrate 11 such that the upper surface of the coating liquid becomes flat.

(2)在往狹縫噴嘴3之塗布液之供給量一定之狀態下,以令狹縫噴嘴3之移動速度是與從狹縫前端部3a至曲面基材11之塗布面11a為止的距離D成反比的方式而移動狹縫噴嘴3,藉此,能以令塗布液之上面成為平面的方式而對曲面基材11塗布塗布液。 (2) In a state where the supply amount of the coating liquid to the slit nozzle 3 is constant, the moving speed of the slit nozzle 3 is set to a distance D from the slit tip 3a to the coating surface 11a of the curved substrate 11 By moving the slit nozzle 3 in an inverse manner, the coating liquid can be applied to the curved substrate 11 such that the upper surface of the coating liquid becomes flat.

(3)以接著劑作為塗布液而塗布在曲面基材11之凹狀曲面,藉此,能以令接著液之上面成為平面的方式而在凹狀曲面塗布接著劑。結果,凸狀曲面玻璃與平面玻璃之貼合變容易,可容易地形成片側凸玻璃。 (3) The adhesive is applied to the concave curved surface of the curved substrate 11 by using the adhesive as a coating liquid, whereby the adhesive can be applied to the concave curved surface so that the upper surface of the adhesive liquid becomes flat. As a result, the bonding of the convex curved glass and the flat glass becomes easy, and the sheet-side convex glass can be easily formed.

(4)若塗布液具有觸變性,則可抑制塗布在曲面基材11之塗布液之移動,可將塗布液平坦地塗布在曲面基材11之預定領域內。另外,若塗布液具有觸變性,則吐出後之塗布液是黏度高,因此,即便是如在曲面基材11進行平面塗布的情況般之在塗布中有塗布厚度變化的情況,亦不易發生塗布液從厚度厚的地方往厚度薄的地方流出而使厚度變化之情形,可令塗布液之上面成為適切之平面。 (4) If the coating liquid has thixotropy, the movement of the coating liquid applied to the curved substrate 11 can be suppressed, and the coating liquid can be evenly applied to a predetermined area of the curved substrate 11. In addition, if the coating liquid has thixotropy, the viscosity of the coating liquid after ejection is high. Therefore, even if the coating thickness changes during coating as in the case of flat coating on the curved substrate 11, coating is unlikely to occur. In the case where the liquid flows out from a thick place to a thin place and the thickness is changed, the upper surface of the coating liquid may become a suitable plane.

(5)由於曲面基材11之凹狀曲面具有一定之曲率,故可容易地達成令狹縫噴嘴3之移動速度是與從狹縫前端部3a至曲面基材11為止的距離成反比之情形。 (5) Since the concave curved surface of the curved substrate 11 has a certain curvature, it can be easily achieved that the moving speed of the slit nozzle 3 is inversely proportional to the distance from the slit front end portion 3a to the curved substrate 11 .

(6)關於當從狹縫噴嘴3之前端部3a至曲面基材11之塗布面11a為止的距離D連續地變化的情況下的其他塗布方法,可以想到的是4令狹縫噴嘴3之X方向之移動速度一定、令塗布液之供給壓力或供給量是與距離D成比例而塗布之方法。然後,以如此之方法來進行的情況下,由於每單位時間之塗布量會變化,塗布液揮發而達到固化所花費之時間不會一定(厚厚地塗布的情況下,揮發耗時),故會有在曲面基材11之塗布面11之固化後之塗布液之品質欠缺均一性之問題。相對於此,本發明是令塗布液之供給壓力或供給量一定,故可令塗布液達到固化之時間不論在塗布之任何時點皆一定,可具有令固化後之塗布液之品質之均一性會比令塗布液之供給壓力或供給量是與距離D成比例而塗布的情況還提升之效果。 (6) Regarding another coating method in the case where the distance D from the front end portion 3a of the slit nozzle 3 to the coating surface 11a of the curved substrate 11 is continuously changed, it is conceivable that X of the 4th order slit nozzle 3 A method of applying a coating material in a direction with a constant moving speed so that the supply pressure or supply amount of the coating liquid is proportional to the distance D. Then, if the amount of coating per unit time is changed in this way, the time it takes for the coating liquid to volatilize to solidify may not be constant (in the case of thick coating, the volatilization takes time), so There is a problem that the quality of the coating liquid after curing of the coating surface 11 of the curved substrate 11 lacks uniformity. In contrast, in the present invention, the supply pressure or supply amount of the coating liquid is constant, so the time for curing the coating liquid to be solid is constant at any point in time, and it can have the uniformity of the quality of the cured coating liquid. The effect is higher than the case where the supply pressure or supply amount of the coating liquid is applied in proportion to the distance D.

雖然在上述實施形態中,支持構件是於噴嘴移 動方向(X方向)設置2個,但亦可以是設置1個或3個以上。 Although in the above embodiment, the supporting member is moved at the nozzle Two moving directions (X directions) are provided, but one or three or more may be provided.

雖然在上述實施形態中,夾持構件與支持構件是在狹縫噴嘴3之狹縫方向(Y方向)上之曲面基材11之兩端部設有一對,但夾持構件與支持構件亦可以是在Y方向上具有預定間隔而設置3個以上。 Although in the above embodiment, the holding member and the supporting member are provided with a pair of both ends of the curved base material 11 in the slit direction (Y direction) of the slit nozzle 3, the holding member and the supporting member may be Three or more are provided with a predetermined interval in the Y direction.

雖然在上述實施形態中,曲面基材11是具有凹形狀且該凹形狀具有一定曲率,但曲面基材11之形狀並不限定於此,舉例來說,如圖5所示,可以是整面具有凸形狀之曲面基材,另外,如圖6所示,亦可以是在X方向之中途具有凸形狀之曲面基材。 Although in the above embodiment, the curved base material 11 has a concave shape and the concave shape has a certain curvature, the shape of the curved base material 11 is not limited to this. For example, as shown in FIG. 5, it may be the entire surface. The curved base material having a convex shape may be a curved base material having a convex shape midway in the X direction, as shown in FIG. 6.

圖5是顯示與其他實施形態相關之曲面基材11上之狹縫噴嘴3之位置與從狹縫前端部3a至塗布面11a為止之距離、狹縫噴嘴3之移動速度、狹縫噴嘴3之吐出量或吐出壓力之關係的圖表。如圖5所示,關於從狹縫噴嘴3之狹縫前端部3a至曲面基材11之塗布面11a為止的距離D,在曲面基材11之X方向基端部是最長,隨著移向X方向中央部而變短,在X方向中央部變最短,隨著從X方向中央部移向X方向前端部而變長,在X方向前端部變最長。而且,關於從狹縫噴嘴3之狹縫前端部3a至曲面基材11之塗布面為止的距離D,在X方向基端部與X方向前端部是相同。所以,狹縫噴嘴3之移動速度是在曲面基材11之X方向基端部最慢,隨著移向X方向中央部而速度增加,在X方向中央部變最快,隨著從X方向中央部移向X方向前端部而速度減少,在X方向前端部變最慢。而且,關於狹縫噴嘴3之移動 速度,在X方向基端部與X方向前端部是相同速度。附帶一提,塗布液之供給壓力或供給量是無關狹縫噴嘴3之位置而一定。 FIG. 5 shows the position of the slit nozzle 3 on the curved substrate 11 and the distance from the slit front end portion 3a to the coating surface 11a, the moving speed of the slit nozzle 3, and the position of the slit nozzle 3 according to other embodiments. A graph showing the relationship between discharge volume or discharge pressure. As shown in FIG. 5, the distance D from the slit front end portion 3 a of the slit nozzle 3 to the coating surface 11 a of the curved base material 11 is the longest in the X-direction base end portion of the curved base material 11. The center portion in the X direction becomes shorter, becomes shorter in the center portion in the X direction, becomes longer as it moves from the center portion in the X direction to the front portion in the X direction, and becomes longer in the front portion in the X direction. The distance D from the slit front end portion 3 a of the slit nozzle 3 to the coating surface of the curved substrate 11 is the same in the X-direction base end portion and the X-direction front end portion. Therefore, the moving speed of the slit nozzle 3 is the slowest at the base end portion of the curved surface 11 in the X direction, and the speed increases as it moves toward the center portion in the X direction, and becomes the fastest in the center portion of the X direction. The central portion moves toward the front end portion in the X direction and the speed decreases, and the front end portion in the X direction becomes the slowest. Moreover, regarding the movement of the slit nozzle 3 The speed is the same at the base end portion in the X direction and the front end portion in the X direction. Incidentally, the supply pressure or supply amount of the coating liquid is constant regardless of the position of the slit nozzle 3.

圖6是顯示與其他實施形態相關之曲面基材11上之狹縫噴嘴3之位置與從狹縫前端部3a至塗布面11a為止之距離、狹縫噴嘴3之移動速度、狹縫噴嘴3之吐出量或吐出壓力之關係的圖表。如圖6所示,關於從狹縫噴嘴3之狹縫前端部3a至曲面基材11之塗布面11a為止的距離D,隨著從曲面基材11之X方向基端部往X方向而變長,在途中變成隨著移向X方向中央部而變短,並且,隨著從X方向中央部往X方向而變長,在途中變成隨著移向X方向前端部而變短。而且,關於距離D,在X方向基端部與X方向前端部是相同。所以,狹縫噴嘴3之移動速度是隨著從曲面基材11之X方向基端部往X方向而變慢,在途中變成隨著移向X方向中央部而變快,並且,隨著從X方向中央部往X方向而變慢,在途中變成隨著移向X方向前端部而變快。附帶一提,塗布液之供給壓力或供給量是無關狹縫噴嘴3之位置而一定。 FIG. 6 shows the position of the slit nozzle 3 on the curved substrate 11 and the distance from the slit front end portion 3a to the coating surface 11a, the moving speed of the slit nozzle 3, and the position of the slit nozzle 3 according to other embodiments. A graph showing the relationship between discharge volume or discharge pressure. As shown in FIG. 6, the distance D from the slit front end portion 3 a of the slit nozzle 3 to the coating surface 11 a of the curved base material 11 varies from the X direction base end portion of the curved base material 11 to the X direction. When it is long, it becomes shorter as it moves toward the central part in the X direction on the way, and becomes longer as it moves from the central part in the X direction to the X direction, and becomes shorter as it moves toward the front end in the X direction. The distance D is the same at the base end portion in the X direction and at the front end portion in the X direction. Therefore, the moving speed of the slit nozzle 3 becomes slower as it moves from the base end portion of the curved surface 11 in the X direction toward the X direction, and becomes faster as it moves toward the center portion of the X direction on the way. The central portion in the X direction becomes slower toward the X direction, and becomes faster as it moves toward the distal end portion in the X direction. Incidentally, the supply pressure or supply amount of the coating liquid is constant regardless of the position of the slit nozzle 3.

另外,雖然圖面是予以省略,但關於令狹縫噴嘴3之移動速度是與從狹縫噴嘴3之前端部3a至曲面基材11之塗布面11a為止之距離D成反比之控制,只要事先明白曲面基材11之形狀,則藉由與其配合之程式而控制狹縫噴嘴3即可;另外,各曲面基材11會形狀不同的情況下,可以在狹縫噴嘴3之行進方向前方設置距離感測器,連續地測 定狹縫噴嘴3之行進方向前方之距離D,藉此,以與距離D成反比之移動速度來移動狹縫噴嘴3;另外,亦可以是使用其他之方法。 In addition, although the drawing is omitted, the movement speed of the slit nozzle 3 is controlled in inverse proportion to the distance D from the front end portion 3a of the slit nozzle 3 to the coating surface 11a of the curved substrate 11, as long as it is controlled in advance. To understand the shape of the curved substrate 11, it is sufficient to control the slit nozzle 3 by a program that cooperates with it. In addition, if each curved substrate 11 has a different shape, a distance can be set in front of the traveling direction of the slit nozzle 3. Sensor, continuous measurement The distance D in the forward direction of the slit nozzle 3 is determined, whereby the slit nozzle 3 is moved at a moving speed that is inversely proportional to the distance D; in addition, other methods may be used.

另外,雖然在上述實施形態中,將供給部4之塗布液從狹縫噴嘴3吐出之機構是以如注射泵44般之藉由壓力來改變吐出量(供給量)之機構而說明,但亦可以是如齒輪泵般之藉由旋轉數而改變供給量之機構。本發明是藉由令該等之運作壓力或旋轉數一定而令來自狹縫噴嘴3之供給量一定。 In addition, in the above-mentioned embodiment, the mechanism for discharging the coating liquid from the supply unit 4 from the slit nozzle 3 is described as a mechanism for changing the discharge amount (supply amount) by pressure, such as the injection pump 44. It may be a mechanism such as a gear pump that changes the supply amount by the number of rotations. In the present invention, the supply pressure from the slit nozzle 3 is constant by making the operating pressure or the number of rotations constant.

在未超脫申請專利範圍所記載之本發明之精神及範圍的情況下進行各種變形及變更是可能的。 Various modifications and changes are possible without departing from the spirit and scope of the invention described in the scope of the patent application.

[產業利用性] [Industrial availability]

本發明可提供在對曲面基材塗布塗布液的情況下令所塗布之塗布液之上面成為平面之塗布液之塗布裝置及塗布方法,故產業上之利用價值高。 The present invention can provide a coating device and a coating method for making the upper surface of the coated coating liquid a flat coating liquid when the coating liquid is coated on a curved substrate, so the industrial use value is high.

Claims (5)

一種塗布裝置,是對曲面基材之塗布液之塗布裝置,其特徵在於包含:貯留槽,貯留前述塗布液;狹縫噴嘴,將前述塗布液塗布於前述曲面基材;供給部,將前述塗布液從前述貯留槽往前述狹縫噴嘴供給;及控制部,控制前述塗布裝置;前述控制部控制前述供給部使其供給至前述狹縫噴嘴之前述塗布液之供給壓力一定,再者,以令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止的距離成反比的方式來控制前述狹縫噴嘴。A coating device is a coating device for a coating solution for a curved substrate, which comprises a storage tank for storing the coating solution, a slit nozzle for coating the coating solution on the curved substrate, and a supply section for coating the coating. The liquid is supplied from the storage tank to the slit nozzle; and a control unit controls the coating device; the control unit controls the supply unit so that a supply pressure of the coating liquid supplied to the slit nozzle is constant, and further, The moving speed of the slit nozzle is controlled so as to be inversely proportional to the distance from the tip of the slit of the slit nozzle to the coating surface of the curved substrate. 一種塗布裝置,是對曲面基材之塗布液之塗布裝置,其特徵在於包含:貯留槽,貯留前述塗布液;狹縫噴嘴,將前述塗布液塗布於前述曲面基材;供給部,將前述塗布液從前述貯留槽往前述狹縫噴嘴供給;及控制部,控制前述塗布裝置;前述控制部控制前述供給部使其供給至前述狹縫噴嘴之前述塗布液之供給量一定,再者,以令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止的距離成反比的方式來控制前述狹縫噴嘴。A coating device is a coating device for a coating solution for a curved substrate, which comprises a storage tank for storing the coating solution, a slit nozzle for coating the coating solution on the curved substrate, and a supply section for coating the coating. The liquid is supplied from the storage tank to the slit nozzle; and a control unit controls the coating device; the control unit controls the supply unit so that a supply amount of the coating liquid supplied to the slit nozzle is constant, and further, The moving speed of the slit nozzle is controlled so as to be inversely proportional to the distance from the tip of the slit of the slit nozzle to the coating surface of the curved substrate. 如請求項1或2之塗布裝置,其中前述曲面基材之塗布面具有凹狀曲面。The coating device according to claim 1 or 2, wherein the coating surface of the curved substrate has a concave curved surface. 一種塗布方法,是對曲面基材之塗布液塗布方法,其特徵在於:將供給至狹縫噴嘴之前述塗布液之供給壓力設為一定,前述狹縫噴嘴係將前述塗布液塗布在前述曲面基材;令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止之距離成反比,來移動前述狹縫噴嘴。A coating method is a coating liquid coating method for a curved substrate, characterized in that the supply pressure of the coating liquid supplied to a slit nozzle is constant, and the slit nozzle is configured to apply the coating liquid to the curved substrate. The moving speed of the slit nozzle is inversely proportional to the distance from the front end of the slit of the slit nozzle to the coating surface of the curved substrate, so as to move the slit nozzle. 一種塗布方法,是對曲面基材之塗布液之塗布方法,其特徵在於:將供給至狹縫噴嘴之前述塗布液之供給量設為一定,前述狹縫噴嘴係將前述塗布液塗布在前述曲面基材;令前述狹縫噴嘴之移動速度是與從前述狹縫噴嘴之狹縫前端部至前述曲面基材之塗布面為止之距離成反比,來移動前述狹縫噴嘴。A coating method is a coating method for a coating liquid on a curved substrate, characterized in that the supply amount of the coating liquid supplied to a slit nozzle is constant, and the slit nozzle is configured to coat the coating liquid on the curved surface. Substrate; the moving speed of the slit nozzle is inversely proportional to the distance from the front end of the slit of the slit nozzle to the coating surface of the curved substrate, so as to move the slit nozzle.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003190862A (en) * 2001-12-28 2003-07-08 Dainippon Printing Co Ltd Coating method and coating apparatus
JP2013187236A (en) * 2012-03-06 2013-09-19 Tokyo Electron Ltd Slit nozzle for manufacturing solar cell, and chemical solution applying device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2630522B2 (en) * 1991-10-18 1997-07-16 富士写真フイルム株式会社 Coating method and device
JP3257340B2 (en) 1995-05-24 2002-02-18 松下電器産業株式会社 Liquid coating method, liquid coating apparatus and slit nozzle
JP4646381B2 (en) * 2000-11-13 2011-03-09 東京エレクトロン株式会社 Coating liquid supply device and coating device
JP2003071352A (en) 2001-09-06 2003-03-11 Matsushita Electric Ind Co Ltd Method and apparatus for applying liquid to coating and method and apparatus for manufacturing cathode ray tube by using the same
JP2004167422A (en) * 2002-11-21 2004-06-17 Seiko Epson Corp Application method and application device
JP4501382B2 (en) * 2003-09-11 2010-07-14 株式会社豊田自動織機 Defogger wire coating device
JP4229853B2 (en) * 2004-02-06 2009-02-25 Hoya株式会社 Application method and spectacle lens manufacturing method
JP2005125327A (en) * 2004-12-20 2005-05-19 Seiko Epson Corp Method and apparatus for discharging liquid-like substance
JP5338183B2 (en) * 2008-08-05 2013-11-13 トヨタ自動車株式会社 Damping material applicator
WO2010131580A1 (en) * 2009-05-09 2010-11-18 コニカミノルタホールディングス株式会社 Coating method and organic electronic element
WO2010146928A1 (en) * 2009-06-19 2010-12-23 タツモ株式会社 Substrate coating apparatus
US20130089657A1 (en) * 2011-10-07 2013-04-11 Sage Electrochromics, Inc. Direct dispense device and method
JP3202751U (en) * 2015-12-09 2016-02-18 金堂 義明 Slit nozzle and chemical coating device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003190862A (en) * 2001-12-28 2003-07-08 Dainippon Printing Co Ltd Coating method and coating apparatus
JP2013187236A (en) * 2012-03-06 2013-09-19 Tokyo Electron Ltd Slit nozzle for manufacturing solar cell, and chemical solution applying device

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