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TWI598418B - Anti-fingerprint adhesive and method for producing the same, composition for a hard coat film, base material having a hard coat layer and touch panel - Google Patents

Anti-fingerprint adhesive and method for producing the same, composition for a hard coat film, base material having a hard coat layer and touch panel Download PDF

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TWI598418B
TWI598418B TW102103512A TW102103512A TWI598418B TW I598418 B TWI598418 B TW I598418B TW 102103512 A TW102103512 A TW 102103512A TW 102103512 A TW102103512 A TW 102103512A TW I598418 B TWI598418 B TW I598418B
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compound
hard coat
hydrolyzable decane
carbon atoms
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TW201341483A (en
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Kotaro Yamada
Hideyuki Takahashi
Yutaka Furukawa
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Asahi Glass Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/08Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Wood Science & Technology (AREA)
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  • Paints Or Removers (AREA)
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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
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Description

抗指紋附著劑及其製造方法、硬塗膜用組成物、具有硬塗膜層之基材以及觸控面板 Anti-fingerprint adhesive agent, manufacturing method thereof, composition for hard coating film, substrate with hard coating layer, and touch panel 發明領域 Field of invention

本發明有關於一種抗指紋附著劑及其製造方法、硬塗膜用組成物、具有硬塗膜層之基材以及觸控面板。 The present invention relates to an anti-fingerprint adhesive agent, a method for producing the same, a composition for a hard coat film, a substrate having a hard coat layer, and a touch panel.

發明背景 Background of the invention

由於智慧型手機或輸入板個人電腦等使用之觸控面板在使用時會觸及人們的手指,因此容易附著指紋、皮脂、汗等所造成的脂性污垢。而且,脂性污垢一旦附著便難以脫落又會因光線程度等而顯著,有損及辨識性及美觀之問題。此外,在顯示器玻璃、光學元件、衛生機器等當中亦被指出具有相同問題。 Since the touch panel used in a smart phone or a tablet personal computer touches people's fingers when used, it is easy to adhere to fat dirt caused by fingerprints, sebum, sweat, and the like. Moreover, once the fat dirt adheres, it is difficult to fall off, and it is noticeable due to the degree of light, etc., which detracts from the problems of visibility and appearance. In addition, the same problem has been pointed out in display glasses, optical components, sanitary machines, and the like.

爰此,作為解決脂性污垢附著之問題的手段,有提議各種於光學構件表面形成防污層之技術,該防污層具備脂性污垢難以附著且即便附著亦容易拭除之性能。在表面具有防污層之光學構件中,位於最外層之防污層在拭除時,其表面部分容易損傷。因此,在必須對基材表面賦予耐磨耗性等機械強度時,必須於基材表面設置硬塗膜層,而有製造步驟變得複雜之問題。 Here, as a means for solving the problem of adhesion of the grease stain, various techniques for forming an antifouling layer on the surface of the optical member have been proposed, and the antifouling layer has a property that the fat dirt is hard to adhere and is easily wiped off even if it adheres. In the optical member having the antifouling layer on the surface, the surface portion of the antifouling layer located at the outermost layer is easily damaged when it is wiped off. Therefore, when it is necessary to impart mechanical strength such as abrasion resistance to the surface of the substrate, it is necessary to provide a hard coat layer on the surface of the substrate, which has a problem that the manufacturing steps become complicated.

為了解決上述問題,例如在專利文獻1中有記載 一種將含有下述物質之組成物塗佈於基材並使之硬化,而形成具有優異耐磨耗性且抗指紋附著性等之防污性優異的硬塗膜層之技術:含有具2個以上(甲基)丙烯醯基之多官能性聚合性單體成分的活性能量線硬化性聚合性單體;於分子結構含有活性能量線硬化性官能基、撥水撥油性顯現部位及特定2價烴基之撥水撥油性賦予劑;及活性能量線聚合引發劑。 In order to solve the above problem, for example, it is described in Patent Document 1. A technique of applying a composition containing the following substance to a substrate and curing it to form a hard coat layer having excellent abrasion resistance and anti-fingerprint adhesion resistance, etc. An active energy ray-curable polymerizable monomer having a polyfunctional polymerizable monomer component of the above (meth) acrylonitrile group; an active energy ray-curable functional group, a water- and oil-repellent property-expressing portion, and a specific two-valent value in a molecular structure a water-based oil-repellent imparting agent; and an active energy ray polymerization initiator.

又,專利文獻2中有記載一種使用在被膜形成用組成物並具有全氟烷基或全氟聚醚基之氟有機聚矽氧烷樹脂的製造方法。在實施例中係在特定條件下,使具全氟烷基之水解性矽烷化合物、或者是其與具有機基(不具氟原子)之水解性矽烷化合物的混合物水解,而製得氟有機聚矽氧烷樹脂。而且,使用該樹脂所形成之被膜有優異的密著性、耐刮傷性、耐光性、防污染性、撥水性、抗反射性、低折射率及透明性。 Further, Patent Document 2 describes a method for producing a fluoroorganopolysiloxane resin which is a composition for forming a film and which has a perfluoroalkyl group or a perfluoropolyether group. In the examples, a hydrofluorinated decane compound having a perfluoroalkyl group or a mixture thereof with a hydrolyzable decane compound having an organic group (having no fluorine atom) is hydrolyzed under specific conditions to obtain a fluoroorganic polyfluorene. Oxygen resin. Further, the film formed using the resin has excellent adhesion, scratch resistance, light resistance, antifouling property, water repellency, antireflection property, low refractive index, and transparency.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:國際公開2004/044062號 Patent Document 1: International Publication No. 2004/044062

專利文獻2:日本專利第4711080號公報 Patent Document 2: Japanese Patent No. 4711080

發明概要 Summary of invention

然而,在使用專利文獻1記載之組成物而得的硬塗膜層中,就防污性而言有耐光性不夠充分之情況。 However, in the hard coat layer obtained by using the composition described in Patent Document 1, the light resistance is insufficient for the antifouling property.

由於專利文獻2記載之氟有機聚矽氧烷樹脂係以具有碳原子數8之全氟烷基的水解性矽烷化合物作為原料,因此環境負荷高。又,藉由該樹脂製得之被膜有硬度不夠充分之情況。here The fluoroorganopolysiloxane resin described in Patent Document 2 has a hydrolyzable decane compound having a perfluoroalkyl group having 8 carbon atoms as a raw material, and thus has a high environmental load. Further, the film obtained by the resin may have insufficient hardness. Here

本發明係有鑒於前述現況而進行者,其目的在於提供一種可藉由添加至光硬化性硬塗膜用樹脂作使用,而對製得之硬塗膜層表面賦予充分的硬度及防污性尤其是抗指紋附著性,同時亦可充分確保硬塗膜層外觀及防污性尤其是抗指紋附著性之耐光性,更少有環境負荷的部分水解縮合物及其製造方法。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a resin which can be added to a photocurable hard coat film to impart sufficient hardness and antifouling property to the surface of the obtained hard coat layer. In particular, it is also capable of sufficiently protecting the appearance of the hard coat layer and the antifouling property, particularly the light resistance against fingerprint adhesion, the partial hydrolysis condensate having less environmental load, and the method for producing the same.

本發明又一目的在於提供一種摻混有上述部分水解縮合物且可形成具有充分的硬度及防污性尤其是抗指紋附著性及其耐光性以及外觀優異的硬塗膜層之硬塗膜用組成物,及使用其之具有硬塗膜層之基材,以及使用該具有硬塗膜層之基材的觸控面板。 Still another object of the present invention is to provide a hard coat film which is blended with the above-mentioned partially hydrolyzed condensate and which can form a hard coat layer having sufficient hardness and antifouling property, particularly anti-fingerprint adhesion, light resistance and appearance. A composition, a substrate having a hard coat layer using the same, and a touch panel using the substrate having the hard coat layer.

本發明提供一種具有以下[1]~[14]構成之抗指紋附著劑及其製造方法、硬塗膜用組成物、具有硬塗膜層之基材以及觸控面板。 The present invention provides an anti-fingerprint adhesive agent having the following composition [1] to [14], a method for producing the same, a composition for a hard coat film, a substrate having a hard coat layer, and a touch panel.

[1]一種抗指紋附著劑,係由含有下述成分之混合物的部分水解縮合物所構成:以下式(a-1)表示之水解性矽烷化合物(a-1)、以下式(a-2)表示之水解性矽烷化合物(a-2)及以下式(a-3)表示之水解性矽烷化合物(a-3);且該部分水解縮合物之氟原子含有率為2.5~40質量%。 [1] An anti-fingerprint adhesive agent comprising a partially hydrolyzed condensate comprising a mixture of the following components: a hydrolyzable decane compound (a-1) represented by the following formula (a-1), and the following formula (a-2) The hydrolyzable decane compound (a-2) and the hydrolyzable decane compound (a-3) represented by the following formula (a-3); and the partial hydrolysis-condensation product has a fluorine atom content of 2.5 to 40% by mass.

式(a-1)、(a-2)及(a-3)中之記號係如以下所述:Rf:碳原子數1~6之全氟烷基或以Rf1ORf2-表示且碳原子數2~100之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2矽可於碳-碳原子間具有醚性氧原子之全氟伸烷基);Q1:碳原子數1~10且不含氟原子之2價有機基;Y:具有乙烯性雙鍵之基;Q2:碳原子數1~6且不含氟原子之2價有機基;RH1、RH2:碳原子數1~6之烴基;X1、X2、X3:水解性基;p:0~3之整數;q:1或2;r:0或1且q+r為1或2之數。 The symbols in the formulae (a-1), (a-2) and (a-3) are as follows: R f : a perfluoroalkyl group having 1 to 6 carbon atoms or represented by R f1 OR f2 - a valence group having 2 to 100 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 is a perfluoroalkyl group having an etheric oxygen atom between carbon and carbon atoms); 1 : a divalent organic group having 1 to 10 carbon atoms and not containing a fluorine atom; Y: a group having an ethylenic double bond; Q 2 : a divalent organic group having 1 to 6 carbon atoms and not containing a fluorine atom; H1 , R H2 : a hydrocarbon group having 1 to 6 carbon atoms; X 1 , X 2 , X 3 : a hydrolyzable group; p: an integer of 0 to 3; q: 1 or 2; r: 0 or 1 and q+r It is a number of 1 or 2.

惟,式(a-1)中存在複數個X1及式(a-2)或式(a-3)中存在複數個X2、X3、RH1、Y-Q2時,其等可彼此相異亦可相同。 However, when a plurality of X 1 and a formula (a-2) or a formula (a-3) have a plurality of X 2 , X 3 , R H1 , and YQ 2 in the formula (a-1), they may be mutually The difference can also be the same.

[2]如[1]之抗指紋附著劑,其中前述部分水解縮合物之氟原子含有率為20~40質量%,前述式(a-1)中之Rf係碳原子數1~6之全氟烷基或以Rf1ORf2-表示且碳原子數2~40之1 價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基)。 [2] The anti-fingerprint adhesive agent according to [1], wherein the partial hydrolysis-condensation product has a fluorine atom content of 20 to 40% by mass, and the R f- based carbon number of the above formula (a-1) is 1 to 6 a perfluoroalkyl group or a valent group represented by R f1 OR f2 - and having 2 to 40 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 may have a carbon-carbon atom a perfluoroalkylene group of an etheric oxygen atom).

[3]一種抗指紋附著劑的製造方法,係製造如前述[1]或[2]之抗指紋附著劑者,其特徵在於:在水、有機溶媒及酸之存在下,使水解性矽烷化合物混合物水解且部分縮合以製造氟原子含有率為2.5~40質量%之部分水解縮合物;該水解性矽烷化合物混合物以莫耳比計,相對於前述以(a-1)表示之水解性矽烷化合物(a-1)100莫耳,含有1~23,000莫耳之前述以(a-2)表示之水解性矽烷化合物(a-2)及20~11,500莫耳之前述以(a-3)表示之水解性矽烷化合物(a-3)。 [3] A method for producing an anti-fingerprint adhesive agent, which is characterized in that the anti-fingerprint adhesive agent according to the above [1] or [2] is characterized in that a hydrolyzable decane compound is obtained in the presence of water, an organic solvent and an acid. The mixture is hydrolyzed and partially condensed to produce a partially hydrolyzed condensate having a fluorine atom content of 2.5 to 40% by mass; the hydrolyzable decane compound mixture is in a molar ratio with respect to the hydrolyzable decane compound represented by the above (a-1) (a-1) 100 mol, containing 1 to 23,000 mol of the above-mentioned hydrolyzable decane compound (a-2) represented by (a-2) and 20 to 11,500 mol of the foregoing (a-3) Hydrolyzable decane compound (a-3).

[4]如[3]之抗指紋附著劑的製造方法,其中前述部分水解縮合物係使水解性矽烷化合物混合物水解並部分縮合而製造之部分水解縮合物,該水解性矽烷化合物混合物以莫耳比計,相對於前述水解性矽烷化合物(a-1)100莫耳,含有1~800莫耳之前述水解性矽烷化合物(a-2)及20~300莫耳之前述水解性矽烷化合物(a-3)。 [4] The method for producing an anti-fingerprint adhesive agent according to [3], wherein the partially hydrolyzed condensate is a partially hydrolyzed condensate produced by hydrolyzing and partially condensing a hydrolyzable decane compound mixture, the hydrolyzable decane compound mixture being a molar The hydrolyzable decane compound (a-2) and the hydrolyzable decane compound (a) of 1 to 800 mol are contained in an amount of 1 to 800 mol per 100 mol of the hydrolyzable decane compound (a-1). -3).

[5]如[3]或[4]之抗指紋附著劑的製造方法,其中相對於前述水解性矽烷化合物混合物100質量份,前述水之添加量為5~100質量份。 [5] The method for producing an anti-fingerprint adhesive agent according to [3] or [4], wherein the water is added in an amount of 5 to 100 parts by mass based on 100 parts by mass of the hydrolyzable decane compound mixture.

[6]如[4]之抗指紋附著劑的製造方法,其中相對於前述水解性矽烷化合物混合物100質量份,前述水之添加量為5~40質量份。 [6] The method for producing an anti-fingerprint adhesive agent according to [4], wherein the water is added in an amount of 5 to 40 parts by mass based on 100 parts by mass of the hydrolyzable decane compound mixture.

[7]如[3]~[6]中任一項之抗指紋附著劑的製造方法,其 中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 [7] The method for producing an anti-fingerprint adhesive agent according to any one of [3] to [6], wherein The above organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C.

[8]如[3]~[7]中任一項之抗指紋附著劑的製造方法,其中前述酸為硝酸。 [8] The method for producing an anti-fingerprint adhesive according to any one of [3] to [7] wherein the acid is nitric acid.

[9]一種硬塗膜用組成物,係含有下述部分水解縮合物與光聚合性成分者,其特徵在於前述組成物之總固體成分中下述部分水解縮合物之含量為0.01~20質量%; 部分水解縮合物:含有以下式(a-1)表示之水解性矽烷化合物(a-1)、以下式(a-2)表示之水解性矽烷化合物(a-2)及以下式(a-3)表示之水解性矽烷化合物(a-3)的混合物之部分水解縮合物,且氟原子含有率為2.5~40質量%; [9] A composition for a hard coat film comprising the following partially hydrolyzed condensate and photopolymerizable component, wherein the content of the following partial hydrolyzed condensate in the total solid content of the composition is 0.01 to 20 mass Partially hydrolyzed condensate: a hydrolyzable decane compound (a-1) represented by the following formula (a-1), a hydrolyzable decane compound (a-2) represented by the following formula (a-2), and the following formula (a) -3) a partially hydrolyzed condensate of a mixture of hydrolyzable decane compounds (a-3), and a fluorine atom content of 2.5 to 40% by mass;

式(a-1)、(a-2)及(a-3)中之記號係如以下所述:Rf:碳原子數1~6之全氟烷基或以Rf1ORf2-表示且碳原子數2~100之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基);Q1:碳原子數1~10且不含氟原子之2價有機基;Y:具有乙烯性雙鍵之基; Q2:碳原子數1~6且不含氟原子之2價有機基;RH1、RH2:碳原子數1~6之烴基;X1、X2、X3:水解性基;p:0~3之整數;q:1或2;r:0或1且q+r為1或2之數。 The symbols in the formulae (a-1), (a-2) and (a-3) are as follows: R f : a perfluoroalkyl group having 1 to 6 carbon atoms or represented by R f1 OR f2 - a valence group having 2 to 100 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 is a perfluoroalkyl group having an etheric oxygen atom between carbon and carbon atoms); 1 : a divalent organic group having 1 to 10 carbon atoms and not containing a fluorine atom; Y: a group having an ethylenic double bond; Q 2 : a divalent organic group having 1 to 6 carbon atoms and not containing a fluorine atom; H1 , R H2 : a hydrocarbon group having 1 to 6 carbon atoms; X 1 , X 2 , X 3 : a hydrolyzable group; p: an integer of 0 to 3; q: 1 or 2; r: 0 or 1 and q+r It is a number of 1 or 2.

惟,式(a-1)中存在複數個X1及式(a-2)或式(a-3)中存在複數個X2、X3、RH1、Y-Q2時,其等可彼此相異亦可相同。 However, when a plurality of X 1 and a formula (a-2) or a formula (a-3) have a plurality of X 2 , X 3 , R H1 , and YQ 2 in the formula (a-1), they may be mutually The difference can also be the same.

[10]如[9]之硬塗膜用組成物,其中前述部分水解縮合物之氟原子含有率為20~40質量%,前述式(a-1)中之Rf係碳原子數1~6之全氟烷基或以Rf1ORf2-表示且碳原子數2~40之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基)。 [10] The composition for a hard coating film according to [9], wherein the partial hydrolysis-condensation product has a fluorine atom content of 20 to 40% by mass, and the R f- based carbon number in the above formula (a-1) is 1 to 1 a perfluoroalkyl group of 6 or a valent group represented by R f1 OR f2 - and having 2 to 40 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 is a carbon-carbon atom; a perfluoroalkyl group having an etheric oxygen atom).

[11]如[9]或[10]之硬塗膜用組成物,前述光聚合性成分含有光聚合性化合物與光聚合引發劑。 [11] The composition for a hard coating film according to [9] or [10], wherein the photopolymerizable component contains a photopolymerizable compound and a photopolymerization initiator.

[12]如[9]~[11]中任一項之硬塗膜用組成物,其中前述硬塗膜用組成物硬化而成之膜至少相對於可見光線為透明。 [12] The composition for a hard coat film according to any one of [9] to [11] wherein the film obtained by hardening the composition for the hard coat film is at least transparent to visible light.

[13]一種具有硬塗膜層之基材,其特徵在於具有:基材;及硬塗膜層,係由如[9]~[11]中任一項之硬塗膜用組成物形成於前述基材之至少一部分表面的硬化膜所構成。 [13] A substrate having a hard coat layer, comprising: a substrate; and a hard coat layer formed of the composition for a hard coat film according to any one of [9] to [11] A cured film of at least a part of the surface of the substrate.

[14]一種觸控面板,其特徵在於具有如前述[13]之具有硬塗膜層之基材。 [14] A touch panel comprising the substrate having a hard coat layer as in [13] above.

本發明之抗指紋附著劑藉由添加至光硬化性硬塗膜用樹脂作使用,可對製得之硬塗膜層表面賦予充分的硬度及抗指紋附著性。又,其等特性之耐光性優異的同時環境負荷亦少。 The anti-fingerprint adhesive of the present invention can be applied to a resin for a photocurable hard coat film to impart sufficient hardness and anti-fingerprint adhesion to the surface of the obtained hard coat layer. Moreover, these characteristics are excellent in light resistance and environmental load is also small.

本發明之抗指紋附著劑的製造方法可製造一種可藉由添加至光硬化性硬塗膜用樹脂作使用,而對製得之硬塗膜層表面賦予充分的硬度及抗指紋附著性之抗指紋附著劑。 The method for producing an anti-fingerprint adhesive of the present invention can produce an anti-fingerprint adhesion resistance which can be imparted to the surface of the obtained hard coat layer by using a resin for photocurable hard coat film. Fingerprint adhesive.

本發明之硬塗膜用組成物可於基材上形成具有良好的外觀、充分的硬度、防污性及抗指紋附著性之硬塗膜層。 The composition for a hard coat film of the present invention can form a hard coat layer having a good appearance, sufficient hardness, antifouling property, and anti-fingerprint adhesion on a substrate.

本發明之具有硬塗膜層之基材及使用該具有硬塗膜層之基材的觸控面板其硬塗膜層外觀良好,具有充分的硬度、防污性、抗指紋附著性優異且其耐光性優異。 The base material having a hard coat layer of the present invention and the touch panel using the base material having the hard coat layer have a good appearance of a hard coat layer, and have sufficient hardness, antifouling property, and excellent anti-fingerprint adhesion property. Excellent light resistance.

用以實施發明之形態 Form for implementing the invention

以下說明本發明之實施形態。 Embodiments of the present invention will be described below.

本說明書中之「指紋」係以指尖觸及物品表面時,附著於指尖的汗及皮脂成分等以轉印指尖的指紋模樣之形態附著於該物品表面者。 The "fingerprint" in the present specification is such that when the fingertip touches the surface of the article, the sweat and sebum components adhering to the fingertip are attached to the surface of the article in the form of a fingerprint pattern of the transfer fingertip.

本說明書中之「總固體成分」係硬塗膜用組成物所含之成分中的硬塗膜層形成成分,在140℃下將硬塗膜用組成物加熱24小時並除去溶媒後之殘存物。具體上係表示溶媒 等在藉由硬塗膜層形成過程之加熱等而揮發之揮發性成分以外的總成分。而,總固體成分之量亦可從饋入量計算。 The "total solid content" in the present specification is a hard coat layer forming component in the component contained in the composition for a hard coat film, and the composition of the hard coat film is heated at 140 ° C for 24 hours to remove the residue after the solvent is removed. . Specifically, it means solvent The total component other than the volatile component volatilized by heating or the like in the formation of the hard coat layer. However, the amount of total solids can also be calculated from the feed amount.

在本說明書中,已塗佈硬塗膜用組成物之膜稱為「塗膜」,使之乾燥之狀態稱為「膜」,進而使之硬化而得之膜稱為「硬化膜」。又,使用硬塗膜用組成物形成之硬塗膜層係指該「硬化膜」。 In the present specification, a film in which a composition for a hard coat film is applied is referred to as a "coating film", and a state in which it is dried is referred to as a "film", and a film obtained by curing it is referred to as a "cured film". Further, the hard coat layer formed using the composition for a hard coat film means the "cured film".

在本說明書中使用之(甲基)丙烯醯氧基等之「(甲基)丙烯醯氧基...」的用語係表示「丙烯醯氧基...」與「甲基丙烯醯氧基...」兩者之意。又,後述之「(甲基)丙烯醯基...」的用語同樣地係表示「丙烯醯基...」與「甲基丙烯醯基...」兩者之意。 The term "(meth)acryloxyl group" as used in the present specification means "acrylomethoxy group..." and "methacryloxy group". ..." the meaning of both. In addition, the term "(meth)acryloyl group..." which will be described later means "acryloyl group" and "methacryloyl group" in the same manner.

本說明書中以式(a-1)表示之化合物稱為化合物(a-1)。其他化合物亦同。 The compound represented by the formula (a-1) in the present specification is referred to as the compound (a-1). Other compounds are also the same.

本發明中之部分水解縮合物以下稱為「部分縮合物(A)」。此外,本發明中之「光聚合性化合物」亦稱為「光聚合性化合物(B)」,「光聚合引發劑」亦稱為「光聚合引發劑(C)」。 The partially hydrolyzed condensate in the present invention is hereinafter referred to as "partial condensate (A)". In addition, the "photopolymerizable compound" in the present invention is also called "photopolymerizable compound (B)", and the "photopolymerization initiator" is also called "photopolymerization initiator (C)".

本說明書中之抗指紋附著性係指兼具不會附著上述指紋的撥水撥油性及已附著之指紋的除去性兩者之性質。抗指紋附著性與防污性係以水接觸角及油酸接觸角之數值作評估。 The anti-fingerprint adhesion in the present specification means the property of both the water repellency and the removability of the attached fingerprint which do not adhere to the above-mentioned fingerprint. Anti-fingerprint adhesion and antifouling properties were evaluated by the values of water contact angle and oleic acid contact angle.

而,在本說明書中未特別說明的情況下,符號%表示質量%。 However, in the case where it is not particularly described in the present specification, the symbol % indicates the mass %.

[抗指紋附著劑] [Anti-fingerprint adhesive]

本發明之抗指紋附著劑係由部分縮合物(A)所構成,亦 即含有下述成分之混合物的部分水解縮合物:以下式(a-1)表示之水解性矽烷化合物(a-1)、以下式(a-2)表示之水解性矽烷化合物(a-2)及以下式(a-3)表示之水解性矽烷化合物(a-3);且該部分水解縮合物之氟原子含有率為2.5~40質量%。 The anti-fingerprint adhesive of the present invention is composed of a partial condensate (A), In other words, the hydrolyzable decane compound (a-1) represented by the following formula (a-1) and the hydrolyzable decane compound (a-2) represented by the following formula (a-2); And the hydrolyzable decane compound (a-3) represented by the following formula (a-3); and the partial hydrolysis-condensation product has a fluorine atom content of 2.5 to 40% by mass.

式(a-1)、(a-2)及(a-3)中之記號係如以下所述。 The symbols in the formulas (a-1), (a-2) and (a-3) are as follows.

Rf:碳原子數1~6之全氟烷基或以Rf1ORf2-表示且碳原子數2~100之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基);Q1:碳原子數1~10且不含氟原子之2價有機基;Y:具有乙烯性雙鍵之基;Q2:碳原子數1~6且不含氟原子之2價有機基;RH1、RH2:碳原子數1~6之烴基;X1、X2、X3:水解性基;p:0~3之整數;q:1或2;r:0或1且q+r成為1或2之數。 R f : a perfluoroalkyl group having 1 to 6 carbon atoms or a monovalent group represented by R f1 OR f2 - and having 2 to 100 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, R F2 is a perfluoroalkyl group having an etheric oxygen atom between carbon-carbon atoms; Q 1 : a divalent organic group having 1 to 10 carbon atoms and no fluorine atom; Y: having an ethylenic double bond a group; Q 2 : a divalent organic group having 1 to 6 carbon atoms and no fluorine atom; R H1 and R H2 : a hydrocarbon group having 1 to 6 carbon atoms; X 1 , X 2 and X 3 : a hydrolyzable group; p: an integer from 0 to 3; q: 1 or 2; r: 0 or 1 and q+r becomes the number of 1 or 2.

惟,式(a-1)中存在複數個X1及式(a-2)或式(a-3)中存在 複數個X2、X3、RH1、Y-Q2時,其等可彼此相異亦可相同。 However, when a plurality of X 1 and a formula (a-2) or a formula (a-3) have a plurality of X 2 , X 3 , R H1 , and YQ 2 in the formula (a-1), they may be mutually The difference can also be the same.

本發明之部分縮合物(A)係於化合物中,在上述範圍下含有源自水解性矽烷化合物(a-1)之氟原子,而可對使用含此之硬塗膜用組成物形成的硬塗膜層表面賦予優異的撥水撥油性。認為,藉由硬塗膜層表面具有撥水撥油性而使從指尖轉印至表面之水分及皮脂成分等處於不會密著於硬塗膜層表面的狀態。處於該狀態的皮脂成分等可輕易地拭取。亦即,可以說藉由使用部分縮合物(A)而得以對硬塗膜層賦予優異的抗指紋附著性。 The partial condensate (A) of the present invention is a compound containing a fluorine atom derived from the hydrolyzable decane compound (a-1) in the above range, and can be formed by using a composition for a hard coat film containing the same. The surface of the coating layer imparts excellent water and oil repellency. It is considered that the water and the sebum component transferred from the fingertip to the surface by the water-repellent property of the surface of the hard coat layer are not adhered to the surface of the hard coat layer. The sebum component or the like in this state can be easily wiped off. That is, it can be said that the hard coat layer is imparted with excellent anti-fingerprint adhesion by using the partial condensate (A).

而,部分縮合物(A)中之氟原子含有率為2.5~40質量%,以3~40質量%較佳,20~40質量%更佳,25~40質量%尤佳,且以30~40質量%最佳。 Further, the fluorine atom content in the partial condensate (A) is 2.5 to 40% by mass, preferably 3 to 40% by mass, more preferably 20 to 40% by mass, particularly preferably 25 to 40% by mass, and 30% by weight. 40% by mass is the best.

若在上述範圍之上限值以下,與後述之光聚合化合物(B)的相溶性即佳,且硬化膜之外觀及抗指紋附著性良好。而,氟原子含有率是部分縮合物(A)每單元質量之氟原子質量的比例,可以後述方法求算。 When it is at most the upper limit of the above range, the compatibility with the photopolymerizable compound (B) to be described later is good, and the appearance of the cured film and the anti-fingerprint adhesion are good. Further, the fluorine atom content ratio is a ratio of the mass of the fluorine atom per unit mass of the partial condensate (A), and can be calculated by a method described later.

本發明中之部分縮合物(A)因含有源自水解性矽烷化合物(a-2)之單元,部分縮合物(A)對烴系溶媒之溶解性及造膜性即佳。 The partial condensate (A) in the present invention contains a unit derived from the hydrolyzable decane compound (a-2), and the solubility and film-forming property of the partial condensate (A) with respect to the hydrocarbon-based solvent are preferable.

本發明中之部分縮合物(A)藉由含有具有源自水解性矽烷化合物(a-3)之乙烯性雙鍵之基,可自由基聚合。與具有含此之硬塗膜用組成物的主成分即後述之光聚合性化合物(B)所有的乙烯性雙鍵之基的結合性即佳,可抑制部分縮合物(A)自硬塗膜層的漏溢。 The partial condensate (A) in the present invention is radically polymerizable by containing a group having an ethylenic double bond derived from the hydrolyzable decane compound (a-3). It is preferable to bond with all of the ethylenic double bond groups of the photopolymerizable compound (B) which is a main component of the composition for a hard coat film containing the above, and it is possible to suppress the partial condensate (A) from the hard coat film. The layer leaks.

又,本發明中之部分縮合物(A)宜具有矽烷醇基。矽烷醇基之數量以每1個矽原子有0.2~3.5個為佳,0.2~2.0個較佳,0.5~1.5個尤佳。若在上述範圍之下限值以上,使用硬塗膜用組成物形成硬塗膜層時,部分縮合物(A)即難以從基材表面蒸發。若在上述範圍之上限值以下,含有部分縮合物(A)之硬塗膜組成物其部分縮合物(A)彼此即難以凝聚,貯藏穩定性良好。 Further, the partial condensate (A) in the present invention preferably has a stanol group. The number of stanol groups is preferably from 0.2 to 3.5 per one cesium atom, preferably from 0.2 to 2.0, and preferably from 0.5 to 1.5. When the hard coat layer is formed using the composition for a hard coat film at the lower limit or more of the above range, the partial condensate (A) is difficult to evaporate from the surface of the substrate. When it is less than the upper limit of the above range, the hard coat film composition containing the partial condensate (A) has a partial condensate (A) which is difficult to aggregate and has good storage stability.

而,部分縮合物(A)中之矽烷醇基數係藉由以29Si-NMR測定之具有矽烷醇基之Si基及不具矽烷醇基之Si基的峰面積之比算出。 Further, the number of decyl alcohol groups in the partial condensate (A) was calculated from the ratio of the peak areas of the Si group having a stanol group and the Si group having no stanol group measured by 29 Si-NMR.

構成本發明之抗指紋附著劑的部分縮合物(A)係含有水解性矽烷化合物(a-1)~(a-3)之水解性矽烷化合物的混合物(以下亦稱為「水解性矽烷化合物混合物」)之部分水解縮合物。以下,就各水解性矽烷化合物進行說明。 The partial condensate (A) constituting the anti-fingerprint adhesive of the present invention is a mixture of hydrolyzable decane compounds containing hydrolyzable decane compounds (a-1) to (a-3) (hereinafter also referred to as "hydrolyzable decane compound mixture" Partially hydrolyzed condensate. Hereinafter, each hydrolyzable decane compound will be described.

(水解性矽烷化合物(a-1)) (hydrolyzable decane compound (a-1))

水解性矽烷化合物(a-1)是以下式(a-1)表示之含氟水解性矽烷化合物。 The hydrolyzable decane compound (a-1) is a fluorine-containing hydrolyzable decane compound represented by the following formula (a-1).

Rf-Q1-SiX1 3...(a-1) R f -Q 1 -SiX 1 3 (a-1)

式(a-1)中,Rf係碳原子數1~6之全氟烷基或以Rf1ORf2-表示之碳原子數2~100之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基),Q1係不含碳原子數1~10且不具氟原子之2價有機基,X1係水解性基。惟,3個X1可彼此相異亦可相同。h In the formula (a-1), R f is a perfluoroalkyl group having 1 to 6 carbon atoms or a monovalent group having 2 to 100 carbon atoms represented by R f1 OR f2 - (R f1 is a carbon atom number 1~) 6 perfluoroalkyl group, R f2 is a perfluoroalkyl group having an etheric oxygen atom between carbon-carbon atoms), and Q 1 does not contain a divalent organic group having 1 to 10 carbon atoms and no fluorine atom X 1 is a hydrolyzable group. However, the three X 1 may be different from each other or the same. h

因為化合物(a-1)具有Rf,所以由含有部分縮合物 (A)之硬塗膜用組成物形成的硬塗膜層可顯示優異的抗指紋附著性。因為化合物(a-1)具有Rf,所以將含有部分縮合物(A)之硬塗膜用組成物塗佈至基材時,Rf基容易侷在化於與塗膜基材相反之側(即空氣側)。即,部分縮合物(A)容易侷在化於與基材相反之側。 Since the compound (a-1) has R f , the hard coat layer formed of the composition for a hard coat film containing the partial condensate (A) can exhibit excellent anti-fingerprint adhesion. Since the compound (a-1) has R f , when the composition for a hard coat film containing the partial condensate (A) is applied to a substrate, the R f group is easily formed on the opposite side to the coated substrate. (ie the air side). That is, the partial condensate (A) is easily localized on the side opposite to the substrate.

在式(a-1)中,從環境負荷之觀點及對通用溶媒之溶解性優異之觀點看來,Rf不含碳原子數7以上之全氟烷基。 In the formula (a-1), R f does not contain a perfluoroalkyl group having 7 or more carbon atoms from the viewpoint of environmental load and excellent solubility in a general-purpose solvent.

Rf之結構可舉如直鏈結構、支鏈結構、環結構、或局部具有環之結構,且以直鏈結構為佳。 The structure of R f may be, for example, a linear structure, a branched structure, a ring structure, or a structure having a ring partially, and a linear structure is preferred.

作為Rf為碳數1~6之全氟烷基時的具體例,可舉以下之基。 Specific examples of the case where R f is a perfluoroalkyl group having 1 to 6 carbon atoms include the following groups.

F(CF2)4-、F(CF2)6-。 F(CF 2 ) 4 -, F(CF 2 ) 6 -.

當Rf係以Rf1ORf2-表示之碳原子數2~100之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基)時,從與其他水解性矽烷化合物之相溶性之觀點看來,以碳原子數為2~80較佳,且以2~40尤佳。 When R f is a valence group having 2 to 100 carbon atoms represented by R f1 OR f2 - (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 may have an ether between carbon-carbon atoms In the case of the perfluoroalkylene group of the oxygen atom, it is preferably from 2 to 80, more preferably from 2 to 40, from the viewpoint of compatibility with other hydrolyzable decane compounds.

Rf2以(Rf3O)x為佳(式中,Rf3係碳原子數1~10之全氟伸烷基,x係1~99之整數)。Rf3可為直鏈狀亦可為支鏈狀。從合成之易行性看來,Rf3之碳原子數以1~5尤佳。作為(Rf3O)之具體例可舉如以下。 R f2 is preferably (R f3 O) x (wherein R f3 is a perfluoroalkyl group having 1 to 10 carbon atoms, and x is an integer of 1 to 99). R f3 may be linear or branched. From the standpoint of the ease of synthesis, the number of carbon atoms of R f3 is preferably from 1 to 5. Specific examples of (R f3 O) include the following.

(CF2O)、(CF2CF2O)、(CF2CF2CF2O)、(CF(CF3)CF2O)、(CF2CF2CF2CF2O)等。 (CF 2 O), (CF 2 CF 2 O), (CF 2 CF 2 CF 2 O), (CF(CF 3 )CF 2 O), (CF 2 CF 2 CF 2 CF 2 O), or the like.

x在2以上時,(Rf3O)單元可為1種亦可為2種以上,且其 鍵結順序不受限定。可以是由複數單元所構成之嵌段、無規或交互之任一種配置。 When x is 2 or more, the (R f3 O) unit may be one type or two or more types, and the bonding order is not limited. It may be any configuration of blocks, randoms or interactions composed of complex units.

作為Rf係以Rf1ORf2-表示之碳原子數2~100之1價基時的具體例,可舉如以下之基。 Specific examples of the case where the R f is a monovalent group having 2 to 100 carbon atoms represented by R f1 OR f2 - may be exemplified below.

CF3OCF3CF2CF2-、CF3OCF(CF3)CF2-、CF3OCF(CF3)CF2OCF(CF3)-。 CF 3 OCF 3 CF 2 CF 2 -, CF 3 OCF(CF 3 )CF 2 -, CF 3 OCF(CF 3 )CF 2 OCF(CF 3 )-.

F(CF2)2OCF2CF2OCF2-、F(CF2)2OCF2CF2OCF2CF2-、F(CF2)2OCF2CF2OCF2CF2OCF2CF2OCF2-、F(CF2)2OCF2CF2OCF2CF2OCF2CF2OCF2CF2-、F(CF2)2OCF(CF3)CF2OCF(CF3)-。 F(CF 2 ) 2 OCF 2 CF 2 OCF 2 -, F(CF 2 ) 2 OCF 2 CF 2 OCF 2 CF 2 -, F(CF 2 ) 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 -, F(CF 2 ) 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 CF 2 -, F(CF 2 ) 2 OCF(CF 3 )CF 2 OCF(CF 3 )-.

F(CF2)3OCF2-、F(CF2)3OCF2CF2-、F(CF2)3OCF(CF3)-、F(CF2)3OCF(CF3)CF2-、F(CF2)3OCF(CF3)CF2OCF2CF2-、F(CF2)3OCF(CF3)CF2OCF(CF3)-、F(CF2)3OCF(CF3)CF2OCF(CF3)CF2-、CF3O(CF2CF2O)x1CF2-(x1係1~49之整數)、F(CF2)3O(CF(CF3)CF2O)x2CF(CF3)-(x2係1~31之整數)、F(CF2)2O(CF2CF2OCF2CF2CF2CF2O)x3CF2CF2OCF2CF2CF2-(x3係1~15之整數)、F(CF2)2O(CF2CF2OCF2CF2CF2CF2O)x4CF2CF2OCF2CF2CF2CF2(x4係1~15之整數)。 F(CF 2 ) 3 OCF 2 -, F(CF 2 ) 3 OCF 2 CF 2 -, F(CF 2 ) 3 OCF(CF 3 )-, F(CF 2 ) 3 OCF(CF 3 )CF 2 -, F(CF 2 ) 3 OCF(CF 3 )CF 2 OCF 2 CF 2 -, F(CF 2 ) 3 OCF(CF 3 )CF 2 OCF(CF 3 )-, F(CF 2 ) 3 OCF(CF 3 ) CF 2 OCF(CF 3 )CF 2 -, CF 3 O(CF 2 CF 2 O) x1 CF 2 - (x1 is an integer from 1 to 49), F(CF 2 ) 3 O(CF(CF 3 )CF 2 O) x2 CF(CF 3 )-(x2 is an integer from 1 to 31), F(CF 2 ) 2 O(CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) x3 CF 2 CF 2 OCF 2 CF 2 CF 2 -(x3 is an integer from 1 to 15), F(CF 2 ) 2 O(CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) x4 CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 (x4 Is an integer from 1 to 15).

化合物(a-1)中之Q1係碳原子數1~10且不具氟原子之2價有機基,為連結Rf與水解性矽烷基(-SiX1 3)之2價有機基。當Q1係以分別於右側之鍵上鍵結Si且於左側之鍵上鍵結Rf表示時,具體上以下述表示之基為佳:-(CH2)i1-(i1 係1~5之整數)、-CH2O(CH2)i2-(i2係1~4之整數)、-SO2NR1-(CH2)i3-(R1係氫原子、甲基或乙基,i3係1以上且與R1之碳原子數之合計為4以下之整數)、-(C=O)-NR1-(CH2)i4-(R1與上述相同,i4係1以上且與R1之碳原子數之合計為4以下之整數)、-(CH2)i5-OC(=O)-(CH2)i6-S-(CH2)i7-(i5、i6及i7分別獨立為1~5之整數)、-(CH2)i5-OC(=O)-(CH2)i6-NH-(CH2)i7-(i5、i6及i7與上述相同)、-(CH2)i5-OC(=O)-(CH2)i6-N(CH3)-(CH2)i7-(i5、i6及i7與上述相同)、-(CH2)i5-OC(=O)-(CH2)i6-N(C6H5)-(CH2)i7-(i5、i6及i7與上述相同)。作為Q1,以-(CH2)2-、-(CH2)3-及-(CH2)2-OC(=O)-(CH2)2-S-(CH2)3-較佳,且以-(CH2)2-及-(CH2)2-OC(=O)-(CH2)2-S-(CH2)3-尤佳。 In the compound (a-1), Q 1 is a divalent organic group having 1 to 10 carbon atoms and having no fluorine atom, and is a divalent organic group linking R f and a hydrolyzable decyl group (-SiX 1 3 ). When Q 1 is bonded to Si on the key on the right side and R f is on the bond on the left side, the base represented by the following is preferably: -(CH 2 ) i1 -(i1 is 1~5 Integer), -CH 2 O(CH 2 ) i2 - (i2 is an integer from 1 to 4), -SO 2 NR 1 -(CH 2 ) i3 - (R 1 is a hydrogen atom, methyl or ethyl, i3 1 or more and the total number of carbon atoms of R 1 is an integer of 4 or less), -(C=O)-NR 1 -(CH 2 ) i4 - (R 1 is the same as above, and i4 is 1 or more and R The total number of carbon atoms of 1 is an integer of 4 or less), -(CH 2 ) i5 -OC(=O)-(CH 2 ) i6 -S-(CH 2 ) i7 - (i5, i6 and i7 are each independently An integer from 1 to 5), -(CH 2 ) i5 -OC(=O)-(CH 2 ) i6 -NH-(CH 2 ) i7 - (i5, i6 and i7 are the same as above), -(CH 2 ) I5 -OC(=O)-(CH 2 ) i6 -N(CH 3 )-(CH 2 ) i7 -(i5, i6 and i7 are the same as above), -(CH 2 ) i5 -OC(=O)- (CH 2 ) i6 -N(C 6 H 5 )-(CH 2 ) i7 - (i5, i6 and i7 are the same as above). As Q 1 , -(CH 2 ) 2 -, -(CH 2 ) 3 - and -(CH 2 ) 2 -OC(=O)-(CH 2 ) 2 -S-(CH 2 ) 3 - is preferred. Further, -(CH 2 ) 2 - and -(CH 2 ) 2 -OC(=O)-(CH 2 ) 2 -S-(CH 2 ) 3 - is particularly preferred.

而,Rf為全氟烷基時,作為上述Q1,以下述表示之基為佳:-(CH2)i1-(i1與上述相同)、-(CH2)i5-OC(=O)-(CH2)i6-S-(CH2)i7-(i5、i6及i7與上述相同)。i1以2~4之整數為佳,且以2尤佳。i5、i6及i7以分別獨立為2~4之整數為佳,且以2或3尤佳。 Further, when R f is a perfluoroalkyl group, as the above Q 1 , the group represented by the following is preferable: -(CH 2 ) i1 - (i1 is the same as above), -(CH 2 ) i5 -OC(=O) -(CH 2 ) i6 -S-(CH 2 ) i7 - (i5, i6 and i7 are the same as described above). I1 is preferably an integer of 2 to 4, and is preferably 2. I5, i6, and i7 are preferably integers of 2 to 4, respectively, and preferably 2 or 3.

又,Rf係含有醚性氧原子之全氟烷基時,作為上述Q1,以下述表示之基(i1~4及R1與上述相同)為佳:-(CH2)i1-、-CH2O(CH2)i2-、-SO2NR1-(CH2)i3-、-(C=O)-NR1-(CH2)i4-。i1以2~4之整數為佳,且以2尤佳。 Further, when R f is a perfluoroalkyl group having an etheric oxygen atom, the above-mentioned Q 1 is preferably represented by the following groups (i1 to 4 and R 1 are the same as defined above): -(CH 2 ) i1 -, - CH 2 O(CH 2 ) i2 -, -SO 2 NR 1 -(CH 2 ) i3 -, -(C=O)-NR 1 -(CH 2 ) i4 -. I1 is preferably an integer of 2 to 4, and is preferably 2.

在式(a-1)中,X1表示鍵結於矽原子之水解性基。作為X1,可舉如烷氧基、芳氧基、鹵素原子、醯氧基、胺 基及胺基之氫經烷基取代之基等。其中,作為X1以碳原子數1~4之烷氧基或鹵素原子為佳,且以甲氧基、乙氧基及氯原子尤佳。甲氧基及乙氧基會藉由水解反應成為羥基(矽烷醇基),進而在分子間進行縮合反應形成Si-O-Si鍵結之反應易於圓滑地進展。 In the formula (a-1), X 1 represents a hydrolyzable group bonded to a ruthenium atom. Examples of X 1 include a group in which an alkoxy group, an aryloxy group, a halogen atom, a decyloxy group, an amine group, and an amine group are substituted with an alkyl group. Among them, X 1 is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom, and particularly preferably a methoxy group, an ethoxy group or a chlorine atom. The methoxy group and the ethoxy group are converted into a hydroxyl group (stanol group) by a hydrolysis reaction, and a reaction in which a molecule undergoes a condensation reaction to form a Si-O-Si bond tends to progress smoothly.

作為化合物(a-1)的理想具體例,可舉如以下化合物。 Preferable specific examples of the compound (a-1) include the following compounds.

F(CF2)4CH2CH2Si(OCH3)3、F(CF2)4CH2CH2Si(OCH2CH3)3、F(CF2)4CH2CH2SiCl3、F(CF2)6CH2CH2Si(OCH3)3、F(CF2)6CH2CH2Si(OCH2CH3)3、F(CF2)6CH2CH2SiCl3F(CF 2 ) 4 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 4 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , F(CF 2 ) 4 CH 2 CH 2 SiCl 3 , F (CF 2 ) 6 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 SiCl 3 .

CF3OCF2CF2CF2CH2CH2Si(OCH3)3、F(CF2)2O(CF2)2O(CF2)2O(CF2)2OCF2CH2CH2Si(OCH2CH3)3、CF3OCF(CF3)CF2CH2CH2CH2Si(OCH3)3CF 3 OCF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 2 O(CF 2 ) 2 O(CF 2 ) 2 O(CF 2 ) 2 OCF 2 CH 2 CH 2 Si (OCH 2 CH 3 ) 3 , CF 3 OCF(CF 3 )CF 2 CH 2 CH 2 CH 2 Si(OCH 3 ) 3 .

F(CF2)2O(CF2)2OCF2CH2CH2CH2Si(OCH3)3、F(CF2)2O(CF2)2O(CF2)2CH2CH2Si(OCH3)3F(CF 2 ) 2 O(CF 2 ) 2 OCF 2 CH 2 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 2 O(CF 2 ) 2 O(CF 2 ) 2 CH 2 CH 2 Si (OCH 3 ) 3 .

F(CF2)3O(CF2)2CH2CH2SiCl3、F(CF2)3OCF(CF3)CF2O(CF2)2CH2CH2Si(OCH3)3、CF3O(CF2CF2O)x1CF2C(=O)NHCH2CH2CH2Si(OCH3)3(x1係1~49之整數)、F(CF2)3O(CF(CF3)CF2O)x2CF(CF3)CH2CH2Si(OCH3)3(x2係1~31之整數)、F(CF2)2O(CF2CF2OCF2CF2CF2CF2O)x3(CF2)2O(CF2)3C(=O)NHCH2CH2CH2Si(OCH3)3(x3係1~15之整數)、 F(CF2)2O(CF2CF2OCF2CF2CF2CF2O)x4(CF2)2O(CF2)4CH2CH2CH2Si(OCH3)3(x4係1~15之整數)、F(CF2)6CH2CH2OC(=O)CH2CH2SCH2CH2CH2Si(OCH3)3、F(CF2)6CH2CH2OC(=O)CH(CH3)CH2SCH2CH2CH2Si(OCH3)3、[F(CF2)6CH2CH2OC(=O)CH2CH2]2NCH2CH2CH2Si(OCH3)3、F(CF2)6CH2CH2OC(=O)CH2CH2NHCH2CH2CH2Si(OCH3)3、[F(CF2)6CH2CH2OC(=O)CH(CH3)CH2]2NCH2CH2CH2Si(OCH3)3、F(CF2)6CH2CH2OC(=O)CH2CH(CH3)NHCH2CH2CH2Si(OCH3)3、F(CF2)6CH2CH2OC(=O)CH2CH2N(CH3)CH2CH2CH2Si(OCH3)3、F(CF2)6CH2CH2OC(=O)CH2CH(CH3)N(CH3)CH2CH2CH2Si(OCH3)3、F(CF2)6CH2CH2OC(=O)CH2CH2N(C6H5)CH2CH2CH2Si(OCH3)3、F(CF2)6CH2CH2OC(=O)CH2CH(CH3)N(C6H5)CH2CH2CH2Si(OCH3)3F(CF 2 ) 3 O(CF 2 ) 2 CH 2 CH 2 SiCl 3 , F(CF 2 ) 3 OCF(CF 3 )CF 2 O(CF 2 ) 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 O(CF 2 CF 2 O) x1 CF 2 C(=O)NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3 (x1 is an integer from 1 to 49), F(CF 2 ) 3 O(CF(CF) 3 ) CF 2 O) x2 CF(CF 3 )CH 2 CH 2 Si(OCH 3 ) 3 (x2 is an integer from 1 to 31), F(CF 2 ) 2 O(CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) x3 (CF 2 ) 2 O(CF 2 ) 3 C(=O)NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3 (x3 is an integer from 1 to 15), F(CF 2 ) 2 O (CF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 O) x4 (CF 2 ) 2 O(CF 2 ) 4 CH 2 CH 2 CH 2 Si(OCH 3 ) 3 (x4 is an integer of 1 to 15), F (CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH 2 SCH 2 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH(CH 3 CH 2 SCH 2 CH 2 CH 2 Si(OCH 3 ) 3 , [F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH 2 ] 2 NCH 2 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH 2 NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3 , [F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH (CH 3 )CH 2 ] 2 NCH 2 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH(CH 3 )NHCH 2 CH 2 CH 2 Si (OCH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH 2 N(CH 3 )CH 2 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH(CH 3 )N(CH 3 )CH 2 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH 2 N(C 6 H 5 )CH 2 CH 2 CH 2 Si(OCH 3 ) 3 ,F (CF 2 ) 6 CH 2 CH 2 OC(=O)CH 2 CH(CH 3 )N(C 6 H 5 )CH 2 CH 2 CH 2 Si(OCH 3 ) 3 .

在本發明中,作為化合物(a-1),其中尤宜使用F(CF2)6CH2CH2Si(OCH3)3、F(CF2)3OCF(CF3)CF2O(CF2)2CH2CH2Si(OCH3)3、CF3O(CF2CF2O)8CF2C(=O)NHCH2CH2CH2Si(OCH3)3及KY-108(商品名、信越化學工業公司製,具有上述Rf1ORf2-Q1-基及3個烷氧基之矽烷化合物)。 In the present invention, as the compound (a-1), it is particularly preferable to use F(CF 2 ) 6 CH 2 CH 2 Si(OCH 3 ) 3 , F(CF 2 ) 3 OCF(CF 3 )CF 2 O(CF 2 ) 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 O(CF 2 CF 2 O) 8 CF 2 C(=O)NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3 and KY-108 (Commodity Name, manufactured by Shin-Etsu Chemical Co., Ltd., having the above R f1 OR f2 -Q 1 - group and 3 alkoxy decane compounds).

而,就本發明中之部分縮合物(A)原料的水解性矽烷化合物而言,化合物(a-1)可單獨使用1種亦可將2種以上併用。 In addition, as for the hydrolyzable decane compound of the raw material of the partial condensate (A) in the present invention, the compound (a-1) may be used alone or in combination of two or more.

又,在本發明之部分縮合物(A)中,作為水解性矽烷化合物混合物中之化合物(a-1)之含量係從該混合物製得之部分縮合物(A)中之氟原子含有率成為上述範圍之量。 Further, in the partial condensate (A) of the present invention, the content of the compound (a-1) in the hydrolyzable decane compound mixture is such that the fluorine atom content in the partial condensate (A) obtained from the mixture becomes The amount of the above range.

(水解性矽烷化合物(a-2)) (hydrolyzable decane compound (a-2))

水解性矽烷化合物(a-2)係與上述化合物(a-1)一起作為本發明中之部分縮合物(A)原料的水解性矽烷化合物使用且以下式(a-2)表示之化合物。 The hydrolyzable decane compound (a-2) is a compound represented by the following formula (a-2) which is used as the hydrolyzable decane compound which is a raw material of the partial condensate (A) in the present invention together with the above compound (a-1).

RH1 p-SiX2 (4-p)...(a-2) R H1 p -SiX 2 (4-p) ...(a-2)

式(a-2)中,RH1係碳原子數1~6之烴基,以碳原子數1~4之烷基或苯基為佳,以甲基或乙基較佳,且以甲基尤佳。X2係水解性基,可採用與上式(a-1)中存在複數個X1相同者並包含其理想態樣。p係0~3之整數。惟,p係2或3時的2個或3個RH1及(4-p)個X2可分別彼此相異亦可相同。 In the formula (a-2), R H1 is a hydrocarbon group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms or a phenyl group, preferably a methyl group or an ethyl group, and a methyl group. good. The X 2 -based hydrolyzable group may be the same as the plurality of X 1 in the above formula (a-1) and includes the desired aspect. p is an integer from 0 to 3. However, two or three R H1 and (4-p) X 2 when p is 2 or 3 may be different from each other or may be the same.

化合物(a-2)以p為0之4官能性化合物或p為1之3官能性化合物為佳,且以4官能性化合物尤佳。化合物(a-2)可單獨使用1種亦可將2種以上併用。將2種以上併用時,亦可連同4官能性化合物及/或3官能性化合物一起併用2官能性化合物及/或1官能性化合物。 The compound (a-2) is preferably a 4-functional compound in which p is 0 or a 3-functional compound in which p is 1, and a tetra-functional compound is particularly preferable. The compound (a-2) may be used alone or in combination of two or more. When two or more types are used together, a bifunctional compound and/or a monofunctional compound may be used together with a tetrafunctional compound and/or a trifunctional compound.

在部分縮合物(A)中係藉由源自化合物(a-1)之單元中之Rf顯現撥水撥油性。又,在源自化合物(a-2)之單元中p為0時,具有部分縮合物(A)之造膜性優異的優點。在源自化合物(a-2)之單元中,p為1、2或3時(即存在RH1時),具有下述優點:藉由RH1以某程度存在,可使部分縮合物(A)易於溶解於烴系溶媒;且於基材表面形成硬塗膜用組成物之塗膜時,可選擇比較低價的溶媒。 In the partial condensate (A), water repellency is exhibited by R f in the unit derived from the compound (a-1). In addition, when p is 0 in the unit derived from the compound (a-2), the partial condensate (A) has an advantage of being excellent in film formability. In the unit derived from the compound (a-2), when p is 1, 2 or 3 (i.e., when R H1 is present), there is an advantage that a partial condensate can be obtained by the presence of R H1 to some extent (A). When a coating film of a composition for a hard coating film is formed on the surface of the substrate, it is easy to dissolve in a hydrocarbon-based solvent; and a relatively low-cost solvent can be selected.

作為化合物(a-2)之具體例,可舉如以下化合物。又,作為化合物(a-2),亦可因應需求使用已將其複數個預先進行部分水解縮合而得之化合物(a-2)的部分水解縮合 物。而,其他水解性矽烷化合物方面,同樣亦可使用其部分水解縮合物。 Specific examples of the compound (a-2) include the following compounds. Further, as the compound (a-2), partial hydrolysis condensation of the compound (a-2) obtained by partially hydrolyzing and condensing a plurality of them in advance may be used as required. Things. On the other hand, in the case of other hydrolyzable decane compounds, a partially hydrolyzed condensate thereof can also be used.

Si(OCH3)4、Si(OCH2CH3)4、CH3Si(OCH3)3、CH3Si(OCH2CH3)3、CH3CH2Si(OCH3)3、CH3CH2Si(OCH2CH3)3、(CH3)2Si(OCH3)2、(CH3)2Si(OCH2CH3)2、Si(OCH3)4之部分水解縮合物(例如COLCOAT公司製之矽酸甲酯51(商品名))、Si(OCH2CH3)4之部分水解縮合物(例如COLCOAT公司製之矽酸乙酯40、矽酸乙酯48。多摩化學工業公司製之矽酸酯45(皆為商品名))。 Si(OCH 3 ) 4 , Si(OCH 2 CH 3 ) 4 , CH 3 Si(OCH 3 ) 3 , CH 3 Si(OCH 2 CH 3 ) 3 , CH 3 CH 2 Si(OCH 3 ) 3 , CH 3 CH 2 Partially hydrolyzed condensate of Si(OCH 2 CH 3 ) 3 , (CH 3 ) 2 Si(OCH 3 ) 2 , (CH 3 ) 2 Si(OCH 2 CH 3 ) 2 , Si(OCH 3 ) 4 (eg COLCOAT) A partially hydrolyzed condensate of methyl decanoate 51 (trade name) and Si (OCH 2 CH 3 ) 4 (for example, ethyl decanoate 40 manufactured by COLCOAT Co., Ltd., ethyl decanoate 48. manufactured by Tama Chemical Industry Co., Ltd. Phthalate 45 (all are trade names)).

又,化合物(a-2)可單獨使用1種亦可將2種以上併用。 Further, the compound (a-2) may be used alone or in combination of two or more.

而,水解性矽烷化合物混合物中之水解性矽烷化合物(a-2)之含量相對於水解性矽烷化合物(a-1)100莫耳,水解性矽烷化合物(a-2)在1~23,000莫耳為佳,在1~15,000莫耳較佳,在1~3,000莫耳更佳,在1~800莫耳尤佳,在1~400莫耳最佳。 Further, the content of the hydrolyzable decane compound (a-2) in the hydrolyzable decane compound mixture is 100 mol with respect to the hydrolyzable decane compound (a-1), and the hydrolyzable decane compound (a-2) is 1 to 23,000 mol. It is better, preferably 1~15,000 Mo, better in 1~3,000 Mo, especially in 1~800 Mo, and best in 1~400 Mo.

(水解性矽烷化合物(a-3)) (hydrolyzable decane compound (a-3))

水解性矽烷化合物(a-3)係以下式(a-3)表示之含有具乙烯性雙鍵之基的水解性矽烷化合物,與上述化合物(a-1)、化合物(a-2)一起作為本發明之部分縮合物(A)原料使用。 The hydrolyzable decane compound (a-3) is a hydrolyzable decane compound containing a group having an ethylenic double bond represented by the following formula (a-3), and is used together with the above compound (a-1) and compound (a-2). The partial condensate (A) raw material of the present invention is used.

[化4] [Chemical 4]

在式(a-3)中,表示水解性基之X3可採用與上式(a-1)中存在複數個X1相同者並包含其理想態樣。又,RH2可採用與上式(a-2)中之RH1相同者並包含其理想態樣。 In the formula (a-3), X 3 representing a hydrolyzable group may be the same as the plurality of X 1 in the above formula (a-1) and include a desired aspect thereof. Further, R H2 may be the same as R H1 in the above formula (a-2) and include its ideal aspect.

式(a-3)中之Y係具有乙烯性雙鍵之基,Q2係碳原子數1~6之不含氟原子之2價有機基。q係1或2,r係0或1,且q+r為1或2之數。惟,Y-Q2及X3在上述水解性矽烷化合物內存在複數個時,該等可彼此相異亦可彼此相同。 Y in the formula (a-3) has a group having an ethylenic double bond, and Q 2 is a divalent organic group having no fluorine atom and having 1 to 6 carbon atoms. q is 1 or 2, r is 0 or 1, and q+r is 1 or 2. However, when YQ 2 and X 3 are present in a plurality of the above hydrolyzable decane compounds, they may be different from each other or may be identical to each other.

因為化合物(a-3)具有Y,所以將含有製得之部分縮合物(A)的硬塗膜用組成物之膜光硬化時,在該膜表面可透過該基使部分縮合物(A)彼此聚合,或使部分縮合物(A)與硬塗膜用組成物含有的光聚合性化合物(B)所具乙烯性雙鍵之基聚合。因此,具有光硬化後使部分縮合物(A)容易侷在化於硬塗膜層尤其是其表面之作用,並可賦予即便長期使用後仍可將硬塗膜層表面保持在撥水撥油性並使抗指紋附著性持續之效果。 Since the compound (a-3) has Y, when the hard coat film containing the obtained partial condensate (A) is photocured by the film of the composition, the partial condensate (A) can be transmitted through the base on the surface of the film. The polymerization is carried out, or the partial condensate (A) and the photopolymerizable compound (B) contained in the composition for a hard coat film are polymerized with a vinyl double bond. Therefore, after photohardening, the partial condensate (A) is easily localized on the hard coat layer, especially on the surface thereof, and can impart the water-repellent property to the surface of the hard coat layer even after long-term use. And make the anti-fingerprint adhesion last.

作為式(a-3)中之Y,以(甲基)丙烯醯氧基、乙稀苯基等為佳,且以(甲基)丙烯醯氧基尤佳。 As Y in the formula (a-3), a (meth) acryloxy group, an ethyl phenyl group or the like is preferable, and a (meth) propylene fluorenyl group is particularly preferable.

式(a-3)中之Q2係將水解性矽烷基(-SiX3 (4-q-r)(RH2)r)與Y鍵結之連結基,具體上可舉如碳原子數2~6之伸烷基及伸苯基等。其中以-(CH2)3-為佳。 The Q 2 in the formula (a-3) is a linking group in which a hydrolyzable decyl group (-SiX 3 (4-qr) (R H2 ) r ) is bonded to Y, and specifically, a carbon number of 2 to 6 is exemplified. The alkyl group and the phenyl group. Among them, -(CH 2 ) 3 - is preferred.

在式(a-3)中,q為2時,2個Y-Q2可彼此相同亦可 相異,q+r為1時,3個X3可彼此相同亦可相異,q+r為2時,2個X3可彼此相同亦可相異。 In the formula (a-3), when q is 2, the two YQ 2 may be the same or different from each other, and when q+r is 1, the three X 3 may be the same or different from each other, and q+r is 2 When two X 3s are the same or different from each other.

式(a-3)中,以q為1且r為0或1為佳。 In the formula (a-3), it is preferred that q is 1 and r is 0 or 1.

作為化合物(a-3)之具體例,可舉如以下化合物。 Specific examples of the compound (a-3) include the following compounds.

CH2=C(CH3)COO(CH2)3Si(OCH3)3、CH2=C(CH3)COO(CH2)3Si(OC2H5)3、CH2=CHCOO(CH2)3Si(OCH3)3、CH2=CHCOO(CH2)3Si(OC2H5)3、[CH2=C(CH3)COO(CH2)3]CH3Si(OCH3)2、[CH2=C(CH3)COO(CH2)3]CH3Si(OC2H5)2CH 2 =C(CH 3 )COO(CH 2 ) 3 Si(OCH 3 ) 3 , CH 2 =C(CH 3 )COO(CH 2 ) 3 Si(OC 2 H 5 ) 3 , CH 2 =CHCOO(CH 2 ) 3 Si(OCH 3 ) 3 , CH 2 =CHCOO(CH 2 ) 3 Si(OC 2 H 5 ) 3 , [CH 2 =C(CH 3 )COO(CH 2 ) 3 ]CH 3 Si(OCH 3 2 , [CH 2 =C(CH 3 )COO(CH 2 ) 3 ]CH 3 Si(OC 2 H 5 ) 2 .

又,作為本發明之部分縮合物(A)原料的水解性矽烷化合物,化合物(a-3)可單獨使用1種亦可將2種以上併用。 In addition, as the hydrolyzable decane compound which is a raw material of the partial condensate (A) of the present invention, the compound (a-3) may be used alone or in combination of two or more.

而,水解性矽烷化合物混合物中,水解性矽烷化合物(a-3)含量以相對於水解性矽烷化合物(a-1)100莫耳在20~11,500為佳,在20~8,000莫耳較佳,在20~2,000更佳,在20~300莫耳尤佳,在50~200莫耳最佳。 Further, in the hydrolyzable decane compound mixture, the hydrolyzable decane compound (a-3) content is preferably from 20 to 11,500, more preferably from 20 to 8,000 mol, per 100 mol of the hydrolyzable decane compound (a-1). It is better in 20~2,000, especially in 20~300 mo, and the best in 50~200 mo.

本發明之部分縮合物(A)原料的水解性矽烷化合物混合物含有上述化合物(a-1)、化合物(a-2)及化合物(a-3),此外亦可因應需求在例如提升製得之部分縮合物(A)對硬塗膜用組成物的相溶性或控制反應性等目的下含有該等化合物以外之水解性矽烷化合物。水解性矽烷化合物混合物中其他水解性矽烷化合物含量係,在製得之部分縮合物(A)之氟原子含有率為2.5~40質量%之範圍中,相對於化合物 (a-1)、化合物(a-2)及化合物(a-3)之合計量100莫耳在1~100莫耳為佳。 The hydrolyzable decane compound mixture of the partial condensate (A) raw material of the present invention contains the above compound (a-1), the compound (a-2) and the compound (a-3), and may be obtained by, for example, upgrading according to the demand. The partial condensate (A) contains a hydrolyzable decane compound other than the compound for the purpose of compatibility with the composition for a hard coat film, control reactivity, and the like. The content of the other hydrolyzable decane compound in the hydrolyzable decane compound mixture is in the range of 2.5 to 40% by mass of the fluorine atom content of the obtained partial condensate (A) relative to the compound. The total amount of (a-1), the compound (a-2) and the compound (a-3) is preferably 100 to 1 mol.

本發明之部分縮合物(A)係由水解性矽烷化合物(a-1)、水解性矽烷化合物(a-2)、水解性矽烷化合物(a-3)及因應需求適宜摻混的其他水解性矽烷化合物構成之水解性矽烷化合物混合物的部分水解縮合物所構成。其中,作為本發明之部分縮合物(A)以將由下述成分(a-1)~(a-3)所構成之混合物部分水解縮合而得之部分縮合物(A)為佳:水解性矽烷化合物(a-1)、水解性矽烷化合物(a-2)及水解性矽烷化合物(a-3)。此時水解性矽烷化合物混合物中水解性矽烷化合物(a-1)、水解性矽烷化合物(a-2)及水解性矽烷化合物(a-3)之含量只要是可使製得之部分縮合物(A)中氟原子含有率成為2.5~40質量%之含量即無特別限制,例如相對於水解性矽烷化合物(a-1)100莫耳,以可使水解性矽烷化合物(a-2)成為1~23,000莫耳及水解性矽烷化合物(a-3)成為20~11,500莫耳之含量為佳,且以相對於水解性化合物(a-1)100莫耳,水解性矽烷化合物(a-2)在1~800莫耳及水解性矽烷化合物(a-3)在20~300莫耳尤佳。 The partial condensate (A) of the present invention is a hydrolyzable decane compound (a-1), a hydrolyzable decane compound (a-2), a hydrolyzable decane compound (a-3), and other hydrolyzability which are suitably blended according to the demand. A partially hydrolyzed condensate of a mixture of hydrolyzable decane compounds composed of a decane compound. In the partial condensate (A) of the present invention, a partial condensate (A) obtained by partially hydrolyzing and condensing a mixture of the following components (a-1) to (a-3) is preferred: hydrolyzable decane Compound (a-1), hydrolyzable decane compound (a-2), and hydrolyzable decane compound (a-3). In this case, the content of the hydrolyzable decane compound (a-1), the hydrolyzable decane compound (a-2), and the hydrolyzable decane compound (a-3) in the hydrolyzable decane compound mixture may be a partial condensate which can be obtained ( A) The content of the fluorine atom content in the range of 2.5 to 40% by mass is not particularly limited. For example, the hydrolyzable decane compound (a-2) is 1 based on 100 mol of the hydrolyzable decane compound (a-1). ~23,000 moles and hydrolyzable decane compound (a-3) is preferably 20 to 11,500 moles, and is 100 moles of hydrolyzable compound (a-1), hydrolyzable decane compound (a-2) The 1 to 800 moles and the hydrolyzable decane compound (a-3) are particularly preferred at 20 to 300 moles.

本發明之部分縮合物(A)係上述原料之水解性矽烷化合物混合物的部分水解縮合物,通常係以聚合度不同的複數縮合物構成之混合物。即,例如使用由水解性矽烷化合物(a-1)、水解性矽烷化合物(a-2)及水解性矽烷化合物(a-3)所構成之混合物作為原料水解性矽烷化合物來製造部分縮合物(A)時,會成為具有以下式(1)表示之平均組成式結 構的縮合物。 The partial condensate (A) of the present invention is a partially hydrolyzed condensate of a hydrolyzable decane compound mixture of the above-mentioned raw materials, and is usually a mixture of a plurality of condensates having different degrees of polymerization. In other words, for example, a mixture of a hydrolyzable decane compound (a-1), a hydrolyzable decane compound (a-2), and a hydrolyzable decane compound (a-3) is used as a raw material hydrolyzable decane compound to produce a partial condensate ( When A), it will become the average compositional expression represented by the following formula (1) Condensate.

惟,由於部分縮合物(A)係水解性基或矽烷醇基殘存之生成物(部分水解縮合物),故很難以化學式表示該生成物,以式(1)表示之平均組成式係假設在如上述所製造之部分水解縮合物中水解性基或矽烷醇基全部成為矽氧烷鍵結時的化學式。 However, since the partial condensate (A) is a product of a hydrolyzable group or a stanol group remaining (partially hydrolyzed condensate), it is difficult to express the product in a chemical formula, and the average composition formula represented by the formula (1) is assumed to be The hydrolyzable group or the stanol group in the partially hydrolyzed condensate produced as described above is a chemical formula in which all of the hydroxyl groups are bonded.

式(1)中、Rf、Q1、RH1、Y、Q2、RH2及p、q、r的理想範圍與上述相同。s、t、u係聚合度不同之複數含氟矽烷化合物混合物中各單元的平均存在數。 In the formula (1), the desirable ranges of R f , Q 1 , R H1 , Y, Q 2 , R H2 and p, q, r are the same as described above. The average number of units in a plurality of fluorine-containing decane compound mixtures having different degrees of polymerization of s, t, and u.

如以式(1)表示,由於本發明之部分縮合物(A)係以鍵能大之聚矽氧烷鍵結構成主鏈,因此耐光性良好。 As shown by the formula (1), since the partial condensate (A) of the present invention has a polyoxyalkylene bond structure having a large bond energy and is a main chain, the light resistance is good.

推測,在具有以式(1)表示之平均組成式結構的部分縮合物(A)中,分別源自於化合物(a-1)、化合物(a-2)及化合物(a-3)之單元係呈現無規配列。而,平均組成式(1)中,s:t係作為水解性矽烷化合物混合物中化合物(a-2)相對於化合物(a-1)之含有比例,以在上述範圍內為佳。又,s:u係作為該混合物中化合物(a-3)相對於化合物(a-1)之含有比例,以在上述範圍內為佳。若以s:t:u表示,以處於100:1~23,000:20~11,500(莫耳比)之關係為佳,且以100:1~800:20~300(莫耳比)尤佳。 It is presumed that in the partial condensate (A) having the average composition formula represented by the formula (1), the units derived from the compound (a-1), the compound (a-2), and the compound (a-3), respectively. The system presents a random arrangement. In the average composition formula (1), the ratio of the compound (a-2) to the compound (a-1) in the hydrolyzable decane compound mixture is preferably in the above range. Further, the s:u system is preferably contained in the above range as the ratio of the compound (a-3) to the compound (a-1) in the mixture. If it is expressed by s:t:u, it is preferable to have a relationship of 100:1 to 23,000:20 to 11,500 (mole ratio), and it is preferably 100:1 to 800:20 to 300 (mole ratio).

本發明之部分縮合物(A)的數目平均分子量(Mn)以500以上且低於10,000為佳,以500以上且低於5,000較佳,且以500以上且低於3,000尤佳。數目平均分子量(Mn)若在上述下限值以上,使用硬塗膜用組成物形成硬塗膜層時,部分縮合物(A)之表面移行性高且在少量添加下即可顯現良好的抗指紋附著性,因此可使硬化膜之硬度良好。數目平均分子量(Mn)若低於上述上限值,部分縮合物(A)在硬塗膜用組成物中與溶媒或其他成分之相溶性即佳。此外,難以相分離,硬塗膜用組成物之貯藏穩定性佳。 The number average molecular weight (Mn) of the partial condensate (A) of the present invention is preferably 500 or more and less than 10,000, more preferably 500 or more and less than 5,000, and still more preferably 500 or more and less than 3,000. When the number average molecular weight (Mn) is at least the above lower limit value and the hard coat layer is formed using the composition for a hard coat film, the surface condensate of the partial condensate (A) is high and a good resistance can be exhibited with a small amount of addition. Fingerprint adhesion, so that the hardness of the cured film is good. When the number average molecular weight (Mn) is less than the above upper limit, the partial condensate (A) is preferably compatible with the solvent or other components in the composition for a hard coat film. Further, it is difficult to phase separate, and the composition for a hard coat film is excellent in storage stability.

部分縮合物(A)之數目平均分子量(Mn)可藉由選擇反應條件等進行調節。 The number average molecular weight (Mn) of the partial condensate (A) can be adjusted by selecting reaction conditions and the like.

[抗指紋附著劑的製造方法] [Method for producing anti-fingerprint adhesive agent]

構成本發明之抗指紋附著劑的氟原子含有率為2.5~40質量%之部分縮合物(A)可藉由使水解性矽烷化合物混合物水解並部分縮合而製造,且該水解性矽烷化合物混合物係以製得之部分縮合物(A)中氟原子含有率成為2.5~40質量%之含量含有上述水解性矽烷化合物(a-1)、水解性矽烷化合物(a-2)及水解性矽烷化合物(a-3)。 The partial condensate (A) having a fluorine atom content of 2.5 to 40% by mass in the anti-fingerprint adhesive of the present invention can be produced by hydrolyzing and partially condensing the hydrolyzable decane compound mixture, and the hydrolyzable decane compound mixture is The hydrolyzable decane compound (a-1), the hydrolyzable decane compound (a-2), and the hydrolyzable decane compound are contained in the content of the fluorine atom in the obtained partial condensate (A) in an amount of 2.5 to 40% by mass. A-3).

具體上,可藉由包含以下反應步驟(以下稱為「反應步驟(I)」)之部分縮合物(A)的製造方法製造。 Specifically, it can be produced by a method for producing a partial condensate (A) comprising the following reaction step (hereinafter referred to as "reaction step (I)").

反應步驟(I):在水、有機溶媒及酸之存在下,使水解性矽烷化合物混合物水解並部分縮合之步驟,且該水解性矽烷化合物混合物以莫耳比計,相對於水解性矽烷化合物(a-1)100莫耳,含有1~23,000莫耳之水解性矽烷化合物(a-2) 及20~11,500莫耳之水解性矽烷化合物(a-3)。 Reaction step (I): a step of hydrolyzing and partially condensing a hydrolyzable decane compound mixture in the presence of water, an organic solvent and an acid, and the hydrolyzable decane compound mixture is in a molar ratio with respect to the hydrolyzable decane compound ( A-1) 100 moles, containing 1 to 23,000 moles of hydrolyzable decane compound (a-2) And 20 to 11,500 moles of hydrolyzable decane compound (a-3).

該使水解並部分縮合之反應如上述係藉由水解性基之水解反應生成矽烷醇基及藉由矽烷醇基彼此之脫水縮合反應生成矽氧烷鍵結之反應。 The reaction for hydrolyzing and partially condensing is as described above by a hydrolysis reaction of a hydrolyzable group to form a stanol group and a reaction in which a decyl alcohol group is dehydrated and condensed with each other to form a siloxane coupling.

而,在部分縮合物(A)中其氟原子含有率為20~40質量%,且上述水解性矽烷化合物(a-1)中之Rf係碳原子數1~6之全氟烷基或以Rf1ORf2-表示且碳原子數2~40之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基)時,可令反應步驟(I)為在水、有機溶媒及酸之存在下,使水解性矽烷化合物混合物水解並部分縮合之步驟,且該水解性矽烷化合物混合物以莫耳比計,相對於水解性矽烷化合物(a-1)100莫耳,含有1~800莫耳之水解性矽烷化合物(a-2)及20~300莫耳之水解性矽烷化合物(a-3)(以下亦稱為反應步驟(Ia))。在以下說明中,反應步驟(I)之各種條件等包含了反應步驟(Ia)之條件等。其中在具有尤其適合於反應步驟(Ia)之條件的情況下,會針對反應步驟(Ia)進一步說明。 In the partial condensate (A), the fluorine atom content thereof is 20 to 40% by mass, and the R f- based perfluoroalkyl group in the hydrolyzable decane compound (a-1) has a perfluoroalkyl group having 1 to 6 carbon atoms or a monovalent group represented by R f1 OR f2 - and having 2 to 40 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 may have an etheric oxygen atom between carbon-carbon atoms) In the case of a perfluoroalkylene group, the reaction step (I) is a step of hydrolyzing and partially condensing the hydrolyzable decane compound mixture in the presence of water, an organic solvent and an acid, and the hydrolyzable decane compound mixture is in the form of a mole. The hydrolyzable decane compound (a-2) and the hydrolyzable decane compound (a-3) of 1 to 800 mol are contained in an amount of 100 mol with respect to the hydrolyzable decane compound (a-1). (hereinafter also referred to as reaction step (Ia)). In the following description, various conditions and the like of the reaction step (I) include the conditions of the reaction step (Ia) and the like. In the case of having conditions which are particularly suitable for the reaction step (Ia), further description will be given for the reaction step (Ia).

就反應步驟(I)使用之水量而言,相對於水解性矽烷化合物混合物100質量份在5~100質量份為佳,且在5~80質量份尤佳。又,在反應步驟(Ia)的情況下,就使用之水量而言,相對於水解性矽烷化合物混合物100質量份在5~40質量份為佳,且在5~25質量份尤佳。令水量在上述範圍可使水解及部分縮合之控制易於進行。 The amount of water used in the reaction step (I) is preferably from 5 to 100 parts by mass, more preferably from 5 to 80 parts by mass, per 100 parts by mass of the hydrolyzable decane compound mixture. In the case of the reaction step (Ia), the amount of water used is preferably from 5 to 40 parts by mass, more preferably from 5 to 25 parts by mass, per 100 parts by mass of the hydrolyzable decane compound mixture. By allowing the amount of water to be in the above range, the control of hydrolysis and partial condensation can be easily carried out.

酸係作為使水解性矽烷化合物水解、部分縮合之 觸媒起作用。就酸而言可舉如鹽酸、硫酸、硝酸、磷酸等無機酸;及乙酸、草酸、順丁烯二酸等有機酸。其中以硝酸為佳。就酸量而言,以相對於水解性矽烷化合物混合物100質量在0.01~10質量份為佳,且在0.01~1質量份尤佳。 The acid is used as a hydrolysis and partial condensation of the hydrolyzable decane compound. Catalyst works. Examples of the acid include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid; and organic acids such as acetic acid, oxalic acid, and maleic acid. Among them, nitric acid is preferred. The amount of the acid is preferably 0.01 to 10 parts by mass, more preferably 0.01 to 1 part by mass, per 100 parts by mass of the hydrolyzable decane compound mixture.

就在反應步驟(I)中使用之有機溶媒而言,可舉如將水解性矽烷化合物水解、縮合反應時一般使用的有機溶媒。具體上可舉如甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、異丁醇、乙二醇、丙三醇、丙二醇等醇類;丙酮、甲基異丙基酮、環己酮等酮類;2-甲氧基乙醇、2-乙氧基乙醇、2-丁氧基乙醇等賽路蘇類;2-(2-甲氧基乙氧基)乙醇、2-(2-乙氧基乙氧基)乙醇、2-(2-丁氧基乙氧基)乙醇等卡必醇類;乙酸甲酯、乙酸乙酯、乙酸正丁酯、乳酸乙酯、乳酸正丁酯、乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、乙二醇單丁基醚乙酸酯、二乙二醇單甲基醚乙酸酯、二乙二醇單乙基醚乙酸酯、二乙二醇單丁基醚乙酸酯、丙二醇單甲基醚乙酸酯、乙二醇二乙酸酯、丙二醇二乙酸酯、乙基-3-乙氧基丙酸酯、環己醇乙酸酯、乳酸丁酯、γ-丁內酯、乙酸3-甲基-3-甲氧基丁酯、丙三醇三乙酸酯等酯類;及二乙二醇二甲基醚、二乙二醇二乙基醚、二乙二醇二丁基醚、三乙二醇二甲基醚、四乙二醇二甲基醚、丙二醇二甲基醚、二丁基醚、二乙二醇甲基乙基醚、丙二醇單甲基醚、二乙二醇單甲基醚、二乙二醇單丁基醚、二丙二醇單甲基醚等。在反應步驟(I)中,作為有機溶媒亦可使用六氟間二甲苯等含氟溶媒。該等有機溶媒可單獨使用亦可將2種 以上併用。 The organic solvent to be used in the reaction step (I) may, for example, be an organic solvent generally used in the hydrolysis and condensation reaction of a hydrolyzable decane compound. Specific examples thereof include alcohols such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, isobutanol, ethylene glycol, glycerin, and propylene glycol; acetone and methyl groups; Ketones such as isopropyl ketone and cyclohexanone; sirolimus such as 2-methoxyethanol, 2-ethoxyethanol, 2-butoxyethanol; 2-(2-methoxyethoxy) Carbitol such as ethanol, 2-(2-ethoxyethoxy)ethanol, 2-(2-butoxyethoxy)ethanol; methyl acetate, ethyl acetate, n-butyl acetate, lactate B Ester, n-butyl lactate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monomethyl ether acetate Ester, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol diacetate, propylene glycol diacetate, B 3-ethoxy propionate, cyclohexanol acetate, butyl lactate, γ-butyrolactone, 3-methyl-3-methoxybutyl acetate, glycerol triacetate, etc. Ester; and diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether, triethylene glycol dimethyl Ether, tetraethylene glycol dimethyl ether, propylene glycol dimethyl ether, dibutyl ether, diethylene glycol methyl ethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene Alcohol monobutyl ether, dipropylene glycol monomethyl ether, and the like. In the reaction step (I), a fluorine-containing solvent such as hexafluoro-m-xylene or the like may be used as the organic solvent. These organic solvents can be used alone or in combination of two The above is used together.

在本發明中,製得之部分縮合物(A)如上述具有矽烷醇基為佳。又,製得之部分縮合物(A)多與在反應步驟(I)中所用之有機溶媒一起摻混於硬塗膜用組成物。因此,作為反應步驟(I)中使用之有機溶媒宜使用將上述矽烷醇基穩定化之有機溶媒。作為將矽烷醇基穩定化之有機溶媒,可舉如具羥基且在25℃下之介電常數(ε)為5~20之範圍的化合物。 In the present invention, the partial condensate (A) obtained is preferably a stanol group as described above. Further, the obtained partial condensate (A) is often blended with the composition for a hard coat film together with the organic solvent used in the reaction step (I). Therefore, as the organic solvent used in the reaction step (I), an organic solvent which stabilizes the above stanol group is preferably used. The organic solvent for stabilizing the stanol group may, for example, be a compound having a hydroxyl group and having a dielectric constant (?) of 5 to 20 at 25 °C.

具體上可舉如碳原子數2~8個之二醇系單烷基醚乙酸酯溶媒、二醇系單烷基醚溶媒、甘二甲醚系溶媒、及碳原子數2~4個之烴系醇等。較具體而言,作為二醇系單烷基醚乙酸酯溶媒可舉如丙二醇單甲基醚乙酸酯(ε:8.3);作為二醇系單烷基醚溶媒可舉如丙二醇單甲基醚(ε:12.3);作為烴系醇可舉如2-丙醇(ε:19.92)等。尤以可進行氫鍵結之質子性極性溶媒的丙二醇單甲基醚之矽烷醇基之穩定化效果高,相當理想。 Specific examples thereof include a glycol monoalkyl ether acetate solvent having 2 to 8 carbon atoms, a glycol monoalkyl ether solvent, a dimethyl ether solvent, and 2 to 4 carbon atoms. Hydrocarbon alcohol or the like. More specifically, as the diol-based monoalkyl ether acetate solvent, propylene glycol monomethyl ether acetate (ε: 8.3); and the diol-based monoalkyl ether solvent may be propylene glycol monomethyl Ether (ε: 12.3); as the hydrocarbon-based alcohol, 2-propanol (ε: 19.92) or the like can be mentioned. In particular, it is preferable to have a high stabilizing effect of a decyl alcohol group of a propylene glycol monomethyl ether capable of hydrogen bonding and a protic polar solvent.

從使矽烷醇基充分穩定化之觀點看來,有機溶媒以僅由具羥基且在25℃下之介電常數(ε)為5~20之範圍的化合物構成為佳。惟,有機溶媒亦可因應需求含有該化合物以外之化合物,屆時從矽烷醇基之穩定化效果觀點看來,相對於有機溶媒總量在10~100質量%之範圍含有具羥基且在25℃下之介電常數(ε)為5~20之範圍的化合物為佳,且以含有20~100質量%之範圍尤佳。 From the viewpoint of sufficiently stabilizing the stanol group, the organic solvent is preferably composed of a compound having only a hydroxyl group and a dielectric constant (?) at 25 ° C of 5 to 20. However, the organic solvent may contain a compound other than the compound in accordance with the demand, and from the viewpoint of the stabilizing effect of the stanol group, the hydroxyl group is contained in the range of 10 to 100% by mass based on the total amount of the organic solvent and is at 25 ° C. The compound having a dielectric constant (?) in the range of 5 to 20 is preferable, and it is particularly preferably in the range of 20 to 100% by mass.

反應步驟(I)宜在室溫至溶媒之沸點為止的反應 溫度且適當的攪拌條件下實施。作為反應時間具體上雖亦依使用之原料成分之量、反應溫度及攪拌條件等而定,但以0.5~24小時為佳,且以1~18小時尤佳。反應結束後,亦可在未除去有機溶媒的情況下使本發明之硬塗膜用組成物中含有所得之部分縮合物(A)。亦可藉由常用的方法將有機溶媒除去後,再將部分縮合物(A)單離後而使含在硬塗膜用組成物中。 The reaction step (I) is preferably carried out at a temperature ranging from room temperature to the boiling point of the solvent. It is carried out under temperature and under appropriate stirring conditions. The reaction time is specifically determined depending on the amount of the raw material component to be used, the reaction temperature, the stirring conditions, and the like, but it is preferably 0.5 to 24 hours, and particularly preferably 1 to 18 hours. After the completion of the reaction, the obtained partial condensate (A) may be contained in the composition for a hard coat film of the present invention without removing the organic solvent. After the organic solvent is removed by a usual method, the partial condensate (A) is separated and then contained in the composition for a hard coat film.

[硬塗膜用組成物] [Composition for hard coating film]

本發明之硬塗膜用組成物係含有前述部分縮合物(A)及光聚合性成分,且部分縮合物(A)之含量相對於該組成物之總固體成分為0.01~20質量%之硬塗膜用組成物。 The composition for a hard coat film of the present invention contains the partial condensate (A) and the photopolymerizable component, and the content of the partial condensate (A) is 0.01 to 20% by mass based on the total solid content of the composition. A composition for a coating film.

光聚合性成分含有光聚合性化合物(B),且理想係進一步含有光聚合引發劑(C)。 The photopolymerizable component contains the photopolymerizable compound (B), and further preferably contains a photopolymerization initiator (C).

本發明之硬塗膜用組成物亦可因應需求進一步含有有機溶媒(D)、氧化矽微粒子(E)及其他添加劑。 The composition for a hard coat film of the present invention may further contain an organic solvent (D), cerium oxide fine particles (E), and other additives as needed.

本發明之硬塗膜用組成物以使其硬化而得之膜的硬化膜至少相對於可見光線為透明為佳。硬化膜雖以無色透明之膜為佳,亦可為著色透明之膜。製得無色透明之膜或著色透明之膜時,硬塗膜用組成物不宜含有會阻礙硬化膜之透明性的添加劑。例如,顏料等著色粉末由會阻礙透明性一點即不宜摻混至硬塗膜用組成物。另一方面,由如氧化矽微粒子(E)等具有與硬化膜大致相等之折射率的透明物質所構成之粉末可作為在不使透明性降低下使硬化膜之耐磨耗性提升之添加劑摻混至硬塗膜用組成物。 It is preferable that the cured film of the film obtained by hardening the composition for a hard coat film of the present invention is at least transparent to visible light. The cured film is preferably a colorless transparent film, and may be a colored transparent film. When a colorless transparent film or a colored transparent film is obtained, the composition for a hard coat film is not preferably contained with an additive which inhibits the transparency of the cured film. For example, a colored powder such as a pigment is not suitable for being blended into a composition for a hard coat film because it hinders transparency. On the other hand, a powder composed of a transparent material having a refractive index substantially equal to that of the cured film such as cerium oxide microparticles (E) can be used as an additive for improving the abrasion resistance of the cured film without lowering the transparency. Mix with the composition for the hard coat film.

(部分縮合物(A)) (partial condensate (A))

本發明之硬塗膜用組成物含有前述部分縮合物(A)。 The composition for a hard coat film of the present invention contains the above partial condensate (A).

本發明之硬塗膜用組成物中部分縮合物(A)含量在硬塗膜用組成物之總固體成分中為0.01~20質量%,且以0.1~10質量%為佳,0.1~5質量%尤佳。藉由令部分縮合物(A)含量在上述範圍,可使硬塗膜用組成物之貯藏穩定性變佳。由該硬塗膜用組成物製得之硬塗膜層表面的防污性或抗指紋附著性佳,又可製得具有外觀良好之表面的硬塗膜層。 The content of the partial condensate (A) in the composition for a hard coat film of the present invention is 0.01 to 20% by mass based on the total solid content of the composition for a hard coat film, and preferably 0.1 to 10% by mass, and 0.1 to 5 mass%. % is especially good. By setting the content of the partial condensate (A) in the above range, the storage stability of the composition for a hard coat film can be improved. The surface of the hard coat layer obtained from the composition for a hard coat film is excellent in antifouling property or anti-fingerprint adhesion, and a hard coat layer having a surface having a good appearance can be obtained.

(光聚合性化合物(B)) (Photopolymerizable compound (B))

本發明之硬塗膜用組成物中光聚合性化合物(B)係在後述之光聚合引發劑(C)之存在下藉由照射光使聚合反應開始並藉由聚合而硬化之化合物的總稱。依條件或種類有時亦僅以光聚合性化合物(B)進行光聚合,通常係與光聚合引發劑(C)一起使用。 The photopolymerizable compound (B) in the composition for a hard coat film of the present invention is a general term for a compound which is started by a polymerization reaction by irradiation with light and hardened by polymerization in the presence of a photopolymerization initiator (C) to be described later. Photopolymerization may be carried out only by the photopolymerizable compound (B) depending on the conditions or the kind, and it is usually used together with the photopolymerization initiator (C).

光聚合性化合物(B)宜含有1分子內具有2個以上乙烯性雙鍵之多官能性單體(以下亦稱為「單體(b-1)」)。又,因應需求宜含有1分子內具有1個乙烯性雙鍵之單官能性單體(以下亦稱為「單體(b-2)」)。光聚合性化合物(B)藉由含有單體(b-1),可藉由具體上為紫外線、電子束、X射線、放射線及高頻射線等光之照射而硬化。而,上述部分縮合物(A)係具有乙烯性雙鍵之化合物,而光聚合性化合物(B)則不含相當於部分縮合物(A)之化合物。 The photopolymerizable compound (B) preferably contains a polyfunctional monomer having two or more ethylenic double bonds in one molecule (hereinafter also referred to as "monomer (b-1)"). Further, it is preferable to contain a monofunctional monomer having one ethylenic double bond in one molecule (hereinafter also referred to as "monomer (b-2)"). The photopolymerizable compound (B) can be cured by irradiation with light such as ultraviolet rays, electron beams, X-rays, radiation, and high-frequency rays by containing the monomer (b-1). Further, the partial condensate (A) is a compound having an ethylenic double bond, and the photopolymerizable compound (B) does not contain a compound corresponding to the partial condensate (A).

作為單體(b-1)只要是具有1分子內具2個以上乙 烯性雙鍵之基(以下亦稱為「聚合性官能基」)的化合物即無特別限制。作為聚合性官能基以(甲基)丙烯醯基、乙烯基、烯丙基等之α,β-不飽和基為佳,且以(甲基)丙烯醯基尤佳。其中又以較容易藉由紫外線聚合之丙烯醯基為佳。而,單體(b-1)亦可係1分子中合計具有2個以上之2種以上聚合性官能基的化合物,亦可為合計具有2個以上之相同聚合性官能基的化合物。 As the monomer (b-1), it has two or more B in one molecule. The compound of the group of the ethylenic double bond (hereinafter also referred to as "polymerizable functional group") is not particularly limited. The polymerizable functional group is preferably an α,β-unsaturated group such as a (meth)acryl fluorenyl group, a vinyl group or an allyl group, and particularly preferably a (meth) acrylonitrile group. Among them, it is preferred to use an acrylonitrile group which is more easily polymerized by ultraviolet light. In addition, the monomer (b-1) may be a compound having two or more polymerizable functional groups in total in one molecule, or a compound having two or more identical polymerizable functional groups in total.

單體(b-1)1分子中之聚合性官能基之數在2個以上,且以3個以上尤佳。單體(b-1)1分子所具之聚合性官能基之個數上限並無特別限定,通常在50個左右且以30個為佳。又,作為單體(b-1),從使高度耐磨耗性顯現之觀點看來,以1分子中具有3個以上聚合性官能基且每1官能基之分子量在120以下之化合物為佳。作為滿足上述條件之單體(b-1),可舉如以下化合物。 The number of the polymerizable functional groups in the molecule of the monomer (b-1) is two or more, and more preferably three or more. The upper limit of the number of the polymerizable functional groups of the monomer (b-1) molecule is not particularly limited, and is usually about 50 and preferably 30. Further, as the monomer (b-1), from the viewpoint of exhibiting high abrasion resistance, a compound having three or more polymerizable functional groups per molecule and having a molecular weight of 120 or less per one functional group is preferable. . The monomer (b-1) which satisfies the above conditions may, for example, be the following compounds.

多官能性化合物,其係新戊四醇或聚新戊四醇與(甲基)丙烯酸之反應生成物的聚酯,具有3個以上且較理想為4~20個之(甲基)丙烯醯基。具體而言,適宜列舉如:三羥甲丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯及二新戊四醇六(甲基)丙烯酸酯等。 A polyfunctional compound which is a polyester of neopentyl alcohol or a reaction product of polytetramethylenetetraol and (meth)acrylic acid, and has 3 or more and more preferably 4 to 20 (meth) acrylonitrile. base. Specifically, for example, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, and dipentaerythritol VI are exemplified. (Meth) acrylate, etc.

又,分子內具有胺甲酸乙酯鍵之含(甲基)丙烯醯基化合物(以下亦稱為「丙烯酸胺甲酸乙酯」),其胺甲酸乙酯鍵以其氫鍵結之作用而發揮擬似交聯點作用,每1官能基之分子量即便不如上述般的小,仍可顯現充分高度的耐磨 耗性,相當理想。作為滿足上述條件之單體(b-1),以下述化合物為佳。 Further, a (meth)acryloyl group-containing compound having an urethane bond in the molecule (hereinafter also referred to as "ethyl urethane acrylate") has an urethane bond which functions as a hydrogen bond. At the cross-linking point, even if the molecular weight per one functional group is not as small as described above, a sufficient height of wear resistance can be exhibited. Consumable, quite ideal. As the monomer (b-1) satisfying the above conditions, the following compounds are preferred.

多官能性化合物,其係新戊四醇或聚新戊四醇、聚異氰酸酯與(甲基)丙烯酸羥烷基酯之反應生成物的丙烯酸胺甲酸乙酯,具有3個以上且較理想為4~20個之(甲基)丙烯醯基。 a polyfunctional compound which is a urethane urethane which is a reaction product of pentaerythritol or polytetramethylene glycol, a polyisocyanate and a hydroxyalkyl (meth) acrylate, and has 3 or more and more preferably 4 ~20 (meth)acrylonitrile groups.

多官能性化合物,其係新戊四醇或聚新戊四醇之含羥基聚(甲基)丙烯酸酯與聚異氰酸酯之反應生成物的丙烯酸胺甲酸乙酯,具有3個以上且較理想為4~20個之(甲基)丙烯醯基。 a polyfunctional compound which is an urethane urethane which is a reaction product of a hydroxyl group-containing poly(meth)acrylate and a polyisocyanate of pentaerythritol or polytetramethylene glycol, and has 3 or more and more preferably 4 ~20 (meth)acrylonitrile groups.

單體(b-1)可單獨使用1種亦可將2種以上併用。 The monomer (b-1) may be used alone or in combination of two or more.

作為單體(b-2)只要是1分子內具有1個聚合性官能基之化合物即無特別限制。作為單體(b-2)所具之聚合性官能基,以(甲基)丙烯醯基為佳。 The monomer (b-2) is not particularly limited as long as it is a compound having one polymerizable functional group in one molecule. As the polymerizable functional group of the monomer (b-2), a (meth) acrylonitrile group is preferred.

作為單體(b-2),具體上可舉如以CH2=C(R4)COOCzH2z+1(R4係氫原子或甲基,z係1~13之整數。CzH2z+1可為直鏈結構亦可為支鏈結構)表示之(甲基)丙烯酸烷酯。作為單體(b-2),進一步可舉如單(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸丁氧基乙酯、丁二醇單(甲基)丙烯酸酯、丁氧基三乙二醇(甲基)丙烯酸酯、(甲基)丙烯酸三級丁基胺乙酯、(甲基)丙烯酸3-氯-2-羥丁酯、(甲基)丙烯酸2-氰乙酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2,3-二溴丙酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸N,N-二乙基胺乙酯、(甲基)丙烯酸N,N-二甲基胺乙酯、 (甲基)丙烯酸2-乙氧基乙酯、(甲基)丙烯酸2-(2-乙氧基乙氧基)乙酯、(甲基)丙烯酸2-乙基己酯、丙三醇單(甲基)丙烯酸酯、(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸十七氟癸酯、(甲基)丙烯酸2-羥乙酯、氯化2-羥基-3-(甲基)丙烯醯氧基丁基三甲基銨、(甲基)丙烯酸2-羥丙酯、3-(甲基)丙烯醯氧基丙基三甲氧矽烷、(甲基)丙烯酸2-甲氧基乙酯、甲氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯、甲氧基四乙二醇(甲基)丙烯酸酯、甲氧基二丙二醇(甲基)丙烯酸酯、甲氧化環十碳三烯(甲基)丙烯酸酯、啉(甲基)丙烯酸酯、壬基苯氧基聚乙二醇(甲基)丙烯酸酯、壬基苯氧基聚丙二醇(甲基)丙烯酸酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸苯氧基羥丁酯、(甲基)丙烯酸苯氧基乙酯、苯氧基二乙二醇(甲基)丙烯酸酯、苯氧基四乙二醇(甲基)丙烯酸酯、苯氧基六乙二醇(甲基)丙烯酸酯、(甲基)丙烯酸苯氧酯、聚丙二醇(甲基)丙烯酸酯、乙氧基(甲基)丙烯酸2-磺酸鈉、(甲基)丙烯酸四氟丁酯、(甲基)丙烯酸四氫呋喃甲酯、(甲基)丙烯酸三氟乙酯、乙酸乙烯酯、N-乙烯己內醯胺、N-乙烯吡咯啶酮、(甲基)丙烯酸二環戊二烯酯、丙烯酸異莰酯等。 Specific examples of the monomer (b-2) include CH 2 =C(R 4 )COOC z H 2z+1 (R 4 -based hydrogen atom or methyl group, z-system 1 to 13 integer. C z H 2z+1 may be a linear structure or a branched structure represented by an alkyl (meth)acrylate. Further, as the monomer (b-2), allyl mono(meth)acrylate, benzyl (meth)acrylate, butoxyethyl (meth)acrylate, butanediol mono(methyl) may be mentioned. Acrylate, butoxy triethylene glycol (meth) acrylate, tributyl butyl (meth) acrylate, 3-chloro-2-hydroxybutyl (meth) acrylate, (methyl) 2-cyanoethyl acrylate, cyclohexyl (meth)acrylate, 2,3-dibromopropyl (meth)acrylate, dicyclopentenyl (meth)acrylate, N,N-(meth)acrylate Diethylamine ethyl ester, N,N-dimethylaminoethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, 2-(2-ethoxylated) (meth)acrylate Oxy)ethyl ester, 2-ethylhexyl (meth)acrylate, glycerol mono(meth)acrylate, glycidyl (meth)acrylate, heptafluorodecyl (meth)acrylate, 2-Hydroxyethyl (meth)acrylate, 2-hydroxy-3-(methyl)propenyloxybutyltrimethylammonium chloride, 2-hydroxypropyl (meth)acrylate, 3-(methyl) ) acryloxypropyltrimethoxy decane, 2-methoxyethyl (meth) acrylate, methoxy diethylene glycol (meth) acrylate, methoxy triethyl Alcohol (meth) acrylate, methoxy tetraethylene glycol (meth) acrylate, dipropylene glycol methoxy (meth) acrylate, methyl ten ring carbon leukotriene oxide (meth) acrylate, Porphyrin (meth) acrylate, nonyl phenoxy polyethylene glycol (meth) acrylate, nonyl phenoxy polypropylene glycol (meth) acrylate, octafluoropentyl (meth) acrylate, (A) Phenoxy butyl acrylate, phenoxyethyl (meth) acrylate, phenoxy diethylene glycol (meth) acrylate, phenoxytetraethylene glycol (meth) acrylate, benzene Ethoxy hexaethylene glycol (meth) acrylate, phenoxy (meth) acrylate, polypropylene glycol (meth) acrylate, sodium ethoxylate (meth) acrylate, (meth) acrylate Tetrafluorobutyl ester, tetrahydrofuran methyl (meth)acrylate, trifluoroethyl (meth)acrylate, vinyl acetate, N-vinyl caprolactam, N-vinylpyrrolidone, bicyclo(meth)acrylate Pentadienyl ester, isodecyl acrylate, and the like.

單體(b-2)可單獨使用1種亦可將2種以上併用。 The monomer (b-2) may be used alone or in combination of two or more.

光聚合性化合物(B)中單體(b-1)含量相對於光聚合性化合物(B)總量在20~100質量%為佳。光聚合性化合物(B)中單體(b-1)之比例若在上述範圍,由硬塗膜用組成物之硬化膜所構成之硬塗膜層的耐磨耗性即佳。單體(b-1)之比例以50~100質量%較佳,且以70~100質量%尤佳。 The content of the monomer (b-1) in the photopolymerizable compound (B) is preferably from 20 to 100% by mass based on the total amount of the photopolymerizable compound (B). When the ratio of the monomer (b-1) in the photopolymerizable compound (B) is in the above range, the hard coat layer composed of the cured film of the composition for a hard coat film is excellent in abrasion resistance. The ratio of the monomer (b-1) is preferably from 50 to 100% by mass, and particularly preferably from 70 to 100% by mass.

光聚合性化合物(B)中單體(b-2)含量相對於光聚合性化合物(B)總量在0~80質量%為佳。光聚合性化合物(B)中單體(b-2)之比例若在上述範圍,硬化膜之硬度即佳又膜收縮率適當,因此具有硬塗膜層之基材不會產生翹曲。單體(b-2)之比例以0~50質量%較佳,且以0~30質量%尤佳。 The content of the monomer (b-2) in the photopolymerizable compound (B) is preferably from 0 to 80% by mass based on the total amount of the photopolymerizable compound (B). When the ratio of the monomer (b-2) in the photopolymerizable compound (B) is in the above range, the hardness of the cured film is good and the film shrinkage ratio is appropriate, so that the substrate having the hard coat layer does not warp. The ratio of the monomer (b-2) is preferably 0 to 50% by mass, and more preferably 0 to 30% by mass.

在此,單體(b-1)及單體(b-2)亦可以因應需求以將複數個單體(b-1)或複數個單體(b-1)及單體(b-2)預先進行(共)聚合而得之(共)寡聚物或預(共)聚物之形態作使用。此時,就光聚合性化合物(B)中該(共)寡聚物或預(共)聚物之含量而言,以源自於單體(b-1)的重複單元含量相對於光聚合性化合物(B)總量在20~100質量%,且源自於單體(b-2)的重複單元含量相對於光聚合性化合物(B)總量在0~80質量%之範圍為佳。此外,源自於單體(b-1)的重複單元之比例在50~100質量%較佳,且在70~100質量%尤佳。源自於單體(b-2)的重複單元之比例在0~50質量%較佳,且在0~30質量%尤佳。 Here, the monomer (b-1) and the monomer (b-2) may also be a plurality of monomers (b-1) or a plurality of monomers (b-1) and monomers (b-2) depending on the requirements. The form of (co)oligomer or pre (co)polymer obtained by (co)polymerization is used in advance. At this time, in terms of the content of the (co)oligomer or the pre-copolymer in the photopolymerizable compound (B), the content of the repeating unit derived from the monomer (b-1) is relative to the photopolymerization. The total amount of the compound (B) is from 20 to 100% by mass, and the content of the repeating unit derived from the monomer (b-2) is preferably from 0 to 80% by mass based on the total amount of the photopolymerizable compound (B). . Further, the ratio of the repeating unit derived from the monomer (b-1) is preferably from 50 to 100% by mass, and particularly preferably from 70 to 100% by mass. The ratio of the repeating unit derived from the monomer (b-2) is preferably from 0 to 50% by mass, and particularly preferably from 0 to 30% by mass.

硬塗膜用組成物之總固體成分中的光聚合性化合物(B)含量在40~98.99質量%為佳,在50~95質量%較佳,在55~90質量%尤佳。 The content of the photopolymerizable compound (B) in the total solid content of the composition for a hard coat film is preferably from 40 to 98.99% by mass, more preferably from 50 to 95% by mass, particularly preferably from 55 to 90% by mass.

(光聚合引發劑(C)) (Photopolymerization initiator (C))

本發明之硬塗膜用組成物使用的光聚合引發劑(C)只要是具有作為光聚合引發劑之機能的化合物即無特別限制,且以可藉由光產生自由基之化合物為佳。 The photopolymerization initiator (C) used in the composition for a hard coat film of the present invention is not particularly limited as long as it has a function as a photopolymerization initiator, and is preferably a compound which generates a radical by light.

作為光聚合引發劑(C),具體上可舉如芳基酮系光聚合 引發劑(例如、苯乙酮類、二苯基酮類、烷基胺基二苯基酮類、苯甲基類、苯偶姻類、苯偶姻醚類、苯甲基二甲基縮酮類、苯甲醯基苯甲酸酯類、α-醯基肟酯類等)、含硫磺系光聚合引發劑(例如、硫化物類、硫雜蔥酮類等)、醯基膦氧化物類(例如、醯基二芳基膦氧化物等)及其他光聚合引發劑。 As the photopolymerization initiator (C), specifically, aryl ketone photopolymerization is exemplified. Initiators (for example, acetophenones, diphenylketones, alkylaminodiphenyl ketones, benzyls, benzoins, benzoin ethers, benzyldimethylketal) , benzoyl benzoic acid esters, α-mercapto oxime esters, etc.), sulfur-containing photopolymerization initiators (for example, sulfides, squalenes, etc.), mercaptophosphine oxides (for example) For example, mercaptodiarylphosphine oxides, and the like, and other photopolymerization initiators.

光聚合引發劑(C)可單獨使用1種亦可將2種以上併用。又,光聚合引發劑(C)亦可與胺類等光增敏劑組合使用。 One type of the photopolymerization initiator (C) may be used alone or two or more types may be used in combination. Further, the photopolymerization initiator (C) may be used in combination with a photo sensitizer such as an amine.

作為光聚合引發劑,可舉如以下化合物。 The photopolymerization initiator may, for example, be the following compounds.

4-苯氧基二氯苯乙酮、4-三級丁基-二氯苯乙酮、4-三級丁基-三氯苯乙酮、二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、1-(4-十二基苯基)-2-甲基丙烷-1-酮、1-{4-(2-羥乙氧基)苯基}-2-羥基-2-甲基-丙烷-1-酮、1-羥環己基苯基酮、2-甲基-1-{4-(甲硫基)苯基}-2-啉基丙烷-1-酮。 4-phenoxydichloroacetophenone, 4-tributyl-dichloroacetophenone, 4-tributyl-trichloroacetophenone, diethoxyacetophenone, 2-hydroxy-2 -methyl-1-phenylpropan-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 1-(4-dodecylphenyl) -2-methylpropan-1-one, 1-{4-(2-hydroxyethoxy)phenyl}-2-hydroxy-2-methyl-propan-1-one, 1-hydroxycyclohexylbenzene Ketone, 2-methyl-1-{4-(methylthio)phenyl}-2- Lolinylpropan-1-one.

苯甲基、苯偶姻、苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻異丙基醚、苯偶姻異丁基醚、苯甲基二甲基縮酮、二苯基酮、苯甲醯基安息香酸、苯甲醯基安息香酸甲酯、4-苯基二苯基酮、羥二苯基酮、丙烯醯化二苯基酮、3,3’-二甲基-4-甲氧基二苯基酮、3,3’,4,4’-肆(三級丁基過氧羰基)二苯基酮、9,10-菲醌、樟腦醌、二苯并環庚酮、2-乙基蒽醌、4’,4”-二乙基異二苯鄰苯二甲內酯、(1-苯基-1,2-丙二酮-2(o-乙氧基羰基)肟)、α-醯基肟酯、甲基苯基乙醛酸酯。 Benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, diphenyl Ketone, benzamidine benzoic acid, methyl benzoyl benzoate, 4-phenyldiphenyl ketone, hydroxydiphenyl ketone, propylene diphenyl ketone, 3,3'-dimethyl- 4-methoxydiphenyl ketone, 3,3',4,4'-fluorene (tertiary butylperoxycarbonyl)diphenyl ketone, 9,10-phenanthrenequinone, camphorquinone, dibenzocycloheptane Ketone, 2-ethylhydrazine, 4',4"-diethyliso-diphenylphthalic lactone, (1-phenyl-1,2-propanedione-2 (o-ethoxycarbonyl) ))), α-mercaptodecyl ester, methylphenylglyoxylate.

4-苯甲醯基-4’-甲基二苯基硫化物、硫雜蔥酮、2-氯硫雜蔥酮、2-甲基硫雜蔥酮、2,4-二甲基硫雜蔥酮、異丙基硫雜蔥酮、2,4-二氯硫雜蔥酮、2,4-二乙基硫雜蔥酮、2,4-二異丙基硫雜蔥酮、2,4,6-三甲基苯甲醯基二苯基膦氧化物、苯甲醯基二苯基膦氧化物、2,6-二甲基苯甲醯基二苯基膦氧化物、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基膦氧化物。 4-Benzylmercapto-4'-methyldiphenyl sulfide, thiazolone, 2-chlorothianicone, 2-methylthiane, 2,4-dimethylthio onion Ketone, isopropyl sulforaphane, 2,4-dichlorothiazepine, 2,4-diethylthiane, 2,4-diisopropylthione, 2,4, 6-trimethylbenzimidyl diphenylphosphine oxide, benzamidine diphenylphosphine oxide, 2,6-dimethylbenzimidyl diphenylphosphine oxide, double (2,6 -Dimethoxybenzylidene)-2,4,4-trimethylpentylphosphine oxide.

硬塗膜用組成物之總固體成分中光聚合引發劑(C)之含量在1~15質量%為佳,在3~15質量%較佳,且在3~10質量%尤佳。若在上述範圍,與硬塗膜用組成物中之光聚合性化合物(B)的相溶性及硬化性即佳,且形成之硬化膜之硬度良好。 The content of the photopolymerization initiator (C) in the total solid content of the composition for a hard coat film is preferably from 1 to 15% by mass, more preferably from 3 to 15% by mass, and particularly preferably from 3 to 10% by mass. In the above range, the compatibility with the photopolymerizable compound (B) in the composition for a hard coat film and the curability are good, and the hardness of the cured film formed is good.

(有機溶媒(D)) (organic solvent (D))

本發明之硬塗膜用組成物亦可含有有機溶媒(D)。藉由含有有機溶媒(D),可提升該組成物對基材之塗覆性。又,在硬塗膜用組成物中,可使部分縮合物(A)穩定存在。作為有機溶媒(D),只要是可使硬塗膜用組成物作為必須成分而含有之部分縮合物(A)、光聚合性化合物(B)及光聚合引發劑(C)還有進一步作為隨意成分而含有之氧化矽微粒子(E)或其他添加劑均勻地溶解或分散,且不與硬塗膜用組成物中所含之各成分具反應性者,即無特別限制。 The composition for a hard coat film of the present invention may further contain an organic solvent (D). By containing an organic solvent (D), the coating property of the composition to the substrate can be improved. Further, in the composition for a hard coat film, the partial condensate (A) can be stably present. The organic solvent (D) is further a part of the condensate (A), the photopolymerizable compound (B), and the photopolymerization initiator (C) which can be contained as a component of the hard coat film as an essential component. The cerium oxide fine particles (E) or other additives contained in the composition are uniformly dissolved or dispersed, and are not reactive with the respective components contained in the composition for a hard coating film, and are not particularly limited.

有機溶媒(D)可單獨使用1種亦可將2種以上併用。有機溶媒(D)之使用量相對於光聚合性化合物(B)100質量份在10,000質量份以下為佳,且在5,000質量份以下尤佳。 The organic solvent (D) may be used alone or in combination of two or more. The amount of the organic solvent (D) to be used is preferably 10,000 parts by mass or less based on 100 parts by mass of the photopolymerizable compound (B), and more preferably 5,000 parts by mass or less.

作為有機溶媒(D),宜為:乙醇、丁醇、異丙醇等低級醇類;甲基異丙基酮、甲基乙基酮、丙酮等酮類;二烷、二乙二醇二甲基醚、四氫呋喃、甲基-三級丁基醚等醚類;及甲基賽路蘇、乙基賽路蘇、丁基賽路蘇、丙二醇單甲基醚等二醇醚類等之有機溶劑。又,可使用乙酸正丁酯、乙酸異戊酯、二乙二醇單乙酸酯、丙二醇單甲基醚乙酸酯等酯類;聚氟己烷、聚氟甲基環己烷、聚氟-1,3-二甲基環己烷等碳原子數5~12之聚氟脂肪族烴;雙(三氟甲基)苯等多氟化芳香族烴;多氟化脂肪族烴等鹵素化烴類;及甲苯、二甲苯、己烷等烴類等。從硬塗膜用組成物之塗覆性良好之觀點看來,以光聚合性化合物(B)之溶解性及蒸發速度適當的乙酸正丁酯尤佳。 The organic solvent (D) is preferably a lower alcohol such as ethanol, butanol or isopropanol; a ketone such as methyl isopropyl ketone, methyl ethyl ketone or acetone; Ethers such as alkane, diethylene glycol dimethyl ether, tetrahydrofuran, methyl-tertiary butyl ether; and methyl stilbene, ethyl siroli, butyl siroli, propylene glycol monomethyl ether, etc. An organic solvent such as a glycol ether. Further, esters such as n-butyl acetate, isoamyl acetate, diethylene glycol monoacetate, and propylene glycol monomethyl ether acetate; polyfluorohexane, polyfluoromethylcyclohexane, and polyfluoride can be used. a polyfluoroaliphatic hydrocarbon having 5 to 12 carbon atoms such as 1,3-dimethylcyclohexane; a polyfluorinated aromatic hydrocarbon such as bis(trifluoromethyl)benzene; and halogenation of a polyfluorinated aliphatic hydrocarbon Hydrocarbons; and hydrocarbons such as toluene, xylene, and hexane. From the viewpoint of good coatability of the composition for a hard coat film, n-butyl acetate which is suitable for the solubility and evaporation rate of the photopolymerizable compound (B) is particularly preferable.

而,如上述,從可在硬塗膜用組成物中使部分縮合物(A)穩定存在之觀點看來,以具羥基且在25℃下之介電常數(ε)在5~20範圍之化合物為佳。尤其,以可進行氫鍵結之質子性極性溶媒的丙二醇單甲基醚的矽烷醇基之穩定化效果高,相當理想。 Further, as described above, from the viewpoint that the partial condensate (A) can be stably present in the composition for a hard coating film, the dielectric constant (?) having a hydroxyl group at 25 ° C is in the range of 5 to 20 The compound is preferred. In particular, it is preferable that the stanol group of propylene glycol monomethyl ether which can be hydrogen-bonded to a protic polar solvent has a high stabilizing effect.

從矽烷醇基之穩定化效果一點看來,相對於有機溶媒之總量宜含有10~100質量%範圍之具羥基且在25℃下之介電常數(ε)在5~20範圍之化合物,且以含有20~100質量%範圍尤佳。 From the point of view of the stabilizing effect of the stanol group, it is preferred to contain a compound having a hydroxyl group in the range of 10 to 100% by mass and a dielectric constant (?) in the range of 5 to 20 at 25 ° C with respect to the total amount of the organic solvent. It is particularly preferably in the range of 20 to 100% by mass.

硬塗膜用組成物含有有機溶媒(D)時,因應形成硬塗膜層之基材的種類,宜選擇適當的有機溶媒(D)。例如,當基材為耐溶劑性低之芳香族聚碳酸酯樹脂時,宜使 用相對於芳香族聚碳酸酯樹脂之溶解性低的有機溶媒(D),且以低級醇類、二醇醚類、酯類、醚類及其等之混合物等為適當。 When the composition for a hard coat film contains an organic solvent (D), it is preferable to select an appropriate organic solvent (D) depending on the type of the substrate on which the hard coat layer is formed. For example, when the substrate is an aromatic polycarbonate resin having low solvent resistance, it is preferred to An organic solvent (D) having a low solubility with respect to the aromatic polycarbonate resin is used, and a mixture of a lower alcohol, a glycol ether, an ester, an ether, and the like is suitably used.

(氧化矽微粒子(E)) (cerium oxide microparticles (E))

本發明之硬塗膜用組成物因應需求亦可含有氧化矽微粒子(E)。藉由含有氧化矽微粒子(E),可提升硬塗膜層之耐磨耗性。 The composition for a hard coat film of the present invention may contain cerium oxide microparticles (E) as needed. The wear resistance of the hard coat layer can be improved by containing cerium oxide microparticles (E).

作為氧化矽微粒子(E),以膠質氧化矽為佳。膠質氧化矽係於分散介質中分散成膠態狀之矽酸酐的超微粒子,分散介質並無特別限定,以水、低級醇類及賽路蘇類等為佳。作為具體的分散介質,可舉如水、甲醇、乙醇、異丙醇、正丁醇、乙二醇、甲基賽路蘇、乙基賽路蘇、丁基賽路蘇、丙二醇單甲基醚乙酸酯、二甲基乙醯胺、甲苯、二甲苯、乙酸甲酯、乙酸乙酯、乙酸戊酯、丙酮等。 As the cerium oxide microparticles (E), colloidal cerium oxide is preferred. The colloidal cerium oxide is an ultrafine particle of phthalic anhydride which is dispersed in a colloidal state in a dispersion medium, and the dispersion medium is not particularly limited, and water, a lower alcohol, and a serotonin are preferable. Specific examples of the dispersion medium include water, methanol, ethanol, isopropanol, n-butanol, ethylene glycol, methyl stilbene, ethyl serosol, butyl siroli, propylene glycol monomethyl ether B. Acid ester, dimethylacetamide, toluene, xylene, methyl acetate, ethyl acetate, amyl acetate, acetone, and the like.

氧化矽微粒子(E)之平均粒徑並無特別限定,為了使硬化後之硬化膜即硬塗膜層展現高透明性,以1~1,000nm為佳,1~200nm較佳,且以1~50nm尤佳。 The average particle diameter of the cerium oxide fine particles (E) is not particularly limited, and is preferably 1 to 1,000 nm, more preferably 1 to 200 nm, and 1 to 1 in order to exhibit high transparency in a hard coating film which is a cured film after curing. 50nm is especially good.

為了使氧化矽微粒子(E)之分散穩定性提升,亦可以水解性矽烷化合物之水解物修飾微粒子表面來作使用。在此「以水解物修飾表面」係表示水解性矽烷化合物之水解物物理性地或化學性地結合於氧化矽微粒子(E)表面的一部分或全部之矽烷醇基之狀態,並藉此使表面特性呈現改質之意。而,亦包含水解物之部分縮合物所鍵結的氧化矽微粒子。表面修飾例如藉由在氧化矽微粒子存在下使水 解性矽烷化合物之水解性基的一部分或全部水解或產生水解與縮合反應而進行即可。 In order to improve the dispersion stability of the cerium oxide microparticles (E), the hydrolyzate of the hydrolyzable decane compound may be used to modify the surface of the microparticles. Here, "the surface modified with a hydrolyzate" means a state in which a hydrolyzate of a hydrolyzable decane compound is physically or chemically bonded to a part or all of a stanol group on the surface of the cerium oxide microparticle (E), and thereby the surface is made The characteristics are modified. Further, cerium oxide microparticles bonded by a partial condensate of the hydrolyzate are also included. Surface modification, for example, by making water in the presence of cerium oxide microparticles The partial or total hydrolysis of the hydrolyzable group of the decane compound may be carried out by hydrolysis or condensation reaction.

作為水解性矽烷化合物,以具有(甲基)丙烯醯基、胺基、環氧基、巰基等官能性基之有機基及烷氧基等水解性基或羥基鍵結於矽原子之矽烷化合物為佳。 The hydrolyzable decane compound is a hydrolyzable group such as an organic group having a functional group such as a (meth)acryl fluorenyl group, an amine group, an epoxy group or a decyl group, or a hydrazine compound having a hydroxyl group bonded to a ruthenium atom. good.

含有氧化矽微粒子(E)時,其含量相對於光聚合性化合物(B)100質量份在0.1~500質量份為佳,在1~300質量份較佳,且在10~200質量份尤佳。若在上述範圍,在硬化後之硬化膜即硬塗膜層中耐磨耗性即充分,易於維持高透明性,且難以因外力產生裂痕等。 When the cerium oxide fine particles (E) are contained, the content thereof is preferably 0.1 to 500 parts by mass, more preferably 1 to 300 parts by mass, and particularly preferably 10 to 200 parts by mass, per 100 parts by mass of the photopolymerizable compound (B). . In the above range, abrasion resistance is sufficient in the hard coat layer which is a cured film after curing, and it is easy to maintain high transparency, and it is difficult to cause cracks or the like due to an external force.

(其他添加劑) (other additives)

於本發明之硬塗膜用組成物,亦可因應需求在不損及本發明效果之範圍內摻混作為上述以外之添加劑之選自於由紫外線吸收劑、光穩定劑、抗氧化劑、熱聚合抑制劑、調平劑、消泡劑、增黏劑、抗沉降劑、顏料(有機著色顏料、無機顏料)、著色染料、紅外線吸收劑、螢光增白劑、分散劑、導電性微粒子、抗靜電劑、防霧劑及耦合劑所構成群組中之1種以上添加劑。 The composition for a hard coat film of the present invention may be selected from the group consisting of ultraviolet absorbers, light stabilizers, antioxidants, and thermal polymerizations as needed in addition to the above-described additives without damaging the effects of the present invention. Inhibitor, leveling agent, antifoaming agent, tackifier, anti-settling agent, pigment (organic coloring pigment, inorganic pigment), coloring dye, infrared absorbing agent, fluorescent whitening agent, dispersing agent, conductive microparticle, anti-resistance One or more additives selected from the group consisting of an electrostatic agent, an antifogging agent, and a coupling agent.

而,本發明之硬塗膜用組成物亦可係使市售硬塗膜形成用之光硬化性樹脂組成物(以下亦稱為「樹脂組成物(Y)」)中,相對於樹脂組成物(Y)總固體成分與部分縮合物(A)之合計質量,以0.01~20質量%之比例含有部分縮合物(A)者。市售之硬塗膜形成用樹脂組成物(Y)通常係含有光聚合性化合物(B)作為光聚合性成分,更多情況則含有光聚 合引發劑(C)並因應需求與上述同樣地含有各種成分者。 In addition, the composition for a hard coat film of the present invention may be a photocurable resin composition for forming a commercially available hard coat film (hereinafter also referred to as "resin composition (Y)"), with respect to the resin composition. (Y) The total mass of the total solid content and the partial condensate (A), and the partial condensate (A) is contained in a ratio of 0.01 to 20% by mass. The commercially available resin composition for forming a hard coat film (Y) usually contains a photopolymerizable compound (B) as a photopolymerizable component, and more often contains a photopolymerizable component. The initiator (C) is contained in the same manner as described above in accordance with the demand.

作為上述市售之硬塗膜形成用樹脂組成物(Y),具體上可舉如硬塗膜HC162(商品名、橫濱橡膠公司製)及硬塗膜BEAMSET 575(CB)(商品名、荒川化學工業公司製)等。 Specific examples of the commercially available resin composition for forming a hard coat film (Y) include a hard coat film HC162 (trade name, manufactured by Yokohama Rubber Co., Ltd.) and a hard coat film BEAMSET 575 (CB) (trade name, Arakawa Chemical Co., Ltd.). Industrial company system).

[具有硬塗膜層之基材] [Substrate with hard coating layer]

本發明之具有硬塗膜層之基材具有:基材;及硬塗膜層,係由上述本發明之硬塗膜用組成物形成於前述基材之至少一部分表面的硬化膜所構成。 The substrate having a hard coat layer of the present invention comprises: a base material; and a hard coat layer formed of a cured film formed on the surface of at least a part of the base material by the composition for a hard coat film of the present invention.

作為形成硬塗膜層之基材,一般而言,只要是由有要求形成防污性尤其是抗指紋附著性之硬塗膜層的材質所構成之基材即無特別限定,適合使用由金屬、玻璃、樹脂、陶瓷、或其組合(複合材料、積層材料等)所構成之基體。尤以玻璃或樹脂等透明的基材為佳。 The base material for forming the hard coat layer is generally not particularly limited as long as it is composed of a material having a hard coat layer which is required to form antifouling properties, particularly anti-fingerprint adhesion, and is preferably used as a metal. A substrate composed of glass, resin, ceramic, or a combination thereof (composite material, laminated material, etc.). In particular, a transparent substrate such as glass or resin is preferred.

作為玻璃,可舉如通常的鈉鈣玻璃、硼矽酸玻璃、無鹼玻璃及石英玻璃等。 Examples of the glass include ordinary soda lime glass, borosilicate glass, alkali-free glass, and quartz glass.

在本發明中,使用屬於透明樹脂且有要求防污性尤其是抗指紋附著性以及耐磨耗性之樹脂基材來作為可形成硬塗膜層之基材時,尤可發揮顯著的效果,相當理想。 In the present invention, when a resin substrate which is a transparent resin and which has antifouling properties, particularly anti-fingerprint adhesion and abrasion resistance, is used as a substrate capable of forming a hard coat layer, a remarkable effect can be exerted. Quite ideal.

作為上述樹脂,具體上可舉如芳香族聚碳酸酯樹脂、聚甲基丙烯酸甲酯樹脂、聚甲基丙烯醯亞胺樹脂、聚苯乙烯樹脂、聚氯化乙烯樹脂、不飽和聚酯樹脂、聚烯烴樹脂、ABS樹脂及MS(甲基丙烯酸甲酯‧苯乙烯)樹脂等。 Specific examples of the resin include an aromatic polycarbonate resin, a polymethyl methacrylate resin, a polymethacrylimide resin, a polystyrene resin, a polyvinyl chloride resin, and an unsaturated polyester resin. Polyolefin resin, ABS resin, and MS (methyl methacrylate styrene) resin.

就基材之形狀或形成硬塗膜層之表面並無特別限制,可因應用途適宜選擇。基材為板狀時,可為平板亦 可整面或一部分具有曲率。基材的厚度可依照具有硬塗膜層之基材的用途適宜選擇,一般而言以0.5~10mm為佳。 The shape of the substrate or the surface on which the hard coat layer is formed is not particularly limited and may be appropriately selected depending on the application. When the substrate is in the form of a plate, it can be a flat plate. The entire surface or a portion may have a curvature. The thickness of the substrate can be appropriately selected in accordance with the use of the substrate having the hard coat layer, and is generally preferably 0.5 to 10 mm.

就本發明使用之基材而言,亦可因應目的使用已於其表面施行酸處理(使用業經稀釋之氫氟酸、硫酸、鹽酸等之處理)、鹼處理(使用氫氧化鈉水溶液等之處理)或放電處理(電漿照射、電暈照射、電子束照射等)等者。 For the substrate used in the present invention, it may also be subjected to acid treatment on the surface (using diluted hydrofluoric acid, sulfuric acid, hydrochloric acid, etc.) or alkali treatment (using aqueous sodium hydroxide solution, etc.) for the purpose. ) or discharge treatment (plasma irradiation, corona irradiation, electron beam irradiation, etc.).

作為於基材表面形成硬塗膜層之方法,通常可適用與使用以光聚合性化合物(B)為主體之硬塗膜用組成物於基材上形成硬塗膜層者相同之方法。具體上可以具有下述步驟之方法製造:(1)塗膜形成步驟,將硬塗膜用組成物塗佈至基材的預定表面,形成塗膜(惟,硬塗膜用組成物不含溶媒時,製得之塗膜會成為不含溶媒之「膜」);(2)溶媒除去步驟,從基材上之塗膜因應需求除去溶媒並形成膜;(3)光硬化步驟,對基材上之膜進行光照射,形成屬硬化膜的硬塗膜層。 As a method of forming a hard coat layer on the surface of the substrate, a method similar to the method of forming a hard coat layer on a substrate using a composition for a hard coat film mainly composed of a photopolymerizable compound (B) can be suitably used. Specifically, it can be produced by the following method: (1) a coating film forming step of applying a composition for a hard coating film onto a predetermined surface of a substrate to form a coating film (however, the composition for a hard coating film contains no solvent) In this case, the obtained coating film becomes a "film" containing no solvent); (2) a solvent removing step, removing the solvent from the coating film on the substrate according to the demand and forming a film; (3) a photohardening step to the substrate The upper film is irradiated with light to form a hard coat layer which is a cured film.

(塗膜(膜)形成步驟) (coating film (film) forming step)

作為將硬塗膜用組成物塗佈至基材表面之方法並無特別限制,可適用習知之公知方法。具體上,可舉如浸塗法、旋塗法、流動施膜法、噴塗法、棒塗法、凹版塗佈法、輥塗法、刮刀塗佈法及氣刀塗佈法等方法。在此,塗膜或膜之厚度可以光硬化後之硬化膜即硬塗膜層之厚度成為後述厚度的方式加以調整。 The method of applying the composition for a hard coat film to the surface of the substrate is not particularly limited, and a known method can be applied. Specifically, methods such as dip coating, spin coating, flow coating, spray coating, bar coating, gravure coating, roll coating, blade coating, and air knife coating may be mentioned. Here, the thickness of the coating film or the film can be adjusted so that the thickness of the hard coat film which is the hardened film after photohardening becomes the thickness mentioned later.

(溶媒除去步驟) (Solvent removal step)

於基材上形成有含有溶媒之塗膜時,通常會進行用以 除去溶媒之乾燥。乾燥條件雖依使用之硬塗膜用組成物而定,一般而言係在40~120℃下進行0.5~5分鐘左右的處理。 When a coating film containing a solvent is formed on a substrate, it is usually used for The drying of the solvent is removed. Although the drying conditions depend on the composition for the hard coat film to be used, it is generally carried out at 40 to 120 ° C for about 0.5 to 5 minutes.

(光硬化步驟) (photohardening step)

接下來,對基材上之膜照射光,使膜中之光硬化成分反應硬化成為硬化膜而形成硬塗膜層。作為光照射使用之光,以紫外線、電子束、X射線、放射線及高頻射線等為佳,經濟上則以具有180~500nm之波長的紫外線尤佳。作為光源,可使用氙燈、低壓水銀燈、高壓水銀燈、超高壓水銀燈、金屬鹵素燈、碳弧燈、鎢絲燈等之紫外線照射裝置、電子束照射裝置、X射線照射裝置及高頻生成裝置等。 Next, the film on the substrate is irradiated with light, and the photohardenable component in the film is reactively cured to form a cured film to form a hard coat layer. As the light used for light irradiation, ultraviolet rays, electron beams, X-rays, radiation, and high-frequency rays are preferable, and ultraviolet rays having a wavelength of 180 to 500 nm are economically preferable. As the light source, an ultraviolet irradiation device such as a xenon lamp, a low pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a carbon arc lamp, or a tungsten lamp, an electron beam irradiation device, an X-ray irradiation device, and a high frequency generating device can be used.

光照射之條件可依照光聚合性化合物(B)之種類、光聚合引發劑(C)之種類、膜厚度及光源種類等適宜改變。通常作為相對於膜之曝光量的條件以100~5,000mJ/cm2為佳,且以100~1,000mJ/cm2尤佳。就曝光時間而言,以0.1~60秒鐘為佳,且以0.5~30秒鐘尤佳。此外在使硬化反應完成之目的下亦可於光照射後進行加熱處理。 The conditions of the light irradiation can be appropriately changed depending on the kind of the photopolymerizable compound (B), the kind of the photopolymerization initiator (C), the film thickness, the type of the light source, and the like. The condition as the exposure amount to the film is usually preferably from 100 to 5,000 mJ/cm 2 and more preferably from 100 to 1,000 mJ/cm 2 . In terms of exposure time, it is preferably 0.1 to 60 seconds, and preferably 0.5 to 30 seconds. Further, heat treatment may be performed after the light irradiation for the purpose of completing the hardening reaction.

硬化膜即硬塗膜層之厚度可依照期望採用各種厚度。硬塗膜層之厚度以0.1~50μm為佳,以0.2~20μm較佳,且以0.3~10μm尤佳。硬塗膜層之厚度若在上述範圍,耐磨耗性即充分且硬塗膜層深部之硬化亦充分,故為理想。 The thickness of the cured film, that is, the hard coat layer, can be various thicknesses as desired. The thickness of the hard coat layer is preferably 0.1 to 50 μm, more preferably 0.2 to 20 μm, and particularly preferably 0.3 to 10 μm. When the thickness of the hard coat layer is in the above range, the abrasion resistance is sufficient and the hardening of the deep portion of the hard coat layer is sufficient, which is preferable.

如此而形成於基材表面的硬塗膜層透明性良好,且其表面具有充分的硬度,撥水撥油性優異,可長期 顯現優異的抗指紋附著性。本發明之具有硬塗膜層之基材的硬塗膜層表面之上述撥水撥油性的相關性質係依硬塗膜用組成物所含之部分縮合物(A)的機能而定。 The hard coat layer formed on the surface of the substrate in this manner is excellent in transparency, and has a sufficient hardness on the surface thereof, and is excellent in water repellency and oil repellency. Excellent anti-fingerprint adhesion. The water-repellent property associated with the surface of the hard coat layer of the substrate having the hard coat layer of the present invention depends on the function of the partial condensate (A) contained in the composition for a hard coat film.

將部分縮合物(A)摻混至硬塗膜用組成物並藉由上述方法形成硬塗膜層時,部分縮合物(A)係鍵結於硬塗膜層的主構成成分即光聚合性化合物(B)。硬塗膜層尤其是在表面,會顯現出由部分縮合物(A)所具之含氟有機基獲致的優異撥水撥油性。此外,從部分縮合物(A)與光聚合性化合物(B)相互鍵結一點看來,幾乎不會從硬塗膜層產生漏溢,可長期顯現優異的撥水撥油性。因此,本發明之具有硬塗膜層之基材的硬塗膜層表面相對於皮脂、汗、化妝品等脂性污垢具有優異的防污性尤其是抗指紋附著性,且難以附著脂性污垢,即便有所附著亦可輕易地拭除。 When the partial condensate (A) is blended into the composition for a hard coat film and the hard coat layer is formed by the above method, the partial condensate (A) is bonded to the main constituent component of the hard coat layer, that is, photopolymerizability. Compound (B). The hard coat layer, particularly on the surface, exhibits excellent water repellency and oil repellency obtained by the fluorine-containing organic group of the partial condensate (A). Further, when the partial condensate (A) and the photopolymerizable compound (B) are bonded to each other, leakage from the hard coat layer is hardly generated, and excellent water repellency and oil repellency can be exhibited for a long period of time. Therefore, the surface of the hard coat layer of the substrate having the hard coat layer of the present invention has excellent antifouling properties, particularly anti-fingerprint adhesion, and is difficult to adhere to grease stains, even if there is grease stain such as sebum, sweat, and cosmetics. The attachment can also be easily removed.

從本發明之具有硬塗膜層之基材具有上述特性一點看來,可有效地作為視脂性污垢尤其是指紋附著為外觀上問題之在智慧型手機及輸入板個人電腦等使用的觸控面板、顯示器玻璃、光學元件及衛生機器等之構件。尤其,在使用於觸控面板時可獲得顯著的效果。 From the point of view of the above-described characteristics of the substrate having the hard coat layer of the present invention, it can be effectively used as a touch panel for smart phones and tablet personal computers, etc., which are effective for viewing grease stains, especially fingerprints. Components such as display glass, optical components, and sanitary machines. In particular, a remarkable effect can be obtained when used in a touch panel.

<觸控面板> <Touch Panel>

本發明之觸控面板具有上述本發明之具有硬塗膜層之基材。該觸控面板係以硬塗膜層顯露於觸控面的方式來配設具有硬塗膜層之基材,除此以外可以與通常的觸控面板構成相同的方式進行設計。 The touch panel of the present invention has the above-described substrate having a hard coat layer of the present invention. The touch panel is provided with a substrate having a hard coat layer so that the hard coat layer is exposed on the touch surface, and can be designed in the same manner as a normal touch panel.

實施例 Example

以下使用實施例進一步詳細說明本發明,惟本發明並不受該等實施例限定。而,例1~3、9~11、18、19、21~24、26為實施例,例4~8、12~16、20、25為比較例,例17為參考例。 The invention is further illustrated in the following examples, but the invention is not limited by the examples. Examples 1 to 3, 9 to 11, 18, 19, 21 to 24, and 26 are examples, and examples 4 to 8, 12 to 16, 20, and 25 are comparative examples, and example 17 is a reference example.

各測定係以下述方法進行。 Each measurement system was carried out in the following manner.

[數目平均分子量(Mn)] [Number average molecular weight (Mn)]

使用市售GPC測定裝置(東曹公司製、裝置名:HLC-8320GPC)測定作為分子量測定用標準試料之市售聚合度不同的數種單分散聚苯乙烯聚合物之凝膠滲透層析(GPC),並以聚苯乙烯之分子量與保持時間(滯留時間)之關係為依據製出檢測線。 Gel permeation chromatography (GPC) of several monodisperse polystyrene polymers having different commercial polymerization degrees as standard samples for molecular weight measurement was measured using a commercially available GPC measuring device (manufactured by Tosoh Corporation, device name: HLC-8320GPC) ), and the detection line is prepared based on the relationship between the molecular weight of polystyrene and the retention time (residence time).

將試料以四氫呋喃稀釋成1.0質量%並使通過0.5μm之過濾器後,就該試料之GPC使用前述GPC測定裝置進行測定。 After the sample was diluted to 1.0% by mass in tetrahydrofuran and passed through a filter of 0.5 μm, the GPC of the sample was measured using the GPC measuring apparatus.

利用前述檢測線藉由電腦解析試料之GPC譜,藉此求出該試料之數目平均分子量(Mn)。 The number average molecular weight (Mn) of the sample was determined by analyzing the GPC spectrum of the sample by a computer using the above-mentioned detection line.

[氟原子含有率] [Fluorine content]

以1,4-二三氟甲基苯為標準物質,藉由19F NMR測定求出氟原子含有率。 The fluorine atom content was determined by 19 F NMR measurement using 1,4-bistrifluoromethylbenzene as a standard material.

[水接觸角] [water contact angle]

藉由不濡液滴法,依照JIS R 3257「基板玻璃表面之濕潤性試驗方法」於基材上之測定表面3處滴載水滴,並就各水滴進行測定。液滴係約2μL/滴且測定係在20℃下進行。接觸角係以3測定值之平均值(n=3)表示。而,從抗指紋附著 性之觀點看來,水接觸角只要大概在90度以上即可使用,且大概在95度以上為佳。 Water droplets were dripped on the measurement surface 3 on the substrate in accordance with JIS R 3257 "Test method for wettability of the surface of the substrate glass" by the non-drop method, and the water droplets were measured. The droplet system was about 2 μL/drop and the assay was carried out at 20 °C. The contact angle is expressed as the average of 3 measured values (n=3). And, from anti-fingerprint attachment From the point of view of sex, the water contact angle can be used as long as it is about 90 degrees or more, and preferably about 95 degrees or more.

[油酸接觸角] [oleic acid contact angle]

藉由不濡液滴法,依照JIS R 3257「基板玻璃表面之濕潤性試驗方法」於基材上之測定表面3處滴載油酸滴,並就各油酸滴進行測定。液滴係約2μL/滴且測定係在20℃下進行。接觸角係以3測定值之平均值(n=3)表示。而,從抗指紋附著性之觀點看來,油酸接觸角只要大概在55度以上即可使用,且大概在60度以上為佳。 The oleic acid droplets were dropped on the measurement surface 3 of the substrate in accordance with JIS R 3257 "Test method for wettability of the surface of the substrate glass" by the non-drop method, and each oleic acid droplet was measured. The droplet system was about 2 μL/drop and the assay was carried out at 20 °C. The contact angle is expressed as the average of 3 measured values (n=3). Further, from the viewpoint of anti-fingerprint adhesion, the oleic acid contact angle can be used as long as it is approximately 55 degrees or more, and preferably about 60 degrees or more.

[硬化膜外觀] [The appearance of the cured film]

依照以下基準藉由目測來評估硬化膜外觀。 The appearance of the cured film was evaluated by visual inspection in accordance with the following criteria.

○(良好):無法確認異物且膜厚均勻。 ○ (good): Foreign matter could not be confirmed and the film thickness was uniform.

△(可):雖無法確認異物,但膜厚有不均。 △ (may): Although the foreign matter could not be confirmed, the film thickness was uneven.

×(不良):可確認異物。 × (defect): Foreign matter can be confirmed.

[撥墨性] [Ink repellency]

評估初始與以下耐光性試驗後之撥墨性。撥墨性係於製得之硬化膜表面以麥克筆(ZEBRA公司製、製品名:MACKEE極細黑色)劃線並以目測觀察印墨之附著狀態而進行評估。評估基準如下所述。 The ink repellency after the initial and following light resistance tests was evaluated. The ink repellency was evaluated by scribing the surface of the obtained cured film with a crayon (manufactured by ZEBRA, product name: MACKEE very fine black) and visually observing the adhesion state of the ink. The evaluation criteria are as follows.

◎(優良):撥墨性良好且可使印墨撥彈成珠狀。 ◎ (Excellent): The ink repellency is good and the ink can be plucked into a bead shape.

○(良好):無法使印墨撥彈成珠狀且產生線狀的撥痕(線寬低於麥克筆筆尖寬度的50%)。 ○ (good): The ink cartridge cannot be made into a bead shape and a linear plucking is generated (the line width is less than 50% of the width of the tip of the stylus pen).

△(可):產生印墨的線狀撥痕且線寬在麥克筆筆尖寬度的50%以上且低於100%。 △ (may): A linear plucking of the ink is produced and the line width is 50% or more and less than 100% of the width of the tip of the stylus pen.

×(不良):絲毫無法將印墨撥彈並可於表面描繪完整的線。 × (bad): There is no way to print the ink and draw a complete line on the surface.

[耐光性試驗] [Light resistance test]

將製得之硬化膜使用日照氣候測試儀在黑板溫度63℃下以降雨12分、乾燥48分的循環暴露500小時。 The obtained cured film was exposed to a cycle of rain at 12 minutes and dried for 48 minutes at a blackboard temperature of 63 ° C for 500 hours using a sunshine weather tester.

[鉛筆硬度] [pencil hardness]

依據JIS K 5600進行測定。 The measurement was carried out in accordance with JIS K 5600.

在硬塗膜用組成物及具有硬塗膜層之基材的實施例中所用之化合物略語如以下所述。 The compounds used in the examples of the composition for a hard coat film and the substrate having a hard coat layer are as follows.

(部分縮合物(A)) (partial condensate (A))

使用以下例1~6、例8及例18~21中所得之部分縮合物液(A1-1)~(A6-1)、(A8-1)~(A11-1)、(X1-1)及例7中所得之部分縮合物(A7)。 The partial condensate solutions (A1-1) to (A6-1), (A8-1) to (A11-1), (X1-1) obtained in the following Examples 1 to 6, 8 and 18 to 21 were used. And a partial condensate (A7) obtained in Example 7.

(光聚合性化合物(B)) (Photopolymerizable compound (B))

B-1:二新戊四醇六丙烯酸酯。 B-1: dipentaerythritol hexaacrylate.

B-2:參(丙烯醯氧基乙基)異三聚氰酸酯。 B-2: ginseng (propylene oxyethyl) iso-cyanate.

(光聚合引發劑(C)) (Photopolymerization initiator (C))

C-1:2-甲基-1-(4-甲硫基苯基)-2-啉基-丙烷-1-酮 C-1: 2-methyl-1-(4-methylthiophenyl)-2- Lolinyl-propan-1-one

(有機溶媒(D)) (organic solvent (D))

D-1:乙酸正丁酯。 D-1: n-butyl acetate.

D-2:丙二醇單甲基醚(以下亦稱為「PGME」)。 D-2: propylene glycol monomethyl ether (hereinafter also referred to as "PGME").

(氧化矽微粒子(E)) (cerium oxide microparticles (E))

於E-1:異丙醇分散型膠質氧化矽(氧化矽含量:30質量%、平均粒徑:11nm)100質量份加入3-甲基丙烯醯氧基丙 基三甲氧矽烷2.5質量份,並在50℃下攪拌3小時後,在室溫下熟化12小時而製得於表面具有含甲基丙烯醯基之矽烷化合物的水解縮合物之膠質氧化矽。 Addition of 3-methylpropenyloxypropane to E-1: isopropanol-dispersed colloidal cerium oxide (cerium oxide content: 30% by mass, average particle diameter: 11 nm), 100 parts by mass 2.5 parts by mass of methoxytrioxane and stirred at 50 ° C for 3 hours, and then aged at room temperature for 12 hours to obtain a cerium oxide cerium having a hydrolyzed condensate of a decane compound having a methacryl oxime group on the surface.

[例1:部分縮合物(A1)及部分縮合物液(A1-1)之製造] [Example 1: Production of partial condensate (A1) and partial condensate liquid (A1-1)]

於具備攪拌機之2公升燒瓶放入上述化合物(a-1)之CF3(CF2)5CH2CH2Si(OCH3)3(旭硝子公司製)46.75g、上述化合物(a-2)之Si(OCH2H5)4(COLCOAT公司製)12.45g及上述化合物(a-3)之CH2=CHCOO(CH2)3Si(OCH3)3(東京化成工業公司製)40.8g。接下來,放入607g之PGME及水12.02g而製得混合物。 Into a 2 liter flask equipped with a stirrer, 46.75 g of CF 3 (CF 2 ) 5 CH 2 CH 2 Si(OCH 3 ) 3 (manufactured by Asahi Glass Co., Ltd.) of the above compound (a-1) and the above compound (a-2) were placed. 12.45 g of Si(OCH 2 H 5 ) 4 (manufactured by COLCOAT Co., Ltd.) and 40.8 g of CH 2 =CHCOO(CH 2 ) 3 Si(OCH 3 ) 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) of the above compound (a-3). Next, 607 g of PGME and 12.02 g of water were placed to prepare a mixture.

在室溫下一邊攪拌該混合物一邊滴下0.20g之60%硝酸水溶液。滴下結束後進一步攪拌5小時。以含有10質量%之所得的部分縮合物(A1)之PGME溶液為部分縮合物液(A1-1)。部分縮合物(A1)之含氟原子含有率為34.3質量%且數目平均分子量(Mn)為740。 While stirring the mixture at room temperature, 0.20 g of a 60% aqueous solution of nitric acid was added dropwise. After the completion of the dropwise addition, the mixture was further stirred for 5 hours. A PGME solution containing 10% by mass of the obtained partial condensate (A1) was used as a partial condensate liquid (A1-1). The partial condensate (A1) had a fluorine atom content of 34.3% by mass and a number average molecular weight (Mn) of 740.

表1中以質量(g)表示部分縮合物(A1)之原料組成及製造所用的各成分之量。此外,有關原料組成係將使化合物(a-1)為100莫耳時之莫耳數合併表示。製造所用的各成分之量係將使化合物(a-1)~(a-3)之合計量為100質量份時的質量份合併表示。又,將氟原子含有率及數目平均分子量(Mn)合併表示。 In Table 1, the raw material composition of the partial condensate (A1) and the amount of each component used in the production are indicated by mass (g). Further, the relevant raw material composition will be expressed by combining the molar numbers of the compound (a-1) at 100 mol. The amount of each component used for the production is a combination of the mass parts when the total amount of the compounds (a-1) to (a-3) is 100 parts by mass. Further, the fluorine atom content ratio and the number average molecular weight (Mn) are combined and expressed.

[例2~6:部分縮合物(A2)~(A6)及部分縮合物液(A2-1)~(A6-1)之製造] [Examples 2 to 6: Preparation of partial condensate (A2) to (A6) and partial condensate (A2-1) to (A6-1)]

除了將原料摻混變更成如表1所示以外,以與例1同樣的方式製得部分縮合物(A2)~(A6)及部分縮合物液(A2-1)~(A6-1)。 The partial condensates (A2) to (A6) and the partial condensate solutions (A2-1) to (A6-1) were obtained in the same manner as in Example 1 except that the raw materials were blended and changed as shown in Table 1.

[例7:部分縮合物(A7)之製造] [Example 7: Production of partial condensate (A7)]

將原料摻混變更成如表1所示。反應結束後會有白色油酯狀物析出。將白色油酯狀物過濾並藉由離子交換水進行洗淨直至pH成為6~7,在減壓下並在60℃下乾燥3小時而製得略具黏性的白色固體狀樹脂。以製得之樹脂為部分縮合物(A7)。 The raw material blending was changed to as shown in Table 1. Upon completion of the reaction, a white oily ester precipitated. The white oil ester was filtered and washed with ion-exchanged water until the pH became 6 to 7, and dried under reduced pressure at 60 ° C for 3 hours to obtain a slightly viscous white solid resin. The obtained resin was used as a partial condensate (A7).

[例8:部分縮合物(A8)及部分縮合物液(A8-1)之製造] [Example 8: Production of partial condensate (A8) and partial condensate liquid (A8-1)]

於裝有攪拌機及冷卻管之300mL的4口燒瓶加入四異丁氧化鈦80mg、C3F7(OCF2CF2CF2)20O(CF2)2CH2OH(大金工業公司製、製品名:DEMNUM SA、數目平均分子量(Mn):4,000)100g及ε-己內酯10g,並在150℃下加熱5小時。製得於C3F7(OCF2CF2CF2)20O(CF2)2CH2OH之一末端開環加成有ε-己內酯之白色蠟狀的化合物。該化合物之數目平均分子量(Mn)為4,400且己內酯之聚合度數約3.5。 40 mg of tetraisobutylene titanate and C 3 F 7 (OCF 2 CF 2 CF 2 ) 20 O(CF 2 ) 2 CH 2 OH (manufactured by Daikin Industries Co., Ltd.) in a 300 mL four-necked flask equipped with a stirrer and a cooling tube. Product name: DEMNUM SA, number average molecular weight (Mn): 4,000) 100 g and ε-caprolactone 10 g, and heated at 150 ° C for 5 hours. A white waxy compound obtained by ring-opening addition of ε-caprolactone to one end of C 3 F 7 (OCF 2 CF 2 CF 2 ) 20 O(CF 2 ) 2 CH 2 OH was obtained. The compound has a number average molecular weight (Mn) of 4,400 and a caprolactone polymerization degree of about 3.5.

接下來,將該化合物冷卻至室溫,並加入六氟間二甲苯50g及2,6-二-三級丁基-對甲苯酚60mg,攪拌30分鐘。加入2-甲基丙烯醯氧基乙基異氰酸酯6.0g,在室溫下進一步攪拌24小時而製得末端業經甲基丙烯醯基修飾之部分縮合物(A8)的六氟間二甲苯溶液(含有70質量%之部分縮合物(A8))之部分縮合物液(A8-1)。表1中顯示部分縮合物液 (A8-1)之組成及部分縮合物(A8)的氟原子含有率、數目平均分子量(Mn)。 Next, the compound was cooled to room temperature, and 50 g of hexafluorom-xylene and 60 mg of 2,6-di-tert-butyl-p-cresol were added, and the mixture was stirred for 30 minutes. 6.0 g of 2-methylpropenylmethoxyethyl isocyanate was added, and further stirred at room temperature for 24 hours to obtain a hexafluorom-xylene solution containing a partial condensate (A8) modified with a methacryl oxime group (containing A partial condensate liquid (A8-1) of 70% by mass of the partial condensate (A8)). Table 1 shows partial condensate solution The composition of (A8-1) and the fluorine atom content and the number average molecular weight (Mn) of the partial condensate (A8).

[例9:硬塗膜用組成物及具有硬塗膜層之基材的製造] [Example 9: Composition of a hard coating film and production of a substrate having a hard coating layer]

於裝有攪拌機及冷卻管之300mL的4口燒瓶放入例1中所製造之(A1-1)液10g、光聚合性化合物(B-1)80g、光聚合引發劑(C-1)4g及有機溶媒(D-1)100g,並在常溫及已遮光之狀態下攪拌1小時。接下來,一邊進行攪拌一邊緩慢加入膠 質氧化矽(E-1)75g,並進一步在常溫及已遮光之狀態下攪拌1小時而製得硬塗膜用組成物1。 Into a 300-mL four-necked flask equipped with a stirrer and a cooling tube, 10 g of the liquid (A1-1) produced in Example 1, 80 g of a photopolymerizable compound (B-1), and 4 g of a photopolymerization initiator (C-1) were placed. 100 g of an organic solvent (D-1) was stirred for 1 hour at normal temperature and in a state of being shielded from light. Next, slowly add the glue while stirring 75 g of cerium oxide (E-1) was further stirred at normal temperature and in a state of being shielded for 1 hour to obtain a composition 1 for a hard coating film.

接下來,藉由棒塗法於PET基板表面塗佈硬塗膜用組成物例1,並以50℃之加熱板乾燥1分鐘而於基板表面形成膜。接下來,使用高壓水銀燈(光量:300mJ/cm2、波長365nm之紫外線積分能量)進行光照射。其結果於基板表面製得厚度5μm的硬化膜。以上述方法評估該硬化膜(硬塗膜層)。將結果與硬塗膜用組成物之組成一起顯示於表2。 Next, the composition 1 of the hard coat film was applied onto the surface of the PET substrate by a bar coating method, and dried on a hot plate at 50 ° C for 1 minute to form a film on the surface of the substrate. Next, light irradiation was performed using a high pressure mercury lamp (light quantity: 300 mJ/cm 2 , ultraviolet integral energy of wavelength 365 nm). As a result, a cured film having a thickness of 5 μm was formed on the surface of the substrate. The cured film (hard coat layer) was evaluated in the above manner. The results are shown in Table 2 together with the composition of the composition for a hard coat film.

[例10~17:硬塗膜用組成物及具有硬塗膜層之基材的製造] [Examples 10 to 17: Composition of a hard coating film and production of a substrate having a hard coating layer]

將例1~6及8中所得之部分縮合物液(A1-1)~(A6-1)、(A8-1)、例7中所得之部分縮合物(A7)、光聚合性化合物(B)、光聚合引發劑(C)、有機溶媒(D)及膠質氧化矽(E)變更成如表2所示,除此以外以與例9同樣的方式製造出硬塗膜用組成物2~9。分別使用該等以與例9同樣的方式於PET基板上形成硬化膜(硬塗膜層)並進行評估。將結果與硬塗膜用組成物之組成一起顯示於表2。 The partial condensate solutions (A1-1) to (A6-1), (A8-1) obtained in Examples 1 to 6 and 8, and the partial condensate (A7) obtained in Example 7, and a photopolymerizable compound (B) The composition for a hard coat film 2-2 was produced in the same manner as in Example 9 except that the photopolymerization initiator (C), the organic solvent (D), and the colloidal cerium oxide (E) were changed as shown in Table 2. 9. A cured film (hard coat layer) was formed on the PET substrate in the same manner as in Example 9 and evaluated. The results are shown in Table 2 together with the composition of the composition for a hard coat film.

[例18:部分縮合物(A9)及部分縮合物液(A9-1)之製造] [Example 18: Production of partial condensate (A9) and partial condensate liquid (A9-1)]

於具備攪拌機之2公升燒瓶加入上述化合物(a-1)之CF3O(CF2CF2O)8CF2C(=O)NHCH2CH2CH2Si(OCH3)3(依據國際公開第2009/008380號之例2製造)3.3g、上述化合物(a-2)之Si(OC2H5)4(COLCOAT公司製)62.1g及上述化合物(a-3)之CH2=CHCOO(CH2)3Si(OCH3)3(東京化成工業公司製)34.6g。接下來,加入六氟間二甲苯530g與2-丙醇227g而製得混合物。 CF 3 O(CF 2 CF 2 O) 8 CF 2 C(=O)NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3 of the above compound (a-1) was added to a 2 liter flask equipped with a stirrer (according to international disclosure) Example 2 of the No. 2009/008380) 3.3 g of Si(OC 2 H 5 ) 4 (manufactured by COLCOAT Co., Ltd.) of the above compound (a-2) and CH 2 =CHCOO of the above compound (a-3) ( CH 2 ) 3 Si(OCH 3 ) 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) 34.6 g. Next, 530 g of hexafluorom-xylene and 227 g of 2-propanol were added to prepare a mixture.

在室溫下一邊將該混合物進行攪拌一邊滴下1%硝酸水溶液水59.7g。滴下結束後進一步攪拌5小時。以所得之含有5質量%之部分縮合物(A9)的溶液為部分縮合物液(A9-1)。部分縮合物(A9)之含氟原子含有率為3.9質量%且數 目平均分子量(Mn)為1,160。 While the mixture was stirred at room temperature, 59.7 g of a 1% aqueous solution of nitric acid was added dropwise. After the completion of the dropwise addition, the mixture was further stirred for 5 hours. The obtained solution containing the 5% by mass of the partial condensate (A9) was used as a partial condensate liquid (A9-1). The fluorine atom content of the partial condensate (A9) is 3.9% by mass and the number The average molecular weight (Mn) was 1,160.

[例19:部分縮合物(A10)及部分縮合物液(A10-1)之製造] [Example 19: Production of partial condensate (A10) and partial condensate liquid (A10-1)]

於具備攪拌機之2公升燒瓶加入上述化合物(a-1)之KY-108(商品名、信越化學工業公司製)5.2g、上述化合物(a-2)之Si(OC2H5)4(COLCOAT公司製)60.7g及上述化合物(a-3)之CH2=CHCOO(CH2)3Si(OCH3)3(東京化成工業公司製)34.1g。接下來,加入六氟間二甲苯537g及2-丙醇230g而製得混合物。 To a 2 liter flask equipped with a stirrer, KY-108 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.) of the above compound (a-1), 5.2 g of the compound (a-2), and Si(OC 2 H 5 ) 4 (COLCOAT) of the above compound (a-2) were added. 60.7 g of the compound (a) and 34.1 g of CH 2 =CHCOO(CH 2 ) 3 Si(OCH 3 ) 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) of the above compound (a-3). Next, 537 g of hexafluoro-m-xylene and 230 g of 2-propanol were added to prepare a mixture.

在室溫下一邊將該混合物進行攪拌一邊滴下1%硝酸水溶液水57.6g。滴下結束後進一步攪拌5小時。以所得之含有7質量%之部分縮合物(A10)的溶液為部分縮合物液(A10-1)。部分縮合物(A10)之含氟原子含有率為7.4質量%且數目平均分子量(Mn)為1,230。 While the mixture was stirred at room temperature, 57.6 g of a 1% aqueous solution of nitric acid was added dropwise. After the completion of the dropwise addition, the mixture was further stirred for 5 hours. The resulting solution containing 7 mass% of the partial condensate (A10) was used as a partial condensate liquid (A10-1). The partial condensate (A10) had a fluorine atom content of 7.4% by mass and a number average molecular weight (Mn) of 1,230.

[例20:部分縮合物(X1)及部分縮合物液(X1-1)之製造] [Example 20: Production of partial condensate (X1) and partial condensate liquid (X1-1)]

於具備攪拌機之2公升燒瓶放入上述化合物(a-1)之CF3O(CF2CF2O)8CF2C(=O)NHCH2CH2CH2Si(OCH3)3(依據國際公開第2009/008380號之例2製造)1.7g、上述化合物(a-2)之Si(OC2H5)4(COLCOAT公司製)62.8g及上述化合物(a-3)之CH2=CHCOO(CH2)3Si(OCH3)3(東京化成工業公司製)35.5g。接下來,加入六氟間二甲苯526g及2-丙醇226g而製得混合物。 In a 2 liter flask equipped with a stirrer, CF 3 O(CF 2 CF 2 O) 8 CF 2 C(=O)NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3 of the above compound (a-1) was placed (according to international Manufactured in Example 2 of the publication No. 2009/008380), 1.7 g of the compound (a-2), Si (OC 2 H 5 ) 4 (manufactured by COLCOAT Co., Ltd.), 62.8 g, and the compound (a-3), CH 2 =CHCOO (CH 2 ) 3 Si(OCH 3 ) 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) 35.5 g. Next, 526 g of hexafluoro-m-xylene and 226 g of 2-propanol were added to prepare a mixture.

在室溫下一邊將該混合物進行攪拌一邊滴下1%硝酸水溶液水61.3g。滴下結束後進一步攪拌5小時。令所得之含有5質量%之部分縮合物(X1)的溶液為部分縮合物液 (X1-1)。部分縮合物(X1)之含氟原子含有率為2.1質量%且數目平均分子量(Mn)為1,150。 While the mixture was stirred at room temperature, 61.3 g of a 1% aqueous solution of nitric acid was added dropwise. After the completion of the dropwise addition, the mixture was further stirred for 5 hours. The obtained solution containing the 5% by mass of the partial condensate (X1) is a partial condensate solution (X1-1). The partial condensate (X1) had a fluorine atom content of 2.1% by mass and a number average molecular weight (Mn) of 1,150.

[例21:部分縮合物(A11)及部分縮合物液(A11-1)之製造] [Example 21: Production of partial condensate (A11) and partial condensate liquid (A11-1)]

於具備攪拌機之2公升燒瓶在氮環境氣體下加入F(CF2)6CH2CH2OC(=O)C(CH3)=CH288.0g、HSCH2CH2CH2Si(OCH3)3 40.0g及2,2’-偶氮雙異丁腈(AIBN)0.33g。接下來,加入六氟間二甲苯710g及2-丙醇304g而製得混合物。 In a 2 liter flask equipped with a stirrer, F(CF 2 ) 6 CH 2 CH 2 OC(=O)C(CH 3 )=CH 2 88.0 g, HSCH 2 CH 2 CH 2 Si(OCH 3 ) was added under a nitrogen atmosphere. 3 40.0 g and 2,2'-azobisisobutyronitrile (AIBN) 0.33 g. Next, 710 g of hexafluorom-xylene and 304 g of 2-propanol were added to prepare a mixture.

在70℃下將該混合物一邊進行攪拌一邊使反應12小時而製得含有10質量%之F(CF2)6CH2CH2OC(=O)CH(CH3)CH2SCH2CH2CH2Si(OCH3)3(化合物(a-1-11))。 The mixture was stirred at 70 ° C for 12 hours to obtain 10% by mass of F(CF 2 ) 6 CH 2 CH 2 OC(=O)CH(CH 3 )CH 2 SCH 2 CH 2 CH. 2 Si(OCH 3 ) 3 (compound (a-1-11)).

於具備攪拌機之1公升燒瓶加入上述化合物(a-1)之化合物(a-1-11)10%溶液162g、上述化合物(a-2)之Si(OC2H5)4(COLCOAT公司製)53.6g及上述化合物(a-3)之CH2=CHCOO(CH2)3Si(OCH3)3(東京化成工業公司製)30.2g。接下來,加入六氟間二甲苯149g及2-丙醇64g而製得混合物。 In a 1 liter flask equipped with a stirrer, 162 g of a 10% solution of the compound (a-1-11) of the above compound (a-1) and Si(OC 2 H 5 ) 4 of the compound (a-2) (manufactured by COLCOAT Co., Ltd.) were added. 53.6 g and 30.2 g of CH 2 =CHCOO(CH 2 ) 3 Si(OCH 3 ) 3 (manufactured by Tokyo Chemical Industry Co., Ltd.) of the above compound (a-3). Next, 149 g of hexafluoro-m-xylene and 64 g of 2-propanol were added to prepare a mixture.

在室溫下將該混合物一邊進行攪拌一邊滴下1%硝酸水溶液水53.8g。滴下結束後進一步攪拌5小時。以所得之含有10質量%之部分縮合物(A11)的溶液為部分縮合物液(A11-1)。部分縮合物(A11)之含氟原子含有率為12.4質量%且數目平均分子量(Mn)為990。 The mixture was stirred while stirring at room temperature with 53.8 g of a 1% aqueous solution of nitric acid. After the completion of the dropwise addition, the mixture was further stirred for 5 hours. The resulting solution containing 10% by mass of the partial condensate (A11) was used as a partial condensate solution (A11-1). The partial condensate (A11) had a fluorine atom content of 12.4% by mass and a number average molecular weight (Mn) of 990.

於表3中以質量(g)顯示部分縮合物(A9)、(A10)、(X1)及(A11)之原料組成及製造所用的各成分之量。進一步,就原料組成係將以化合物(a-1)為100莫耳時之莫耳數合 併顯示。製造所用之各成分之量係將以化合物(a-1)~(a-3)之合計量為100質量份時的質量份合併顯示。又,將氟原子含有率及數目平均分子量(Mn)合併顯示。 The raw material compositions of the partial condensates (A9), (A10), (X1) and (A11) and the amounts of the respective components used for the production are shown in Table 3 in terms of mass (g). Further, in terms of the raw material composition, the molar ratio of the compound (a-1) to 100 mol And display. The amount of each component used for the production is shown by combining the mass parts when the total amount of the compounds (a-1) to (a-3) is 100 parts by mass. Further, the fluorine atom content rate and the number average molecular weight (Mn) were combined and displayed.

[例22~26:硬塗膜用組成物及具有硬塗膜層之基材的製造] [Examples 22 to 26: Composition of a hard coating film and production of a substrate having a hard coating layer]

使表4顯示之市售硬塗膜形成用樹脂組成物(Y)中,相對於樹脂組成物(Y)之總固體成分及部分縮合物之合計質量,以部分縮合物(A9)、(A10)、(X1)及(A11)之比例成為表4顯示之比例(質量%)含有例18~21中所得部分縮合物液(A9-1)、(A10-1)、(X1-1)及(A11-1),製造出硬塗膜用組成物10~14。而,作為各例之光硬化性樹脂組成物(Y),可使用硬塗膜HC162(商品名、橫濱橡膠公司製)及硬塗膜BEAMSET 575(CB)(商品名、荒川化學工業公司製)中任一者。個別使用該等,以與例11同樣的方式於PET基板上形成硬化膜(硬塗膜層)並進行評估。將結果與硬塗膜用組成物之組成一起顯示於表4。 In the resin composition (Y) for forming a commercially available hard coating film shown in Table 4, the partial condensate (A9), (A10) was used as the total mass of the total solid content and the partial condensate of the resin composition (Y). The ratio of (X1) and (A11) to the ratio (% by mass) shown in Table 4 includes the partial condensate solutions (A9-1), (A10-1), (X1-1) obtained in Examples 18 to 21 and (A11-1), compositions 10 to 14 for hard coat films were produced. In addition, as a photocurable resin composition (Y) of each of the examples, a hard coat film HC162 (trade name, manufactured by Yokohama Rubber Co., Ltd.) and a hard coat film BEAMSET 575 (CB) (trade name, manufactured by Arakawa Chemical Industries, Ltd.) can be used. Any of them. Each of these was used, and a cured film (hard coat layer) was formed on the PET substrate in the same manner as in Example 11 and evaluated. The results are shown in Table 4 together with the composition of the hard coating film composition.

分別使用本發明之部分縮合物(A1)及(A2)形成的例9、10之硬塗膜層,在表示撥水撥油性及撥墨性之抗指紋附著性、耐光性、硬化膜外觀及鉛筆硬度良好。 The hard coat layers of Examples 9 and 10 formed by using the partial condensates (A1) and (A2) of the present invention respectively exhibit anti-fingerprint adhesion, light resistance, and cured film appearance of water repellency and ink repellency. The pencil is of good hardness.

使用本發明之部分縮合物(A3)形成的例11之硬塗膜層係具有抗指紋附著性且硬化膜外觀良好者。 The hard coat layer layer of Example 11 formed using the partial condensate (A3) of the present invention has anti-fingerprint adhesion properties and a cured film having a good appearance.

分別使用本發明之部分縮合物(A9)、(A10)及(A11)形成的例22~24及26之硬塗膜層係在表示撥水撥油性及撥墨性之抗指紋附著性及硬化膜外觀良好者。 The hard coat layers of Examples 22 to 24 and 26 formed by using the partial condensates (A9), (A10) and (A11) of the present invention are respectively resistant to fingerprint adhesion and hardening of water repellency and ink repellency. The film looks good.

使用部分縮合物之氟原子含有率超過40%的部分縮合物(A4)之例12之硬塗膜層其硬化膜外觀不夠充分。 The hard coat layer of Example 12 of the partial condensate (A4) having a fluorine atom content of the partial condensate of more than 40% is insufficient in the appearance of the cured film.

使用不含化合物(a-2)單元的部分縮合物(A5)之例13之硬塗膜層其撥墨性不夠充分。推定係由於不含化合物(a-2)單元而損及部分水解縮合物之造膜性的結果。 The hard coat layer of Example 13 using the partial condensate (A5) containing no compound (a-2) unit was insufficient in ink repellency. It is presumed that the film-forming property of the partially hydrolyzed condensate is impaired by the absence of the compound (a-2) unit.

使用不含化合物(a-3)單元的部分縮合物(A6)之例14之硬塗膜層其撥墨性不夠充分。推定係因為不含化合物(a-3)單元而無法使部分水解縮合物與光聚合性化合物(B)聚合,難以侷在化於塗膜層尤其是表面的結果。 The hard coat layer of Example 14 using the partial condensate (A6) containing no compound (a-3) unit was insufficient in ink repellency. It is presumed that the partial hydrolysis condensate and the photopolymerizable compound (B) cannot be polymerized because the compound (a-3) unit is not contained, and it is difficult to form a coating layer, especially a surface.

利用使用具有碳原子數8之全氟烷基的水解性矽烷化合物之部分縮合物(A7)的例15之硬塗膜層其環境負荷大。又,硬化膜外觀不夠充分。此推定是因為部分水解縮合物之數目平均分子量大且因為與光聚合性化合物(B)之相溶性不夠充分之故。 The hard coat layer of Example 15 using a partial condensate (A7) having a hydrolyzable decane compound having a perfluoroalkyl group having 8 carbon atoms has a large environmental load. Moreover, the appearance of the cured film is insufficient. This estimation is because the number average molecular weight of the partially hydrolyzed condensate is large and the compatibility with the photopolymerizable compound (B) is insufficient.

使用主鏈以烴所構成之部分縮合物(A8)的例16之硬塗膜層其耐光性不夠充分。推定是因為主鏈以烴所構成且因 為紫外線而劣化之故。 The hard coat layer of Example 16 using the partial condensate (A8) composed of a hydrocarbon in the main chain was insufficient in light resistance. Presumed because the main chain is composed of hydrocarbons and It is degraded by ultraviolet rays.

在例17中,使用例1中所得之實施例的部分水解縮合物來製造硬塗膜用組成物,並使用此來製造具有硬塗膜層之基材。惟,從以總固體成分中之部分水解縮合物含量超過20質量%之組成來製造硬塗膜用組成物一點看來,在例17之硬塗膜層中撥墨性不夠充分。低表面能量的部分水解縮合物具有偏析於表面之特性。推定係在例17之硬塗膜層中形成部分水解縮合物業經濃縮之層而使部分縮合物(A)與光聚合性化合物(B)無法充分地進行交聯之故。使組成物含有本發明之部分水解縮合物作使用時,可藉由該組成物所求之特性範圍等來適宜調整適當的組成作使用。 In Example 17, the partially hydrolyzed condensate of the Example obtained in Example 1 was used to produce a composition for a hard coat film, and a substrate having a hard coat layer was produced using the same. However, from the viewpoint of producing a composition for a hard coat film having a composition in which the content of the partially hydrolyzed condensate in the total solid content exceeds 20% by mass, the ink-repellent property in the hard coat layer of Example 17 is insufficient. The partially hydrolyzed condensate having a low surface energy has characteristics of segregation on the surface. It is presumed that a partially hydrolyzed condensation property layer is formed in the hard coat layer of Example 17 to partially crosslink the partial condensate (A) and the photopolymerizable compound (B). When the composition contains the partially hydrolyzed condensate of the present invention, it is possible to appropriately adjust the appropriate composition by using the range of characteristics of the composition and the like.

使用氟原子含有率低於2.5%之部分縮合物(X1)的例25之硬塗膜層其撥墨性不夠充分。推定是因為表面無法被Rf充分被覆之故。 The hard coat layer of Example 25 using the partial condensate (X1) having a fluorine atom content of less than 2.5% was insufficient in ink repellency. The presumption is because the surface cannot be fully covered by Rf.

產業上之可利用性 Industrial availability

含有本發明之部分水解縮合物的硬塗膜用組成物可形成對基材具有充分的硬度同時具有優異的防污性尤其是抗指紋附著性優異的硬塗膜層。此外,環境負荷少。又,具有硬塗膜層之基材有優異的耐磨耗性、透明性,此外其表面具有充分的硬度,且防污性尤其是抗指紋附著性之耐光性亦佳。因此,可有效地作為視脂性污垢尤其是指紋附著為外觀上問題之智慧型手機或輸入板個人電腦等使用的觸控面板、顯示器玻璃、光學元件及衛生機器等之構件。 The composition for a hard coat film containing the partially hydrolyzed condensate of the present invention can form a hard coat layer which has sufficient hardness to the substrate and has excellent antifouling properties, particularly excellent in anti-fingerprint adhesion. In addition, the environmental load is small. Further, the substrate having the hard coat layer has excellent abrasion resistance and transparency, and the surface thereof has sufficient hardness, and the antifouling property, particularly the anti-fingerprint adhesion, is also excellent in light resistance. Therefore, it can be effectively used as a member of a touch panel, a display glass, an optical element, a sanitary machine, or the like which is used for a fat-type dirt, in particular, a smart phone or an input tablet personal computer to which a fingerprint is attached.

而,在此係引用已於2012年1月31日提出申請之日本專 利申請案2012-017605號及已於2012年11月7日提出申請之日本專利申請案2012-245498號之說明書、申請專利範圍及摘要的全部內容,並納入作為本發明說明書之揭示。 However, this is a reference to the Japanese application that was filed on January 31, 2012. The entire contents of the specification, the patent application, and the abstract of the Japanese Patent Application No. 2012- 245 498 filed on Nov.

Claims (21)

一種抗指紋附著劑的製造方法,其特徵在於:在水、有機溶媒及酸之存在下,使水解性矽烷化合物之混合物水解且部分縮合以製造氟原子含有率為2.5~40質量%之部分水解縮合物;該水解性矽烷化合物之混合物以莫耳比計,相對於以下式(a-1)表示之水解性矽烷化合物(a-1)100莫耳,含有1~23,000莫耳之以下式(a-2)表示之水解性矽烷化合物(a-2)及20~11,500莫耳之以下式(a-3)表示之水解性矽烷化合物(a-3); 式(a-1)、(a-2)及(a-3)中之記號係如以下所述:Rf:F(CF2)4-、F(CF2)6-或以Rf1ORf2-表示且碳原子數2~100之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基);Q1:碳原子數1~10且不含氟原子之2價有機基;Y:具有乙烯性雙鍵之基;Q2:碳原子數1~6且不含氟原子之2價有機基; RH1、RH2:碳原子數1~6之烴基;X1、X2、X3:水解性基;p:0~3之整數;q:1或2;r:0或1且q+r為1或2之數;惟,式(a-1)中存在複數個X1及式(a-2)或式(a-3)中存在複數個X2、X3、RH1、Y-Q2時,其等可彼此相異亦可相同。 A method for producing an anti-fingerprint adhesive agent, characterized in that a mixture of hydrolyzable decane compounds is hydrolyzed and partially condensed in the presence of water, an organic solvent and an acid to produce a partial hydrolysis of a fluorine atom content of 2.5 to 40% by mass. a condensate; the hydrolyzable decane compound is a mixture of 1 to 23,000 moles per mole of the hydrolyzable decane compound (a-1) represented by the following formula (a-1) in terms of a molar ratio ( a hydrolyzable decane compound (a-2) represented by a-2) and a hydrolyzable decane compound (a-3) represented by the following formula (a-3): 20 to 11,500 mol; The symbols in the formulas (a-1), (a-2) and (a-3) are as follows: R f : F(CF 2 ) 4 -, F(CF 2 ) 6 - or R f1 OR F2 - represents a monovalent group having 2 to 100 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 is a perfluoroalkylene having an etheric oxygen atom between carbon atoms and carbon atoms) Base); Q 1 : a divalent organic group having 1 to 10 carbon atoms and no fluorine atom; Y: a group having an ethylenic double bond; Q 2 : a carbon number of 1 to 6 and not containing a fluorine atom Organic group; R H1 , R H2 : a hydrocarbon group having 1 to 6 carbon atoms; X 1 , X 2 , X 3 : a hydrolyzable group; p: an integer of 0 to 3; q: 1 or 2; r: 0 or 1 And q+r is a number of 1 or 2; however, there are a plurality of X 1 and a plurality of X 2 , X 3 , R in the formula (a-1) or the formula (a-2) or the formula (a-3). When H1 and YQ 2 , they may be different from each other or the same. 如申請專利範圍第1項之抗指紋附著劑的製造方法,其中前述部分水解縮合物之氟原子含有率為20~40質量%,前述式(a-1)中之Rf係F(CF2)4-、F(CF2)6-或以Rf1ORf2-表示且碳原子數2~40之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基)。 The method for producing an anti-fingerprint adhesive agent according to the first aspect of the invention, wherein the partial hydrolysis-condensation product has a fluorine atom content of 20 to 40% by mass, and the R f- based F (CF 2 in the above formula (a-1) 4 -, F(CF 2 ) 6 - or a valent group represented by R f1 OR f2 - and having 2 to 40 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 is acceptable a perfluoroalkylene group having an etheric oxygen atom between carbon-carbon atoms). 如申請專利範圍第1項之抗指紋附著劑的製造方法,其中前述部分水解縮合物係使水解性矽烷化合物之混合物水解並部分縮合而製造之部分水解縮合物,該水解性矽烷化合物混合物以莫耳比計,相對於前述水解性矽烷化合物(a-1)100莫耳,含有1~800莫耳之前述水解性矽烷化合物(a-2)及20~300莫耳之前述水解性矽烷化合物(a-3)。 The method for producing an anti-fingerprint adhesive agent according to the first aspect of the invention, wherein the partially hydrolyzed condensate is a partially hydrolyzed condensate obtained by hydrolyzing and partially condensing a mixture of hydrolyzable decane compounds, the hydrolyzable decane compound mixture being The above-mentioned hydrolyzable decane compound (a-2) and 20 to 300 moles of the aforementioned hydrolyzable decane compound are contained in an amount of from 1 to 800 moles per 100 moles of the hydrolyzable decane compound (a-1). A-3). 如申請專利範圍第1項之抗指紋附著劑的製造方法,其中相對於前述水解性矽烷化合物混合物100質量份,前述水之添加量為5~100質量份。 The method for producing an anti-fingerprint adhesive agent according to the first aspect of the invention, wherein the water is added in an amount of 5 to 100 parts by mass based on 100 parts by mass of the hydrolyzable decane compound mixture. 如申請專利範圍第2項之抗指紋附著劑的製造方法,其中相對於前述水解性矽烷化合物混合物100質量份,前述水之添加量為5~100質量份。 The method for producing an anti-fingerprint adhesive agent according to the second aspect of the invention, wherein the water is added in an amount of 5 to 100 parts by mass based on 100 parts by mass of the hydrolyzable decane compound mixture. 如申請專利範圍第3項之抗指紋附著劑的製造方法,其中相對於前述水解性矽烷化合物混合物100質量份,前述水之添加量為5~100質量份。 The method for producing an anti-fingerprint adhesive agent according to the third aspect of the invention, wherein the water is added in an amount of 5 to 100 parts by mass based on 100 parts by mass of the hydrolyzable decane compound mixture. 如申請專利範圍第3項之抗指紋附著劑的製造方法,其中相對於前述水解性矽烷化合物混合物之100質量份,前述水之添加量為5~40質量份。 The method for producing an anti-fingerprint adhesive agent according to the third aspect of the invention, wherein the water is added in an amount of 5 to 40 parts by mass based on 100 parts by mass of the hydrolyzable decane compound mixture. 如申請專利範圍第1項之抗指紋附著劑的製造方法,其中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 The method for producing an anti-fingerprint adhesive agent according to the first aspect of the invention, wherein the organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C. 如申請專利範圍第2項之抗指紋附著劑的製造方法,其中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 The method for producing an anti-fingerprint adhesive agent according to the second aspect of the invention, wherein the organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C. 如申請專利範圍第3項之抗指紋附著劑的製造方法,其中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 The method for producing an anti-fingerprint adhesive agent according to claim 3, wherein the organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C. 如申請專利範圍第4項之抗指紋附著劑的製造方法,其中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 The method for producing an anti-fingerprint adhesive agent according to the fourth aspect of the invention, wherein the organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C. 如申請專利範圍第5項之抗指紋附著劑的製造方法,其中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 The method for producing an anti-fingerprint adhesive agent according to claim 5, wherein the organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C. 如申請專利範圍第6項之抗指紋附著劑的製造方法,其中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 The method for producing an anti-fingerprint adhesive agent according to claim 6, wherein the organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C. 如申請專利範圍第7項之抗指紋附著劑的製造方法,其中前述有機溶媒含有具羥基且在25℃下之介電常數為5~20之化合物。 The method for producing an anti-fingerprint adhesive agent according to claim 7, wherein the organic solvent contains a compound having a hydroxyl group and having a dielectric constant of 5 to 20 at 25 °C. 如申請專利範圍第1至14項中任一項之抗指紋附著劑的製造方法,其中前述酸為硝酸。 The method for producing an anti-fingerprint adhesive according to any one of claims 1 to 14, wherein the acid is nitric acid. 一種硬塗膜用組成物,係含有下述部分水解縮合物與光聚合性成分者,其特徵在於前述組成物之總固體成分中下述部分水解縮合物之含量為0.01~20質量%;部分水解縮合物:含有以下式(a-1)表示之水解性矽烷化合物(a-1)、以下式(a-2)表示之水解性矽烷化合物(a-2)及以下式(a-3)表示之水解性矽烷化合物(a-3)的混合物之部分水解縮合物,且氟原子含有率為2.5~40質量%;其係在水、有機溶媒及酸之存在下,使水解性矽烷化合物之混合物水解且部分縮合之氟原子含有率為2.5~40質量%之部分水解縮合物;該水解性矽烷化合物之混合物以莫耳比計,相對於以下式(a-1)表示之水解性矽烷化合物(a-1)100莫耳,含有1~23,000莫耳之以下式(a-2)表示之水解性矽烷化合物(a-2)及20~11,500莫耳之以下式(a-3)表示之水解性矽烷化合物(a-3);[化2] 式(a-1)、(a-2)及(a-3)中之記號如以下所述:Rf:F(CF2)4-、F(CF2)6-或以Rf1ORf2-表示且碳原子數2~100之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基);Q1:碳原子數1~10且不含氟原子之2價有機基;Y:具有乙烯性雙鍵之基;Q2:碳原子數1~6且不含氟原子之2價有機基;RH1、RH2:碳原子數1~6之烴基;X1、X2、X3:水解性基;p:0~3之整數;q:1或2;r:0或1且q+r為1或2之數;惟,式(a-1)中存在複數個X1及式(a-2)或式(a-3)中存在複數個X2、X3、RH1、Y-Q2時,其等可彼此相異亦可相同。 A composition for a hard coating film comprising a partial hydrolyzed condensate and a photopolymerizable component, wherein the content of the following partial hydrolyzed condensate in the total solid content of the composition is 0.01 to 20% by mass; Hydrolyzed condensate: a hydrolyzable decane compound (a-1) represented by the following formula (a-1), a hydrolyzable decane compound (a-2) represented by the following formula (a-2), and the following formula (a-3) a partially hydrolyzed condensate of a mixture of hydrolyzable decane compounds (a-3), and having a fluorine atom content of 2.5 to 40% by mass; in the presence of water, an organic solvent and an acid, a hydrolyzable decane compound a partially hydrolyzed condensate of a hydrolyzed and partially condensed fluorine atom content of 2.5 to 40% by mass; the hydrolyzable decane compound represented by the following formula (a-1) in a molar ratio of the mixture of the hydrolyzable decane compound (a-1) 100 mol, containing 1 to 23,000 mol of the hydrolyzable decane compound (a-2) represented by the following formula (a-2) and 20 to 11,500 mol of the following formula (a-3) Hydrolyzable decane compound (a-3); [Chemical 2] The symbols in the formulas (a-1), (a-2), and (a-3) are as follows: R f : F(CF 2 ) 4 -, F(CF 2 ) 6 - or R f1 OR f2 - a valent group having 2 to 100 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 is a perfluoroalkyl group having an etheric oxygen atom between carbon atoms and carbon atoms) ); Q 1 : a divalent organic group having 1 to 10 carbon atoms and no fluorine atom; Y: a group having an ethylenic double bond; Q 2 : a divalent organic group having 1 to 6 carbon atoms and no fluorine atom R H1 , R H2 : a hydrocarbon group having 1 to 6 carbon atoms; X 1 , X 2 , X 3 : a hydrolyzable group; p: an integer of 0 to 3; q: 1 or 2; r: 0 or 1 and q+r is a number of 1 or 2; however, there are a plurality of X 1 and a plurality of X 2 , X 3 , and R H1 in the formula (a-1) and the formula (a-2) or the formula (a-3). When YQ 2 , the same may be different from each other. 如申請專利範圍第16項之硬塗膜用組成物,其中前述部分水解縮合物之氟原子含有率為20~40質量%,前述式(a-1)中之Rf係F(CF2)4-、F(CF2)6-或以Rf1ORf2-表示且碳 原子數2~40之1價基(Rf1係碳原子數1~6之全氟烷基,Rf2係可於碳-碳原子間具有醚性氧原子之全氟伸烷基)。 The composition for a hard coating film according to claim 16, wherein the partial hydrolysis condensate has a fluorine atom content of 20 to 40% by mass, and the R f system F(CF 2 ) in the above formula (a-1) 4- , F(CF 2 ) 6 - or a valent group represented by R f1 OR f2 - and having 2 to 40 carbon atoms (R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms, and R f2 is acceptable a perfluoroalkylene group having an etheric oxygen atom between carbon-carbon atoms). 如申請專利範圍第16或17項之硬塗膜用組成物,其中前述光聚合性成分含有光聚合性化合物與光聚合引發劑。 The composition for a hard coat film according to claim 16 or 17, wherein the photopolymerizable component contains a photopolymerizable compound and a photopolymerization initiator. 如申請專利範圍第16或17項之硬塗膜用組成物,其中前述硬塗膜用組成物硬化而成之膜至少相對於可見光線為透明。 The composition for a hard coat film according to claim 16 or 17, wherein the film obtained by hardening the composition for the hard coat film is at least transparent to visible light. 一種具有硬塗膜層之基材,其特徵在於具有:基材;及硬塗膜層,係由如申請專利範圍第16至18項中任一項之硬塗膜用組成物形成於前述基材之至少一部分表面的硬化膜所構成。 A substrate having a hard coat layer, comprising: a substrate; and a hard coat layer formed on the base by a composition for a hard coat film according to any one of claims 16 to 18. A cured film of at least a portion of the surface of the material. 一種觸控面板,其特徵在於具有如申請專利範圍第20項之具有硬塗膜層之基材。 A touch panel characterized by having a substrate having a hard coat layer as in claim 20 of the patent application.
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