TWI541946B - Semiconductor package and method of manufacture - Google Patents
Semiconductor package and method of manufacture Download PDFInfo
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- TWI541946B TWI541946B TW103138013A TW103138013A TWI541946B TW I541946 B TWI541946 B TW I541946B TW 103138013 A TW103138013 A TW 103138013A TW 103138013 A TW103138013 A TW 103138013A TW I541946 B TWI541946 B TW I541946B
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- Prior art keywords
- carrier
- semiconductor package
- package
- active surface
- electronic components
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- 239000004065 semiconductor Substances 0.000 title claims description 57
- 238000000034 method Methods 0.000 title claims description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 32
- 239000000969 carrier Substances 0.000 claims description 27
- 238000000926 separation method Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 13
- 239000005022 packaging material Substances 0.000 claims 2
- 239000010410 layer Substances 0.000 description 27
- 239000012790 adhesive layer Substances 0.000 description 15
- 238000005520 cutting process Methods 0.000 description 8
- 239000008393 encapsulating agent Substances 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011152 fibreglass Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 description 1
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04105—Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/12105—Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/19—Manufacturing methods of high density interconnect preforms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
Landscapes
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
本發明係有關一種半導體封裝件之製法,尤指一種提昇產能之半導體封裝件及其製法。 The invention relates to a method for manufacturing a semiconductor package, in particular to a semiconductor package for improving productivity and a method for manufacturing the same.
隨著電子產業的蓬勃發展,電子產品也逐漸邁向多功能、高性能的趨勢。為了滿足半導體封裝件微型化(miniaturization)的封裝需求,係發展出晶圓級封裝(Wafer Level Packaging,WLP)的技術。 With the rapid development of the electronics industry, electronic products are gradually moving towards multi-functional and high-performance trends. In order to meet the packaging requirements for semiconductor package miniaturization, Wafer Level Packaging (WLP) technology was developed.
如第1A至1E圖,係為習知晶圓級半導體封裝件1之製法之剖面示意圖。 1A to 1E are schematic cross-sectional views showing a conventional method of fabricating a wafer-level semiconductor package 1.
如第1A圖所示,形成一熱化離型膠層(thermal release tape)11於一承載件10上。 As shown in FIG. 1A, a thermal release tape 11 is formed on a carrier 10.
接著,置放複數半導體元件12於該熱化離型膠層11上,該些半導體元件12具有相對之主動面12a與非主動面12b,各該主動面12a上均具有複數電極墊120,且各該主動面12a黏著於該熱化離型膠層11上。 Next, a plurality of semiconductor elements 12 are disposed on the thermal release adhesive layer 11, the semiconductor elements 12 having opposite active planes 12a and inactive surfaces 12b, each of which has a plurality of electrode pads 120 thereon, and Each of the active faces 12a is adhered to the thermal release adhesive layer 11.
如第1B圖所示,形成一封裝膠體13於該熱化離型膠層11上,以包覆該半導體元件12,且使該半導體元件12 之非主動面12b外露於該封裝膠體13。 As shown in FIG. 1B, an encapsulant 13 is formed on the thermal release adhesive layer 11 to encapsulate the semiconductor component 12, and the semiconductor component 12 is formed. The inactive surface 12b is exposed to the encapsulant 13 .
如第1C圖所示,於該封裝膠體13及該半導體元件12之非主動面12b上藉由一結合層170貼覆一支撐件17,再烘烤該封裝膠體13以硬化該熱化離型膠層11而移除該熱化離型膠層11與該承載件10,使該半導體元件12之主動面12a外露。之後,固化(curing)該封裝膠體13。 As shown in FIG. 1C, a support member 17 is attached to the encapsulant 13 and the inactive surface 12b of the semiconductor device 12 by a bonding layer 170, and the encapsulant 13 is baked to harden the thermal release type. The adhesive layer 11 removes the thermal release adhesive layer 11 and the carrier 10 to expose the active surface 12a of the semiconductor component 12. Thereafter, the encapsulant 13 is cured.
如第1D圖所示,進行線路重佈層(Redistribution layer,RDL)製程,係形成一線路重佈結構14於該封裝膠體13與該半導體元件12之主動面12a上,令該線路重佈結構14電性連接該半導體元件12之電極墊120。 As shown in FIG. 1D, a circuit redistribution layer (RDL) process is performed to form a line redistribution structure 14 on the encapsulant 13 and the active surface 12a of the semiconductor component 12, so that the circuit is re-wired. The electrode pad 120 of the semiconductor element 12 is electrically connected.
接著,形成一絕緣保護層15於該線路重佈結構14上,且該絕緣保護層15外露該線路重佈結構14之部分表面,以供結合如銲球之導電元件16。 Next, an insulating protective layer 15 is formed on the circuit redistribution structure 14, and the insulating protective layer 15 exposes a portion of the surface of the circuit redistribution structure 14 for bonding the conductive elements 16 such as solder balls.
如第1E圖所示,沿如第1D圖所示之切割路徑S進行切單製程,以獲取複數個半導體封裝件1(即封裝單元)。 As shown in FIG. 1E, a singulation process is performed along the dicing path S as shown in FIG. 1D to obtain a plurality of semiconductor packages 1 (ie, package units).
習知半導體封裝件1之製法係為晶圓級(wafer form),而為降低生產成本,係以整版面形式(Panel form)製作。目前製作之整版面形式之尺寸,其長與寬分別為370mm×470mm,目標發展為600mm×700mm。 The conventional semiconductor package 1 is manufactured in a wafer form, and is manufactured in a panel form in order to reduce production costs. The size of the full-face form currently produced is 370 mm × 470 mm in length and width, and the target is developed to be 600 mm × 700 mm.
惟,習知半導體封裝件1之製法中,目前現有切單機台最大僅能置放100mm×240mm,因而無法放置370mm×470mm或更大尺寸,故現階段需先以人工方式切割成適合尺寸,再放入現有切單機中,導致難以提升產量。 However, in the manufacturing method of the conventional semiconductor package 1, the current singulation machine can only be placed at a maximum size of 100 mm × 240 mm, and thus cannot be placed at a size of 370 mm × 470 mm or more, so that it is necessary to manually cut into a suitable size at this stage. Putting it into the existing singer, it is difficult to increase the output.
再者,若要直接將370mm×470mm或更大尺寸之版面進 行切單製程,需額外特製機台,導致產品製作成本提高。 Furthermore, if you want to directly enter the layout of 370mm × 470mm or larger The line cutting process requires an extra special machine, which leads to an increase in production costs.
因此,如何克服上述習知技術的種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the various problems of the above-mentioned prior art has become a problem that is currently being solved.
鑑於上述習知技術之種種缺失,本發明係提供一種半導體封裝件,係為整版面結構,其包括:一承載件,係具有複數凹槽;以及複數電子單元,係嵌設於各該凹槽中。 In view of the above-mentioned various deficiencies of the prior art, the present invention provides a semiconductor package, which is a full-surface structure, comprising: a carrier having a plurality of grooves; and a plurality of electronic units embedded in each of the grooves in.
前述之半導體封裝件中,該電子單元係包含:封裝材,係形成於該些凹槽中;複數電子元件,係嵌埋於各該凹槽中之封裝材中,且任一該凹槽中具有複數個該電子元件;以及承載體,係形成於該封裝材上,以使該承載體對應位於該凹槽上。再者,該電子元件具有相對之主動面與非主動面,且該承載體係覆蓋於該電子元件之主動面上。 In the above semiconductor package, the electronic unit includes: a package material formed in the grooves; and a plurality of electronic components embedded in the package in each of the grooves, and any of the grooves And a plurality of the electronic components; and a carrier formed on the package such that the carrier is correspondingly located on the groove. Furthermore, the electronic component has opposite active and inactive surfaces, and the carrier system covers the active surface of the electronic component.
前述之半導體封裝件中,該電子單元係包含:承載體,具有相對之第一側與第二側,且該第一側之面積大於該第二側之面積,該承載體以其第二側對應置放於該凹槽中;複數電子元件,係設於該承載體之第一側上,且任一該承載體上設有複數個該電子元件;以及封裝材,係形成於該承載件上,以包覆該些電子元件。再者,該電子元件具有相對之主動面與非主動面,且該電子元件以其主動面結合於該第一側上。又包括設於該封裝材上之支撐件。另外,該凹槽係為錐狀。 In the foregoing semiconductor package, the electronic unit includes: a carrier having opposite first and second sides, and the first side has an area larger than the second side, and the carrier has the second side Correspondingly placed in the groove; a plurality of electronic components are disposed on the first side of the carrier, and any one of the electronic components is disposed on any of the carriers; and an encapsulating material is formed on the carrier Upper to cover the electronic components. Furthermore, the electronic component has opposing active and inactive surfaces, and the electronic component is bonded to the first side with its active surface. Also included is a support member disposed on the package. In addition, the groove is tapered.
本發明復提供一種半導體封裝件之製法,係包括:提供一具有複數凹槽之承載件及複數承載體,且各該承載體 上分別設有一封裝體,各該封裝體具有複數電子元件及包覆該些電子元件之封裝材;嵌置各該封裝體於各該凹槽中,且使各該承載體凸出於該承載件上;移除各該承載體,以外露各該封裝體;以及沿該些凹槽進行分離製程,且移除該承載件。 The invention further provides a method for manufacturing a semiconductor package, comprising: providing a carrier having a plurality of grooves and a plurality of carriers, and each of the carriers Each of the packages is provided with a plurality of electronic components and a package covering the electronic components; each of the packages is embedded in each of the grooves, and each of the carriers protrudes from the carrier And removing each of the carriers to expose the packages; and performing a separation process along the grooves and removing the carrier.
前述之製法中,該電子元件具有相對之主動面與非主動面,且該電子元件以其主動面結合於該承載體上。 In the above method, the electronic component has an opposite active surface and a non-active surface, and the electronic component is bonded to the carrier with its active surface.
前述之製法中,於移除各該承載體後,使各該電子元件外露於該承載件。 In the above method, after removing each of the carriers, the electronic components are exposed to the carrier.
前述之製法中,復包括於移除各該承載體後,形成一線路重佈結構於各該封裝體上,且該線路重佈結構電性連接該電子元件。 In the foregoing method, after the removal of each of the carriers, a line redistribution structure is formed on each of the packages, and the circuit redistribution structure electrically connects the electronic components.
前述之製法中,復包括於進行該分離製程後,進行切單製程。 In the above method, the singulation process is performed after the separation process is performed.
本發明復提供一種半導體封裝件之製法,係包括:提供一具有複數凹槽之承載件及複數承載體,各該承載體具有相對之第一側與第二側,且該第一側之面積大於該第二側之面積,該第一側上並設有複數電子元件;將各該承載體以其第二側對應置放於各該凹槽中,使各該電子元件凸出於該承載件上;形成封裝材於該承載件上,以包覆該些電子元件,以於各該承載體上形成複數封裝體;移除各該承載體與該承載件;以及依各該封裝體進行分離製程。 The invention provides a method for fabricating a semiconductor package, comprising: providing a carrier having a plurality of grooves and a plurality of carriers, each of the carriers having an opposite first side and a second side, and an area of the first side A plurality of electronic components are disposed on the first side, and the plurality of electronic components are disposed on the first side, and the electronic components are protruded from the recesses. Forming an encapsulating material on the carrier to cover the electronic components to form a plurality of packages on each of the carriers; removing each of the carrier and the carrier; and performing the package Separate the process.
前述之製法中,該電子元件具有相對之主動面與非主動面,且該電子元件以其主動面結合於該承載體上。 In the above method, the electronic component has an opposite active surface and a non-active surface, and the electronic component is bonded to the carrier with its active surface.
前述之製法中,各該凹槽之形狀係對應該承載體之形狀。 In the above method, the shape of each of the grooves corresponds to the shape of the carrier.
前述之製法中,復包括於移除各該承載體與該承載件前,設置支撐件於該封裝材上。復包括於於進行分離製程後,移除該支撐件;復包括先移除該支撐件,再進行該分離製程。 In the foregoing method, the method further includes disposing a support member on the package before removing the carrier and the carrier. After the separation process is performed, the support member is removed; the method includes removing the support member first, and then performing the separation process.
前述之製法中,復包括於移除各該承載體與該承載件後,形成一線路重佈結構於該封裝材上,且該線路重佈結構電性連接該電子元件。 In the above method, after the removal of each of the carrier and the carrier, a line redistribution structure is formed on the package, and the circuit redistribution structure electrically connects the electronic component.
前述之製法中,復包括於進行該分離製程後,進行切單製程。 In the above method, the singulation process is performed after the separation process is performed.
由上可知,本發明之半導體封裝件及其製法,係藉由該承載體與凹槽之設計,以於整版面結構中分離出所需尺寸之封裝區塊,而於後續製程中,可進行切單、封裝與組裝等製程,故藉此方法可依需求增加整版面之尺寸以提升產量,且能省去機台開發之成本。 It can be seen from the above that the semiconductor package of the present invention and the method for manufacturing the same are designed by the carrier and the groove to separate the package block of the required size in the entire layout structure, and can be carried out in the subsequent process. The process of singulation, packaging and assembly is adopted, so that the size of the full-face can be increased according to the demand to increase the output, and the cost of machine development can be saved.
1,2,3‧‧‧半導體封裝件 1,2,3‧‧‧Semiconductor package
10,20,30‧‧‧承載件 10,20,30‧‧‧carriers
11‧‧‧熱化離型膠層 11‧‧‧heating release layer
12‧‧‧半導體元件 12‧‧‧Semiconductor components
12a,22a‧‧‧主動面 12a, 22a‧‧‧ active surface
12b,22b‧‧‧非主動面 12b, 22b‧‧‧ inactive surface
120,220‧‧‧電極墊 120,220‧‧‧electrode pads
13‧‧‧封裝膠體 13‧‧‧Package colloid
14,24‧‧‧線路重佈結構 14,24‧‧‧Line redistribution structure
15‧‧‧絕緣保護層 15‧‧‧Insulation protective layer
16,26‧‧‧導電元件 16,26‧‧‧ conductive elements
17,27‧‧‧支撐件 17,27‧‧‧Support
170,270‧‧‧結合層 170, 270‧‧‧ bonding layer
2’,3’‧‧‧封裝區塊 2’, 3’‧‧‧Package Blocks
2a,3a‧‧‧封裝單元 2a, 3a‧‧‧Packing unit
200,300‧‧‧凹槽 200,300‧‧‧ grooves
21,31‧‧‧承載體 21,31‧‧‧Carrier
210,310,310’‧‧‧黏著層 210,310,310’‧‧‧ adhesive layer
22‧‧‧電子元件 22‧‧‧Electronic components
23‧‧‧封裝材 23‧‧‧Package
240‧‧‧介電層 240‧‧‧ dielectric layer
241‧‧‧線路層 241‧‧‧Line layer
25‧‧‧封裝體 25‧‧‧Package
29,39‧‧‧電子單元 29,39‧‧‧Electronic unit
31a‧‧‧第一側 31a‧‧‧ first side
31b‧‧‧第二側 31b‧‧‧ second side
S,S’,S”‧‧‧切割路徑 S, S’, S”‧‧‧ cutting path
L‧‧‧分割路徑 L‧‧‧ split path
A,B,C,W,X‧‧‧面積 A, B, C, W, X‧‧‧ area
h‧‧‧深度 H‧‧‧depth
t‧‧‧厚度 T‧‧‧thickness
第1A至1E圖係為習知半導體封裝件之製法之剖面示意圖;第2A至2F圖係本發明之半導體封裝件之製法之第一實施例的剖面示意圖;其中,第2F’圖係第2F圖之下視圖;以及第3A至3G圖係本發明之半導體封裝件之製法之第二實施例的剖面示意圖;其中,第3G’圖係第3G圖之下視圖。 1A to 1E are schematic cross-sectional views showing a method of fabricating a conventional semiconductor package; and FIGS. 2A to 2F are cross-sectional views showing a first embodiment of a method of fabricating a semiconductor package of the present invention; wherein the 2F' is a 2F FIG. 3A to FIG. 3G are cross-sectional views showing a second embodiment of the method of fabricating the semiconductor package of the present invention; wherein the 3Gth diagram is a lower view of the 3Gth diagram.
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“上”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It is to be understood that the structure, the proportions, the size, and the like of the present invention are intended to be used in conjunction with the disclosure of the specification, and are not intended to limit the invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effects and the objectives that can be achieved by the present invention. The technical content disclosed in the invention can be covered. In the meantime, the terms "upper" and "one" as used in the specification are merely for convenience of description, and are not intended to limit the scope of the invention, and the relative relationship is changed or adjusted. Substantially changing the technical content is also considered to be within the scope of the invention.
第2A至2F圖係為本發明之半導體封裝件2之製法的第一實施例之剖面示意圖。 2A to 2F are schematic cross-sectional views showing a first embodiment of the method of fabricating the semiconductor package 2 of the present invention.
如第2A至2C圖所示,提供一具有複數凹槽200之承載件20及複數承載體21,且各該承載體21上設有封裝體25,各該封裝體25具有複數電子元件22及包覆該些電子元件22之封裝材23,以構成電子單元29。接著,將各該電子單元29以其封裝體25對應置放於各該凹槽200中,使各該承載體21凸出於該承載件20上,藉此,完成整版面(panel)結構之半導體封裝件2。 As shown in FIG. 2A to FIG. 2C, a carrier 20 having a plurality of recesses 200 and a plurality of carriers 21 are provided, and each of the carriers 21 is provided with a package 25, each of the packages 25 having a plurality of electronic components 22 and The package 23 covering the electronic components 22 is formed to constitute the electronic unit 29. Then, each of the electronic units 29 is placed in the recess 200 correspondingly with the package body 25, so that the carrier 21 protrudes from the carrier 20, thereby completing the panel structure. Semiconductor package 2.
於本實施例中,該承載件20係為如晶圓、矽板之半導 體基板或玻璃基板,且該承載件20之頂側或底側之面積X係為610mm×720mm,並於該單一承載體21上結合有複數該電子元件22,而該承載體21藉由其表面上之黏著層210以結合該些電子元件22,該黏著層210亦凸出於該承載件20上。 In this embodiment, the carrier 20 is a semi-conductive such as a wafer or a raft. a body substrate or a glass substrate, and an area X of the top side or the bottom side of the carrier 20 is 610 mm × 720 mm, and the plurality of electronic components 22 are bonded to the single carrier 21, and the carrier 21 is The adhesive layer 210 on the surface is coupled to the electronic components 22, and the adhesive layer 210 also protrudes from the carrier 20.
再者,該承載體21之頂側或底側之面積A與該凹槽200之開口之面積W係為100mm×240mm,故該承載體21與該凹槽200係可作為拼圖式結構,亦即該承載體21之製作可為從一板體結構中切割分離出該承載件20與該承載體21。 Furthermore, the area A of the top side or the bottom side of the carrier 21 and the area W of the opening of the groove 200 are 100 mm×240 mm, so the carrier 21 and the groove 200 can be used as a puzzle structure. That is, the carrier 21 can be fabricated by cutting and separating the carrier 20 and the carrier 21 from a plate structure.
又,該電子元件22係為主動元件、被動元件或其組合者,且該主動元件係例如半導體晶片,而該被動元件係例如電阻、電容及電感。例如,該電子元件22具有相對之主動面22a與非主動面22b,且該電子元件22以其主動面22a結合該黏著層210。 Moreover, the electronic component 22 is an active component, a passive component or a combination thereof, and the active component is, for example, a semiconductor wafer, and the passive component is, for example, a resistor, a capacitor, and an inductor. For example, the electronic component 22 has an opposite active surface 22a and an inactive surface 22b, and the electronic component 22 incorporates the adhesive layer 210 with its active surface 22a.
另外,該封裝材23係以壓合(Lamination)方式或模壓(molding)方式形成於該承載體21之黏著層210上,且該封裝材23之材質係為封裝膠體、介電材感光絕緣材、乾膜型(Dry Film Type)環氧樹脂(Epoxy)或流體狀環氧樹脂、或有機材質,如ABF(Ajinomoto Build-up Film)樹脂等。 In addition, the encapsulating material 23 is formed on the adhesive layer 210 of the carrier 21 by a lamination method or a molding method, and the material of the encapsulant 23 is a package colloid and a dielectric photosensitive material. , Dry film type epoxy resin (Epoxy) or fluid epoxy resin, or organic material, such as ABF (Ajinomoto Build-up Film) resin.
如第2D圖所示,移除各該承載體21及該黏著層210,以外露各該封裝體25(如該電子元件22之主動面22a)。 As shown in FIG. 2D, each of the carrier 21 and the adhesive layer 210 are removed, and each of the packages 25 (such as the active surface 22a of the electronic component 22) is exposed.
如第2E圖所示,進行線路重佈層(Redistribution layer, RDL)製程,即形成一線路重佈結構24於該封裝材23、承載件20與該些電子元件22上,且該線路重佈結構24電性連接各該電子元件22。接著,結合如銲球之導電元件26於該線路重佈結構24之部分表面上,俾供接置其它電子裝置(如電路板)。 As shown in Figure 2E, a redistribution layer is implemented. The RDL) process forms a line redistribution structure 24 on the package 23, the carrier 20 and the electronic components 22, and the line redistribution structure 24 is electrically connected to each of the electronic components 22. Next, a conductive element 26 such as a solder ball is bonded to a portion of the surface of the line redistribution structure 24 for connection to other electronic devices (such as a circuit board).
於本實施例中,該線路重佈結構24係包含相疊之至少一線路層241與至少一介電層240,該介電層240係形成於該封裝材23上,且該線路層241係電性連接該電子元件22。 In this embodiment, the circuit redistribution structure 24 includes at least one circuit layer 241 and at least one dielectric layer 240 stacked on each other. The dielectric layer 240 is formed on the package 23, and the circuit layer 241 is The electronic component 22 is electrically connected.
如第2F及2F’圖所示,沿如第2E圖所示之分割路徑L(即沿該些凹槽200之邊緣或該封裝體25之邊緣)進行分離製程,再完全移除該承載件20之底部。 As shown in FIGS. 2F and 2F', the separation process is performed along the division path L as shown in FIG. 2E (ie, along the edge of the grooves 200 or the edge of the package 25), and the carrier is completely removed. The bottom of 20.
於本實施例中,該分離製程係將整版面結構分割成複數封裝區塊(strip)2’,且該封裝區塊2’之尺寸係為100mm×240mm,其由複數封裝單元2a(如第2F’圖所示之切單製程之切割路徑S’之範圍)構成。具體地,單一該封裝單元2a中之電子元件22之數量可依需求而定,即藉由調整切單製程之切割路徑S’,例如,第2F’圖所示之單一該封裝單元2a中具有四個電子元件22,而於其它實施例中,單一該封裝單元2a中亦可具有一個電子元件22。 In this embodiment, the separation process divides the full-page structure into a plurality of package strips 2', and the size of the package block 2' is 100 mm×240 mm, which is composed of a plurality of package units 2a (eg, 2F' is shown in the range of the cutting path S' of the singulation process. Specifically, the number of the electronic components 22 in the single package unit 2a can be determined according to requirements, that is, by adjusting the cutting path S' of the singulation process, for example, the single package unit 2a shown in FIG. 2F' has There are four electronic components 22, and in other embodiments, a single electronic component 22 can be included in a single package unit 2a.
再者,於其它實施例中,亦可先移除該承載件20之底部,再進行該分離製程。 Moreover, in other embodiments, the bottom of the carrier 20 may be removed first, and then the separation process is performed.
本發明之製法中,藉由該承載體21與凹槽200之設計,以將整版面結構分割成尺寸100mm×240mm之封裝區塊 2’,而於後續製程中,可將該封裝區塊2’進行切單製程以獲得複數封裝單元2a,故藉此方法可依需求增加整版面之尺寸,而變換整版面之尺寸,以提升產量。 In the manufacturing method of the present invention, the design of the carrier 21 and the groove 200 is used to divide the entire surface structure into a package block having a size of 100 mm×240 mm. 2', and in the subsequent process, the package block 2' can be singulated to obtain the plurality of package units 2a, so the method can increase the size of the entire layout according to the requirements, and change the size of the entire layout to improve Yield.
再者,藉由該承載體21與凹槽200之設計,可將整版面結構分割成現有切單機所需之切單尺寸(即該封裝區塊2’之尺寸),即可進行量產,無需額外開發新機台,故能降低機台開發之成本。 Moreover, by the design of the carrier 21 and the groove 200, the entire layout structure can be divided into the singulation size required for the existing singulator (ie, the size of the package block 2'), and mass production can be performed. There is no need to develop additional machines, which can reduce the cost of machine development.
又,藉由該承載體21與凹槽200之設計,能以自動化方式將整版面結構分離成所需尺寸之封裝區塊2’,再放入現有切單機中,以提升產量。 Moreover, by the design of the carrier 21 and the recess 200, the entire layout structure can be separated into the package block 2' of a desired size in an automated manner and placed in an existing singulator to increase the yield.
第3A至3G圖係為本發明之半導體封裝件3之製法的第二實施例之剖面示意圖。 3A to 3G are schematic cross-sectional views showing a second embodiment of the method of fabricating the semiconductor package 3 of the present invention.
如第3A至3C圖所示,提供一具有複數凹槽300之承載件30及複數承載體31,且各該承載體31具有相對之第一側31a與第二側31b,且該第一側31a之面積B大於該第二側31b之面積C,並於該第一側31a上設有複數電子元件22,以構成電子單元39。接著,將各該電子單元39以其承載體31之第二側31b對應置放於各該凹槽300中,使各該電子元件22凸出於該承載件30上。 As shown in FIGS. 3A to 3C, a carrier 30 having a plurality of grooves 300 and a plurality of carriers 31 are provided, and each of the carriers 31 has a first side 31a and a second side 31b opposite to each other, and the first side The area B of 31a is larger than the area C of the second side 31b, and a plurality of electronic components 22 are disposed on the first side 31a to constitute the electronic unit 39. Then, each of the electronic units 39 is placed in each of the grooves 300 corresponding to the second side 31b of the carrier 31 so that the electronic components 22 protrude from the carrier 30.
於本實施例中,該承載件30係為如晶圓、矽板之半導體基板或玻璃基板,且該承載件30之頂側或底側之面積X係為610mm×720mm,並於該單一承載體31上結合有複數該電子元件22,而該承載體31藉由其表面上之黏著層310以結合該些電子元件22。例如,該承載件30也具有黏著 層310’,以藉由該些黏著層310,310’之佈設使整體結構之上側為平坦面。 In this embodiment, the carrier 30 is a semiconductor substrate such as a wafer or a silicon plate or a glass substrate, and the area X of the top side or the bottom side of the carrier 30 is 610 mm×720 mm, and the single carrier is The body 31 is bonded with a plurality of electronic components 22, and the carrier 31 is bonded to the electronic components 22 by an adhesive layer 310 on the surface thereof. For example, the carrier 30 also has adhesive The layer 310' is disposed such that the upper side of the unitary structure is a flat surface by the arrangement of the adhesive layers 310, 310'.
再者,該凹槽300之深度h等於該承載體31之厚度t。於其它實施例中,該凹槽300之深度h可大於該承載體31之厚度t,以利於該承載體31置放於該凹槽300中。 Moreover, the depth h of the groove 300 is equal to the thickness t of the carrier 31. In other embodiments, the depth h of the groove 300 may be greater than the thickness t of the carrier 31 to facilitate placement of the carrier 31 in the groove 300.
又,該承載體31之第一側31a之面積B係為100mm×240mm,且該承載體31係為梯形狀,以利於置放於該凹槽300中,而各該凹槽300之形狀係對應該承載體31之形狀,故該承載體31與該凹槽300係可作為拼圖式結構,亦即該承載體31之製作可為從一板體結構中切割分離出該承載件30與該承載體31。 Moreover, the area B of the first side 31a of the carrier 31 is 100 mm×240 mm, and the carrier 31 has a trapezoidal shape to facilitate placement in the recess 300, and the shape of each recess 300 is Corresponding to the shape of the carrier 31, the carrier 31 and the recess 300 can be used as a puzzle structure, that is, the carrier 31 can be fabricated by cutting and separating the carrier 30 from a board structure and Carrier 31.
另外,該電子元件22係為主動元件、被動元件或其組合者,且該主動元件係例如半導體晶片,而該被動元件係例如電阻、電容及電感。例如,該電子元件22具有相對之主動面22a與非主動面22b,該電子元件22以其主動面22a(即具有電極墊220之側)結合該黏著層310。 In addition, the electronic component 22 is an active component, a passive component or a combination thereof, and the active component is, for example, a semiconductor wafer, and the passive component is, for example, a resistor, a capacitor, and an inductor. For example, the electronic component 22 has an opposite active surface 22a and an inactive surface 22b that is bonded to the active layer 22a (ie, the side having the electrode pads 220).
如第3D圖所示,形成封裝材23於該承載件20上,以包覆該些電子元件22,以於對應各該承載體31上形成複數封裝體25。藉此,完成整版面(panel)結構之半導體封裝件3。 As shown in FIG. 3D, a package member 23 is formed on the carrier member 20 to cover the electronic components 22 to form a plurality of packages 25 corresponding to the carrier members 31. Thereby, the semiconductor package 3 of the full-panel structure is completed.
於本實施例中,該封裝材23係以壓合(Lamination)方式或模壓(molding)方式形成於該承載件30上,且該封裝材23之材質係為封裝膠體、介電材感光絕緣材、乾膜型(Dry Film Type)環氧樹脂(Epoxy)或流體狀環氧樹脂、 或有機材質,如ABF(Ajinomoto Build-up Film)樹脂等。 In this embodiment, the package material 23 is formed on the carrier member 30 by a lamination method or a molding method, and the material of the package material 23 is a package adhesive body and a dielectric material photosensitive insulation material. , Dry Film Type epoxy (Epoxy) or fluid epoxy resin, Or organic materials, such as ABF (Ajinomoto Build-up Film) resin.
再者,可結合一支撐件27於該封裝材23上(於該電子元件22之非主動面22b上方),且該支撐件27係藉由結合層270設於該封裝材23上。 Furthermore, a support member 27 can be coupled to the package member 23 (above the inactive surface 22b of the electronic component 22), and the support member 27 is disposed on the package member 23 by the bonding layer 270.
例如,該結合層270係為黏性材質(如乾膜型環氧樹脂),且該支撐件27之材質係為無機材質或有機材質,該無機材質係例如玻璃、矽(Si)、陶瓷、碳化矽(SiC)、二氧化矽(SiO2)、砷化鎵(gallium arsenide,GaAs)、磷砷化鎵(gallium arsenide phosphide,GaAsP)、磷化銦(indium phosphide,InP)、砷化鋁鎵(gallium aluminum arsenide,GaAlAs)或磷化銦鎵(indium gallium phosphide,InGaP)等,該有機材質係例如塑膠、玻璃纖維強化樹脂(如bismaleimide-triazine,簡稱BT)、玻璃纖維強化環氧樹脂(fiberglass reinforced epoxy resin)(如FR-4)或環氧樹脂(epoxy)等。 For example, the bonding layer 270 is made of a viscous material (such as a dry film epoxy resin), and the material of the support member 27 is an inorganic material or an organic material, such as glass, bismuth (Si), ceramic, Tantalum carbide (SiC), cerium oxide (SiO 2 ), gallium arsenide (GaAs), gallium arsenide phosphide (GaAsP), indium phosphide (InP), aluminum gallium arsenide (gallium aluminum arsenide, GaAlAs) or indium gallium phosphide (InGaP), etc., the organic material is, for example, plastic, glass fiber reinforced resin (such as bismaleimide-triazine, BT for short), fiberglass reinforced epoxy resin (fiberglass) Reinforced epoxy resin (such as FR-4) or epoxy (epoxy).
又,可先以如旋塗(spin coating)方式形成該結合層270於該支撐件27上,再將該結合層270結合於該封裝材23上。 Moreover, the bonding layer 270 may be formed on the support member 27 by spin coating, and the bonding layer 270 may be bonded to the package member 23.
另外,亦可先形成該結合層270於該封裝材23上,再將該支撐件27結合於該結合層270上。 Alternatively, the bonding layer 270 may be formed on the package member 23, and the support member 27 may be bonded to the bonding layer 270.
如第3E圖所示,移除該承載件30、各該承載體31及該黏著層310,310’,以外露各該封裝體25(如該電子元件22之主動面22a)。 As shown in FIG. 3E, the carrier 30, each of the carrier 31 and the adhesive layer 310, 310' are removed, and each of the packages 25 (such as the active surface 22a of the electronic component 22) is exposed.
如第3F圖所示,進行線路重佈層(Redistribution layer, RDL)製程,即形成一線路重佈結構24於該封裝材23與該些電子元件22上,且該線路重佈結構24電性連接各該電子元件22。接著,結合如銲球之導電元件26於該線路重佈結構24之部分表面上,俾供接置其它電子裝置(如電路板)。 As shown in Figure 3F, a redistribution layer (Redistribution layer, The RDL process is to form a line redistribution structure 24 on the package 23 and the electronic components 22, and the circuit redistribution structure 24 is electrically connected to each of the electronic components 22. Next, a conductive element 26 such as a solder ball is bonded to a portion of the surface of the line redistribution structure 24 for connection to other electronic devices (such as a circuit board).
於本實施例中,該線路重佈結構24係包含相疊之至少一線路層241與至少一介電層240,該介電層240係形成於該封裝材23上,且該線路層241係電性連接該電子元件22之電極墊220。 In this embodiment, the circuit redistribution structure 24 includes at least one circuit layer 241 and at least one dielectric layer 240 stacked on each other. The dielectric layer 240 is formed on the package 23, and the circuit layer 241 is The electrode pads 220 of the electronic component 22 are electrically connected.
再者,藉由該承載體31係為梯形狀之設計,可避免於進行RDL製程時,該承載體31發生偏移的問題,故能避免後續製程對位不準的問題。 Furthermore, since the carrier 31 has a trapezoidal shape, the problem that the carrier 31 is displaced during the RDL process can be avoided, so that the problem of misalignment of subsequent processes can be avoided.
如第3G及3G’圖所示,沿如第3F圖所示之分割路徑L(即沿該些封裝體25之邊緣)進行分離製程,再完全移除該支撐件27與結合層270。 As shown in Figs. 3G and 3G', the separation process is performed along the division path L as shown in Fig. 3F (i.e., along the edges of the packages 25), and the support member 27 and the bonding layer 270 are completely removed.
於本實施例中,該分離製程係將整版面結構分割成複數封裝區塊(strip)3’,且該封裝區塊3’之尺寸係為100mm×240mm,其由複數封裝單元3a(如第3G’圖所示之切單製程之切割路徑S”之範圍)構成。具體地,單一該封裝單元3a中之電子元件22之數量可依需求而定,即藉由調整切單製程之切割路徑S”,例如,第3G’圖所示之單一該封裝單元3a中具有一個電子元件22,而於其它實施例中,單一該封裝單元3a中亦可具有四個電子元件22。 In this embodiment, the separation process divides the full-page structure into a plurality of package strips 3', and the size of the package block 3' is 100 mm×240 mm, which is composed of a plurality of package units 3a (eg, 3G' is shown in the range of the cutting path S" of the singulation process. Specifically, the number of the electronic components 22 in the single package unit 3a can be determined according to requirements, that is, by adjusting the cutting path of the singulation process. For example, the single package unit 3a shown in FIG. 3G' has one electronic component 22, and in other embodiments, the single package unit 3a may have four electronic components 22.
再者,於其它實施例中,亦可先移除該支撐件27與結 合層270,再進行該分離製程。 Furthermore, in other embodiments, the support member 27 and the knot may also be removed first. The layer 270 is combined to perform the separation process.
本發明之製法中,藉由該承載體31與凹槽300之設計,以將整版面結構分割成尺寸100mm×240mm之封裝區塊3’,而於後續製程中,可將該封裝區塊3’進行切單製程以獲得複數封裝單元3a,故藉此方法可依需求增加整版面之尺寸,而變換整版面之尺寸,以提升產量。 In the manufacturing method of the present invention, the layout of the carrier 31 and the recess 300 is used to divide the full-surface structure into a package block 3' having a size of 100 mm × 240 mm, and in the subsequent process, the package block 3 can be 'The singulation process is performed to obtain the plurality of package units 3a. Therefore, the size of the entire layout surface can be increased according to the method, and the size of the entire layout surface can be changed to increase the yield.
再者,藉由該承載體31與凹槽300之設計,可將整版面結構分割成現有切單機所需之切單尺寸(即該封裝區塊3’之尺寸),即可進行量產,無需額外開發新機台,故能降低機台開發之成本。 Furthermore, by designing the carrier 31 and the recess 300, the entire layout structure can be divided into the singulation size required for the existing singulator (ie, the size of the package block 3'), and mass production can be performed. There is no need to develop additional machines, which can reduce the cost of machine development.
又,藉由該承載體31與凹槽300之設計,能以自動化方式將整版面結構分離成所需尺寸之封裝區塊3’,再放入現有切單機中,以提升產量。 Moreover, by the design of the carrier 31 and the recess 300, the entire layout structure can be separated into the package block 3' of a desired size in an automated manner and placed in an existing singulator to increase the yield.
本發明復提供一種半導體封裝件2,係為整版面結構,其包括:具有複數凹槽200之一承載件20、形成於該些凹槽200中之封裝材23、嵌埋於各該凹槽200中之封裝材23中的複數電子元件22、以及形成於該封裝材23上之複數承載體21。 The present invention provides a semiconductor package 2, which is a full-surface structure, comprising: a carrier 20 having a plurality of recesses 200, a package 23 formed in the recesses 200, and embedded in each of the recesses The plurality of electronic components 22 in the package 23 of 200, and the plurality of carriers 21 formed on the package 23.
所述之電子元件22具有相對之主動面22a與非主動面22b,且該承載體21係覆蓋該電子元件22之主動面22a上。 The electronic component 22 has an opposite active surface 22a and an inactive surface 22b, and the carrier 21 covers the active surface 22a of the electronic component 22.
所述之各該承載體21係對應位於各該凹槽200上。 Each of the carrier bodies 21 is correspondingly located on each of the grooves 200.
本發明亦提供一種半導體封裝件3,係為整版面結構,其包括:具有複數凹槽300之一承載件30、設於各該凹槽300中之複數承載體31、設於各該承載體31上之複 數電子元件22、以及形成於該承載件30上以包覆該些電子元件22之封裝材23。 The present invention also provides a semiconductor package 3, which is a full-surface structure, comprising: a carrier 30 having a plurality of recesses 300, a plurality of carriers 31 disposed in each of the recesses 300, and a carrier 31 on the complex The electronic component 22 and the package 23 formed on the carrier 30 to cover the electronic components 22.
所述之承載體31具有相對之第一側31a與第二側31b,且該第一側31a之面積B大於該第二側31b之面積C,各該承載體31以其第二側31b對應置放於各該凹槽300中。 The carrier 31 has a first side 31a and a second side 31b, and the area B of the first side 31a is larger than the area C of the second side 31b. Each of the carriers 31 corresponds to the second side 31b. Placed in each of the grooves 300.
所述之電子元件22係具有相對之主動面22a與非主動面22b,且該電子元件22之主動面22a結合於該第一側31a上,而單一該承載體31上設有複數個該電子元件22。 The electronic component 22 has an opposite active surface 22a and an inactive surface 22b, and the active surface 22a of the electronic component 22 is coupled to the first side 31a, and a plurality of the electronic components are disposed on the single carrier 31. Element 22.
於一實施例中,復包括一支撐件27,係形成於該封裝材23上。 In an embodiment, a support member 27 is formed on the package member 23.
綜上所述,本發明之半導體封裝件及其製法,主要藉由拼圖式之承載體與凹槽之設計,以於整版面結構分離出所需尺寸之封裝區塊,以於後續製程中,可使用現有機台進行生產,故不僅能省去機台開發之成本,且藉此可依需求增加整版面之尺寸以提升產量。 In summary, the semiconductor package of the present invention and the manufacturing method thereof are mainly designed by separating the carrier and the groove of the puzzle type to separate the package block of the required size in the whole plate surface structure, in the subsequent process, It can be produced using existing machines, so it not only saves the cost of machine development, but also increases the size of the entire layout to increase production.
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the appended claims.
2‧‧‧半導體封裝件 2‧‧‧Semiconductor package
20‧‧‧承載件 20‧‧‧Carrier
200‧‧‧凹槽 200‧‧‧ grooves
21‧‧‧承載體 21‧‧‧Carrier
210‧‧‧黏著層 210‧‧‧Adhesive layer
22‧‧‧電子元件 22‧‧‧Electronic components
23‧‧‧封裝材 23‧‧‧Package
25‧‧‧封裝體 25‧‧‧Package
29‧‧‧電子單元 29‧‧‧Electronic unit
W,X‧‧‧面積 W, X‧‧‧ area
Claims (19)
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TW103138013A TWI541946B (en) | 2014-11-03 | 2014-11-03 | Semiconductor package and method of manufacture |
CN201410636266.5A CN105633028B (en) | 2014-11-03 | 2014-11-12 | Semiconductor package and fabrication method thereof |
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