TWI478160B - Data storage media containing carbon and metal layers and method for preparing optical information medium - Google Patents

Description

Data storage medium containing carbon layer and metal layer and method for preparing optical information medium Cross-references to related applications

The present invention claims US Provisional Patent Application No. 61/191,839, filed on Sep. 12, 2008, and U.S. Provisional Patent Application No. 61/197,089, filed on Oct. 23, 2008; The priority of the provisional patent application No. 61/204, 010, and the priority of the U.S. Provisional Patent Application No. 61/205,739, filed on Dec. 31, 2008, the entire disclosure of which is hereby incorporated by reference.

Field of invention

The present invention relates to long term digital data storage media and, more particularly, to materials and methods of producing very stable digital data storage media. In particular, a disc containing a metal layer and a carbon layer is disclosed.

Description of related technology

Optical information storage media typically includes several components, such as a data layer, a dielectric layer, and a support substrate, each of which provides a certain function for the product.

The 碲 material has been used in the information storage media for some time, but it has not been used as a commodity for a variety of reasons. It is known that hydrazine is easily oxidized, and various methods have been tried to reduce or eliminate this problem. Another problem often observed in media is the formation of "berm", which is formed when the optical storage medium is written using a laser and is written around a "pit" (pit). )" raised area. The material that initially occupies the space is expelled and produces a raised lip "bulge" that produces an artifact in the HF signal that reduces the effective peak-to-peak value when reading the media.

The following are representative examples of scientific and patent literature describing the use of germanium materials, and various methods for attempting to reduce the problems associated with the use of germanium in optical storage media.

There has been a report of the incorporation of an alloy layer into different spherical particles after laser writing (Holstein, WL and Begnoche, BC J. Appl. Phys . 60(8): 2928-2943 (1968)). A disc having an aluminum disc substrate was prepared to comprise an absorber layer made of a Te ₈₀ Se ₁₉ As ₁ alloy having a thickness of less than 15 nm, the absorber layer being covered by a 250 nm thick sputtered dielectric organic coating. It has been found that increasing the laser power used to write a mark to the disc increases the size of the marks. In addition, it has also been found that the formation of particles increases as the laser power increases. The authors distinguish these results from previously discovered phase change or erosion mechanisms for the formation of tokens.

The shape of the pores formed in the film on a polymethyl methacrylate substrate has been studied using various metal film systems (J. Appl. Phys. 50:6881 (1979). These systems used are As-Te, Ge-Te, As-Se, Ge-Se, and Sb-S. It has been found that the high viscosity of the film helps to obtain clean formed pores.

Electrolytic corrosion is discussed because it has most serious drawbacks to the enamel film when it is used to store media (Kivits, P., et al., Vac . Sci. Technol . 18(1): 68-69 (1981)). Selenium and/or bismuth are added to amorphize the ruthenium film. The weathering test showed that the Te-Se-Sb film was stable for more than 200 days. Subsequent publications discuss the prevention of oxidation by adding In, Pb, Sn, Bi, or Sb to the metal-Te-Se film (Terao, M., et al. J. Appl. Phys . 62(3): 1029-1034 (1987) )).

U.S. Patent No. 4,322,839 (issued March 30, 1982) provides a continuous wave type semiconductor laser beam and its use for recording information on a compact disc. The disc may contain niobium oxide. It has been reported that PbO and V ₂ O ₅ are added at various concentrations to change the light absorption rate.

An optical recording medium having a stack of carbon and carbon layers is disclosed in European Patent Application No. 82301410.5 (WO 0 062 975 A1; issued Oct. 20, 1982). The carbon system is present at a predetermined content of 5 to 50 atomic percent, and the ruthenium-carbon layer exists due to good sensitivity and long service life.

U.S. Patent No. 4,357,366 (issued on Nov. 2, 1982) and No. 4,385,376 (issued on May 24, 1983), it is proposed to add a thin film to a substrate and oxidize the crucible to form a double oxide layer. These oxide layers each contain different cerium oxides and are irradiated with ultraviolet light to produce oxidation.

U.S. Patent No. 4,410,968 (issued October 18, 1983) provides a deformable metal tantalum film deposited on a disc substrate and a modulated beam for recording information. The light liquefies the ruthenium material but does not evaporate, causing the material to redistribute to change the reflectivity of a read beam.

U.S. Pat. An absorbing layer in the disc may be composed of a plurality of metals and alloys including niobium and tantalum alloys, which facilitate the preparation of substrates lacking macro and micro defects.

U.S. Pat. It is suggested that carbon is present in the ruthenium layer to reduce oxidation of the ruthenium due to oxygen or moisture.

An optical information disc comprising a substrate and a tantalum, selenium and tellurium alloy is provided in U.S. Patent No. 4,476,214 (issued October 9, 1984). The recording layer material satisfies the molecular formula Te _x Se _y Sb _z S _q , where x=55-85 atom%, y=13-30 atom%, z=1-12 atom%, q=0-10 atom%, and x +y+z+q=100. Suitable recording layers are Te ₆₀ Se ₂₅ Sb ₁₀ S ₅ and Te ₇₅ Se ₁₅ Sb ₅ S ₅ alloys, and these alloys were found to impart better ablation properties to the recording layer.

An optical disc having a resin disc substrate, a recording medium layer, a transparent layer formed on the recording medium layer, and a transparent protective resin layer is disclosed in U.S. Patent No. 4,583,102 (issued Apr. 15, 1986). . The recording medium layer may comprise a cerium oxide or an organic pigment, and the transparent layer may be an adhesive layer or an air layer. The reported configuration of the layers can produce a lesser error than a conventional optical disc.

European Patent Application No. 85309330.0 (WO 0 186 467 A2; published July 2, 1986), which is incorporated herein by reference in its entirety, the disclosure of the disclosure of the disclosure of the disclosure of the disclosure of the present disclosure of The next layer is sputtered to form.

U.S. Patent No. 4,652,215 (issued November 25, 1986) to provide a three-layer structure having a dish-shaped substrate; a planarization layer; a reflective layer; a fluorocarbon phase layer, an active layer, and a fluorocarbon matrix layer. An information storage device with a thin transparent conductive cover. The active layer is coated between the phase layer and the substrate layer, and the active layer comprises a plurality of beads of a bismuth, selenium and arsenic alloy. A laser beam is applied to agglomerate the active layer and change the optical transmittance of the three layer structure. The phase layer protects the active layer from the heat dissipation effect of the reflective layer such that the laser energy can escape in the active layer.

A substrate and an electromagnetic energy absorbing layer are disclosed in U.S. Patent No. 4,647,947 (issued March 3, 1987). The layer may comprise a low melting point metal such as ruthenium, osmium, tin, antimony, zinc or lead, and the layer may also comprise an element which is gaseous at a temperature below a predetermined temperature. Energy is applied to cause the recording layer to bulge to form a projection.

U.S. Pat. The majority of the layers are converted to a single layer by irradiation with a laser beam.

European Patent Application No. 89105303.5 (WO 0 334 275 A2; issued Oct. 4, 1989) discloses the use of a recording film containing bismuth, carbon and hydrogen. The carbon hydrogenation content is defined by its atomic percentage to be equal to or greater than 25 atomic percent and less than or equal to 38 atomic percent. These ranges are selected to provide good recording sensitivity, oxidation resistance, and regenerative laser power margin.

A disc having a substrate, a bottom layer and a low melting ruthenium recording layer is provided in U.S. Patent No. 4,908,250 (issued March 13, 1990) and No. 5,073,243 (issued on Dec. 17, 1991). The underlayer mitigates thermal shock transmitted from the recording layer to the disc substrate, and the underlayer comprises a highly polymerizable material having a heat resistance superior to that of the substrate. A fluorocarbon resin or a polyimine is provided as an example of a polymeric material.

An information storage medium having an amorphous structured recording layer comprising carbon and a metal element, a semi-metal element or a semiconductor element is provided in U.S. Patent No. 4,929,485 (issued May 29, 1990). Examples of such elements include Te, Se, Bi, Pb, Sb, Ag, Ga, As, and Ge. The application of energy to the recording layer changes the structure from an amorphous form to a crystalline form, which is used to characterize the oxidizing properties of germanium or other previously used metals.

U.S. Patent No. 4,990,387 (issued February 5, 1991) teaches the use of a carbon and fluorine underlayer as a diffusion barrier to prevent water and oxygen from penetrating into a recording layer. The recording layer comprises carbon and a metal and a semiconductor element such as Te, Se, Ge, Sb, Pb, Sn, Ag, In, and Bi, and the recording layer has good writing sensitivity and oxidation resistance.

An information storage medium consisting of a polycarbonate substrate and a recording layer comprising an AgTe eutectic alloy, carbon and hydrogen is proposed in U.S. Patent No. 5,013,635 (issued May 7, 1991). These structures are used to characterize the oxidizing properties of germanium or other previously used metals.

No. 5,061,563 proposes to prepare a recording film comprising ruthenium, carbon and hydrogen, the recording film having a structure in which a plurality of ruthenium clusters are dispersed in a CH matrix in which carbon and hydrogen are bonded to each other by chemical bonds. . This system was suggested as a possible solution to the problem caused by oxidation of the ruthenium film, and the resulting recording film was found to be absorbable in the far infrared range (25 to 100 μm).

U.S. Patent No. 5,102,708 (issued Apr. 7, 1992) to provide a data recording medium comprising a substrate, a bottom cover layer formed by plasma polymerization of C ₄ F ₈ fluorocarbon gas, and a record In the layer, the recording layer comprises Te, C, H and a metal composed of Ag, Au and Cu in various content ratios.

U.S. Patent No. 5,510,164 (issued Apr. 23, 1996) discloses a disc which contains a layer of active material. Irradiation with a laser causes the tantalum alloy to flow and form a plurality of pores, the disc comprising a "soft" deformable layer directly on the tantalum layer. Oxide elastomers, fluorinated hydrocarbons, polyacrylates, ethylene propylene, and polyurethanes are listed as examples of materials for the deformable layer. The deformable layer is flexible so that the crucible can flow without excessive laser power.

A recording film composed of an amorphous alloy containing Ge, Sb, and Te is disclosed in U.S. Patent No. 5,580,632 (issued on Dec. 3, 1996) and No. 5,652,037 (issued on July 29, 1997). Irradiation of the film causes the alloy to become crystalline GeTe and crystalline SeTe, which changes are optically detectable.

A disc is provided in U.S.

While there have been many reported developments in the use of germanium and other metals in optical information media, new materials and methods are still needed to make metals that are commercially attractive for use in optical information media. It is particularly attractive to reduce or eliminate the problems associated with oxidation and the formation of girders.

The dielectric layer is typically included in an optical data disc to protect the data layer material from corrosion by diffusion of oxygen or water. The dielectric layer is typically composed of, for example, cerium oxide, zinc sulfide-cerium oxide, zirconium oxide, Or inorganic materials such as bismuth-nickel oxynitride. Dielectric layers comprising hafnium oxide are currently widely used in commercial products.

The dielectric layer also acts as an electrical insulator that effectively separates the different layers of the disc.

The materials used in the dielectric layer are often such that, due to their optical transparency, the layers do not optically interfere with writing or reading data from the disc. The optical properties of the dielectric material will vary with the wavelength of light used. For example, germanium is transparent at wavelengths of light greater than 400 nm, but is absorptive at wavelengths of light less than 400 nm.

Conventional dielectric materials have also been used to thermally protect substrates and write layers. The dielectric material is less prone to pinhole defects and does not deteriorate much in its glass state. The choice of a particular dielectric material involves many criteria, such as cost, adhesion to adjacent materials at its interface, miscibility and miscibility of materials, melting point, and heat capacity.

Carbon has not been widely used in commercial optical media. The following is a discussion of several references using a variety of materials including carbon as the "interfacial layer."

A phase change rewritable optical disk having a substrate, a first protective layer, a recording layer, a second protective layer, and a reflective layer is provided in US Patent Publication No. 2004/0166440 A1 (published on Aug. 26, 2004). The recording layer comprises a composite composition of Sb, Te, Ge and In having a predetermined atomic ratio, which allows the addition of a nitride, oxide or carbide "interfacial layer" on one or both sides of the recording layer. The discs may also comprise a "diffusion protective layer" made of a similar material which lacks the sulfur component and protects the recording layer from sulfur penetration.

US Patent Publication No. 2005/0074694 A1 (published Apr. 7, 2005) proposes an information recording medium comprising a phase change recording layer, a Cr and O layer, and a Ga and O layer, the phase change recording layer The phase can vary between a crystalline phase and an amorphous phase. Working Example 11 discloses the addition of a C-containing layer between the recording layer and the Ga-containing layer, and/or as an "interfacial layer" between the Cr-containing layer and the recording layer. The interface layer has a function of preventing a substance from entering between the dielectric layer and the recording layer, the interface layer having low light absorption, having a melting point so high that it does not melt upon recording, and having the recording layer Good adhesion.

A phase change optical information medium having a particular recording layer and other composite layers is provided in U.S. Patent No. 6,790,592 B2, issued on September 14,2004. This patent provides for the upper and lower protective layers from a variety of materials including metal oxides, nitrides, sulfides, carbides, diamond-like carbons, and mixtures thereof. The patent "requires" that the protective layers have a higher melting point than the recording layer, and the patent also "requires" that the protective layers have a high thermal conductivity, a low coefficient of thermal expansion, and good adhesion.

A phase change optical information recording medium having a transparent substrate, a reversible recording layer, a Ta-based dielectric layer, and a silver reflective layer is provided in U.S. Patent No. 7,169,533 B2, issued Jan. 30, 2007. a "nitride, oxide, carbide or oxynitride containing carbon, or a single element alpha (Sn, In, Zr, Si, Cr, Al, V, Nb, Mo, W, Ti, Mg or Ge)" The interface layer can be used to prevent peeling. The interfacial layer also prevents diffusion of atoms between the recording layer and the dielectric layer, the interfacial layer preferably having a thickness of at least 1 nm and at most 10 nm, and more preferably at least 1 nm and at most 5 nm.

In most commodities, the data is recorded by changing the molecular state of an organic dye or a phase of a metal or alloy, and other materials in the commodity are selected to be compatible with these data storage mechanisms. However, in order to achieve permanent data storage, other more permanent and irreversible institutions are necessary. Although there have been many reports of the development of the use of inorganic materials as dielectric layers in optical information media, new materials and methods are still needed.

Summary of invention

The present invention discloses an optical information medium comprising a plurality of combinations of a metal material layer and a carbon material layer. A layer of carbon material is used to protect a nearby data layer from various factors such as oxidation, thermal deformation, and stress induced damage. The use of a layer of carbon material can also reduce or eliminate the formation of girders in the layer of metallic material after writing at a laser or other source of energy. The carbon material layer can also be used as a dielectric layer in a variety of optical information media. The combination of a carbon material layer and a metal material layer has been found to be surprisingly attractive for the development of archive quality optical information media.

Simple illustration

The following drawings are a part of this specification and are included to provide a further understanding of the invention.

Figure 1a shows an optical information medium having a support substrate and a data layer.

Figure 1b shows an optical information medium supporting a substrate, a data layer and a capture layer.

Figure 1c shows an optical information medium supporting a substrate, a data layer and a reflective layer.

Figure 1d shows an optical information medium of a support substrate, a data layer and a reflective capture layer.

Figure 1e shows an optical information medium of a support substrate, a diffusion barrier, a data layer and a reflective capture layer.

Figure 1f shows a support substrate, a diffusion barrier, a data layer, a reflective capture layer, and an optical information medium that protects the barrier barrier.

Figure 1g shows an environmental protection layer, a scratch-resistant layer, an ultraviolet blocking layer, a supporting substrate, a diffusion barrier, a data layer, a reflective capturing layer, and an optical information medium for protecting the sealing barrier.

Figure 2a shows an optical information medium having a support substrate, a data layer and a layer of carbon material.

Figure 2b shows an optical information medium having a support substrate, a layer of carbon material, and a data layer.

Figure 2c shows an optical information medium having a support substrate, at least one intermediate layer, a data layer, and a layer of carbon material.

Figure 2d shows an optical information medium having a support substrate, at least one intermediate layer, a layer of carbon material, and a data layer.

Figure 3a shows an optical information medium having a support substrate, a first carbon material layer, a data layer and a second carbon material layer.

Figure 3b shows an optical information medium having a support substrate, at least one intermediate layer, a first carbon material layer, a data layer and a second carbon material layer.

Figure 3c shows an optical information medium having a first support substrate, a data layer, a carbon material layer and a second support substrate.

Figure 3d shows an optical information medium having a first support substrate, a first carbon material layer, a data layer, a second carbon material layer and a second support substrate.

FIG. 3e shows an optical information having a first supporting substrate, a first intermediate layer, a first carbon material layer, a data layer, a second carbon material layer, a second intermediate layer, and a second supporting substrate. media.

Figure 4a shows an optical information medium having a support substrate, a layer of metallic material and a layer of carbon material.

Figure 4b shows a variation of the optical information medium shown in Figure 4a, wherein the location of the layer of metallic material and the layer of carbon material is reversed relative to the support substrate. The optical information medium has a support substrate, a carbon material layer and a metal material layer.

Figure 4c shows an optical information medium having a support substrate, one or more intermediate layers, a layer of metallic material and a layer of carbon material.

Figure 4d shows an optical information medium having a first support substrate, a first carbon material layer, a metal material layer, a second carbon material layer and a second support substrate.

Figure 5a shows an optical information medium having a substrate layer that is in contact with a layer of germanium/dioxa/carbon monoxide data.

Figure 5b shows an optical information medium having a substrate layer, at least one intermediate layer, and a germanium/dioxa/carbon monoxide data layer.

Figure 5c shows an optical information medium having a first substrate layer, a germanium/dioxa/carbon monoxide data layer, and a second substrate layer.

Figure 6 shows that as the concentration of carbon dioxide in the oxidizing gas increases, the optical density of the prepared carbon film decreases (or the optical transparency increases). The x-axis is the wavelength calculated in nm and the y-axis is the absorbance per thickness (1/nm). The line indicated by a square symbol represents 1% (v/v) carbon dioxide, the line represented by a diamond symbol represents 2% (v/v) carbon dioxide, and the line represented by a circular symbol represents 4% (v/v) carbon dioxide. .

Figure 7 shows a graph of the optical density of the tantalum film as a function of time compared to the tantalum and carbon dioxide film. The x-axis is the time in days, and the y-axis is the optical density (or absorbance) measured in proportion (OD/-OD _init ) / OD _init . The figure shows the addition of carbon dioxide to reduce the change due to oxidation. The square symbol represents the carbon dioxide without added carbon; the "x" symbol represents the addition of 1% carbon dioxide; the "diamond" symbol represents the addition of 2% carbon dioxide; the "filled circle" symbol represents the addition of 2.3% carbon dioxide; the "+" symbol represents the addition of 2.5% Carbon dioxide; the "one long stroke" symbol represents the addition of 2.7% carbon dioxide; the "*" symbol represents the addition of 3% carbon dioxide; the "triangle" symbol represents the addition of 4% carbon dioxide; and the "empty circle" symbol represents the addition of 10% carbon dioxide.

Fig. 8 is a graph showing the reflectance of the ruthenium film as a function of time compared to the ruthenium and carbon dioxide film. The x-axis is the time in days and the y-axis is the percent reflectivity. The square symbol represents the carbon dioxide without added carbon; the "x" symbol represents the addition of 1% carbon dioxide; the "diamond" symbol represents the addition of 2% carbon dioxide; the "filled circle" symbol represents the addition of 2.3% carbon dioxide; the "+" symbol represents the addition of 2.5% Carbon dioxide; the "one long stroke" symbol represents the addition of 2.7% carbon dioxide; the "*" symbol represents the addition of 3% carbon dioxide; the "triangle" symbol represents the addition of 4% carbon dioxide; and the "empty circle" symbol represents the addition of 10% carbon dioxide.

Detailed description of the invention

Although the compositions and methods are "comprising" the various components or steps (which are meant to mean "including, but not limited to"), such compositions and methods may also "consist primarily of various components or steps" or " Consisting of various components or steps, this term should be interpreted to primarily define a closed component group.

Preferably, the optical information medium described herein is not magnetic, and the data written to the optical information medium described herein is preferably not a reversible or phase change mark, but a permanent, non-erasable physical change mark. .

The optical information medium described herein is preferably applied as an archive medium, and the information stored on the archived medium is preferably about one month later, about one year later, about two years later, and about three years later. After about 4 years, after about 5 years, after about 6 years, after about 7 years, after about 8 years, after about 9 years, after about 10 years, after about 20 years, at about 30 years later, after about 40 years, after about 50 years, after about 60 years, after about 70 years, after about 80 years, after about 90 years, after about 100 years, after about 200 years It is still readable after about 300 years, after about 400 years, after about 500 years, and ideally indefinitely.

The optical information media described below can be generally any shape and size. The shape of the media is generally flat and round, and is currently expected to be about 8 cm in diameter, about 12 cm in diameter (e.g., a conventional CD or DVD), about 13 cm in diameter, about 20 cm in diameter, and about 10 inches in diameter (about 25.4 cm). ), approximately 26 cm in diameter, and approximately 12 inches in diameter (approximately 30.48 cm).

The cross-sectional view of the optical information medium can be symmetrical or asymmetrical, and the cross section is mostly asymmetrical.

The optical information medium described below generally includes at least one support substrate, which may be substantially any material suitable for optical information storage. Polymer or ceramic materials having desirable optical and mechanical properties are widely used, and the support substrate usually comprises polycarbonate, polystyrene, alumina, polydimethyl siloxane, polymethyl methacrylate, ruthenium oxide. , glass, aluminum, stainless steel, or a mixture thereof. If substrate transparency is not necessary, a metal substrate can be used, and other optically transparent plastics or polymers can also be used. The support substrate may be selected from materials having sufficient hardness or rigidity, and the hardness or rigidity is usually measured in terms of Young's modulus per unit area pressure, and is preferably from about 0.5 GPa to about 70 GPa. Specific examples of the stiffness value are about 0.5 GPa, about 1 GPa, about 5 GPa, about 10 GPa, about 20 GPa, about 30 GPa, about 40 GPa, about 50 GPa, about 60 GPa, about 70 GPa, and a range between any two of these values. . The support substrate may be selected from materials having a refractive index of from about 1.45 to about 1.70, and specific examples of refractive indices include about 1.45, about 1.5, about 1.55, about 1.6, about 1.65, about 1.7, and any two of these values. The range between values.

Preferably, the substrate comprises a material that is not affected by aging and deterioration, and currently preferred materials are polycarbonate, glass, and yttria (melted vermiculite). The thickness of the substrate can be selected as a function of the driving ability: a substrate of 1.2 mm thickness is suitable for a CD drive, a substrate of 0.6 mm thickness is suitable for a DVD drive, and a substrate of 0.1 mm thickness is suitable for a BD drive. This thickness has historically been chosen to maintain the rotational mass within reasonable limits while maintaining the necessary flatness and stiffness of the substrate to maintain the data layer in focus during reading and writing.

Material - carbon layer

One embodiment of the invention includes an optical information medium suitable for archiving. These materials and manufacturing procedures are designed to be very durable and not subject to aging deterioration to a substantial extent. Similarly, the information writing process is permanent and is not affected by aging deterioration to a substantial extent. The medium includes at least one support substrate 10 and at least one data layer 15 infused with a gas, which is shown in Figure 1a.

The data layer may comprise carbon, amorphous carbon, diamond-like carbon, tantalum carbide, boron carbide, boron nitride, tantalum, amorphous tantalum, niobium, amorphous tantalum, or combinations thereof. At present, it is best that the data layer contains amorphous carbon, which is a stable substance that requires a considerable amount of activation energy to change its optical properties, which makes amorphous carbon unaffected by typical thermal and chemical dynamic aging processes. . Amorphous carbon also has excellent chemical resistance and a high graphite type (SP ² ) carbon.

The data layer also includes at least one gas that is injected into the structure. The term "injected" means that at least one gas is covalently bonded, captured or absorbed into or onto the amorphous carbon or other material. When processed at an appropriate energy source, the treated data layer decomposes and releases a gas which is expanded by the released gas and creates a prominence or ablation location whereby a between the treated and untreated locations is created Optical contrast can be detected. The data layer may be injected with a gas or may be injected with two or more different gases. If the data layer is injected with two or more gases, they all lack oxygen atoms, both contain oxygen atoms, or may be a mixture of a gas lacking an oxygen atom and one or more gases containing oxygen atoms.

Examples of a gas lacking an oxygen atom include molecular hydrogen (H ₂ ), molecular nitrogen (N ₂ ), helium (He), argon (Ar), neon (Ne), krypton (Kr), xenon (Xe), and chlorine ( Cl ₂ ), and fluorine (F ₂ ).

In a presently preferred embodiment, the gas is an oxidizing gas. The term "oxidized gas" means a gas whose molecular formula includes at least one oxygen atom, and examples of such gases include carbon monoxide (CO), carbon dioxide (CO ₂ ), molecular oxygen (O ₂ ), ozone (O ₃ ), and nitrogen oxides. (NO _x ), sulfur oxides (SO _x ), and mixtures thereof. It is generally believed that when the data layer is heated to a very high temperature, oxygen increases the volatility of the data layer. It is also believed that oxygen can stabilize the write layer under typical conditions, particularly for residual stress in the carbon film. It is generally believed that this stability results in oxygen oxidizing carbon to form a very non-reactive compound when bonded to carbon. The data layer may be implanted with an oxidizing gas or may be injected with two or more different oxidizing gases.

The transparency (or opacity) of the data layer can be varied by adjusting the concentration of the gas used in preparing the data layer. The inventors have discovered that the higher the concentration of the gas, the greater the transparency of the data layer. The gas can be detected and measured using methods such as XPS. The resulting coating has a higher concentration of gas, oxygen or oxidizing gas than would be obtained if otherwise prepared in the same manner but lacking the added gas during preparation.

It has been found that this gas helps to erode the data layer. The following is a description of the institutions currently believed to promote erosion. The true mechanism is not to be construed as limiting the embodiments of the invention. During writing, extreme heat is generated by the writing laser to cause a generally strong and stable covalent bond break between the gas and the carbon atoms. The gas heating and separation process produces an explosion from which the gas and the amorphous carbon are discharged. The gas explosion has the effect of ablation of the write layer by the optical disk or permanent alteration of the written portion of the data layer, depending on the system design, which is significantly more opaque to a read laser than to a region that is not written to the data layer or A more transparent combination of effects. The data layer is very non-reactive with both the unwritten portion and the unwritten portion (not affected by typical thermal and chemical dynamic aging processes) and is optically different. In addition, the conversion from gas injection to a less gaseous state requires a large amount of activation energy to prevent changes through natural chemical dynamic aging.

The data layer can be substantially any thickness and the thickness of the data layer provides light absorption. A lower thickness limit may be about 10 nm or about 20 nm, and an upper thickness limit may be determined by varying the energy required for the data layer and will vary depending on the material selected. An example of an upper limit is about 100 nm, and examples of thickness are about 10 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm, about 90 nm, about 100 nm, and at any of these values. Scope between people. A thickness value can theoretically be calculated as λ/n, where λ is the read wavelength and n is the refractive index of the laser.

The support substrate can be in direct contact with the gas-injected data layer without any intermediate single or majority layers. Alternatively, one or more additional layers may be placed between the support substrate and the data layer.

The refractive index, thickness, and opacity of the substrate and data layer can be optimized in an unwritten state to optically reflect a read laser. Light entering the bottom of the disc in the form of a read laser produces a first reflected beam from the data layer/data layer interface and a second reflected beam from the data layer/air interface. Adjusting the thickness of the data layer such that the in-phase of the two reflected beams will maximize reflection by constructive interference, and increasing the reflection in the unwritten state of the disc can provide greater between being written and unwritten. The optical contrast increases the signal-to-noise ratio during the reading process.

The written portion of the data layer can be ablated or removed from the disc by a high power write laser intensity, and the high power write laser intensity is modulated to be recorded on the disc. The flow of data. An apparently less intense reading laser passes through the ablated portion of the data layer or is absorbed in a less opaque portion of the gas and exhibits a maximum reflection at the unwritten portion of the data layer. Optically contrasting, a photodiode detects optical contrast between the written or non-reflective and unwritten or reflected portions of the disc.

Additional layers can be added to make the disc more suitable for writing, more durable for archiving, or more compatible with existing disc capacity and format. The optical information medium can further include an ablation capture layer 20, and an ablation capture layer can cover the data layer to capture material that is ablated during the writing process and to protect the data layer. Suitable materials for the ablation capture layer include an aerosol, or a metal layer. Other suitable materials include aluminum, chromium, titanium, silver, gold, platinum, rhodium, ruthenium, iridium, palladium, iridium, tin, indium, other metals, ceramics, SiO ₂ , Al ₂ O ₃ , alloys thereof, and mixtures thereof. When an ablation capture layer is present, the writing process permanently separates the gas initially implanted into the data layer, creating a void in the layer and a bubble or bump in the ablation capture layer. As previously stated, the injected gas is not easily removed unless the high power energy writing process is passed, and the unwritten portion of the data layer does not change over time. The ablation capture layer has another advantage of sealing the data layer to prevent possible write optical contamination from the ablated material during the writing process, and convex in the ablation capture layer when the protrusion absorbs the read laser The optical contrast is produced as a pair of unwritten or unallocated portions of the write layer, producing the same effect as when the read laser passes completely through the disc. If the gas removed by the data layer and captured under the ablation capture layer finally leaves the bump, the optical properties of the bump will remain unchanged. Therefore, since the optical properties of the written and unwritten portions are permanent, the disc is not affected by aging deterioration.

The optical information medium may further comprise a reflective layer 25 as shown in Figure 1e. The reflective layer may or may not be used with an ablation capture layer, or the reflective layer may have the function of both a reflective layer and an ablation capture layer (which is formed as a reflective capture layer 30; Figure 1d). At this point, it provides two different ways of writing. A first write mode provides a half transparent write layer, as previously described, the write layer transparency is adjusted as the gas concentration increases. A reflective ablation capture layer acts as a mirror that reflects the read laser at the unwritten regions of the data layer. When the write layer is etched through the writing process, a bump is generated in the reflective ablation capture layer, and an effective ridge is generated to prevent the read laser from being directly reflected back to a photodiode detector. . Thus, for this read laser, the unwritten area is more reflective and the written area is more absorptive, providing the necessary contrast during the reading process. A second writing mode provides a minimum reflective data layer by adjusting the thickness such that the reflected light from the first and second surfaces are 180 degrees out of phase for destructive interference. The data layer can also be made more opaque by reducing the gas concentration. In addition, the opacity and thickness of the data layer can be adjusted to maximize read laser absorbance and destructive optical phase cancellation. The writing process exposes the reflective layer by the ablated portion of the write layer, the unwritten area is opaque or more absorbing, and the written area is reflective, and the write process is provided The necessary comparison.

The reflective layer material is selected for its extreme durability and reflectivity and may comprise materials such as ruthenium, silver, titanium, chromium, platinum, rhodium, gold, aluminum, or alloys thereof.

The optical information medium may further comprise a diffusion barrier layer 35; Figure 1e. The diffusion barrier layer may be added between the substrate and the data layer to add another pair of protective layers of the data layer when the substrate is made of a polycarbonate material, and oxygen and moisture in the absence of a diffusion barrier layer It will easily diffuse through the conventional polycarbonate substrate and adversely react with the data layer. The diffusion barrier material is selected for its durability and impermeability to gases and moisture, and may include materials such as cerium oxide, aluminum oxide, ceramics, glass, metal oxides, transparent materials, or other transparent metal oxides. When the substrate contains these same materials, no other diffusion barrier is needed.

The optical information medium may further comprise a protective sealing barrier layer 40; Figure 1f. Most additional layers can be added above and below the aforementioned layers to achieve additional protection and increase digital data lifetime. A protective sealing barrier layer may comprise a material such as chromium, titanium, yttria, alumina, ceramic, glass, metal oxide, transparent material, or a spin-on polymer. If the reflective layer comprises a reactive material, a protective seal barrier layer is more desirable. The protective sealing barrier layer may also be the reflective layer depending on the material selected.

The optical information medium may further comprise an ultraviolet radiation blocking layer 45; Figure 1g. The ultraviolet radiation blocking layer can be added below the substrate to prevent clouding of the substrate or other metamorphism of the data layer. An ultraviolet radiation blocking layer comprises a polycarbonate or glass film comprising at least one ultraviolet radiation blocking agent such as zinc oxide, titanium oxide, tantalum carbide, glass, or various transparent materials.

The optical information medium may further comprise a scratch-resistant layer 50; a 1g image. One of the most common failure modes of optical discs is scratches, which cause a reduction in optical readback signals through scattering and absorption. Although these scratches are far from the focal plane of the optical readback system, they are very optically wide (hundreds or even thousands of tracks) and therefore cause widespread readback problems. Thus, a scratch resistant layer can be applied beneath the substrate, the scratch resistant material comprising yttria, alumina, tantalum carbide, or a transparent material.

The substrate, UV blocking layer, and scratch resistant layer can be combined into a single material that exhibits all of the advantageous properties of the individual layers. In other words, the substrate can comprise at least one ultraviolet radiation blocker, at least one scratch resistant material, or both.

The optical information medium may further comprise an environmental protection layer 55; Figure 1g. The environmental protection layer can be added to prevent dirt, water, or other contaminants from entering the disc structure. Typical environmental protection layers include hydrophobic materials and fluorinated hydrophobic materials.

The optical information medium can include many different layers arranged in a variety of different configurations, and the following are a few examples of simple or more complex arrangements in the optical information media product. These examples are not meant to be merely illustrative, but rather there are many variations of layers and the order in which the layers are applied. It is presently preferred that the gas is an oxidizing gas and the data layer comprises carbon.

In a simplest example, the medium can include at least one support substrate and at least one data layer infused with a gas such that the support substrate and the data layer are in surface contact with each other. In a presently preferred embodiment, the data layer contacts one side of the support substrate. In a presently preferred embodiment, the support substrate is a polycarbonate. In another presently preferred embodiment, the support substrate is fused vermiculite or glass. In a presently preferred embodiment, the data layer comprises carbon. It is presently preferred that the gas be an oxidizing gas.

In one embodiment, the medium may include at least one support substrate; at least one data layer implanted with a gas such that the support substrate and the data layer are in surface contact with each other; and at least one ablation capture layer, such that the data layer The ablation capture layers are in surface contact with each other.

In another embodiment, the medium may include at least one support substrate; at least one data layer implanted with a gas such that the support substrate and the data layer are in surface contact with each other; and at least one reflective capture layer such that the data layer The reflective capture layers are in surface contact with each other. This is shown in Figure 1c.

In another embodiment, the medium may include at least one supporting substrate; at least one diffusion barrier layer such that the supporting substrate and the diffusion barrier layer are in surface contact with each other; at least one material layer injected with a gas, such that the diffusion barrier layer And contacting the data layer with each other; and at least one reflective capture layer such that the data layer and the reflective capture layer are in surface contact with each other. This is shown in Figure 1e.

In another embodiment, the medium may include at least one supporting substrate; at least one diffusion barrier layer such that the supporting substrate and the diffusion barrier layer are in surface contact with each other; at least one material layer injected with a gas, such that the diffusion barrier layer Contacting the data layer in contact with each other; at least one reflective capture layer such that the data layer and the reflective capture layer are in surface contact with each other; and at least one protective sealing barrier layer such that the reflective capture layer and the protective seal barrier layer are in surface contact with each other. This is shown in Figure 1f.

In another embodiment, the medium may include at least one support substrate having a first surface and a second surface; at least one diffusion barrier layer such that the support substrate and the diffusion barrier layer are in surface contact with each other; at least one is injected a gas data layer, such that the diffusion barrier layer and the data layer are in surface contact with each other; at least one reflective capture layer, such that the data layer and the reflective capture layer are in surface contact with each other; at least one protective sealing barrier layer, such that the reflective capture layer Contacting the protective sealing barrier layer in contact with each other; at least one ultraviolet radiation blocking layer, such that the supporting substrate and the ultraviolet radiation blocking layer are in surface contact with each other; at least one scratch-resistant layer, such that the scratch-resistant layer and the ultraviolet radiation blocking layer face each other Contacting; and at least one environmental protection layer such that the environmental protection layer and the ultraviolet radiation blocking layer are in surface contact with each other. This is shown in the 1g chart.

In a very specific embodiment, an optical information medium can comprise a polycarbonate, a fused vermiculite, or a glass support substrate; and an amorphous carbon data layer that is infused with carbon dioxide.

Preparation method - carbon layer

Another embodiment of the invention is directed to a method of making an optical information medium. Generally, the method can include providing a support substrate and applying one or more additional layers to prepare the optical information medium.

The various layers can be applied in various orders depending on the particular configuration desired in the optical information media product, and the layers can all be applied to one side of the support substrate to produce a final product having the support substrate on the outside. Alternatively, the layers may be applied on both sides of the support substrate to produce a final product having the support substrate, and the support substrate is disposed such that it is not outside of one of the final products.

In a simplest embodiment, the method can include providing a support substrate and applying at least one data layer implanted with a gas on at least one side of the support substrate such that the support substrate and the data layer are in surface contact with each other. In a presently preferred embodiment, the data layer is applied to one side of the support substrate, and the support substrate can be any of the aforementioned support substrates. In a presently preferred embodiment, the support substrate is polycarbonate. In another presently preferred embodiment, the support substrate is fused vermiculite or glass.

The method can further include exposing the support substrate to a vacuum prior to the applying step.

Sputtering can be used to apply the data layer to the other layers during the application step. Sputtering the data layer may include providing a precursor material and at least one gas; applying energy to the precursor material to evaporate the precursor material; and depositing the evaporated precursor material and the gas on the support substrate such that the Gas is injected into the data layer. In a presently preferred embodiment, the precursor material is carbon and the gas can be any of the foregoing gases. In a presently preferred embodiment, the gas can be any of the foregoing oxidizing gases, such as carbon dioxide. Additional non-oxidized gases may be present during sputtering, such as argon, helium, nitrogen, helium, and neon. Sputtering can be performed using laboratory-grade equipment typically having a single chamber and one or more targets (eg, a PVD 75 device from Kurt J. Lesker Company, Pittsburgh, PA), or can have a majority of chambers and Most of the target industrial grade equipment (eg one from Oerlikon Systems (Pf Ffikon, Switzerland) Sprinter device) to implement.

The concentration of the gas may be from about 0.01% (v/v) to about 25% (v/v) at the time of sputtering, and the specific concentration may be about 0.01% (v/v), about 0.05% (v/v), About 0.1% (v/v), about 0.5% (v/v), about 1% (v/v), about 2% (v/v), about 3% (v/v), about 4% (v) /v), approximately 5% (v/v), approximately 10% (v/v), approximately 15% (v/v), approximately 20% (v/v), approximately 25% (v/v), and The range between any of these values. These values are volume/volume relative to the inert sputtering carrier gas (usually argon).

The data layer and other layers may be applied using methods other than sputtering, for example, plasma polymerization, electron beam evaporation, chemical vapor deposition, molecular beam epitaxy, and evaporation may be used.

The step of applying at least one data layer to which a gas is injected can be carried out in a single step. Alternatively, the applying step may be performed by first applying a data layer without the injected gas and then applying the gas to the data layer in two steps.

In a more complex embodiment, one or more additional layers may be applied to the support substrate. The support substrate can have a first side and a second side, and the additional layers can be oriented such that they extend from the first side, the second side, or both the first side and the second side of the support substrate. If the additional layers extend only from one side of the support substrate, the final prepared product will expose one side of the support substrate. If the additional layers extend from both the first side and the second side of the support substrate, the final prepared product will not expose the support substrate. The one or more additional layers may be oriented symmetrically relative to the support substrate or asymmetrically relative to the support substrate.

In some embodiments, one or more layers may be applied to the support substrate prior to applying the data layer to the outermost layer. For example, the methods may further comprise applying one or more of the following layers: an ablation capture layer, a reflective capture layer, a protective seal barrier layer, an ultraviolet radiation barrier layer, a scratch resistant layer, and an environmental protection layer.

In some embodiments, certain layers may be applied to a first support substrate, some layers may be applied to a second support substrate, and the first support substrate may be surface bonded or bonded to the second support substrate. . This method is particularly attractive for preparing DVD media.

The following are specific examples of methods for preparing a multilayer optical data medium. These examples are not meant to be merely limiting, but rather there are many layers of variations and layer application sequences. In embodiments where multiple layers are applied to both the first side and the second side of the support substrate, the particular order of layer application can be varied to achieve the same optical data media product.

In one embodiment, the method can include providing a support substrate; applying at least one data layer implanted with a gas to the support substrate such that the support substrate and the data layer are in surface contact with each other; and capturing at least one ablation A layer is applied over the data layer such that the data layer and the ablation capture layer are in surface contact with each other.

In another embodiment, the method can include providing a support substrate; applying at least one data layer implanted with a gas on the support substrate such that the support substrate and the data layer are in surface contact with each other; and reflecting at least one A capture layer is applied over the data layer such that the data layer and the reflective capture layer are in surface contact with each other.

In another embodiment, the method may include providing a support substrate; applying at least one diffusion barrier layer on the support substrate such that the support substrate and the diffusion barrier layer are in surface contact with each other; at least one is injected with a gas A data layer is applied on the diffusion barrier layer such that the diffusion barrier layer is in surface contact with the data layer; and at least one reflective capture layer is applied to the data layer such that the data layer and the reflective capture layer are in surface contact with each other.

In another embodiment, the method may include providing a support substrate; applying at least one diffusion barrier layer on the support substrate such that the support substrate and the diffusion barrier layer are in surface contact with each other; at least one is injected with a gas a data layer is applied on the diffusion barrier layer such that the diffusion barrier layer and the data layer are in surface contact with each other; and at least one reflective capture layer is applied on the data layer such that the data layer and the reflective capture layer are in surface contact with each other; At least one protective sealing barrier layer is applied such that the reflective capturing layer and the protective sealing barrier layer are in surface contact with each other.

In another embodiment, the method can include providing a support substrate having a first surface and a second surface; applying at least one diffusion barrier layer on the support substrate such that the support substrate and the diffusion barrier layer are mutually Surface contact; applying at least one data layer implanted with a gas to the diffusion barrier layer such that the diffusion barrier layer and the data layer are in surface contact with each other; and applying at least one reflective capture layer to the data layer, such that the data The layer and the reflective trap layer are in surface contact with each other; at least one protective sealing barrier layer is applied on the reflective trap layer such that the reflective trap layer and the protective seal barrier layer are in surface contact with each other; and at least one ultraviolet radiation blocking layer is applied thereto Supporting the second surface of the substrate such that the support substrate and the ultraviolet radiation blocking layer are in surface contact with each other; and applying at least one scratch-resistant layer to the ultraviolet radiation blocking layer such that the scratch-resistant layer and the ultraviolet radiation blocking layer face each other Contacting; and applying at least one environmental protection layer to the scratch-resistant layer such that the environmental protection layer and the scratch-resistant layer are in surface contact with each other.

Material-carbon layer adjacent to the data layer

One embodiment of the invention includes an optical information medium suitable for archiving. These materials and manufacturing procedures are designed to be very durable and not subject to aging deterioration to a substantial extent. Similarly, the information writing process is permanent and is not affected by aging deterioration to a substantial extent. The medium comprises at least one data layer 60, at least one carbon layer 65, and at least one support substrate 10. Although it is presently preferred that the carbon layer is in surface contact with the data layer, at least one intermediate layer may be disposed between them. .

The presence of the carbon layer provides the optical information medium with a number of advantageous properties. The carbon layer acts as a thermal capacitor for heat transfer away from the data layer. This is especially useful when using high power lasers to write data into the data layer. High power lasers produce most high local heat blooms that can damage or degrade neighbors if they are not dissipated. data. In some extreme cases, such thermal halos can destroy substrate trenches used for data tracking in subsequent reading steps. The carbon layer can also act as a barrier to the substrate, preventing exposure of the data layer to oxygen, water vapor, and other agents that can oxidize or degrade the material of the data layer. A carbon layer can be more flexible than materials previously used in dielectric layers, and the flexibility can be "tuned" by the addition of gases or other materials. This flexibility imparts less stress, reduces or avoids cracking, and reduces or avoids unnecessary separation of the carbon layer from adjacent layers. Carbon is also a high temperature resistant material with a high melting point and also helps to resist the transient high temperatures that can occur when a high power laser is used to write data into a data layer.

The data layer can be generally any material or a plurality of materials suitable for writing data and reading data using a suitable device such as an optical disk drive. The carbon layer can be used with substantially any of the data layers to form various embodiments of the invention, examples of materials used in the data layer include organic dyes, metals, metal alloys, metal oxides, glass, and ceramics.

The data layer can be of any thickness. An example of a lower limit of the thickness may be about 2 nm, and an example of the upper limit of the thickness is about 250 nm. Examples of thickness are about 2 nm, about 4 nm, about 6 nm, about 8 nm, about 10 nm, about 12 nm, about 14 nm, about 16 nm, about 18 nm, about 20 nm, about 22 nm, about 24 nm, about 25 nm, about 26 nm, about 28 nm, about 30 nm. , about 32 nm, about 34 nm, about 35 nm, about 36 nm, about 38 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm, about 90 nm, about 100 nm, about 110 nm, about 120 nm, about 130 nm, about 140 nm, about 150 nm, about 160 nm, about 170 nm, about 180 nm, about 190 nm, about 200 nm, about 210 nm, about 220 nm, about 230 nm, about 240 nm, about 250 nm, and a range between any of these values.

The carbon layer may comprise elemental carbon (C), consist essentially of elemental carbon (C), or consist of elemental carbon (C). Examples of elemental carbon include amorphous carbon, graphite amorphous carbon, tetrahedral amorphous carbon, diamond-like amorphous carbon, polymer-like amorphous carbon, glassy carbon, diamond-like carbon, and carbon black. The use of a carbon layer provides better adhesion between adjacent layers than other optical information media lacking the carbon layer.

If the optical information medium contains more than one layer of carbon, they may each be the same or different.

The carbon layer may lack an injected gas. Alternatively, the carbon layer may further comprise at least one injected gas. The phrase "injected" means that at least one gas is covalently bonded, captured or absorbed into or onto the layer of carbon material. The gas may lack an oxygen atom or contain an oxygen atom, and examples of a gas lacking an oxygen atom include molecular hydrogen (H ₂ ), molecular nitrogen (N ₂ ), helium (He), argon (Ar), neon (Ne), and neon. (Kr), hydrazine (Xe), chlorine (Cl ₂ ), and fluorine (F ₂ ). Examples of a gas containing at least one oxygen atom include carbon monoxide (CO), carbon dioxide (CO ₂ ), molecular oxygen (O ₂ ), ozone (O ₃ ), nitrogen oxides (NO _x ), and sulfur oxides (SO _{x ).} ). A particular embodiment may include carbon dioxide (CO ₂ ) as an injected gas, and another specific embodiment may include molecular hydrogen (H ₂ ) as an injected gas. Alternatively, hydrogen may be added to the carbon layer using various hydrocarbons such as methane, ethane, propane or acetylene.

Alternatively, the carbon layer may further comprise another solid, such as aluminum.

The carbon layer can be substantially any thickness. The lower thickness limit may be about one single layer of carbon, the other lower thickness limit may be about 10 nm, and the upper thickness limit may be about 200 nm. Examples of thickness include 1 nm, about 2 nm, about 3 nm, about 4 nm, about 5 nm, about 10 nm, about 15 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm, about 90 nm, about 100 nm, Approximately 110 nm, about 120 nm, about 130 nm, about 140 nm, about 150 nm, about 160 nm, about 170 nm, about 180 nm, about 190 nm, about 200 nm, and a range between any of these values.

Preferably, the carbon layer is immiscible with an adjacent layer in the optical information medium, the carbon layer preferably being adhered to an adjacent layer in the optical information medium. Preferably, the carbon layer is substantially free of stress to aid in the flatness of the optical information medium and the long-term adhesion of the medium.

The optical information medium can include a first support substrate and a second support substrate. The first support substrate and the second support substrate may be made of the same material or may be made of different materials. The first support substrate and the second support substrate are generally oriented such that they form two outer layers of the optical information medium (ie, the first and last layers when viewed in a cross section), which is in a DVD format Especially ideal.

The support substrate may be in surface contact with the data layer or the carbon layer, or at least one intermediate layer 70 between the support substrate and the data layer or the support substrate and the carbon layer. The structure of these layers is shown in Figures 2a-2d.

In the embodiment illustrated in Figure 2a, a cross section will first intersect the support substrate, then the data layer, and the carbon layer. Figure 2b shows another orientation of the data layer and the carbon layer relative to the support substrate. In this figure, a cross section will first intersect the support substrate, then the carbon layer, and the data layer. In the embodiment illustrated in Figure 2c, a cross section will first be associated with the support substrate, then with the at least one intermediate layer, then with the data layer, and with the carbon layer. Figure 2d shows another orientation of the data layer and the carbon layer relative to the support substrate. In this figure, a cross section will be first with the support substrate, then with the at least one intermediate layer, and then with the carbon layer, Intersect with the data layer.

An example of an intermediate layer is a thermal barrier layer. A thermal barrier layer protects the substrate from the heat generated when data is written into the layer of metallic material. Examples of thermal barrier layers include glass, ceramics, nitrides, and metal oxides. Specific examples include vermiculite (SiO ₂ ), cerium oxide-zinc sulfide (SiO ₂ ZnS), tantalum nitride (SiN), carbon, aluminum oxide, tantalum, tantalum nitride, boron nitride, titanium oxide (TiO _x ), and bismuth oxide (TaO _x ). Other refractory materials can also be used if they can be deposited in a film with appropriate adhesion. Alternatively, since it has better thermal conductivity than a dielectric layer, a metal layer can be used as a thermal barrier layer. The use of a metal layer will allow heat to be quickly conducted away from a data location rather than gradually absorbing and dissipating heat over time.

The data layer can be "sandwiched" between the two carbon layers. At this time, the data layer contacts both the first carbon layer 75 and the second carbon layer 80. One such example is shown in Figure 3a, in which a cross section will first be associated with the support substrate, then the first carbon layer, then the data layer, and the second carbon layer.

Another embodiment is shown in FIG. 3b, in which a cross section will be first with the support substrate, then the at least one intermediate layer, the first carbon layer, and then the data layer, and then The second carbon layers intersect.

Other embodiments including a first support substrate and a second support substrate are shown in Figures 3c and 3d. In Fig. 3c, a cross section will first intersect the first support substrate 85, then the data layer 60, then the carbon layer 65, and the second support substrate 90. In FIG. 3d, a cross section will be first with the first support substrate 85, then with the first carbon layer 75, with the data layer 60, then with the second carbon layer 80, and with the second support. The substrates 90 intersect.

Further embodiments comprising a plurality of support substrates and a plurality of intermediate layers are shown in Figure 3e. In FIG. 3e, a cross section will be first with the first support substrate 85, then with one or more first intermediate layers 95, with the first carbon layer 75, and then with the data layer 60, The second carbon layer 80, and then the one or more second intermediate layers 100, intersects the second support substrate 90.

The optical information medium may further comprise another layer, such as at least one reflective layer, at least one outer protective layer, at least one heat dissipation layer, at least one light adjustment layer, or at least one adhesive layer. Other layers may be added to adjust the optical properties of the optical information medium by increasing the optical path length to modulate the reflectivity of the structure using constructive or destructive interference.

The data layer may further include one or more locations where data has been written, the locations having detectable differences that are different from other locations where the data has not been written.

Preparation Method - Carbon Layer Dielectric

A further embodiment of the invention relates to a method of preparing an optical information medium.

The various layers can be applied in various orders depending on the particular configuration desired in the optical information media product, and the layers can all be applied to one side of the support substrate to produce a final product having the support substrate on the outside. Alternatively, the layers may be applied on both sides of the support substrate to produce a final product having the support substrate, and the support substrate is disposed such that it is not outside of one of the final products. Although it is presently preferred that the carbon layer is in surface contact with the data layer, at least one intermediate layer may be disposed therebetween.

In one embodiment, the method can include providing a support substrate; applying a data layer such that the data layer is in surface contact with the support substrate; and applying a carbon layer such that the carbon layer contacts the data layer. Implementing this method produces an optical information medium as shown in Figure 2a.

In another embodiment, the method can include providing a support substrate; applying a carbon layer such that the carbon layer is in surface contact with the support substrate; and applying a data layer such that the data layer is in contact with the carbon layer. Implementing this method produces an optical information medium as shown in Figure 2b.

In another embodiment, the method can include providing a support substrate; applying at least one intermediate layer such that the intermediate layer is in surface contact with the support substrate; applying a data layer such that the data layer is in contact with the intermediate layer; and applying A carbon layer is placed in contact with the data layer. Implementing this method produces an optical information medium as shown in Figure 2c.

In another embodiment, the method can include providing a support substrate; applying at least one intermediate layer such that the intermediate layer is in surface contact with the support substrate; applying a carbon layer such that the carbon layer is in contact with the intermediate layer; and applying A data layer that brings the data layer into contact with the carbon layer. Implementing this method produces an optical information medium as shown in Figure 2d.

In another embodiment, the method can include providing a support substrate; applying a first carbon layer such that the first carbon layer is in surface contact with the support substrate; applying a data layer such that the data layer and the first carbon Layer contact; and applying a second carbon layer such that the second carbon layer is in contact with the data layer. Implementing this method produces an optical information medium as shown in Figure 3a.

In still another embodiment, the method can include providing a support substrate; applying at least one intermediate layer such that the intermediate layer is in surface contact with the support substrate; applying a first carbon layer such that the first carbon layer and the intermediate layer Contacting; applying a data layer such that the data layer is in contact with the first carbon layer; and applying a second carbon layer such that the second carbon layer is in contact with the data layer. Implementing this method produces an optical information medium as shown in Figure 3b.

In an embodiment, the method may include: providing a first support substrate; applying a data layer such that the data layer is in surface contact with the first support substrate; applying a carbon layer such that the carbon layer is in contact with the data layer; And applying a second support substrate such that the second support substrate is in contact with the carbon layer. Implementing this method produces an optical information medium as shown in Figure 3c.

In another embodiment, the method can include providing a first support substrate; applying a first carbon layer such that the first carbon layer is in surface contact with the first support substrate; applying a data layer such that the data layer The first carbon layer contacts; applying a second carbon layer such that the second carbon layer contacts the data layer; and applying a second support substrate such that the second support substrate is in contact with the second carbon layer. Implementing this method produces an optical information medium as shown in Figure 3d.

In still another embodiment, the method can include providing a first support substrate; applying at least one first intermediate layer such that the first intermediate layer is in surface contact with the first support substrate; applying a first carbon layer such that the a first carbon layer is in contact with the first intermediate layer; a data layer is applied such that the data layer is in contact with the first carbon layer; a second carbon layer is applied such that the second carbon layer is in contact with the data layer; a second intermediate layer, the second intermediate layer is in contact with the second carbon layer; and a second supporting substrate is applied such that the second supporting substrate is in contact with the second carbon layer. Implementing this method produces an optical information medium as shown in Figure 3e.

The applying step can include physical vapor deposition (eg, sputtering of a target, reactive sputtering, electron beam evaporation, and laser ablation), or chemical vapor deposition. Sputtering can be performed using laboratory-grade equipment typically having a single chamber and one or more targets (eg, a PVD75 device from Kurt J. Lesker Company (Pittsburgh, PA)), or can be used with most rooms and majority Targeted industrial grade equipment (eg one from Oerlikon Systems (Pf Ffikon, Switzerland) Sprinter device) to implement.

Material-carbon layer and metal data layer assembly

One embodiment of the invention includes an optical information medium suitable for archiving. These materials and manufacturing procedures are designed to be very durable and not subject to aging deterioration to a substantial extent. Similarly, the information writing process is permanent and is not affected by aging deterioration to a substantial extent. The medium comprises at least one metal material layer 105, at least one carbon material layer 65, and at least one support substrate 10.

The layer of metallic material comprises at least one metal or metal alloy, consists essentially of at least one metal or metal, or consists of at least one metal or metal. The metal material layer may comprise a mixture of two or more metals or metal alloys, examples of which include niobium, tantalum alloy, selenium, selenium alloy, arsenic, arsenic alloy, tin, tin alloy, niobium, tantalum Alloys, niobium, tantalum alloys, lead, and lead alloys. Examples of the niobium alloy include Te _x Se _100-x , Te _x Se _100-x (where X is less than or equal to 95), Te ₈₆ Se ₁₄ , Te ₇₉ Se ₂₁ , Te _x Sb _100-x , Te _x Sb _100-x (where X is less than or equal to 95), Te _x Se _y Sb _z , Te _x Se _y Sb _z (where X+Y+Z=100), Te _x Se _y Sb _z (where X+Y+Z=100, Y Is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Sb ₅ , Te _72.5 Se ₂₀ Sb _7.5 , Te _x Se _y In _z , Te _x Se _y In _z (where X+Y+Z=100) Te _x Se _y In _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ In ₅ , Te _72.5 Se ₂₀ In _7.5 , Te _x Se _y Pb _z , Te _x Se _y Pb _z (where X+Y+Z=100), Te _x Se _y Pb _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Pb ₅ , Te _72.5 Se ₂₀ Pb _7.5 , Te _x Se _y Sn _z , Te _x Se _y Sn _z (where X+Y+Z=100), Te _x Se _y Sn _z (where X+Y+Z =100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Sn ₅ , Te _72.5 Se ₂₀ Sn _7.5 , Te _x Se _y Bi _z , Te _x Se _y Bi _z (where X+Y+ Z=100), Te _x Se _y Bi _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Bi ₅ , Te _72.5 Se ₂₀ Bi _7.5 , TeGeAs , TeGeSbS, TeO _x Ge, TeO _x Sn, Pb-Te-Se, Pb-Te-Sb, As-Te, and Ge-Te. Examples of other alloys include As-Se, Ge-Se, GeS, SnS, Sb-S, Bi _x Sb _100-x , Bi _x Sb _100-x (where X is less than or equal to 95). Other examples of the alloy include GeS, As ₂ S ₃ , SnS, Sb ₂ S ₃ , Sb ₂₀ S ₈₀ , GeSe, As ₂ Se ₃ , SnSe, Sb ₂ Se ₃ , Bi ₂ Se ₃ , GeTe, Ge ₁₀ Te ₉₀ , AS ₂ Te ₃ , SnTe, Sb ₂ Te ₃ , PbTe, Bi ₂ Te ₃ , As ₁₀ Te ₉₀ , As ₃₂ Te ₆₈ , InTe ₃ , In ₂ S ₃ , CdTe, and InSe ₃ . Other metals and alloys include nickel (Ni), chromium (Cr), titanium (Ti), stainless steel, gold (Au), platinum (Pt), palladium (Pd), Monel (usually used in marine applications) One of nickel, an alloy of copper and iron), bismuth (Si), AuSi, CuNi, and NiCr. Currently preferred layers of metallic materials comprise chromium, niobium, or tantalum alloys.

The layer of metallic material can be of substantially any thickness. An example of a lower limit of the thickness may be about 2 nm, and an example of the upper limit of the thickness is about 250 nm. Examples of thickness are about 2 nm, about 4 nm, about 6 nm, about 8 nm, about 10 nm, about 12 nm, about 14 nm, about 16 nm, about 18 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm. , about 90 nm, about 100 nm, about 110 nm, about 120 nm, about 130 nm, about 140 nm, about 150 nm, about 160 nm, about 170 nm, about 180 nm, about 190 nm, about 200 nm, about 210 nm, about 220 nm, about 230 nm, about 240 nm, about 250 nm, and the range between any of these values.

The carbon material layer may comprise at least one carbon compound, consist essentially of at least one carbon compound, or consist of at least one carbon compound. Examples of the carbon compound include amorphous carbon, glassy carbon, diamond-like carbon, and carbon black.

If the optical information medium contains more than one layer of carbon material, they may each be the same or different.

The carbon material layer may lack an injected gas. Alternatively, the carbon material layer may further comprise at least one injected gas. The phrase "injected" means that at least one gas is covalently bonded, captured or absorbed into or onto the layer of carbon material. The gas may lack an oxygen atom or contain an oxygen atom, and examples of a gas lacking an oxygen atom include molecular hydrogen (H ₂ ), molecular nitrogen (N ₂ ), helium (He), argon (Ar), neon (Ne), and neon. (Kr), hydrazine (Xe), chlorine (Cl ₂ ), and fluorine (F ₂ ). Examples of a gas containing at least one oxygen atom include carbon monoxide (CO), carbon dioxide (CO ₂ ), molecular oxygen (O ₂ ), ozone (O ₃ ), nitrogen oxides (NO _x ), and sulfur oxides (SO _{x ).} ). A particular embodiment may include carbon dioxide (CO ₂ ) as an injected gas, and another specific embodiment may include molecular hydrogen (H ₂ ) as an injected gas.

The carbon material layer can be substantially any thickness. The lower thickness limit may be about one single layer of carbon, the other lower thickness limit may be about 10 nm, and the upper thickness limit may be about 200 nm. Examples of thickness include 1 nm, about 2 nm, about 3 nm, about 4 nm, about 5 nm, about 10 nm, about 15 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm, about 90 nm, about 100 nm, Approximately 110 nm, about 120 nm, about 130 nm, about 140 nm, about 150 nm, about 160 nm, about 170 nm, about 180 nm, about 190 nm, about 200 nm, and a range between any of these values. A currently preferred thickness is about 19 nm for the first carbon layer and about 13 nm for the second carbon layer.

The optical information medium can include a first support substrate and a second support substrate. The first support substrate and the second support substrate may be made of the same material or may be made of different materials. The first support substrate and the second support substrate are generally oriented such that they form two outer layers of the optical information medium (ie, the first and last layers when viewed in a cross section), which is in a DVD format Especially ideal.

The support substrate may be in surface contact with the data layer or the carbon layer, or there may be at least one intermediate layer between the metal material layer that may be in surface contact with the carbon material layer. The structure of these layers is shown in Figures 4a-4d. In the embodiment shown in Fig. 4a, a cross section will first intersect the support substrate 10, then the metal material layer 105, and the carbon material layer 65. Figure 4b shows another orientation of the metal material layer and the carbon material layer relative to the support substrate. In this figure, a cross section will be first with the support substrate 10, then with the carbon material layer 65, and with the metal. The material layers 105 intersect. In the embodiment illustrated in Figure 4c, a cross section will first intersect the support substrate 10, then the at least one intermediate layer 70, and then the metal material layer 105, and the carbon material layer 65.

An example of an intermediate layer is a thermal barrier layer. A thermal barrier layer protects the substrate from the heat generated when writing data into the layer of metallic material. Examples of thermal barrier layers include vermiculite (SiO ₂ ) or carbon.

The layer of metallic material can be "sandwiched" between the layers of two carbon materials. At this time, the metal material layer contacts both the first carbon material layer and the second carbon material layer. One such example is shown in Figure 4d, in which a cross section will be first with the first support substrate 85, with the first carbon material layer 110, then with the metal material layer 105, and then with The second carbon material layer 115 is further intersected with the second support substrate 90.

Another simplified "clip" configuration can include at least one support substrate 10, a first carbon material layer 110, a metal material layer 105, and a second carbon material layer 115. The support substrate may directly contact the first carbon material layer or may have at least one intermediate layer between the support substrate and the first carbon material layer. The first carbon material layer may be in contact with the metal material layer, and the metal material layer may be in contact with the second carbon material layer. A cross section will first intersect the support substrate, the first layer of carbon material, and then the layer of metal material, and then the layer of second carbon material.

Preparation Method - Carbon Layer and Metal Data Layer

A further embodiment of the invention relates to a method of preparing an optical information medium.

The various layers can be applied in various orders depending on the particular configuration desired in the optical information media product, and the layers can all be applied to one side of the support substrate to produce a final product having the support substrate on the outside. Alternatively, the layers may be applied on both sides of the support substrate to produce a final product having the support substrate, and the support substrate is disposed such that it is not outside of one of the final products.

In one embodiment, the method may include providing a support substrate; applying a metal material layer such that the metal material layer is in surface contact with the support substrate; and applying a carbon material layer such that the carbon material layer and the metal material layer contact.

In another embodiment, the method can include providing a support substrate; applying at least one intermediate layer such that the intermediate layer is in surface contact with the support substrate; applying a metal material layer such that the metal material layer is in contact with the intermediate layer; And applying a layer of carbon material such that the layer of carbon material is in contact with the layer of the metal material.

In still another embodiment, the method may include providing a first support substrate; applying a first carbon material layer such that the first carbon material layer is in surface contact with the first support substrate; applying a metal material layer such that the a metal material layer is in contact with the first carbon material layer; a second carbon material layer is applied such that the second carbon material layer is in contact with the metal material layer; and a second support substrate is applied such that the second support substrate and the Contact at the second carbon material level.

The applying step can include physical vapor deposition (eg, sputtering of a target, reactive sputtering, electron beam evaporation, and laser ablation), or chemical vapor deposition. Sputtering can be performed using laboratory-grade equipment typically having a single chamber and one or more targets (eg, a PVD 75 device from Kurt J. Lesker Company, Pittsburgh, PA), or can have a majority of chambers and Most of the target industrial grade equipment (eg one from Oerlikon Systems (Pf Ffikon, Switzerland) Sprinter device) to implement.

Material - contains the data layer of the injected gas

One embodiment of the invention includes an optical information medium suitable for archiving. These materials and manufacturing procedures are designed to be very durable and not subject to aging deterioration to a substantial extent. Similarly, the information writing process is permanent and is not affected by aging deterioration to a substantial extent. The optical information medium comprises at least one layer of carbon oxide (carbon monoxide, carbon dioxide, or both carbon monoxide and carbon dioxide) data layer 120, and at least one support substrate 10.

The ruthenium and carbon dioxide data layer comprises a ruthenium material and a carbon oxide (COx, wherein x=1 or 2; carbon monoxide, carbon dioxide, or both carbon monoxide and carbon dioxide), mainly composed of a tantalum material and a carbon oxide, or It consists of a tantalum material and a carbon oxide. The carbon dioxide or carbon monoxide may be included in the data layer in any manner, for example, the carbon dioxide or carbon monoxide may be covalently bonded, captured or absorbed into or onto the material of the data layer. The carbon dioxide or carbon monoxide can be present in the data layer in substantially any concentration.

The tantalum material may be a base metal (Te) or at least one tantalum alloy.碲 can be combined with, for example, selenium (Se), antimony (Sb), indium (In), lead (Pb), tin (Sn), bismuth (Bi), germanium (Ge), arsenic (As), oxygen (O), cadmium An alloy is formed by various other elements such as (Cd), or a combination thereof, and the niobium alloy can be more stably resistant to oxidation than the niobium metal.

Examples of the niobium alloy include Te _x Se _100-x , Te _x Se _100-x (where X is less than or equal to 95), Te ₈₆ Se ₁₄ , Te ₇₉ Se ₂₁ , Te _x Sb _100-x , Te _x Sb _100-x (where X is less than or equal to 95), Te _x Se _y Sb _z , Te _x Se _y Sb _z (where X+Y+Z=100), Te _x Se _y Sb _z (where X+Y+Z=100, Y Is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Sb ₅ , Te _72.5 Se ₂₀ Sb _7.5 , Te ₃ Sb ₂ , Te _x Se _y In _z , Te _x Se _y In _z (where X+Y +Z=100), Te _x Se _y In _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), InTe ₃ , Te ₇₅ Se ₂₀ In ₅ , Te _72.5 Se ₂₀ In _7.5 , Te _x Se _y Pb _z , Te _x Se _y Pb _z (where X+Y+Z=100), Te _x Se _y Pb _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Pb ₅ , Te _72.5 Se ₂₀ Pb _7.5 , TePb, Te _x Se _y Sn _z , Te _x Se _y Sn _z (where X+Y+Z=100), Te _x Se _y Sn _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Sn ₅ , Te _72.5 Se ₂₀ Sn _7.5 , Te ₃ Bi ₂ , Te _x Se _y Bi _z , Te _x Se _y Bi _z (where X+Y+Z=100), TeSn, Te _x Se _y Bi _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20 ), Te ₇₅ Se ₂₀ Bi ₅ , Te _72.5 Se ₂₀ Bi _7.5 , TeGeAs, TeGeSbS, TeO _x Ge, TeO _x Sn, Pb-Te-Se, Pb-Te-Sb, As-Te, As ₁₀ Te ₉₀ , As ₃₂ Te ₆₈ , Ge-Te, Ge ₁₀ Te ₉₀ , CdTe, and PbTe. Examples of other alloys include As-Se, Ge-Se, GeS, SnS, Sb-S, Bi _x Sb _100-x , Bi _x Sb _100-x (where X is less than or equal to 95). Other examples of the alloy include GeTe, Ge ₁₀ Te ₉₀ , As ₂ Te ₃ , SnTe, Sb ₂ Te ₃ , PbTe, Bi ₂ Te ₃ , As ₁₀ Te ₉₀ , As ₃₂ Te ₆₈ , and InTe ₃ .

The crucible and the carbon dioxide or carbon monoxide data layer can be of substantially any thickness. An example of a lower limit of the thickness may be about 2 nm, and an example of the upper limit of the thickness is about 250 nm. Examples of thickness are about 2 nm, about 4 nm, about 6 nm, about 8 nm, about 10 nm, about 12 nm, about 14 nm, about 16 nm, about 18 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm. , about 90 nm, about 100 nm, about 110 nm, about 120 nm, about 130 nm, about 140 nm, about 150 nm, about 160 nm, about 170 nm, about 180 nm, about 190 nm, about 200 nm, about 210 nm, about 220 nm, about 230 nm, about 240 nm, about 250 nm, and the range between any of these values. A presently preferred range can be from about 12 nm to about 45 nm.

The crucible and the carbon dioxide or carbon monoxide data layer may further comprise one or more additional materials such as silver.

The enthalpy and carbon dioxide or carbon monoxide data layer may further contain a plurality of locations where data has been written, the locations having detectable differences that are different from other locations where the data has not yet been written.

The optical information medium can include a first support substrate 85 and a second support substrate 90. The first support substrate and the second support substrate may be made of the same material or may be made of different materials. The first support substrate and the second support substrate are generally oriented such that they form two outer layers of the optical information medium (ie, the first and last layers when viewed in a cross section), which is in a DVD format Especially ideal. This structure is shown in Figure 5c.

The support substrate may be in surface contact with the tantalum and carbon dioxide or carbon monoxide data layer, or there may be at least one intermediate layer between them. The structure of these layers is shown in Figures 5a and 5b. In the embodiment shown in Figure 5a, a cross section will first intersect the support substrate and then with the data layer. In the embodiment illustrated in Figure 5b, a cross section will first intersect the support substrate and then with at least one intermediate layer and then with the data layer. In FIG. 5b, the support substrate is in contact with the at least one intermediate layer, and the at least one intermediate layer is in contact with the data layer.

An example of an intermediate layer is a thermal barrier layer. A thermal barrier layer protects the substrate from the heat generated when data is written into the data layer. Examples of thermal barrier layers include vermiculite (SiO ₂ ), carbon, aluminum oxide, tantalum, tantalum nitride, Boron nitride, titanium oxide (TiO _x ), and tantalum oxide (TaO _x ).

Another example of an intermediate layer is a thermally conductive layer. This layer shields heat away from where data has been written, reducing or avoiding thermal damage to adjacent locations.

The optical information medium may further comprise at least one reflective layer, the plurality of reflective layers being generally oriented away from the support substrate such that the distance from the reflective layer to the data layer is less than the distance from the reflective layer to the support substrate.

The optical information medium has a greater resistance to oxidation than a similar medium made without the carbon dioxide or carbon monoxide in the data layer.

Preparation Method - Contains a data layer containing the injected gas

A further embodiment of the invention relates to a method of preparing an optical information medium.

The various layers can be applied in various orders depending on the particular configuration desired in the optical information media product, and the layers can all be applied to one side of the support substrate to produce a final product having the support substrate on the outside. Alternatively, the layers may be applied on both sides of the support substrate to produce a final product having the support substrate, and the support substrate is disposed such that it is not outside of one of the final products.

In one embodiment, the method can include providing a support substrate; and applying a layer of carbon dioxide and/or carbon monoxide data such that the data layer is in surface contact with the support substrate. This method produces an optical information medium as shown in Figure 5a.

In another embodiment, the method can include providing a support substrate; applying at least one intermediate layer such that the intermediate layer is in surface contact with the support substrate; and applying a layer of carbon dioxide and/or carbon monoxide data to cause the data layer Contact with the intermediate level. This method produces an optical information medium as shown in Figure 5b.

In still another embodiment, the method can include providing a first support substrate, applying a layer of carbon dioxide and/or a carbon monoxide material layer such that the data layer is in surface contact with the first support substrate, and applying a second support substrate The second support substrate is brought into contact with the data layer. This method produces an optical information medium as shown in Figure 5c.

The applying step can include physical vapor deposition (eg, sputtering of a target, reactive sputtering, electron beam evaporation, and laser ablation), or chemical vapor deposition. Sputtering can be performed using laboratory-grade equipment typically having a single chamber and one or more targets (eg, a PVD 75 device from Kurt J. Lesker Company, Pittsburgh, PA), or can have a majority of chambers and Most of the target industrial grade equipment (eg one from Oerlikon Systems (Pf Ffikon, Switzerland) Sprinter device) to implement.

The base metal or a tantalum alloy may be applied in the presence of carbon dioxide, carbon monoxide, or both carbon dioxide and carbon monoxide. The concentration of carbon dioxide or carbon monoxide present may be substantially any concentration, and an example of the concentration of carbon dioxide present at the application step may be about 1% (v/v), about 2% (v/v), about 3% (v/v). ), approximately 4% (v/v), approximately 5% (v/v), approximately 6% (v/v), approximately 7% (v/v), approximately 8% (v/v), approximately 9% (v/v), approximately 10% (v/v), approximately 15% (v/v), approximately 20% (v/v), approximately 25% (v/v), approximately 30% (v/v) , approximately 35% (v/v), approximately 40% (v/v), approximately 45% (v/v), approximately 50% (v/v), and a range between any of these values. If both carbon dioxide and carbon monoxide are used, each may be the same or present in different concentrations. Typically, at least one inert gas such as a rare gas, helium, neon, xenon, or argon is used as the remainder of 100%. Due to its low cost, argon is currently preferred.

Method of use

Any of the foregoing digital data media can be used to store digital data, the method can include providing a digital data medium and applying energy to a location in the metallic material layer to generate a detectable in the data layer of the media Measuring changes. The method further includes detecting changes in the data layer.

Applying energy to the location in the layer of metallic material also locally produces deformation sufficient to deform the track in the support substrate, which in turn can detect the location of deformation in the support substrate.

Lasers can be used in the energy application step and in the detection step. The main types of lasers include gas lasers, diode-excited solid-state lasers, and diode lasers.

The following examples are included to illustrate preferred embodiments of the invention. Those skilled in the art should understand that the techniques disclosed in the following examples represent techniques discovered by the inventors to perform a good function of the present invention, and thus can be considered as a preferred mode of implementation. . However, it will be apparent to those skilled in the art that the present invention may be practiced without departing from the scope of the invention. Many changes can be made to the particular embodiments and a similar or similar result can still be obtained.

example

Example 1: Identification of candidate write layer materials

Several tools and methods are employed herein to identify materials suitable for use as a write layer in an optical medium. A first tool is a phase diagram of the candidate material. The phase diagram illustrates a thermodynamically stable material and provides information on the melting point, phase separation into different compounds and structures, peak crystallization temperatures, and eutectic temperatures.

The write layer material can be selected to have a height sufficient to stabilize the material below a predetermined temperature (e.g., 100 degrees C), but low enough to allow it to be melted by a laser without causing a support substrate in a product The melting point of the material's deformation or decomposition. Preferably, the material does not separate into two distinct material states (sometimes referred to as "eutectic compositions") upon heating, and the material preferably does not separate into two distinct phases upon heating or cooling.

Although the materials do not meet all of the "ideal" conditions, they can still be applied to commodities. Information about the dynamics of any change can also help identify, screen, or evaluate candidate materials. Phase change kinetic information can be obtained using differential scanning calorimetry and X-ray crystallization. The kinetic information can show how quickly or slowly a material will be close to a predetermined temperature as shown in a phase diagram. Or unfavorable state. For example, an alloy having a peak crystallization temperature of about 50 degrees C at room temperature is less commercially attractive than an alloy having a higher peak crystallization temperature.

Example 2: General Method for Reactive Sputtering

Sputtering was performed using a PVD 75 device (Kurt J. Lesker Company; Pittsburgh, PA). The system is constructed with an RF power source, three magnetron guns that hold a 3 inch (7.62 cm) target, and equipment for two sputtering gases. The targets are arranged in an upward sputter-up configuration, and most of the gates shield the targets of the three targets, and most of the substrates are mounted on a rotating platform that can be heated to 200 ° C, and the rotating platform is located Above the targets. Most of the experiments were carried out without actively heating the platform. Since there is no active heating, the temperature of the platform increases with the increase of sputtering time at 400w until the temperature reaches a maximum of about 60 ° C - 70 ° C. . The maximum temperature is reached after about 3 hours, and the initial temperature in the chamber prior to sputtering is typically about 27 ° C. The time, target, and sputtering source will vary as explained in the examples below.

The substrate used is typically a germanium (Si) wafer or a gas microscope slide with a UV blocking effect at approximately 300 nm. A plasma-cleaned substrate was mounted on the platform, and a portion of the crucible substrate was covered with a piece of tape having an acrylic adhesive to measure the sputter deposition rate. After the platform is positioned, the sputtering chamber is vacuumed until the pressure is below 2.3 x 10 ^-5 torr. Argon (Ar) and carbon dioxide (CO ₂ ) were then introduced into the chamber in a specific ratio such that the pressure in the chamber was about 12 mTorr. The Capman pressure is maintained at 13 mTorr (the Kapman pressure is the equipment setting for the PVD device) and then above the carbon graphite target (99.999%; Kurt J. Lesker Company, part number EJTCXXX503A4) The plasma is emitted. 400Wrf power was gradually warmed and the chamber pressure is reduced to about 2.3 mTorr (Capmann pressure equal to 3 mTorr), and has been maintained for a specific ratio of CO ₂ Ar. Then, the gate on the graphite target is opened and the substrate is exposed to the sputtering target for a predetermined length of time. After the time has elapsed, the gate on the target is closed and the power is reduced. Next, the substrate containing the sputtered material is taken out of the apparatus for analysis or further processing.

Example 3: General Method for AFM Thickness Measurement

One atomic force microscopy (AFM) was performed using a Veeco Dimension 3100 apparatus (Veeco; Plainview, NY) and images were taken in a tapping mode.

The coated tantalum wafer was prepared to perform step height measurement using AFM as follows. Removing a portion of the tape covering the surface, moistening the surface with acetone and wiping it with a cotton swab soaked with acetone at one end to remove residual adhesive and between the exposed and covered portions of the wafer The material at the interface is soft. The interface height on the Si wafer was measured by AFM, and a few films on the Si wafer were studied by XPS, and the coated glass microscope slide was analyzed by UV-VIS spectroscopy.

Example 4: General method for UV-VIS measurement

UV/VIS spectroscopy of the film on a glass slide was performed using an Agilent 8453 UV/VIS spectrometer (Agilent; Santa Clara, CA). For a spectroscopic measurement, the glass slide is oriented such that the beam from the spectrometer first passes through the air-glass interface of the slide and then through the glass-membrane interface. Each scan was accompanied by a scan of a single uncoated glass slide, and the absorption spectrum of the film was obtained by subtracting the absorption spectrum of the simple glass slide from the absorption spectrum of the coated glass slide. We assume that the reflectivity of the glass-air interface of the simple glass slide is the same as the reflectance of the film-air interface at the coated glass slide, and the reflectance of the film-glass interface is negligible. When a scan of a coated glass slide is performed, the slide is positioned such that the beam of the spectrometer passes through a section of the glass slide that is 2.2 cm from the center of the platform during the sputter deposition.

Example 5: General method for measuring optical density

The optical density of a film is determined by dividing the UV/VIS by the film thickness. The higher the optical density of a material at a predetermined wavelength, the more opaque it is at that wavelength. Two samples and two measurements are used herein to determine the optical density. The two samples are a coated masked wafer and a coated glass slide. The films on the two samples are desirably prepared simultaneously, resulting in a UV/VIS spectrum of the coated glass slide. An AFM image of the interface of the Si wafer that is shielded from the exposed section is obtained, and a first-order height measurement is performed to obtain the thickness of the film. Next, the absorption value at all points along the absorption spectrum is divided by the film thickness to obtain an optical density spectrum of the film.

Example 6: Preparation of a disc lacking a data layer in which an oxidizing gas is injected

A polycarbonate disc uncoated thereon is mounted on a platform in the PVD 75 apparatus, and the optical track on the disc faces the targets. A carbon graphite target was sputtered with argon as the sputtering gas for 1 hour using a magnetron power of 400 W RF at a 3 mTorr Kapman pressure. This produces a carbon film having a thickness of about 31 nm on the surface of the optical disk, followed by deposition of a layer of chromium.

Example 7: Preparation of a disc containing a data layer infused with carbon dioxide

A polycarbonate disc uncoated thereon is mounted on a platform in the PVD 75 apparatus, and the optical track on the disc faces the targets. A carbon graphite target was sputtered with a concentration of the CO ₂ for 1 hour using a magnet power of 400 W RF at a Kmman pressure of 3 mTorr using Ar and CO ₂ as the sputtering gas. Next, a metal layer such as aluminum or chromium is deposited on the top surface of the carbon film.

Example 8: Applying a chrome reflective layer

Usually, after depositing a carbon layer, a chromium layer is applied to the disc by sputtering deposition. Typically, the chamber is maintained in a vacuum between the application of the carbon layer and the chromium layer. A magnet of 400 W RF was used at a Kmman pressure of 4 mTorr, and a chromium target was sputtered with Ar as the sputtering gas for 15 minutes. This produces a chrome film having a thickness of about 138 nm on the surface of the disc.

Example 9: Measuring film growth rate by changing the sputtering time

The thickness of the films is determined using AFM. As previously described, a film is masked with tape during sputtering. After sputtering, the tape is removed and the surface is cleaned. Next, the height of the step is measured by AFM. I have found that the chromium-plated chromium system grows at a rate of 0.154 nm/s under the 400W RF magnetron power and a 4 mTorr Kapman pressure. This is the slope of the calibration curve from a 5 data point. To decide. We have found that the aluminum alloy sputtered at a magnet power of 400w RF and a Kapman pressure of 3 mTorr grows at a rate of 0.141 nm/s, which is the slope of the calibration curve from a 3 data point. To decide.

Example 10: Measuring film growth rate by changing gas concentration

We have found that the growth rate of the carbon film depends on the percentage of carbon dioxide in the sputtering gas. The experimental conditions in which all experiments were constant were 400w RF magnetron power and Kapman pressure = 3 mTorr. The amount of carbon dioxide in the process gas is 0% (v/v), 1% (v/v), 2% (v/v) and 4% (v/v) of the amount of argon that has been tested. The growth rate of the film is shown in the table below, and is determined by dividing the thickness of the film determined by the AFM by the sputtering time.

These growth rates clearly show that increasing the carbon dioxide concentration slows down the rate of sputter deposition.

Example 11: Measuring Film Optical Density (Transparency) by Changing Gas Concentration

I have found that in the range of 1%-4% (v/v) of the sputtering gas, the optical density of the carbon films decreases as the carbon dioxide sputtering concentration increases. For this example, most of the film was produced by sputtering a carbon graphite of 400 W RF and a 3 mTorr of Kapman pressure to deposit carbon graphite for 4 hours. The 650 nm optical density of these films is shown in the table below.

The optical density through a spectrum from 300 nm to 1100 nm was measured and is shown in FIG. These results clearly show that increasing the carbon dioxide concentration reduces the optical density of the formed film. In other words, increasing the concentration of carbon dioxide increases the transparency of the film formation.

Example 12: X-ray photoelectron spectroscopy of a carbon film implanted with carbon dioxide

X-ray photoelectron spectroscopy (XPS) was carried out using an SSX-100 device (Surface Science maintained by Surface Physics; Bend, OR). XPS provides the basic composition of materials approximately 10 nm above. XPS showed that the oxygen content in the films increased as the percentage of carbon dioxide in the sputtering gas increased, and the results are shown in the table below.

In addition, as the concentration of carbon dioxide in the sputtering gas increases, the size of a shoulder on the high energy side of the narrow scan of C1s increases relative to the peak of the main Cls. This means that as the percentage of carbon dioxide in the sputtering gas increases, the amount of carbon covalently bonded to oxygen increases.

Example 13: Measurement of carbon film peeling

It is well known that carbon films deposited by sputtering are degraded by internal stress and decomposition in the atmosphere, and there are many differences in appearance and properties between the non-damaged carbon film and the severely degraded carbon film. A carbon film having a severe deterioration has a shadow appearance, a light color, and is easily wiped off or washed away from the substrate. Conversely, a non-damaging film is reflective and difficult to remove from the substrate.

The following experiment demonstrates that carbon dioxide injection into a graphite film improves the stability of the film. Various films were prepared on glass microscope slides for analysis. For films produced by sputtering a graphite target at 400 w at 3 mTorr, the visible deterioration tendency of the films increases with increasing sputtering time. For example, a control film produced by sputtering a graphite without addition of carbon dioxide for 1 hour showed no signs of visible deterioration, but a 1.5 hour film showed visible signs of deterioration. The addition of carbon dioxide to the sputtering gas increases the time during which a film is sputtered prior to producing an unstable film, for example, by 1% (v/v) carbon dioxide sputtering of graphite in the sputtering gas for 3 hours. No deterioration was observed in the film produced, but the film showed signs of deterioration in a 4 hour film, and the film produced by sputtering 2% (v/v) of carbon dioxide on the sputtering gas for 4 hours did not appear. Deterioration. These results are shown in the table below.

Example 14: Measurement of disc durability

A simple test to measure durability includes immersing the sample in boiling water for 48 hours and a tape-pull test. A more complex metamorphosis test is shown in ECMA-379 (also known as ISO-IEC-10995).

Example 15: Pre-example of the erosion method

An optical information medium comprising a polycarbonate support substrate and a carbon data layer implanted with carbon dioxide can be produced. The medium can be exposed to a laser to erode or deform the location on the medium to encode a computer program or file into the medium. The media can then be read by a conventional CD or DVD player to retrieve the computer program or file.

Example 16: Comparison of pre-examples with ablation of discs made without oxidizing gas

An optical information medium having a polycarbonate support substrate, a carbon data layer, and with or without carbon dioxide injected in the data layer will compare its performance and lifetime. It is expected that media including carbon dioxide injected will be preferred in writing performance and lifetime testing.

Example 17: Materials and Methods

Polycarbonate blank discs are commercially available from various sources such as Bayer Material Science AG (Leverkusen, Germany), General Electric Company (Fairfield, CT), and Teijin Limited (Osaka, Japan). Molten vermiculite blank discs are commercially available from various sources such as Corning Incorporated (Corning, NY), Hoya Corporation (Tokyo, Japan), and Schott AG (Mainz, Germany).

碲 has a purity of 99.999% (Sigma Aldrich; St. Louis, MO; catalogue 452378, lot 01948ER), and the yttrium deposition system is an electron beam deposition system (model NRC3116; NRC Equipment Corp. (now Varian, Palo Alto, CA)) To implement. The system is equipped with a crystal sensor to measure the thickness of the deposited films. The carbon system was obtained from a carbon graphite target (99.999%; Kurt J. Lesker Company, part number EJTCXXX503A4).

RF sputtering was performed using a PVD 75 device (Kurt J. Lesker Company; Pittsburgh, PA). The system is constructed with an RF power source, three magnetron guns that hold a 3 inch (7.62 cm) target, and equipment for two sputtering gases. The targets are arranged in an upward sputter-up configuration, and most of the gates shield the targets of the three targets, and most of the substrates are mounted on a rotating platform that can be heated to 200 ° C, and the rotating platform is located Above the targets. Most of the experiments were carried out without actively heating the platform. Since there is no active heating, the temperature of the platform increases with the increase of sputtering time at 400w until the temperature reaches a maximum of about 60 ° C - 70 ° C. . The maximum temperature is reached after about 3 hours, and the initial temperature in the chamber prior to sputtering is typically about 27 ° C. The time, target, and sputtering source will vary as explained in the examples below.

Example 18: Preparation of Disc 95

A polycarbonate disc without a coating thereon having a diameter of 120 mm and a thickness of 0.6 mm was mounted on the platform in the PVD 75 apparatus. For the first layer on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 were} used as the sputtering gas and the total Kapman held at 3 mTorr was utilized. The pressure and the magnetron power set at 400 W RF were sputtered with a carbon graphite target for 30 minutes, and the resulting carbon film thickness was about 14 nm.

For the second layer on the disc, a 40 nm crucible was deposited using an electron beam deposition system. The basic pressure is 5 x 10 ^-5 Torr.

For the third and last layers on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 are} used as the sputtering gas and the total card maintained at 3 mTorr is utilized. The Puman pressure sputtered a carbon graphite target to emit plasma at 65 W above the graphite target and the power supplied to the gun rose to 200 W at a rate of 3 W/s. When the power set point arrives, the countdown starts for 1 hour. After the end of one hour of the countdown, the countdown was started for 15 minutes and the power supplied to the gun was increased to 400 W at a speed of 3 W/s. The gate was turned off after 15 minutes of countdown and the resulting carbon film thickness was approximately 9 nm.

The resulting disc has a polycarbonate support substrate, a carbon and carbon dioxide reactive material layer, a tantalum layer, and a second carbon and carbon dioxide reactive material layer.

Example 19: Preparation of Disc 98

A polycarbonate disc without a coating thereon having a diameter of 120 mm and a thickness of 0.6 mm was mounted on the platform in the PVD75 apparatus. For the first layer on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 were} used as the sputtering gas and the total Kapman held at 3 mTorr was utilized. The pressure and the magnetron power set at 400 W RF were sputtered with a carbon graphite target for 15 minutes, and the resulting carbon film thickness was about 7 nm.

For the second layer on the disc, a 40 nm crucible was deposited using an electron beam deposition system. The basic pressure is 5 x 10 ^-5 Torr.

For the third and last layers on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 are} used as the sputtering gas and the total card maintained at 3 mTorr is utilized. The Puman pressure sputtered a carbon graphite target to emit plasma at 65 W above the graphite target and the power supplied to the gun rose to 200 W at a rate of 3 W/s. When the power set point arrives, the countdown starts for 1 hour. After the end of one hour of the countdown, the countdown was started for 15 minutes and the power supplied to the gun was increased to 400 W at a speed of 3 W/s. The gate was turned off after 15 minutes of countdown and the resulting carbon film thickness was approximately 9 nm.

The resulting disc has a polycarbonate support substrate, a carbon and carbon dioxide reactive material layer, a tantalum layer, and a second carbon and carbon dioxide reactive material layer.

Example 20: Preparation of Disc 99

A polycarbonate disc having no coating thereon, a diameter of 120 mm and a thickness of 0.6 mm and having a groove depth of 170 nm was mounted on the platform in the PVD 75 apparatus. For the first layer on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 were} used as the sputtering gas and the total Kapman held at 3 mTorr was utilized. The pressure and the magnetron power set at 400 W RF were sputtered with a carbon graphite target for 15 minutes, and the resulting carbon film thickness was about 7 nm.

For the second layer on the disc, a 50 nm crucible was deposited using an electron beam deposition system. The basic pressure is 6 x 10 ^-5 Torr.

For the third and last layers on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 are} used as the sputtering gas and the total card maintained at 3 mTorr is utilized. The Puman pressure and the magnetron power set at 200 W RF were sputtered with a carbon graphite target for 30 minutes, and the resulting carbon film thickness was about 1 nm.

The resulting disc has a polycarbonate support substrate, a carbon and carbon dioxide reactive material layer, a tantalum layer, and a second carbon and carbon dioxide reactive material layer.

Example 21: Preparation of Disc 100

A polycarbonate disc having no coating thereon, a diameter of 120 mm and a thickness of 0.6 mm and having a groove depth of 170 nm was mounted on the platform in the PVD 75 apparatus. For the first layer on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 were} used as the sputtering gas and the total Kapman held at 3 mTorr was utilized. The pressure and the magnetron power set at 400 W RF were sputtered with a carbon graphite target for 30 minutes, and the resulting carbon film thickness was about 14 nm.

For the second layer on the disc, a 61 nm crucible was deposited using an electron beam deposition system. The basic pressure is 3 x 10 ^-5 Torr.

For the third and last layers on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 are} used as the sputtering gas and the total card maintained at 3 mTorr is utilized. The Puman pressure and the magnetron power set at 200 W RF were sputtered with a carbon graphite target for 30 minutes, and the resulting carbon film thickness was about 1 nm.

The resulting disc has a polycarbonate support substrate, a carbon and carbon dioxide reactive material layer, a tantalum layer, and a second carbon and carbon dioxide reactive material layer.

Example 22: Preparation of Disc 101

A polycarbonate disc having no coating thereon, a diameter of 120 mm and a thickness of 0.6 mm and having a groove depth of 170 nm was mounted on the platform in the PVD 75 apparatus. For the first layer on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 were} used as the sputtering gas and the total Kapman held at 3 mTorr was utilized. The pressure and the magnetron power set at 400 W RF were sputtered with a carbon graphite target for 30 minutes, and the resulting carbon film thickness was about 14 nm.

For the second layer on the disc, a 70 nm crucible was deposited using an electron beam deposition system. The basic pressure is 2 x 10 ^-5 Torr.

For the third and last layers on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 are} used as the sputtering gas and the total card maintained at 3 mTorr is utilized. The Puman pressure and the magnetron power set at 200 W RF were sputtered with a carbon graphite target for 30 minutes, and the resulting carbon film thickness was about 1 nm.

The resulting disc has a polycarbonate support substrate, a carbon and carbon dioxide reactive material layer, a tantalum layer, and a second carbon and carbon dioxide reactive material layer.

Example 23: Preparation of a disc 123

A polycarbonate disc having no coating thereon, a diameter of 120 mm and a thickness of 0.6 mm and having a groove depth of 60 nm was mounted on the platform in the PVD 75 apparatus. For the first layer on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 were} used as the sputtering gas and the total Kapman held at 3 mTorr was utilized. The pressure and the magnetron power set at 400W RF were sputtered with a carbon graphite target for 30 minutes. The Kapman pressure is a device parameter and the Kapman pressure value is close to the pressure in the plasma chamber. The resulting carbon film thickness was about 14 nm.

For the second layer on the disc, a 60 nm crucible was deposited using an electron beam deposition system. The basic pressure is 5 x 10 ^-5 Torr.

For the third and last layers on the disc, 98% (v/v) Ar and 2% (v/v) CO _{2 are} used as the sputtering gas and the total card maintained at 3 mTorr is utilized. The Puman pressure and the magnetron power set at 200 W RF were sputtered with a carbon graphite target for 30 minutes, and the resulting carbon film thickness was about 1 nm.

The resulting disc has a polycarbonate support substrate, a carbon and carbon dioxide reactive material layer, a tantalum layer, and a second carbon and carbon dioxide reactive material layer.

Example 24: General method for writing data to a disc

A Pulstec ODU1000 device (Pulstec Industrial Co., Ltd.; Hamamatsu-City; Japan) was used to mark the various discs with a diode laser set at a wavelength of 650 nm. All writes were performed at 1X speed (3.49 m/sec) and all writes were performed on a single track unless otherwise indicated. An HF signal was seen in all cases and most of the marks were actually observed using a microscope.

Example 25: Writing data to disc 95

Written to disc number 95 is performed at various power levels: 4 mW, 5 mW, 6 mW, 8 mW, 10 mW, 11 mW, 12 mW, 13 mW, 15 mW, 16 mW, and 20 mW. Using a trough and a multi-pulse at 33% load, the following mark lengths were successfully written and confirmed by microscopy: 3T (398 nm), 5T (663 nm), and 14T (1857 nm).

Example 26: Writing data to disc 98

Written to disc number 98 is performed at various power levels: 3 mW, 4 mW, 5 mW, 6 mW, 7 mW, 8 mW, 9 mW, 10 mW, 12 mW, 14 mW, 15 mW, 16 mW, and 20 mW. Using a multi-pulse mode with a 33% load, the following mark lengths were successfully written and confirmed by microscopy: 3T (398 nm), 4T (530 nm), 5T (663 nm), 7T (928 nm), and 14T (1857 nm).

Example 27: Writing data to disc 99

Written to disc number 99 is performed at various power levels: 3 mW, 3.5 mW, 4 mW, 4.5 mW, 5 mW, 6 mW, 7 mW, 8 mW, and 9 mW. Using a multi-pulse mode with a 33% load, the following mark lengths were successfully written and confirmed by microscopy: 3T (398 nm), 4T (530 nm), and 5T (663 nm).

Example 28: Writing data to the disc 100

The write to disc number 100 is performed at various power levels: 3.5 mW, 4 mW, 4.5 mW, 5 mW, 6 mW, and 7 mW. Using a multi-pulse mode with a 33% load, the following mark lengths were successfully written and confirmed by microscopy: 3T (398 nm), 4T (530 nm), 7T (928 nm), and 14T (1857 nm). It was also confirmed that a plurality of tracks having a length of all marks from 3T (398 nm) to 14T (1857 nm) were continuously written at 4 mW and confirmed.

Example 29: Writing data to disc 101

The writing to the disc number 101 is performed at various power levels: 4 mW, 5 mW, 6 mW, 7 mW, and 8 mW. Using a multi-pulse mode with a 33% load, the following mark lengths were successfully written and confirmed by microscopy: 3T (398 nm), 4T (530 nm), and 14T (1857 nm).

Example 30: Writing data to the disc 123

The disc number 123 is written at various power levels: 3.5 mW, 4 mW, 4.5 mW, and 8 mW. A multi-pulse mode was used with a 33% load, and a continuous write of a 3T (398 nm) mark length of 50 tracks was successfully written and confirmed by a microscope.

Example 31: Writing an excerpt to a disc

The following table extracts the various discs and the results obtained.

Example 32: Materials and Methods

Polycarbonate blank discs are commercially available from various sources such as Bayer Material Science AG (Leverkusen, Germany), General Electric Company (Fairfield, CT), and Teijin Limited (Osaka, Japan). Molten vermiculite blank discs are commercially available from various sources such as Corning Incorporated (Corning, NY), Hoya Corporation (Tokyo, Japan), and Schott AG (Mainz, Germany).

Sputter deposition was performed on the crucible using a 0.125 inch (3.175 mm) crucible target with a copper backsheet.

RF sputtering was performed using a PVD 75 device (Kurt J. Lesker Company; Pittsburgh, PA). The system is constructed with an RF power source, three magnetron guns that hold a 3 inch (7.62 cm) target, and equipment for two sputtering gases. The targets are arranged in an upward sputter-up configuration, and most of the gates shield the targets of the three targets, and most of the substrates are mounted on a rotating platform that can be heated to 200 ° C, and the rotating platform is located Above the targets. All experiments were performed without actively heating the platform, and the distance between the target and the substrate was 22 cm. The initial temperature in the chamber prior to sputtering is typically about 27 ° C. The time, target, and sputtering source will vary as explained in the examples below.

Example 33: Preparation of a disc series containing niobium and varying carbon dioxide films

A series of Te films with or without carbon dioxide were deposited on a set of polycarbonate discs using PVD 75, which had no coating on them and had a diameter of 120 nn and a thickness of 0.6 mm. For a series of Te films deposited on the discs, the following parameters remain unchanged: the target is sputtered, the power is 20 WDC, the Kapman pressure is 7 mTorr, and the substrate is rotated at 20 rpm. And the substrate was exposed to the sputtered target for 12 minutes. The concentration of carbon dioxide in the sputtering gas is varied such that each film in the series is sputtered at different concentrations of carbon dioxide in units of atomic % of the sputtering gas. The concentration of carbon dioxide is 0%, 1%, 2%, 2.3%, 2.5%, 2.7%, 3%, 4% and 10%. The remainder of the sputtering gas is argon.

Example 34: Evaluation of the effect of carbon dioxide in the Te data layer

The discs obtained from the foregoing examples were analyzed daily using a disc measuring system (Argus eco; dr. schwab Inspection Technology GmbH; Aichach, Germany), and the absorbance and reflectance of the films were plotted over time.

The absorbance results are shown in Fig. 7, and the data points in Fig. 7 are obtained by subtracting the initial absorbance (optical density) obtained on the same day that the disc is made from the absorbance measurement, and The mapping is plotted against the number of days starting with the first measurement made with the Argus device within one day of the disc creation.

The reflectance results are shown in Figure 8 and are listed below. The graph shows the percent reflectance of the discs relative to the number of days from the preparation of the discs.

The raw data sheets of Figures 7 and 8 are listed below. The number of days in the table is not an integer because they are calculated from the hours and minutes since the disc was produced.

Information obtained from discs with 0% carbon dioxide

Information obtained from discs with 1% carbon dioxide

Information obtained from discs with 2% carbon dioxide

Information obtained from discs with 2.3% carbon dioxide

Information obtained from discs with 2.5% carbon dioxide

Information obtained from discs with 2.7% carbon dioxide

Information obtained from discs with 3% carbon dioxide

Information obtained from discs with 4% carbon dioxide

Information obtained from discs with 10% carbon dioxide

The change in absorbance of the Te film produced by 10% CO ₂ in the sputtering gas over time is much smaller than that of other films, but it also has a lower reflectance value, which is at least partially Because of the higher transparency of the film. This higher transparency is shown by lower absorbance values than other films. Due to its better stability, this film is particularly attractive for use in archived discs.

Example 35: Preparation of Disc 356

The three films are sequentially deposited on a polycarbonate optical disk substrate having a plurality of grooves such that a layer of CO ₂ infused with CO ₂ is sandwiched between the two carbon layers. The substrate has a diameter of 120 mm and a thickness of 0.6 mm.

The substrate is mounted on the platform of the PVD 75 with a grooved side facing the guns. The first layer was deposited by sputtering a 1/8" thick graphite target at 400 W DC power and 7 mTorr Kapman pressure (Kurt J. Lesker Co., Clariton, PA, part number EJTCXXX503A2, Lot number VPU0140000). The sputtering gas was 98% (v/v) argon and 2% (v/v) carbon dioxide, and the substrate was rotated at 20 rpm. The substrate was exposed to the sputtered target for 10 minutes.

The second layer was deposited by sputtering a 1/8" thick Te target (Plasmaterials, lot number PLA5420787) with a copper backing plate at 20 W DC power and 7 mTorr Kapman pressure. It was 98% (v/v) argon and 2% (v/v) carbon dioxide, and the substrate was rotated at 20 rpm. The substrate was exposed to the sputtered target for 6 minutes and 2 seconds.

The deposition parameters of the third layer are the same as those of the first layer.

Disc 356 has a polycarbonate support substrate, a first 7 nm carbon layer, a 20 nm tantalum and carbon dioxide data layer, and a second 7 nm carbon layer.

Example 36: General method for writing data to a disc

A Pulstec ODU1000 device (Pulstec Industrial Co., Ltd.; Hamamatsu-City; Japan) was used to mark the diode laser set at a wavelength of 650 nm. All writes were performed at 1X speed (3.49 m/sec) and all writes were performed on a single track unless otherwise indicated. An HF signal was seen in all cases and most of the marks were actually observed using a microscope.

Example 37: Writing data to disc 356

Written to disc number 356, a mixed data format is repeatedly written to the disc at various power levels, and the power level is filtered to determine the set value that produces the minimum aggregate jitter value. The data versus clock jitter is measured relative to the temporal change of any pit front edge of a clock signal relative to the data-to-data jitter that is measured as the change in pit length. The table below shows the information obtained in the two areas of the disc.

These results show that the mixed data can be written to the disc and the write power can be optimized by monitoring the jitter value.

Example 38: Preparation of exemplary discs 911 and 912

The substrate is mounted on the platform of the PVD 75 with a grooved side facing the guns that rotate as they are deposited. The first layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJBPCU03A2, batch number VPU014670/4- 8-08); power is 400 W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 30 minutes. The SiO ₂ film thickness is about 35 nm.

The second layer is deposited by sputtering a 1/4" thick graphite target (Plasmaterials, Livermore, CA, lot number PLA489556); power is 400W DC, Kapman pressure is 7 mTorr; The main component is argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 15 minutes. The thickness of this carbon film is about 19 nm.

The third layer is deposited by sputtering a 1/8" thick Te target (Plasmaterials, lot number PLA489788) of a copper backing plate; a power of 20 W DC, a Kapman pressure of 7 mTorr; The main component of the gas is argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 5:23 minutes. This film thickness is about 20 nm.

The deposition conditions of the fourth layer were the same as those of the second layer, but the deposition time was 10 minutes. The fourth layer is deposited by sputtering a 1/4" thick graphite target (Plasmaterials, lot number PLA489556); the power is 400W DC, and the Kapman pressure is 7 mTorr; the main component of the sputtering gas is Argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 10 minutes. The thickness of this carbon film is about 13 nm.

Discs 911 and 912 have a polycarbonate support substrate, a 35 nm SiO ₂ intermediate dielectric layer, a first 19 nm carbon and carbon dioxide layer, a approximately 20 nm germanium and carbon dioxide data layer, and a second 13 nm carbon and carbon dioxide layer.

A second polycarbonate support was bonded to the discs using a Spaceline II DVD cable using an adhesive of 0.9-1.1 grams of Pancure 1503 rotated at 3500-3600 rpm. The adhesive is hardened at a hardening power of 4.5 kVA for 1.5-1.7 seconds.

Example 39: Exemplary discs 911 and 912 work well in commercially available players

The exemplary discs 911 and 912 are recorded in a manner that allows playback using a standard commercial DVD player, and the appropriate laser power setpoint and pulse mode values are obtained prior to writing.

The pre-write evaluation step includes a reflectance and a routine test of the resistance to read power induced modulation ("RPIM"). The reflectance test involves mapping the reflectivity of the surface of the disc at any interval from the smallest to the largest radial extent of the disc data region, which is achieved using a Pulstec ODU-1000 system, including the Pulstec ODU-1000 system. The ODU control unit, a analog-to-digital signal binaryizer, a multi-signal generator (MSG4) having an optical/mechanical disc drive unit, and a Yokogawa DL1640L digital oscilloscope, both of which operate under computer control. The test automation software deposits and records readings from the digital oscilloscope, and a RPIM study is performed using the same device. The RPIM evaluates the local reflectance of the disc for varying average impedance and for repeated, extended, low-level laser exposures such as 1.0 milliwatts. Both discs were evaluated by this pre-write.

After the pre-write test is completed, the preparatory power and write modes are optimized using the aforementioned device and a Yokogawa TIA520 time interval analyzer to evaluate the data being written during playback. The time interval analyzer provides an instant representation of a previously written data to guide adjustments to power and mode settings for subsequent write attempts. The ODU-1000 is used under manual control, and a standard test pattern containing a virtually random combination of all standard DVD marks and spaces is repeatedly written to the discs in various power and write modes. Make a note of the resulting average and standard deviation of each symbol length for each symbol type (3T-14T) after each write period, and use the deviation of these values from the nominal value as an indication of the required mode and/or laser write power adjustment. . The result of this repetitive work is an approximate decision on the optimal write power and mode setting for the disc. After the automatic test, the manual control method and power optimization are performed as described below.

Using an (n-2) multi-pulse DVD+R write mode, the true optimum power and the value of each parameter in this mode will vary slightly from disc to disc. An important metric, the combination, or "bucket", the data jitter on the clock will vary slightly from disc to disc. Since this jitter represents the standard deviation of the time points before and after the all veins in the virtual random test pattern, its minimization is the desired result of one of the optimization rituals. The jitter is measured for both the monorail performance and the multi-track performance of the isolation. After the laser write power is changed and the jitter of each power setting is measured, the minimum multi-track jitter observed is in the range of 4.8 ns to 5.24 ns. . The optimum power range is 15.0 to 16.0 mW and the write speed is standard 1x, constant linear velocity (CLV).

After the aforementioned optimization work, the standard DVD format data was successfully written to each of the three discs, one linked to one of the disc technologies introduced by Church of Jesus Christ of Latter-day Saints The DVD menu structure of the licensed multimedia content provided by Les Olson Company (a distributor of Sharp copiers and printers) and THX Ltd. is written to the ODU-1000 and an Eclipse Data Technologies image encoder unit. The disc. The data from the Eclipse encoder is graded by an Apogee Labs TTL to ECL converter and streamed through the Pulstec multi-signal generator to the ODU-1000 laser head, where it uses the previously derived write mode and The power setpoint is written on the prototype disc at 1xCLV.

After recording, the discs have been played intensively in several commercially available DVD players and have found no errors preventing the successful retrieval of the written material. This example demonstrates that video content can be written to the discs and that the discs can be played repeatedly in different commercially available DVD players.

Example 40: Preparation of Discs 944 and 945 with TeSe Alloy Data and Carbon Layer

The four films were sequentially deposited on a polycarbonate optical disk substrate [D27W40A-LB] having a tracking track having a diameter of 120 mm and a thickness of 0.6 mm. All four film systems were deposited without interrupting the vacuum.

The substrate is mounted on the platform of the PVD 75 with a grooved side facing the guns, the platform rotating as it is deposited. The first layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTSIO 2453A2, lot 11-24- 08/VPU026926); power is 400W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 36:52 minutes. The film thickness is about 45 nm.

The second layer is deposited by sputtering a 1/4" thick graphite target (Plasmaterials, Livermore, CA, lot number PLA489556); power is 400W DC, Kapman pressure is 7 mTorr; The main component is argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 13:46 minutes. The film thickness is about 19 nm.

The third layer is deposited by sputtering a 1/8" thickness target (Plasmaterials, Livermore, CA) containing Te, 78.4 at% and Se, 21.6 at% bonded to a copper backsheet. There is a portion that is sputtered by exposing the binder, the power applied to the cathode is 20 W DC, the Kapman pressure is 3 mTorr; the sputtering gas is Ar; the deposition time is 4:18 minutes. The film thickness is approximately 20 nm.

The fourth layer is deposited by sputtering a 1/4" thick graphite target (Plasmaterials, lot number PLA489556); power is 400W DC, Kapman pressure is 7 mTorr; the main component of the sputtering gas It is argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 9:25 minutes. The film thickness is about 13 nm.

The resulting disc had a polycarbonate support substrate, a 45 nm SiO ₂ dielectric interlayer, a 19 nm layer of carbon and carbon dioxide, an approximately 20 nm TeSe alloy data layer, and a 13 nm carbon and carbon dioxide layer.

Example 41: Characterization of Discs 944 and 945 with TeSe Alloy Data Layer

The TeSe alloy data discs were evaluated using the general methods described above with respect to the exemplary discs 911 and 912. Although the data token was successfully written to the discs, there is a significant "settling time" during which the jitter value changes for a few minutes after writing. These TeSe alloy data discs have been continually optimized to minimize stabilizing time effects.

Example 42: Preparation of a disc with chromium data and carbon layer

Four films were sequentially deposited on a grooved polycarbonate optical disk substrate having a diameter of 120 mm and a thickness of 0.6 mm. All four film systems were deposited without interrupting the vacuum.

The substrate is mounted on the platform of the PVD 75 with a grooved side facing the guns, the platform rotating as it is deposited. The first layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTSIO 2453A2, lot 11-24- 08/VPU026926); power is 400W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 44:12 minutes. The film thickness is about 45 nm.

The second layer is deposited by sputtering a 1/4" thick graphite target (Plasmaterials, Livermore, CA, lot number PLA489556); power is 400W DC, Kapman pressure is 7 mTorr; The main component is argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 15:20 minutes. The film thickness is about 19 nm.

The third layer is deposited by sputtering a 1/8" thick Cr target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTCRXX353A2, lot number L5791/D05/601713) The power is 20 W DC, the Kapman pressure is 3 mTorr; the sputtering gas is Ar; the deposition time is 2:49 minutes. The film thickness is about 20 nm.

The fourth layer is deposited by sputtering a 1/4" thick graphite target (Plasmaterials, lot number PLA489556); power is 400W DC, Kapman pressure is 7 mTorr; the main component of the sputtering gas It is argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 10:30 minutes. The film thickness is about 13 nm.

The resulting disc has a first polycarbonate support substrate, a 45 nm SiO ₂ dielectric interlayer, a 19 nm carbon and carbon dioxide layer, a 20 nm chromium data layer, a 13 nm carbon and carbon dioxide layer, and a second polycarbonate. Ester support substrate.

Example 43: Characterization of discs with chromium data layers and carbon layers

This disc is tested by a read power induced modulation ("RPIM") at greater than 3.5 mW, which indicates that the disc is extremely resistant to read power laser intensities. Both the 3T and 4T marks are made in the disc, but the quality of the mark is somewhat murmur. The write mode has not been optimized.

Example 44: Preparation and Analysis of Disc 966 with TeSe Data Layer but Missing Carbon Layer

The two films were sequentially deposited on a grooved polycarbonate optical disk substrate having a diameter of 120 mm and a thickness of 0.6 mm. All two membrane systems were deposited without interrupting the vacuum.

The substrate is mounted on the platform of the PVD 75 with a grooved side facing the guns, the platform rotating as it is deposited. The first layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTSIO 2453A2, lot 11-24- 08/VPU026926); power is 400W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 44:12 minutes. The film thickness is about 45 nm.

The second layer was deposited by sputtering a compound TeSe target (Plasmaterials, Livermore, CA, lot number PLA489556) with a ratio of Te ₇₈ Se ₂₂ . This film thickness is approximately 20 nm.

The resulting disc had a first polycarbonate support substrate, a 45 nm SiO ₂ dielectric interlayer, and a 20 nm Te ₇₈ Se ₂₂ data layer.

The disc was not subjected to the read power induced modulation ("RPIM") test at 0.8 mW, which indicates that the low read power used by the optical disc would destroy the TeSe alloy data layer in the absence of a carbon layer. After the basic test is not passed, the characterization of the disc is not further performed.

Example 45: Preparation and Analysis of Disc 967 with Te Data Layer but Missing Carbon Layer

The three films were sequentially deposited on a grooved polycarbonate optical disk substrate having a diameter of 120 mm and a thickness of 0.6 mm. All three membrane systems were deposited without interrupting the vacuum.

The substrate is mounted on the platform of the PVD 75 with a grooved side facing the guns, the platform rotating as it is deposited. The first layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTSIO 2453A2, lot 11-24- 08/VPU026926); power is 400W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 44:12 minutes. The film thickness is about 45 nm.

The second layer is deposited by sputtering a 1/8" thick Te target (Plasmaterials, lot number PLA489788) bonded to a copper backing plate; the power is 20 W DC, and the Kapman pressure is 7 mTorr; The main component of the sputtering gas is argon; the concentration of carbon dioxide in the sputtering gas is 2%; the deposition time is 5:23 minutes. This film thickness is about 20 nm.

The third layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTSIO 2453A2, lot 11-24- 08/VPU026926); power is 400W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 44:12 minutes. The film thickness is about 45 nm.

The resulting disc had a first polycarbonate support substrate, a 45 nm SiO ₂ dielectric interlayer, a 20 nm layer of tantalum and carbon dioxide, and a 45 nm SiO ₂ dielectric interlayer.

Example 46: Preparation and Analysis of Disc 968 with Carbon Layer but Missing a Data Layer

The three films were sequentially deposited on a grooved polycarbonate optical disk substrate having a diameter of 120 mm and a thickness of 0.6 mm. All three membrane systems were deposited without interrupting the vacuum.

The substrate is mounted on the platform of the PVD 75 with a grooved side facing the guns, the platform rotating as it is deposited. The first layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTSIO 2453A2, lot 11-24- 08/VPU026926); power is 400W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 44:12 minutes. The film thickness is about 45 nm.

The second layer is deposited by sputtering a 1/4" thick graphite target (Plasmaterials, Livermore, CA, lot number PLA489556); power is 400W DC, Kapman pressure is 7 mTorr; The main component is argon; the concentration of carbon dioxide in the sputtering gas is 2%. The film thickness is about 30 nm.

The third layer is deposited by sputtering a 1/8" thick SiO ₂ target bonded to a copper backsheet (Kurt J. Lesker Co., Clariton, PA, part number EJTSIO 2453A2, lot 11-24- 08/VPU026926); power is 400W RF, Kapman pressure is 3 mTorr; sputtering gas is composed of 100% Ar; deposition time is 44:12 minutes. The film thickness is about 45 nm.

The resulting disc had a first polycarbonate support substrate, a 45 nm SiO ₂ dielectric interlayer, a 30 nm layer of carbon and carbon dioxide, and a 45 nm SiO ₂ dielectric interlayer. The disc does not contain any data layers.

This disc can be tracked, but all attempts to write data to the disc completely fail.

All of the compositions and/or methods and/or processes and/or devices disclosed and claimed herein may be made and executed without undue experimentation. Although the compositions and methods of the present invention have been described in the preferred embodiments, those skilled in the art can understand that the compositions described herein can be made without departing from the spirit and scope of the invention. And / or methods and / or devices and / or processes and a variety of changes in the order of steps or steps of the methods. In particular, it will be appreciated that certain agents that are chemically and physically related may be substituted for the agents described herein and achieve the same or similar results. All of the similar substitutes and modifications that are known to those of ordinary skill in the art are considered to be within the scope and concept of the invention.

10. . . Support substrate

15. . . Data layer

20. . . Capture layer

25. . . Reflective layer

30. . . Reflection trapping layer

35. . . Diffusion barrier layer

40. . . Protective sealing barrier layer

45. . . Ultraviolet radiation barrier

50. . . Scratch resistant layer

55. . . Environmental protection layer

60. . . Data layer

65. . . Carbon layer

70. . . middle layer

75. . . First carbon layer

80. . . Second carbon layer

85. . . First support substrate

90. . . Second support substrate

95. . . First intermediate layer

100. . . Second intermediate layer

105. . . Metal material layer

110. . . First carbon material layer

115. . . Second carbon material layer

120. . . Data layer

Figure 1a shows an optical information medium having a support substrate and a data layer.

Figure 1b shows an optical information medium supporting a substrate, a data layer and a capture layer.

Figure 1c shows an optical information medium supporting a substrate, a data layer and a reflective layer.

Figure 1d shows an optical information medium of a support substrate, a data layer and a reflective capture layer.

Figure 1e shows an optical information medium of a support substrate, a diffusion barrier, a data layer and a reflective capture layer.

Figure 1f shows a support substrate, a diffusion barrier, a data layer, a reflective capture layer, and an optical information medium that protects the barrier barrier.

Figure 1g shows an environmental protection layer, a scratch-resistant layer, an ultraviolet blocking layer, a supporting substrate, a diffusion barrier, a data layer, a reflective capturing layer, and an optical information medium for protecting the sealing barrier.

Figure 2a shows an optical information medium having a support substrate, a data layer and a layer of carbon material.

Figure 2b shows an optical information medium having a support substrate, a layer of carbon material, and a data layer.

Figure 2c shows an optical information medium having a support substrate, at least one intermediate layer, a data layer, and a layer of carbon material.

Figure 2d shows an optical information medium having a support substrate, at least one intermediate layer, a layer of carbon material, and a data layer.

Figure 3a shows an optical information medium having a support substrate, a first carbon material layer, a data layer and a second carbon material layer.

Figure 3b shows an optical information medium having a support substrate, at least one intermediate layer, a first carbon material layer, a data layer and a second carbon material layer.

Figure 3c shows an optical information medium having a first support substrate, a data layer, a carbon material layer and a second support substrate.

Figure 3d shows an optical information medium having a first support substrate, a first carbon material layer, a data layer, a second carbon material layer and a second support substrate.

FIG. 3e shows an optical information having a first supporting substrate, a first intermediate layer, a first carbon material layer, a data layer, a second carbon material layer, a second intermediate layer, and a second supporting substrate. media.

Figure 4a shows an optical information medium having a support substrate, a layer of metallic material and a layer of carbon material.

Figure 4b shows a variation of the optical information medium shown in Figure 4a, wherein the location of the layer of metallic material and the layer of carbon material is reversed relative to the support substrate. The optical information medium has a support substrate, a carbon material layer and a metal material layer.

Figure 4c shows an optical information medium having a support substrate, one or more intermediate layers, a layer of metallic material and a layer of carbon material.

Figure 4d shows an optical information medium having a first support substrate, a first carbon material layer, a metal material layer, a second carbon material layer and a second support substrate.

Figure 5a shows an optical information medium having a substrate layer that is in contact with a layer of germanium/dioxa/carbon monoxide data.

Figure 5b shows an optical information medium having a substrate layer, at least one intermediate layer, and a germanium/dioxa/carbon monoxide data layer.

Figure 5c shows an optical information medium having a first substrate layer, a germanium/dioxa/carbon monoxide data layer, and a second substrate layer.

Figure 6 shows that as the concentration of carbon dioxide in the oxidizing gas increases, the optical density of the prepared carbon film decreases (or the optical transparency increases). The x-axis is the wavelength calculated in nm and the y-axis is the absorbance per thickness (1/nm). The line indicated by a square symbol represents 1% (v/v) carbon dioxide, the line represented by a diamond symbol represents 2% (v/v) carbon dioxide, and the line represented by a circular symbol represents 4% (v/v) carbon dioxide. .

Figure 7 shows a graph of the optical density of the tantalum film as a function of time compared to the tantalum and carbon dioxide film. The x-axis is the time in days, and the y-axis is the optical density (or absorbance) measured in proportion (OD/-OD _init ) / OD _init . The figure shows the addition of carbon dioxide to reduce the change due to oxidation. The square symbol represents the carbon dioxide without added carbon; the "x" symbol represents the addition of 1% carbon dioxide; the "diamond" symbol represents the addition of 2% carbon dioxide; the "filled circle" symbol represents the addition of 2.3% carbon dioxide; the "+" symbol represents the addition of 2.5% Carbon dioxide; the "one long stroke" symbol represents the addition of 2.7% carbon dioxide; the "*" symbol represents the addition of 3% carbon dioxide; the "triangle" symbol represents the addition of 4% carbon dioxide; and the "empty circle" symbol represents the addition of 10% carbon dioxide.

Fig. 8 is a graph showing the reflectance of the ruthenium film as a function of time compared to the ruthenium and carbon dioxide film. The x-axis is the time in days and the y-axis is the percent reflectivity. The square symbol represents the carbon dioxide without added carbon; the "x" symbol represents the addition of 1% carbon dioxide; the "diamond" symbol represents the addition of 2% carbon dioxide; the "filled circle" symbol represents the addition of 2.3% carbon dioxide; the "+" symbol represents the addition of 2.5% Carbon dioxide; the "one long stroke" symbol represents the addition of 2.7% carbon dioxide; the "*" symbol represents the addition of 3% carbon dioxide; the "triangle" symbol represents the addition of 4% carbon dioxide; and the "empty circle" symbol represents the addition of 10% carbon dioxide.

10. . . Support substrate

15. . . Data layer

Claims (35)

An archive optical information medium comprising: at least one support substrate; at least one data layer; and at least one carbon layer, at least one gas is injected, wherein a main component of the carbon layer is carbon and wherein the carbon layer is in contact with the data layer . The archived optical information medium of claim 1, wherein the data layer comprises an organic dye, a metal, or a metal alloy. For example, the archived optical information medium of claim 1 wherein the carbon layer comprises amorphous carbon, graphite amorphous carbon, tetrahedral amorphous carbon, diamond-like amorphous carbon, polymer-like amorphous carbon, glassy carbon, Like diamond carbon, or carbon black. An archived optical information medium as claimed in claim 1 includes a first carbon layer in contact with the data layer and a second carbon layer in contact with the data layer. The archive optical information medium of claim 1 further comprises at least one intermediate layer between the support substrate and the data layer. An archive optical information medium as claimed in claim 1, wherein the data layer includes one or more locations where data has been written. For example, the archived optical information medium of claim 1 of the patent scope, wherein the data layer comprises tantalum, a tantalum alloy, selenium, a selenium alloy, tin, a tin alloy, tantalum, a tantalum alloy, tantalum, a tantalum alloy, lead, Or a lead alloy. For example, the archive optical information medium of claim 1 of the patent scope, wherein the data layer comprises base metal or chrome metal. An archived optical information medium comprising: a first supporting substrate comprising a polycarbonate; a first dielectric layer in surface contact with the first supporting substrate; a first carbon layer implanted with at least one gas, and the first dielectric layer Contact, wherein the main component of the carbon layer is carbon; a metal material data layer is in contact with the first carbon material layer; a second carbon layer is injected with at least one gas and is in contact with the metal material layer; A second dielectric layer is in contact with the second carbon material layer. A method of preparing an archived optical information medium, the method comprising: providing a support substrate; applying a data layer; and applying a carbon layer implanted with at least one gas such that the carbon layer is in contact with the data layer, and wherein the carbon It is the main component of this carbon layer. The method of claim 10, wherein the applying a data layer step comprises sputtering of a target, reactive sputtering, electron beam evaporation, laser ablation, or chemical vapor deposition. The method of claim 10, wherein the step of applying a carbon layer comprises sputtering of a target, reactive sputtering, electron beam evaporation, laser ablation, or chemical vapor deposition. The method of claim 10, further comprising applying at least one intermediate layer such that the intermediate layer is in surface contact with both the support substrate and the data layer. The method of claim 10, further comprising applying a second carbon layer such that the second carbon layer is injected with at least one gas, and the data Level contact. A method for preparing an archive optical information medium, the method comprising: providing a first support substrate; applying a first dielectric layer such that the first dielectric layer is in surface contact with the first support substrate; a first carbon layer of at least one gas such that the first carbon layer is in contact with the first dielectric layer, wherein carbon is a main component of the carbon layer; applying a data layer such that the data layer is in contact with the first carbon layer Applying a second carbon layer such that the second carbon layer contacts the data layer; and applying a second dielectric layer implanted with at least one gas such that the second dielectric layer is in contact with the second carbon layer . An archived optical information medium as claimed in claim 1, further comprising: at least one data layer comprising: strontium; and injected carbon dioxide, carbon monoxide, or both carbon dioxide and carbon monoxide. The archived optical information medium of claim 16 further comprises at least one intermediate layer between the support substrate and the data layer. The archive optical information medium of claim 16 of the patent application includes a first support substrate and a second support substrate. An archived optical information medium as claimed in claim 16, wherein the data layer comprises a base metal (Te) or at least one tantalum alloy. An archive optical information medium as claimed in claim 16, wherein the data layer comprises Te _x Se _100-x , Te _x Se _100-x (where X is less than or equal to 95), Te ₈₆ Se ₁₄ , Te ₇₉ Se ₂₁ , Te _x Sb _100-x , Te _x Sb _100-x (where X is less than or equal to 95), Te _x Se _y Sb _z , Te _x Se _y Sb _z (where X+Y+Z=100), Te _x Se _y Sb _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Sb ₅ , Te _72.5 Se ₂₀ Sb _7.5 , Te ₃ Sb ₂ , Te _x Se _y In _z , Te _x Se _y In _z (where X+Y+Z=100), Te _x Se _y In _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), InTe ₃ , Te ₇₅ Se ₂₀ In ₅ , Te _72.5 Se ₂₀ In _7.5 , Te _x Se _y Pb _z , Te _x Se _y Pb _z (where X+Y+Z=100), Te _x Se _y Pb _z (where X+ Y+Z=100, Y is 0-30, and Z is 5-20), Te ₇₅ Se ₂₀ Pb ₅ , Te _72.5 Se ₂₀ Pb _7.5 , TePb, Te _x Se _y Sn _z , Te _x Se _y Sn _z ( Wherein X+Y+Z=100), Te _x Se _y Sn _z (where X+Y+Z=100, Y is 10-30, and Z is 5-20), Te ₇₅ Se ₂₀ Sn ₅ , Te _72.5 Se _{20 Sn 7.5, Te 3 Bi 2} , Te x Se y Bi z, Te x Se y Bi z ( wherein X + Y + Z = 100) , TeSn, Te x Se y Bi z ( wherein X + Y + Z = 100 Y is 10-30, and Z is _{5-20), Te 75 Se 20 Bi} 5, Te 72.5 Se 20 Bi 7.5, TeGeAs, TeGeSbS, TeO x Ge, TeO x Sn, Pb-Te-Se, Pb-Te- Sb, As-Te, As ₁₀ Te ₉₀ , As ₃₂ Te ₆₈ , Ge-Te, Ge ₁₀ Te ₉₀ , or CdTe. An archived optical information medium as claimed in claim 16, wherein the data layer comprises carbon dioxide and does not comprise carbon monoxide. For example, the archived optical information medium of claim 16 of the patent scope, wherein the medium The body has a higher oxidation resistance than the corresponding medium lacking carbon dioxide and carbon monoxide. A method of preparing an optical information medium as claimed in claim 15 of the patent application, the method comprising: applying a data layer comprising: ruthenium; and injected carbon dioxide, carbon monoxide, or both carbon dioxide and carbon monoxide. The method of claim 23, wherein the applying a data layer step comprises sputtering of a target, reactive sputtering, electron beam evaporation, laser ablation, or chemical vapor deposition. The method of claim 23, wherein the applying a data layer step comprises applying hydrazine in the presence of carbon dioxide but in the absence of carbon monoxide. The method of claim 23, wherein the applying a data layer step comprises applying hydrazine in the presence of about 1% (v/v) to about 50% (v/v) carbon dioxide or carbon monoxide. The method of claim 23, further comprising applying at least one intermediate layer such that the intermediate layer is in surface contact with both the support substrate and the data layer. The method of claim 23, further comprising applying a second support substrate. An archive optical information medium comprising: at least one support substrate; At least one data layer composed of carbon is implanted with at least one oxidizing gas. For example, the archived optical information medium of claim 29, wherein the data layer comprises carbon, amorphous carbon, diamond-like carbon, niobium carbide, boron carbide, boron nitride, tantalum, amorphous germanium, germanium, amorphous germanium, Or a composition thereof. An archived optical information medium as claimed in claim 29, wherein the gas lacks an oxygen atom. For example, the archived optical information medium of claim 29, wherein the gas is molecular hydrogen (H ₂ ), molecular nitrogen (N ₂ ), helium (He), argon (Ar), neon (Ne), krypton (Kr). , 氙 (Xe), chlorine (Cl ₂ ), and fluorine (F ₂ ). An archived optical information medium as claimed in claim 29, wherein the gas is an oxidizing gas. An archived optical information medium as claimed in claim 29, wherein the gas is carbon monoxide, carbon dioxide, molecular oxygen, ozone, nitrogen oxides, sulfur oxides, or a mixture thereof. For example, the archived optical information medium of claim 29, wherein the gas is carbon dioxide.