Nothing Special   »   [go: up one dir, main page]

TWI226808B - Circuit board structure and method fabricating the same - Google Patents

Circuit board structure and method fabricating the same Download PDF

Info

Publication number
TWI226808B
TWI226808B TW93105505A TW93105505A TWI226808B TW I226808 B TWI226808 B TW I226808B TW 93105505 A TW93105505 A TW 93105505A TW 93105505 A TW93105505 A TW 93105505A TW I226808 B TWI226808 B TW I226808B
Authority
TW
Taiwan
Prior art keywords
layer
circuit board
plated
item
patent application
Prior art date
Application number
TW93105505A
Other languages
Chinese (zh)
Other versions
TW200531578A (en
Inventor
Bin-Yang Chen
Chih-Liang Chu
Hsin-Ku Huang
Wei-Cheng Huang
Xian-Zhang Wang
Original Assignee
Phoenix Prec Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Phoenix Prec Technology Corp filed Critical Phoenix Prec Technology Corp
Priority to TW93105505A priority Critical patent/TWI226808B/en
Application granted granted Critical
Publication of TWI226808B publication Critical patent/TWI226808B/en
Publication of TW200531578A publication Critical patent/TW200531578A/en

Links

Landscapes

  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

A circuit board structure and a method for fabricating the same are proposed, wherein a core substrate formed with a metal layer on surfaces thereof and a plurality of plated through holes therein is provided. A conductive layer is formed on the surface of the terminal portions of the plated through holes, and a patterned circuit layer is formed on the core substrate by patterning the metal layer. An insulating layer is respectively formed on the surface of circuit layer with a plurality of openings, wherein at least an opening on one side of circuit board is formed to expose the terminal portion of the plated through hole and the remaining openings on the other side of circuit board are covered by a resist layer. After a metal layer is formed on the plated through hole within the opening, the resist layer is removed. By the arrangement, the metal layer can be selectively formed on the partial plated through holes for electrical connection pads.

Description

1226808 五、發明說明(1) —- ‘【發明所屬之技術領域】 本發明係關於-種電路板及其製&,尤指一種於多層 電路板中利用電錢導通孔結構以導電連接上、下層線路層 之電路板結構及其製法。 【先前技術】 隨著電子產業的蓬勃發展,電子產品亦逐漸邁入多功 能、高性能的研發趨勢。為滿足半導體封裝件高積集度( Integration)及微型化(Miniaturizat i〇n)的封裝需求, =供更多主、被動元件及線路載接,承載半導體晶片之電 馨板亦逐漸由雙層板演變成多層板(Multi —layer board) ,俾在有限的空間下,運用層間連接技術(Interlayer 二ο η n e c 11 ο η)來擴大電路板上可供利用的線路佈局面積, 藉此配a兩線路洽、度之積體電路(Integrated circuit)需 要,以在相同電路板單位面積下容納更多數量的線路及元 件。 斤為因應微處理器、晶片組與繪圖晶片等高效能晶片之 運异需要’電路板亦需提昇其傳遞晶片訊號、改善頻寬、 控制阻抗等功能,來成就高丨/ 〇數封裝件的發展。缺而, |符合半導體封裝件輕薄短小、多功能、高速度及高頻化 ▼開發方向,電路板已朝向細線路及小孔徑發展。現有電 路板製程從傳統100微米之線路尺寸:包括導線寬度(LiΜ Iidt1^、、、線路間距(SpaCe)及深寬比(AsPect r^tio) 等細減至3 0微米以下,並持續朝向更小的線路精度進行 _ _ i 1 _ Hi _ ‘瞧隱y i 11 HI In 1· 17659 全懋.ptd 1226808 五、發明說明(2) 為提高電路板之佈線精密度,業界發展出一種增層技 術(Build-up),亦即在一核心電路板(Core circuit boar d )表面利用線路增層技術交互堆疊多層絕緣層及線路 層,並於該絕緣層中開設導電盲孔(C ο n d u c t i v e v i a )以供 上下層線路之間電性連接。其中,線路增層製程係影響電 路板線路密度的關鍵,依照現行技術,業者多以增層製程 來製作多層電路板。 請參閱第1 A至1 C圖,係採用一例如半加成法(1226808 V. Description of the invention (1) --- 'Technical field to which the invention belongs] The present invention relates to a circuit board and a manufacturing method thereof, particularly a conductive connection using a through-hole structure of an electric money in a multilayer circuit board. 3. The circuit board structure of the lower circuit layer and its manufacturing method. [Previous technology] With the vigorous development of the electronics industry, electronic products have gradually entered the trend of multi-function and high-performance research and development. In order to meet the packaging requirements of high integration and miniaturization of semiconductor packages, for more active and passive components and circuits, the electrical board that carries semiconductor wafers has also gradually changed from a double layer The board has evolved into a multi-layer board. In a limited space, the interlayer connection technology (Interlayer II ο η nec 11 ο η) is used to expand the available circuit layout area on the circuit board. The integrated circuit of the two circuits is required to accommodate a larger number of circuits and components under the same unit area of the circuit board. In response to the needs of high-performance chips such as microprocessors, chip sets, and graphics chips, the circuit board also needs to improve its functions of transmitting chip signals, improving bandwidth, and controlling impedance to achieve high- / 0-number packages. development of. Without it, | conforms to the lightness and shortness of semiconductor packages, multi-functionality, high speed and high frequency ▼ In the development direction, circuit boards have been developed towards fine lines and small apertures. The existing circuit board manufacturing process has been reduced from the traditional 100 micron circuit size: including the wire width (LiM Iidt1 ^ ,,, line spacing (SpaCe), and aspect ratio (AsPect r ^ tio), etc.) to less than 30 microns, and continue to move towards more Small line accuracy _ _ i 1 _ Hi _ 'See hidden yi 11 HI In 1 · 17659 full 懋 .ptd 1226808 V. Description of the invention (2) In order to improve the precision of the wiring of the circuit board, the industry has developed a layering technology (Build-up), that is, a multi-layer insulation layer and a circuit layer are alternately stacked on a surface of a core circuit board (Core circuit boar d) by using a line increasing technology, and a conductive blind hole (C ο nductivevia) is opened in the insulation layer to Provides electrical connection between upper and lower layers of the circuit. Among them, the layer increase process is the key to affect the circuit board circuit density. According to the current technology, the industry mostly uses the layer increase process to make multilayer circuit boards. Please refer to Figures 1A to 1C , Using a method such as semi-additive (

Semi-additive process,SAP )之線路增層製程,首先, 提供一核心電路板1 0,並在其表面形成一絕緣層1 1,利用 雷射鑽孔(L a s e r d r i 1 1 i n g )技術於該絕緣層1 1上形成開孔 1 1 0,以連通該核心電路板1 0之内層線路層1 2 (如第1 A圖所 示)。接著,於該絕緣層1 1上以無電解鍍銅方式形成一導 電晶種層1 3,在該晶種層1 3上施加一圖案化阻層1 4後進行 電鍍,以於該晶種層1 3表面形成圖案化線路層1 5 (如第1 B 圖所示)。之後,剝離該阻層1 4並進行蝕刻,以移除先前 覆蓋於阻層1 4下之晶種層1 3 (如第1 C圖所示);如此,運用 此等步驟重複形成絕緣層及增層線路層,即製成一具有多 層線路結構之電路板。 惟,按一般習用藉由增層方式所製作之多層電路板, 若電子訊號欲由電路板上層傳送至下層時,該訊號必須從 上部增層線路層、上部線路層間之導電盲孔、而至核心電 路板上層線路層,再穿過該核心電路板内部之電鍍導通孔 (Plated through hole,PTH)、核心電路板下層線路層、Semi-additive process (SAP). First, a core circuit board 10 is provided, and an insulating layer 11 is formed on the surface. A laser drilling (Laserdri 1 1 ing) technology is used for the insulation. An opening 1 1 0 is formed on the layer 11 to communicate with the inner circuit layer 1 2 of the core circuit board 10 (as shown in FIG. 1A). Next, a conductive seed layer 13 is formed on the insulating layer 11 by electroless copper plating, and a patterned resist layer 14 is applied on the seed layer 13 to perform electroplating on the seed layer. 1 3 A patterned circuit layer 1 5 is formed on the surface (as shown in FIG. 1B). After that, the resist layer 14 is peeled off and etched to remove the seed layer 1 3 previously covered under the resist layer 14 (as shown in FIG. 1C). In this way, using these steps to repeatedly form the insulating layer and Adding a circuit layer is to make a circuit board with a multilayer circuit structure. However, in the conventional multi-layer circuit board produced by the build-up method, if the electronic signal is to be transmitted from the upper layer of the circuit board to the lower layer, the signal must be from the upper build-up circuit layer, the conductive blind hole between the upper circuit layers, to The core circuit board has an upper circuit layer, and then passes through a plated through hole (PTH) inside the core circuit board, the lower circuit layer of the core circuit board,

17659 全懋.ptd 第11頁 1226808 五、發明說明(3) -下部增層線路層間之導電盲孔及下部增層線路層,方抵達 電路板下層。訊號傳遞路徑過長,易造成電感增強而導致 串擾(Cross-talk)或雜訊(Noise)產生,損及電性傳 輸品質。另,由於核心電路板中形成有多數電鍍導通孔, 而於後續在該核心電路板上、下表面所形成之增層線路層 製作其圖案化線路層時,必須自電鍍導通孔延伸出連接墊 (Pad)空間,藉以形成導電盲孔(Conductive via),如此 不僅浪費電路板佈線面積,不利於微型化封裝趨勢,更會 因為線路佈局時要閃避電鍍導通孔位置而影響到電路板空 運用的靈活度。 — 再者,或有直接在電鍍導通孔上形成導電盲孔之方式 _,惟在該電鍍導通孔上欲直接形成導電盲孔時,必須先在 具電鍍導通孔之整體電路板表面上形成一金屬層,而為供 後續在該電鍍導通孔上形成導電盲孔,因而需在該電鍍導 通孔之塞孔樹脂上形成一足夠厚度之金屬層,以避免後續 製程中,金屬層受塞孔樹脂影響而產生裂損甚或分離,惟 ,由於該金屬層係同時形成於該電路板整體表面,因此, 常由於該金屬層之厚度過厚或厚度不均等問題,導致後續 藉由例如蝕刻等圖案化製程中,形成導電線路及電性連接 之精度困擾,而無法形成一縝密之細線路結構。 " 而由於可縮小積體電路(I C )面積且具有高密度與多接 腳化特性的等封裝件已日漸成為封裝市場上的主流,且電 路板製程佔有封裝成本的20%至50%,因此在半導體晶片之 積體電路製程已縮小至0 · 0 9 // m且封裝尺寸亦不斷縮小至17659 Quan 懋 .ptd Page 11 1226808 V. Description of the invention (3)-The conductive blind holes between the lower build-up circuit layers and the lower build-up circuit layer arrive at the lower layer of the circuit board. The signal transmission path is too long, which may cause the increase of inductance and cause cross-talk or noise, which will damage the quality of electrical transmission. In addition, since most of the plated-through holes are formed in the core circuit board, the connection pads must be extended from the plated-through holes when the patterned circuit layer is formed in the subsequent layered circuit layer formed on the core circuit board and the lower surface. (Pad) space to form a conductive via, which not only wastes the wiring area of the circuit board, is not conducive to the trend of miniaturization packaging, but also affects the empty use of the circuit board because of the need to avoid the position of the plated-through holes in the circuit layout. flexibility. — Furthermore, there may be a way to form conductive blind vias directly on the plated vias. However, if conductive blind vias are to be formed directly on the plated vias, a surface of the entire circuit board with plated vias must first be formed. Metal layer, and in order to form conductive blind holes in the plated vias, a metal layer of sufficient thickness must be formed on the plug hole resin of the plated vias to prevent the metal layer from being subject to plug hole resin in subsequent processes It can cause cracks or even separation. However, because the metal layer is formed on the entire surface of the circuit board at the same time, often the thickness of the metal layer is too thick or the thickness is uneven, resulting in subsequent patterning by, for example, etching. In the manufacturing process, the precision of forming conductive lines and electrical connections is troubled, and a dense and fine line structure cannot be formed. " As packages that can reduce the area of integrated circuits (IC) and have high density and multi-pin characteristics have gradually become the mainstream in the packaging market, and the circuit board manufacturing process accounts for 20% to 50% of the packaging cost, Therefore, the integrated circuit manufacturing process on semiconductor wafers has been reduced to 0 · 0 9 // m and the package size has been continuously reduced to

17659 全懋.ptd 第12頁 1226808 五、發明說明(4) 幾乎與晶片同大(約僅為晶片之1 · 2倍)時,如何開發可與 其格配的細線路(F 1 n e c i r c u i t)與高線路密度之電路板結 構’同時不致提高過多製造成本,無疑是半導體產業乃至 其他相關電子產業進入下一世代技術之重要研發課題。 【發明内容】 II於以上所述習知技術之缺點,本發明之主要目的在 於提供一種電路板結構及其製法,係可直接在電鍍導通孔 上形成電性連接端,同時提供電路板其餘電性連接端與導 電線路具縝密之細線路結構。 本發明之再一目的在於提供一種電路板結構及其製法 ’藉以縮短導電盲孔佈線空間,並供該導電盲孔鍍層與電 鍵導通孔形成較佳之電性連接關係。 本發明之又一目的在於提供一種電路板結構及其製法 ’藉以縮短訊號傳輸路徑,以避免串擾、雜訊之產生而進 一步提昇電路板之電性品質。 本發明之又一目的在於提供一種電路板結構及其製法 ’藉以擴大電路板的線路佈局面積,並且提高層間線路( Inte]:layer circuits )之佈局靈活性。 u為達成上述及其他目的,本發明揭露一種電路板結構 之製法,/係包括:提供一芯層板,該芯層板表面具有金屬 層$且形成有多數之電鍍導通孔;於顯露出該芯層板之電 鍵導通孔端部表面形成導電層;圖案化該芯層板^面之金 屬層以形成一圖案化線路結構;於該線路結構上覆蓋一絕 緣層’共使該絕緣層形成有複數個開口,且至少一 ^ 口係17659 全懋 .ptd Page 12 1226808 V. Description of the invention (4) When it is almost the same size as a chip (about 1 or 2 times as large as a chip), how to develop a fine circuit (F 1 necircuit) and high The circuit board structure of the circuit density 'at the same time does not increase excessive manufacturing costs, which is undoubtedly an important R & D issue for the semiconductor industry and other related electronics industries to enter the next generation of technology. [Summary of the Invention] II. The disadvantages of the conventional techniques described above. The main purpose of the present invention is to provide a circuit board structure and a manufacturing method thereof, which can directly form an electrical connection end on a plated through hole while providing the remaining power of the circuit board. The sexual connection end and the conductive circuit have a fine and thin circuit structure. Another object of the present invention is to provide a circuit board structure and a method for manufacturing the same, thereby shortening the wiring space of a conductive blind hole, and forming a better electrical connection relationship between the conductive blind hole plating layer and the key via. Another object of the present invention is to provide a circuit board structure and a manufacturing method thereof, thereby shortening a signal transmission path to avoid crosstalk and noise, and further improve the electrical quality of the circuit board. Another object of the present invention is to provide a circuit board structure and a manufacturing method thereof, thereby increasing the circuit layout area of the circuit board, and improving the layout flexibility of interlayer circuits (Inte): layer circuits. u In order to achieve the above and other objectives, the present invention discloses a method for manufacturing a circuit board structure, which includes: providing a core board, the core board having a metal layer on the surface thereof and forming a plurality of plated through-holes; A conductive layer is formed on the end surface of the key via hole of the core board; the metal layer on the surface of the core board is patterned to form a patterned circuit structure; and an insulation layer is covered on the circuit structure to form the insulation layer. A plurality of openings, and at least one ^

17659全想.ptd17659 Think All.ptd

第13頁 1226808 . —~^ 五、發明說明(5) 外露出該電鍍導通孔端部,並形成一阻層以覆蓋住另一表 面其餘開口;於外露出該絕緣層開口之電鍍導通孔端部形 成一金屬層;以及移除該阻層。如此,即可選擇性在部分 之電鍍導通孔上直接形成一供後續作用為電性連接端之金 屬層。之後,復可在顯露出該絕緣層開口之線路結構部分 (即供後續作為該電路板與外部電性導接之電性連接端) 表面上形成一金屬保護層,俾供該電路板得以有效與導電 元件電性連接,而該絕緣層即可為一拒銲層。 該電鍍導通孔端部表面上之導電層可透過直接鍍覆方 (Direct plating,DP)以在該電鑛導通孔之塞孔絕緣 —部分形成一例如鈀之導電膜,或利用化學沈積方式以在該 電鍍導通孔之塞孔絕緣部分形成一例如銅之導電膜;之後 亦或可利用電鍍方式於該芯層板整體表面形成一金屬薄層 ,俾於後續得以透過電鍍方式而在該電鍍導通孔之端部上 直接形成一作為電性連接端之金屬層,復可利用電鍍導線 或化學沈積等方式,以在外露出圖案化絕緣層(如拒銲層 )之電性連接端上形成金屬保護層,以保護該電性連接端 避免受外界環境侵害,並提供其與導電元件(如銲線、錫 球、或金屬凸塊等)間良好之電性連接。此外,在該電鍍 通孔之端部形成電性連接端後,亦可作為後續線路增層 結構中承接導電盲孔之用,俾得以直接在電鍍導通孔上直 接形成導電盲孔,以縮短導電途徑,且有效增加線路佈設 空間,提升線路佈局靈活度,之後,復可持續進行線路增 層製程,俾形成一具有多層線路結構之電路板。Page 13 1226808. — ~ ^ V. Description of the invention (5) The end of the plated through hole is exposed and a barrier layer is formed to cover the remaining openings on the other surface; the plated through hole end of the insulation layer opening is exposed outside Forming a metal layer; and removing the resist layer. In this way, a metal layer can be selectively formed directly on some of the plated through holes for subsequent use as an electrical connection terminal. After that, a metal protective layer can be formed on the surface of the circuit structure part (that is, the electrical connection terminal for the subsequent electrical connection between the circuit board and the outside) that exposes the opening of the insulation layer, so that the circuit board can be effectively used. It is electrically connected to the conductive element, and the insulating layer can be a solder resist layer. The conductive layer on the surface of the end of the plated via hole can be insulated by direct plating (DP) in the plug hole of the electric mine via—partially forming a conductive film such as palladium, or by chemical deposition to A conductive film, such as copper, is formed on the plug-hole insulation portion of the plated-through hole; afterwards, a thin metal layer may be formed on the entire surface of the core board by electroplating, which can be subsequently conducted through the electroplating through the electroplating A metal layer as an electrical connection terminal is directly formed on the end of the hole, and a metal protection can be formed on the electrical connection terminal of the patterned insulating layer (such as solder resist layer) by using electroplated wires or chemical deposition. Layer to protect the electrical connection end from the external environment and provide a good electrical connection between the electrical connection end and the conductive element (such as a wire, a solder ball, or a metal bump). In addition, after the electrical connection end is formed at the end of the plated through hole, it can also be used as a conductive blind hole in the subsequent layer buildup structure, so that a conductive blind hole can be directly formed on the plated through hole to shorten the conductivity. Approach, and effectively increase the layout space of the circuit, improve the flexibility of the layout of the circuit, and then continue to carry out the process of layer increase to form a circuit board with a multilayer circuit structure.

17659 全懋.ptd 第14頁 1226808 五、發明說明(6)17659 全懋 .ptd Page 14 1226808 V. Description of Invention (6)

亦即 層覆蓋住 孔之端部 線路之製 由在電鍍 盲孔所需 有效提升 此外 ,係包括 數貫穿該 具有多數 性連接端 形成在該 出該電性 部之電性 絕緣層開 成前段製 欲形成細 形成金屬 程,同時 導通孔上 之電性連 線路佈線 ,經前述 :一芯層 芯層板之 之導電線 係形成於 線路結構 連接端, 連接端; 口之電性 程之多層 述製程 線路之層,而 更可進 所形成 接端之 之密度製程, 板,其 電鍍導 路與電 該電鍍 上,該 ’ q二盯 /百 /人 pi 區域,严選擇性於部分電鑛導通 不致影響其餘線路佈局空間與細 一步應用在線路增層製程中,藉 之電性連接端,以減少承接導電 設置與接線所佔電路板空間,俾 本發明亦揭 表面形成有 通孔,其中 鍍導通孔電 導通孔上; 絕緣層形成 且至少一開口係對 以及一金屬保護層 連接端上表面。另 電路板。 示出一種電 圖案化線路 ’該圖案化 性導通,而 一圖案化絕 有複數個開 應至該電鍍 ’係形成於 ’該芯層板 路板結構 結構與多 線路結構 至少一電 緣層,係 口以外露 導通孔端 外露出該 可為一完 ,t ’藉由本發明之電路板結構及其製法,係可選擇 性在部分欲形成電性連接端之電鍍導通孔 简I續接置有導電元件,俾提供 、〜Y 兀〗牛(半導體晶片或電路板)之電性導接,亦或 Z3 3 ‘通孔上之電性連接端直接形成有線路增層結 • 士 “目孔以減少習知形成導電盲孔(Conductive 才所而延伸出連接墊(P a d )之空間,藉以增加佈線That is, the system of the end portion of the layer covering the hole is effectively improved by the need to plate the blind hole. In addition, it includes a number of electrical insulation layers formed through the electrical part that pass through the plurality of connection ends to the front part. Forming a fine forming metal process, and at the same time electrically connecting the wiring on the vias, through the foregoing: a core layer of the core board's conductive line is formed at the connection end of the circuit structure, the connection end; the multilayer electrical process of the mouth The layer of the process line can be entered into the density process of the formed terminals. The plate, its plating guide and the electroplating, the 'q two-star / 100 / person pi area is strictly selective for some electric ore conduction. It will not affect the layout space of the remaining circuits and apply it in a step-by-step process in the layer build-up process. The electrical connection end is used to reduce the circuit board space occupied by the conductive settings and wiring. The present invention also discloses through-holes formed on the surface. The via is electrically conductive; the insulating layer is formed and at least one opening is paired and an upper surface of the connection end of the metal protective layer. Another circuit board. Shows an electrically patterned circuit 'the patterning is conductive, and a patterning must have a plurality of contacts to the plating' formed on 'the core layer circuit board structure structure and the multi-circuit structure at least one electrical edge layer, The exposure of the exposed through-hole end outside the system port may be completed. T 'Through the circuit board structure and the manufacturing method of the present invention, the plated through-holes which are to be electrically connected to the electrical connection end can be selectively connected. conductive elements, serve to provide, ~y Wu〗 bovine (a semiconductor wafer or a circuit board) of electrically conductive connection, or will Z3 3 'is electrically connected to the end of the through hole is formed directly by layer wiring junction • Disabled "mesh holes Reduce the space for forming conductive blind holes (Conductive only) to extend the connection pad (P ad) to increase wiring

17659全懋.ptd 第15頁 1226808 五、發明說明(7) -路密度與靈活性,並可縮短導電路徑,減少電感、串擾及 雜訊產生;此外,該電鍍導通孔上之電性連接端係於製程 中獨立形成,而不影響該電路板導電線路之製程,藉以避 免習知技術中在電鍍導通孔上欲形成電性連接端時,必需 在整體電路板上形成一厚度過厚或厚度不均之金屬層,導 致後續在圖案化製程中形成導電線路及電性連接端之精度 困擾,而無法形成一具細線路結構之電路板等缺失,而得 以提供一具細線路(F i n e c i r c u i t)與高佈線密度之電路 板。 _實施方式】 以下係藉由特定的具體實施例說明本發明之實施方式 ?熟習此技藝之人士可由本說明書所揭示之内容輕易地瞭 解本發明之其他優點與功效。本發明亦可藉由其他不同的 具體實施例加以施行或應用,本說明書中的各項細節亦可 基於不同觀點與應用,在不悖離本發明之精神下進行各種 修飾與變更。 以下即以第2A圖至第2K圖詳細說明本發明之電路板結 構及其製法之較佳實施例。其中,須注意的是,該等圖式 均為簡化之示意圖,僅以示意方式說明本發明之電路板架 % 。惟該等圖式僅顯示與本發明有關之元件,其所顯示之 元件非為實際實施時之態樣,其實際實施時之元件數目、 形狀及尺寸比例為一種選擇性之設計,且其元件佈局型態 可能更行複雜。 如第2 A及2 B圖所示,首先,提供一表面形成有金屬薄17659 全懋 .ptd Page 15 1226808 V. Description of the invention (7)-Circuit density and flexibility, and can shorten the conductive path, reduce inductance, crosstalk and noise generation; In addition, the electrical connection terminal on the plated through hole It is formed independently in the manufacturing process without affecting the manufacturing process of the conductive circuit of the circuit board, so as to avoid the need to form an electrical connection end on the plated through hole in the conventional technology, it is necessary to form an excessive thickness or thickness on the overall circuit board. The uneven metal layer causes the subsequent precision problems of forming conductive lines and electrical connection terminals in the patterning process, and the lack of a circuit board with a fine circuit structure, etc., can provide a fine circuit. And high wiring density circuit board. _Embodiment] The following is a description of specific embodiments of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied by other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the spirit of the present invention. Hereinafter, the preferred embodiments of the circuit board structure and the manufacturing method of the present invention will be described in detail with reference to FIGS. 2A to 2K. Among them, it should be noted that these drawings are simplified schematic diagrams, and only the schematic description of the circuit board rack of the present invention is shown. However, the drawings only show the elements related to the present invention. The elements shown are not the actual implementation. The number, shape, and size ratio of the elements during actual implementation are an optional design. The layout pattern may be more complicated. As shown in Figures 2A and 2B, first, a surface is provided with a thin metal

17659 全懋.ptd 第16頁 1226808 五、發明說明(8) 層之芯層板2 0,該芯層板2 0亦可為一完成前處理之多層電 路板。於本實施例之圖式中,該公層板2 〇係由、纟巴緣層 2 0 〇及形成於該絕緣層2 0 0表面之金屬薄層2 0 1所構成;復 以機械或雷射鑽孔等方式於該芯層板20中鑽設多個貫穿孔 2 0 2 (如第2 B圖所示)。其中,該絕緣層2 〇 〇可為環氧樹脂 (Epoxy resin)、聚乙酿胺(P〇lyimide)、氧酉曰( C y a n a t e E s t e r )、玻璃纖維、雙順丁烯二酸醯亞胺/三氮 陕(Bismaleimide Triazine,BT)或混合環氧樹脂與玻璃 纖維之FR5材質所製成,該金屬薄層20 1一般係以導電性較 佳之銅(C u )為主,以作為訊號傳遞的導線材料,且該金屬 薄層2 0 1可先壓合或沉積於該絕緣層2 0 0上’或使用樹脂壓 合銅箔(Resin coated copper, RCC)予以製作。本實施例 採用一樹脂壓合銅箔(RCC)為例進行說明。 如第2C圖所示,接著,利用物理氣相沈積(PVD)、 化學氣相沈積(CVD)、無電電鍍或化學沈積等方式,例 如濺鑛(Sputtering)、蒸鍵(Evaporation)、電孤蒸 氣沈積(Arc vapor deposition)、離子束濺鍍(I〇n beam sputter ing)、雷射熔散沈積(Lasker ab 1 at i on deposition)、電漿忙進之化學氣相沈積或無電電錢等, 以於該芯層板2 0及其貫穿孔2 〇 2表面形成一導電層(未圖示 ),俾藉由該導電層作為電流傳導路徑,以在該芯層板2 〇 表面上以及於該貫穿孔2 0 2孔壁上電鍍形成有一具足夠p 度之金屬層203。 予 如第2D圖所示,復以一填充材2〇4(如油墨樹脂等)填17659 Quan 懋 .ptd Page 16 1226808 V. Description of the Invention (8) The core board 20 is a layer, and the core board 20 can also be a multi-layer circuit board with pre-processing completed. In the drawing of this embodiment, the male layer board 20 is composed of a sloping edge layer 200 and a thin metal layer 201 formed on the surface of the insulating layer 200; furthermore, mechanical or lightning A plurality of through holes 2 0 2 are drilled in the core board 20 by a method such as shot drilling (as shown in FIG. 2B). Wherein, the insulating layer 2000 may be epoxy resin, Polyimide, Cyanate Ester, glass fiber, and bismaleimide diimide. / Triazine (Bismaleimide Triazine, BT) or a mixture of epoxy resin and glass fiber FR5 material, the metal thin layer 20 1 is generally mainly conductive copper (C u), as a signal transmission And the metal thin layer 201 can be first laminated or deposited on the insulating layer 200 'or made of resin-coated copper foil (Resin coated copper, RCC). This embodiment is described by using a resin laminated copper foil (RCC) as an example. As shown in Figure 2C, next, physical vapor deposition (PVD), chemical vapor deposition (CVD), electroless plating, or chemical deposition are used, such as sputtering, evaporation, and electrically isolated vapor. Arc vapor deposition, ion beam sputtering, laser fusing deposition (Lasker ab 1 at i on deposition), chemical vapor deposition where plasma is busy or no electricity, etc. A conductive layer (not shown) is formed on the surface of the core board 20 and its through holes 2. The conductive layer is used as a current conduction path to form a conductive layer on the surface of the core board 20 and the conductive layer. A metal layer 203 having a sufficient p degree is formed on the wall of the through hole 202 by electroplating. As shown in FIG. 2D, fill with a filling material 204 (such as ink resin, etc.)

17659 全懋.ptd 第17頁 1226808 五、發明說明(9) 滿該貫穿孔2 0 2之殘留空隙,俾形成一電鍍導通孔(PTH ) 2 0 5,藉以電性導通該芯層板2 0上下表面之金屬層2 0 3。 如第2 E圖所示,於顯露出該芯層板2 0之電鍍導通孔 20 5端部表面形成一導電層。其可透過無電電鍍等方式先 在該芯層板2 0之表面形成一導電層(未圖示),俾藉由該導 電層作為電流傳導路徑,以在該芯層板2 0表面(包含該電 鑛導通孔2 0 5之填充材2 0 4端部)上電鍍形成一例如銅(Cu ) 之導電薄層21 (厚度通常可為3至l〇A m)。此外,如第2E, 圖所示,亦可於該芯層板2 0上進行直接鍍覆方式(D i r e c t 1 a t i n g, D P )等製程,以在該芯層板之表面上形成一例如 纪(P d)之導電膜2 0 3 a,再經化學剝除製程,以使該妃金屬 層依附於該電鍍導通孔2 0 5之填充材2 04端部表面;亦或進 行化學銅等製程,以使該電鍍導通孔2 0 5之填充材2 0 4端部 表面覆蓋一導電膜203a。 其中,該電鍍導通孔20 5之填充 材20 4端部表面所形成之導電薄層21或導電膜203a,主要 係作為電流傳導路徑,俾於後續進行電鍍製程時,得以選 擇性在該電鐘導通孔2 0 5上形成有電鑛金屬層。以下後續 製程說明,主要係以在該芯層板2 0上形成一例如鋼(Cu )之 電薄層2 1加以說明,而於該電鍍導通孔2 0 5之填充材2 0 4 %部表面形成可如鈀或鋼之導電膜2 0 3 a,其後續製程係相 近於以下所述之製程步驟,故於此不再多所贅述,先予敘 明。 如第2F圖所示,進行線路圖案化製程,以於該芯層板 表面之金屬層以形成一圖案化線路結構。其係可於該芯層17659 Quan 懋 .ptd Page 17 1226808 V. Description of the invention (9) The remaining void of the through hole 2 0 2 is filled, and a plated through hole (PTH) 2 0 5 is formed to electrically conduct the core board 2 0 Upper and lower surface metal layers 2 0 3. As shown in FIG. 2E, a conductive layer is formed on the surface of the end of the plated-through hole 20 5 where the core layer board 20 is exposed. It can first form a conductive layer (not shown) on the surface of the core board 20 through electroless plating, etc., and use the conductive layer as a current conduction path to form a conductive layer on the surface of the core board 20 (including the A conductive thin layer 21 (such as a thickness of usually 3 to 10 μm) is formed by electroplating on the end of the filling material 204 of the electric via 20 5. In addition, as shown in FIG. 2E, processes such as direct plating (DP) can also be performed on the core board 20 to form, for example, a ( P d) conductive film 203a, and then subjected to a chemical stripping process so that the concubine metal layer adheres to the end surface of the filling material 2004 of the plated through-hole 205; or a process such as chemical copper, A conductive film 203a is covered on the surface of the end of the filling material 204 of the plated-through hole 205. Among them, the conductive thin layer 21 or the conductive film 203a formed on the end surface of the filling material 20 4 of the plated through hole 20 5 is mainly used as a current conduction path, and can be selectively applied to the electric clock during the subsequent plating process. An electric ore metal layer is formed on the via hole 205. The following description of the subsequent process is mainly based on the formation of an electrical thin layer 21 such as steel (Cu) on the core layer board 20, and the surface of the filling material 204 in the plated through-holes 2 0 5 4% A conductive film 203a, which can be made of palladium or steel, is formed. The subsequent process is similar to the process steps described below, so it will not be described in detail here. As shown in FIG. 2F, a circuit patterning process is performed to form a patterned circuit structure on the metal layer on the surface of the core board. It can be in the core layer

17659 全想.ptd 第18頁 122680817659 Think.ptd Page 18 1226808

五、發明說明(10) 板2 Q上形成 .rF 例如乾膜或光阻之阻層(未圖示),並經過曝 iirrri影(Devei〇pment)等製程,以使該阻層 ^ ^开=以外露出該芯、層板2 0之表面金屬層,俾經 由:八程以私除未為該阻層所覆蓋之金屬層部分,藉以 形、一圖案化線路結構22,纟中,該圖案化線路結構22可 包含有多數細線路結構。 、,如第2G圖所示,於該線路結構22上覆蓋一絕緣層23, 並使该絕緣層2 3形成有複數個開口 2 3 〇,且至少一開口 2 3 0 係外露出該電鑛導通孔2 0 5端部。其中,該絕緣層2 3之材 質可為一例如綠漆之拒銲層,而該些絕緣層開口 2 3 〇即用 以外露出後續形成電性連接端之部份電路板導電線路。 如第2 Η圖所示,形成一阻層2 4以覆蓋住未外露出該電 鍍導通孔2 0 5端部之部分絕緣層開口 2 3 0。該阻層2 4可為一 乾膜或光阻,以供後續進行電鍍製程時作為電鑛阻層之用 如苐2 I圖所不’於外路出該絕緣層開口 2 3 0之電鍍導 通孔2 0¾部形成一金屬層25。其可透過電鍍導線等方式 ,以在未被該阻層2 4所覆蓋住之部分絕緣層開口 2 3 〇中之 電鍍導通孔20 5上形成一電鍍金屬層25,如此,即可選擇 性在部分之電鍍導通孔2 0 5上直接形成一供後續作用為電 性連接端之金屬層2 5。其中,由於該電鍍金屬層2 5僅係選 擇性形成於部分該電鍍導通孔2 0 5上,因此除了可在電錢 導通孔2 0 5上形成有電性連接端外,芯層板其餘區域上= 圖案化線路可保有較細緻之線路結構。V. Description of the invention (10) A resist layer (for example, dry film or photoresist) (not shown) is formed on the plate 2 Q, and the process is performed by exposing the resist layer (Deveiopment) to make the resist layer ^ ^ open = Exposing the surface metal layer of the core and laminate 20 outside, via: Bacheng to privately remove the part of the metal layer that is not covered by the resist layer, thereby forming a patterned circuit structure 22, where the pattern The circuit structure 22 may include a plurality of fine circuit structures. As shown in FIG. 2G, an insulating layer 23 is covered on the circuit structure 22, and the insulating layer 23 is formed with a plurality of openings 2 3 0, and at least one opening 2 3 0 is exposed to the power mine. End of via hole 205. Wherein, the material of the insulating layer 23 may be a solder resist layer such as green paint, and the insulating layer openings 2 3 0 are used to expose part of the conductive circuit of the circuit board that subsequently forms the electrical connection end. As shown in FIG. 2 (a), a resist layer 24 is formed to cover a part of the insulation layer opening 230 which does not expose the end of the plated-through hole 205. The resistive layer 24 can be a dry film or a photoresistor, which can be used as an electrical resistive layer in the subsequent electroplating process. As shown in Figure 2I, the plating vias of the insulating layer opening 2 3 0 are routed outside. A 205 part forms a metal layer 25. It can form a plated metal layer 25 on the plated through hole 20 5 in the part of the insulating layer opening 2 3 0 which is not covered by the resist layer 24 by means of plating wires, etc. A metal layer 25 is directly formed on a part of the plated-through hole 25 for subsequent use as an electrical connection end. Among them, since the electroplated metal layer 25 is only selectively formed on a part of the electroplated vias 205, in addition to the electrical connection ends that can be formed on the electric power vias 205, the rest of the core layer board Top = The patterned circuit can maintain a more detailed circuit structure.

17659 全懋.ptd 弟19頁 1226808 五、發明說明(11) • 如第2 J圖所示,在該電鍍導通孔2 0 5上形成金屬層2 5 後,即可將該阻層2 4移除,俾將該芯層板表面之圖案化線 路結構中欲作為電性連接端之部分(包含選擇性形成在該 電鍍導通孔上之金屬層2 5)顯露於該絕緣層(如拒銲層)2 3 之開口 2 3 0。 如第2 K圖所示,之後,復可在顯露出該絕緣層開口 2 3 0 之導電金屬(即供後續作為該電路板與外部電性導接之電 性連接端)表面上形成一金屬保護層2 6。其可藉由電鍍導 線方式以於顯露出該絕緣層開口 2 3 0之導電金屬上表面形 _ 一例如鎳/金之金屬保護層2 6,俾藉由該金屬保護層2 6 提供電性連接端有效與導電元件(如銲線、錫球、或金屬 凸塊等)電性連接。當然,於電性連接端上形成金屬保護 層之方式,並非以前述之電鍍導線方式為限,另可採用化 學沈積(如化學鎳/金製程)等方式形成,惟該金屬保護層 之形成方式,僅係用以例示而非用以限定本發明之可實施 範疇。 此外,請參閱第2 K ’圖,其係如先前第2 E ’圖所示,在 該電鍍導通孔2 0 5之填充材2 0 4端部表面形成如鈀之導電膜 f,復經由前述製程以選擇性在部分電鍍導通孔2 0 5上形 供後續作用為電性連接端之金屬層2 5,並在顯露出絕緣 層(拒銲層)開口 2 3 0之電性連接端上表面形成有金屬保護 層2 6,以製得一電路板。 因此,上述本發明之電路板結構之製程,主要係在該 電鍍導通孔之端部表面上透過直接鑛覆方式(Direct17659 Quan 懋 .ptd 19 page 1226808 V. Description of the invention (11) • As shown in Figure 2J, after forming a metal layer 2 5 on the plated through hole 2 0 5, the resist layer 2 4 can be moved. In addition, the part of the patterned circuit structure on the surface of the core board that is to be used as an electrical connection terminal (including the metal layer 25 selectively formed on the plated through hole) is exposed to the insulating layer (such as a solder resist layer) ) 2 3 openings 2 3 0. As shown in Figure 2K, after that, a metal can be formed on the surface of the conductive metal (that is, the electrical connection terminal for subsequent electrical connection between the circuit board and the outside) that exposes the insulating layer opening 230. Protective layer 2 6. It can be formed on the top surface of the conductive metal by exposing the opening 2 3 0 of the insulating layer by electroplated wires. A metal protective layer such as nickel / gold 2 6 can provide electrical connection through the metal protective layer 2 6. The terminal is effectively electrically connected to a conductive element (such as a wire, a solder ball, or a metal bump, etc.). Of course, the method of forming a metal protective layer on the electrical connection end is not limited to the aforementioned electroplated wire method. It can also be formed by chemical deposition (such as chemical nickel / gold process), but the method of forming the metal protective layer , It is only for the purpose of illustration, not to limit the implementable scope of the present invention. In addition, please refer to FIG. 2K ′, which is a conductive film f such as palladium formed on the surface of the end of the filling material 204 of the plated-through hole 2 0 5 as shown in FIG. The process is to selectively form a metal layer 25 that is an electrical connection terminal on a part of the plated through-hole 25, and to expose the upper surface of the electrical connection terminal that exposes the opening 2 3 0 of the insulating layer (solder resist layer). A metal protective layer 26 is formed to make a circuit board. Therefore, the above-mentioned manufacturing process of the circuit board structure of the present invention is mainly carried out by direct mining on the end surface of the plated through-hole (Direct

17659 全懋.ptd 第20頁 1226808 五、發明說明(12) plat ing, DP)或化學沈積方式以使該電鍍導通孔之塞孔絕 緣部分覆蓋一例如鈀或銅之導電膜,亦或經由電鍍方式形 成一導電薄層,俾得利用電鍍導線以選擇性在該電鍍導通 孔之端部上形成電性連接端,復可藉由電鍍導線或化學沈 積等方式,以在外露出圖案化絕緣層(如拒銲層)之電性 連接端上形成金屬保護層,以保護該電性連接端避免受外 界環境侵害,並提供其與導電元件(如銲線、錫球、或金 屬凸塊等)間良好之電性連接。 請參閱第2 K及2 K ’圖所示,透過前述製程,本發明亦 揭示一種電路板結構,係包括有一芯層板2 0,其表面形成 有圖案化線路結構2 2與多數貫穿該芯層板2 0之電鍍導通孔 2 0 5,其中,該圖案化線路結構2 2具有多數之導電線路與 電鍍導通孔電性導通,而至少一電性連接端係形成於該電 鍍導通孔2 0 5上;一圖案化絕緣層2 3,係形成在該線路結 構2 2上,該絕緣層2 3形成有複數個開口 2 3 0以外露出該電 性連接端,且至少一開口 2 3 0係對應至該電鍍導通孔2 0 5端 部之電性連接端;以及一金屬保護層2 6,係形成於外露出 該絕緣層開口 2 3 0之電性連接端表面。 因此,本發明係可選擇性於部分電鍍導通孔上直接形 成電性連接端,且預先利用阻層覆蓋住先前製程中所形成 之細線路結構,而不致影響其餘線路佈局空間與細線路之 製程,亦即,該電鍍導通孔上之電性連接端係於其餘同層 線路結構形成後再予製作,且該電性連接端即可作為電路 板後續接置導電元件用。17659 Quan 懋 .ptd Page 20 1226808 V. Description of the invention (12) plat ing (DP) or chemical deposition method so that the plug insulating part of the plated through hole is covered with a conductive film such as palladium or copper, or by electroplating A conductive thin layer is formed by using electroplated wires to selectively form electrical connection ends on the ends of the plated vias, and the patterned insulating layer can be exposed by electroplating wires or chemical deposition ( Such as a solder resist layer, a metal protective layer is formed on the electrical connection end to protect the electrical connection end from the external environment, and to provide it with conductive components (such as welding wires, solder balls, or metal bumps, etc.) Good electrical connection. Please refer to FIG. 2K and 2K ′. Through the foregoing process, the present invention also discloses a circuit board structure, which includes a core layer board 20, and a patterned circuit structure 22 is formed on the surface, and most of the cores run through the core. The plated-through holes 2 0 5 of the layer plate 20, wherein the patterned circuit structure 22 has most of the conductive lines and the plated-through holes electrically connected, and at least one electrical connection end is formed in the plated-through holes 2 0 5; a patterned insulating layer 23 is formed on the circuit structure 22, the insulating layer 23 is formed with a plurality of openings 2 3 0 to expose the electrical connection terminal, and at least one opening 2 3 0 is The electrical connection end corresponding to the end of the plated through hole 205; and a metal protective layer 26 is formed on the surface of the electrical connection end which exposes the opening 230 of the insulation layer. Therefore, the present invention can selectively form an electrical connection end directly on a part of the plated through-holes, and use a resistive layer to cover the fine line structure formed in the previous process in advance without affecting the remaining line layout space and the process of the fine line. That is, the electrical connection ends on the plated through-holes are made after the rest of the same layer circuit structure is formed, and the electrical connection ends can be used as subsequent connection of conductive elements on the circuit board.

17659 全懋.ptd 第21頁 1226808 五、發明說明(13) _ 此外,如 之端部形成有 3 1中承接導電 上形成導電盲 連接端之設置 有效增加線路 可持續進行線 電路板。 另,雖本 _之製程亦可 係可為一已完 ^具多 應用本 ,以及 非侷限 用於任 因 性在部 f連接 電子 於該電 之導電 v i a )時 路密度 層線路 發明前 具六層 於前述 一具多 此,藉 分欲形 端,以 元件( 鍍導通 盲孔, ,所需 與靈活 第3圖所示,在芯層板30中之带赫 堂从、由从 u τ <甩鍍導通孔3 0 5 端後’亦::為後續線路增層結構 目32用,俾得以直接在該電鍍導通孔3〇5 L 32,如此,即可減少承接導電盲孔之電性 =接線所佔電路板空間,縮短導電途徑,且 佈攻空間,提升線路佈局靈活度,之 路增層製程,俾形成一具有多層線路結構1 ^明先前之圖示係以雙層板作為說明,本發 =2於多層板中,亦即先前圖式之該芯層‘ ^段製程之多層板’即可依前述製程形成 、、、。構之電路板,如第4A圖及4B圖所示,係為 述製程所得之具四層線路結構之電^板4、〇1 線路結構之電路板40B。當然本發明之應用 ^二層、四層、或六層電路板,實際係可應 層線路結構之電路板。 由本發明之電路板結構及其製法,係可選擇 成電性連接端之電鍍導通孔上直接形成該電 後續接置有導電元件以提供該電路板與其 半導體晶片或電路板)之電性導接,亦或可 子匕上之電性連接端直接形成有線路增層結構 以及減少習知形成導電盲孔(Conductive 延伸出連接墊(Pad)之空間,藉以增加佈線 性’並可縮短導電路徑,減少電感、串擾及17659 Quan 懋 .ptd Page 21 1226808 V. Description of the invention (13) _ In addition, if the end is formed with 3 conductive connections, the conductive connection is formed on the connection end, which effectively increases the wiring and can continuously carry the circuit board. In addition, although this process can also be a completed multi-use application, and is not limited to arbitrary use in connecting the electrons to the electrical conduction of the electrical circuit, the circuit density layer circuit was invented before the invention. There are many layers in the foregoing. By dividing the desired shape, the components (plated vias, blind holes, required and flexible) are shown in Figure 3. After throwing off the plated-through hole at the 3 05 end, it is also used as a layer 32 for the subsequent circuit, so that it can be directly used in the plated-through hole 3 05 L 32. In this way, the electrical property of the conductive blind hole can be reduced. = Wiring occupies circuit board space, shortens the conductive pathways, and deploys space to improve the flexibility of circuit layout. The process of adding layers increases the formation of a multi-layer circuit structure. 1 ^ The previous illustration uses double-layer boards as an illustration. , 本 发 = 2 in the multi-layer board, that is, the core layer '^ multi-layer board of the previous process' can be formed according to the aforementioned process, as shown in Figures 4A and 4B. Shown is a four-layer electrical structure with a four-layer circuit structure obtained from the manufacturing process. Circuit board 40B. Of course, the application of the present invention is a two-layer, four-layer, or six-layer circuit board, which is actually a circuit board capable of supporting a layered circuit structure. The circuit board structure of the present invention and its manufacturing method can be selected to be electrical The electroplated vias of the connection end are directly formed with the electrical connection of the subsequent conductive elements to provide electrical connection between the circuit board and its semiconductor wafer or circuit board, or the electrical connection end on the subassembly can be directly formed with a line. Layer-increasing structure and reducing the formation of conductive blind holes (Conductive extends the space of the connection pad (Pad), thereby increasing the wiring, and shortening the conductive path, reducing inductance, crosstalk and

17659 全懋.ptd 第22頁 1226808 五、發明說明 雜訊產生 係獨立形 免習知技 在整體電 致後續在 困擾,而 路(F i ne 以上 定本發明 廣義地定 術實體或 全相同, 專利範圍 (14) ;此外,該電鍍 成,而不影響該 術中在電鍍導通 路板上形成一厚 圖案化製程中形 無法形成一細線 C i r cu i t)與高佈 所述僅為本發明 之實質技術内容 義於下述之申請 方法,若是與下 亦或為同一等效 中 〇 導通 電路 孔上 度過 成導 路結 線密 之較 範圍 專利 述之 變更 孔上之 板導電 欲形成 厚或厚 電線路 構等缺 度之電 佳實施 ,本發 範圍中 申請專 ,均將 電性連接 線路之製 電性連接 度不均之 及電性連 失’俾提 路板。 例而已, 明之實質 ,任何他 利範圍所 被視為涵 端於製程中 程,藉以避 端時,必需 金屬層,導 接端之精度 供一具細線 並非用以限 技術内容係 人完成之技 定義者係完 蓋於此申請17659 Quan 懋 .ptd Page 22 1226808 V. Description of the invention Noise generation is an independent form of free know-how in the whole electro-mechanical follow-up, and the way (F i ne above defines the invention as a broadly defined entity or all the same, patent Scope (14); In addition, the electroplating without affecting the formation of a thick patterning process on the electroplated guide plate during the operation cannot form a thin line (Cir cu it) and the description by Gao Bu is only the essence of the present invention The technical content means the following application method. If it is the same as the following or the same, the conductive circuit hole is passed through to form a conductive junction junction. The plate on the hole is conductive to form a thick or thick wire. Road construction and other deficient electrical implementation, the application in the scope of this application, all will be the electrical connection line of the electrical connection of uneven electrical connection and electrical connection loss' mention circuit board. For example, in the essence, any other benefit range is considered to be in the middle of the manufacturing process. In order to avoid the end, a metal layer is required. The precision of the lead is a thin line that is not used to limit the technical content. Definitions are covered in this application

17659 全懋.ptd 第23頁 1226808 圖式簡單說明 _【圖式簡單說明】 第1 A圖至第1 C圖係習知之半加成法製程流程示意圖; 第2 A圖至第2 K圖係本發明之電路板結構製法之製程剖 面示意圖; 第2E’圖及第2Γ圖係本發明之電路板結構製法另一實 施態樣之剖面示意圖; 第3圖係本發明之電路板結構製法應用於增層結構之 剖面示意圖;以及 第4A圖及第4B圖係本發明之電路板結構製法應用於多 •板之剖面示意圖。 1 0 核心電路板 11 絕緣層 110 開孔 12 内層線路層 13 晶種層 14 阻層 15 圖案化線路層 .20 芯層板 • 0 0 絕緣層 201 金屬薄層 202 貫穿孔 203 金屬層 2 0 3a 導電膜17659 Quan 懋 .ptd Page 23 1226808 Schematic illustrations _ [Schematic descriptions] Figures 1 A to 1 C are the conventional semi-additive process flow diagrams; Figures 2 A to 2 K 2E ′ and 2Γ are schematic cross-sectional views of another embodiment of the circuit board structure manufacturing method of the present invention; FIG. 3 is a circuit board structure manufacturing method of the present invention applied to A schematic cross-sectional view of the build-up structure; and FIGS. 4A and 4B are schematic cross-sectional views of the method for manufacturing a circuit board structure of the present invention applied to a multi-board. 1 0 Core circuit board 11 Insulation layer 110 Opening hole 12 Inner circuit layer 13 Seed layer 14 Resistance layer 15 Patterned circuit layer. 20 Core board • 0 0 Insulation layer 201 Thin metal layer 202 Through hole 203 Metal layer 2 0 3a Conductive film

17659 全懋.ptd 第24頁 1226808 圖式簡單說明 2 0 4 填充材 2 0 5 電鍍導通孔 21 導電薄層 22 線路結構 2 3 絕緣層 2 3 0 開口 2 4 阻層 2 5 金屬層 2 6 金屬保護層 30 芯層板 3 0 5 電鍍導通孔 31 線路增層結構 32 導電盲孔 40 A 四層電路板 4 0 B 六層電路板17659 Full 懋 .ptd Page 24 1226808 Brief description of drawings 2 0 4 Filler 2 0 5 Plating vias 21 Conductive thin layer 22 Circuit structure 2 3 Insulation layer 2 3 0 Opening 2 4 Resistive layer 2 5 Metal layer 2 6 Metal Protective layer 30 core layer board 3 0 5 plated vias 31 circuit build-up structure 32 conductive blind hole 40 A four-layer circuit board 4 0 B six-layer circuit board

17659 全懋.ptd 第25頁17659 懋 .ptd Page 25

Claims (1)

1226808 六、申請專利範圍 η. —種電路板結構之製法,係包括: 提供一芯層板,該芯層板表面具有金屬層,且該 芯層板形成有多數之電鍍導通孔; 於顯露出該芯層板之電鍍導通孔端部表面形成導 電層; 圖案化該芯層板表面之金屬層以形成一圖案化線 路結構; 於該線路結構上覆蓋一絕緣層,並使該絕緣層形 成有複數個開口,且至少一開口係外露出該電鍍導通 鲁孔端部;以及 於外露出該絕緣層開口之電鍍導通孔端部形成一 - 金屬層以作為電性連接端。 2.如申請專利範圍第1項之電路板結構之製法,其中,該 電鍍導通孔端部表面上之導電層係透過直接鍍覆方式 (Direct plating, DP)形成。 3 ·如申請專利範圍第1項之電路板結構之製法,其中,該 電鍍導通孔内部復以一填充材填滿其殘留空隙。 4.如申請專利範圍第1項之電路板結構之製法,其中,該 電鍵導通孔端部表面上之導電層係利用化學沈積方式 •形成。 5 ·如申請專利範圍第4項之電路板結構之製法,其中,該 電鍵導通孔端部表面上之導電層其材質可為銅及纪之 其中一者。 6.如申請專利範圍第1項之電路板結構之製法,其中,該1226808 VI. Scope of patent application η. A method for manufacturing a circuit board structure includes: providing a core board, the core board having a metal layer on the surface, and the core board formed with a large number of plated through-holes; A conductive layer is formed on an end surface of the plated via hole of the core board; a metal layer on the surface of the core board is patterned to form a patterned circuit structure; an insulating layer is covered on the circuit structure, and the insulating layer is formed with A plurality of openings, and at least one of the openings exposes the end of the plated via hole; and an end of the plated via hole that exposes the opening of the insulating layer forms a metal layer as an electrical connection end. 2. The method for manufacturing a circuit board structure according to item 1 of the patent application scope, wherein the conductive layer on the surface of the end of the plated-through hole is formed by direct plating (DP). 3. The manufacturing method of the circuit board structure according to the first item of the patent application scope, wherein the inside of the plated through hole is filled with a filling material to fill its remaining gap. 4. The manufacturing method of the circuit board structure according to the first patent application scope, wherein the conductive layer on the end surface of the via hole of the key is formed by chemical deposition. 5. If the method of manufacturing a circuit board structure according to item 4 of the patent application method, wherein the material of the conductive layer on the end surface of the via hole of the key can be one of copper and copper. 6. As for the manufacturing method of the circuit board structure according to the scope of patent application item 1, wherein, the 17659 全懋.ptd 第26頁 1226808 六、申請專利範圍 電鍍導通孔端部表面上之導電層係利用無電電鍍方式 形成。 7. 如申請專利範圍第4或6項之電路板結構之製法,其中 ,該電鍍導通孔端部表面上之導電層係作為電流導通 路徑,以在該電鍍導通孔端部上形成電鍍金屬層。 8. 如申請專利範圍第1項之電路板結構之製法,其中,該 芯層板表面藉該導電層作為電流傳導路徑,以在該芯 層板表面上電鍍形成一導電薄層。 9. 如申請專利範圍第1項之電路板結構之製法,其中,該 芯層板可為一樹脂壓合銅猪(R C C )。 1 0 .如申請專利範圍第1項之電路板結構之製法,其中,該 芯層板可為一完成前段製程之多層電路板。 11.如申請專利範圍第1項之電路板結構之製法,其中,該 絕緣層為一拒焊層。 1 2 .如申請專利範圍第1項之電路板結構之製法,其中,該 電鍍導通孔端部外露出絕緣層後,並形成一阻層以覆 蓋住電路板另一表面其餘開口。 1 3 .如申請專利範圍第1 2項之電路板結構之製法,其中, 於外露出該絕緣層開口之電鍍導通孔端部形成一金屬 層以作為電性連接端後,移除該阻層。 1 4 .如申請專利範圍第1項之電路板結構之製法,其中,可 在顯露出該絕緣層開口之電性連接端表面上形成金屬 保護層。 1 5 .如申請專利範圍第1 4項之電路板結構之製法,其中,17659 Quan 懋 .ptd Page 26 1226808 6. Scope of patent application The conductive layer on the surface of the end of the plated-through hole is formed by electroless plating. 7. If the method of manufacturing a circuit board structure according to item 4 or 6 of the application for a patent, wherein the conductive layer on the surface of the end of the plated via is used as a current conduction path to form a plated metal layer on the end of the plated via . 8. For the method of manufacturing a circuit board structure according to item 1 of the application, wherein the surface of the core board uses the conductive layer as a current conduction path to form a conductive thin layer on the surface of the core board by electroplating. 9. For the method for manufacturing a circuit board structure according to item 1 of the application, wherein the core board may be a resin-bonded copper pig (R C C). 10. If the method of manufacturing a circuit board structure according to item 1 of the scope of the patent application, the core board may be a multi-layer circuit board that has completed the previous process. 11. The method for manufacturing a circuit board structure according to item 1 of the application, wherein the insulation layer is a solder resist layer. 12. The method for manufacturing a circuit board structure according to item 1 of the scope of patent application, wherein after the end of the plated via hole is exposed with an insulating layer, a resist layer is formed to cover the remaining opening on the other surface of the circuit board. 1 3. According to the method for manufacturing a circuit board structure according to item 12 of the scope of patent application, wherein a metal layer is formed at the end of the plated through hole exposing the opening of the insulating layer as an electrical connection end, and the resist layer is removed. . 14. The method of manufacturing a circuit board structure according to item 1 of the scope of patent application, wherein a metal protective layer may be formed on the surface of the electrical connection end that exposes the opening of the insulating layer. 1 5. The manufacturing method of the circuit board structure according to item 14 of the scope of patent application, wherein: 17659 全懋.ptd 第27頁 1226808 六、申請專利範圍 - 該金屬保護層為鎳/金金屬層。 1 6 .如申請專利範圍第1 4項之電路板結構之製法,其中, 該金屬保護層係可利用電鑛導線及化學沈積方式之其 中一者加以形成。 1 7 .如申請專利範圍第1項之電路板結構之製法,其中,該 電鍍導通孔上之金屬層係作用為電性連接端,其係選 擇性形成於部分電鍍導通孔上,且預先利用阻層覆蓋 住形成細線路之區域。 1 8 ·如申請專利範圍第1或1 7項之電路板結構之製法,其中 Φ ,該電性連接端即可作為電路板後續接置導電元件用 〇 1 9 ·如申請專利範圍第1或1 7項之電路板結構之製法,其中 ,該電性連接端可作為後續線路增層結構中承接導電 盲孔之用,俾得以在電鍍導通孔上形成導電盲孔,以 縮短導電途徑,增加線路佈設空間,與提升線路佈局 靈活度。 2 0 . —種電路板結構,係包括: 一芯層板,其表面形成有圖案化線路結構與多數 貫穿該芯層板之電鑛導通孔’該圖案化線路結構具有 • 多數之導電線路與電鍍導通孔電性導通,而至少一電 ' 性連接端係形成於該電鍍導通孔上; 一圖案化絕緣層,係形成在該線路結構上,俾使 該絕緣層形成有複數個開口以外露出該電性連接端, 且至少一開口係對應至該電鍍導通孔端部之電性連接17659 Quan 懋 .ptd Page 27 1226808 6. Scope of Patent Application-The metal protective layer is a nickel / gold metal layer. 16. The method for manufacturing a circuit board structure according to item 14 of the scope of patent application, wherein the metal protective layer can be formed by using one of an electric ore wire and a chemical deposition method. 17. According to the method for manufacturing a circuit board structure according to item 1 of the scope of patent application, wherein the metal layer on the plated through hole functions as an electrical connection end, it is selectively formed on part of the plated through hole and is used in advance. The barrier layer covers the area where the fine lines are formed. 1 8 · If the manufacturing method of the circuit board structure in item 1 or 17 of the scope of patent application, where Φ, the electrical connection end can be used as a subsequent connection of conductive elements on the circuit board. 17. The method for manufacturing a circuit board structure according to item 17, wherein the electrical connection end can be used to receive conductive blind holes in a subsequent layer build-up structure, so that conductive blind holes can be formed on the plated through holes to shorten the conductive path and increase Line layout space, and improve the flexibility of line layout. 2 0. A circuit board structure comprising: a core board with a patterned circuit structure formed on its surface and a plurality of electrical slab vias passing through the core board. The patterned circuit structure has a majority of conductive circuits and The plated via is electrically conductive, and at least one electrical connection terminal is formed on the plated via; a patterned insulating layer is formed on the circuit structure, so that the insulating layer is formed with a plurality of openings and exposed. The electrical connection terminal, and at least one opening corresponds to the electrical connection of the end of the plated through hole 17659 全懋.ptd 第28頁 1226808 六、申請專利範圍 端,以及 一金屬保護層,係形成於外露出該圖案化絕緣層 開口之該電性連接端表面。 2 1 .如申請專利範圍第2 0項之電路板結構,其中,該芯層 板可為一樹脂壓合銅猪(RCC)。 2 2 .如申請專利範圍第2 0項之電路板結構,其中,該芯層 板可為一完成前段製程之多層電路板。 2 3 .如申請專利範圍第2 0項之電路板結構,其中,該絕緣 層為拒鮮層。 2 4 .如申請專利範圍第2 0項之電路板結構,其中,該電性 連接端即可作為電路板後續接置導電元件用。 2 5 .如申請專利範圍第2 0項之電路板結構,其中,該電鍍 導通孔上之電性連接端係於其餘同層線路結構形成後 再予製作。 2 6 .如申請專利範圍第2 0或2 5項之電路板結構,其中,該 電鍍導通孔上之電性連接端係選擇性形成於部分電鍍 導通孔上,而不致影響其餘圖案化線路結構之製程。 2 7 .如申請專利範圍第2 0項之電路板結構,其中,該金屬 保護層為鎳/金金屬層。17659 Quan 懋 .ptd Page 28 1226808 6. Scope of patent application, and a metal protective layer is formed on the surface of the electrical connection end which exposes the opening of the patterned insulating layer. 2 1. The circuit board structure according to item 20 of the patent application scope, wherein the core board may be a resin-bonded copper pig (RCC). 2 2. If the circuit board structure of item 20 of the patent application scope, wherein the core board can be a multi-layer circuit board that has completed the previous process. 2 3. The circuit board structure according to item 20 of the scope of patent application, wherein the insulation layer is a freshness-preventing layer. 24. For example, the circuit board structure of the 20th in the scope of patent application, wherein the electrical connection end can be used as a subsequent connection of the circuit board to conductive elements. 25. The circuit board structure according to item 20 of the scope of patent application, wherein the electrical connection ends on the plated through-holes are made after the formation of the rest of the same layer circuit structure. 2 6. If the circuit board structure of the patent application scope item 20 or 25, wherein the electrical connection end on the plated through hole is selectively formed on part of the plated through hole without affecting the remaining patterned circuit structure The process. 27. The circuit board structure according to item 20 of the patent application scope, wherein the metal protective layer is a nickel / gold metal layer. 17659 全懋.ptd 第29頁17659 懋 .ptd Page 29
TW93105505A 2004-03-03 2004-03-03 Circuit board structure and method fabricating the same TWI226808B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93105505A TWI226808B (en) 2004-03-03 2004-03-03 Circuit board structure and method fabricating the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93105505A TWI226808B (en) 2004-03-03 2004-03-03 Circuit board structure and method fabricating the same

Publications (2)

Publication Number Publication Date
TWI226808B true TWI226808B (en) 2005-01-11
TW200531578A TW200531578A (en) 2005-09-16

Family

ID=35634340

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93105505A TWI226808B (en) 2004-03-03 2004-03-03 Circuit board structure and method fabricating the same

Country Status (1)

Country Link
TW (1) TWI226808B (en)

Also Published As

Publication number Publication date
TW200531578A (en) 2005-09-16

Similar Documents

Publication Publication Date Title
JP3297879B2 (en) Integrated circuit package formed continuously
US20060284640A1 (en) Structure of circuit board and method for fabricating the same
US20080251495A1 (en) Methods of preparing printed circuit boards and packaging substrates of integrated circuit
US9099313B2 (en) Embedded package and method of manufacturing the same
JP2010135721A (en) Printed circuit board comprising metal bump and method of manufacturing the same
US20090071707A1 (en) Multilayer substrate with interconnection vias and method of manufacturing the same
TW587322B (en) Substrate with stacked via and fine circuit thereon, and method for fabricating the same
JP2003209366A (en) Flexible multilayer wiring board and manufacturing method therefor
JP2009088469A (en) Printed circuit board and manufacturing method of same
JP6467814B2 (en) Wiring substrate manufacturing method and semiconductor device manufacturing method
WO2012040724A1 (en) Electrolytic depositon and via filling in coreless substrate processing
TWI389279B (en) Printed circuit board structure and fabrication method thereof
JP3577421B2 (en) Package for semiconductor device
KR20100061026A (en) A printed circuit board comprising a metal bump and a method of manufacturing the same
CN101364586B (en) Construction for packaging substrate
US20060243482A1 (en) Circuit board structure and method for fabricating the same
US20110147058A1 (en) Electronic device and method of manufacturing electronic device
US20090071704A1 (en) Circuit board and method for fabricating the same
US20050251997A1 (en) Method for forming printed circuit board
US20090050359A1 (en) Circuit board having electrically connecting structure and fabrication method thereof
TWI393229B (en) Packing substrate and method for manufacturing the same
JP4187049B2 (en) Multilayer wiring board and semiconductor device using the same
TWI226808B (en) Circuit board structure and method fabricating the same
TWI231552B (en) Method for forming circuits patterns of interlayer for semiconductor package substrate
JP2010519769A (en) High speed memory package

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees