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TWI268527B - Fabrication method of cathode structure for field emission display employs polishing to produce cathode structure with low cost ink material and improve the flatness - Google Patents

Fabrication method of cathode structure for field emission display employs polishing to produce cathode structure with low cost ink material and improve the flatness

Info

Publication number
TWI268527B
TWI268527B TW093119362A TW93119362A TWI268527B TW I268527 B TWI268527 B TW I268527B TW 093119362 A TW093119362 A TW 093119362A TW 93119362 A TW93119362 A TW 93119362A TW I268527 B TWI268527 B TW I268527B
Authority
TW
Taiwan
Prior art keywords
cathode structure
low cost
improve
field emission
flatness
Prior art date
Application number
TW093119362A
Other languages
Chinese (zh)
Other versions
TW200601377A (en
Inventor
rui-ting Xu
jun-yan Xiao
kui-wen Zheng
Original Assignee
Teco Nanotech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teco Nanotech Co Ltd filed Critical Teco Nanotech Co Ltd
Priority to TW093119362A priority Critical patent/TWI268527B/en
Publication of TW200601377A publication Critical patent/TW200601377A/en
Application granted granted Critical
Publication of TWI268527B publication Critical patent/TWI268527B/en

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  • Cold Cathode And The Manufacture (AREA)

Abstract

The present invention provides a fabrication method of cathode structure for field emission display, which employs the thick film technology and low cost silver ink oil and nano-tube material to form the first and second electrode layers on a substrate; employs the sintering technique for sintering of ink oil. After sintering, employing surface polishing process to control the thickness error after surface polishing for the first and the second electrode layers produced with the low cost silver ink oil and nano-tube material under 0.1 μm, so as to improve the surface flatness for the first and second electrode layers.
TW093119362A 2004-06-30 2004-06-30 Fabrication method of cathode structure for field emission display employs polishing to produce cathode structure with low cost ink material and improve the flatness TWI268527B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW093119362A TWI268527B (en) 2004-06-30 2004-06-30 Fabrication method of cathode structure for field emission display employs polishing to produce cathode structure with low cost ink material and improve the flatness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW093119362A TWI268527B (en) 2004-06-30 2004-06-30 Fabrication method of cathode structure for field emission display employs polishing to produce cathode structure with low cost ink material and improve the flatness

Publications (2)

Publication Number Publication Date
TW200601377A TW200601377A (en) 2006-01-01
TWI268527B true TWI268527B (en) 2006-12-11

Family

ID=57806918

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093119362A TWI268527B (en) 2004-06-30 2004-06-30 Fabrication method of cathode structure for field emission display employs polishing to produce cathode structure with low cost ink material and improve the flatness

Country Status (1)

Country Link
TW (1) TWI268527B (en)

Also Published As

Publication number Publication date
TW200601377A (en) 2006-01-01

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