1247349 玖、發明說明： 【發明所屬之技術領域】 本發明係關於具有灰階部的灰階罩幕之灰階部的缺陷 檢查（判斷）方法及缺陷修正方法等，其中，灰階部係以在 經過調整穿透量的區域降低穿透此區域之光的穿透量，以 選擇性改變光阻膜厚為目的。 【先前技術】 近年，在大型LCD用罩幕領域中，有嘗試採用灰階罩幕 來削減罩幕片數（參照非專利文獻1 )。 其中，灰階罩幕係如圖5 ( 1 )所示，在透明基板上設有： 遮光部1、穿透部2及灰階部3。灰階部3係譬如形成使用 灰階罩幕之大型LCD用曝光機之解析臨界以下的遮光圖案 3a之區域，以降低穿透過此區域之光的穿透量而降低此區 域的照射量，選擇性改變光阻膜厚之目的所形成。元件符 號3b係灰階部3中在曝光機解析臨界以下的細微穿透部。 遮光部1與遮光圖案3 a通常均由鉻或鉻化合物等相同材料 所構成之相同厚度膜形成。穿透部2與細微穿透部3 b均屬 在透明基板上，未形成遮光膜等的透明基板部分。 使用灰階罩幕的大型L C D用曝光機之解析臨界，係在利 用分級曝光機時約為2. 5 // m，而在利用鏡面投影曝光機時 則約為3 // m。所以，例如在圖3 ( 1 )中將灰階部3的細微穿 透部3 b隔間寬度設為低於2 . 5 // m，將曝光機解析臨界以 下的遮光圖案3a線寬設為低於2.5//m。當利用上述大型 LCD用曝光機進行曝光之時，因為通過灰階部3的曝光光 5 312/發明說明書(補件)/93-07/93109724 1247349 將發生整體曝光量嫌不足的情況，所以透過灰階部3進行 曝光的正型光阻便可能在膜厚成為較薄時殘留於基板上。 即，光阻將隨曝光量的不同，在通常對應遮光部1的部分 與對應著灰階部3的部分，出現對顯影液之溶解性差，所 以，顯影後的光阻形狀便將如圖5 ( 2 )所示，通常對應著遮 光部1的部分Γ便將為如約1 // m，對應著灰階部3的部分 3 ’則為約0 . 4〜0 . 5 // m，對應著穿透部2的部分將成為無光 阻部分2 ’。然後，在無光阻部分2 ’處施行被加工基板的第 1蝕刻，將對應著灰階部3的較薄部分3 ’光阻，利用拋光 加工等而去除，再藉由對此部分施行第2蝕刻，利用1片 罩幕實施習知2片份罩幕的步驟，以減少罩幕片數。 但是，如上述灰階罩幕的遮光部，就從細微圖案加工較 不易，且受在製造步驟中所發生灰塵等大幅影響等等理 由，將發生由遮光圖案3a的細、粗等CD誤差或多餘圖案 (如：突起（凸）、短路（橋接）、點等）或缺損圖案（如：缺損 (凹）或斷線等）更構成圖案缺陷等等（以下將圖案過粗、多 餘圖案缺陷等現象稱為「黑缺陷」，將圖案過細或缺損缺陷 等現象稱為「白缺陷」）狀況。 所以，針對灰階部中所發生的缺陷，雖有施行圖案修 正，但是因為灰階部的圖案較細微，因而將發生各種問題。 第1 :例如，在利用最小狹縫尺寸為2 // in的修正裝置， 對2 // m以上灰階圖案進行修正之情況時，將因灰階部圖案 屬於細微（線寬較細）、受修正裝置造成修正精度存在有極 限的緣故，將在相當於應形成修正圖案的部分與欲形成修 6 312/發明說明書(補件)/93-07/93109724 1247349 正圖案的部分間之偏差的對位精度方面，以及在相當於應 形成修正圖案的部分與實際形成修正圖案的部分間之差異 的修正精度方面存在有極限。因而，利用與正常圖案相同 形狀（正常圖案的C D容許精度内）進行修正之事項，將因所 發生的缺陷而造成在技術層面上非常困難（例如：當在巨大 缺損缺陷部分形成細微修正膜圖案，並進行修正的情況）， 所以便實施盡可能接近正常圖案的修正，即近似正常圖案 的修正（正常圖案的C D容許精度外）。 第2 :因為在技術上不可能利用最小狹縫尺寸並2 // m的 修正裝置，對如1 // m灰階圖案進行修正，因此藉由不復原 為近似正常圖案的形狀，而是形成可獲得與正常圖案相同 灰階效果的修正圖案（不同於正常圖案的形狀及/或不同排 列的修正圖案），以執行灰階部修正的技術，相關此方面技 術，本案申請人在此之前已提出申請（專利文獻1 )。 〈非專利文獻 1 > 月刊 FPD Intel 1 igence、p.31-35、1999 年 5 月 〈專利文獻1 >日本專利特開2 0 0 2 - 1 0 7 9 1 3號公報 【發明内容】 (發明所欲解決之問題） 上述習知技術存在有下述問題點。 第1:在修正為與正常圖案相同形狀（正常圖案的CD容 許精度内）之圖案的情況時，執行通常圖案間之比較的比較 檢查，但是，在利用近似正常圖案形狀的圖案（正常圖案之 C D容許精度）之進行修正之情況時，或者利用不同於正常 圖案形狀的圖案進行修正之情況時，無法執行通常之比較 7 312/發明說明書(補件)/93-07/93109724 1247349 檢查，因而存在有較不易檢查的問題。 第2 :在利用雷射修復裝置去除黑缺陷之情況，玻璃基 板較容易受損傷，因此即使在滿足設定修正後之遮光圖案 3 a規格（圖案線寬、形狀）之情況時，在細微穿透部（玻璃 部）3 b遭受損傷時，細微穿透部（玻璃部）3 b的穿透率將降 低，所以在使用者的曝光、轉印處理中會有發生問題的情 況。具體而言，當遭受玻璃損傷之情況時，為彌補細微穿 透部（玻璃部）3 b的穿透率降低，產生設為較所設定規格 (圖案線寬、形狀）更細線寬的遮光圖案3 a的必要。此情況 下，在僅為圖案形狀的檢查中，將有不夠完備的問題。 第3 :即便為滿足應欲滿足使用者要求（當由使用者進行 曝光時，設定為殘留既定光阻膜厚）而設定之規格（圖案線 寬、形狀）的正常圖案（當然在CD容許精度内）及正常圖案 之CD容許精度内的修正圖案，因為使用者實際使用灰階罩 幕，在待轉印基板的光阻上獲得轉印圖案時的曝光條件， 具有依轉印時所使用曝光裝置的光學條件的設定條件而異 的情況，所以在使用者的曝光、轉印處理中仍將存在問題。 具體而言，使用者所使用灰階罩幕的曝光條件，具有非屬 普通條件的情況[例如：光照射量條件非屬普通條件的情況 (具過度不足的照射條件等）]，或者刻意未解析灰階圖案的 條件。由上述可知：（1 )即便為符合所設定規格（圖案線寬、 形狀）的正常圖案或修正圖案（均在CD容許精度内），在使 用者的曝光、轉印處理中仍將出現問題，（2 )即便為屬於近 似正常圖案之修正圖案（正常圖案的CD容許精度外），在使 8 312/發明說明書(補件)/93-07/93109724 1247349 用者的曝光、轉印處理中，若未出現問題的話便可（若判斷 使用者曝光後的光阻圖案是否合格的結果，屬於合格的話 便可），（3 )在使用者曝光、轉印處理中具有進行是否有問 題的檢查（判斷）的必要性、重要性。 本發明係為解決上述問題點而所構思，其第1目的在於 提供一種可輕易且精度高地施行灰階部在使用者的曝光、 轉印處理中，是否有問題的檢查（判斷）之灰階罩幕檢查（判 斷、保證）、修正的方法。 再者，第2目的在於提供一種利用上述檢查（判斷）方法 的灰階罩幕之灰階部圖案決定方法。 (解決問題之手段） 本發明具有下述構造。 (方法1 ) 一種灰階罩幕之缺陷檢查方法，係具有灰階部、 遮光部及穿透部，其中，灰階部係以在經過調整穿透量的 區域減低穿過此區域之光穿透量，而選擇性改變光阻膜厚 為目的，其特徵為包含有如下步驟： 製作上述灰階部之影像資料的步驟； 根據上述影像資料，對灰階部施行可辨識缺陷之影像處 理的步驟；以及 根據上述影像處理後的資料，施行缺陷檢查的步驟。 (方法2 )如方法1所述之灰階罩幕之缺陷檢查方法，其中， 上述施行影像處理的步驟係包含有模糊處理。 (方法3 )如方法1或2所述之灰階罩幕之缺陷檢查方法， 其中，上述施行影像處理的步驟係包含有強調處理。 9 312/發明說明書(補件)/93-07/93109724 1247349 (方法4 )如方法1或2所述之灰階罩幕之缺陷檢查方法， 其中，上述灰階部係形成使用灰階罩幕之曝光機解析臨界 以下的遮光圖案之區域。 (方法5)如方法1或2所述之灰階罩幕之缺陷檢查方法， 其中，上述缺陷檢查係根據對上述影像處理後的資料，預 先設置的濃淡容許範圍（臨限值）而實施。 (方法6 )如方法1或2所述之灰階罩幕之缺陷檢查方法， 其中，上述影像資料係修正後的灰階部影像資料。 (方法7)如方法6所述之灰階罩幕之缺陷檢查方法，其中， 上述修正後的灰階部係包含達成與正常圖案近似形狀之圖 案或與正常圖案相同灰階效果之不同形狀及/或排列之修 正圖案。 (方法8 )如方法1或2所述之灰階罩幕之缺陷檢查方法， 其中，灰階罩幕係LCD製造用罩幕或顯示裝置製造用罩幕^ (方法9 ) 一種灰階罩幕之圖案決定方法，係具有灰階部、 遮光部及穿透部，其中，灰階部係以在經過調整穿透量的 區域減低穿過此區域之光穿透量而選擇性改變光阻膜厚為 目的，且其特徵為包含有如下的步驟： (1 )利用既定形狀及/或排列，製作上述灰階部的步驟； (2 )製作上述灰階部之影像資料的步驟；以及 (3 )根據上述影像資料，對灰階部施行可辨識缺陷之影 像處理的步驟； 其中，對經上述（1 )〜（3 )步驟所獲得上述影像處理後的 資料，以未存在缺陷的方式來決定灰階部的形狀及/或排 10 312/發明說明書(補件)/93-07/93109724 1247349 列。 (方法1 Ο )如方法9所述之灰階罩幕之圖案決定方法，其 中，上述施行影像處理的步驟係包含有模糊處理。 (方法1 1 )如方法9或1 0所述之灰階罩幕之圖案決定方 法，其中，上述施行影像處理的步驟係包含有強調處理。 (方法1 2 )如方法9或1 0所述之灰階罩幕之圖案決定方 法，其中，上述灰階部係形成使用灰階罩幕之曝光機解析 臨界以下的遮光圖案之區域。 【實施方式】 本發明的灰階罩幕之檢查（判斷、保證）、修正方法的特 徵在於（方法1 ): (1 )製成含有灰階部的影像（如：含有修正後灰階部圖案 的影像或含有正常圖案的影像等）之影像資料的步驟； (2 )根據上述影像資料，施行可辨識灰階部中缺陷之影 像處理的步驟；以及 (3 )根據上述影像處理後的資料，施行缺陷檢查的步驟。 本發明根據含有灰階部的影像（如：含有修正後灰階部 圖案的影像或含有正常圖案的影像等）之影像資料，製成可 判斷在使用者的曝光、轉印處理中之轉印狀況的影像，使 灰階部圖案進入使用者的容許範圍内。 其中，在包含灰階部在内之影像的影像資料製成步驟 [步驟（1 )]中，係對經可觀察、解析包含灰階部在内之區域 的光學系統（如：修正裝置中所具備的顯微鏡、單獨顯微 鏡、檢查裝置等光學系統等），而所獲得包含灰階部在内的 11 312/發明說明書(補件)/93-07/93109724 1247349 影像，藉由採用掃描器讀取照片拍攝或CCD攝影到影像 手法，或利用影像擷取器（v i d e 〇 c a p t u r e )直接讀取的手 等，獲得將包含灰階部在内之影像電子化的影像資料。 光學系統有如：可利用反射光、穿透光進行觀察的先 系統，其中，因為可利用穿透光進行觀察的光學系統， 使用者的曝光、轉印處理中，可達成更接近轉印狀況的 態，所以最好採用此方式。 再者，藉由根據影像資料，施行可辨識灰階部中之缺 的影像處理[步驟（2 )]，便將製成可判斷使用者在曝光、 印處理中之轉印狀況的影像。 在本發明中，影像處理除如「模糊處理」（方法2 )、「 調處理」（方法3 )之外，尚可具體舉例如：影像讀取處理 灰階化（破壞色彩資訊）處理、色條校正處理（稱「僅校正 像内特定明亮度區域的處理」，包含僅抽取出如白、黑資 的處理）等等。 其中，所謂「模糊處理」係為「清晰處理」的相反， 將變化形成滑順的處理。此「模糊處理」通常主要係指 用影像處理將影像細微化（分割），並分別對各個經細微 的影像，在未改變面積（強度）的情況下，施行高斯分布 之後，再度各個重疊（相加）的處理方法，在影像處理領 中，亦涵蓋通稱「模糊處理」的其他處理方法。「模糊處3 之條件係可利用影像細微化（像素化）程度、經高斯分布 的資料加工（如：使模糊部分的範圍（距離）產生變化）等 便可詳細設定，配合所檢查的圖案等，便可變更詳細的 312/發明說明書(補件)/93-07/93109724 的 法 學 在 狀 陷 轉 強 影 訊 指 利 化 化 域 【j 化 5 設 12 1247349 定條件（即，設定模糊效果程度）。另外，在模糊處理後， 面積（強度）總計仍無變化。此模糊處理條件可利用模擬確 認到幾乎等於使用者的曝光、轉印處理中之實際光轉印狀 態。即，探討使用者的曝光條件（如：光之照射量條件、刻 意未解析灰階圖案的條件等），藉由施行對應此的模糊處 理，便製成能從灰階部的圖案中，判斷經使用者曝光後之 轉印影像所對應，在使用者的曝光、轉印處理中的轉印狀 況之影像。 依此本發明經影像處理，並藉由任意設定使用者的曝光 條件來施行模擬，便可製成對應著經使用者曝光後之轉印 影像的影像，即，製成可判斷使用者曝光、轉印處理中之 轉印狀況的影像。換句話說，製成使用者曝光、轉印處理 中之轉印狀況的影像之機構，係採用影像處理，因此可任 意設定使用者的曝光條件，並輕易且高精度地施行模擬， 特別係可任意設定光的照射量條件並施行模擬，相較於使 預曝光機實際進行確認的手法之下，特別具優勢且有效性 頗南。 再者，所謂「強調處理」係指影像中之缺陷部分的強調 化處理。例如··根據針對影像處理後之資料預先設置的濃 淡臨限值，強調顯示超過臨限值區域的處理。 在本發明中，最好均施行「模糊處理」與「強調處理」， 將可達提昇缺陷檢查（判斷）精度的效果。 在根據上述影像處理後的資料，施行缺陷檢查的步驟 [步驟（3 )]中，根據針對影像處理後的資料預先設定的濃淡 13 312/發明說明書(補件)/93-07/93109724 1247349 容許範圍（如：臨限值），便可執行缺陷檢查（判斷）（方法 5) 〇 因為在灰階部中存在有重複圖案，因而將存在重複圖案 的CD偏差。在考慮該等CD偏差範圍的前提下，使用者不 管採取「上限（如：粗圖案）」、「下限（如：細圖案）」均不 受影響的條件施行曝光。所以，修正後的圖案便需要進入 上限〜下限（容許偏差範圍）之間。其中一例係對應此上限〜 下限（容許偏差範圍）而設定臨限值。例如針對灰階部未修 正正常圖案的C D容許精度所對應穿透率範圍，可根據能獲 得擴展± 5 %或-5 %範圍之穿透率範圍的濃淡容許範圍（臨限 值），施行缺陷檢查（判斷）。 本發明係根據能判斷使用者曝光、轉印處理中之轉印狀 況的影像處理後資料（影像），施行修正部的評估，再根據 此評估結果施行再度修正，以使修正後的圖案進入使用者 的容許範圍内（方法6 )。此外，亦可預先儲存此種評估結 果，並根據此所儲存的資料，施行灰階部的缺陷修正（方法 6 ) ° 本發明的缺陷檢查方法，特別適用於灰階部屬於形成有 使用灰階罩幕之曝光機，解析臨界以下遮光圖案之區域的 情況（方法4)。此係因為超過臨限值之線寬較粗或較細影 響，將因影像處理而明顯化，所以在使用者的曝光條件中， 可依較高精度判斷灰階部圖案是否有缺陷的緣故所致。 再者，本發明的缺陷修正、判斷方法，亦可適用灰階部 屬於形成半穿透光膜的區域。 14 312/發明說明書(補件)/93-07/93109724 1247349 本發明可利用於相關灰階罩幕之灰階部的新圖案或正 常圖案，與變形狀修正圖案的圖案決定方法。 具體而言，包含有： (1 )利用既定形狀及/或排列，製作上述灰階部之新圖案 或與正常圖案不同形狀的修正圖案的步驟； (2 )製作包含有上述灰階部圖案之影像資料的步驟；以 及 (3 )根據上述影像資料，對灰階部施行可辨識缺陷之影 像處理的步驟； 其中，根據經上述（1 )〜（3 )步驟所獲得上述影像處理後 的資料，判斷在使用者的曝光條件中是否將造成問題，並 將此判斷結果進行回饋，以未存在缺陷的方式決定灰階部 形狀及/或排列，便可決定達成所需灰階效果的灰階部圖案 (方法9 )。 本發明針對LCD製造用灰階罩幕或顯示裝置製造用灰階 罩幕之缺陷修正、判斷方法將特別有效（方法8 )。此係因 為近年隨顯示裝置的高精細化，解決上述各項問題係為當 務之急的緣故。 依照上述本發明的話，將可達下述效果。 (1 )藉由探討使用者的曝光條件（如：光之照射量條件、 刻意未解析灰階圖案的條件等），執行對應此的影像處理， 便可從灰階部圖案製成對應由使用者曝光後的轉印影像之 能判斷使用者之曝光、轉印處理中之轉印狀況的影像。 (2 )藉由製成影像資料，可採用影像處理軟體施行可辨 15 312/發明說明書(補件)/93-07/93109724 1247349 識缺陷的影像處理，所以可施行高精度的缺陷檢查。 (3 )針對新圖案，可判斷是否能達所需灰階效果。 (4 )針對上述第1問題，即便為利用近似於正常圖案形 狀的圖案（正常圖案的C D容許精度外）進行修正的情況（方 法7 )、或利用不同於正常圖案的變形圖案進行修正的情況 (方法7 )(即，均無法施行尋常的比較檢查之情況），均可 藉由使用者曝光條件[如：刻意不解析灰階圖案的條件或光 之照射量條件（如：存在過度與不足之照射條件等）等等] 所對應的轉印影像，輕易地進行判斷。 (5 )針對上述第2問題，即便為因修正而造成玻璃損傷， 導致玻璃基板穿透率降低的情況，仍可判斷在使用者的曝 光條件[如：刻意不解析灰階圖案的條件或光之照射量條件 (如：存在過度與不足之照射條件等）等等]下，是否將造成 問題。 (6 )針對上述第3問題，在使用者的曝光條件[如：刻意 不解析灰階圖案的條件或光之照射量條件（如：存在過度與 不足之照射條件等）等等]下，可判斷灰階部圖案是否有缺 陷。 (7 )可細微判斷至例如在使用者的曝光、轉印處理中， 造成問題的微小缺陷。 (實施例） 圖4所示係實施例所使用雷射修正裝置（雷射CVD修復 裝置）概略構造說明示意圖。 在該等圖式中，雷射束11係光束擴徑器12而放大，並 16 312/發明說明書(補件)/93-07/93109724 1247349 看到大致均勻明亮度（大致均勻灰色）的情況，包含 圖案在内區域的影像，則如圖1 ( 5 )所示，具有較0| 色）部分。在此就由正常圖案所構成灰階部的大致均 度（大致均勻灰色），針對具一定暗度（一定深度以上 部分之包含修正圖案在内的灰階部，綜合性判斷一 暗度（一定深度以上深灰色）部分的暗度（濃度）、面 置等，便可評估修正部。 在本實施例中，針對經「模糊處理」後的影像， 影像中之缺陷部分進行強調化的「強調處理」處理 處理」後的影像，如圖1 (6)所示。此「強調處理」 針對影像處理後的資料所預先設置的濃淡臨限值， 超過臨限值區域的強調顯示處理。具體而言，如圖2 相關「模糊處理」後的影像，針對正常圖案之CD容 所對應範圍（圖中，顯示為灰階部容許範圍），將達 以下（臨限值以下）之一定深度以上的深灰色部分， 顯示，並將達此範圍以上（臨限值以上）之一定淡度 淡灰色部分，以白色顯示，藉此而施行「強調處理. 若依照此「強調處理」的話，藉由根據臨限值的數值 便可利用黑色或白色顯示出缺陷部分，所以可更容 精度地施行缺陷檢查。 本實施例中.，雖因影像處理的「模糊處理」而明 線寬太粗影響，與同樣的因影像處理的「模糊處理 顯化的玻璃部損傷，造成穿透率降低的影響，將複 影響，但是可依高精度輕易地針對在使用者曝光、 312/發明說明書(補件)/93-07/93109724 修正後 ί* (深灰 勻明亮 深灰色） 定以上 積、位 施行對 。「強調 係根據 施行對 !所示， 許精度 此範圍 以黑色 以上的 j。因為 .處理， 易且高 顯4匕的 」而明 合發生 轉印處 19 1247349 理中是否構成問題進行判斷。 在本實施例中，在修正裝置上經修正後，可對在相同修 正裝置上剛修正後的修正地方進行評估。 (實施例2 ) 圖3所示係說明本發明實施例之灰階部著黑缺陷修正、 檢查方法的部分俯視圖。 本實施例係關於對圖3 (1 )所示灰階部3的正常圖案，如 圖3 ( 2 )所示，當在應符合使用者要求而設定規格（圖案線 寬、形狀）方面，不致造成問題的微小黑缺陷（凸缺陷），出 現在灰階部3之遮光圖案3 a其中一部份的情況。此時，微 小黑缺陷（凸缺陷）更進一步利用雷射修復裝置的去除（所 謂「追加修正精度」），因為將影響相鄰細微穿透部3 b (玻 璃部圖案）或遮光圖案3a，因此便不執行。 針對包含有修正後圖案在内區域的影像，施行本發明的 影像處理。即，採用可觀察、解析包含灰階部在内區域的 光學系統，讀取包含灰階部在内的影像，而獲得經電子化 的影像資料。 具體而言，移動通常在缺陷觀察、檢查中所採用的顯微 鏡的成像透鏡（物鏡），再利用照相拍攝取得包含修正後圖 案在内區域之影像的對焦影像，再將此影像照片使用掃描 器等，獲得將包含灰階部在内影像電子化的影像資料[圖 3(3)]。 將此經電子化影像資料，施行灰階化處理（破壞色彩資 訊），接著施行色調校正處理（如：僅抽取出白、黑資訊的 20 312/發明說明書(補件)/93-07/93109724 1247349 處理，當正常圖案的情況時，玻璃基板部分大致相當於 「白」，圖案部分大致相當於「黑」）[圖3 (4)]。 針對上述色調校正處理後的影像資料，施行「模糊處 理」。具體而言，將影像細微化（分割），對此各個細微化在 不改變面積（強度）之前提下，施行高斯分布後，再度將各 個重疊（相加）處理，而施行「模糊處理」。經施行「模糊處 理」後的狀態，如圖3 ( 5 )所示。 此時，相對於由正常圖案所構成灰階部（未圖示），可觀 看到大致均勻明亮度（大致均勻灰色）的情況，包含修正後 圖案在内區域的影像，則如圖1 ( 5 )所示，具有較暗（深灰 色）部分。在此就由正常圖案所構成灰階部的大致均勻明亮 度（大致均勻灰色），針對具一定暗度（一定深度以上深灰色） 部分之包含修正圖案在内的灰階部，綜合性判斷一定以上 暗度（一定深度以上深灰色）部分的暗度（濃度）、面積、位 置等，便可評估修正部。 在本實施例中，針對經「模糊處理」後的影像，施行對 影像中之缺陷部分進行強調化的「強調處理」處理。「強調 處理」後的影像，如圖3 (6)所示。此「強調處理」係根據 針對影像處理後的資料所預先設置的濃淡臨限值，施行對 超過臨限值區域的強調顯示處理。具體而言，如同實施例 1，相關「模糊處理」後的影像，針對正常圖案之CD容許 精度所對應範圍，將達此範圍以下之一定深度以上的深灰 色部分，以黑色顯示，藉此施行「強調處理」。因為若依照 此「強調處理」的話，藉由根據臨限值的數值處理，便可 21 312/發明說明書(補件)/93-07/93109724 1247349 利用黑色顯示出缺陷部分，所以可更容易且高精度地施行 缺陷檢查。 本實施例中，雖因影像處理的模糊處理而明顯化的微小 缺陷（應符合使用者要求而設定規格（圖案線寬、形狀）方 面，不致造成問題的微小黑缺陷），可依高精度輕易地判斷 在使用者曝光、轉印處理中是否構成問題。 另外，在本發明中，相對於由正常圖案所構成灰階部之 「模糊處理」後的影像中，大致均句明亮度（大致均勻灰色） 的情況，包含有具一定明亮度（一定淡度以上淡灰色）部分 之修正圖案在内的灰階部，綜合性判斷一定以上明亮度（一 定淡度以上淡灰色）部分的明亮度（淡度）、面積、位置等， 便可評估修正部的白缺陷。此外，因為藉由施行「強調處 理」，並藉由根據臨限值的數值處理，便可利用白色顯示出 缺陷部分，所以可更容易且高精度地施行缺陷檢查。 (比較例） 相關圖1 ( 2 )所示修正後圖案、及圖3 ( 2 )所示具微小黑 缺陷的圖案，施行與正常圖案間的普通比較檢查，結果僅 修正部被強調，頗難判斷良莠。另外，相關圖1 ( 2 )所示修 正後圖案，當然無法施行普通的比較檢查。此外，相關圖 3 ( 2 )所示微小黑缺陷，則無法在普通的比較檢查中檢測出。 另外，本發明並不僅限於上述實施例。 在上述實施例1中，雖舉施行近似正常圖案的修正（正 常圖案之CD容許精度外）的情況，但是針對（1 )形成達到與 正常圖案相同灰階效果的不同形狀及/或排列之正常圖案 22 312/發明說明書(補件)/93-07/93109724 1247349 的情況，（2 )當施行正常圖案或所謂修正圖案判斷之情況 時，在使用者的曝光條件下，均可判斷灰階部圖案是否有 缺陷。 再者，在上述第2問題的「因玻璃損傷所造成玻璃基板 穿透率降低」方面，藉由採用依穿透光觀察的影像，便可 判斷使用者曝光後之轉印影像所對應的缺陷。 (發明效果） 依照上述本發明的話，將具有下述效果。 (1 )藉由探討使用者的曝光條件，執行對應此的影像處 理，便可從灰階部圖案，製成對應由使用者曝光後的轉印 影像之能判斷，使用者之曝光、轉印處理中之轉印狀況的 影像。 (2 )藉由製成影像資料，可採用影像處理軟體施行可辨 識缺陷的影像處理成，所以可施行高精度的缺陷檢查。 (3 )針對新圖案，可判斷是否能達所需灰階效果。 (4 )針對上述第1問題，即便為利用近似於正常圖案形 狀的圖案（正常圖案的CD容許精度外）進行修正的情況或 利用不同於正常圖案的變形圖案進行修正的情況（即，均無 法施行尋常的比較檢查之情況），藉由使用者曝光條件所對 應的轉印影像，仍可輕易地進行判斷。 (5 )針對上述第2問題，即便為因修正而造成玻璃損傷， 導致玻璃基板穿透率降低的情況，仍可判斷在使用者的曝 光條件下，是否將造成問題。 (6 )針對上述第3問題，在使用者的曝光條件下，可判 23 312/發明說明書(補件)/93-07/93109724 1247349 斷灰階部圖案是否有缺陷。 (7 )可細微判斷至例如在使用者的曝光、轉印處理中， 造成問題的微小缺陷層級。 【圖式簡單說明】 圖1 ( 1 )〜（6 )為供說明本發明實施例1的灰階部中，黑 缺陷修正、檢查方法的部分俯視圖。 圖2為供說明本發明實施例之強調處理的示意圖。 圖3 ( 1 )〜（6 )為供說明本發明實施例2的灰階部中，微 小黑缺陷檢查方法的部分俯視圖。 圖4為供說明雷射修正裝置概略構造示意圖。 圖5為灰階罩幕說明圖，（1 )為部分俯視圖，（2 )為部分 剖視圖。 (元件符號說明） 遮光部 2 2, 3 3, 3a 3b 11 12 13 遮光部1的部分 穿透部 無光阻部分 灰階部 灰階部3的較薄部分 遮光圖案 細微穿透部 雷射束 光束擴徑器 平凸透鏡 24 312/發明說明書(補件)/93-07/93109724 1247349[Technical Field] The present invention relates to a defect inspection (judgment) method and a defect correction method for a gray scale portion of a gray scale mask having a gray scale portion, wherein the gray scale portion is The amount of penetration of light passing through the region is reduced in the region where the penetration amount is adjusted to selectively change the thickness of the photoresist film. [Prior Art] In the field of large-size LCD masks, attempts have been made to reduce the number of masks by using a gray scale mask (see Non-Patent Document 1). As shown in FIG. 5 (1), the gray scale mask is provided on the transparent substrate: a light shielding portion 1, a penetration portion 2, and a gray scale portion 3. The gray scale portion 3 is formed by, for example, forming a region of the light-shielding pattern 3a below the resolution critical value of the exposure machine for a large LCD using a gray scale mask to reduce the amount of penetration of light passing through the region and reducing the amount of irradiation in the region. The purpose of changing the thickness of the photoresist film is formed. The component symbol 3b is a fine penetration portion of the gray scale portion 3 below the exposure machine resolution critical value. The light shielding portion 1 and the light shielding pattern 3a are usually formed of the same thickness film made of the same material such as chromium or a chromium compound. Both the penetrating portion 2 and the fine penetrating portion 3b belong to a transparent substrate, and a transparent substrate portion such as a light shielding film is not formed. The resolution of the large L C D exposure machine using a gray scale mask is about 2.5 Ω when using a grading exposure machine and about 3 // m when using a mirror projection exposure machine. Therefore, for example, in Fig. 3 (1), the width of the fine penetration portion 3 b of the gray scale portion 3 is set to be lower than 2.5 / m, and the line width of the light shielding pattern 3a below the exposure machine resolution threshold is set to Less than 2.5//m. When the exposure is performed by the above-mentioned large-sized LCD exposure machine, since the exposure light 5 312/invention specification (supplement)/93-07/93109724 1247349 passing through the gray scale portion 3 will be insufficient in overall exposure amount, The positive photoresist which is exposed by the gray scale portion 3 may remain on the substrate when the film thickness becomes thin. That is, the photoresist will have poor solubility to the developer in the portion corresponding to the light-shielding portion 1 and the portion corresponding to the gray-scale portion 3 depending on the amount of exposure. Therefore, the shape of the photoresist after development will be as shown in FIG. (2), generally, the portion of the sputum corresponding to the opaque portion 1 will be, for example, about 1 // m, and the portion 3 ′ corresponding to the gray-scale portion 3 will be about 0. 4 to 0. 5 // m, corresponding The portion of the penetrating portion 2 will become the non-resistance portion 2'. Then, the first etching of the substrate to be processed is performed at the non-photoresist portion 2', and the thin portion 3' photoresist corresponding to the gray-scale portion 3 is removed by polishing or the like, and the portion is subjected to this portion. 2 etching, using a single mask to implement the conventional two-piece mask step to reduce the number of masks. However, as the light-shielding portion of the gray-scale mask described above is difficult to process from the fine pattern, and due to the influence of dust or the like occurring in the manufacturing step, etc., CD errors such as thinness and thickness of the light-shielding pattern 3a or Excess patterns (such as protrusions (convex), short circuits (bridges), dots, etc.) or defect patterns (such as defects (concave) or broken lines) constitute pattern defects, etc. (the following pattern is too thick, redundant pattern defects, etc.) The phenomenon is called "black defect", and the phenomenon that the pattern is too thin or defective is called "white defect". Therefore, although the pattern correction is performed for the defects occurring in the gray scale portion, various problems occur because the pattern of the gray scale portion is fine. First: For example, when a correction device of 2 // m or more is corrected by using a correction device having a minimum slit size of 2 // in, the pattern of the gray scale portion is fine (thin line width), There is a limit to the correction accuracy caused by the correction device, which is equivalent to the deviation between the portion where the correction pattern should be formed and the portion of the positive pattern to be formed (removal)/93-07/93109724 1247349. There is a limit in the accuracy of the alignment and the correction accuracy corresponding to the difference between the portion where the correction pattern should be formed and the portion where the correction pattern is actually formed. Therefore, the correction of the same shape as the normal pattern (within the CD tolerance of the normal pattern) is technically very difficult due to the occurrence of defects (for example, when a fine correction film pattern is formed in a large defect defect portion). And correcting the case), so as to implement correction as close as possible to the normal pattern, that is, correction of the normal pattern (except for the CD tolerance of the normal pattern). 2nd: Since it is technically impossible to correct the 1 // m gray scale pattern by using a correction device having a minimum slit size and 2 // m, it is formed by not restoring to a shape similar to a normal pattern. A correction pattern (the shape different from the shape of the normal pattern and/or a modified pattern of different arrangements) having the same gray scale effect as the normal pattern can be obtained to perform the technique of correcting the gray scale portion, and the related art has been An application is made (Patent Document 1). <Non-Patent Document 1 > Monthly FPD Intel Igence, p. 31-35, May 1999 <Patent Document 1 > Japanese Patent Laid-Open No. 2 0 0 2 - 1 0 7 9 1 3 [Invention] (Problems to be Solved by the Invention) The above conventional techniques have the following problems. First: In the case of a pattern corrected to the same shape as the normal pattern (within the CD tolerance of the normal pattern), a comparison check of the comparison between the normal patterns is performed, but a pattern using a shape similar to the normal pattern (normal pattern) is performed. When the CD tolerance accuracy is corrected, or when the correction is made using a pattern different from the normal pattern shape, the usual comparison 7 312 / invention specification (supplement) / 93-07/93109724 1247349 inspection cannot be performed. There are problems that are less likely to be checked. Secondly, in the case where the black defect is removed by the laser repairing device, the glass substrate is more likely to be damaged. Therefore, even when the shading pattern 3 a specification (pattern line width and shape) after the setting correction is satisfied, fine penetration is performed. When the portion (glass portion) 3 b is damaged, the transmittance of the fine penetration portion (glass portion) 3 b is lowered, so that problems may occur in the user's exposure and transfer processing. Specifically, when the glass is damaged, the light transmittance of the fine penetration portion (glass portion) 3 b is reduced, and a light shielding pattern having a finer line width than the set specification (pattern line width and shape) is generated. 3 a necessary. In this case, there will be an incomplete problem in the inspection of only the shape of the pattern. 3rd: A normal pattern (of course, CD tolerance) that is set to the specifications (pattern line width, shape) to satisfy the user's request (when the user performs exposure, set the residual photoresist film thickness) Correction pattern within the tolerance of the CD of the normal pattern and the normal pattern, because the user actually uses the gray scale mask, the exposure condition when the transfer pattern is obtained on the photoresist of the substrate to be transferred, and the exposure used according to the transfer Since the setting conditions of the optical conditions of the device vary, there is still a problem in the user's exposure and transfer processing. Specifically, the exposure conditions of the grayscale mask used by the user have a condition that is not an ordinary condition [for example, the condition that the light irradiation amount is not an ordinary condition (with excessively insufficient irradiation conditions, etc.)], or deliberately The condition for analyzing the grayscale pattern. As can be seen from the above, (1) even if the normal pattern or the correction pattern conforms to the set specifications (pattern line width and shape) (both within the CD tolerance), problems will occur in the user's exposure and transfer processing. (2) Even in the case of the correction pattern belonging to the approximate normal pattern (except for the CD tolerance of the normal pattern), in the exposure and transfer processing of the user of 8 312/invention specification (supplement)/93-07/93109724 1247349, If there is no problem (if it is judged whether the photoresist pattern after the user's exposure is qualified, it is acceptable), (3) Check whether there is a problem in the user exposure or transfer processing ( The necessity and importance of judgment). The present invention has been conceived to solve the above problems, and a first object of the present invention is to provide a gray scale which can easily and accurately perform inspection (judgment) of whether or not a gray scale portion has a problem in exposure and transfer processing of a user. Mask inspection (judgment, guarantee), correction method. Further, a second object is to provide a gray scale portion pattern determining method of a gray scale mask using the above-described inspection (determination) method. (Means for Solving the Problem) The present invention has the following configuration. (Method 1) A gray scale mask defect inspection method having a gray scale portion, a light shielding portion, and a penetration portion, wherein the gray scale portion reduces light passing through the region in an area where the penetration amount is adjusted For the purpose of selectively changing the thickness of the photoresist film, the method comprises the steps of: fabricating the image data of the gray-scale portion; and performing image processing of the identifiable defect on the gray-scale portion according to the image data. a step of performing a defect inspection according to the image processed by the image processing described above. (Method 2) The method for detecting a defect of a gray scale mask according to the method 1, wherein the step of performing the image processing includes blurring. (Method 3) The method for detecting a defect of a gray scale mask according to the method of claim 1 or 2, wherein the step of performing the image processing includes the emphasis processing. 9 312 / Inventive specification (supplied) / 93-07/93109724 1247. The method of detecting a defect of a gray scale mask according to the method 1 or 2, wherein the gray scale portion is formed using a gray scale mask The exposure machine analyzes the area of the light-shielding pattern below the critical value. (Method 5) The method for inspecting a defect of a gray scale mask according to the method of claim 1 or 2, wherein the defect inspection is performed based on a pre-set exposure range (provisional value) of the image processed by the image processing. (Method 6) The method for inspecting a gray scale mask according to the method of claim 1 or 2, wherein the image data is a corrected gray scale image data. (Method 7) The method for detecting a defect of a gray scale mask according to the method 6, wherein the corrected gray scale portion includes a pattern that achieves a shape similar to a normal pattern or a different gray shape effect of a normal pattern and / or arrange the correction pattern. (Method 8) The method for inspecting a gray scale mask according to the method 1 or 2, wherein the gray scale mask is a mask for manufacturing the LCD or a mask for manufacturing the display device (Method 9) A gray scale mask The pattern determining method has a gray scale portion, a light shielding portion and a penetration portion, wherein the gray scale portion selectively changes the photoresist film by reducing the amount of light penetration through the region in the region where the penetration amount is adjusted For the purpose of thickness, and characterized in that it comprises the following steps: (1) a step of fabricating the gray scale portion by using a predetermined shape and/or arrangement; (2) a step of producing image data of the gray scale portion; and (3) According to the above image data, a step of performing image processing of the identifiable defect on the gray scale portion; wherein, the data obtained by the image processing obtained by the above steps (1) to (3) is determined by the absence of the defect The shape of the gray scale and/or the row 10 312 / invention specification (supplement) / 93-07/93109724 1247349 column. (Method 1 Ο) The method for determining the pattern of the gray scale mask as described in the method 9, wherein the step of performing the image processing includes the blurring processing. (Method 1 1) The method for determining the pattern of the gray scale mask as described in the method of claim 9 or 10, wherein the step of performing the image processing includes the emphasis processing. (Method 1 2) The method for determining a pattern of a gray scale mask according to the method of claim 9 or 10, wherein the gray scale portion forms a region of the light-shielding pattern below the critical value of the exposure machine using the gray scale mask. [Embodiment] The inspection (judgment, guarantee) and correction method of the gray scale mask of the present invention is characterized by (method 1): (1) forming an image containing a gray scale portion (for example, containing a modified gray scale portion pattern) (1) a step of performing image processing for identifying defects in the gray scale portion according to the image data; and (3) performing data processing according to the image processing according to the image data, The steps to perform a defect check. According to the image data of an image containing a gray scale portion (for example, an image containing a modified gray scale portion pattern or an image containing a normal pattern), the present invention can be used to determine a transfer in a user's exposure and transfer process. The image of the situation causes the grayscale pattern to enter the user's tolerance. Wherein, in the image data forming step [step (1)] of the image including the gray scale portion, the optical system is observable and parsed in the region including the gray scale portion (for example, in the correction device) With an optical system such as a microscope, a separate microscope, or an inspection device, etc., an image of 11 312/invention specification (supplement)/93-07/93109724 1247349 including a gray scale portion is obtained, which is read by using a scanner. Photographing or CCD photography to image manipulation, or using a video capture device (vide 〇capture) to directly read the image, etc., to obtain image data containing the grayscale portion of the image. The optical system is, for example, a prior system that can be observed by using reflected light or transmitted light. Among them, since the optical system capable of observing light can be used, the exposure and transfer processing of the user can be closer to the transfer condition. State, so it is best to use this method. Further, by performing image processing [step (2)] which is identifiable in the grayscale portion based on the image data, an image which can determine the transfer state of the user in the exposure and printing processes is prepared. In the present invention, in addition to "fuzzy processing" (method 2) and "tone processing" (method 3), for example, image reading processing grayscale (destructive color information) processing, color Strip correction processing (referred to as "processing to correct only a specific brightness area in an image", including processing such as extracting only white and black money) and the like. Among them, the "fuzzy processing" is the reverse of the "clear processing", and the change is formed into a smooth processing. This "fuzzification" usually refers to the image processing to subdivide (segment) the image, and separately perform the Gaussian distribution on each subtle image without changing the area (intensity), and then overlap each other again. In addition to the processing method of image processing, other processing methods known as "fuzzy processing" are also covered. "The condition of the blur 3 can be set in detail by using the degree of image miniaturization (pixelization) and data processing by Gaussian distribution (for example, changing the range (distance) of the blurred portion), etc., in conjunction with the checked pattern, etc. , you can change the detailed 312 / invention manual (supplement) / 93-07/93109724 law in the case of the situation, the strong video information refers to the profitable field [j 5 set 12 1247349 conditions (ie, set the degree of blur effect) In addition, after the blurring process, the area (strength) total remains unchanged. This blurring processing condition can be confirmed by simulation to be almost equal to the actual light transfer state in the exposure and transfer processing of the user. The exposure conditions (such as the condition of the amount of light irradiation, the condition of deliberately unresolved gray scale pattern, etc.) are determined by the blurring process corresponding to this, and can be determined from the pattern of the gray scale portion after being exposed by the user. The image corresponding to the transfer image in the exposure and transfer process of the user, and the image processing according to the present invention, and arbitrarily setting the user's exposure By performing the simulation, an image corresponding to the transferred image after being exposed by the user can be produced, that is, an image which can be judged by the user in the exposure and transfer processing in the transfer process. In other words, it is made. The image processing is used for the image of the transfer state during the user's exposure and transfer processing. Therefore, the user's exposure conditions can be arbitrarily set, and the simulation can be performed easily and with high precision, in particular, the amount of light can be arbitrarily set. The condition and the simulation are particularly advantageous and effective compared to the method of actually confirming the pre-exposure machine. Further, the "emphasis processing" refers to the emphasis processing of the defective portion in the image. For example, the processing of exceeding the threshold area is emphasized based on the density threshold set in advance for the image after image processing. In the present invention, it is preferable to perform "blurring processing" and "emphasis processing" to achieve the effect of improving the accuracy of defect inspection (judgment). In the step of performing the defect inspection [step (3)] according to the data processed by the image processing described above, the shading 13 312/invention specification (supplement)/93-07/93109724 1247349 which is preset according to the image after image processing is allowed. For the range (eg, threshold), defect inspection (judgment) can be performed (method 5) 〇 Since there is a repeating pattern in the gray scale portion, there will be a CD deviation of the repeating pattern. Under the premise of considering the range of such CD deviations, the user does not take the conditions of "upper limit (such as: coarse pattern)" and "lower limit (such as fine pattern)" to perform exposure. Therefore, the corrected pattern needs to enter between the upper limit and the lower limit (tolerance range). One of the examples sets the threshold value corresponding to the upper limit to the lower limit (permissible deviation range). For example, for the transmittance range corresponding to the allowable accuracy of the CD in which the gray pattern is not corrected, the defect can be obtained according to the exposure range (threshold) of the transmittance range in which the range of ± 5% or -5% is extended. Check (judgment). According to the present invention, the image processing data (image) capable of determining the user's exposure and transfer processing is subjected to evaluation by the correction unit, and then the correction result is re-corrected according to the evaluation result so that the corrected pattern is used. Within the permissible range (method 6). In addition, the evaluation result may be stored in advance, and the defect correction of the gray scale portion may be performed according to the stored data (method 6). The defect inspection method of the present invention is particularly suitable for the gray scale portion to be formed with the use gray scale. In the case of the exposure machine of the mask, the area of the light-shielding pattern below the critical level is analyzed (method 4). Because the line width exceeding the threshold is thicker or thinner, it will be obvious due to image processing. Therefore, in the user's exposure conditions, it is possible to judge whether the gray-scale pattern is defective according to high accuracy. To. Further, the defect correction and determination method of the present invention can also be applied to a region in which the gray scale portion belongs to a semi-transparent light film. 14 312/Invention Manual (Supplement)/93-07/93109724 1247349 The present invention can be applied to a new pattern or a normal pattern of a gray scale portion of a gray scale mask, and a pattern determining method for a shape correction pattern. Specifically, the method includes the following steps: (1) a step of creating a new pattern of the gray scale portion or a correction pattern having a shape different from the normal pattern by using a predetermined shape and/or arrangement; (2) fabricating the pattern including the gray scale portion. And (3) performing a step of performing image processing of the identifiable defect on the gray scale portion according to the image data; wherein, according to the image processed by the above (1) to (3) steps, Determining whether a problem will occur in the user's exposure conditions, and feeding back the judgment result, and determining the shape and/or arrangement of the gray scale portion in the absence of the defect, thereby determining the gray scale portion that achieves the desired gray scale effect. Pattern (method 9). The present invention is particularly effective for the defect correction and determination method of the gray scale mask for the manufacture of a gray scale mask or display device for LCD manufacturing (method 8). This is because of the high definition of display devices in recent years, it is a matter of urgency to solve the above problems. According to the present invention described above, the following effects can be obtained. (1) By discussing the exposure conditions of the user (such as the condition of the amount of light irradiation, the condition of the intentionally unresolved gray scale pattern, etc.), the image processing corresponding to this is performed, and the corresponding pattern can be made from the pattern of the gray scale portion. The image of the transfer image after exposure can be used to determine the image of the user's exposure and transfer conditions during the transfer process. (2) By making image data, image processing software can be used to perform image processing that can identify defects, so that high-precision defect inspection can be performed. (3) For the new pattern, it can be judged whether the desired gray scale effect can be achieved. (4) In the case of the above-described first problem, the correction is performed by using a pattern similar to the normal pattern shape (except for the CD tolerance of the normal pattern) (method 7), or correction using a deformation pattern different from the normal pattern. (Method 7) (that is, the case where ordinary comparison checks cannot be performed) can be performed by the user's exposure conditions [eg, deliberately not analyzing the conditions of the gray scale pattern or the conditions of the light exposure (eg, excessive and insufficient) The irradiation conditions, etc., etc., are correspondingly determined, and the judgment is easily made. (5) In the second problem described above, even if the glass is damaged due to the correction, the transmittance of the glass substrate is lowered, and the exposure conditions of the user can be judged [eg, conditions or light that intentionally do not analyze the gray scale pattern) Whether the conditions of exposure (such as excessive and insufficient irradiation conditions, etc.), etc., will cause problems. (6) In response to the third problem described above, under the exposure conditions of the user [eg, deliberately not analyzing the condition of the gray scale pattern or the irradiation condition of the light (eg, excessive and insufficient irradiation conditions, etc.), etc.] Determine if the grayscale pattern is defective. (7) It is possible to minutely judge, for example, a minute defect causing a problem in the exposure and transfer processing of the user. (Embodiment) FIG. 4 is a schematic view showing a schematic configuration of a laser correction device (laser CVD repairing device) used in the embodiment. In these figures, the laser beam 11 is amplified by the beam expander 12, and 16 312 / invention specification (supplement) / 93-07/93109724 1247349 sees a substantially uniform brightness (substantially uniform gray) The image containing the pattern in the inner region is as shown in Fig. 1 (5) and has a portion of 0|color. Here, the approximate uniformity (substantially uniform gray) of the gray-scale portion formed by the normal pattern is comprehensively judged to have a darkness (a certain degree of darkness (a gray degree portion including a correction pattern at a certain depth or more) The correction unit can be evaluated by the darkness (density) of the portion above the depth (deep gray), the surface, etc. In the present embodiment, the emphasis on the defective portion of the image after the "blurred processing" is emphasized. The image after processing "processing" is as shown in Fig. 1 (6). This "emphasis processing" is based on the highlighting limit value set in advance for the image processed data, and exceeds the highlight display processing in the threshold area. In the image after the "blurring" in Fig. 2, the range corresponding to the CD capacity of the normal pattern (shown as the allowable range of the grayscale portion in the figure) will be equal to or greater than a certain depth (below the threshold). The dark gray part, which is displayed, and will be displayed in white with a certain lighter grayish part above this range (above the threshold), thereby performing "emphasis processing. If this is emphasized" In the case of the threshold value, the defective portion can be displayed in black or white, so that the defect inspection can be performed more accurately. In the present embodiment, the image processing is "blurred". The line width is too thick, and the same effect of the glass processing caused by the blurring of the image processing, resulting in the reduction of the penetration rate will be affected, but can be easily targeted to the user exposure, 312/ Invention manual (supplement) /93-07/93109724 After correction ί* (dark gray evenly dark gray) Set the above product and position to perform the pair. "The emphasis is based on the implementation of the pair! j. Because the processing is easy and high, and the transfer occurs, the determination of whether or not the transfer portion 19 1247349 constitutes a problem is judged. In this embodiment, after the correction device is corrected, the same correction can be made. The correction point immediately after the correction is performed on the device. (Embodiment 2) FIG. 3 is a partial plan view showing a black defect correction and inspection method for the gray scale portion according to the embodiment of the present invention. Regarding the normal pattern of the gray scale portion 3 shown in Fig. 3 (1), as shown in Fig. 3 (2), when the specifications (pattern line width and shape) are set in accordance with the user's request, the problem is not caused to be small. A black defect (convex defect) occurs in a part of the light-shielding pattern 3 a of the gray-scale portion 3. At this time, the minute black defect (convex defect) is further removed by the laser repairing device (so-called "additional correction accuracy" ”), since the adjacent fine penetrating portion 3b (glass portion pattern) or the light-shielding pattern 3a is affected, it is not executed. The image processing of the present invention is performed on the image including the corrected pattern in the region. An optical system that can observe and analyze a region including a gray scale portion, and reads an image including a gray scale portion to obtain an electronic image data. Specifically, the imaging lens (objective lens) of the microscope generally used for defect observation and inspection is moved, and the focused image of the image including the corrected pattern is obtained by photographing, and the image is used by using a scanner or the like. Obtain image data that will be electronically imaged including the grayscale part [Fig. 3(3)]. Performing grayscale processing (destruction of color information) on the electronic image data, and then performing tone correction processing (eg, extracting only white and black information 20 312/invention manual (supplement)/93-07/93109724 1247349 Processing, in the case of a normal pattern, the glass substrate portion is roughly equivalent to "white", and the pattern portion is roughly equivalent to "black") [Fig. 3 (4)]. The "blur processing" is performed on the image data after the tone correction processing. Specifically, the image is subdivided (divided), and the miniaturization is performed before the area (intensity) is changed, and after the Gaussian distribution is performed, each overlap (addition) is processed again, and "blurring" is performed. The state after the implementation of "fuzzy processing" is shown in Figure 3 (5). At this time, a substantially uniform brightness (substantially uniform gray) can be observed with respect to the gray scale portion (not shown) formed by the normal pattern, and the image including the corrected pattern in the inner region is as shown in FIG. 1 (5). ) shows a darker (dark gray) part. Here, the substantially uniform brightness (substantially uniform gray) of the gray-scale portion formed by the normal pattern is comprehensively judged for the gray-scale portion including the correction pattern with a certain degree of darkness (deep gray above a certain depth). The correction unit can be evaluated by the darkness (concentration), area, position, etc. of the darkness (deep gray above a certain depth). In the present embodiment, the "emphasis processing" for emphasizing the defective portion of the image is performed on the image subjected to the "blurring process". The image after "emphasis processing" is shown in Figure 3 (6). This "emphasis processing" performs an emphasis display process for exceeding the threshold area based on the exposure threshold set in advance for the image after image processing. Specifically, as in the first embodiment, the image corresponding to the "blurring process" is displayed in black for the dark gray portion of a certain depth or less below the range for the range corresponding to the CD allowable accuracy of the normal pattern. "emphasize processing." Because according to this "emphasis processing", by the numerical processing according to the threshold value, 21 312 / invention manual (supplement) / 93-07/93109724 1247349 can be used to display the defective portion in black, so it is easier and Defect inspection is performed with high precision. In the present embodiment, the small defects that are apparent due to the blurring processing of the image processing (the micro-defects that do not cause problems due to the specification (pattern line width, shape) in accordance with the user's requirements) can be easily adjusted according to high precision. It is judged whether or not it poses a problem in the user exposure and transfer processing. Further, in the present invention, in the image after the "blurring" of the gray scale portion formed by the normal pattern, the brightness of the uniform sentence (substantially uniform gray) includes a certain degree of brightness (a certain degree of lightness). In the gray-scale part of the correction pattern of the light gray part above, the brightness (lightness), area, position, etc. of the brightness (a certain lightness or more) may be comprehensively judged, and the correction part may be evaluated. White defect. Further, since the "emphasis processing" is performed and the numerical value processing according to the threshold value is performed, the defective portion can be displayed in white, so that the defect inspection can be performed more easily and with high precision. (Comparative Example) Corresponding to the corrected pattern shown in Fig. 1 (2) and the pattern with a slight black defect shown in Fig. 3 (2), a normal comparison check with the normal pattern is performed, and as a result, only the correction portion is emphasized, which is difficult. Judge the good. In addition, with regard to the corrected pattern shown in Fig. 1 (2), it is of course impossible to perform a normal comparison check. In addition, the micro black defect shown in Fig. 3 (2) cannot be detected in the ordinary comparison check. Further, the present invention is not limited to the above embodiment. In the first embodiment described above, although the correction of the normal pattern (except for the CD tolerance of the normal pattern) is performed, the normal shape and/or arrangement of the same gray scale effect as the normal pattern is formed for (1). In the case of the pattern 22 312 / invention specification (supplement) / 93-07/93109724 1247349, (2) when the normal pattern or the so-called correction pattern is judged, the gray scale portion can be judged under the exposure condition of the user. Whether the pattern is defective. Furthermore, in the second problem of "the glass substrate transmittance is lowered due to glass damage", it is possible to determine the defect corresponding to the transferred image after exposure by the user by using the image observed by the transmitted light. . (Effect of the Invention) According to the present invention described above, the following effects will be obtained. (1) By discussing the exposure conditions of the user and performing the corresponding image processing, the gray scale pattern can be determined from the gray image of the transfer image, and the user can be exposed and transferred. An image of the transfer condition in the process. (2) By making image data, the image processing software can be used to perform image processing with identifiable defects, so that high-precision defect inspection can be performed. (3) For the new pattern, it can be judged whether the desired gray scale effect can be achieved. (4) The above-described first problem is a case where correction is performed by a pattern that approximates a normal pattern shape (except for the CD tolerance of a normal pattern) or a correction pattern that is different from a normal pattern (that is, it is impossible to correct) By performing an ordinary comparison check, the judgment can be easily made by the transfer image corresponding to the user's exposure conditions. (5) In the second problem described above, even if the glass is damaged due to the correction, the transmittance of the glass substrate is lowered, and it is possible to determine whether or not a problem will occur under the exposure conditions of the user. (6) For the above-mentioned third problem, under the exposure conditions of the user, it is possible to determine whether the pattern of the gray-scale step is defective in 23 312/invention specification (supplement)/93-07/93109724 1247349. (7) The minute defect level which causes a problem, for example, in the exposure and transfer processing of the user, can be finely judged. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 (1) to (6) are partial plan views for explaining a black defect correction and inspection method in a gray scale portion according to a first embodiment of the present invention. Fig. 2 is a schematic view for explaining the emphasis processing of the embodiment of the present invention. Fig. 3 (1) to (6) are partial plan views for explaining a method of inspecting a micro black defect in the gray scale portion of the second embodiment of the present invention. Fig. 4 is a schematic view showing the schematic configuration of a laser correction device. Fig. 5 is an explanatory view of a gray scale mask, (1) is a partial plan view, and (2) is a partial sectional view. (Description of component symbols) Light-shielding portion 2 2, 3 3, 3a 3b 11 12 13 Partial penetration portion of the light-shielding portion 1 No light-resistance portion Gray-scale portion Gray-scale portion 3 Light-shielding portion Light-shielding pattern Fine-penetration portion Laser beam Beam expander plano-convex lens 24 312 / invention manual (supplement) /93-07/93109724 1247349
14 長 方 形 狹 縫（ 可變矩形開口） 15 成 像 透 鏡 (物 鏡） 16 指 示 燈 17 顯 微 鏡 18 昭 έ 明 20 光 罩 312/發明說明書(補件)/93-07/93109724 2514 Rectangular slit (variable rectangular opening) 15 Imaging lens (obj.) 16 Indicator light 17 Microscope 18 Zhao Ming 20 Light cover 312 / invention manual (supplement) / 93-07/93109724 25