TW412891B - Reliable modular production quality narrow-band high rep rate F2 laser - Google Patents

Abstract

The present invention provides a reliable modular production quality excimner laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of tree modules; an optical resonator comprised of a line narrowing module and an output coupler module a wavemeter module,an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power Unit to produce taster rise time and improved pulse energy control These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse form the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in The past has posed a hazard.

Description

A7 '^ —-- 4IS891-^ __ 5. Description of the invention (/) This application partially continues to build a file on March 17, 1999, serial number 09 / 271,041, which can reliably produce modular narrow band high repetition rate ArF excimer with high quality. Laser: Archived on March 11, 998 'Serial No. 09 / 041,474, reliable and modular production quality narrow-band KrF excimer laser: Archived 12/22/97, serial No. 08 / 995,832, with fine digital adjustment Pulse wave power supply excimer laser: file 7/18/97, serial number 08 / 896,384, wavelength of excimer laser reference: 9/29/97, «Case, serial number 08 / 939,611, repeated diffraction Grating protective coating; 10/10/97 file, serial number 08/947, 4 7 4ι narrowband excimer laser; 3/4/98 file, serial number 09 / 034,870, pulse wave of excimer laser Energy control; 5/20/98 file, serial number 09 / 082,139 'Narrow-band excimer laser with gas additives; 9/18/98 file, serial number 09 / 157,067, reliable modular production quality narrow-band high repeat Rate excimer laser; 9/28/98 file, serial number 09 / 162,341, line narrowing device with high penetration chirped beam expander: 10/2 / 98 file > serial number 09 / 165,593, excimer laser wavelength system: 12/7/98 file 1, serial number 09 / 206,526, laser wavelength reference; 12/15/98 file, serial number 09 / 211,825, with High-pulse-rate power supply system with resonant power supply; 12/21/98 Archive • Serial No. 09 / 217,340 'Durable calibrator-based output couplers, all of which are listed here for reference. The present invention relates to lasers, and in particular to narrow-band ArF excimer lasers. "K r F excimer lasers holmium fluoride (KrF) excimer lasers have now become the main light source of the integrated circuit photoengraving industry." KrF lasers produce It has a narrow band wave of about 248nm. 4 This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the precautions on the back before filling this page). ^ AJ · Line, Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Consumption Cooperative of the Ministry of Economy Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Consumption Cooperative of A7 ___ 412 ^ 91_b7 ______ 5. Description of the Invention (2) A long group of laser beams can be used to generate an integrated circuit of approximately 180nm. ArF fluoride excimer lasers are very similar to KrF lasers. The main difference is the wavelength of the laser gas mixture and the shorter output beam. Basically, argon replaces krypton and the wavelength of the output beam produced is 193 nm. This allows the size of the integrated circuit to be further reduced to about 120nm »F2 laser is considered to be the successor of KrF and ArF lasers in the integrated circuit photoengraving industry, because the 157nm beam allows pattern analysis above the main Improve. These F2 lasers can be very similar to KrF and ArF excimer lasers and can be slightly modified to operate as an F2 laser like KrF or ArF lasers of the prior art. A typical prior art KrF excimer laser used in integrated circuit production is shown in Figures 1 and 2. The sectional view of the laser chamber of the previous laser technology is shown in FIG. 3 "The pulse wave power system 2 powered by the high voltage power supply 3 supplies electrical pulses to the electrodes 6 placed in the capacitor chamber 8. A typical state-of-the-art photoengraving laser is operated at a pulse wave rate of about 1000 Hz with a pulse wave energy of about 10 mJ per pulse. Laser gas (for KrF lasers, approximately 0.1% fluorine, 1.3% tritium, and the rest is neon as a buffer gas) circulates between the electrodes at a speed of about 11,000 inches per second at about 3 atmospheres Space. This is done using a tangential blower 10 placed in a laser discharge capacitor chamber. The laser gas is cooled by using a heat exchanger 11 placed in a container and a cooling plate (not shown) installed outside the container. The natural frequency band width of the excimer laser is narrowed by the line narrowing module 18. Commercial excimer laser systems typically include many modules. They can be quickly replaced without disturbing the rest of the system. The main modules include: 5 paper sizes applicable to China National Standards (CNS > A4 size (210 X 297 mm) < please read the notes on the back before filling this page)

A7 412891 V. Description of the invention (3) Laser chamber module, pulse wave power system with high voltage power supply module · Steering gear module and high voltage compression head wedge group I output coupler module > Line narrowing Module · Wavelength meter module, computer control module, gas control module, cooling water module-electrode 6 includes cathode 6A and anode 6B. In this prior art embodiment, the anode 6B is supported by the anode support rod 44 which is shown in the sectional view of FIG. The flow is clockwise in this figure. A set of corners and a set of edges of the anode support rod 44 serve as a set of guide vanes to force the gas from the hair dryer 10 to flow between the electrodes 6 A and 6 B. The other guide vanes in this prior art laser are shown at 46, 48, and 50 = penetrating current return plates 52 to help the anode 6B connect to the metal structure of the chamber 8. The plate is penetrated and has a large countersink in the laser gas flow path (not shown in Figure 3) so the current return to the plate does not significantly affect the airflow. A group of peak-to-peak capacitors including an array of separate capacitors 19 are charged by the pulse wave power system 2 before each pulse wave. When the voltage rises to the peak on the capacitor, the two sets of pre-ionizers 56 weakly ionize the laser gas between the electrodes 6A and 6B and discharge across the electrode when the charge on the capacitor reaches approximately 16,000 volts. Generated to produce an excimer laser pulse. After each pulse wave, the gas generated by the hair dryer and flowing between the electrodes at a speed of about 1 inch per millisecond is issued for one millisecond later. 6 Paper sizes are applicable to China National Standard (CNS) A4 specifications (2K). * 297 mm) (Please read the notes on the back before filling out this page) Order --------- Online. Printed by the cooperative 412891 A7 B7 V. Description of invention (bucket)

The next pulse generated in time is provided in time with fresh and sufficient laser gas D between the electrodes. In a typical photographic plate-making excimer laser > A set of feedback control system measures the output laser energy of each pulse. | From The required pulse wave energy determines the offset angle, and then sends a set of signals to a group of controllers to adjust the power supply voltage so that the sequential pulse wave energy approaches the required energy. In the prior art systems, this feedback signal is an analog signal and uses the laser environment to generate noise. This noise can be generated in the wrong power supply voltage and can be reflected in the output laser pulse energy increase向 Generation. These excimer lasers typically require many months of continuous operation 24 hours a day, 7 days a week, but only require short-term regular maintenance. The problem experienced by these prior art lasers is that they have excessive wear and often cause the blower bearings to fail-a modular, reliable, production line quality F2 laser is needed in the integrated circuit industry to allow integrated circuits to have KrF and ArF Resolution not found in lasers. The invention provides a reliable modular production quality F 2 excimer laser, which can generate pulse waves with a full width of about or less than half of the maximum frequency band width and a wavelength stability of less than lpm in the range of 1000 Hz to 2000 Hz. Laser pulses with energy greater than 10m. The preferred embodiment of the present invention can be operated in a power supply range of 10 to 40 watts with an output pulse energy of 10 to 5 mJ and in the range of 1000 to 4000 Hz. "Using this laser as a light source"> Stepper or scanner device Can produce integrated circuit resolution of 0.1pm or less. The replaceable module includes a set of laser chambers and a set of 7 papers. The paper size is applicable to the national standard (CNS) A4 specification (210 X 297 mm) 1} ¾ -------- Order if- ----- line- \ L '/ (Please read the notes on the back before filling this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 41 ^ 091 a? Wave power system. Important improvements are provided in this pulsed power supply unit to produce faster charging. These improvements include a high-voltage power supply with increased capacity | a set of improved steering modules that generates high-voltage pulses from capacitors charged by the high-voltage power supply and secondary winding the pulse voltage with a single four-segment stainless steel rod The very fast voltage transformer of the line amplifies 23 times. A peculiarly designed compression head saturable inductor (here called the 11-pot and pan-H design) to greatly reduce the amount of transformer oil required and practically eliminate the possibility of harmful oil leaks in the past. Improvements in pulse rate and improved performance in the laser containment chamber include the use of a single pre-ionizer tube. In the preferred embodiment, the laser is adjusted to 157.6nm lines using two sets of external chirps. In the second preferred embodiment, the laser operates in a wide frequency band and a 157.6nm line is selected outside the resonance chamber. A third preferred embodiment uses a spray cloth to provide a 0.2 pm wide line. Other embodiments of the invention include ceramic bearings. Selective magnetic bearings can be used-the reaction forces on the bearings can be reduced due to the aerodynamic conditions provided above the anode support rods. Other improvements include the use of a muffler that generates split sound shock waves in the laser chamber. It is best if the cavity light and output light are completely sealed and the nitrogen is purged. Graphic Description Figure 1 is a prior art commercial excimer photolithographic laser pattern. 8 This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) Fantasy -------- Line j. Intellectual Property of the Ministry of Economic Affairs A7 printed by the Bureau ’s Consumer Cooperative— — ______B7412891_ V. Description of the Invention (6) Figure 2 is a block diagram showing some of the main components of the commercial excimer laser used in integrated circuit photoengraving in the prior art. Fig. 2 is a diagram of a laser-capacitor chamber. Fig. 4 is a diagram of a preferred embodiment of the present invention. Fig. 5 is a diagram showing a hair dryer drive unit including a magnetic bearing.-Figs. 6 and 6A are A cross-sectional view of a laser container according to a preferred embodiment of the present invention. Figure 7 is a graph showing the characteristics of a better pre-ionizer tube. Fig. 8A is a block diagram of a pulse wave power supply system according to a third embodiment of the present invention. FIG. 8B is a simplified circuit diagram of the above preferred embodiment. Fig. 8C is a block diagram of a combination of a circuit diagram of a high-voltage power supply in the above-mentioned preferred embodiment. Fig. 8D is a pattern of a perspective component of a pulse wave transformer used in the above preferred embodiment. Figure 8E is a diagram of the main windings of a pulse wave transformer used in the above-mentioned preferred embodiment. "Figures 8F1, 8F2, and 8F3 are time charts showing pulse compression using the above-mentioned preferred embodiment." 8G1 and 8G2 The figure shows two graphs of a set of full-saturated inductors. Figures 8H1 and 8H2 show the layout of the compression head in the preferred embodiment. . 9 This paper size applies to China National Standard (CNS) A4 (2J0 X 297 mm) -------- Order ----- (Please read the precautions on the back before filling this page)

I H I I 412891 A7

5. Description of the invention (7) Figures 9A and 9B are diagrams describing the design of a preferred heat exchanger. Figures 10A to 10F are graphics of a standard F2 laser. Figures 11A and 11B show two sets of preferred F2 system configurations. Figures 12A to 12E are diagrams showing the design of various anode support rods. Figure 13 illustrates a preferred closed cooling system. Figures 14A, 14B, and 14C show the structural design of a preferred blower blade. Figure 15A and 15B show? 2 Laser performance data. Figure 16 shows a large manifold gas supply system. First Preferred Embodiment A preferred embodiment of the present invention will be described with reference to the drawings. Modular laser design A front view of a preferred embodiment of the present invention is shown in Figure 4 separately. This graphic emphasizes the modular nature of the invention, which allows very rapid replacement of modules to be repaired, replaced and maintained. The main features of this embodiment are listed below, which correspond to the reference numbers shown in FIG. 2 0 1 Laser enclosed room 2 0 2 Gas module 2 0 3 Cooling water supply module 2 0 4 AC / DC distribution module 2 0 5 Control module 2 0 6 Line narrowing module 2 0 7 Compression head 10 This paper size applies to China National Standard (CNS) A4 specifications < 210 X 297 mm) (Please read the precautions on the back before filling this page) -------- Order -------- -Line \. ^ .. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ^ 12891 A7 ----------- B7_, V. Description of Invention (Art) 2 0 8 High voltage pulse wave power supply module 2 0 9 Steering gear module supplying pulse wave power supply 210 Metal fluoride condensate valve 211 Laser volume chamber 213 Wavelength meter module 214. Automatic shut-off device 216 Output coupler 217 Hair blowing Motor 218 metal fluoride gas valve power supply 219 status light 2 2 0 24 volt power supply 2 2 1 chamber window 2 2 2 gas control elastic connection 2 2 4 orifice box preferred embodiment of the present invention The embodiment is a modified version of the laser illustrated in Figures 1, 2 and 3. This preferred embodiment includes the following improvements: 1) A single tube larger preionizer replaces a prior art combination of a dual tube preionizer to provide improved efficiency between electrodes, better preionization, and improved Laser gas flow; 2) a silicon-free fan blade, which can be a set of single-chip microcomputer blades; 3) the solid-state pulse wave power system is modified to produce faster rise times, provide multiple sets of harmonic pulses, and Improved laser at higher voltage 11 This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm). ^ Installation -------- Order ---------- (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 a? ______B7_ 5. Description of the invention (7) Efficiency; 4) The charging voltage of the pulse wave power system is more accurate Control: 5) A computer controller planned by the new algorithm program provides improved control of pulse energy and array energy and: 6) The electrode interval is reduced to 10mm. Chamber Modification Single Preionizer Tube As shown in Figure 6, a single larger preionizer tube 56A replaces the dual preionizer tube 56 shown in Figure 3. The single tube pre-ionizer is manufactured in accordance with the description of U.S. Patent No. 5,719,896 issued on February 17, 1998, which is incorporated herein by reference. Applicants have found that a set of pre-ionizer tubes is not only sufficient, but very surprisingly provides performance improvements over a dual pre-ionizer design. In the examples this pre-ionizer is placed upstream of the electrode. The applicant does not fully understand the reason for the improved performance. Applicants have learned that single tube pre-ionizers provide the stability of discharge and improve pulse-to-pulse stability. Referring next to Fig. 7, this pre-ionizer adopts an integrated tube design 'which has an insulating sleeve element 180 containing a reverse tracking groove 170 as an integral component of the tube. When the diameter of the rod portion 145 of the pre-ionizer and the OD of the insulating sleeve portion 180 are 1/2. The inner guide bar 146 has a diameter of 7/37 inches and the diameter of the connecting wire extending through the insulating sleeve portion and forming a ground connection is about 1/16 inch. The previous pre-ionizer tube design used a dual-diameter design with a rod section diameter of approximately 1/4 inch and an insulation sleeve diameter of approximately 1 inch. This makes it necessary to join the processing procedure to manufacture the insulating sleeve member. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210x297 mm) ------------------- -Order --------- Line / ^ (Please read the notes on the back before filling out this page) Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 ____B7_ V. Description of Invention (/ P) and Management Component combination. The design of thicker fixed-diameter tubes is the opposite of the conventional design rule, which predicts a reduction in ionization due to lower capacitance. In most designs, the thickness of the tube depends on the dielectric strength of the material selected. Those skilled in the art will understand the pre-ionizer tube design techniques used in the prior art to select materials with the highest dielectric strength and determine the wall thickness that matches this capacitance. For example, conventional sapphire materials have a dielectric strength from 1200 volts / mil to 1700 volts / mil. Therefore, if the laser is operated at 25kV, a 0.035 inch dielectric thickness provides a safety factor of 2. This design results in lower capacitance: but in laser operation, the practical effect of reducing capacitance is negligible, and there is a surprising increase in the measured geometrical radiation of the electrode gap. Because of the fixed diameter, thicker tube wall, and overall insulation sleeve design, a single piece of material can mechanically provide the counter-tracking groove 170. Due to the monolithic construction, there is no need to use ultra-pure (ie, 99.9%) polycrystalline semi-transparent aluminum oxide ceramic objects. • Although the applicant continues to use ultra-pure materials. The overall relationship between the insulating sleeve 180 and the tube 145 is artificially generated without the need to plan the surface of the difficult tube geometry for diffusion bonding. In fact, it has been found that the properties of high purity values are not as important as the porosity of the material . I have found that the greater the porosity | the more the dielectric strength is reduced. As a result, a commercial-grade ceramic object preferably has a purity of at least 99.8% and is low in porosity. For example, Coors Ceramics manufactured under the material NO.AD-99SF has a dielectric strength of 300 volts / mil. The product can be used. Insulating sleeve 180 with anti-tracking groove 170 configured therein, as previously explained, its function is to prevent the axial direction from the cathode to the ground plane 160 along the surface of the tube. 13 This paper size applies to China National Standard (CNS) A4 specifications. (210 X 297 mm) „-------- Order ------------ ^-t ~, .4v '' (Please read the notes on the back before filling in this (Page) 412891 a7 ___B7____ 5. Description of the invention (//) High voltage tracking. As explained above | The applicant has also found that a single preionizer works better than two sets of preionizers, and is better than the first A single pre-ionizer system is placed upstream of the electrodes as illustrated in the examples. The applicant has performed experiments using a single pre-ionizer placed downstream and found that at a certain blower speed, this configuration produces more than two sets of tube devices. The upstream configuration produces significantly better pulse wave energy stability. High-efficiency chamber printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (please read the precautions on the back before filling this page). The chamber has been improved. The efficiency of the laser "single-piece cathode separator composed of aluminum A1203 Isolator 55A, which isolates the cathode from the upper chamber structure, as shown in Figure 6A. In the prior art design, eight separate sets of isolators were needed to avoid breakage of the isolators due to thermal expansion stress in the isolators. This An important improvement allows the head of the chamber to be made shorter, which significantly reduces the distance between the cathode 83 and the peak chirp capacitor 82. The respective capacitors 54A forming the peak chirp capacitor array 82 are moved horizontally closer than the prior art Cathode. In order to reduce the difference in thermal expansion between the monolithic isolator and the chamber structure, the upper chamber 8A is made of ASTM-A3C steel, which has a coefficient of thermal expansion closer to A 丨 203 than aluminum > chamber 8 The bottom part 8B is made of aluminum. But the applicant has found that the difference in thermal expansion between ASTM-A3C steel and aluminum is not a problem. Both the steel and aluminum parts are nickel-coated. For commercial photolithographic laser cathodes. The prior art is generally supported by the cathode support rod 53, as shown in Figure 3 "In this preferred embodiment, the cathode support rod is removed and the cathode 83 is formed slightly thicker and directly mounted on the unit. Slice Above the device 55A, "Cathode 83 uses 15 sets of feeds and passes 14 paper sizes. Applicable national standard (CNS) A4 specifications (210 x 297 mm)) 412821 Printed by A7 B7, Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs. The pole 83A and the connection nut 83B are connected to the high-voltage side 82A of the peak capacitor 82. In this preferred embodiment, the new anode support rod 84A is substantially larger than the prior art anode support rod and contains a gas stream The protruding piece 84B in the area »These two characteristics minimize the temperature change of the anode. The metal seal applicant has found that the elastic sealing material of the prior art reacts with the fluorine gas to generate pollution in the laser gas that reduces the laser performance. The preferred embodiment of the present invention uses a metal sealing material to seal the laser chamber. The relatively metal seal is a tin-plated Inconel 1718 sealing material. The Monel current return channel and the blade. The applicant also found stainless steel components. At the same time, it also reacts with fluorine and generates pollution in the laser gas. Therefore | In this preferred embodiment, the prior art stainless steel current return channel structure and gas flow blades are replaced with Monel alloy current return channels 250 and Monel alloy flow blades 252 and 254. The muffler applicant found that the main reason for the distortion of the quality of the laser beam produced by a narrow-band excimer laser operating at 2000 Hz or higher is the acoustic shock wave caused by the discharge of the pulse wave, which is reflected back from the structural component of the chamber To the space between the electrodes and to distort the laser beam of the pulse wave that occurs 0.5 milliseconds later "An embodiment described here (see Fig. 6A) uses an oblique arrangement provided on the two sides of the laser chamber Recessed silencers 63A and 64A minimize this effect significantly. These silencers absorb a portion of the sound energy and reflect a portion of the sound energy downwards into the area below the laser chamber. This paper size applies China National Standard (CNS) A4 Specification (210 X 297 Gongchu) --------: ---- {Please read the notes on the back before filling this page) ------ Order-- ------- line. ^ 12891 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention) Keep away from the electrodes. In this preferred embodiment, the muffler includes a set of machine metal structures having a groove of 0.1 mil width > 0.3 mil depth and placed at intervals of 0.2 mil: a set of 0.3 mil depth recesses The grooves are shown at 63 of the silencers 60 in Fig. 6A. The actual test results show that these silencers significantly reduce the pulse quality distortion caused by sound shock waves. The applicant also found that the shock wave effect can be minimized by reducing its current during discharge. In fact, in the preferred embodiment of the invention, changes in the chamber head (discussed above) and new pre-ionizers designed to reduce acoustic shock waves without the need for a muffler. Fan Improvements The preferred embodiment of the present invention includes a major improvement in the prior art, gas circulator, which substantially improves laser performance. These improvements are in the construction of a copper-free blower blade structure—a new asymmetric blade configuration that significantly reduces resonance effects and improves its bearings. Silicon-free fan blade structure Applicants have found that a brass alloy welded material, which is commonly used in the construction of blower blades, is the main source of SiF6 in laser chambers. This gas significantly reduces the laser performance of the KrF laser and severely damages the ArF laser. The applicant found four solutions to this problem. First, the blade structure is machined into pieces from a solid block of material, in this case aluminum. Another solution is to cast the blade structure into segments. These segments are then combined with electron beams in a way that does not add new materials. It is also possible to connect the segments into a frame structure ', but in this case, electron beam bonding replaces the brass alloy welding process of the prior art. Procedure to reach the connection. 16 This paper size applies to China National Standard (CNS) A4 (2) 0 X 297 mm

A7 412891 ----------- 5. Description of the invention (/ hand) One method is to connect the blade to a frame structure using a solderless soldering process. Aluminum 6061 is used as the base material for all component fragments. These parts are then copper-plated before the soldering process. After all parts are combined, the fan is soldered in a vacuum furnace with low temperature solder, usually 91% tin (Sn) and 9% zinc (Zn). This solder was selected because it lacks silicon and has the ability to work with copper-plated aluminum. The assembled and welded fans are then nickel-plated. This manufacturing method results in inexpensive silicon-free fans. Reducing resonance effects Prior art hair dryer blade structures include a set of tangential hair dryers with 23 longitudinal blades. These blades are mounted symmetrically around the structure. The main resonance effect is measured according to the fan parameters and the actual laser performance. The disturbance in the laser beam shows its corresponding sound wave at 23 times the fan rotation frequency. The effect of unfavorable bearing performance was also measured corresponding to 23 times the fan rotation frequency. The improvement in the design of the fan structure is called an asymmetric blade configuration, as shown in Figure 14A. Another example of the fan blade structure shown in Figure 14B forms 16 separate milled or cast segments, each segment having 23 sets of blades to 360 relative to adjacent segments. / (15x23) · or about]. Rotating the segments • Another improvement in the grinding or casting method for the manufacture of the fan blade structure, which is relatively easy to form, is to form the blade into a gas tin foil, as shown in Figure 32 of the figure. The blades of the prior art are stamped and the cross-sectional views of the two sets of stamped blades are shown in comparison with 314 ° 3] 8 showing the direction of rotation and 320 represents the surroundings of the blade structure. Therefore, the conventional blade thickness is uniform, and the gas tin foil blade has 17 paper standards applicable to China National Standard (CNS) A4 specifications &lt; 210 «297 mm): ------------- Order- ------- line (Please read the precautions on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 413891 A7 _____B7____ 5. Description of the invention (/ ^) Tear-shaped appearance, which includes circles Shaped leading edge, thick central portion and tapered trailing edge. Bearing Improvements Embodiments of the present invention will outperform the prior art with one of two bearing improvements. Ceramic Bearings-A preferred embodiment of the present invention includes ceramic bearings. Compared to ceramic bearings, silicon nitrides lubricated with synthetic lubricants, preferably peffluoropolya kylether (PFPE). Compared to prior art excimer laser fan bearings, these bearings generally provide longer life expectancy. In addition, neither bearings nor lubricants are significantly affected by the highly reactive fluorine gas. Magnetic bearings respond to other preferred embodiments of the present invention which have a magnetic bearing that supports a fan structure, as shown in FIG. In this embodiment, the shaft 130 supporting the fan blade structure 146 is then supported by a set of active magnetic bearing systems and driven by a set of brushless DC motors 130. The rotor 129 of the motor and the rotor 128 of at least two sets of bearings are sealed. Within the gas environment of the laser cavity and the motor stator 40 and the coil 126 of the magnetic bearing magnet are placed outside the gas environment. This preferred bearing design also includes a set of active magnetic thrust bearings 124, which also have a coil that is placed outside the gas environment. Gas powered anode support rod As shown in Figure 3, the prior art gas flow from the blower 10 is forced to flow between the electrodes 6A and 6B by the anode support rod 44. But 'Shen 18 This paper size is applicable to Chinese National Standard (CNS) A4 specification (210 X 297 mm) ---------- blanket · (Please read the precautions on the back before filling in this page) Order --------- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy Printed 412891 A7 ______B7 _ V. Description of the invention (▲) Please find as shown in Figure 3 The support rod 44 designed by the prior art is shown to generate the main aerodynamic reaction force on the hair dryer, which is sent to the hair dryer bearing and causes the chamber to vibrate. The applicant believes that these vibration forces cause the hair dryer bearing to wear and May cause bearing failure. The applicant has tested other designs * many of which are shown in Figures 12A-12E * and they use aerodynamic forces distributed over a long period of time to reduce the reaction forces that are formed each time a blade passes near the edge of the support rod 44. One of the applicant's preferences A better anode support rod design is shown at 84A in Figure 6A. This design has a large mass that minimizes the temperature storage of the anode. The total mass of the anode and anode support rod is approximately 3.4 kg. At the same time, this design also includes a protruding piece 84B, which provides additional cooling of the anode. The applicant's tests indicate that both the muffler and the aerodynamic anode support rod tend to slightly reduce the gas flow. Because the gas flow is restricted, both The use of group improvements involves an analysis of compromise. For these reasons, two improvements are shown in Figure 6A instead of Figure 6. Pulse wave power system Four sets of pulse wave power module function description A better pulse wave power system is manufactured into four separate modules as shown in Figures 8A and 8B. Each module becomes an important part of the excimer laser system. And each module can be quickly replaced in the event of a component failure or periodic maintenance. The applicant designates these modules as: high-voltage power supply module 20, redirector module 40, compression head module 60, and laser chamber module 80. High-voltage power supply module The high-voltage power supply module 20 includes a set of 300-volt rectifiers 22 for converting a 208-volt three-phase power source from source 10 to 300-volt 19. This paper size is applicable to China National Standard (CNS) A4 specifications ( 210x297 mm) -------- Order ----- (Please read the precautions on the back before filling this page) Line 412891 A7 ___B7_ V. Description of the invention (//) DC = Inverter 24 conversion rectifier The output of 22 is a high frequency 300 volt pulse in the range of 100kHz to 200kHz. The frequency and conduction period of the inverter 24 are controlled by the HV power supply control board 21 to provide the system with the optimal output pulse energy adjustment. The output of the inverter 24 is boosted to approximately 1200 volts by the step-up transformer 26. The output of the transformer 26 is converted to 1200 volts DC by a rectifier 28. The rectifier 28 includes a set of standard bridge rectifier circuits 30 and a set of filter capacitors 32. The direct current electrical energy from the circuit 30 will be diverted to 8.1 # F in the diverter module 40. The C0 charging capacitor 42 is charged, which is guided by the HY power supply control board 21 that controls the operation of the inverter 24, as shown in FIG. 8A. The set point within the HV power supply control board 21 is set by the laser system control board 100. The reader should note that the pulse energy control of the laser system in the embodiment shown in Figure 8A It is provided by the power supply module 20. The electrical circuits in the steering gear 40 and the compression head 60 are only used to form the electrical pulse wave at a rate of 2,000 times per second to the electric power stored in the power supply module 20 on the charging capacitor 42 to amplify the pulse wave. The voltage and duration of the pulse are compressed in time. As an example of this control, FIG. 8A indicates that the processor 102 on the control board 00 controls the power supply to accurately provide 700 volts to the charging capacitor 42. It is solid-state switch 46 from the downstream circuit during the charging cycle Separation. The electrical circuits in the steering gear 40 and the compression head 60 will very quickly and automatically convert the electrical energy stored on the capacitor 42 into a precise electrical discharge pulse across the electrodes 83 and 84 when the switch 46 is closed, which provides control with Below the precise energy determined by the processor 102 in the board—the laser pulse. 20 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the unintentional matter on the back before filling this page) Order --------- line. Intellectual Property of the Ministry of Economic Affairs Printed by the Bureau ’s Consumer Cooperatives Printed by the Ministry of Economy ’s Intellectual Property Bureau ’s Consumer Cooperatives ^ 12691 at ____B7 __ V. Description of the invention (/ account) Steering module The steering module 40 contains C. The charging capacitor 42, in this embodiment, is a group of parallel capacitors providing a total capacitance of 8.1 mF. The voltage divider 44 provides a feedback voltage signal to the HV power supply control board 21, which is used by the control board 21 to limit the charging of the capacitor 42 to a voltage (referred to as &quot; control voltage &quot;) when it forms an electrical pulse and When compressed and amplified in the diverter and compression head 60, the required discharge voltage on the peak chirp capacitor 82 and across the electrodes 83 and 84 is generated. In this embodiment (designed to provide an electrical pulse of 16,000 volts at a pulse rate of about 3 Joules and a pulse rate of 1000 Hz per second), approximately 250 microseconds (as indicated in Figure 8F1) are required. The supply 20 charges the charging capacitor 42 to 800 volts. Therefore, when the signal from the steering gear control board 41 closes the solid-state switch 44 and starts to switch the 3 joules of electricity stored in the charging capacitor Ce very quickly. The 16,000 volts of the electrodes 83 and 84 are discharged and the charging capacitor 42 is completely Ground charges and stabilizes to the required voltage. For this embodiment 'the solid state switch 46 is a 1GBT switch, although other switching technologies such as SCR, GTO, MCT, etc. can also be used at the same time. A set of 600πΗ charging inductors 48 is connected in series with the solid state switch 46 and when the switch 46 is closed to set C. When the charging capacitor 42 is discharged, the current passing through the switch 46 is temporarily limited. Pulse wave generation step The first step of high voltage pulse wave power generation-the step is the pulse wave generation step 50 ° In order to generate the pulse wave, the charge on the charging capacitor 42 is switched to approximately 8.5jUF C by using the closed 1GBT switch 46. Capacitor 21 This paper size applies to the national standard (CNS) A4 specification (210 X 297 mm) 3 ^^ ------- | Order! -(Please read the precautions on the back before filling this page) 1 n 1— nt line J. 412891 A7 B7 V. Description of the invention (/ y) 5 2 as shown in Figure 8 F 2 A set of saturable inductors 54 initially maintains the voltage stored on capacitor 52 and then becomes saturated to allow charge to be transferred from capacitor 52 to Cp- via a 1:23 boost pulse transformer 56 within a transfer time period of approximately 550ns. The i-capacitor 62 is the first step of compression 61 as shown in FIG. 8F3. The design of the pulse transformer 56 is explained below. The pulse wave transformer is very effective in converting 700 volts, 17,500 amps and 550 ns pulses into 16, 100 volts and 760 amps and 550 ns pulses and temporarily stored on the Cp.i capacitor bank 62 in the compression head module 60. Compression head module The compression head module 60 further compresses the pulse wave. The second step of compression—the set of Lp.i saturable inductors 64 (with about 125nH saturation inductance 値) is maintained at Cp- of 16.5nF, and the voltage on capacitor bank 62 passes about 550ns to allow the charge on Cp-i (in Within approximately 100 ns) flows to a Cp peak capacitor 16.5 nF located at the top of the laser chamber 80 and it is connected in parallel with the electrodes 83 and 84 and the pre-ionizer 56A. 550ns long pulse becomes 100ns long pulse conversion. Charge cp peak 値 capacitor 82 to form the second and last step of compression indicated by 65 in Figure 8A. Peak-capacitor capacitor 22 on the top of the radio-capacitor module 80 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) II 丨 &quot; —d package &lt; please read the precautions on the back before filling This page) Order! Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 _: _ B7 _ V. Description of the Invention (2ί &); 82 After about 100ns, the voltage of the peak-to-peak capacitor 82 reaches approximately 14.000 volts and the discharge between the electrodes begins. The discharge lasted approximately 50ns | During that time the laser occurred in the optical resonance volume of the excimer laser. The optical resonance chamber described in detail below is defined by a set of line narrowing packages 86. In this example, it contains a set of 3 · 稜鏡 beam expanders, a set of adjusting mirrors, a set of Eschelle gratings, and a set of outputs. Coupler 88. The laser pulse of this laser is a narrow band of about 5mJ, a pulse of 20 to 50ns &gt; 193ηηι, and the repetition rate is 1000 pulses per second = the pulse defines the laser beam 90 and the pulse of the beam is Monitored by polar body 92, all of which are shown in Figure 8A. Control of Pulse Energy Control The signal from the light diode 94 is transmitted to the processor 102 of the control board 100 and the processor uses this energy signal and possibly other previous pulse energy data (eg pulse energy control below) (Discussed in the algorithm section) to set the command voltage for the next and / or future pulse. In a preferred embodiment, the laser operates in a short array (for example, a 0.5 second array of 100 pulses separated by inactive time at 2000 Hz), a processor in the control board 100] 0 2 A special algorithm is planned, which uses the latest pulse wave energy signal and the energy signals of all previous pulse waves in the array and other historical pulse wave data to select the control voltage of the subsequent pulse wave to make the pulse wave to pulse wave change The energy is minimal and the array-to-array variation energy is minimized. This calculation is achieved within 3 5 &quot; s using this algorithm by the processor 102 in the control board 100. The laser pulse occurs about 5 // S after the Tβ of the IGBT switch 46 is started, as shown in Figure 8F3. Exhibition 23 This paper size is applicable to China National Standard (CNS) A4 specification (2〗 0 X 297 mm) (Please read the precautions on the back before filling this page) -------- Order ---- ----- Line: Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed 412891 A7 ___; _B7_ V. Description of the Invention (Magic) and requires about 20j «S to collect Laser pulse energy data. (The start-up time of switch 46 is called TD). Therefore, about 70 microseconds after the start of the previous pulsed IGBT switch 46 (at a startup period of 2,000 Hz is 500 卩 s) The new control voltage (as shown in Figure 8 F 1) is available. The characteristics of the energy control algorithm are described below and described in more detail in US Patent Application Serial No. 09 / 034,870. It will be incorporated herein by reference. Energy recovery This comparative embodiment has an electronic circuit The excess energy is collected into the charging capacitor 42. This circuit significantly reduces wasted energy and actually eliminates ripples in the laser chamber 80. The energy recovery circuit 57 includes an energy recovery inductor 58 and an energy recovery diode 59 , Connected in series with C. charging capacitor 42 "as shown in Figure 8B. Because the impedance of the pulse wave power system is not exactly matched to the impedance of the chamber and the impedance of the chamber changes many times during the pulse wave discharge The facts * cause a set of negative "reflections" to be generated from the main pulse, which is transmitted back from the chamber towards the front of the pulse wave generation system. After the excess energy is transmitted back via the compression head 60 and the diverter 40, the trigger signal It is removed by the controller so that the switch 46 is opened. The energy recovery circuit 57 has a reverse reflective polarity, which generates a negative voltage on the charging capacitor 42 via a resonance-free circuit (half of the LC circuit formed by the charging capacitor 42 and the energy recovery inductor 58). Periodic ripple), which uses diode 59 to clamp the reverse of the current in inductor 58. The net result is that all the energy reflected from the chamber 80 is removed from The pulse wave is recovered and stored on the charging capacitor 42 as a preparation to think that it will follow the pulse 24. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -------- Order ---- ------ line., 4 (guess first read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 B7 V. Description of the invention (none) A positive charge used by Wave Figures 8F1, 2 and 3 are time diagrams showing the charge on capacitors (^, (^, (^., And Cp). This figure shows the energy recovery processing program on C0. "Magnetic switching bias" In order to fully adopt the full BH curve swing of magnetic materials used in saturable inductors, a set of DC bias currents are provided so that each The inductor is reverse-saturated when the pulse wave is turned off by the switch 46. In the case of the saturable inductors 48 and 54 of the steering gear, this is used to provide an inversion of approximately 15A (compared to the direction of the normal pulse current) Bias current is achieved through the inductor. This bias current source is provided by the bias current 120 through the isolation inductor LB1. The actual current flows from the power supply through the ground connection of the diverter, through the main coil of the pulse wave transformer, via saturable inductor 54> via saturable inductor 48, and back to bias current source 120 via isolation inductor LBI, As indicated by arrow B1. In the case of a compression head saturable inductor, a bias current B2 of about 5 A is supplied from the second bias current source 126 via the isolation capacitor LB2. In the compression head, the current is separated and the main part B2-1 flows through the saturable inductor Lp-164 and passes through the isolation inductor LB3 to return to the second bias current source 26. The smaller component of the current B2-2 passes through the HV cable connecting the compression head 60 and the redirector 40 to the ground via the secondary coil of the pulse wave transformer, and returns to the second bias current source 126 via the bias resistor. This second smaller current is used to bias the pulse transformer so that it is also reset during pulse wave operation. The amount of current divided into two branches is determined by the resistance of each channel and adjusted so that each channel receives the correct amount of bias current. 25 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) --------: ------------- Order ----- (please first Read the notes on the back and fill in this page) Line 4- 412891 A7 ___ B7 _._ V. Description of the current) In this embodiment, the current flows from a standard three-phase power source 10 through the system to the ground of the electrode and the overriding electrode 84. Pulse wave energy flow is called "forward flow" and this direction is called forward direction. When we say that an electrical component such as a saturable inductor is forwarded, we mean that it is biased into a saturated state and conducts "pulse energy" in the direction toward the electrode. When it is conducting in the reverse direction, it is biased into a saturation state and conducts energy away from the electrode toward the charging capacitor. The actual direction of the current (or electron flow) through the system depends on its location within the system. The direction of the current will then be explained to eliminate possible doubts. Refer to Figures 8A and 8B, C in this preferred embodiment. The capacitor 42 is charged (for example) positive 700 volts so that when the switch 46 is turned off, current flows from the capacitor 42 via the inductor 48 in the direction of C, capacitor 52 (the electrons actually flow in the opposite direction). Similarly The current flows from the Ci capacitor 52 to the ground through the main side of the pulse transformer 56. Therefore, the direction of current and pulse energy is the same as from the charging capacitor 42 to the pulse transformer 56. As shown below in the "pulse transformer__title" Explanation of the part * The current in the main circuit and the secondary circuit of the pulse transformer 56 is directed to ground. The result is when it is at the beginning of the discharge (which represents the main part of the discharge, generally about 80%) ) When the current between the pulse transformer 56 and the electrode is away from the electrode toward the transformer 56. Therefore, the direction of the electron flow when the main discharge is reached from the ground temporarily via the secondary coil of the pulse transformer 56 C ρ .1 Capacitor 62, via inductor 64, temporarily reaches Cp capacitor 82, via inductor 81, via electrode 84 (this is referred to as discharge 26) This paper applies to Yin Guoguo Home Standard (CNS) A4 Specification = &lt; 297 mm) (Please read the notes on the back before filling this page)! — Order ·! -Line, printed by the Intellectual Property Bureau Staff Consumer Cooperatives of the Ministry of Economic Affairs 412891 A7 B7 Ministry of Economic Affairs Printed by the Intellectual Property Bureau's Consumer Cooperative (5) (Explanation (M) cathode), via the discharge plasma, via electrode 83 and back to ground. Therefore, the electron current flows between the pulse wave transformer 56 and the electrodes 84 and 83 in the same direction as the energy of the pulse wave when mainly discharged. Immediately after the discharge, the current and electron flow are reversed and the reverse electron flow rises from the ground point via the ground electrode 84, via the discharge space between the electrodes to the electrode 83 and via the transformer 56 to ground. The "main" loop current of the transformer 56 is generated via the reverse electron flow channel of the transformer 56 from which the electron current flows from the ground point via the "main" side of the pulse transformer 56 (same direction as the main pulse current) and Finally, charge Co as shown in Figure 8F2. The negative charge on Cc is reversed as shown in circle 8F2 and has been explained above in the section entitled Energy Recovery .. Detailed description of the pulse wave power supply components A more detailed circuit diagram of the power supply part of the preferred embodiment is shown in Figure 8C. As indicated in Figure 8C, the rectifier 22 is a 6-pulse phase control rectifier with + 150v to -150V DC output. 24 is actually three sets of inverters 24A, 24B, and 24C. When the voltage on the Cfl charging capacitor 42 of 8.1 is less than the command voltage of 50 volts, the inverters 24B and 24 C are cut off and when at <^ 42 When the above voltage is slightly higher than the command voltage &gt; Inverter 24A is cut off. This step reduces the charging rate before the end of charging. Stepper transformers 26A, 26B and 26C are each rated at 7kw and convert their voltage to 12 0 Volts AC.

Three sets of bridge rectifier circuits 30A, 30B and 30C are shown. HV 27 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -------------------- Order -------- -(Please read the precautions on the back before filling out this page) Duty printing of employee cooperation of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 ___B7__ V. Description of the invention (β) Power supply control board 2 1 conversion 1 2-bit digital command into analogy Signals are combined with self-C. The feedback signal 45 from the voltage monitor 44 is compared. When the feedback voltage is higher than the command voltage, the inverter 24A is cut off. As discussed above, the Q2 switch 34 is closed to consume the energy stored in the supply source, and the Q3 disconnect switch 36 is opened to prevent any additional energy from leaving the supply. Source and the Q1 discharge switch 38 is turned off to release C. 42 until the voltage at C0 equals the command voltage. At this time Q1 is turned on. Steering gear and compression head The main components of steering gear 40 and compression head 60 are shown in Figures 8A and 8B, and the operation of the system is discussed above. In this section, we detail the manufacture of the steering gear. Solid State Switch In this preferred embodiment, the solid state switch 46 is an IGBT switch of P / NCM1000HA-28H provided by Powerex's office in Youngwood, Pennsylvania. Inductors Inductors 48, 54 and 64 include saturable inductors similar to those described in U.S. Patent Nos. 5,448,580 and 5,315,611. The top and cross-sectional views of a better saturable inductor design are shown in Figures 8G1 and 8G2, respectively. "In the inductor of this embodiment, the flux excludes metal pieces such as: 301, 302, 303, and 304 as in Figure 8G2 The graph shows that it was added to reduce leakage flux in the inductor. The current input to this inductor is screwed to the bus at 305 and also to the capacitor 62. This current forms four and a half loops via the vertical director. Since the position 28 This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 public love) (Please read the precautions on the back before filling this page) ------- Order------- -^ 412891 a; __ B7 V. Description of the invention (;) At 3 0 5 the current flows down to the large-diameter guide at 1A in the center, and six groups of small guides labeled 1B go up at the circumference. Go down 2A, go up 213, go down through all fluxes to exclude metal components, go up 3B, go down 3A, go up 4B and down 4A, and the current exits at position 306 = there is a pot-like pipe 64A there As a high voltage current lead. The cover 64B of the saturable inductor contains an electrical isolator material, such as Teflon. In prior art pulse wave power systems | oil leakage from electrical components isolated from oil is a problem. In the preferred embodiment, the oil-isolating member is limited to a saturable inductor and the oil is contained in a pan-containing oil-metal pipe 64A, as described above | that is the crimp connection output wire. All sealed connections are placed above the oil level to substantially eliminate the possibility of oil leakage. For example, the lowest seal in inductor 64 is shown at 308 in Figure 8G2. Because the flux exclusion metal element is in the middle of the current path through the inductor, this voltage allows the safe maintenance interval between the flux exclusion metal portion and other turning metal rods to be reduced. A protruding piece 307 is provided to increase heat removal. Capacitors Capacitor clusters 42, 52, and 62 all include clusters of parallel-connected commercial capacitors. Suppliers of these capacitors, for example, Murata office in Smyrna ’Georgia. Applicants prefer to connect capacitors and inductors to solder by soldering or bolting them to the positive and negative terminals of a special printed circuit board, which is similarly described in U.S. Patent No. 5, 4 4 8, 5 8 0 The method has heavy nickel-coated copper wires. Pulse Transformer 29 This paper size is in accordance with Chinese national standard (CNS &gt; A4 size (210 X 297 mm) (Please read the precautions on the back before filling this page)) Order --------- Line 4_ Ministry of Economy Printed by the Intellectual Property Bureau employee consumer cooperative printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumer cooperative printed by 412891A7 B7 V. Invention Description G7) Pulse transformer 5 6 is also similar to the pulse wave described in US Patent Nos. 5, 448, 580 and 5,313, 481. Transformer: Yes, the pulse wave transformer of this embodiment has only a single turn and 23 sets of main windings in the secondary coil. The graphic of the pulse wave transformer 56 is shown in Figure 8D. The 23 sets of main coils each include an aluminum bobbin 56A with two sets of flanges (each having a flat edge and a line pattern fixing hole), which are fixed to the positive and negative ends of the printed circuit board 56B, as shown in the bottom edge of Figure 8D . The isolator 56C isolates the positive end of each spool from the negative end of an adjacent line spool. Between the bobbin flanges is a hollow 11/16 inch long cylinder with a wall thickness of 0.875OD and approximately 1/32 inch-the bobbin is one inch wide · 0.7 mils thick Metglas ™ 2605S3A and 0.1 mils The thick polyester film is wound until the OD of the isolated Metglas ™ winding is 2.24 inches. A perspective view of a single bobbin forming a major winding is shown in Figure 8E. The secondary coil of the transformer is a single stainless steel rod mounted in an electrical glass immediately inside the insulating tube. The winding is divided into four parts, as shown in SD 圊. The stainless steel secondary coil shown at 56D in Fig. 8D is grounded at 56E to a ground wire on the printed circuit board and the high-voltage terminal is shown at 56F. As shown above, a 700 volt pulse between the positive and negative terminals of the primary winding will produce a negative 16,100 volt pulse at terminal 56F on the secondary side, resulting in a 1 to 23 voltage transition. This design provides very low leakage inductance and thus allows extremely fast output rise times. Laser chamber pulse wave power supply component

Cp capacitor 82 includes 28 0.59nf capacitor clusters mounted on top of the laser chamber pressure conduit. Each electrode 83 and 84 is separated by 30. This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) ------------- Q equipment ----- --- Order --------- Wire, (Please read the notes on the back before filling this page) 412891 A7 B7 V. Description of the invention (fen) 28-inch long solid brass, about 0.5 to 1.0 inch In this embodiment, the top electrode 83 is the cathode and the bottom electrode 84 is connected to ground, as shown in FIG. 8A. Compression head mounting The preferred embodiment of the present invention includes the compression head mounting technology shown in Figures 8H1 and 8 H2. Fig. 8H1 is a sectional view of a laser system showing the relative positions of the compression head module 60 and the electrodes 83 and 84. This technology is designed to minimize the resistance associated with the compression wire chamber connection and at the same time facilitate the rapid replacement of the compression head. As shown in Figures SH1 and 8H2, the ground connection is formed by connecting approximately 28 inches of trough tabs along the rear side of the compression head, as shown in 81A in Figure 8H1 and 81B in Figure 8H2. An elastic finger handle 81C is installed at the bottom of the trough tab. The preferred material for the finger handle is supplied under the brand name Multnam®. The high-voltage connection is formed between the smooth bottom of the saturable inductor 64 at six diameters and the paired array of elastic finger grips at 89 in Figure 8H1. As mentioned above, the preferred finger grip material is supplied by Multilam®. This configuration allows the compression head module to be replaced for repair or preventative maintenance in approximately five minutes. Gas Control Module This preferred embodiment includes a fluorine control system that allows operation within a selected vantage point without using a fluorine monitor. This embodiment will be described with reference to Fig. 16. * Fluorine consumption Laser chamber contains approximately 20.3 liters of laser gas. As stated above 31 This paper size applies to the Chinese National Standard &lt; CNS) A4 specification (2J0 * 297 mm) {Please read the item on the back &gt; ii before filling out this page)

Duo printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed 412891 A7 B7 V. Description of the invention) It states that its composition is 0.1% fluorine and the remainder is helium. The% fluorine represents the volume of approximately 0.0023 liters or 2.3 milliliters of fluorine at 4 atmospheric pressure. In terms of mass, the approximate amount of fluorine in the laser container is about 110 mg. Partial pressure of pure fluorine is about 411Pa, pure fluorine (corresponding to about 41Kpa of 1% fluorine mixture). When the laser is normally operated with an expensive factor of about 40% (typical photographic plate laser), the consumption rate of fluorine is about 4.5 mg per hour (corresponding to about 4% of fluorine in the chamber per hour). In terms of the partial pressure of pure fluorine &gt; The normal consumption rate of fluorine is about 16 hours per hour 16Pa »To compensate this consumption with a 1% fluorine gas mixture, a volumetric mixture equivalent to approximately 1.6kPa per hour is added to the chamber. The rate of laser fluorine consumption is not constant. If the laser fan is operated but no laser is generated, the fluorine consumption rate is approximately halved. If the fan is turned off, the fluorine consumption rate is reduced to about 1/4 of the 40% expensive factor consumption rate &quot; At a 100% liability factor, the consumption rate is double the consumption rate of the 40% expensive factor factor '' gas replacement The process described above essentially replaces the consumed fluorine almost continuously. Because the fluorine gas source is only 1% fluorine &gt; it also replaces some of the helium in the chamber almost continuously. Although even a portion of the laser gas is roughly continuously replaced, operation in this mode will result in pollution that reduces laser efficiency generated in the laser gas. This reduced efficiency requires increased voltage and / or increased fluorine concentration to maintain the required pulse wave energy. Therefore, the general recommendation of prior art systems is that the laser is periodically turned off to achieve a substantially complete gas exchange. This roughly complete gas exchange is called recharging. These periods can be based on the number of laser pulses. 32 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). — — — — — — — — — — — — ---- II-^ i — — — — — — — (Please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Consumption Cooperative 412891 A7 ____B7____ 5. Description of the invention (such as) Item 1 For example between recharge 100 ， 000,000 sets of pulses, and it is determined that the “recharge time” can also be determined based on the combination of the time elapsed during the last recharge last time or the pulse wave and the time of the last recharge time. It can be determined based on the amplitude of the charging voltage required to achieve the desired output at a particular fluorine concentration. After recharging, a new "quotient" test is best performed. At the same time, the benefits test should be performed periodically between charges, so if the benefits change, the operator will know where the new benefits are located. The system in Figure 16 can be used as follows to achieve recharge. By closing valves 510, 506, 515, 512, 517, and 504 and opening valves 506 and 512, the vacuum pump 513 can be operated and the laser chamber can be pumped down to an absolute pressure of less than 13 kPa. (A direct pumping down line can be provided between the chamber 1 and the vacuum pump 513 to allow fast pumping). Valve 512 is closed. Valve 515 is opened and 100% helium buffer gas from a buffer gas bottle 516 is added to the chamber to fill it to a pressure equivalent to 262 kPa at 50 ° C. (Note that in a 20 · 3 liter laser chamber, the temperature correction can be corrected by shifting the chamber temperature from 50 ° C using the ΔP / ΔΤ correction of IkPa / t. Therefore, if the chamber temperature is 23 ° C, it will be charged to 247kPa. Valve 517 is closed and valve 515 is opened and a mixture of 1¼ fluorine, 99% helium from the halogen-rich gas bottle 514 is added to the chamber 1 to charge it to equal Effective at a pressure of 290kPa at ° C. (Note • The same temperature corrections as discussed above can be used.) This will produce a gas mixture of approximately 0.1% fluorine '3.5% argon and 96.4% neon in the container. When the container is When heated to about 50 ° C * its 33 paper standards are applicable to Chinese national standards (CNSXA4 specification (210 X 297 mm) (Please read the precautions on the back before filling out this page)-I I ----- Order --- ------ line 'Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 · A7 ____ · __ B7__ V. Description of the invention (w) The pressure will be about 4atm. N2 淸 Net system because 〇2 strongly Absorbing 157nm light, 02 must be excluded from the beam channel. The applicant's development has been greatly improved A 1 ^ 2 purging system that surpasses the prior art systems. All laser-related optical components outside the chamber are purged with nitrogen. This nitrogen system is only operated at a pressure of approximately 10 bar above atmospheric pressure during laser operation. Card pressure operation. Small pressure difference is better to avoid pressure distortion on the optical components. The net components include line narrowing modules, output couplers, wavelength meters and shutter components. Seals are provided in all possible The location of the leak. An output port connected to a 1 / 16-inch inner diameter, approximately 6 feet long tube is provided. The flow through the output port is monitored to determine the proper operation of the clean system. Via a 1/16 inch inner diameter 6 feet long The preferred flow rate of about 4 L / min of the tube is the preferred flow rate corresponding to the required pressure difference. Laser component cooling The preferred embodiment of the present invention is particularly useful for operations with repetition rates exceeding 1000 Hz to 2000 Hz, including unique The cooling technology is shown in Figure 13 to cool the excimer laser. The components of the laser are contained in a closed chamber 240, which uses a hair dryer installed at the orifice, such as 224 shown in Figures 13 and 4A, Keep it on the inside of a little vacuum. The box frame contains a filter inlet port 2 4 1 near the top of the box frame and some small leaks • For example • the door surrounding the gasket, so the indoor gas flow through the laser confined chamber is approximately It is 200 feet minutes, which is not enough to remove the heat from the heat-generating components generated by the laser. 34 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the Jiang Yi on the back first) (Fill in this page again) JS)--line.

Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives M A7 B7___ V. Invention Description (¥) A very large portion (about 90%) of the waste heat generated by the laser (about 12kw at a 100% liability factor) is frozen The water system is removed, as shown in Figure 13. In this embodiment, the main heat sources in the laser are the pressure supply 20, the redirector 40, the compression head 60, and the laser chamber 80. For the container, a water-cooled heat exchanger is placed inside the container and the heat from the circulating laser gas is transferred to the heat exchanger to become cooling water. Other heat exchangers (not shown) are installed outside the surface of the chamber. For the remaining main heat generating components, the cooling water is piped to the component position and one or more groups of fans blow the gas through the water gas heat exchanger to the component, as shown in FIG. For the compression head, the cycle is as shown, but for HVPS and steering, the cycle continues to the components, and then cools the other components through the other parts of the closed chamber before being recycled back to the heat exchanger. . The partition plates 242 and 243 guide the general ventilation gas from the filter 241 to the orifice 224 through the passage shown by the arrow 244 «» This cooling system does not include ducts, except that the water line is fed into the laser chamber and attached to the laser chamber Outside the heat exchanger of the room * There is no water line connected to any laser components. Because all components (except the laser containment chamber) are cooled by blowing gas into the enclosed chamber ', there is no cooling connection when installing and replacing components. At the same time * due to the absence of ducts, the increase in the enclosed chamber is greatly increased. Inside can use components and work space. Pulse wave energy control algorithm operation mode-wafer photographic version of the embodiment of the invention includes a computer controller with a new algorithm Cheng 35 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 11— ^ ------------- Order i — — &quot; (Please read the notes on the back before filling this page)

n n H I line '4. 412891 A7

Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs on employee consumption cooperation. V. Invention Description (3) This type significantly reduces the changes in the previous technology of pulse energy and total integrated array energy. The following describes improved equipment and software and better processing procedures to reduce energy sum and array dose variation. As described in the background section of the explanation, the array mode is a typical mode of excimer laser operation &gt; It uses a light source that is a stepping machine in the integrated circuit of a photoengraving product. In this mode, the laser operation generates an "array" of pulse waves at a rate of 1000 Hz, and lasts about 110 milliseconds to generate 110 pulses to illuminate the ~ portion of the crystal. After the array, the stepper Move the wafer and the mask. Once the movement is completed, it usually takes a few tenths of a second to make the laser produce another set of 1 10 pulse wave arrays = Therefore, the normal operation is an array of about 110 milliseconds followed by a few tenths of a second. Stop time. In each case, a longer stop time period will be provided so that other operations can be performed. This basic processing procedure continues 24 hours a day, 7 days a week, and lasts for many months. The laser generally generates several hundred per day. Wan array. In the above array mode, it is usually important that each part of the wafer receives the same luminous energy in each array. At the same time, the wafer maker hopes that the pulse-to-pulse variation is minimized. The preferred embodiment uses equipment and software to achieve these goals. It monitors the energy of each pulse wave (pulse wave N-丨) and then controls the energy of the next pulse wave (pulse wave N) according to the following results: 1) The pulse wave N-1 Set Comparison result of energy and target pulse wave energy 2) Comparison result of cumulative dose through pulse wave N-1 array and target pulse wave dose through pulse wave N-1. In a typical F2 excimer laser, we have discussed First, the energy of the 30-40 pulse wave is generally shorter than that of the remaining arrays due to the transient effects in the laser gas. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). I ------ ------- Order --------- line.} Doo (please read the notes on the back before filling this page) A7 B7__ 5. Description of the invention (bismuth) is unstable. Approximately 40ms after the pulse, the energy of the pulse with a fixed voltage is relatively fixed. In dealing with these early pairs, the applicant divided the array into two sets of time-direction regions, the first region (containing a number of previous pulses, for example, 40 The pulse wave) is called the __K &quot; zone and the second zone (including the pulse wave following the K zone) is referred to as the zone by the applicant in this description. This embodiment of the present invention uses a prior art excimer laser device for Pulse wave energy control. The pulse wave energy of each pulse wave of each array is measured by the photodiode 92 Measurement • As shown in Figure 8A. All response time of this photodiode and its sample and hold circuit, including the time required to reset the circuit It is stored within a few microseconds after the end of the pulse and this signal is read six times on average and is stored by the computer controller 22 approximately 1.0 microseconds after the start of the pulse. The accumulated energy is called the array dose 値. The computer controller uses signals representing the pulse wave energy of the pulse wave N and the target pulse wave energy and the array dose 値 to specify the high voltage of the pulse wave N + 1. This calculation takes about 200 microseconds. When the high voltage of N + 1 is determined, the computer controller sends a set of signals to the high voltage command (VCMD) 120 of the high voltage power supply, as shown in Figure 9 • To create a pulse wave N + 1 that takes several microseconds Charging voltage. The computer controller 22 commands the high-voltage power supply to capacitor C. Charge to the specified voltage. (At high repetition rates exceeding 2000 Hz, it may be necessary to start charging before the calculation is completed.) When a trigger signal from pulse wave N + 1 of trigger circuit 13 is received 0.5 milliseconds after the trigger signal from pulse wave N, As shown in Figure 2, this charging takes about 250 microseconds, so C. Fully charged and ready "On the trigger signal, capacitor C. 37 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

I »n I (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs --- ml — ^ · ί--IIII ----- — It · — — —? -------------- Printed by the Consumer Property Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 _B7___ V. Description of the Invention (λΓ) Release about 700 volts into the magnetic compression circuit, shown in Figure 8B Over a period of about 5 microseconds and then the pulse wave is compressed and amplified by the magnetic compression circuit to generate a discharge voltage of about 16,100 volts on the capacitor Cp, which discharges about 100 ns across the electrode 6 to generate a laser pulse of about 10 mj Lasts approximately ISns. A better algorithm is described below. When operating in the array mode, one of the particularly preferred procedures for adjusting the charging voltage to achieve the roughly required pulse energy. This procedure uses two sets of voltage adjustment algorithms. The first algorithm used in the first 80 pulses is called the KPI algorithm. The second algorithm, called the PI algorithm, uses pulses after the number of pulses 40 = the time period after the 80th pulse is called the "L area" of the array here. "Initial" PI __instructions · Proportional integrals "and __ KPI" in the __ K __indications are the "K" of the array "K" I algorithm K area contains pulse wave 1 To K, where K = 40 in this preferred embodiment »The algorithm used to set the charging voltage of the pulse wave N is: VN = (VB) N- (Vc) n- 1 N = 1, 2 ... k Among them: VN = Charging voltage of the Nth pulse wave (VB) N = k stored voltage array • It represents the best current estimate of the voltage required to generate the target energy Ετ of the Nth pulse wave in the K. area 値This array is changed after each array according to the following equation. According to the energy error of the previous pulse wave and the voltage error of the previous pulse wave that occurred in the array, the energy error to the pulse wave N-1 * 38 This paper scale applies to China Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling in this page) -------- Order ----- line '^ ~ ^ · · Ministry of Economy Wisdom Printed by the Consumer Cooperative of the Property Bureau 412894 ___B7 V. Description of the invention (secretary) y'jA-ei-BDi) j ^ ~ JdEidV) According to the definition, (Vc) 0 = 0 A 'B =-generally between 0 and 1 of Score, in this preferred embodiment A and B are both 0.5

Si = energy error of the i-th group of pulses = Ei-Eτ, where Ei is the energy of the i-th group of pulses, and 3ET is the target energy array, which includes all the pulses from 1 to i, and the cumulative dose error i = Α -1 dE / dV = rate of change of pulse energy with charging voltage. (In this example | one or more sets of dE / dV 値 are experimentally determined in each array and the average of these 运作 s is used to calculate) The stored V (VB) N is based on the following relationship, in Is changed during or after each array: (VB) NM + 1 = (VB) NM-C [EN / (dE / dV)-(Vc &gt; M] where the index M indicates the number of arrays C = generally between 0 and 1 The fraction between them is 0.3 in this preferred embodiment. The PI algorithm L region contains the pulse wave k + 1 to the end of the array (in the preferred embodiment, the number of pulse waves is 41 and more). The algorithm used to set the pulse N charge voltage is = VN = VN.i-[(AeN.i + BDN-i) / (dE / dV)] 39 This paper size applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) ----------- I ------ Order ------ 111 c Please read the notes on the back before filling out this page) Intellectual Property Bureau, Ministry of Economic Affairs Printed by the employee consumer cooperative 412891 β Α7 _____ &quot; _B7_ V. Description of the invention (β) Where: VN = Charging voltage of the Nth pulse wave N-1 (previous) charging voltage variable A, B, ε ,, D | * and dE / dV are as previously defined. dE / dV decision The new definition of dE / dV is determined periodically to track relatively slow changes in laser characteristics. In the preferred embodiment, dE / dV is measured in a controlled manner using a change or dither voltage when two consecutive pulses are in the L 瓯 domain. For these two sets of pulse waves, the normal energy control algorithm is temporarily stopped and replaced by: For pulse wave j:

Vj = Vj.i-[(A8j.1 + BDj.1) / (dE / dV)] + VDi (her where VDither = fixed voltage increment, generally a few volts. For pulse j + 1:

Vj + I = Vj-VDither After the pulse j + 1, dE / dV is calculated: dE / dV = (Ej + 1.Ej) / (2VDither) The calculation of dE / dV is very complicated, because the jitter voltage The expected energy change may have the same amplitude as the normal energy change of the laser. In the preferred embodiment, the operation average of the last 50 sets of dE / dV calculations is actually used for the PI and KPI algorithms. The better method for VDithtr to choose is to specify the energy jitter EDithei, which is generally a percentage of the energy target Eτ *. Then use dE / dV's current (average) to calculate 40 paper standards applicable to China National Standard (CNS) A4 Specifications (2〗 〇297297 mm) ----- I I .------------- Order --- I-! Line {Please read the back first; fill in this item Page) Printed B7 by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (3δ) ^ Dither = EDither ^ (dE / dV) Pulse j +2 (immediately after two sets of jitter pulses) is non-jitter , But it has specific 値:

Vj-J = Vj.i + VDither '[A (8j + i + VDither) + BDj + |)] / (dE / dV) (pulse j + 2) This Vj + 2 is specific to the jitter of the applied voltage and The expected energy jitter from the pulse j + Ι is corrected = many variations of the above algorithm are possible. For example, dE / dV can be determined in the L and K regions. Dithering can occur once per array, or multiple times. The jitter order can be performed at a fixed number of pulses j as described above, or it can be started for any number of selected pulses that change from one array to the next array. The reader should know that A, B and C are convergence factors , Which can have many others. A higher 値 than specified above can provide faster convergence 'but can lead to increased instability. In other preferred embodiments, A = (2B) I / 2. This relationship has evolved from conventional techniques that produce critical damping. In the case of no dose correction, B can be zero; however, A should not be zero 'because it provides a damping term to the dose delivery part of the algorithm. If the determined dE / dV ratio becomes too small, the above algorithm can lead to overcorrection. Therefore, in the preferred technique, if the sum of the energy sum exceeds the threshold, dE / dV is arbitrarily doubled. The original values of V and dE / dV are provided to the first pulse of the array. D is set to zero at the beginning of each array. The original dE / dV was set to approximately three times the expected dE / dV to avoid initiating excessive corrections. 41 This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) --------.------------- Order ------- --Line, ^ -1-- (Please read the precautions on the back before filling this page) 412 buckle B7 V. Description of the invention (yes) As mentioned above, the different method for determining dE / dV without jitter is to measure only and measure Energy and voltage stored during laser operation 値 (You can also use measurement 値 instead of specified voltage 値.) These data can be used to determine dE / dV as a function of V at a fixed pulse energy. Readers should note that the differences in dE / dV do not include considerable uncertainty> because the components of 値 are significant measurement differences with significant uncertainties '' but • averaging a large number of dE / dV 値 can reduce these Uncertainty. The dithering operation to determine dE / dV does not have to be formed in each array and can be formed periodically, for example, once per M array. Or the dE / dV measurement can be calculated by the computer (replaced or the dE / dV) can be manually inserted by the operator of the previous pulse wave for the calculation of VN + 1. In addition, the actual measurement can be used in this control system. . At the same time, ^ 11 値 can be calculated from the specified 値, rather than the actual measurement 値 in the above embodiment. Another obvious method is to use the measurement voltage 値. Ετ is generally fixed, such as 10m, but it does not have to be constant. For example, the Et of the last ten sets of pulses may be smaller than the nominal pulse energy, so that the percentage of these pulses offset from the target Et will have a smaller effect on the integrated pulse dose. At the same time, it is better to plan the computer controller 22 in some cases to provide E τ 改变 that changes from array to array. Single-line and narrow-line configuration Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs `` ---- Package (Please read the precautions on the back before filling this page) Figure 11A shows a better F2 laser system The preferred single-line configuration. In this configuration, one of two sets of main F2 lines is selected as shown in the figure. There is a simple 稜鏡 selector. Figure 11B shows a narrower line narrowing system. One set of power shakers is Group of major shakers provided. Prototype unit 42 This paper size is in accordance with Chinese national standard (CNSXA4 specification (210 X 297 mm) 412891 A7 _B7____ V. Description of invention) A prototype F2 laser system unit was established and tested by the applicant and their staff. This prototype laser is largely based on the current production KrF and ArF laser excimer laser systems, which have many important improvements over the previous technology, which uses a high-efficiency chamber and solid-state pulsed power excitation. The discharge is pre-ionized by corona In order to minimize gas pollution, the entire optical beam channel is purged with nitrogen to avoid light being absorbed by oxygen and damage to optical components. All the resonator optics are added to the laser chamber with an angle chamber window. The gas mixture was 0.1% fluorine at 4 atmospheric pressures of helium and the electrode gap was reduced to 10 mm. In this module, the applicant has successfully demonstrated the main parameters for standard photoengraving fluorine lasers | which have only a few direct changes to the currently developed ArF lasers. Test results The test results of the prototype unit are described below. This laser power source is measured by a set of standard power supply measuring devices and interacts with a set of piezoelectric Joule meters. The effect of the red atomic fluorine laser is subtracted and is usually less than 1% of the total energy. The red radiation can be measured by exhausting the beam feeder tube to the air, which strongly absorbs light of 5 7 η m. The laser wavelength in this prototype unit was adjusted in a single-line mode at 157.6nm using a set of two external prisms. The laser can also be adjusted to a 157.5nm transfer line with reduced efficiency. The transition is not visible at 156.7nm. The laser spectrum recorded with a 2 meter lobin YvonVUV spectrometer indicates a limited measurement line width of 6 p m. 43 This paper size applies to Chinese national standard (CNS &gt; A4 size (210 X 297 mm) (Please read the precautions on the back before filling this page)) -Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 _B7_ V. Description of the invention (w) In a wide band (or multi-line) operation at a repeat rate of 1000 Hz Get a maximum power of 12W. The power supply linearly shows no sign of saturation as the repetition rate increases. The behavior in single-line mode is similar, but the energy is 1/3. The decrease in energy is due to the large cavity length in current radon devices Increased and can be significantly reduced. In array mode, 3—sigma 3% σ stability is recorded. Only the output can be set to start the array transient. This is advantageously compared to ArF lasers, which exhibit greater energy Instability and the airflow about the transient state of the array. Therefore, we can conclude that the production of a fluorophotographic plate laser will have better energy stability than the current ArF laser. The integral square pulse lasts 30ns, which is close to the ArF laser. performance Careful selection of laser chamber materials and the use of pre-ionization of corona discharge to induce laser operation without the need for cryogenic purification and the need for halogen spraying for many hours as well as a 3 MW emission with a small energy reduction. The relationship of the coverage rate is shown at the top of the graph. The bottom part of graph 10A shows that increasing the repetition rate beyond 10002 reduces the pulse energy slightly. The laser power increases linearly with the repetition rate to 15W power. (At 1kHz) and to about 19W power (at 2kHz). Based on this linear relationship, we can assume that the fluorine laser can be further adjusted to operate at many kilohertz, and assume that the airflow is adjusted accordingly. Because the applicant uses helium as Buffer gas requires only a part of the power of a standard neon-based laser hair dryer and therefore does not show the limitation of higher flow rates. A good measurement of energy stability is obtained by observing the energy transients in the array mode. Therefore The laser is repeatedly excited in an array and the average energy at each pulse position in the array is recorded. At the same time, it applies to 44 paper scales China National Standard (CNS) A4 Specification (210 X 297 mm) --------. 11 ^ ---- Installation -------- Order --------- ( Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 ____B7_ V. Description of Invention (4Z) The number of each pulse in the array is the average change in energy from the array to the array. Calculations. The generated energy and stability curves for fluorine lasers, and the comparison of linear narrow-band ArF lasers are shown in Figures 10B1 and 10B2. The fluorine laser has only a small amount of energy change over the 120 arrays. Energy stability The performance exhibits an initial increase at the beginning of the array and then stabilizes above the 3σ level of about 3%. In contrast, ArF lasers have large transfers in energy and 3σ instability of about 7%. ArF lasers have a distribution stability of 0.5% in 60 sets of pulse windows *. Therefore, fluorine lasers are expected to have at least the same distribution stability. The 苐 10C plot contains pulse energy and 3 σ 1000 at 1000Hz and 1900Hz. A wide-band fluorine laser spectrum recorded with a νυν spectrometer is shown in Figures 10D1 and 10D2. It can be clearly seen that 87% of the laser energy at two groups of transfer lines at 157.52nm and 157.63nm is placed in the longer wavelength line of 157.63nm. The transfer at 156.7nm is not visible. The single-line mode operation at 157.63nm is achieved by adjusting a set of two external chirps. The laser can also be adjusted to a transfer line of 157.52 nm, but with reduced efficiency. Figures 10D1 and 10D2 also show an expanded view of the ray at 157,63 nm. 1.14pmFWHM and 2.35pm 95% of the convolution line widths are measured Applications. The laser power for a single-line laser has the same linear increase in repeatability results as a wideband laser. However, the maximum power in this initial test was limited to 4W. This reduced output power is due to the reflection loss in line-selective optics and the overall length of 45 paper standards applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -------- i — * J1 (Please read the precautions on the back before filling this page) nnn line, printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ¥?

4128U B7 V. Description of invention (#) Caused by cavity length. Horizontal and vertical beams are measured at a distance from the laser im. (See Figures I0E1 and 丨 0E2> "The beam shows a highly symmetrical, smooth profile. This profile can be easily managed with homogenizer technology currently used to produce a very uniform luminescence. The gas lifetime is estimated to be used at a fixed voltage Operate a fluorine laser during the non-fluorine injection and record the development of the laser power for the number of excitations. In these measurements * no cryo-purification was used. It can be seen in Figure 10F that after four million laser launches, the laser The reduction of the radio power is less than 20%, which is at least as good as ArF laser. From the previous experience of ArF laser, we can use periodic fluorine injection and therefore expect a gas life of about 25 million shots. This is due to the choice of Results of matching materials in the chamber and using corona preionization. For KrF and ArF lasers, a direct correlation between fluorine consumption and chamber life was established previously. Therefore, we can estimate fluorine The life of the laser chamber is the same as that of ArF laser. The bottom graph of Figure 15A shows the pulse wave energy relative to the F2 concentration and the top graph shows the maximum pulse wave repetition rate, both A blower speed of 250 rpm. The top graph in Figure 15B shows the pulse shape of the time function, which indicates a FWHM of 16ns. And the bottom graph shows the integral square pulse width is about 37ns. Although this F2 laser has been referenced to a specific implementation For example, it should be understood that various changes and modifications can be made. For example, many different embodiments are discussed in the patent applications listed in the first part of this description, all of which are listed here for reference. Calibrator output couplers can be Use to provide another 46 narrow lines. Applicable to China National Standard (CNS) A4 specifications (210 X 297 public love). Γ -------- Order --------- (谙 Read first Note on the back, please fill in this page again) 412891A7 B7 V. Description of the invention (and ·) Chemical = buffer gas helium can be replaced by neon. The present invention is only limited to the scope of additional patent applications. ----- -------- Equipment -------- Order --------- line, (Please read the precautions on the back before filling out this page) Intellectual Property Bureau Staff Consumer Cooperatives Printed 47 This paper is sized for China National Standard (CNS) A4 (210 X 297 mm) 5 Description of the Invention (#) 3 ... 6 ... 6 A 6 B 8 ... 8 A 8 B 10 economic element portion 4128¾ B7 numeral Intellectual Property Office employee table printed consumer cooperatives

1 9 2 0 2 1 2 2 2 4 2 4A 2 4 B 2 4 C 2 Blower heat exchanger line narrowing wedge group capacitor high voltage power supply module HV power supply control board rectifier inverter ... inverter ... inverter ... inverter transformer ... step transformer ... step transformer 48 (Please read the note on the back first (Fill in this page again)

This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 mm) A7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 B7 V. Description of the invention 2 6 C ...... Stepping transformer 2 8 ... rectifier 3 0 ... bridge rectifier circuit 3 0 A ... bridge rectifier circuit 3 0 B ... bridge rectifier circuit 3 0 C ... bridge rectifier circuit 3 1. ..... line narrowing module 3 2 ... filter capacitor 3 3 ... output beam 3 4 ... switch 3 6 ... switch 3 7 A ... 稜鏡 3 7 B ... Prism 3 7 C ... 稜鏡 3 8 ... Grating 3 9 ... Stepper motor 4 0 .. .... steering gear 4 1 ... steering gear control board 4 2 ... charging capacitor 4 4 ... monitor 45 ... feedback signal 46 ... guide vane 4 8 …… Guide blade 5 0 + ..... Guide blade 49 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the unintentional matter on the back before filling in this page)

Printed clothing for employees' cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 A7 _B7 V. Invention Description "7) 5 2 Capacitor 5 3 ... Cathode Support Rod 5 4 Inductor 5 4 A ... Capacitor 5 5 A .. .... isolator 5 6 ... transformer 5 6 A pre-ionizer 5 6 B printed circuit board 5 6 C ... isolator 5 6 D ... secondary coil 5 6 E ..... .Ground 5 6 F ... High voltage terminal 5 7 ... Recycling circuit 5 8 ... Recycling inductor 5 9 ... Recycling diode 60 ... Compression head module 6 1 ... silencer 6 2 ... capacitor 6 4 ... inductor 6 4 A ... pipe 6 4 B ... cover 6 9. .... Photodiode 7 9 ... Calibrator 8 0 ... Laser Capacitor Module -------- 1 ----- Installation ---- ---- Order ------ (Please read the precautions on the back before filling in this page) Cindon 50 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) Intellectual Property of the Ministry of Economic Affairs Printed by the Consumer Cooperatives of the Bureau A7 B7 V. Description of the invention (this "8 1" ·… convex green (inductor) 8 1 A ..... Slot plate S 1 B ..... Slot plate Slice 8 2 &quot; .. capacitor array 8 2 A ••… high voltage side 8 3 …… Partition (electrode) 8 3 A ...... rod 8 3 B ...... nut 8 4 &quot; ·… aluminum pipe (electrode) 8 4 A …… support rod 8 4 B .. .... protruding piece 8 5… wire 8 6… narrow package 8 7-… flange 8 8…… diffuser (coupler) 8 9…… window 9 0…… focusing lens 9 2-·… light two Polar body 1 0 0 ••… high voltage control processor 10 2 ••… processor 12 0 ••… bias current source 12 4… magnetically driven bearing 1 2 6 ..... coil 12 8 ••… rotor- --- 1 ——— ό Outfit ------ &lt; Please read the notes on the back before filling in this page) Order ----- Thread &gt;. This paper size applies the national standard of the country (CNS ) A4 size (210 X 297 mm) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 412891 a? _ ^ _ B7 V. Description of the invention) 1 2 9-*… rotor 13 0 · &quot;… shaft 1 4 0-… Stator 1 4 5 —… rod section 14 6 · &quot;… guide rod 1 6 0…… ground plane 17 0 “*… reverse tracking groove 1 7 1…… mirror 1 7 2…… detector 17 3- … Lens 17 4 ·.… Mirror 17 5-… Mirror 17 6 * … Grating 17 7 · '… Slit 17 8- •… Mirror 17 9 .. •… Mirror 18 0- · •… Light Diode Array (Insulation Case) 18 2 ·· •… Lens 18 3- •… Lens 18 4 * ·-… Calibrator 18 6- •… Lens 18 8- •… Lens 19 0- •… Atomic Wavelength Reference Sheet Redundant 19 1 ·. •… Diffuser 52 (Please read the precautions on the back before filling this page ) -------- Order ----- The standard of this paper is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) V. Description of Invention (SO) ί! 289 ^ 7 Β7 Economy Ministry of Intellectual Property Bureau Employees' Cooperatives Printed Clothing 19 2- ·… Lens 19 3-… Lens 19 4 ··… Vapor Cell 19 5 &quot; ·… Lens 19 6 * ·-… Light Diode 1 9 7…… Handling器 19 8 —… cathode 2 0 1…… laser enclosed room 2 0 2 “·… gas module 2 0 3…… cooling water supply module 2 0 4 &quot;.… AC / DC distribution module 2 0 5 … * · Control module 2 0 6…… Narrowing module 2 0 7… Compression head 2 0 8…… High-voltage pulse wave power supply 2 0 9 &quot; ·… Supply pulse wave power supply 210 ···Metal fluoride condensate flap 2 1 ...… laser chamber 2 13 &quot;… wavelength meter module 2 1 4…… automatic closer 2 16-… output coupler 2 17-… hair dryer motor 2 18-… Metal fluoride condensate flap 2 19 · "… status light 53 This paper size applies to the national standard (CNS) A4 specification (210x297 mm) -----— Id package · &lt; Please read the precautions on the back first Fill out this page again) Order ------ Line '412891 A7 B7 V. Invention Description (5 j Printed by the Consumers' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 2 2 0 2 2 1 2 2 2 2 2 4 2 4 0 2 4 1 2 4 2 2 4 3 2 4 4 2 5 0 2 5 2 2 5 4 3 0 1 3 0 2 3 0 3 3 0 4 3 0 7 3 0 8 3 14 3 16 3 18 3 2 0 5 0 2 5 0 4 24 volt power supply chamber window gas control elastic connection orifice box sealed chamber entrance port split disk split disk channel channel flow leaf flow blade flux exclusion metal flux flux exclusion metal flux flux exclusion Metal sheet protruding sheet sealed transmission window transmission window anode cathode spray bottle valve 54 This paper size is applicable to national national standard (CNS) A4 specification (2J0 X 29 7 mm) --------; ----- install -------- order --------- line ^^^-&lt; please read the note on the back first Please fill in this page again) A7 412891 V. Description of the invention (5 of 5) 5 0 5…… Flow limiter 5 0 6-… Valve 5 0 7…… Pressure transducer 5 10 ”.… Valve 5 12-… Valve 5 1 3…… vacuum pump 5 1 4…… gas bottle 5 1 5…… valve 5 1 6…… buffer gas bottle 5 1 7…… valve 5 2 4 &quot; ·… beam splitter 5 2 8-… monitor 5 5 0-… circuit 5 3 6… processor 5 3 7…… manifold (please read the precautions on the back before filling this page)

Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper is sized to the Chinese National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

412891 g D8 VI. Patent application scope Consumption cooperation by employees of the Intellectual Property Bureau of the Ministry of Economic Affairs Du printed 1. A very narrow band reliable modularized production product with a narrow band pulse laser beam with a repetition rate of at least about 1000 Hz A high repetition rate A r F excimer laser, the laser contains: A.-a fast replaceable laser chamber module containing a laser chamber, which includes: 1 &gt; two sets of extended electrodes; 2) laser gas, It contains a) gas, and _ b) inert gas: 3)-a group of gas circulators for circulating the gas B between the electrodes at a speed of at least two centimeters per millisecond-a type containing at least one group that can quickly A modular pulse wave power system that replaces a module, the system includes a set of power supplies, pulse wave compression and amplification circuits, and pulse wave power control &gt; for generating at least 14,000 volts across these electrodes at a rate of at least about 1000 Hz High voltage electrical pulses; and C. a set of laser pulse energy control systems for controlling the voltage provided by the pulse power system, the control system comprising a set of laser pulse energy monitors and a set of A computer processor, which is planned by a set of algorithms, calculates the electrical pulses required to generate a laser pulse with a pulse energy within the required energy range based on the pulse energy data experienced. 2 · If the laser of the first scope of the patent application, the container, the pulse wave power system, the line narrowing system, the energy control system, and almost all the electrical, optical and mechanical components of the laser are Included in modules that can be quickly replaced. 56 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) {Please read the precautions on the back before filling this page) 412891 A8B8C8D8 VI. Patent application scope Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 3. If the patent application scope item 1 laser, where the chamber and the gas circulator form a set of airflow channels and upstream direction The radiation also includes a set of single pre-ionizer tubes placed upstream of the electrode. 4. As for the laser of the first scope of the patent application, each of the electrodes forms a set of electrode length and the single pre-ionizer tube contains A grounded electrical conductive rod placed along the axis of a hollow cylindrical tube having a length longer than the length of the electrode. 5 as in the scope of patent application 1 | all of these at least three groups of 稜鏡 are composed of calcium fluoride "6. As in the scope of patent application 1, where the two groups of extended electrodes form a cathode And anode and the anode support rod contains cooling tabs. 7. The laser of claim 1 in the scope of the patent application, wherein the two sets of extended electrodes form a cathode and an intestine and the anode contains a cooling tab. 8-The laser of claim 7 in the scope of the patent application, wherein the anode and the anode support rod together have a combined texture of at least about 3.4 kg. 9. The laser according to item 1 of the patent application &gt; wherein the modular pulse wave power system includes at least three sets of modules each designed for rapid removal and replacement. 10. The laser of claim 1 in the scope of the patent application, wherein the laser chamber forms a chamber structure and wherein the two sets of extended electrodes form a cathode and an anode and the cathode uses a part attached to a part of the chamber structure. A 丨 203 constitutes a monolithic isolator and is isolated from the chamber structure. 11. If the laser of item 10 of the patent application scope, where the part of the monolithic isolator attached to the chamber structure has a coefficient of thermal expansion similar to 57 (please read the precautions on the back before filling this page) Private paper scales are in accordance with China National Standard (CNS) A4 (210 X 297 mm) 412891 A8 B8 C8 D8 Patent Application Scope Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperative Production Du printed ai2o3 materials. 12. For the laser of the scope of application for item 11, the structural material is ASTM A36 steel. 13. If the laser of item 12 of the patent application scope, wherein the cathode is directly installed on the monolithic isolator "14. If the patent application of the first paragraph of the laser gas all seals are metal seals. 15. Such as the leaf structure of the laser alloy in the scope of the patent application. 16. As the laser silencer of item 1 in the scope of the patent application ^ 1 7. As the laser electrode of item 2 in the scope of the patent application, a cathode and an anode are formed and the anode has a tapered surface to reduce the aerodynamic force on the bearing Supported by the anode support rod of the reaction force. 18. The laser according to item 1 of the scope of patent application, wherein the power supply includes a set of rectifiers for converting AC power to DC power, a set of converters for converting the DC power to high frequency AC power, A set of step transformers for increasing the high frequency AC power supply voltage to a higher voltage, and a set of charging capacitors for converting the higher voltage to approximately the command voltage established by the laser pulse energy control system A set of voltage rectifiers. 19. The laser according to item 18 of the scope of patent application, wherein the power supply is configured to slightly overcharge the charging capacitor and further includes a set of discharge circuits to discharge the charging capacitor to the command voltage. The exposure to the laser further includes Meng and further includes the two sets of extensions (please read the precautions on the back before filling out this page)! —Order- 丨 ----- Thread '58 Applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 412891 A8 B8 C8 D8 6. Application for patent scope Printed by the Consumers' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 20. If the patent application scope of the 19th laser, The pulse wave power system includes a set of solid-state switches that, when turned off, activate the high-voltage electrical pulse wave by allowing a charge to flow from the charging capacitor to a set of second capacitors to generate a high-voltage charge on the recording capacitor. 21. The laser of claim 20, further comprising a set of inductors, a set of pulse transformers, and a set of third capacitors, wherein the inductor, the pulse transformer and the third capacitor are configured The high voltage charge on the second capacitor is allowed to flow to the ground via the main side of the pulse wave transformer to generate a set of very high voltage pulse waves that will be temporarily stored on the third capacitor at the output of the pulse wave transformer. 2 2. If the laser of item 21 of the patent application scope, wherein the main side of the pulse wave transformer includes a plurality of hollow bobbins • each bobbin forms a series connected shaft, and the secondary side of the pulse wave transformer includes and The axes of the plurality of spools are aligned with at least one set of rods. 2 3. The laser according to item 22 of the scope of patent application, wherein the at least one set of rods are connected in series and form four sets of two sets of wires, one set of wires forms a grounded wire and the other set of wires forms a very high voltage wire. 24. The laser according to item 1 of the patent application scope, wherein the laser pulse wave power system includes at least one set of saturable inductors having a coil that is also a high-voltage wire of the inductor and exposed to an oil tank. 25. The laser according to item 1 of the patent application scope, wherein the gas circulator includes a set of compressors having a shaft supported by at least two sets of magnetic bearings, each bearing includes a set of stators and a set of rotors; The bearing contains a set of stators and a set of rotors, and the compressor also contains the 59-paper size for the Chinese national standard (CNS) A4 (210 X 297 mm) --------- ---- Q (Please read the precautions on the back before filling out this page) tr --------- 412891 Α8 Βδ C8 D8 A group of sealing devices containing the laser gas environment and the stator outside the laser gas environment "26. For example, the laser of patent application scope item 1, wherein the gas circulator includes A set of compressors for a shaft supported by a bearing. 27. For example, the laser of the scope of the patent application> and further includes a group of N2 chirping systems that provide a net stream of N2 chirp to all laser optical components outside the laser chamber, where the chirping net current is Contained under less than 10 Baska pressure. 28. For example, the laser of the scope of patent application, and further includes a device for measuring the rate of change of pulse wave energy with a varying voltage ΔΕ / AV, and an algorithm to plan a group of computer controllers to control The pulse wave power system of the high voltage charging system forming the charging voltage, the pulses of the laser array, P ,, P2, ... PN · ..PK, ρκ + 1, PK + 2 · ..ΡΚ + Ν 「. · P, 'Ρ2' ... Pν- ,, PN pulse energy and integrated energy dose, the algorithm includes the steps: (1) according to the measured energy sum of at least one set of previous pulses in the array For a set of predetermined target pulse energy 値, for each? "Pulse determines energy error 'ε, (2) for all previous pulses in the array,? 1 to 卩 1 ^], each Pν determines the integrated dose error, D, (3) For each of the first plurality of pulse waves, PN, use the following to determine the charging voltage PN: (i) the ΔΕ / ΔV (ί i) the ε 60 sheets Applicable Chinese national standard (CNS &gt; A4 size (210 X 297 mm)) (Please read the precautions on the back before filling Page) Order, line, A8412891 1 VI. Patent application scope Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (iiimD (iv) Based on the reference voltages specified by the majority of the previous array * pN, C. Use a set of algorithms to plan The computer processor adjusts the laser charging voltage to control the pulse wave energy of each pulse wave p K + N behind the pulse wave in the pulse wave array. The algorithm: (1) According to at least one set of previous pulses in the pulse wave array The measured energy of the wave and a group. The predetermined target pulse energy 値 determines the energy error for each PN pulse, £ 1 (2) For all previous pulses in the array, each pN determines the integrated dose error, D (3) For each of the first plurality of pulse waves, PN, the following items are used to determine the charging voltage PN: ⑴ the △ Ε / Δ V (H) the ε (HimD (iv) according to the majority The reference voltage of the previous array * PN specified voltage. 29. The laser as claimed in item 1 of the patent application scope, and further comprising a tapered surface for reducing the exit of the compressor due to laser gas and being redirected by the anode support device Aerodynamic reaction A group of anode support devices of the power amplitude. 3 〇 As the patent application scope of the first laser, and further includes a set of fluorine injection system with a processor planned by a set of algorithms 1 It is {Please read first Note on the back? Matters need to be filled out on this page again!! I _ —Order 丨 丨 丨 丨 '61_ This paper size applies to China National Standard (CNS) A4 (210 X 297 ^ 17 412891 A8B8C8D8) VI. Patent Application The Property Bureau employee consumer cooperative designs designs to cause fluorine to be shot continuously or in less than 30 minutes to maintain the fluorine concentration, which is approximately fixed at the desired concentration over an extended time period of at least many days. 31. The laser of claim 30 in the patent application range, wherein the fluorine injection system further includes a feedback voltage signal representation of a set of laser discharge voltages provided to the processor, and the signal is used by the processor to maintain The signal is within a predetermined range. 32. The laser of the scope of patent application No. 31, wherein the predetermined range is periodically modified so as to maintain the laser to operate corresponding to the fluorine concentration within a desired range to a favorable point. 33. The laser according to item 32 of the patent application * further includes a set of devices &gt; a laser parameter expression for periodically determining the pulse width of the laser pulse. 34. For the laser of item 30 of the scope of patent application, where the decision parameter represents the full width of half the maximum pulse width. 35. — A reliable, modular production quality high-repetition-rate excimer laser that generates a narrow-band pulsed laser beam with a repetition rate of at least about 1 kHz, which includes: A. A set of laser capacity that can be quickly replaced A chamber module comprising: I) two sets of extended electrodes, 2) a laser gas comprising fluorine and a buffer gas, and 3) for circulating the laser gas between the electrodes at least two centimeters per millisecond A group of gas circulator systems, including: a) a copper-free blade structure forming a shaft, *-· .- V »ίιι — llllll -------— subscription · — 1 — 丨! (Please read the notes on the back before filling out this page) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A8 B8 412891_% l__ Scope of patent application b) A group of brushless motors used to rotate the shaft, 〇 magnetic bearings used to support the shaft, the motor and the bearing are attached to the shaft and sealed in the exposure to the laser gas A rotor within the environment and the motor and the bearing have a stator outside the laser gas environment, B. a set of pulse wave power systems, which are roughly included in at least one set that can quickly replace the module and contain : 1) a set of processor-controlled high-voltage power supplies for periodically charging a rough charge capacitor to a predetermined pulse-wave control voltage with electrical energy at a rate of at least about 1000 Hz, 2) a set of compression and amplification circuits for Connect the electrical energy stored on the charging capacitor into high voltage electrical pulses of at least 14,000 volts across the electrodes. 36. If the laser of claim 35 is applied, wherein the chamber and the gas circulator form a set of airflow channels and are in the upstream direction, and the laser also includes a set placed upstream of the electrode A set of single pre-ionizer tubes and wherein each of the electrodes forms an electrode length and the single pre-ionizer tube includes a set of grounded electrical conduction placed along an axis having ai2o3 hollow cylindrical tube having a length longer than the electrode length Pole. 37. The laser according to item 35 of the scope of the patent application, and further comprising a device for measuring the rate of change of the pulse wave energy with a varying voltage AE / AV, and an algorithm to plan a group of computer controllers for Control the pulses of the laser array, P ,, P2, ... Pγ · · Pκ, Pκ +], Pκ + 2 ... Pκ + Ν〆 ·· from the pulse wave power supply system that forms the charging voltage. ,, P2, ... 63 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -------------------- Order ---- ----- Line ·, (Please read the precautions on the back before filling this page) 412891 A8 B8 C8 D8 VI. Application for Patent Scope Printed by Pn-i'Pn in Pn-i'Pn by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Energy and integrated energy dose, the algorithm includes the following steps: (1) according to the measured energy of at least one set of previous pulses in the array and-a set of predetermined target pulse energy 値, for each PN pulse to determine the energy error, ε, (2) For all previous pulses in the array, each% of ρ, to ρN | determines the integrated dose error, D,-(3) For each of the first majority of pulses, pN &gt; Use the following to determine the charging voltage PN: (i) the ΔΕ / ΔV (ii) the ε (iii) the D (iv) the reference voltage based on the voltage specified by the majority of the previous array * pN, C. Use a The computer processor planned by the group algorithm adjusts the laser charging voltage to control the pulse wave energy of each pulse wave P behind the P κ pulse wave in the pulse wave array. The algorithm (1) According to the measured energy of at least one set of previous pulses in the array and a set of predetermined target pulse energy 値, the energy error is determined for each p N pulse, e, (2) For all previous pulses in the array wave,? | To? ^ 之 卩 1 ^ Determine the integrated dose error 1 D, (3) For each of the first majority pulses, PN, use the following to determine the charging voltage p N: 64 Standard (CNS) .A4 specification (210 X 297 mm) (Please read the notes on the back before filling this page)! 丨 丨 丨 Order --------- line · ^ 12891 g D8 VI.Application The patent scope (i) the Δ E / Δ V (i ί) the ε (iii) the D (iv) reference voltage according to the voltage specified by most previous arrays * PN. (Please read the precautions on the back before filling out this page) Order ----- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper size applies to China National Standard (CNS) A4 (210x 297 mm) ^ Λ) A8 B8 C8 D8 6. Scope of patent application (please read the precautions on the back before filling in 1. A very narrow band with a very narrow frequency band and reliable pulsed laser beam with a repetition rate of at least about 1000Hz. High production quality An excimer laser with a repetition rate of 1 includes: A. A fast replaceable laser chamber module including a laser chamber, comprising: I) two sets of extended electrodes: 2) laser gas Contains a) fluorine, and b) inert gas: 3) a group of gas circulators for circulating the gas between the electrodes at a speed of at least two centimeters per millisecond; the order B includes at least one group that can quickly replace the module A modular pulse wave power system that includes a set of power supplies, pulse wave compression and amplification circuits, and pulse wave power control for generating at least 14,000 volts across these electrodes at a rate of at least about 00Hz. High-voltage electrical pulses: and C.—Group Laser Pulse Energy Control System | Used to control the voltage provided by the pulse power system, the control system includes a set of laser pulse energy monitors and a set of computer processing Device, which is planned by a set of algorithms and calculates the electrical pulses required to generate laser pulses with pulse wave energy within the required energy range based on the experienced pulse wave halo data. The laser of scope item 1, wherein the chamber, the pulse wave power system, the line narrowing system, the energy halo control system, and almost all the electrical, optical, and mechanical components of the laser are included in the rapid Ground instead of the 'module. 56 Essays are applicable to national standards of China (CNS) A4 now (210X297 mm) A8 B8 C8 D8 VI. Patent application scope 3 * If the laser in the patent application scope item 1 is used, the room and The gas circulator forms a set of gas flow channels and an upstream direction, and the laser also includes a set of a single pre-ionizer tube placed upstream of the electrode. 4. The laser of the first scope of the patent application, wherein each The electrode forms a set of electrode lengths and the single pre-ionizer tube includes a grounded electrical conductive rod placed along the axis of a hollow cylindrical tube having a longer length than the electrode length. All the at least three sets of prisms are made of calcium fluoride. 6. As the laser in the scope of patent application No. 1 • Where the two sets of extended electrodes form the cathode and anode and the anode support rod contains cooling protrusions 》 7-If the laser of the patent application No. 1 is used, wherein the two groups of extended electrodes form a cathode and an anode and the anode contains a cooling tab. 8. As for the laser of the patent application No. 7 • where the anode The anode support rods together have a combined mass of at least about 3.4 kg. 9 As described in the patent application for item 1 of the laser, the modular pulse wave power system includes at least three sets of modules each designed for rapid removal and replacement. Group "Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 10. As in the case of the patent application No. 1 of the laser • where the laser chamber forms a chamber structure and where the two groups of extended electrodes form a cathode and an anode and the cathode Use AhO attached to a part of the chamber structure to form a monolithic isolator to be isolated from the chamber structure. 11. If the laser of the patent application item 10 &gt; where the monolithic isolator is attached to ' The part of the structure of the chamber contains a coefficient of thermal expansion similar to ______ 57 This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 x 297 male «&gt; A8 BS C8 _ D8 _ / ,, apply for a patent control A12〇, the material. 12-If the patent application scope of the 11th laser 'where the structural material is ASTM A36 steel · 13. If the patent scope of the 12th laser application, where the cathode is directly Installed on the monolithic isolator. 14. If the laser in the scope of patent application 丨, all the seals exposed to the laser gas are golden seals * 15. If the laser in the scope of patent application 1 , Further including the structure of Monel alloy leaf. 16. If the patent application scope of the first laser, and further includes the silencer = 1 7. As the patent application scope of the second laser • Among the two groups The extended electrodes form a cathode and an anode and the anode is supported by an anode support rod having a tapered surface to reduce the aerodynamic reaction force above the bearing. Printed by the Employees ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 18. For example, the laser in the scope of patent application1. Where the power supply includes a rectifier for converting AC power to DC power, and for converting the DC power to One set of inverters of high frequency AC power supply * A set of step transformers for increasing the high frequency AC power supply voltage to a higher voltage, and a set of charging capacitors for converting the higher voltage to approximately use the lightning The pulse wave energy control system is a group of current commanders which are set of voltages. 19. The laser of claim 8 in which the power supply is configured to slightly overcharge the charging capacitor and further include a set of discharge circuits to discharge the charging capacitor to the command voltage. ___— 58 This paper is designed in accordance with the Chinese Standard (CNS) A4 (210 χ 297 mm) 6. The scope of patent application A8 B8 C8 D8 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 20. If the scope of patent application The laser of item 9 in which the pulse wave power system includes a set of solid state switches which, when turned off, activates the recording capacitor by allowing a charge to flow from the charging capacitor to a set of second capacitors to generate a high voltage charge on the recording capacitor. "High Voltage Electrical Pulse" 2 1. As the laser in the scope of patent application No. 20, and further comprising a set of inductors, a set of pulse transformers and a set of third capacitors, wherein the inductor, the pulse wave The transformer and the third capacitor are configured to allow the high voltage charge on the second capacitor to flow to ground via the main side of the pulse wave transformer to generate the output of the pulse wave transformer to be temporarily stored on one of the third capacitors. Group of very high pressure pulses. 22. According to the laser in the scope of patent application No. 2 丨, wherein the main side of the pulse wave transformer includes a plurality of hollow bobbins. Each bobbin forms a series connected shaft, and the secondary side of the pulse wave transformer Contains at least one set of rods aligned with the axes of the plurality of spools. 2 3. The laser according to item 22 of the scope of patent application, wherein the at least one set of rods are connected in series and form four sets of two sets of wires. — One set of wires forms a ground wire and the other set of wires forms a very high voltage. wire. 24. The laser according to item 1 of the patent application scope, wherein the laser pulse wave power system includes at least one set of saturable inductors having a coil that is also a high-voltage wire of the inductor and exposed to an oil tank. 25. The laser of item 1 of the patent application range, wherein the gas circulator includes a set of compressors having a shaft supported by at least two sets of magnetic bearings 1. Each bearing includes a set of stators and a set of rotors: using a motor The bearing of the drive contains a set of stators and a set of rotors. The compressor also contains a seal for sealing. Please read the "Cautions" on the back of "a" on page 59. This paper size applies to the Chinese national standard &lt; CNS) A4. (210x 297 mm) Rhyme 0808 VI. A set of sealing devices for which the scope of the patent application rotor is within the laser gas environment and the stator is outside the laser gas environment. Laser, wherein the gas circulator comprises a set of compressors having a shaft supported by at least two sets of ceramic bearings. 27. For example, the laser in the scope of the patent application, and further includes a group of N2 淸 net system that provides N2 淸 net flow to all laser optical components outside the laser container. Under the pressure of Baska · 28. The laser of item 1 of the scope of patent application • and further includes a device for measuring the change rate of the pulse wave energy setting with a varying voltage ΔΕ / Δν, and an algorithm Planning a group of computer controllers | used to control the pulses of the laser array from the pulsed power supply system of the high-grid charging system forming the charging voltage, P |, P: '··· Pn — Pk, P (C * I, PK ”… ΡΚ * ΝΙ…. Ρ!, ... PN-, · PN * pulse energy and integrated energy dose • The algorithm includes the following steps: (1) According to at least one group in the array Measured energy of previous pulse waves and a set of predetermined target pulse energy 値 • Determines the energy error I ε * for each PN pulse wave (2) For all previous pulse waves in the array? | To 1 &gt; 1 &lt;, • of Each member of the Department of Vision, Intellectual Property Bureau, Consumer Consumption, Printed Decision, Integrated Dose Error &gt; D (3) For each of the first majority of the pulses _ PN • Use the following to determine the charging voltage P〆 (i) the Δ Ε / Δ V (ii) the e ____60_ ^ Paper size applies to China Standard (CNS) A4 specification (210 x 297 mm) VI. Patent application scope (i Π) The D (iv) is based on the reference voltage specified by the majority of the previous array * Pn, 'C. Use a set of algorithms to plan The computer processor adjusts the laser charge voltage to control the pulse wave energy of each pulse wave Pκ + Ν behind the ρκ pulse wave in the pulse wave array. The algorithm: (1) According to at least one set of previous pulse waves in the array The measured energy and a set of predetermined target pulse energy 値, for each? 〃 pulse determines the setting error, € * * (2) For all previous pulses in the array,? 1 to 1 &gt; 1 ^, Each ρN determines the integrated dose error, D · (3) For each of the first majority pulses, pN, the following are used to determine the charging voltage P, N: (i) the ΔE / ΔV ( ii) the e (iii) the D (iv) reference voltage based on the PN specified voltage in most previous arrays. Consumption of employees of the production bureau is up to date. 29. The laser of patent application scope item 1 and further includes a tapered surface for reducing the exit of the compressor due to laser gas and being re-applied by the anode support device. A set of anode support devices that guides the amplitude of the aerodynamic reaction force generated. 30. Such as the laser of the patent application, and further includes a set of fluorine injection systems with a processor planned by a set of algorithms, Its 61 paper sizes are in accordance with Chinese National Standard (CNS) A4 specifications (210 X 297 mm) A8 B8-C8 D8 __ Liuqi Qicun! L &quot; a 30-hour Shu Shu 1. Consumption The patented range is designed to cause fluorine to be ejected continuously or in intervals of less than 30 minutes in order to keep the fluorine concentration approximately fixed at the desired concentration over an extended time period over at least many days. 3 I · The laser of claim 30 in the patent application range, wherein the fluorine injection system further includes a feedback voltage signal representation of a set of laser discharge voltages provided to the processor | the signal is used by the processor to maintain The signal is within a predetermined range. 32. The laser of the scope of patent application No. 31, wherein the predetermined range is periodically modified so as to maintain the laser to operate in accordance with the fluorine concentration within the required range corresponding to the favorable point "3 3 Laser of 2 &gt; further includes a set of means for periodically determining the laser parameter representation of the pulse width of the laser pulse. 34. If the laser of the scope of patent application is No. 30, where the determining parameter represents the full width of half the maximum pulse width-35. — a reliable module that generates a narrow-band pulse laser beam with a repetition rate of at least about 1 kHz The production of high-quality excimer lasers with high reproducibility, the laser contains: A. — a set of laser chamber modules that can be quickly replaced • it contains: I) two sets of extended electrodes 2) contains fluorine and buffer gas Composition of the laser gas | 3) A group of gas circulator systems for circulating the laser gas between the electrodes at least two centimeters per millisecond • It contains: a) a copper-free blade structure forming a shaft &gt; 62 This paper size applies to China National Standard (CNS) A4 (210x 297 mm) A8 B8ca D8 VI. Patent application scope b) A group of brushless motors for rotating the shaft, c) Magnetic support for the shaft A bearing, the motor and the bearing having a rotor attached to the shaft and sealed within the laser gas environment and the motor and the bearing having a stator outside the laser gas environment · B ·-group pulse Wave power system, which roughly Contained in at least one group that can quickly replace the module and contains: 1) —A processor-controlled high-voltage power supply • For periodically charging a group of charging capacitors with electrical energy at a rate of at least about 10.0 0 + Hz To the predetermined pulse wave control voltage, 2) — a set of compression and amplifying circuits for connecting the electrical energy stored on the charging capacitor into high voltage electrical pulse waves of at least 14,000 volts across these electrodes ” 36. The laser of claim 35, wherein the chamber and the gas circulator form a group of airflow channels and are in the upstream direction 1 and the laser also includes a group of single electrodes placed upstream of the electrode. A pre-ionizer tube and wherein each of the electrodes forms an electrode length and the single pre-ionizer tube includes a set of grounded electrical conduction placed along the axis of a cylindrical hollow tube having a length longer than the length of the electrode "3 7", such as the laser for applying for profit item 35, and further includes a device for measuring the rate of change of pulse wave energy with a varying voltage ΔΕ / AV, and an algorithmic planning A group of computer controllers for controlling the laser array pulses from the pulsed power supply system of the high voltage charging system forming the charging voltage. Pi ·… PN… PjC, PK + Ι 'Ρκ + Ϊ… PPNl… Pl f Ρ2… 63 This paper size applies to China Solid Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) 铿 齐 郎 智 毯 财 i 曷 r. Consumption and Itfi Print Si A8 B8 C8 _ DS VI. Patent application scope PN., I Pulse energy and integrated energy dose in PN, the algorithm includes the steps: ( 1) Set according to the measured energy of at least ~ groups of previous pulses in the array and a set of predetermined target pulse energy, determine the energy error for each PN pulse, ε, (2) for all previous pulses in the array The integrated dose errors of P, P, to PN1, D, (3) For each of the first majority of the pulse waves · PN, use the following to determine the charging voltage PN: (i) the Δ E / △ V (ii) the e (iii) the D (iv) according to the reference voltages of the voltages specified by the plurality of previous arrays * PN, C · Control the pulse by using a computer processor planned by a set of algorithms to adjust the laser charging voltage The pulse wave energy of each pulse wave P ^^ behind the Pκ pulse wave in the wave array. The algorithm: printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs (1) the measured energy based on at least one set of previous pulse waves in the array And __ group of predetermined target pulse energy 値, for each? ~ Pulse determines the set error, £, (2) For all previous pulses in the array, the individual integrated dose errors from P | to PN | · D · (3) For the first majority of pulses Each of these pulses, PN. Use the following items to determine the charging voltage PN: 1_____ 64 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A8 B8 τ C8 D8 VI. Patent application scope (i ) The A £ / Δ V (ii) the ε (iii) the D (iv) are based on a reference voltage specified by a plurality of previous array voltages. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 65 companies 97 2 X ο 21/1% Standard A4 5 &gt; N (c