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TW202140995A - Apparatus for surface profile measurement - Google Patents

Apparatus for surface profile measurement Download PDF

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Publication number
TW202140995A
TW202140995A TW110111764A TW110111764A TW202140995A TW 202140995 A TW202140995 A TW 202140995A TW 110111764 A TW110111764 A TW 110111764A TW 110111764 A TW110111764 A TW 110111764A TW 202140995 A TW202140995 A TW 202140995A
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Taiwan
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surface profile
pinhole
pinholes
light
beam splitter
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TW110111764A
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Chinese (zh)
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方仲平
友仁 吴
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大陸商元素光電智能科技(蘇州)有限公司
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Publication of TW202140995A publication Critical patent/TW202140995A/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/0016Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/002Scanning microscopes
    • G02B21/0024Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0036Scanning details, e.g. scanning stages
    • G02B21/0044Scanning details, e.g. scanning stages moving apertures, e.g. Nipkow disks, rotating lens arrays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/002Scanning microscopes
    • G02B21/0024Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052Optical details of the image generation
    • G02B21/0064Optical details of the image generation multi-spectral or wavelength-selective arrangements, e.g. wavelength fan-out, chromatic profiling
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/50Using chromatic effects to achieve wavelength-dependent depth resolution
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/002Scanning microscopes
    • G02B21/0024Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052Optical details of the image generation
    • G02B21/006Optical details of the image generation focusing arrangements; selection of the plane to be imaged

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microscoopes, Condenser (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The present disclosure generally relates to an apparatus (20) for measuring a surface profile of an object (30), the apparatus (20) comprising: a light source assembly (100) comprising a broadband light source (110); a confocal microscopy assembly (200) comprising: a beam splitter (210) for directing uniform light from the broadband light source (110) to the object (30); a pinhole device (220) comprising an array of pinholes (222), the pinhole device (220) configured for passing the uniform light from the beam splitter (210) through the pinholes (222) to the object (30); a set of incident optical elements (230) for directing the uniform light from the pinhole device (220) to the object (30) and causing chromatic aberration of the uniform light passing through the incident optical elements (230); and the pinhole device (220) configured for passing light reflected from the object (30) through the pinholes (222) to the beam splitter (210), the reflected light comprising spectral information of the surface profile based on the chromatic aberration; and an optical detection assembly (300) comprising: an optical detector (310) for receiving the reflected light from the beam splitter (210); and a set of detection optical elements (320) for directing the reflected light from the beam splitter (210) to the optical detector (310), wherein the surface profile of the object (30) is measurable based on spectral information of the reflected light received by the optical detector (310), the spectral information representing heights across the surface profile.

Description

表面輪廓測量系統Surface profile measurement system

本揭露一般關於表面輪廓測量。更特別地,本揭露描述物體表面輪廓測量系統的各種實施例。This disclosure generally relates to surface profile measurement. More specifically, this disclosure describes various embodiments of the object surface profile measurement system.

物體表面輪廓是檢視許多工業用物件品質的一項重要特性。特別地是在半導體工業,半導體裝置例如晶圓或基底的表面輪廓的測量與檢查被視為是品質控制與品質保證製程的一部份。一種傳統的物體表面輪廓測量方法是採用共焦顯微鏡技術。具體而言,共焦感測器被使用來測量該物體表面的多個點,以決定這些點在該表面的相對高度。接著這些一點一點的測量被組合來估測該物體的該表面輪廓。然而,對該表面的每一個別點採一點一點的測量耗時,使得該表面輪廓的測量緩慢。這些任意點亦無法涵蓋該表面的所有面積,潛在地排除了該表面輪廓的被關注的相關區域。The surface profile of an object is an important feature for inspecting the quality of many industrial objects. Especially in the semiconductor industry, measurement and inspection of the surface profile of semiconductor devices such as wafers or substrates are regarded as part of the quality control and quality assurance process. A traditional object surface profile measurement method is to use confocal microscope technology. Specifically, a confocal sensor is used to measure multiple points on the surface of the object to determine the relative height of these points on the surface. Then these little by little measurements are combined to estimate the surface profile of the object. However, it takes time to measure each individual point on the surface, making the measurement of the surface profile slow. These arbitrary points also cannot cover all the area of the surface, potentially excluding the relevant area of interest of the surface contour.

為了解決或消弭至少一項上述的問題及/或缺點,亟需提供一種改良的物體表面輪廓測量系統。In order to solve or eliminate at least one of the above-mentioned problems and/or shortcomings, there is an urgent need to provide an improved object surface profile measurement system.

根據本揭露的一方面,提供一種物體表面輪廓測量系統,該系統包括:一光源組件,包含一寬頻光源;一共焦顯微鏡組件,包含:一分束器,用以將來自該寬頻光源的均勻光導引至該物體; 一針孔裝置,包含一陣列的針孔,該針孔裝置被配置以使來自該分束器的所述均勻光通過該等針孔至該物體;一組入射光學元件,用以將來自該針孔裝置的所述均勻光導引至該物體,並使通過該等入射光學元件的所述均勻光造成色差;及該針孔裝置被配置以使來自該物體的反射光通過該等針孔至該分束器,所述反射光包含基於所述色差的該表面輪廓的光譜資訊;及一光學偵測組件,包含:一光學偵測器,係接收來自該分束器的所述反射光;及一組偵測光學元件,係將來自該分束器的所述反射光導引至該光學偵測器;其中,根據該光學偵測器接收的所述反射光的光譜資訊可以測量該物體的該表面輪廓,所述光譜資訊代表橫跨該表面輪廓的高度。According to one aspect of the present disclosure, an object surface profile measurement system is provided. The system includes: a light source assembly, including a broadband light source; a confocal microscope assembly, including: a beam splitter for dividing uniform light from the broadband Guided to the object; a pinhole device comprising an array of pinholes, the pinhole device being configured to allow the uniform light from the beam splitter to pass through the pinholes to the object; a set of incident optical elements , Used to guide the uniform light from the pinhole device to the object, and cause the uniform light passing through the incident optical elements to cause chromatic aberration; and the pinhole device is configured to cause reflection from the object The light passes through the pinholes to the beam splitter, the reflected light includes the spectral information of the surface profile based on the chromatic aberration; and an optical detection component includes: an optical detector that receives the beam splitter The reflected light of the optical detector; and a set of detecting optical elements, which guide the reflected light from the beam splitter to the optical detector; wherein, according to the reflected light received by the optical detector The spectral information of can measure the surface profile of the object, and the spectral information represents the height across the surface profile.

根據本揭露的一種物體表面輪廓測量系統在此被揭露。從下文的本揭露非限制性的例示實施例的詳細描述與附隨的圖式,本揭露的各種特徵、方面及優點將變得趨於明瞭。An object surface profile measurement system according to the present disclosure is disclosed here. From the following detailed description of the non-limiting exemplary embodiments of the present disclosure and the accompanying drawings, various features, aspects, and advantages of the present disclosure will become more apparent.

為了簡潔及清楚起見,根據圖式,本揭露實施例的描述是關於物體表面輪廓的測量系統。本揭露的各方面配合在此提供的實施例予以描述,需了解它們不是意圖要將本揭露限制在這些實施例。相反地,本揭露欲意涵蓋在此描述的實施例的各種變化例、修飾與均等手段,它們係被含括在所附的申請專利範圍定義的本揭露範疇。再者,下文的詳細描述陳述具體細節,以利於徹底了解本揭露。然而,本技術領域具通常知識人士,即熟悉此技人士,將明白 在沒有提及特定實施例各方面組合的具體細節及/或若干細節下,仍可實施本揭露。一些例子沒有詳細描述已知系統、方法、程序及部件,以避免不需要地模糊本揭露實施例的各方面。For the sake of brevity and clarity, according to the drawings, the description of the embodiment of the present disclosure is about a measurement system for the surface profile of an object. Various aspects of the disclosure are described in conjunction with the embodiments provided herein, and it should be understood that they are not intended to limit the disclosure to these embodiments. On the contrary, the present disclosure intends to cover various variations, modifications, and equivalent means of the embodiments described herein, which are included in the scope of the present disclosure defined by the appended patent scope. Furthermore, the following detailed description states specific details to facilitate a thorough understanding of this disclosure. However, those with ordinary knowledge in the art, that is, those familiar with the art, will understand that the present disclosure can still be implemented without mentioning the specific details and/or some details of the combination of the various aspects of the specific embodiment. Some examples do not describe in detail known systems, methods, procedures, and components in order to avoid unnecessarily obscuring aspects of the disclosed embodiments.

本揭露的實施例中,出現在不同圖式的相同、均等或類似元件或者相對應的材質係採用相同的元件標號或符號。In the embodiments of the present disclosure, the same, equal or similar elements or corresponding materials appearing in different drawings adopt the same element numbers or symbols.

“一實施例/例子”、“另一實施例/例子”、“一些實施例/例子”、“一些其他實施例/例子”等等的引用係指所描述的這些實施例/例子可包括一特定特徵、結構、特徵、特性、元件,或限制要件,但非每一實施例/例子需要包括這些特定特徵、結構、特徵、特性、元件或限制要件。再者,“在一實施例/例子”或“在另一實施例/例子”的重覆使用並不需要是指相同的實施例/例子。References to “one embodiment/example”, “another embodiment/example”, “some embodiments/examples”, “some other embodiments/examples”, etc. mean that the described embodiments/examples may include one Specific features, structures, features, characteristics, elements, or limiting elements, but not every embodiment/example needs to include these specific features, structures, features, characteristics, elements, or limiting elements. Furthermore, repeated use of "in one embodiment/example" or "in another embodiment/example" does not necessarily refer to the same embodiment/example.

“包含”、“包括”、“具有”及其等類似用語並不排除除了在 實施例中被列出以外的其他特徵/元件/步驟。在不同實施例中界定的某些特徵/元件/步驟並未指這些特徵/元件/步驟的組合不能使用在一實施例中。"Include", "include", "have" and similar terms do not exclude features/elements/steps other than those listed in the embodiments. Certain features/elements/steps defined in different embodiments do not mean that the combination of these features/elements/steps cannot be used in one embodiment.

如同本文所使用,用語“一個”是指一個或多於一個。除非有特別指明,圖式或文本使用”/ ”代表“及/或”。用語“組”定義為非空但有限的元件集合,根據已知數學上定義,其在數學上表示至少一的基數(例如在此一組的定義係對應一個單元、一個單態,或一個單一元件組,或一個若干元件組。在此一特定數值或一數值範圍的界定被理解成包括近似數值或近似數值範圍。 “第一”、“第二”等等的使用僅做為標示用,並非意圖對其等關聯的用語加入數字要求。As used herein, the term "a" refers to one or more than one. Unless otherwise specified, the use of "/" in diagrams or text represents "and/or". The term "group" is defined as a non-empty but finite set of elements. According to known mathematical definitions, it mathematically represents at least one cardinal number (for example, the definition of a group corresponds to a unit, a single state, or a single An element group, or a group of several elements. The definition of a specific value or a value range here is understood to include an approximate value or an approximate value range. The use of "first", "second", etc. is only for labeling purposes. It is not intended to add digital requirements to related terms.

請參照第一圖,在本揭露的代表性或例示的實施例中,一系統20用以測量一物體30的表面輪廓。該系統20包括一光源組件100、一共焦顯微鏡組件200及一光學偵測組件300。該系統20進一步包含一平台,係在該測量期間支撐該物體30。該平台可被配置成可以位移,藉以例如平移該物體30以測量該表面輪廓的不同區域或者整個區域 。Please refer to the first figure. In a representative or exemplary embodiment of the present disclosure, a system 20 is used to measure the surface profile of an object 30. The system 20 includes a light source assembly 100, a confocal microscope assembly 200, and an optical detection assembly 300. The system 20 further includes a platform for supporting the object 30 during the measurement. The platform can be configured to be displaceable, whereby, for example, the object 30 can be translated to measure different areas or the entire area of the surface profile.

該光源組件100包括一寬頻光源110,係配置以發射一寬譜帶連續波長範圍的寬頻均勻光線。例如,該寬頻均勻光是涵蓋可見光彩色光譜波長並可包括紅外線及/或紫外光譜波長的白光。The light source assembly 100 includes a broadband light source 110 configured to emit a broadband uniform light with a continuous wavelength range of a broad band. For example, the broadband uniform light is white light that covers the wavelength of the visible color spectrum and may include the wavelength of the infrared and/or ultraviolet spectrum.

該共焦顯微鏡組件200包括一組入射光學元件230,例如透鏡及/或 鏡面,用以導引該均勻光從該針孔裝置220至該物體30並且通過該等入射光學元件230造成色差(chromatic  aberration)。此外,該針孔裝置220被配置使來自該物體30的反射光通過該等針孔222至該分束器210,所述反射光包含基於所述色差的該表面輪廓的光譜資訊。更明確而言,該等針孔222被設置成只允許聚焦於該物體30且從該物體30反射的光線通過該分束器210。該針孔裝置220阻擋未聚焦於該物體30的所有反射光線,以使這些反射光線不會進入該等針孔222。The confocal microscope assembly 200 includes a set of incident optical elements 230, such as lenses and/or mirrors, for guiding the uniform light from the pinhole device 220 to the object 30 and causing chromatic aberration through the incident optical elements 230. aberration). In addition, the pinhole device 220 is configured to cause the reflected light from the object 30 to pass through the pinholes 222 to the beam splitter 210, and the reflected light includes the spectral information of the surface profile based on the color difference. More specifically, the pinholes 222 are configured to only allow light focused on the object 30 and reflected from the object 30 to pass through the beam splitter 210. The pinhole device 220 blocks all reflected light that is not focused on the object 30 so that the reflected light does not enter the pinholes 222.

該光學偵測組件300包括一光學偵測器310,係接收來自該分束器220的所述反射光。該光學偵測組件300包括一組偵測光學元件320,係導引來自該分束器210的所述反射光至該光學偵測器310。根據該光學偵測器310接收的所述反射光的光譜資訊測量該物體30的表面輪廓,該光譜資訊代表橫跨該表面輪廓的高度。例如,該光譜資訊包括聚焦於該物體30且反射至該等針孔222的所述反射光波長的有關資訊,其中波長可以用來決定橫跨該表面輪廓的高度變化。The optical detection component 300 includes an optical detector 310 for receiving the reflected light from the beam splitter 220. The optical detection assembly 300 includes a set of detection optical elements 320 which guide the reflected light from the beam splitter 210 to the optical detector 310. The surface profile of the object 30 is measured according to the spectral information of the reflected light received by the optical detector 310, and the spectral information represents the height across the surface profile. For example, the spectral information includes information about the wavelength of the reflected light focused on the object 30 and reflected to the pinholes 222, where the wavelength can be used to determine the height change across the surface profile.

在本揭露的各種實施例中,第二圖顯示一種測量該物體30的表面輪廓的方法400,其中該方法400係透過該系統20來執行。該方法400包括步驟402,係透過該分束器210將來自該寬頻光源110的均勻光導引至該物體30。該方法400包括步驟404,係讓來自該分束器210的所述均勻光通過該針孔裝置220的該等針孔222的陣列至該物體30。該方法400包括步驟406,係透過該組入射光學元件230導引來自該針孔裝置220的所述均勻光至該物體30,並且當所述均勻光通過該等入射光學元件230時產生色差(chromatic aberration)。該方法400包括步驟408,讓該物體30的反射光通過該等針孔222的陣列至該分束器210,所述反射光包含基於所述色差的該表面輪廓的光譜資訊。該方法400包括步驟410,透過該組偵測光學元件320導引來自該分束器210的所述反射光至該光學偵測器310。該方法400包括步驟412,透過該光學偵測器310接收自該分束器210的所述反射光。該方法400包括步驟414,根據該光學偵測器310接收的所述反射光的光譜資訊測量該物體30的該表面輪廓,該光譜資訊代表橫跨該表面輪廓的高度。In various embodiments of the present disclosure, the second figure shows a method 400 for measuring the surface profile of the object 30, wherein the method 400 is executed through the system 20. The method 400 includes step 402 of guiding the uniform light from the broadband light source 110 to the object 30 through the beam splitter 210. The method 400 includes a step 404 of allowing the uniform light from the beam splitter 210 to pass through the array of pinholes 222 of the pinhole device 220 to the object 30. The method 400 includes the step 406 of guiding the uniform light from the pinhole device 220 to the object 30 through the set of incident optical elements 230, and generating chromatic aberration when the uniform light passes through the incident optical elements 230 ( chromatic aberration). The method 400 includes step 408, allowing the reflected light of the object 30 to pass through the array of pinholes 222 to the beam splitter 210, the reflected light including the spectral information of the surface profile based on the color difference. The method 400 includes step 410 of guiding the reflected light from the beam splitter 210 to the optical detector 310 through the group of detecting optical elements 320. The method 400 includes step 412 of transmitting the reflected light received from the beam splitter 210 through the optical detector 310. The method 400 includes step 414 of measuring the surface profile of the object 30 according to the spectral information of the reflected light received by the optical detector 310, the spectral information representing the height across the surface profile.

如上述,該等入射光學元件230引起自該針孔裝置220傳播至該物體30的所述均勻光的色差,並且來自該物體30的所述反射光包含基於所述色差的光譜資訊,例如波長。更明確而言,該組入射光學元件230引起光線的軸向或縱向色差,導致來自該等入射光學元件230的不同波長的光線沿著不同焦距距離聚焦至該物體30。由於色差,這些不同波長的光線會聚焦於該物體30相對於沿著該表面輪廓的一參考平面橫跨該表面輪廓的不同高度或深度的位置。例如,紅光(具有大約620nm至720nm的波長)聚焦於一較低高度,藍光(具有大約460nm至500nm的波長)聚焦於一較高高度,及綠光(具有大約500nm至570nm的波長)聚焦在兩者之間的一中間高度,其中這些高度是相對於該參考平面而言。As mentioned above, the incident optical elements 230 cause the chromatic aberration of the uniform light propagating from the pinhole device 220 to the object 30, and the reflected light from the object 30 contains spectral information based on the chromatic aberration, such as wavelength . More specifically, the group of incident optical elements 230 causes axial or longitudinal chromatic aberration of the light, which causes the light of different wavelengths from the incident optical elements 230 to be focused to the object 30 along different focal distances. Due to the chromatic aberration, the rays of different wavelengths will be focused on the position of the object 30 at different heights or depths across the surface contour with respect to a reference plane along the surface contour. For example, red light (having a wavelength of approximately 620nm to 720nm) is focused at a lower height, blue light (having a wavelength of approximately 460nm to 500nm) is focused at a higher altitude, and green light (having a wavelength of approximately 500nm to 570nm) is focused An intermediate height between the two, where these heights are relative to the reference plane.

清楚聚焦於該物體30的該表面輪廓的波長自該物體30反射,而所述反射光反過來成為入射光沿著相同傳播途徑抵達該表面輪廓並聚焦於該表面輪廓。聚焦於該物體30的所述反射光的這些波長通過該針孔裝置220至該分束器210,而未聚焦於該物體30的反射光的波長可能被反射回來但不會對齊該等針孔222,且無法通過該等針孔222。換句話說,該針孔裝置220會將未聚焦於該物體30的所有反射光擋住。因此僅有自該物體30反射的所述反射光波長通過該等針孔222至該分束器210。所述反射光接著成像於該針孔裝置210的一共軛面(conjugate plane)並且被該光學偵測器310接收。只有聚焦於橫跨該表面輪廓不同高度的所述反射光的波長自該物體30反射且被該光學偵測器310接收,這些波長代表該等高度,且根據這些波長可以三維量測該表面輪廓。該表面輪廓的彩色光譜影像可精準的測量出橫跨該表面輪廓的三維高度輪廓,而無需垂直掃描或移動該系統20的任何部件。The wavelength clearly focused on the surface profile of the object 30 is reflected from the object 30, and the reflected light in turn becomes incident light that reaches the surface profile along the same propagation path and focuses on the surface profile. The wavelengths of the reflected light focused on the object 30 pass through the pinhole device 220 to the beam splitter 210, while the wavelengths of the reflected light not focused on the object 30 may be reflected back but will not be aligned with the pinholes 222, and cannot pass through the pinholes 222. In other words, the pinhole device 220 will block all the reflected light that is not focused on the object 30. Therefore, only the wavelength of the reflected light reflected from the object 30 passes through the pinholes 222 to the beam splitter 210. The reflected light is then imaged on a conjugate plane of the pinhole device 210 and is received by the optical detector 310. Only the wavelengths of the reflected light focused on different heights across the surface profile are reflected from the object 30 and received by the optical detector 310. These wavelengths represent the heights, and the surface profile can be measured in three dimensions based on these wavelengths . The color spectrum image of the surface profile can accurately measure the three-dimensional height profile across the surface profile without vertically scanning or moving any parts of the system 20.

由於該針孔裝置220擋住入射於該針孔裝置220表面的大部份光線,即該等針孔222的周圍面積,該針孔裝置220可包括適當的光學元件,以最小化或防止光線反射。例如,入射於該針孔裝置220頂部表面的光線可被反射回來至該分束器210並與來自該物體30的所述反射光融合,潛在地影響該表面輪廓測量的精準度。這些光學元件可以促進光線聚焦進入該等針孔222,進而提高光譜成像與該表面輪廓的測量。Since the pinhole device 220 blocks most of the light incident on the surface of the pinhole device 220, that is, the surrounding area of the pinholes 222, the pinhole device 220 may include appropriate optical elements to minimize or prevent light reflection . For example, light incident on the top surface of the pinhole device 220 can be reflected back to the beam splitter 210 and merged with the reflected light from the object 30, potentially affecting the accuracy of the surface profile measurement. These optical elements can promote the focusing of light into the pinholes 222, thereby improving the spectral imaging and the measurement of the surface profile.

如第三圖所示,該針孔裝置220可包括一或多個陣列的微透鏡224,搭配該等針孔222的陣列。例如,該針孔裝置220包括設置在該等針孔222頂部的第一陣列的微透鏡224,以使得每一針孔222配搭該第一陣列的一該微透鏡224,而第一陣列的該等微透鏡224係配置以將來自該分束器220的光線聚焦進入個別的該等針孔222。該針孔裝置220可選擇性包含設置於該等針孔222下方的第二陣列的微透鏡224,以使得每一該針孔222配搭第二陣列的一該微透鏡224,而第二陣列的該等微透鏡224係配置以將來自該物體30的反射光聚焦進入個別的該等針孔222。該等針孔222及微透鏡224的陣列可以分開形成並結合在一起,或者它們可以整合在一起成為一個單元。As shown in the third figure, the pinhole device 220 may include one or more arrays of microlenses 224 to match the array of pinholes 222. For example, the pinhole device 220 includes a first array of microlenses 224 arranged on top of the pinholes 222, so that each pinhole 222 matches a microlens 224 of the first array, and the first array of microlenses 224 The iso-microlens 224 is configured to focus the light from the beam splitter 220 into the individual pinholes 222. The pinhole device 220 can optionally include a second array of microlenses 224 disposed under the pinholes 222, so that each of the pinholes 222 matches a second array of microlenses 224, and the second array of microlenses 224 The microlenses 224 are configured to focus the reflected light from the object 30 into the individual pinholes 222. The arrays of pinholes 222 and microlenses 224 can be formed separately and combined together, or they can be integrated together into a unit.

每一該針孔222係與至少一該微透鏡224配對,且它們協同將光線聚焦進入個別的該等針孔222的中心。該等微透鏡224係特定地搭配該等針孔222,以使得它們的中心焦點對齊,進而將人射在該等微透鏡224的光線聚焦進入該等針孔222。如此一來,較多的光能被匯集在該針孔裝置220的一邊或兩邊,並且增加導引進入每一該針孔222的光量,進而提高光效率,因為傳統共焦顯微鏡的光效率非常低。該等微透鏡224的彎曲表面可排開及移除入射在它們表面而不需要的光線,進而提高通過該等針孔222的光線品質。Each of the pinholes 222 is paired with at least one of the microlenses 224, and they cooperate to focus the light into the center of the individual pinholes 222. The microlenses 224 are specifically matched with the pinholes 222 to align their center focal points, so as to focus the light irradiated by a person on the microlenses 224 into the pinholes 222. In this way, more light energy is collected on one or both sides of the pinhole device 220, and the amount of light guided into each pinhole 222 is increased, thereby improving the light efficiency, because the light efficiency of the traditional confocal microscope is very high. Low. The curved surfaces of the microlenses 224 can disperse and remove unnecessary light incident on their surfaces, thereby improving the quality of light passing through the pinholes 222.

如第三圖所示,該等微透鏡224裝置在一起,以使得它們彼此接觸,或者彼此之間存在一些間隙。由於該等針孔222的直徑小於該等微透鏡224的直徑,該等針孔222之間會存在間隙。如第四圖所示,以兩個垂直方向上的間距P1、 P2代表這些間隙,例如分別沿著X軸與Y軸。藉由將該等針孔222投射到該物體30,該等針孔222對應到該物體30的該表面輪廓的複數個獨立點,且該等針孔222之間的間隙或間距P1及P2對應到該等獨立點之間的間隔。As shown in the third figure, the microlenses 224 are arranged together so that they are in contact with each other or there are some gaps between them. Since the diameter of the pinholes 222 is smaller than the diameter of the microlenses 224, there will be gaps between the pinholes 222. As shown in the fourth figure, these gaps are represented by the pitches P1 and P2 in two vertical directions, for example, along the X axis and the Y axis, respectively. By projecting the pinholes 222 onto the object 30, the pinholes 222 correspond to a plurality of independent points of the surface contour of the object 30, and the gaps or spacings P1 and P2 between the pinholes 222 correspond to The interval between these independent points.

該等針孔222的一項優點是可同時測量該表面輪廓的該等獨立點的高度。該等獨立點分配在至少一個取樣面積,或者在一些例子中,分配在該表面輪廓的大致上整個面積,以使該系統20可以執行該取樣面積的快速取樣測量。須注意的是,該等獨立點的數目視該等針孔222的數目而定,以致於較大數目的 該等針孔222可以增加欲被測量的取樣面積及/或提高測量解析度。該取樣面積的該等獨立點的高速取樣測量有利於各種實際應用,尤其是應用在需要快速檢視一批次該物體30的情況。One advantage of the pinholes 222 is that the heights of the independent points of the surface profile can be measured at the same time. The independent points are allocated to at least one sampling area, or in some examples, to substantially the entire area of the surface profile, so that the system 20 can perform rapid sampling measurement of the sampling area. It should be noted that the number of the independent points depends on the number of the pinholes 222, so that a larger number of the pinholes 222 can increase the sampling area to be measured and/or improve the measurement resolution. The high-speed sampling measurement of the independent points of the sampling area is beneficial to various practical applications, especially when it is necessary to quickly inspect a batch of the objects 30.

由於在取樣測量期間該針孔裝置220保持靜止不動,該等獨立點之間的間隙不會被成像並測量。為解決此一情形,在一些實施例中,該共焦顯微鏡組件200可包括一驅動機構240,用以平面地移動該針孔裝置220。如第五圖所示,該驅動機構240可配置成沿著X軸及/或Y軸平面地移動該針孔裝置220。或者,該 驅動機構240可被配置成繞著Z軸平面地轉動該針孔裝置220,以使該針孔裝置220在轉動期間保持在XY平面上。例如,該驅動機構240包括比如馬達及壓電驅動器等驅動器。Since the pinhole device 220 remains stationary during sampling and measurement, the gap between the independent points will not be imaged and measured. To solve this situation, in some embodiments, the confocal microscope assembly 200 may include a driving mechanism 240 for moving the pinhole device 220 planarly. As shown in FIG. 5, the driving mechanism 240 can be configured to move the pinhole device 220 along the X-axis and/or Y-axis plane. Alternatively, the driving mechanism 240 may be configured to rotate the pinhole device 220 planarly around the Z axis, so that the pinhole device 220 is maintained on the XY plane during the rotation. For example, the driving mechanism 240 includes drivers such as motors and piezoelectric drivers.

當該針孔裝置220沿著此XY平面平面地移動時,該等針孔222及該表面輪廓上的對應點會橫跨該表面輪廓而移動,使得光線能夠抵達及掃描一連續表面面積與大致上整個該表面輪廓。大致上該表面輪廓的所有面積可以無縫地掃描與測量,進而可以消弭該表面輪廓被關注的區域被排除的風險。因此該表面輪廓更詳細的測量可以被取得,以致對該物體30提供較高品質的檢視。When the pinhole device 220 moves along the XY plane, the pinholes 222 and the corresponding points on the surface contour will move across the surface contour, so that light can reach and scan a continuous surface area and approximately Draw the contour of the entire surface. Roughly all areas of the surface contour can be scanned and measured seamlessly, thereby eliminating the risk of the area of interest of the surface contour being excluded. Therefore, a more detailed measurement of the surface profile can be obtained, so that a higher quality inspection of the object 30 is provided.

在第一圖所示的實施例中,該系統20包括如上文所述的該光源組件100、該共焦顯微鏡組件200及該光學偵測組件300。該光源組件100包括該寬頻光源110,係被配置以發射寬頻均勻光線,例如白光。如第六圖所示,該寬頻光源110包括一組燈光112。該燈光112可以是白熾燈或寬頻白光發光二極體。例如,該白熾燈是鹵素燈,比如鎢絲鹵素燈。該燈光112可以是低功率,例如50 瓦, 以  減少使用該系統20產生的被浪費掉的熱。低功率的燈光112可以消除冷卻設備所需要的風扇,進而可降低機械振動與功率消耗。然而,該光源組件 100可包括一小型散熱槽,以移除該寬頻光源110產生的任何熱量。In the embodiment shown in the first figure, the system 20 includes the light source assembly 100, the confocal microscope assembly 200, and the optical detection assembly 300 as described above. The light source assembly 100 includes the broadband light source 110, which is configured to emit broadband uniform light, such as white light. As shown in FIG. 6, the broadband light source 110 includes a group of lights 112. The lamp 112 may be an incandescent lamp or a broadband white light emitting diode. For example, the incandescent lamp is a halogen lamp, such as a tungsten halogen lamp. The light 112 may be of low power, such as 50 watts, to reduce wasted heat generated by using the system 20. The low-power light 112 can eliminate the fan required for cooling equipment, thereby reducing mechanical vibration and power consumption. However, the light source assembly 100 may include a small heat sink to remove any heat generated by the broadband light source 110.

該寬頻光源110包括一光學光圈114,用以導引發射自該燈光112 的所述均勻光離開該寬頻光源110。該光學光圈114可以是圓形且配置以控制從該寬頻光源110發射出來至該共焦顯微鏡組件200的光束直徑。該寬頻光源110可包括一光學積分球(optical integrating shperer)116,係配置以整合來自該等燈光112的光能。該光學積分球116,已知為烏布里希球(Ulbricht sphere),是一種具有空心球穴與內部反射塗層的光學部件,該內部反射塗層用以均勻地散射光線並減少光線損失。如第六圖所示,該等燈光112係配置在該光學積分球116的周圍,以使得來自該等燈光112的光線被導引進入該空心球穴且朝向該光學積分球116的該內部反射塗層,以使得該內部反射塗層反射該等光線至該光學光圈114。The broadband light source 110 includes an optical aperture 114 for guiding the uniform light emitted from the lamp 112 to leave the broadband light source 110. The optical aperture 114 may be circular and configured to control the diameter of the beam emitted from the broadband light source 110 to the confocal microscope assembly 200. The broadband light source 110 may include an optical integrating shperer 116 configured to integrate light energy from the lights 112. The optical integrating sphere 116, known as the Ulbricht sphere, is an optical component with hollow spheres and an internal reflective coating for uniformly scattering light and reducing light loss. As shown in Figure 6, the lights 112 are arranged around the optical integrating sphere 116, so that the light from the lights 112 is guided into the hollow sphere and reflected toward the interior of the optical integrating sphere 116 Coating so that the internal reflective coating reflects the lights to the optical aperture 114.

該寬頻光源110可包括一光學帶通濾波器(optical bandpass filter),係配置以濾掉預定波長範圍以外的光線。該光學帶通濾波器設置在該等燈光112與該光學積分球116之間,比如在該光學光圈114。例如, 該光學帶通濾波器包括一二向色濾光片(dichroic  filter)或一介質鏡面。該預定波長範圍可以對應至該可見光彩色光譜,或者紅光至藍光的區域,且該光學帶通濾波器允許所有可見光通過並離開該光學光圈114。該可見光彩色光譜以外不需的光線,比如紅外光及紫外光,係被該光學帶通濾波器擋掉。須注意的是,紅外光比可見光熱,透過擋掉紅外光, 會有較少的熱從該光學光圈114傳遞出來,進而可消弭對該共焦顯微鏡組件200的熱毀損。The broadband light source 110 may include an optical bandpass filter, which is configured to filter out light outside a predetermined wavelength range. The optical band pass filter is disposed between the lights 112 and the optical integrating sphere 116, such as the optical aperture 114. For example, the optical bandpass filter includes a dichroic filter or a dielectric mirror. The predetermined wavelength range may correspond to the visible light color spectrum, or the region from red light to blue light, and the optical band pass filter allows all visible light to pass through and leave the optical aperture 114. The unnecessary light outside the visible color spectrum, such as infrared light and ultraviolet light, is blocked by the optical band pass filter. It should be noted that infrared light is hotter than visible light. By blocking the infrared light, less heat will be transferred from the optical aperture 114, thereby eliminating thermal damage to the confocal microscope assembly 200.

來自該寬頻光源110的所述均勻光可傳播通過該光學光圈114而直接至該共焦顯微鏡組件200。或者,該光源組件 110可包括具有一或多個透鏡設置在該寬頻光源110與該共焦顯微鏡組件200之間的科勒照明系統(Köhler illumination device)120。該科勒照明系統120提供平行且均勻的光線至該共焦顯微鏡組件200。The uniform light from the broadband light source 110 can propagate through the optical aperture 114 and directly to the confocal microscope assembly 200. Alternatively, the light source assembly 110 may include a Köhler illumination device 120 having one or more lenses disposed between the broadband light source 110 and the confocal microscope assembly 200. The Kohler illumination system 120 provides parallel and uniform light to the confocal microscope assembly 200.

該共焦顯微鏡組件200包括如上述的該分束器210、該針孔裝置220及該組入射光學元件230。該組入射光學元件230包括一物鏡232,用以將光線聚焦至該物體30,以及一鏡筒透鏡(tube lens)234,用以將來自該物體30的反射光聚焦在該針孔裝置220上。該組入射光學元件230更包含一色差透鏡(chromatic  aberration lens) 236,係設置於該物鏡232與該鏡筒透鏡234之間,以引起光線的色差。該色差透鏡236經設計成具有特定的色差特性與線性度佳。視所要的測量範圍與解析度而定,不同的色差透鏡236可被使用。或者,該色差透鏡236可與該物鏡232整合成為一單一透鏡元件。隨著色差,不同波長的光線更可以被清楚分開,且該表面輪廓的該等不同高度可以清楚區別出來,以致於該表面輪廓可以被三維成像與測量。The confocal microscope assembly 200 includes the beam splitter 210, the pinhole device 220, and the set of incident optical elements 230 as described above. The incident optical element 230 includes an objective lens 232 for focusing light on the object 30, and a tube lens 234 for focusing the reflected light from the object 30 on the pinhole device 220 . The incident optical element 230 further includes a chromatic aberration lens 236, which is disposed between the objective lens 232 and the tube lens 234 to cause chromatic aberration of light. The chromatic aberration lens 236 is designed to have specific chromatic aberration characteristics and good linearity. Depending on the desired measurement range and resolution, different chromatic aberration lenses 236 can be used. Alternatively, the chromatic aberration lens 236 and the objective lens 232 can be integrated into a single lens element. With chromatic aberration, light of different wavelengths can be clearly separated, and the different heights of the surface profile can be clearly distinguished, so that the surface profile can be three-dimensionally imaged and measured.

該光學偵測組件300包括如上述的該光學偵測器310及該組偵測光學元件320。該偵測光學元件320可包括一成像透鏡322,用以導引來自該分束器210的所述反射光至該光學偵測器310。該光學偵測器310可包括一彩色攝像儀312,係具有紅-綠-藍(RGB)色彩的影像感測器,例如CCD 或CMOS影像感測器。該成像透鏡322係配置將含有所述光譜資訊的所述反射光聚焦於該彩色攝像儀312的該等影像感測器,進而讓來自該物體30的該表面輪廓的所述反射光的所述光譜資訊成像於該彩色攝像儀。The optical detecting component 300 includes the optical detector 310 and the set of detecting optical elements 320 as described above. The detecting optical element 320 may include an imaging lens 322 for guiding the reflected light from the beam splitter 210 to the optical detector 310. The optical detector 310 may include a color camera 312, which is an image sensor with red-green-blue (RGB) colors, such as a CCD or CMOS image sensor. The imaging lens 322 is configured to focus the reflected light containing the spectral information on the image sensors of the color camera 312, thereby allowing the reflection of the reflected light from the surface profile of the object 30 The spectral information is imaged on the color camera.

該彩色攝像儀312的工作光譜範圍可涵蓋可見光彩色光譜與可選擇地涵蓋到紅外光譜及/或紫外光譜。例如,該彩色攝像儀312的所述工作光譜範圍可大約是380nm至1000nm。該彩色攝像儀312可加入一紅外線濾波器,以排除紅外線及/或近紅外線。如上所述,根據所述反射光的精確光譜資訊及波長, 橫跨該表面輪廓的不同高度或深度係以不同色彩成像,且該表面輪廓被擷取的光譜影像可精準地測量出該三維表面輪廓,其中橫跨該表面輪廓的不同高度係以光譜影像中的不同光譜色彩代表。第七圖顯示一RGB光譜影像40的例子,係包括該彩色攝像儀312所擷取該物體30經校正的RGB曲線。該系統20可以與一影像處理模組整合或耦合,以根據該光譜影像40產生該物體30的表面輪廓。更明確而言,該影像處理模組根據該光學偵測器310接收的該光譜影像40計算該物體30的該表面輪廓,其中每一點(對應該等針孔222)的色彩或波長代表該表面輪廓的該點的高度。所有點集合起來代表橫跨該整個表面輪廓的高度變化。The working spectral range of the color camera 312 can cover the visible color spectrum and optionally the infrared spectrum and/or the ultraviolet spectrum. For example, the working spectral range of the color camera 312 may be approximately 380 nm to 1000 nm. An infrared filter can be added to the color camera 312 to exclude infrared and/or near infrared. As described above, according to the accurate spectral information and wavelength of the reflected light, different heights or depths across the surface profile are imaged in different colors, and the spectral image captured by the surface profile can accurately measure the three-dimensional surface Contour, where the different heights across the surface contour are represented by different spectral colors in the spectral image. The seventh figure shows an example of an RGB spectral image 40, which includes the corrected RGB curve of the object 30 captured by the color camera 312. The system 20 can be integrated or coupled with an image processing module to generate the surface profile of the object 30 according to the spectral image 40. More specifically, the image processing module calculates the surface profile of the object 30 based on the spectral image 40 received by the optical detector 310, where the color or wavelength of each point (corresponding to the pinholes 222) represents the surface The height of the contour at that point. The collection of all points represents the height change across the entire surface profile.

在一實施例中,該光源組件100、該共焦顯微鏡組件200,及該光學偵測組件300係設置如第一圖所示。當該系統20使用時,來自該光源組件100的均勻光通過該分束器210至該物體30,從該物體30反射回到該分束器210,且該分束器210將光線反射至該光學偵測組件300。 由於該分束器210被配置以穿透及反射光線(較佳是等比例),該系統20可以有其他配置架構。如第八圖所示的實施例,當該系統20使用時,自該光源組件100的光線抵達該分束器210,反射至該物體30,從該物體30反射回到該分束器210,並且通過該分束器210至該光學偵測組件300。In one embodiment, the light source assembly 100, the confocal microscope assembly 200, and the optical detection assembly 300 are arranged as shown in the first figure. When the system 20 is used, the uniform light from the light source assembly 100 passes through the beam splitter 210 to the object 30, reflects from the object 30 back to the beam splitter 210, and the beam splitter 210 reflects the light to the object 30. Optical detection component 300. Since the beam splitter 210 is configured to transmit and reflect light (preferably in equal proportions), the system 20 can have other configurations. As in the embodiment shown in Figure 8, when the system 20 is used, the light from the light source assembly 100 reaches the beam splitter 210, is reflected to the object 30, and is reflected from the object 30 back to the beam splitter 210, And it passes through the beam splitter 210 to the optical detection assembly 300.

總括而言,第一圖及第八圖所示的實施例中,該系統20包括該光源組件100、該共焦顯微鏡組件200,及該光學偵測組件300, 係配置以測量該物體30的該表面輪廓。該光源組件100包括該寬頻光源110及科勒照明裝置120。該共焦顯微鏡組件200包括該分束器210及具有該等針孔222陣列的該針孔裝置220以及搭配該等針孔222陣列的一或多個陣列的微透鏡224。該共焦顯微鏡組件 200更包含該組入射光學元件230及用以沿著X軸與Y軸平面地移動該針孔裝置220的該驅動機構240。該等入射光學元件230包括該物鏡232、鏡筒透鏡234,及該色差透鏡236。該光學偵測組件300包括具有該彩色攝像儀的該光學偵測器310,及更包括具有將所述反射光聚焦於該彩色攝像儀312的成像透鏡322的該組偵測光學元件320。In summary, in the embodiments shown in Figures 1 and 8, the system 20 includes the light source assembly 100, the confocal microscope assembly 200, and the optical detection assembly 300, which are configured to measure the object 30 The surface profile. The light source assembly 100 includes the broadband light source 110 and the Kohler lighting device 120. The confocal microscope assembly 200 includes the beam splitter 210 and the pinhole device 220 with the pinhole 222 arrays, and the microlenses 224 with one or more arrays of the pinhole 222 arrays. The confocal microscope assembly 200 further includes the group of incident optical elements 230 and the driving mechanism 240 for moving the pinhole device 220 along the X-axis and Y-axis in a plane. The incident optical elements 230 include the objective lens 232, the tube lens 234, and the chromatic aberration lens 236. The optical detection component 300 includes the optical detector 310 with the color camera, and further includes the group of detection optical elements 320 with the imaging lens 322 that focuses the reflected light on the color camera 312.

在第九圖所示的實施例中,該系統20除了該光學偵測組件300外係大致上相似於第一圖的實施例。上文對於第一圖的實施例的各方面描述可同樣或類似地應用在第九圖的實施例,反之亦然。該光學偵測器310包括一超光譜攝像儀(hyperspectral camera) 314,且該光學偵測組件300可以當做一單次拍攝超光譜成像組件(one-shot hyperspectral imaging assembly)302。該超光譜攝像儀314可更精細地擷取所述反射光的所述光譜資訊並且獲得該表面輪廓的該超光譜資訊。再者,該超光譜攝像儀314是一單拍超光譜攝像儀(one shot or single shot hyperspectral camera),係擷取僅一個影像,以獲得該表面輪廓的該超光譜資訊。該超光譜攝像儀314可擷取全彩或單色的所述超光譜資訊。例如,該超光譜攝像儀314是一高解析全彩或單色攝像儀。In the embodiment shown in FIG. 9, the system 20 is substantially similar to the embodiment in FIG. 1 except for the optical detection component 300. The above description of the various aspects of the embodiment in the first figure can be equally or similarly applied to the embodiment in the ninth figure, and vice versa. The optical detector 310 includes a hyperspectral camera 314, and the optical detection assembly 300 can be used as a one-shot hyperspectral imaging assembly 302. The hyperspectral camera 314 can more finely capture the spectral information of the reflected light and obtain the hyperspectral information of the surface profile. Furthermore, the hyperspectral camera 314 is a one shot or single shot hyperspectral camera, which captures only one image to obtain the hyperspectral information of the surface profile. The hyperspectral camera 314 can capture the hyperspectral information in full color or monochrome. For example, the hyperspectral camera 314 is a high-resolution full-color or monochromatic camera.

正規光譜成像或多重光譜成像(normal spectral imaging or multispectral imaging)通常以對應RGB色彩的三個寬譜帶波長擷取及處理影像,這是由於人眼看得見大部份在這三個寬譜帶的可見光的色彩。超光譜成像可以擷取與處理紅外光譜至紫外光譜或甚至包括X-射線光譜的電磁波光譜的影像。相較於一般的RGB譜帶,超光譜成像將所述電磁波分成更多譜帶,並且涵蓋具有精細波長解析度的寬波長範圍。正規光譜成像測量隔開的RGB光譜譜帶,但相反地,超光譜成像測量多個連續光譜譜帶。該超光譜攝像儀314可以在非常大量的精細波長中擷取與處理該物體30的影像,並且該超光譜資訊可以分裂成對應這些精細波長的非常大量的色彩。Normal spectral imaging or multispectral imaging (normal spectral imaging or multispectral imaging) usually captures and processes images with three broad band wavelengths corresponding to RGB colors. This is because the human eye can see most of them in these three broad bands. The colors of visible light. Hyperspectral imaging can capture and process images from infrared spectrum to ultraviolet spectrum or even electromagnetic spectrum including X-ray spectrum. Compared with general RGB bands, hyperspectral imaging divides the electromagnetic waves into more bands and covers a wide wavelength range with fine wavelength resolution. Regular spectral imaging measures separated RGB spectral bands, but conversely, hyperspectral imaging measures multiple continuous spectral bands. The hyperspectral camera 314 can capture and process images of the object 30 in a very large number of fine wavelengths, and the hyperspectral information can be split into a very large number of colors corresponding to these fine wavelengths.

該單拍超光譜成像組件302包括一光圈裝置330,來自該分束器210的所述反射光通過該光圈裝置330至該超光譜攝像儀314。該光圈裝置330包括至少一光圈或一孔洞, 俾讓光線通過。該單拍超光譜成像組件302包括一波長分開裝置(wavelength differentiation device)340,係設置在該光圈裝置330與該超光譜攝像儀314之間,用以分開所述反射光,以致於透過所述光譜資訊例如波長更清楚的區別所述反射光。該波長分開裝置340可以是繞射所述反射光的一個光柵或散射所述反射光的一個光學稜鏡。The single-shot hyperspectral imaging component 302 includes an aperture device 330, and the reflected light from the beam splitter 210 passes through the aperture device 330 to the hyperspectral camera 314. The aperture device 330 includes at least one aperture or a hole to allow light to pass through. The single-shot hyperspectral imaging component 302 includes a wavelength differentiation device 340, which is disposed between the aperture device 330 and the hyperspectral camera 314 to separate the reflected light so as to pass through the Spectral information such as wavelength distinguishes the reflected light more clearly. The wavelength division device 340 may be a grating that diffracts the reflected light or an optical beam that scatters the reflected light.

在如第九圖所示的該單拍超光譜成像組件300中,該組偵測光學元件320包括該成像透鏡322,係設置於該超光譜攝像儀314前方且於該光柵340後方。該成像透鏡322係配置以將來自該光柵340的所述反射光聚焦於該超光譜攝像儀314的影像感測器,俾使來自該物體30的該表面輪廓的所述反射光的光譜資訊成像於該超光譜攝像儀314。該偵測光學元件320更包含一準直器(collimator)324,設置於該光圈裝置330與該光柵340之間。該準直器324是一裝置,比如是一曲面透鏡或鏡面,係可窄化光束並將其對齊至一特定方向。須注意的是,該準直器324將來自該光圈裝置330的所述反射光對準於該光柵340,而該光柵340係更清楚地將光線區分成它的波長連續光譜。該偵測光學元件320可更包含一中繼透鏡326,係設置於該分束器210與該光圈裝置330之間。該中繼透鏡326係配置以將形成在 該針孔裝置220的該表面輪廓影像經由該分束器210投影在該光圈裝置330上。In the single-shot hyperspectral imaging component 300 as shown in FIG. 9, the group of detecting optical elements 320 includes the imaging lens 322, which is disposed in front of the hyperspectral camera 314 and behind the grating 340. The imaging lens 322 is configured to focus the reflected light from the grating 340 on the image sensor of the hyperspectral camera 314, so as to image the spectral information of the reflected light from the surface profile of the object 30 In the hyperspectral camera 314. The detecting optical element 320 further includes a collimator 324 disposed between the aperture device 330 and the grating 340. The collimator 324 is a device, such as a curved lens or a mirror, which narrows the beam and aligns it to a specific direction. It should be noted that the collimator 324 aligns the reflected light from the aperture device 330 to the grating 340, and the grating 340 more clearly distinguishes light into its continuous spectrum of wavelengths. The detecting optical element 320 may further include a relay lens 326 disposed between the beam splitter 210 and the aperture device 330. The relay lens 326 is configured to project the surface profile image formed on the pinhole device 220 on the aperture device 330 via the beam splitter 210.

根據所述反射光的所述光譜資訊,成像透鏡322將所述反射光的被繞射波長以分離的波長投影在該超光譜攝像儀314 。由於該等微透鏡224增加導引至該等針孔222的光線量的效應,影像敏感度提高且該物體30的該表面輪廓的每一點的全面光譜係由該超光譜攝像儀314成像。第十圖例示該單拍超光譜成像組件302所擷取的該物體30的超光譜影像50。該系統20可以與一影像處理模組整合或耦合,俾根據該超光譜影像50產生該物體30的該表面輪廓。由於是3D表面輪廓的全面超光譜,故除了該表面輪廓外,該物體30表面的次表面輪廓及多層厚度可以被精細的測量與檢視。超光譜成像因此可以高解析度詳細地測量該表面輪廓的全面性光譜,並且該系統20在各種領域可以有廣泛的應用且不受限於線上檢視與半導體工業、電子工業、精密工程、光學、生醫農業,及食品工業。According to the spectral information of the reflected light, the imaging lens 322 projects the diffracted wavelength of the reflected light on the hyperspectral camera 314 at separated wavelengths. Due to the effect of the microlenses 224 increasing the amount of light guided to the pinholes 222, the image sensitivity is improved and the full spectrum of each point of the surface contour of the object 30 is imaged by the hyperspectral camera 314. The tenth figure illustrates the hyperspectral image 50 of the object 30 captured by the single-shot hyperspectral imaging component 302. The system 20 can be integrated or coupled with an image processing module to generate the surface profile of the object 30 according to the hyperspectral image 50. Since it is a full-scale hyperspectrum of the 3D surface profile, in addition to the surface profile, the sub-surface profile and multilayer thickness of the surface of the object 30 can be measured and inspected finely. Hyperspectral imaging can therefore measure the comprehensive spectrum of the surface profile in high resolution and detail, and the system 20 can have a wide range of applications in various fields and is not limited to online inspection and semiconductor industry, electronics industry, precision engineering, optics, Biomedical agriculture, and food industry.

在第九圖所示的實施例中,該光圈裝置330包括相似於該針孔裝置220的該等針孔222的針孔332的陣列。該光圈裝置330可進一步包含搭配該等針孔332陣列的一個陣列的微透鏡334。具體而言,該光圈裝置330包括設置在該等針孔332前方的該陣列的微透鏡334,即在該分束器210與該等針孔332之間,比如每一該針孔332配搭一該微透鏡334。該等針孔332陣列與該等微透鏡334陣列可以分開形成並耦合在一起,或者它們可以整合成為一個單元。每一該針孔332與一該微透鏡334配對,並且它們協同將光線聚焦於個別的該等針孔332的中心。In the embodiment shown in FIG. 9, the aperture device 330 includes an array of pinholes 332 similar to the pinholes 222 of the pinhole device 220. The aperture device 330 may further include an array of microlenses 334 with an array of the pinholes 332. Specifically, the aperture device 330 includes the array of microlenses 334 arranged in front of the pinholes 332, that is, between the beam splitter 210 and the pinholes 332, for example, each pinhole 332 is matched with one The micro lens 334. The pinhole 332 array and the microlens 334 array can be formed separately and coupled together, or they can be integrated into a unit. Each of the pinholes 332 is paired with a microlens 334, and they cooperate to focus the light on the center of the individual pinholes 332.

總括而言,在第九圖所示的實施例中,該系統20包括該光源組件 100、該共焦顯微鏡組件200,及該光學偵測組件300。該光學偵測組件300是一單拍超光譜成像組件302,係配置以測量該物體30的該表面輪廓及包含多層膜厚度的次表面輪廓。該光源組件100包括該寬頻光源110與該科勒照明裝置120。該共焦顯微鏡組件200包括該分束器210與具有該等針孔222陣列的該針孔裝置220以及配搭該等針孔222陣列的一或多個陣列的微透鏡224。該共焦顯微鏡組件200進一步包括該等入射光學元件230與用以沿著X軸與Y軸平面地移動該針孔裝置220的該驅動機構240。然而,該系統20可排除或停止該驅動機構240,以執行該物體30的快速取樣測量。該入射光學元件230包括該物鏡232、該鏡筒透鏡234,及該色差透鏡236。該單拍超光譜成像組件302包括具有該超光譜攝像儀314的 該光學偵測器310、具有搭配該等針孔332陣列的一個陣列的微透鏡234的該光圈裝置330,以及該波長分開裝置(wavelength differentiation device)。該單拍超光譜成像組件302進一步包括具有該中繼透鏡326、該準直器324與該成像透鏡322的該組偵測光學元件320。In summary, in the embodiment shown in FIG. 9, the system 20 includes the light source assembly 100, the confocal microscope assembly 200, and the optical detection assembly 300. The optical detection component 300 is a single-shot hyperspectral imaging component 302 configured to measure the surface profile of the object 30 and the subsurface profile including the thickness of the multilayer film. The light source assembly 100 includes the broadband light source 110 and the Kohler lighting device 120. The confocal microscope assembly 200 includes the beam splitter 210, the pinhole device 220 having the pinhole 222 arrays, and the microlenses 224 matching one or more arrays of the pinhole 222 arrays. The confocal microscope assembly 200 further includes the incident optical elements 230 and the driving mechanism 240 for moving the pinhole device 220 planarly along the X axis and the Y axis. However, the system 20 can exclude or stop the driving mechanism 240 to perform rapid sampling and measurement of the object 30. The incident optical element 230 includes the objective lens 232, the tube lens 234, and the chromatic aberration lens 236. The single-shot hyperspectral imaging component 302 includes the optical detector 310 with the hyperspectral camera 314, the aperture device 330 with an array of microlenses 234 with an array of the pinholes 332, and the wavelength separation device (wavelength differentiation device). The single-shot hyperspectral imaging component 302 further includes the group of detecting optical elements 320 having the relay lens 326, the collimator 324, and the imaging lens 322.

在第一圖與第九圖的實施例中,該系統20被配置以掃描該物體30的該表面輪廓的2D面積。具體而言,該針孔裝置220的該等針孔222的陣列係橫跨一2D平面而設置。在第十一圖的實施例中,該系統20被配置以執行該物體30的該表面輪廓的線性掃描。上述第一圖與第九圖的各方面可以相似地或類似地應用在第十一圖的實施例,反之亦然。在第十一圖的實施例中,該等針孔222及同樣地該等微透鏡224可設置成一單排(一維排列),以取代二維陣列的針孔222。同樣地對於該針孔裝置330,該等針孔332及同樣地該等微透鏡334可設置成一單排(一維排列),以取代二維陣列的針孔332。或者,該單排針孔332可以第十一圖所示的一維的狹縫光圈336來取代。In the embodiments of the first and ninth figures, the system 20 is configured to scan the 2D area of the surface profile of the object 30. Specifically, the array of the pinholes 222 of the pinhole device 220 is arranged across a 2D plane. In the embodiment of FIG. 11, the system 20 is configured to perform a linear scan of the surface profile of the object 30. The aspects of the above-mentioned first figure and the ninth figure can be similarly or similarly applied to the embodiment of the eleventh figure, and vice versa. In the embodiment of FIG. 11, the pinholes 222 and similarly the microlenses 224 can be arranged in a single row (one-dimensional arrangement) to replace the pinholes 222 of the two-dimensional array. Similarly for the pinhole device 330, the pinholes 332 and similarly the microlenses 334 can be arranged in a single row (one-dimensional arrangement) instead of the pinholes 332 of the two-dimensional array. Alternatively, the single row of pinholes 332 can be replaced by the one-dimensional slit aperture 336 shown in FIG. 11.

或者,該寬頻光源110的該光學光圈114是一線形光圈,以對應該單排的針孔222/332。該科勒照明裝置120亦可以將該寬頻光束聚焦成一線形光束的鏡筒透鏡122來代替。用以平面地移動該針孔裝置220的該驅動機構240可配置以平行該單排針孔222的方向移動該針孔裝置220,以涵蓋該等針孔222之間的間隙或間距。例如,該排針孔222係沿著X軸橫跨該表面輪廓而展開排列,且該驅動機構240係配置以沿著此X軸移動該針孔裝置220。該驅動機構240與支撐該物體30的可位移平台協力測量該物體30的整個表面輪廓。例如,該驅動機構240沿著X  軸移動該等針孔222而該平台沿著Y軸移動該物體30。當該線形光束橫跨該表面輪廓而移動時,該光學偵測器310(例如該彩色攝像儀312或超光譜攝像儀314) 一次擷取一列的光譜。第十二圖例示該超光譜攝像儀314所擷取該物體30的連續列光譜形式的超光譜影像60。Alternatively, the optical aperture 114 of the broadband light source 110 is a linear aperture to correspond to a single row of pinholes 222/332. The Kohler illuminator 120 can also be replaced by a tube lens 122 that focuses the broadband light beam into a linear light beam. The driving mechanism 240 for moving the pinhole device 220 in a plane can be configured to move the pinhole device 220 in a direction parallel to the single row of pinholes 222 to cover the gap or spacing between the pinholes 222. For example, the pinholes 222 are spread out and arranged along the X-axis across the surface contour, and the driving mechanism 240 is configured to move the pinhole device 220 along the X-axis. The driving mechanism 240 cooperates with the displaceable platform supporting the object 30 to measure the entire surface profile of the object 30. For example, the driving mechanism 240 moves the pinholes 222 along the X axis and the platform moves the object 30 along the Y axis. When the linear beam moves across the surface contour, the optical detector 310 (such as the color camera 312 or the hyperspectral camera 314) captures one column of spectra at a time. The twelfth figure illustrates the hyperspectral image 60 in the form of a continuous spectrum of the object 30 captured by the hyperspectral camera 314.

總括而言,在第十一圖的實施例中,該系統20被配置以線性掃描該物體30且包括該光源組件100、該共焦顯微鏡組件200,及該光學偵測組件300,而該光學偵測組件300是該單拍超光譜成像組件200。該光源組件100包括該寬頻光源110與該鏡筒透鏡122。該鏡筒透鏡122將來自該寬頻光源110的所述均勻光聚焦成一線形光束,以線性掃描該物體30。該共焦顯微鏡組件200包括該分束器210及具有用以線性掃描的單排針孔222陣列的該針孔裝置220以及搭配該單排針孔222陣列的一或多個陣列的微透鏡234。該共焦顯微鏡組件200進一步包括該組入射光學元件230及該驅動裝置240。該驅動裝置240用以平行於該單排針孔222例如沿著該X軸而平面地移動該針孔裝置220。該入射光學元件230包括該物鏡232、該鏡筒透鏡234,及該色差透鏡236。該單拍超光譜成像組件302包括具有該超光譜攝像儀314的該光學偵測器310、具有用以線性掃描的該狹縫光圈336的該光圈裝置330,及該波長分開裝置340。或者,該光圈裝置330包括用以線性掃描的一單排針孔332與搭配該單排針孔332的一單排微透鏡334。該單拍超光譜成像組件302更包括該組偵測光學元件320,而該組偵測光學元件320具有中繼透鏡326、準直器324,及成像透鏡322。In summary, in the embodiment of FIG. 11, the system 20 is configured to linearly scan the object 30 and includes the light source assembly 100, the confocal microscope assembly 200, and the optical detection assembly 300, and the optical The detection component 300 is the single-shot hyperspectral imaging component 200. The light source assembly 100 includes the broadband light source 110 and the tube lens 122. The tube lens 122 focuses the uniform light from the broadband light source 110 into a linear beam to scan the object 30 linearly. The confocal microscope assembly 200 includes the beam splitter 210, the pinhole device 220 with a single row of pinholes 222 array for linear scanning, and one or more arrays of microlenses 234 with the single row of pinholes 222 array . The confocal microscope assembly 200 further includes the set of incident optical elements 230 and the driving device 240. The driving device 240 is used to move the pinhole device 220 in a plane parallel to the single row of pinholes 222, for example along the X axis. The incident optical element 230 includes the objective lens 232, the tube lens 234, and the chromatic aberration lens 236. The single-shot hyperspectral imaging component 302 includes the optical detector 310 with the hyperspectral camera 314, the aperture device 330 with the slit aperture 336 for linear scanning, and the wavelength separation device 340. Alternatively, the aperture device 330 includes a single row of pinholes 332 for linear scanning and a single row of microlenses 334 matched with the single row of pinholes 332. The single-shot hyperspectral imaging component 302 further includes the group of detecting optical elements 320, and the group of detecting optical elements 320 has a relay lens 326, a collimator 324, and an imaging lens 322.

在第十三圖所示的實施例中,除了該針孔裝置220以外,該系統20大致上相似於第九圖所示的實施例。然而,上述第一圖、第九圖與第十一圖所示實施例的各方面同樣地或類似地可應用至第十三圖的實施例,反之亦然。在第十三圖的實施例中,該針孔裝置220是一尼普科夫圓盤(Nipkow disk)226。該尼普科夫圓盤226是一具有等距且為圓形或方形的針孔222的掃描盤。 該驅動機構240被配置以繞著Z軸平面地轉動該尼普科夫圓盤226。較佳地,該等針孔222係從該尼普科夫圓盤226的一外部徑向點起始朝向其中心定位,以形成一單圈螺旋, 俾利於當該驅動機構240轉動該尼普科夫圓盤226時該等針孔222追逐圓環圖案軌跡。如上述,當該尼普科夫圓盤226轉動時,該等針孔222與該物體30的該表面輪廓上對應的點被移動而通過該表面輪廓,進而該表面輪廓的一連續表面面積被掃描與測量。In the embodiment shown in FIG. 13, except for the pinhole device 220, the system 20 is substantially similar to the embodiment shown in FIG. 9. However, the aspects of the embodiment shown in the first figure, the ninth figure and the eleventh figure above can be equally or similarly applied to the embodiment of the figure thirteenth, and vice versa. In the embodiment of FIG. 13, the pinhole device 220 is a Nipkow disk 226. The Nipkov disk 226 is a scanning disk with pinholes 222 that are equidistant and round or square. The driving mechanism 240 is configured to rotate the Nipkov disc 226 planarly around the Z axis. Preferably, the pinholes 222 are positioned from an outer radial point of the Nipkov disc 226 toward the center thereof to form a single-turn spiral, which facilitates when the driving mechanism 240 rotates the Nipkov disc 226. The pinholes 222 chase the circular pattern trajectory when the Cove disk 226 is. As mentioned above, when the Nipkov disk 226 rotates, the pinholes 222 and the corresponding points on the surface contour of the object 30 are moved to pass through the surface contour, and a continuous surface area of the surface contour is changed. Scan and measure.

在第十四圖的實施例中,該尼普科夫圓盤226進一步包括第一陣列的微透鏡224,係設置在該等針孔222的頂部。如第十五圖所示,該尼普科夫圓盤226可進一步包括一第二陣列的微透鏡224,係設置於該等針孔222的下方,即該等針孔222的陣列位於該第一陣列與該第二陣列的微透鏡224之間。每一該針孔222搭配至少一該微透鏡224,而該微透鏡224係配置以將光線聚焦進入個別的該等針孔222。In the embodiment of FIG. 14, the Nipkov disc 226 further includes a first array of microlenses 224, which are arranged on top of the pinholes 222. As shown in Figure 15, the Nipkov disk 226 may further include a second array of microlenses 224, which are arranged below the pinholes 222, that is, the array of pinholes 222 is located on the first Between an array and the microlenses 224 of the second array. Each pinhole 222 is matched with at least one microlens 224, and the microlens 224 is configured to focus light into the individual pinholes 222.

總括而言,在第十三圖至第十五圖的實施例中,該系統20包括該光源組件100、該共焦顯微鏡組件200,及該光學偵測組件300。該光學偵測組件300是該單拍超光譜成像組件302。該光源組件100包括該寬頻光源110及該科勒照明系統120。該共焦顯微鏡組件200包括該分束器210與該針孔裝置220。該針孔裝置220是具有該等針孔222陣列的該尼普科夫圓盤226。該尼普科夫圓盤226可進一步包括搭配該等針孔222陣列的一或多個陣列的微透鏡224。該共焦顯微鏡組件200進一步包括該組入射光學元件230與沿著Z軸轉動該針孔裝置220的該驅動機構240。該組入射光學元件230包括該物鏡232、該鏡筒透鏡234,及該色差透鏡236。該單拍超光譜成像組件302包括具有該超光譜攝像儀314的該光學偵測器310、具有該等針孔332陣列的該光圈裝置330及搭配該等針孔332陣列的一陣列微透鏡334,以及該波長分開裝置340。該單拍超光譜成像組件302進一步包括該組偵測光學元件320,而該組偵測光學組件320具有該中繼透鏡326、該準直器324,及該成像透鏡322。In summary, in the embodiments shown in FIGS. 13 to 15, the system 20 includes the light source assembly 100, the confocal microscope assembly 200, and the optical detection assembly 300. The optical detection component 300 is the single-shot hyperspectral imaging component 302. The light source assembly 100 includes the broadband light source 110 and the Kohler lighting system 120. The confocal microscope assembly 200 includes the beam splitter 210 and the pinhole device 220. The pinhole device 220 is the Nipkov disc 226 with an array of pinholes 222. The Nipkov disk 226 may further include one or more arrays of microlenses 224 matching the pinhole 222 arrays. The confocal microscope assembly 200 further includes the group of incident optical elements 230 and the driving mechanism 240 that rotates the pinhole device 220 along the Z axis. The incident optical element 230 includes the objective lens 232, the tube lens 234, and the chromatic aberration lens 236. The single-shot hyperspectral imaging component 302 includes the optical detector 310 with the hyperspectral camera 314, the aperture device 330 with the array of pinholes 332, and an array microlens 334 with the array of pinholes 332 , And the wavelength separation device 340. The single-shot hyperspectral imaging component 302 further includes the group of detecting optical components 320, and the group of detecting optical components 320 has the relay lens 326, the collimator 324, and the imaging lens 322.

在第十六圖的實施例中,該系統20包括如上述的該光源組件100、該共焦顯微鏡組件200,及該光學偵測組件300。該光源組件100包括該寬頻光源220及科勒照明裝置120。雖然可以理解該光學偵測組件300可以是該單拍超光譜成像組件302,該光學偵測組件300包括該彩色攝像儀312 及該成像透鏡322。In the embodiment of FIG. 16, the system 20 includes the light source assembly 100, the confocal microscope assembly 200, and the optical detection assembly 300 as described above. The light source assembly 100 includes the broadband light source 220 and the Kohler lighting device 120. Although it can be understood that the optical detection component 300 may be the single-shot hyperspectral imaging component 302, the optical detection component 300 includes the color camera 312 and the imaging lens 322.

該共焦顯微鏡組件200包括該分束器210、呈尼普科夫圓盤226形式  的該針孔裝置220,及用以轉動該尼普科夫圓盤226的該驅動機構240。該共焦顯微鏡組件200進一步包括該鏡筒透鏡234、 該色差透鏡236,及用以協力將光線色差地聚焦於該物體30的該物鏡232。該物體30被支撐在可移動的平台32上。例 如,該平台32與驅動器比如馬達與壓電驅動器耦合或整合在一起。該等驅動器可沿著XYZ軸之至少一軸移動該平台32及/或繞著XYZ軸之至少一軸轉動該平台32。The confocal microscope assembly 200 includes the beam splitter 210, the pinhole device 220 in the form of a Nipkov disc 226, and the driving mechanism 240 for rotating the Nipkov disc 226. The confocal microscope assembly 200 further includes the barrel lens 234, the chromatic aberration lens 236, and the objective lens 232 for cooperating to focus the light on the object 30 chromatic aberration. The object 30 is supported on a movable platform 32. For example, the platform 32 is coupled or integrated with drivers such as motors and piezoelectric drivers. The drivers can move the platform 32 along at least one of the XYZ axes and/or rotate the platform 32 around at least one of the XYZ axes.

在第十六圖所示的實施例中,該組入射光學元件230包括一第一物鏡232及一第二物鏡238。該共焦顯微鏡組件200進一步包括支撐該第一與第二物鏡232、238的變換裝置或台架250。該變換裝置250可包括驅動器比如馬達與壓電驅動器,並可被操做於該第一與第二物鏡232、238之間。例如,該第一物鏡232具有較高放大倍率而該第二物鏡238具有較低放大倍率。此外,該組入射光學元件230可包括多個物鏡,而透過變換裝置250這些物鏡可以彼此互相切換,其中這些物鏡可以具有不同的放大倍率,俾利於選擇測量性能。In the embodiment shown in FIG. 16, the group of incident optical elements 230 includes a first objective lens 232 and a second objective lens 238. The confocal microscope assembly 200 further includes a conversion device or stage 250 supporting the first and second objective lenses 232 and 238. The conversion device 250 may include a driver such as a motor and a piezoelectric driver, and may be operated between the first and second objective lenses 232 and 238. For example, the first objective lens 232 has a higher magnification and the second objective lens 238 has a lower magnification. In addition, the group of incident optical elements 230 may include multiple objective lenses, and these objective lenses can be switched with each other through the conversion device 250, wherein the objective lenses can have different magnifications, which facilitates the selection of measurement performance.

雖然該三維表面輪廓測量系統20主要可使用在線上高速測量與檢視,其亦可做為取樣測量的一獨立的測量系統。第十六圖例示該獨立的測量系統20。Although the three-dimensional surface profile measurement system 20 can mainly be used for online high-speed measurement and inspection, it can also be used as an independent measurement system for sampling measurement. The sixteenth figure illustrates this independent measurement system 20.

如上述,該系統20包括該寬頻光源110、該照明裝置120,及該分束器210。該分束器210導引均勻的照明光線至該尼普科夫圓盤226的表面。一些光線被該尼普科夫圓盤226擋掉,而一些光線通過該尼普科夫圓盤226的該等針孔222。來自該等針孔222的光線通過該鏡筒透鏡234、該色差透鏡236,並且最後透過該物鏡232聚焦於安置在該可機械移動平台32的該物體30的表面上。As mentioned above, the system 20 includes the broadband light source 110, the lighting device 120, and the beam splitter 210. The beam splitter 210 guides uniform illumination light to the surface of the Nipkov disk 226. Some light is blocked by the Nipkov disc 226, and some light passes through the pinholes 222 of the Nipkov disc 226. The light from the pinholes 222 passes through the barrel lens 234, the chromatic aberration lens 236, and finally passes through the objective lens 232 to focus on the surface of the object 30 placed on the mechanically movable platform 32.

一觀測裝置500被安置於該物鏡232與該鏡筒透鏡234之間,用以觀測及選擇該表面輪廓欲被檢視的面積。該觀測裝置500包括一第一分束器510、一第二分束器520、一目鏡530、一成像透鏡540,及一攝像儀550。該物體30的該表面輪廓透過該物鏡232成像,並由該第一分束器510與該第二分束器520反射。該影像可透過該成像透鏡540與攝像儀550成像。該物體30的影像亦可直接透過該目鏡530以裸眼來觀測。該觀測裝置500可以移入以進行觀測並移出以進行三維表面輪廓測量。An observation device 500 is arranged between the objective lens 232 and the barrel lens 234 to observe and select the area of the surface contour to be inspected. The observation device 500 includes a first beam splitter 510, a second beam splitter 520, an eyepiece 530, an imaging lens 540, and a camera 550. The surface profile of the object 30 is imaged through the objective lens 232 and reflected by the first beam splitter 510 and the second beam splitter 520. The image can be formed by the imaging lens 540 and the camera 550. The image of the object 30 can also be directly observed through the eyepiece 530 with naked eyes. The observation device 500 can be moved in for observation and moved out to perform three-dimensional surface profile measurement.

如上述的各種實施例,該系統20及方法400透過擷取該表面輪廓的單一影像並利用光譜分析產生該物體30的表面輪廓而測量出該物體30的該表面輪廓。該光源組件100提供均勻寬頻光線至該共焦顯微鏡組件200與該光學偵測組件300,以成像該物體30。該共焦顯微鏡組件200產生並收集該表面輪廓的光譜資訊,以及該光學偵測組件300記錄該表面輪廓的光譜影像的光譜資訊。該系統20可與一影像處理模組整合或耦合,以根據該光譜影像比如上述的該光譜影像40或超光譜影像50產生該物體30的該表面輪廓。例如,透過該超光譜影像50,可以檢視該物體30的除了該表面輪廓以外的次表面輪廓與表面層厚度。As in the various embodiments described above, the system 20 and the method 400 measure the surface contour of the object 30 by capturing a single image of the surface contour and using spectral analysis to generate the surface contour of the object 30. The light source assembly 100 provides uniform broadband light to the confocal microscope assembly 200 and the optical detection assembly 300 to image the object 30. The confocal microscope component 200 generates and collects the spectral information of the surface profile, and the optical detection component 300 records the spectral information of the spectral image of the surface profile. The system 20 can be integrated or coupled with an image processing module to generate the surface profile of the object 30 according to the spectral image, such as the aforementioned spectral image 40 or hyperspectral image 50. For example, through the hyperspectral image 50, the subsurface contour and the surface layer thickness of the object 30 other than the surface contour can be viewed.

該光譜分析是根據該寬頻均勻光線通過該共焦顯微鏡組件200的色差原理。該均勻光線的該色差產生代表橫跨該表面輪廓的高度具有更多區別波長的光譜資訊,且該表面輪廓可以根據這些波長精確地被測量而不需要垂直掃描。相較於緩慢的傳統點對點測量方法,由於該針孔裝置220比如尼普科夫圓盤226,該系統20可以達到高速表面輪廓測量。該物體30的整個表面可以無縫地被掃描與測量,進而可消弭該物體30所關注的區域被排除掉的風險,並且對該物體30進行更高品質的檢視。The spectrum analysis is based on the chromatic aberration principle of the broadband uniform light passing through the confocal microscope assembly 200. The chromatic aberration of the uniform light produces spectral information representing more distinct wavelengths across the height of the surface profile, and the surface profile can be accurately measured based on these wavelengths without vertical scanning. Compared with the slow traditional point-to-point measurement method, the system 20 can achieve high-speed surface profile measurement due to the pinhole device 220 such as the Nipkov disc 226. The entire surface of the object 30 can be scanned and measured seamlessly, thereby eliminating the risk that the area of interest of the object 30 is excluded, and the object 30 can be inspected with higher quality.

因此,該系統20與方法40可使用於高速與精確的表面輪廓測量,尤其是波浪形態或不連續形態的表面輪廓,如此可適合各種應用,包括半導體晶圓、積體電路線迴路及精密部件的高速自動表面輪廓檢視。Therefore, the system 20 and method 40 can be used for high-speed and accurate surface profile measurement, especially the surface profile of wave shape or discontinuous shape, which can be suitable for various applications, including semiconductor wafers, integrated circuit circuits and precision parts. High-speed automatic surface contour inspection.

參照圖式,上文詳細描述了測量物體表面輪廓的該系統20與方法400的本揭露實施例。這些實施例在此並非意圖將本揭露限制在特定的代表例,而僅只是舉例說明本揭露非限制性的例子。本揭露用於解決所提到的已知技術的問題與缺失中至少一項。雖然本揭露在此僅揭露一些實施例,所屬技術領域具通常知識人士根據本揭露應可了解在不悖離本揭露範疇下對於所揭露的實施例可以進行各種改變及/或修飾。因此,本揭露範疇及後附的請求項範圍不受限於在此揭露的實施例。With reference to the drawings, the disclosed embodiments of the system 20 and the method 400 for measuring the surface profile of an object are described in detail above. These embodiments are not intended to limit the present disclosure to specific representative examples, but merely illustrate non-limiting examples of the present disclosure. This disclosure is used to solve at least one of the problems and deficiencies of the known technologies mentioned. Although the disclosure only discloses some embodiments here, those skilled in the art should understand that various changes and/or modifications can be made to the disclosed embodiments without departing from the scope of the disclosure according to the disclosure. Therefore, the scope of the disclosure and the scope of the appended claims are not limited to the embodiments disclosed herein.

20:系統 30:物體 32:可機械移動平台 40:光譜影像 50:超光譜影像 100:光源組件100 110:寬頻光源 112:燈光 114:光學光圈 116:光學積分球 120:科勒照明裝置 122:鏡筒透鏡 200:共焦顯微鏡組件 210:分束器 220:針孔裝置 222:針孔 224:微透鏡 226:尼普科夫圓盤 230:入射光學件組 232:物鏡 234:鏡筒透鏡 236:色差透鏡 238:第二物鏡 240:驅動機構 250:變換裝置 300:光學偵測組件 302:單拍超光譜成像組件 310:光學偵測器 312:彩色攝像儀 314:超光譜攝像儀 320:偵測光學元件組 322:成像透鏡 324:準直器 326:中繼透鏡 330:光圈裝置 332:針孔 334:微透鏡 336:狹縫光圈 340:光柵 400:步驟流程圖 402-414:步驟 500:觀測裝置 510:第一分束器510 520:第二分束器 530:目鏡 540:成像透鏡 550:攝像儀 R:紅 G:綠 B:藍 P1、P2:間距20: System 30: Object 32: Mechanically movable platform 40: Spectral image 50: Hyperspectral image 100: Light source assembly 100 110: Broadband light source 112: lights 114: optical aperture 116: optical integrating sphere 120: Kohler lighting device 122: Tube lens 200: Confocal microscope components 210: beam splitter 220: pinhole device 222: Pinhole 224: Micro lens 226: Nipkov Disc 230: incident optics group 232: Objective 234: Tube lens 236: Chromatic aberration lens 238: second objective lens 240: drive mechanism 250: Transformation device 300: Optical detection component 302: Single-shot hyperspectral imaging component 310: Optical detector 312: Color camera 314: Hyperspectral camera 320: Detection optics group 322: imaging lens 324: Collimator 326: Relay lens 330: Aperture device 332: Pinhole 334: Micro lens 336: slit aperture 340: Raster 400: Step-by-step flowchart 402-414: Step 500: Observation device 510: The first beam splitter 510 520: second beam splitter 530: eyepiece 540: imaging lens 550: Camera R: Red G: Green B: blue P1, P2: pitch

第一圖是根據本揭露的一些實施例的一種物體表面輪廓測量系統的範例示意圖,其中該系統具有一彩色攝像儀。The first figure is an exemplary schematic diagram of an object surface profile measurement system according to some embodiments of the disclosure, in which the system has a color camera.

第二圖是根據本揭露的一些實施例的一種物體表面輪廓測量方法的步驟流程圖範例。The second figure is an example of a flowchart of a method for measuring the surface profile of an object according to some embodiments of the disclosure.

第三圖至第五圖是根據本揭露的一些實施例的該測量系統的針孔裝置的範例示意圖。Figures 3 to 5 are schematic diagrams of exemplary pinhole devices of the measurement system according to some embodiments of the present disclosure.

第六圖是根據本揭露的一些實施例的該測量系統的光源範例示意圖。The sixth figure is a schematic diagram of an example of a light source of the measurement system according to some embodiments of the present disclosure.

第七圖是根據本揭露的一些實施例的該測量系統擷取的該物體的光譜影像範例示意圖。The seventh figure is a schematic diagram of an example of a spectral image of the object captured by the measurement system according to some embodiments of the present disclosure.

第八圖是根據本揭露的一些實施例的另一配置架構的測量系統的範例示意圖。Figure 8 is an exemplary schematic diagram of a measurement system with another configuration architecture according to some embodiments of the disclosure.

第九圖是根據本揭露的一些實施例具有超光譜成像組件的另一   測量系統的範例示意圖。Figure ninth is an exemplary schematic diagram of another measurement system with a hyperspectral imaging component according to some embodiments of the present disclosure.

第十圖是根據本揭露的一些實施例的測量系統擷取的該物體的一超光譜影像的範例示意圖。Figure 10 is a schematic diagram illustrating an example of a hyperspectral image of the object captured by the measurement system according to some embodiments of the disclosure.

第十一圖是根據本揭露的一些實施例具有超光譜成像組件且配置用以線性掃描的另一測量系統的範例示意圖。FIG. 11 is an exemplary schematic diagram of another measurement system having a hyperspectral imaging component and configured for linear scanning according to some embodiments of the present disclosure.

第十二圖是根據本揭露的一些實施例採用線性掃描的該測量系統擷取的該物體的超光譜影像的範例示意圖。FIG. 12 is a schematic diagram of an example of a hyperspectral image of the object captured by the measurement system using linear scanning according to some embodiments of the present disclosure.

第十三圖是根據本揭露的一些實施例具有超光譜成像組件及一尼普科夫圓盤的另一測量系統的範例示意圖。Figure 13 is an exemplary schematic diagram of another measurement system with a hyperspectral imaging component and a Nipkov disk according to some embodiments of the present disclosure.

第十四圖及第十五圖是根據本揭露的一些實施例的該尼普科夫圓盤的範例示意圖。Figures 14 and 15 are schematic diagrams of examples of the Nipkov disk according to some embodiments of the present disclosure.

第十六圖是根據本揭露的一些實施例具有彩色攝像儀的另一測量系統的範例示意圖。Figure 16 is an exemplary schematic diagram of another measurement system with a color camera according to some embodiments of the disclosure.

20:系統20: System

30:物體30: Object

100:光源組件100100: Light source assembly 100

110:寬頻光源110: Broadband light source

120:科勒照明裝置120: Kohler lighting device

200:共焦顯微鏡組件200: Confocal microscope components

210:分束器210: beam splitter

220:針孔裝置220: pinhole device

230:人射光學件組230: Human shot optics group

234:鏡筒透鏡234: Tube lens

236:色差透鏡236: Chromatic aberration lens

238:第二物鏡238: second objective lens

240:驅動機構240: drive mechanism

300:光學偵測組件300: Optical detection component

310:光學偵測器310: Optical detector

312:彩色攝像儀312: Color camera

320:偵測光學元件320: detection optics

322:成像透鏡322: imaging lens

R:紅R: Red

G:綠G: Green

B:藍B: blue

Claims (24)

一種物體表面輪廓測量系統,該系統包括: 一光源組件,包含一寬頻光源; 一共焦顯微鏡組件,包含: 一分束器,用以將來自該寬頻光源的均勻光導引至該物體; 一針孔裝置,包含一針孔陣列,該針孔裝置被配置以使來自該分束器的所述均勻光通過該等針孔至該物體; 一組入射光學元件,用以將來自該針孔裝置的所述均勻光導引至該物體,並使通過該等入射光學元件的所述均勻光造成色差;及 該針孔裝置被配置以使來自該物體的反射光通過該等針孔至該分束器,所述反射光包含基於所述色差的該表面輪廓的光譜資訊;及 一光學偵測組件,包含: 一光學偵測器,係接收來自該分束器的所述反射光;及 一組偵測光學元件,係將來自該分束器的所述反射光導引至該光學偵測器; 其中,根據該光學偵測器接收的所述反射光的光譜資訊可以測量該物體的該表面輪廓,所述光譜資訊代表橫跨該表面輪廓的高度。An object surface profile measurement system, which includes: A light source assembly including a broadband light source; A confocal microscope assembly, including: A beam splitter for guiding the uniform light from the broadband light source to the object; A pinhole device comprising an array of pinholes configured to allow the uniform light from the beam splitter to pass through the pinholes to the object; A set of incident optical elements for guiding the uniform light from the pinhole device to the object and causing the uniform light passing through the incident optical elements to cause chromatic aberration; and The pinhole device is configured to allow reflected light from the object to pass through the pinholes to the beam splitter, the reflected light including spectral information of the surface profile based on the chromatic aberration; and An optical detection component, including: An optical detector that receives the reflected light from the beam splitter; and A set of detecting optical elements, which guide the reflected light from the beam splitter to the optical detector; Wherein, the surface profile of the object can be measured according to the spectral information of the reflected light received by the optical detector, and the spectral information represents the height across the surface profile. 如請求項1所述的物體表面輪廓測量系統,其中該寬頻光源包含: 一光學積分球; 一組燈光,係被安置圍繞該光學積分球,該光學積分球被配置以整合來自該等燈光的光能;及 一光學光圈,係導引發射自該等燈光的所述均勻光離開該寬頻光源。The object surface profile measurement system according to claim 1, wherein the broadband light source includes: An optical integrating sphere; A group of lights is arranged around the optical integrating sphere, and the optical integrating sphere is configured to integrate the light energy from the lights; and An optical aperture guides the uniform light emitted from the lamps to leave the broadband light source. 如請求項2所述的物體表面輪廓測量系統,其中該等燈光為白光元件,係配置以發射紅光至藍光,或紅外光至紫外光。The object surface profile measurement system according to claim 2, wherein the lights are white light elements configured to emit red light to blue light, or infrared light to ultraviolet light. 如請求項1至3之任一項所述的物體表面輪廓測量系統,其中該針孔裝置包含一或多個微透鏡陣列,來搭配該針孔陣列,以使每一該針孔搭配至少一該微透鏡,而該等微透鏡被配置以將來自該分束器的光線聚焦至個別的該等針孔。The object surface profile measurement system according to any one of claims 1 to 3, wherein the pinhole device includes one or more microlens arrays to match the pinhole array, so that each pinhole matches at least one The microlenses, and the microlenses are configured to focus the light from the beam splitter to the individual pinholes. 如請求項4所述的物體表面輪廓測量系統,其中該等微透鏡陣列係安置於該針孔裝置的一邊或兩邊。The object surface profile measurement system according to claim 4, wherein the micro lens arrays are arranged on one or both sides of the pinhole device. 如請求項1至5之任一項所述的物體表面輪廓測量系統,其中該共焦顯微鏡組件包含一驅動機構,用以平面地移動該針孔裝置。The object surface profile measurement system according to any one of claims 1 to 5, wherein the confocal microscope assembly includes a driving mechanism for moving the pinhole device in a plane. 如請求項6所述的物體表面輪廓測量系統,其中該驅動機構被配置以平面地沿X軸及/或Y軸移動該針孔裝置。The object surface profile measurement system according to claim 6, wherein the driving mechanism is configured to move the pinhole device along the X axis and/or the Y axis in a plane. 如請求項1至7之任一項所述的物體表面輪廓測量系統,其中該組入射光學元件包含: 一物鏡,用以將光線聚焦於該物體; 一鏡筒透鏡,用以將來自該物體的所述反射光聚焦於該針孔裝置;及 一色差透鏡, 係設置在該鏡筒透鏡與該物鏡之間,以造成所述光線的所述色差。The object surface profile measurement system according to any one of claims 1 to 7, wherein the group of incident optical elements includes: An objective lens to focus light on the object; A tube lens for focusing the reflected light from the object on the pinhole device; and A chromatic aberration lens is arranged between the barrel lens and the objective lens to cause the chromatic aberration of the light. 如請求項8所述的物體表面輪廓測量系統,其中該物鏡及該色差透鏡係整合成一個單一透鏡元件。The object surface profile measurement system according to claim 8, wherein the objective lens and the chromatic aberration lens are integrated into a single lens element. 如請求項1至9之任一項所述的物體表面輪廓測量系統,其中該光學偵測組件是一超光譜成像組件 (hyperspectral imaging assembly),係配置以測量該物體的該表面輪廓與次表面輪廓。The object surface profile measurement system according to any one of claims 1 to 9, wherein the optical detection component is a hyperspectral imaging assembly (hyperspectral imaging assembly) configured to measure the surface profile and subsurface of the object contour. 如請求項10所述的物體表面輪廓測量系統,其中該超光譜成像組件 是一單次拍攝超光譜成像組件 ,係被配置以單一影像測量該物體的該表面輪廓與次表面輪廓。The object surface profile measurement system according to claim 10, wherein the hyperspectral imaging component is a single shot hyperspectral imaging component configured to measure the surface profile and subsurface profile of the object with a single image. 如請求項11所述的物體表面輪廓測量系統,其中該單次拍攝超光譜成像組件 包含: 該光學偵測器,係包含一高光譜攝像儀(hyperspectral camera); 一光圈裝置,其中來自該分束器的所述反射光通過該光圈裝置至該高光譜攝像儀;及 一波長分開裝置(wavelength differentiation device),係設置於該光圈裝置與該高光譜攝像儀之間並用以分開所述反射光;及 該組偵測光學元件包含: 一中繼透鏡(relay lens),係設置於該分束器與該光圈裝置之間; 一準直器(collimator),係設置於該光圈裝置與該波長分開裝置之間;及 一成像透鏡,係設置於該波長分開裝置與該高光譜攝像儀之間並用以將所述反射光聚焦於該高光譜攝像儀。The object surface profile measurement system according to claim 11, wherein the single-shot hyperspectral imaging component includes: The optical detector includes a hyperspectral camera; An aperture device, wherein the reflected light from the beam splitter passes through the aperture device to the hyperspectral camera; and A wavelength differentiation device (wavelength differentiation device) is arranged between the aperture device and the hyperspectral camera and used to separate the reflected light; and The group of detecting optical components includes: A relay lens is arranged between the beam splitter and the aperture device; A collimator (collimator) is arranged between the aperture device and the wavelength separation device; and An imaging lens is arranged between the wavelength separation device and the hyperspectral camera and used for focusing the reflected light on the hyperspectral camera. 如請求項12所述的物體表面輪廓測量系統,其中該光圈裝置包含一陣列的針孔或一狹縫光圈。The object surface profile measurement system according to claim 12, wherein the aperture device includes an array of pinholes or a slit aperture. 如請求項13所述的物體表面輪廓測量系統,其中該光圈裝置包含該陣列的針孔與搭配該陣列的針孔的一陣列的微透鏡,以使得每一該針孔配搭一該微透鏡,其中該微透鏡被配置以將來自該分束器的所述反射光聚焦至個別的該針孔。The object surface profile measurement system according to claim 13, wherein the aperture device includes the pinholes of the array and an array of microlenses matching the pinholes of the array, so that each pinhole is matched with one microlens, The micro lens is configured to focus the reflected light from the beam splitter to the individual pinhole. 如請求項12至14之任一項所述的物體表面輪廓測量系統,其中該波長分開裝置包含一光柵,用以繞射所述反射光,或者一光學稜鏡,用以散開所述反射光。The object surface profile measurement system according to any one of claims 12 to 14, wherein the wavelength division device includes a grating to diffract the reflected light, or an optical beam to diffuse the reflected light . 如請求項1所述的物體表面輪廓測量系統,其中 該光源組件 包含該寬頻光源與一照明裝置,該照明裝置用以均勻地導引來自該寬頻光源的均勻光線; 該共焦顯微鏡組件包含: 該分束器與該組入射光學元件; 該針孔裝置,係包含該針孔陣列與搭配該針孔陣列的一或多個陣列的微透鏡,以使每一該針孔配搭至少一該微透鏡,其中該微透鏡用以將來自該分束器的光線聚焦進入個別的該等針孔;及 一驅動機構,用以沿著X軸及Y軸平面地移動該針孔裝置;以及 該光學偵測組件,係包含一彩色攝像儀,係用以測量該物體的該表面輪廓。The object surface profile measurement system according to claim 1, wherein The light source assembly includes the broadband light source and an illuminating device, and the illuminating device is used to uniformly guide uniform light from the broadband light source; The confocal microscope components include: The beam splitter and the group of incident optical elements; The pinhole device includes the pinhole array and one or more arrays of microlenses matching the pinhole array, so that each pinhole is matched with at least one microlens, wherein the microlens is used to The light from the beam splitter is focused into the individual pinholes; and A driving mechanism for moving the pinhole device along the X-axis and Y-axis planes; and The optical detection component includes a color camera for measuring the surface contour of the object. 如請求項1所述的物體表面輪廓測量系統,其中 該光源組件包含該寬頻光源與一照明裝置,該照明裝置用以均勻地導引來自該寬頻光源的均勻光線; 該共焦顯微鏡組件包含: 該分束器與該組入射光學元件;及 該針孔裝置,係包含該針孔陣列與搭配該針孔陣列的一或多個陣列的微透鏡,以使每一該針孔配搭至少一該微透鏡,其中該微透鏡用以將來自該分束器的光線聚焦進入個別的該等針孔;以及 該光學偵測組件係一單次拍攝超光譜成像組件 ,係被配置以測量該物體的該表面輪廓與次表面輪廓,該單次拍攝超光譜成像組件 包含: 一高光譜攝像儀(hyperspectral camera);及 一光圈裝置,其中來自該分束器的所述反射光通過該光圈裝置至該高光譜攝像儀,該光圈裝置包含一陣列的針孔與搭配該陣列的針孔的一陣列的微透鏡,以使得每一該針孔配搭一該微透鏡,該微透鏡被配置以將來自該分束器的所述反射光聚焦進入個別的該等針孔。The object surface profile measurement system according to claim 1, wherein The light source assembly includes the broadband light source and an illuminating device for guiding uniform light from the broadband light source evenly; The confocal microscope components include: The beam splitter and the set of incident optical elements; and The pinhole device includes the pinhole array and one or more arrays of microlenses matching the pinhole array, so that each pinhole is matched with at least one microlens, wherein the microlens is used to The light from the beam splitter is focused into the individual pinholes; and The optical detection component is a single-shot hyperspectral imaging component configured to measure the surface profile and sub-surface profile of the object. The single-shot hyperspectral imaging component includes: A hyperspectral camera; and An aperture device, wherein the reflected light from the beam splitter passes through the aperture device to the hyperspectral camera, the aperture device includes an array of pinholes and an array of microlenses matching the array of pinholes, and Each of the pinholes is matched with a microlens, and the microlens is configured to focus the reflected light from the beam splitter into the individual pinholes. 如請求項17所述的物體表面輪廓測量系統,其中該驅動機構沿著X軸及Y軸平面地移動該針孔裝置。The object surface profile measuring system according to claim 17, wherein the driving mechanism moves the pinhole device along the X-axis and Y-axis plane. 如請求項1所述的物體表面輪廓測量系統,其中 該光源組件包含該寬頻光源與一柱形透鏡,該柱形透鏡用以將來自該寬頻光源的均勻光線聚焦成一線光束,以線性掃描該物體; 該共焦顯微鏡組件包含: 該分束器與該組入射光學元件; 該針孔裝置,係包含基於該線性掃描呈一單排的該針孔陣列與配搭該單排針孔的一或多個陣列的微透鏡,以使得每一該針孔配搭至少一該微透鏡,該微透鏡被配置將來自該分束器的光線聚焦進入個別的該等針孔;及 一驅動機構,係平行於該單排針孔平面地移動該針孔裝置;以及 該光學偵測組件係一單次拍攝超光譜成像組件 ,係被配置以測量該物體的該表面輪廓與次表面輪廓,該單次拍攝超光譜成像組件 包含: 一高光譜攝像儀;及 一光圈裝置,其中來自該分束器的所述反射光通過該光圈裝置至該高光譜攝像儀,該光圈裝置包含用以該線性掃描的一單排針孔及配搭該單排針孔的一單排微透鏡,以使得每一該針孔搭配一該微透鏡,而該微透鏡被配置以聚焦來自該分束器的所述反射光進入個別的該等針孔。The object surface profile measurement system according to claim 1, wherein The light source assembly includes the broadband light source and a cylindrical lens for focusing the uniform light from the broadband light source into a line beam to linearly scan the object; The confocal microscope components include: The beam splitter and the group of incident optical elements; The pinhole device includes a single row of the pinhole array based on the linear scan and one or more arrays of microlenses matching the single row of pinholes, so that each pinhole is matched with at least one microlens , The micro lens is configured to focus the light from the beam splitter into the individual pinholes; and A driving mechanism that moves the pinhole device parallel to the plane of the single row of pinholes; and The optical detection component is a single-shot hyperspectral imaging component configured to measure the surface profile and sub-surface profile of the object. The single-shot hyperspectral imaging component includes: A hyperspectral camera; and An aperture device, wherein the reflected light from the beam splitter passes through the aperture device to the hyperspectral camera, and the aperture device includes a single row of pinholes for the linear scanning and a pair of the single row of pinholes A single row of microlenses makes each pinhole match one microlens, and the microlens is configured to focus the reflected light from the beam splitter into the individual pinholes. 如請求項1所述的物體表面輪廓測量系統,其中 該光源組件包含該寬頻光源與一柱形透鏡,該柱形透鏡用以將來自該寬頻光源的均勻光線聚焦成一線光束,以線性掃描該物體; 該共焦顯微鏡組件包含: 該分束器與該組入射光學元件; 該針孔裝置,係包含基於該線性掃描呈一單排的該針孔陣列與配搭該單排針孔的一或多個陣列的微透鏡,以使得每一該針孔配搭至少一該微透鏡,該微透鏡被配置將來自該分束器的光線聚焦進入個別的該等針孔;及 一驅動機構,係平行於該單排針孔平面地移動該針孔裝置;以及 該光學偵測組件係一單次拍攝超光譜成像組件 ,係被配置以測量該物體的該表面輪廓與次表面輪廓,該單次拍攝超光譜成像組件 包含: 一高光譜攝像儀;及 一光圈裝置,其中來自該分束器的所述反射光通過該光圈裝置至該高光譜攝像儀,該光圈裝置包含一狹縫光圈,用以該線性掃描。The object surface profile measurement system according to claim 1, wherein The light source assembly includes the broadband light source and a cylindrical lens for focusing the uniform light from the broadband light source into a line beam to linearly scan the object; The confocal microscope components include: The beam splitter and the group of incident optical elements; The pinhole device includes a single row of the pinhole array based on the linear scan and one or more arrays of microlenses matching the single row of pinholes, so that each pinhole is matched with at least one microlens , The micro lens is configured to focus the light from the beam splitter into the individual pinholes; and A driving mechanism that moves the pinhole device parallel to the plane of the single row of pinholes; and The optical detection component is a single-shot hyperspectral imaging component configured to measure the surface profile and sub-surface profile of the object. The single-shot hyperspectral imaging component includes: A hyperspectral camera; and An aperture device, wherein the reflected light from the beam splitter passes through the aperture device to the hyperspectral camera, and the aperture device includes a slit aperture for the linear scanning. 如請求項1所述的物體表面輪廓測量系統,其中 該光源組件包含該寬頻光源與一照明裝置,該照明裝置用以均勻地導引來自該寬頻光源的均勻光線; 該共焦顯微鏡組件包含: 該分束器與該組入射光學元件;及 該針孔裝置,係一尼普科夫圓盤且包含該針孔陣列;及 一驅動機構,用以沿著Z軸轉動該針孔裝置;以及 該光學偵測組件係一單次拍攝超光譜成像組件 ,係被配置以測量該物體的該表面輪廓與次表面輪廓,該單次拍攝超光譜成像組件 包含: 一高光譜攝像儀(hyperspectral camera);及 一光圈裝置,其中來自該分束器的所述反射光通過該光圈裝置至該高光譜攝像儀,該光圈裝置包含一陣列的針孔與搭配該陣列的針孔的一陣列的微透鏡,以使得每一該針孔配搭一該微透鏡,該微透鏡被配置以將來自該分束器的所述反射光聚焦進入個別的該等針孔。The object surface profile measurement system according to claim 1, wherein The light source assembly includes the broadband light source and an illuminating device for guiding uniform light from the broadband light source evenly; The confocal microscope components include: The beam splitter and the set of incident optical elements; and The pinhole device is a Nipkov disc and includes the pinhole array; and A driving mechanism for rotating the pinhole device along the Z axis; and The optical detection component is a single-shot hyperspectral imaging component configured to measure the surface profile and sub-surface profile of the object. The single-shot hyperspectral imaging component includes: A hyperspectral camera; and An aperture device, wherein the reflected light from the beam splitter passes through the aperture device to the hyperspectral camera, the aperture device includes an array of pinholes and an array of microlenses matching the array of pinholes, and Each of the pinholes is matched with a microlens, and the microlens is configured to focus the reflected light from the beam splitter into the individual pinholes. 如請求項21所述的物體表面輪廓測量系統,其中該尼普科夫圓盤更包含一或多個陣列的微透鏡,來搭配該針孔陣列,以使得每一該針孔配搭至少一該微透鏡,該微透鏡用以將來自該分束器的光線聚焦進入個別的該等針孔。The object surface profile measurement system according to claim 21, wherein the Nipkov disk further includes one or more arrays of microlenses to match the pinhole array, so that each pinhole matches at least one of the pinholes. The micro lens is used to focus the light from the beam splitter into the individual pinholes. 如請求項22所述的物體表面輪廓測量系統,其中該等陣列的微透鏡係安置於該針孔裝置的一邊或兩邊。The object surface profile measurement system according to claim 22, wherein the microlenses of the arrays are arranged on one or both sides of the pinhole device. 如請求項21至23之任一項所述的物體表面輪廓測量系統,其中該等針孔呈圓形或方形。The object surface profile measurement system according to any one of claims 21 to 23, wherein the pinholes are circular or square.
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