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TW201525073A - Polysiloxane - Google Patents

Polysiloxane Download PDF

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Publication number
TW201525073A
TW201525073A TW104108949A TW104108949A TW201525073A TW 201525073 A TW201525073 A TW 201525073A TW 104108949 A TW104108949 A TW 104108949A TW 104108949 A TW104108949 A TW 104108949A TW 201525073 A TW201525073 A TW 201525073A
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Taiwan
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group
polyoxyalkylene
mol
integer
sio
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TW104108949A
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Chinese (zh)
Inventor
Kouji Nakanishi
Taichi Tazaki
Kouichi Hasegawa
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Jsr Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

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  • Silicon Polymers (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Led Device Packages (AREA)

Abstract

A curable composition, which is containing: polysiloxane (A) having alkenyl group and adhesive group, polysiloxane (B) having per molecule at least two hydrogen atom that is combined with silicon atom (but polysiloxane (A)), and catalyst (C) for the hydrosilylation reaction. It is characterized by the content ratio of polysiloxane (A) is 40 to 90 mass% when total content of all ingredients of the curable composition is 100 mass%. The curable composition of the present invention is capable of forming a hydrosilyl series polysiloxane composition which is having both high adhesiveness for substrates or metal lines, and high Initial luminance of LED etc. Therefore, an optical semiconductor device which is obtained by covering the semiconductor light-emitting element by the cured article obtained from the curable composition, the initial luminance is high, even in the case of undergoing heat cycle, the cured article is having high adhesiveness and could not separate of package and the like.

Description

聚矽氧烷 Polyoxane

本發明係有關於硬化性組成物、硬化物、光半導體裝置以及聚矽氧烷。 The present invention relates to a curable composition, a cured product, an optical semiconductor device, and a polyoxyalkylene.

半導體發光裝置(LED)的密封劑等所使用的矽氫化反應硬化型的聚矽氧烷組成物(以下亦稱為氫矽烷(hydrosilyl)系聚矽氧烷組成物),被要求提高對LED封裝等之黏著性的技術。 A hydrogenation-reaction-hardening polyoxane composition (hereinafter also referred to as a hydrosilyl-based polyoxane composition) used for a sealing agent for a semiconductor light-emitting device (LED), etc., is required to improve the LED package. Adhesive technology.

作為圖謀提高氫矽烷系聚矽氧烷組成物之黏著性的技術,已知有在氫矽烷系聚矽氧烷組成物中添加含環氧基之聚矽氧烷等黏著促進劑的技術。 As a technique for improving the adhesion of a hydroxane-based polyoxane composition, a technique of adding an adhesion promoter such as an epoxy group-containing polyoxyalkylene to a hydroquinone-based polyoxane composition is known.

專利文獻1中記載了一種氫矽烷系聚矽氧烷組成物,其相對於作為主劑的有機聚矽氧烷100重量份,含有0.01~50重量份的作為黏著促進劑的具有烯基的含環氧基的聚矽氧烷。 Patent Document 1 describes a hydroquinane-based polyoxoxane composition containing 0.01 to 50 parts by weight of an alkenyl group as an adhesion promoter, based on 100 parts by weight of the organopolyoxane as a main component. An epoxy group of polyoxyalkylene.

專利文獻2中記載了一種氫矽烷系聚矽氧烷組成物,其相對於作為主劑之含有烯基和苯基的有機聚矽氧烷樹脂100重量份,含有0.01~20重量份的作為黏著促進劑的含環氧基的聚矽氧烷。 Patent Document 2 describes a hydroquinane-based polyoxoxane composition containing 0.01 to 20 parts by weight as an adhesive per 100 parts by weight of an organic polyfluorene-containing resin containing an alkenyl group and a phenyl group as a main component. An epoxy group-containing polyoxyalkylene of a promoter.

專利文獻3中記載了一種氫矽烷系聚矽氧烷組成物,其相對於作為主劑之包含烯基的有機聚矽氧烷成分100質量份,含有0.01~10質量份的作為黏著促進劑的具有烯基之含環氧基的聚矽氧烷。 Patent Document 3 describes a hydroquinane-based polyoxoxane composition containing 0.01 to 10 parts by mass as an adhesion promoter, based on 100 parts by mass of the alkenyl group-containing organopolyoxane component as a main component. An epoxy group-containing polyoxyalkylene having an alkenyl group.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1 日本特開2007-327019號公報 Patent Document 1 Japanese Patent Laid-Open Publication No. 2007-327019

專利文獻2 日本特開2007-008996號公報 Patent Document 2 Japanese Patent Laid-Open Publication No. 2007-008996

專利文獻3 日本特開2010-229402號公報 Patent Document 3 Japanese Patent Laid-Open Publication No. 2010-229402

為了提高基板、金屬配線與密封劑的黏著性,有需要增加作為黏著促進劑之含環氧基的聚矽氧烷的環氧基含量。但是在使用較多這樣的黏著促進劑的情況下,有亮度降低之虞。 In order to improve the adhesion of the substrate, the metal wiring, and the sealant, it is necessary to increase the epoxy group content of the epoxy group-containing polyoxyalkylene as an adhesion promoter. However, in the case where a large amount of such an adhesion promoter is used, there is a possibility that the brightness is lowered.

本發明的課題在於提供一種硬化性組成物,其為氫矽烷系聚矽氧烷組成物,可形成能兼顧對基板或金屬配線等的黏著性和亮度的硬化物。 An object of the present invention is to provide a curable composition which is a hydroquinane-based polyoxane composition and which can form a cured product which can achieve adhesion to a substrate or a metal wiring or the like.

本發明為一種硬化性組成物,其為含有具有烯基及密接性基團的聚矽氧烷(A)、每1分子中至少具有兩個與矽原子結合的氫原子的聚矽氧烷(B)(但聚矽氧烷(A)除外)、及矽氫化反應用催化劑(C)的硬化性組成物,其特徵為以該硬化性組成物中所含之全部成分的含量合 計為100質量%時,聚矽氧烷(A)的含有比例為40~90質量%。 The present invention is a curable composition which is a polyoxyalkylene containing a polyoxyalkylene (A) having an alkenyl group and an adhesion group, and having at least two hydrogen atoms bonded to a halogen atom per molecule ( B) (except for the polyoxane (A)) and the curable composition of the catalyst for hydrogenation reaction (C), characterized in that the content of all the components contained in the curable composition is combined When the content is 100% by mass, the content of the polyoxyalkylene (A) is from 40 to 90% by mass.

在前述硬化性組成物中,以聚矽氧烷(A)中所含的全部Si原子的數目為100莫耳%時,較佳為聚矽氧烷(A)中烯基的含量3~50莫耳%,密接性基團的含量較佳為0.01~10莫耳%。 In the above curable composition, when the number of all Si atoms contained in the polyoxyalkylene (A) is 100 mol%, it is preferred that the polyoxyalkylene (A) has an alkenyl group content of 3 to 50. The content of the molar group is preferably 0.01 to 10 mol%.

前述硬化性組成物中,前述密接性基團較佳為具有環氧基的基團。 In the curable composition, the adhesion group is preferably a group having an epoxy group.

前述硬化性組成物中,前述聚矽氧烷(A)較佳為以下述化學式表示:(RViR1 2SiO1/2)a(R1 3SiO1/2)b(RViR1SiO2/2)c(REpR1SiO2/2)d(R1 2SiO2/2)e(R1SiO3/2)f(SiO4/2)h(XO1/2)i In the above curable composition, the polyoxyalkylene (A) is preferably represented by the following chemical formula: (R Vi R 1 2 SiO 1/2 ) a (R 1 3 SiO 1/2 ) b (R Vi R 1 SiO 2/2 ) c (R Ep R 1 SiO 2/2 ) d (R 1 2 SiO 2/2 ) e (R 1 SiO 3/2 ) f (SiO 4/2 ) h (XO 1/2 ) i

(式中,RVi表示具有烯基的基團。REp表示具有環氧基的基團。R1各自獨立地表示1價的烴基(但具有烯基的基團除外)。X表示氫原子或者碳原子數1至3的烷基。a表示0以上的整數、b表示0以上的整數、c表示0以上的整數、d表示1以上的整數、e表示0以上的整數、f表示0以上的整數、h表示0以上的整數。i表示0以上的整數。且a+c為1以上的整數)。 (wherein R Vi represents a group having an alkenyl group. R Ep represents a group having an epoxy group. R 1 each independently represents a monovalent hydrocarbon group (except for a group having an alkenyl group). X represents a hydrogen atom. Or an alkyl group having 1 to 3 carbon atoms. a represents an integer of 0 or more, b represents an integer of 0 or more, c represents an integer of 0 or more, d represents an integer of 1 or more, e represents an integer of 0 or more, and f represents 0 or more. An integer, h represents an integer of 0 or more, i represents an integer of 0 or more, and a+c is an integer of 1 or more).

在前述硬化性組成物中,聚矽氧烷(A)具有芳基,並且以聚矽氧烷(A)中所含的全部Si原子的數目為100莫耳%時,聚矽氧烷(A)中所含的芳基的含量較佳為30~120莫耳%。 In the aforementioned hardenable composition, the polyoxyalkylene (A) has an aryl group, and when the number of all Si atoms contained in the polyoxyalkylene (A) is 100 mol%, the polyoxyalkylene (A) The content of the aryl group contained in the ) is preferably from 30 to 120 mol%.

其他的發明為一種硬化物,其特徵為係由前述的硬化性組成物獲得。 Another invention is a cured product characterized by being obtained from the aforementioned curable composition.

另外,其他的發明為一種光半導體裝置,其特徵為具有半導體發光元件和覆蓋該半導體發光元件之前述的硬化物。 Further, another invention is an optical semiconductor device characterized by having a semiconductor light-emitting element and the aforementioned cured material covering the semiconductor light-emitting element.

另外,其他的發明為一種聚矽氧烷,係以下述化學式表示:(RViR1 2SiO1/2)a(R1 3SiO1/2)b(RViR1SiO2/2)c(REpR1SiO2/2)d(R1 2SiO2/2)e(R1SiO3/2)f(SiO4/2)h(XO1/2)i Further, another invention is a polyoxyalkylene which is represented by the following chemical formula: (R Vi R 1 2 SiO 1/2 ) a (R 1 3 SiO 1/2 ) b (R Vi R 1 SiO 2/2 ) c (R Ep R 1 SiO 2/2 ) d (R 1 2 SiO 2/2 ) e (R 1 SiO 3/2 ) f (SiO 4/2 ) h (XO 1/2 ) i

(式中,RVi表示具有烯基的基團。REp表示具有環氧基的基團。R1各自獨立地表示1價的烴基(但具有烯基的基團除外)。X表示氫原子或者碳原子數1至3的烷基。a表示0以上的整數、b表示0以上的整數、c表示0以上的整數、d表示1以上的整數、e表示0以上的整數、f表示0以上的整數、h表示0以上的整數。i表示0以上的整數。且a+c為1以上的整數)。 (wherein R Vi represents a group having an alkenyl group. R Ep represents a group having an epoxy group. R 1 each independently represents a monovalent hydrocarbon group (except for a group having an alkenyl group). X represents a hydrogen atom. Or an alkyl group having 1 to 3 carbon atoms. a represents an integer of 0 or more, b represents an integer of 0 or more, c represents an integer of 0 or more, d represents an integer of 1 or more, e represents an integer of 0 or more, and f represents 0 or more. An integer, h represents an integer of 0 or more, i represents an integer of 0 or more, and a+c is an integer of 1 or more).

本發明的硬化性組成物為氫矽烷系聚矽氧烷組成物,其可形成能兼顧對基板或金屬配線等的黏著性和亮度的硬化物。 The curable composition of the present invention is a hydroquinane-based polyoxane composition, which can form a cured product which can achieve adhesion to a substrate or a metal wiring or the like.

因此,以由該硬化性組成物獲得的硬化物覆蓋半導體發光元件而獲得之光半導體裝置,係為可靠性優異之光半導體裝置。 Therefore, the optical semiconductor device obtained by covering the semiconductor light-emitting device with the cured product obtained from the curable composition is an optical semiconductor device excellent in reliability.

1‧‧‧光半導體裝置 1‧‧‧Optical semiconductor device

2‧‧‧半導體發光元件 2‧‧‧Semiconductor light-emitting elements

3‧‧‧反射器 3‧‧‧ reflector

4‧‧‧密封材料 4‧‧‧ Sealing material

5‧‧‧顆粒 5‧‧‧ particles

6‧‧‧電極 6‧‧‧Electrode

7‧‧‧導線 7‧‧‧Wire

圖1所示為光半導體裝置的一個具體例子的模式圖。 Fig. 1 is a schematic view showing a specific example of an optical semiconductor device.

[實施發明之形態] [Formation of the Invention] <硬化性組成物> <Sclerosing composition>

本發明的硬化性組成物,其為含有具有烯基及密接性基團的聚矽氧烷(A)、每1分子中至少具有兩個與矽原子結合的氫原子的聚矽氧烷(B)(但聚矽氧烷(A)除外)、及矽氫化反應用催化劑(C)的硬化性組成物,其特徵為以該硬化性組成物中所含的全部成分的含量合計為100質量%時,聚矽氧烷(A)的含有比例為40~90質量%。 The curable composition of the present invention is a polysiloxane having a polyoxyalkylene (A) having an alkenyl group and an adhesion group, and a hydrogen atom having at least two hydrogen atoms bonded to a ruthenium atom per molecule (B) (a) the curable composition of the catalyst for hydrogenation reaction (C), and the total content of all the components contained in the curable composition is 100% by mass. In the case, the content of the polyoxyalkylene (A) is from 40 to 90% by mass.

另外,在本發明中「聚矽氧烷」是指具有結合有2個以上的矽氧烷單元(Si-O)之分子骨架的矽氧烷。 In the present invention, "polyoxyalkylene oxide" means a siloxane having a molecular skeleton in which two or more siloxane units (Si-O) are bonded.

[聚矽氧烷(A)] [polyoxane (A)]

聚矽氧烷(A)為具有烯基及密接性基團的聚矽氧烷。聚矽氧烷(A)為本組成物的主要成分,藉由與聚矽氧烷(B)的矽氫化反應而硬化,成為硬化物的主體。另外,聚矽氧烷(A)由於具有密接性基團,因此亦具有提高硬化物與LED封裝等之黏著性的功能。 The polyoxyalkylene (A) is a polyoxyalkylene having an alkenyl group and an adhesion group. The polyoxyalkylene (A) is a main component of the composition, and is hardened by hydrogenation reaction with polyhydrazine (B) to form a main body of the cured product. Further, since the polyoxyalkylene (A) has an adhesive group, it also has a function of improving the adhesion between the cured product and the LED package.

作為聚矽氧烷(A)所具有的烯基,例如可列舉乙烯基、烯丙基、丙烯基、異丙烯基、丁烯基、異丁烯基、戊烯基、庚烯基、己烯基以及環己烯基等。此等中較佳為乙烯基、烯丙基以及己烯基。 Examples of the alkenyl group of the polyoxyalkylene (A) include a vinyl group, an allyl group, a propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group, a pentenyl group, a heptenyl group, and a hexenyl group. Cyclohexenyl and the like. Preferred among these are vinyl, allyl and hexenyl.

聚矽氧烷(A)中烯基的含量,以聚矽氧烷(A)中所含的全部Si原子的數目為100莫耳%時,較佳為3~50莫耳%,更佳為5~40莫耳%,進一步更佳為10~30莫耳%。烯基的含量為前述範圍內時,聚矽氧烷(A)與聚矽氧烷(B)的矽氫化反應在適宜範圍引發,可獲得強度高的硬化物。 The content of the alkenyl group in the polyoxyalkylene (A) is preferably from 3 to 50 mol%, more preferably from 3 to 50 mol%, based on the total number of Si atoms contained in the polyoxyalkylene (A). 5 to 40% by mole, and further preferably 10 to 30% by mole. When the content of the alkenyl group is within the above range, the hydrazine hydrogenation reaction of the polyoxyalkylene oxide (A) and the polyoxyalkylene oxide (B) is initiated in a suitable range, and a cured product having high strength can be obtained.

前述密接性基團,係指對成為半導體裝置等的基材等材料之金屬或有機樹脂等,具有密接性的基團。 The adhesion-bonding group is a group having adhesion to a metal or an organic resin which is a material such as a substrate of a semiconductor device or the like.

作為聚矽氧烷(A)所具有的密接性基團,例如可列舉具有環氧基、亞硫醯基、異氰酸酯基、三烯丙基異氰酸酯基等的基團。 Examples of the adhesion group which the polysiloxane (A) has include a group having an epoxy group, a sulfinylene group, an isocyanate group, a triallyl isocyanate group, and the like.

此等中,由於難以阻礙在硬化性組成物硬化時引起的矽氫化反應,並且形成能高度兼顧對基板、金屬配線等的黏著性和亮度的硬化物,較佳為具有環氧基的基團。 In this case, it is difficult to prevent the hydrazine hydrogenation reaction caused by the curing of the curable composition, and to form a cured product having high adhesion to the substrate and the metal wiring, etc., and a group having an epoxy group is preferable. .

作為前述具有環氧基的基團,例如可列舉:環氧丙氧基,3-環氧丙氧基丙基等環氧丙氧基烷基,以及3,4-環氧環戊基、3,4-環氧環己基、2-(3,4-環氧環戊基)乙基、以及2-(3,4-環氧環己基)乙基等環氧環烷基等。作為前述具有環氧基的基團,具體可列舉以下述結構式(1)~(4)表示的基團。前述具有環氧基的基團為這樣的基團時,便可實現以毫米等級成型硬化物。 Examples of the group having an epoxy group include a glycidoxy group such as a glycidoxy group or a 3-glycidoxypropyl group, and a 3,4-epoxycyclopentyl group. An epoxycycloalkyl group such as 4-epoxycyclohexyl, 2-(3,4-epoxycyclopentyl)ethyl or 2-(3,4-epoxycyclohexyl)ethyl. Specific examples of the group having an epoxy group include groups represented by the following structural formulae (1) to (4). When the group having an epoxy group is such a group, the cured product can be formed in a millimeter order.

[結構式(1)中R2表示亞甲基或者2價的碳原子數2~10的直鏈狀伸烷基或者碳原子數3~10的支鏈狀伸烷基。] [R 2 in the structural formula (1) represents a methylene group or a divalent linear alkyl group having 2 to 10 carbon atoms or a branched alkyl group having 3 to 10 carbon atoms. ]

[結構式(2)中R3表示亞甲基或者2價的碳原子數2~10的直鏈狀伸烷基或者碳原子數3~10的支鏈狀伸烷基。] [In the structural formula (2), R 3 represents a methylene group or a divalent linear alkyl group having 2 to 10 carbon atoms or a branched alkyl group having 3 to 10 carbon atoms. ]

[結構式(3)中R4表示亞甲基或者2價的碳原子數2~10的直鏈狀伸烷基或者碳原子數3~10的支鏈狀伸烷基。] [R 4 in the structural formula (3) represents a methylene group or a divalent linear alkyl group having 2 to 10 carbon atoms or a branched alkyl group having 3 to 10 carbon atoms. ]

[結構式(4)中R5表示亞甲基或者2價的碳原子數2~10的直鏈狀伸烷基或者碳原子數3~10的支鏈狀伸烷基。] [R 5 in the structural formula (4) represents a methylene group or a divalent linear alkyl group having 2 to 10 carbon atoms or a branched alkyl group having 3 to 10 carbon atoms. ]

作為以結構式(1)表示的基團,具體可列舉2-(3,4-環氧環己基)乙基等。 Specific examples of the group represented by the structural formula (1) include 2-(3,4-epoxycyclohexyl)ethyl and the like.

作為以結構式(2)表示的基團,具體可列舉縮水甘油基等。 Specific examples of the group represented by the structural formula (2) include a glycidyl group and the like.

作為以結構式(3)表示的基團,具體可列舉3-環氧丙氧基丙基等。 Specific examples of the group represented by the structural formula (3) include 3-glycidoxypropyl group and the like.

作為以結構式(4)表示的基團,具體可列舉2-(4-甲基-3,4-環氧環己基)乙基等。 Specific examples of the group represented by the structural formula (4) include 2-(4-methyl-3,4-epoxycyclohexyl)ethyl and the like.

聚矽氧烷(A)中的密接性基團的含量,以聚矽氧烷(A)中所含之全部Si原子的數目為100莫耳%時,較佳為0.01~10莫耳%,更佳為0.05~5莫耳%,進一步更佳為0.05~3莫耳%。密接性基團的含量為前述範圍內時,可獲得由本組成物所獲得之硬化物與LED封裝等之間高黏著性以及亮度高的硬化膜。 The content of the adhesion group in the polyoxyalkylene (A) is preferably 0.01 to 10 mol% when the number of all Si atoms contained in the polyoxyalkylene (A) is 100 mol%. More preferably, it is 0.05 to 5 mol%, and further preferably 0.05 to 3 mol%. When the content of the adhesion group is within the above range, a cured film having high adhesion and high brightness between the cured product obtained from the composition and the LED package can be obtained.

本發明的硬化性組成物中所含的聚矽氧烷(A)的含量,以本組成物中所含的全部成分的含量的合計為100質量%時為40~90質量%,較佳為50~85質量%,更佳為65~85質量%。 The content of the polysiloxane (A) contained in the curable composition of the present invention is preferably from 40 to 90% by mass based on 100% by mass of the total of all the components contained in the composition. 50 to 85% by mass, more preferably 65 to 85% by mass.

在以往的氫矽烷系聚矽氧烷組成物中,為了提高黏著性,除了作為主劑的聚矽氧烷,另外添加相對於組成物全體0.01~20質量%左右的作為黏著促進劑之含環氧基的聚矽氧烷。相對於此,在本發明的硬化性組成物中,將含環氧基的聚矽氧烷之聚矽氧烷(A)作為主劑,其含量如前述那樣為40~90質量%。聚矽氧烷(A)的含量為前述範圍時,由本組成物所獲得的硬化物,具有對基板或金屬配線等的高黏著性,且在作為LED等密封材料使用的情況下維持LED等之高的初期亮度。 In the conventional hydroquinone-based polyoxane composition, in order to improve the adhesiveness, a polyoxynitane as a main component is added in an amount of about 0.01 to 20% by mass based on the total amount of the composition as an adhesion promoter. Alkoxy polyoxyalkylene. On the other hand, in the curable composition of the present invention, the polyoxyalkylene oxide (A) containing an epoxy group-containing polyoxyalkylene is used as a main component, and the content thereof is 40 to 90% by mass as described above. When the content of the polyoxyalkylene (A) is in the above range, the cured product obtained from the composition has high adhesion to a substrate or a metal wiring, and the LED or the like is maintained when used as a sealing material such as an LED. High initial brightness.

另外,聚矽氧烷(A)較佳為具有芳基。聚矽氧烷(A)具有芳基時,則表現出在作為LED密封材料使用 時可獲得高亮度之特性。以聚矽氧烷(A)中所含的全部Si原子的數目為100莫耳%時,聚矽氧烷(A)中所含的芳基的含量較佳為30~120莫耳%,更佳為50~110莫耳%,進一步更佳為70~100莫耳%。芳基的含量在30~120莫耳%的範圍內時,可從本組成物獲得亮度高、並且折射率高的硬化膜。作為前述芳基,可列舉苯基、甲苯基、二甲苯基、萘基等。 Further, the polyoxyalkylene (A) preferably has an aryl group. When the polyoxyalkylene (A) has an aryl group, it is used as an LED sealing material. High brightness characteristics are obtained. When the number of all Si atoms contained in the polyoxyalkylene (A) is 100 mol%, the content of the aryl group contained in the polyoxyalkylene (A) is preferably from 30 to 120 mol%, more preferably Good is 50~110%, and further better is 70~100%. When the content of the aryl group is in the range of 30 to 120 mol%, a cured film having high luminance and high refractive index can be obtained from the composition. Examples of the aryl group include a phenyl group, a tolyl group, a xylyl group, and a naphthyl group.

聚矽氧烷(A)之藉由凝膠滲透層析法測定的聚苯乙烯換算的重量平均分子量較佳在100~50000的範圍,更佳在500~5000的範圍。若聚矽氧烷(A)的重量平均分子量在前述範圍內,則在使用本組成物製造密封材料時容易處理,另外由本組成物獲得的硬化物具有作為光半導體密封材料之充分的材料強度及特性。 The polystyrene-equivalent weight average molecular weight measured by gel permeation chromatography of polyoxyalkylene (A) is preferably in the range of from 100 to 50,000, more preferably in the range of from 500 to 5,000. When the weight average molecular weight of the polyoxyalkylene (A) is within the above range, it is easy to handle when the sealing material is produced using the composition, and the cured product obtained from the composition has sufficient material strength as an optical semiconductor sealing material and characteristic.

作為聚矽氧烷(A),可列舉以下述化學式(1)表示的聚矽氧烷: [化學式(1)] (RViR1 2SiO1/2)a(R1 3SiO1/2)b(RViR1SiO2/2)c(RAdR1SiO2/2)d(R1 2SiO2/2)e(R1SiO3/2)f(RAdSiO3/2)g(SiO4/2)h(XO1/2)i Examples of the polyoxyalkylene oxide (A) include polyoxyalkylene represented by the following chemical formula (1): [Chemical Formula (1)] (R Vi R 1 2 SiO 1/2 ) a (R 1 3 SiO 1/2 b (R Vi R 1 SiO 2/2 ) c (R Ad R 1 SiO 2/2 ) d (R 1 2 SiO 2/2 ) e (R 1 SiO 3/2 ) f (R Ad SiO 3/2 ) g (SiO 4/2 ) h (XO 1/2 ) i

(式中,RVi表示具有烯基的基團。RAd表示具有密接性基團的基團。R1各自獨立地表示1價的烴基(但具有烯基的基團除外)。X表示氫原子或者碳原子數1至3的烷基。a表示0以上的整數、b表示0以上的整數、c表示0以上的整數、d表示0以上的整數、e表示0以上的整數、f表示0以上的整數、g表示0以上的整數、h表示0以上的整數。i表示0以上的整數。且a+c為1以上的整數。d+g為1以上的整數)。 (wherein R Vi represents a group having an alkenyl group. R Ad represents a group having an adhesion group. R 1 each independently represents a monovalent hydrocarbon group (except for a group having an alkenyl group). X represents hydrogen An atom or an alkyl group having 1 to 3 carbon atoms. a represents an integer of 0 or more, b represents an integer of 0 or more, c represents an integer of 0 or more, d represents an integer of 0 or more, e represents an integer of 0 or more, and f represents 0. The above integer, g represents an integer of 0 or more, h represents an integer of 0 or more, i represents an integer of 0 or more, and a+c is an integer of 1 or more. d+g is an integer of 1 or more).

相對於a、b、c、d、e、f、g、h以及i的合計,a的比例,使前述合計為100%時,較佳為0%以上60%以下,更佳為5%以上40%以下。b的比例較佳為0%以上50%以下,更佳為0%以上20%以下。c的比例較佳為0%以上30%以下,更佳為0%以上20%以下。d的比例較佳為0%以上10%以下,更佳為0%以上5%以下。e的比例較佳為0%以上50%以下,更佳為0%以上30%以下。f的比例較佳為20%以上90%以下,更佳為40%以上80%以下。g的比例較佳為0%以上10%以下,更佳為0%以上5%以下。h的比例較佳為0%以上50%以下,更佳為0%以上30%以下。i的比例較佳為0%以上10%以下,更佳為0%以上5%以下。且a+c的比例大於0%,d+g的比例大於0%。 With respect to the total of a, b, c, d, e, f, g, h, and i, the ratio of a is preferably 0% or more and 60% or less, more preferably 5% or more, when the total amount is 100%. 40% or less. The ratio of b is preferably 0% or more and 50% or less, more preferably 0% or more and 20% or less. The ratio of c is preferably 0% or more and 30% or less, more preferably 0% or more and 20% or less. The ratio of d is preferably 0% or more and 10% or less, more preferably 0% or more and 5% or less. The ratio of e is preferably 0% or more and 50% or less, more preferably 0% or more and 30% or less. The ratio of f is preferably 20% or more and 90% or less, more preferably 40% or more and 80% or less. The ratio of g is preferably 0% or more and 10% or less, more preferably 0% or more and 5% or less. The ratio of h is preferably 0% or more and 50% or less, more preferably 0% or more and 30% or less. The ratio of i is preferably 0% or more and 10% or less, more preferably 0% or more and 5% or less. And the ratio of a+c is greater than 0%, and the ratio of d+g is greater than 0%.

以化學式(1)所示的聚矽氧烷之中,以下述化學式(2)所示的聚矽氧烷係形成能高度兼顧對基板、金屬配線等的黏著性和亮度的硬化物,而較佳。 Among the polyoxanes represented by the chemical formula (1), a polyoxyalkylene represented by the following chemical formula (2) is used to form a cured product which can achieve a high degree of adhesion to a substrate, a metal wiring or the like, and a cured product. good.

[化學式(2)](RViR1 2SiO1/2)a(R1 3SiO1/2)b(RViR1SiO2/2)c(REpR1SiO2/2)d(R1 2SiO2/2)e(R1SiO3/2)f(SiO4/2)h(XO1/2)i [Chemical Formula (2)] (R Vi R 1 2 SiO 1/2 ) a (R 1 3 SiO 1/2 ) b (R Vi R 1 SiO 2/2 ) c (R Ep R 1 SiO 2/2 ) d (R 1 2 SiO 2/2 ) e (R 1 SiO 3/2 ) f (SiO 4 / 2 ) h (XO 1/2 ) i

(式中,RVi表示具有烯基的基團。REp表示具有環氧基的基團。R1各自獨立地表示1價的烴基(但具有烯基的基團除外)。X表示氫原子或者碳原子數1至3的烷基。a表示0以上的整數、b表示0以上的整數、c表示0以上的整數、d表示1以上的整數、e表示0以上的整數、f表示0以上的整數、h表示0以上的整數。i表示0以上的整數。且a+c為1以上的整數) (wherein R Vi represents a group having an alkenyl group. R Ep represents a group having an epoxy group. R 1 each independently represents a monovalent hydrocarbon group (except for a group having an alkenyl group). X represents a hydrogen atom. Or an alkyl group having 1 to 3 carbon atoms. a represents an integer of 0 or more, b represents an integer of 0 or more, c represents an integer of 0 or more, d represents an integer of 1 or more, e represents an integer of 0 or more, and f represents 0 or more. An integer, h represents an integer of 0 or more, i represents an integer of 0 or more, and a+c is an integer of 1 or more)

作為具有烯基的基團,例示與上述之具有烯基的基團相同的基團。作為具有密接性基團的基團,例示具有與上述之密接性基團相同之基團的基團。作為具有環氧基的基團,例示與上述之具有環氧基的基團相同的基團。作為1價的烴基,例示甲基、乙基、丙基、丁基、戊基、己基、庚基等烷基;苯基、甲苯基、二甲苯基、萘基等芳基;苄基、苯乙基等芳烷基;氯甲基、3-氯丙基、3,3,3-三氟丙基、九氟丁基乙基等取代烷基。 As the group having an alkenyl group, the same group as the above-mentioned group having an alkenyl group is exemplified. As the group having an adhesion group, a group having the same group as the above-mentioned adhesion group is exemplified. As the group having an epoxy group, the same group as the above-mentioned group having an epoxy group is exemplified. Examples of the monovalent hydrocarbon group include an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group or a heptyl group; an aryl group such as a phenyl group, a tolyl group, a xylyl group or a naphthyl group; a benzyl group and a benzene group; An aralkyl group such as ethyl; a substituted alkyl group such as chloromethyl, 3-chloropropyl, 3,3,3-trifluoropropyl or nonafluorobutylethyl.

作為聚矽氧烷(A)的製造方法,可列舉:日本特開平6-9659號公報、日本特開2003-183582號公報、日本特開2007-008996號公報、日本特開2007-106798號公報、日本特開2007-169427號公報以及日本特開2010-059359號公報等中記載之周知的方法,例如,將成為各單元來源的氯矽烷、烷氧基矽烷共水解的方法,通過鹼金屬催化劑等將共水解物平衡化反應的方法等。 For example, Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. A well-known method described in, for example, Japanese Laid-Open Patent Publication No. 2010- 059427, and the like, for example, a method of co-hydrolyzing a chlorodecane or an alkoxy decane derived from each unit, through an alkali metal catalyst A method of equalizing a cohydrolyzate, etc.

藉由使用這樣的聚矽氧烷,由本案之硬化性組成物獲得的硬化物可獲得必需的強度,表現與金屬或有機樹脂膜的密接性,而且也表現在作為LED密封材料使用時可獲得高亮度之特性。 By using such a polyoxyalkylene, the cured product obtained from the curable composition of the present invention can obtain the necessary strength, exhibits adhesion to a metal or organic resin film, and is also obtained when used as an LED sealing material. High brightness characteristics.

[聚矽氧烷(B)] [polyoxane (B)]

聚矽氧烷(B)係為每1分子至少具有兩個與矽原子結合之氫原子的聚矽氧烷(但聚矽氧烷(A)除外)。即聚矽氧烷(B)其每1分子至少具有兩個的Si-H基(氫矽烷基)。聚矽氧烷(B)為對於聚矽氧烷(A)之交聯劑,藉由與聚矽氧烷(A)的矽氫化反應而形成硬化物。 The polyoxyalkylene (B) is a polyoxyalkylene having at least two hydrogen atoms bonded to a halogen atom per molecule (except for polyoxyalkylene (A)). That is, the polyoxyalkylene (B) has at least two Si-H groups (hydroalkylene groups) per molecule. The polyoxyalkylene (B) is a crosslinking agent for polyoxyalkylene (A), which is formed by hydrogenation with hydrazine of polyoxyalkylene (A) to form a cured product.

作為聚矽氧烷(B),若是在以往的氫矽烷系聚矽氧烷組成物作為交聯劑使用之的、每1分子至少具有兩個與矽原子結合之氫原子的聚矽氧烷,則可不受特別限制地使用。 The polyoxyalkylene (B) is a polysiloxane having at least two hydrogen atoms bonded to a ruthenium atom per molecule, which is used as a crosslinking agent in a conventional hydrooxane-based polyoxane composition. It can be used without particular limitation.

作為聚矽氧烷(B)的具體例子,可列舉專利文獻1~3所記載的有機氫化聚矽氧烷等。 Specific examples of the polyoxyalkylene oxide (B) include organic hydrogenated polyoxyalkylenes described in Patent Documents 1 to 3.

聚矽氧烷(B)例如可藉由周知的方法使苯基三甲氧基矽烷、二苯基二甲氧基矽烷等烷氧基矽烷與1,1,3,3-四甲基二矽氧烷等氫化矽氧烷反應而獲得。 The polyoxyalkylene (B) can be, for example, alkoxydecane such as phenyltrimethoxydecane or diphenyldimethoxydecane and 1,1,3,3-tetramethyldioxane by a known method. Obtained by reacting a hydrogenated oxane such as an alkane.

作為本發明的硬化性組成物中聚矽氧烷(B)的含量,相對於聚矽氧烷(A)中的烯基量,聚矽氧烷(B)中的與矽原子結合之氫原子量的莫耳比較佳為0.1~5的量,更佳為0.5~2的量,進一步更佳為0.7~1.4的量。如果聚矽氧烷(B)的含量在前述範圍內,那麼組成物的硬化充分進行,另外所獲得的硬化物可獲得充分的耐熱性。 As the content of the polyoxyalkylene (B) in the curable composition of the present invention, the amount of hydrogen atoms bonded to the ruthenium atom in the polysiloxane (B) relative to the amount of the alkenyl group in the polyoxyalkylene (A) The molar amount is preferably from 0.1 to 5, more preferably from 0.5 to 2, still more preferably from 0.7 to 1.4. If the content of the polyoxyalkylene (B) is within the above range, the hardening of the composition proceeds sufficiently, and the obtained cured product can obtain sufficient heat resistance.

[矽氫化反應用催化劑(C)] [矽 Catalyst for hydrogenation reaction (C)]

矽氫化反應用催化劑(C),係為聚矽氧烷(A)與聚矽氧烷(B)之矽氫化反應的催化劑。 The catalyst for hydrogenation reaction (C) is a catalyst for hydrogenation of a polyfluorene oxide (A) with a polyoxane (B).

作為矽氫化反應用催化劑(C),若是在以往的氫矽烷系聚矽氧烷組成物作為矽氫化反應用催化劑使用的催化劑,則可不受特別限制地使用。 The catalyst for the hydrogenation reaction (C) is not particularly limited as long as it is a catalyst used in the conventional hydroquinone-based polyoxane composition as a catalyst for the hydrogenation reaction.

作為矽氫化反應用催化劑(C)的具體例子,可列舉鉑系催化劑、銠系催化劑、鈀系催化劑。從促進本組成物的硬化的觀點來看,此等中較佳為鉑系催化劑。作為鉑系催化劑,例如可列舉鉑-烯基矽氧烷錯合物等。 作為烯基矽氧烷,例如可列舉1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷、1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷等。特別是從錯合物的安定性的觀點來看,較佳為1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷。 Specific examples of the catalyst (C) for the hydrogenation reaction include a platinum catalyst, a rhodium catalyst, and a palladium catalyst. From the viewpoint of promoting the hardening of the present composition, among these, a platinum-based catalyst is preferred. Examples of the platinum-based catalyst include a platinum-alkenyl alkane complex and the like. Examples of the alkenyl alkane include 1,3-divinyl-1,1,3,3-tetramethyldioxane and 1,3,5,7-tetramethyl-1,3. 5,7-tetravinylcyclotetraoxane, and the like. In particular, from the viewpoint of the stability of the complex, 1,3-divinyl-1,1,3,3-tetramethyldioxane is preferred.

本發明之硬化性組成物中的矽氫化反應用催化劑(C),使用使聚矽氧烷(A)與聚矽氧烷(B)之矽氫化反應現實地進行的量。 The catalyst (C) for the hydrogenation reaction of the hydrazine in the curable composition of the present invention is an amount which is practically carried out by hydrogenating a polyfluorene oxide (A) and a polyoxyalkylene (B).

本發明的硬化性組成物,限於達成本發明之目的,除了前述成分以外,因應需要可含有例如,氣相二氧化矽、石英粉末等的微粒狀矽石;氧化鈦、氧化鋅等的無機填充劑;環-四甲基四乙烯基四矽氧烷等的延遲劑;二苯基雙(二甲基乙烯基矽烷氧基)矽烷、苯基三(二甲基乙烯基矽烷氧基)矽烷等稀釋劑;顏料;阻燃劑;耐熱劑;抗氧化劑等。 The curable composition of the present invention is limited to the object of the present invention, and may contain, in addition to the above-mentioned components, particulate vermiculite such as gas phase ceria or quartz powder, or inorganic filler such as titanium oxide or zinc oxide. Retardant such as cyclo-tetramethyltetravinyltetraoxane; diphenyl bis(dimethylvinyl decyloxy) decane, phenyl tris(dimethyl vinyl decyloxy) decane, etc. Thinner; pigment; flame retardant; heat resistant agent; antioxidant.

本發明的硬化性組成物,可藉由混合機等周知的方法將前述各成分均勻混合而製備。 The curable composition of the present invention can be prepared by uniformly mixing the above components by a known method such as a mixer.

本發明的硬化性組成物之25℃下的黏度,較佳為1~1000000mPa.s,更佳為10~10000mPa.s。黏度在此範圍內時,本組成物的操作性提高。 The viscosity of the curable composition of the present invention at 25 ° C is preferably from 1 to 1,000,000 mPa. s, more preferably 10~10000mPa. s. When the viscosity is within this range, the handleability of the composition is improved.

本發明的硬化性組成物,可製備為單劑,也可分製為雙劑、而在使用時混合雙劑使用。也可因應需要而少量添加乙炔醇等硬化抑制劑。 The curable composition of the present invention can be prepared as a single dose, or can be divided into two doses, and used in combination at the time of use. A hardening inhibitor such as acetylene alcohol may also be added in small amounts as needed.

<硬化物> <hardened matter>

藉由使本發明的硬化性組成物硬化可獲得硬化物。藉由本發明的硬化性組成物將半導體元件密封,使其硬化,則可獲得密封材料之硬化物。 A cured product can be obtained by hardening the curable composition of the present invention. When the semiconductor element is sealed and hardened by the curable composition of the present invention, a cured product of the sealing material can be obtained.

作為使本發明的硬化性組成物硬化的方法,例如可列舉:將硬化性組成物塗布於基板上後,以100~180℃加熱1~13小時的方法等。 The method of curing the curable composition of the present invention is, for example, a method in which the curable composition is applied onto a substrate and then heated at 100 to 180 ° C for 1 to 13 hours.

如前述,將本發明之硬化性組成物硬化而獲得的硬化物,對基板或金屬配線等的黏著性高,並且實現LED等之高初期亮度。 As described above, the cured product obtained by curing the curable composition of the present invention has high adhesion to a substrate or a metal wiring or the like, and achieves high initial brightness of an LED or the like.

<光半導體裝置> <Optical semiconductor device>

本發明的光半導體裝置,具有半導體發光元件和覆蓋該半導體發光元件的前述硬化物。本發明的光半導體裝置,通過將前述硬化性組成物覆蓋於半導體發光元件,使該組成物硬化而獲得。使硬化性組成物硬化的方法如上述。 An optical semiconductor device according to the present invention includes a semiconductor light emitting element and the cured material covering the semiconductor light emitting element. The optical semiconductor device of the present invention is obtained by coating the curable composition on a semiconductor light-emitting device and curing the composition. The method of hardening the curable composition is as described above.

作為光半導體裝置,可列舉LED(Light Emitting Diode,發光二極體)及LD(Laser Diode,雷射二極體)等。 Examples of the optical semiconductor device include an LED (Light Emitting Diode) and an LD (Laser Diode).

圖1為本發明的光半導體裝置的一個具體例子的模式圖。光半導體裝置1具有電極6、設置於電極6上並藉由導線7與電極6以電連接的半導體發光元件2、以收納半導體發光元件2的方式而配置的反射器3、以及填充於反射器3而將半導體發光元件2密封的密封材料4。密封材料4係硬化本發明的硬化性組成物而獲得。密封材料4中分散有矽石、螢光體等的顆粒5。 Fig. 1 is a schematic view showing a specific example of an optical semiconductor device of the present invention. The optical semiconductor device 1 includes an electrode 6, a semiconductor light-emitting element 2 that is electrically connected to the electrode 6 and is electrically connected to the electrode 6 by a wire 7, and a reflector 3 that is disposed to house the semiconductor light-emitting device 2, and is filled in the reflector. 3 is a sealing material 4 that seals the semiconductor light emitting element 2. The sealing material 4 is obtained by hardening the curable composition of the present invention. Particles 5 such as vermiculite, phosphor, and the like are dispersed in the sealing material 4.

如前述,將本發明的硬化性組成物硬化而獲得的密封材料,由於對反射器之材料的有機樹脂膜或電極之材料的金屬等之黏接力強,而即使在受到熱循環的 情況,密封材料也不會從LED封裝剝落。另外,前述密封材料維持LED等之高的初期亮度。即,可實現兼顧高的黏著性與高的初期亮度。 As described above, the sealing material obtained by curing the curable composition of the present invention has a strong adhesion to the organic resin film of the material of the reflector or the metal of the electrode material, and is even subjected to thermal cycling. In this case, the sealing material will not peel off from the LED package. Further, the sealing material maintains a high initial luminance of the LED or the like. That is, it is possible to achieve both high adhesion and high initial brightness.

[實施例] [Examples] (1)聚矽氧烷的合成 (1) Synthesis of polyoxyalkylene oxide (1-1)聚矽氧烷的合成 (1-1) Synthesis of polyoxyalkylene oxide [合成例1]聚矽氧烷(AR1)的合成 [Synthesis Example 1] Synthesis of polyoxyalkylene (AR1)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷82g、苯基三甲氧基矽烷525g、水143g、三氟甲磺酸0.4g以及甲苯500g,加熱回流1小時。冷卻後,分離去除下層,水洗上層的甲苯溶液層。在水洗後的甲苯溶液層中加入氫氧化鉀0.4g,一邊從水分離管去除水一邊回流。水的去除結束後,濃縮至固體成分濃度為75質量%,再回流5小時。冷卻後,投入乙酸0.6g中和後,水洗過濾而獲得的甲苯溶液。其後,進行減壓濃縮而獲得聚矽氧烷(AR1)。以凝膠滲透層析法測定了(AR1)的聚苯乙烯換算重量平均分子量,為2000。聚矽氧烷(AR1)的化學式為(ViMe2SiO1/2)25(PhSiO3/2)75(Vi表示乙烯基、Me表示甲基、Ph表示苯基。下標數字表示mol%)。 Into a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, charged and mixed 1,3-divinyl-1,1,3,3-tetramethyldioxane 82g, phenyltrimethoxy 525 g of decane, 143 g of water, 0.4 g of trifluoromethanesulfonic acid and 500 g of toluene were heated under reflux for 1 hour. After cooling, the lower layer was separated and washed, and the upper layer of the toluene solution was washed with water. 0.4 g of potassium hydroxide was added to the toluene solution layer after washing with water, and the water was refluxed while removing water from the water separation tube. After the removal of water was completed, the mixture was concentrated to a solid concentration of 75 mass%, and refluxed for 5 hours. After cooling, the mixture was neutralized with 0.6 g of acetic acid, and the toluene solution obtained by filtration was washed with water. Thereafter, concentration under reduced pressure was carried out to obtain polyoxyalkylene (AR1). The polystyrene-equivalent weight average molecular weight of (AR1) was measured by gel permeation chromatography to be 2,000. The chemical formula of polyoxyalkylene (AR1) is (ViMe 2 SiO 1/2 ) 25 (PhSiO 3/2 ) 75 (Vi represents a vinyl group, Me represents a methyl group, and Ph represents a phenyl group. The subscript number represents mol%).

[合成例2]聚矽氧烷(A1)的合成 [Synthesis Example 2] Synthesis of polyoxyalkylene (A1)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷82g、水143g、苯基三甲氧基矽烷521g、三氟甲磺酸 0.4g以及甲苯500g,加熱回流1小時。冷卻後,分離去除下層,水洗上層的甲苯溶液層。在水洗後的甲苯溶液層中加入3-環氧丙氧基丙基甲基二甲氧基矽烷4g和氫氧化鉀0.5g並加熱回流1小時。接著,將甲醇蒸餾去除,以共沸脫水去除過量的水。接著加熱回流4小時。反應後的甲苯溶液在冷卻後,以乙酸0.6g中和並水洗。去除水後,在減壓下將甲苯蒸餾去除濃縮而獲得了具有烯基25莫耳%以及環氧基0.5莫耳%(以聚矽氧烷中所含的全部Si原子的數目為100莫耳%)的聚矽氧烷(A1)。以凝膠滲透層析法測定了(A1)的聚苯乙烯換算重量平均分子量,為2000。聚矽氧烷(A1)的化學式為(ViMe2SiO1/2)25(PhSiO3/2)74.5(EpMeSiO2/2)0.5(Vi表示乙烯基、Me表示甲基、Ph表示苯基、Ep表示環氧丙氧基丙基。下標數字表示mol%)。以聚矽氧烷(A1)中所含的全部Si原子的數目為100莫耳%時,烯基的含有比例為25mol%,環氧基的含有比例為0.5mol%,芳基的含有比例為74.5mol%。 Into a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, 82 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane, 143 g of water, and benzene were charged and mixed. 521 g of methoxymethoxysilane, 0.4 g of trifluoromethanesulfonic acid and 500 g of toluene were heated under reflux for 1 hour. After cooling, the lower layer was separated and washed, and the upper layer of the toluene solution was washed with water. To the toluene solution layer after washing with water, 4 g of 3-glycidoxypropylmethyldimethoxydecane and 0.5 g of potassium hydroxide were added and heated under reflux for 1 hour. Next, the methanol was distilled off, and excess water was removed by azeotropic dehydration. It was then heated to reflux for 4 hours. The toluene solution after the reaction was cooled, neutralized with 0.6 g of acetic acid and washed with water. After removing water, the toluene was distilled off under reduced pressure to obtain a molar ratio of 25 mol% of an alkenyl group and 0.5 mol% of an epoxy group (the number of all Si atoms contained in the polysiloxane was 100 mol). %) polyoxyalkylene (A1). The polystyrene-equivalent weight average molecular weight of (A1) was determined by gel permeation chromatography to be 2,000. The chemical formula of polyoxyalkylene (A1) is (ViMe 2 SiO 1/2 ) 25 (PhSiO 3/2 ) 74.5 (EpMeSiO 2/2 ) 0.5 (Vi represents vinyl, Me represents methyl, Ph represents phenyl, Ep Represents a glycidoxypropyl group. The subscript number indicates mol%). When the number of all Si atoms contained in the polyoxyalkylene (A1) is 100 mol%, the content ratio of the alkenyl group is 25 mol%, the content ratio of the epoxy group is 0.5 mol%, and the content ratio of the aryl group is 74.5 mol%.

[合成例3]聚矽氧烷(A2)的合成 [Synthesis Example 3] Synthesis of polyoxyalkylene (A2)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷82g、苯基三甲氧基矽烷518g、水143g、三氟甲磺酸0.4g以及甲苯500g,加熱回流1小時。冷卻後,分離去除下層,水洗上層的甲苯溶液層。在水洗後的甲苯溶液層中加入3-環氧丙氧基丙基甲基二甲氧基矽烷8g和氫 氧化鉀0.5g並加熱回流1小時。接著,將甲醇蒸餾去除,以共沸脫水去除過量的水。接著加熱回流4小時。反應後的甲苯溶液在冷卻後,用乙酸0.6g中和並水洗。去除水後,在減壓下將甲苯蒸餾去除濃縮而獲得了具有烯基25莫耳%以及環氧基1莫耳%(以聚矽氧烷中所含的全部Si原子的數目為100莫耳%)的聚矽氧烷(A2)。以凝膠滲透層析法測定了(A2)的聚苯乙烯換算重量平均分子量,為2000。聚矽氧烷(A2)的化學式為(ViMe2SiO1/2)25(PhSiO3/2)74(EpMeSiO2/2)1(Vi表示乙烯基、Me表示甲基、Ph表示苯基、Ep表示環氧丙氧基丙基。下標數字表示mol%)。以聚矽氧烷(A2)中所含的全部Si原子的數目為100莫耳%時,烯基的含有比例為25mol%,環氧基的含有比例為1mol%,芳基的含有比例為74mol%。 Into a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, charged and mixed 1,3-divinyl-1,1,3,3-tetramethyldioxane 82g, phenyltrimethoxy 518 g of decane, 143 g of water, 0.4 g of trifluoromethanesulfonic acid and 500 g of toluene were heated under reflux for 1 hour. After cooling, the lower layer was separated and washed, and the upper layer of the toluene solution was washed with water. To the toluene solution layer after washing with water, 8 g of 3-glycidoxypropylmethyldimethoxydecane and 0.5 g of potassium hydroxide were added and heated under reflux for 1 hour. Next, the methanol was distilled off, and excess water was removed by azeotropic dehydration. It was then heated to reflux for 4 hours. The toluene solution after the reaction was cooled, neutralized with 0.6 g of acetic acid and washed with water. After removing water, the toluene was distilled off under reduced pressure to obtain a molar ratio of 25 mol% of an alkenyl group and 1 mol% of an epoxy group (the number of all Si atoms contained in the polyoxyalkylene was 100 mol. %) polyoxyalkylene (A2). The polystyrene-equivalent weight average molecular weight of (A2) was measured by gel permeation chromatography to be 2,000. The chemical formula of polyoxyalkylene (A2) is (ViMe 2 SiO 1/2 ) 25 (PhSiO 3/2 ) 74 (EpMeSiO 2/2 ) 1 (Vi represents vinyl, Me represents methyl, Ph represents phenyl, Ep Represents a glycidoxypropyl group. The subscript number indicates mol%). When the number of all Si atoms contained in the polyoxyalkylene (A2) is 100 mol%, the content ratio of the alkenyl group is 25 mol%, the content ratio of the epoxy group is 1 mol%, and the content ratio of the aryl group is 74 mol. %.

[合成例4]聚矽氧烷(A3)的合成 [Synthesis Example 4] Synthesis of polyoxyalkylene (A3)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷82g、苯基三甲氧基矽烷511g、水143g、三氟甲磺酸0.4g以及甲苯500g,加熱回流1小時。冷卻後,分離去除下層,水洗上層的甲苯溶液層。在水洗後的甲苯溶液層中加入3-環氧丙氧基丙基甲基二甲氧基矽烷16g和30g和氫氧化鉀0.5g並加熱回流1小時。接著,將甲醇蒸餾去除,以共沸脫水去除過量的水。接著加熱回流4小時。反應後的甲苯溶液在冷卻後,用乙酸0.6g中和並 水洗。去除水後,在減壓下將甲苯蒸餾去除濃縮,獲得具有烯基25莫耳%以及環氧基2莫耳%(以聚矽氧烷中所含的全部Si原子的數目為100莫耳%)的聚矽氧烷(A3)。以凝膠滲透層析法測定了(A3)的聚苯乙烯換算重量平均分子量,為2000。聚矽氧烷(A3)的化學式為(ViMe2SiO1/2)25(PhSiO3/2)73(EpMeSiO2/2)2(Vi表示乙烯基、Me表示甲基、Ph表示苯基、Ep表示環氧丙氧基丙基。下標數字表示mol%)。以聚矽氧烷(A3)中所含的全部Si原子的數目為100莫耳%時,烯基的含有比例為25mol%,環氧基的含有比例為2mol%,芳基的含有比例為73mol%。 Into a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, charged and mixed 1,3-divinyl-1,1,3,3-tetramethyldioxane 82g, phenyltrimethoxy 511 g of decane, 143 g of water, 0.4 g of trifluoromethanesulfonic acid, and 500 g of toluene were heated under reflux for 1 hour. After cooling, the lower layer was separated and washed, and the upper layer of the toluene solution was washed with water. To the toluene solution layer after water washing, 16 g of 3-glycidoxypropylmethyldimethoxydecane and 30 g of potassium hydroxide and 0.5 g of potassium hydroxide were added and heated under reflux for 1 hour. Next, the methanol was distilled off, and excess water was removed by azeotropic dehydration. It was then heated to reflux for 4 hours. The toluene solution after the reaction was cooled, neutralized with 0.6 g of acetic acid and washed with water. After removing water, the toluene was distilled off under reduced pressure to concentrate to obtain an alkenyl group of 25 mol% and an epoxy group of 2 mol% (the number of all Si atoms contained in the polyoxyalkylene was 100 mol%). Polyoxyalkylene (A3). The polystyrene-equivalent weight average molecular weight of (A3) was determined by gel permeation chromatography to be 2,000. The chemical formula of polyoxyalkylene (A3) is (ViMe 2 SiO 1/2 ) 25 (PhSiO 3/2 ) 73 (EpMeSiO 2/2 ) 2 (Vi represents vinyl, Me represents methyl, Ph represents phenyl, Ep Represents a glycidoxypropyl group. The subscript number indicates mol%). When the number of all Si atoms contained in the polyoxyalkylene (A3) is 100 mol%, the content ratio of the alkenyl group is 25 mol%, the content ratio of the epoxy group is 2 mol%, and the content ratio of the aryl group is 73 mol. %.

[合成例5]聚矽氧烷(A4)的合成 [Synthesis Example 5] Synthesis of polyoxyalkylene (A4)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷49g、苯基三甲氧基矽烷442g、二甲基二甲氧基矽烷85g、水143g、三氟甲磺酸0.4g以及甲苯500g,加熱回流1小時。冷卻後,分離去除下層,水洗上層的甲苯溶液層。在水洗後的甲苯溶液層中加入3-環氧丙氧基丙基甲基二甲氧基矽烷8g和氫氧化鉀0.5g並加熱回流1小時。接著,將甲醇蒸餾去除,以共沸脫水去除過量的水。接著加熱回流4小時。反應後的甲苯溶液在冷卻後,以乙酸0.6g中和並水洗。去除水後,在減壓下將甲苯蒸餾去除濃縮,獲得具有烯基15莫耳%以及環氧基1莫耳%(以聚矽氧烷中所含的全部Si原子的數目為100莫耳 %)的聚矽氧烷(A4)。以凝膠滲透層析法測定了(A4)的聚苯乙烯換算重量平均分子量,為1800。聚矽氧烷(A4)的化學式為(ViMe2SiO1/2)15(PhSiO3/2)64(Me2SiO2/2)20(EpMeSiO2/2)1(Vi表示乙烯基、Me表示甲基、Ph表示苯基、Ep表示環氧丙氧基丙基。下標數字表示mol%)。以聚矽氧烷(A4)中所含的全部Si原子的數目為100莫耳%時,烯基的含有比例為15mol%,環氧基的含有比例為1mol%,芳基的含有比例為64mol%。 In a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, 1,3-divinyl-1,1,3,3-tetramethyldioxane 49g and phenyltrimethoxy were charged and mixed. 442 g of decane, 85 g of dimethyldimethoxydecane, 143 g of water, 0.4 g of trifluoromethanesulfonic acid and 500 g of toluene were heated under reflux for 1 hour. After cooling, the lower layer was separated and washed, and the upper layer of the toluene solution was washed with water. To the toluene solution layer after washing with water, 8 g of 3-glycidoxypropylmethyldimethoxydecane and 0.5 g of potassium hydroxide were added and heated under reflux for 1 hour. Next, the methanol was distilled off, and excess water was removed by azeotropic dehydration. It was then heated to reflux for 4 hours. The toluene solution after the reaction was cooled, neutralized with 0.6 g of acetic acid and washed with water. After removing water, the toluene was distilled off under reduced pressure to concentrate to obtain an alkenyl group of 15 mol% and an epoxy group of 1 mol% (the number of all Si atoms contained in the polyoxyalkylene was 100 mol%). Polyoxyalkylene (A4). The polystyrene-equivalent weight average molecular weight of (A4) was measured by gel permeation chromatography to be 1800. The chemical formula of polyoxyalkylene (A4) is (ViMe 2 SiO 1/2 ) 15 (PhSiO 3/2 ) 64 (Me 2 SiO 2/2 ) 20 (EpMeSiO 2/2 ) 1 (Vi represents vinyl, Me represents Methyl, Ph represents phenyl, and Ep represents glycidoxypropyl. The subscript number indicates mol%). When the number of all Si atoms contained in the polyoxyalkylene (A4) is 100 mol%, the content of the alkenyl group is 15 mol%, the content of the epoxy group is 1 mol%, and the content of the aryl group is 64 mol. %.

[合成例6]聚矽氧烷(A5)的合成 [Synthesis Example 6] Synthesis of polyoxyalkylene (A5)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷82g、苯基三甲氧基矽烷525g、水143g、三氟甲磺酸0.4g以及甲苯500g,加熱回流1小時。冷卻後,分離去除下層,水洗上層的甲苯溶液層。在水洗後的甲苯溶液層中加入3-環氧丙氧基丙基甲基二甲氧基矽烷314g和水130g以及氫氧化鉀0.5g並加熱回流1小時。接著,將甲醇蒸餾去除,以共沸脫水去除過量的水。接著加熱回流4小時。反應後的甲苯溶液在冷卻後,以乙酸0.6g中和並水洗。去除水後,在減壓下將甲苯蒸餾去除濃縮,獲得具有烯基25莫耳%以及環氧基40莫耳%(以聚矽氧烷中所含的全部Si原子的數目為100莫耳%)的聚矽氧烷(A5)。以凝膠滲透層析法測定了(A5)的聚苯乙烯換算重量平均分子量,為1600。聚矽氧烷(A5)的化學式為(ViMe2SiO1/2)25(PhSiO3/2)75(EpMeSiO2/2)40(Vi表示乙烯 基、Me表示甲基、Ph表示苯基、Ep表示環氧丙氧基丙基。下標數字表示mol%)。以聚矽氧烷(A5)中所含的全部Si原子的數目為100莫耳%時,烯基的含有比例為25mol%,環氧基的含有比例為40mol%,芳基的含有比例為75mol%。 Into a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, charged and mixed 1,3-divinyl-1,1,3,3-tetramethyldioxane 82g, phenyltrimethoxy 525 g of decane, 143 g of water, 0.4 g of trifluoromethanesulfonic acid and 500 g of toluene were heated under reflux for 1 hour. After cooling, the lower layer was separated and washed, and the upper layer of the toluene solution was washed with water. To the toluene solution layer after water washing, 314 g of 3-glycidoxypropylmethyldimethoxydecane, 130 g of water, and 0.5 g of potassium hydroxide were added and heated under reflux for 1 hour. Next, the methanol was distilled off, and excess water was removed by azeotropic dehydration. It was then heated to reflux for 4 hours. The toluene solution after the reaction was cooled, neutralized with 0.6 g of acetic acid and washed with water. After removing water, the toluene was distilled off under reduced pressure to concentrate to obtain an alkenyl group of 25 mol% and an epoxy group of 40 mol% (the number of all Si atoms contained in the polyoxyalkylene was 100 mol%). Polyoxyalkylene (A5). The polystyrene-equivalent weight average molecular weight of (A5) was measured by gel permeation chromatography to be 1600. The chemical formula of polyoxyalkylene (A5) is (ViMe 2 SiO 1/2 ) 25 (PhSiO 3/2 ) 75 (EpMeSiO 2/2 ) 40 (Vi represents vinyl, Me represents methyl, Ph represents phenyl, Ep Represents a glycidoxypropyl group. The subscript number indicates mol%). When the number of all Si atoms contained in the polyoxyalkylene (A5) is 100 mol%, the content of the alkenyl group is 25 mol%, the content of the epoxy group is 40 mol%, and the content of the aryl group is 75 mol. %.

[合成例7]聚矽氧烷(A6)的合成 [Synthesis Example 7] Synthesis of polyoxyalkylene (A6)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷33g、苯基三甲氧基矽烷442g、二甲基二甲氧基矽烷85g、二苯基二甲氧基矽烷43g、水155g、三氟甲磺酸0.4g以及甲苯500g,加熱回流1小時。冷卻後,分離去除下層,水洗上層的甲苯溶液層。在水洗後的甲苯溶液層中加入3-環氧丙氧基丙基甲基二甲氧基矽烷8g和氫氧化鉀0.5g並且加熱回流1小時。接著,將甲醇蒸餾去除,以共沸脫水去除過量的水。接著加熱回流4小時。反應後的甲苯溶液在冷卻後,以乙酸0.6g中和並水洗。去除水後,在減壓下將甲苯蒸餾去除濃縮,而獲得具有烯基10莫耳%以及環氧基1莫耳%(以聚矽氧烷中所含的全部Si原子的數目為100莫耳%)的聚矽氧烷(A6)。以凝膠滲透層析法測定了(A6)的聚苯乙烯換算重量平均分子量,為1800。聚矽氧烷(A6)的化學式為(ViMe2SiO1/2)10(PhSiO3/2)64(Ph2SiO2/2)5(Me2SiO2/2)20(EpMeSiO2/2)1(Vi表示乙烯基、Me表示甲基、Ph表示苯基、Ep表示環氧丙氧基丙基。下標數字表示mol%)。以聚矽氧烷(A6) 中所含的全部Si原子的數目為100莫耳%時,烯基的含有比例為10mol%,環氧基的含有比例為1mol%,芳基的含有比例為74mol%。 Into a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, 33 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane and phenyltrimethoxy 442 g of decane, 85 g of dimethyldimethoxydecane, 43 g of diphenyldimethoxydecane, 155 g of water, 0.4 g of trifluoromethanesulfonic acid and 500 g of toluene were heated under reflux for 1 hour. After cooling, the lower layer was separated and washed, and the upper layer of the toluene solution was washed with water. To the toluene solution layer after water washing, 8 g of 3-glycidoxypropylmethyldimethoxydecane and 0.5 g of potassium hydroxide were added and heated under reflux for 1 hour. Next, the methanol was distilled off, and excess water was removed by azeotropic dehydration. It was then heated to reflux for 4 hours. The toluene solution after the reaction was cooled, neutralized with 0.6 g of acetic acid and washed with water. After removing water, the toluene was distilled off under reduced pressure to concentrate to obtain an alkenyl group of 10 mol% and an epoxy group of 1 mol% (the number of all Si atoms contained in the polyoxyalkylene was 100 mol. %) polyoxyalkylene (A6). The polystyrene-equivalent weight average molecular weight of (A6) was measured by gel permeation chromatography to be 1800. The chemical formula of polyoxyalkylene (A6) is (ViMe 2 SiO 1/2 ) 10 (PhSiO 3/2 ) 64 (Ph 2 SiO 2/2 ) 5 (Me 2 SiO 2/2 ) 20 (EpMeSiO 2/2 ) 1 (Vi represents a vinyl group, Me represents a methyl group, Ph represents a phenyl group, and Ep represents a glycidoxypropyl group. The subscript number indicates mol%). When the number of all Si atoms contained in the polyoxyalkylene (A6) is 100 mol%, the content of the alkenyl group is 10 mol%, the content of the epoxy group is 1 mol%, and the content of the aryl group is 74 mol. %.

[合成例8]聚矽氧烷(B1)的合成 [Synthesis Example 8] Synthesis of polyoxyalkylene (B1)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合苯基三甲氧基矽烷195g和三氟甲磺酸0.2g,一邊攪拌一邊用15分鐘滴入水13g,滴入結束後,加熱回流1小時。冷卻至室溫後,加入1,1,3,3-四甲基二矽氧烷119g,一邊攪拌一邊滴入乙酸88g。滴入結束後,攪拌混合液並且升溫至50℃,反應3小時。冷卻至室溫後,加入甲苯和水,充分混合而靜置,分離去除水層。水洗上層的甲苯溶液層後,減壓濃縮,而獲得甲基苯基氫化聚矽氧烷(B1)。聚矽氧烷(B1)的化學式為(HMe2SiO1/2)60(PhSiO3/2)40(Me表示甲基,Ph表示苯基。下標數字表示mol%)。 195 g of phenyltrimethoxydecane and 0.2 g of trifluoromethanesulfonic acid were placed and mixed in a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, and 13 g of water was dropped into the mixture for 15 minutes while stirring. After the end, it was heated to reflux for 1 hour. After cooling to room temperature, 119 g of 1,1,3,3-tetramethyldioxane was added, and 88 g of acetic acid was added dropwise while stirring. After the completion of the dropwise addition, the mixture was stirred and heated to 50 ° C for 3 hours. After cooling to room temperature, toluene and water were added, and the mixture was thoroughly mixed and allowed to stand, and the aqueous layer was separated and removed. After washing the upper layer of the toluene solution with water, it was concentrated under reduced pressure to obtain methylphenyl hydrogenated polyoxane (B1). The chemical formula of polyoxyalkylene (B1) is (HMe 2 SiO 1/2 ) 60 (PhSiO 3/2 ) 40 (Me represents a methyl group, and Ph represents a phenyl group. The subscript number indicates mol%).

[合成例9]聚矽氧烷(B2)的合成 [Synthesis Example 9] Synthesis of polyoxyalkylene (B2)

在附攪拌器、回流冷凝管、投入口、溫度計的四口燒瓶中投入並混合二苯基二甲氧基矽烷220g和三氟甲磺酸0.6g,加入1,1,3,3-四甲基二矽氧烷147g,一邊攪拌一邊花費30分鐘滴入乙酸108g。滴入結束後,攪拌混合液並且升溫至50℃並反應3小時。冷卻至室溫後,加入甲苯和水,充分混合而靜置,分離去除水層。將上層的甲苯溶液層水洗3次後,進行減壓濃縮,獲得二苯 基氫化聚矽氧烷(B2)。聚矽氧烷(B2)的化學式為(HMe2SiO1/2)50(Ph2SiO2/2)50(Me表示甲基,Ph表示苯基。下標數字表示mol%)。 In a four-necked flask equipped with a stirrer, a reflux condenser, an inlet, and a thermometer, 220 g of diphenyldimethoxydecane and 0.6 g of trifluoromethanesulfonic acid were added and mixed, and 1,1,3,3-tetramethyl was added. 147 g of bisoxane was added dropwise to 108 g of acetic acid over 30 minutes while stirring. After the completion of the dropwise addition, the mixture was stirred and heated to 50 ° C and reacted for 3 hours. After cooling to room temperature, toluene and water were added, and the mixture was thoroughly mixed and allowed to stand, and the aqueous layer was separated and removed. The upper layer of the toluene solution was washed with water three times, and then concentrated under reduced pressure to obtain diphenylhydrogenated polyoxane (B2). The chemical formula of polyoxyalkylene (B2) is (HMe 2 SiO 1/2 ) 50 (Ph 2 SiO 2/2 ) 50 (Me represents a methyl group, and Ph represents a phenyl group. The subscript number indicates mol%).

(1-2)重量平均分子量 (1-2) Weight average molecular weight

所獲得的聚矽氧烷的重量平均分子量(Mw),係藉由凝膠滲透層析法(GPC)以下述條件測定,以作為聚苯乙烯換算值求出。 The weight average molecular weight (Mw) of the obtained polyoxyalkylene was measured by gel permeation chromatography (GPC) under the following conditions, and was determined as a value in terms of polystyrene.

裝置:HLC-8120C(TOSOH CORPORATION製) Device: HLC-8120C (manufactured by TOSOH CORPORATION)

管柱:TSK-gel MultiporeHXL-M(TOSOH CORPORATION製) Column: TSK-gel MultiporeHXL-M (manufactured by TOSOH CORPORATION)

展開劑:THF、流量0.5mL/min、負載量5.0%、100μL(1-3)烯基、環氧基以及芳基的含有比例、以及聚矽氧烷的化學式。 Developer: THF, flow rate 0.5 mL/min, loading amount 5.0%, 100 μL (1-3) alkenyl group, epoxy group and aryl group content ratio, and chemical formula of polyoxyalkylene.

所獲得的聚矽氧烷中所含的烯基、環氧基以及芳基的含有比例(以聚矽氧烷中所含的全部Si原子的數目為100莫耳%)、以及聚矽氧烷的化學式,係利用29Si NMR及13C NMR算出。 The content ratio of the alkenyl group, the epoxy group, and the aryl group contained in the obtained polyoxyalkylene (100 mol% based on the total number of Si atoms contained in the polyoxyalkylene), and polyoxyalkylene oxide The chemical formula was calculated by 29 Si NMR and 13 C NMR.

(2)硬化性組成物的製備 (2) Preparation of hardenable composition [實施例1~5以及比較例1和2] [Examples 1 to 5 and Comparative Examples 1 and 2]

在95℃常壓下,以表1所示的摻合量將下述表1所示的成分混合,獲得實施例1~4和比較例1和2的硬化性組成物。表1中的數值表示質量份。此外,表1中的各成分的細節如以下。 The components shown in the following Table 1 were mixed at a normal pressure of 95 ° C under the normal amount shown in Table 1, and the curable compositions of Examples 1 to 4 and Comparative Examples 1 and 2 were obtained. The numerical values in Table 1 represent parts by mass. Further, the details of the respective components in Table 1 are as follows.

C1:鉑與1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷的錯合物(鉑金屬量4質量%) C1: a complex of platinum with 1,3-divinyl-1,1,3,3-tetramethyldioxane (amount of platinum metal 4% by mass)

D1:環-四甲基四乙烯基四矽氧烷 D1: cyclo-tetramethyltetravinyltetraoxane

D2:二苯基雙(二甲基乙烯基矽烷氧基)矽烷 D2: diphenyl bis(dimethylvinyl decyloxy) decane

D3:苯基三(二甲基乙烯基矽烷氧基)矽烷 D3: phenyl tris(dimethylvinyl nonyloxy) decane

(3)硬化性組成物的評價 (3) Evaluation of hardenable composition

利用下述(3-1)~(3-6)的手法對實施例1~4和比較例1和2的硬化性組成物進行評價。將評價結果示於表2。 The curable compositions of Examples 1 to 4 and Comparative Examples 1 and 2 were evaluated by the following methods (3-1) to (3-6). The evaluation results are shown in Table 2.

(3-1)黏度 (3-1) Viscosity

使用E型黏度計在25℃測定硬化性組成物的黏度。 The viscosity of the curable composition was measured at 25 ° C using an E-type viscometer.

(3-2)硬度 (3-2) hardness

在TEFLON(註冊商標)的平板上鑲2mm厚的框,塗布硬化性組成物成為框的高度,藉由在150℃的熱風循環式烘箱加熱5小時製作出50mm×50mm×1mm的硬化物。藉由JIS K6253中規定的D型硬度計測定該硬化物的硬度。 A frame of 2 mm thick was placed on a flat plate of TEFLON (registered trademark), and the curable composition was applied to the height of the frame, and a cured product of 50 mm × 50 mm × 1 mm was produced by heating in a hot air circulating oven at 150 ° C for 5 hours. The hardness of the cured product was measured by a D-type hardness meter defined in JIS K6253.

(3-3)折射率 (3-3) Refractive index

使用將硬化性組成物製成硬度測定用之硬化物,以Metricon Corporation製Model2010全反射式折射計測定25℃下的折射率。此外,測定波長為408nm。 The cured product for hardness measurement was prepared using a curable composition, and the refractive index at 25 ° C was measured using a Model 2010 total reflection refractometer manufactured by Metricon Corporation. Further, the measurement wavelength was 408 nm.

(3-4)光透過率變化 (3-4) Light transmittance change

在1mm的石英板上放置圓形(直徑2cm、厚度1mm)的框,在此框內填充硬化性組成物,測定藉由以150℃的熱風循環式烘箱加熱5小時硬化而製作之硬化物(光路長1.0mm)在25℃下之波長460nm的光透過率。接著,為了調查加速劣化試驗後之著色的程度,同樣地測定以150℃的熱循環式烘箱將上述硬化物加熱老化1000小時後,在25℃下之波長460nm的光透過率。由加熱老化後的光透過率相對於加熱老化前的光透過率之比,以下述的基準評價光透過率變化。 A circular (diameter: 2 cm, thickness: 1 mm) frame was placed on a 1 mm quartz plate, and the frame was filled with a curable composition, and a cured product prepared by heating in a hot air circulating oven at 150 ° C for 5 hours was measured ( Light path length 1.0 mm) Light transmittance at a wavelength of 460 nm at 25 °C. Next, in order to investigate the degree of coloring after the accelerated deterioration test, the light transmittance at a wavelength of 460 nm at 25 ° C after heat-aging the cured product in a heat cycle oven at 150 ° C for 1,000 hours was measured in the same manner. The ratio of the light transmittance after heat aging to the light transmittance before heat aging was evaluated by the following criteria.

A:前述比為98%以上 A: The aforementioned ratio is 98% or more

B:前述比為90%以上未滿98% B: The aforementioned ratio is 90% or more and less than 98%.

C:前述比未滿90% C: the aforementioned ratio is less than 90%

(3-5)接著強度 (3-5) subsequent strength

在直徑5mm高度5mm的鋁圓柱的底面塗布硬化性組成物而黏貼於各種測試面板,以在150℃的熱風循環式烘箱中放置1小時,獲得利用硬化性組成物而將直徑5mm高度5mm的鋁圓柱密接於測試面板的試驗片。採用Dage公司製series-4000PXY作為測定裝置,將密接於各種測試面板上的鋁圓柱以50μm/秒的速度剝離,測定此時的載重作為接著強度,以下述的基準來評價。 A curable composition was applied to the bottom surface of an aluminum cylinder having a diameter of 5 mm and a height of 5 mm and adhered to various test panels, and placed in a hot air circulating oven at 150 ° C for 1 hour to obtain aluminum having a diameter of 5 mm and a height of 5 mm by using a hardenable composition. The test piece in which the cylinder is in close contact with the test panel. The series-4000 PXY manufactured by Dage Co., Ltd. was used as a measuring device, and the aluminum cylinders adhered to the various test panels were peeled off at a rate of 50 μm/sec. The load at this time was measured as the adhesion strength, and evaluated according to the following criteria.

A:接著強度為10kg重以上 A: The strength is more than 10kg.

B:接著強度為5kg重以上未滿10kg重 B: The strength is more than 5kg and less than 10kg.

C:接著強度未滿5kg重 C: Then the strength is less than 5kg

(3-6)耐熱性 (3-6) heat resistance

使硬化性組成物成為乾燥膜厚為1mm的方式而塗布於石英玻璃上後,在100℃下乾燥硬化1小時,接著在150℃下乾燥硬化5小時而製作硬化物。在150℃下保管該硬化物500小時,以目視觀察保管後之硬化物的外觀,以下述的基準評價耐熱性。 The curable composition was applied to quartz glass so that the dried film thickness was 1 mm, and then dried and cured at 100 ° C for 1 hour, and then dried and cured at 150 ° C for 5 hours to prepare a cured product. The cured product was stored at 150 ° C for 500 hours, and the appearance of the cured product after storage was visually observed, and the heat resistance was evaluated by the following criteria.

(顏色變化) (Color changes)

A:沒有顏色變化 A: No color change

B:些微地黃色化 B: slightly yellowed

C:明顯地黃色化 C: Obviously yellowed

(3-7)總輻射束測定(亮度評價) (3-7) Total radiation beam measurement (brightness evaluation)

將硬化性組成物在光學用半導體的表面安裝型(Topview型,包含由圖1的光半導體2、電極6、導線7以及反射器3所構成的部分)封裝進行塗布,在150℃加熱1小時而製成評價用樣品。 The curable composition was applied to a surface mount type of an optical semiconductor (a topview type including a portion including the photo-semiconductor 2, the electrode 6, the lead 7 and the reflector 3 of FIG. 1), and heated at 150 ° C for 1 hour. A sample for evaluation was prepared.

使用總輻射束測定裝置(紫外,可視,近紅外光分光光譜儀MCPD-3700、Φ 300mm積分球(半球狀積分球)),實施上述評價用樣品的輻射束測定。以%算出上述評價用樣品的輻射束,相對於在塗布密封材料之前的封裝通電使其發光而測定之初期輻射束的比率,以下述的基準評價。 The radiation beam measurement of the sample for evaluation described above was carried out using a total radiation beam measuring device (ultraviolet, visible, near-infrared spectroscopic spectrometer MCPD-3700, Φ 300 mm integrating sphere (hemispherical integrating sphere)). The radiation beam of the sample for evaluation described above was calculated in %, and the ratio of the initial radiation beam measured by energization of the package before application of the sealing material to light emission was evaluated by the following criteria.

A:前述比率為110%以上 A: The aforementioned ratio is 110% or more

B:前述比率為未滿110%、100%以上 B: The aforementioned ratio is less than 110%, 100% or more

C:前述比率為未滿100% C: The aforementioned ratio is less than 100%

由表2所示之結果可知,將含環氧基的聚矽氧烷的聚矽氧烷(A)當作黏著促進劑使用的比較例1和2中,使用了環氧基多的聚矽氧烷(A5)之比較例1,總輻射束即亮度低,而使用環氧基少的聚矽氧烷(A3)之比較例2,接著強度變低,沒有實現兼顧高亮度與高黏著性。相對於此,在將含環氧基的聚矽氧烷之聚矽氧烷(A)作為主要成分的實施例1~5中,總輻射束及接著強度均高,實現了兼顧高亮度與高黏著性。 As is apparent from the results shown in Table 2, in Comparative Examples 1 and 2 in which the polyoxyalkylene (A) containing an epoxy group-containing polyoxyalkylene was used as an adhesion promoter, a polyepoxide having a large epoxy group was used. In Comparative Example 1 of oxyalkylene (A5), the total radiation beam had a low luminance, and Comparative Example 2 using a polyoxyalkylene oxide (A3) having a small epoxy group, the strength was lowered, and high luminance and high adhesion were not achieved. . On the other hand, in Examples 1 to 5 in which the polyoxyalkylene (A) containing an epoxy group-containing polyoxyalkylene was used as a main component, the total radiation beam and the subsequent strength were both high, achieving both high brightness and high brightness. Adhesive.

[產業上之可利用性] [Industrial availability]

本發明的硬化性組成物,由於其硬化物為透明,並且即使放置於高溫氣體環境下其光透過率的降低也小,具有高的黏著性,而有用於光學用半導體元件及光半導體部件的密封劑、黏著劑、灌封劑(potting agent)、保護塗布劑、底部填充劑等。本發明的硬化物由於即使是暴露在高溫,其光透過率的降低也小,而具有在高溫條件下的製造步驟中光透過率的降低小,長期可靠性優異之特徵。本發明的硬化物,特別是在用於高亮度的發光元件等之光學用半導體裝置時,由於總輻射束變高,而有用於作為高亮度的光源附近所使用的光學部件。 The curable composition of the present invention is transparent, and has a low light transmittance and high adhesion even when placed in a high-temperature gas atmosphere, and is used for an optical semiconductor element and an optical semiconductor component. Sealant, adhesive, potting agent Agent), protective coating agent, underfill, and the like. The cured product of the present invention has a small reduction in light transmittance even when exposed to a high temperature, and has a feature that the light transmittance is reduced in a manufacturing step under high temperature conditions and the long-term reliability is excellent. In the case of an optical semiconductor device such as a high-luminance light-emitting device, the cured product of the present invention has an optical component for use as a high-luminance light source because the total radiation beam is high.

Claims (4)

一種聚矽氧烷,其係以下述化學式表示:(RViR1 2SiO1/2)a(R1 3SiO1/2)b(RViR1SiO2/2)c(REpR1SiO2/2)d(R1 2SiO2/2)e(R1SiO3/2)f(SiO4/2)h(XO1/2)i式中,RVi表示具有烯基的基團;REp表示具有環氧基的基團;R1各自獨立地表示1價的烴基,其中,具有烯基的基團除外;X表示氫原子或者碳原子數1至3的烷基;a表示0以上的整數、b表示0以上的整數、c表示0以上的整數、d表示1以上的整數、e表示0以上的整數、f表示0以上的整數、h表示0以上的整數;i表示0以上的整數;其中,a+c為1以上的整數。 A polyoxyalkylene which is represented by the following chemical formula: (R Vi R 1 2 SiO 1/2 ) a (R 1 3 SiO 1/2 ) b (R Vi R 1 SiO 2/2 ) c (R Ep R 1 SiO 2/2 ) d (R 1 2 SiO 2/2 ) e (R 1 SiO 3/2 ) f (SiO 4/2 ) h (XO 1/2 ) i wherein R Vi represents an alkenyl group a group; R Ep represents a group having an epoxy group; R 1 each independently represents a monovalent hydrocarbon group, wherein a group having an alkenyl group is excluded; and X represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; a represents an integer of 0 or more, b represents an integer of 0 or more, c represents an integer of 0 or more, d represents an integer of 1 or more, e represents an integer of 0 or more, f represents an integer of 0 or more, and h represents an integer of 0 or more; i An integer of 0 or more is represented; wherein a+c is an integer of 1 or more. 如請求項1之聚矽氧烷,其中,以聚矽氧烷中所含之全部Si原子的數目為100莫耳%時,聚矽氧烷中烯基的含量為3~50莫耳%,密接性基團的含量為0.01~10莫耳%。 The polyoxyalkylene of claim 1, wherein the amount of the alkenyl group in the polyoxyalkylene is from 3 to 50 mol%, when the number of all Si atoms contained in the polyoxyalkylene is 100 mol%, The content of the adhesion group is 0.01 to 10 mol%. 如請求項1之聚矽氧烷,其中,聚矽氧烷具有芳基,並且以聚矽氧烷中所含的全部Si原子的數目為100莫耳%時,聚矽氧烷中所含之芳基的含量為30~120莫耳%。 The polyoxyalkylene as claimed in claim 1, wherein the polyoxyalkylene has an aryl group and is contained in the polyoxane when the number of all Si atoms contained in the polyoxyalkylene is 100 mol%. The content of the aryl group is 30 to 120 mol%. 如請求項1之聚矽氧烷,其中,在該化學式中,相對於a、b、c、d、e、f、g、h以及i的合計,f的比例為20~90%。 The polyoxyalkylene of claim 1, wherein in the chemical formula, the ratio of f is 20 to 90% with respect to the total of a, b, c, d, e, f, g, h, and i.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI811225B (en) * 2017-07-24 2023-08-11 日商陶氏東麗股份有限公司 Multi-component curable thermally conductive polysiloxane gel composition, thermally conductive member, and heat dissipation structure

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101556274B1 (en) * 2012-12-28 2015-09-30 제일모직 주식회사 Composition for encapsulant and encapsulant and electronic device
JP2019524959A (en) * 2016-08-12 2019-09-05 ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG Curable organic polysiloxane composition, encapsulant, and semiconductor device
JP7574543B2 (en) * 2020-03-31 2024-10-29 三菱ケミカル株式会社 Resin composition, electronic device member, resin additive, and organopolysiloxane composition for use as an additive to resin
JP7574544B2 (en) * 2020-03-31 2024-10-29 三菱ケミカル株式会社 Resin composition, electronic device member, resin additive, and organopolysiloxane composition for use as an additive in resin

Family Cites Families (7)

* Cited by examiner, † Cited by third party
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JPH062821B2 (en) * 1989-11-28 1994-01-12 信越化学工業株式会社 Method for producing epoxy group-containing silicone elastomer fine powder and fine powder produced by the method
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JP2003192790A (en) * 2001-12-27 2003-07-09 Dow Corning Toray Silicone Co Ltd Radically polymerizable organopolysiloxane mixture and method for producing the same
JP5060074B2 (en) * 2006-05-11 2012-10-31 東レ・ダウコーニング株式会社 Adhesion promoter, curable organopolysiloxane composition, and semiconductor device
JP4862032B2 (en) * 2008-12-05 2012-01-25 信越化学工業株式会社 Addition-curable silicone composition that provides a cured product having a high refractive index, and an optical element sealing material comprising the composition
JP4913858B2 (en) * 2009-04-14 2012-04-11 日東電工株式会社 Composition for thermosetting silicone resin
JP2011057755A (en) * 2009-09-07 2011-03-24 Shin-Etsu Chemical Co Ltd Silicone composition and cured product thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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