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TW201439182A - Photo-curable composition for optical stereolithography and fabricating method of shape article - Google Patents

Photo-curable composition for optical stereolithography and fabricating method of shape article Download PDF

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Publication number
TW201439182A
TW201439182A TW103101769A TW103101769A TW201439182A TW 201439182 A TW201439182 A TW 201439182A TW 103101769 A TW103101769 A TW 103101769A TW 103101769 A TW103101769 A TW 103101769A TW 201439182 A TW201439182 A TW 201439182A
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photocurable composition
light
formula
optical
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TW103101769A
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Chinese (zh)
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Katsuyuki Sugihara
Kuniaki Arai
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Jnc Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A photo-curable composition for optical stereolithography includes: (A) a radical polymerization compound, (B) a photo-polymerization initiator which generates radicals by irradiating a light having a wavelength of 400 nm or more, (C) a water insoluble surfactant, whereby an elastic modulus of a tensile test of a curing film with a film thickness of 30 μ m obtained by irradiating a light having a wavelength of 400 nm or more to the photo-curable composition is 10 to 500 MPa, a breaking strength of the curing film is 1 to 50 MPa, and a breaking elongation of the curing film is 10 to 100%.

Description

光學的立體造型用光硬化性組成物、以及造型物的製造方法 Photocurable composition for optical three-dimensional modeling, and method for producing shaped object

本發明是有關於一種在用光學的立體造型法製造立體造型物時所使用的光硬化性組成物、及包含對光硬化性組成物照射波長為400nm以上的光線的步驟的造型物的製造方法。 The present invention relates to a photocurable composition used for producing a three-dimensional shaped object by an optical three-dimensional molding method, and a method for producing a shaped article including a step of irradiating a photocurable composition with light having a wavelength of 400 nm or more. .

作為立體的造型物的製造方法,提出了基於光積層造型法等光學的立體造型法而製造立體的造型物的方法。例如已知有光學的立體造型法,其是根據將造型的立體模式的3維CAD資料切片(slice)為多個層而所得的剖面群組的資料而形成各層,將該些層一體地積層而製造立體的造型物。 As a method of manufacturing a three-dimensional shaped object, a method of manufacturing a three-dimensional shaped object by an optical three-dimensional modeling method such as an optical layering method has been proposed. For example, an optical three-dimensional modeling method is known in which each layer is formed based on data of a section group obtained by forming a three-dimensional CAD data slice of a stereoscopic mode into a plurality of layers, and the layers are integrally laminated. And make a three-dimensional shape.

該光學的立體造型法的一個形態可通過反覆進行下述步驟(1)與步驟(2)而實施:(1)對容器內所收容的光硬化性樹脂組成物,自支撐體的上方選擇性照射雷射等光,由此而形成具有規定圖案的硬化層;(2)使支撐體下降一層的程度。 One embodiment of the optical three-dimensional molding method can be carried out by repeatedly performing the following steps (1) and (2): (1) Selectively above the self-supporting body for the photocurable resin composition contained in the container Light such as a laser is irradiated to form a hardened layer having a predetermined pattern; and (2) the support is lowered by one layer.

如上所述,利用光學的立體造型法,反覆進行在先前所形成 的硬化層的上側一體地形成新的硬化層的操作,由此可製造一體地形成有多個硬化層的立體造型物。 As described above, the optical stereoscopic modeling method is used to repeatedly form the previous formation. The upper side of the hardened layer integrally forms a new hardened layer, whereby a three-dimensional shaped object in which a plurality of hardened layers are integrally formed can be manufactured.

近年來,進行製造該些立體造型物的裝置的小型輕量化與低成本化的研究,需求即使是一般家庭亦可導入的可在桌面上使用的廉價的裝置。在一般家庭中所使用的光立體造型物中,要求難以於造型物上附有傷痕、造型物柔軟且對嬰幼兒的安全性高、容易變形因此造型物的操作容易等廣泛的特性。 In recent years, studies on the reduction in size, weight, and cost of an apparatus for manufacturing these three-dimensional shaped objects have required an inexpensive device that can be used on a tabletop even in a general household. In the optical three-dimensional shape used in the general household, it is required to have a wide range of characteristics such as difficulty in attaching a flaw to the molded article, softness of the molded article, high safety to the infant, and easy deformation, so that the operation of the molded article is easy.

而且,在醫療領域中,在外科手術的手術計劃中應用以對器官進行攝影的三維影像為基礎而進行立體造型的器官模型,或者應用用以提高外科手術的熟練度的練習用器官模型。於該些模型中,期望以更接近實際的器官的形式表現柔軟性與彈性,因此立體造型中所使用的樹脂材料的選定變得重要。 Further, in the medical field, an organ model for stereoscopic modeling based on a three-dimensional image for photographing an organ is applied to a surgical operation plan for surgery, or an exercise organ model for improving the proficiency of surgery is applied. In these models, it is desirable to express softness and elasticity in a form closer to an actual organ, and therefore selection of a resin material used in a three-dimensional shape becomes important.

例如,已知在光學的立體造型法中,對包含特定胺基甲酸酯化合物的組成物照射紫外線,由此而製作柔軟性、彈性高的光造型物(日本專利特開平9-169827(專利文獻1)、日本專利特開2000-290328(專利文獻2)、日本專利特開2006-028499(專利文獻3))。而且,亦揭示了耐熱性及透明性高的光學的立體造型用組成物(日本專利特開2000-204125(專利文獻4))。 For example, it is known that a composition containing a specific urethane compound is irradiated with ultraviolet rays in an optical three-dimensional molding method, thereby producing a light-shaped material having high flexibility and elasticity (Japanese Patent Laid-Open No. Hei 9-169827 (Patent Document 1), Japanese Patent Laid-Open No. 2000-290328 (Patent Document 2), and Japanese Patent Laid-Open No. 2006-028499 (Patent Document 3)). Further, an optical three-dimensional molding composition having high heat resistance and transparency has been disclosed (Japanese Patent Laid-Open Publication No. 2000-204125 (Patent Document 4)).

於光造型物的製造方法中,若所照射的光線的波長為400nm以上,則與紫外線相比較而言為能量弱的光,因此自安全方面等考慮,製造裝置的通用性變高。 In the method of producing a light-formed object, when the wavelength of the light to be irradiated is 400 nm or more, the energy is weak compared with the ultraviolet light. Therefore, the versatility of the manufacturing apparatus is increased from the viewpoint of safety and the like.

然而,專利文獻1~專利文獻4中所記載的組成物中,於波長 為400nm以上的光線的情況下硬化性並不充分。而且,由該些專利文獻中所記載的組成物所得的造型物雖然拉伸彈性模數顯示出高的值,但與包含氟樹脂的容器的密接性過高,於自容器取出造型物時,有時會造成容器破損(專利文獻1~專利文獻3)。另外,由專利文獻4中所記載的組成物而所得的造型物雖然以JIS K7127為基準的試驗的拉伸彈性模數顯示出高的值,但斷裂伸長率小至不足10%,且所得的造型物的柔軟性並不充分。 However, in the compositions described in Patent Documents 1 to 4, the wavelength is When the light is 400 nm or more, the hardenability is not sufficient. Further, the molded article obtained from the composition described in the above-mentioned patent documents exhibits a high value in tensile elastic modulus, but has high adhesion to a container containing a fluororesin, and when the molded article is taken out from the container, The container may be damaged (Patent Document 1 to Patent Document 3). In addition, the molded article obtained by the composition described in Patent Document 4 exhibits a high tensile modulus in the test based on JIS K7127, but the elongation at break is as small as less than 10%, and the obtained product is obtained. The softness of the shape is not sufficient.

而且,在自支撐體的上方照射光的光學的立體造型法中,使支撐體下降至放入有光學的立體造型用光硬化性組成物的容器內而反覆進行積層,因此於所得的造型物大的情形中,需要大量的光學的立體造型用光硬化性組成物。另一方面,在自支撐體的下方照射光的光學的立體造型法中,若僅僅曝光部分浸漬於硬化性組成物中就足夠了,因此無需大量的組成物。 Further, in the optical three-dimensional molding method in which the light is irradiated on the upper side of the self-supporting body, the support body is lowered into a container in which the optical stereolithic photocurable composition is placed, and the laminate is repeatedly laminated. In the large case, a large amount of optical stereolithic photocurable composition is required. On the other hand, in the optical three-dimensional molding method in which light is irradiated under the self-supporting body, it is sufficient that only the exposed portion is immersed in the curable composition, so that a large amount of the composition is not required.

然而,為了自支撐體的下方照射光,使容器的底面與造型物(硬化物)之間具有一定程度以上的接著力,因此在將造型物自容器中取出時,有時會對造型物及容器造成損傷。 However, in order to irradiate light from the lower side of the support body, a certain degree of adhesion force is formed between the bottom surface of the container and the molded object (cured material). Therefore, when the shaped object is taken out from the container, the shaped object may be The container caused damage.

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平9-169827 [Patent Document 1] Japanese Patent Laid-Open No. 9-169827

[專利文獻2]日本專利特開2000-290328 [Patent Document 2] Japanese Patent Laid-Open No. 2000-290328

[專利文獻3]日本專利特開2006-028499 [Patent Document 3] Japanese Patent Laid-Open No. 2006-028499

[專利文獻4]日本專利特開2000-204125 [Patent Document 4] Japanese Patent Laid-Open No. 2000-204125

在上述狀況下,需求可藉由照射波長為400nm以上的光線而容易地硬化,可容易地將所形成的造型物自容器中取出的光學的立體造型用光硬化性組成物。 Under the above circumstances, it is possible to use an optical stereolithic composition which can be easily cured by irradiating light having a wavelength of 400 nm or more, and which can easily take out the formed shaped object from the container.

而且,藉由光學的立體造型法所得的造型物要求柔軟性與彈性的性能平衡良好、難以造成損傷、在造型物的操作時的變形變容易的通用性高的光硬化性組成物。 In addition, the molded article obtained by the optical three-dimensional molding method requires a highly versatile photocurable composition which is excellent in balance between flexibility and elasticity, and which is less likely to cause damage and deformation during operation of the molded article.

本發明者等發明一種包含式(1)所表示的自由基聚合性化合物(A)、藉由照射波長為400nm以上的光線而產生自由基的光聚合起始劑(B)、及非水溶性界面活性劑(C)的光學的立體造型用光硬化性組成物。 The present inventors have invented a photopolymerization initiator (B) comprising a radical polymerizable compound (A) represented by the formula (1), a radical generated by irradiation of light having a wavelength of 400 nm or more, and a water-insoluble initiator (B). A photocurable composition for optical stereoscopic molding of the surfactant (C).

[1] [1]

一種光硬化性組成物,其是包含式(1)所表示的自由基聚合性化合物(A)、藉由照射波長為400nm以上的光線而產生自由基的光聚合起始劑(B)、及非水溶性界面活性劑(C)的光學的立體造型用光硬化性組成物, A photocurable composition comprising a radically polymerizable compound (A) represented by the formula (1), a photopolymerization initiator (B) which generates a radical by irradiation with light having a wavelength of 400 nm or more, and Photocurable composition for optical stereoscopic molding of water-insoluble surfactant (C),

(式(1)中,R1為包含式(2-1)或式(2-2)所表示的結構 作為部分結構的a價有機基,R2為氫或碳數為1~6的烷基,a為2以上的整數) (In the formula (1), R 1 comprising formula (2-1) or (2-2) structure represented as a partial structure a divalent organic group, R 2 is hydrogen or alkyl having a carbon number of 1 to 6 Base, a is an integer of 2 or more)

對該光硬化性組成物照射波長為400nm以上的光線而所得的膜厚為30μm的硬化膜的拉伸試驗的彈性模數為10MPa~500MPa,該硬化膜的斷裂強度為1MPa~50MPa,該硬化膜的斷裂伸長率為10%~100%。 The elastic modulus of the tensile test of the cured film having a film thickness of 30 μm obtained by irradiating the photocurable composition with light having a wavelength of 400 nm or more is 10 MPa to 500 MPa, and the rupture strength of the cured film is 1 MPa to 50 MPa. The elongation at break of the film is from 10% to 100%.

[2] [2]

如[1]所述之光硬化性組成物,其中光聚合起始劑(B)是選自由α-胺基烷基苯酮系及醯基氧化膦系化合物所構成的群組的1種以上。 The photocurable composition according to the above [1], wherein the photopolymerization initiator (B) is one or more selected from the group consisting of an α-aminoalkylphenone-based compound and a fluorenylphosphine oxide-based compound. .

[3] [3]

如[1]或[2]所述之光硬化性組成物,其中非水溶性界面活性劑(C)是選自由氟系界面活性劑及矽酮系界面活性劑所構成的群組的1種以上。 The photocurable composition according to the above [1], wherein the water-insoluble surfactant (C) is one selected from the group consisting of a fluorine-based surfactant and an anthrone-based surfactant. the above.

[4] [4]

如[1]~[3]中任一項所述之光硬化性組成物,其更包含其他自由基聚合性化合物(D),上述其他自由基聚合性化合物(D)具 有式(3)所表示的結構,且結構與自由基聚合性化合物(A)不同; The photocurable composition according to any one of [1] to [3] further comprising another radical polymerizable compound (D), wherein the other radical polymerizable compound (D) has the formula (3) a structure represented, and the structure is different from the radically polymerizable compound (A);

(式(3)中,R3為不具有CH2=CH-CO-的1價有機基,R4為氫或碳數為1~6的烷基)。 (In the formula (3), R 3 is a monovalent organic group having no CH 2 =CH-CO-, and R 4 is hydrogen or an alkyl group having 1 to 6 carbon atoms).

[5] [5]

如[4]所述之光硬化性組成物,其中其他自由基聚合性化合物(D)的R3是具有式(4)所表示的結構的化合物; The photocurable composition according to [4], wherein R 3 of the other radical polymerizable compound (D) is a compound having a structure represented by the formula (4);

(式(4)中,R5是亦可具有環狀結構的2價有機基)。 (Formula (4), R 5 is a divalent organic group may have a cyclic structure).

[6] [6]

一種造型物的製造方法,其包含對如[1]~[5]中任一項所述之光硬化性組成物照射波長為400nm以上的光線的步驟。 A method of producing a molded article, comprising the step of irradiating light having a wavelength of 400 nm or more with the photocurable composition according to any one of [1] to [5].

[7] [7]

如[6]所述之製造方法,其中自支撐體的下方或水平方向照射波長為400nm以上的光線。 The production method according to [6], wherein the light having a wavelength of 400 nm or more is irradiated from the lower side or the horizontal direction of the support.

在本說明書中,所謂「有機基」並無特別限定,例如可列舉碳數為1~20的烴基,烴基的具體可列舉芳基、烷基芳基、芳基烷基、環烷基、環烯基等。 In the present specification, the "organic group" is not particularly limited, and examples thereof include a hydrocarbon group having 1 to 20 carbon atoms, and specific examples of the hydrocarbon group include an aryl group, an alkylaryl group, an arylalkyl group, a cycloalkyl group, and a ring. Alkenyl and the like.

而且,一價有機基具體而言可列舉:亦可具有取代基的 碳數為1~20的烷氧基、亦可具有取代基的碳數為6~20的芳氧基、亦可具有取代基的胺基、亦可具有取代基的矽烷基、亦可具有取代基的烷硫基(-SY1,式中,Y1表示亦可具有取代基的碳數為1~20的烷基)、亦可具有取代基的芳硫基(-SY2,式中,Y2表示亦可具有取代基的碳數為6~18的芳基)、亦可具有取代基的烷基磺醯基(-SO2Y3,式中,Y3表示亦可具有取代基的碳數為1~20的烷基)、亦可具有取代基的芳基磺醯基(-SO2Y4,式中,Y4表示亦可具有取代基的碳數為6~18的芳基)。 Further, specific examples of the monovalent organic group include an alkoxy group having 1 to 20 carbon atoms which may have a substituent, and an aryloxy group having 6 to 20 carbon atoms which may have a substituent, and may have a substitution. a group of an amine group, a decyl group which may have a substituent, or an alkylthio group which may have a substituent (-SY 1 , wherein Y 1 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent) And an arylthio group having a substituent (-SY 2 , wherein Y 2 represents an aryl group having 6 to 18 carbon atoms which may have a substituent), and an alkylsulfonyl group which may have a substituent ( -SO 2 Y 3 , wherein Y 3 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, and an arylsulfonyl group which may have a substituent (-SO 2 Y 4 , wherein Y 4 represents an aryl group having a carbon number of 6 to 18 which may have a substituent.

在本說明書中,「碳數為1~20的烴基」的烴基可為飽和或不飽和的非環式,亦可為飽和或不飽和的環式。在碳數為2~20的烴基為非環式的情況下,可為直鏈狀,亦可分支。「碳數為1~20的烴基」包含碳數為1~20的烷基、碳數為2~20的烯基、碳數為2~20的炔基、碳數為4~20的烷基二烯基、碳數為6~18的芳基、碳數為7~20的烷基芳基、碳數為7~20的芳基烷基、碳數為4~20的環烷基、碳數為4~20的環烯基等。 In the present specification, the hydrocarbon group of "hydrocarbon group having 1 to 20 carbon atoms" may be a saturated or unsaturated acyclic group, and may be a saturated or unsaturated ring type. When the hydrocarbon group having 2 to 20 carbon atoms is acyclic, it may be linear or branched. The "hydrocarbon group having 1 to 20 carbon atoms" includes an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, and an alkyl group having 4 to 20 carbon atoms. a dienyl group, an aryl group having 6 to 18 carbon atoms, an alkylaryl group having 7 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a cycloalkyl group having 4 to 20 carbon atoms, and carbon The number is 4 to 20 cycloalkenyl groups and the like.

在本說明書中,「碳數為1~20的烷基」較佳的是碳數 為1~10的烷基,更佳的是碳數為1~6的烷基。烷基的例子並無限制,可列舉甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、己基、十二烷基等。 In the present specification, the "alkyl group having 1 to 20 carbon atoms" is preferably a carbon number. It is an alkyl group of 1 to 10, more preferably an alkyl group having 1 to 6 carbon atoms. Examples of the alkyl group are not limited, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, and a dodecyl group.

在本說明書中,「碳數為2~20的烯基」較佳的是碳數為2~10的烯基,更佳的是碳數為1~6的烯基。烯基的例子並無限制,可列舉乙烯基、烯丙基、丙烯基、異丙烯基、2-甲基-1-丙烯基、2-甲基烯丙基、2-丁烯基等。 In the present specification, the "alkenyl group having 2 to 20 carbon atoms" is preferably an alkenyl group having 2 to 10 carbon atoms, more preferably an alkenyl group having 1 to 6 carbon atoms. Examples of the alkenyl group are not limited, and examples thereof include a vinyl group, an allyl group, a propenyl group, an isopropenyl group, a 2-methyl-1-propenyl group, a 2-methylallyl group, and a 2-butenyl group.

在本說明書中,「碳數為2~20的炔基」較佳的是碳數為2~10的炔基,更佳的是碳數為2~6的炔基。炔基的例子並無限制,可列舉乙炔基、丙炔基、丁炔基等。 In the present specification, the "alkynyl group having 2 to 20 carbon atoms" is preferably an alkynyl group having 2 to 10 carbon atoms, more preferably an alkynyl group having 2 to 6 carbon atoms. Examples of the alkynyl group are not limited, and examples thereof include an ethynyl group, a propynyl group, a butynyl group and the like.

在本說明書中,「碳數為4~20的烷基二烯基」較佳的是碳數為4~10的烷基二烯基,更佳的是碳數為4~6的烷基二烯基。烷基二烯基的例子並無限制,可列舉1,3-丁二烯基等。 In the present specification, the "alkyldienyl group having 4 to 20 carbon atoms" is preferably an alkyldienyl group having 4 to 10 carbon atoms, more preferably an alkyl group having 4 to 6 carbon atoms. Alkenyl. Examples of the alkyldienyl group are not limited, and examples thereof include a 1,3-butadienyl group and the like.

在本說明書中,「碳數為6~18的芳基」較佳的是碳數為6~10的芳基。芳基的例子並無限制,可列舉苯基、1-萘基、2-萘基、茚基、聯苯基、蒽基、菲基等。 In the present specification, the "aryl group having 6 to 18 carbon atoms" is preferably an aryl group having 6 to 10 carbon atoms. Examples of the aryl group are not limited, and examples thereof include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, an anthracenyl group, a biphenyl group, a fluorenyl group, and a phenanthryl group.

在本說明書中,「碳數為7~20的烷基芳基」較佳的是碳數為7~12的烷基芳基。烷基芳基的例子並無限制,可列舉鄰甲苯基、間甲苯基、對甲苯基、2,3-二甲苯基、2,4-二甲苯基、2,5-二甲苯基、鄰枯烯基、間枯烯基、對枯烯基、均三甲苯基等。 In the present specification, the "alkylaryl group having 7 to 20 carbon atoms" is preferably an alkylaryl group having 7 to 12 carbon atoms. Examples of the alkylaryl group are not limited, and examples thereof include o-tolyl, m-tolyl, p-tolyl, 2,3-xylyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, ortho Alkenyl, m-cumenyl, p-cumenyl, mesitylylene, and the like.

在本說明書中,「碳數為7~20的芳基烷基」較佳的是碳數為7~12的芳基烷基。芳基烷基的例子並無限制,可列舉苄 基、苯乙基、二苯基甲基、三苯基甲基、1-萘基甲基、2-萘基甲基、2,2-二苯基乙基、3-苯基丙基、4-苯基丁基、5-苯基戊基等。 In the present specification, the "arylalkyl group having 7 to 20 carbon atoms" is preferably an arylalkyl group having 7 to 12 carbon atoms. Examples of the arylalkyl group are not limited, and benzyl may be mentioned. Base, phenethyl, diphenylmethyl, triphenylmethyl, 1-naphthylmethyl, 2-naphthylmethyl, 2,2-diphenylethyl, 3-phenylpropyl, 4 -phenylbutyl, 5-phenylpentyl and the like.

在本說明書中,「碳數為4~20的環烷基」較佳的是碳數為4~10的環烷基。環烷基的例子並無限制,可列舉環丙基、環丁基、環戊基、環己基等。 In the present specification, the "cycloalkyl group having 4 to 20 carbon atoms" is preferably a cycloalkyl group having 4 to 10 carbon atoms. Examples of the cycloalkyl group are not limited, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and the like.

在本說明書中,「碳數為4~20的環烯基」較佳的是碳數為4~10的環烯基。環烯基的例子並無限制,可列舉環丙烯基、環丁烯基、環戊烯基、環己烯基等。 In the present specification, the "cycloalkenyl group having 4 to 20 carbon atoms" is preferably a cycloalkenyl group having 4 to 10 carbon atoms. Examples of the cycloalkenyl group are not limited, and examples thereof include a cyclopropenyl group, a cyclobutenyl group, a cyclopentenyl group, and a cyclohexenyl group.

在本說明書中,「碳數為2~20的烷氧基」較佳的是碳數為2~10的烷氧基,更佳的是碳數為2~6的烷氧基。烷氧基的例子並無限制,存在有乙氧基、丙氧基、丁氧基、戊氧基等。 In the present specification, the "alkoxy group having 2 to 20 carbon atoms" is preferably an alkoxy group having 2 to 10 carbon atoms, more preferably an alkoxy group having 2 to 6 carbon atoms. Examples of the alkoxy group are not limited, and an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group or the like is present.

在本說明書中,「碳數為6~20的芳氧基」較佳的是碳數為6~10的芳氧基。芳氧基的例子並無限制,可列舉苯氧基、萘氧基、聯苯氧基等。 In the present specification, the "aryloxy group having 6 to 20 carbon atoms" is preferably an aryloxy group having 6 to 10 carbon atoms. Examples of the aryloxy group are not limited, and examples thereof include a phenoxy group, a naphthyloxy group, and a biphenyloxy group.

在本說明書中,「烷硫基(-SY1,式中,Y1表示亦可具有取代基的碳數為2~20的烷基)」及「烷基磺醯基(-SO2Y3,式中,Y3表示亦可具有取代基的碳數為1~20的烷基)」中,Y1及Y3較佳的是碳數為2~10的烷基,更佳的是碳數為2~6的烷基。烷基的例子並無限制,可列舉甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、己基、十二烷基等。 In the present specification, "alkylthio (-SY 1 , wherein Y 1 represents an alkyl group having 2 to 20 carbon atoms which may have a substituent)" and "alkylsulfonyl (-SO 2 Y 3 ) In the formula, Y 3 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, and Y 1 and Y 3 are preferably an alkyl group having 2 to 10 carbon atoms, more preferably carbon. The number is 2 to 6 alkyl groups. Examples of the alkyl group are not limited, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, and a dodecyl group.

在本說明書中,「芳硫基(-SY2,式中,Y2表示亦可具有取代基的碳數為6~18的芳基)」及「芳基磺醯基(-SO2Y4,式 中,Y4表示亦可具有取代基的碳數為6~18的芳基)」中,Y2及Y4較佳的是碳數為6~10的芳基。芳基的例子並無限制,可列舉苯基、1-萘基、2-萘基、茚基、聯苯基、蒽基、菲基等。 In the present specification, "arylthio (-SY 2 , wherein Y 2 represents an aryl group having 6 to 18 carbon atoms which may have a substituent)" and "arylsulfonyl (-SO 2 Y 4) formula, Y 4 represents a substituent having a carbon number may also be an aryl group having 6 to 18) "in, Y 2 and Y 4 carbon atoms is preferably an aryl group having 6 to 10. Examples of the aryl group are not limited, and examples thereof include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, an anthracenyl group, a biphenyl group, a fluorenyl group, and a phenanthryl group.

於「碳數為1~20的烴基」、「碳數為1~20的烷氧基」、「碳數為6~20的芳氧基」、「胺基」、「矽烷基」、「烷硫基」、「芳硫基」、「烷基磺醯基」、「芳基磺醯基」等中亦可導入取代基。 "Carbon group having 1 to 20 carbon atoms", "alkoxy group having 1 to 20 carbon atoms", "aryloxy group having 6 to 20 carbon atoms", "amine group", "decyl group", "alkane" A substituent may be introduced into a sulfur group, an "arylthio group", an "alkylsulfonyl group", an "arylsulfonyl group" or the like.

本說明書中,「取代基」例如可列舉鹵素(氟、氯、溴、碘等)、酯、羧基、醯胺基、炔基、三甲基矽烷基、胺基、膦醯基、硫基、羰基、硝基、磺酸基、亞胺基、鹵代基、或烷氧基等。在這種情況下,取代基可在可取代的位置導入1個以上、直至可取代的最大數為止,較佳的是可導入1個~4個。於取代基數為2個以上的情況下,各取代基可相同亦可不同。 In the present specification, examples of the "substituent" include halogen (such as fluorine, chlorine, bromine, and iodine), an ester, a carboxyl group, a decylamino group, an alkynyl group, a trimethyldecyl group, an amine group, a phosphonium group, and a thio group. A carbonyl group, a nitro group, a sulfonic acid group, an imido group, a halogenated group, or an alkoxy group. In this case, the substituent may be introduced at one or more positions up to the maximum number that can be substituted, and it is preferred to introduce one to four. When the number of substituents is two or more, each substituent may be the same or different.

在本說明書中,「亦可具有取代基的胺基」的例子並無限制,存在有胺基、二甲基胺基、甲基胺基、甲基苯基胺基、苯基胺基等。 In the present specification, the "amino group which may have a substituent" is not limited, and an amine group, a dimethylamino group, a methylamino group, a methylphenylamino group, a phenylamino group or the like may be present.

在本說明書中,「亦可具有取代基的矽烷基」的例子並無限制,存在有二甲基矽烷基、二乙基矽烷基、三甲基矽烷基、三乙基矽烷基、三甲氧基矽烷基、三乙氧基矽烷基、二苯基甲基矽烷基、三苯基矽烷基、三苯氧基矽烷基、二甲基甲氧基矽烷基、二甲基苯氧基矽烷基、甲基甲氧基苯基等。 In the present specification, the example of the "nonyl group which may have a substituent" is not limited, and there are dimethyl decyl group, diethyl decyl group, trimethyl decyl group, triethyl decyl group, trimethoxy group.矽alkyl, triethoxyalkyl, diphenylmethyl decyl, triphenyl decyl, triphenyloxy decyl, dimethyl methoxy decyl, dimethyl phenoxy decyl, A Methoxy phenyl and the like.

以上,列舉了1價有機基的具體例,在本說明書中,2價有機基的具體例可列舉在本說明書中所記載的1價有機基中進 一步增加1個價數的基。同樣地,在本說明書中,3價有機基的具體例可列舉在本說明書中所記載的1價有機基中進一步增加2個價數的基,4價有機基的具體例可列舉在本說明書中所記載的1價有機基中進一步增加3個價數的基。 Specific examples of the monovalent organic group are listed above, and specific examples of the divalent organic group in the present specification include the monovalent organic group described in the present specification. Add a base of 1 valence in one step. In the same manner, specific examples of the trivalent organic group in the present specification include a group in which two valences are further added to the monovalent organic group described in the present specification, and specific examples of the tetravalent organic group are exemplified in the present specification. Further, a base of three valences is added to the monovalent organic group described in the above.

在本說明書中,所謂「波長為400nm以上的光線」是指可使產生活性物質的化合物分解而產生活性物質的波長為400nm以上的光線,例如可列舉可見光等的光線。 In the present specification, the term "light having a wavelength of 400 nm or more" refers to light having a wavelength at which the active material is decomposed to generate an active material having a wavelength of 400 nm or more, and examples thereof include light rays such as visible light.

可在該聚合反應中所使用的光聚合起始劑若為藉由照射波長為400nm以上的光線而產生自由基的化合物,則並無特別限定。 The photopolymerization initiator to be used in the polymerization reaction is not particularly limited as long as it is a compound which generates a radical by irradiation with light having a wavelength of 400 nm or more.

在本說明書中,「(甲基)丙烯酸酯」用以表示丙烯酸酯與甲基丙烯酸酯的兩者或其中一方。而且,「(甲基)丙烯醯基」用以表示丙烯醯基與甲基丙烯醯基的兩者或其中一方。 In the present specification, "(meth) acrylate" is used to mean either or both of an acrylate and a methacrylate. Further, "(meth)acrylonitrile" is used to mean either or both of an acryloyl group and a methacryl group.

在本說明書中,有時將「光學的立體造型用光硬化性組成物」稱為「光硬化性組成物」或「組成物」。 In the present specification, the "photocurable composition for optical three-dimensional molding" may be referred to as "photocurable composition" or "composition".

由本發明的較佳形態的光硬化性組成物而所得的硬化膜具有高的拉伸彈性模數、斷裂強度及斷裂伸長率,因此可形成柔軟性與彈性的性能平衡良好,韌性優異的造型物。 Since the cured film obtained from the photocurable composition of the preferred embodiment of the present invention has a high tensile modulus, breaking strength, and elongation at break, it is possible to form a molded article having excellent balance between flexibility and elasticity and excellent toughness. .

而且,由本發明的較佳形態的光硬化性組成物所得的造型物可容易地自容器取出,因此並不對造型物及容器造成損傷。特別是在自下方照射光的光學的立體造型法中,於造型物與容器的底面之間具有一定程度以下的接著力,因此可於並不對所得的造型 物及容器造成損傷的情況下剝離。 Further, the molded article obtained from the photocurable composition of the preferred embodiment of the present invention can be easily taken out from the container, so that the molded article and the container are not damaged. In particular, in the optical three-dimensional modeling method in which light is irradiated from below, there is a certain degree of adhesion between the molded object and the bottom surface of the container, so that the resulting shape is not obtained. Peeling in the case where the object and the container cause damage.

而且,本發明的較佳形態的光硬化性組成物可藉由照射波長為400nm以上的光線而容易地硬化。因此,本發明的較佳形態的光硬化性組成物可藉由在一般家庭中亦可容易地使用的通用性高的光積層造型法而製作出造型物。 Further, the photocurable composition of the preferred embodiment of the present invention can be easily cured by irradiation with light having a wavelength of 400 nm or more. Therefore, the photocurable composition of the preferred embodiment of the present invention can be produced by a highly versatile optical layering method which can be easily used in a general household.

1‧‧‧光學的立體造型用光硬化性組成物 1‧‧‧Optical stereolithic photocurable composition

2‧‧‧容器 2‧‧‧ Container

3a、3b‧‧‧遮罩 3a, 3b‧‧‧ mask

4‧‧‧支撐體 4‧‧‧Support

5‧‧‧波長為400nm以上的光線 5‧‧‧Light with a wavelength above 400 nm

6a、6b‧‧‧硬化層 6a, 6b‧‧‧ hardened layer

7‧‧‧容器的底面 7‧‧‧Bottom of the container

圖1(A)~圖1(C)是表示光學的立體造型法的一例的圖。 1(A) to 1(C) are diagrams showing an example of an optical three-dimensional modeling method.

1 光學的立體造型用光硬化性組成物 1 Optical stereolithic photocurable composition

本發明的光學的立體造型用光硬化性組成物包含式(1)所表示的自由基聚合性化合物(A)、藉由照射波長為400nm以上的光線而產生自由基的光聚合起始劑(B)、及非水溶性界面活性劑(C)。 The photocurable composition for optical three-dimensional molding of the present invention comprises the radically polymerizable compound (A) represented by the formula (1) and a photopolymerization initiator which generates a radical by irradiation with light having a wavelength of 400 nm or more ( B), and a water-insoluble surfactant (C).

另外,光學的立體造型用光硬化性組成物並不限於無色透明,亦可為有色。 Further, the optical stereolithic photocurable composition is not limited to being colorless and transparent, and may be colored.

以下,對各成分加以說明。 Hereinafter, each component will be described.

1.1 自由基聚合性化合物(A) 1.1 Radical polymerizable compound (A)

本發明的自由基聚合性化合物(A)是式(1)所表示的化合物。 The radically polymerizable compound (A) of the present invention is a compound represented by the formula (1).

式(1)中,a為2以上的整數,較佳的是2~20,更佳的是3~10,特佳的是3~5。 In the formula (1), a is an integer of 2 or more, preferably 2 to 20, more preferably 3 to 10, and particularly preferably 3 to 5.

式(1)中,R1較佳的是包含環氧烷(alkylene oxide)、 或己內酯作為部分結構的有機基,更佳的是包含碳數1~6的環氧烷、或己內酯作為部分結構的有機基。 In the formula (1), R 1 is preferably an organic group containing an alkylene oxide or a caprolactone as a partial structure, more preferably an alkylene oxide having a carbon number of 1 to 6, or The ester serves as an organic group of a partial structure.

式(1)中,R2為氫或碳數1~6的烷基,特佳的是氫或碳數1的烷基,最佳的是氫。 In the formula (1), R 2 is hydrogen or an alkyl group having 1 to 6 carbon atoms, particularly preferably hydrogen or an alkyl group having 1 carbon atom, and most preferably hydrogen.

自由基聚合性化合物(A)亦可使用市售品,亦可使用由異氰酸酯化合物與具有羥基與(甲基)丙烯醯基的化合物等而合成者。 A commercially available product may be used as the radically polymerizable compound (A), and a compound obtained from an isocyanate compound and a compound having a hydroxyl group and a (meth)acryloyl group may be used.

自由基聚合性化合物(A)的市售品可列舉BLEMMER TA-604AU(商品名;日油(股))、New frontier R1220、New frontier RST101、New frontier RST201、New frontier R-1306X(商品名;第一工業製藥(股))、紫光UV-3000B、紫光3310B、紫光7000B、紫光7600B(商品名;日本合成化學工業(股))、同9893、同981、同964、同9013、同9001(商品名;Arkema Japan)、ARONIX M-215、ARONIX 313、ARONIX 315、ARONIX 327(商品名;東亞合成(股))等。 Commercial products of the radical polymerizable compound (A) include BLEMMER TA-604AU (trade name; Nippon Oil Co., Ltd.), New frontier R1220, New frontier RST101, New frontier RST201, New frontier R-1306X (trade name; First Industrial Pharmaceutical Co., Ltd., Violet UV-3000B, Violet 3310B, Violet 7000B, Violet 7600B (trade name; Japan Synthetic Chemical Industry Co., Ltd.), the same as 9893, the same 981, the same 964, the same 9013, the same 9001 ( Trade name; Arkema Japan), ARONIX M-215, ARONIX 313, ARONIX 315, ARONIX 327 (trade name; East Asia Synthetic Co., Ltd.).

自由基聚合性化合物(A)可為1種,亦可為2種以上的混合物。 The radically polymerizable compound (A) may be used singly or in combination of two or more kinds.

若相對於組成物的總重量而言,本發明的光硬化性組成物中所含的自由基聚合性化合物(A)的含量為3重量%~96重量%,則藉由照射波長為400nm以上的光線而所得的造型物的柔軟性、彈性變高,因此較佳,更佳的是5重量%~96重量%,進一步更佳的是10重量%~96重量%。 When the content of the radically polymerizable compound (A) contained in the photocurable composition of the present invention is from 3% by weight to 96% by weight based on the total weight of the composition, the irradiation wavelength is 400 nm or more. The light of the resulting molded article is preferably softer and more elastic, and is more preferably from 5% by weight to 96% by weight, still more preferably from 10% by weight to 96% by weight.

1.2 光聚合起始劑(B) 1.2 Photopolymerization initiator (B)

本發明的光聚合起始劑(B)若為可藉由照射波長為400nm以上的光線而產生自由基的化合物,則並無特別限定,α-胺基烷基苯酮系及醯基膦系的光聚合起始劑可使光硬化性組成物的光硬化性與保存性變良好,因此更佳。 The photopolymerization initiator (B) of the present invention is not particularly limited as long as it can generate a radical by irradiation with light having a wavelength of 400 nm or more, and the α-aminoalkylphenone and the mercaptophosphine are. The photopolymerization initiator is more preferable because it can improve photocurability and preservability of the photocurable composition.

可藉由照射波長為400nm以上的光線而產生自由基的化合物的具體例可列舉:2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基-1-丙酮、2-(二甲基胺基)-1-(4-嗎啉代苯基)-2-苄基-1-丁酮、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]-1-丁酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代-1-丙酮、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦、2,4,6-三甲基苯甲醯基-二苯基-氧化膦、雙(η5-2,4-環戊二烯-1-基)-雙(2,6-二氟-3-(1H-吡咯-1-基)-苯基)鈦、1-[4-(苯基硫基)苯基]-1,2-辛二酮-2-(O-苯甲醯基肟)。 Specific examples of the compound which can generate a radical by irradiation with light having a wavelength of 400 nm or more include 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propenyl)-benzyl Phenyl]-2-methyl-1-propanone, 2-(dimethylamino)-1-(4-morpholinophenyl)-2-benzyl-1-butanone, 2-( Dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butanone, 2-methyl-1- [4-(Methylthio)phenyl]-2-morpholino-1-propanone, bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide, 2,4,6- trimethyl benzoyl group - diphenyl - phosphine oxide, bis (η 5 -2,4- cyclopentadien-1-yl) - bis (2,6-difluoro-3- (lH-pyrrol - 1-yl)-phenyl)titanium, 1-[4-(phenylthio)phenyl]-1,2-octanedione-2-(O-benzoguanidinopurine).

該些中較佳的是作為α-胺基烷基苯酮系或醯基膦系化合物的2-(二甲基胺基)-1-(4-嗎啉代苯基)-2-苄基-1-丁酮、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]-1-丁酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代-1-丙酮、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦、2,4,6-三甲基苯甲醯基-二苯基-氧化膦。 Preferred among these are 2-(dimethylamino)-1-(4-morpholinophenyl)-2-benzyl which is an α-aminoalkylphenone or a mercaptophosphine compound. 1-butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butene Ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-1-propanone, bis(2,4,6-trimethylbenzylidene)-phenyl Phosphine oxide, 2,4,6-trimethylbenzylidene-diphenyl-phosphine oxide.

光聚合起始劑(B)可為1種,亦可為2種以上的混合物。 The photopolymerization initiator (B) may be one type or a mixture of two or more types.

若相對於組成物中所含有的自由基聚合性化合物的總和100重量份而言,光聚合起始劑(B)的含量為1重量份~25 重量份,則光硬化性優異,因此較佳,更佳的是3重量份~20重量份,進一步更佳的是5重量份~15重量份。 The content of the photopolymerization initiator (B) is 1 part by weight to 25 parts by weight based on 100 parts by weight of the total of the radical polymerizable compound contained in the composition. The parts by weight are excellent in photocurability, and therefore more preferably 3 parts by weight to 20 parts by weight, still more preferably 5 parts by weight to 15 parts by weight.

1.3 非水溶性界面活性劑(C) 1.3 water-insoluble surfactant (C)

本發明的非水溶性界面活性劑(C)若為非水溶性的界面活性劑則並無特別限定,較佳的是與本發明的光硬化性組成物中所含的其他成分的相溶性良好的化合物。而且,較佳的是並不對由光硬化性組成物所得的造型物的柔軟性及彈性造成影響,可使由該光硬化性組成物所得的造型物的脫模性提高的化合物。 The water-insoluble surfactant (C) of the present invention is not particularly limited as long as it is a water-insoluble surfactant, and it is preferred that the water-insoluble surfactant (C) is compatible with other components contained in the photocurable composition of the present invention. compound of. Further, a compound which does not affect the flexibility and elasticity of the molded article obtained from the photocurable composition, and which has improved mold release property of the molded article obtained from the photocurable composition, is preferable.

非水溶性界面活性劑(C)較佳的是非離子性界面活性劑,特佳的是非水溶性氟系界面活性劑及非水溶性矽酮系界面活性劑。 The water-insoluble surfactant (C) is preferably a nonionic surfactant, and particularly preferably a water-insoluble fluorine-based surfactant and a water-insoluble anthrone-based surfactant.

非水溶性界面活性劑(C)的具體例可列舉Megafac RS-72K、Megafac F-444、Megafac F-555(商品名;DIC(股))、TEGO Rad 2200N、TEGO Rad 2250、TEGO Rad 2500、TEGO Rad 2600、TEGO Rad 2700(商品名;日本贏創德固賽(Evonik Degussa Japan)(股))、BYK-306、BYK-310、BYK-315、BYK-322、BYK-370、BYK-377、BYK-3550、BYK-UV3500(商品名;日本畢克化學(股))等。 Specific examples of the water-insoluble surfactant (C) include Megafac RS-72K, Megafac F-444, Megafac F-555 (trade name; DIC), TEGO Rad 2200N, TEGO Rad 2250, and TEGO Rad 2500. TEGO Rad 2600, TEGO Rad 2700 (trade name; Evonik Degussa Japan), BYK-306, BYK-310, BYK-315, BYK-322, BYK-370, BYK-377 , BYK-3550, BYK-UV3500 (trade name; Japan BYK Chemical Co., Ltd.) and so on.

本發明的光硬化性組成物中所使用的非水溶性界面活性劑(C)可為1種,亦可為2種以上的混合物。 The water-insoluble surfactant (C) used in the photocurable composition of the present invention may be one type or a mixture of two or more types.

而且,若相對於組成物的總重量而言,非水溶性界面活性劑(C)的含量為0.05重量%~5重量%,則自容器的脫模性優 異而較佳,更佳的是0.1重量%~5重量%,特佳的是0.5重量%~5重量%。 Further, if the content of the water-insoluble surfactant (C) is from 0.05% by weight to 5% by weight based on the total weight of the composition, the release property from the container is excellent. It is preferably, more preferably, it is 0.1% by weight to 5% by weight, and particularly preferably 0.5% by weight to 5% by weight.

1.4 其他自由基聚合性化合物(D) 1.4 Other radical polymerizable compounds (D)

本發明的其他自由基聚合性化合物(D)若為式(3)所表示的化合物且並非自由基聚合性化合物(A)的化合物,則並無限定。 The other radically polymerizable compound (D) of the present invention is not limited as long as it is a compound represented by the formula (3) and is not a compound of the radical polymerizable compound (A).

式(3)中,R4為氫或碳數為1~6的烷基,較佳的是氫或碳數為1~3的烷基,更佳的是氫或碳數為1的烷基,最佳的是氫。 In the formula (3), R 4 is hydrogen or an alkyl group having 1 to 6 carbon atoms, preferably hydrogen or an alkyl group having 1 to 3 carbon atoms, more preferably hydrogen or an alkyl group having 1 carbon atom. The best is hydrogen.

式(4)中,R5為亦可具有環狀結構的2價有機基,較佳的是碳數為2~20的2價有機基,更佳的是碳數為4~15的2價有機基。 In the formula (4), R 5 is a divalent organic group which may have a cyclic structure, preferably a divalent organic group having a carbon number of 2 to 20, more preferably a divalent organic group having a carbon number of 4 to 15. Organic base.

化合物(D)的R3為具有(4)式所表示的結構的化合物的具體的化合物可列舉:(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸-2-羥基丙酯、(甲基)丙烯酸-4-羥基丁酯、1,4-環己烷二甲醇單(甲基)丙烯酸酯、(甲基)丙烯酸-2-羥基-3-苯氧基丙酯、(甲基)丙烯酸羥基苯酯、異三聚氰酸環氧乙烷改質二(甲基)丙烯酸酯、丙三醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯。 Specific examples of the compound in which R 3 of the compound (D) is a compound having a structure represented by the formula (4) include 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate. 4-hydroxybutyl (meth)acrylate, 1,4-cyclohexanedimethanol mono(meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, (methyl) Hydroxyphenyl acrylate, isomeric cyanuric acid ethylene oxide modified di(meth) acrylate, glycerol di(meth) acrylate, pentaerythritol di(meth) acrylate, trimethylolpropane Di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate.

該些以外的其他自由基聚合性化合物(D)的具體化合物可列舉:(甲基)丙烯酸正丁酯、(甲基)丙烯酸第三丁酯、γ-丁內酯(甲基)丙烯酸酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸環己酯、 (甲基)丙烯酸異冰片酯、(甲基)丙烯酸苄酯、聚氧乙烯單(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯等。 Specific examples of the other radical polymerizable compound (D) other than these include n-butyl (meth)acrylate, tert-butyl (meth)acrylate, and γ-butyrolactone (meth)acrylate. Tetrahydrofurfuryl (meth)acrylate, cyclohexyl (meth)acrylate, Isobornyl (meth)acrylate, benzyl (meth)acrylate, polyoxyethylene mono(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, Dipentaerythritol hexa(meth) acrylate or the like.

本發明的其他自由基聚合性化合物(D)可適宜地用以在不損及由該組成物所得的造型物的柔軟性、彈性的範圍內調整該組成物的黏度。 The other radically polymerizable compound (D) of the present invention can be suitably used to adjust the viscosity of the composition within a range that does not impair the flexibility and elasticity of the molded article obtained from the composition.

其他自由基聚合性化合物(D)可為1種,亦可為2種以上的混合物。 The other radically polymerizable compound (D) may be used alone or in combination of two or more.

相對於組成物的總重量而言,其他自由基聚合性化合物(D)的含量較佳的是10重量%~90重量%,更佳的是20重量%~80重量%,進一步更佳的是25重量%~75重量%。 The content of the other radically polymerizable compound (D) is preferably from 10% by weight to 90% by weight, more preferably from 20% by weight to 80% by weight, based on the total weight of the composition, and still more preferably 25 wt% to 75% by weight.

1.5 其他添加劑 1.5 Other additives

本發明的光硬化性組成物可在不偏離本發明的主旨的範圍內包含可均一地混合的添加劑。具體而言,光硬化性組成物可包含溶劑、聚合抑制劑、塑化劑、抗氧化劑、紫外線吸收劑、抗靜電劑、阻燃劑、阻燃助劑、填充劑、顏料、染料等各種添加劑。 The photocurable composition of the present invention may contain an additive which can be uniformly mixed within a range not departing from the gist of the present invention. Specifically, the photocurable composition may include various additives such as a solvent, a polymerization inhibitor, a plasticizer, an antioxidant, an ultraviolet absorber, an antistatic agent, a flame retardant, a flame retardant, a filler, a pigment, a dye, and the like. .

本發明的光硬化性組成物亦可在不偏離本發明的主旨的範圍內,為了提高保存穩定性而含有聚合抑制劑。聚合抑制劑的具體例可列舉4-甲氧基苯酚、對苯二酚及啡噻嗪。該些化合物中,啡噻嗪即使在長期的保存中黏度的增加亦小,因此較佳。 The photocurable composition of the present invention may contain a polymerization inhibitor in order to improve storage stability without departing from the gist of the present invention. Specific examples of the polymerization inhibitor include 4-methoxyphenol, hydroquinone, and phenothiazine. Among these compounds, phenothiazine is preferred even if the viscosity is increased during long-term storage.

本發明的光硬化性組成物中所使用的聚合抑制劑可為1種,亦可為2種以上的混合物。 The polymerization inhibitor to be used in the photocurable composition of the present invention may be one type or a mixture of two or more types.

若相對於光硬化性組成物中所含的光硬化性化合物的總和100重量份而言,聚合抑制劑的含量為0.01重量份~1重量份,則即使在長期的保存中黏度的增加亦小,因此較佳,若考慮與光硬化性的平衡,則更佳的是0.01重量份~0.5重量份,進一步更佳的是0.01重量份~0.2重量份。 When the content of the polymerization inhibitor is from 0.01 part by weight to 1 part by weight based on 100 parts by weight of the total of the photocurable compound contained in the photocurable composition, the viscosity increases little even in long-term storage. Therefore, it is more preferable to use 0.01 parts by weight to 0.5 parts by weight, and more preferably 0.01 parts by weight to 0.2 parts by weight, in consideration of the balance with photocurability.

1.6 本發明的光學的立體造型用光硬化性組成物的製備方法 1.6 Method for preparing photocurable composition for optical three-dimensional modeling of the present invention

本發明的光硬化性組成物可藉由公知的方法將成為原料的各成分加以混合而製備。 The photocurable composition of the present invention can be prepared by mixing various components which are raw materials by a known method.

特佳的是本發明的光硬化性組成物可藉由將上述(A)成分~(C)成分及視需要的其他成分加以混合,對所得的溶液進行過濾脫氣而製備。上述過濾中例如可使用氟樹脂製的膜濾器(membrane filter)。 Particularly preferably, the photocurable composition of the present invention can be prepared by mixing the above components (A) to (C) and optionally other components, and filtering and degassing the obtained solution. For the above filtration, for example, a membrane filter made of a fluororesin can be used.

藉由光學的立體造型法而獲得所期望的形狀的造型物,上述光學的立體造型法是對如上所述而所得的本發明的光學的立體造型用光硬化性組成物以規定的圖案而照射波長為400nm以上的光線。 The optical three-dimensional modeling method obtains a molded object having a desired shape, and the optical three-dimensional molding method irradiates the optical stereolithic photocurable composition of the present invention obtained as described above in a predetermined pattern. Light with a wavelength of 400 nm or more.

1.7 本發明的光硬化性組成物的保存 1.7 Preservation of the photocurable composition of the present invention

本發明的光硬化性組成物若在5℃~25℃下進行保存,則保存中的黏度變化變小,因此保存穩定性良好。 When the photocurable composition of the present invention is stored at 5 to 25 ° C, the change in viscosity during storage is small, so that the storage stability is good.

2 造型物的製造方法 2 How to make shaped objects

本發明的造型物可藉由公知的光積層造型法等光學的立體造 型法而造型。基於圖1(A)~圖1(C)對光學的立體造型法加以說明。 The shaped object of the present invention can be optically formed by a known optical layering method or the like. Modeling and modeling. The optical three-dimensional modeling method will be described based on Fig. 1(A) to Fig. 1(C).

如圖1(A)所示那樣,在容器2中收容光硬化性組成物1,以支撐體4的平台(stage)潛於光硬化性組成物1的液面下的方式設置可升降的支撐體4。容器的底面7是可透過波長為400nm以上的光線的透明材料,材質並無特別限定,例如可列舉玻璃、聚四氟乙烯(以下稱為「PTFE」)等氟樹脂、矽酮樹脂、金屬等。而且,亦可為於透明材料上貼合有PTFE薄板等的複合材料。 As shown in FIG. 1(A), the photocurable composition 1 is housed in the container 2, and the platform can be lifted and lowered so that the stage of the support 4 is submerged under the liquid surface of the photocurable composition 1. Body 4. The bottom surface 7 of the container is a transparent material that can transmit light having a wavelength of 400 nm or more, and the material is not particularly limited, and examples thereof include a fluororesin such as glass or polytetrafluoroethylene (hereinafter referred to as "PTFE"), an anthrone resin, and a metal. . Further, a composite material such as a PTFE sheet may be bonded to the transparent material.

其次,如圖1(B)所示那樣,基於所製造的造型物的形狀而將遮罩3a設置於容器的下方。若自遮罩3的下方照射波長為400nm以上的光線5,則未被遮罩3a遮蔽的波長為400nm以上的光線5到達容器2內的光硬化性組成物1上而使其硬化,於支撐體4的平台的下表面形成硬化層6a(第1層形成步驟)。 Next, as shown in FIG. 1(B), the mask 3a is placed under the container based on the shape of the manufactured object. When the light 5 having a wavelength of 400 nm or more is irradiated from the lower side of the mask 3, the light 5 having a wavelength of 400 nm or less which is not blocked by the mask 3a reaches the photocurable composition 1 in the container 2, and is hardened and supported. The lower surface of the platform of the body 4 forms a hardened layer 6a (first layer forming step).

其後,如圖1(C)所示那樣使支撐體4上升,基於所製造的造型物的形狀而設置遮罩3b。若自遮罩3b的下方照射波長為400nm以上的光線5,則未被遮罩3b遮蔽的波長為400nm以上的光線5到達容器2內的光硬化性組成物1上而使其硬化,於硬化層6a的下側形成硬化層6b(積層步驟)。反覆進行設定使波長為400nm以上的光線5所透過的區域,照射波長為400nm以上的光線5而使光硬化性組成物1硬化的該積層步驟,由此可製造一體地積層有多個硬化層的立體的造型物。 Thereafter, as shown in FIG. 1(C), the support 4 is raised, and the mask 3b is provided based on the shape of the manufactured object. When the light 5 having a wavelength of 400 nm or more is irradiated from the lower side of the mask 3b, the light 5 having a wavelength of 400 nm or more which is not blocked by the mask 3b reaches the photocurable composition 1 in the container 2, and is hardened and hardened. The lower side of the layer 6a forms a hardened layer 6b (layering step). In the region where the light 5 having a wavelength of 400 nm or more is transmitted, the step of irradiating the light 5 having a wavelength of 400 nm or more to cure the photocurable composition 1 is repeatedly performed, whereby a plurality of hardened layers can be integrally formed. The three-dimensional shape of the object.

光學的立體造型法中所使用的遮罩3的形狀可根據將所 造型的立體模式的3維CAD資料切片為多個層而所得的剖面群組的資料而設計。 The shape of the mask 3 used in the optical three-dimensional modeling method can be based on The three-dimensional CAD data slice of the stereoscopic mode of the modeling is designed as data of the obtained profile group of the plurality of layers.

上述光學的立體造型法是自容器2的下方照射波長為400nm以上的光線而於支撐體4的平台的下方積層硬化層的方法,照射波長為400nm以上的光線的方向並不限於自容器2的下方,亦可自容器2的橫向、上方而照射波長為400nm以上的光線。例如,在自容器2的上方照射波長為400nm以上的光線的情況下,變得於支撐體4的平台的上方積層硬化層,因此變得一面使支撐體向下方沈降一面反覆積層。 The optical three-dimensional modeling method is a method of irradiating a light having a wavelength of 400 nm or more from the lower side of the container 2 to laminate a hardened layer under the platform of the support 4, and the direction of the light having a wavelength of 400 nm or more is not limited to the container 2 Below, light having a wavelength of 400 nm or more may be irradiated from the lateral direction and the upper side of the container 2. For example, when light having a wavelength of 400 nm or more is irradiated from above the container 2, a hardened layer is formed on the upper surface of the support 4, and thus the support is deposited while being deposited downward.

作為對光硬化性組成物1選擇性照射波長為400nm以上的光線的方法,並不限制於使用遮罩3,可採用各種手段。例如亦可使用一面掃描使用雷射光、透鏡等而所得的會聚光(convergent light)等,一面對光硬化性組成物1進行照射的方法。 The method of selectively irradiating the photocurable composition 1 with light having a wavelength of 400 nm or more is not limited to the use of the mask 3, and various means can be employed. For example, a method of irradiating the photocurable composition 1 with a convergent light obtained by using a laser beam, a lens, or the like may be used.

較佳的是在將積層硬化層而所得的造型物自容器2取出後,對造型物進行清洗。清洗劑並無特別限定,例如使用乙醇。 Preferably, the molded article obtained by laminating the hardened layer is taken out from the container 2, and then the molded article is washed. The cleaning agent is not particularly limited, and for example, ethanol is used.

所照射的波長為400nm以上的光線的量(曝光量)可根據光硬化性組成物的組成、1次照射所欲形成的硬化層的厚度而調整,藉由安裝有牛尾電機(股)製造的光接收器UVD-405PD的累計光量計UIT-201而進行測定,較佳的是10mJ/cm2~1,000mJ/cm2,更佳的是10mJ/cm2~500mJ/cm2,進一步更佳的是10mJ/cm2~300mJ/cm2。而且,所照射的光線的波長較佳的是400nm~550nm,更佳的是400nm~500nm。 The amount of light (exposure amount) of the wavelength of 400 nm or more to be irradiated can be adjusted according to the composition of the photocurable composition and the thickness of the hardened layer to be formed by one irradiation, and is manufactured by mounting a oxtail motor (strand). The photodetector UVD-405PD is measured by an integrated photometer UIT-201, preferably 10 mJ/cm 2 to 1,000 mJ/cm 2 , more preferably 10 mJ/cm 2 to 500 mJ/cm 2 , further preferably It is 10 mJ/cm 2 to 300 mJ/cm 2 . Further, the wavelength of the light to be irradiated is preferably from 400 nm to 550 nm, more preferably from 400 nm to 500 nm.

光源若為照射波長為400nm以上的光線的裝置則並無特別限定,例如可使用LED、高壓水銀燈、超高壓水銀燈、金屬鹵素燈、鹵素燈、氙氣燈等。 The light source is not particularly limited as long as it emits light having a wavelength of 400 nm or more. For example, an LED, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a halogen lamp, a xenon lamp, or the like can be used.

藉由如上所述地進行,可由本發明的光硬化性組成物而製作柔軟性、彈性高的光造型物,且可將造型物容易地自容器中取出。 By carrying out as described above, a light-sensitive composition having high flexibility and elasticity can be produced from the photocurable composition of the present invention, and the molded article can be easily taken out from the container.

3 造型物 3 shape objects

本發明的造型物可藉由上述光學的立體造型法而製造。亦即,於光學的立體造型法中,使本發明的光硬化性組成物組成物的特定部分硬化後,使支撐體移動且一面變更光的照射位置(照射面)一面積層硬化層,由此而獲得規定立體形狀的造型物。因此,本發明的造型物包含使光學的立體造型用光硬化性組成物硬化而所得的硬化層的積層體。 The shaped object of the present invention can be produced by the above-described optical three-dimensional modeling method. In the optical three-dimensional molding method, after the specific portion of the photocurable composition of the present invention is cured, the support is moved while changing the irradiation position (irradiation surface) of the light to the one-layer hardened layer. A shaped object having a predetermined three-dimensional shape is obtained. Therefore, the molded article of the present invention includes a laminate of a hardened layer obtained by curing an optical stereolithic photocurable composition.

本發明的造型物的大小並無特別限定,通常為數mm至數m,典型的是數cm至數十cm的尺度(scale)。 The size of the shaped object of the present invention is not particularly limited, but is usually from several mm to several m, and typically is a scale of several cm to several tens of cm.

[實施例] [Examples]

以下,藉由實施例對本發明進一步加以說明,但本發明並不限定於該些實施例。 Hereinafter, the present invention will be further illustrated by the examples, but the present invention is not limited to the examples.

[實施例1] [Example 1]

將作為自由基聚合性化合物(A)的BLEMMER TA-604AU(商品名;日油(股)、以下稱為「TA-604AU」)、作為光聚合起始劑(B)的DAROCUR TPO(商品名;日本巴斯夫(BASF Japan)(股)、 以下稱為「TPO」)、作為非水溶性界面活性劑(C)的氟系非水溶性界面活性劑的Megafac RS-72K(商品名;DIC(股)、以下稱為「RS-72K」。固體成分濃度:30wt%)、作為其他自由基聚合性化合物(D)的丙烯酸-4-羥基丁酯(商品名;日本化成(股)、以下稱為「4HBA」)以下述組成加以混合、溶解後,用PTFE製的膜濾器(5μm)進行過濾,製備光硬化性組成物1。 BLEMAMER TA-604AU (trade name; Nippon Oil Co., Ltd., hereinafter referred to as "TA-604AU") as a radical polymerization compound (A), and DAROCUR TPO (trade name) as a photopolymerization initiator (B) ; BASF Japan (shares), Hereinafter referred to as "TPO"), Megafac RS-72K (trade name; DIC), hereinafter referred to as "RS-72K", which is a fluorine-based water-insoluble surfactant of the water-insoluble surfactant (C). Solid content concentration: 30% by weight), 4-hydroxybutyl acrylate (trade name; Nippon Kasei Co., Ltd., hereinafter referred to as "4HBA") as another radical polymerizable compound (D), which is mixed and dissolved by the following composition Thereafter, the mixture was filtered through a membrane filter (5 μm) made of PTFE to prepare a photocurable composition 1.

(A)TA-604AU 8.00g (A) TA-604AU 8.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)RS-72K 0.56g (C) RS-72K 0.56g

(D)4HBA 8.00g (D) 4HBA 8.00g

使用E型黏度計TV-22(商品名;東機產業(股)、以下稱為「TV-22」),測定25℃下的光硬化性組成物1的黏度,結果是165mPa.s。 The viscosity of the photocurable composition 1 at 25 ° C was measured using an E-type viscometer TV-22 (trade name; Toki Sangyo Co., Ltd., hereinafter referred to as "TV-22"), and the result was 165 mPa. s.

[實施例2] [Embodiment 2]

使用New frontier RST101(商品名;第一工業製藥(股)、以下稱為「RST101」)作為自由基聚合性化合物(A),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物2。 The same procedure as in Example 1 was carried out except that the radical polymerizable compound (A) was used as the radical polymerizable compound (A) as the radical polymerizable compound (A). The photocurable composition 2 was prepared.

(A)RST101 8.00g (A) RST101 8.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)RS-72K 0.56g (C) RS-72K 0.56g

(D)4HBA 8.00g (D) 4HBA 8.00g

使用TV-22而測定25℃下的光硬化性組成物2的黏度,結果是98mPa.s。 The viscosity of the photocurable composition 2 at 25 ° C was measured using TV-22, and the result was 98 mPa. s.

[實施例3] [Example 3]

使用CN9893(商品名;Arkema Japan製造)作為自由基聚合性化合物(A),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物3。 The photocurable composition 3 was prepared in the same manner as in Example 1 except that the CN9893 (trade name; manufactured by Arkema Japan) was used as the radically polymerizable compound (A).

(A)CN9893 8.00g (A) CN9893 8.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)RS-72K 0.56g (C) RS-72K 0.56g

(D)4HBA 8.00g (D) 4HBA 8.00g

使用TV-22而測定25℃下的光硬化性組成物3的黏度,結果是256mPa.s。 The viscosity of the photocurable composition 3 at 25 ° C was measured using TV-22, and the result was 256 mPa. s.

[實施例4] [Example 4]

使用ARONIX M-327(商品名;東亞合成(股)、以下稱為「M-327」)作為自由基聚合性化合物(A),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物4。 Aronix M-327 (trade name; East Asia Synthetic Co., Ltd., hereinafter referred to as "M-327") was used as the radical polymerizable compound (A) in the same manner as in Example 1 except that the following composition ratio was used. The photocurable composition 4 was prepared.

(A)M-327 12.00g (A) M-327 12.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)RS-72K 0.56g (C) RS-72K 0.56g

(D)4HBA 4.00g (D) 4HBA 4.00g

使用TV-22而測定25℃下的光硬化性組成物4的黏度,結果是225mPa.s。 The viscosity of the photocurable composition 4 at 25 ° C was measured using TV-22, and the result was 225 mPa. s.

[實施例5] [Example 5]

使用4HBA與Light acrylate IB-XA(商品名;共榮社化學(股)、以下稱為「IB-XA」)作為其他自由基聚合性化合物(D),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物5。 4HBA and Light acrylate IB-XA (trade name; Kyoeisha Chemical Co., Ltd., hereinafter referred to as "IB-XA") are used as the other radical polymerizable compound (D), and the following composition ratio is used. The photocurable composition 5 was prepared in the same manner as in Example 1.

(A)TA-604AU 6.00g (A) TA-604AU 6.00g

(B)TPO 0.85g (B) TPO 0.85g

(C)RS-72K 0.60g (C) RS-72K 0.60g

(D)4HBA 1.00g (D) 4HBA 1.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

使用TV-22而測定25℃下的光硬化性組成物5的黏度,結果是98mPa.s。 The viscosity of the photocurable composition 5 at 25 ° C was measured using TV-22, and the result was 98 mPa. s.

[實施例6] [Embodiment 6]

使用IB-XA作為其他自由基聚合性化合物(D),設為下述組成比例,除此以外與實施例4同樣地進行而製備光硬化性組成物6。 The photocurable composition 6 was prepared in the same manner as in Example 4 except that IB-XA was used as the other radically polymerizable compound (D) in the following composition ratio.

(A)M-327 8.00g (A) M-327 8.00g

(B)TPO 0.73g (B) TPO 0.73g

(C)RS-72K 0.51g (C) RS-72K 0.51g

(D)IB-XA 6.50g (D) IB-XA 6.50g

使用TV-22而測定25℃下的光硬化性組成物6的黏度,結果是141mPa.s。 The viscosity of the photocurable composition 6 at 25 ° C was measured using TV-22, and the result was 141 mPa. s.

[實施例7] [Embodiment 7]

使用氟系非水溶性界面活性劑Megafac F-444(商品名;DIC(股)、以下稱為「F-444」。固體成分濃度:100wt%)作為非水溶性界面活性劑(C),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物7。 A fluorine-based water-insoluble surfactant Megafac F-444 (trade name; DIC (hereinafter referred to as "F-444", solid content concentration: 100% by weight) was used as the water-insoluble surfactant (C). The photocurable composition 7 was prepared in the same manner as in Example 1 except for the following composition ratio.

(A)TA-604AU 6.00g (A) TA-604AU 6.00g

(B)TPO 0.85g (B) TPO 0.85g

(C)F-444 0.18g (C) F-444 0.18g

(D)4HBA 1.00g (D) 4HBA 1.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

使用TV-22而測定25℃下的光硬化性組成物7的黏度,結果是98mPa.s。 The viscosity of the photocurable composition 7 at 25 ° C was measured using TV-22, and the result was 98 mPa. s.

[實施例8] [Embodiment 8]

使用矽酮系非水溶性界面活性劑BYK-306(商品名;日本畢克化學(股)、以下稱為「BYK-306」。固體成分濃度:12.5wt%)作為非水溶性界面活性劑(C),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物8。 An indolone-based water-insoluble surfactant BYK-306 (trade name; Japan BYK Chemical Co., Ltd., hereinafter referred to as "BYK-306". Solid content concentration: 12.5 wt%) was used as the water-insoluble surfactant ( C) The photocurable composition 8 was prepared in the same manner as in Example 1 except that the composition ratio was as follows.

(A)TA-604AU 6.00g (A) TA-604AU 6.00g

(B)TPO 0.85g (B) TPO 0.85g

(C)BYK-306 1.428g (C) BYK-306 1.428g

(D)4HBA 1.00g (D) 4HBA 1.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

使用TV-22而測定25℃下的光硬化性組成物8的黏度,結果是97mPa.s。 The viscosity of the photocurable composition 8 at 25 ° C was measured using TV-22, and the result was 97 mPa. s.

[實施例9] [Embodiment 9]

使用New frontier R-1306X(商品名;第一工業製藥(股)、以下稱為「R-1306X」)作為自由基聚合性化合物(A),使用氟系非水溶性界面活性劑F-444作為非水溶性界面活性劑(C),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物9。 A new frontier R-1306X (trade name; First Industrial Pharmaceutical Co., Ltd., hereinafter referred to as "R-1306X") was used as the radical polymerizable compound (A), and a fluorine-based water-insoluble surfactant F-444 was used. The photocurable composition 9 was prepared in the same manner as in Example 1 except that the water-insoluble surfactant (C) was used in the following composition ratio.

(A)R-1306X 8.00g (A) R-1306X 8.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)F-444 0.17g (C) F-444 0.17g

(D)4HBA 8.00g (D) 4HBA 8.00g

使用TV-22而測定25℃下的光硬化性組成物9的黏度,結果是189mPa.s。 The viscosity of the photocurable composition 9 at 25 ° C was measured using TV-22, and the result was 189 mPa. s.

[實施例10] [Embodiment 10]

使用4HBA與IB-XA作為其他自由基聚合性化合物(D),設為下述組成比例,除此以外與實施例9同樣地進行而製備光硬化性組成物10。 The photocurable composition 10 was prepared in the same manner as in Example 9 except that 4HBA and IB-XA were used as the other radically polymerizable compound (D) in the following composition ratio.

(A)R-1306X 8.00g (A) R-1306X 8.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)F-444 0.17g (C) F-444 0.17g

(D)4HBA 4.00g (D) 4HBA 4.00g

(D)IB-XA 4.00g (D) IB-XA 4.00g

使用TV-22而測定25℃下的光硬化性組成物10的黏度,結果是232mPa.s。 The viscosity of the photocurable composition 10 at 25 ° C was measured using TV-22, and the result was 232 mPa. s.

[比較例1] [Comparative Example 1]

並未使用自由基聚合性化合物(A),使用季戊四醇三丙烯酸酯ARONIX M-305(商品名;東亞合成(股)、以下稱為「M-305」)及4HBA作為其他自由基聚合性化合物(D),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物C1。 The radical polymerizable compound (A) was not used, and pentaerythritol triacrylate ARONIX M-305 (trade name; East Asia Synthetic Co., hereinafter referred to as "M-305") and 4HBA were used as other radical polymerizable compounds ( D) The photocurable composition C1 was prepared in the same manner as in Example 1 except that the composition ratio was as follows.

(B)TPO 0.80g (B) TPO 0.80g

(C)RS-72K 0.56g (C) RS-72K 0.56g

(D)4HBA 4.00g (D) 4HBA 4.00g

(D)M-305 12.00g (D)M-305 12.00g

使用TV-22而測定25℃下的光硬化性組成物C1的黏度,結果是109mPa.s。 The viscosity of the photocurable composition C1 at 25 ° C was measured using TV-22, and the result was 109 mPa. s.

[比較例2] [Comparative Example 2]

並未使用界面活性劑(C),設為下述組成比例,除此以外與實施例5同樣地進行而製備光硬化性組成物C2。 The photocurable composition C2 was prepared in the same manner as in Example 5 except that the surfactant (C) was not used.

(A)TA-604AU 6.00g (A) TA-604AU 6.00g

(B)TPO 0.85g (B) TPO 0.85g

(D)4HBA 1.00g (D) 4HBA 1.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

使用TV-22而測定25℃下的光硬化性組成物C2的黏度, 結果是100mPa.s。 The viscosity of the photocurable composition C2 at 25 ° C was measured using TV-22, The result is 100mPa. s.

[比較例3] [Comparative Example 3]

並未使用光聚合起始劑(B),使用作為並不藉由照射波長為400nm以上的光線而產生自由基的光聚合起始劑的1-羥基環己基苯基酮(日本巴斯夫(股)、以下稱為「Irg184」),設為下述組成比例,除此以外與實施例5同樣地進行而製備光硬化性組成物C3。 The photopolymerization initiator (B) is not used, and 1-hydroxycyclohexyl phenyl ketone which is a photopolymerization initiator which does not generate radicals by irradiation with light having a wavelength of 400 nm or more is used (Japan BASF) The photocurable composition C3 was prepared in the same manner as in Example 5 except that the composition ratio was the same as that of the following composition ratio (hereinafter referred to as "Irg 184").

(A)TA-604AU 6.00g (A) TA-604AU 6.00g

(C)RS-72K 0.60g (C) RS-72K 0.60g

(D)4HBA 1.00g (D) 4HBA 1.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

Irg184 0.85g Irg184 0.85g

使用TV-22而測定25℃下的光硬化性組成物C3的黏度,結果是98mPa.s。 The viscosity of the photocurable composition C3 at 25 ° C was measured using TV-22, and the result was 98 mPa. s.

[比較例4] [Comparative Example 4]

使用紫光UV-7000B(商品名;日本合成化學工業(股)、以下稱為「UV-7000B」)作為化合物(A),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物C4。 The same procedure as in Example 1 was carried out except that the compound (A) was used as the compound (A) in the form of the following composition ratio, using the UV-7000B (trade name; Nippon Synthetic Chemical Industry Co., Ltd., hereinafter referred to as "UV-7000B"). A photocurable composition C4 was prepared.

(A)UV-7000B 8.00g (A)UV-7000B 8.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)RS-72K 0.56g (C) RS-72K 0.56g

(D)4HBA 8.00g (D) 4HBA 8.00g

使用TV-22而測定25℃下的光硬化性組成物C4的黏度, 結果是278mPa.s。 The viscosity of the photocurable composition C4 at 25 ° C was measured using TV-22, The result is 278mPa. s.

[比較例5] [Comparative Example 5]

使用4HBA與IB-XA作為其他自由基聚合性化合物(D),設為下述組成比例,除此以外與實施例3同樣地進行而製備光硬化性組成物C5。 The photocurable composition C5 was prepared in the same manner as in Example 3 except that 4HBA and IB-XA were used as the other radically polymerizable compound (D) in the following composition ratio.

(A)CN9893 6.00g (A) CN9893 6.00g

(B)TPO 0.90g (B) TPO 0.90g

(C)RS-72K 0.63g (C) RS-72K 0.63g

(D)4HBA 2.00g (D) 4HBA 2.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

使用TV-22而測定25℃下的光硬化性組成物C5的黏度,結果是147mPa.s。 The viscosity of the photocurable composition C5 at 25 ° C was measured using TV-22, and the result was 147 mPa. s.

[比較例6] [Comparative Example 6]

使用New frontier R1220(商品名;第一工業製藥(股)、以下稱為「R1220」)作為化合物(A),設為下述組成比例,除此以外與實施例1同樣地進行而製備光硬化性組成物C6。 Photohardening was carried out in the same manner as in Example 1 except that New Frontier R1220 (trade name; First Industrial Pharmaceutical Co., Ltd., hereinafter referred to as "R1220") was used as the compound (A), and the following composition ratio was used. Sex composition C6.

(A)R1220 8.00g (A) R1220 8.00g

(B)TPO 0.80g (B) TPO 0.80g

(C)RS-72K 0.56g (C) RS-72K 0.56g

(D)4HBA 8.00g (D) 4HBA 8.00g

使用TV-22而測定25℃下的光硬化性組成物C6的黏度,結果是262mPa‥s。 The viscosity of the photocurable composition C6 at 25 ° C was measured using TV-22, and as a result, it was 262 mPa·.s.

[比較例7] [Comparative Example 7]

使用氟系水溶性界面活性劑Megafac F-477(商品名;DIC(股)、以下稱為「F-477」。固體成分濃度:100wt%)代替非水溶性界面活性劑(C),設為下述組成比例,除此以外與實施例5同樣地進行而製備光硬化性組成物C7。 The fluorine-based water-soluble surfactant Megafac F-477 (trade name; DIC (share), hereinafter referred to as "F-477". solid content concentration: 100% by weight) was used instead of the water-insoluble surfactant (C). The photocurable composition C7 was prepared in the same manner as in Example 5 except for the following composition ratio.

(A)TA-604AU 6.00g (A) TA-604AU 6.00g

(B)TPO 0.85g (B) TPO 0.85g

(D)4HBA 1.00g (D) 4HBA 1.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

F-477 0.18g F-477 0.18g

光硬化性組成物C7懸濁,因此中止其後的評價。 Since the photocurable composition C7 was suspended, the subsequent evaluation was suspended.

[比較例8] [Comparative Example 8]

使用矽酮系水溶性界面活性劑BYK-342(商品名;日本畢克化學(股)、固體成分濃度:53wt%)代替非水溶性界面活性劑(C),設為下述組成比例,除此以外與實施例5同樣地進行而製備光硬化性組成物C8。 The indolinone-based water-soluble surfactant BYK-342 (trade name; Japan BYK Chemical Co., Ltd., solid content concentration: 53% by weight) was used instead of the water-insoluble surfactant (C), and the following composition ratio was used. The photocurable composition C8 was prepared in the same manner as in Example 5 except for the above.

(A)TA-604AU 6.00g (A) TA-604AU 6.00g

(B)TPO 0.85g (B) TPO 0.85g

(D)4HBA 1.00g (D) 4HBA 1.00g

(D)IB-XA 10.00g (D) IB-XA 10.00g

BYK-342 0.34g BYK-342 0.34g

光硬化性組成物C8懸濁,因此中止其後的評價。 Since the photocurable composition C8 was suspended, the subsequent evaluation was suspended.

實施例及比較例中所使用的M-327、4HBA、IB-XA、TPO及Irg184的結構式如下所述。 The structural formulae of M-327, 4HBA, IB-XA, TPO, and Irg184 used in the examples and comparative examples are as follows.

[化5] [Chemical 5]

[光硬化性組成物的評價] [Evaluation of photocurable composition]

關於上述實施例及比較例中所得的光硬化性組成物,如下所述地評價相溶性、光硬化性、硬化膜的拉伸彈性模數、斷裂強度及斷裂伸長率、以及剝離性。 With respect to the photocurable composition obtained in the above Examples and Comparative Examples, the compatibility, the photocurability, the tensile modulus of the cured film, the breaking strength, the elongation at break, and the peeling property were evaluated as follows.

(1)相溶性 (1) Compatibility

目視觀察所得的光硬化性組成物的各成分是否完全溶解。評價基準如下所述。 Whether or not each component of the obtained photocurable composition was completely dissolved was visually observed. The evaluation criteria are as follows.

○:各成分溶解,墨水透明。 ○: Each component was dissolved, and the ink was transparent.

×:某些成分析出,墨水渾濁。 ×: Some of the analysis showed that the ink was cloudy.

(2)光硬化性 (2) Photohardenability

準備4cm見方之玻璃基板,使用巴斯德吸管(Pasteur pipette)而於玻璃基板上滴下光硬化性組成物0.05g,疊合玻璃基板。其後,進一步疊合h射線透射濾光片後,使用紫外線照射裝置(拓普康(股)製造的TME-400PRC)而照射紫外線。藉由安裝有牛尾電機(股)製造的光接收器UVD-405PD的累計光量計UIT-201而測定該照射的累計曝光量,結果是500mJ/cm2A glass substrate of 4 cm square was prepared, and 0.05 g of a photocurable composition was dropped on a glass substrate using a Pasteur pipette, and the glass substrate was laminated. Thereafter, after the h-ray transmission filter was further laminated, ultraviolet rays were irradiated using an ultraviolet irradiation device (TME-400PRC manufactured by Topcon Co., Ltd.). The cumulative exposure amount of the irradiation was measured by an integrated photometer UIT-201 of a photoreceiver UVD-405PD manufactured by a oxtail motor (sand), and the result was 500 mJ/cm 2 .

照射紫外線後,將疊合的玻璃基板的其中一方剝去,用顯微鏡觀察手指接觸基板表面時的硬化膜的表面狀態。評價基準如下所述。 After the ultraviolet ray was irradiated, one of the laminated glass substrates was peeled off, and the surface state of the cured film when the finger touched the surface of the substrate was observed with a microscope. The evaluation criteria are as follows.

○:於硬化膜表面完全未殘留手指接觸的痕跡。 ○: There was no trace of finger contact on the surface of the cured film.

△:於硬化膜表面殘留少量手指接觸的痕跡。 △: A small amount of finger contact was left on the surface of the cured film.

×:於硬化膜表面完全地殘留手指接觸的痕跡。 ×: Traces of finger contact were completely left on the surface of the cured film.

(3)拉伸彈性模數、斷裂強度、斷裂伸長率 (3) tensile modulus, breaking strength, elongation at break

於貼附有鋁箔的玻璃基板上滴下光硬化性組成物,進行旋塗塗佈(轉速:300rpm),將其收納於進行了氮氣置換的紫外線硬化裝置用置換箱中。其後,疊合h射線透射濾光片,使用紫外線照射裝置(拓普康(股)製造之TME-400PRC)而照射紫外線。藉由安裝有牛尾電機(股)製造之光接收器UVD-405PD的累計光量計UIT-201而測定該照射的累計曝光量,結果是500mJ/cm2The photocurable composition was dropped on a glass substrate to which an aluminum foil was attached, and spin coating (rotation speed: 300 rpm) was carried out, and this was placed in a replacement tank for an ultraviolet curing device which was replaced with nitrogen. Thereafter, the h-ray transmission filter was laminated, and ultraviolet rays were irradiated using an ultraviolet irradiation device (TME-400PRC manufactured by Topcon Co., Ltd.). The cumulative exposure amount of the irradiation was measured by an integrated photometer UIT-201 equipped with a photoreceptor UVD-405PD manufactured by a oxtail motor (sand), and found to be 500 mJ/cm 2 .

照射紫外線後,自鋁箔剝去硬化膜,製作試片(5mm×25mm×30μm)。其後,使用EZ Graph(商品名;島津製作所)而求出硬化膜的拉伸特性,亦即拉伸彈性模數(MPa)、斷裂強度(MPa)、斷裂伸長率(%)。另外,將夾盤間距離設為15mm、拉伸速度設為5mm/min而進行測定。 After the ultraviolet ray was irradiated, the cured film was peeled off from the aluminum foil to prepare a test piece (5 mm × 25 mm × 30 μm). Then, the tensile properties of the cured film, that is, tensile modulus (MPa), breaking strength (MPa), and elongation at break (%) were determined using EZ Graph (trade name; Shimadzu Corporation). Further, the measurement was performed by setting the distance between the chucks to 15 mm and the stretching speed to 5 mm/min.

上述試驗依照ASTM D882而進行。 The above test was carried out in accordance with ASTM D882.

(4)硬化物的自PTFE薄板的剝離性 (4) Peelability of hardened material from PTFE sheet

在貼附有PTFE薄板的玻璃基板上滴下光硬化性組成物0.05g,將其收納於進行了氮氣置換的紫外線硬化裝置用置換箱中。其後,疊合h射線透射濾光片,使用紫外線照射裝置(拓普康(股)製造之TME-400PRC)而進行紫外線(Ultraviolet,UV)照射。藉由安裝有牛尾電機(股)製造之光接收器UVD-405PD的累計光量計UIT-201而測定該照射的累計曝光量,結果是500mJ/cm2。用鑷子(tweezers)夾著紫外線照射後在PTFE上所形成的硬化物,調查自PTFE薄板的抗剝離性(peel resistance)。評價基準如下所 示。 0.05 g of a photocurable composition was dropped on a glass substrate to which a PTFE sheet was attached, and this was placed in a replacement tank for an ultraviolet curing device which was replaced with nitrogen. Thereafter, the h-ray transmission filter was laminated, and ultraviolet (Ultraviolet, UV) irradiation was performed using an ultraviolet irradiation device (TME-400 PRC manufactured by Topcon Co., Ltd.). The cumulative exposure amount of the irradiation was measured by an integrated photometer UIT-201 equipped with a photoreceptor UVD-405PD manufactured by a oxtail motor (sand), and found to be 500 mJ/cm 2 . The cured product formed on the PTFE after irradiation with ultraviolet rays was sandwiched with tweezers, and the peel resistance from the PTFE sheet was investigated. The evaluation criteria are as follows.

◎:基本未施加力亦可剝離硬化物。 ◎: The cured product can be peeled off without substantially applying force.

○:若以不對硬化物造成損傷的程度施加力,則硬化物剝離。 ○: When a force is applied to the extent that damage is not caused to the cured product, the cured product is peeled off.

×:即使施加力,硬化物亦未剝離。 ×: The cured product was not peeled off even when a force was applied.

根據表1所示之結果可知:光硬化性組成物1~光硬化性組成物10的墨水的相溶性、光硬化良好。 According to the results shown in Table 1, it is understood that the ink of the photocurable composition 1 to the photocurable composition 10 has good compatibility and light hardening.

而且,光硬化性組成物1~光硬化性組成物10硬化而所得的硬化膜顯示拉伸彈性模數為10MPa~500MPa、斷裂強度為1MPa~50MPa、斷裂伸長率為10%~100%的範圍的值,良好。而且,該些硬化物的自PTFE薄板的剝離性亦良好。 Further, the cured film of the photocurable composition 1 to the photocurable composition 10 is cured, and the cured film has a tensile modulus of 10 MPa to 500 MPa, a breaking strength of 1 MPa to 50 MPa, and a breaking elongation of 10% to 100%. The value is good. Moreover, the peelability of these hardened materials from a PTFE sheet is also good.

[產業上之可利用性] [Industrial availability]

藉由光學的立體造型法對本發明的光學的立體造型用光硬化性組成物進行硬化而所得的硬化物可用於醫療領域中的器官模型、包含工程塑膠(engineering plastic)的零件的試製品等中。 The optically curable composition for optical stereoscopic molding of the present invention is cured by an optical three-dimensional molding method, and the obtained cured product can be used in an organ model in a medical field, a prototype including a part of engineering plastics, and the like. .

1‧‧‧光學的立體造型用光硬化性組成物 1‧‧‧Optical stereolithic photocurable composition

2‧‧‧容器 2‧‧‧ Container

3a‧‧‧遮罩 3a‧‧‧ mask

4‧‧‧支撐體 4‧‧‧Support

5‧‧‧波長為400nm以上的光線 5‧‧‧Light with a wavelength above 400 nm

6a‧‧‧硬化層 6a‧‧‧ hardened layer

7‧‧‧容器的底面 7‧‧‧Bottom of the container

Claims (7)

一種光學的立體造型用光硬化性組成物,包含式(1)所表示的自由基聚合性化合物(A)、藉由照射波長為400nm以上的光線而產生自由基的光聚合起始劑(B)、及非水溶性界面活性劑(C), (式(1)中,R1為包含式(2-1)或式(2-2)所表示的結構作為部分結構的a價有機基,R2為氫或碳數為1~6的烷基,a為2以上的整數) 對上述光硬化性組成物照射波長為400nm以上的光線而所得的膜厚為30μm的硬化膜的拉伸試驗的彈性模數為10MPa~500MPa,上述硬化膜的斷裂強度為1MPa~50MPa,上述硬化膜的斷裂伸長率為10%~100%。 An optical photocurable composition for stereoscopic molding comprising a radically polymerizable compound (A) represented by the formula (1) and a photopolymerization initiator which generates a radical by irradiation with light having a wavelength of 400 nm or more (B) ), and a water-insoluble surfactant (C), (In the formula (1), R 1 is an a-valent organic group containing a structure represented by the formula (2-1) or the formula (2-2) as a partial structure, and R 2 is hydrogen or an alkane having 1 to 6 carbon atoms. Base, a is an integer of 2 or more) The elastic modulus of the tensile test of the cured film having a film thickness of 30 μm obtained by irradiating the photocurable composition with light having a wavelength of 400 nm or more is 10 MPa to 500 MPa, and the breaking strength of the cured film is 1 MPa to 50 MPa. The elongation at break of the film is from 10% to 100%. 如申請專利範圍第1項所述之光學的立體造型用光硬化性組成物,其中上述光聚合起始劑(B)是選自由α-胺基烷基苯酮系及醯基氧化膦系化合物所構成的群組的1種以上。 The optical photocuring composition for stereoscopic molding according to the first aspect of the invention, wherein the photopolymerization initiator (B) is selected from the group consisting of an α-aminoalkylphenone and a fluorenylphosphine oxide compound. One or more of the groups formed. 如申請專利範圍第1項或第2項所述之光學的立體造型用光硬化性組成物,其中上述非水溶性界面活性劑(C)是選自由氟系界面活性劑及矽酮系界面活性劑所構成的群組的1種以上。 The optical photocuring composition for stereoscopic molding according to the first or second aspect of the invention, wherein the water-insoluble surfactant (C) is selected from the group consisting of a fluorine-based surfactant and an anthrone-based interface. One or more of the groups consisting of the agents. 如申請專利範圍第1項至第3項中任一項所述之光學的立體造型用光硬化性組成物,其更包含其他自由基聚合性化合物(D),上述其他自由基聚合性化合物(D)具有式(3)所表示的結構,且結構與自由基聚合性化合物(A)不同; (式(3)中,R3為不具有CH2=CH-CO-的1價有機基,R4為氫或碳數為1~6的烷基)。 The optical photocurable composition for stereoscopic molding according to any one of the first to third aspects of the present invention, further comprising another radical polymerizable compound (D), and the other radical polymerizable compound ( D) having the structure represented by the formula (3), and having a structure different from the radically polymerizable compound (A); (In the formula (3), R 3 is a monovalent organic group having no CH 2 =CH-CO-, and R 4 is hydrogen or an alkyl group having 1 to 6 carbon atoms). 如申請專利範圍第4項所述之光學的立體造型用光硬化性組成物,其中上述其他自由基聚合性化合物(D)的R3是具有式(4)所表示的結構的化合物;[化9] (式(4)中,R5是亦可具有環狀結構的2價有機基)。 The optical photocurable composition for stereoscopic molding according to the fourth aspect of the invention, wherein R 3 of the other radical polymerizable compound (D) is a compound having a structure represented by the formula (4); 9] (In the formula (4), R 5 is a divalent organic group which may have a cyclic structure). 一種造型物的製造方法,其包含對如申請專利範圍第1項至第5項中任一項所述之光硬化性組成物照射波長為400nm以上的光線的步驟。 A method for producing a molded article, comprising the step of irradiating light having a wavelength of 400 nm or more with the photocurable composition according to any one of claims 1 to 5. 如申請專利範圍第6項所述之製造方法,其中自支撐體的下方或水平方向照射波長為400nm以上的光線。 The manufacturing method according to claim 6, wherein the light having a wavelength of 400 nm or more is irradiated from the lower side or the horizontal direction of the support.
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