TW201428574A - Conductive sheet and touch panel - Google Patents

Abstract

A conductive sheet and a touch panel with improved visibility are provided. In the conductive sheet 1, the following are sequentially laminated: a first electrode layer 10 having many rows of first electrodes 12, a transparent insulated layer 30, and a second electrode layer 40 having many rows of second electrodes 42. The first electrode 12 comprises a plurality of first grids 26 including M*N grid group. The second electrode 42 comprises a plurality of second grids 56 including M*N grid group. In the first electrode layer 10 and the second electrode layer 40, many first grids 26 and many second grids 56 are continuously disposed without overlapping on an entire surface when observed from above. M and N are integers and M+N ≤ 9.

Description

Conductive sheet and touch panel

The invention relates to a conductive sheet and a touch panel.

In recent years, as an input device for a mobile terminal or a computer, a touch panel is often used. The touch panel is disposed on the surface of the display, and detects an input position such as a finger, and performs an input operation. As a method of detecting the position of the touch panel, a capacitance method or the like is known.

For example, in a capacitive touch panel, indium tin oxide (ITO) is used as a material of the transparent electrode pattern from the viewpoint of visibility. However, since ITO has high wiring resistance and does not have sufficient transparency, it has been studied to use a transparent electrode pattern of metal thin wires for use in a touch panel.

For example, Patent Document 1 - Patent Document 4 discloses a touch panel including a conductive sheet including: a plurality of first electrodes including lattices made of thin metal wires and arranged in parallel in one direction, and including A plurality of second electrodes arranged in a lattice formed by thin metal wires and arranged in a direction orthogonal to the first electrode.

[Previous Technical Literature]

[Patent Literature]

[Patent Document 1] WO2010/013679

[Patent Document 2] WO2011/062301

[Patent Document 3] Japanese Patent Laid-Open Publication No. 2011-237839

[Patent Document 4] Japanese Patent Laid-Open Publication No. 2012-508937

The first electrode and the second electrode constituting the conductive sheet include a region in which a lattice of metal thin wires is disposed, and a region in which a lattice of metal thin wires is not disposed. In addition, by superposing the first electrode and the second electrode, the conductive metal sheet is formed such that the lattice-shaped metal thin wires are uniformly arranged over the entire surface. Thereby, the visibility of the electrically conductive sheet is improved.

When the conductive sheet is irradiated, light is reflected in a region of a lattice of metal thin wires constituting the first electrode and the second electrode. However, since the reflectance of light in the first electrode and the second electrode is slightly different, there is a problem in that the electrode is visually observed due to a difference in the amount of minute reflected light.

The present invention has been made in view of the above problems, and an object thereof is to provide a conductive sheet and a touch panel which have an electrode of a lattice of metal thin wires and which have improved visibility.

The conductive sheet according to one aspect of the present invention sequentially stacks: the first electrode layer has a plurality of first electrodes, and the plurality of first electrodes extend in the first direction and are arranged in a second direction crossing the first direction a transparent insulating layer; and a second electrode layer having a plurality of second electrodes extending in the second direction and arranged in the first direction, the first electrode having branch electrodes extending in the width direction, And the first electrode includes a plurality of first lattices composed of thin metal wires, the plurality of first lattices include M×N lattice groups, and the second electrode has branch electrodes extending in the width direction, and The two electrodes include a plurality of second lattices composed of thin metal wires, the plurality of second lattices include an M×N lattice group, and the plurality of first lattices and the plurality of second lattices in the first electrode layer and the second electrode layer The plurality of first lattices and the plurality of second lattices are continuously arranged over the entire surface so as not to overlap each other, and M+N is an integer and M+N≦9.

Preferably, in the conductive sheet, the first electrode has an opening of 98% to 99.8%. The surface resistivity of 40 Ω/sq. to 80 Ω/sq., the second electrode has an aperture ratio of 98% to 99.5%, and a surface resistivity of 40 Ω/sq. to 80 Ω/sq.

Preferably, in the conductive sheet, the first electrode layer and the second electrode layer are more The first lattice and the plurality of second lattices do not overlap each other, and when viewed from above, the plurality of first lattices and the plurality of second lattices are respectively adjacent to each other and are arranged adjacent to each other.

Preferably, among the conductive sheets, the metals constituting the first lattice and the second lattice The proportion of fine lines per unit area is 0.2% to 2%.

Preferably, in the conductive sheet, the first grid and the second grid respectively have 200 One side of μm~1000μm.

Preferably, in the conductive sheet, the first electrode and the second electrode have 4 mm~ 12mm width.

Preferably, in the conductive sheet, the first grid and the second grid respectively have 240 On one side of μm to 500 μm, the first electrode and the second electrode have a width of 5 mm to 7 mm.

Preferably, in the conductive sheet, both M and N are 4 or less.

A touch panel according to a second aspect of the present invention includes the above-described conductive sheet.

The conductive sheet of the third aspect of the present invention is sequentially laminated with: a first electrode layer, a plurality of first electrodes extending in a first direction and arranged in a second direction crossing the first direction; a transparent insulating layer; and a second electrode layer having a second direction extending in the first direction a plurality of second electrodes, the first electrode has a plurality of first lattices composed of thin metal wires, the second electrode has a plurality of second lattices composed of thin metal wires, and the second electrode includes four or more and eight or less second The first sensing portion of the lattice is configured by alternately arranging second sensing portions including nine or more and twenty or less second lattices, and the plurality of first lattices and the plurality of first electrode layers and second electrode layers The second lattices are arranged so as not to overlap each other, and when viewed from above, the plurality of first lattices and the plurality of second lattices are continuously arranged over the entire surface.

The conductive sheet of the fourth aspect of the present invention is sequentially laminated with: a first electrode layer, a plurality of first electrodes extending in a first direction and arranged in a second direction crossing the first direction; a transparent insulating layer; and a second electrode layer having a second direction extending in the first direction a plurality of second electrodes, the first electrode having a plurality of first lattices formed of thin metal wires, the second electrode having a plurality of second lattices formed of thin metal wires, and having the first sensing portion and having the first sensing portion The second sensing portions of the area of 1.5 times or more are alternately arranged, and the plurality of first lattices and the plurality of second lattices do not overlap each other in the first electrode layer and the second electrode layer, and When viewed from above, the plurality of first lattices and the plurality of second lattices are continuously arranged over the entire surface.

Preferably, in the conductive sheet, the first lattice and the second lattice have the same shape.

Preferably, in the conductive sheet, two or more first cells including the first electrode are included The sensing portion of the sub-section surrounds the second sensing portion of the second electrode.

Preferably, in the conductive sheet, the second sensing portion has an area of 7 mm ² or less.

According to the invention, in the conductive sheet and the touch panel having the electrode of the lattice including the metal thin wires, the visibility can be improved.

1, 101‧‧‧ conductive sheet

10‧‧‧First electrode layer

12, 112‧‧‧ first electrode

14‧‧‧1st electrode terminal

16‧‧‧1st wiring

26, 26-1~26-5‧‧‧ first grid

29, 59‧‧‧Dummy design

30‧‧‧Transparent insulation

40‧‧‧Second electrode layer

42, 142‧‧‧ second electrode

44‧‧‧Second electrode terminal

46‧‧‧Second wiring

56, 56-1, 56-2‧‧‧ second grid

100‧‧‧ touch panel

102‧‧‧Sensor body

106‧‧‧Protective layer

108‧‧‧Display device

110‧‧‧ display panel

126, 156‧ ‧ plaid

132, 162‧‧‧ lattice group

A, B, C‧‧‧ areas

W1, W2‧‧‧ width

X‧‧‧ first direction

Y‧‧‧second direction

Fig. 1 is a schematic plan view of a conductive sheet.

2 is a schematic cross-sectional view of a conductive sheet.

3 is a plan view of a conductive sheet including a diamond pattern.

4 is a schematic plan view of a first electrode layer.

Fig. 5 is a schematic plan view of a second electrode layer.

Fig. 6 is a schematic plan view of a conductive sheet in which a first electrode layer and a second electrode layer are stacked.

Fig. 7 is a partially enlarged view of a conductive sheet.

Fig. 8 is a partially enlarged view of a conductive sheet.

Fig. 9A is a plan view showing a state in which the first electrode and the second electrode are overlapped.

Fig. 9B is a plan view showing a state in which the first electrode and the second electrode are overlapped.

Fig. 9C is a plan view showing a state in which the first electrode and the second electrode are overlapped.

FIG. 10 is an exploded perspective view showing the configuration of the touch panel.

Hereinafter, a preferred embodiment of the present invention will be described with reference to the accompanying drawings. Bright. The present invention has been described in terms of the preferred embodiments described below, but may be modified by various methods without departing from the scope of the invention, and other embodiments than the embodiments may be utilized. Therefore, all modifications within the scope of the invention are included in the scope of the claims. In addition, the "~" which shows the numerical range in this specification is used as the meaning of the numerical value of the following description as a lower-limit and upper-limit.

1 is a schematic plan view of a conductive sheet 1 for a touch panel, and FIG. 2 is a guide A schematic cross-sectional view of the electric sheet 1. The conductive sheet 1 includes a first electrode layer 10 having a plurality of first electrodes 12 extending in a first direction (X direction) and in a second direction (Y direction) crossing the first direction Arranging; a transparent insulating layer 30; and a second electrode layer 40 having a plurality of second electrodes 42 extending in the second direction (Y direction) and arranged in the first direction (X direction) .

Each of the first electrodes 12 is electrically connected to the first electrode terminal 14 at one end thereof. Further, each of the first electrode terminals 14 is electrically connected to the conductive first wiring 16 . Each of the second electrodes 42 is electrically connected to the second electrode terminal 44 at one end thereof. Each of the second electrode terminals 44 is electrically connected to the conductive second wiring 46. Each of the first electrode 12 and the second electrode 42 includes a lattice of metal thin wires.

The conductive sheet 1 includes: a transparent insulating layer having a first main surface and a second main surface 30. The first electrode layer 10 disposed on the first main surface of the transparent insulating layer 30, and the second electrode layer 40 disposed on the second main surface of the transparent insulating layer 30. As shown in FIG. 2, the first electrode 12 and the second electrode 42 are formed with the transparent insulating layer 30 interposed therebetween, but the first electrode 12 and the second electrode 42 are not disposed at opposite positions. On the other hand, in the case where the conductive sheet 1 is viewed in a plan view, the uniform electrode on the entire surface will be seen. The first electrode 12 and the second electrode 42 are formed on the first main surface and the second main surface of the transparent insulating layer 30.

The inventors of the present invention have microscopically generated light when they are irradiated to the conductive sheet formed as described above. The problem of the difference in the amount of reflected light and the visual observation of the electrode was actively studied.

Figure 3 is a view showing a conventional conductive sheet 101 including a so-called diamond pattern. A rough plan view. The conductive sheet 101 includes a first electrode 112 and a second electrode 142. The first electrode 112 includes a plurality of lattices 126 of metal thin wires, and the second electrode 142 includes a plurality of lattices 156 of metal thin wires. In order to clarify the first electrode 112 and the second electrode 142, the first electrode 112 is shown thicker than the second electrode 142. The first electrode 112 has two lattice groups 132 including a plurality of lattices 126 of 8 × 8. Similarly, the second electrode 142 also has two lattice groups 162 including a plurality of lattices 156 of 8×8.

When the light is transmitted to the conductive sheet 101, the lattice group 132 and the lattice group 162 The area light is reflected. Each of the lattice group 132 and the lattice group 162 includes a plurality of lattices 126 and 156 of 8×8, and the lattice group 132 and the lattice group 162 have a relatively large area. It has been found that even in the lattice group 132 and the lattice group 162, even if the difference in reflectance is small, if the area is large, the electrode can be easily visually observed even if it is a small difference in the amount of reflected light.

It was found that the first electrode and the second electrode were subdivided as much as possible. Further, the area of the lattice group is small, and the first electrode and the second electrode are configured to be branched electrodes which are branched so as to expand in the width direction, whereby the difference in the amount of minute reflected light is not easily visually observed by the human eye. The present invention has been completed.

Fig. 4 is a schematic plan view showing a first electrode layer 10 as an example of the embodiment. The first electrode layer 10 has a plurality of first electrodes 12, the plurality of first electrodes 12 extends in the first direction (X direction) and is arranged in a second direction (Y direction) crossing the first direction. The first electrode 12 includes a plurality of first lattices 26 of metal thin wires. The first lattice 26 is formed by surrounding the metal thin wires in a state in which they are electrically connected to each other, and an opening region is formed in the first lattice 26. The first lattice 26 of the present embodiment has an open region formed by four sides.

The first electrode 12 extends in the first direction if viewed as a whole. If When the first lattices 26 constituting the first electrode 12 are observed, they extend continuously in the width direction of the first electrode 12 along the third direction with the first lattice 26-1 as a starting point. Further, the first lattice 26-1 is used as a starting point to continuously extend in the width direction of the first electrode 12 along the fourth direction. That is, the first electrode 12 has branch electrodes extending in the third direction and the fourth direction starting from the first lattice 26-1. The area where the sensing can be performed can be expanded by having the branch electrodes.

The first lattice 26 continuously means that the two first lattices 26 share one side and are adjacent to each other. The status of the configuration. However, in the case where the two first lattices 26 are arranged only at one corner without sharing the sides, the first lattices 26 are not in a continuous state.

The first lattice 26 continuous along the third direction is turned on by the thin metal wires and Extends in the first direction. Similarly, the first lattice 26 continuous along the fourth direction is electrically connected by the thin metal wires and extends in the first direction.

a first lattice 26 extending in a manner that the third party extends continuously upward It then extends continuously along the fourth direction toward the first lattice 26-2. Moreover, the first lattice 26 extending in a manner continuously expanding in the fourth direction is followed by the third direction, It extends continuously toward the first lattice 26-2. Thereby, a repeating pattern of the first electrode 12 surrounded by the circular mark is formed. In the present embodiment, one repeating pattern has a hexagonal shape, and three repeating patterns extend in the first direction.

Adjacent repeating pattern by becoming the first lattice 26-2 and the first lattice 26-3, and is electrically connected to the first lattice 26-5 by the first lattice 26-4. Wherein, the corners of the first lattice 26-2 and the first lattice 26-3 are connected to each other, and the corners of the first lattice 26-4 and the first lattice 26-5 are connected to each other, and thus are not equivalent to the first continuous Lattice 26.

The first electrode 12 includes a plurality of first lattices of M×N as shown in FIG. 4 . 26 lattice group formed. Here, the lattice group including the plurality of first lattices 26 of M×N refers to a state in which the plurality of first lattices 26 of the shared sides are arranged in a matrix form at M×N. At this time, the plurality of first lattices 26 are arranged such that M and N are integers and M+N≦9. In the case where the plurality of first lattices 26 are arranged in M×N, it is intended to prevent the area of the lattice group from being excessively large. By setting the lattice group of the first electrode 12 composed of the first lattice 26 to M+N≦9, the visibility can be improved. Further, it is preferable that both M and N are 4 or less.

Regarding M and N, for example, in the case of M=7 and N=2, M+N=9, from And meet M+N≦9. M × N = 7 × 2, and the lattice group includes 14 first lattices 26. Therefore, the area of the lattice group is not excessively large, and thus the visibility can be improved.

On the other hand, in the case of M=5 and N=5, M+N=10, which is not satisfied. M+N≦9. The lattice group including the first lattice 26 has a large area as a whole, and thus is not preferable from the viewpoint of visibility.

In FIG. 4, the first lattice 26 is continuous with M×N=1×5 along the third direction. The grid forms a grid. Further, the first lattice 26 is continuously formed into a lattice group at M × N = 1 × 5 along the fourth direction. In FIG. 4, the lattice groups become a lattice group having the largest area. The lattice group of Fig. 4 satisfies M + N ≦ 9, so that visibility can be improved. The first electrode 12 has an elongated shape, and thus is preferably M × N = 2 × 7, more preferably M × N = 2 × 5, and further preferably M × N = 1 × 5.

Moreover, from other viewpoints, in the first electrode 12, the first lattice In the case where seven or more are continuous with respect to the third direction, the first lattices 26 are arranged such that three or more are discontinuous in the fourth direction. That is, the first lattices 26 are not arranged in a matrix of 7 × 3 or more, thereby restricting the lattice group from occupying a large area. It is important to satisfy M+N≦9.

In addition, in terms of direction, the direction and arrangement in which the first electrode 12 extends The directions are set to the first direction and the second direction, respectively, and the directions in which the continuous first lattices 26 are extended are set to the third direction and the fourth direction. The direction in which the continuous first lattices 26 are extended is not limited to the third direction and the fourth direction, and a plurality of directions such as the fifth direction may be employed.

The first direction and the third direction, the second direction, and the fourth direction are respectively separable Similarly, they can also have a fixed inclination angle. In FIG. 4 of the present embodiment, the first direction and the third direction, the second direction, and the fourth direction have a fixed inclination angle.

In general, the first direction and the second direction refer to the drawing using the conductive sheet 1. The longitudinal direction and the lateral direction of the surface are shown, but are not particularly limited herein. It is preferable that the direction of the continuous first lattice 26 and the direction of the first electrode 12 have an angle which is less likely to cause moiré. The direction of the first electrode 12 may also be substantially uniform in the vertical and horizontal directions of the screen. But not exactly the same.

The metal thin wires constituting the first electrode 12 have a line width of 30 μm or less, and the metal thin wires include a metal material such as gold, silver, or copper, or a conductive material such as a metal oxide.

The line width of the fine metal wire is preferably 30 μm or less, preferably 15 μm or less, more preferably 10 μm or less, still more preferably 9 μm or less, still more preferably 7 μm or less, and 0.5 μm or more, and more preferably 1 μm or more.

The first electrode 12 includes a plurality of first lattices 26 that include intersecting metal thin wires. The first lattice 26 includes an open area surrounded by thin metal wires. The first lattice 26 preferably has one side of 200 μm to 1000 μm. The first lattice 26 further preferably has one side of 240 μm to 500 μm. By setting it as this range, it is excellent in light transmittance, and it is not easy to see a thin line.

The first electrode 12 is in the range of the width W1 of 4 mm to 12 mm or less, and preferably in the range of the width W1 of 5 mm to 7 mm. By setting it as this range, the electrode width suitable for a finger contact can be formed.

In particular, one side of the first lattice 26 is 240 μm to 500 μm, and the width of the first electrode 12 is set to 5 mm to 7 mm, whereby the effect of improving the low resistance and the visibility can be achieved.

The first electrode 12 preferably has an aperture ratio of 98% to 99.8% from the viewpoint of visible light transmittance. The aperture ratio corresponds to the proportion of the light-transmitting portion which is not occupied by the thin metal wires of the first electrode 12 in the predetermined area over the entire area. That is, the ratio obtained by subtracting the proportion of the fine metal wires per unit area from 1 is expressed as a percentage. Therefore, the thin metal wire accounts for each unit area. The ratio is 0.2% to 2%.

The surface resistivity of the first electrode 12 is in the range of 10 Ω/sq. to 120 Ω/sq. It is especially in the range of 40 Ω/sq.~80 Ω/sq. There is a trade off relationship between the aperture ratio and the surface resistivity. In the case of applying the electronic sheet-like display of the conductive sheet 1 of the present embodiment, for example, the first lattice 26 is preferentially increased to increase the aperture ratio, which is for a display facing a personal computer monitor or a tablet PC. In the case, the surface resistivity is preferentially lowered. Therefore, the aperture ratio and the surface resistivity are determined in consideration of the display to be applied.

Surface resistivity is MCP-T610 manufactured by Mitsubishi Chemical Corporation The surface resistivity meter was obtained. In the measurement, a sample having a mesh length of about 10 cm × 10 cm having the same line width, lattice size, and aperture ratio as the electrode (a sample having no cut portion or the like) was prepared and measured.

In the above conductive sheet 1, the first lattice 26 has a rectangular shape. however, Alternatively, it may be polygonal. Further, the shape of one side may be a straight shape, or may be a curved shape, or may be an arc shape. In the case of the arc shape, for example, the two sides facing each other may be formed in an arc shape that protrudes outward, and the other two sides that face each other are formed in an arc shape that is convex toward the inside. Further, the shape of each side may be a wavy line shape in which an arc that protrudes outward and a circular arc that protrudes toward the inside are continuous. Of course, the shape of each side can also be set to a sinusoidal curve.

Fig. 5 is a schematic plan view showing a second electrode layer 40 as an example of the embodiment. The second electrode layer 40 has a plurality of second electrodes 42 extending in the second direction (Y direction) and in a first direction crossing the second direction Arranged in the (X direction). The second electrode 42 includes a plurality of second lattices 56 of metal thin wires. The second lattice 56 is formed by surrounding the metal thin wires in a state in which they are electrically connected to each other, and an opening region is formed in the second lattice 56. The second lattice 56 of the present embodiment forms an opening region by four sides.

The second electrode 42 extends in the second direction if viewed as a whole. In FIG. 5, the second lattice 56 is continuous in the third direction and the fourth direction to form a plurality of lattice groups arranged in a matrix. Specifically, the second electrode 42 includes a lattice group having a small area shown in a region A surrounded by a circular mark, and a lattice group having a large area shown in a region B surrounded by a circular mark. A lattice group having a small area and a lattice group having a large area are alternately arranged along the second direction. A lattice group having a small area and a lattice group having a large area are electrically connected by a thin metal wire. The lattice group having a small area constitutes the first sensing unit, and the lattice group having a large area constitutes the second sensing unit.

The first sensing unit includes a lattice group composed of M+N≦9 and seven second lattices 56. The first sensing unit in the present embodiment includes a lattice group including M × N = 2 × 2 second lattices 56. The first sensing unit preferably includes a second grid 56 of four or more and eight or less.

Further, from the other point of view, in the second electrode 42 , when the second lattice 56 is continuous for seven or more with respect to the third direction, the second electrode 42 is disposed in a manner that is not continuous for five or more in the fourth direction. Grid 56. That is, the second lattices 56 are not arranged in a matrix of 7 × 3 or more, thereby restricting the lattice group from occupying a large area. It is important to satisfy M+N≦9.

The second sensing portion includes a second lattice 56 constructed of M+N≦9 and 14 a group of lattices. The second sensing unit in the present embodiment includes a lattice group including M × N = 3 × 3 second lattices 56. The second sensing unit preferably includes nine or more and twenty or less second lattices 56.

Regarding the size of the second sensing unit and the first sensing unit, it is preferable that the second sensing unit has an area of 1.5 times or more of the first sensing unit. Further, the area of the second sensing portion is preferably 7 mm ² or less. The area can be obtained from (the area of the second lattice 56) × (the number of the second lattices 56).

The second electrode 42 is provided with two extending from the first sensing portion in the first direction Branch electrode. The area where the sensing can be performed can be expanded by having the branch electrodes. The branch electrodes are disposed in the first sensing portion of the repeatedly arranged.

Regarding the line width and material of the metal thin wires constituting the second electrode 42, The same line width and material as the first electrode 12 are used. The length of one side constituting the second lattice 56 is 200 μm to 1000 μm, preferably 240 μm to 500 μm, similarly to the first lattice 26 .

The second electrode 42 is in the range of width W2 of 4 mm to 12 mm, It is preferably in the range of width W2 of 5 mm to 7 mm or less. Similarly to the first electrode 12, it is preferable that one side of the second lattice 56 is 240 μm to 500 μm, and the width of the second electrode 42 is set to 5 mm to 7 mm.

The aperture ratio of the second electrode 42 is in the range of 98% to 99.8%. Second electric The proportion of the metal thin wires of the pole 42 in the area per unit area is 0.2% to 2%. Further, the surface resistivity of the second electrode 42 is in the range of 40 Ω/sq. to 80 Ω/sq. In the conductive sheet 1, the second lattice 56 has a rectangular shape, but is not limited thereto, and may have There is the same shape as the first lattice 26.

FIG. 6 is a guide for arranging the first electrode layer 10 and the second electrode layer 40 to face each other. A plan view of the electric sheet 1. The conductive sheet 1 is configured by arranging the first electrode 12 and the second electrode 42 so as to be orthogonal to each other.

The first electrode layer 10 and the second electrode layer 40 are arranged to face each other, but in the first The position where the one electrode 12 and the second electrode 42 do not face each other, and the first lattice 26 of the first electrode 12 and the second lattice 56 of the second electrode 42 do not overlap each other in plan view. That is, the region of the first electrode layer 10 where the first electrode 12 is formed overlaps with the region of the second electrode layer 40 where the second electrode 42 is not formed, and the first electrode layer 10 is not formed with the first electrode 12. The regions and the regions of the second electrode layer 40 on which the second electrodes 42 are formed overlap each other. In FIG. 6, in order to easily recognize the first electrode 12 and the second electrode 42, the second electrode 42 is indicated by a line thicker than the first electrode 12.

By arranging the first electrode layer 10 and the second electrode layer 40 opposite each other, As shown in FIG. 6, the plurality of first lattices 26 and the plurality of second lattices 56 are continuously arranged over the entire surface. The continuous arrangement of the plurality of first lattices 26 and the plurality of second lattices 56 over the entire surface means that the first lattice 26 and the second lattice 56 appear to be continuous. The first lattice 26 is formed on the first electrode layer 10, and the second lattice 56 is formed on the second electrode layer 40, so that the first lattice 26 and the second lattice 56 are not physically connected. When the first electrode layer 10 and the second electrode layer 40 are overlapped and seen through, the first lattice 26 and the second lattice 56 may appear to be in a continuous state. Further, in a state in which it appears to be continuous, the state includes that the metal thin wires of the first lattice 26 and the metal thin wires of the second lattice 56 are not exactly continuous in a straight line, and the naked eyes of the human body seem to be When the large lens is observed, it has a broken line or a slight offset.

Fig. 7 is a partially enlarged view of the conductive sheet 1 shown in Fig. 6. Taking a look down The one electrode 12 and the second electrode 42 are arranged so as not to overlap each other. In plan view, the region C includes four first lattices 26-1 to 26-4 constituting a part of the first electrode 12. The first lattices 26-1 to 26-4 are arranged adjacent to the metal thin wires or the second lattices 56-1 to 56-2 constituting the second electrode 42 in the region C. In the present embodiment, the first lattice 26 and the second lattice 56 are arranged adjacent to each other by four or less.

So configured as a first lattice 26 and a second lattice 56, thereby reducing static Electric capacitor Cm. When the electrostatic capacitance Cm is made small, the ratio ΔCm/Cm of the electrostatic capacitance ΔCm that changes when the contact is made by the finger is increased, and it is easy to detect the presence or absence of the finger. Even in the case where the portion where the first lattice 26 and the second lattice 56 overlap is reduced, the reason why the sensing region is increased is that the first electrode 12 has a shape in which the repeating pattern is a hexagon, and the second electrode 42 has A branch electrode that expands in the width direction of the second electrode 42.

Fig. 8 is a partially enlarged view of the conductive sheet 1 shown in Fig. 6. Figure 8 is conductive Unlike the conductive sheet of FIG. 7, the sheet has a dummy pattern. In FIG. 6, a gap in which no fine metal wires are formed is formed between the first electrode 12 and the second electrode 42 in plan view. Even if it is irradiated in the gap, light does not reflect, and thus is recognized as a pattern, thereby affecting visibility.

Therefore, in FIG. 8, in the gap between the first electrode 12 and the second electrode 42 The dummy pattern 29 and the dummy pattern 59 are formed by thin metal wires. The dummy pattern 29 is formed on the first electrode layer 10, and the dummy pattern 59 is formed on the second electrode layer 40. Fake pattern 29. The dummy pattern 59 is formed in the gap between the first electrode 12 and the second electrode 42 and thus may be formed in any of the first electrode layer 10 and the second electrode layer 40. The first lattice 26 and the dummy lattice 59 may be in a continuous state by the first electrode 12, the second electrode 42, the dummy pattern 29, and the dummy pattern 59 in plan view.

When the first electrode layer 10 and the second electrode layer 40 are arranged to face each other, sometimes The position of the metal thin wire is shifted between the first lattice 26 and the second lattice 56 due to the step error. Therefore, if the first electrode layer 10 and the second electrode layer 40 are overlapped in design, a continuous lattice having a uniform interval and a uniform shape as a whole is formed as a whole. However, the phenomenon of FIGS. 9A to 9C occurs. In FIG. 9A, there is no offset in the first electrode 12 and the second electrode 42, as designed. In FIG. 9B, the first electrode 12 and the second electrode 42 are not arranged in a straight line. However, the naked eye cannot recognize it. In FIG. 9C, the first electrode 12 and the second electrode 42 overlap in a part, and a gap (interruption) occurs in a part. The portion where the first electrode 12 and the second electrode 42 overlap is a factor that deteriorates visibility due to the appearance of the thin metal wires.

In the above situation, it is effective by performing the following design. First, as shown in Figure 9B The design is generally performed in an offset manner, and the second metal thin line is designed to be short, and it is important that the first electrode 12 and the second electrode 42 do not overlap.

Next, the contact of the above-mentioned conductive sheet 1 is faced with reference to FIG. The control panel 100 will be described. The touch panel 100 has a sensor body 102 and a control circuit (including an integrated circuit or the like) not shown. The sensor body 102 has a conductive sheet 1 and a protective layer 106 laminated thereon. The conductive sheet 1 and the protective layer 106 are disposed on the display panel 110 of the display device 108 such as a liquid crystal display. on.

Next, a method of manufacturing the conductive sheet 1 will be described.

In the case of manufacturing the conductive sheet 1, for example, a photosensitive material having an emulsion layer containing a photosensitive silver halide salt may be exposed on the first main surface of the transparent transparent insulating layer 30, and development processing may be performed thereby exposing The first electrode layer 10 is formed by forming a metal silver portion (metal thin wire) and a light transmissive portion (opening region) in each of the portion and the unexposed portion. Further, the metal silver portion may be subjected to physical development and/or plating treatment to thereby carry the conductive metal on the metallic silver portion.

Alternatively, the photoresist film formed on the copper foil on the first main surface of the transparent transparent insulating layer 30 may be exposed and developed to form a resist pattern, and the copper foil exposed from the resist pattern may be formed. Etching, thereby forming the first electrode layer 10.

Alternatively, the slurry containing the metal fine particles may be printed on the first main surface of the transparent transparent insulating layer 30, and the slurry may be metal plated to form the first electrode layer 10.

The first electrode layer 10 may be formed by printing on the first main surface of the transparent transparent insulating layer 30 by a screen printing plate or a gravure printing plate. Alternatively, the first electrode layer 10 may be formed on the first main surface of the transparent transparent insulating layer 30 by inkjet.

Regarding the second electrode layer 40, the second electrode layer 40 can be formed on the second main surface of the transparent insulating layer 30 by the same manufacturing method as the first electrode layer 10.

A photosensitive plating layer may be formed on the transparent transparent insulating layer 30 by using a plating pretreatment material, and subjected to a plating treatment after exposure and development treatment, thereby forming a metal portion and light in the exposed portion and the unexposed portion, respectively. Through the sexual department, thus forming the first An electrode layer 10 and a second electrode layer 40. Further, the conductive metal may be carried on the metal portion by performing physical development and/or plating treatment on the metal portion. In addition, more specific contents are disclosed in Japanese Patent Laid-Open No. 2003-213437, Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei.

As shown in FIG. 2, when the first main surface of the transparent insulating layer 30 is formed first In the electrode layer 10, when the second electrode layer 40 is formed on the second main surface of the transparent insulating layer 30, according to a usual method, the first main surface is exposed, and then the second main surface is exposed. However, there is a case where the first electrode layer 10 and the second electrode layer 40 having a desired pattern cannot be obtained.

Therefore, the manufacturing method shown below can be preferably employed.

That is, the photosensitive silver halide formed on both sides of the transparent insulating layer 30 The emulsion layer is subjected to collective exposure, and the first electrode layer 10 is formed on one main surface of the transparent insulating layer 30, and the second electrode layer 40 is formed on the other main surface of the transparent insulating layer 30.

A specific example of the manufacturing method will be described.

First, make a long strip of photosensitive material. Photosensitive materials include: transparent insulation The layer 30 is formed of a photosensitive silver halide emulsion layer (hereinafter referred to as a first photosensitive layer) formed on the first main surface of the transparent insulating layer 30, and a photosensitive silver halide emulsion layer formed on the other main surface of the transparent insulating layer 30 ( Hereinafter referred to as a second photosensitive layer).

Next, the photosensitive material is exposed. In the exposure process, the first exposure is performed The second exposure process (two-side simultaneous exposure), the first exposure process irradiates the first photosensitive layer toward the transparent insulating layer 30, and exposes the first impression along the first exposure pattern. In the second exposure process, the second photosensitive layer is irradiated with light toward the transparent insulating layer 30, and the second photosensitive layer is exposed along the second exposure pattern.

For example, a long piece of photosensitive material is conveyed in one direction, and the first side is The light (parallel light) is irradiated to the first photosensitive layer via the first photomask, and the second light (parallel light) is irradiated to the second photosensitive layer via the second photomask. The light emitted from the first light source is converted into parallel light by the first collimating lens in the middle to obtain the first light, and the light emitted from the second light source is converted into the parallel light by the second collimating lens in the middle. Thereby obtaining the second light.

In the above description, it is indicated that two light sources (first light source and second light source) are used. In the case of the light source), the light emitted from one light source may be divided by the optical system, and the divided light may be irradiated to the first photosensitive layer and the second photosensitive layer as the first light and the second light.

Secondly, the exposed photosensitive material is developed to make a touch Conductive sheet 1 for the control panel. The conductive sheet 1 for a touch panel includes a transparent insulating layer 30, a first electrode layer 10 formed on the first main surface of the transparent insulating layer 30 along the first exposure pattern, and a second exposure pattern formed along the second exposure pattern. The second electrode layer 40 of the other main surface of the transparent insulating layer 30. In addition, since the exposure time and the development time of the first photosensitive layer and the second photosensitive layer are variously changed depending on the type of the first light source and the second light source, the type of the developing solution, and the like, a preferable numerical range cannot be determined in the same manner. The exposure time and the development time were adjusted to an exposure time and a development time at which the development rate was 100%.

Further, in the manufacturing method of the embodiment, the first exposure processing is the first The photomask is placed on the first photosensitive layer, for example, in a close contact with the first light source, and the first light source is irradiated from the first light source facing the first photomask to the first photomask to expose the first photosensitive layer. The first photomask includes a glass substrate formed of transparent soda glass and a mask pattern (first exposure pattern) formed on the glass substrate. Therefore, by the first exposure processing, the following portion of the first photosensitive layer is exposed, and the portion is along the first exposure pattern formed on the first photomask. A gap of about 2 μm to 10 μm may be provided between the first photosensitive layer and the first photomask.

Similarly, in the second exposure processing, the second mask is placed in close contact with the second photosensitive layer, for example, and the second light source disposed facing the second mask is irradiated with the second light toward the second mask. 2 photosensitive layer exposure. Similarly to the first photomask, the second photomask includes a glass substrate made of transparent soda glass and a mask pattern (second exposure pattern) formed on the glass substrate. Therefore, the second exposure process exposes a portion of the second photosensitive layer along the second exposure pattern formed on the second photomask. In this case, a gap of about 2 μm to 10 μm may be provided between the second photosensitive layer and the second photomask.

In the first exposure processing and the second exposure processing, the emission timing of the first light from the first light source and the emission timing of the second light from the second light source may be simultaneously made, and the two emission timings may be different. At the same time, the first photosensitive layer and the second photosensitive layer can be simultaneously exposed by one exposure process, whereby the processing time can be shortened. However, in the case where both the first photosensitive layer and the second photosensitive layer are not subjected to photosensitization, if the photosensitive material is exposed from both sides, the exposure from one side will be on the other side (back side) Image formation has an effect.

That is, the first light from the first light source that reaches the first photosensitive layer is The silver halide particles in the photosensitive layer are scattered and transmitted as scattered light through the transparent insulating layer 30, and a part of the scattered light reaches the second photosensitive layer. Thus, the boundary portion between the second photosensitive layer and the transparent insulating layer 30 is exposed over a wide range to form a latent image. Therefore, in the second photosensitive layer, exposure is performed by the second light from the second light source, and exposure is performed by the first light from the first light source, and the conductive sheet 1 for touch panel is formed by the subsequent development processing. In addition to forming the conductive pattern (second electrode layer 40) by the second exposure pattern, a thin conductive layer is formed between the conductive patterns by the first light from the first light source, so that the conductive layer cannot be obtained. A desired pattern (a pattern along the second exposure pattern). This is also the same for the first photosensitive layer.

In order to avoid the above problem, as a result of active research, it was confirmed that the thickness of the first photosensitive layer and the second photosensitive layer was set to a specific range, or the amount of coated silver of the first photosensitive layer and the second photosensitive layer was defined. Thereby, the silver halide itself absorbs light, thereby restricting the transmission of light to the back side. The thickness of the first photosensitive layer and the second photosensitive layer can be set to 1 μm or more and 4 μm or less. The upper limit is preferably 2.5 μm. Further, the amount of silver applied to the first photosensitive layer and the second photosensitive layer is set to 5 g/m ² to 20 g/m ² .

For the above two-sided close-contact exposure method, due to adhesion to the surface of the sheet The dust or the like becomes a problem of image defects caused by exposure hindrance. As a method of preventing adhesion of dust, a method of applying a conductive material to a sheet is known, but the metal oxide is also left after the treatment, and the transparency of the final product is impaired, and the conductivity of the conductive polymer is preserved. There are problems in other areas. Therefore, active research As a result, it is known that the conductivity required for antistatic property is obtained by silver halide in which the amount of the binder is reduced, and the volume ratio of the silver/adhesive of the first photosensitive layer and the second photosensitive layer is defined. That is, the silver/adhesive volume ratio of the first photosensitive layer and the second photosensitive layer is 1/1 or more, preferably 2/1 or more.

As described above, the thickness of the first photosensitive layer and the second photosensitive layer, the amount of coated silver, and the volume ratio of the silver/binder are set and defined, thereby reaching the first light from the first light source of the first photosensitive layer. It will not reach the second photosensitive layer. Similarly, the second light from the second light source that has reached the second photosensitive layer does not reach the first photosensitive layer. As a result, when the conductive sheet 1 is formed by the subsequent development processing, only the first electrode layer 10 formed of the first exposure pattern is formed on the first main surface of the transparent insulating layer 30, and the second layer of the transparent insulating layer 30 is formed. Only the second electrode layer 40 formed of the second exposure pattern is formed on the main surface, so that a desired pattern can be obtained.

As described above, in the manufacturing method using the above-described two-sided collective exposure, the first photosensitive layer and the second photosensitive layer which are compatible with both conductivity and double-sided exposure can be obtained. Moreover, the same pattern or different patterns can be arbitrarily formed on both sides of the transparent insulating layer 30 by the exposure processing performed on one transparent insulating layer 30, whereby the electrodes of the touch panel can be easily formed, and touch can be realized. The panel is thinned (low profile).

Next, in the conductive sheet 1 of the present embodiment, a method of using a silver halide photographic light-sensitive material as a preferable form will be mainly described.

The method for producing the electrically conductive sheet 1 of the present embodiment includes the following three aspects depending on the form of the photosensitive material and the development treatment.

(1) The form is a photosensitive silver halide black and white that does not contain a physical development core. The photosensitive material is subjected to chemical development or thermal development to form a metallic silver portion on the photosensitive material.

(2) The morphology is the sensitization of the physical development nucleus in the silver halide emulsion layer The silver halide black-and-white photosensitive material is subjected to dissolution physical development to form a metal silver portion on the photosensitive material.

(3) The form is a photosensitive silver halide black and white that does not contain a physical development core. The photosensitive material is superposed on a developing sheet having a non-photosensitive layer containing a physical developing core to perform diffusion transfer development, and the metallic silver portion is formed on a non-photosensitive image receiving sheet.

The above form (1) is an integrated type of black and white development type in a photosensitive material A light-transmitting conductive film such as a light-transmitting conductive film is formed thereon. The developed silver obtained is chemically developed silver or thermally developed silver, and is a high specific surface filament, and in this point, the developed silver has high activity during subsequent plating or physical development.

In the form of the above (2), in the exposed portion, the physical development nuclei are near The silver halide particles of the edge are dissolved and deposited on the developing core, whereby a light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material. This is also an integrated black and white development type. The development is a precipitation on the physical development nucleus, and thus the activity is high, but the developed silver is spherical smaller than the surface.

In the form of the above (3), the silver halide particles are dissolved in the unexposed portion. The light-transmitting conductive film such as a light-transmitting conductive film is formed on the developing sheet by dissolving and depositing on the developing core on the developing sheet. The form of the above (3) is a so-called separation type, and is a form used to peel the developing sheet from the photosensitive material.

For any form, you can choose negative development processing and reverse display Any of the development processes (in the case of the diffusion transfer method, a direct positive photosensitive material is used as the photosensitive material, whereby negative development processing can be performed).

Here, the configuration of the conductive sheet 1 of the present embodiment will be described in detail below. Bright.

[Transparent Insulation Layer 30]

Examples of the transparent insulating layer 30 include a plastic film, a plastic plate, and a glass plate. As a raw material of the plastic film and the plastic plate, for example, a polyester such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN); polyethylene (Polyethylene) can be used. , PE), Polypropylene (PP), Polystyrene, Ethylene Vinyl Acetate (EVA) / Cycloolefin Polymer (COP) / Cycloolefin Copolymer (COC) Polyolefins; and vinyl resins; in addition, polycarbonate (Polycarbonate, PC), polyamide, polyimide, acrylic, and triacetyl cellulose (TAC) can be used. From the viewpoint of light transmittance, workability, and the like, polyethylene terephthalate (PET) is particularly preferable.

[Silver Salt Emulsion Layer]

The silver salt emulsion layer which becomes the first electrode layer 10 and the second electrode layer 40 of the conductive sheet 1 contains an additive such as a solvent or a dye in addition to the silver salt and the binder.

Examples of the silver salt used in the embodiment include inorganic substances such as silver halide. Organic silver salts such as silver salts and silver acetate. In the present embodiment, it is preferable to use silver halide which is excellent in characteristics as a photosensor.

The amount of coated silver (coating amount of the silver salt) of the silver salt emulsion layer is preferably from 1 g/m ² to 30 g/m ² , more preferably from 1 g/m ² to 25 g/m ² , and further preferably from 1 g/m ² to 25 g/m ² . It is 5 g/m ² to 20 g/m ² . By setting the amount of coated silver to the above range, in the case of forming the conductive sheet 1 for a touch panel, a desired surface resistivity can be obtained.

As the binder used in the present embodiment, for example, gelatin can be mentioned. (gelatin), polyvinyl alcohol (PVA), polyvinyl pyrrolidone (PVP), polysaccharides such as starch, cellulose and its derivatives, polyethylene oxide, polyvinylamine, polyglucosamine (chitosan) ), polylysine, polyacrylic acid, polyalginic acid, polyhyaluronic acid, and carboxyl cellulose. The above binder has a property of neutral, anionic or cationic depending on the ionicity of the functional group.

The content of the binder contained in the silver salt emulsion layer is not particularly limited, and It is appropriately determined within a range in which dispersibility and adhesion can be exhibited. The content of the binder in the silver salt emulsion layer is preferably 1/4 or more, more preferably 1/2 or more, based on the silver/binder volume ratio. The silver/binder volume is preferably 100/1 or less, more preferably 50/1 or less, further preferably 10/1 or less, and particularly preferably 6/1 or less. Further, the silver/binder volume ratio is further preferably from 1/1 to 4/1. The best is 1/1~3/1. By setting the silver/binder volume ratio in the silver salt emulsion layer to this range, even when the amount of coated silver has been adjusted, unevenness in resistance value can be suppressed, and a uniform surface can be obtained. Resistivity A conductive sheet for a touch panel. In addition, the silver/binder volume ratio can be obtained by converting the amount of silver halide/binder (weight ratio) of the raw material into silver amount/binder amount (weight ratio), and then the amount of silver/binder (weight) Ratio) converted to silver/binder (volume ratio).

<solvent>

The solvent for forming the silver salt emulsion layer is not particularly limited, and examples thereof include water and an organic solvent (for example, an alcohol such as methanol, a ketone such as acetone, a guanamine such as formamide, or a dimethyl hydrazine. An ester such as an anthracene or ethyl acetate or an ether, an ionic liquid, and a mixed solvent of the solvents.

The content of the solvent used in the silver salt emulsion layer of the present embodiment is relative to silver The total mass of the silver salt, the binder, and the like contained in the salt emulsion layer is in the range of 30% by mass to 90% by mass, preferably in the range of 50% by mass to 80% by mass.

<Other additives>

The various additives used in the present embodiment are not particularly limited, and known additives can be preferably used.

[Composition of other layers]

A protective layer not shown may also be provided on the silver salt emulsion layer. In the present embodiment, the "protective layer" means a layer containing a binder such as gelatin or a high molecular polymer, and the protective layer is formed of photosensitive silver in order to exhibit an effect of preventing scratches or improving mechanical properties. On the salt emulsion layer. The thickness of the protective layer is preferably 0.5 μm or less. The coating method and the formation method of the protective layer are not particularly limited, and a known coating method and formation method can be appropriately selected. Moreover, it can also be below the silver salt emulsion layer. At the place, for example, an undercoat layer is provided.

Next, each step of the method of producing the conductive sheet 1 will be described.

[exposure]

In the present embodiment, the first electrode layer 10 and the second electrode layer 40 are formed by printing. However, in addition to the printing method, the first electrode layer 10 and the second electrode layer are formed by exposure, development, and the like. Electrode layer 40. That is, the photosensitive material having the silver salt layer provided on the transparent insulating layer 30 or the photosensitive material coated with the photopolymer for photolithography is exposed. Electromagnetic waves can be used for exposure. Examples of the electromagnetic wave include light such as visible light and ultraviolet light, and radiation such as X-ray. Further, a light source having a wavelength distribution may be used for the exposure, and a light source having a specific wavelength may be used.

The exposure method is preferably a method performed by a glass mask or a pattern exposure method by laser drawing.

[development processing]

In the present embodiment, after the emulsion layer is exposed, development processing is further performed. The development processing may use a technique of usual development processing used in silver salt photographic film or photographic paper, film for printing plate making, latex mask for reticle, and the like.

The development processing in the present embodiment may include a fixing treatment for performing stabilization in order to remove the silver salt of the unexposed portion. The fixing treatment in the present invention can be carried out using a technique of fixing treatment used in silver salt photographic film or photographic paper, film for printing plate making, latex mask for reticle, and the like.

It is preferable to apply a hard film to the photosensitive material subjected to development and fixing treatment. Treatment, washing treatment or stabilization treatment.

It is preferably a content ratio as follows, that is, included in the exposed portion after the development treatment The mass of the metallic silver is 50% by mass or more, and more preferably 80% by mass or more, based on the mass of the silver contained in the exposed portion before the exposure. When the mass of the silver contained in the exposed portion is 50% by mass or more based on the mass of the silver contained in the exposed portion before the exposure, high conductivity can be obtained, which is preferable.

The gray scale after the development processing in the present embodiment is not particularly limited, but Good for more than 4.0. When the gray scale after the development treatment exceeds 4.0, the light transmittance of the light transmissive portion can be maintained high, and the conductivity of the conductive metal portion can be improved. Examples of the method of setting the gradation to 4.0 or more include doping of the above-mentioned cerium ions and cerium ions.

The conductive sheet is obtained through the above steps, but the obtained conductive sheet is in the form The surface resistivity is preferably 40 Ω/sq. to 80 Ω/sq. or less.

By adjusting the surface resistivity to the above range, even at an area of 10 Position detection is also possible in a large touch panel of cm × 10 cm or more. Further, the conductive sheet after the development treatment may be further subjected to a calender treatment, and may be adjusted to a desired surface resistivity by calendering.

(hard film treatment after development treatment)

Preferably, after the silver salt emulsion layer is subjected to development treatment, the silver salt emulsion layer is immersed in a hard coat agent to perform a hard film treatment. Examples of the hardener include dialdehydes such as glutaraldehyde, adipaldehyde, and 2,3-dihydroxy-1,4-dioxane, and boric acid, chrome alum/potassium alum. The hardener described in Japanese Laid-Open Patent Publication No. Hei 2-141279, the like.

[Physical development and plating treatment]

In the present embodiment, in order to improve the conductivity of the metal silver portion formed by the exposure and development treatment, physical development and/or plating treatment for carrying the conductive metal particles on the metal silver portion may be performed. In the present invention, the conductive metal particles may be carried on the metallic silver portion by only one of the physical development or the plating treatment, or the physical development and the plating treatment may be combined to carry the conductive metal particles. In the metal silver department. In addition, a portion in which the metal silver portion is subjected to physical development and/or plating treatment is collectively referred to as a "conductive metal portion".

[Oxidation treatment]

In the present embodiment, it is preferable that the metal silver portion after the development treatment and the conductive metal portion formed by the physical development and/or the plating treatment are subjected to an oxidation treatment. By performing the oxidation treatment, for example, when the metal is slightly deposited on the light transmissive portion, the metal can be removed, and the transmittance of the light transmissive portion is substantially 100%.

[Light Transmissive Department]

The "light-transmitting portion" in the present embodiment is a portion that guides the light-transmitting layer other than the first electrode layer 10 and the second electrode layer 40 in the electric sheet 1. As described above, the transmittance of the light-transmitting portion is as shown by the minimum value of the transmittance in the wavelength region of 380 nm to 780 nm of the transparent insulating layer 30 other than the function of contributing to light absorption and reflection. The rate is 90% or more, preferably 95% or more, more preferably 97% or more, still more preferably 98% or more, and most preferably 99% or more.

[Conductive sheet 1]

The thickness of the transparent insulating layer 30 in the conductive sheet 1 of the present embodiment is preferably 5 μm. ~350 μm, further preferably 30 μm to 150 μm. If it is in the range of 5 μm to 350 μm, the required transmittance of visible light can be obtained and it is easy to handle.

The thickness of the metallic silver portion provided on the transparent insulating layer 30 can be appropriately determined according to the coating thickness of the coating material for the silver salt-containing layer applied on the transparent insulating layer 30. The thickness of the metal silver portion may be selected from 0.001 mm to 0.2 mm, preferably 30 μm or less, more preferably 20 μm or less, still more preferably 0.01 μm to 9 μm, and most preferably 0.05 μm to 5 μm. Further, the metallic silver portion is preferably patterned. The metal silver portion may be one layer or a laminate of two or more layers. In the case where the metal silver portion is patterned and has a laminated structure of two or more layers, different color sensitivities can be imparted so that light can be received at different wavelengths. Thereby, if the exposure wavelength is changed and exposure is performed, a different pattern can be formed in each layer.

In the use of the touch panel, the thinner the thickness of the conductive metal portion is, the wider the viewing angle of the display panel is, which is preferable, and the thinning is also required in terms of improving visibility. From this viewpoint, the thickness of the layer containing the conductive metal carried on the conductive metal portion is desirably less than 9 μm, less than 5 μm, less than 3 μm, and 0.1 μm or more.

In the present embodiment, the metal silver portion having a desired thickness can be formed by controlling the coating thickness of the silver salt-containing layer, and the conductive metal can be freely controlled by physical development and/or plating treatment. The thickness of the layer of the particles can be easily formed even if the conductive sheet 1 has a thickness of less than 5 μm, preferably less than 3 μm.

Further, in the method for producing a conductive sheet of the present embodiment, it is not necessarily necessary Perform steps such as plating. The reason is that in the method for producing the conductive sheet 1 of the present embodiment, the desired surface resistivity can be obtained by adjusting the amount of coated silver and the silver/binder volume ratio of the silver salt emulsion layer.

The conductive sheet and the touch panel of the present invention are not limited to the above embodiment Of course, various configurations can be employed without departing from the gist of the present invention. Moreover, the technique disclosed in Japanese Patent Laid-Open No. 2011-113149, Japanese Patent Laid-Open No. 2011-12905, Japanese Patent Laid-Open No. 2011-129112, Japanese Patent Laid-Open No. 2011-134311, Japanese Patent Laid-Open No. 2011-175628, and the like Use in combination.

[Examples]

Hereinafter, the present invention will be more specifically described by way of examples of the invention. In addition, the materials, the amounts used, the ratios, the processing contents, the processing order, and the like shown in the following examples can be appropriately changed without departing from the gist of the invention. Therefore, the scope of the invention should not be construed as being limited by the specific examples shown below.

<Formation of conductive pattern>

(silver halide photosensitive material)

An emulsion prepared by dissolving 10.0 g of gelatin in an aqueous medium with respect to 150 g of silver (Ag) and containing silver iodobromochloride having an average sphere-equivalent diameter of 0.1 μm was prepared. I = 0.2 mol%, Br = 40 mol%).

Further, K ₃ Rh ₂ Br ₉ and K ₂ IrCl ₆ were added to the emulsion so that the concentration reached 10 ^-7 (mole/mole silver), and Rh ions and Ir ions were doped to the silver bromide particles. Na ₂ PdCl ₄ was added to the emulsion, and then gold sulphur sensitization was carried out using chloroauric acid and sodium thiosulfate, and the emulsion and gelatin hardener were applied so that the amount of silver applied was 10 g/m ² . They are applied together to a substrate 30 (here, polyethylene terephthalate (PET)). At this time, the Ag/gelatin volume ratio was set to 2/1.

20m in a width of 25cm for a PET support with a width of 30cm The coating was carried out by cutting the center portion of the coating of 24 cm to cut the both ends by 3 cm, respectively, to obtain a rolled silver halide photosensitive material.

(exposure)

Regarding the pattern of exposure, a mask that changes a plurality of patterns such as the number of cells, an aperture ratio, and a line width is prepared, and exposure is performed through the masks using parallel light using a high-pressure mercury lamp as a light source.

(development processing)

. 1L developer solution

. 1L fixer formulation

Ammonium thiosulfate solution (75%) 300ml

Using the automatic developing machine FG-710PTS manufactured by Fujifilm Co., Ltd., the exposed photosensitive material was treated with the above treatment agent under the following processing conditions, that is, development at 35 ° C for 30 seconds, and at 34 ° C for 23 seconds. Fixing, water washing treatment was carried out for 20 seconds (flowing water: 5 L/min).

<Test 1 to Test 12>

A conductive sheet of Tests 1 to 12 was produced by using a plurality of masks to change the size (M×N) of the lattice group, the aperture ratio, the surface resistivity, the occupation ratio of the fine metal wires, the electrode width, and the length of one side of the lattice. . Regarding Test 1 to Test 12, the visibility was evaluated. The evaluation of the visibility is judged by visual observation, and the case where the lattice group is hardly visible is set to A, and the case where the lattice group can be visually recognized is a little bit, and the case where the lattice group can be clearly visualized is set. For C. Table 1 shows the conditions and evaluation results of Test 1 to Test 12.

According to Table 1, trials 1 to 10 satisfying M+N≦9 are in the visibility side. Get an evaluation of B or above. In Tests 1 to 10, especially in the case where the length of one side of the lattice is 500 μm or less, it is evaluated by A. On the other hand, in Tests 11 and 12 in which M+N>9, even if the length of one side of the lattice was 500 μm, it was evaluated as C.

1‧‧‧Conductor

12‧‧‧First electrode

26‧‧‧ first grid

42‧‧‧second electrode

56‧‧‧second grid

X‧‧‧ first direction

Y‧‧‧second direction

Claims (9)

a conductive sheet sequentially laminating: a first electrode layer having a plurality of first electrodes, the plurality of first electrodes extending in a first direction and arranged in a second direction crossing the first direction; a transparent insulating layer And a second electrode layer having a plurality of second electrodes extending in the second direction and arranged in the first direction, the first electrode having a branch electrode extending in a width direction, and The first electrode includes a plurality of first lattices composed of thin metal wires, the plurality of first lattices include an M×N lattice group, the second electrode has a branch electrode extending in a width direction, and the second electrode includes a plurality of second lattices formed of thin metal wires, wherein the plurality of second lattices include M×N lattice groups, and the plurality of first lattices and the plurality of second lattices are formed in the first electrode layer and the second electrode layer The plurality of first lattices and the plurality of second lattices are continuously arranged over the entire surface so as not to overlap each other, and M+N is an integer and M+N≦9. The conductive sheet according to claim 1, wherein the first electrode has an opening ratio of 98% to 99.5%, a surface resistivity of 40 Ω/sq. to 80 Ω/sq., and the second electrode has 98%~ 99.8% aperture ratio, surface resistivity of 40 Ω/sq.~80 Ω/sq. The conductive sheet according to claim 1 or 2, wherein the above In the first electrode layer and the second electrode layer, the plurality of first lattices and the plurality of second lattices are not overlapped with each other, and when viewed from the upper surface, the plurality of first lattices and the plurality of The second grid is adjacent to each other and is arranged adjacent to each other. The conductive sheet according to any one of claims 1 to 3, wherein a ratio of each of the metal thin wires constituting the first lattice and the second lattice to a unit area is 0.2%. 2%. The conductive sheet according to any one of claims 1 to 4, wherein the first lattice and the second lattice each have a side having a length of 200 μm to 1000 μm. The conductive sheet according to any one of claims 1 to 5, wherein the first electrode and the second electrode have a width of 4 mm to 12 mm. The conductive sheet according to Item 5 or 6, wherein the first lattice and the second lattice each have a length of 240 μm to 500 μm, and the first electrode and the second electrode have 5 mm to 7 mm. The width. The conductive sheet according to any one of claims 1 to 7, wherein the above M and N are all 4 or less. A touch panel comprising the conductive sheet according to any one of claims 1 to 8.