TW201351234A - Touch sensor - Google Patents
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- TW201351234A TW201351234A TW102110809A TW102110809A TW201351234A TW 201351234 A TW201351234 A TW 201351234A TW 102110809 A TW102110809 A TW 102110809A TW 102110809 A TW102110809 A TW 102110809A TW 201351234 A TW201351234 A TW 201351234A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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Abstract
Description
本發明係有關在顯示裝置等中配設於前面的投射式的電容觸控感應器。 The present invention relates to a projected capacitive touch sensor disposed in front of a display device or the like.
在習知技術中,行動電話等中所使用的電容觸控感應器等元件係如第4圖所示般以層積的方式組合(下述之專利文獻1)。 In the prior art, components such as a capacitive touch sensor used in a mobile phone or the like are combined in a layered manner as shown in Fig. 4 (Patent Document 1 below).
在第4圖的示例中,顯示的是液晶顯示裝置70、配置在液晶顯示裝置70前面的投射式的電容觸控感應器71、配設在電容觸控感應器71前面的保護玻璃(cover glass)72的例子。在第4圖中,構成顯示裝置70的一對透明基板81、82係在以密封材料84密封而成的空間裡夾持液晶83。此外,在透明基板81、82形成有液晶顯示用電極85,並配設有偏光板86。另外,元件符號87為驅動用IC,此驅動用IC 87係透過撓性(flexible)基板88而與作為圖像資料傳送來源的控制基板等(未圖示)連接。 In the example of FIG. 4, a liquid crystal display device 70, a projected capacitive touch sensor 71 disposed in front of the liquid crystal display device 70, and a cover glass disposed in front of the capacitive touch sensor 71 are shown. ) 72 example. In Fig. 4, the pair of transparent substrates 81 and 82 constituting the display device 70 sandwich the liquid crystal 83 in a space sealed by the sealing material 84. Further, liquid crystal display electrodes 85 are formed on the transparent substrates 81 and 82, and a polarizing plate 86 is disposed. Further, the reference numeral 87 is a driving IC, and the driving IC 87 is connected to a control substrate (not shown) as a source of image data transmission through a flexible substrate 88.
在如上述構成的液晶顯示裝置70的前面,配置有具備透明基板91的電容觸控感應器71,其中該透明基板91設置有感應用電極92。投射式的電容觸控感應器71係感知人類的手指等導電體接近設置於該透明基板91 的感應電極92所引起的電容量變化而檢測出觸碰位置。更具體言之,手指接近感應用電極92會使手指與感應用電極92之間形成電容,這變化會被透過撓性基板95連接的投射式電容感應用IC(未圖示)所檢知。另外,在第4圖中顯示的是將感應用電極92形成為朝互相交叉的兩方向延伸的串列電極之例。因此,在朝其中一方向延伸的第1電極圖案(pattern)與朝另一方向延伸的的第1電極圖案之間,設置有用以使雙方在電性上成為非接觸狀態的絕緣膜93。此外,於電容式觸控感應器71係設置有用以保護感應用電極92的保護層96。 On the front surface of the liquid crystal display device 70 configured as described above, a capacitive touch sensor 71 including a transparent substrate 91 provided with a sensing application electrode 92 is disposed. The projected capacitive touch sensor 71 senses that a conductor such as a human finger is disposed close to the transparent substrate 91. The change in capacitance caused by the sensing electrode 92 detects the touch position. More specifically, the finger proximity application electrode 92 forms a capacitance between the finger and the sensing application electrode 92, and this change is detected by a projected capacitive sensing application IC (not shown) connected through the flexible substrate 95. Further, Fig. 4 shows an example in which the sensing application electrode 92 is formed as a series electrode extending in two directions crossing each other. Therefore, an insulating film 93 is provided between the first electrode pattern extending in one direction and the first electrode pattern extending in the other direction so that both of them are electrically non-contact. In addition, a protective layer 96 for protecting the sensing application electrode 92 is provided in the capacitive touch sensor 71.
另外,在第4圖的示例中,顯示的是於電容式觸控感應器71上還隔著光學接著層99配設有保護玻璃72之例。保護玻璃72的周邊部多半會施做黑色印刷97或是開孔等裝飾。 Further, in the example of FIG. 4, an example in which the protective glass 72 is disposed on the capacitive touch sensor 71 via the optical adhesive layer 99 is shown. Most of the peripheral portion of the cover glass 72 is decorated with a black print 97 or a hole.
此外,在專利文獻1係揭露在透明基板1的一側面形成朝第1方向延伸的複數個第1電極圖案與朝第2方向延伸的複數個第2電極圖案作為感應電極92,且在交叉區域,第2電極圖案形成為斷開的形狀(第5圖,沿第1方向隔著間隔形成的兩個以上的第1島狀電極部201c、201d及形成於兩者間的第1橋接配線部202、以及沿第2方向隔著間隔形成的兩個以上的第2島狀電極部201a、201b),此外還具備絕緣膜9及第2橋接配線部4(參照第6圖),該絕緣膜9係於交叉區域覆蓋在該交叉區域未斷開形成的第1電極圖案,該第2橋接配線部4係為用以使在交叉區域斷開形成的第2電極圖案的第2島狀電極部間於該交叉 區域成為連接狀態而形成的配線,即係以跨越前述絕緣膜9的方式形成,其中,第2橋接配線部4係以金屬材料形成,絕緣膜係以具有遮蔽性及絕緣性的材料形成。 Further, Patent Document 1 discloses that a plurality of first electrode patterns extending in the first direction and a plurality of second electrode patterns extending in the second direction are formed as the sensing electrode 92 on one side surface of the transparent substrate 1, and are in the intersection region. The second electrode pattern is formed in a broken shape (Fig. 5, two or more first island-shaped electrode portions 201 c and 201 d formed at intervals in the first direction, and a first bridge formed therebetween The wiring portion 202 and the two or more second island-shaped electrode portions 201 a and 201 b ) which are formed at intervals in the second direction, and the insulating film 9 and the second bridge wiring portion 4 (see FIG. 6 ) The insulating film 9 is formed in the intersection region so as to cover the first electrode pattern which is not formed in the intersection region, and the second bridge wiring portion 4 is the second electrode pattern for forming the second electrode pattern formed in the intersecting region. The wiring formed in the connection state between the island-shaped electrode portions is formed so as to straddle the insulating film 9. The second bridge wiring portion 4 is formed of a metal material, and the insulating film is shielded. And an insulating material is formed.
如上述,藉由以具有遮蔽性的材料來形成設置於在交叉區域未斷開形成的第1電極圖案的第1橋接配線部202與第2橋接配線部4之間的絕緣膜9,便能夠抑制因為由金屬材料形成的橋接配線4之反射所造成的可視性之劣化,即能夠抑制因產生於第1電極圖案與第2電極的交叉區域的點狀或線狀的眩目的高輝度部分所造成的讓使用者在觀看液晶畫面時覺得顯示上有不良或視覺上有不適的感覺。 As described above, by forming the insulating film 9 between the first bridge wiring portion 202 and the second bridge wiring portion 4 which are provided in the first electrode pattern which is not formed in the intersecting region by the shielding material, It is possible to suppress the deterioration of the visibility due to the reflection of the bridge wire 4 formed of a metal material, that is, to suppress the high-luminance portion of the dot-like or linear glare which is generated in the intersection region between the first electrode pattern and the second electrode. This causes the user to feel a bad or visually uncomfortable feeling when viewing the LCD screen.
另外,在前述專利文獻1中,上述結構的電容式感應器係以下述方式製造。首先,在透明基板的一側面,藉由透明電導膜的圖案化(patterning),形成透明電極圖案,包括朝第1方向延伸的第1電極圖案及朝與前述第1方向交叉之方向的第2方向延伸的第2電極圖案,即形成第2電極圖案在前述第1電極圖案與前述第2電極圖案的交叉區域形成為斷開形狀的透明電極圖案。接著,在前述第1電極圖案與前述第2電極圖案的交叉區域,設置以具有遮蔽性及絕緣性的材料形成的絕緣遮蔽層,以此絕緣遮蔽層作為覆蓋在交差區域未分斷形成的前述第1電極圖案的絕緣膜。接著,在透明基板的形成有前述絕緣遮蔽層的同一面,進行以金屬製的導電物質成膜而得的金屬膜的圖案化,藉此形成第2橋接配線部。 Further, in Patent Document 1 described above, the capacitive sensor of the above configuration is manufactured in the following manner. First, a transparent electrode pattern is formed on one side surface of a transparent substrate by patterning of a transparent conductive film, and includes a first electrode pattern extending in the first direction and a second electrode in a direction crossing the first direction The second electrode pattern extending in the direction, that is, the transparent electrode pattern in which the second electrode pattern is formed in a disconnected shape at the intersection of the first electrode pattern and the second electrode pattern. Next, an insulating shielding layer formed of a material having shielding properties and insulating properties is provided in an intersection region between the first electrode pattern and the second electrode pattern, and the insulating shielding layer is formed as a cover that is formed in the intersection region without being separated. An insulating film of the first electrode pattern. Then, on the same surface of the transparent substrate on which the insulating shielding layer is formed, patterning of the metal film formed by forming a conductive material made of a metal is performed, thereby forming a second bridge wiring portion.
專利文獻1:日本特開2011-90443號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2011-90443
然而,在專利文獻1所記載的發明中,具有遮蔽性的絕緣膜9的寬度係形成為比以跨越絕緣膜9的方式形成之由金屬材料構成的第2橋接配線部4的寬度還寬。這是為了確實防止第2橋接配線部4與相交叉的第1電極圖案中的第1橋接配線部202發生接觸,考量到層積的各層在交叉區域的位置偏移容許度後的做法。然而具有遮蔽性的絕緣膜9的大範圍遮光會導致可視性劣化,也就是說在透明電極圖案的交叉區域會產生將亮起的像素永遠遮光的點狀或線狀的黑色部分,成為液晶畫面顯示時的妨礙而成了新的問題。 However, in the invention described in Patent Document 1, the width of the insulating film 9 having shielding properties is formed to be wider than the width of the second bridge wiring portion 4 made of a metal material formed to extend across the insulating film 9. This is to prevent the second bridge wiring portion 4 from coming into contact with the first bridge wiring portion 202 in the first electrode pattern that intersects, and it is considered that the position of each layer of the layer is shifted in the intersection region. However, the wide-area light-shielding of the insulating film 9 having the shielding property may cause deterioration of visibility, that is, a dot-like or linear black portion that shields the illuminated pixels forever in the intersection region of the transparent electrode pattern, and becomes a liquid crystal screen. Obstruction at the time of display has become a new problem.
為此,本發明的目的在於提供一種能夠解決前述課題,在透明電極圖案的交叉區域不會產生眩目的點狀或線狀的高輝度部分,且會讓液晶畫面顯示變得難以看清的點狀或線狀的黑色部分也不明顯的觸控感應器。 Therefore, an object of the present invention is to provide a point in which a high-intensity portion having a dot shape or a line shape which does not cause glare in the intersection region of the transparent electrode pattern and which makes the liquid crystal screen display difficult to see is provided. The black part of the shape or line is not obvious to the touch sensor.
依據本發明的第1態樣,提供一種觸控感應器,係具有形成於透明的基板的一面上且朝互相交叉的方向延伸的複數個透明的第1電極圖案及複數個透明的第2電極圖案;其中,前述第1電極圖案係具有:複數個第1島狀電極部,係沿前述基板上的第1方向隔著間隔形成;及 第1橋接配線部,係使相鄰接的前述第1島狀電極部間形成電性連接;前述第2電極圖案係具有:複數個第2島狀電極部,係位於前述基板上,且沿跟前述第1方向交叉的第2方向隔著間隔形成;此外,以跨越形成在前述第1電極圖案的至少前述第1橋接配線部上的透明的絕緣膜上之方式,形成使前述第2電極圖案中相鄰接的前述第2島狀電極部間形成電性連接的第2橋接配線部,且該第2橋接配線部係為經黑色化的金屬細線。 According to a first aspect of the present invention, a touch sensor having a plurality of transparent first electrode patterns and a plurality of transparent second electrodes extending on one surface of a transparent substrate and extending in a direction intersecting each other is provided. a pattern, wherein the first electrode pattern has a plurality of first island-shaped electrode portions formed at intervals along a first direction on the substrate; The first bridge wiring portion is electrically connected between the adjacent first island-shaped electrode portions, and the second electrode pattern includes a plurality of second island-shaped electrode portions on the substrate and along the substrate The second direction intersecting the first direction is formed at intervals, and the second electrode is formed so as to straddle the transparent insulating film formed on at least the first bridge wiring portion of the first electrode pattern A second bridge wiring portion that is electrically connected is formed between the adjacent second island-shaped electrode portions adjacent to each other in the pattern, and the second bridge wiring portion is a blackened metal thin wire.
此外,依據本發明的第2態樣,提供一種如第1態樣之觸控感應器,其中前述金屬細線的黑色化係以鍍黑處理進行。 Further, according to a second aspect of the present invention, a touch sensor according to the first aspect, wherein the blackening of the metal thin wires is performed by a black plating process.
此外,依據本發明的第3態樣,提供一種如第1態樣之觸控感應器,其中前述金屬細線的黑色化係以電沉積塗裝處理進行。 Further, according to a third aspect of the present invention, a touch sensor according to the first aspect, wherein the blackening of the metal thin wires is performed by an electrodeposition coating process.
此外,依據本發明的第4態樣,提供一種如第1態樣之觸控感應器,其中前述金屬細線的黑色化係以化成處理進行。 Further, according to a fourth aspect of the present invention, a touch sensor according to the first aspect, wherein the blackening of the metal thin wires is performed by a chemical conversion process.
此外,依據本發明的第5態樣,提供一種如第1至4態樣中任一態樣之觸控感應器,其中前述金屬細線係為銅、鋁、鎳之中的任一者。 Further, according to a fifth aspect of the present invention, a touch sensor according to any one of the first to fourth aspects, wherein the metal thin wire is any one of copper, aluminum, and nickel.
此外,依據本發明的第6態樣,提供一種如第1至5態樣中任一態樣之觸控感應器,其進一步於前面具備偏光板。 Further, according to a sixth aspect of the present invention, a touch sensor according to any one of the first to fifth aspects is provided, further comprising a polarizing plate at the front.
本發明的觸控感應器係構成為形成於斷開的電極圖案中島狀電極部之間的橋接配線部係為經黑色化的金屬細線,且以跨越透明的絕緣膜之方式形成。因此,由金屬材料構成的橋接配線部因黑色化的關係而不會產生反射,所以所以不會在透明電極圖案的交叉區域產生眩目的點狀或線狀的高輝度部分。此外,遮光的範圍是經黑色化的橋接配線部的寬度而不是絕緣膜的寬度,所以在交叉區域會讓液晶畫面顯示變得難以看清的點狀或線狀的黑色部分也不會明顯。 In the touch sensor of the present invention, the bridge wiring portion formed between the island electrode portions formed in the disconnected electrode pattern is a blackened metal thin wire and is formed to span a transparent insulating film. Therefore, since the bridge wiring portion made of a metal material does not cause reflection due to the blackening relationship, a dazzling dot-like or linear high-luminance portion does not occur in the intersection region of the transparent electrode pattern. Further, since the range of the light-shielding is the width of the blackened bridge wiring portion instead of the width of the insulating film, the dot-like or linear black portion which makes the liquid crystal screen display difficult to see in the intersecting region is not conspicuous.
1、81、82、91‧‧‧透明基板 1, 81, 82, 91‧‧‧ transparent substrate
3‧‧‧絕緣膜(透明) 3‧‧‧Insulation film (transparent)
4‧‧‧第2橋接配線部(反射) 4‧‧‧2nd bridge wiring section (reflection)
5‧‧‧佈線 5‧‧‧Wiring
9‧‧‧絕緣膜(遮蔽) 9‧‧‧Insulation film (shadowing)
10‧‧‧第1電極圖案(X電極圖案) 10‧‧‧First electrode pattern (X electrode pattern)
11、202‧‧‧第1橋接配線部 11, 202‧‧‧1st bridging wiring department
12、201c、201d‧‧‧第1島狀電極部 12, 201 c , 201 d ‧‧‧1st island electrode
13、23‧‧‧連接部 13, 23‧‧‧ Connection Department
14、92‧‧‧感應用電極 14, 92‧‧ ‧ application electrode
20‧‧‧第1電極圖案(Y電極圖案) 20‧‧‧First electrode pattern (Y electrode pattern)
22、201a、201b‧‧‧第2島狀電極部 22, 201 a , 201 b ‧‧‧2nd island electrode
30‧‧‧第2橋接配線部(黑色化) 30‧‧‧2nd bridge wiring section (black)
70‧‧‧液晶顯示裝置 70‧‧‧Liquid crystal display device
71、101‧‧‧觸控感應器 71, 101‧‧‧ touch sensor
72‧‧‧保護玻璃 72‧‧‧protective glass
83‧‧‧液晶 83‧‧‧LCD
84‧‧‧密封材料 84‧‧‧ Sealing material
85‧‧‧液晶顯示用電極 85‧‧‧Liquid electrodes for liquid crystal display
86‧‧‧偏光板 86‧‧‧Polar plate
87‧‧‧驅動用IC 87‧‧‧Drive IC
88、95‧‧‧撓性基板 88, 95‧‧‧Flexible substrate
93‧‧‧絕緣膜 93‧‧‧Insulation film
96‧‧‧保護層 96‧‧‧Protective layer
97‧‧‧黑色印刷 97‧‧‧Black printing
99‧‧‧光學接著層 99‧‧‧optical layer
第1圖係顯示第1實施形態的觸控感應器的構成之局部平面圖。 Fig. 1 is a partial plan view showing the configuration of a touch sensor according to the first embodiment.
第2圖係交叉區域附近的局部放大圖。 Figure 2 is a partial enlarged view of the vicinity of the intersection area.
第3圖係第2圖中的A-A’線剖面圖。 Fig. 3 is a cross-sectional view taken along line A-A' in Fig. 2.
第4圖係顯示含有電容觸控感應器的電子機器的構成例之說明圖。 Fig. 4 is an explanatory view showing a configuration example of an electronic device including a capacitive touch sensor.
第5圖係顯示透明電極的圖案化的例子之說明圖。 Fig. 5 is an explanatory view showing an example of patterning of a transparent electrode.
第6圖係放大顯示習知技術中在透明基板形成有透明電極、絕緣膜、橋接配線的狀態之說明圖。 Fig. 6 is an enlarged view showing a state in which a transparent electrode, an insulating film, and a bridge wiring are formed on a transparent substrate in the prior art.
[實施形態1] [Embodiment 1]
以下,參照圖式說明本發明的實施形態。第1圖係顯 示觸控感應器的例子之概略圖。第2圖係交差區域附近的局部放大圖。此外,第3圖係第1圖中的I-I線的局部放大圖。第1圖顯示的投射式的電容觸控感應器101係具備一片透明基板1及形成在該透明基板1上的感應用電極14。電容觸控感應器101係感知人類的手指等導電體接近設置於該透明基板1的感應用電極14所引起的電容量變化而檢測出觸碰位置。由於是藉由電容量變化來檢知手指的接近,所以手指並不需要直接接觸到感應用電極14。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. Figure 1 shows A schematic diagram showing an example of a touch sensor. Fig. 2 is a partial enlarged view of the vicinity of the intersection region. In addition, Fig. 3 is a partially enlarged view of the I-I line in Fig. 1 . The projected capacitive touch sensor 101 shown in FIG. 1 includes a transparent substrate 1 and a sensing application electrode 14 formed on the transparent substrate 1. The capacitive touch sensor 101 senses a change in capacitance caused by a conductor such as a human finger approaching the sensing application electrode 14 provided on the transparent substrate 1 to detect a touch position. Since the proximity of the finger is detected by the change in capacitance, the finger does not need to directly contact the sensing application electrode 14.
更具體言之,手指接近感應用電極14會使手指與感應用電極14之間形成電容,這變化會被透過撓性基板(未圖示)連接的電容感應用IC(未圖示)所檢知而檢測出觸碰位置。感應用電極14與撓性基板之間係藉由佈線5而連接。另外,電容感應用IC可搭載於撓性基板上,亦可搭載於透明基板1上。 More specifically, the finger proximity sensing application electrode 14 forms a capacitance between the finger and the sensing application electrode 14, and this change is detected by a capacitive sensing application IC (not shown) connected through a flexible substrate (not shown). Knowing and detecting the touch position. The application electrode 14 and the flexible substrate are connected by a wiring 5. Further, the capacitive sensing application IC can be mounted on a flexible substrate or mounted on the transparent substrate 1.
在第1圖所示的例子中,於透明基板1的一側面,感應用電極14係具有複數個作為第1電極圖案的X電極圖案10及複數個作為第2電極圖案的Y電極圖案20。 In the example shown in FIG. 1, the sensing application electrode 14 has a plurality of X electrode patterns 10 as a first electrode pattern and a plurality of Y electrode patterns 20 as second electrode patterns on one side surface of the transparent substrate 1.
X電極圖案10係朝圖示中作為第1方向的X軸方向延伸,且沿Y軸方向隔著間隔排列有複數列。Y電極圖案20係朝圖示中作為第2方向的Y軸方向延伸,且沿X軸方向隔著間隔排列有複數行。另外,由於X電極圖案10與Y電極圖案20交叉,所以在交叉區域,Y電極圖案20以斷開形狀形成。 The X electrode pattern 10 extends in the X-axis direction as the first direction in the drawing, and has a plurality of columns arranged at intervals in the Y-axis direction. The Y electrode pattern 20 extends in the Y-axis direction as the second direction in the drawing, and has a plurality of rows arranged at intervals in the X-axis direction. In addition, since the X electrode pattern 10 and the Y electrode pattern 20 intersect, the Y electrode pattern 20 is formed in a broken shape in the intersection region.
X電極圖案10係以單一膜具有沿X軸方向隔著間隔排列的複數個第1島狀電極部12及連接相鄰第1島 狀電極部12的第1橋接配線部11。第1島狀電極部12係形成為以平面觀看時為矩形狀,且以矩形狀其中一條對角線平行X軸的方式配置。 The X electrode pattern 10 has a plurality of first island-shaped electrode portions 12 arranged at intervals in the X-axis direction in a single film, and connects adjacent first islands The first electrode portion 12 of the electrode portion 12 is bridged. The first island-shaped electrode portion 12 is formed in a rectangular shape when viewed in plan, and is disposed such that one of the diagonal lines is parallel to the X-axis.
Y電極圖案20係具有沿Y軸方向隔著間隔排列的複數個第2島狀電極部22。第2島狀電極部22係形成為以平面觀看時為矩形狀,且以矩形狀其中一條對角線平行Y軸的方式配置。第1島狀電極部12與第2島狀電極部22係在X軸方向及Y軸方向上配置為彼此交錯(交錯方格式配置),以平面觀看時,矩形狀的第1島狀電極部12、第2島狀電極部22係配置成矩陣狀。 The Y electrode pattern 20 has a plurality of second island-shaped electrode portions 22 arranged at intervals in the Y-axis direction. The second island-shaped electrode portion 22 is formed in a rectangular shape when viewed in plan, and is disposed such that one of the diagonal lines is parallel to the Y-axis. The first island-shaped electrode portion 12 and the second island-shaped electrode portion 22 are arranged to be staggered in the X-axis direction and the Y-axis direction (arranged in a staggered manner), and the first island-shaped electrode portion having a rectangular shape when viewed in plan 12. The second island-shaped electrode portions 22 are arranged in a matrix.
此外,於形成為在交叉區域非斷開之形狀的透明的X電極圖案10,以覆蓋第1橋接配線部11的方式設置有透明的絕緣膜3。此外,於在交叉區域斷開形成的透明的第2電極圖案,設置有用以使相鄰接的第2島狀電極部22於該交叉區域成為連接狀態而形成的配線,即以跨越前述透明的絕緣膜3的方式形成的第2橋接配線部30(參照第2圖、第3圖)。亦即,第2電極圖案20中相鄰接的第2島狀電極部22係藉由與透明電極圖案分開形成的該第2橋接配線部30而電性連接。另外,在本發明中,第2橋接配線部30跨越透明的絕緣膜3指的是以比絕緣膜3的寬度還長的第2橋接配線部30橫跨整個絕緣膜3上面。 Further, the transparent X electrode pattern 10 formed in a shape that is not broken in the intersecting region is provided with a transparent insulating film 3 so as to cover the first bridge wiring portion 11. Further, a transparent second electrode pattern formed in the intersecting region is provided with a wiring formed so that the adjacent second island-shaped electrode portions 22 are connected to each other in the intersecting region, that is, across the aforementioned transparent The second bridge wiring portion 30 formed as the insulating film 3 (see FIGS. 2 and 3). In other words, the second island-shaped electrode portions 22 adjacent to each other in the second electrode pattern 20 are electrically connected by the second bridge wiring portion 30 formed separately from the transparent electrode pattern. Further, in the present invention, the second bridge wiring portion 30 spans the transparent insulating film 3 to mean that the second bridge wiring portion 30 longer than the width of the insulating film 3 spans the entire upper surface of the insulating film 3.
此外,佈線5係形成在透明的基板1的周緣部,其一端連接至X電極圖案10及Y電極圖案20,從而能夠將在X電極圖案10及Y電極圖案20感知到的信號傳送至外部。佈線5的另一端係與設置在觸控感應器內部或外部 裝置的驅動部及電訊號轉換/演算部(皆省略圖示)連接。 Further, the wiring 5 is formed on the peripheral portion of the transparent substrate 1, and one end thereof is connected to the X electrode pattern 10 and the Y electrode pattern 20, so that the signals perceived by the X electrode pattern 10 and the Y electrode pattern 20 can be transmitted to the outside. The other end of the wiring 5 is disposed inside or outside the touch sensor The drive unit of the device and the electrical signal conversion/calculation unit (all omitted) are connected.
透明基板1係為具有電絕緣性的基板,例如可為玻璃基板、PET(Polyethylene Terephthalate;聚對苯二甲酸乙二酯)膜、PC(Polycarbonate;聚碳酸酯)膜、COP(Cyclo-olefin Polymer;環烯烴聚合物)膜、PVC(Polyvinyl Chloride;聚氯乙烯)膜等。其中尤以COP膜為佳,其不僅在光學等方性方面有優異的表現,在尺寸穩定性、更甚而在加工精度方面也有優異的表現。另外,當透明基板1使用的是玻璃基板時,厚度為0.3mm(毫米)至3mm即可。此外,當透明基板1使用的樹脂膜時,厚度為20μm(微米)至3mm即可。 The transparent substrate 1 is an electrically insulating substrate, and may be, for example, a glass substrate, a PET (Polyethylene Terephthalate) film, a PC (Polycarbonate) film, or a COP (Cyclo-olefin Polymer). Cycloolefin polymer) film, PVC (Polyvinyl Chloride) film, and the like. Among them, a COP film is preferable, and it not only has excellent performance in optical equivalence, but also excellent in dimensional stability and even in processing precision. Further, when the transparent substrate 1 is a glass substrate, the thickness may be from 0.3 mm (mm) to 3 mm. Further, when the resin film used for the transparent substrate 1 is used, the thickness may be 20 μm (micrometer) to 3 mm.
就構成透明的X電極圖案10及Y電極圖案20的材料而言,有透明導電膜,例如氧化銦錫(ITO)、氧化鋁鋅(AZO)、氧化銦鋅(IZO)等金屬氧化物。此外,透明導電膜的厚度要形成為數十nm(奈米)至數百nm的程度,必須能夠不容易被後述的由金屬細線構成的第2橋接配線部30的圖案化形成之際使用的蝕刻液所蝕刻。並且具有80%以上的光線透過率、數mΩ至數百Ω的表面電阻值為佳。 The material constituting the transparent X electrode pattern 10 and the Y electrode pattern 20 is a transparent conductive film such as a metal oxide such as indium tin oxide (ITO), aluminum zinc oxide (AZO) or indium zinc oxide (IZO). In addition, the thickness of the transparent conductive film is required to be tens of nanometers (nano) to several hundreds of nm, and it is necessary to be able to be formed by patterning of the second bridge wiring portion 30 made of thin metal wires, which will be described later. The etching solution is etched. Further, it has a light transmittance of 80% or more and a surface resistance value of several mΩ to several hundredsΩ.
就構成透明的絕緣膜3的具透明性的電絕緣性物質而言,能夠使用例如SiO2等無機材料和光微影樹脂等有機材料樹脂。 As the transparent electrically insulating material constituting the transparent insulating film 3, an organic material such as an inorganic material such as SiO 2 or a photolithography resin can be used.
在本實施形態中,第2橋接配線部30及佈線5係為經黑色化的金屬細線。金屬細線的材質係能夠使用銅、鋁、鎳、鐵、金、銀、鉻、鈦等金屬或該些金屬的 合金。其中,從導電性佳、加工容易、價格便宜的角度來看,較佳為使用銅、鋁、鎳等。 In the present embodiment, the second bridge wiring portion 30 and the wiring 5 are blackened metal thin wires. The material of the metal thin wire can use metals such as copper, aluminum, nickel, iron, gold, silver, chromium, titanium, or the like. alloy. Among them, copper, aluminum, nickel, and the like are preferably used from the viewpoint of good conductivity, easy processing, and low cost.
該些金屬細線的黑色化係能夠以鍍黑處理進行。例如只要施作鍍黑鎳處理、鍍黑鉻處理等或是施作使用錫及鎳、銅的三元合金鍍黑處理、使用錫及鎳、鉬的三元合金鍍黑處理等即可。 The blackening of the metal thin wires can be performed by a black plating process. For example, it may be applied as a black nickel plating treatment, a black chrome plating treatment, or the like, or a ternary alloy black plating treatment using tin, nickel, or copper, and a ternary alloy black plating treatment using tin, nickel, and molybdenum.
此外,金屬細線的黑色化亦能夠以電沉積塗裝處理進行。黑色的電沉積塗裝處理係使用在電沉積樹脂裡摻雜黑色顏料而成的黑色塗料。就黑色顏料而言,可舉出碳黑(carbon black)等,以具有導電性的黑色顏料為佳。此外,就電沉積樹脂而言,可為陰離子系樹脂,亦可為陽離子系樹脂,具體而言可舉出丙烯酸(acrylate)樹脂、聚酯(polyester)樹脂、環氧(epoxy)樹脂等,且這些電沉積樹脂可各自單獨使用或混合兩種以上使用。 In addition, the blackening of the metal thin wires can also be performed by an electrodeposition coating process. The black electrodeposition coating treatment uses a black paint which is doped with a black pigment in an electrodeposition resin. Examples of the black pigment include carbon black and the like, and a black pigment having conductivity is preferred. In addition, the electrodeposition resin may be an anionic resin or a cationic resin, and specific examples thereof include an acrylate resin, a polyester resin, and an epoxy resin. These electrodeposited resins may be used singly or in combination of two or more.
此外,金屬細線的黑色化亦能夠以硫化處理或氧化處理等化成處理進行。硫化處理和氧化處理能夠以周知的方法進行。 Further, the blackening of the fine metal wires can also be carried out by a chemical conversion treatment such as a vulcanization treatment or an oxidation treatment. The vulcanization treatment and the oxidation treatment can be carried out in a known manner.
另外,在本說明書中,黑色化的「黑色」以明度L*為1至20,色度a*、b*各為+5至-5者為佳。明度與色度可利用色彩色差計測量,在本說明書中係以國際照明委員會(CIE)規定的L*a*b*表色系統(JIS Z 8729亦採用)來規定明度及色度。明度的值愈小則愈黑,代表愈不會反射光線,愈難以看清,理論上的最小值為0。色度表示色度圖上的座標,表示色相與彩度。在L*a*b*表色系統中,a*b*之值皆為0的座標表示理論上的無彩色。在明 度L*為1至20的範圍內,金屬細線的表面呈黑色,難以利用肉眼辨別出差異。明度L*的值愈低愈佳,但一般10至20便能獲得目標效果。另一方面,若色度a*、b*各為+5至-5,則難以利用肉眼進行色相的辨別。a*若超過+5,金屬細線看起來呈紅色系,若未滿-5,看起來呈綠色系;b*若超過+5,金屬細線看起來呈黃色系,若未滿-5,看起來呈藍色系。a*的較佳範圍為+4至-2,b*的較佳範圍為+2至-5。 Further, in the present specification, the blackened "black" is preferably 1 to 20 in brightness L*, and +5 to -5 in chromaticity a* and b*. The brightness and chromaticity can be measured by a color difference meter. In this specification, the L*a*b* color system (also used in JIS Z 8729) specified by the International Commission on Illumination (CIE) is used to specify the brightness and chromaticity. The smaller the value of the brightness is, the darker it is. The less the light is reflected, the harder it is to see. The theoretical minimum is 0. Chroma represents the coordinates on the chromaticity diagram, indicating hue and chroma. In the L*a*b* color system, the coordinates of a*b* having a value of 0 indicate a theoretical achromatic color. In Ming When the degree L* is in the range of 1 to 20, the surface of the fine metal wires is black, and it is difficult to distinguish the difference by the naked eye. The lower the value of the brightness L*, the better, but generally 10 to 20 can achieve the target effect. On the other hand, if the chromaticities a* and b* are each +5 to -5, it is difficult to distinguish the hue with the naked eye. If a* exceeds +5, the thin metal wire looks red. If it is less than -5, it looks green. If b* exceeds +5, the thin metal wire looks yellow. If it is less than -5, it looks It is blue. A preferred range for a* is +4 to -2, and a preferred range for b* is +2 to -5.
如上述,由金屬細線構成的第2橋接配線部30及佈線5以經黑色化的金屬細線來構成,藉此,由金屬細線構成的第2橋接配線部30不會產生反射,所以不會於X電極圖案10及Y電極圖案20的交叉區域產生眩目的點狀或線狀的高輝度部分。此外,如第2圖所示,遮光的範圍是由金屬細線構成的第2橋接配線部30的寬度而不是絕緣膜的寬度,所以在X電極圖案10及Y電極圖案20的交叉區域讓液晶畫面顯示變得難以看清的點狀或線狀的黑色部分也不會明顯。 As described above, the second bridge wiring portion 30 and the wiring 5 which are formed of thin metal wires are formed of blackened metal thin wires, whereby the second bridge wiring portion 30 made of thin metal wires does not cause reflection, and therefore does not The intersection area of the X electrode pattern 10 and the Y electrode pattern 20 produces a dazzling dot-like or linear high-luminance portion. Further, as shown in FIG. 2, the range of the light-shielding is the width of the second bridge wiring portion 30 composed of the thin metal wires instead of the width of the insulating film, so that the liquid crystal screen is provided at the intersection of the X electrode pattern 10 and the Y electrode pattern 20. The dotted or linear black portion that becomes difficult to see is also not noticeable.
接著,針對本實施形態的觸控感應器101的製造方法的一例進行說明。 Next, an example of a method of manufacturing the touch sensor 101 of the present embodiment will be described.
首先,使用濺鍍法等方法,於透明基板1的一側面成膜透明導電膜,再使用光微影(photolithography)技術等方法對所成膜的透明導電膜進行圖案化,從而加工成朝X軸方向延伸之具有接續形狀的X電極圖案10與朝Y軸方向延伸之具有斷開形狀的Y電極圖案20,藉此而形成感應用電極14。 First, a transparent conductive film is formed on one side surface of the transparent substrate 1 by a sputtering method or the like, and the formed transparent conductive film is patterned by a photolithography technique or the like to be processed into X. The X electrode pattern 10 having a continuous shape extending in the axial direction and the Y electrode pattern 20 having a broken shape extending in the Y-axis direction are thereby formed to form the sensing electrode 14.
接著,對形成有感應用電極14的透明基板1的同一面(形成有感應用電極14之面),使用旋轉塗布(spin coat)法等方法形成透明的絕緣性材料,再使用光微影技術進行圖案化,藉此在感應用電極14的X電極圖案10與Y電極圖案20交叉的區域,圖案化形成透明的絕緣膜3。 Next, a transparent insulating material is formed on the same surface of the transparent substrate 1 on which the applied electrode 14 is formed (the surface on which the applied electrode 14 is formed) by a spin coating method or the like, and photolithography is used. Patterning is performed to form a transparent insulating film 3 in a region where the X electrode pattern 10 of the application electrode 14 and the Y electrode pattern 20 intersect.
接著,對形成有透明的絕緣膜3的透明基板1的同一面(形成有絕緣膜3之面),使用濺鍍法等方法,以金屬材料的導電物質成膜一整面的膜,再藉由鍍黑處理或電沉積塗裝理、化成處理使該金屬膜黑色化後,使用光微影技術將該經黑色化的金屬膜形成為特定的圖案形狀。亦即,同時形成佈線5及跨越各絕緣膜3使第2電極圖案中相鄰接的第2島狀電極部22間形成電性連接之由金屬細線構成的第2橋接配線部30。如上述,由於同時形成第2橋接配線部30及佈線5,所以可以用較少的步驟數完成。 Next, the same surface of the transparent substrate 1 on which the transparent insulating film 3 is formed (the surface on which the insulating film 3 is formed) is formed by a sputtering method or the like, and a film of a whole surface is formed by using a conductive material of a metal material. After the black film is blackened by black plating or electrodeposition coating and chemical conversion treatment, the blackened metal film is formed into a specific pattern shape by photolithography. In other words, the wiring 5 and the second bridge wiring portion 30 made of a thin metal wire electrically connected between the adjacent second island-shaped electrode portions 22 in the second electrode pattern are formed at the same time. As described above, since the second bridge wiring portion 30 and the wiring 5 are simultaneously formed, it can be completed with a small number of steps.
[實施形態2] [Embodiment 2]
在本實施形態2中,佈線5的材料並非使用跟上述實施形態1中由金屬細線構成的第2橋接配線部30相同的材料,而是使用其他材料。例如,藉由銀膠(silver paste)等的網版印刷亦能夠形成佈線5。此時,與實施形態1相較,不適合用於第2橋接配線部30的材料仍能夠用於佈線5,因此具有材料選擇範圍廣的優點。此外,還能進行厚度的調整,例如形成得厚一點。 In the second embodiment, the material of the wiring 5 is not the same as that of the second bridge wiring portion 30 composed of the metal thin wires in the first embodiment, but other materials are used. For example, the wiring 5 can be formed by screen printing such as silver paste. At this time, compared with the first embodiment, the material which is not suitable for the second bridge wiring portion 30 can be used for the wiring 5, and therefore has an advantage that the material selection range is wide. In addition, the thickness can be adjusted, for example, to be thicker.
[變化例] [variation]
另外,本發明並不限定為上述各實施形態。例如,透明基板1為樹脂膜時,可為提供λ/4相位差者。此處,提供λ/4相位差指的是理想上對可視光波段的所有波長提供λ/4相位差。而只要波長550nm的相位差為λ/4的話,則其他波長的相位差就算稍微偏離λ/4,在實際應用上也不會有問題。波長550nm的遲滯(retardation)值(△nd)以125nm至150nm為佳,131nm至145nm更佳。 Further, the present invention is not limited to the above embodiments. For example, when the transparent substrate 1 is a resin film, it may be provided with a λ/4 phase difference. Here, providing a λ/4 phase difference means that the λ/4 phase difference is ideally provided for all wavelengths of the visible light band. As long as the phase difference of the wavelength of 550 nm is λ/4, the phase difference of the other wavelengths is slightly deviated from λ/4, and there is no problem in practical use. The retardation value (Δnd) at a wavelength of 550 nm is preferably from 125 nm to 150 nm, more preferably from 131 nm to 145 nm.
此外,透明基板1的樹脂膜並不限為僅有λ/4相位差膜單層。例如,亦可為黏合λ/4相位差膜與光學等方性膜的層積體。就光學等方性膜而言,例如為遲滯值(△nd)為30nm以下者。此外,透明基板1的樹脂膜亦可使用黏合λ/2相位差膜與λ/4相位差膜的層積體。 Further, the resin film of the transparent substrate 1 is not limited to a single layer of only λ/4 retardation film. For example, it may be a laminate of a λ/4 retardation film and an optical isotropic film. The optical isotropic film is, for example, a hysteresis value (Δnd) of 30 nm or less. Further, a laminate of a λ/2 retardation film and a λ/4 retardation film may be used as the resin film of the transparent substrate 1.
此外,透明導電膜除了使用前述濺鍍金屬氧化物而成的膜之外,亦可為以各種印刷法、塗布法、噴墨法等方法形成的PEDOT:poly(3,4-ethylenedioxythiophene)等導電性聚合物膜和將奈米碳管、碳奈米角、碳奈米線、碳奈米纖維、石墨原纖維(graphite fibril)等極細導電碳纖維或由銀素材構成的極細導電纖維摻雜至發揮作為結合劑(binder)功能的聚合物材料裡而成之膜。這些膜具有優異的可撓性,當透明基板1為樹脂膜時,能夠把電容觸控感應器10沿著2.5維曲面或3維曲面貼附。 Further, the transparent conductive film may be a conductive film such as PEDOT:poly(3,4-ethylenedioxythiophene) formed by various methods such as a printing method, a coating method, or an inkjet method, in addition to the film formed by sputtering the metal oxide. Polymer film and ultrafine conductive carbon fiber such as carbon nanotube, carbon nanohorn, carbon nanowire, carbon nanofiber, graphite fibril or ultrafine conductive fiber composed of silver material A film made from a polymer material that functions as a binder. These films have excellent flexibility, and when the transparent substrate 1 is a resin film, the capacitive touch sensor 10 can be attached along a 2.5-dimensional curved surface or a 3-dimensional curved surface.
此外,佈線5亦可使用跟感應用電極14相同的材料,此時,能夠同時形成感應用電極14與佈線5。此外,佈線5亦可為由跟感應用電極14相同的材料構成的層與由其他材料構成的層組成的多層膜。 Further, the wiring 5 may be made of the same material as the sensing application electrode 14, and in this case, the sensing application electrode 14 and the wiring 5 can be simultaneously formed. Further, the wiring 5 may be a multilayer film composed of a layer made of the same material as the sensing application electrode 14 and a layer composed of other materials.
此外,在透明基板1的形成有感應用電極14、絕緣膜3、由金屬細線構成的第2橋接配線部30、佈線5之面,亦可進一步形成保護層(未圖示)。例如只要使用遮罩(mask)並以濺鍍法形成SiO2材料的膜即可。SiO2膜係例如於除了佈線5連接撓性基板的連接部之外全面形成。 Further, a protective layer (not shown) may be further formed on the surface of the transparent substrate 1 on which the application electrode 14, the insulating film 3, the second bridge wiring portion 30 composed of thin metal wires, and the wiring 5 are formed. For example, a film of a SiO 2 material may be formed by a sputtering method using a mask. The SiO 2 film is formed integrally, for example, in addition to the connection portion where the wiring 5 is connected to the flexible substrate.
此外,本發明的投射式的電容觸控感應器係可為自容(Self Capacitance)方式或互容(Mutual Capacitance)方式的任一者。在上述各實施形態的觸控感應器101中,雖然係構成為具有作為第1電極圖案的X電極圖案10、作為第2電極圖案的Y電極圖案20,但亦可反過來構成為具有作為第1電極圖案的Y電極圖案、作為第2電極圖案的X電極圖案20。 In addition, the projected capacitive touch sensor of the present invention may be any of a Self Capacitance mode or a Mutual Capacitance mode. In the touch sensor 101 of the above-described embodiments, the X electrode pattern 10 as the first electrode pattern and the Y electrode pattern 20 as the second electrode pattern are provided, but the reverse configuration may be A Y electrode pattern of one electrode pattern and an X electrode pattern 20 as a second electrode pattern.
此外,本發明的投射式的電容觸控感應器亦可進一步在前面還具有偏光板。只要將此構成的觸控感應器配置在濾色片(color filter)上,就能成為偏光板與濾色器之間內藏觸控面板(touch panel)功能的所謂「On-Cell型」液晶顯示裝置。 In addition, the projected capacitive touch sensor of the present invention may further have a polarizing plate in front. As long as the touch sensor is configured on a color filter, the so-called "On-Cell type" liquid crystal having a touch panel function between the polarizing plate and the color filter can be realized. Display device.
本發明的技術內容及技術特徵已揭示如上,惟本發明所屬技術領域中熟悉此項技藝者,當能根據本發明之教示及揭示,進行不違背本發明技術思想的各種置換及附加。因此本發明的權利保護範圍並不限定為實施例的揭示內容,而是涵蓋不違背本發明的各種置換及附加以及於後的專利申請範圍之記載。 The technical content and the technical features of the present invention have been disclosed as above, and those skilled in the art to which the present invention pertains can be variously substituted and added without departing from the technical idea of the present invention. Therefore, the scope of the invention is not limited by the scope of the invention, but is intended to cover various alternatives and additions of the invention and the scope of the appended claims.
3‧‧‧絕緣膜(透明) 3‧‧‧Insulation film (transparent)
10‧‧‧第1電極圖案(X電極圖案) 10‧‧‧First electrode pattern (X electrode pattern)
11‧‧‧第1橋接配線部 11‧‧‧1st bridging wiring department
12‧‧‧第1島狀電極部 12‧‧‧1st island electrode
13、23‧‧‧連接部 13, 23‧‧‧ Connection Department
20‧‧‧第2電極圖案(Y電極圖案) 20‧‧‧2nd electrode pattern (Y electrode pattern)
22‧‧‧第2島狀電極部 22‧‧‧2nd island electrode
30‧‧‧第2橋接配線部(黑色化) 30‧‧‧2nd bridge wiring section (black)
Claims (6)
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JP2012075224A JP2013206198A (en) | 2012-03-28 | 2012-03-28 | Touch sensor |
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TW201351234A true TW201351234A (en) | 2013-12-16 |
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JP6612075B2 (en) | 2015-07-23 | 2019-11-27 | 株式会社ジャパンディスプレイ | Display device, input device, and method of manufacturing display device |
JP2018036896A (en) | 2016-08-31 | 2018-03-08 | 株式会社ジャパンディスプレイ | Touch sensor and display device |
KR20180076688A (en) * | 2016-12-28 | 2018-07-06 | 엘지디스플레이 주식회사 | Display device |
CN107783699B (en) * | 2017-10-16 | 2021-05-04 | 业成科技(成都)有限公司 | Touch panel structure and manufacturing method thereof |
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