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TW200843848A - Hydrogenation processes using functional surface catalyst composition - Google Patents

Hydrogenation processes using functional surface catalyst composition Download PDF

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Publication number
TW200843848A
TW200843848A TW096142324A TW96142324A TW200843848A TW 200843848 A TW200843848 A TW 200843848A TW 096142324 A TW096142324 A TW 096142324A TW 96142324 A TW96142324 A TW 96142324A TW 200843848 A TW200843848 A TW 200843848A
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Taiwan
Prior art keywords
glass
substrate
sample
treatment
catalyst
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Application number
TW096142324A
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Chinese (zh)
Inventor
Robert L Bedard
Jeffery C Bricker
Dean E Rende
Ally Seng Yoot Chan
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Uop Llc
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Publication of TW200843848A publication Critical patent/TW200843848A/en

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    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/08Silica
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/12Silica and alumina
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B01J23/16Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
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    • B01J27/00Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
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    • B01J37/0201Impregnation
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    • B01J37/06Washing
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    • B01J37/28Phosphorising
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C5/00Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms
    • C07C5/02Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C5/00Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms
    • C07C5/02Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation
    • C07C5/10Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation of aromatic six-membered rings
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10GCRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G45/00Refining of hydrocarbon oils using hydrogen or hydrogen-generating compounds
    • C10G45/44Hydrogenation of the aromatic hydrocarbons
    • C10G45/46Hydrogenation of the aromatic hydrocarbons characterised by the catalyst used
    • C10G45/52Hydrogenation of the aromatic hydrocarbons characterised by the catalyst used containing platinum group metals or compounds thereof
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    • B01J23/24Chromium, molybdenum or tungsten
    • B01J23/26Chromium
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    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
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    • B01J35/397Egg shell like
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Abstract

Hydrogenation processes using a catalyst composition which, preferably comprises a glass substrate, with one or more functional surface active constituents integrated on and/or in the substrate surface. A substantially nonmicroporous/nonmesoporous substrate having macropores has (i) a total surface area between about 0.1 m<SP>2</SP>/g and 50 m<SP>2</SP>/g: and (ii) a predetermined isoelectric point (IEP) obtained in a pH range greater than 0, preferably greater than or equal to 4.5, or more preferably greater than or equal to 6.0, but less than or equal to 14. At least one catalytically-active region may be contiguous or discontiguous and has a mean thickness less than or equal to about 30 nm, preferably less than or equal to 20 nm and more preferably less than or equal to 10 nm. Preferably, the substrate is a glass composition having a SARCNa less than or equal to about 0.5.

Description

200843848 九、發明說明: 【發明所屬之技術領域】 本^月係關⑨觸媒組合物及其製備方法,該觸媒組 勿可用於各種化學製造方法及各種排放控制方法。更具 體而,,本發明係關於一種較佳包括玻璃基質之觸媒組合 且在基貝表面上及/或基質表面中整合一或多種官能 性表面活性成分,該觸媒組合物可用於各種氫化方法應 用。200843848 IX. INSTRUCTIONS: [Technical field to which the invention pertains] The present invention relates to a catalyst composition and a preparation method thereof, and the catalyst group is not applicable to various chemical production methods and various emission control methods. More specifically, the present invention relates to a catalyst composition preferably comprising a glass substrate and incorporating one or more functional surface active ingredients on the surface of the base and/or the surface of the substrate, the catalyst composition being useful for various hydrogenation Method application.

Ο 【先前技術】 觸媒組合物用於促進一 ^ ^ 如被杬述為催化反應或催化 作用的化學反應,而催化作 限化用對於有效刼作各種化學製程 至關重要。 :部分工業反應及幾乎所有的生物反應若非催化反應, 即是涉及為催化反應的反應前或反應後處理。僅就美國而 y在其中某階段包括催化作用之製程所出產之產品價值 就接近一兆美元(U S D) 〇你田奋s l甘z人, 1 D)使用觸媒組合物生產之產品包括 例如食品、服裝、華物、 ’、 曰用化予口口、特製或精細化學 品、塑膠、洗滌劑、辦1 J从枓及潤滑劑等。觸媒組合物還可用 於處理排放物(例如乍鱼 尸 α車尾氣排放物、煉製廒排放物、公 用設施工廄排放物等 他I私排放流,以降低可能對 人類魏或環境造成負面影響之有害成分的含量。 售額而言,用於異相催化反應之固載觸媒在全 球市%之銷售額約為备 ,一 -母年30¼吴几。固载觸媒通常分 類,即石油煉製魍拔 ,L ^ i觸媒、化學加工觸媒及排放控制觸媒。該 126426.doc 200843848 二類觸媒之市場銷售基本上三分天下。例如,1 9 9 〇年,在 美國1 8億美元之固體觸媒市場中,石油煉製、化學加工及 排放控制觸媒分佔市場之37%、34%及29%。以石油煉製 觸媒市場(1990年約為1〇億美元)為例,56%之收益來自流 體媒裂法(FCC)觸媒,而31.5%、6.5%及4.5%之收益分別來 自加氫處理觸媒、氫化裂解觸媒及重整觸媒。Ο [Prior Art] The catalyst composition is used to promote a chemical reaction that is described as a catalytic reaction or a catalytic reaction, and catalytic limitation is essential for effective chemical processes. : Some industrial reactions and almost all biological reactions, if not catalyzed, involve pre- or post-reaction treatments that are catalytic reactions. For products that are only produced in the United States and at a certain stage including catalytic processes, the value of the product is close to one trillion US dollars (USD). You are using the catalyst composition to produce products including, for example, food. , clothing, Chinese, ', 曰 use to mouth, special or fine chemicals, plastics, detergents, 1 J 枓 and lubricants. The catalyst composition can also be used to treat emissions (such as squid car exhaust emissions, refinery sputum emissions, utility effluent emissions, etc.) to reduce the potential for human Wei or the environment. The amount of harmful components affected. In terms of sales, the sales of solid carrier catalysts for heterogeneous catalytic reactions in the global market are about 备 , , 一 一 一 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Refining, L ^ i catalyst, chemical processing catalyst and emission control catalyst. The 126426.doc 200843848 second-class catalyst market sales are basically three-point world. For example, 1 9 9 years, in the United States 1 In the $800 million solid catalyst market, petroleum refining, chemical processing and emission control catalysts accounted for 37%, 34% and 29% of the market. The market for petroleum refining catalysts (about $100 million in 1990) For example, 56% of the revenue comes from fluid-cracking (FCC) catalysts, while 31.5%, 6.5%, and 4.5% of the revenue comes from hydrotreating catalysts, hydrocracking catalysts, and reforming catalysts.

就化學機理觀點而言,觸媒通常可在自身實質上沒有消 耗之情況下,提高使化學反應在反應物與產物之間達到平 衡狀態的速率。所以,對於任何相關之反應而言,觸媒雖 然不能改變反應物與產物之間的平衡狀態,但若經適當設 汁及/或挑選,觸媒可加快化學反應之速率。 因此,出於各種目的將觸媒用於範圍廣泛之商業實用製 程,該等目的包括提高製程之反應性、選擇性及能量效率 及其他用途。例如,按照規定的製程條件生產出所需之產 物%,提咼反應物之反應速率或反應性可縮短處理時間, 用以獲得更高的產物生產能力(例如,增加每單位小時之 f物體積或質量)。所以,觸媒活性係指觸媒組合物在每 單位時,内有效將反應物轉化成所需產物的能力。同樣 也提阿反應4擇性可在一組可能的反應產斗勿中提高所需 產物之產出百分率:在該等可能之反應產物中,有些產物 了 U非所需且f要進—步處理以進行相應之移除或轉 化。因此’觸媒選擇性為觸媒組合物將一部分反應物在規 ^製程條件下轉化成特定產物的能力。另外,觸媒組合 了用於在某一製程中轉化並降低污染物或非所需反應物 126426.doc 200843848 或產物之含量。另外-項用途則為在維持或改善產物生產 能力及/或反應選擇性的同時提高反應製程之總體能量效 率。 觸媒之使用範圍相差很大。例如(但不限於)觸媒能夠用 於降低諸如烴、—氧化碳(⑶)、氮氧化物⑽X)及硫氧化 物(sox)等污染物含量,該等污染 々寺/可木物可存在於一系列製程 (例如車輛之汽油發動機式些、、占她 钺次木/甴機内的燃燒廢氣、分類石 油煉製或燃煤製程等)之排放物中 卩双物中。同樣地,觸媒可用於 烴之處理製程,該製程用於# 用π對卉夕不同來源(例如直餾之 石油餾分、再循環石油餾分、重 刀里/由、瀝青、葉岩、天然氣 及包含可受催化反應作用 材料的其他碳物質)之烴製程 流進行轉化或改質。 催化反應通常分成兩種不同 4里个丨j的反應類型,亦即均相催化 及異相催化。 均相摧化廣泛描述一類催 Ο 、隹化反應,在其中反應物及觸媒 以&amp;在一溶液相中。儘瞢 , &amp;某些案例冒使用氣相催化反應, 但均相催化在典型情 月兄下為一液相糸統。因此,濃度梯度 -物遷移到觸媒會變成控制均相催化反應之重要因 二另外’在有些情況下’ ”溶液相”催化反應 個液相之界面發生,祐 w _形成一真正溶液,而是形成一乳 禮仆。;^些―般類別的均相催化包括酸鹼催化、有機金屬 催化、相轉移催化等。 /、相催化杬述如下的一類催化反應··在反應 呈氣相或液相之反應物暴露於實質上為固相或半 126426.doc 200843848 固相之觸媒。所以’在異相催化製程中,觸媒及反應物產 生了一種混合的固相-液相或固相_氣相反應。與均相催化 相比’異相催化具有許多優點,例如固體觸媒一般⑷腐蝕 性較低’ 13而與許多肖勻溶液相冑媒相&amp;,安全及環境風 險相對較低,(b)提供範圍較廣的經濟上可行之溫度與壓力 條件’而且⑷更能控制較為強烈之放熱化學反應及吸熱化 學反應,等。 另方面,固體可具有質量傳遞限制,進而顯著降低觸 媒之最終有效性。典型情況下,固體觸媒(有時稱為觸媒 顆粒)在種具有很高内表面積之多孔材料上包括一或多 種催化成分(例如,貴金屬,如把(Pd)、翻(Pt)、釕(Ru)、 銖(Re)等在催化成分所在之内表面積,通常數量級為每 克数百平方公尺。所以,習知觸媒組合物或觸媒顆粒包 夕一有很大内表面積之特別多孔載體,催化反應即在該 夕孔載體上發生 '然而,此類觸媒結構經常會產生質量傳 遞斤制it而降低觸媒顆粒關於觸媒活性及選擇性的有效 性月b,並引發其他觸媒性能問題。 ,^更/、代表性的觸媒結構中,反應物必須擴散通過 ^罔狀物才能到達觸媒顆粒之内部區域,而產物必須 2回擴政’退出觸媒顆粒之内部區域。因此,習知觸媒組 口物之夕孔性除其他因素外還取決於平衡,亦即取決於習 知觸媒組合物$ &amp; 勿之兩種特性之間的權衡,即觸媒表面積盘促 進質量傳#夕处丄 ' 得遴之此力之間的權衡。例如,許多催化成分在典 〉兄下存右 g JL^ . 牧衣具有微細而複雜之孔隙結構的載體中(經 126426.doc 200843848 系為微孔隙έ士播 顆粒… 即&lt;2奈米平均最大直徑),以增加觸媒 ,θ , 積。此較高表面積通常又將增加觸媒活性。 但,由於軔黑夕to w ^ ^ 。 ^媒顆粒表面積而導致的觸媒活性增加, I:觸:量傳遞阻力之問題(亦即阻止反應物及產物 微孔結構時一…”疋戟體包括較南百分率之 、。&quot;巧題更為明顯。藉由增加較大尺寸孔隙 (例如&gt;50奈米的大From a chemical mechanism point of view, the catalyst generally increases the rate at which the chemical reaction is brought to equilibrium between the reactants and the product without substantially eliminating itself. Therefore, for any relevant reaction, although the catalyst cannot change the equilibrium state between the reactants and the product, the catalyst can accelerate the rate of the chemical reaction if properly set and/or selected. Thus, catalysts are used for a wide variety of commercially useful processes for a variety of purposes including improved process responsiveness, selectivity and energy efficiency, and other uses. For example, the desired product % can be produced according to the specified process conditions, and the reaction rate or reactivity of the reactant can be shortened to achieve higher product throughput (for example, increasing the volume per unit hour). Or quality). Thus, catalyst activity refers to the ability of the catalyst composition to effectively convert the reactants to the desired product, per unit time. Similarly, the selectivity of the reaction can increase the percentage of yield of the desired product in a set of possible reaction products: among the possible reaction products, some products are undesired and f is required. Process for corresponding removal or conversion. Thus &apos;catalyst selectivity is the ability of a catalyst composition to convert a portion of the reactants to a particular product under regulatory conditions. In addition, the catalyst is combined to convert and reduce the amount of contaminants or undesired reactants in a process. The additional use is to increase the overall energy efficiency of the reaction process while maintaining or improving product production capacity and/or reaction selectivity. The range of use of the catalyst varies greatly. For example, but not limited to, a catalyst can be used to reduce the content of contaminants such as hydrocarbons, carbon monoxide ((3)), nitrogen oxides (10) X), and sulfur oxides (sox), which may exist in the contaminated temples/woods. In a series of processes (such as the gasoline engine type of the vehicle, the combustion exhaust gas in her 木 wood/甴 machine, the classified petroleum refining or coal burning process, etc.). Similarly, the catalyst can be used in a hydrocarbon treatment process, which is used for different sources of π-pairs (such as straight-run petroleum fractions, recycled petroleum fractions, heavy-knife/yield, asphalt, porphyry, natural gas, and A hydrocarbon process stream comprising other carbon species that can be subjected to a catalytic reaction material is converted or upgraded. The catalytic reaction is usually divided into two different types of reactions, namely homogeneous catalysis and heterogeneous catalysis. Homogeneous catalysis broadly describes a class of hydrazine and deuteration reactions in which reactants and catalysts are &amp; in a solution phase. In some cases, &amp; some cases use a gas phase catalytic reaction, but homogeneous catalysis is a liquid phase system under the typical situation. Therefore, the concentration gradient-object migration to the catalyst will become an important factor in controlling the homogeneous catalytic reaction. In addition, in some cases, the "solution phase" catalyzes the reaction at the interface of the liquid phase, forming a true solution. It is the formation of a servant. Homogeneous catalysis includes general acid-base catalysis, organometallic catalysis, phase transfer catalysis, and the like. /, the phase catalytic catalyzes a type of catalytic reaction as follows: The reactant in the gas phase or the liquid phase is exposed to a catalyst which is substantially solid phase or a solid phase or 126426.doc 200843848 solid phase. Therefore, in the heterogeneous catalytic process, the catalyst and reactants produce a mixed solid-liquid phase or solid phase-gas phase reaction. Heterogeneous catalysis has many advantages over homogeneous catalysis. For example, solid catalysts are generally less corrosive (13) and are more compatible with many Xiaojing solutions. Safety and environmental risks are relatively low, (b) A wide range of economically viable temperature and pressure conditions 'and (4) can control more intense exothermic chemical reactions and endothermic chemical reactions. On the other hand, solids can have mass transfer limitations that in turn significantly reduce the ultimate effectiveness of the catalyst. Typically, solid catalysts (sometimes referred to as catalyst particles) include one or more catalytic components on a porous material having a high internal surface area (eg, precious metals such as (Pd), turn (Pt), 钌(Ru), 铢 (Re), etc., the internal surface area of the catalytic component, usually on the order of hundreds of square meters per gram. Therefore, the conventional catalyst composition or catalyst particles have a large internal surface area. In the porous support, the catalytic reaction occurs on the carrier. However, such a catalyst structure often produces a mass transfer which reduces the effectiveness of the catalyst particles with respect to the activity and selectivity of the catalyst, and causes other Catalyst performance problems. ^^/, representative catalyst structure, the reactants must diffuse through the 罔 罔 to reach the inner region of the catalyst particles, and the product must be expanded 2 times to exit the interior of the catalyst particles Therefore, the compatibility of the conventional catalyst group depends on the balance, among other factors, depending on the trade-off between the two characteristics of the conventional catalyst composition, ie, the catalyst. Surface area plate promotes quality #夕处丄' The trade-off between this power. For example, many catalytic components are stored under the code of the brothers. The grazing has a fine and complex pore structure in the carrier (via 126426.doc 200843848 For microporous gentleman granules ... ie &lt; 2 nm average maximum diameter) to increase the catalyst, θ, product. This higher surface area will usually increase the catalytic activity. However, due to the black eve to w ^ ^ The catalyst activity increases due to the surface area of the particles, I: the problem of the resistance of the amount of transmission (ie, the reaction of the reactants and the microporous structure of the product..." The carcass includes the southerly percentage. The problem is more obvious. By increasing the size of the pores (for example, &gt; 50 nm

永)在載體中之百分率,可降低質量 傳遞之阻力(亦即加快 、里 、貝里傳遞)。然而,該解決方案傾向 於^低:媒顆粒之物理強度及持久性。換言之,自力學之 觀 &lt;:、、而p,觸媒顆粒之穩健性降低。 ^ 右反應物在觸媒顆粒之孔隙結構中受到明顯的質 里傳遞阻力’則在穩態反應條件下將存在濃度梯度。因 此’在孔隙結構中,反應物之濃度在觸媒顆粒之周圍最 大,在觸媒顆粒之中心則最小。另一方面,反應產物濃度 在觸:顆粒之中心要高於觸媒顆粒之周圍。該等濃度梯度 為貝里傳遞提供了推動力。該等濃度梯度變得越大,催化 反應之速率就越低。如此—來,觸媒顆粒之有效性峨 女反應H、遠擇性、再生處理之間的壽命週期及抗結焦性 能等)亦相應降低。 通常情況下,開發觸媒組合物之目的在於··自商業之角 度出發,改進如上所述之一或多種加工目標。在某些情況 下,影響觸媒性能的因素之一就是其促進反應物之間快速 有效反應的能力。因此’經常f要具有較低擴散限制之觸 媒組合物。然@,在其他情況下,為了獲得較佳之產物, 126426.doc 200843848 對於產生特定產物之選擇性可能更為重要。由&amp;,得以淘 汰用於移除或轉化非所需反應產物之附加製程及相關處理 設備。 例如在1976年,γ·τ· Shah等人提議使用酸浸在呂删石夕酸 鹽纖維、具體而言為E型玻璃(更具體而言,Ε_62ι)來產生 -種觸媒載體。與習知觸媒相比,該觸媒載體具有較高之 表面積_體積比、用於汽車排“統的催化轉化 益之 K寸(例如參 t〇xidation 吋 an Aut〇m〇biie ⑽ μPercentage in the carrier reduces the resistance to mass transfer (ie, speed, rib, and berry transfer). However, this solution tends to be low: the physical strength and durability of the media particles. In other words, the self-mechanical concept &lt;:, and p, the robustness of the catalyst particles is reduced. ^ The right reactant is subjected to significant mass transfer resistance in the pore structure of the catalyst particles', and a concentration gradient will exist under steady state reaction conditions. Therefore, in the pore structure, the concentration of the reactants is the largest around the catalyst particles and the smallest at the center of the catalyst particles. On the other hand, the concentration of the reaction product is higher at the center of the touch: particle than around the catalyst particles. These concentration gradients provide the driving force for the Berry transfer. The greater the concentration gradient becomes, the lower the rate of the catalytic reaction. In this way, the effectiveness of the catalyst particles, the female response H, the long-term selectivity, the life cycle between the regeneration treatments, and the anti-coking properties are also reduced accordingly. In general, the purpose of developing a catalyst composition is to improve one or more of the processing objectives described above from a commercial perspective. In some cases, one of the factors affecting the performance of the catalyst is its ability to promote rapid and efficient reaction between reactants. Therefore, it is often desirable to have a catalyst composition having a lower diffusion limit. However, in other cases, in order to obtain a better product, 126426.doc 200843848 may be more important for the selectivity of a particular product. By &amp;, additional processes and associated processing equipment for removing or converting undesired reaction products are eliminated. For example, in 1976, γ·τ·Shah et al. proposed the use of acid leaching on a lycopene fiber, specifically an E-glass (more specifically, Ε_62ι) to produce a catalyst carrier. Compared with the conventional catalyst, the catalyst carrier has a high surface area-volume ratio and is used for the catalytic conversion of the automobile row (for example, t参xidation 吋 an Aut〇m〇biie (10) μ

Gas Mixture by Fiber Catalysts, Ind. Eng. Chem.5 Prod Res.Dev.,pp.29_35,v〇1.15,N〇1,1976)。同時,讥讣等 人認為,一般在汽車排氣混合物中產生之反應性氣體(例 如一氧化碳、二氧化碳、氮氧化物、甲烷、乙烷、丙烷、 乙烯丙烯乙炔、笨及甲笨等)容易接觸到在酸浸E型玻 璃中所產生之較大的表面積。Gas Mixture by Fiber Catalysts, Ind. Eng. Chem. 5 Prod Res. Dev., pp. 29_35, v〇 1.15, N〇1, 1976). At the same time, he believes that reactive gases (such as carbon monoxide, carbon dioxide, nitrogen oxides, methane, ethane, propane, ethylene propylene acetylene, stupid and stupid), which are generally produced in automobile exhaust mixtures, are easily accessible. The large surface area produced in acid leached E-glass.

Shah等人表明,與兩種習知觸媒(以氧化鋁珠為載體之 鉑或以矽膠珠為載體之鉑)相比,具有相對較小表面積 (75 m /g)之較少數量纖維E型玻璃觸媒載體的性能效果要 俊於以氧化鋁為載體或以二氧化矽為載體之觸媒(分別為 180 m2/g及317 m2/g),其中E型玻璃觸媒之平均孔徑大於 乂氧化紹為載體之觸媒或以一氧化石夕為載體之觸媒。儘管 如此,Shah等人並未提議或建議有效的汽車排氣氧化能 夠在小於75 m2/g之表面積發生。 將近25年後,Kiwi-Minsker等人在1999年研究了在另一 種酸浸鋁硼矽酸鹽E型玻璃纖維(EGF)中減小表面積後,相 126426.doc -11 - 200843848 對於用在笨甲盤之選擇性液相氫化的二氧化矽玻璃纖維 (SGF)有關生成苯甲醇(使用以鉑為主之觸媒)或甲苯(使用 以把為主之觸媒)的效果(例如參見jShah et al. showed that a relatively small amount of fiber E with a relatively small surface area (75 m / g) compared to two conventional catalysts (platinum supported on alumina beads or platinum supported on silica beads) The performance of the glass-catalyst carrier should be better than that of alumina as the carrier or cerium oxide as the carrier (180 m2/g and 317 m2/g, respectively), wherein the average pore diameter of the E-type glass catalyst is greater than The ruthenium oxide is a catalyst for the carrier or a catalyst for the carrier of the oxidized stone. Despite this, Shah et al. did not propose or suggest that effective vehicle exhaust oxidation can occur at surface areas of less than 75 m2/g. Nearly 25 years later, Kiwi-Minsker et al. studied the reduction of surface area in another acid-impregnated aluminum borosilicate type E glass fiber (EGF) in 1999. Phase 126426.doc -11 - 200843848 The selective liquid phase hydrogenation of cerium oxide glass fiber (SGF) of A-plate is related to the effect of producing benzyl alcohol (using a platinum-based catalyst) or toluene (using a catalyst for the main one) (see, for example, j)

Catalysts for Novel Multi-phase Reactor Design, Chem.Catalysts for Novel Multi-phase Reactor Design, Chem.

Eng· Sci· PP· 4785-4790, Vol· 54, 1999)。在該項研究中, Kiwi-Minsker等人發現,SGF不能自酸浸中獲得增大之表 面積,所以相對於用於承載鈀以作為以鈀為主之觸媒組合 v 物之催化成分的egf樣品(表面積分別為15 mVg及 75 m2/g),SGF之表面積保持在2以、之低水平。但, Kiwi-Minsker等人注意到,SGF/鈀觸媒之鈀實質上具有與 其EGF/鈀觸媒對應物(即約(M mm〇1/m2)相同的有效表面積 濃度(毫莫耳金屬/平方公尺莫耳),可是SGF/鈀觸媒組合物 表明,與其EGF/鈀觸媒對應物相比,每公克鈀之活性或反 應速率有所降低。Eng·Sci· PP· 4785-4790, Vol· 54, 1999). In this study, Kiwi-Minsker et al. found that SGF does not obtain an increased surface area from acid leaching, so it is relative to the egf sample used to carry palladium as a catalytic component of palladium-based catalyst combination v. (The surface area is 15 mVg and 75 m2/g, respectively), and the surface area of SGF is kept at a low level of 2 or less. However, Kiwi-Minsker et al. noted that the SGF/palladium catalyst palladium essentially has the same effective surface area concentration as its EGF/palladium catalyst counterpart (ie, about (M mm〇1/m2) (mole metal/ The SGF/palladium catalyst composition shows a decrease in activity or reaction rate per gram of palladium compared to its EGF/palladium catalyst counterpart.

Kiwi-Minsker等人提出,此種SGF/鈀觸媒因表面積減小 U 而活性降低的現象,可能可解釋為活性成分(亦即催化成 分’在本例為鈀)與SGF載體之相互作用增強,而非由於其 表面積(即2 m2/g)較小。然而,他們未能藉由證明以下論 據來驗證此論點:表面積較小(亦即可與2 m2/gi sgf/鈀相 比)的EGF/鈀觸媒,至少與表面積較大(亦即分別為i5 及75 m2/g)的EGF/鈀觸媒樣品具有相同的催化活性。因 此,Kiwi-Minsker等人提出有關SGF/鈀之活性限制(亦即由 於SGF與EGF相比具有較高的酸性,鈀與SGF之間的相互 作用增強)為何是主要因素,而非由於實質上SGF/pd之表 126426.doc •12- 200843848 面^交小,原因並不明確。無論如何,Kiwi_Minsker並未 報口 σ兄明,相對於75 m2/g EGF/I巴樣品,15 m2/g EGF/|巴 樣叩口為擴放速率提高而催化活性增強。否則,這或許將 表月由於奴小觸媒表面積而產生之有益效果。 最近,在US 7,〇6〇,651 及 EP 1 247 575 A1(EP,575)中,Kiwi-Minsker et al. suggest that the SGF/palladium catalyst has a reduced surface area due to a decrease in U and may be explained by the enhanced interaction of the active ingredient (ie, the catalytic component 'palladium in this case) with the SGF carrier. , not because of its small surface area (ie 2 m2/g). However, they failed to verify this argument by proving the following argument: EGF/palladium catalysts with a small surface area (ie, comparable to 2 m2/gi sgf/palladium), at least with a larger surface area (ie, The iGF/palladium catalyst samples of i5 and 75 m2/g) have the same catalytic activity. Therefore, Kiwi-Minsker et al. proposed a limitation on the activity of SGF/palladium (ie, because SGF has a higher acidity than EGF, and the interaction between palladium and SGF is enhanced), which is a major factor, not a SGF/pd Table 126426.doc •12- 200843848 Faces are small, the reason is not clear. In any case, Kiwi_Minsker did not report σ Xiongming, compared with the 75 m2/g EGF/I bar sample, the 15 m2/g EGF/|ba sample mouthwash has an increased diffusion rate and enhanced catalytic activity. Otherwise, this may have the beneficial effect of the surface of the moon due to the small catalyst surface area. Recently, in US 7, 〇 6〇, 651 and EP 1 247 575 A1 (EP, 575),

Barelko等人揭示了使用富含二氧化矽之載體(包括二氧化 矽及包含非二氧化矽之氧化物(例如Al2〇3、B203、Na20、 ζ g Ca〇荨)作為觸媒載體的有益效果,其中該富含二氧 化矽之載體在載體之表面下層具有偽分層之多微孔結構 (例如參見 EP ’575 之第 11、13、15、17、18、23、31 及 32 段内容)。正如向歐洲專利局(”Ep〇&quot;)更為完整的說明,在 區分EP ’5 75與Kiwi-Minsker等人在上述文件所揭示之催化 載體(’’Kiwi-Minsker載體”)時,Barelko等人斷言,他們所 主張的富含二氧化矽之載體具有帶狹窄夾層空間的偽分層 多微孔結構,而Kiwi-Minsker載體則沒有此種結構。更具 體而a ’ Barelko等人認為,在Kiwi-Minkser等人之論文中 ^又有依據可假定(a)在Kiwi-Minsker載體中有形成帶狹窄夾 層空間的偽分層多微孔結構;(b)所述帶有狹窄夾層空間的 偽分層多微孔結構有助於增強應用於載體之金屬的活性 (例如參見EP ’575之第13、17-18、23及32段内容)。Barelko et al. disclose the beneficial effects of using a cerium oxide-rich carrier, including cerium oxide and an oxide comprising non-cerium oxide (e.g., Al2?3, B203, Na20, ζg Ca?) as a catalyst carrier? Wherein the cerium-enriched support has a pseudo-layered microporous structure in the underlying layer of the support (see, for example, paragraphs 11, 13, 15, 17, 18, 23, 31 and 32 of EP '575) As a more complete description of the European Patent Office ("Ep"), in distinguishing the catalytic carrier (''Kiwi-Minsker carrier') disclosed in EP '5 75 and Kiwi-Minsker et al. Barelko et al. assert that the cerium-enriched carrier they claim has a pseudo-layered microporous structure with a narrow interlayer space, while the Kiwi-Minsker carrier does not. This is more specific than a 'Barelko et al. In the paper by Kiwi-Minkser et al., it is assumed that (a) there is a pseudo-stratified microporous structure with a narrow interlayer space in the Kiwi-Minsker carrier; (b) the narrow sandwich space Pseudo-layered microporous structure helps to enhance The activity of the metal applied to the carrier (see, for example, paragraphs 13, 17-18, 23 and 32 of EP '575).

Barelko等人藉由向歐洲專利局說明下述内容,進一步 將其畐含一氧化石夕之載體與Kiwi-Mins ker等人提出之載體 加以區分:由於’’催化成分以高度分散之活性狀態在載體 t 表面飞资勢分布pred〇minanf distribution of the 126426.d〇i -13 - 200843848 catalytic components in the subsurface layers of the support in a highly dispersed active state)'、(在增、艾餐象),富含二 氧化石夕之載體具有更高活性的催化狀態,因此該更高活性 之催化狀悲使彳于催化成分能夠耐受燒結、聚集及自載體剝 洛及觸救劑之影響(例如參見EP ’ 5 7 5之第11段)。EP,5 7 5確 認,擴散限制可能會阻礙陽離子混入載體之夾層空間,並 因此阻礙陽離子藉由化學吸附進入載體(例如參見Ep,575 之第17段)。為了解決該擴散限制問題,Barelk〇等人提出 (並主張)一種載體結構,在該載體結構中,,,薄,,層之矽-氧 碎片經分離形成狹窄夾層空間(即偽分層之多微孔結構), 该狹窄的夾層空間包含”大量的” 〇H基團,該等〇h基團之 質子可被陽離子交換。Barelk〇f人揭示,充分,,薄,,的石夕_ 氧碎片層為高Q3至Q4比率所特有,並且他們進一步聲明, 帶有大量夾在狹窄夾層空間之間的⑽基團之偽分層多微 孔結構,已藉由29Si NMR(核磁共振)及以(紅外)光譜量测 結合氬BET及鹼滴定表面積量測得到證實。 像該等玻璃觸媒組合物中的一些一樣,許多習知觸媒試 圖解决至夕一項上述確認之加工問題,但在觸媒性能之其 他方面則表現欠佳。所以,該等習知觸媒經常侷限於較窄 之製程反應範圍内,在要求再生或置換之前的使用週期有 限及/或而要大里裝填昂貴之催化成分(例如鉑、鈀等貴金 屬),因而顯著增加觸媒生產及進行催化製程之成本。 □此❿要種改進之觸I组合物,能夠用於各種加工 反應同%改進諸如製程反應性、選擇性及/或能量效率 126426.doc 14 200843848 等。該觸媒組合物較佳可對相當廣泛之製程條件及要求進 :改進,同時增強穩健性及持久性,並保持相對較長的壽 :週期。中請人已發現-種官能性表面觸媒組合物,預期 能夠滿足該適用廣泛催化反應的需要。 【發明内容】 本發明之一個態樣提供一種製程流的氫化方法,盆利用 -種觸媒組合物對製程流之至少一部分進行氫化,該製程Barelko et al. further clarified the carrier containing the oxidized sulphur oxides and the carrier proposed by Kiwi-Mins ker et al. by explaining to the European Patent Office that the catalytic component is in a highly dispersed active state. The surface of the carrier t is the distribution of the potential of the pred〇minanf distribution of the 126426.d〇i -13 - 200843848 catalytic components in the subsurface layers of the support in a highly dispersed active state)', (in the increase, Ai meal), rich The carrier containing the dioxide dioxide has a more active catalytic state, so the catalytic activity of the higher activity is such that the catalytic component can withstand the effects of sintering, aggregation and self-carrier stripping and rescue agents (see, for example, EP). 'Paragraph 11 of 5 7 5). EP, 5 7 5 confirms that diffusion limitations may hinder the intercalation of cations into the support and thus hinder the entry of cations into the support by chemisorption (see, for example, paragraph 17 of Ep, 575). In order to solve this diffusion limitation problem, Barelk et al. propose (and advocate) a carrier structure in which thin, layered helium-oxygen fragments are separated to form a narrow interlayer space (ie, a large number of pseudo-layers) Microporous structure), the narrow interlayer space contains "mass" 〇H groups, and the protons of the 〇h groups can be exchanged by cations. Barelk〇f reveals that the full, thin, and slick _ oxygen shard layers are unique for high Q3 to Q4 ratios, and they further state that there are a large number of (10) groups of pseudo-segments sandwiched between narrow interlayer spaces. The layered microporous structure has been confirmed by 29Si NMR (nuclear magnetic resonance) and by (infrared) spectrometry combined with argon BET and alkali titration surface area measurements. Like some of these glass catalyst compositions, many conventional catalysts attempt to solve the above-mentioned confirmed processing problems, but perform poorly in other aspects of catalyst performance. Therefore, such conventional catalysts are often limited to a narrower range of process reactions, have limited useful life before regeneration or replacement is required, and/or require large amounts of expensive catalytic components (such as precious metals such as platinum and palladium). Significantly increase the cost of catalyst production and catalytic processes. □ This is an improved touch I composition that can be used in a variety of processing reactions with % improvement such as process reactivity, selectivity and/or energy efficiency 126426.doc 14 200843848 et al. The catalyst composition is preferably tailored to a wide range of process conditions and requirements while enhancing robustness and durability while maintaining a relatively long life: cycle. A functional surface catalyst composition has been found to meet the needs of this broad range of catalytic reactions. SUMMARY OF THE INVENTION One aspect of the present invention provides a method of hydrogenating a process stream, the basin utilizing a catalyst composition to hydrogenate at least a portion of a process stream, the process

t 抓3有至V種具有至少一個可氫化位點的化合物,其 中’觸媒組合物包括: 具有大孔隙、外表面、開口孔隙壁表面、表面區域及 表面下區域之實質上無微孔隙/無中孔隙基質, -至少一種催化成分,及 -至少一個催化活性區域,其包括該至少一種催化成 分,其中 該實質上無微孔隙/無中孔隙基質具有 ·) ▲以L自8·Α·ΛΤ2_β£Γ,S· 及其組合組成之群 之方法量測時,所測得之介於約0.1 m2/g至50 m2/g 之間的總表面積;及 η)在大於0但小於或等於14的pH值範圍内獲得之預定 等電點(IEP); b) 該至少一個催化活性區域可為連續或不連續,且具有 i) 小於或等於約30奈米的平均厚度;及 ii) 催化有效量的至少一種催化成分;及 c) 該至少一個催化活性區域之位置實質上 126426.doc 15 200843848 i)在外表面上, π)在開口孔隙壁表面, iii)在表面區域内, N)部分在開口孔隙壁表面上, 丨刀在表面區域内及 其組合;或 v) (c)(i)、(ii)、(iii)及(iv)之組合。 基於以下實施方式及所附之申 — 月寻利乾圍及附圖,孰習 此項技術者將能清楚掌握本發明之其他離樣。 …、 【實施方式】 I'’ ° 定義 本文中所使用的術語具有以下定義之含義。 ,,孔隙”表示深度大於寬度之空穴或通道。 ’’互連孔隙”表示與一或多個其他孔隙相通之孔隙。 ”閉口孔隙”表示與閉口孔隙所在材料的外表面沒有任何 通道之孔隙。 ί, ,▼開口孔隙π表示與開口孔隙所* 、 札隙所在材料的外表面有直接通 道’或經由另一孔隙或互連》丨階士; 遝孔隙相連之孔隙(亦即不屬於 閉口孔隙之孔隙)。 ”孔隙寬度”表示按照指定方法謔宝夕^丨欣^ 1 l 心乃/无;疋之孔隙的内徑或相對 壁之間的距離。 ”孔隙體積”表示按照指定方法被令夕&amp;士 7丨, .. 和疋万决確疋之所有孔隙的總體積 效應’但不包括閉口孔隙之體積效應。 ”多孔性”表示-材料中孔隙體積與該材料所占總體積之 比率。 I26426.doc 16 200843848 ’’微孔隙’’表示内部寬度小於2奈米(nm)之孔隙。 ’’中孔隙’’表示内部寬度在2奈米至5〇奈米之間的孔隙 ’’大孔隙,,表示内部寬度大於5〇奈米之孔隙。 外表面’’表示一材料之外邊界或表皮(厚度接近零),包 括外邊界或表皮上與缺陷(若有)有關的規則或不規則之輪 廓0 ’▼孔隙壁表面”指内邊界或表皮(厚度接近零),包括在内 邊界或表皮上的任何與缺陷(若有)有關的規則或不規則之 輪廓,貝貝上定義在一具有至少一種或多種類型孔隙之材 料中任何開口孔隙的形狀。 ”表面&quot;總體表示—材料之孔隙壁表面(若存在任何開口 孔隙)、材料之外表面及其表面區域。 ’’表面區域”表示可根據材料而改變的不包括任何由材料 之開口孔隙(若存在任何開σ孔隙)所定義之區域的材料區 域但δ亥表面區域⑷在材料的外表面以下小於或等於夺 米(較士佳為奈米,更佳為_&lt;1〇奈米);在材料有任何開口 孔隙時,該表面區域(b)在材料的孔隙壁表面以下小於或等 於30奈米(較佳為幻〇奈米,更佳為^1〇奈米)。對於具有可 偵測之表面高程變化的材料’無論該等變化是否規則,, 著外部邊界或内部邊界或表皮,外部或内部邊界或表皮: 平均向程用於確定表面區域之平均深度。 ’’表面下區域”表示可根據材料而改變的不包括任 =開口孔隙(若存在任何開口孔隙)所Μ之區域的材料 知、,但該表面下區域⑷在材料的外表面以下大於%奈米 126426.doc -17- 200843848 (較佳為&gt;20奈米,更佳為〉1〇奈米);在 隙時’該表面下區域⑻在材料的孔隙壁=何開口孔 米(較佳為⑽奈米,更佳為〉1Q奈…表^下大於3〇奈 :内表面積”或,,開口孔隙壁表面積”表示用指定方 之在材料中所有開口孔隙壁之表面積效應。 ^表面積,’表示用指定方法確定之不包括材料中所有孔 I承^之表面積效應的材料表面積效應。 ,,總表面積,,表W指定方法確定之材㈣表面積及其外 表面積之和。 ’’納·化學吸附表面積”或S.A·勤表#藉由使用化學吸附法 由鈉陽離子的化學吸附而確定之材料表面積,該(等)化學 吸附法在 G.W· Sears ^/. C/2 鼠,1956, V〇l. 28, P. 1981 與 R. Iler,C/z⑽以外 〇/义&quot;ca,j〇hn Wiley &amp; Sons 1979, ρ· 203及353中說明。 ’’納-化學吸附表面積變化率”或”SARCiVa”,其中 SARCA^=V5q5/v初,其中(i) V初為用於最初滴定一含水漿液 混合物的稀NaOH滴定溶液之初始體積,在約25 °C溫度下 在3·4 M NaCl溶液中包括實質上不溶於水之材料,溶液pH 值在零時間t。自最初的pH 4.0到達pH 9.0,及(ii) 乂5至15係 指用於使漿液混合物在1 5分鐘時間内保持在pH 9的相同濃 度NaOH滴定液的總體積,每隔5分鐘(總共3個5分鐘的間 隔’分別為t5、t1G及t15)該總體積按照需要儘快進行相應調 整。 所以,V,總係指在以下更詳細描述之滴定程序中所使用 126426.doc -18- 200843848 之NaOH滴定液的總體積,其中v初+Vp15=v總。因此,乂5至15 可表不為V.總與V初之差,其中Vy15=V總.V初。 就本定義而言,藉由將3〇公克NaCl(試劑級)添加到150 愛升水中製備3·4 M NaCl溶液,將1.5公克樣品材料添加到 NaCl溶液中以產生含水漿液混合物。含水漿液混合物必須 首先調整為pH 4.0。為了在滴定之前進行此調整,可相應 地使用少量稀酸(例如HC1)或稀鹼(例如NaOH)。滴定時, 為了首先獲得V初,先使用稀Na〇H滴定液(例如〇1 n或0.01 N) ’然後使用Vy υ進行SARCa^測定。另外,就本定義而 曰’ V” μ為在ts、〜及y使用之Na〇H滴定液的累積體 積,其中使用NaOH滴定液每隔5分鐘(共3個5分鐘的間隔) 盡快滴定,以按照需要自t。至最終時間4的15分鐘内將漿 液混合物之PH值調整為9.0。 就本疋義而言’在用任何可選擇的離子交換(ΙΕχ)、反 離子交換(BIX)及/或靜電吸附(ΕΑ)處理方法進行處理以將 一或多種2成分前驅物(以下說明)整合至基質表面上及“戈 基質表面中之前,確定樣品材料之SARC心。 ”初濕”表示,對於包括固體或半固體材料之含水漿液或 卓月狀此。物,正在測定該材料之等電點(,,iEp,,)的一時間 ^此日守,去離子水貫質上覆蓋了固體或半固體材料之整 個表面,並於目前的程度填充了該材料可能具有的任何可 通水之孔隙體積,進而允許水進人含水漿液或糊狀混合 物’以提供玻璃電極觸面與其參考電極觸面及二者之間充 分的液體接觸,進而測定材料的ΙΕρ。 126426.doc -19- 200843848 ’’等電點,’或IEP表示一固體或半固體材料在初濕時之淨 表面電荷為零的pH值。在本文中使用之ιΕρ亦可稱為電荷 零點(zero point charge,ZPC)或零電荷點(p〇int of zero charge,PZC) 〇 ’▼催化有效量’’表示在適當的加工條件下,足以將至少一 種反應物轉化成足夠產量之至少一種預定產物,以支援試 驗工廠或商業級製程的催化成分之量。 ”硫屬化物(Cha丨conide)”表示包括至少一種來自由硫 (S)、石西(Se)及碲(Te)組成之群的第16族(以前的第VIA族)元 素及至少一種正電性強於其對應的第16族元素之元素或基 團的化合物。 ,,貴金屬,,表示來自铑(Rh)、鈀(Pd)、銀(Ag)、銥(Ir)、鉑 (Pt)及金(Au)之群的過渡金屬,除非另有說明以金屬錯合 物、金屬Μ、金屬陽離子或金屬陰離子之形式處於荷電狀 態,否則各種過渡金屬均處於零氧化狀態(同時處於未反 應狀悲)。 ’’抗腐#基質”表示-種能夠抵抗表面下區域的基質电成 結構發生實質改變的基質’該等改變係由於大部分酸或稀 驗在標準溫度及壓力條件下造成結構組成元素之改變及/ 或損失、新的孔隙生成、孔隙大小膨服等。然而,耐腐蚀 基質之組成結構可能實質上被高強度酸(例如濃剛 度驗(例如濃_Η)或其他強腐㈣試劑(無論係單獨 與高溫、高壓及/或高振動頻率條件結合)所改變’就本— 義而言,此類基質仍視為”抗腐蝕,,基質。 ,疋 126426.doc -20- 200843848 、’’表面活性”表示一材料之表面充分地裝有一或多種荷电 成^之狀怨,該裝有一或多種荷電成分之材料係用以⑴在 穩態反應條件下促進催化反應而不進一步改質,或者(ii) 另外,由與—或多種荷电成分之間的靜電相互作用及/ 或離子交換相互作用,用於進一步改質,進而隨後可在穩 態反應條件下作為催化成分。 ’,基質”表示任何固體或半固體材料’包括但不限於玻璃 及玻璃樣材料,IEP大於G但小於或等於14,表面活性狀態 可“基質在觸媒組合物(具有催化有效量之 之預定用途進行更改。 成刀)中 ”整合”表示藉由電子及/或物理化學相互 子、靜電或共價相互作用,包括但不限於氣鍵合、離子鍵 二:電鍵合、凡得瓦力(Vas)/偶極鍵合、親和 。共價鍵合及其組合)將化學成分與基 結 合0 實施方式概述 圍二 切述下的註解僅用於說明與附隨申請專利範 表述可=二怨樣及因素’因此僅用於以簡要之措詞方便 :二讀者的潛在利益有關之實施方式的某些態樣。 制。本貧施方式註解不應視為對附隨申請發明範圍之限 催:樣係關於-種觸媒組合物,其表面活性之 =:區域的平:_小於或等於_奈米,較佳為_&lt; 丁…卡’且更佳為-〈約】0奈米(,,觸媒組合物”)。本發明之 126426.doc 21 200843848 另一態樣係關於各種製造新型觸媒組合物之方去本笋明 之另-態樣係產生複合形式之觸媒組合物,無論有沒^ 形介質。本發明之又一個態樣係關於在各種製程中使用觸 媒組合物,該等製程例如為烴、 雜/工及/或非烴處理、轉 化、精煉及/或排放控制及處理製程及其他類型的梦程。 例如,新型觸媒組合物可提高烴、雜煙及/或非烴處理、 轉化:精煉及/或排放控制及處理製程及其他類型製程的 Γ 反應選擇性、反應速率、成品良率及能量效率。 在產生觸媒組合物時應考慮到若干項因素,該等因素包 括但不限於: μ ⑴=於預期用途’獲得具有預定等電點(”ΐΕρ”)之基 質,無論按原樣獲得或經後續處理後獲得; (Π)鑒於預定用途,基質之抗腐蝕性程度; ㈣鑒於預定用途’為了獲得所需表面性質,基質之多 ϋ 孔性程度(若有),及相關之元素組成(特別係在表面 上), ㈣取決於組合物之預定用途,適當時,基質對於產生 適當等電點之化學敏感度,且藉由一或多種具有第 類與基質之離子及/或靜電相互作用的第一成分, 使基質具有表面活性,該基質能夠但不—定產生一 催化活性區域,該催化活性區域在基質表面上及/或 勺平均厚度為 &lt;約3〇奈米,較佳為$約2〇奈米,更 佳為s約10奈求; ⑺基質對於—可選擇之離子交換(IEX)、反離子交換 126426.doc -22- 200843848 (BIX)及/或靜電吸附(E A)處理方法的化學敏感性, 該等處理方法用於將一或多種第二成分整合至基質 表面上及/或内,該基質表面具有第二類與基質離子 及/或靜電相互作用,並因此產生一催化活性區域, 該催化活性區域在基質表面上及/或内的平均厚度為 &lt;約30奈米,較佳為 &lt;約20奈米,更佳為$約1〇奈 • 米;及 (vi)取決於組合物之預定用途,處理過之基質對於下述 f、 反應的化學敏感性:可選的煅燒及/或還原、氧化或 進一步使處理過之基質在使用觸媒組合物之前與第 一或第二催化成分起化學反應。 I.基質說明 對於許多潛在應用之通常及較佳範圍說明的1Ep選擇 較佳地,用於產生本發明之觸媒組合物的基質為玻璃組 合物’無論係表面活性按原樣接收或經處理產生表面活性 (之狀悲,1即均大於約0但小於或等於14。能否獲得具有適 菖IEP(適於產生用於預定用途之觸媒組合物)的基質取決於 各種因素,其中部分因素已在上文中概要說明(在”實施方 式概述”中)。鐾於下文提供更詳細之論述,熟習此項技術 者將會更清楚掌握與選擇適當IEP有關的其他因素。 例如,對於許多具有商業利益之製程,玻璃(或玻璃樣) 組合物及其表面活性產物較佳具有大於或等於約4·5但小 於14之财,而預計ΙΕΡ大於或等於約6〇但小於14之玻璃 組合物更佳,且預計ΙΕΡ大於或等於約7·8但小於14之玻璃 126426.doc -23 - 200843848 組合物取佳。然而,取決於觸媒組合物之預定用途及在組 口物的基貝中多孔性之程度及類型,較佳的IEP範圍可能 受到塑。:a ^ ' 卜,某些催化製程對於在較低pH範圍具有表 ® _'組合物更為敏感。因此’在該等情況下, J ; 8(軚佳為,更佳為&lt;4·5)的基質很可能更適用 於此類製程。所α $ . α ^ /Τ 乂’再二人申明,在適當的ΙΕρ範圍内選擇 基貝時不僅要考慮觸媒組合物之預定用途這一因素,還 要結合基質之多孔性、化學組合物及處理程序(若有)等。 另卜#决於預期催化用途’許多玻璃類型可成為潛在 的基質候選對象,以獲得適當的ΙΕΡ及多孔性的程度及類 型,無論係按原樣接收或使用以下一或多種處理方法。通 系σ亥等玻璃類型之實例包括但不限於Ε型玻璃、無硼£型 玻璃、S型玻璃、尺型玻璃、AR型玻璃、稀土·矽酸鹽玻 璃、鋇-鈦-矽酸鹽玻璃、氮化物玻璃如矽_鋁_氧_氮玻璃、 A里玻璃、C型玻璃及cc型玻璃。然而,以下將舉例說明 通常預期用於一系列催化應用及某些可能處理之玻璃類 型。 大孔隙玻璃說明 用於生產本發明觸媒組合物之基質較佳採用由實質上無 微孔隙、無中孔隙,但有一些大孔隙(”無微孔隙/無中孔隙,,) 之玻璃組合物構成的玻璃材料,無論原本就具有表面、、舌 性,還是經處理形成表面活性狀態,IEp 一般大於7 8。 通常,IEP大於7.8之無微孔隙/無中孔隙破璃組合物將包 括酸性或鹼性氧化物型玻璃網狀物改質劑,6 w 匕祜(例如)但 126426.doc -24- 200843848t catching from 3 to V compounds having at least one hydrogenatable site, wherein the 'catalyst composition comprises: substantially void-free, outer surface, open pore wall surface, surface region, and subsurface region substantially free of microporosity/ a mesoporous matrix, - at least one catalytic component, and - at least one catalytically active region comprising the at least one catalytic component, wherein the substantially microporous/non-porous matrix has a ... ▲ L from 8 · Α · The total surface area measured between ΛΤ2_β£Γ, S· and its combined group is measured to be between about 0.1 m2/g and 50 m2/g; and η) is greater than 0 but less than or equal to a predetermined isoelectric point (IEP) obtained within a pH range of 14; b) the at least one catalytically active region may be continuous or discontinuous, and having i) an average thickness of less than or equal to about 30 nm; and ii) catalysis An effective amount of at least one catalytic component; and c) a position of the at least one catalytically active region is substantially 126426.doc 15 200843848 i) on the outer surface, π) on the open pore wall surface, iii) in the surface region, N) portion Opening wall surface , Shu knife in the surface region, and combinations thereof; or v) (c) (i), (ii), (iii) and (iv) the combination. Based on the following embodiments and the accompanying drawings and drawings, it will be apparent to those skilled in the art that the present invention can be clearly understood. ..., [Embodiment] I''° Definitions The terms used herein have the meanings defined below. , "pores" means holes or channels having a depth greater than the width. ''Interconnected pores'" means pores that communicate with one or more other pores. "Closed pores" means pores that do not have any passages to the outer surface of the material in which the closed pores are located. ί, , ▼Open pores π means that there is a direct channel with the open pores*, the outer surface of the material where the gap exists, or via another pore or interconnected pores; the pores connected to the pores (ie, not closed pores) The pores). "Pore width" means the distance between the inner diameter of the pores or the opposite wall of the pores of the pores according to the specified method. "Pore volume" means the total volume effect of all pores in accordance with the specified method, and does not include the volume effect of the closed pores. "Porosity" means the ratio of the pore volume in the material to the total volume of the material. I26426.doc 16 200843848 ''Microporosity'' denotes pores having an internal width of less than 2 nanometers (nm). The 'intermediate pores'' represent pores '' macropores having an internal width between 2 nm and 5 Å, representing pores having an internal width greater than 5 Å. The outer surface '' denotes a boundary or skin of a material (thickness near zero), including a regular or irregular contour on the outer boundary or skin associated with the defect (if any). 0 '▼Porous wall surface' means the inner boundary or skin (thickness near zero), including any regular or irregular contours on the inner boundary or skin associated with defects, if any, defined on any open porosity in a material having at least one or more types of pores. Shape. "Surface" overall representation - the pore wall surface of the material (if any open pores are present), the outer surface of the material and its surface area. ''Surface area'' means a material area that may vary depending on the material and does not include any area defined by the open pores of the material (if any open σ pores are present), but the δH surface area (4) is less than or equal to the outer surface of the material. Capturing rice (better than nano, more preferably _&lt;1〇N); when the material has any open pores, the surface area (b) is less than or equal to 30 nm below the pore wall surface of the material ( Preferably, the illusion nano, more preferably ^1 〇 nanometer. For materials with detectable surface elevation changes, whether the changes are regular, external or internal boundaries or skin, external or internal Boundary or skin: The average range is used to determine the average depth of the surface area. ''Under surface area' means the material that can be changed depending on the material, excluding the area where the open pores (if any open pores are present) , but the subsurface region (4) is greater than % nanometer 126426.doc -17- 200843848 (preferably &gt; 20 nm, more preferably > 1 nanometer) below the outer surface of the material; Lower area (8) In the pore wall of the material = what is the opening pore meter (preferably (10) nanometer, more preferably > 1Q nai... Table ^ is greater than 3 〇: internal surface area" or, open pore wall surface area" means designated The surface area effect of all open pore walls in the material. ^ Surface area, ' indicates the surface area effect determined by the specified method that does not include the surface area effect of all pores in the material. , Total surface area, Table W specified method The sum of the surface area of the material (IV) and its external surface area. ''Nano-Chemical Adsorption Surface Area' or SA·Qin Table# The surface area of the material determined by chemical adsorption of sodium cations by chemisorption, the chemical adsorption method GW· Sears ^/. C/2 Rat, 1956, V〇l. 28, P. 1981 and R. Iler, C/z(10) outside/meaning&quot;ca,j〇hn Wiley &amp; Sons 1979, ρ· 203 And 353. ''Na-Chemical adsorption surface area change rate' or 'SARCiVa', where SARCA^=V5q5/v initial, where (i) V is initially used to initially titrate an aqueous slurry mixture of dilute NaOH titration solution Initial volume, at about 25 °C at 3·4 M Na The Cl solution comprises a material that is substantially insoluble in water, the pH of the solution is at zero time t. From the initial pH 4.0 to pH 9.0, and (ii) 乂5 to 15 means that the slurry mixture is used for a period of 15 minutes. Maintain the total volume of the same concentration of NaOH titrant at pH 9 every 5 minutes (a total of 3 5 minute intervals 't5, t1G and t15 respectively). The total volume is adjusted as needed as soon as possible. Therefore, V, total Refers to the total volume of NaOH titrant used in 126426.doc -18- 200843848, which is used in the titration procedure described in more detail below, where v initial + Vp15 = v total. Therefore, 乂5 to 15 can be expressed as V. The difference between the total and V initial, where Vy15=V total.V initial. For the purposes of this definition, 1.5 grams of sample material is added to the NaCl solution by adding 3 gram grams of NaCl (reagent grade) to 150 liters of water to produce an aqueous slurry mixture. The aqueous slurry mixture must first be adjusted to pH 4.0. To make this adjustment prior to titration, a small amount of dilute acid (e.g., HCl) or a dilute base (e.g., NaOH) may be used accordingly. Titration, in order to obtain the V initial, first use a dilute Na〇H titration solution (for example, 〇1 n or 0.01 N) ’ and then use Vy υ for the SARCa^ measurement. In addition, for the purposes of this definition, 曰 'V" μ is the cumulative volume of the Na〇H titration solution used in ts, ~ and y, wherein the NaOH titration solution is titrated as soon as possible every 5 minutes (3 intervals of 5 minutes). Adjust the pH of the slurry mixture to 9.0 within 15 minutes from t to the final time of 4. As far as this is concerned, 'with any optional ion exchange (ΙΕχ), counter ion exchange (BIX) and / or electrostatic adsorption (ΕΑ) treatment method to determine the SARC heart of the sample material prior to integration of one or more 2-component precursors (described below) onto the surface of the substrate and prior to "goth surface." "Incipient wetness" means an aqueous slurry comprising a solid or semi-solid material or a moon-like shape. The time at which the isoelectric point (i, iEp, ) of the material is being measured, the deionized water is overlaid on the entire surface of the solid or semi-solid material and is filled to the present extent. The material may have any water-permeable pore volume, which in turn allows water to enter the human aqueous slurry or paste mixture' to provide sufficient liquid contact between the glass electrode contact surface and its reference electrode contact surface, and thereby determine the material's ΙΕρ . 126426.doc -19- 200843848 ''Electrical point,' or IEP means the pH at which the net surface charge of a solid or semi-solid material is zero at initial humidity. The ιΕρ used herein may also be referred to as a zero point charge (ZPC) or a p〇int of zero charge (PZC) 〇 '▼ catalytically effective amount '' indicating sufficient processing conditions The at least one reactant is converted to at least one predetermined product of sufficient yield to support the amount of catalytic component of the pilot plant or commercial grade process. "Cha丨conide" means a group of at least one group of 16 (formerly Group VIA) derived from a group consisting of sulfur (S), sulphur (Se) and cerium (Te) and at least one positive A compound that is more electrically stronger than the element or group of its corresponding Group 16 element. , a noble metal, representing a transition metal from the group of rhodium (Rh), palladium (Pd), silver (Ag), iridium (Ir), platinum (Pt), and gold (Au), unless otherwise stated The form of the substance, metal ruthenium, metal cation or metal anion is in a state of charge, otherwise the various transition metals are in a zero oxidation state (at the same time in an unreacted state). ''Anti-corrosion #matrix' means a substrate that is capable of resisting substantial changes in the matrix's electrical structure under the subsurface region'. These changes are due to changes in structural elements due to most acids or tests under standard temperature and pressure conditions. And / or loss, new pore formation, pore size expansion, etc. However, the composition of the corrosion-resistant matrix may be substantially high-strength acid (such as thick stiffness test (such as concentrated Η) or other strong rot (four) reagents (regardless of In combination with high temperature, high pressure and/or high vibration frequency conditions, the matrix is still considered to be "corrosion resistant, matrix." 疋126426.doc -20- 200843848 , '' "Surface activity" means that the surface of a material is sufficiently filled with one or more charged materials, and the material containing one or more charged components is used to (1) promote catalytic reaction under steady state reaction conditions without further modification, Or (ii) additionally, by electrostatic interaction and/or ion exchange interaction with - or a plurality of charged components, for further modification, and subsequently under steady state reaction conditions Is a catalytic component. ', matrix' means any solid or semi-solid material 'including but not limited to glass and glass-like materials, IEP greater than G but less than or equal to 14, surface active state can be "matrix in the catalyst composition (with catalytic effective The intended use of the quantity is changed. "Integration" in the "knife" means mutual, electrostatic or covalent interaction by electron and/or physicochemical, including but not limited to gas bonding, ionic bonding 2: electrical bonding, Vas / dipole bonding, affinity, covalent bonding and combinations thereof. Combining chemical composition with the base. Can be = two complaints and factors 'so only used for a brief wording convenience: some aspects of the implementation of the second reader's potential benefits. System. This poor mode of application should not be considered as an accompanying application invention Scope limit: The sample is related to the type of catalyst composition, the surface activity =: the area of the flat: _ less than or equal to _ nanometer, preferably _ &lt; butyl ... card 'and more preferably - < about 】0 nm (,, catalyst composition) . Another aspect of the invention is the production of a composite form of a catalyst composition, regardless of the presence or absence of a medium, with respect to various other aspects of the manufacture of the novel catalyst composition. A further aspect of the invention relates to the use of catalyst compositions in various processes such as hydrocarbon, hetero/er and/or non-hydrocarbon treatment, conversion, refining and/or emission control and treatment processes and other types. Dream journey. For example, new catalyst compositions can enhance hydrocarbon, miscellaneous and/or non-hydrocarbon treatment, conversion: refining and/or emission control and treatment processes and other types of processes. Reaction selectivity, reaction rate, yield, and energy efficiency. . Several factors should be considered in the production of the catalyst composition, including but not limited to: μ (1) = obtaining a substrate having a predetermined isoelectric point ("ΐΕρ") for the intended use, either as it is or as a follow-up Obtained after treatment; (Π) the degree of corrosion resistance of the substrate in view of the intended use; (iv) in view of the intended use 'in order to obtain the desired surface properties, the degree of porosity of the substrate (if any), and related elemental composition (special (on the surface), (d) depending on the intended use of the composition, where appropriate, the chemical sensitivity of the substrate to the generation of the appropriate isoelectric point, and by one or more of the first and the substrate ions and/or electrostatic interactions a component which imparts surface activity to the substrate which can, but does not, produce a catalytically active region having an average thickness on the surface of the substrate and/or a spoon of &lt; about 3 nanometers, preferably about 2 〇 nano, more preferably s about 10 奈; (7) matrix for - selective ion exchange (IEX), counter ion exchange 126426.doc -22- 200843848 (BIX) and / or electrostatic adsorption (EA) treatment Chemical sensitivity of the method for integrating one or more second components onto and/or within the surface of the substrate having a second type of interaction with the matrix ions and/or electrostatic interactions, and thereby producing a a catalytically active region having an average thickness on and/or within the surface of the substrate of &lt; about 30 nm, preferably &lt; about 20 nm, more preferably about 1 〇N•m; and Vi) depending on the intended use of the composition, the chemical sensitivity of the treated substrate to the following f, reaction: optional calcination and/or reduction, oxidation or further treatment of the treated substrate prior to use of the catalyst composition The first or second catalytic component acts as a chemical reaction. I. Substrate Description The preferred and preferred range of 1Ep options for many potential applications. Preferably, the matrix used to produce the catalyst composition of the present invention is a glass composition that is either received as received or processed by surface activity. Surface activity (sorry, 1 is greater than about 0 but less than or equal to 14. Whether to obtain a matrix with suitable IEP (suitable for producing a catalyst composition for the intended use) depends on various factors, some of which are factors It has been outlined above (in the "Overview of Implementation"). As discussed in more detail below, those skilled in the art will be more aware of other factors associated with selecting an appropriate IEP. For example, for many businesses For the benefit process, the glass (or glass-like) composition and its surface active product preferably have a weight greater than or equal to about 4. 5 but less than 14, and a glass composition having a ΙΕΡ greater than or equal to about 6 〇 but less than 14 is more preferred. Preferably, the composition is preferably greater than or equal to about 7. 8 but less than 14 126426.doc -23 - 200843848 Preferably, the composition is preferred. However, depending on the intended use of the catalyst composition The preferred extent of IEP may be plasticized in the extent and type of porosity in the base of the mouthpiece.: a ^ ' Bu, some catalytic processes are more sensitive to the Table® _' composition at lower pH ranges Therefore, in these cases, the matrix of J; 8 (軚佳为,更优选为4·5) is likely to be more suitable for such processes. α α . α ^ /Τ 乂' It is stated that when selecting the base in the appropriate range, it is necessary to consider not only the factor of the intended use of the catalyst composition, but also the porosity of the substrate, the chemical composition and the treatment procedure (if any), etc. For expected catalytic use 'many glass types can be potential matrix candidates to obtain the appropriate degree and type of enthalpy and porosity, whether received or used as one or more of the following treatment methods. Examples include, but are not limited to, bismuth-type glass, boron-free glass, S-glass, sizing glass, AR-type glass, rare earth silicate glass, strontium-titanium-silicate glass, nitride glass such as 矽Aluminum_Oxygen-nitrogen glass, A-glass, C-glass Cc-type glass. However, the following is a exemplification of the type of glass that is generally expected for a range of catalytic applications and some possible treatments. Large-pore glass indicates that the substrate used to produce the catalyst composition of the present invention is preferably substantially Porous, non-medium pores, but some glass materials composed of large pores ("no microporosity / no mesoporosity,"), whether originally had a surface, tongue, or treated to form a surface active state, IEp is generally greater than 7 8. Typically, a microporous/non-porous glass-filling composition having an IEP greater than 7.8 will include an acidic or basic oxide type glass mesh modifier, 6 w 匕祜 (for example) but 126426. Doc -24- 200843848

不限於鋅(Zn)、鎂(Mg)、鈣(Ca)、鋁(Al)、硼(B)、鈦 (Ti)、鐵(Fe)、鈉(Na)及鉀(K)等元素的氧化物。若使用鹼 性網狀物改質劑’則包括在該等較低IEp玻璃内的量傾向 於為&lt;15 wt·%。含有鎂、鈣、鋁、鋅、鈉及鉀之玻璃係較 佳’而含有大於或等於約7〇 wt·%的二氧化矽之玻璃組合 物則更佳。但,大孔性相應於小於總表面積約98%,且相 應幾何外表面之範圍約為總表面積2%至5〇%的實質上無微 孔隙、無中孔隙玻璃組合物亦可用於生產本發明之觸媒組 合物,且該組合物的IEP通常大於7·8但小於或等於14。 多孔性說明 基質之多孔性係產生本發明觸媒組合物的另一相關態 樣通$,基負應為實質上無微孔隙/無中孔隙,但實際 上可能存在數量上無關緊要,對於觸媒組合物之預定用途 沒有不利影響的微孔隙及/或中孔隙體積。由於材料中的 微孔隙體積經常難以偵測,本說明使用兩種表面積量測法 來測定基質是否實質上無微孔隙/無中孔隙,以鏗別本發 明之觸媒組合物。 而’對於較小表面積量測(例如 ASTM D4780-95所述的方法, 第-項表面積量測係藉由適用於接受量測之預期表面積 範圍的熱吸附/脫附方法進行測定,τ用於債測微孔隙、 中孔隙及/或大孔隙之㈣。例%,對於較大表面積量測 (例如 &gt;約3 m2/g) Ν2贿’按照ASTM m663_〇3所述的方 法’(”S_A.❿朦&quot;)’可能係較佳的表面積量測技術。然 &lt;約 3 m2/g) Kr BET,按照 (,可能係較佳 126426.doc -25- 200843848 的表面積量測技術。熟習分析固體及半固體材料表面積之 技術者將很清楚用於偵測微孔隙、中孔隙及/或大孔隙程 度的最佳表面積量測方法。第二項量測係鈉-化學吸附表 面積(,’S.A·^,,),可使用某類分析方法(R· Ilei•在 of Silica, John Wiley &amp; Sons (1979)第 203及 353 頁描述)表 示為NaOH滴定液的變化與時間比,並按照s · a —變化率 (&quot;SARCw”)更具體的定義。 因此,如本文所定義,基質實質上無微孔隙/無中孔 隙’ k為基質的S.A.a^^et或S.A.尺卜万以處於約0.1 m2/g至 約5 0 m /g之間,而其s ARCw小於或等於0 · 5。如以上更詳 細的討論,SARCNa係NaOH滴定液的兩種體積之比,其分 母為最初使用的NaOH滴定溶液的體積,即最初用於在零 時間t◦滴定一基質漿液混合物,該基質漿液混合物在3 4 μ NaCl溶液(pH 4至pH 9)中在約25°C中包含1.5公克之基質。 但’如上所述’在最初的NaOH滴定開始用於SARCw測定 之前’含水漿液混合物必須首先相應地用少量酸(HCi)或 鹼(NaOH)調整為pH 4。另外,仍如上所述,Na〇H滴定液 (用於3個5分鐘的時間間隔、在丨5分鐘内將基質漿液混合 物保持在pH 9)之累積體積為初(即vy15),此為比率 SARCw的分子。所以,若%總^初小於或等於〇5¥初,相應 的SARC·則小於或等於〇·5。因此,如本文所定義, SARCa^S0.5的基質實質上無微孔隙/無中孔隙(亦即大孔 隙)’河提為基質之亦在約“仏至 約50 m2/g之間。若滿足了該等表面積參數,就基質有任何 126426.doc -26 - 200843848 其他類型的孔隙體積而言,可有不充分的濃度、分布及/ 或類型,因而可對觸媒組合物達成預期用途的期望性能產 生不利影響。 鈉表面積(’’S.A.a^’’)係一種經驗上的滴定程序,係為粒 狀、粉末狀及懸浮凝膠形式(suspended s〇1 f〇rm)的基本上 純二氧化矽(Si〇2)所開發。s.Α·心係測定表面質子位置 • 之反應性及可及性的量度,對於純的二氧化 (' 矽,相當於8ί-〇·Η+位置。矽酸鹽玻璃及晶體矽酸鹽與純 的二氧化矽(Si〇2)在組成上有顯著不同,關於此種滴定程 序之化學計量法,矽酸鹽玻璃及晶體矽酸鹽之行為不能根 據在S.A.W實驗中測定之Na〇H滴定液的絕對值得知或預 測。因此,Sears及Iler用來將S.A·^實驗的1^〇]9[體積與所 研究之二氧化矽材料之N2_bet表面積關聯的方程式,並不 適合可靠預測更複雜的矽酸鹽組合物之絕對表面積。此係 預期情況,因為能夠存在於組成不同之玻璃的 t 基團可包括如Α1-〇-Η+、Β_〇Ή、Ti_〇_H+、Mg-〇·矿及與 單個矽2位置的多個Si-〇-H+部分結合之更多不同結構的質 子群(Q2群)。另一方面,,,矽樣&quot;玻璃組合物(例如酸浸石 英)的總表面積可能可使用S.A·心實驗可靠地確定,前提為 , 最小的孔隙大小在標準氣相BET量測可達到的範圍内,因Not limited to oxidation of elements such as zinc (Zn), magnesium (Mg), calcium (Ca), aluminum (Al), boron (B), titanium (Ti), iron (Fe), sodium (Na), and potassium (K) Things. If an alkali network modifier is used, the amount included in the lower IEp glass tends to be &lt;15 wt.%. A glass composition containing magnesium, calcium, aluminum, zinc, sodium, and potassium is preferred, and a glass composition containing greater than or equal to about 7 〇 wt% of cerium oxide is more preferred. However, the macroporosity corresponds to a substantially microporous, void-free glass composition having a total surface area of less than about 98% and a corresponding geometric outer surface ranging from about 2% to about 5% by total surface area. The catalyst composition, and the IEP of the composition is typically greater than 7.8 but less than or equal to 14. Porosity indicates that the porosity of the matrix produces another relevant aspect of the catalyst composition of the present invention. The basis weight should be substantially free of microporosity/no pores, but may actually be quantitatively insignificant. The microporosity and/or mesoporous volume of the intended use of the media composition is not adversely affected. Since the micropore volume in the material is often difficult to detect, the present description uses two surface area measurements to determine if the matrix is substantially free of microporosity/no porosity to distinguish the catalyst composition of the present invention. And for smaller surface area measurements (eg, the method described in ASTM D4780-95, the first-surface area measurement is determined by a thermal adsorption/desorption method suitable for accepting the expected surface area range of the measurement, τ is used for Debt measurement of micropores, mesopores and/or macropores (IV). Example %, for larger surface area measurements (eg > 3 m2/g) 贿2 bribe 'according to the method described in ASTM m663_〇3' (" S_A.❿朦&quot;)' may be a preferred surface area measurement technique. However, &lt; about 3 m2/g) Kr BET, according to (, may be better than 126426.doc -25-200843848 surface area measurement technique. Those skilled in the art of analyzing the surface area of solid and semi-solid materials will be aware of the optimal surface area measurement method for detecting microporosity, mesopores and/or macroporosity. The second measurement is the sodium-chemical adsorption surface area (, 'SA·^,,), can be expressed as a change in the ratio of NaOH titrant to time using a certain type of analytical method (R·Ilei • described in on Silica, John Wiley &amp; Sons (1979) pp. 203 and 353), and According to s · a - rate of change (&quot;SARCw") more specific definition. Thus, as defined herein, the matrix has substantially no microporosity / no mesoporosity 'k is a matrix of SAa^^et or SA gauges between about 0.1 m2/g to about 50 m / g, and s ARCw is less than or equal to 0 · 5. As discussed in more detail above, the ratio of the two volumes of SARCNa NaOH titrant, the denominator is the volume of the initially used NaOH titration solution, ie initially used for titration at zero time t◦ a matrix slurry mixture comprising 1.5 grams of substrate in a solution of 34 μ NaCl (pH 4 to pH 9) at about 25 ° C. But 'as described above' is used for SARCw at the initial NaOH titration Before the determination, the 'aqueous slurry mixture must first be adjusted accordingly to a pH of 4 with a small amount of acid (HCi) or base (NaOH). In addition, as described above, Na〇H titration solution (for three 5 minute intervals, at The cumulative volume of the matrix slurry mixture maintained at pH 9 for 5 minutes is initial (ie vy15), which is the molecular ratio of the SARCw. Therefore, if the % total initial is less than or equal to 〇5¥, the corresponding SARC· Less than or equal to 〇·5. Therefore, as defined herein, the basis of SARCa^S0.5 Substantially no microporosity / no mesoporosity (ie, macropores) 'the river is also a matrix between about 仏 to about 50 m2 / g. If these surface area parameters are met, the matrix has any 126,426.doc -26 - 200843848 Other types of pore volumes may have insufficient concentrations, distributions, and/or types, and thus may adversely affect the desired performance of the catalyst composition for its intended use. The sodium surface area (''SAa^'') is an empirical titration procedure for essentially pure cerium oxide (Si〇2) in the form of granulated, powdered and suspended gels (suspended s〇1 f〇rm). Developed. s. Α·heart measurement of surface proton position • Measure of reactivity and accessibility for pure oxidizing (' 矽, equivalent to 8 〇-〇·Η+ position. Tellurite glass and crystal citrate Pure cerium oxide (Si〇2) is significantly different in composition. For the stoichiometry of this titration procedure, the behavior of bismuth silicate glass and crystalline citrate cannot be determined according to the Na〇H titration determined in the SAW experiment. The absolute value of the liquid is known or predicted. Therefore, the equations used by Sears and Iler to correlate the volume of the SA·^ experiment with the N2_bet surface area of the ceria material studied are not suitable for reliable prediction. The absolute surface area of the citrate composition. This is expected because the t groups that can be present in the different compositions of the glass can include, for example, Α1-〇-Η+, Β_〇Ή, Ti_〇_H+, Mg-〇. · Minerals and proton groups (Q2 groups) with more different structures combined with multiple Si-〇-H+ parts at a single 矽2 position. On the other hand, 矽-like glass compositions (such as acid immersion quartz) The total surface area may be reliably determined using the SA·heart test, provided that The minimum pore size is within the range achievable by standard gas phase BET measurements,

為其主要由連網的Si〇2及Si-OlT部分組成。然而,Glass_ 〇_H +部分對於氫氧根離子及鈉離子的擴散可及性,及多微 孔對比中孔隙:、大孔隙及/或實質上無孔區域的相對百分 率,應可根據NaOH的量(在S.A·*實驗中為保持最終之pH 126426.doc -27- 200843848 值9,必須對比時間添加)(滴定剂)進行偵測。所以,總言 之’ Glass-〇-H+部分對於〇H-及Na+對比時間的可及性,如 在上述SAR〜a實驗所確定,可作為存在微孔隙的合理可 罪Ϊ度,包括標準氣相BET量測不可及的某類多孔性。 較佳地,基質之表面積在其離子浸出處理後將實質上保 持不k,對於大部分耐鹼(&quot;AR&quot;)玻璃而言,此為常見情 況。然而,在某些情況下,某些自基質網狀物消耗之離子 不會顯著影響基質之微孔結構(若有),因而避免對觸媒組 合物達成預定用途的期望性能產生不利影響。但’若基質 網狀物上有顯著的離子消耗及伴生之浸出,在基質中則很 可能士產生多微孔區域。因此,如上所述,sar(^大於約 守♦示存在此種多;^孔結構。顯示該等特性之基質網 狀物已產生了足夠的微孔結構,特別係在基質區域中,此 種微孔結構將對基質維持表面活性狀態之能力產生不利影 響,因此對觸媒組合物達成預定用途的期望性能產 影響。 基質形狀、形式及尺寸說明 用於產生本發明觸媒組合物之基質具有多種形狀及形 式。合適形狀的實例包括但不限於:纖維、原纖化纖維、 圓柱七顆粒(例如球粒)、球狀顆粒(例如球體)、橢圓形顆 粒(例如橢圓體)、扁平顆粒(例如薄片)、不規則斷裂顆 粒、螺旋形或螺旋狀的顆粒及其組合。 可形成此等基質形狀之合適成形體或複合材料的實例包 括但不限於:機織複合材料、非機織複合材料、網眼織 126426.doc -28- 200843848 物、壓出物、環形物、鞍狀物、柱體、薄膜、螺旋結合 膜、濾、器、纖維絲、切短纖維及其組合。 在某些情況下,視觸媒組合物之預定用途而定,可使用 任何一種合適材料作為成形介質,與催化基質形成成形體 或複合材料(總稱,,複合材料”),包括但不限於軟水鋁石 (boehmite)、水合二氧化鈦及11〇2、水合氧化锆及Zr〇2,丫 氧化鋁、oc氧化鋁、二氧化矽、黏土、天然及合成聚合纖 維、聚合樹脂及溶劑及水溶性聚合物,無論基質是否包括 1型或2型催化成分(以下更詳細說明)。較佳地,催化基質 應位於或實質接近複合材料之外表面(即位於複合材料之 外周邊)。在不受理論約束的情況下,據認為,若將催化 基質之實質部分置於觸媒複合材料之外部周圍區域(,,複合 材料周邊)上及/或内,將減小產生非想要之内部複合材料 擴散效應的程度。 所以,應理解,用以將催化基質之實質部分定位在複合 材料周邊内及/或上的合適距離,將取決於觸媒複合材料 之預定用途、觸媒複合材料之整體尺寸及形狀及催化基質 之整體尺寸及形狀。因此,在各種複合材料形狀及尺寸 中,該複合材料周邊的平均厚度(在該複合材料周邊上及/ 或内可置放催化基質)通常為約1微米至約4〇〇微米之間。 然而,該複合材料周邊的平均厚度較佳在約}微米至約25〇 从米之間’更佳在約1微米至約1 5 0微米之間。 然而,視觸媒組合物之預定用途而定,在某些情況下, 可能需要將基質實質上分布於整個成形介質上。例如但不 i26426.doc -29- 200843848 限於’在需要擴大反應物及/或反應中間物暴露之製程 中’較佳在整個成形介質上複合基質(無論係1型或2型催 化活性基質),具有可控之孔隙大小分布雖然較佳但並非 必要。 用於產生成形體或複合材料的基質之最小尺寸(即基質 顆粒之平均最大尺寸)通常在大於約0 05微米至小於或等於 約150微米之間,較佳在約〇2微米至小於或等於約15〇微 f 米之間,更佳在約〇·2微米到約5〇微米之間。然而,視組 合物之預定用途及其他可能受到觸媒組合之形狀及形式影 響的製程變數而定,超出該範圍的基質仍然可有效,例如 在上述之連續纖維形式中,不會對觸媒組合物之期望性能 產生不利影響。 熟習此項技術者應理解,複合操作可能將潛在的中孔隙 及/或微孔隙度引入成品複合材料。然而,在複合操作製 程中’如本文所述,此多孔性未引人觸媒組合物之官能化It consists mainly of Si连2 and Si-OlT parts connected by the network. However, the diffusion accessibility of the Glass_ 〇_H + moiety to hydroxide ions and sodium ions, and the relative percentage of pores: macropores and/or substantially non-porous regions in microporous contrast should be based on NaOH The amount (in the SA·* experiment to maintain the final pH 126426.doc -27- 200843848 value 9, must be added in time) (titrant) for detection. Therefore, in general, the accessibility of the 'Glass-〇-H+ part for the contrast time of 〇H- and Na+, as determined by the above SAR~a experiment, can be used as a reasonable guilty degree of existence of microporosity, including standard gas. A certain type of porosity that is not comparable to the phase BET measurement. Preferably, the surface area of the substrate will remain substantially unchanged after its ion leaching process, which is a common occurrence for most alkali resistant (&quot;AR&quot;) glasses. However, in some cases, some of the ions consumed from the matrix network do not significantly affect the microporous structure of the substrate, if any, thereby avoiding adverse effects on the desired properties of the catalyst composition for the intended use. However, if there is significant ion depletion and associated leaching on the matrix network, it is likely that a microporous region will be produced in the matrix. Thus, as noted above, sar (^ is greater than about ♦ indicates that there is such a multiplicity; ^ pore structure. The matrix network showing these properties has produced sufficient microporous structure, especially in the matrix region, such The microporous structure will adversely affect the ability of the substrate to maintain a surface active state, thereby achieving the desired performance impact on the intended use of the catalyst composition. Matrix Shape, Form, and Size Description The matrix used to produce the catalyst composition of the present invention has A variety of shapes and forms. Examples of suitable shapes include, but are not limited to, fibers, fibrillated fibers, cylindrical seven particles (eg, pellets), spherical particles (eg, spheres), elliptical particles (eg, ellipsoids), flat particles ( For example, flakes, irregularly fractured particles, spiral or spiral particles, and combinations thereof. Examples of suitable shaped bodies or composites that can form such matrix shapes include, but are not limited to, woven composites, non-woven composites, webs Eye woven 126426.doc -28- 200843848 objects, extrudates, rings, saddles, cylinders, membranes, spiral bonded membranes, filters, Weft, chopped fibers, and combinations thereof. In some cases, depending on the intended use of the catalyst composition, any suitable material may be used as the forming medium to form a shaped body or composite with the catalytic substrate (collectively, Composite materials"), including but not limited to boehmite, hydrated titanium dioxide and 11〇2, hydrated zirconia and Zr〇2, yttrium alumina, oc alumina, ceria, clay, natural and synthetic polymeric fibers , polymeric resins and solvents and water soluble polymers, whether or not the matrix comprises a type 1 or type 2 catalytic component (described in more detail below). Preferably, the catalytic substrate should be at or substantially adjacent to the outer surface of the composite (ie, in the composite) Outside the periphery. Without being bound by theory, it is believed that if a substantial portion of the catalytic substrate is placed on and/or within the outer surrounding region of the catalytic composite, The extent to which the unwanted internal composite diffusion effect is produced. Therefore, it should be understood that the substantial portion of the catalytic substrate is positioned within the perimeter of the composite and/or The appropriate distance or distance will depend on the intended use of the catalytic composite, the overall size and shape of the catalytic composite, and the overall size and shape of the catalytic substrate. Therefore, in the shape and size of the composite, the composite periphery The average thickness (the catalytic substrate can be placed on and/or within the periphery of the composite) is typically between about 1 micrometer and about 4 micrometers. However, the average thickness of the perimeter of the composite is preferably between about 10 microns. About 25 〇 from between meters is more preferably between about 1 micrometer and about 150 micrometers. However, depending on the intended use of the catalyst composition, in some cases it may be necessary to substantially distribute the matrix to On the entire forming medium, for example, but not i26426.doc -29- 200843848 is limited to 'in the process of expanding the exposure of reactants and / or reaction intermediates', preferably on the entire forming medium (whether type 1 or type 2) The catalytically active matrix), with a controlled pore size distribution, is preferred but not necessary. The minimum size of the matrix used to produce the shaped body or composite (i.e., the average largest dimension of the matrix particles) is typically between greater than about 0.05 microns and less than or equal to about 150 microns, preferably from about 2 microns to less than or equal to. Between about 15 〇 micro f meters, more preferably between about 2 microns and about 5 microns. However, depending on the intended use of the composition and other process variables that may be affected by the shape and form of the combination of catalysts, matrices outside of this range may still be effective, for example, in the continuous fiber form described above, without the combination of catalysts. The expected performance of the object has an adverse effect. Those skilled in the art will appreciate that the composite operation may introduce potential mesopores and/or microporosity into the finished composite. However, in a composite process, the functionalization of the porous unintroduced catalyst composition is as described herein.

表面組分。 Π·基質表面活化 、用於產生本發明觸媒組合物之基質可藉由一或多種第一 \使表面活化„亥第一成分具有與基質的第一類離子及/ 或靜電相互作用(” 1型成分前 月J馬£物)。如以下更詳細所述, 1型成分如驅物可能本身就右 有催化效力或係可經進一步處 理來產生催化活性區域,在其所 卷貝表面上及/或内的平均厚 度為S約30奈米,較佳為$約 1 、勺20不未的平均厚度,更佳為幺 、、、勺1 〇奈米的平均厚度。例如, 长某些情況下,取決於觸媒 126426.doc -30. 200843848 組合物之預定用途, 斤獲仔之基質在適於預定 圍内具有適當類切刀和命 、、頂疋用延的靶 (iEP),n 王又之孔隙結構(若有)及等電點 化雖: 時可能具有充分表面活性,可有效催 化。雖非必要但較 令双惟 暴貝可經處理來進一步佟泠芬/心 改進其表面活性。另外/修改及/或 計可能仲_ 可藉由處理來移除任何預 干板觸媒組合物性能的有 此妁有機塗科或其他可能之污染 物。此外,如以下更詳細論 在2型成为W驅物整合處 里下,取決於觸媒組合物 用逆,更佳的做法可能 疋用#子父換(IEX)、反離 ,^ _抨方Φ、# ^ ^ 換(βΙΧ)及/或靜電吸附(EA) 4理基貝之表面,該等處理方法將 種第二成分整合至美暂本石上 卜, 基貝表面上及/或内,該基質表面具有 弟二類與基質之离鱼j θ # 貝之離子及/杨電相互作用,並因此產 化活性區域,在基曾&gt; ,^ 、 貝表面上及/或内的平均厚度為幻〇奈 米,較佳為$20奈米,更佳為$1〇奈米。 基質污染物移除處理 視典型情況下在基f表面上發現之物質的組成及該物質 是否預計會干擾觸媒組合物之製備及/或干擾觸媒組合物 達成預定用途的期望性能而定,可選擇進行污染物移除處 理。例如’典型情況下’ AR型玻璃使用有機塗層製造(亦 即施膠)’該有機塗層用於促進加工處理,例如在含水調 配物中之分散。然而,即使不會干擾觸媒組合物之大部分 (若非全部)預定用途之催化性能,該有機塗層或施膠亦可 能會干擾觸媒組合物之製備。所以應移除有機塗層。 煅燒係適用於移除此種有機塗層的一種較佳方法。因為 126426.doc -31 - 200843848 此項處理之主要目標係將污染物自基質移除,因此此類艰 燒處理的條件對於基質成功的表面活化並非特別重要。‘ 某些情況下,取決於欲自基質移除之污染物的性質,溶 d界面,舌性劑、水溶液清洗或其他適用的方法可用於移 除污染物,達到滿意的效果。 然而,根據所使用之煅燒程度,較佳地在氧化性氣氛 ⑼如在空氣或氧氣中)中煅燒基質。另外很重要的係,要 〔、 l擇夠回的煅燒溫度來移除目標污染物,但緞燒溫度又要 肖低以合理避免材料之軟化點。通常,煅燒溫度應至少比 所選基質材料之軟化點低約5〇°C。較佳地,锻燒溫度應至 少比所選基質材料之軟化點低約1〇〇t:。例如,在使用 型玻璃時,大部分从型玻璃可接受之移除污染物的炮燒 皿度在、’’勺300 C至約700。。之間。通常’所選擇之基質材料 應煅燒約2至14小時’較佳煅燒4至8小時。儘管如此,取 :於所獲基質之性質及欲自基質移除之目標污染物的性 I 質,煅燒時間可在該等時間範圍外變化。 藉由離子浸出處理達成表 面活化 在任何潛在之污染物實質上自基質移除以後,基質可藉 由处里來產生表面活性狀態及所要之等電點(&quot;IEP”),前提 為以基質獲得的最初IEP不在所要之範圍内。然而,在某 一 下所接收的基質可能具有足夠的表面活性,需要 使用或夕種其他處理(在以下更詳細說明)進一步改質, 而不使用第一類離子浸出(IEX-1)處理(此會在以下更詳細 兒月的其他處理中首先論述)。換言之,基質之元素組 126426.doc -32- 200843848 成,特別係在外表面或實質上接近外表面上的元素組成, 可能足以獲得所要之IEP。然而,在报多情況下,基質之 70素組成將需要一些改質來改變最初的IE P並獲得適人的 I.接著按照觸媒組合物之預定用途,獲得在類型及程 度上符合要求的表面活性狀態。 ' =表面活性狀態,在—或多種第_成分具有⑴第一氧化 狀L及(11)第—類與基質的離子及/或靜電相互作用的情況 下可牝足以產生催化活性區域,在基質表面上及/或内 的平均厚度為W3G奈米,較佳為s約2()奈米,更佳為$約 奈米’且因此提供觸媒組合物達成預定用途的期望性 能。例如但不限於,基質表面上及/或内的布忍司特 (^formed)或路易士(Lewis)酸位及布忍、司特或路易士驗位 能夠有效促進一些烴、雜烴(例如含氧烴)及非烴處理、轉 化及/或精煉製程。 ’、、&lt;、而在其他情況下’基於觸媒組合物之預定用途,可 C 忐更佳的方式係用一或多種如下所述的離子交換法來進— 步處理基質表面,以達成⑴可與第一氧化狀態相同或不同 的第二氧化狀態,及(ii)第二類與基質的離子及/或靜電相 互作用,足以產生催化活性區域,在基質表面上及/或内 . 的平均厚度為幻〇奈米,較佳為U0奈米,更佳為幻0太 米。 $ 現轉至表面活化處理,表面活化處理包括至少一種離子 /又出處理,用以獲得第一類或1類離子交換(IEX-1)基質。 」而’應理解,若所接收的基質具有適合觸媒組合物達成 126426.doc -33 - 200843848 預定用途之IEP,則聰小亦準備用於說明該第一類基質 即二:::子浸出處理係藉由任何適當的方法執行亦 …貝之方式自整個基質表面有效移除所需之離子 種通,而不會明顯侵钱基質網狀物(例如 LJg T7 / 兄社衣面區 或及/或表面下區域產生任何微孔結構)。例如但不限 部分酸類物質’無論係無機酸或有機酸,及各種 均適用於離子浸出處理。較佳地,使用無機酸,例如:不 =硝酸、磷酸、硫酸、鹽酸、乙酸、過氯酸、氯漠酸、 氯磺酸、三氟乙酸及其組合。 、— 通常’用於離子浸出處理之酸溶液的濃度取決於基質之 特性(例如,|自玻璃網狀物移除之離子的親和力、在移 除網狀物離子後玻璃之強度)、基質之IEP需要改變的程度 及觸媒組合物之預定用途。較佳地,用於離子浸出處理之 酸溶液的濃度可在約0.5 wt.%至約5〇 wt%之間,更佳在約 2.5 wt.%至約25 wt.%之間,最佳在約5 wt %至約w糾%Surface composition.基质·Matrix surface activation, the matrix used to produce the catalyst composition of the present invention can be activated by one or more first surfaces. The first component has a first type of ion and/or electrostatic interaction with the matrix (" Type 1 ingredients in the previous month J horses). As described in more detail below, a type 1 component such as a flooding may itself have catalytic effect on the right or may be further processed to produce a catalytically active region having an average thickness of about 30 on and/or within the surface of the rolled shell. The nanometer preferably has an average thickness of about 1 and a spoon 20, more preferably an average thickness of 幺, 、, spoon 1 〇 nanometer. For example, in some cases, depending on the intended use of the composition of the catalyst 126426.doc -30. 200843848, the substrate of the powder is suitable for the predetermined circumference and has the appropriate type of cutter and life, The target (iEP), n Wang's pore structure (if any) and isoelectric point: although it may have sufficient surface activity, can be effectively catalyzed. Although it is not necessary, it can be treated to further improve the surface activity of the bismuth/heart. Additionally/modifications and/or possible secondary _ organic coatings or other possible contaminants that may be removed by treatment to remove the performance of any pre-drying catalyst composition. In addition, as described in more detail below, in the case where Type 2 becomes a W-driver integration, depending on the catalyst composition, it is better to use #子父换 (IEX), reverse, ^ _ square Φ, # ^ ^ change (βΙΧ) and/or electrostatic adsorption (EA) 4 the surface of the ribbed shell, these treatment methods integrate the second component of the species into the surface of the US, on the surface of the base and/or inside, The surface of the substrate has an average thickness of the second and the base of the fish, and the interaction between the active and the active regions, on the surface of the base, and/or within the base. For illusion nano, it is preferably $20 nm, more preferably $1 〇 nanometer. The matrix contaminant removal treatment is dependent upon the composition of the material typically found on the surface of the base f and whether the material is expected to interfere with the preparation of the catalyst composition and/or interfere with the desired performance of the catalyst composition for the intended use, Optional contaminant removal. For example, 'typically' AR-type glass is made using an organic coating (i.e., sized). The organic coating is used to facilitate processing, such as dispersion in aqueous formulations. However, the organic coating or sizing may interfere with the preparation of the catalyst composition, even if it does not interfere with most, if not all, of the catalytic properties of the intended use of the catalyst composition. Therefore, the organic coating should be removed. Calcination is a preferred method for removing such organic coatings. Because 126426.doc -31 - 200843848 The primary goal of this treatment is to remove contaminants from the matrix, the conditions of such arduous treatment are not particularly important for successful surface activation of the matrix. ‘In some cases, depending on the nature of the contaminant to be removed from the substrate, the solvent interface, lingual agent, aqueous solution cleaning or other suitable methods can be used to remove contaminants for satisfactory results. However, depending on the degree of calcination used, the substrate is preferably calcined in an oxidizing atmosphere (9) such as in air or oxygen. In addition, it is important to select the calcination temperature to remove the target contaminant, but the satin temperature is also low to avoid the softening point of the material. Generally, the calcination temperature should be at least about 5 ° C lower than the softening point of the selected matrix material. Preferably, the calcination temperature is at least about 1 〇〇t: lower than the softening point of the selected matrix material. For example, when using a type of glass, most of the cannons that are acceptable for removing contaminants from the glazing are 300 C to about 700. . between. Typically, the selected substrate material should be calcined for about 2 to 14 hours and is preferably calcined for 4 to 8 hours. Nonetheless, the calcination time may vary outside of the time range depending on the nature of the substrate obtained and the nature of the target contaminant to be removed from the substrate. Surface activation by ion leaching treatment After any potential contaminants are substantially removed from the substrate, the substrate can be used to generate the surface active state and the desired isoelectric point (&quot;IEP", provided that the substrate is The initial IEP obtained is not within the desired range. However, the substrate received at a certain time may have sufficient surface activity and needs to be further modified (other than described in more detail below) without using the first type. Ion leaching (IEX-1) treatment (this will be discussed first in the other treatments of the following more detailed months). In other words, the matrix element group 126426.doc -32- 200843848, especially on the outer surface or substantially close to the outer surface The composition of the elements may be sufficient to obtain the desired IEP. However, in the case of multiple reports, the 70-prime composition of the matrix will require some modification to change the original IE P and obtain a suitable I. Then follow the catalyst composition. For the intended use, obtain a surface active state that meets the requirements of type and degree. ' = surface active state, in - or a plurality of _ components have (1) first oxidation The interaction between L and (11) of the first type and the ionic and/or electrostatic interaction of the substrate may be sufficient to produce a catalytically active region having an average thickness on and/or within the surface of the substrate of W3G nanometers, preferably s. 2() nanometers, more preferably $about nanometers' and thus provide the desired properties of the catalyst composition for the intended use, such as, but not limited to, ^formed or Louise on and/or within the surface of the substrate. 'Lewis' acid position and Buchen, Ster or Lewis position can effectively promote some hydrocarbons, hydrocarbons (such as oxygenated hydrocarbons) and non-hydrocarbon treatment, conversion and / or refining processes. ',, &lt; In other cases, based on the intended use of the catalyst composition, it may be preferred to use one or more ion exchange methods as described below to further treat the surface of the substrate to achieve (1) the same state as the first oxidation state. Or a different second oxidation state, and (ii) a second type of ion and/or electrostatic interaction with the substrate sufficient to produce a catalytically active region having an average thickness on the surface of the substrate and/or within the substrate. It is preferably U0 nanometer, more preferably illusion 0 meters. To the surface activation treatment, the surface activation treatment includes at least one ion/removal treatment to obtain a first or a class 1 ion exchange (IEX-1) matrix. "And it should be understood that if the substrate is suitable for the catalyst The composition reaches 126426.doc -33 - 200843848 For the intended use of IEP, Satoshi is also prepared to explain the first type of substrate, ie: 2:: The sub-leaching treatment is performed by any suitable method. The entire surface of the substrate effectively removes the desired ion species without significantly invading the matrix network (e.g., the LJg T7 / brother's clothing area and/or subsurface area produces any microporous structure). For example, but not limited to, some of the acid substances' are inorganic acid or organic acid, and various are suitable for ion leaching treatment. Preferably, a mineral acid is used, for example: not = nitric acid, phosphoric acid, sulfuric acid, hydrochloric acid, acetic acid, perchloric acid, hydrochloric acid, chlorosulfonic acid, trifluoroacetic acid, and combinations thereof. - usually the concentration of the acid solution used for ion leaching depends on the properties of the substrate (for example, the affinity of the ions removed from the glass network, the strength of the glass after removal of the network ions), the matrix The extent to which the IEP needs to be altered and the intended use of the catalyst composition. Preferably, the concentration of the acid solution used for the ion leaching treatment may be between about 0.5 wt.% and about 5 wt%, more preferably between about 2.5 wt.% and about 25 wt.%, most preferably About 5 wt% to about w%

C 之間。 餐口切亦可用於離子浸出處理,例如,但不限於乙二胺 乙酉夂(EDTA )、对喊、乙二酸鹽、聚胺、聚敌酸及其組 合0 所通$肖於離子浸出處理之螯合劑溶液的濃度取決於基 貝之特性(例如,名欠自玻璃網狀物移除之離子的親和力、 ^移除網狀_子後玻璃之強度)及觸媒組合物之預定用 述。較佳地’用於離子浸出處理之螯合劑溶液的濃度可在 約0·001 wt.%至飽和度之間,更佳在約〇.〇1 wt.%至飽和度 126426.doc •34· 200843848 之間。 通常,會根據所使用之酸或螯合劑之類型及濃度及基質 之特性,㈣用於離子浸出處理的熱處理條件,例如加熱 溫度、加熱時間及混合條件。 視酸溶液或整合劑溶液之濃度而定,加熱溫度的變化範 圍很大。然而,較佳地,適用於酸離子浸出處理的加熱溫 度在約20 C至約200 °C之間,更佳在約4〇 °c至約95它之 間,最佳在約6(TC至約9(rc之間。較佳地,適用於螯合劑 離子浸出處理的加熱溫度在約2(rc至約2〇〇t&gt;c的範圍,更 佳在約40°C至約90°C的範圍。 視酸溶液或螯合劑溶液之濃度及加熱時間而定,適用於 離子π出處理的加熱時間可改變。較佳地,用於離子浸出 處理的加熱時間在約1 5分鐘至約48小時之間,更佳在約3〇 分鐘至約12小時之間。 通常,會根據所使用之酸劑或螯合劑類型及濃度及基質 之特性(例如,欲自玻璃網狀物移除之離子的親和力、在 移除網狀物離子後玻璃之強度等)及熱處理之持續時間, 遠擇混合條件。例如但不限於,混合條件可為連續或斷 、、’貝亦可為機械混合、流化、翻滾、滾動或手動混合。 、、么之’酸劑或螯合劑濃度、熱處理條件及混合條件的組 u ’會根據在酸劑或螯合劑與目標基質離子之間達成足夠 的離子交換(”ΙΕχ,,)程度予以確定,用以產生合適的等電點 面%何之類型及程度’以達成基質的後處理或觸媒組 口物的預定用途所需之表面活性狀態。 126426.doc -35- 200843848 在離子浸出處理完成後’較佳地以任何合適的方法分離 經離子浸出處理之基質,包括但不限於過渡方式、離心方 式、傾析及其組合。然後’用一或多種適當的清洗液(例 如去離子水及/或適用的水溶性有機溶劑,例如甲醇、乙 醇或丙酮)清洗經離子浸出處理之基質,並在約室内溫度 至110 C之溫度下乾燥約20至24小時。 反離子交換處理 在有些情況下’取決於觸媒組合物之狀用途,可能較 勺方式係對遥定之基質進行反離子交換(”Βιχ”)或兩步 、子乂換處理(在本文中統稱為ΒΙΧ處理)。β以處理通常 稱為(但不限於)’,反離子&quot;交換,因為將經離子浸出之基質 與包括最初移除之—種離子的鹽溶液(例如NaCl)混合,經 又出處理而自基|移除之此種離子(例如心+)隨後會 置回或返回基皙。日, —、 目則尚不清楚自基質中移除之離子是否 一疋會返回最初在基質中佔攄 T ^像的相冋位置。但,無論最初 被置換之離子是否合m 、 曰口為BIX處理而完全或部分改變位置 或根本不改變位置,都應理解, 一丄 町 +又甲况明的BIX處理涵 盖由於任何該等可能的離子 觸媒組合物。 子“之置她而產生之所有 J常,用於處理經離子浸出處理之基質的鹽溶液類型, 、於將進订反離子交換之離子類型。較佳地,只進行— 種離子的反離子交換 籀“夕 ^況下,可能需要進行兩 種或更夕種離子的反離子交換。 任何易於藉由上述離早、、君ψ步 述雕子π出處理方法移除之離子均可進 I26426.doc -36- 200843848 行反離子交換。該等離子之一些實例包括但不限於第1族 (以前的第IA族)鹼金屬離子,例如鋰、鈉及鉀離子,及來 自第2族(以前的第iia族)的鹼土金屬離子,例如鈹、鎂、 鈣離子、NH4 +及絲銨陽離子,及小型有機聚陽離子。較 佳地,驗金屬離子及NH/係用於ΒΙχ處理的較佳目標離 子,而Na+及ΝΗ/係較佳的ΒΙχ離子,且Na+係更佳的Β以 離子。 通常,用於BIX處理之鹽溶液濃度,取決於經離子浸出 處理而要經BIX處理的基質類型及用於返回經離子浸出處 理基質之BIX離子的相對親和力,同樣,與Βιχ離子返: 基負網狀物中的位點無關(例如,Na+對於基質對比矿的相 對親和力)。對於大部分類型的玻璃基質,例如但不限於 AR型玻璃、Α型玻璃或石英玻璃,約〇·剛m〇i/L至$ m〇l/L濃度之ΒΙΧ-鹽溶液係較佳,而約〇〇5咖1几至3 mο 1 /L ΒIX-鹽溶液係更佳。 典型情況下’會根據所使用之BIX_鹽溶液之類型及濃度 及基質之特性,選擇用於BIX處理的熱處理條件,例如2 熱溫度、加熱時間及混合條件。 較佳地,用於使用鮮鹽溶液進行ΒΙΧ處理的加熱溫 度’可在約2(TC至約2〇(TC之間,更佳在約阶至約 …,溶液之濃度及所選擇之加熱溫度而定,用方 處理的加熱時間可改變。較佳地,mx處理的加^ 間在約5分鐘至約24小時之間,更佳在約30分鐘至約8小日_ 126426.doc 200843848 之間 通吊’會根據所使用之BIX溶液類型及濃度及基質 性(例如’欲自玻璃網狀物移除之離子的親和力、在移广 網狀物離子後玻璃之強度等)及熱處理之持續時間,心 混合條件。例如但不限於’混合條件可為連續或斷續,亦 可為機械混合、流化、翻滾、滾動或手動混合。Between C. The mouth cut can also be used for ion leaching treatment, such as, but not limited to, ethylenediamine oxime (EDTA), yoke, oxalate, polyamine, polyacid, and combinations thereof. The concentration of the chelating agent solution depends on the characteristics of the kebab (for example, the affinity of the ions that are missing from the glass network, the strength of the glass after removal of the network), and the intended use of the catalyst composition. . Preferably, the concentration of the chelating agent solution used for the ion leaching treatment may range from about 0. 001 wt.% to saturation, more preferably from about 〇.〇1 wt.% to saturation 126426.doc • 34· Between 200843848. Usually, depending on the type and concentration of the acid or chelating agent used and the characteristics of the substrate, (d) the heat treatment conditions for the ion leaching treatment, such as heating temperature, heating time and mixing conditions. Depending on the concentration of the acid solution or the integrator solution, the heating temperature varies widely. Preferably, however, the heating temperature suitable for the acid ion leaching treatment is between about 20 C and about 200 ° C, more preferably between about 4 ° C and about 95, and most preferably between about 6 (TC to Preferably, the heating temperature for the chelating agent ion leaching treatment is in the range of from about 2 (rc to about 2 〇〇t &gt; c, more preferably from about 40 ° C to about 90 ° C. The heating time suitable for the ion π-out treatment may vary depending on the concentration of the acid solution or the chelating agent solution and the heating time. Preferably, the heating time for the ion leaching treatment is from about 15 minutes to about 48 hours. More preferably, between about 3 minutes and about 12 hours. Typically, depending on the type and concentration of the acid or chelating agent used and the nature of the substrate (eg, ions to be removed from the glass network) Affinity, the strength of the glass after removing the mesh ions, etc.) and the duration of the heat treatment, depending on the mixing conditions, such as, but not limited to, the mixing conditions may be continuous or broken, and the shell may be mechanically mixed or fluidized. , tumbling, rolling or manual mixing. ,, 'acid or chelating agent concentration, heat The set of conditions and mixing conditions will be determined according to the degree of sufficient ion exchange ("ΙΕχ,") between the acid or chelating agent and the target matrix ion to produce a suitable isoelectric point. Type and extent 'to achieve the surface activity state required for the post-treatment of the substrate or the intended use of the catalyst composition. 126426.doc -35- 200843848 After the ion leaching treatment is completed, the separation is preferably carried out by any suitable method. Substrates for ion leaching, including but not limited to, transition mode, centrifugation, decantation, and combinations thereof. Then 'use one or more suitable cleaning solutions (eg, deionized water and/or a suitable water soluble organic solvent such as methanol, The substrate subjected to ion leaching treatment is washed with ethanol or acetone and dried at a temperature of about room temperature to 110 C for about 20 to 24 hours. The reverse ion exchange treatment may in some cases depend on the use of the catalyst composition, possibly The method of scooping is to carry out reverse ion exchange ("Βιχ") or two-step, sub-twisting treatment on the remotely determined substrate (collectively referred to herein as "ΒΙΧ treatment"). Usually referred to as (but not limited to) ', counter ion &quot; exchange, because the ion leached matrix is mixed with a salt solution (such as NaCl) including the initially removed ions, and is processed again and removed from the base. In addition to this ion (such as the heart +) will then be returned or returned to the base. It is not clear whether the ions removed from the matrix will return to the phase that originally occupied the T ^ image in the matrix.冋 position. However, regardless of whether the originally replaced ion is m or not, the mouth is completely or partially changed position or the position is not changed at all, it should be understood that the BIX treatment of Ichimachi + Azumi is covered by any The possible ion-catalyst compositions are all of the types of salt solutions used to treat the substrate subjected to ion leaching, and the type of ions that will be used for the reverse ion exchange. Preferably, only the counter ion exchange of the ions is carried out. In the case of the case, it may be necessary to carry out the counter ion exchange of the two or more ions. Any one of the above-mentioned early, jubilant steps The ions removed by the π-out process can be subjected to counter ion exchange in I26426.doc -36- 200843848. Some examples of the plasma include, but are not limited to, Group 1 (former Group IA) alkali metal ions such as lithium and sodium. And potassium ions, and alkaline earth metal ions from Group 2 (formerly iia), such as barium, magnesium, calcium ions, NH4 + and silk ammonium cations, and small organic polycations. Preferably, metal ions and NH/ is the preferred target ion for hydrazine treatment, while Na+ and ΝΗ/ are preferred cesium ions, and Na+ is better for strontium ions. Generally, the concentration of salt solution used for BIX treatment depends on the ion. The type of matrix to be treated by BIX for leaching and the relative affinity of the BIX ions for returning to the ion leaching matrix are also independent of the sites in the 负ιχ ion back: basal negative network (eg, Na+ for matrix comparison) Mine phase Affinity. For most types of glass substrates, such as, but not limited to, AR-type glass, bismuth-type glass or quartz glass, ΒΙΧ-salt solution of 〇················· Preferably, about 〇〇5 coffee 1 to 3 mο 1 /L Β IX-salt solution is better. Typically, it will be selected according to the type and concentration of the BIX_salt solution used and the characteristics of the substrate. The heat treatment conditions of the BIX treatment, for example, 2 heat temperature, heating time, and mixing conditions. Preferably, the heating temperature for the hydrazine treatment using the fresh salt solution can be between about 2 (TC to about 2 Torr (TC), more Preferably, the heating time of the treatment may vary depending on the concentration of the solution and the selected heating temperature. Preferably, the addition of the mx treatment is between about 5 minutes and about 24 hours. More preferably, between about 30 minutes and about 8 hours _ 126426.doc 200843848, depending on the type and concentration of the BIX solution used and the matrix properties (eg 'the affinity of the ions to be removed from the glass mesh, The strength of the glass after moving the mesh ions, etc.) and the duration of the heat treatment, the heart Bonding conditions such as, but not limited to 'mixing conditions may be continuous or intermittent, but also may be a mechanical mixture, fluidizing, tumbling, rolling, or manual mixing.

U 總之,BIX鹽溶液濃度、熱處理條件及混合條件的也 Θ ’實質上係基於返回足夠數量及分配足夠數量之町-離 子回到基質進行確定,而與離子於基質網狀物中之位^ 關。返回及分布足夠數量之BIX_離子係、用以產生所需之: 面电何類型及程度’以產生達成基質的後處理或觸媒組合 物的預疋用途所要之表面活性狀態。 藉由調整pH來調整基質表面電荷 較仫地’而要用基質上的負表面電荷來支援與帶正電荷 之成分(例如陽離子性鹼土金屬、陽離子性過渡金屬成分 等)的靜電相互作用或親和力。然而,對於一些潛在的觸 媒、、且口物應用,可能需要使用正表面電荷來支持與帶負電 荷之成分(例如陰離子性過渡金屬氧離子、硫酸根陰離 子、貴金屬多鹵化物陰離子等)的靜電相互作用或親和 力。 通^,可藉由將經離子浸出處理之基質/ΙΕχ混合物 值凋整為低於或高於基質等電點(,,IEp”),將基質之表面電 何改變為淨正性狀態或淨負性狀態。請回想,IEP又稱為 零點電荷(’’ZPC,’)。因此,換言之,IEP(或ZPC)可視為材 126426.doc -38· 200843848 料在初濕時之表面具有淨零表面電荷的_值。所以,將基 質/IEX水混合物之pH值調整為大於基質iEp(或W)的^ 值、,可在基質上產生淨的負表面電荷。另夕卜,將基質/ΐΕχ 水混合物之pH值調整為小於基質ΙΕρ(或zpc)的ρΗ值,可 在基質上產生淨的正表面電荷。 例如但不限於,若AR型玻璃之IEP等於9·6,若將經離子 浸出處理之AR型玻璃的ρΗ值調整為&gt;9.6的1)11值,則將會 在玻璃表面產生淨的負表面電荷。視八汉型玻璃之iEp分布 而疋,較佳的方式可能為將pH值調整為大於基質之IEp 一 或兩個或更多個pH值單位,以保證其表面電荷得到充分支 持。 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相容性、玻璃穩定性及所要之電荷密度及其他因 素。通常,任何稀鹼均可用於將基質表面電荷調至其IEp 的右側(亦即產生淨的負表面電荷),而任何稀酸可用於將 基質表面電荷調至其IEP的左側(亦即產生淨的正表面電 荷)。無機酸及鹼或有機酸及鹼均可以稀濃度使用,而通 常較佳為無機酸。通常,稀酸溶液或稀鹼溶液之濃度將取 決於所使用的酸或鹼類型、其解離常數及適於獲得所要表 面電荷類型及密度的pH值。 在某些情況下’可能需要在使表面電荷產生與某催化成 分或前驅物相同符號的pH值下,整合該催化成分或前驅 物。在该等條件下,靜電吸附(EA)型整合機制係很可能不 會發生的。然而,在不受理論約束的情況下,在可交換之 126426.doc -39- 200843848 表面位置上可能發生直接的離子交換(ΙΕΧ)或反交換 (BIX) ’導致催化成分或前驅物之表面整合,該催化成分 或前驅物可能在物理上及/或化學上不同於在靜電吸附 (EA)機制下整合的相同組分。例如,某些基質表面部分包 括可由相同符號的離子催化成分或前驅物置換之陽離子 (或陰離子),該等基質表面部分可提供用於與基質表面部 分進行適量但有效的ΙΕΧ或ΒΙΧ之交換位置。例如但不限 於忒等部分,如矽烷氧基(-Si-0-Na+)部分包括可至少部 分由帶正電荷之催化金屬或金屬錯合物前驅物(例如但不 ,於Pd(NH3〇置換的Na+離子,進而產生具有催化有效 量之催化成分的基質。 藉由調整pH值來控制經以乂處理之基質的表面電荷 如同在IEX處理或第二ΙΕχ處理(&quot;iex_2處理”,如下論 述)的情況一樣,對於某些ΒΙΧ處理,可能需要調整?11值, 但並非必需。同樣,根據將要在ΙΕΧ-2處理中整合至表面 之第二成分及交換之ΒΙΧ·離子類型,所需之pH調整程度通 苇取決於基質的I E p、# Τ ϋ p Jfcl I L * -r- ^ 土貝曰其IEP對比表面電荷分布曲線及所要 之電荷類型。 用於進行所述ρΗ值調整之溶液類型,將取決於與其他反 :物之相合性、基質在相關ρΗ值範圍内的穩定性及所要之 電η山度及其他因f。通常,任何稀驗均可用於將基質表 面電荷調至其IEP的右側(亦即產生淨的負表面電荷),而任 :稀fee可用於將基質表面電荷調至其财的左側(亦即產生 &quot; 表面電荷)。無機酸或鹼或有機酸或鹼均可以稀濃 126426.doc -40- 200843848 度使用。通常,稀酸溶液或稀鹼溶液之濃度,將取決於所 使用之酸或鹼類型、其解離常數及適於獲得所要表面電荷 類型及密度的pH值。 ΠΙ· 2型成分前驅物整合處理U In summary, the concentration of BIX salt solution, the heat treatment conditions and the mixing conditions are also substantially determined based on the return of a sufficient amount and the distribution of a sufficient amount of meth-ion back to the matrix, and the position of the ion in the matrix network ^ turn off. A sufficient amount of BIX_ionic system is returned and distributed to produce the desired: what type and extent of surface electricity&apos; to produce a surface active state desired for the intended use of the post-treatment or catalyst composition of the substrate. By adjusting the pH to adjust the surface charge of the substrate to a lesser extent, the negative surface charge on the substrate is used to support electrostatic interaction or affinity with positively charged components (eg, cationic alkaline earth metals, cationic transition metal components, etc.). . However, for some potential catalysts, and for oral applications, it may be necessary to use positive surface charges to support negatively charged components (eg, anionic transition metal oxygen ions, sulfate anions, noble metal polyhalide anions, etc.) Electrostatic interaction or affinity. By changing the value of the matrix/ruthenium mixture subjected to ion leaching to a level lower or higher than the isoelectric point of the matrix (, IEp", the surface of the substrate is changed to a net positive state or a net state. Negative state. Think back, IEP is also known as zero charge (''ZPC,'). Therefore, in other words, IEP (or ZPC) can be regarded as material 126426.doc -38· 200843848 material has a net zero on the surface at initial humidity The _ value of the surface charge. Therefore, adjusting the pH of the matrix/IEX water mixture to be greater than the value of the matrix iEp (or W) can produce a net negative surface charge on the substrate. In addition, the matrix/ΐΕχ The pH of the water mixture is adjusted to be less than the ρΗ value of the matrix ΙΕρ (or zpc) to produce a net positive surface charge on the substrate. For example, but not limited to, if the IEP of the AR-type glass is equal to 9.6, if the ion leaching is performed The ρΗ value of the treated AR-type glass is adjusted to the value of 1)11 of 9.6, which will produce a net negative surface charge on the surface of the glass. Depending on the iEp distribution of the Bahan-type glass, the preferred way may be The pH is adjusted to be greater than one or two or more pH units of the IEp of the substrate to ensure The surface charge is fully supported. The type of solution used to effect the pH adjustment will depend on compatibility with other reactants, glass stability and desired charge density, among other factors. Generally, any dilute base can be used. To adjust the surface charge of the substrate to the right side of its IEp (ie, to produce a net negative surface charge), and any dilute acid can be used to adjust the surface charge of the substrate to the left side of its IEP (ie, to produce a net positive surface charge). Acids and bases or organic acids and bases can be used in dilute concentrations, and inorganic acids are usually preferred. Generally, the concentration of the dilute acid solution or the dilute alkali solution will depend on the type of acid or base used, its dissociation constant and Obtaining the pH of the desired surface charge type and density. In some cases, it may be necessary to integrate the catalytic component or precursor at a pH that causes the surface charge to produce the same sign as a catalytic component or precursor. Under the electrostatic adsorption (EA) type of integration mechanism is likely to not occur. However, in the case of not being bound by theory, in the exchange of 126426.doc -39- 200843848 table Direct ion exchange (ΙΕΧ) or reverse exchange (BIX) may occur at the surface location resulting in surface integration of the catalytic component or precursor, which may be physically and/or chemically different from electrostatic adsorption ( EA) the same components integrated under the mechanism. For example, some substrate surface portions include cations (or anions) that may be replaced by ionic catalytic components or precursors of the same symbol, which may be provided for surface portion of the substrate. An appropriate but effective exchange site of ruthenium or osmium, such as, but not limited to, a ruthenium moiety, such as a decyloxy (-Si-0-Na+) moiety, including at least a portion of a positively charged catalytic metal or metal complex precursor. (For example, but not, Pd (NH3 〇 substituted Na+ ion, which in turn produces a matrix with a catalytically effective amount of catalytic component. By adjusting the pH to control the surface charge of the substrate treated with ruthenium, as in the case of IEX treatment or second treatment (&quot;iex_2 treatment, as discussed below), adjustments may be required for certain treatments. Value, but not required. Similarly, depending on the type of bismuth ion that is to be integrated into the surface during the ΙΕΧ-2 treatment and the type of ΒΙΧ·ion exchanged, the degree of pH adjustment required depends on the IE p,# Τ ϋ p of the matrix. Jfcl IL * -r- ^ Tube 曰 IEP contrast surface charge distribution curve and the type of charge required. The type of solution used to carry out the ρΗ value adjustment will depend on the compatibility with other anti-objects and the matrix. Stability within the range of ρΗ and the desired electrical η mountain and other factors f. Generally, any thin test can be used to adjust the surface charge of the substrate to the right side of its IEP (ie, to produce a net negative surface charge). : Sparse fee can be used to adjust the surface charge of the substrate to the left side of the money (that is, to produce &quot; surface charge). The inorganic acid or base or organic acid or base can be used at a concentration of 126426.doc -40-200843848 degrees. Usually, dilute Concentration of the solution or dilute alkali solution, will depend on the type of acid or base used, its dissociation constant and the pH suitable for obtaining the desired type and density of surface charge. ΠΙ · Type 2 precursor component integration processing

無論基質表面活性係按原樣接收,或係經離子浸出處理 (亦即經IEX-1處理之基質),或經Βιχ處理,較佳地,在⑴ 第二離子交換(ΠΙΕΧ-2Π)處理,(ii)靜電吸附(ΕΑ)處理或(出) 某些ΙΕΧ-2與ΕΑ處理之組合中使用至少一種第二成分前驅 物(”2型成分前驅物”)進一步處理基質,以便將一或多種第 一成分前驅物整合在具有第二種與基質的離子及/或靜電 相互作用之基質表面上及/或内。接下來,按照預定用 返,某些2型成分前驅物在未經進一步處理的情況下可產 生催化活性區域,或經進一步處理而產生包括一或多種2 型成分之催化活性區域。但,無論該催化活性區域係由 U)2型成分前驅物組成,(b)由產生於2型成分前驅物之2型 f分組成’或⑷由⑷及(b)之某組合組成,催化區域在基 質表面上及/或内的平均厚度均“約3〇奈米,車交佳為 &lt;約 2〇奈米,更佳為$約1〇奈米。 如前所述,在某些情況下,取決於觸媒組合物之預定用 途’按原樣接收或經離子浸出處理之基質可具有催化效 力。=而1於許多潛在應用,更佳的方式為對選定 之基貝進仃IEX-2及/或EA處理。例如但不限於,許多適合 ^本發明觸媒組合物之製程的反應㈣、«性及/或 ^置效率,可藉由置換至少一部分第一成分(”型成分&quot;)並 126426.doc •41 · 200843848 將弟二種成分(”2型成分&quot;)與基質表面整合而顯著提高。Whether the substrate surface active is received as is, or is subjected to ion leaching (ie, IEX-1 treated substrate), or via Βιχ, preferably, in (1) second ion exchange (ΠΙΕΧ-2Π) treatment, ( Ii) electrostatic adsorption (ΕΑ) treatment or (out) the use of at least one second component precursor ("type 2 component precursor") in combination with certain ΙΕΧ-2 and hydrazine treatments to further treat the substrate so that one or more A component precursor is integrated on and/or within the surface of the substrate having a second ion and/or electrostatic interaction with the substrate. Next, according to the intended use, certain Type 2 component precursors can produce catalytically active regions without further processing, or can be further processed to produce catalytically active regions comprising one or more Type 2 components. However, whether the catalytically active region consists of a U) type 2 component precursor, (b) consists of a type 2 f component resulting from a type 2 component precursor, or (4) consists of a combination of (4) and (b), catalyzed. The average thickness of the area on and/or within the surface of the substrate is "about 3 〇 nanometers, and the car is preferably &lt; about 2 〇 nanometers, more preferably about 1 〇 nanometer. As mentioned above, in some In this case, the substrate that is received as received or ion leached may have catalytic potency depending on the intended use of the catalyst composition. = 1 For many potential applications, a better way is to select the IBE for the selected base. 2 and/or EA treatment, such as, but not limited to, a plurality of reactions (4), «sexuality and/or efficiency" suitable for the process of the catalyst composition of the present invention, by replacing at least a portion of the first component ("type component" ;) and 126426.doc •41 · 200843848 The two components of the brother ("type 2 ingredient") are significantly improved by integration with the surface of the substrate.

C *在不受理論約束的情況下,藉由與基質表面上及/或内 f相反電荷之特定離子交換位點進行直接或間接的離子相 互作用’ H由與帶相反電荷之基質表面進行靜電吸附相互 作用’及某些離子相互作用與靜電吸附相互作用之組合或 某些其他類型之有待瞭解的前驅物_電荷-表面間相互作 用’:型成分前驅物離子可得以整合。但,不論相互作用 之性貝如何,在按原樣接收之基質、經IEX-1處理之基質 或經BI:-處理之基質產生第二種前驅物電荷-表面間相互 、々h况下,2型成分前驅物可能因此產生催化活性區 或°亥催化活性區域在基質表面上及/或内的平均厚度為&lt; 約3〇奈米,較佳為S約20奈米,更佳為 &lt;約10奈米。 只=為了便於進行以下討論’且無意限制本文所述本發 明之祀圍,本文使用ΙΕχ_2來統稱通常稱為2•型成分前驅 物電荷-表面間相互作用或2型成分前驅物相互作用之廣泛 的相互作用。 a〆 通常,用於處理經IEXq處理或經ΒΙχ_處理之基質的鹽 溶液類型,將取決於要在ΙΕΧ-2處理中進行離子交換之離 子類型。或是-種離子將進行離子交換,或在某些情況下 需要進行兩種《更多#離子之錢,或是同時進行離子交 換’或是按順序進行離子交換。 在兩種不同類型的成分前驅物離子與基質整合之情況 下本文中4 ΙΕχ-2處理稱為兩次離子交換或兩次正又-2處 理。因此,在三種不同類型的成分前驅物離子與基質整合 126426.doc -42- 200843848 之h况下’ ΙΕΧ-2處理稱為三次離子交換或三次ΐΕχ·2處 理。 2型成分及前驅物說明 ΙΕΧ 2離子之任何鹽溶液,若對於按原樣接收、經 處理或經BIX-處理之基質表面置換離子有化學敏感性,或 疋具有電荷親和力來達成與經正尽丨處理或經處理之 基質表面的靜電相互作用,即可使用。 Γ 所以,ΙΕΧ-2離子能夠作為2型成分之前驅物。如上所 述丄根據其預定用* ’該等離子性ΐΕχ_2前驅物(即2型成 分前t物)可能具有催化效力,若是如此,該等離子性 IE X - 2前驅物就能夠像某類觸媒組合物中的2型成分一樣以 其刖驅物’但所述離子亦可作為在製備另一類型 之觸媒組合物製程中的跡2前驅物工作。然而,通常情 況下,離子性IEX-2前驅物(可用於獲得與基質表面整人之 2型成分)包括但不限於布忍司特或路易士酸、布忍司:或 路易士鹼、貴金屬陽離子及貴金屬錯合陽離子及陰離子、 過渡金屬陽離子及過渡金屬錯合陽離子及陰離子、過渡全 屬氧陰離子、過渡金屬硫屬化物陰離子、主族氧陰離 函離子、稀土離子、稀土錯合陽離子及陰離子及^組合。、 同樣’取決於觸媒組合物之預定用途,某些ΐΕχ_ 本身在前驅物狀態下有催化效力’與適當的基質整合 產生2型成分。可選擇在不進一步處理的情況下具有:化 效力之離子性ΙΕΧ-2前驅物,某些實例包括但不限 司特或路易士酸、布忍司特或路易士驗、貴金屬陽離子心 126426.doc -43 - 200843848 主族氧陰離子、鹵 子及其組合。 過渡金屬陽離子、過渡金屬氧陰離子、 離子、稀土氫氧根離子、稀土氧化物離 可作為2型成分前驅物之某些貴金屬及過渡金屬實例, 包括但不限於第了族至㈣族(以前的第_、第爾、第 Vb族、第VIb族、第vb族及第彻族),例如翻、把、錄、 錢、銀、釘、鍊、銅、叛、冬爲自 、至及鎳的離子鹽尤其較佳。為 了方便起見,該等族之元夸^ , 素了糟由使用國際理論及應用化 學聯合會(IUPAC)命名夺續夕一 # α 7卩a系統之兀素族編號在 P P arll.lanl.gov/pen〇dlc/default htm 中顯示的化學元 素週期表(並顯示以前使用的族編號)中查詢。 銅、銀、金、鍺、銥、釕、鍊、蛾、銘、鐵、猛、辞的離 子鹽及錯合離子鹽及其組合。對於ΙΕχ_2處理,鈀、鉑、C*, without being bound by theory, undergoes direct or indirect ionic interactions by specific ion exchange sites on the surface of the substrate and/or on the opposite side of the internal charge. H is electrostatically charged from the surface of the oppositely charged substrate. Adsorption interactions' and combinations of certain ionic and electrostatic adsorption interactions or some other type of precursor to be understood_charge-surface interactions': type component precursor ions can be integrated. However, irrespective of the nature of the interaction, the substrate received as received, the substrate treated with IEX-1, or the substrate treated with BI:-produces the second precursor charge-surface interaction, 2 The type component precursor may thus produce a catalytically active region or an average thickness of the catalytically active region on and/or within the surface of the substrate of &lt; about 3 nanometers, preferably about 20 nanometers, more preferably &lt; About 10 nm. Only in order to facilitate the following discussion's and is not intended to limit the scope of the invention described herein, ΙΕχ_2 is used herein to collectively refer to the broad range of charge-surface interactions or type 2 precursor interactions commonly referred to as type 2 precursor precursors. Interaction. A〆 In general, the type of salt solution used to treat the IEXq-treated or ΒΙχ-treated substrate will depend on the type of ion to be ion-exchanged in the ΙΕΧ-2 treatment. Alternatively, the ions will be ion exchanged or, in some cases, two more "Ion's money, or simultaneous ion exchange" or sequential ion exchange. In the case where two different types of component precursor ions are integrated with the matrix, the 4 ΙΕχ-2 treatment herein is referred to as two ion exchanges or two positive and two treatments. Therefore, in the case of three different types of component precursor ions and matrix integration 126426.doc -42- 200843848, the ΙΕΧ-2 treatment is called three-ion ion exchange or three ΐΕχ·2 treatment. Type 2 Ingredients and Precursor Description Any salt solution of ΙΕΧ 2 ions, if it is chemically sensitive to the surface-replacement ions received, treated or BIX-treated as received, or has a charge affinity to achieve The electrostatic interaction of the treated or treated substrate surface can be used. Γ Therefore, ΙΕΧ-2 ion can be used as a precursor to the type 2 component. As described above, the precursor of the plasma ΐΕχ_2 (i.e., the precursor of the type 2 component) may have catalytic effect according to its predetermined use. If so, the plasma IE X-2 precursor can be combined with a certain type of catalyst. The type 2 component is the same as its ruthenium drive' but the ion can also function as a trace 2 precursor in the preparation of another type of catalyst composition process. However, in general, ionic IEX-2 precursors (which can be used to obtain a type 2 component that is integral with the surface of the substrate) include, but are not limited to, Blenzel or Lewis acid, Bruce: or Lewis base, noble metal cations and Precious metal complex cations and anions, transition metal cations and transition metal complex cations and anions, transitional oxyanions, transition metal chalcogenide anions, main oxygen anion ions, rare earth ions, rare earth complex cations and anions ^ Combination. Similarly, depending on the intended use of the catalyst composition, some of the ΐΕχ_ itself has a catalytic effect in the precursor state' in combination with a suitable matrix to produce a Type 2 component. Optional ionic ΙΕΧ-2 precursors with no efficiencies, some examples include but not limited to stell or Lewis acid, Blenz or Lewis, precious metal cations 126426.doc -43 - 200843848 Main group of oxygen anions, halogens and combinations thereof. Transition metal cations, transition metal oxyanions, ions, rare earth hydroxide ions, rare earth oxides can be used as examples of certain noble metals and transition metals of type 2 precursors, including but not limited to the first to the fourth group (formerly Articles _, Di, Vb, VIb, Vb, and Dichu), such as turning, turning, recording, money, silver, nails, chains, copper, rebellion, winter, and nickel Ionic salts are especially preferred. For the sake of convenience, the elements of these families are exaggerated, and the use of the International Union of Theoretical and Applied Chemistry (IUPAC) is named after the continuation of the #α 7卩a system of the 兀 族 family number in PP arll.lanl. Query in the chemical element periodic table (and display the previously used family number) shown in gov/pen〇dlc/default htm. Copper, silver, gold, ruthenium, osmium, iridium, chain, moth, Ming, iron, fierce, ionic salt and complex ion salt and combinations thereof. For ΙΕχ_2 treatment, palladium, platinum,

ί 可作為2型成分前驅物之某些過渡金屬氧陰離子實例, &lt;不限於第5知及第6族(以前的第^族及第族)的 離子鹽,例如 VCV·、W(V·、H2Wi2〇4q6_、Μ。#、 M〇70246、Nb6〇196·、Re(V及其組合。對於IEX-2處理, 銖、鉬、鎢及釩的離子鹽尤其較佳。 每可作為2型成分前驅物之某些過渡金屬硫屬化物陰離子 貝H包括但不限於第6族(以前的第VIb族)的離子鹽,例 如M〇S42·、WS42-及其組合。 曰可作為2型成分前驅物之某些主族氧陰離子實例,包括 限於第16私(以珂的第vu族)的離子鹽,例如s〇42_、 Ρ Ο +4- 4及其組合。對於IEX-2處理,S042·的離子鹽 尤其較佳。 126426.doc -44- 200843848 可作為2型成分前驅物之某 — 卡二_離子實例,包括但不限 於弟17族(以前的第VII族) _ 你’的離子鹽,例如F·、Cl·、Br·、 Ι·及其組合。對於ΙΕΧ-2處理 t及ci的離子鹽尤其較佳。 可作為2型成分前驅物之某些稀土離子及稀土錯合陽離 子或離子實例,包括但不限於鐦系元素及㈣元素的離子 鹽’例如 La、Pr、Nd、Pm、q - ㈣ 、Sm、Ell、Gd、Tb、Dy、 H〇、Er、Tm、Yb、Lu、Th、U及其組合。ί can be used as an example of some transition metal oxyanions of type 2 precursors, &lt;not limited to ionic salts of Group 5 and Group 6 (formerly Groups and Groups), such as VCV·, W(V· , H2Wi2〇4q6_, Μ.#, M〇70246, Nb6〇196·, Re (V and combinations thereof. For IEX-2 treatment, ionic salts of bismuth, molybdenum, tungsten and vanadium are especially preferred. Certain transition metal chalcogenide anion shells H of the constituent precursors include, but are not limited to, ionic salts of Group 6 (formerly Group VIb), such as M〇S42., WS42-, and combinations thereof. Examples of certain main group oxygen anions of the precursor include ionic salts limited to the 16th private (ie, vu group of hydrazine), such as s〇42_, Ρ Ο +4-4, and combinations thereof. For IEX-2 treatment, S042 The ionic salt is especially preferred. 126426.doc -44- 200843848 can be used as a precursor to a type 2 component - an example of a card II ion, including but not limited to the group 17 (formerly Group VII) _ your 'ion Salts such as F·, Cl·, Br·, Ι· and combinations thereof. It is especially preferred for the treatment of ionic salts of t and ci with ΙΕΧ-2. Examples of certain rare earth ions and rare earth complex cations or ions of the precursor, including but not limited to lanthanide and (iv) element ionic salts such as La, Pr, Nd, Pm, q - (4), Sm, Ell, Gd, Tb , Dy, H〇, Er, Tm, Yb, Lu, Th, U, and combinations thereof.

可用於產生作為2型成分之過渡金屬_碳化物、過渡金 屬-虱化物、過渡金屬-硼化物及過渡金屬-磷化物的某些過 渡金屬實例,包括但不限於鉻、鉬、鎢、鈮、鈕、鐵、 始、鎳的離子鹽及其組合。 IEX_2處理說明 通常,用於IEX-2處理之鹽溶液濃度,取決於經把又^處 理或BIX-處理並要經IEXj處理之基質類型及用於與經 IEX-1處理之基質相互作用及/或整合的正乂_2離子之相對 親和力。對於大部分類型之玻璃基質(例如但不限於ar 型、A型或鈉鈣(s〇da-iime)玻璃),約〇 〇〇1 wt·%至飽和的 IEX-2鹽溶液係較佳,而約〇 〇〇1 wt·%至5 wt·% ΙΕχ_2鹽溶 液係更佳。然而,視被視為達成觸媒組合物之預定用途所 必需之催化成分的官能性表面濃度而定,ΙΕΧ-2鹽溶液可 月b為小於〇 〇 〇 1 wt. %。 若多種離子類型與基質交換,無論為同時進行或按順序 進行’鹽溶液之濃度將按照對於基質上各種成分前驅物所 萬的相對負載及基質適用於一成分前驅物對比另一種成分 126426.doc -45- 200843848 前驅物的相對親和力進行敕 口θ正。例如作不限 IEX-2處理(亦即兩種不 一 、,在兩次 處理之基質整合)或-成刀前驅物與經叫或 )或一-人IEX-2處理(亦即三藉 催化成分前驅物與經IEX]或經邮處理之基以種=的 種離子㈣溶㈣度將取決於適 T整合之成分前驅物的目標相對濃度及對於各種離: 之表面親和力。 分裡雕子Examples of certain transition metals that can be used to produce transition metal-carbides, transition metal-tellurides, transition metal-borides, and transition metal-phosphides as type 2 components, including but not limited to chromium, molybdenum, tungsten, rhenium, Button, iron, ionic salts of nickel, and combinations thereof. IEX_2 Treatment Description Typically, the concentration of the salt solution used for IEX-2 treatment depends on the type of substrate that is treated or BIX-treated and treated by IEXj and used to interact with the substrate treated with IEX-1 and/or Or the relative affinity of the integrated positive 乂_2 ion. For most types of glass substrates (such as, but not limited to, ar type, A type, or soda-iime glass), about 1 wt.% to saturated IEX-2 salt solution is preferred. The salt solution of about 1 wt.% to 5 wt.% ΙΕχ_2 is more preferred. However, depending on the functional surface concentration of the catalytic component necessary to achieve the intended use of the catalyst composition, the ΙΕΧ-2 salt solution may have a monthly b of less than 〇 〇 〇 1 wt.%. If multiple ion types are exchanged with the substrate, either simultaneously or sequentially, the concentration of the salt solution will be based on the relative loading of the precursors of the various components on the substrate and the matrix is applied to one component precursor versus the other. 126426.doc -45- 200843848 The relative affinity of the precursor is 敕 θ positive. For example, it is not limited to IEX-2 treatment (that is, two different, matrix integration in two treatments) or - knife precursor and call or or one-human IEX-2 treatment (ie, three-catalyzed The composition precursor and the IEX] or postal treatment group species (4) solution (four) degree will depend on the target relative concentration of the component precursors suitable for T integration and the surface affinity for various separations.

典型情況下,會根據所使 '州 &lt; 比χ-2鹽溶液類型及澧痄 及基質之特性,選擇適用於τργ 丄及,辰度 释週用於ΙΕΧ-2處理的熱處理條件, 如加熱溫度、加熱時間及混合條件。 較佳地’適合於使用酸進行ΙΕΧ_2處理的加熱溫度可在 約2〇t至約2(K)t之間,更佳在約3代至約㈣之間。 取決於IEX-2鹽溶液之濃度及選定之加熱溫度,用於 IEX-2處理的加熱時間可改變。較佳地,適用於ΐΕχ_2處理 的加熱時間在約5分鐘至約48小時之間,更佳在約3〇分鐘 至約5小時之間。 通系會根據所使用之ΙΕΧ-2鹽溶液類型及濃度及基質 之特|± (例如,欲自玻璃網狀物移除之離子的親和力、在 ^除、、、罔狀物離子後玻璃之強度等)及熱處理之持續時間, 遠擇混合條件。例如但不限於,混合條件可為連續或斷 ,亦可為機械混合、流化、翻滾、滾動或手動混合。 衾· ^ 丫 ’ σ ’ IEX-2鹽溶液濃度、熱處理狀態及混合條件的 组合 5 每併 、、 只貝上係基於在基質上及/或内整合足夠數量之 ΙΕΧ-2離子及ΙΕχ-2離子之分布予以確定,而與基質表面之 126426.doc •46- 200843848 物理化學結合的性質無關,用以產生所需之表面電荷類型 及程度,以產生達成觸媒組合物之預定用途所需的表面、、舌 性狀態。 藉由調整pH來調整基質表面電荷 如上所述’考慮到在第二IEX(”IEX-2”)處理中將與表面 整合之2蜇成分前驅物,所需的pH調整程度通常將取決於 ‘ 基質之IEP、基質之IEP對比表面電荷分布曲線及所要之電 荷類型。例如但不限於,對於IEP等於8的基質,較佳地, 基質/IEX-2混合物之pH值調整為約8至約12之間,更佳為 約9至約11之間。 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相容性、基質在相關pH值範圍内的穩定性及所要之 電荷密度及其他因素。通常,任何稀鹼均可用於將基質表 面電荷調至其IEP的右側(亦即產生淨的負表面電荷),而任 何稀酸可用於將基質表面電荷調至其IEp的左側(亦即產生 ϋ ’爭的正表面電荷)。無機酸或鹼或有機酸或鹼均可以稀濃 又使用’而通常較佳為有機驗。㉟常,稀酸溶液或稀驗溶 液之痕度,將取決於所使用之酸或驗類型、其解離常數及 . $於獲得所要表面電荷類型及密度的pH值。 在1EX-2處理完成後,較佳地,經圧心2處理之基質可使 用任何合適的方法分離,包括但不限於過遽方式、離心方 式二傾析及其組合。然後,經ΙΕχ_2處理之基質用一或多 a、人適的清洗液(例如蒸餾水或去離子水、稀鹼或稀酸及/ 或口適的水溶性有機溶劑,例如甲醇、乙醇或丙酮)清 126426.doc -47- 200843848 洗,亚在約no c之溫度下乾燥約2〇至24小時。 IV·沈殿後處理說明 視而要,在經IEX.2處理之基質得以分離|,可僅乾 燥、锻燒,在氧化條件下锻燒,隨後還原或進一步氧化, • ㈣劇情況下還原或在不煅燒的情況下氧化。可按照 ‘ 冑要,用合適的還原、硫化、碳化、氮化、填化或化試 劑(-⑴㈣試劑),在氣相或液相中執行表面沈丨殿之過渡金 (Λ ㉟離子、氧陰離子及/或硫陰離子的反應、,以產生相應的 催化有效之金屬硫化物/硫氧化物、金屬碳化物/碳氧化 物、金屬氮化物/氮氧化物、金屬硼化物或金屬磷化物成 分。 通常但不限於,沈澱後煅燒處理的目的實質上為分解金 屬平衡離子或配體,且將金屬、金屬氧化物、金屬硫屬化 物等更緊密地與基質表面整合,並移除任何未在先前的乾 燥處理中移除的殘餘水。 c 用於經IEX-2處理之基質的煅燒處理條件,對於基質之 成功表面活化並非特別重要,然而,該等條件只應足夠嚴 格,能夠以催化有效量產生至少一個具有沈澱之成分前驅 物的催化活性區域。但就使用煅燒而言,基質首先在氧化 性氣氛(例如在空氣或氧氣)中煅燒。另外,重要的係,選 擇夠高的緞燒溫度以確保所關注之2型成分前驅物被氧化 而且任何殘餘水得到移除(若仍有任何殘餘水存在),但緞 燒溫度亦應夠低,能夠合理避免基質之軟化點及非所要之 沈澱成分前驅物分解。 126426.doc -48 - 200843848 例如但不限於,沈澱之硫酸鹽需要煅燒條件來分解所結 合之陽離子並將硫酸根固定&amp;表面i,但#等條件不得顯 著將硫酸鹽分解成揮發性的硫氧化物。同樣地,金屬氧陰 離子要求煅燒條件來分解所結合之陽離子並將陰離子以氧 化物形式固定於表面上,但條件不得嚴格到使金屬氧化物 自表面揮發或造成金屬氧化物溶入基質。最後,貴金屬及 錯合物應在以下條件煅燒:分解所存在的配體及陰離子, 但不得嚴格到使貴金屬聚集在表面上。鑒於此原因,如以 下更詳細說明,貴金屬較佳在沒有煅燒的情況下直接還 原。 通常,煅燒溫度應至少比選定基質軟化點低至少約100 °c。煅燒温度應在之間,更佳在約2〇〇它 至600°c之間,最佳在約300。(:至5⑽。c之間。 典型情況下,經IEX-2處理之基質烺燒約丄至約24個小 時,較佳煅燒約2至約12個小時。儘管如此,視與基質整 合之2型成分而定,該項煅燒時間可在該等範圍以外變 化。 通常但不限於,沈澱後還原處理目的為至少實質上(若 非疋王)將催化成分丽驅物(例如金屬、金屬氧化物或金屬 硫化物)還原成與基質表面整合的較低氧化狀態。合適還 原劑的實你]包㈣不限於ccmH” h2係較佳的還原劑, 其流動速率較佳在每公克基質約001 L/hr至約100 [/匕之 間’更佳其流動速率在每公克基質0.1L/hl1L/hr之間。 典型情況下,還原溫度應在代㈣代之間,前提為所 126426.doc -49- 200843848 選擇之溫度比基質之軟化點至少低1 〇〇£&gt;c。 ,通常’經IEX-2處理之基質要經約〇1小時至約48小時之 還原處理’較佳經約W、時至約8小時之還原處理。 或者,經ΙΕΧ-2處理之基質可藉由溶液相處理進行還 . 原,該溶液相處理使用可溶性還原劑(例如但不限於肼、 氫化鈉、氫化銘經及其組合)在合適的溶劑(例如水或乙⑹ • 中進行。 f ^但不限於,沈殿後很而反應處理的目的為在另外 使還原的金屬與包含較低原子量_lmNG元素之試劑反應的 同時,還原金屬離子、金屬氧陰離子及/或金屬硫陰離 子在某些6況下,直接-IDING會在沒有同時發生金屬氧 化態還原的情況下發生,例如某些硫化處理。 典型的氣相-IDING試劑包括但不限於硫化氫、甲硫醇及 二甲基硫(硫化試劑)、氨(氮化試劑)、甲烷、乙烷及其他 輕質烴類(碳化試劑)。該等氣相-IDING試劑可在環境壓力 V 下或加壓下直接與經IEX-2處理之基質起反應,或是在與 惰性氣體或氫氣混合之氣體中與與經IEX_2處理之基質起 , 反應進而產生相應的硫化物、碳化物或氮化物。可能有 催化效力之部分-IDED產物(包括硫氧化物、碳氧化物及氮 氧化物)亦可藉由下述方式產生:與實質上原樣接收/獲得 之基質、經IEX-2處理之整合基質、經IEX-2處理之緞燒基 貝或經IEX-2處理之還原基質進行不完全反應。 藉由兩次離子交換(兩次ΙΕχ_2處理)基質之還原處理, 可產生金屬磷化物,其中一項ΙΕΧ_2處理係一或多種過渡 126426.doc -50- 200843848 金屬離子,而另—項1EX_2處理係賴根離子。較佳地, 該兩項IEX-2處理可按順序執行。另外,金屬碟化物可藉 由使用氣相填化試劑(例如但不限於魏氫(pH〕))來產生所 要之金屬磷化物。例如,以處於合適氧化態之所需過渡全 屬進行單一離子交換之基質(經單m處理之基質),可 進一步用PH3處理來產生所需的金屬磷化物。 ,溶液相處理可用於產生金屬硫化物、金屬删化物及金屬 4化物催化成刀。產生金屬硫化物之典型溶體處理包括但 不限於在室溫至回流溫度之範圍内,以有效濃度之六甲基 二矽硫烷有機溶液處理經IEX_2處理之金屬·離子—整合基 貝,歷日守之時間足以在基質表面上及/或内產生催化有效 量之催化成分。 產生删化物之典型溶液相處理包括但不限於,對於經 IEX-2處理之金屬_離子-整合基質,在室溫至回流溫度之 間,歷時有效時間進行硼氫化鈉或硼氫化鉀水溶液處理。 產生嗓化物之典型溶液相處理包括在室溫至回流之範圍 内’對於經IEX-2處理之金屬-離子-整合基質進行次磷酸鈉 水溶液處理,歷時時間之足以在基質表面上及/或内產生 催化有效量之催化成分。 V ·催化活性區域說明 由於任何上述基質處理而產生的催化活性區域,將具有 ⑴小於或等於約30奈米的平均厚度,較佳為S約20奈米, 更佳為S約10奈米,及(ii)催化有效量之至少一種催化成 分。較佳地,使用XPS光譜學確定催化區域的平均厚度, 126426.doc -51 - 200843848 x P s光譜學使用稱為賤射深度分布之分層餘刻技術(會在以 下提供實例中的分析方法下更詳細說明)。然而,熟習此 項技術者所知的其他分析技術亦可用來確定催化成分對比 成分之相關基質表面的大體位置。所以,I質催化區域的 平均厚度可使用(例如但不限於)透射電子顯微鏡術(tem) 或掃描TEM(STEM,亦在以下更詳細說明)予以確定。熟 習此項技術者對XPS或TEM程序均有透徹的瞭解。 應理解,在極限情況下,無論催化活性區域係由IEX] 處理或IEX-2處理(有或無ΒΙχ處理)所產生,對於本發明之 =何觸媒組合物而言,催化活性區域的厚度一般⑷不會在 κ貝上牙過基質之表面區域或不會超過基質之外表面約 3〇奈米厚度,較佳不超過約2〇奈米厚度,更佳不超過奈 米厚度。關於在經處理之基質上及/或内一或多個催化活 性區域的定位,亦應理解催化活性區域可能: (a) 在基g之外表面,及存在任何孔隙時,在基質之孔 隙壁表面; (b) 在基質之表面區域中,亦即在基質外表面以下約% 奈米,較佳在基質外表面以下約2〇奈米,更佳在基 質外表面以下約10奈米;當存在任何孔隙時,在基 質孔隙壁表面以下約30奈米,較佳在基質孔隙壁表 面以下約20奈米,更佳在基f孔隙壁表面以下約1〇 奈米,但在基質表面下區域以上; (C)在基質之外表面上面或以上,t存在任何孔隙時, 部分在基質孔隙壁表面上或以上,而部分位於基質 126426.doc •52· 200843848 之表面區域中,或 (d) (a)、(b)及(c)之組合。 通常,無論為1型成分或2型成分,催化成分之量可在約 0.0002 wt·%至約5 wt·%之間,較佳在約〇·〇〇〇2 _%至約2 wt.°/。之間,更佳在約0.0005 wt.%至約1 wt·%之間。而且, • 本發明觸媒組合物之催化活性區域可為連續或不連續。 不5:理淪約束的情況下,據認為,覆蓋有不連續的催化 活性區域之觸媒組合物,與實質上覆蓋有連續或更廣泛之 連續催化活性區域的催化成分相比,至少同樣有效,而且 在有些情況下更為有效。催化有效區域在基質上的外表面 覆蓋範圍之程度,可在低至0.0001%覆蓋至高達1〇〇%覆蓋 之間。較佳地,催化有效區域之外表面覆蓋的程度在約 0.0001%至約10%之間,更佳在約0 0001%至約1%之間。 但,在不受理論約束的情況下,據認為,觸媒組合物,特 另J係/、有較低催化成分wt.%負載之觸媒組合物,彳艮可能催 I , 化有效〖生更強,因為在經處理之基質上及/或内的催化活 性區域變得更為分散(亦即在催化活性區域之間更大程度 的分布及分開)。 催化活性區域及其他上述觸媒組合物特性,均係基於發 明人對於進入穩態反應條件之前觸媒組合物狀態的最佳可 件貢訊。一或多種所述特性可改變的程度並不確定,而且 大。卩刀不可預測。儘管如此,在不受理論約束的情況下認 為,由於觸媒組合物促進其預定製程反應,本文所述之觸 媒組合物的官能性表面活性將允許與基質整合之催化成分 126426.doc -53- 200843848 的電荷及/或幾何定位及其他成分特性顯著變化。因此, 應理解,本文所述的本發明範圍,同樣擴展至在穩態反應 條件下由所主張之組合物產生的所有觸媒組合物。 νι·觸媒組合物在氫化方法中的應用 ................應物 之粒子内擴散阻力而使觸媒活性及選擇性受到限制的製程 (亦即擴散受限製程)最為有利。但,該等觸媒組合物還可 仙於不-定受到擴散限制的製程。例如,若沒有限制, -些製程僅僅需要上述類型的觸媒組合物提供單一類型之 催化相互作用,以幫助降低某個製程反應之活化能量。因 此,較低的活化能量可使該製程具有更好的熱力學特性 (例如,驅動該製裎所堂处曰 i柱所而之此罝變少)’ s此,進行商業化 產亦就更具成本效益。 非選擇性氫化(或簡稱”氫 古利m )万法係上述觸媒組合物可 有利用於處理烴、雜烴及1 田—卜〃 八此口物的一類方法。本文所使 用之fe係指僅由碳原子 # 物 M ’、 (C)及虱原子(H)構成的一群化合 物,而本文所使用之雜煙係指主要由碳=\ _成,但同時還含有除碳及氫以外:至子少 子(例如但不限於氧(〇)、氮(N)及/ ”他原 在氫化方法中,適於使用上述類型:觸嬋:合物。 化的含有烴及/或㈣Μ , 觸媒組合物進行氫 〆y、卫之I程流一般包括且古4«从1 碳原子及可能— /、有大約I至30個 戍夕個雜原子(例如氧、 但在某些情況下可铲 虱虱、&amp;等)的烴, J月匕超過3〇個碳屌早 t 個可氫化位點,在原子其中,烴有至少一 所需產物、產率及/或製程效率的 I26426.doc -54- 200843848 適當氫化條件下(以下更詳細描述),易於氫化。 製程流包括但不限於原料流、中間轉移流、再循環流及/ 或排放流。本文所使用之可氫化位點係指具有至少一個碳 原子(c)或雜原子的原子位置,但一般為含碳的原子位 置,而雜原子可為(但不限於)氧(〇)、氮(N)或硫⑻。' 益論 如何,化位點都具有至少一個不飽和度,而且在適當Typically, heat treatment conditions suitable for τργ 丄 and 辰 -2 treatments, such as heating, are selected according to the type of 'state' and χ-2 salt solution and the characteristics of the bismuth and matrix. Temperature, heating time and mixing conditions. Preferably, the heating temperature suitable for the ΙΕΧ_2 treatment using an acid may be between about 2 Torr and about 2 (K) t, more preferably between about 3 and about (4). The heating time for the IEX-2 treatment can vary depending on the concentration of the IEX-2 salt solution and the selected heating temperature. Preferably, the heating time suitable for the ΐΕχ_2 treatment is between about 5 minutes and about 48 hours, more preferably between about 3 minutes and about 5 hours. The system will be based on the type and concentration of the ΙΕΧ-2 salt solution used and the specificity of the matrix|± (for example, the affinity of the ions to be removed from the glass mesh, after the annihilation, Strength, etc.) and the duration of the heat treatment, depending on the mixing conditions. For example, without limitation, the mixing conditions can be continuous or broken, or mechanical mixing, fluidization, tumbling, rolling, or manual mixing.衾· ^ 丫' σ ' IEX-2 salt solution concentration, heat treatment state and combination of mixing conditions 5 each, only on the shell based on the integration of a sufficient amount of ΙΕΧ-2 ion and ΙΕχ-2 on the substrate and / or The distribution of ions is determined irrespective of the nature of the physico-chemical bonding of the surface of the substrate 126426.doc • 46-200843848 to produce the desired type and extent of surface charge to produce the desired use for the intended use of the catalyst composition. Surface, tongue state. Adjusting the surface charge of the substrate by adjusting the pH As mentioned above, considering the 2蜇 component precursor that will be integrated with the surface in the second IEX ("IEX-2") treatment, the degree of pH adjustment required will usually depend on ' The IEP of the matrix, the IEP of the matrix, the surface charge distribution curve and the desired charge type. For example, but not limited to, for a substrate having an IEP equal to 8, preferably, the pH of the matrix/IEX-2 mixture is adjusted to be between about 8 and about 12, more preferably between about 9 and about 11. The type of solution used to effect the pH adjustment will depend on compatibility with other reactants, stability of the matrix over the relevant pH range, and desired charge density and other factors. Generally, any dilute base can be used to adjust the surface charge of the substrate to the right of its IEP (ie, to produce a net negative surface charge), and any dilute acid can be used to adjust the surface charge of the substrate to the left side of its IEp (ie, to produce ϋ 'The positive surface charge of the battle.' The inorganic acid or base or the organic acid or base can be both concentrated and used, and is generally preferably an organic test. 35, often, the trace of a dilute acid solution or a dilute solution will depend on the type of acid or test used, its dissociation constant, and the pH at which the desired surface charge type and density are obtained. Preferably, after the 1EX-2 treatment is completed, the matrix treated with the core 2 can be separated by any suitable method including, but not limited to, over-twisting, centrifugation, decantation, and combinations thereof. Then, the substrate treated with ΙΕχ_2 is cleaned with one or more a human, suitable cleaning solutions (such as distilled water or deionized water, dilute alkali or dilute acid and / or a suitable water-soluble organic solvent such as methanol, ethanol or acetone). 126426.doc -47- 200843848 Wash, sub-dry at a temperature of about no c for about 2 to 24 hours. IV. Post-deep treatment description As a matter of course, the substrate treated by IEX.2 can be separated|can be dried only, calcined, calcined under oxidizing conditions, then reduced or further oxidized, • (d) reduced or in the case of drama Oxidation without calcination. The transition gold (Λ 35 ion, oxyanion and cations) of the surface deposition chamber can be carried out in the gas phase or liquid phase according to 'supremely, with suitable reduction, sulfurization, carbonization, nitridation, filling or chemical reagents (-(1)(4) reagent). / or a reaction of a sulfur anion to produce a corresponding catalytically effective metal sulfide / sulfur oxide, metal carbide / carbon oxide, metal nitride / nitrogen oxide, metal boride or metal phosphide component. Without limitation, the purpose of post-precipitation calcination treatment is essentially to decompose metal counterions or ligands, and to integrate metals, metal oxides, metal chalcogenides, etc. more closely with the surface of the substrate, and to remove any prior drying. Residual water removed during treatment. c Calcination conditions for substrates treated with IEX-2 are not particularly important for successful surface activation of the substrate. However, such conditions should only be sufficiently stringent to produce at least a catalytically effective amount. a catalytically active region of a precursor having a precipitated component. However, in the case of calcination, the substrate is first in an oxidizing atmosphere (for example, in air or oxygen). Calcination. In addition, the important system is to choose a high enough satin temperature to ensure that the precursor of the type 2 component of interest is oxidized and any residual water is removed (if any residual water remains), but the satin temperature should also be Low enough to reasonably avoid the softening point of the matrix and the decomposition of the undesired precipitated precursors. 126426.doc -48 - 200843848 For example, but not limited to, the precipitated sulfate requires calcination conditions to decompose the bound cations and fix the sulfate &amp; surface i, but #, etc. conditions must not significantly decompose the sulfate into volatile sulfur oxides. Similarly, metal oxyanions require calcination conditions to decompose the bound cations and immobilize the anions as oxides on the surface, However, the conditions shall not be so strict that the metal oxide volatilizes from the surface or causes the metal oxide to dissolve into the matrix. Finally, the precious metal and the complex compound should be calcined under the following conditions: decomposition of the ligand and anion present, but not strictly to concentrate the precious metal On the surface. For this reason, as explained in more detail below, the noble metal is preferably directly returned without calcination. Typically, the calcination temperature should be at least about 100 ° C lower than the softening point of the selected substrate. The calcination temperature should be between, more preferably between about 2 Torr and 600 ° C, optimally at about 300. (: Between 5(10) and c. Typically, the IEX-2 treated substrate is calcined for about 24 hours, preferably calcined for about 2 to about 12 hours. Nevertheless, the matrix-integrated type 2 component As such, the calcination time can vary outside of these ranges. Typically, but not limited to, the post-precipitation reduction treatment is intended to at least substantially (if not a king) catalyze the catalyzed component (eg, metal, metal oxide or metal sulfide) Reducing to a lower oxidation state integrated with the surface of the substrate. Suitable reducing agent is not limited to ccmH" h2 is a preferred reducing agent, and its flow rate is preferably about 001 L / hr per gram of substrate to Approximately 100 [/ between ''s better flow rate between 0.1 L/hl1 L/hr per gram of substrate. Typically, the reduction temperature should be between generations (four generations), provided that the temperature chosen is 126426.doc -49- 200843848 and the temperature selected is at least 1 &£&gt;c lower than the softening point of the matrix. Typically, the substrate treated with IEX-2 is subjected to a reduction treatment of from about 1 hour to about 48 hours, preferably from about W to about 8 hours. Alternatively, the ruthenium-2 treated substrate can be treated by solution phase treatment. Originally, the solution phase treatment uses a soluble reducing agent (such as, but not limited to, hydrazine, sodium hydride, hydrogenation, and combinations thereof) in a suitable solvent ( For example, water or B (6) • is carried out. f ^ but not limited to, after the temple is very, the purpose of the reaction treatment is to reduce the metal ions and metal oxygen while additionally reacting the reduced metal with a reagent containing a lower atomic amount of _lmNG element. Anion and/or metal sulphide anion In some 6 cases, direct-IDING will occur without simultaneous reduction of the metal oxidation state, such as certain sulfidation treatments. Typical gas phase-IDING reagents include, but are not limited to, hydrogen sulfide , methyl mercaptan and dimethyl sulfide (sulfiding reagent), ammonia (nitriding reagent), methane, ethane and other light hydrocarbons (carbonizing agents). These gas-IDING reagents can be at ambient pressure V or Directly reacting with IEX-2 treated substrate under pressure, or reacting with IXX_2 treated substrate in a gas mixed with inert gas or hydrogen to produce the corresponding sulfide, carbon Compounds or nitrides. Potentially catalytically active parts - IDED products (including sulfur oxides, carbon oxides and nitrogen oxides) can also be produced by: receiving and obtaining the substrate substantially as it is, via IEX- 2 treated integrated matrix, IEX-2 treated satin scallop or IEX-2 treated reducing matrix for incomplete reaction. Metal can be produced by two ion exchange (twice ΙΕχ_2 treatment) reduction treatment of the substrate A phosphide, wherein one ΙΕΧ_2 treatment is one or more transitions 126426.doc -50-200843848 metal ions, and the other -1EX_2 treatment is a lyon ion. Preferably, the two IEX-2 treatments can be performed sequentially. Alternatively, the metal dish can be used to produce the desired metal phosphide by using a vapor phase fill reagent such as, but not limited to, hydrogen (pH). For example, a single ion can be carried out with the desired transitional genus in a suitable oxidation state. The exchanged substrate (matrix treated with a single m) can be further treated with PH3 to produce the desired metal phosphide. The solution phase treatment can be used to produce metal sulfides, metal deletions and metal compounds. Forming a knife. Typical solution treatment for producing metal sulfides includes, but is not limited to, treatment of IEX_2 treated metal·ion-integration groups at an effective concentration of hexamethyldisulfanesulfane organic solution at room temperature to reflux temperature. The catalyzed time is sufficient to produce a catalytically effective amount of catalytic component on and/or within the surface of the substrate. Typical solution phase treatments that produce cleavage include, but are not limited to, for IEX-2 treated metal-ion-integrated substrates, The sodium borohydride or potassium borohydride aqueous solution is treated at room temperature to reflux temperature over a period of time effective. Typical solution phase treatment for the formation of telluride includes in the range from room temperature to reflux 'for IEX-2 treated metal - The ion-integrating substrate is treated with an aqueous solution of sodium hypophosphite for a time sufficient to produce a catalytically effective amount of a catalytic component on and/or within the surface of the substrate. V. Catalytic active region indicates that the catalytically active region resulting from any of the above substrate treatments will have (1) an average thickness of less than or equal to about 30 nm, preferably S of about 20 nm, more preferably S of about 10 nm. And (ii) catalyzing an effective amount of at least one catalytic component. Preferably, XPS spectroscopy is used to determine the average thickness of the catalytic region, 126426.doc -51 - 200843848 x P s spectroscopy uses a layered residual technique called the stencil depth distribution (the analysis method will be provided in the examples below) More detailed below). However, other analytical techniques known to those skilled in the art can be used to determine the general location of the substrate surface associated with the catalytic component contrast component. Therefore, the average thickness of the I-catalyzed region can be determined using, for example, but not limited to, transmission electron microscopy (TEM) or scanning TEM (STEM, also described in more detail below). Those skilled in the art have a thorough understanding of XPS or TEM procedures. It should be understood that in the extreme case, regardless of whether the catalytically active region is produced by IEX] treatment or IEX-2 treatment (with or without hydrazine treatment), for the catalyst composition of the present invention, the thickness of the catalytically active region Generally, (4) does not pass over the surface area of the matrix of the kappa shell or does not exceed the surface of the substrate by about 3 nm, preferably not more than about 2 nm, more preferably not more than the thickness of the nanometer. With regard to the localization of one or more catalytically active regions on the treated substrate and/or within the catalytically active region, it is also understood that the catalytically active region may: (a) be on the outer surface of the base g, and in the presence of any pores, in the pore walls of the matrix (b) in the surface region of the substrate, that is, about % nanometer below the outer surface of the substrate, preferably about 2 nanometers below the outer surface of the substrate, more preferably about 10 nanometers below the outer surface of the substrate; In the presence of any pores, about 30 nm below the surface of the pore wall of the matrix, preferably about 20 nm below the surface of the pore wall of the matrix, more preferably about 1 nm below the surface of the pore wall of the base f, but below the surface of the substrate surface. Above (C) above or above the outer surface of the substrate, t is partially on or above the surface of the pore wall of the substrate, and partially in the surface area of the substrate 126426.doc •52·200843848, or (d) A combination of (a), (b) and (c). Generally, the amount of the catalytic component may range from about 0.0002 wt.% to about 5 wt.%, preferably from about 〇·〇〇〇2 _% to about 2 wt.°, whether it is a type 1 component or a type 2 component. /. More preferably, it is between about 0.0005 wt.% and about 1 wt.%. Moreover, the catalytically active regions of the catalyst compositions of the present invention may be continuous or discontinuous. In the case of no 5: rational constraints, it is believed that the catalyst composition covered with the discontinuous catalytically active region is at least as effective as the catalytic component substantially covered by a continuous or broader continuous catalytically active region. And in some cases more effective. The extent to which the catalytically effective region covers the outer surface of the substrate can range from as low as 0.0001% coverage to as high as 1% coverage. Preferably, the extent of surface coverage outside the catalytically active region is between about 0.0001% and about 10%, more preferably between about 00001% and about 1%. However, without being bound by theory, it is believed that the catalyst composition, especially the J system / the catalyst composition with a lower catalytic component wt.% loading, may promote I It is stronger because the catalytically active regions on and/or within the treated substrate become more dispersed (i.e., more widely distributed and separated between the catalytically active regions). The catalytically active regions and other characteristics of the above-described catalyst compositions are based on the best possible information for the developer to state the state of the catalyst composition prior to entering the steady state reaction conditions. The degree to which one or more of the described characteristics can vary is not certain and is large. The sickle is unpredictable. Nevertheless, without being bound by theory, it is believed that the functional surface activity of the catalyst compositions described herein will allow for the integration of the catalytic component with the matrix 126426.doc-53 as the catalyst composition promotes its intended process reaction. - 200843848 The charge and / or geometric positioning and other composition characteristics vary significantly. Thus, it is to be understood that the scope of the invention described herein extends to all of the catalyst compositions produced by the claimed compositions under steady state reaction conditions. Application of νι·catalyst composition in hydrogenation process..................................................................................................................................................................................................................................................................................................................................................................... Diffusion is limited by the limit). However, such catalyst compositions can also be used in processes that are not limited by diffusion. For example, if not limited, some processes require only a single type of catalytic composition to provide a single type of catalytic interaction to help reduce the activation energy of a process reaction. Therefore, the lower activation energy allows the process to have better thermodynamic properties (for example, driving the 曰i column of the 裎 柱 而 而 ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ' ' ' ' ' ' ' ' ' ' ' ' ' Cost-effectiveness. Non-selective hydrogenation (or simply "hydrogen gim") The above-mentioned catalyst composition can be advantageously used for the treatment of hydrocarbons, hydrocarbons and 1 field - dip. Refers to a group of compounds consisting only of carbon atoms # M ', (C) and helium atoms (H), and the term "miscellane" as used herein refers mainly to carbon = \ _, but also contains carbon and hydrogen. : to the sub-children (such as but not limited to oxygen (〇), nitrogen (N) and / /" in the hydrogenation process, suitable for the use of the above type: contact: compound. Contains hydrocarbons and / or (d) Μ, touch The medium composition is hydroquinone y, and the I-flow is generally included and ancient 4 «from 1 carbon atom and possibly - /, there are about 1 to 30 hetero atoms (such as oxygen, but in some cases Shovel, &amp;, etc., J J 匕 more than 3 屌 carbon 屌 early t hydrogenation sites, in the atom, hydrocarbons have at least one desired product, yield and / or process efficiency of I26426. Doc -54- 200843848 Easily hydrogenated under suitable hydrogenation conditions (described in more detail below) Process streams include, but are not limited to, feed streams, medium A transfer stream, a recycle stream, and/or a discharge stream. As used herein, a hydrogenatable site refers to an atomic position having at least one carbon atom (c) or a hetero atom, but is generally a carbon-containing atomic position, and a hetero atom For (but not limited to) oxygen (〇), nitrogen (N) or sulfur (8). 'How to make it, the chemical sites have at least one degree of unsaturation, and

的反應條件下,有觸媒組合物參與時,容易達到至少部Z 飽和。Under the reaction conditions, at least partial Z saturation is easily achieved when the catalyst composition is involved.

Ο 另外,煙中不飽和位的程度及類型可能有所不同。因 此’夕烯fe、多快烴及環_可能有連續(僅限連續雙-雙 鍵)、共輛或間隔-或多個飽和及/或取代碳之雙鍵及/或: 鍵位。適於氫化之製程流還可有烯烴或多烯烴、芳香炉或 環烯烴、炔烴或多块烴混合物及/或具有至少—個可:化 四此,適於使用上述類型之觸媒組合物氫化的烴及/或 雜烴包括(但不限於)烯煙、二稀烴、多稀烴 '块 炉 煙、環烯烴、芳香烴、又私 、 不飽和植物油及可氫化含氧 物。可氯化含氧化合物包括(但不限於)嗣、輕、經酸、: 及其他具有-或多個氮或硫等除氧以外之雜原子的雜煙。 適於使用上述類型觸婼έ人 斤 觸媒組合物氫化的一類較佳的烴為呈 有2至:20個碳原子的正鏈歸烴、正鏈多稀烴及正鏈伊;: :具有6至12個(取代或未取代)碳原子的芳香烴。更佳的; t具有2至15個碳原子的正_烴、正鏈多浠烴、烯㈣ 香經、正鏈块煙、烯烴酸及稀烴嗣及具有6至8個碳 126426.doc -55- 200843848 原子的芳香烴。 行用具有-或多個一各類反應器執 的一個氫化區;^應=料流可與保持在氯化條件下 述)。該接觸1 合物充分接觸(以下更詳細描 化床系統中::定了?床系統、移動 批次操作中進行。… 述各類不同觸媒複合物,在 原床系統,定床_,- -… 需之反應溫度,然後流入含有固 疋觸媒硬合物床之氯化區。該氯化區自身可能包括一或多 :獨立的反應區’它們之間有加熱手段’可確保各反應區 輸入端保持所需之反應溫度。烴能夠以向上、向下或徑向 流動方式接觸觸媒床。較佳使烴徑向流過觸媒床。該 接觸觸媒時可為液相、氣液混合相或氣相,較佳為氣相。 上述觸I址合物在何種氫化條件下可用於許多氣化方 法’同樣取決於所需之產物'產率及/或製程效率,該等 氫化條件包括(a)溫度範圍一般在約至約538。〇,(b)壓力 範圍-般在約1〇1 kPa至約13,789 kPa,⑷氫氣與可氯化烴 之莫耳比範圍一般在約〇.1:1至約20:1,⑷反應器中的液時 空速(LHSV)範圍一般在約〇·ΐ hr·1至約20 hr1。 實例 現在結合以下實例更詳細說明本發明,以下實例說明或 模擬了涉及本發明實踐的多個態樣。應理解,在本發明精 神實質内的所有改變均希望得到保護,因此不能認為本發 126426.doc -56- 200843848 明僅侷限於該等實例。 具有大孔隙玻璃基質之觸媒組合物 實例1 大孔隙玻璃上之把 獲得由Dennert Poraver生產之大孔隙泡沫鈉鈣玻璃樣 品,即平均直徑約為4〇至125微米之玻璃珠。Ο In addition, the extent and type of unsaturation in the smoke may vary. Therefore, there may be continuous (only continuous double-double bonds), common or interval- or multiple double bonds of saturated and/or substituted carbon and/or: bond sites. The process stream suitable for hydrogenation may also have an olefin or multiolefin, an aromatic furnace or a cyclic olefin, an alkyne or a mixture of hydrocarbons and/or have at least one which may be suitable for use with a catalyst composition of the above type. Hydrogenated hydrocarbons and/or heterohydrocarbons include, but are not limited to, olefinic, di- and dilute hydrocarbons, poly-saturated hydrocarbons, cyclic olefins, aromatic hydrocarbons, private, unsaturated vegetable oils, and hydrogenatable oxygenates. Chlorinated oxygenates include, but are not limited to, hydrazine, light, acid, and other miscellaneous gases having one or more heteroatoms other than oxygen or sulfur. A preferred class of hydrocarbons suitable for hydrogenation using a contact group of the above-described type of strontium manganes is a normal chain hydrocarbon having from 2 to 20 carbon atoms, a normal chain polybasic hydrocarbon, and a normal chain; 6 to 12 (substituted or unsubstituted) aromatic hydrocarbons of carbon atoms. More preferably; n-hydrocarbons having from 2 to 15 carbon atoms, normal chain polyterpenes, alkene (tetra) scent, positive-chain chunks, olefinic acids and dilute hydrocarbons and having 6 to 8 carbons 126426.doc - 55- 200843848 Aromatic aromatic hydrocarbons. A hydrogenation zone having one or more reactors of the various types is used; ^ should = the stream can be maintained under chlorination conditions). The contact compound is in full contact (hereinafter detailed in the bed system:: the bed system, the mobile batch operation is carried out.... The various catalyst complexes in the original bed system, the fixed bed _, - -... The required reaction temperature is then flowed into the chlorination zone containing the solid catalyst hard bed. The chlorination zone itself may include one or more: a separate reaction zone 'with heating means between them' to ensure each reaction The zone input maintains the desired reaction temperature. The hydrocarbon can contact the catalyst bed in an upward, downward or radial flow. Preferably, the hydrocarbon flows radially through the catalyst bed. The contact catalyst can be liquid or gas. a liquid mixed phase or a gas phase, preferably a gas phase. Under which hydrogenation conditions, the above-mentioned contact sites can be used in many gasification processes 'also depending on the desired product' yield and/or process efficiency, The hydrogenation conditions include (a) a temperature range generally from about 538 to about 538. (b) a pressure range of from about 1 〇 1 kPa to about 13,789 kPa, and (4) a molar ratio of hydrogen to a chlorinated hydrocarbon is generally about 〇.1:1 to about 20:1, (4) The liquid hourly space velocity (LHSV) in the reactor is generally in the range of约·〇 hr·1 to about 20 hr1. Examples The present invention will now be described in more detail in connection with the following examples which illustrate or emulate various aspects relating to the practice of the invention. It is understood that all within the spirit of the invention The changes are intended to be protected, and therefore it is not considered that the present invention is limited to such examples. Catalyst Compositions with Large Porous Glass Substrate Example 1 Large Porous Glass was obtained from Dennart Poraver. A macroporous foamed soda lime glass sample, i.e., glass beads having an average diameter of about 4 to 125 microns.

u 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約25公克大孔隙玻璃及3公升5·5 wt·%之 硝酸各自置入4公升之塑膠廣口容器内。將該塑膠容器置 於30°C之通風烘箱内30分鐘,每1〇分鐘用手稍微搖晃一 下。酸次處理完成之後,使用帶有Whatman 541濾紙之布 氏(Buchner)漏斗過濾樣品,並使用約7·6公升去離子水清 洗。然後,在11(rc之溫度下,將酸浸後之樣品乾燥22小 時。 第二步,對經酸浸處理之大孔隙玻璃進行離子交換 (IEX)處理。在本實例中’使用二氫氧四胺鈀 [Pd(NH3)4](OH)2製備80毫升〇, 1 wt %之鈀溶液用於離子交 換(&quot;IEX溶液&quot;)。將4公克大孔隙玻璃加入離子交換溶液中 (’’玻璃/離子交換混合物”)。量測玻璃/離子交換混合物之 pH值,測得約1()·3。然&amp;,將混合物移人15〇毫升之塑膠 廣口容器内。將該塑膠容器置於5(rc之通風择箱内2^ 時’每3G分鐘用手猶微搖晃—下。離子交換處理完成之 後,使用帶有Whatman 541濾紙之布氏漏斗過據玻璃/離子 交換混合物,並使用約3.8公升去離子水清洗。然後,在 126426.doc -57- 200843848 1HTC溫度下,將離子交換玻璃樣品乾燥22小時。 第二步’對離子交換玻璃進行還原處理,其中離子交換 玻螭先在空氣流速為2 L/hr之空氣氣氛及3〇〇°c之溫度下烺 燒2小時,然後在氫氣流速為2 L/hr之氫氣(Η〗)氣氛及 3 00°C之溫度下還原4小時。 採用電感耦合電漿-原子發射光譜法(ICp_AES)分析樣 口口’免丨辰度之結果約為0.098 wt.% 〇 jr、 實例2 \ 4 大孔隙玻璃上之把 獲#由Dennert Poraver生產之大孔隙泡沫鈉鈣玻璃樣 品’即平均直徑約為40至125微米之玻璃珠。 第步,對於按原樣接收、未經烺燒之大孔隙玻璃樣品 進仃酸浸處理。將約25公克大孔隙玻璃及3公升5·5 wt%之 硝S文各自置入4公升之塑膠廣口容器内。將該塑膠容器置 於30 C之通風烘箱内30分鐘,每1〇分鐘用手稍微搖晃一 U 下馱/文處理元成之後,使用帶有Whatman 541濾紙之布 氏漏斗過濾樣品,並使用約7·6公升去離子水清洗。然 後,在11 0 C之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃進行離子交換 (ΙΕΧ)處理。在本實例中,使用二氣四胺鈀[pd(NH3)小ο): 製備80毫升〇·ΐ wt.%之鈀溶液用於離子交換(,,ΙΕχ溶液”)。 將4公克大孔隙玻璃加入離子交換溶液中(,,玻璃/離子交換 混合物”)。量測玻璃/離子交換混合物之?11值,測得約 8.1。然後,將混合物移入15〇毫升之塑膠廣口容器内。將 126426.doc -58- 200843848 該塑膠容器置於5〇°ρ夕、s 、風烘箱内2小時,每3 0分鐘用手 稍微搖晃一下。離子夺 又換處理完成之後,使用帶有u In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching. Approximately 25 grams of macroporous glass and 3 liters of 5·5 wt% of nitric acid were placed in a 4 liter plastic wide-mouth container. The plastic container was placed in a ventilated oven at 30 ° C for 30 minutes and shaken slightly by hand every 1 minute. After the acid treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. Then, the acid immersed sample was dried for 22 hours at a temperature of 11 (rc). In the second step, the acid leached macroporous glass was subjected to ion exchange (IEX) treatment. In this example, 'dihydrogen oxygen was used. Tetraamine palladium [Pd(NH3)4](OH)2 was prepared in 80 ml of hydrazine, 1 wt% palladium solution for ion exchange (&quot;IEX solution&quot;). 4 g of macroporous glass was added to the ion exchange solution ( ''Glass/ion exchange mixture'). Measure the pH of the glass/ion exchange mixture and measure about 1 ()·3. For &amp;, transfer the mixture to a 15 〇 ml plastic wide-mouth container. Place the plastic container in a 5 (arc selected box at 2^', shaking it by hand every 3G minutes. After the ion exchange process is completed, use a Buchner funnel with Whatman 541 filter paper to pass the glass/ion exchange mixture. And use about 3.8 liters of deionized water to clean. Then, at 126426.doc -57-200843848 1HTC, the ion exchange glass sample is dried for 22 hours. The second step is to reduce the ion exchange glass, where the ion exchange glass First in an air atmosphere with an air flow rate of 2 L/hr The mixture was calcined at a temperature of 3 ° ° C for 2 hours, and then reduced under a hydrogen gas flow rate of 2 L / hr of hydrogen gas at a temperature of 300 ° C for 4 hours. Inductively coupled plasma-atomic emission spectroscopy The method (ICp_AES) analyzes the result of the mouth-freeness of about 0.098 wt.% 〇jr, example 2 \ 4 on the large-porosity glass, the large-porosity foamed soda-lime glass sample produced by Dennert Poraver Glass beads with an average diameter of about 40 to 125 microns. In the first step, the macroporous glass sample received as received and not calcined is subjected to acid leaching treatment. About 25 grams of macroporous glass and 3 liters of 5·5 wt% The nitrates are placed in a 4 liter plastic wide-mouth container. Place the plastic container in a 30 C ventilated oven for 30 minutes, and shake it with a hand for 1 〇 minutes. The sample was filtered using a Buchner funnel with Whatman 541 filter paper and rinsed with about 7.6 liters of deionized water. The acid immersed sample was then dried for 22 hours at a temperature of 110 ° C. The second step, The acid-impregnated macroporous glass is subjected to ion exchange treatment. In this example, difluorotetramine palladium [pd(NH3) small ο) was used: 80 ml of a palladium solution of 〇·ΐ wt.% was prepared for ion exchange (, ΙΕχ solution). 4 g of macroporous glass was added. Ion exchange solution (,, glass/ion exchange mixture). Measure the value of the glass/ion exchange mixture to a value of about 8.1. Then, transfer the mixture into a 15 liter plastic wide-mouth container. 126426. Doc -58- 200843848 The plastic container is placed in a 5 ° ° °, s, air oven for 2 hours, shaking slightly by hand every 30 minutes. After the ion is replaced and the process is completed, use

Whatman 54 1濾紙之布庆 , 冲氏漏+過濾玻璃/離子交換混合物, 並使用約3 · 8公升去赫义u ^ t 子水h洗。然後,在110°C溫度下, 將離子交換玻璃樣品乾燥22小時。 第一/對每隹子父換玻璃進行還原處理,其中離子交換 玻璃先在空氣流速為2 L/hr之空氣氣氛及綱。c之溫度下锻 燒2小時,然後在氫教、、、六 孔(私)_速為2 L/hr之氫氣(η〗)氣氛及 300°C之溫度下還原4小時。 採用ICP_AES進行揭。八私 X Λ 樣口口刀析,把濃度之結果約為0.045 wt·% 〇 實例3 反離子交換之大孔隙玻璃上之把 獲得由Dennert Poraver峰姦夕士 a rr小^ , raver生屋之大孔隙泡沫鈉鈣玻璃樣 品,即平均直徑約為40至125微米之玻璃珠。 第一步,對於按原樣接收、未經锻燒之大孔隙玻璃樣品 進行酸浸處理。將約50公克之大孔隙玻璃及4公升5.5 wt% 之硝酸各自置人4公升之玻璃燒杯内。使用_台不鐵鋼举 式授拌機以300至500 rpm之速度在9(rc下進行機械授拌〕 小時。酸浸處理完成之後,使用帶有Whatman 541濾紙之 布氏漏斗過遽樣品’並使用約7.6公升去離子水清洗。然 後’在11 0°c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃進行Na'反離子交 換(&quot;Na-BIX”)處理。將在第一步中得到的經酸浸之樣品與 126426.doc -59- 200843848 4公升3 mol/L氯化鈉(NaCl)溶液混合(”玻璃/氯化鈉混合 物’,)。量測玻璃/NaCl混合物之pH值。根據需要,連續遂 滴添加約40 wt·%之氫氧化四丙基銨,將玻璃/NaCl混合物 之pH值調整至大於1 〇(在本實例中,得到的pH值約為 1〇·5)。然後,將該玻璃/NaCl混合物移入4公升之玻璃燒杯 中’且在5 0 °C溫度下加熱4小時,同時使用一台不鏽鋼紫 式攪拌機以300至500 rpm之速度攪拌。Na-BIX處理完成之 後,使用帶有Whatman 541濾紙之布氏漏斗過濾玻璃/氯化 鈉混合物並收集Na-BIX/玻璃樣品,然後使用約7.6公升去 離子水清洗。然後,在11(TC之溫度下,將Na_BIX/玻璃樣 品乾燥22小時。 第三步’對Na-BIX/大孔隙玻璃樣品進行第二次離子交 換(&quot;IEX-2”)處理。在本實例中,使用二氣四胺把 [Pd(NH3)4](Cl)2製備3公升0.01 wt·%之鈀溶液用於離子交 換(IEX-2溶液’’)。將35公克大孔隙玻璃加入ΙΕχ_2溶液中 (”玻璃/IEX-2混合物”)。量測玻璃/離子交換混合物之 值,測得約8·1。然後,將該混合物移入2公升之玻璃燒杯 中’且在50°C溫度下加熱4小時,同時使用一台不鏽鋼紫 式攪拌機以300至500 rpm之速度攪拌。離子交換處理完成 之後,使用帶有Whatman 54丨濾紙之布氏漏斗過濾破璃^離 子交換混合物,並使用約7.6公升去離子水清洗。然後, 在ii〇°c溫度下,將離子交換玻螭樣品乾燥22小時。w , 第四步,對IEX-2玻璃樣品進行還原處理,其中樣品在 氫氣(HO流速為2 L/hr之氫氣氣氛及3〇〇〇c之溫度下還原4 j 126426.doc -60 - 200843848 時。 採用ICP-AES進行樣品分析,鈀濃度之結果約為〇 〇2ι Wt·% 〇 實例4 大孔隙玻璃上之把 獲得由Dennert Poraver生產之大孔隙泡沫鈉鈣破璃樣 品’即平均直徑約為40至125微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約20公克之大孔隙玻璃及4公升5·5 之硝酸各自置入4公升之玻璃燒杯内。使用一台不鏽鋼紫 式攪拌機以300至500 rpm之速度在卯它下進行機械攪拌2 小時。酸浸處理完成之後,使用帶有Whatman 541濾紙之 布氏漏斗過濾樣品,並使用約7·6公升去離子水清洗。然 後,在11 〇 c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本實例中,使用二氣四胺鈀[pd(NH3)4]Cl2製備3 公升0.01 wt·%之鈀溶液用於離子交換(,,ΙΕχ溶液&quot;)。將約 18公克經酸浸之大孔隙玻璃加入離子交換溶液中(”玻璃/離 子交換混合物”)。量測玻璃/離子交換混合物之1)1^值。根 據需要,連續逐滴添加約29·8 wt·%之氫氧化銨(ΝΗ4〇Η), 將該混合物之pH值調整至大於1〇(在本實例中,得到的 值約為10.8)。然後,將該玻璃/離子交換混合物移入4公升 之玻璃燒杯中,且在5 0 C溫度下加熱2小時,同時使用一 台不鏽鋼槳式攪拌機以300至500 rpm之速度攪拌。離子交 126426.doc -61- 200843848 換處理完成之後,使用帶有Whatman 541濾、紙之布氏漏斗 過濾玻璃/離子交換混合物,並使用約7·6公升去離子水清 洗然後,在110 c溫度下,將離子交換玻璃樣品乾燥22 小時。 弟一步,對離子父換玻璃樣品進行還原處理,其中樣品 在氫氣(Η2)流速為2 L/hr之氫氣氣氛及3〇〇°c之溫度下還原4 小時。 採用ICP-AES進行樣品分析,鈀濃度之結果約為〇 〇47 Wt·%。 實例5 大孔隙玻璃上之把 獲得由Dennert Poraver生產之大孔隙泡沫鈉鈣玻璃樣 品’即平均直徑約為4〇至125微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒且未經酸浸之大孔 隙玻璃樣品進行離子交換處理。在本實例中,使用二氯氧 四胺鈀[?〇1(&gt;^3)4](011)2製備1.5公升0.001 wt·%之鈀溶液用 於離子交換(&quot;IEX溶液”)。將約8公克大孔隙玻璃加入離子 交換溶液中玻璃/離子交換混合物’’)。量測玻璃/離子交換 混合物之pH值。根據需要,連續逐滴添加約29.8 wt.%之 氫氧化銨(NH4〇H),將該混合物之pH值調整至大於1〇(在 本實例中,得到的pH值約為10.5)。將玻璃/離子交換混合 物移入2公升之塑膠廣口容器。將該塑膠容器置於5(rc之 通風烘箱内2小時,每3 0分鐘用手稍微搖晃一下。離子交 換處理完成之後,使用帶有Whatman 541濾紙之布氏漏斗 126426.doc -62- 200843848 過濾玻璃/離子交換混合物並收集離子交換-玻璃樣品,然 後使=約7_6公升之稀NH4〇H溶液清洗。稀nh4〇h溶液係 採用混合10公克之29 8 wt 0/dfNH4〇H溶液與約3.8公升去 離子水而製備m11Gt:溫度下,將離子交換玻璃 樣品乾燥22小時。 第一步,對離子交換玻璃樣品進行還原處理,其中離子 交換樣品錢氣(h2)流速為2 L/hr之氫氣氣氛及 度下還原4小時。 μ 抓用ICP-AES進行樣品分析,鈀濃度之結果約為Whatman 54 1 filter paper is celebrated, Chongshi leak + filter glass / ion exchange mixture, and use about 3 · 8 liters to wash the Heyi u ^ t water. The ion exchange glass samples were then dried for 22 hours at a temperature of 110 °C. First, the glass is subjected to a reduction treatment for each of the scorpions, wherein the ion exchange glass is first placed in an air atmosphere having an air flow rate of 2 L/hr. The steel was calcined at a temperature of c for 2 hours, and then reduced under hydrogen atmosphere at a hydrogen (η) atmosphere of 6 L/hr and at a temperature of 300 ° C for 4 hours. Revealed by ICP_AES. Eight private X Λ sample mouth knife analysis, the concentration of the result is about 0.045 wt·% 〇 Example 3 reverse ion exchange on the large pore glass to get by Dennert Poraver peak priest a rr small ^, raver house A macroporous foamed soda lime glass sample, i.e., glass beads having an average diameter of about 40 to 125 microns. In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching. Approximately 50 grams of macroporous glass and 4 liters of 5.5 wt% nitric acid were placed in a 4 liter glass beaker. Use a _ stand-free iron-type steel mixer to mechanically mix at 9 (rc) at a speed of 300 to 500 rpm. After the acid leaching process, use a Buchner funnel with Whatman 541 filter paper to pass through the sample' And use about 7.6 liters of deionized water to clean. Then, the acid immersed sample is dried for 22 hours at a temperature of 110 ° C. The second step is to carry out Na' counter ion exchange on the acid leached macroporous glass. (&quot;Na-BIX") treatment. Mix the acid leached sample obtained in the first step with 126426.doc -59-200843848 4 liters of 3 mol/L sodium chloride (NaCl) solution ("glass/chlorine Sodium mixture ',). Measure the pH of the glass/NaCl mixture. Add about 40 wt.% tetrapropylammonium hydroxide as needed, and adjust the pH of the glass/NaCl mixture to more than 1 〇. (In this example, the pH obtained is about 1 〇·5.) Then, the glass/NaCl mixture was transferred into a 4 liter glass beaker' and heated at 50 °C for 4 hours while using one The stainless steel purple mixer is stirred at a speed of 300 to 500 rpm. After the Na-BIX treatment is completed, use Filter the glass/sodium chloride mixture with a Buchner funnel with Whatman 541 filter paper and collect the Na-BIX/glass sample, then rinse with about 7.6 liters of deionized water. Then, at a temperature of 11 (TC, Na_BIX/glass sample) Dry for 22 hours. The third step is to perform a second ion exchange (&quot;IEX-2" treatment on the Na-BIX/macroporous glass sample. In this example, [Pd(NH3)4 is used using dioxetane. (Cl) 2 Prepare 3 liters of a 0.01 wt.% palladium solution for ion exchange (IEX-2 solution ''). Add 35 grams of macroporous glass to the ΙΕχ 2 solution ("glass / IEX-2 mixture"). The value of the glass/ion exchange mixture was measured and found to be about 8.1. Then, the mixture was transferred into a 2 liter glass beaker' and heated at 50 ° C for 4 hours while using a stainless steel violet mixer to 300 Stir at a speed of 500 rpm. After the ion exchange treatment is completed, the glass ion exchange mixture is filtered using a Buchner funnel with Whatman 54 丨 filter paper and washed with about 7.6 liters of deionized water. Then, at ii 〇 °c temperature Next, dry the ion exchange glass sample 22 Time. w, the fourth step, the IEX-2 glass sample is reduced, wherein the sample is reduced in hydrogen (HO gas flow rate of 2 L / hr hydrogen atmosphere and 3 〇〇〇 c temperature 4 j 126426.doc -60 - 200843848. Sample analysis by ICP-AES, the palladium concentration result is about ι2ι Wt·% 〇 Example 4 on the large-porosity glass, the large-porosity foamed sodium-calcium granule sample produced by Dennert Poraver is obtained. Glass beads having a diameter of about 40 to 125 microns. In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching. Approximately 20 grams of macroporous glass and 4 liters of 5·5 nitric acid were placed in a 4 liter glass beaker. Mechanical stirring was carried out for 2 hours at a speed of 300 to 500 rpm using a stainless steel violet mixer. After the acid leaching treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. The acid immersed sample was then dried for 22 hours at a temperature of 11 〇 c. In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange treatment. In the present example, 3 liters of a 0.01 wt.% palladium solution was prepared for ion exchange (, hydrazine solution &quot;) using dioxetamine palladium [pd(NH3)4]Cl2. About 18 grams of acid immersed macroporous glass was added to the ion exchange solution ("glass/ion exchange mixture"). Measure the 1) value of the glass/ion exchange mixture. About 29.8 wt% of ammonium hydroxide (ΝΗ4〇Η) was added dropwise as needed, and the pH of the mixture was adjusted to be greater than 1 Torr (in this example, the value obtained was about 10.8). The glass/ion exchange mixture was then transferred to a 4 liter glass beaker and heated at 50 C for 2 hours while stirring at 300 to 500 rpm using a stainless steel paddle mixer. Ion exchange 126426.doc -61- 200843848 After the completion of the treatment, use a Buchner funnel with Whatman 541 filter, paper filter glass / ion exchange mixture, and use about 7. 6 liters of deionized water to clean, then at 110 c temperature The ion exchange glass samples were dried for 22 hours. In the next step, the ion parent glass-changed sample was subjected to reduction treatment, in which the sample was reduced in a hydrogen atmosphere at a hydrogen (Η2) flow rate of 2 L/hr and at a temperature of 3 ° C for 4 hours. Sample analysis by ICP-AES showed a palladium concentration of approximately W47 Wt·%. Example 5 A large-porosity glass sample obtained from Dennart Poraver was obtained as a glass bead having an average diameter of about 4 to 125 μm. In the first step, ion exchange treatment is performed on a large pore glass sample which is received as it is, which is not calcined and which has not been acid leached. In the present example, 1.5 liters of a 0.001 wt.% palladium solution was prepared for ion exchange (&quot;IEX solution" using palladium dichlorooxytetramine [??1(&gt;^3)4](011)2. Add about 8 grams of macroporous glass to the glass/ion exchange mixture in the ion exchange solution ''). Measure the pH of the glass/ion exchange mixture. Add about 29.8 wt.% ammonium hydroxide (NH4) as needed. 〇H), adjust the pH of the mixture to more than 1 〇 (in this example, the pH obtained is about 10.5). Move the glass/ion exchange mixture into a 2 liter plastic wide-mouth container. Shake it by hand for 5 hours in a ventilated oven at 5 (rc). After the ion exchange treatment was completed, filter the glass/ion exchange mixture using a Buchner funnel with Whatman 541 filter paper 126426.doc -62- 200843848 The ion exchange-glass sample was collected and then washed with a solution of about 7-6 liters of dilute NH4〇H. The diluted nh4〇h solution was mixed with 10 grams of 29 8 wt 0/df NH 4 〇H solution and about 3.8 liters of deionized water. Preparation of m11Gt: ion exchange glass samples at temperature Drying for 22 hours. In the first step, the ion-exchanged glass sample was subjected to reduction treatment, in which the ion exchange sample was purged with hydrogen gas atmosphere at a flow rate of 2 L/hr for 4 hours. μ Grab the sample with ICP-AES Analysis, the result of palladium concentration is about

Wt.%。 實例6 大孔隙玻璃上之銘 U仔由Siscor生產之大孔隙泡沫納好玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。 第步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 t; 進行酸浸處理。將約49.61公克大孔隙玻璃及4公升5.5 wt·%之硝酸各自置入4公升之塑膠廣口容器内。將該塑膠 • 容器置於9〇°C之通風烘箱内2小時,每30分鐘用手稍微搖 晃一下。酸浸處理完成之後,使用帶有Whatman 541濾紙 之布氏漏斗過濾樣品,並使用約7·6公升去離子水清洗。 然後,在1 io°c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本實例中,使用二氯四胺鉑[PKNHjdCU製備 升0_16 wt·%之鉑溶液用於離子交換(”ΙΕχ溶液。。將約 126426.doc -63 - 200843848Wt.%. Example 6 On the large-porosity glass U-cells were made from a large-pore foam produced by Siscor, a glass bead with an average diameter of about 45 to 75 microns. In the first step, the macroporous glass sample t received as it is, which has not been calcined, is subjected to acid leaching treatment. About 49.61 grams of macroporous glass and 4 liters of 5.5 wt% of nitric acid were placed in a 4 liter plastic wide mouth container. Place the plastic container in a ventilated oven at 9 °C for 2 hours with a slight shake every 30 minutes. After the acid leaching treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. Then, the acid immersed sample was dried at a temperature of 1 io ° C for 22 hours. In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange treatment. In this example, a platinum solution of 0_16 wt.% was prepared using platinum tetrachloride tetrachloride [PKNHjdCU for ion exchange ("ΙΕχ solution. Will be approximately 126426.doc -63 - 200843848

15.86公克經酸浸之大孔隙玻璃加入離子交換溶液中(”破璃/ 離子交換混合物”)。量測玻璃/離子交換混合物之pH值。 根據需要,以約4〇%之氫氧化四丙基銨調整pH值。連續添 加氫氧化四丙基銨,將pH值調整至大於1〇(在本實例 得到的pH值約為u.83)。將玻璃/離子交換混合物移入4公 升之塑膠廣口容器。將該塑膠容器置於耽之通風供箱内 2小時,且每30分鐘用手猶微搖晃一下。離子交換處理完 成之後’使用帶有Whatman 54&quot;慮紙之布氏漏斗過濾玻璃/ 離子交換混合物,並使用約7.6公升去離子水清洗。缺 後,在1HTC溫度下,將離子交換玻璃樣品乾燥22小時。… 採用ICP-AES進行樣品分析,鉑濃度之結果約為〇·4ι15.86 grams of acid immersed macroporous glass is added to the ion exchange solution ("glass/ion exchange mixture"). The pH of the glass/ion exchange mixture was measured. The pH was adjusted as needed with about 4% of tetrapropylammonium hydroxide. The tetrapropylammonium hydroxide was continuously added to adjust the pH to more than 1 Torr (the pH obtained in this example was about u.83). The glass/ion exchange mixture was transferred to a 4 liter plastic wide mouth container. Place the plastic container in the ventilated box for 2 hours, and shake it with your hands every 30 minutes. After the ion exchange treatment was completed, the glass/ion exchange mixture was filtered using a Buchner funnel with Whatman 54&quot; paper and washed with about 7.6 liters of deionized water. After the absence, the ion exchange glass samples were dried for 22 hours at 1HTC temperature. ... ICP-AES for sample analysis, the result of platinum concentration is about 〇·4ι

Wt.0/〇。 實例7 大孔隙玻璃上之銘 獲得由Siscor生產之大孔隙泡沫鈉鈣玻璃樣品,即平均 直徑約為4 5至7 5微米之玻璃珠。 第一步,對於按原樣接收、未經烺燒之大孔隙玻璃樣品 進行酸浸處理。將約50.37公克大孔隙玻璃及4公升5·5 wt·%之硝酸置入4公升之塑膠廣口容器内。將該塑膠容器 置於9CTC之通風烘箱内2小時,每30分鐘用手稍微搖晃一 下。酸浸處理完成後,傾析出溶液,然後使用約7·6公升 去離子水清洗固態物。然後,在u〇°c之溫度下,將酸浸 後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 126426.doc -64- 200843848 處理。在本實例中,使用二氯四胺鉑[Pt(NH3)4]ci2製備^公 升0.18 wt·%之鉑溶液用於離子交換(,,ΙΕχ溶液π)。將約 41.79公克經酸浸之大孔隙玻璃加入離子交換溶液中(,,玻璃/ 離子交換混合物”)。玻璃/離子交換混合物之?11值測得為 6.8,在本實例中,ρΗ值並未調整。將玻璃/離子交換混合 物移入4公升之塑膠廣口容器。將該塑膠容器置於9〇。〇之 通風烘箱内4小時,每3 0分鐘用手稍微搖晃一下。離子交 換處理完成後,傾析出溶液,然後使用約7·6公升去離子 水清洗固態物。然後,在ll〇t:溫度下,將離子交換玻璃 樣品乾燥22小時。 採用ICP-AES進行樣品分析,鉑濃度之結果約為〇13 wt·0/。。 實例8 大孔隙玻璃上之把 獲得由Siscor生產之大孔隙泡沫鈉鈣玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。 第一步,對於按原樣接收、未經緞燒之大孔隙玻璃樣品 進行酸浸處理。將約20公克之大孔隙玻璃及4公升55对% 之硝酸置入4公升之玻璃燒杯内。使用一台不鏽鋼紫式搜 拌機以300至500 rpm之速度在90°C下進行機械搜掉2小 時。酸浸處理完成之後’使用帶有Whatman 541滤紙之布 氏漏斗過濾樣品,並使用約7 · 6公升去離子水清洗。 後’在110°c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 126426.doc -65- 200843848 處理。在本實例中,使用二氯四胺鈀[Pd(NH3)4]ci2製備3 公升0.01 wt.%之鈀溶液用於離子交換(&quot;IEX溶液”)。將約 1 8公克經酸浸之大孔隙玻璃加入離子交換溶液中(”玻璃/離 子交換混合物’’)。量測玻璃/離子交換混合物之pH值。根 據需要’連續逐滴添加約29·8 wt·%之氫氧化錢(nh4〇h), 將該混合物之pH值調整至大於1 〇(在本實例中,得到的pH 值約為10.78)。然後,將該玻璃/離子交換混合物移入4公 升之玻璃燒杯中’且在5 0 C溫度下加熱兩小時,同時使用 一台不鏽鋼槳式檟;拌機以300至500 rpm之速度搜拌。離子 交換處理完成之後’使用帶有Whatman 541濾紙之布氏漏 斗過慮玻璃/離子交換混合物,並使用約7 · 6公升去離子水 清洗。然後,在ll〇°C溫度下,將離子交換玻璃樣品乾燥 22小時。 第三步,對離子交換玻璃樣品進行還原處理,其中樣品 在氫氣(H2)流速為2 L/hr之氫氣氣氛及30〇。〇之溫度下還原4 小時。 採用ICP-AES進行樣品分析,把濃度之結果約為〇 〇47 wt·% 〇 實例9 大孔隙玻璃上之把 獲得由Siscor生產之大孔隙泡沫鈉鈣破璃樣品,即平均 直徑約為45至75微米之玻璃珠。 第一步’對於按原樣接收、未經烺燒之大孔隙玻璃樣品 進行酸浸處理。將約49.61公克大孔隙玻璃及4公升5.5 126426.doc -66 - 200843848Wt.0/〇. Example 7 On the large-porosity glass A sample of a large-pore foamed soda lime glass produced by Siscor, that is, a glass bead having an average diameter of about 45 to 75 μm was obtained. In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching. About 50.37 grams of macroporous glass and 4 liters of 5·5 wt% of nitric acid were placed in a 4 liter plastic wide-mouth container. The plastic container was placed in a 9 CTC ventilated oven for 2 hours and shaken slightly by hand every 30 minutes. After the acid leaching treatment was completed, the solution was decanted, and then the solid matter was washed with about 7.6 liters of deionized water. Then, the acid immersed sample was dried at a temperature of u 〇 °c for 22 hours. In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange 126426.doc -64-200843848. In the present example, a platinum solution of 0.18 wt% was prepared using tetrachlorotetramine platinum [Pt(NH3)4]ci2 for ion exchange (, ΙΕχ solution π). Approximately 41.79 grams of acid immersed macroporous glass was added to the ion exchange solution (, glass/ion exchange mixture). The value of the glass/ion exchange mixture was determined to be 6.8. In this example, the value of ρΗ was not Adjust. Move the glass/ion exchange mixture into a 4 liter plastic wide-mouth container. Place the plastic container in a 9 〇 通风 ventilated oven for 4 hours, shake it slightly by hand every 30 minutes. After the ion exchange treatment is completed, The solution was decanted, and then the solid was washed with about 7.6 liters of deionized water. Then, the ion-exchanged glass sample was dried for 22 hours at ll〇t: temperature. Sample analysis by ICP-AES, the result of platinum concentration was about 〇13 wt·0/. Example 8 On a large-pore glass, a large-pore foamed soda lime glass sample produced by Siscor, that is, a glass bead having an average diameter of about 45 to 75 μm, was obtained. The macroporous glass sample received and not satin-fired was subjected to acid leaching treatment. About 20 grams of macroporous glass and 4 liters of 55-% nitric acid were placed in a 4 liter glass beaker. A stainless steel was used. The machine was mechanically searched at a speed of 300 to 500 rpm for 2 hours at 90 ° C. After the acid leaching process was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and used for about 7.6 liters. Ion water cleaning. The sample after acid leaching was dried for 22 hours at a temperature of 110 ° C. In the second step, the acid leached macroporous glass sample was subjected to ion exchange 126426.doc -65 - 200843848 treatment. In the present example, 3 liters of a 0.01 wt.% palladium solution was prepared for ion exchange (&quot;IEX solution" using dichlorotetramine palladium [Pd(NH3)4]ci2. Approximately 18 grams of acid leached macroporous glass is added to the ion exchange solution ("glass/ion exchange mixture"). The pH of the glass/ion exchange mixture is measured. As needed, 'continuously add about 29.8 The wt%% hydrogen hydroxide (nh4〇h), the pH of the mixture is adjusted to greater than 1 〇 (in this example, the resulting pH is about 10.78). Then, the glass/ion exchange mixture is transferred to 4 In a glass beaker of liters and heated at 50 °C for two hours while using a stainless steel paddle crucible; the mixer is mixed at a speed of 300 to 500 rpm. After the ion exchange treatment is completed, 'Use with Whatman 541 filter paper The Buchner funnel was passed through the glass/ion exchange mixture and washed with about 7.6 liters of deionized water. The ion exchange glass sample was then dried for 22 hours at ll 〇 ° C. The third step was to ion exchange glass. The sample was subjected to a reduction treatment in which the sample was reduced in a hydrogen atmosphere at a hydrogen (H2) flow rate of 2 L/hr and at a temperature of 30 Torr. The sample was analyzed by ICP-AES, and the concentration was approximately 〇〇47. Wt· % 〇 Example 9 On the large-porosity glass, a large-porosity foamed soda-calcium glass sample produced by Siscor, that is, a glass bead having an average diameter of about 45 to 75 μm was obtained. The first step was received as received without being burnt. The macroporous glass sample is subjected to acid leaching treatment. Will be about 49.61 grams of macroporous glass and 4 liters 5.5 126426.doc -66 - 200843848

Wt·%之硝酸各自置入4公升之塑膠廣口容器内。將該塑膠 容器置於90。(:之通風烘箱内2小時,每30分鐘用手稍微搖 无下自文,文處理完成之後’使用帶有Whatman 54 1濾紙 之布氏漏斗過濾樣品,並使用約入6公升去離子水清洗。 然後,在litre之溫度下,將酸浸後之樣品乾燥22小時。Wt·% nitric acid is placed in a 4 liter plastic wide-mouth container. Place the plastic container at 90. (: 2 hours in a ventilated oven, shake the hand slightly every 30 minutes, after the text is processed, 'Filter the sample with a Buchner funnel with Whatman 54 1 filter paper and wash it with about 6 liters of deionized water. The acid leached sample was then dried for 22 hours at the temperature of litre.

第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本實例中,使用二氫氧四胺鈀[pd(NH3川(〇H)2製 備1公升0.0003 wt·%之鈀溶液用於離子交換(,,ΙΕχ溶液。。 將約15.06公克經酸浸之大孔隙玻璃加入離子交換溶液中 (玻璃/離子交換混合物”)。量測玻璃/離子交換混合物之 pH值。根據需要,連續逐滴添加約29·8之氫氧化銨 (ΝΗβΗ),將該混合物之pH值調整至大於1〇(在本實例 中’得到的pH值約為10.2)。將玻璃/離子交換混合物移入4 公升之塑膠廣口 $器。將該塑膠容器置於抓之通風洪箱 内2小時,每30分鐘用手稍微搖晃一 了。離子交換處理完 :之後,使用帶有Whatman 541濾紙之布氏漏斗過濾樣 品,並使用約7.6公升稀NH4〇h溶液清洗。稀簡猶溶液 係採用混合1 ()公克之29·δ wt %濃簡魏溶液與約3.8公升 去離子水而製備。然後,在⑽溫度下,將離子交換玻 璃樣品乾燥22小時。 、 採用ICP-AES進行樣品分析,纪濃度之結果約為⑹ 社%。採用如(下面)實例咖所述之掃描透射電子顯微鏡 (STEM)分析對樣品之一部分進檢 、、、口禾表明,鈀顆 粒(對比度較亮的點)-般散布在與孔隙壁表面距離小於或 126426.doc -67- 200843848 寺於約30奈米之範圍内(亦即,相對於對比度相對較亮之 基質周圍材料區域,對比度較暗之陰影區域的周界)。 實例10 大孔隙玻璃上之鎢 - 獲得由siscor生產之大孔隙泡沫鈉鈣玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。 • 第一步,對於按原樣接收、未經烺燒之大孔隙玻璃樣品In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange treatment. In the present example, 1 liter of a 0.0003 wt.% palladium solution was prepared using palladium dihydrooxytetraamine [pd(NH3)(〇H) 2 for ion exchange (,, ΙΕχ solution. About 15.06 gram of acid leaching The macroporous glass is added to the ion exchange solution (glass/ion exchange mixture). The pH of the glass/ion exchange mixture is measured. If necessary, about 29.8 ammonium hydroxide (ΝΗβΗ) is continuously added dropwise, The pH of the mixture was adjusted to greater than 1 〇 (in this example 'the pH obtained was approximately 10.2.) The glass/ion exchange mixture was transferred to a 4 liter plastic wide-mouth device. The plastic container was placed in a ventilated flood. The box was shaken for 2 hours every 30 minutes. After ion exchange treatment: After that, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with a solution of about 7.6 liters of dilute NH4〇h. The solution was prepared by mixing 1 () g of 29·δ wt % concentrated Wei solution with about 3.8 liters of deionized water. Then, the ion exchange glass sample was dried at (10) for 22 hours. ICP-AES was used. Sample analysis About (6) %. Using a scanning transmission electron microscope (STEM) analysis as described in the example below (C), a portion of the sample was examined, and the mouth of the sample showed that the palladium particles (the point where the contrast was brighter) were scattered. The distance from the surface of the pore wall is less than or equal to 126426.doc -67-200843848 in the range of about 30 nanometers (i.e., the perimeter of the darker contrasted shadow region relative to the material region around the substrate where the contrast is relatively bright). Example 10 Tungsten on Large Porous Glass - Obtained a sample of macroporous foamed soda lime glass produced by siscor, a glass bead having an average diameter of about 45 to 75 microns. • The first step, for receiving as received, without smoldering Large pore glass sample

c 進行酸浸處理。將約公克之大孔隙玻璃及4公升5.5 wt.Z 之硝酸置入4公升之玻璃燒杯内。使用一台不鏽鋼槳式攪 拌機以300至500 rpm之速度在9〇t下進行機械攪拌2小 時。酸浸處理完成之後,使用帶有Whatman 541濾紙之布 氏漏斗過濾樣品,並使用約7·6公升去離子水清洗。然 後,在11 〇 c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本例中,用偏鎢酸銨製備3 I, 公升0·05 wt·%之鎢溶液用於離子交換(&quot;IEX溶液”)。將約 1 8公克經酸浸之大孔隙玻璃加入離子交換溶液中(,,玻璃/離 • 子交換混合物&quot;)。量測玻璃/離子交換混合物之pH值。根 據需要,連續逐滴添加約29.8 wt·%之氫氧化銨(NH4〇h), . 將該混合物之PH值調整至大於δ。然後,將該玻璃/離子交 換混合物移入4公升之玻璃燒杯中,且在5(rc溫度下加熱 兩小時,同時使用一台不鏽鋼槳式攪拌機以3⑽至5〇〇卬㈤ 之速度攪拌。離子交換處理完成之後,使用帶有Whatman 541濾紙之布氏漏斗過濾玻璃/離子交換混合物,並使用約 126426.doc -68 - 200843848 5公升去離子水清洗。然後,在丨丨〇t:溫度下,將離子交換 玻璃樣品乾燥22小時。 第三步,對離子交換玻璃樣品進行煅燒處理,其中樣品 在空氣流速為2 L/hr之空氣及500。(:之溫度下烺燒4小時。 採用ICP-AES進行樣品分析,鎢濃度之結果預期約為 0·01 wt·%。 實例CH-1 分析方法re/XPS濺射,SARCNa, 專電點(IEP)及 S.A.N2-BET或 S.A.Kr-BET測定 X射線光電子光譜學(XPS)濺射深度分布法 使用口 f有1486·7 eV微聚焦單色化Α1 Κα X射線源的 PHI Quantum 200 Scanning ESCA Microprobe™(Physical Electronics公司)獲得xps濺射深度分布。儀器具有雙中和 旎力,在光譜採集過程中,利用低能電子及陽離子提供電 荷補償。 XPS譜通常在以下條件下測得: -X射線束直徑1〇_2〇〇 μχη -X射線束功率2-40 W •樣品分析區10-200 μπι •電子發射角度與樣品法線呈45。 所有XPS譜及濺射深度分布均在室溫下記錄,不對樣品 進行預處理,但將樣品置於xps儀器真空環境中的情況除 外。 藉由交替幾個週期的樣品表面光譜採集,然後在每個週 126426.doc -69- 200843848 期對樣品表面進行15至30秒的2 kv Ar+濺射以清除表面材 料來生成濺射深度分布。使用一層已知厚度的矽薄膜校準 濺射深度速率。c Perform acid leaching. Approximately gram of macroporous glass and 4 liters of 5.5 wt. Z of nitric acid were placed in a 4 liter glass beaker. Mechanical stirring was carried out at 9 Torr for 2 hours using a stainless steel paddle mixer at 300 to 500 rpm. After the acid leaching treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. The acid immersed sample was then dried for 22 hours at a temperature of 11 〇 c. In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange treatment. In this example, 3 I is prepared with ammonium metatungstate, and a 0.05 wt.% tungsten solution is used for ion exchange (&quot;IEX solution). About 18 g of acid-impregnated macroporous glass is added to the ion. Exchange the solution (,, glass/ion exchange mixture &quot;). Measure the pH of the glass/ion exchange mixture. Add about 29.8 wt% ammonium hydroxide (NH4〇h) continuously as needed. The pH of the mixture was adjusted to be greater than δ. The glass/ion exchange mixture was then transferred to a 4 liter glass beaker and heated at 5 (rc temperature for two hours while using a stainless steel paddle mixer to 3 (10) Stir at a speed of 5 Torr (5). After completion of the ion exchange treatment, the glass/ion exchange mixture was filtered using a Buchner funnel with Whatman 541 filter paper and rinsed with about 126426.doc -68 - 200843848 5 liters of deionized water. Then, the ion-exchanged glass sample was dried for 22 hours at 丨丨〇t: temperature. In the third step, the ion-exchanged glass sample was subjected to a calcination treatment in which the sample was air at a flow rate of 2 L/hr and 500 (: Temperature Squeeze for 4 hours. Sample analysis by ICP-AES, the result of tungsten concentration is expected to be about 0·01 wt·%. Example CH-1 Analysis method re/XPS sputtering, SARCNa, special point (IEP) and SAN2- BET or SAKr-BET measurement X-ray photoelectron spectroscopy (XPS) sputter depth distribution method using PHI Quantum 200 Scanning ESCA MicroprobeTM (Physical Electronics) with 1486·7 eV microfocus monochromator Α1 Κα X-ray source The xps sputter depth profile is obtained. The instrument has dual neutralization force, which provides charge compensation using low-energy electrons and cations during spectral acquisition. XPS spectra are usually measured under the following conditions: - X-ray beam diameter 1〇_2 〇〇μχη -X-ray beam power 2-40 W • Sample analysis area 10-200 μπι • The electron emission angle is 45 with the sample normal. All XPS spectra and sputter depth distributions are recorded at room temperature without pre-preparing the sample. Dispose of, except when the sample is placed in a vacuum environment of the xps instrument. The surface of the sample is collected by alternating several cycles, and then the surface of the sample is subjected to 15 to 30 seconds per week 126426.doc -69 - 200843848 2 kv Ar+ sputtering is used to remove the surface material to create a sputter depth profile. The sputter depth rate is calibrated using a thin film of known thickness.

Pd及Si原子濃度值之獲取方法為,取pd 3d3/2及Si 2卩之 峰面積並針對其各自的原子靈敏度因數及分析儀傳輸函數 進行修正。 熟習XPS分析技術者應瞭解,濺射深度參數的測定既受 人為不確定度亦受機械不確定度之影響,兩者結合可能對 才木用XPS濺射深度分布技術測定之濺射深度的每個報告值 造成約25%之不確定度。因此,該不確定度表現在圖}及2 所不之深度值上。該不精確在整個xps分析技術中都很普 遍,但,對於在本文所揭示之催化活性區域的平均厚度及 其他材料屬性來說,該不精確不足以妨礙對本文所述之觸 媒組合物進行區分,亦不會影響該等組合物與其他未在本 文描述及主張的組合物進行區分。 透射電子顯微鏡(TEM)分析法 透射電子顯微鏡(TEM)樣品檢測使用在3〇〇 kv加速電壓 下工作的JEOL 3000F場發射掃描透射電子顯微鏡(stem) 儀器。該儀器裝有牛津儀器公司(〇xf〇rd比价㈣⑽^的The Pd and Si atomic concentration values are obtained by taking the peak areas of pd 3d3/2 and Si 2 并 and correcting their respective atomic sensitivity factors and analyzer transfer functions. Those skilled in the art of XPS analysis should understand that the measurement of the sputter depth parameter is affected by both human uncertainty and mechanical uncertainty. The combination of the two may be used to determine the sputter depth of the wood using the XPS sputter depth distribution technique. The reported values cause an uncertainty of approximately 25%. Therefore, the uncertainty is expressed in the depth values of Figures and 2. This inaccuracy is common throughout the xps analysis technique, but for the average thickness and other material properties of the catalytically active regions disclosed herein, this inaccuracy is insufficient to hinder the performance of the catalyst compositions described herein. The distinction does not affect the differentiation of such compositions from other compositions not described and claimed herein. Transmission Electron Microscopy (TEM) Analysis Transmission electron microscopy (TEM) sample detection was performed using a JEOL 3000F field emission scanning transmission electron microscope (stem) instrument operating at 3 〇〇 kv accelerating voltage. The instrument is equipped with Oxford Instruments (〇xf〇rd Price (4) (10)^

Inca X射線光譜儀系統,使用能量色散光譜儀執行局部化 學分析。 樣品之製備首先將樣品材料嵌入熟fTEM分析技術者所 知的標準環氧包埋劑中。固化後,使用超薄切片機將環氧 包埋的樣品材料切割為約80奈米厚的切片。切片收集在薄 126426.doc -70- 200843848 膜有孔碳載體上,不需要進一步加工,適當定位於上述 STEM儀器的電子束場中,以供檢測及分析。The Inca X-ray spectrometer system performs local chemical analysis using an energy dispersive spectrometer. Preparation of the sample The sample material is first embedded in a standard epoxy embedding agent known to those skilled in the art of fTEM analysis. After curing, the epoxy-embedded sample material was cut into approximately 80 nm thick sections using an ultramicrotome. The sections were collected on a thin film 126426.doc -70-200843848 membrane-porous carbon support and were not properly processed and properly positioned in the electron beam field of the above STEM instrument for detection and analysis.

熟習TEM分析技術者應瞭解,使用TEM分析方法測定目 標分析物的位置及關心區域相對於基質表面的平均厚度既 受人為不確定度之影響,亦受機械不確定度之影響,取決 於樣品之圖像解析度、目標分析物之物理化學特性及樣品 形態等因素,可能造成約±20%的TEM垂直深度量測結果 (相對於某個具體參照點)不確定度及約士5%之側位量測結 果(相對於某個具體參照點)不確定度。因此,該不確定度 表現在測得的催化成分相對於樣品基質表面的距離上。該 不精確在整個TEM分析過程中都很普遍,但並不足以妨礙 觸媒組合物之間的區分。 SARCNa測疋、SARCNa空樣及相關統計分析 由於以上討論之原g],納的表面積變化率(”sarc〇報 告為NaOH滴定液體積之比率。 根據上述SARC心程式,測定以下實例中給定之每個樣 =之SAIU^。藉由配製3.5 MNaC1溶液(亦即在…毫升去 離子水中加入3〇公克NaC1)製備一 J衣1育切空樣,其不含基質樣 品。但,為了解決SAR‘實驗程序中之統計上的變異 性,應滴定四份獨立的空樣’且使用獲得V初及V…5(亦 所用之規定濃度(本實例中為〇〇1 N)滴定量平 均值來調整(亦即修正)各基質σ — 負豫口口 SARCW測定所使用之滴 疋液體積。根據與上述SARQ敎相同的程序調整空樣 pH值並滴定空樣,但同樣不含基質。 126426.doc 200843848 在以下提供的各空樣品及其各自的平均值及標準偏差 (或V總的σ)分析測試結果表格中報告空樣滴定量的統計分 析。同樣,亦報告了由於各自V總所引起之相應於各滴定 里Vw V5 Vio及V】5的固有統計上之波動。從統計學的角 _ I纟t分布,在平均值附近,所指定之信賴區間 X卜的數值可罪,並非源於實驗方法自身固有偏差的確定 度達到95 /〇所以,對於空樣平均值附近信賴區間内的基 質樣品測付的V初及vt值被視為在統計學上與空樣沒有差 別。因此,此類樣品不計算SarCw值。 等電點(1EP)測定 根據以下耘式測定下面給定之各樣品的等電點(,,ΐΕρπ)。 使用帶 pH mV/0RP模組的 Meuler T〇led〇 SevenMulti表,配 合Mettler Toledo INLAB 413 pH複合電極進行iEp量測。在 所關心的整個IEP範圍内,利用pH值為2、4、7及1〇的標準 pH值緩衝溶液校準儀錶。使用足以使樣品達到初濕狀態的 C,; 一定量16 ΜΩ*離子水(在約25。(:下)潤濕樣品,測定每份 樣品的ΙΕΡ,由此可產生比較稠密的聚状或糊狀混合物。 • 而該初濕狀態可使玻璃電極及其參考電極觸面與接觸受測 固體樣品的液體(在本實例中為漿状或糊狀混合物)之間達 成液體接觸。根據樣品的形態(例如玻璃微纖維、粒狀粉 末、切短纖維等)及其多孔性(若有)程度,該程序需要不同 的水量。但在所有情況下,添加的水量應該僅僅足以使充 分的液體與玻璃電極及參考電極觸面接觸。換句話說,對 受測樣品加水應該儘可能避免使樣品超過初濕狀態。在所 126426.doc -72- 200843848 有情況下使用電極頭,用手將固體樣品與去離子水(添力 用於產生初濕)混合,直至測得的pH值穩定,然後從儀 1我錶 讀取所得pH值。 N2 BET或Kr BET表面積(S.A.)測定 根據以上提及之A S TM程序,對以下給定之每份樣口、 當進行 S.A.N2-BET 或 S.A.K卜BET 測定。如根據以上更充&gt; 討論,對於較高的表面積量測值(例如約3至6 m2/a, W,按照 ASTM D3663-03所述之方法,% BET很可能為較佳的 』衣面 積量測技術。而對於較低的表面積量測值(例如, 、 &lt;約3 m2/g),按照 ASTM D4780-95(,,S.A.pir&quot;)所述之方法, ^ ' Kr B E T可能為較佳的表面積量測技術。 樣品 號 稀 NaOH 滴定液 S.A.N2-BET (m2/g) 在NaOH滴定中,使pH值從tc(V初)時4·〇的 初始值調整至9.0,並在時 將pH值保持在9.0所需的滴定液體積(毫升) 濃度(N) V初 0分鐘 v5 5分鐘 v10 10分鐘 V15 15分鐘 V5i15 之和 V初〜ls 空樣A 0.01 不適用 1.5 0.3 0.1 0.2 0.6 2.1 空樣B 0.01 不適用 2.2 0.1 0.1 0.2 0.4 2.6 空樣C 0.01 不適用 2.4 0.1 0.1 0.1 0.3 2.7 空樣D 0.01 不適用 2.2 0.1 0.2 0.1 0.4 2.6 ----— 空樣平均值 0.01 不適用 2.075 0.15 0.125 0.15 0.325 ----- 2.5 空樣標準偏差 0.01 不適用 0.3947 0.1 0.05 0.0577 不適用 空樣95% 信賴區間 1.45-2.70 2.07-2.93Those familiar with TEM analysis should understand that the use of TEM analysis to determine the position of the target analyte and the average thickness of the region of interest relative to the surface of the substrate are both subject to human uncertainty and mechanical uncertainty, depending on the sample. Factors such as image resolution, physicochemical properties of the target analyte, and sample morphology may result in an uncertainty of about ±20% of the TEM vertical depth measurement (relative to a specific reference point) and about 5% of the side The measurement results (relative to a specific reference point) uncertainty. Therefore, the uncertainty is expressed in the distance of the measured catalytic component relative to the surface of the sample substrate. This inaccuracy is common throughout the TEM analysis but is not sufficient to prevent discrimination between the catalyst compositions. SARCNa test, SARCNa empty sample and related statistical analysis. Due to the original g] discussed above, the surface area change rate of nanometer ("sarc〇 is reported as the ratio of NaOH titrant volume. According to the above SARC cardiac program, each of the given examples is determined. A sample of SAIU^ was prepared by preparing a 3.5 MNaC1 solution (that is, adding 3 gram of NaC1 in ... ml of deionized water) to prepare a J-cut 1 sample, which contained no matrix sample. However, in order to solve SAR' The statistical variability in the experimental procedure should be titrated with four independent empty samples' and adjusted using the mean values of V and V...5 (also used in the specified concentration (〇〇1 N in this example). (ie, correct) the volume of the sputum used in the determination of each substrate σ - negative mouth SARCW. The pH of the empty sample was adjusted according to the same procedure as the above SARQ 并 and the empty sample was titrated, but also contained no matrix. 126426.doc 200843848 A statistical analysis of the empty sample titer is reported in the empty sample and its respective mean and standard deviation (or V total σ) analysis test results table below. Similarly, the respective V total is also reported. corresponding The inherent statistical fluctuations of Vw V5 Vio and V]5 in each titration. From the statistical angle _ I纟t distribution, near the average value, the value of the specified confidence interval X is sinful, not from the experiment. The degree of certainty of the inherent deviation of the method reaches 95 / 〇. Therefore, the V initial and vt values measured for the matrix sample in the confidence interval near the average of the empty sample are considered to be statistically different from the empty sample. Therefore, this class The sample does not calculate the SarCw value. The isoelectric point (1EP) measurement determines the isoelectric point (, ΐΕρπ) of each sample given below according to the following formula: Using the Meuler T〇led〇SevenMulti meter with the pH mV/0RP module, iEp measurement with a Mettler Toledo INLAB 413 pH composite electrode. Align the meter with a standard pH buffer solution at pH 2, 4, 7 and 1 整个 over the entire IEP range of interest. Use enough to bring the sample to incipient wetness State of C, a quantity of 16 ΜΩ* ionized water (wet the sample at about 25 (under), determine the enthalpy of each sample, thereby producing a denser poly- or paste-like mixture. Wet state can make glass electrode and The liquid contact between the reference electrode contact surface and the liquid contacting the solid sample to be tested (in this example, a slurry or paste mixture) depends on the morphology of the sample (eg, glass microfibers, granular powder, chopped fibers, etc.) ) and its porosity (if any), the procedure requires a different amount of water, but in all cases, the amount of water added should be sufficient to bring enough liquid into contact with the glass electrode and the reference electrode. In other words, The sample should be added with water as much as possible to avoid exceeding the initial humidity. In the case of 126426.doc -72- 200843848, the electrode tip is used by hand, and the solid sample is mixed with deionized water (adding force for generating the initial humidity) by hand until the measured pH value is stable, and then from the instrument 1 Read the resulting pH. N2 BET or Kr BET surface area (S.A.) determination According to the A S TM procedure mentioned above, the S.A.N2-BET or S.A.Kb BET determination is performed for each sample given below. As discussed above, for higher surface area measurements (e.g., about 3 to 6 m2/a, W, % BET is likely to be preferred) according to the method described in ASTM D3663-03. Measurement technique. For lower surface area measurements (eg, &lt; approx. 3 m2/g), ^ 'Kr BET may be compared as described in ASTM D4780-95 (,, SApir&quot;) Good surface area measurement technology. Sample number dilute NaOH titration solution SAN2-BET (m2/g) In the NaOH titration, adjust the pH value from the initial value of 4·〇 to 9.0 at tc (V initial), and at the time The volume of the titration required to maintain the pH at 9.0 (ml) Concentration (N) V initial 0 minutes v5 5 minutes v10 10 minutes V15 15 minutes V5i15 and V initial ~ ls empty sample A 0.01 Not applicable 1.5 0.3 0.1 0.2 0.6 2.1 Empty sample B 0.01 Not applicable 2.2 0.1 0.1 0.2 0.4 2.6 Empty sample C 0.01 Not applicable 2.4 0.1 0.1 0.1 0.3 2.7 Empty sample D 0.01 Not applicable 2.2 0.1 0.2 0.1 0.4 2.6 ----- Average value of empty sample 0.01 Not applicable 2.075 0.15 0.125 0.15 0.325 ----- 2.5 Standard deviation of empty sample 0.01 Not applicable 0.3947 0.1 0.05 0.0577 Not applicable Empty sample 95% Trust interval 1.45-2.70 2.07-2.93

U 126426.doc -73 - 200843848 實例CH-2 大孔隙玻璃基質-SARCNa 獲得由Dennen Poraver生產之大孔隙泡沫鈉鈣玻璃樣 品,即平均直徑約為40至125微米之玻璃珠。 樣品A為按原樣接收之大孔隙玻璃珠。 採用上述用於測定SARC^之分析方法對樣品A進行分 析。結果如下表所示。 樣品 號 樣品 說明 稀 NaOH 滴定液濃 度(N) ==================== 0.01 在滴定中,使pH值從UV初)時4.0的初始值調整 至9.0,並在t5、tio及ti5(V5M5)時將pH值保持 在9.0所需的滴定液實際體積(毫升) V初 0分鐘 一 2.1 v5 5分鐘 v10 10分鐘 v15 I 15分鐘 V總 V«rV 初 •一 空樣 ----- — 空樣平均值 0.15 0.125 0.15 2.5 不適用 A 原樣多孔 玻璃珠 0.01 5.2 0.8 0.4 0.1 6.5 1.3 B 酸浸多孔 玻璃珠 ---------- 未測定 未測定 ——---U 126426.doc -73 - 200843848 EXAMPLE CH-2 Macroporous Glass Matrix - SARCNa A macroporous soda lime calcium glass sample produced by Dennen Poraver, a glass bead having an average diameter of about 40 to 125 microns, was obtained. Sample A is a macroporous glass bead that is received as it is. Sample A was analyzed using the above analytical method for determining SARC^. The results are shown in the table below. Sample No. Sample Description Dilute NaOH Titration Concentration (N) ==================== 0.01 In the titration, the pH value is adjusted from the initial value of 4.0 at the beginning of UV) To 9.0, and to maintain the pH at 9.0 at t5, tio and ti5 (V5M5), the actual volume of titrant required (ml) V first 0 minutes a 2.1 v5 5 minutes v10 10 minutes v15 I 15 minutes V total V« rV initial • one empty sample ----- average value of empty sample 0.15 0.125 0.15 2.5 not applicable A original porous glass beads 0.01 5.2 0.8 0.4 0.1 6.5 1.3 B acid immersion porous glass beads ----------- Measurement not determined -----

樣品 號 樣品 說明 空樣 空樣平均 值 修正之 A 原樣多孔 玻璃珠 修正之B 酸浸多孔 玻璃珠 IEP 用 在SARCw測定中所用的修正滴定液體積 ^ Am2-BET (毫升) SARC/να (m2/g) V初 V5 v10 v15 V螅 〇分鐘 5分鐘 10分鐘 15分鐘 - — —== _ 不適用 2.1 0.15 0.125 0.15 2.5 不適用 _^一—' 0.4 3.1 0.65 0.275 -0.05 3.97 0.28 6.0 未測定 未測定 結合以下實例 實例說明了上述 法。符合本發明 對上述觸媒組合物進行更詳細的描述’該 不同類型的觸媒組合物可如何用於氫化方 精神的所有修改及實施例均受到保護。因 126426.doc -74- 200843848 、下灵例並非用來限制於本文描述及主張之發明。 氫化(HYD)方法實例 在乂下非限制性實例中,針對實驗室規模工廢中的氮化 活動進行選定觸媒組合物測試。—般程序如下所述。 &quot;先將觸媒裝入帶有3/16’,外徑熱電偶套管之7/8”内徑 反應器。該觸媒在3帆下使用流速為75q ee/mh^氮氣還 原約16小時。 接著,由8〇 Wt.%之環己烷及2〇 wt·%之苯構成的烴原料 在400 pslg的壓力下,以72 cc/hr之速度流過觸媒。氫氣與 原料之莫耳莫耳比率約為h4比1。溫度範圍在9G°C至210°C 之門以達到所需的苯向環己烧之轉化。 實例P-1 利用大孔隙玻璃上之鉑氫化 在本實例中,將根據上述實例6之方法製備的大孔隙玻 璃珠上〇.4i wt.%之約5 g(7.5 cc)翻裝入反應器。在峨之 溫度下,根據以上描述的氫化方法實例程序測試觸媒。結 果如下表所示。 觸媒 大孔隙玻璃上0.41 wt·%之翻 —------ 轉化率(°/〇) 5.00 g 7.5 cc ----- 100 ------ 樣品說明 實例P-1 例對發明進行了描述,且為說明 ^ ㈢的,逖提出了許多細 節’然熟習此項技術者顯而易見本發明很可能有其它一些 實施例,且在不偏離本發明基本原則的基礎上,於此所: 126426.doc -75- 200843848 述的某些細節可能有較大不同。 【圖式簡單說明】 圖1為由一台JEOL 3〇〇〇F場發射透射電子顯微鏡在3〇〇千 伏加速電壓下所拍攝,實質上無微孔隙/無中孔隙、但有 2隙之玻璃基質樣品(例如,酸浸_玻璃)橫截面部分 2描透射電子顯微鏡(STEM)圖像,其中 布在與孔隙壁表面距離小於或等於物奈米的_/政Sample No. Sample Description Empty Sample Average Corrected A Original Porous Glass Bead Corrected B Acid-Immersed Porous Glass Bead IEP Volume of Modified Titration Used in SARCw Measurement ^ Am2-BET (ml) SARC/να (m2/ g) V initial V5 v10 v15 V螅〇 minutes 5 minutes 10 minutes 15 minutes - —== _ Not applicable 2.1 0.15 0.125 0.15 2.5 Not applicable _^一—' 0.4 3.1 0.65 0.275 -0.05 3.97 0.28 6.0 Not determined not determined The above method is illustrated in conjunction with the following example examples. The above described catalyst compositions are described in more detail in accordance with the present invention. All modifications and examples of how the different types of catalyst compositions can be used in the hydrogenation spirit are protected. 126426.doc -74- 200843848, the following examples are not intended to be limited to the invention described and claimed herein. Hydrogenation (HYD) Process Example In a non-limiting example of an underarm, a selected catalyst composition test is conducted for nitriding activities in laboratory scale work waste. The general procedure is as follows. &quot;Firstly load the catalyst into a 7/8” inner diameter reactor with a 3/16', outer diameter thermowell. The catalyst is used at 3 sails with a flow rate of 75q ee/mh^ nitrogen reduction of about 16 Next, a hydrocarbon feedstock consisting of 8 〇Wt.% cyclohexane and 2 〇wt·% benzene flows through the catalyst at a rate of 72 cc/hr at a pressure of 400 psig. The molar ratio is about h4 to 1. The temperature ranges from 9G ° C to 210 ° C to achieve the desired conversion of benzene to cyclohexane. Example P-1 Utilization of platinum hydrogenation on macroporous glass in this example In the macroporous glass beads prepared according to the method of the above Example 6, about 5 g (7.5 cc) of i.4i wt.% was charged into the reactor. At the temperature of hydrazine, according to the hydrogenation method example procedure described above The catalyst was tested. The results are shown in the following table. 0.41 wt·% of the catalyst on the macroporous glass—the conversion rate (°/〇) 5.00 g 7.5 cc ----- 100 ---- -- Sample Description Example P-1 describes the invention, and for the description of ^ (3), 逖 puts forward a lot of details. However, it is obvious that the present invention is likely to have other implementations. And without departing from the basic principles of the present invention, some of the details described herein may be quite different. [Simplified Schematic] Figure 1 is a JEOL 3〇 〇〇F field emission transmission electron microscope photographed at an acceleration voltage of 3 〇〇 kV, substantially without microporosity / no mesoporosity, but with a 2-gap glass matrix sample (eg, acid immersion glass) cross section 2 A transmission electron microscope (STEM) image in which the distance from the surface of the pore wall is less than or equal to the nanometer

126426.doc 76-126426.doc 76-

Claims (1)

200843848 十、申請專利範圍: 1 · 一種製程流之氫化方法,其利用一種觸媒組合物對該製 程流之至少一部分進行氫化,該製程流含有至少一種具 有至少一個可氫化位點的化合物,其中,該觸媒組合物 包括: ^ _具有大孔隙、外表面、開口孔隙壁表面、表面區域及 - 表面下區域之實質上無微孔隙/無中孔隙之基質, -至少一種催化成分,及 ί _ 至少一個催化活性區域,其包括該至少一種催化成 分,其中 (a) 該實質上無微孔隙/無中孔隙基質具有 1)經選自由,s.Ajmm及其組合組成之群 之量測方法所測得之介於約〇·1 m2/g至50 m2/g之 間的總表面積;及 η)在大於〇但小於或等於14的?11值範圍内獲得之預 定等電點(IEP); (b) 該至少一個催化活性區域可為連續或不連續,且具有 1)小於或等於約3 0奈米之平均厚度;及 ‘ ii)催化有效量之該至少一種催化成分;且 (c) 該至少一個催化活性區域之位置實質上 i) 在該外表面上, ii) 在該開口孔隙壁表面上, iii) 在該表面區域内, iv) 部分在該外表面上,部分在該開口孔隙壁表面 126426.doc 200843848 上,部分在該表面區域内及其組合;或 V) (c)(i)、(ii)、(出)及(iv)之組合。 2.如請求項!之氫化方法,其中該至少一種催化成分係選 自由以下成分組成之群:布忍司特(B_ted)或路易士 (Lewis)^ 司特或路易士驗、貴金屬陽離子及貴金 屬錯合陽離子及陰離子、過渡金屬陽離子及過渡金屬錯 合陽離子及陰離子、過渡金屬含氧陰離子、過渡金屬硫 Ο 屬化物陰離子、主族含氧陰離子、_化物、稀土離子、 稀土錯合陽離子及陰離子、貴金屬、過渡金屬、過渡金 屬氧化物、過渡金屬硫化物、過渡金屬氧硫化物、過渡 至屬奴化物、過渡金屬氮化物、過渡金屬侧化物、過渡 金屬碟化物、稀土氫氧化物、稀土氧化物及其組合。' 3· ^ 5月求項1之氫化方法,其中在該觸媒組合物處於穩態 氫化反應條件下之前’該至少一種催化成分為第一催化 成分,其具有 i) (勾第一預反應氧化態,及 (b)與該基質之間的第一預反應相互作用,其係選自 ‘ 由離子電荷相互作用、靜電電荷相互作用及其组 合組成之群。 ,4.:請求項3之氫化方法,其中該第—催化成分係選自由 酸、鹼、硫屬化物及其組合組成之群。 5·:明求項3之氫化方法,其中在該觸媒組合物處於穩態 虱化反應條件下之前,該第一催化成分之至少一部分妒 改質或置換,以生成第二催化成分,其具有 …工 126426.doc 200843848 (a) 第二預反應氧化態,及 (b) 與該基質之間相應的第二預反應相互作用; 其中,該第二催化成分之第二預反應氧化態小於、大於 或等於該第一催化成分之第一預反應氧化態。 6.如請求項5之氫化方法,其中該第二催化成分係選自由 Pd、Pt、Rh、Ir、RU、0s、Cu、Ag、Au、Ru、Re、 Ni、Co、Fe、Mn、Cr及其組合組成之群。 7·如請求項1之氫化方法,其中該基質為SARCN^h於或等 於約0 · 5之玻璃組合物。 8 ·如凊求項1之氫化方法,其_該至少一個催化活性區域 實質上集中在平均厚度小於或等於約2〇奈米之區域中。 9.如請求項1之氫化方法,其中該實質上無微孔隙/無中孔 隙基質係選自由AR玻璃、稀土石夕酸納玻璃、删|呂石夕酸鹽 玻璃、E玻璃、無硼E玻璃、S玻璃、R玻璃、稀土玻璃、 石夕酸鹽玻璃、Ba-Ti-矽酸鹽玻璃、氮化玻璃、a玻璃、C 玻璃及CC玻璃及其組合組成之群。 1 0 ·如請求項1之氫化方法,其中在第一次浸出處理之前或 之後’該實質上無微孔隙/無中孔隙基質所獲得之IEp係 大於或等於約6.0,但小於14。 126426.doc 200843848 七、指定代表圖: (一) 本案指定代表圖為:第(1 )圖。 (二) 本代表圖之元件符號簡單說明: (無元件符號說明) 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式: (無) 126426.doc200843848 X. Patent Application Range: 1 . A method of hydrogenating a process stream, wherein at least a portion of the process stream is hydrogenated using a catalyst composition comprising at least one compound having at least one hydrogenatable site, wherein The catalyst composition comprises: ^ _ a substrate having a large pore, an outer surface, an open pore wall surface, a surface region, and a subsurface-free region having substantially no microporosity/no porosity, at least one catalytic component, and _ at least one catalytically active region comprising the at least one catalytic component, wherein (a) the substantially microporous/non-porous matrix has 1) a method of measurement selected from the group consisting of: s. Ajmm and combinations thereof Is the total surface area measured between about 1 m2/g and 50 m2/g measured; and η) greater than 〇 but less than or equal to 14? a predetermined isoelectric point (IEP) obtained within a range of 11 values; (b) the at least one catalytically active region may be continuous or discontinuous, and having an average thickness of 1) less than or equal to about 30 nm; and 'ii) Catalyzing an effective amount of the at least one catalytic component; and (c) the at least one catalytically active region is positioned substantially i) on the outer surface, ii) on the open pore wall surface, iii) within the surface region, Iv) partially on the outer surface, partially on the open pore wall surface 126426.doc 200843848, partially in the surface region and combinations thereof; or V) (c) (i), (ii), (out) and a combination of (iv). 2. The hydrogenation process of claim 2, wherein the at least one catalytic component is selected from the group consisting of: B_ted or Lewis, or Lewis, precious metal cations, and precious metals. Complex cations and anions, transition metal cations and transition metal complex cations and anions, transition metal oxyanions, transition metal sulfonium anions, main oxyanions, _ compounds, rare earth ions, rare earth cations and anions, Precious metals, transition metals, transition metal oxides, transition metal sulfides, transition metal oxysulfides, transition to slaves, transition metal nitrides, transition metal side compounds, transition metal plates, rare earth hydroxides, rare earth oxides And their combinations. '3· ^ May hydrogenation method of claim 1, wherein the at least one catalytic component is a first catalytic component having i) before the catalyst composition is under steady state hydrogenation reaction conditions (hook first pre-reaction) An oxidation state, and (b) a first pre-reaction interaction with the substrate, selected from the group consisting of: an ionic charge interaction, an electrostatic charge interaction, and combinations thereof. 4. Request No. 3 The hydrogenation method, wherein the first catalytic component is selected from the group consisting of an acid, a base, a chalcogenide, and a combination thereof. 5. The hydrogenation method of claim 3, wherein the catalyst composition is in a steady state deuteration reaction Prior to the condition, at least a portion of the first catalytic component is ruthenium modified or substituted to form a second catalytic component having a second pre-reactive oxidation state, and (b) Corresponding second pre-reaction interaction; wherein the second pre-reaction oxidation state of the second catalytic component is less than, greater than or equal to the first pre-reaction oxidation state of the first catalytic component. Hydrogenation method, The second catalytic component is selected from the group consisting of Pd, Pt, Rh, Ir, RU, 0s, Cu, Ag, Au, Ru, Re, Ni, Co, Fe, Mn, Cr, and combinations thereof. The method of hydrogenation of claim 1, wherein the substrate is a glass composition having a SARCN^h of or equal to about 0.5. 8. The hydrogenation method of claim 1, wherein the at least one catalytically active region is substantially concentrated on the average The region having a thickness of less than or equal to about 2 nanometers. 9. The hydrogenation method of claim 1, wherein the substantially microporous/no-porous matrix is selected from the group consisting of AR glass, rare earth silicate glass, and the like Lushi silicate glass, E glass, boron-free E glass, S glass, R glass, rare earth glass, silicate glass, Ba-Ti-silicate glass, nitrided glass, a glass, C glass and CC A group of glass and a combination thereof. The hydrogenation method of claim 1, wherein the IEp system obtained by the substantially microporous/non-porous matrix is greater than or equal to about before or after the first leaching treatment. 6.0, but less than 14. 126426.doc 200843848 VII. Designated representative map: (1) The picture is: (1) Figure (2) The symbolic symbol of the representative figure is simple: (No component symbol description) 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: (none) 126426. Doc
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