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TW200728910A - Radiation sensitive resin composition, interlayer-insulated film, microlens, and the method for forming them - Google Patents

Radiation sensitive resin composition, interlayer-insulated film, microlens, and the method for forming them

Info

Publication number
TW200728910A
TW200728910A TW095147776A TW95147776A TW200728910A TW 200728910 A TW200728910 A TW 200728910A TW 095147776 A TW095147776 A TW 095147776A TW 95147776 A TW95147776 A TW 95147776A TW 200728910 A TW200728910 A TW 200728910A
Authority
TW
Taiwan
Prior art keywords
resin composition
sensitive resin
radiation sensitive
microlens
interlayer
Prior art date
Application number
TW095147776A
Other languages
English (en)
Inventor
Masaaki Hanamura
Eiji Takamoto
Takaki Minowa
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200728910A publication Critical patent/TW200728910A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/27—Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds
    • C08K5/28—Azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/08—Copolymers of styrene
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041—Lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties
    • C08L2201/02—Flame or fire retardant/resistant

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Formation Of Insulating Films (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW095147776A 2005-12-22 2006-12-20 Radiation sensitive resin composition, interlayer-insulated film, microlens, and the method for forming them TW200728910A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005369301A JP4656316B2 (ja) 2005-12-22 2005-12-22 層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法

Publications (1)

Publication Number Publication Date
TW200728910A true TW200728910A (en) 2007-08-01

Family

ID=38298216

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095147776A TW200728910A (en) 2005-12-22 2006-12-20 Radiation sensitive resin composition, interlayer-insulated film, microlens, and the method for forming them

Country Status (4)

Country Link
JP (1) JP4656316B2 (zh)
KR (1) KR100858446B1 (zh)
CN (1) CN101206401A (zh)
TW (1) TW200728910A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI848898B (zh) * 2016-05-12 2024-07-21 南韓商三星顯示器有限公司 感光性樹脂組合物、具有圖案的有機膜的形成方法以及顯示裝置

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5045064B2 (ja) 2006-11-02 2012-10-10 Ｊｎｃ株式会社 アルカリ可溶性重合体及びそれを用いたポジ型感光性樹脂組成物
JP4637209B2 (ja) * 2007-06-05 2011-02-23 富士フイルム株式会社 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法
WO2009041681A1 (ja) 2007-09-28 2009-04-02 Deos Laboratory Inc. 共重合体、樹脂組成物、表示パネル用スペーサー、平坦化膜、熱硬化性保護膜、マイクロレンズ、および共重合体の製造方法
JP5240459B2 (ja) * 2008-02-19 2013-07-17 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法
TWI452444B (zh) 2008-07-14 2014-09-11 Jsr Corp 光阻圖型不溶化樹脂組成物及使用其之光阻圖型形成方法
JP5343664B2 (ja) * 2009-03-30 2013-11-13 Ｊｓｒ株式会社 感放射線性樹脂組成物、有機ｅｌ表示素子用隔壁及び絶縁膜、並びにその形成方法
WO2014065100A1 (ja) 2012-10-23 2014-05-01 日産化学工業株式会社 非感光性樹脂組成物
KR102239543B1 (ko) * 2013-08-28 2021-04-13 롬엔드하스전자재료코리아유한회사 포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
JP6700020B2 (ja) * 2015-10-21 2020-05-27 昭和電工株式会社 ポジ型感光性樹脂組成物
KR102414942B1 (ko) 2015-12-21 2022-06-30 닛산 가가쿠 가부시키가이샤 수지 조성물
KR102411927B1 (ko) 2016-07-28 2022-06-22 닛산 가가쿠 가부시키가이샤 수지 조성물
KR102683968B1 (ko) 2019-11-06 2024-07-12 닛산 가가쿠 가부시키가이샤 비감광성 수지 조성물

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08292574A (ja) * 1995-04-20 1996-11-05 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JP4269115B2 (ja) * 1999-05-10 2009-05-27 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびスペーサー
JP2000327877A (ja) 1999-05-17 2000-11-28 Jsr Corp 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズへの使用、並びに層間絶縁膜およびマイクロレンズ
JP2000327875A (ja) 1999-05-21 2000-11-28 Jsr Corp カラーフィルター保護膜またはｔｆｔ層間絶縁膜と一体となったスペーサー用感放射線性樹脂組成物
JP2002182380A (ja) * 2000-12-14 2002-06-26 Jsr Corp 有機ｅｌ表示素子の絶縁膜形成用感放射線性樹脂組成物、それから形成された絶縁膜、および有機ｅｌ表示素子
CN1898605B (zh) * 2004-04-08 2010-08-18 Jsr株式会社 辐射敏感性树脂组合物、层间绝缘膜和微透镜以及它们的制备方法
JP4742662B2 (ja) * 2005-04-26 2011-08-10 Ｊｓｒ株式会社 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子
JP4644857B2 (ja) * 2005-07-22 2011-03-09 昭和電工株式会社 感光性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI848898B (zh) * 2016-05-12 2024-07-21 南韓商三星顯示器有限公司 感光性樹脂組合物、具有圖案的有機膜的形成方法以及顯示裝置

Also Published As

Publication number Publication date
CN101206401A (zh) 2008-06-25
JP4656316B2 (ja) 2011-03-23
KR20070066852A (ko) 2007-06-27
JP2007171572A (ja) 2007-07-05
KR100858446B1 (ko) 2008-09-12

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