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TW200510933A - Method for forming resist pattern - Google Patents

Method for forming resist pattern

Info

Publication number
TW200510933A
TW200510933A TW093115121A TW93115121A TW200510933A TW 200510933 A TW200510933 A TW 200510933A TW 093115121 A TW093115121 A TW 093115121A TW 93115121 A TW93115121 A TW 93115121A TW 200510933 A TW200510933 A TW 200510933A
Authority
TW
Taiwan
Prior art keywords
resist pattern
substrate
resist
film
coating
Prior art date
Application number
TW093115121A
Other languages
Chinese (zh)
Other versions
TWI289728B (en
Inventor
Masaki Kurihara
Toshihiro Yamaguchi
Satoshi Niikura
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200510933A publication Critical patent/TW200510933A/en
Application granted granted Critical
Publication of TWI289728B publication Critical patent/TWI289728B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A method for forming a resist pattern which is suitable for manufacturing a LCD can reduce variation in resist pattern size. The method includes (1) a step for forming an antireflection film on a substrate, (2) a step for coating a positive photoresist composition on the antireflection film to form a coating, (3) a step for prebaking the substrate with the film formed thereon, to form a resist coating film on the substrate, (4) a step for subjecting the resist coating film to selective exposure by using a mask, and (5) a step for subjecting the exposed resist coating film to develop by alkali solvent to form both a resist pattern for an integrated circuit with a pattern size of no more than 2.0 μm and a resist pattern for a liquid crystal display with a pattern size of more than 2.0 μm on the substrate.
TW093115121A 2003-06-19 2004-05-27 Method for forming resist pattern TWI289728B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003174860A JP2005010486A (en) 2003-06-19 2003-06-19 Method for forming resist pattern

Publications (2)

Publication Number Publication Date
TW200510933A true TW200510933A (en) 2005-03-16
TWI289728B TWI289728B (en) 2007-11-11

Family

ID=34098220

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093115121A TWI289728B (en) 2003-06-19 2004-05-27 Method for forming resist pattern

Country Status (3)

Country Link
JP (1) JP2005010486A (en)
KR (1) KR100649921B1 (en)
TW (1) TWI289728B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7829965B2 (en) 2005-05-18 2010-11-09 International Business Machines Corporation Touching microlens structure for a pixel sensor and method of fabrication
US7666575B2 (en) * 2006-10-18 2010-02-23 Az Electronic Materials Usa Corp Antireflective coating compositions
JP2010240868A (en) * 2009-04-01 2010-10-28 Canon Inc Inkjet recording head and manufacturing method thereof

Also Published As

Publication number Publication date
KR100649921B1 (en) 2006-11-24
JP2005010486A (en) 2005-01-13
TWI289728B (en) 2007-11-11
KR20040111103A (en) 2004-12-31

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees